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Shin Oowada patents

Recent bibliographic sampling of Shin Oowada patents listed/published in the public domain by the USPTO (USPTO Patent Application #,Title):



02/06/14 - 20140034831 - Inspection system by charged particle beam and method of manufacturing devices using the system
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding...
Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama (Ebara Corporation)

02/09/12 - 20120032079 - Inspection system by charged particle beam and method of manufacturing devices using the system
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding...
Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama (Ebara Corporation)

05/05/11 - 20110104830 - Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving succe-ssively said substrate by means of a...
Inventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito (Ebara Corporation)

02/26/09 - 20090050822 - Electron beam apparatus and method of manufacturing semiconductor device using the apparatus
The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of...
Inventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura (Ebara Corporation)

02/05/09 - 20090032708 - Inspection system by charged particle beam and method of manufacturing devices using the system
An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding...
Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama (Kabushiki Kaisha Toshiba)

Ebara Corporation, Kabushiki Kaisha Toshiba

Archived*
(*May have duplicates - we are upgrading our archive.)

20120032079 - Inspection system by charged particle beam and method of manufacturing devices using the system


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The bibliographic references displayed about Shin Oowada's patents are for a recent sample of Shin Oowada's publicly published patent applications. The inventor/author may have additional bibliographic citations listed at the USPTO.gov. FreshPatents.com is not associated or affiliated in any way with the author/inventor or the United States Patent/Trademark Office but is providing this non-comprehensive sample listing for educational and research purposes using public bibliographic data published and disseminated from the United States Patent/Trademark Office public datafeed. This information is also available for free on the USPTO.gov website. If Shin Oowada filed recent patent applications under another name, spelling or location then those applications could be listed on an alternate page. If no bibliographic references are listed here, it is possible there are no recent filings or there is a technical issue with the listing--in that case, we recommend doing a search on the USPTO.gov website.

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