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10/26/06 - USPTO Class 424 | 214 views | #20060239953 | Prev - Next | About this Page

Rinse-off personal care compositions containing high modulus lipids

Title: Rinse-off personal care compositions containing high modulus lipids

Related Patent Categories: Drug, Bio-affecting And Body Treating Compositions, Live Hair Or Scalp Treating Compositions (nontherapeutic), Anionic Surfactant Containing

Brief Patent Description - Full Patent Description - Patent Claims

The Patent Description & Claims data below is from USPTO Patent Application 20060239953, Rinse-off personal care compositions containing high modulus lipids.

1. A rinsable personal care composition comprising: (a) from 0% to 75%, by weight of said composition, of a surfactant; (b) from 0.01% to 99%, by weight of said composition, of a skin benefit agent; said skin benefit agent comprising a high modulus lipid and an ester; and (c) from 0% to 99%, by weight of said composition, of water.

2. The composition of claim 1, wherein said high modulus lipid comprises an oil selected from the group consisting of hydrocarbon oils, triglycerides, polyesters, silicone oils, and mixtures thereof.

3. The composition of claim 1, wherein a ratio of said high modulus lipid to said ester is no more than 50 to 1.

4. The composition of claim 1, wherein a ratio of said high modulus lipid to said ester is at least 1 to 15.

5. The composition of claim 1, wherein said high modulus lipid has a lipid modulus of no more than 3000 Pa.

6. The composition of claim 1, wherein said high modulus lipid has a lipid modulus of at least 100 Pa.

7. The composition of claim 1, wherein said ester comprises no more than 30 carbon atoms.

8. The composition of claim 1, wherein said ester is selected from the group consisting of a di-ester, a tri-ester, a tetra-ester, a branched ester, a dimmer, and mixtures thereof.

9. The composition of claim 1, wherein said composition comprises no more than 80%, by weight of said composition, of said skin benefit agent.

10. The composition of claim 1, wherein said composition further comprises a continuous aqueous phase.

11. The composition of claim 1, wherein said composition comprises no more than about 5%, by weight of said composition, of said surfactant.

12. The composition of claim 1, wherein said surfactant is in the form of a nonionic gel network.

13. The composition of claim 1, wherein said composition further comprises a structurant.

14. The composition of claim 1, wherein said composition further comprises a thickener/aqueous phase stability agent.

15. The composition of claim 1, wherein said composition further comprises a hydrophobically modified particle.

16. The composition of claim 1, wherein said ester is added separately from said high modulus lipid during a process of making said composition.

17. The composition of claim 1, wherein said ester is premixed with said high modulus lipid during a process of making said composition.

18. A method for moisturizing skin, said method comprising the steps of: a. cleansing said skin; b. applying to said skin a composition comprising: from 0% to 75%, by weight of said composition, of a surfactant; from 0.01% to 99%, by weight of said composition, of a skin benefit agent comprising a high modulus lipid and an ester; and from 0% to 99%, by weight of said composition, of water; and c. rinsing said composition from said skin.

19. A method for removing make-up, said method comprising the steps of: a. applying to said skin a composition comprising: from 0% to 75%, by weight of said composition, of a surfactant; from 0.01% to 99%, by weight of said composition, of a skin benefit agent comprising a high modulus lipid and an ester; and from 0% to 99%, by weight of said composition, of water; and b. rinsing or wiping away said composition from said skin.

Brief Patent Description - Full Patent Description - Patent Claims

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