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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
07/10/2014 > 10 patent applications in 9 patent subcategories.

20140193748 - Visible light photoinitiating system for preparing high diffraction efficiency hologram optical polymer material: The present invention provides a visible light photoinitiating system for preparing a holographic photopolymer material with high-diffraction efficiency. The photoinitiating system comprises a photosensitizer and a co-initiator, and its mechanism is that the photosensitizer transforms from ground state to excited state after absorbing photons, and then interacts with the co-initiator... Agent:

20140193749 - Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent... Agent: Fujifilm Corporation

20140193750 - Electrostatic charge image developing toner, electrostatic charge image developer, and toner cartridge: An electrostatic charge image developing toner includes toner particles; and an external additive that is externally added to surfaces of the toner particles, in which a content of nitrogen atoms on the surfaces of the toner particles is from 0-8 atomic % to 5.0 atomic % and a content of... Agent: Fuji Xerox Co., Ltd.

20140193751 - Toner set, image forming apparatus, and image forming method: Provided is a toner set including a brilliant toner containing a brilliant pigment and at least one kind of color toner containing a colorant, in which a ratio (G′ A/G′B) of G′A to G′B satisfies a relationship of 1≦G′A/G′B≦10, when a storage modulus in 120° C. of the brilliant toner... Agent:

20140193753 - Composition for forming a developable bottom antireflective coating: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for... Agent: Az Electronic Materials Usa Corp.

20140193752 - Stabilized acid amplifiers: There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.... Agent: The Research Foundation Of State University Of New York

20140193754 - Compositions of neutral layer for directed self assembly block copolymers and processes thereof: where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4... Agent: Az Electronic Materials (luxembourg) S.a.r.l.

20140193755 - Amplification method for photoresist exposure in semiconductor chip manufacturing: An electrical field is applied through an extreme ultraviolet (EUV) photoresist layer along a direction perpendicular to an interface between the EUV photoresist layer and an underlying layer. Secondary electrons and thermal electrons are accelerated along the direction of the electrical field, and travel with directionality before interacting with the... Agent: International Business Machines Corporation

20140193756 - Process for producing a liquid ejection head: A process for producing a liquid ejection head including, on a substrate, a flow path forming member forming ejection orifices and a liquid flow path communicating therewith, including forming, on the substrate, a first layer of photosensitive resin; forming, on the first layer, a mask layer in which at least... Agent: Canon Kabushiki Kaisha

20140193757 - Compositon for forming metal oxide-containing film and patterning process: The invention provides a composition for forming a metal oxide-containing film comprising, as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1), as a component (B), an aromatic compound shown... Agent: Shin-etsu Chemical Co., Ltd.

  
07/03/2014 > 28 patent applications in 15 patent subcategories.

20140186751 - Apparatus of repairing a mask and a method for the same: An apparatus includes a probe tip configured to contact the mask, a cantilever configured to mount the probe tip wherein the cantilever includes a mirror, an optical unit having a light source projecting a light beam on the mirror and a light detector receiving a reflected light beam from the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140186750 - Lithography mask repairing process: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography... Agent:

20140186754 - Method for manufacturing reflective mask and apparatus for manufacturing reflective mask: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the... Agent: Shibaura Mechatronics Corporation

20140186753 - Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank: The present invention relates to a reflective mask blank containing in this order, a substrate, a multilayer reflective film that reflects exposure light, and an absorber layer that absorbs the exposure light, in which the reflective mask blank further contains a fiducial mark indicating a reference position of the multilayer... Agent: Asahi Glass Company, Limited

20140186752 - Reflective mask blank for euv lithography, and process for its production: A process for producing a reflective mask blank for EUV lithography (EUVL), which comprises forming a multilayer reflective film for reflecting EUV light on a film-forming surface of a substrate, then forming a protective layer for protecting the multilayer reflective film, on the multilayer reflective film, and forming an absorber... Agent: Asahi Glass Company, Limited

20140186755 - Exposure apparatus and method of device fabrication: The present invention provides an exposure apparatus which exposes a substrate, the apparatus including an adjustment unit configured to adjust an oxygen concentration in a space between the projection optical system and the substrate, a measuring unit configured to measure an illuminance of light applied to the substrate, and a... Agent: Canon Kabushiki Kaisha

20140186756 - Crosslinkable urethane acrylate charge transport molecules for overcoat: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from a curable composition including a urethane methacrylate functional charge transport molecule, and a photoinitiator. The urethane acrylate functional charge transport molecule is a reaction product of hydroxyl functional... Agent: Lexmark International, Inc.

20140186758 - Photo conductor overcoat comprising radical polymerizable charge transport molecules and hexa-functional urethane acrylates: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from an (UV) ultraviolet curable composition including a urethane resin having at least six radical polymerizable functional groups and a charge transport molecule having at least one radical polymerizable... Agent: Lexmark International, Inc.

20140186757 - Wear resistant urethane hexaacrylate materials for photoconductor overcoats: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from a curable composition including a urethane resin having at least six radical polymerizable functional groups. The at least six radical polymerizable functional groups may include acrylate group, methacrylate... Agent: Lexmark International, Inc.

20140186759 - Electrostatic charge image development toner: An electrostatic charge image development toner contains a plurality of toner particles. The plurality of toner particles are each formed to have resin particulates in a surface layer. The resin particulates each include a particulate core and a coating layer covering the particulate core. The particulate core contains a quaternary... Agent: Kyocera Document Solutions Inc.

20140186762 - Toner: A toner having good environmental stability, low-temperature fixability, development durability, and storage stability is provided. A toner includes toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer is obtained by polymerizing a compound having a specific structure. The surface layers have a... Agent:

20140186760 - Toner: A toner having good development durability, storage stability, environmental stability, and low-temperature fixability is provided. The toner contains toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer contains a unit having a specific structure. The average thickness Dav. of the surface layers... Agent:

20140186761 - Toner: A toner having good development durability, storage stability, environmental stability, and low-temperature fixability is provided. The toner contains toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer contains a specific unit. In a chart obtained by 29Si-NMR measurement of THF insoluble components... Agent:

20140186763 - Liquid developer: A liquid developer containing toner particles containing a resin and a pigment, and an insulating liquid, the toner particles being dispersed in the insulating liquid, wherein the insulating liquid contains an olefin having 12 carbon atoms or more and 18 carbon atoms or less in an amount of 10% by... Agent: Kao Corporation

20140186764 - Method for producing liquid developer: A method for producing a liquid developer containing toner particles containing a resin containing a polyester and a pigment, and an insulating liquid, wherein the toner particles are dispersed in the insulating liquid, including: step 1: melt-kneading the resin and the pigment, and pulverizing a melt-kneaded mixture to provide toner... Agent: Kao Corporation

20140186765 - Photosensitive resin composition and cured product thereof: An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having... Agent: Nippon Kayaku Kabushiki Kaisha

20140186766 - Resin composition for masks: The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in... Agent:

20140186767 - Acid generators and photoresists comprising same: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a... Agent: Rohm And Haas Electronic Materials LLC

20140186768 - Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400... Agent: Cheil Industries Inc.

20140186770 - Dendritic compounds, photoresist compositions and methods of making electronic devices: Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well... Agent:

20140186771 - Radiation-sensitive resin composition, polymer, compound, and method for producing compound: A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R1 is a hydrogen atom, a fluorine atom, or the like. R2 is a hydrogen atom or a monovalent hydrocarbon group. R3 is a hydrogen atom, a monovalent chain... Agent: Jsr Corporation

20140186769 - Resist composition, method for forming resist pattern, and high-molecular weight compound: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid,... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140186772 - Photoresist pattern trimming methods: Provided are methods of trimming a photoresist pattern. The methods comprise: (a) providing a semiconductor substrate; (b) forming a photoresist pattern on the substrate, wherein the photoresist pattern is formed from a chemically amplified photoresist composition comprising: a matrix polymer comprising an acid labile group; a photoacid generator; and a... Agent:

20140186773 - Coating material and method for photolithography: Provided is a method including providing a substrate and forming a bottom anti-reflective coating (BARC) on the substrate. The BARC includes a first portion overlying a second portion, which has a different composition than the first portion. The different composition may provide a different dissolution property of the BARC in... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140186774 - Acid-strippable silicon-containing antireflective coating: A silicon-containing antireflective coating formulation comprising: (i) an aqueous base insoluble organosilicon component having a multiplicity of hydrocarbon groups derivatized with hydroxy groups in the absence of Si—O—C and Si—O—H moieties; (ii) a vinylether component having a multiplicity of vinylether groups; and (iii) a casting solvent. Also disclosed is a... Agent: International Business Machines Corporation

20140186775 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition: A monomer for a hardmask composition is represented by the following Chemical Formula 1,... Agent:

20140186776 - Phenolic resin and material for forming underlayer film for lithography: There is provided a novel phenolic resin which can be used as a coating agent or a resist resin for a semiconductor, which has a high carbon concentration and a low oxygen concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility,... Agent: Mitsubishi Gas Chemical Company, Inc.

20140186777 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition: A monomer for a hardmask composition represented by the following Chemical Formula 1,... Agent:

  
06/26/2014 > 23 patent applications in 14 patent subcategories.

20140178803 - Multiple-patterning photolithographic mask and method: A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes receiving a mask having a plurality of sub-reticles and a substrate having one or more regions. A first sub-reticle of the plurality of sub-reticles is aligned with a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140178806 - Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask: As a negative actinic ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in sensitivity, resolution and pattern profile and reduced in line edge roughness (LER), scum and development defect, a negative actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a polymer compound containing (a) a repeating unit... Agent: Fujifilm Corporation

20140178805 - Pellicle for lithogrpahy: There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the... Agent: Shin-etsu Chemical Co., Ltd.

20140178804 - Stacked mask: The present disclosure describes a mask. The mask includes a low thermal expansion material (LTEM) substrate, at least two absorber layers, and a spacer layer separating the two absorber layers. The first absorber layer is deposited over the LTEM substrate. The mask further includes a topcoat layer over the absorber... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140178807 - Photopatternable imaging layers for controlling block copolymer microdomain orientation: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third... Agent: Wisconsin Alumni Research Foundation

20140178808 - Photosensitive resin composition: A photosensitive resin composition having excellent storage stability which can form a high precision pattern upon a low amount of exposure; a method of forming a pattern including a polysiloxane coating with the photosensitive resin composition; and an electronic component including a pattern including a polysiloxane coating formed with the... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140178809 - Electrophotographic photoreceptor: According to the present invention, an electrophotographic photoreceptor comprising an intermediate layer is provided. The intermediate layer is a single layer and contains first metal oxide particles, second metal oxide particles having higher electron-transporting properties than those of the first metal oxide particle and a binder resin. The first metal... Agent: Konica Minolta, Inc.

20140178810 - Image bearing member, manufacturing method of the same, image forming method, image forming apparatus, and process cartridge: c

20140178811 - Chemical binding of renewable oils to polyester emulsion: Methods for making toner particles comprising a polyester-wax resin, wherein the polyester-wax resin includes a bio-based oil that is chemically incorporated into the main chain of the polyester resin. The toner particles may be formed using emulsion aggregation methods. A toner formed from the toner particles may be used in... Agent: Xerox Corporation

20140178812 - Toner: t

20140178813 - Method for manufacturing fatty acid metal salt particle, and fatty acid metal salt particle: A method for manufacturing a fatty acid metal salt particle includes forming a coating layer including a fatty acid metal salt on a surface of a core material particle in supercritical carbon dioxide.... Agent:

20140178814 - Dry film photoresist having oxygen permeable barrier layer and manufacturing method thereof: There is provided a dry film photoresist including: a base film having an oxygen permeable barrier layer formed thereon; a photosensitive resin layer formed on the oxygen permeable barrier layer; and a protective film formed on the photosensitive resin layer. According to the present invention, the dry film photoresist includes... Agent: Samsung Electro-mechanics Co., Ltd.

20140178815 - Photosensitive resin composition for light blocking layer and light blocking layer using the same: e

20140178816 - Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same:

20140178817 - Curable coatings for photoimaging: There is herein described curable coatings for use in a photoimaging process. In particular, there is described curable coatings in the form of 100% or substantially 100% solids energy curable coatings for use in a photoimaging process wherein a substrate is covered with a wet curable photopolymer and the photoimaged... Agent:

20140178819 - Photosensitive polysiloxane composition and applications thereof: A phontosensitive polysiloxane composition for forming a protective film having superior sensitivity is disclosed. A protective film formed from the phontosensitive polysiloxane composition and an element including the protective film are also disclosed. The phontosensitive polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane(meth)acrylate compound having at least... Agent: Chi Mei Corporation

20140178822 - Photosensitive polysiloxane composition and uses thereof: The invention relates to a photosensitive polysiloxane composition that has good thermal transmittance, good chemical resistance and good sensitivity and good refractivity. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.... Agent: Chi Mei Corporation

20140178818 - Resist composition and patterning process: An additive polymer comprising recurring units derived from a fluorosulfonamide-substituted styrene and recurring units derived from a stilbene, styrylnaphthalene, dinaphthylethylene, acenaphthylene, indene, benzofuran, or benzothiophene derivative is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can... Agent: Shin-etsu Chemical Co., Ltd.

20140178821 - Resist composition, method of forming resist pattern and compound: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0)... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140178820 - Resist composition, patterning process and polymer: An additive polymer comprising recurring styrene units having an ester group bonded to a CF3—C(OR2)—R3 group (wherein R2 is H, acyl or acid labile group, R3 is H, CH3 or CF3) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to... Agent: Shin-etsu Chemical Co., Ltd.

20140178823 - Photosensitive polyimide and negative type photoresist composition containing the same:

20140178824 - Optimizing lithographic processes using laser annealing techniques: Approaches for utilizing laser annealing to optimize lithographic processes such as directed self assembly (DSA) are provided. Under a typical approach, a substrate (e.g., a wafer) will be subjected to a lithographic process (e.g., having a set of stages/phases, aspects, etc.) such as DSA. Before or during such process, a... Agent: Globalfoundries Inc.

20140178825 - Developer: A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural... Agent: Jsr Corporation

  
06/19/2014 > 36 patent applications in 19 patent subcategories.

20140170533 - Extreme ultraviolet lithography (euvl) alternating phase shift mask: An alternating phase shift mask for use with extreme ultraviolet lithography is provided. A substrate with a planar top surface is used as a base for the phase shift mask. A spacer layer serves as a Fabry-Perot cavity for controlling the phase shift difference between two adjacent surfaces of the... Agent: Globalfoundries Inc.

20140170537 - Method of defining an intensity selective exposure photomask: An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a coating layer to be used in fabricating the integrated circuit device is predicted based on the design data. This prediction is... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140170535 - Pellicle, pressure-sensitive adhesive for pellicle, photomask with pellicle, and method for manufacturing semiconductor device: To provide a pellicle having a an adhesive, wherein adhesive residue is decreased at the time of peeling the pellicle from a mask after lithographic exposure and outgassing from the adhesive is suppressed The pellicle according to the present invention is a pellicle comprising a pellicle frame, a tensioned pellicle... Agent: Asahi Kasei E-materials Corporation

20140170534 - Phase shift masks and methods of forming phase shift masks: A phase shift mask having a first region and a second region in a transverse direction includes a transparent layer, a phase shift pattern disposed in the first region, a transmittance control layer pattern disposed in the second region, and a shading layer pattern disposed on the transmittance control layer... Agent: Samsung Electronics Co., Ltd.

20140170536 - Reflective mask and method for manufacturing same: A reflective mask having a light-shielding frame with high light-shielding performance, and a method for manufacturing thereof. In a reflective mask having a light-shielding frame dug into a multilayered reflective layer, when side etching is performed or processing to obtain a reverse tapered shape is performed only on the multilayered... Agent: Toppan Printing Co., Ltd.

20140170538 - Novel compound having triazine side chain, coloring composition, inkjet ink, inkjet recording method, color filter, and color toner: r

20140170539 - Determination of lithography tool process condition: A method for forming an integrated circuit (IC) is presented. The method includes providing a wafer having a substrate prepared with a photoresist layer. The photoresist layer is processed by passing a radiation from an exposure source of a lithography tool through a mask having a pattern. The process parameters... Agent: Globalfoundries Singapore Pte. Ltd.

20140170540 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The photosensitive layer of an electrophotographic photosensitive member contains (a) a gallium phthalocyanine crystal, (b) a specific amine compound and (c) a specific polyvinylacetal resin.... Agent: Canon Kabushiki Kaisha

20140170541 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: Provided is an electrophotographic photosensitive member including a charge-generating layer that includes: an amine compound represented by the formula (1) and a gallium phthalocyanine crystal, or a gallium phthalocyanine crystal containing the amine compound represented by the formula (1); and an arene compound, in which the arene compound includes at... Agent: Canon Kabushiki Kaisha

20140170542 - Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus and phthalocyanine crystal: The photosensitive layer of an electrophotographic photosensitive member contains a phthalocyanine crystal in which a compound represented by the following formula (1) is contained:... Agent: Canon Kabushiki Kaisha

20140170543 - Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus and phthalocyanine crystal: An electrophotographic photosensitive member includes a support and a charge generating layer and a charge transporting layer formed on the support. The charge generating layer contains a specific amine compound.... Agent: Canon Kabushiki Kaisha

20140170544 - Electrophotographic photoconductor and method for producing the same: An electrophotographic photoconductor including: an electroconductive substrate; a photoconductive layer; and a surface layer, the photoconductive layer and the surface layer being laid over the electroconductive substrate, wherein the surface layer is a crosslinked layer which is cured by irradiating with light energy a composition containing a radical polymerizable monomer... Agent:

20140170545 - Bio-based branched resins for toner: The present disclosure provides a bio-based, branched polyester resin comprising the condensation product of a hydroxyl donor and a cyclic polyhydroxyl acceptor that may be used with a polyacid to form a polyester which may be used in manufacturing toner for imaging devices.... Agent: Xerox Corporation

20140170547 - Polyester ea toner comprising furan: The present disclosure provides a bio-based polyester resin comprising a polyacidic furan, including the manufacture of such polyester resin, which resin may be used in manufacturing toner for imaging devices.... Agent: Xerox Corporation

20140170546 - Thymol derivatives in polyester polymer toner resin: The present disclosure provides a polyester toner resin comprising a polyhydroxylated thymol derivative that may be used in manufacturing an emulsion aggregation (EA) toner for imaging devices.... Agent: Xerox Corporation

20140170549 - Charge control agent composition for external addition and electrostatic image developing toner: There is provided an electrostatic image developing toner less likely to cause image degradation even when used for a long period, by controlling CCA particles present on surfaces of toner particles and thereby keeping an amount of tribocharge generated between the toner and a magnetic carrier or the like constant.... Agent: Morimura Chemicals Limited

20140170548 - Continuous production of toner: Continuous and semi-continuous emulsion aggregation processes for the production of toner particles are presented.... Agent: Xerox Corporation

20140170552 - Toner: n

20140170551 - Tunable gloss toner: The disclosure describes an emulsion aggregation toner process wherein aspartic acid derivatives are employed as chelating agents. Also disclosed is a process for preparing toner using aspartic acid derivatives to freeze/stop toner particle growth where coalescence occurs following acidification of the reaction mixture.... Agent: Xerox Corporation

20140170553 - Yellow toner: The present invention provides a yellow toner having high compatibility of a colorant with a binder resin, having good chroma, and being useful for broadening the green color gamut. The yellow toner contains the binder resin and the colorant, wherein the colorant contains a compound represented by the general formula... Agent: Canon Kabushiki Kaisha

20140170550 - Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, developing device, image forming apparatus, and image forming method: Provided is an electrostatic charge image developing toner including toner base particles which contain a polyester resin and a vinyl resin and does not have a coating layer and wherein the concentration of the polyester resin on the particle surface is higher than the concentration of the polyester resin in... Agent: Fuji Xerox Co., Ltd.

20140170554 - Electrophotographic toner: An electrophotographic toner contains an electron donating color former compound, an electron accepting color developing agent, and a binder resin, wherein a toluene insoluble content in the electrophotographic toner is 10% by mass or more and 40% by mass or less, and the toner is decolorized by heating.... Agent: Toshiba Tec Kabushiki Kaisha

20140170555 - Cardanol derivatives in polyester toner resins: The present disclosure provides a polyester toner resin comprising a polyhydroxylated cardanol derivative, that may be used in manufacturing an emulsion aggregation (EA) toner for imaging devices.... Agent: Xerox Corporation

20140170556 - Liquid developer and image forming method: A liquid developer includes a carrier liquid having insulation property, colored particles, and an organic high molecular compound. The organic high molecular compound is dissolved in the carrier liquid. The organic high molecular compound includes elastomer A that is a styrene-butadiene-based elastomer not having an acid group or a basic... Agent: Kyocera Document Solutions Inc.

20140170557 - Batch/continuous production of toner: A process for forming toner using an emulsion/aggregation scheme wherein particle aggregation occurs in a batch reactor and coalescence occurs in a continuous reactor, with a space time yield of at least 200 g/L/hr.... Agent: Xerox Corporation

20140170558 - Batch/continuous production of toner: A process for forming toner using an emulsion/aggregation scheme wherein particle aggregation occurs in a batch reactor and coalescence occurs in a continuous reactor. In embodiments, a continuous reactor comprises four sections joined in series.... Agent: Xerox Corporation

20140170559 - Method for manufacturing electrostatic latent image developing toner: Regarding a method for manufacturing an electrostatic latent image developing toner, which includes a process for aggregating particulates of components such as a binder resin, a colorant, and a releasing agent, a dispersion solution of binder resin particulates obtained by a specific method is used. The dispersion solution of the... Agent: Kyocera Document Solutions Inc.

20140170560 - Negative resist composition and patterning process using the same: The invention provides a negative resist composition including, as a base resin, a polymer that contains at least a repeating unit “a” having a cyclopentadienyl complex and is represented by the following general formula (1). There can be a negative resist composition, especially a chemically amplified negative resist composition that... Agent: Shin-etsu Chemical Co., Ltd.

20140170562 - Positive photosensitive resin composition: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at... Agent:

20140170561 - Vinyl ether group-containing copolymer, preparation process and use thereof: The invention provides a vinyl ether group-containing copolymer, preparation process and use thereof. The copolymer comprises of the structural units represented by the following general formulae I, II and III, wherein, R1 is O or HN, R2 is an alkyl group with a carbon atom number of 1-4, cyclohexyl or... Agent: Boe Technology Group Co., Ltd.

20140170564 - Actinic ray-sensitive or radiation-sensitive resing composition, actinic ray-sensitive or radiation-sensitive film using the composition, and pattern forming method: e

20140170563 - Positive resist composition and patterning process using same: The invention provides a positive resist composition, wherein a polymer compound having the weight-average molecular weight in the range of 1,000 to 500,000 and comprising a repeating unit having a hydrogen atom in a carboxyl group and/or in a phenolic hydroxy group therein been substituted by an acid-labile group and... Agent: Shin-etsu Chemical Co., Ltd.

20140170565 - Pattern forming method and method for manufacturing template for imprint: In one embodiment, a pattern forming method includes irradiating a predetermined region of a mask member, provided on a substrate, with an ion beam to inject ions, forming a self-assembled material layer having a first polymer and a second polymer on the mask member, microphase-separating the self-assembled material layer, to... Agent: Kabushiki Kaisha Toshiba

20140170566 - Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image: The present invention relates to customizing individual workpieces, such as chip, flat panels or other electronic devices produced on substrates, by direct writing a custom pattern. Customization can be per device, per substrate, per batch or at some other small volume that makes it impractical to use a custom mask... Agent: Micronic Mydata Ab

20140170567 - Resist underlayer film-forming composition for euv lithography containing condensation polymer: e

20140170568 - Method for manufacturing waveguide lens: A method for manufacturing a waveguide lens is provided. A planar waveguide is provided, wherein the planar waveguide includes a top surface and a side surface perpendicularly connecting with the top surface, the side surface is coupled to a laser light source, and the laser light source emits a laser... Agent: Hon Hai Precision Industry Co., Ltd.

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