Radiation imagery chemistry: process, composition, or product thereof inventions

20090280415 - Transparent substrate for mask blank and mask blank: In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.... Agent: Sughrue Mion, PLLC

20090280416 - Black photosensitive resin composition, and color filter and method of producing the same: A black photosensitive resin composition, a light-shielding color filter using the composition and its production method are provided, the black photosensitive resin composition including: a black colorant; a compound represented by Formula (I) or (II) as defined in the specification; and a photopolymerization initiator.... Agent: Sughrue-265550

20090280418 - Exposure apparatus, correction method, and device manufacturing method: An exposure apparatus comprising a projection optical system configured to project a pattern of an original onto a substrate; and a control unit, wherein the control unit acquires a result of measuring a line width of an image of a first mark and a position of an image of a... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090280417 - Method for fabricating mold core: An exemplary method for fabricating a mold core includes the following steps. First, a substrate is provided. Second, a photo resist layer is formed on the substrate, the photo resist layer has a top surface. Third, the photo resist layer is etched using a direct writing process to form the... Agent: PCe Industry, Inc. Att. Steven Reiss

20090280419 - Electrophotographic photoreceptor and image forming apparatus:

20090280420 - Organic photoreceptor, image forming method, image forming apparatus, and image forming unit: An organic photoreceptor comprising a conductive support having thereon at least an intermediate layer and a photosensitive layer, wherein a skewness Rsk of a cross sectional curve of a surface of the conductive support meets the condition of −8<Rsk<0, a method of forming an image and an image forming unit... Agent: Lucas & Mercanti, LLP

20090280421 - Method of manufacturing toner and toner: A method of manufacturing a toner including dispersing a binder resin, a coloring agent and a releasing agent in an organic solvent to obtain an oil phase; dispersing the oil phase in an aqueous medium with a shearing force to obtain a dispersion emulsion; wherein the shearing force is made... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280422 - Toner for development of electrostatic image: A toner for development of electrostatic images, comprising colored resin particles containing a binder resin and a colorant, and an external additive, wherein the external additive contains fine particles of an inorganic layered clay compound, and the inorganic layered clay compound is an intercalation compound with a quaternary ammonium ion... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090280426 - Toner for electrostatic image development: wherein each of R1 and R4, which may be identical or different, is a linear or branched alkyl group having 3 to 8 carbon atoms; each of R2, R3, R5, and R6, which may be identical or different, is a hydrogen atom, an alkyl group having 1 to 8 carbon... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280423 - Method for producing resin dispersions and resin particles: The present invention concerns a method for producing an aqueous dispersion (X1), the method including a step that includes mixing an aqueous dispersion liquid (W) of resin particles (A) comprising a resin (a) with a precursor (b0) of a resin (b) or an oily liquid (OL) comprising the precursor (b0)... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090280424 - Toner for developing electrostatically charged image and process for producing the same: Provided as toners for developing electrostatically charged images capable of preventing a sticking and curling phenomenon even with an increase in number of printed sheets and processes for producing the same, with the use of a cyclic polyolefinic resin, are a toner for developing electrostatically charged images contains a cyclic... Agent: Jordan And Hamburg LLP

20090280425 - Black toner formulations: Black toner formulations for electrophotography. The black toner formulations include an optimum concentration of one or more black colorants. Further, the black toner formulation includes either a polymeric dispersant, a binder, a wax, or combinations thereof. The one or more black colorants exhibit a low absorption in near infrared spectrum... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090280427 - Toner for non-contact fusing: A toner for non-contacting fusing containing toner matrix particles containing a resin binder and an external additive having an average particle size of from 10 to 100 nm, wherein the external additive is externally added to the toner matrix particles, wherein the resin binder contains one or more polyesters, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280428 - Image formation apparatus that solves uneven gloss in a page, and image formation method and recording medium for the method: The present invention reduces delay in supplying heat to fixing nip when sheet passes therethrough and overcomes disadvantages like uneven gloss in page and fixing faults by including temperature detector 83 detecting temperatures of fixing member including heat application roller and fixing belt, leading end detector 85 detecting timing leading... Agent: Buchanan, Ingersoll & Rooney PC

20090280430 - Method for manufacturing toner: There is provided a method for manufacturing a toner capable of providing a toner having excellent low-temperature fixing property and anti-offset property by adjusting a molecular weight distribution of a polymerization toner to a narrow distribution range. The method is characterized in that a toner is polymerized using a reversible... Agent: Mckenna Long & Aldridge LLP

20090280429 - Polyester synthesis: The present disclosure provides for enzymatic polymerization to produce polyester resins suitable for use in manufacturing toners.... Agent: Xerox Corporation (cdfs)

20090280431 - Material for protective film formation, and method for photoresist pattern formation using the same: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an alkylene chain having 1 to 5 carbon atoms; R3 represents a fluorinated alkylene chain having 1 to 10 carbon atoms in which a part or all of hydrogen atoms have been substituted by a fluorine atom; and... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090280432 - Photosensitive sheets and method and apparatus for manufacturing the same: Photosensitive film can be protected in stacking photosensitive sheets and a sheet can be separated one at a time in a state where photosensitive sheets are stacked, ensuring its taking out. An apparatus for manufacturing PS plates, which is adapted to provide photosensitive film on one side of both surfaces... Agent: Sughrue Mion, PLLC

20090280433 - Radiation-sensitive composition and process for producing low-molecular compound for use therein: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per... Agent: Ditthavong Mori & Steiner, P.C.

20090280434 - Resist composition and patterning process: A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.... Agent: Birch Stewart Kolasch & Birch

20090280435 - Antireflective coating composition: c

20090280436 - Immersion system, exposure apparatus, exposing method, and device fabricating method: An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid. The immersion system comprises: a... Agent: Oliff & Berridge, PLC

20090280437 - Projection exposure methods and systems: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P... Agent: Fish & Richardson PC

20090280438 - Method of forming pattern: A method of forming a pattern including: forming an underlayer film on a support using an underlayer film-forming material, forming a hard mask on the underlayer film using a silicon-based hard mask-forming material, forming a first resist film by applying a chemically amplified positive resist composition to the hard mask,... Agent: Knobbe Martens Olson & Bear LLP

20090280439 - Exposure apparatus, exposure method, and device manufacturing method: A light branching unit and a reflecting mirror are fixed to a barrel in a state where the distance between the members is constantly maintained. And, a laser beam from a light source is guided to the light branching unit via an optical fiber, separated to a measurement beam and... Agent: Oliff & Berridge, PLC

20090280440 - Surface treating agent for resist-pattern, and pattern-forming method using same: A surface treating agent for resist pattern, characterized by containing not only a chemical species having a functional group capable of chemical adsorption to resist pattern and a polymerizable group but also a solvent.... Agent: Sughrue Mion, PLLC

20090280441 - Exposure method, exposure device, and micro device manufacturing method: An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the... Agent: Miles & Stockbridge PC

20090274961 - Photosensitive composition for volume type hologram memory: To provide photosensitive composition for volume type hologram memory with superior photosensitivity and large differences in reflective index before and after photo-curing and with controllable curing shrinkage. The photosensitive composition for volume type hologram memory of the present invention comprises a photo-curable volume expansion compound and a photoinitiator. According to... Agent: Birch Stewart Kolasch & Birch

20090274962 - Pellicle and method for producing pellicle: A silicon single crystal film having a crystal plane as its principal plane, the crystal plane being inclined at 3 to 5° from any lattice plane belonging to {100} planes or {111} planes is used as a pellicle film. The silicon single crystal having such a crystal plane as its... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090274963 - Measurement apparatus, measurement method, exposure apparatus, and device manufacturing method: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090274964 - Measuring apparatus and exposure apparatus having the same: A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system... Agent: Fitzpatrick Cella Harper & Scinto

20090274965 - Metal mercaptoimidazoles containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer, and where the at least one charge transport layer and the photogenerating layer contain a metal mercaptoimidazole.... Agent: Patent Documentation Center Xerox Corporation

20090274966 - Phenazine containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein at least one of the photogenerating layer and charge transport layer contains a phenazine.... Agent: Patent Documentation Center Xerox Corporation

20090274969 - Phenothiazine containing photogenerating layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a phenothiazine.... Agent: Patent Documentation Center Xerox Corporation

20090274968 - Pyrazine containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the charge transport layer contains a pyrazine.... Agent: Patent Documentation Center Xerox Corporation

20090274967 - Quinoxaline containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein at least one of the photogenerating layer and charge transport layer contains a quinoxaline, including derivatives thereof.... Agent: Patent Documentation Center Xerox Corporation

20090274971 - Thiophthalimides containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a thiophthalimide containing photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090274970 - Carbazole containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the charge transport layer contains a carbazole.... Agent: Patent Documentation Center Xerox Corporation

20090274972 - Electrostatic-image-developing toner, method of producing the same, electrostatic image developer, image forming method and image forming apparatus: An electrostatic-image-developing toner includes a phosphonic acid based sequestering agent.... Agent: Oliff & Berridge, PLC

20090274973 - Liquid developer, process cartridge, and image forming apparatus: A liquid developer includes: an aqueous medium; and a magnetic toner which is substantially dispersed in the aqueous medium and includes a polymer compound and a magnetic powder, the amount of the magnetic powder being from about 0.2 volume % to about 5 volume % with respect to the magnetic... Agent: Fildes & Outland, P.C.

20090274977 - Compound and radiation-sensitive composition: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.... Agent: Ditthavong Mori & Steiner, P.C.

20090274976 - Negative resist composition for immersion exposure and method of forming resist pattern: A negative resist composition for immersion exposure including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C); and a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090274975 - Positive photosensitive composition and method of forming pattern therewith: wherein each of R1, R2 and R3 independently represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted cycloalkyl group, provided that R2 and R3 may be bonded with each other to thereby form a ring structure, and Ra represents a hydrogen atom, an alkyl group or a... Agent: Sughrue Mion, PLLC

20090274974 - Spin-on graded k silicon antireflective coating: Graded absorption silicon based antireflective coating compositions are described.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090274978 - Novel photoacid generator, resist composition, and patterning process: a

20090274979 - Device and method for removing overcoat of on-press developable lithographic plate: A device as well as method for removing the overcoat without developing an imagewise exposed lithographic printing plate is disclosed. The device comprises a structure for providing water or an aqueous solution and a transfer means for transporting said plate through said structure. The plate comprises a substrate, an ink... Agent: Gary Ganghui Teng

20090274980 - Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion: A method of forming fine patterns of a semiconductor device according to a double patterning process that uses acid diffusion is provided. In this method, a plurality of first mask patterns are formed on a substrate so as to be separated from one another. A capping film including an acid... Agent: Myers Bigel Sibley & Sajovec

20090274981 - Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions: Mask defects, such as crystal growth defects and the like, may be efficiently detected and estimated at an early stage of their development by generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects.... Agent: Williams, Morgan & Amerson

20090274982 - Method of making a semiconductor device using negative photoresist: Negative photoresist over an insulating layer is exposed to radiation according to a pattern for an opening in the insulating layer for filling conductive material. A post of the negative photoresist is left over the location where the opening in the insulating layer is to be formed. A developable hard... Agent: Freescale Semiconductor, Inc. Law Department

20090274984 - Carboxyl-containing lactone compound, polymer, resist composition, and patterning process: Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and... Agent: Birch Stewart Kolasch & Birch

20090274983 - Scanning exposure apparatus and method of manufacturing device: A scanning exposure apparatus (300) includes a first stage (325), a second stage (345), a projection optical system (330), a first measurement unit (20) arranged on the second stage (345), and a controller (350). A measurement mask (10) is arranged on the first stage (325). The first measurement unit (20)... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090263730 - Extreme ultra violet lithography mask and method for fabricating the same: A method for fabricating an extreme ultra violet lithography mask includes forming a reflective layer that reflects an extreme ultra violet light on a substrate; forming a capping layer that transmits the extreme ultra violet light on the reflective layer; and forming selectively pores in some region of the capping... Agent: Townsend And Townsend And Crew, LLP

20090263732 - Mask patterns including gel layers for semiconductor device fabrication: Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns... Agent: Myers Bigel Sibley & Sajovec

20090263731 - Method for fabricating fine pattern in photomask: A method for fabricating a fine pattern in a photomask includes forming a light shielding layer over a substrate; forming a first resist layer pattern over the light shielding layer to expose the light shielding layer with a first critical dimension; forming a groove by etching the portion of the... Agent: Marshall, Gerstein & Borun LLP

20090263733 - Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device: A photo mask includes an asymmetrical diffraction grating pattern in which diffraction efficiencies of plus primary diffracted light and minus primary diffracted light are different, the asymmetrical diffraction grating pattern including a shielding portion which shields light, a first transmitting portion which transmits light, and a second transmitting portion which... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090263729 - Templates for imprint lithography and methods of fabricating and using such templates: A template for use in imprint lithography is disclosed. The template includes at least two ultraviolet transparent materials bonded together by an ultraviolet transparent epoxy. The ultraviolet transparent epoxy is a polymeric, spin-on epoxy or a two-part, amine-cured epoxy having a viscosity at room temperature of from about 35,000 cps... Agent: Trask Britt, P.C./ Micron Technology

20090263734 - Lithographic apparatus and device manufacturing method: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090263735 - Exposure apparatus: An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a projection optical system configured to project the pattern of the original onto the substrate and designed to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090263736 - Exposure apparatus, exposure method, and device manufacturing method: A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that... Agent: Miles & Stockbridge PC

20090263737 - imaging member and methods of forming the same: The presently disclosed embodiments are directed to an imaging member having an outermost layer formulation that includes wax particles which creates a rough surface morphology for the layer and imparts increased scratch resistance, reduced torque, and improved cleaning performance to the layer. In embodiments, the outermost layer is an overcoat... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090263738 - Toner: An object of the present invention is to provide a spherical toner that has a sharp particle size distribution and a small particle diameter. This is a capsule-type toner that exhibits an excellent low-temperature fixability, while at the same time having a high offset resistance and excellent charging properties and... Agent: Fitzpatrick Cella Harper & Scinto

20090263739 - Resin-filled carrier for electrophotographic developer, and electrophotographic developer using the resin-filled carrier: A resin-filled carrier for an electrophotographic developer obtained by filling resin into voids of a porous ferrite core material, wherein the porous ferrite core material has a pore volume of 0.04 to 0.16 mL/g and a peak pore size of 0.9 to 2.0 μm, and an electrophotographic developer using this... Agent: Greenblum & Bernstein, P.L.C

20090263740 - Toner compositions: The present disclosure provides processes for reducing the particle size of latex resins and toners produced with such resins. In embodiments, a gel latex may be formed as a seed particle and then utilized to form latex resins and toner particles. In accordance with the present disclosure, one may be... Agent: Xerox Corporation (cdfs)

20090263742 - chemically amplified positive resist composition: e

20090263741 - Positive resist composition and method of forming resist pattern:

20090263743 - Resist polymer and resist composition: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090263744 - Ethylenically unsaturated compound, light sensitive composition, light sensitive planographic printing plate material and printing process employing the same: The present invention provides a novel ethylenically unsaturated compound which is highly sensitive to scanning exposure due to an ultraviolet to near-infrared laser and is cured to give good physical properties; a light sensitive composition providing good developability and high sensitivity and forming a high strength layer; a planographic printing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090263745 - Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition: In the formula (1), R1 is a tetravalent organic group; R2 is a divalent organic group; R1s may be the same or different from each other and R2s may be the same or different from each other in the repeating units; R3 and R4 respectively represent a monovalent organic group... Agent: Ladas & Parry LLP

20090263746 - Method of making lithographic printing plates with simple processing: A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution that has a pH of from about 2 to about 11 and contains an anionic surfactant. This single processing solution both develops the imaged precursor and provides... Agent: Andrew J. Anderson Patent Legal Staff

20090263747 - Three axis linear actuator: A mover (344) moving a stage (238) along a first axis, along a second axis and along a third axis includes a magnetic component (354), a conductor component (356), and a control system (324). The magnetic component (354) includes a plurality of magnets (354D) that are surrounded by a magnetic... Agent: Roeder & Broder LLP

20090263748 - Method of manufacturing wiring circuit board: A method of manufacturing a wiring circuit board includes: preparing an insulating layer; forming conductive thin films on the upper surface and the side end surface of the insulating layer; covering the conductive thin films formed on the upper surface and the side end surface of the insulating layer with... Agent: Akerman Senterfitt

20090263749 - Method of forming fine patterns of semiconductor device: A method of forming fine patterns of a semiconductor device, in which a plurality of conductive lines formed in a cell array region are integrally formed with contact pads for connecting the conductive lines to a peripheral circuit. In this method, a plurality of mold mask patterns, each including a... Agent: Myers Bigel Sibley & Sajovec

20090263750 - Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device: A foreign particle inspection apparatus includes a light projecting unit, a photo-receiving unit which receives the scattered light, and a. The photo-receiving unit is arranged such that its optical axis is tilted by a first angle with respect to a plane including the optical axis and the normal axis to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090263751 - Methods for double patterning photoresist: Embodiments of methods for double patterning photoresist are generally described herein. Other embodiments may be described and claimed.... Agent: Intel Corporation C/o Cpa Global