|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereofBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 09/25/2014 > 18 patent applications in 14 patent subcategories.
20140287349 - Thiosulfate polymer compositions and articles: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked... Agent:
20140287350 - Exposure tolerance estimation method and method for manufacturing semiconductor device: According to one embodiment, an exposure tolerance estimation method is disclosed. The method can include setting a plurality of regions along a first surface of a substrate. The method can form a plurality of patterns for estimation by performing exposure on each of the regions using at least three levels... Agent: Kabushiki Kaisha Toshiba
20140287351 - Electrophotographic photoreceptor and image forming apparatus: Disclosed are an electrophotographic photoreceptor which has high durability and high potential characteristics and can suppress the occurrence of stick-slip and turning up of a blade and the abrasion of the blade even when the blade is used as a cleaning unit. The surface layer contains barium sulfate composite fine... Agent: Konica Minolta, Inc.
20140287353 - Electrostatic charge image developing toner, electrostatic charge image developer, and toner cartridge: An electrostatic charge image developing toner includes an amorphous polyester resin and a crystalline polyester resin as a binder resin, and by differential scanning calorimetry, which undergoes processes of a first temperature rise, cooling at a rate of −10° C./min and a second temperature rise, an endothermic peak (1) derived... Agent: Fuji Xerox Co., Ltd.
20140287352 - Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, and image forming apparatus: An electrostatic charge image developing toner includes toner particles, and an external additive containing titanate compound particles having an iron content of from greater than 1200 ppm to 6000 ppm.... Agent: Fuji Xerox Co., Ltd.
20140287354 - Toner for electrostatic image development: Provided is a toner for electrostatic image development, having low-temperature fixability and long-term stable charge property and also having heat-resistant storage stability. The toner for electrostatic image development includes toner particles containing a binder resin. The binder resin has a domain-matrix structure in which a crystalline polyester resin is dispersed... Agent: Konica Minolta, Inc.
20140287355 - Core material for resin-filled ferrite carrier and ferrite carrier for electrophotographic developer, and electrophotographic developer using the ferrite carrier: Disclosed are a resin-filled ferrite carrier core material for an electrophotographic developer, including a porous ferrite particle having an average compression strength of 100 mN or more and a coefficient of variation of the compression strength of 50% or less, a ferrite carrier obtained by filling a resin in the... Agent:
20140287356 - Liquid developer, image forming apparatus, image forming method, liquid developer cartridge, and process cartridge: A liquid developer includes a toner that contains a binder resin and a release agent, and a carrier liquid that has a difference (ΔSP (tc)) in SP value from the binder resin of from 1.5 to 7.0, wherein the release agent is not eluted in the carrier liquid at a... Agent: Fuji Xerox Co., Ltd.
20140287357 - Liquid electrophotographic inks: The present disclosure provides for compositions, methods, and systems directed towards a liquid electrophotographic ink comprising a carrier fluid, a pigment, a first resin, and a stable cross-linkable resin that is solvated or swellable with the carrier fluid, where the stable cross-linkable resin does not undergo cross-linking until a temperature... Agent: Hewlett-packard Development Company, L.p.
20140287358 - Method for producing electrostatic latent image developing toner: In producing an electrostatic latent image developing toner, fine particle aggregates are formed by aggregating fine particles containing a binder resin and fine particles containing a release agent in an aqueous medium in the presence of an aggregating agent containing an alkali metal sulfate, and toner particles are formed by... Agent: Kyocera Document Solutions Inc.
20140287359 - Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method: In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a... Agent:
20140287360 - Resist composition and resist pattern forming method: A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140287361 - Resist composition and resist pattern forming method: A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140287362 - Resist composition and resist pattern forming method: A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140287363 - Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition: Disclosed are an actinic ray-sensitive or radiation-sensitive resin composition including (A) a compound capable of generating an acid by irradiation of actinic rays or radiation, and (B) a resin of which solubility in an alkali developer increases by being decomposed by the action of an acid, and, a resist film,... Agent:
20140287364 - Patterning method using thiosulfate polymer and metal nanoparticles: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be used in methods to form predetermined patterns of metal nanoparticles.... Agent:
20140287365 - Forming patterns using thiosulfate polymer compositions: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles and used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked... Agent:
20140287366 - Method of sequestering metals using thiosulfate polymers: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked... Agent:09/18/2014 > 56 patent applications in 23 patent subcategories.
20140272673 - Block copolymer-based mask structures for the growth of nanopatterned polymer brushes: Block copolymer-based mask structures for the growth of patterned polymer brushes via surface-initiated atom transfer radical polymerization (SI-ATRP) are provided. Also provided are methods of making the mask structures and methods of using the mask structures to grow patterned polymer brushes. The mask structures comprise a substrate having a surface,... Agent: Wisconsin Alumni Research Foundation
20140272687 - Extreme ultraviolet (euv) multilayer defect compensation and euv masks: Methods and structures for extreme ultraviolet (EUV) lithography are disclosed. A method includes determining a phase error correction for a defect in an EUV mask, determining an amplitude error correction for the EUV mask based on both the defect in the EUV mask and the phase error correction, and modifying... Agent: International Business Machines Corporation
20140272681 - Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272684 - Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor: A processing system includes: a vacuum chamber; a plurality of processing systems attached around the vacuum chamber; and a wafer handling system in the vacuum chamber for moving the wafer among the plurality of processing systems without exiting from a vacuum. A physical vapor deposition system for manufacturing an extreme... Agent: Applied Materials, Inc.
20140272679 - Extreme ultraviolet lithography process and mask: An extreme ultraviolet lithography (EUVL) process is disclosed. The process comprises receiving a mask. The mask includes a low thermal expansion material (LTEM) substrate, a reflective multilayer (ML) over one surface of the LTEM substrate, a first region having a phase-shifting layer over the reflective ML, and a second region... Agent:
20140272682 - Extreme ultraviolet lithography process and mask: The present disclosure is directed towards an extreme ultraviolet (EUV) mask. The EUV mask includes a low thermal expansion material (LTEM) substrate. The EUV mask has a first region and a second region. The EUV mask also includes a structure disposed in the first region. The structure has a multiple... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272686 - Mask for extreme ultraviolet lithography and method of fabricating same: A mask and method of fabricating same are disclosed. In an example, a mask includes a substrate, a reflective multilayer coating disposed over the substrate and a patterned absorption layer disposed over the reflective multilayer. The patterned absorption layer has a mask image region and a mask border region. The... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272674 - Mask structure: A mask structure, including a substrate; an absorber layer formed on the substrate; and a patterned reflection layer formed on the absorber layer. Optionally, the mask structure may further include a buffer layer, a conductive coating, or combinations thereof. The buffer layer may be formed between the absorber layer and... Agent: Nanya Technology Corp.
20140272685 - Method and device for writing photomasks with reduced mura errors: The problem of mura in large area photomasks is solved or at least reduced by setting up a writing system to write a pattern with high accuracy and with the optical axes essentially parallel to the movement axes of the stage, then writing photomasks in two passes with the substrate... Agent: Micronic Mydata Ab
20140272675 - Method and system for forming a diagonal pattern using charged particle beam lithography: A method and system for fracturing or mask data preparation is disclosed in which the central core portion of a diagonal pattern is fractured using overlapping variable shaped beam (VSB) shots, and an outer portion of the diagonal pattern is fractured using non-overlapping VSB shots. A transition region is interposed... Agent: D2s, Inc.
20140272680 - Method for mask fabrication and repair: A method for repairing a phase-defect region in a patterned mask for extreme ultraviolet lithography (EUVL) is disclosed. A patterned mask for EUVL is received. The patterned mask includes an absorptive region having an absorption layer over a defect-repairing-enhancement (DRE) layer, a reflective region having the DRE layer without the... Agent: Taiwan Simiconductor Manufacturing Company, Ltd.
20140272683 - Method of fabricating mask: A method for fabricating an extreme ultraviolet (EUV) mask includes providing a low thermal expansion material (LTEM) layer. A reflective multiple-layer (ML) is deposited over the LTEM layer. A flowable-photosensitive-absorption-layer (FPhAL) is spin coated over the reflective ML. The FPhAL is patterned by a lithography process to form a patterned... Agent:
20140272677 - Methods for fabricating euv masks and methods for fabricating integrated circuits using such euv masks: A method for fabricating integrated circuits includes fabricating an EUV mask by providing a photomask having a border region. A photoresist is formed over the photomask and has a border region overlying the border region of the photomask. The method exposes an inner portion and an outer portion of the... Agent: Globalfoundries, Inc.
20140272678 - Structure and method for reflective-type mask: The present disclosure provides an embodiment of a reflective mask that includes a substrate; a reflective multilayer formed on the substrate; a capping layer formed on the reflective multilayer and having a hardness greater than about 8; and an absorber layer formed on the capping layer and patterned according to... Agent:
20140272676 - Technique for repairing an euv photo-mask: During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a recessed area on a top surface of the reflective photo-mask, the modification to the reflective photo-mask is calculated. For example, the calculation may involve an inverse optical calculation... Agent: Dino Technology Acquisition LLC
20140272688 - Grayscale lithography of photo definable glass: A method for forming a three-dimensional microstructure includes providing a photosensitive glass substrate; exposing the photosensitive glass substrate to energy through a continuous tone, variable transmission photomask so as to form opaque portions in the photosensitive glass substrate, each of the opaque portions having one of a variety of depths... Agent: Photronics, Inc.
20140272692 - Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive... Agent: Fujifilm Corporation
20140272691 - Photoactive additive with functionalized benzophenone: Photoactive additives are disclosed. The additive includes a benzophenone having at least one substituent that comprises a divalent linker and a linking group, wherein the linking group is a carboxyl group, ester group, or acid halide group. The additive can be a polymer, an oligomer, or a compound. When added... Agent: Sabic Innovative PlasticsIPB.v.
20140272690 - Toner, two-component developer, toner set, toner container, printed matter, image forming apparatus, and image forming method: To provide a toner, containing: a noncrystalline resin; and a crystalline resin, wherein the crystalline resin has a weight average molecular weight of 100,000 to 180,000, wherein a temperature range of the toner, within which a loss tangent (tan δ) as measured by a dynamic viscoelasticity measurement is 6 or... Agent:
20140272694 - Toner for electrostatic image development, production method of the toner and image formation method: where R1 represents a hydrogen atom or substituted or unsubstituted C1-C2 alkyl group, A represents an oxygen atom or divalent linking group, B represents a hydrogen atom, substituted or unsubstituted C1-C4 alkyl group, aldehyde group, carboxy group or hydroxy group, and X represents an oxygen atom, nitrogen atom or sulfur... Agent: Konica Minolta, Inc.
20140272695 - Toner, development agent, and image forming apparatus: Toner contains a binder resin containing one or more kinds of crystalline resin and one or more kinds of non-crystalline resin. The non-crystalline resin located at the surface portion of the toner forms a shell structure of a continuous phase of the non-crystalline resin and the toner has an amount... Agent:
20140272693 - Toner, liquid developer, dry developer, developer cartridge, process cartridge, image forming apparatus, and image forming method: A toner includes a crystalline polyester resin having an unsaturated double bond, a thiol compound having a bi- or more-functional thiol group, and a photopolymerization initiator.... Agent: Fuji Xerox Co., Ltd.
20140272696 - Toner, development agent, and image forming method: Toner contains a mother toner particle that contains a crystalline resin; and wax; and a coloring agent, wherein the area of endothermic peak derived from the crystalline resin during a first temperature rising as measured by differential scanning calorimetry is at least 20 J/g, wherein the ratio of the area... Agent:
20140272697 - Toner composition having improved charge characteristics and additive attachment: A method of making a toner composition includes preparing raw toner particles, increasing a surface area of the raw toner particles by contacting the raw toner particles with a base to produce base-treated raw toner particles, and mixing the base-treated raw toner particles with at least one surface additive such... Agent: Xerox Corporation
20140272698 - Toner: Toner contains a binder resin containing two or more kinds of crystalline resins; and a coloring agent, wherein the two or more kinds of crystalline resins have at least two endothermic peak temperatures in a set of endothermic peak temperatures of the two or more kinds of crystalline resins as... Agent:
20140272699 - Toner binder and resin particle: Provided is a toner binder that is excellent in heat resistant storage properties and hot offset resistance properties and also affords excellent anti-blocking properties of paper when printing continuously. The present invention is directed to a toner binder comprising a crystalline resin (A), wherein the crystalline resin (A) comprises two... Agent: Sanyo Chemical Industries, Ltd.
20140272700 - Magnetic one-component developing toner: A magnetic one-component developing toner including a plurality of toner particles is provided. Each of the plurality of toner particles contains a binder resin including a polyester resin; and a magnetic powder. Water absorptions of the toner and the magnetic powder shown in an environment of 10° C. and 20%... Agent: Kyocera Document Solutions Inc.
20140272702 - Emulsion aggregation toners with improved particle size distribution: m
20140272701 - Toner particle for high speed single component development system: A toner composition includes toner particles containing a resin; an optional wax; and an optional colorant, wherein the resin is a three latex system including a latex core, a latex shell, and a latex gel; and a glass transition temperature Tg of the latex core is lower than a glass... Agent: Xerox Corporation
20140272703 - Triboelectric charge control of toner through monomer ratio of shell latex: Core/shell toner particles are made to have a desired triboelectric charge through control of the glass transition temperature (Tg) of the shell polymer and/or the ratio of styrene and at least one monomer for forming the polymer of the shell. The polymer is introduced onto core particles to form a... Agent: Xerox Corporation
20140272705 - Photoresist application: Devices and methods are provided where photoresist is applied on a substrate and at least some regions of the photoresist are dried prior to removing a substrate from a substrate support.... Agent: Infineon Technologies Ag
20140272708 - Photosensitive sacrificial polymer with low residue: Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to... Agent: Georgia Tech Research Corporation
20140272706 - Resist composition and method for forming pattern: A resist composition includes: a solvent; and a resin in the solvent, the resin being prepared by the hydrolysis and condensation of an alkoxy group-containing compound that contains an alkoxy group bound to a silicon atom or a germanium atom in the presence of an acid or an alkali, wherein... Agent: Fujitsu Limited
20140272707 - Sulfonium salt, polymer, resist composition, and patterning process: A sulfonium salt having formula (1a) is provided wherein R1 is H, F, CH3 or CF3, R1a to R1m are each independently H or a monovalent hydrocarbon group, L is a single bond or divalent hydrocarbon group, X is a divalent alkylene group optionally substituted with fluorine, and n is... Agent: Shin-etsu Chemical Co., Ltd.
20140272704 - Thickening phase for spin coating process: Among other things, one or more techniques and systems for performing a spin coating process associated with a wafer and for controlling thickness of a photoresist during the spin coating process are provided. In particular, a thickening phase is performed during the spin coating process in order to increase a... Agent:
20140272709 - Middle layer composition for trilayer patterning stack: Methods and materials for making a semiconductor device are described. The method includes forming a middle layer (ML) of a patterning stack (e.g., a tri-layer patterning stack such as a tri-layer resist) and forming a photoresist layer directly on the middle layer. The middle layer includes an additive component having... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272710 - Lithographic printing plate precursor and method of preparing the same: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the... Agent: Fujifilm Corporation
20140272712 - E-beam lithography with alignment gating: The present disclosure provides one embodiment of a reflective electron-beam (e-beam) lithography system. The reflective e-beam lithography system includes an e-beam source to generate an e-beam; a digital pattern generator (DPG) having a plurality of pixels that are dynamically and individually controllable to reflect the e-beam; a substrate stage designed... Agent:
20140272711 - Pre-patterned hard mask for ultrafast lithographic imaging: A method of fabricating a substrate including coating a first resist onto a hardmask, exposing regions of the first resist to electromagnetic radiation at a dose of 10.0 mJ/cm2 or greater and removing a portion of said the and forming guiding features. The method also includes etching the hardmask to... Agent:
20140272713 - Method of making a lithographic printing plate: A method of making a lithographic printing plate including the steps of a) image-wise exposing a lithographic printing plate precursor including a light or heat sensitive coating on a support having a hydrophilic surface or which is provided with a hydrophilic layer, and b) processing the precursor consecutively with a... Agent: Agfa Graphics Nv
20140272714 - Double patterning strategy for contact hole and trench in photolithography: A method of lithography patterning includes forming a first resist pattern on a substrate, wherein the first resist pattern including a plurality of openings. A second resist pattern is formed on the substrate and within the plurality of openings of the first resist pattern, wherein the second resist pattern includes... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272715 - Lithography process on high topology features: A method includes forming a first photo resist layer over a base structure and a target feature over the base structure, performing an un-patterned exposure on the first photo resist layer, and developing the first photo resist layer. After the step of developing, a corner portion of the first photo... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272716 - Photoresist system and method: A system and method for photoresists is provided. In an embodiment the photoresist is exposed in a photoresist track system and developed in an offline developing system. After the photoresist is exposed, the photoresist may be idled for a time period prior to being developed in the offline developing system.... Agent:
20140272717 - System and method for lithography exposure with correction of overlay shift induced by mask heating: A method of exposing a wafer substrate includes receiving an integrated circuit (IC) design layout defining a pattern; determining a temperature profile of a mask based on the IC design layout, the pattern being formed on the mask; calculating a pre-corrected overlay shift for the mask based on the calculated... Agent:
20140272721 - Extreme ultraviolet lithography process and mask: An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned mask along a first direction. The patterned mask includes a substrate including a first region and a second region, a multilayer mirror above... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272718 - Lithography process: A method for being used in a lithography process is provided. The method includes receiving a first mask, a second mask and a substrate with a set of baseline registration marks. A first set of registration marks is formed on the substrate using the first mask and a first exposure... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272720 - Multiple exposures in extreme ultraviolet lithography: An extreme ultraviolet lithography method is disclosed. In an example, the EUVL method comprises providing at least two mask areas having a same pattern, forming a resist layer over a substrate, determining an optimized exposure dose based on an exposure dose for a pre-specified pattern on one of the at... Agent:
20140272719 - Surface modification, functionalization and integration of microfluidics and biosensor to form a biochip: The present disclosure provides methods of fabricating a biochip. The biochip includes a fluidic part, having through-substrate holes as inlets and outlets, and a sensing part bonded together using a bonding material. One or both of the parts has microfluidic channel patterns and one or more patterned surface modification layers... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272722 - Composition for forming resist underlayer film, resist underlayer film and resist underlayer film-forming method, and pattern-forming method: A composition for forming a resist underlayer film includes a polymer having a structural unit represented by a formula (1). Ar1, Ar2, Ar3 and Ar4 each independently represent a divalent aromatic hydrocarbon group or a divalent heteroaromatic group. A part or all of hydrogen atoms included in the divalent aromatic... Agent: Jsr Corporation
20140272723 - Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents: A method of forming a layered substrate comprising a self-assembled material is provided. The method includes forming a first layer of material on a substrate, forming a layer of a radiation sensitive material on the first layer of material, imaging the layer of the radiation sensitive material with patterned light,... Agent: Tokyo Electron Limited
20140272727 - Method of producing polymeric compound, resist composition and method of forming resist pattern: A method of producing a copolymer, including copolymerizing a monomer (am0) containing a partial structure represented by formula (am0-1) shown below, a monomer (am1) containing an acid decomposable group which exhibits increased polarity by the action of acid and a monomer (am5) containing an —SO2— containing cyclic group in the... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140272725 - Method of water repellent treatment for pattern surface: Provided is a method of water repellent treatment for a pattern surface, the method including the steps of agitatingly mixing a perfluoropolyether-group-containing silane water repellent, an organic acid, a fluorine-containing solvent capable of dissolving the perfluoropolyether-group-containing silane water repellent and the organic acid, and water to hydrolyze the perfluoropolyether-group-containing silane... Agent: Canon Kabushiki Kaisha
20140272726 - Photo resist baking in lithography process: A method includes coating a photo resist on a wafer in a first production tool, and performing a pre-exposure baking on the photo resist in a second production tool separate from the first production tool. After the pre-exposure baking, the photo resist is exposed using a lithography mask. After the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140272724 - Photoresist system and method: A system and method for photoresists is provided. In an embodiment a photoresist is developed. Once developed, the photoresist is slimmed using either a direct slimming technique or an indirect slimming technique. In a direct slimming technique the slimming agent is either an alkaline solution or a polar solvent. In... Agent:
20140272728 - Techniques for processing photoresist features using ions: A method of treating a substrate includes directing first ions over a first range of angles to one or more photoresist features disposed on the substrate, the first ions effective to generate an altered layer in the one or more photoresist features, the altered surface layer encapsulating an inner portion... Agent: Varian Semiconductor Equipment Associates, Inc.09/11/2014 > 62 patent applications in 15 patent subcategories.
20140255824 - Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations: The present invention relates to photopolymer formulations comprising: matrix polymers (A), obtainable by reacting at least one polyisocyanate component (a) and one isocyanate-reactive component (b); a writing monomer (B); a photoinitiator (C) a catalyst (D); and a sulphur-containing chain transfer reagent (E). A holographic medium that contains a photopolymer formulation... Agent: Bayer Intellectual Property Gmbh
20140255830 - Apparatus and methods for fabricating a photomask substrate for euv applications: An apparatus and methods utilized a DC or AC power to supply through a conductive substrate support pedestal to a conductive photomask substrate during a photomask substrate manufacturing process for EUV or other advanced lithography applications are provided. In one embodiment, an apparatus for processing a photomask includes a substrate... Agent: Applied Materials, Inc.
20140255826 - Endpoint detection for photolithography mask repair: A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined from the back-scattered electron signals. A stop point is calculated from the endpoint. The step of scanning is stopped when the calculated stop... Agent:
20140255828 - Euvl process structure fabrication methods: Methods are provided for fabricating a process structure, such as a mask or mask blank. The methods include, for instance: providing a silicon substrate; forming a multi-layer, extreme ultra-violet lithography (EUVL) structure over the silicon substrate; subsequent to forming the multi-layer EUVL structure over the crystalline substrate, reducing a thickness... Agent: Sematech, Inc.
20140255832 - Hardcoat compositions: A hardcoat composition comprises (a) an epoxy silane compound, (b) a reactive silicone additive and (c) photo-acid generator. The reactive silicone additive has one of the following general structures:formula (I) or X—SiR1R2—(O—SiR1R2)n-X (Formula 2) wherein: R1, R2, and R3 are independently a C1-C6 alkyl group or aromatic group with or... Agent:
20140255825 - Mask blank for scattering effect reduction: Some embodiments relate a method of forming a photomask for a deep ultraviolet photolithography process (e.g., having an exposing radiation with a wavelength of 193 nm). The method provides a mask blank for a deep ultraviolet photolithography process. The mask blank has a transparent substrate, an amorphous isolation layer located... Agent: Taiwan Semiconductor Manufacturing Co. Ltd.
20140255829 - Mask for dual tone development: A mask for dual tone development including a opening pattern region and a partial transparent pattern is provided. The opening pattern region includes a plurality of transparent patterns and a plurality of opaque patterns, and a plurality of opening patterns is defined in a photoresist for dual tone development by... Agent: Powerchip Technology Corporation
20140255831 - Method and apparatus for protecting a substrate during processing by a particle beam: The invention refers to a method and apparatus for protecting a substrate during a processing by at least one particle beam. The method comprises the following steps: (a) applying a locally restrict limited protection layer on the substrate; (b) etching the substrate and/or a layer arranged on the substrate by... Agent:
20140255827 - Pellicles with reduced particulates: Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may... Agent: Micro Lithography, Inc.
20140255833 - Chemically amplified positive resist composition and pattern forming process: A chemically amplified positive resist composition comprising (A) 100 pbw of a base resin which is normally alkali insoluble or substantially insoluble, (B) 0.05-20 pbw of a photoacid generator, (C) 0.1-50 pbw of a thermal crosslinker, and (D) 50-5,000 pbw of an organic solvent is coated to form a thick... Agent: Shin-etsu Chemical Co., Ltd.
20140255834 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes an electroconductive substrate, a photosensitive layer provided on the electroconductive substrate, and an outermost surface layer, wherein the outermost surface layer is a layer constituted with a cured product of a composition including at least one of non-charge transporting compounds represented by formulae (I) and (II),... Agent:
20140255835 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes an electroconductive substrate; a photosensitive layer that is provided on the electroconductive substrate; and an outermost surface layer, wherein the outermost surface layer is a layer made of a cured product of a composition that contains position isomer mixture of at least one kind among non-charge... Agent: Fuji Xerox Co., Ltd.
20140255836 - Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge each including the electrophotographic photosensitive member: A surface layer of an electrophotographic photosensitive member contains a polymerized product obtained by a polymerization reaction of a hole transporting compound having a first reactive functional group and a compound having a second reactive functional group reactable with the first reactive functional group, and a structure other than the... Agent: Canon Kabushiki Kaisha
20140255837 - Electrophotographic photosensitive member, and electrophotographic apparatus and process cartridge each including the electrophotographic photosensitive member: Provided is an electrophotographic photosensitive member excellent in suppression of image deletion and electric potential variation. The surface layer of the electrophotographic photosensitive member comprises a hole transporting substance. The hole transporting substance is one of a compound consisting of a carbon atom and a hydrogen atom, or a compound... Agent: Canon Kabushiki Kaisha
20140255838 - Process cartridge and electrophotographic apparatus: A process cartridge that can suppress production of a banding image attributed to contact rotation of an electrophotographic photosensitive member and a charging member and output a high-quality image is provided. The charging member includes an electro-conductive substrate and an electroconductive resin layer, the resin layer contains a binder, a... Agent: Canon Kabushiki Kaisha
20140255840 - Toner for electrophotography, and image forming method, image forming apparatus and process cartridge using the toner: A toner is provided. The toner includes a crystalline polyester resin (A); and a non-crystalline resin (B). The toner has a viscoelastic property such that the loss tangent (tan δ) defined as a ratio (G″/G′) of loss elastic modulus (G″) to storage elastic modulus (G′) has at least an inflection... Agent:
20140255841 - Toner compositions: A toner having charge control agents which impart excellent triboelectric charging characteristics. In embodiments, the toner particles are made by a process in which charge control agent is added and adhered to the particle surface through washing steps and is maintained through the drying steps. The process of the present... Agent: Xerox Corporation
20140255842 - Phase immersion emulsification process and apparatus: A method for preparing a latex or dispersion, the method comprising contacting at least one resin with an organic solvent to form a resin mixture; neutralizing the resin mixture with a neutralizing agent; and subjecting the resin mixture flow to steam flow in a continuous manner to form a dispersion.... Agent: Xerox Corporation
20140255843 - Patterning process and resist composition: A negative pattern is formed by coating a resist composition comprising (A) a polymer having an acid labile group, adapted to change its polarity under the action of acid, (B) a photoacid generator, and (C) an organic solvent onto a substrate, baking, exposing the resist film to high-energy radiation, PEB,... Agent: Shin-etsu Chemical Co., Ltd.
20140255844 - Substrate treatment method, non-transitory computer storage medium and substrate treatment system: In the present invention, photolithography processing is performed on a substrate to form a resist pattern over the substrate, and a treatment agent is caused to enter a side surface of the resist pattern and metal is caused to infiltrate the side surface of the resist pattern via the treatment... Agent: Tokyo Electron Limited
20140255845 - Photosensitive resin composition and uses thereof: The invention relates to a photosensitive resin composition that has good heat resistance and good humidity resistance. The invention also provides a method for forming a thin film on a substrate, a thin film on a substrate and an apparatus.... Agent: Chi Mei Corporation
20140255846 - Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition: A polymerizable composition contains (A) a polymerization initiator that is an acetophenone-based compound or an acylphosphine oxide-based compound, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, and (D) an alkali-soluble binder.... Agent: Fujifilm Corporation
20140255847 - Resist overlayer film forming composition for lithography: p
20140255849 - Methanofullerenes: The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative... Agent:
20140255850 - Photo-resist with floating acid: A method for fabricating a semiconductor product includes applying a photo-resist layer to a substrate, the photo-resist layer including a higher acid concentration at an upper portion of the photo-resist layer than at a lower portion of the photo-resist layer. The method also includes exposing the photo-resist layer to a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140255851 - Photoresist defect reduction system and method: A system and method for reducing defects in photoresist processing is provided. An embodiment comprises cleaning the photoresist after development using an alkaline environment. The alkaline environment may comprise a neutral solvent and an alkaline developer. The alkaline environment will modify the attraction between residue leftover from development and a... Agent:
20140255854 - Pattern-forming method: A pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The resist film is exposed. The exposed resist film is developed using a developer having an organic solvent content of 80 mass % or more. The photoresist composition includes a first polymer, a second polymer,... Agent: Jsr Corporation
20140255853 - Resist composition, method of forming resist pattern, polymeric compound and compound: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140255852 - Substrate treatment method, non-transitory computer storage medium and substrate treatment system: The present invention includes: a resist film forming step of forming a resist film over a substrate; an exposure step of exposing the resist film into a predetermined pattern; a metal treatment step of causing a treatment agent to enter an exposed portion exposed in the exposure step of the... Agent: Tokyo Electron Limited09/04/2014 > 12 patent applications in 9 patent subcategories.
20140248555 - Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof: An extreme ultraviolet photomask comprises a reflective layer over a substrate, a capping layer over the reflective layer, a hard mask layer over the capping layer, and an absorber. The absorber is in the hard mask layer, the capping layer and the reflective layer.... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140248554 - Sub-resolution assist devices and methods: Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive... Agent: Micron Technology, Inc.
20140248556 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device: A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a... Agent: Fujifilm Corporation
20140248557 - Carrier for two-component developer, two-component developer using the carrier, and image forming method and process cartridge using the two-component developer: A carrier is provided. The carrier includes a particulate magnetic core, and a cover layer located on the surface of the particulate magnetic core and including a resin and a filler. When determined from observation of cross-section of the carrier, the shape factor SF2 of the carrier is from 120... Agent:
20140248559 - Acoustic method to prepare polyester resin emulsions: The disclosure relates to a process for making a latex emulsion suitable for use in a toner comprising at least one amorphous polyester resin and a solvent to form a resin mixture, including that the process is carried out at room temperature using acoustic mixing.... Agent: Xerox Corporation
20140248558 - Preparing colorant dispersions using acoustic mixing: The present disclosure provides processes for making inorganic or organic colorant dispersions using an acoustic mixer, where such dispersion may be used to make toner. Such processes apply low frequency, high intensity acoustic energy and a consistent shear field throughout an entire mixing vessel and provide uniform dispersion of colorants... Agent: Xerox Corporation
20140248560 - Process for preparing a particulate solid and a particulate solid: A process for preparing a particulate solid is described, which comprises the steps of a) aggregating a dispersion comprising the particles i) and ii) and a liquid medium, wherein i) is 25 to 50 parts by weight of non-polymeric particles having an average particle size of from 1 to 10... Agent: Fujifilm Imaging Colorants Limited
20140248561 - Resist composition, method for forming resist pattern, polyphenolic compound for in the composition, and alcoholic compound that can be derived therefrom: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.... Agent: Mitsubishi Gas Chemical Company, Inc.
20140248563 - Composition, resist pattern-forming method, compound, method for production of compound, and polymer: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or... Agent: Jsr Corporation
20140248564 - Aromatic polycarbonate composition: The present invention relates to a polymer composition comprising the following components: a) 76,6-99,9 mass % of aromatic polycarbonate, b) 0,5-20 mass % of laser direct structuring additive, c) 0-2,4 mass % of rubber like polymer, and d) 0,01-1 mass % of acid and/or acid salt wherein the mass %... Agent: Mitsubishi Chemical Europe Gmbh
20140248565 - Method of patterning a device: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern... Agent:Previous industry: Chemistry: electrical current producing apparatus, product, and process
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