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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
08/07/2014 > 18 patent applications in 11 patent subcategories.

20140220480 - Mask repair with passivation: A method for repairing masks includes performing a first repair process to a mask by etching unwanted opaque regions from the mask, applying a plasma passivation process to the mask, and performing a second repair process to the mask by etching away additional unwanted opaque regions.... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140220482 - Method for forming patterns: A method for forming patterns includes the following steps. A first layout including a first target pattern and a first unprintable dummy pattern is provided. A second layout including a second target pattern and a second printable dummy pattern are provided, wherein at least part of the second printable dummy... Agent: United Microelectronics Corp.

20140220481 - Photomasks and methods of fabricating semiconductor devices using the same: The present inventive concept provides a photomask including a substrate, patterns disposed on the substrate, and an anti-contamination layer disposed on the patterns. The anti-contamination layer includes at least one graphene layer. Methods of fabricating a semiconductor device including the same are also provided.... Agent: Samsung Electronics Co., Ltd.

20140220483 - Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part: A photo-curable resin composition comprising a silicone-containing polymer, a photobase generator, a solvent, and optionally an epoxy resin crosslinker forms a coating which serves as a protective film for the protection of electric/electronic parts.... Agent:

20140220484 - Electrophotographic photoreceptor and copying machine using same, and dope for forming photosensitive layer of same: In an electrophotographic photoreceptor having a photosensitive layer on a conductive support, a binder resin that constitutes the photosensitive layer includes a polymer containing a skeleton derived from dehydroabietic acid in the main chain. An electrophotographic photoreceptor which accelerates conversion to natural materials from the viewpoint of manufactured product quality... Agent: Fujifilm Corporation

20140220485 - Toner, developer and image forming apparatus: To provide a toner, which contains silica particles containing first silica particles, and second silica particles, wherein the toner is a toner produced by depositing the silica particles on surfaces of base particles, the first silica particles have an average primary particle diameter of 75 nm to 250 nm, the... Agent:

20140220486 - Toner: Provided is a toner containing toner particles, each of which includes a binder resin containing a polyester as a main component, a colorant, and a wax, in which the binder resin includes a block polymer in which a segment capable of forming a crystalline structure and a segment incapable of... Agent: Canon Kabushiki Kaisha

20140220487 - Magnetic carrier and two-component developer: A magnetic carrier is provided which can suppress a decrease in glossiness even in a long term use for POD which requires high glossiness. A magnetic carrier includes a filled core particle in which a silicone resin is filled in pores of a porous magnetic core particle and a vinyl... Agent: Canon Kabushiki Kaisha

20140220488 - Image forming method: Provided is an image forming method, in which excellent cleaning properties are obtained for a long period of time even when the process is employed to an image forming apparatus with a charging roller for charging a photoreceptor, and a favorable image can be formed while inhibiting occurrence of a... Agent: Konica Minolta, Inc.

20140220489 - Method for processing sample and sample processing apparatus: Long-period roughness in patterned resist is reduced in a manufacturing process of a sample such as a semiconductor device. A method for processing a sample to be processed, with patterned resist, in a sample processing apparatus includes: disposing the sample to be processed, with the patterned resist on the stage... Agent: Hitachi High-technologies Corporation

20140220490 - Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation: Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R2 and R3 each independently represents... Agent: Central Glass Company, Limited

20140220491 - Photoactive compound and photosensitive resin composition comprising the same: The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure,... Agent: Lg Chem, Ltd.

20140220492 - Resist composition, polymeric compound, compound and method of forming resist pattern: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R1 and R2 each independently represents a group represented... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140220493 - Self aligned patterning with multiple resist layers: A method for using self aligned multiple patterning with multiple resist layers includes forming a first patterned resist layer onto a substrate, forming a spacer layer on top of the first patterned resist layer such that spacer forms on side walls of features of the first resist layer, and forming... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140220496 - Method of forming photoresist structure: A method for forming a photoresist structure is provided The method includes the step of forming a photoresist layer on a substrate, the step of exposing a portion of the photoresist layer to form an exposed portion of the photoresist layer, and the step of removing the photoresist layer except... Agent: National Taiwan University

20140220497 - Methods for manufacturing resin structure and micro-structure: A resin structure for the formation of a micro-structure is manufactured by (A) applying a composition comprising a polymer, a photoacid generator, an epoxy compound, and an organic solvent onto a substrate, (B) heating the composition to form a sacrificial film, (C) exposing imagewise the film to first high-energy radiation,... Agent: Shin-etsu Chemical Co., Ltd.

20140220494 - Pattern generator for a lithography system: A pattern generator includes a minor array plate having a mirror, at least one electrode plate disposed over the minor array plate, a lens let disposed over the minor, and at least one insulator layer sandwiched between the mirror array plate and the electrode plate. The electrode plate includes a... Agent:

20140220495 - Resist performance for the negative tone develop organic development process: A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising... Agent: International Business Machines Corporation

  
07/31/2014 > 18 patent applications in 11 patent subcategories.
  
07/24/2014 > 23 patent applications in 14 patent subcategories.

20140205935 - Adjustable photo-mask: An adjustable photo-mask for providing variable properties is proposed. The adjustable photo-mask includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality... Agent: National Kaohsiung University Of Applied Sciences

20140205938 - Euv mask and method for forming the same: An extreme ultraviolet (EUV) mask can be used in lithography, such as is used in the fabrication of a semiconductor wafer. The EUV mask includes a low thermal expansion material (LTEM) substrate and a reflective multilayer (ML) disposed thereon. A capping layer is disposed on the reflective ML and a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140205936 - Mask blank for reflection-type exposure, and mask for reflection-type exposure: A reflective exposure mask blank and a reflective exposure mask are provided, and the mask enables accurate exposure and transcription without having light being reflected from areas other than a circuit pattern area. The reflective mask blank has, on a substrate (11), a multilayer reflective film (12), a protective film... Agent: Toppan Printing Co., Ltd.

20140205937 - Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: A mask blank is used for manufacturing a binary mask adapted to be applied with ArF excimer laser exposure light and has a light-shielding film for forming a transfer pattern on a transparent substrate. The light-shielding film has a laminated structure of a lower layer and an upper layer and... Agent: Hoya Corporation

20140205934 - Single reticle approach for multiple patterning technology: A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a second portion with a second layout pattern for multiple patterning the layer of the integrated circuit die.... Agent: Xilinx, Inc.

20140205939 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes a conductive substrate, and a photosensitive layer provided on the conductive substrate, and an outermost surface layer of the electrophotographic photoreceptor is constituted with a polymerized product or crosslinked product of a composition including at least one selected from reactive compounds represented by the formulae (I)... Agent: Fuji Xerox Co., Ltd.

20140205940 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: In an electrophotographic photosensitive member including a support, and a photosensitive layer formed on the support, a surface layer of the electrophotographic photosensitive member includes specific resin (α), resin (β) and compound (γ).... Agent: Canon Kabushiki Kaisha

20140205941 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The charge transporting layer as the surface layer of an electrophotographic photosensitive member includes a charge transporting substances represented by any one of formulae (1) to (5), a specific compound, and a specific resin (binder resin). The specific compound is hexanol, heptanol, cyclohexanol, benzyl alcohol, ethylene glycol, 1,4-butanediol, 1,5-pentanediol, diethylene... Agent: Canon Kabushiki Kaisha

20140205943 - Toner: Since a charge amount of a toner and a charge rise characteristic thereof are liable to be influenced by the change in temperature and humidity condition, the change in image density occurs in printing, and in particular, in high temperature and high humidity environment, inconveniences, such as image fogging, occur... Agent: Canon Kabushiki Kaisha

20140205942 - Toner additives: The disclosure relates generally to toner additives, and in particular, toner additives that provide desired higher and stable toner charge. The toner additives comprise silica nanotubes in combination with or in place of the commonly used silica or titania particulate additives.... Agent: Xerox Corporation

20140205944 - Toner for developing electrostatic images: e

20140205945 - Charge controlling agent and toner using same: To provide a charge controlling agent for electrophotography, which presents sufficient triboelectric chargeability to a toner, is useful particularly for a color toner and further for a polymerized toner, increases a charge rising rate, has a high electric charge amount, is excellent in charging characteristics, stability over time and environmental... Agent: Hodogaya Chemical Co., Ltd.

20140205946 - Method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: Provided is a method of producing an electrophotographic photosensitive member including a support and a surface layer formed on the support, the method including the steps of forming a coat of a surface-layer coating solution, and drying the coat to form the surface layer, in which the surface-layer coating solution... Agent: Canon Kabushiki Kaisha

20140205947 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by... Agent: Fujifilm Corporation

20140205949 - Photocurable resin composition and novel siloxane compound: Disclosed is a photocurable resin composition that is alkali-developable, provides a cured product having excellent adhesiveness and scratch resistance, and is useful as a hard-coat material for an image display surface of an image display device. Also disclosed is a novel siloxane compound that is useful as a resin component... Agent: Adeka Corporation

20140205948 - Self-imageable layer forming polymer and compositions thereof: Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k,... Agent: Promerus, LLC

20140205950 - Coating composition for duv filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by... Agent: Samsung Electronics Co., Ltd.

20140205951 - Thermal crosslinking accelerator, polysiloxane-containing resist underlayer film forming composition containing same, and patterning process using same: wherein R11, R12, R13, and R14 each represents a hydrogen atom, a halogen atom, a linear, a branched, a cyclic alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms, wherein... Agent: Shin-etsu Chemical Co., Ltd.

20140205953 - Method for forming semiconductor device: A method for forming a semiconductor device comprises the following steps: first, a substrate is provided, a first photo-etching process is carried out with a first photomask to form at least one device structure and a plurality of compensation structures, wherein the first photomask comprises at least one device pattern... Agent: United Microelectronics Corp.

20140205952 - Methods of forming patterns for semiconductor device structures: Methods of forming a pattern in a semiconductor device structure include deprotecting an outer portion of a first photosensitive resist material, forming a second photosensitive resist material, exposing portions of the first and second photosensitive resist materials to radiation, and removing the deprotected outer portion of the first photosensitive resist... Agent: Micron Technology, Inc.

20140205954 - Method for forming patterns of semiconductor device by using mixed assist feature system: A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes,... Agent: Sk Hynix Inc.

20140205955 - Method of forming tight-pitched pattern: A method of forming a tight-pitched pattern. A target pattern including a plurality of first stripe patterns is provided. Each of the first stripe patterns has a first width and a first length. A photomask includes a plurality of second stripe patterns corresponding to the first stripe patterns is provided.... Agent: Nanya Technology Corp.

20140205956 - Method for forming resist pattern: A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition... Agent: Tokyo Ohka Kogyo Co., Ltd

  
07/17/2014 > 24 patent applications in 20 patent subcategories.

20140199615 - Method to print contact holes at high resolution: A two-dimensional dense array of contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque lines. The openings in the quadrupole illumination lens are aligned along the perpendicular directions of the opaque lines.... Agent: International Business Machines Corporation

20140199616 - Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene metal complex compound or tautomer thereof: A colored composition including a dipyrromethene metal complex compound represented by the following formula (I) or a tautomer thereof:... Agent: Fujifilm Corporation

20140199617 - Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent... Agent: Fujifilm Corporation

20140199618 - Methods of measuring overlay errors in area-imaging e-beam lithography: One embodiment relates to a method of measuring overlay errors for a programmable pattern, area-imaging electron beam lithography apparatus. Patterned cells of an overlay measurement target array may be printed in swaths such that they are superposed on patterned cells of a first (base) array. In addition, the overlay array... Agent: Kla-tencor Corporation

20140199619 - Electrophotographic photoreceptor, method for manufacturing same, and electrophotographic apparatus using same: A layered, positively-charged electrophotographic photoreceptor, a method for manufacturing the photoreceptor and an electrophotographic apparatus using the photoreceptor are disclosed. The layered, positively-charged electrophotographic photoreceptor includes a conductive support on which is provided a sequential stack composed of a charge transport layer containing at least a first hole transport material... Agent: Fuji Electric Co., Ltd.

20140199620 - Electrophotographic photoconductor, image forming apparatus, and process cartridge: An electrophotographic photoconductor, including: an electroconductive substrate; and at least a photoconductive layer and a surface layer in this order over the electroconductive substrate, wherein the surface layer includes a resin having no charge transport properties, and first inorganic fine particles, and wherein the first inorganic fine particles are inorganic... Agent:

20140199621 - Developer, method of manufacturing the same and toner cartridge: A toner or developer is provided having toner particles which exhibit a higher glass transition temperature on their surface than the interior thereof. In one aspect, the toner particles contain a crystalline polyester resin, an amorphous polyester resin and a coloring material, in which the core of the toner particles... Agent: Kabushiki Kaisha Toshiba

20140199622 - Erasable toner: According to one embodiment, an erasable toner of the present embodiment includes a binder resin, an electron donating coloring agent, an electron accepting developer, and a discoloring temperature regulating agent, in which when measuring for the first time by differential thermal scanning calorimetry, an endothermic peak temperature Tg of the... Agent: Toshiba Tec Kabushiki Kaisha

20140199623 - Tuning toner gloss with bio-based stabilizers: The disclosure describes a process to produce toner with tunable gloss levels comprising a stabilizer to freeze particle growth following aggregation, where the stabilizer does not chelate metal ions.... Agent: Xerox Corporation

20140199624 - Method of preparing environment-friendly toner: A method of preparing a toner. A toner having a low residual VOC content, a narrow particle size distribution, excellent fixing properties at low temperature, and high image quality may be prepared using the method by which a polyester resin dispersion is prepared by adding ingredients to a single reactor... Agent:

20140199625 - Preparing amorphous polyester resin emulsions: A process for making a latex emulsion including contacting at least one amorphous polyester resin with at least two organic solvents to form a resin mixture, adding a neutralizing agent, and deionized water to the resin mixture, removing the solvent from the formed latex, and separating the solvent from water.... Agent: Xerox Corporation

20140199626 - Method of manufacturing erasable toner: According to one embodiment, a method of manufacturing an erasable toner includes washing toner particles including therein a coloring material that is erasable by heating and a binder resin to obtain a toner cake having the amount of water of 20% by weight to 60% by weight, and drying the... Agent: Toshiba Tec Kabushiki Kaisha

20140199627 - Method and apparatus for concentrating an ink for an electrostatic printing process: c

20140199628 - Lithographic material stack including a metal-compound hard mask: A lithographic material stack including a metal-compound hard mask layer is provided. The lithographic material stack includes a lower organic planarizing layer (OPL), a dielectric hard mask layer, and the metal-compound hard mask layer, an upper OPL, an optional anti-reflective coating (ARC) layer, and a photoresist layer. The metal-compound hard... Agent: International Business Machines Corporation

20140199631 - Monomer, polymer, resist composition, and patterning process: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic... Agent: Shin-etsu Chemical Co., Ltd.

20140199630 - Sulfonium salt, resist composition and patterning process: wherein R represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms at least one or more of the hydrogen atoms of which are substituted by a fluorine atom, R0 represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1... Agent: Shin-etsu Chemical Co., Ltd.

20140199629 - Sulfonium salt, resist composition, and patterning process: e

20140199632 - Patterning process, resist composition, polymer, and monomer: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring... Agent: Shin-etsu Chemical Co., Ltd.

20140199633 - Process for producing liquid ejection head: A process for producing a liquid ejection head by providing, in one chip, a liquid ejection head having a portion for ejection in which an ejection orifice array is arranged and a side portion having no ejection orifice array, these portions being provided with a member of a photosensitive material,... Agent: Canon Kabushiki Kaisha

20140199634 - Method of measuring a characteristic: During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used... Agent: Asml Netherlands B.v.

20140199635 - Processing apparatus and device manufacturing method: A processing apparatus for processing a substrate chucked by a chuck installed on a stage includes: a conveying unit configured to convey the substrate to the chuck; a robot configured to selectively convey, to the stage, a pressing member capable of pressing the substrate to reduce a warp of the... Agent: Canon Kabushiki Kaisha

20140199636 - Sub-diffraction-limited patterning and imaging via multi-step photoswitching: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength... Agent:

20140199637 - Pattern forming process: A pattern is formed by coating a first chemically amplified positive resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn soluble in alkaline developer upon elimination of the acid labile group, a photoacid generator, and a first organic solvent, onto a... Agent: Shin-etsu Chemical Co., Ltd.

20140199638 - Negative developing method and negative developing apparatus: After a developing step, a substrate is spun at high speeds without supplying a cleaning liquid to a surface of the substrate. This causes a large centrifugal force to act on a developer on a resist film. Consequently, the developer can be removed rapidly from the surface of the substrate.... Agent: Sokudo Co., Ltd.

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