Radiation imagery chemistry: process, composition, or product thereof inventions

20080107972 - Halftone mask and method for making pattern substrate using the halftone mask: A halftone mask includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107970 - Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect: With respect to an exposure mask having a transparent substrate 1 formed thereon with a mask pattern 2 which becomes a transfer pattern, correction is performed by removing, by the use of a needle-shaped member 4, a peripheral portion of a recessed defect 3 formed on a surface 1a of... Agent: Sughrue Mion, Pllc

20080107971 - Silylphenylene polymer composition for the formation of interlayers and process for the formation of patterns by using the same: t

20080107977 - Pigment compositions, colored compositions making use of the pigment compositions, and color filters: wherein A represents a substituted or unsubstituted phenyl group, B represents a substituted or unsubstituted β-naphthyl group, C represents a substituted or unsubstituted α-anthraquinonyl group, D represents a particular substituted aromatic group, and E represents a substituted or unsubstituted phenyl group, with a proviso that the compounds each have at... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107978 - Imaging member: An imaging member has a crosslinked overcoat layer. The overcoat layer is formed from an overcoat solution comprising a trisilanol polyhedral oligomeric polysilsesquioxane; two crosslinking agents; a hole transport molecule; an acid catalyst; and an alcohol solvent. The overcoat layer provides excellent wear resistance at a low cost.... Agent: Fay Sharpe / Xerox - Rochester

20080107980 - Photoreceptor overcoat layer masking agent:

20080107981 - Positive-charge injection preventing layer for electrophotographic photoreceptors: Positive-charge injection-related ghosting of images in electrophotographic processes is addressed by electrophotographic photoreceptors that include a positive-charge injection preventing layer that includes one or more positive-charge-injection preventing compounds. In addition, processes are provided for preventing positive charge injection, in which the processes include a step of applying a positive-charge injection... Agent: Oliff & Berridge, Plc.

20080107979 - Silanol containing charge transport overcoated photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, at least one silanol containing charge transport layer, and a top overcoating layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107984 - Overcoated photoconductors with thiophosphate containing charge transport layers: A photoconductor containing an optional supporting substrate, a containing photogenerating layer, at least one thiophosphate containing charge transport layer, and a top overcoating crosslinked polymer layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107985 - Silanol containing overcoated photoconductors: A photoconductor containing an optional supporting substrate, a silanol containing photogenerating layer, at least one charge transport layer, and a top overcoating layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107983 - Overcoated photoconductors with thiophosphate containing photogenerating layer: A photoconductor containing a thiophosphate photogenerating layer, and at least one charge transport layer, and a top polymeric overcoating layer in contact with and contiguous to a charge transport layer.... Agent: Patent Documentation Center

20080107982 - Photoconductors containing halogenated binders: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer; and wherein the photogenerating layer is comprised of at least one photogenerating pigment and a resin binder that is substantially insoluble in an alkylene halide like methylene chloride.... Agent: Patent Documentation Center

20080107986 - Hydrophobic, salt-like structured silicate: A salt-like hydrophobic structured silicate, wherein the cation of the salt-like structured silicate is a low molecular weight organic cation or a combination thereof with NH4+, H3O+, alkali metal, alkaline earth metal, earth metal and/or a transition metal ion. The anion of the salt-like structured silicate is an island, ring,... Agent: Clariant Corporation Intellectual Property Department

20080107973 - Fine mold and method for regenerating fine mold: A fine mold comprises a regeneration target film forming a convex part of a formation surface, and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film. A manufacturing cost of a product having a three-dimensional structure can... Agent: Dickstein Shapiro LLP

20080107975 - Method of correcting photomask defect: After making an electrical continuity in the isolated pattern by a metal deposition film by a CVD of the electron beam or the helium ion beam generating from the gas field ion source, the defect is corrected and, after the correction, the metal deposition film is physically removed by an... Agent: Brinks Hofer Gilson & Lione

20080107974 - Photomask, multiphase exposure method, and method of manufacturing semiconductor device including insulating gate-type transistors: A photo-mask, a multiphase exposure method and a method of manufacturing a semiconductor device are disclosed. The photo-mask mask includes a first light shielding region which is narrow and elongated, and a second light shielding region which is wider and more elongated than the first light shielding region and is... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080107976 - Real-time configurable masking: Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern having an undefined area, directing a second beam... Agent: Ibm Coporation (rtp) C/o Schubert Osterrieder & Nickelson Pllc

20080107987 - Toner and two-component developer: A toner in which mother toner particles containing at least a resin binder and a colorant are coated with an external additive, wherein the mother toner particles contain fine powders of a fluororesin having an average particle size of 1 μm or less in an amount of from 4 to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107988 - Emulsion aggregation toner having rheological and flow properties: A toner including toner particles of a styrene acrylate binder and at least one colorant, wherein the styrene acrylate binder has a weight average molecular weight of about 20 to about 30 kpse and a molecular peak of about 23 to about 28 kpse, the toner particles have a weight... Agent: Oliff & Berridge, Plc.

20080107989 - Emulsion aggregation polyester toners: An emulsion aggregation toner including an amorphous resin and a crystalline resin, wherein the toner has an acid value of from about 16 mg/eq. KOH to about 40 mg/eq. KOH and a relative humidity sensitivity ratio of from about 1 to about 2, and wherein the crystalline resin has a... Agent: Oliff & Berridge, Plc.

20080107990 - Toner compositions: Toner compositions comprising low-melt toner particles and methods of preparing such toner compositions are provided. The toner particles include a polyester-containing binder, a colorant and an optional wax. The binder includes at least one crystalline polyester resin and at one amorphous acidic polyester resin.... Agent: Oliff & Berridge, Plc.

20080107991 - Toner for development of electrostatic image, method of producing the same, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus: n

20080107992 - Image forming method, image forming apparatus, and developer: where ε′ is a specific dielectric constant of the image bearing member, q is an electrification quantity per one toner particle, and r is a volume average radius of the toner particles.... Agent: Amin, Turocy & Calvin, LLP

20080107993 - Donor films with pattern-directing layers: Laser induced thermal imaging (LITI) donor films, and methods of preparing them, having a substrate, a light-to-heat conversion layer, and a pattern-directing layer. The pattern-directing layer can include patterns of self-assembled monolayer regions, hydrophilic and hydrophobic regions, positively or negatively charged regions, or a series of raised or recessed features.... Agent: 3m Innovative Properties Company

20080107994 - Photonic crystal euv photoresists: Embodiments of the present invention provide EUV (extreme ultraviolet) photoresists comprising photonic crystals, as well as other components. Photonic crystals in general provide the ability not only to block light transmission, but also to create resonant pockets in which light can propagate. The photonic crystals are based on bio-related polymers... Agent: Intel/blakely

20080107995 - Optical disc having lenticular surface and method of manufacturing: The optical disc of the present invention includes a first translucent substrate having generally planar opposed top and bottom surfaces. The bottom surface is smooth and adapted to an optical beam for accessing data on the disc. The top surface of the first substrate has formed pits that represent data... Agent: Stetina Brunda Garred & Brucker

20080107996 - Shear resistant printing ink vehicles: The specification describes a process for making gelled ink resins which exhibit improved properties such as lower viscosity under low shear and less viscosity decrease with increasing shear. In a preferred embodiment, a rosin-based or hydrocarbon-based resin is mixed with an organic solvent and reacted with a polyamine reactant, such... Agent: Legal Department Lubrizol Advanced Materials, Inc

20080107997 - Anti-reflective coating containing sulfur atom: There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with... Agent: Oliff & Berridge, Plc

20080107998 - Near-field exposure method and device manufacturing method using the same: A near-field exposure method in which a light blocking film with an opening having an opening width not greater than a wavelength size of exposure light is contacted to an object to be exposed and in which light from an exposure light source is projected on the light blocking film... Agent: Fitzpatrick Cella Harper & Scinto

20080107999 - Exposure method, device manufacturing method, and substrate: An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition RW−RP≦1.0×10−3 when RP is the transmittance of the liquid containing an eluted... Agent: Oliff & Berridge, Plc

20080108000 - Random negative index material structures in a three-dimensional volume: Materials and methods for fabricating and using negative index materials are disclosed. A negative index material comprises a three-dimensional volume including a bulk solution and a plurality of unit cells disposed in the bulk solution in a substantially random pattern. Each unit cell comprises a periodic hole array pattern on... Agent: Hewlett Packard Company

20080102380 - High density lithographic process: A method is provided for patterning monolithically integrated features having a 1:1 ratio. The method comprises forming a first etch barrier layer (18) over a base layer (14) and applying (52) a template (20) to pattern (52) first printed features (26) in the first etch barrier layer (18). The first... Agent: Ingrassia Fisher & Lorenz, P.C.

20080102379 - Method for forming a robust mask with reduced light scattering: A mask and method for forming the same including carrying out a photolithographic patterning process the method including providing a substantially light transparent portion; forming a substantially light shielding layer disposed over the substantially light transparent portion; forming at least one barrier layer disposed over the substantially light shielding layer;... Agent: Tung & Associates

20080102382 - Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate: Methods for producing a photomask or layer or stack patterning include applying two resists to a layer, a layer stack, or a mask substrate (collectively “the layer”). Sensitivity of the first resist with respect to the exposure dose is greater than sensitivity of the second. Both resists are subjected to... Agent: Mayback & Hoffman, P.A.

20080102384 - Method of fabricating color filter: A method of fabricating a color filter is provided, which includes the following steps. First, a loose composite film is formed. Next, the loose composite film is patterned to form a patterned composite film. Then, a treatment process is performed to dense the patterned composite film, thereby a color filter... Agent: Jianq Chyun Intellectual Property Office

20080102386 - Compositions including polymers aligned via interchain interactions: The present invention provides compositions, devices and methods related to the alignment of materials including polymers. In some cases, the present invention comprises the assembly of molecules (e.g., polymers) via intermolecular interactions to produce extended networks, which may have enhanced properties relative to the individual molecules. Such networks may be... Agent: Wolf Greenfield & Sacks, P.C.

20080102387 - Display panel manufacturing method and display panel manufacturing apparatus: A display panel manufacturing method is provided-for manufacturing a display panel including a microlens formed on a surface of a TFT substrate (2) and a light shield (11) corresponding to an inner region of an opening (5B). The method includes a step of arranging photosensitive resin (8) on a surface... Agent: Edwards Angell Palmer & Dodge LLP

20080102388 - Photoreceptor containing substituted biphenyl diamine and method of forming same: A photoreceptor with a substrate, a charge generating layer, a charge transport layer including N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine, having a purity of from about 95 percent to about 100 percent, and a protective overcoating layer, optionally including a hole transport material other than N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine, that will discharge form about 85% to about 100%... Agent: Oliff & Berridge, PLC.

20080102389 - Electrophotographic photoreceptor, method of producing the same, process cartridge, and image-forming apparatus: The electrophotographic photoreceptor of the present invention includes a cylindrical support; a charge-generating layer and a charge-transporting layer that are layered onto the cylindrical support in this sequence from the cylindrical support side. The charge-transporting layer includes a charge transport material, and resins including a curable resin and a thermoplastic... Agent: Oliff & Berridge, PLC

20080102390 - Electrophotographic photoreceptor, method of producing the same, process cartridge, and image-forming apparatus: The electrophotographic photoreceptor of the present invention includes a cylindrical support, a photosensitive layer and an outermost surface layer that are layered onto the cylindrical support in this sequence from the cylindrical support side. The outermost surface layer includes a charge transport material and a curable resin. The proportion of... Agent: Oliff & Berridge, PLC

20080102391 - Method for preparing photoreceptor, photoreceptor prepared by the method, and image forming method and apparatus and process cartridge using the photoreceptor: A method for preparing a photoreceptor including forming a photosensitive layer overlying an electroconductive substrate; coating a liquid including a radically polymerizable compound to form a protective layer; irradiating the protective layer with light to crosslink the protective layer; and then contacting the protective layer with a fluid, which is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102378 - Thermoplastic holographic media: The present invention provides an article comprising: a binder component, a polymerizable component; and a photoinitiator component comprising at least one photoinitiator that causes the polymerizable component to form a polymer or co-polymer when a portion of the polymerizable component is exposed to a light source. The present invention also... Agent: Jagtiani + Guttag

20080102381 - Method for managing light exposure mask and light exposure mask: An object of the present invention is to provide a method for managing a light exposure mask wherein: a mask inspection or a wafer inspection, in order to manage a contamination of a light exposure mask by a growing foreign matter, is not necessary; the method has general versatility regardless... Agent: Ladas & Parry LLP

20080102383 - Phase shift mask and method of fabricating the same: A phase shift mask includes a first non-phase shift region, a first phase shift region adjacent the first non-phase shift region, a second non-phase shift region, a second phase shift region adjacent the second non-phase shift region, and an opaque region interposed between said second phase shift and non-phase shift... Agent: Volentine & Whitt PLLC

20080102385 - Process for color filter array residual pigment removal: A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without... Agent: Dickstein Shapiro LLP

20080102392 - Information recording medium and method of preparing same: An information recording medium includes a transparent recording member and a substantially non-transparent member. The transparent recording member has at least one transparent area and a concavo-convex pattern on a first surface thereof while bearing a reverse toner image on a second surface thereof. The substantially non-transparent member is formed... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102393 - Toner, method of supplying the same and process cartridge: A toner including a colorant, a binder resin, and a releasing agent, wherein the toner has a number average particle diameter measured by a Coulter Counter method of from 3.5 to 6.5 μm and a peak top molecular weight (MPT) of from 2,500 to 4,800, the binder resin contains a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102394 - Method of preparing resin composition of toner and toner composition having the same: A method of preparing a resin composition of a toner and a toner composition having the same. The method of preparing the resin composition includes preparing a compound in which a double bond is introduced into a polyester by reacting the polyester with a double bond-containing compound, adding a first... Agent: Stanzione & Kim, LLP

20080102395 - Toner and manufacturing method thereof: An objective is to provide toner by which high quality images can be stably formed for a long duration. Disclosed is a toner possessing toner particles each containing a binder resin and a colorant, wherein the toner particle has a low surface energy group chemically bonded to the binder resin... Agent: Lucas & Mercanti, LLP

20080102396 - Toner for developing electrostatic charge image, electrostatic charge image developer, image forming method and image forming apparatus: A toner for developing an electrostatic charge image, includes: a binder resin formed by reacting a polymerizable aromatic monomer having an ethylenically unsaturated double bond conjugated to an aromatic ring thereof, a nitrogen-containing polymerizable aliphatic monomer having an ethylenically unsaturated double bond and a sulfur-containing aliphatic compound to each other;... Agent: Oliff & Berridge, PLC

20080102397 - Toner container and image forming apparatus including same: A toner container of the present invention includes a cylindrical portion containing toner used in an electrophotographic type complex machine. When the cylindrical portion is driven to rotate, the toner gets out via an outlet thereof. The cylindrical portion of the toner container has an inner wall provided with a... Agent: Nixon & Vanderhye, PC

20080102398 - Developing agent and method for producing the same: A method for producing a developing agent including heating a dispersion of a toner particle material containing a binder resin fine particle, a coloring agent particle and a dispersion medium at a temperature of a glass transition point of the binder resin or higher and adding a coagulating agent in... Agent: Amin, Turocy & Calvin, LLP

20080102399 - Image sheet forming method and image sheet forming apparatus: A pair of registration rollers align a leading edge of a recording medium having a transparent section and a non-transparent section. A boundary sensor detects a boundary between the transparent section and the non-transparent section. The boundary sensor is provided on a downstream side of a direction of conveying the... Agent: Harness, Dickey & Pierce, P.L.C

20080102402 - Monomer having sulfonyl group, polymer thereof and photoresist composition including the same: wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a... Agent: Birch Stewart Kolasch & Birch

20080102400 - Negative tone silicon-containing resist for e-beam lithography: The negative resist compositions especially suitable for electron beam-based lithographic processes are obtained by using a polymeric component containing first silsesquioxane moieties functionalized with a first reactive group having a first crosslinking reactivity and a first dissolution rate in aqueous alkaline solutions, and second silsesquioxane moieties functionalized with a second... Agent: International Business Machines Corporation Dept. 18g

20080102403 - Photoresist compositions and methods of forming a pattern using the same: wherein R1, R2, R3 and R4 independently represent a hydrogen atom or a C1-C3 alkyl group, X is a blocking group including an alkyl-substituted adamantane or an alkyl-substituted tricycloalkane, Y is a blocking group including a lactone, Z1 is a blocking group including a hydroxyl-substituted adamantane, and Z2 is a... Agent: Mills & Onello LLP

20080102401 - Si-containing polymers for nano-pattern device fabrication: A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially perpendicular with that of its major surfaces (top and bottom) is provided. Such a resist polymer having the nano-scale patterns... Agent: Scully, Scott, Murphy & Presser, P.C.

20080102404 - Aluminum alloy plate and support for lithographic printing plate: An aluminum alloy plate for lithographic printing that is capable of obtaining a lithographic printing plate support which is free from appearance defects and has a uniform surface after electrolytic graining treatment and of obtaining a lithographic printing plate having a long press life and an excellent scumming resistance is... Agent: Sughrue Mion, PLLC

20080102405 - Nitrogen-containing organic compound, resist composition and patterning process: A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.... Agent: Birch Stewart Kolasch & Birch

20080102406 - Light sensitive planographic printing plate material and manufacturing process of printing plate employing the same: r

20080102407 - Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process: A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is... Agent: Birch Stewart Kolasch & Birch

20080102409 - Inductor for a system-on-a-chip and a method for manufacturing the same: An inductor for a system-on-a-chip and a method for manufacturing the inductor are disclosed. The inductor comprises a conductive line formed by connecting a plurality of conductive patterns grown from a seed layer formed on a lower wiring. The method comprises using an electrolytic plating process or an electroless plating... Agent: Volentine & Whitt PLLC

20080102408 - Microstructure and method for producing microstructures: Light-diffracting microstructures are produced by the superimposition of at least two relief structures, wherein the first relief structure is produced mechanically while at least one second relief structure is a photomechanically generated diffraction structure. A process for the production of light-diffracting microstructures which are additive superimpositions comprising a relief structure... Agent: Charles R Hoffmann Hoffmann & Baron

20080102410 - Method of manufacturing printed circuit board: A method of manufacturing a printed circuit board is disclosed, in which a cavity is formed for embedding a component, which includes: providing a core board, in which an inner circuit is buried; forming a first via in the core board for interlayer conduction; selectively forming a first photoresist in... Agent: Staas & Halsey LLP

20080096116 - Toner and production method thereof, image forming apparatus and image forming method, and process cartridge: The object of the invention is to provide a toner enabling excellent transferring properties, cleanability, and fixability and forming a high-precision image without substantially degraded image quality even after printed on a number of sheets of paper. The invention also provides the toner-production method, an image forming apparatus, an image... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096113 - Exposure mask, manufacturing method of electronic device, and checking method of exposure mask: According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first exposure by using an exposure mask which includes a scribe region and a inspection mark formed in a first side... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080096114 - Neck height equalization in magnetic write pole mold: An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion... Agent: Saile Ackerman LLC

20080096115 - Oxime ester photoinitiators: Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or... Agent: Joann Villamizar Ciba Corporation/patent Department

20080096117 - Bisazo compound, 2-hydroxy-3-phenylcarbamoyl naphthalene compound and method manufacturing bisazo compound: wherein, Ar1 and Ar2 independently represent a substituted or non-substituted aryl group, when at least one of Ar1 and Ar2 has a substituent, the substituent is selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, phenyl group, biphenyl group, naphthyl group, anthryl group, and... Agent: Cooper & Dunham, LLP

20080096118 - Polyester resin and manufacturing method thereof, electrostatic-image-developing toner, developing apparatus, cartridge, image-forming apparatus, and micro-reactor apparatus: A polyester resin has a molecular weight distribution (MWD) of approximately from 1.0 to 2.2, wherein molecular weight distribution (MWD) is a weight-averaged molecular weight (Mw)/a number-averaged molecular weight (Mn); and a luminosity (L*) of from approximately 97.0 to 100 when the polyester resin is molded in a diameter of... Agent: Oliff & Berridge, PLC

20080096119 - Toner and method of manufacturing the same: A toner including toner particles comprising a binder resin, a coloring agent and a wax. The toner particles are prepared by agglomerating and/or fusing at least two kinds of resin particulates and particles of the coloring agent dispersed in an aqueous medium. A first resin particulate among the at least... Agent: Cooper & Dunham, LLP

20080096120 - Toner: An eletrophotographic toner comprising toner particles each containing a colorant and a resin, wherein the resin in the toner particle satisfies the following Formulas (1) and (2): Formula (1) 20≦Tg≦40, Formula (2) 15≦(Ta−Tg)≦40, wherein Tg (° C.) is a glass transition point of the resin; and Ta (° C.) is... Agent: Lucas & Mercanti, LLP

20080096121 - Carrier, supplemental developer, developer in image developer, developer feeding apparatus, image forming apparatus and process cartridge: A carrier for use in an image forming apparatus in which a toner and a carrier are fed to an image developer thereof and an extra developer including the toner and the carrier in the image developer is discharged therefrom, wherein at least one of the carrier fed to the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096122 - Method for imaging with imaging member having filled overcoat layer: A method for forming images including a) depositing an electrostatic latent image on a charge retentive surface of a photoreceptor member having a substrate; a charge transport layer with charge transport materials; and an overcoat layer positioned on the charge transport layer, wherein the overcoat layer includes a crosslinkable alcohol-soluble... Agent: Patent Documentation Center

20080096123 - Process for producing electrophotographic photosensitive member: A process for producing an electrophotographic photosensitive member is disclosed. The electrophotographic photosensitive member includes a conductive support and a surface layer provided thereon containing at least a resin. The process has the step of forming a plurality of depressed portions on the surface layer by irradiation with laser light... Agent: Fitzpatrick Cella Harper & Scinto

20080096124 - Structured thermal transfer donors: A laser induced thermal imaging (LITI) donor film having a substrate, a light-to-heat conversion layer overlaying the substrate, and a transfer layer overlaying the light-to-heat conversion layer. A surface of the transfer layer includes microstructured or nanostructured features, in a continuous or discontinuous pattern, embossed or otherwise imparted in the... Agent: 3m Innovative Properties Company

20080096125 - Antireflective coating compositions: l

20080096126 - Polymer compound, positive resist composition and process for forming resist pattern: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group having 20 or less carbon atoms, or a fluorinated lower alkyl group having 20 or less carbon atoms, R1 represents at most 20-membered cyclic group which may have a substituent, n represents 0 or an integer of... Agent: Knobbe Martens Olson & Bear LLP

20080096127 - Photoactive compounds: The present invention relates to novel photoactive compounds that can be used in formulating photoresist compositions.... Agent: Alan P. Kass Clariant Corporation

20080096129 - Process for production of electroluminescent element and electroluminescent element: A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method... Agent: Burr & Brown

20080096128 - Resist composition and patterning process: A chemically amplified positive resist composition comprises a compound having an amine oxide structure as a basic component, a base resin, a photoacid generator, and an organic solvent. The resist composition exhibits a high resolution, significantly prevents a line pattern from collapsing after development, and has improved etch resistance.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080096131 - Resist composition and patterning process: A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for... Agent: Birch Stewart Kolasch & Birch

20080096130 - Positive resist composition: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than... Agent: Sughrue Mion, PLLC

20080096133 - Photocurable and thermosetting resin composition, cured product thereof and printed circuit board obtained using the same: A photocurable and thermosetting resin composition comprising (A) a carboxyl-group containing resin, (B) an oxime ester-based photopolymerization initiator containing an oxime ester group, (C) an aminoacetophenone-based photopolymerization initiator and/or a phosphine oxide-based photopolymerization initiator, (D) a compound having at least two ethylenically unsaturated groups in its molecule, (E) a filler,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080096132 - Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex: A method for producing a polymer latex includes: mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and a polymerization initiator to conduct emulsion polymerization; and distilling off a monomer unpolymerized in the emulsion polymerization.... Agent: Sughrue-265550

20080096134 - Positive resist composition and pattern forming method using the same: wherein AR represents a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring; Rn represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group; and A represents an atom or group selected from the group consisting of... Agent: Sughrue-265550

20080096136 - Method of forming mask pattern of semiconductor device: A method of forming a photoresist pattern for etching an underlying layer of a semiconductor device. A surface of a semiconductor substrate is coated with photoresist. A mask bias is controlled for a mask writer apparatus depending on a mask target critical dimension. The photoresist is exposed and developed based... Agent: Sherr & Nourse, PLLC

20080096135 - Methods for forming patterns of a filled dielectric material on substrates: Methods of forming a pattern of filled dielectric material on a substrate by thermal transfer processes are disclosed comprising exposing to heat a thermally imageable donor element comprising a substrate and a transfer layer of dielectric material. The exposure pattern is the image of the desired pattern to be formed... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080096137 - Method for fabricating flow channel capable of balancing air pressure: A method for fabricating flow channel capable of balancing air pressure. A device wafer is provided, and a plurality of chambers not conducting to each other are formed on the front surface of the device wafer. Subsequently, a plurality of flow channels are formed on the front surface of the... Agent: North America Intellectual Property Corporation

20080096138 - Method of reducing critical dimension bias during fabrication of a semiconductor device: An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.... Agent: Shirley L. Church, Esq.

20080096139 - Mastering based on heat-induced shrinkage of organic dyes: The present invention relates to a method for providing a high-density relief structure in a recording stack of a master substrate, particularly a master substrate for making a stamper for the mass-fabrication of optical discs or a master substrate for making a stamp for micro contact printing. Furthermore, the present... Agent: Philips Intellectual Property & Standards

20080096140 - Ferrule for optical wave guide: An apparatus includes an optical wave guide and a ferrule. The optical wave guide has a prespecified horizontal-positioning surface and a prespecified vertical-positioning surface. The ferrule is to precisely couple with the optical wave guide. The ferrule defines a first datum plane mating with the prespecified vertical-positioning surface of the... Agent: Law Offices Of Michael Dryja

20080096141 - Cleaning liquid for lithography and method for resist pattern formation:

20080096142 - Baking apparatus, substrate heat treatment method and semiconductor device manufacturing method for using baking apparatus, pattern forming method and semiconductor device manufacturing method for using pattern forming method: A baking apparatus according to one embodiment of the invention includes a hotplate which performs heat treatment to a substrate placed on the hotplate, a base which has at least three support pins passing through through-holes made in the hotplate and supporting the substrate on the hotplate from a backside... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080096143 - Non-transparent microvoided biaxially stretched film, production process therefor and process for obtaining a transparent pattern therewith: A non-transparent microvoided biaxially stretched self-supporting non-laminated polymeric film, the film comprising linear polyester as a continuous phase and dispersed uniformly therein an amorphous high polymer with a higher glass transition temperature than the glass transition temperature of the continuous phase and/or a crystalline high polymer having a higher melting... Agent: Leydig Voit & Mayer, Ltd

20080096144 - Silver halide photographic light-sensitive material for movie subtitles: A silver halide photographic light-sensitive material for movie subtitles, includes: a transparent support; and at least one light-sensitive layer and at least one light-insensitive layer, directly or indirectly on the transparent support, wherein the at least one light-insensitive layer comprises at least one kind of a silicone oil.... Agent: Birch Stewart Kolasch & Birch

20080090155 - Deformation-based contact lithography systems, apparatus and methods: One or more of a contact lithography module, a pattern tool and a substrate include a strain control region to prevent deformation-related misalignment.... Agent: Hewlett Packard Company

20080090156 - Photo mask having assist pattern and method of fabricating the same: A photomask has highly reliable assist patterns, and a method of fabricating the same is provided. The photomask includes a transparent substrate, circuit pattern and assist patterns. The circuit pattern recessed into the transparent substrate relative to a surface thereof has a first thickness, and assist patterns located adjacent to,... Agent: Mills & Onello LLP

20080090160 - Alignment for contact lithography: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and a sensor disposed on the patterning tool for sensing a magnetic pattern disposed on the substrate to determine alignment between the patterning tool and the substrate. A method of aligning a patterning tool... Agent: Hewlett Packard Company

20080090161 - Recording material, smoothing system, and image-forming system: A recording material has toner reception layers on both surfaces of a base. The toner reception layers have glass transition temperatures in the range of 40 to 80° C. One of the toner reception layers that is to be smoothed prior to the other toner reception layer has a higher... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080090162 - Binder resin composition of toner, toner composition and preparation method thereof: A binder resin composition which can sharply, but reversibly, melt and solidify within a narrow temperature range, a toner composition of enhanced low-temperature fixability and durability having the binder resin composition, and a preparation method thereof. The binder resin composition of the toner includes a first polymer compound having a... Agent: Stanzione & Kim, LLP

20080090158 - Method for designing an index profile suitable for encoding into a phase mask for manufacturing a complex optical grating: A method for designing an index profile suitable for encoding into a phase mask for manufacturing a complex optical grating is provided. The optical grating corresponds to a target index profile defining a target spectral response. A modified index profile is set equal to the target index profile and expressed... Agent: Darby & Darby P.C.

20080090157 - Photo mask with improved contrast and method of fabricating the same: A photo mask which enhances contrast and a method of fabricating the same are provided. The photo mask includes a transparent substrate and a light shielding layer pattern formed on the transparent substrate. The light shielding layer pattern includes apertures through which the transparent substrate is exposed. Depressions aligned with... Agent: Marger Johnson & Mccollom, P.C.

20080090159 - Photomask blank, photomask, and method of manufacture: A photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition based on... Agent: Birch Stewart Kolasch & Birch

20080090163 - Emulsion aggregation processes: A process for preparing a toner, includes solvent flashing wax and resin together to emulsify the resin and wax to a sub-micro size; mixing the wax and resin emulsion with a colorant, and optionally a coagulant to form a mixture; heating the mixture at a temperature below a glass transition... Agent: Oliff & Berridge, PLC.

20080090164 - Developer, process cartridge, and image forming apparatus: The invention provides a developer having at least a toner, an aeration ratio (AR) of the developer measured by a powder rheometer being in a range of about 5.0 to about 10.0. It is preferable that the developer further contains an external additive of silica particles having a small diameter.... Agent: Oliff & Berridge, PLC

20080090165 - Toner and developer, toner container, process cartridge, image forming apparatus, and image forming method using the same: To provide a toner containing an ethyl acetate-soluble polyester component and an ethyl acetate-insoluble polyester component, wherein the toner is granulated in an aqueous medium, the ethyl acetate-insoluble polyester component is obtained by elongating and/or cross-linking a modified polyester resin during granulating and/or after granulating, the modified polyester resin is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080090166 - Addition of extra particulate additives to chemically processed toner: The present invention relates to the combination of a chemically processed toner with extra particulate additive in a conical mixer. The toner may include polymer resins having a glass transition temperature (Tg) wherein the mixer and/or toner may be maintained below the glass transition temperature during mixing. Prior to mixing... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080090167 - Method of addition of extra particulate additives to image forming material: The present invention relates to a method for combining extra particulate additive with toner. The method includes mixing toner and extra particulate additive in a conical mixer having temperature control. The toner may contain polymeric material having a glass transition temperature (Tg) and the mixing may be carried out wherein... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080090168 - Positive type dry film photoresist: A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that... Agent: Birch Stewart Kolasch & Birch

20080090169 - Composite film suitable as a donor support in a radiation-induced thermal transfer imaging process: A composite film suitable as a donor support in a radiation-induced thermal transfer imaging process, said film comprising a polymeric substrate and a transfer-assist coating layer derived from an aqueous composition comprising one or more water-soluble or water-dispersible radiation-absorbing compound(s).... Agent: Ratnerprestia

20080090170 - Pattern forming template and pattern forming method: A pattern forming template used in a nano-imprinting method is disclosed. An imprint material layer formed of liquid having a photo-setting property is coated on a to-be-processed substrate. A pattern is transferred onto the imprint material layer by applying light to a surface on which the pattern is not formed... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080090173 - Polymer, resist composition, and patterning process: A resist composition comprising an alkali-soluble polymer having lactone units incorporated therein as an additive forms a resist film which has on its surface a reduced contact angle after development and prevents water penetration during immersion lithography.... Agent: Birch Stewart Kolasch & Birch

20080090171 - Positive resist composition for immersion lithography and method for forming resist pattern: wherein R1 is a hydrogen atom or a methyl group; R2 and R3 are each independently represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; n is an integer of 0 to 3; and Z is an aliphatic cyclic group having 4 to 12 carbon... Agent: Knobbe Martens Olson & Bear LLP

20080090172 - Resist composition and patterning process: A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080090174 - Novel oxonol dye compounds and optical information recording medium: r

20080090175 - Positive working light sensitive planographic printing plate material and planographic printing plate manufacturing process employing the same: Disclosed are a positive working planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer, wherein the light sensitive layer contains an alkali soluble resin and pigment having on the surface a development restrainer and a positive working planographic printing plate material comprising an aluminum... Agent: Frishauf, Holtz, Goodman & Chick, PC

20080090177 - Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method: s

20080090176 - Semiconductor wafer and semiconductor device: Disclosed is a semiconductor wafer which is characterized in that a resin layer composed of a resin composition containing a cyclic olefin resin (A) having an epoxy group and a photoacid generator (B) is arranged on a surface on which a circuit element is formed, and the residual stress of... Agent: Smith, Gambrell & Russell

20080090179 - Novel polymer, resist composition and patterning process using the same: There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition... Agent: Oliff & Berridge, PLC

20080090178 - Heat-sensitive transfer image-receiving sheet and coating composition for forming heat-sensitive transfer image-receiving sheet: wherein, R1 represents a hydrogen atom, a halogen atom or a methyl group; L1 represents a divalent linking group; R2 represents an alkylene group having 1 to 5 carbon atoms which may be further substituted; n represents an integer of 1 to 40; Z1 represents a hydrogen atom or a... Agent: Sughrue Mion, PLLC

20080090180 - Method of fabricating semiconductor device: A semiconductor fabrication method may include depositing hexamethyldisilazane (HMDS) on a wafer surface, cooling the wafer and coating the wafer surface with a first photoresist, heating the wafer on which the first photoresist has been coated to induce a silylation reaction, cooling the wafer, and developing and removing the first... Agent: Workman Nydegger

20080090181 - Method for producing submicron structures: The invention relates to a method for producing submicron structures using a shadow mask, whereby a material charge and/or energy charge occurs through the openings of the shadow mask. The method comprises the following steps: a film which is used as a shadow mask and which is made of a... Agent: Diederiks & Whitelaw, PLC

20080090182 - Method for manufacturing microlens: A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for... Agent: Ladas & Parry LLP

20080090183 - Aligned carbon nanotubes and method for construction thereof: Aligned carbon nanotubes and composites for electrical interconnect and thermal interface materials are provided. In one preferred embodiment, an aligned carbon nanotube device comprises a substrate and a plurality of carbon nanotubes having a substantially vertical profile. The substantially vertical carbon nanotubes are coupled to the substrate. In another preferred... Agent: Troutman Sanders LLP

20080090184 - Positive -working photoimageable bottom antireflective coating: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a... Agent: Sangya Jain Clariant Corp.

20080090185 - Method and apparatus for rinsing a substrate during lithographic development processing: The invention provides a method capable of eliminating occurrence of concentration difference in developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse; preventing occurrence of stain-like defects on a resist film surface; and reducing amount used of the developer. While... Agent: Townsend And Townsend And Crew, LLP

20080090186 - Method and system for performing development processing during photolithography: A method of eliminating an occurrence of concentration differences in a developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse, preventing occurrence of stain-like defects on a resist film surface, and reducing amount of the developer used is disclosed. While... Agent: Townsend And Townsend And Crew, LLP

20080090187 - Photothermographic material: m