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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
06/11/2015 > patent applications in patent subcategories.
  
06/04/2015 > patent applications in patent subcategories.
  
05/28/2015 > 19 patent applications in 12 patent subcategories.

20150147684 - System and method for holography-based fabrication: A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a... Agent:

20150147685 - System and method for holography-based fabrication: A system and method may utilize holography to facilitate fabrication techniques such as 3D printing and lithography. The system may include a light source, a hologram of an original object or lithographic pattern recorded in a holographic medium, and a target such as a reservoir of photosensitive material or a... Agent:

20150147686 - Extreme ultraviolet lithography process and mask: A low EUV reflectivity mask includes a low thermal expansion material (LTEM) layer, a low EUV reflectivity (LEUVR) multilayer over the LTEM layer in a first region, a high EUV reflectivity (HEUVR) multilayer over the LTEM layer in a second region and a patterned absorption layer over the LEUVR multilayer... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150147687 - Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity: The present disclosure provides one embodiment of an extreme ultraviolet (EUV) mask. The EUV mask includes a first state and a second state different from each other; a first main polygon and a second main polygon adjacent to the first main polygon; a plurality of sub-resolution assist polygons; and a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150147688 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or... Agent: Fujifilm Corporation

20150147689 - Polycarbonate copolymer, coating liquid using same, and electrophotographic photoreceptor: A polycarbonate copolymer includes a repeating unit A represented by a formula (1) below and a repeating unit B represented by a formula (2) below, in which an abundance ratio represented by Ar1/(Ar1+Ar2) is in a range of 35 mol % to 75 mol % and an abundance ratio represented... Agent: Idemitsu Kosan Co., Ltd.

20150147690 - Polyarylatecarbonate containing photoconductors: A photoconductor that includes, for example, a supporting substrate, an optional anticurl layer, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, a charge transport layer, and an optional protective coating, and where the photogenerating layer contains a polyarylatecarbonate.... Agent: Xerox Corporation

20150147691 - Electrophotographic photosensitive member, method for manufacturing the same, electrophotographic apparatus, process cartridge, and hydroxygallium phthalocyanine crystal: A photosensitive layer of an electrophotographic photosensitive member contains a hydroxygallium phthalocyanine crystal of a crystalline form having peaks at Bragg angles 2θ±0.2° of 7.0°, 16.6°, 20.8°, and 26.9° in X-ray diffraction with CuKα radiation.... Agent:

20150147692 - Liquid developer, particles for liquid developer, and liquid developer accommodation container: A liquid developer includes a carrier liquid having silicone oil, and toner particles including a polyester resin and having a value of ammonium ions contained therein measured by underwater extraction in a range of 0.005 ppm to 1 ppm.... Agent: Fuji Xerox Co., Ltd.

20150147693 - Method of producing electrophotographic photosensitive member: The invention has a process of preparing a dispersion liquid by dispersing particles containing a charge transporting substance and a binder resin in liquid medium containing a specific liquid to prepare a dispersion liquid and a process of forming a coat of the dispersion liquid, and heating and drying the... Agent:

20150147694 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin, (B) a photosensitive diazoquinone compound, (C) a thermosetting cross-linking agent represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and (D) a solvent,... Agent:

20150147695 - Resin, photoresist composition, and method for producing photoresist pattern: s

20150147696 - Method for producing polymer compound, polymer compound, and photoresist resin composition: The method for producing a polymer compound includes the step of filtering a resin solution containing a polymer compound through a filter. The filter is approximately devoid of strongly acidic cation-exchange groups and develops a positive zeta potential. The polymer compound includes a monomer unit (a) and a monomer unit... Agent: Daicel Corporation

20150147698 - Negative resist composition and pattern forming process: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(═O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4... Agent: Shin-etsu Chemical Co., Ltd.

20150147699 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device: The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid... Agent: Fujifilm Corporation

20150147697 - Resist composition and pattern forming process: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(═O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is... Agent: Shin-etsu Chemical Co., Ltd.

20150147700 - Black photosensitive resin composition and light blocking layer using the same: Disclosed are a black photosensitive resin composition including (A) a binder resin; (B) a colorant including a pigment and a silica nanoparticle; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the silica nanoparticle is included in an amount of about 1 part by weight to... Agent: Cheil Industries Inc.

20150147701 - Composition for forming topcoat layer and resist pattern formation method employing the same: Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including... Agent:

20150147702 - Resist composition and method of forming resist pattern: A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound... Agent:

  
05/21/2015 > 21 patent applications in 14 patent subcategories.

20150140477 - Euv mask for use during euv photolithography processes: The present disclosure is directed to various masks for use during EUV photolithography processes. In one example, an EUV mask is disclosed that includes, among other things, a substrate, a multilayer stack comprised of a plurality of multilayer pairs of ruthenium and silicon formed above the substrate, wherein the mask... Agent: Global Foundries Inc.

20150140478 - Method and apparatus for integrated circuit layout: Provided is an integrated circuit (IC) testline layout. The layout has a device boundary and a main pattern boundary inside the device boundary. The layout includes at least one main pattern inside the main pattern boundary. The layout further includes a plurality of dummy patterns in a region that is... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150140479 - Method of processing a semiconductor wafer such as to make prototypes and related apparatus: A method of processing a semiconductor wafer may include providing a rotatably alignable photolithography mask that includes different mask images. Each mask image may be in a corresponding different mask sector. The method may also include performing a series of exposures with the rotatably alignable photolithography mask at different rotational... Agent: Stmicroelectronics Pte Ltd

20150140480 - Photomask and methods for manufacturing and correcting photomask: The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the assist pattern while keeping the focal... Agent:

20150140481 - Forming patterns using crosslinkable reactive polymers: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a λmax of at... Agent:

20150140482 - Pattern forming method, and, electronic device producing method and electronic device, each using the same: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first... Agent: Fujifilm Corporation

20150140484 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol... Agent: Fujifilm Corporation

20150140483 - Electroless plating method: A conductive metal pattern is formed in a polymeric layer that has a polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the... Agent:

20150140485 - Processing liquid supplying apparatus, processing liquid supplying method and storage medium: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between... Agent:

20150140487 - Yellow toner: The present invention provides a yellow toner having excellent light resistance. The yellow toner includes toner particles, each of which contains a binder resin, a wax, and a colorant. The colorant is a compound represented by Formula (1).... Agent:

20150140486 - Toner and method of manufacturing same: A toner includes a plurality of toner particles that each include a toner mother particle and an external additive adhering to a surface of the toner mother particle. The toner mother particle includes a core and a shell layer disposed over a surface of the core. The external additive contains... Agent: Kyocera Document Solutions Inc.

20150140488 - Electrostatic charge image developing toner and method for producing electrostatic charge image developing toner: An electrostatic charge image developing toner contains a plurality of toner particles. Each of the toner particles includes a toner core containing a binder resin and a shell layer coating the toner core. The shell layers contain a thermosetting resin. The toner cores have a negative zeta potential in an... Agent: Kyocera Document Solutions Inc.

20150140489 - Composition of matter and molecular resist made therefrom: wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon... Agent:

20150140491 - Composition of matter and molecular resist made therefrom: wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon... Agent:

20150140490 - Overlay film forming composition and resist pattern formation method using same: An object of the present invention is to provide a composition enabling to form a topcoat layer capable of preventing outgassing and of keeping deep UV light from impairing pattern shape in a lithographic process with extreme UV light. The object can be achieved by a composition of the invention... Agent:

20150140492 - Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition: The present invention is a conductive polymer composition containing a π-conjugated conductive polymer, a polyanion, and a gemini surfactant. There can be provided a conductive polymer composition that has excellent antistatic performance and excellent application properties, does not adversely affect a resist, and can be suitably used in lithography using... Agent:

20150140493 - Compounders for enhancing generation of chemical species: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. Also described is a method for manufacturing a device, the method including applying a liquid containing a composition to a member such that a coating film including the composition is formed on the... Agent:

20150140494 - Electroless plating method using bleaching: A conductive metal pattern is formed using a reactive polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to... Agent:

20150140495 - Electroless plating method using halide: A conductive metal pattern is formed using a reactive polymer that can provide pendant sulfonic acid groups upon exposure to radiation, and (2) pendant groups that are capable of providing crosslinking. The polymeric layer is patternwise exposed to radiation to provide first exposed regions that are then contacted with electroless... Agent:

20150140496 - Electroless plating method using non-reducing agent: A conductive metal pattern can be formed in a polymeric layer that has a reactive polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to... Agent:

20150140497 - Resist composition, method of forming resist pattern, polymeric compound, compound: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a... Agent:

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