|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereofBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 06/13/2013 > 14 patent applications in 11 patent subcategories.
20130149638 - Mask design and opc for device manufacture: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a... Agent:
20130149636 - Pattern determining method, pattern determining apparatus and storage medium: A method of determining a pattern of a mask for an exposure apparatus includes a first calculation step of calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, a second calculation step of... Agent: Canon Kabushiki Kaisha
20130149637 - Titania and sulfur co-doped quartz glass member and making method: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A... Agent: Shin-etsu Chemical Co., Ltd.
20130149639 - Ammonium alkylphosphate containing intermediate transfer members: An intermediate transfer member that includes a mixture of a polyamideimide, an ammonium alkylphosphate, an optional polysiloxane, and an optional conductive filler.... Agent: Xerox Corporation
20130149640 - Toner particle, developer, and image forming method: A toner particle including a mother particle and an outer shell layer is provided. The mother particle includes a binder resin and a colorant. The outer shell layer is formed of a reaction product of a silicon compound chemically binding to a surface of the mother particle. The outer shell... Agent:
20130149641 - Charge controlling agent and toner using same: To provide a charge controlling agent for electrophotography, which presents sufficient triboelectric chargeability to a toner, is useful particularly for a color toner and further for a polymerized toner, increases a charge rising rate, has a high electric charge amount, is excellent in charging characteristics, stability over time and environmental... Agent: Hodogaya Chemical Co., Ltd.
20130149642 - Toner and developer: To provide a toner, which contains a first binder resin, and a second binder resin, wherein the first binder resin is a block polymer containing at least a polyester skeleton A having, in a repeating structure thereof, a constitutional unit formed by dehydration condensation of hydroxycarboxylic acid, and a skeleton... Agent:
20130149643 - Carboxylic acid or acid salt functionalized polyester polymers: The present disclosure describes a polyester that contains plural pendant adjacent carboxylic acid or acid salt side groups for use in making a toner for use in imaging devices.... Agent:
20130149644 - Radiation-sensitive composition and compound: A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R0 independently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. R1 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. R2 represents a... Agent: Jsr Corporation
20130149645 - Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film: A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) an isocyanuric acid. The resist composition overcomes the stripping... Agent: Shin-etsu Chemical Co., Ltd.
20130149646 - Charged particle beam writing apparatus and charged particle beam writing method: Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The... Agent: Nuflare Technology, Inc.
20130149647 - Holding apparatus, drawing apparatus, and method of manufacturing article: A holding apparatus holds a substrate. The apparatus includes a base having burls that support the substrate, a pool whose capacity is variable and from which a liquid is to be supplied into a gap between the base and the substrate supported by the burls, and a regulator configured to... Agent: Canon Kabushiki Kaisha
20130149648 - Method of making nozzle chip: The present disclosure provides a method of making a nozzle chip including a step of forming an ejection orifice row by performing irradiation with light rays using a mask having ejection orifice row patterns that form an ejection orifice row pattern of one nozzle chip when the ejection orifice row... Agent: Canon Kabushiki Kaisha
20130149649 - Lithographic apparatus and a device manufacturing method: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator... Agent: Asml Netherlands B.v.06/06/2013 > 18 patent applications in 14 patent subcategories.
20130143149 - Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask: Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in... Agent: Samsung Display Co., Ltd.
20130143150 - Method for manufacturing photomask and photomask manufactured using the same: A method for manufacturing a photomask includes forming a photoresist film on a substrate, and forming a defect detecting pattern on the photoresist film. The defect detecting pattern has a first pattern elongated in a first direction and a second pattern overlapping one end of the first pattern and elongated... Agent:
20130143151 - Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: An electrostatic charge image developing toner includes: bright pigment particles; and a binder resin, and the electrostatic charge image developing toner has a main peak and at least one peak or shoulder that is higher in molecular weight than the main peak in a molecular weight distribution of a tetrahydrofuran-soluble... Agent: Fuji Xerox Co., Ltd.
20130143152 - Carrier and developer for electrostatic image development, and image formation method and apparatus: A carrier for electrostatic image development, and a developer, an image formation method and an image formation apparatus using the carrier. The carrier is carrier particles. When the carrier particles each have a coating layer on a magnetic particle, the carrier has a total energy amount of 1500 to 3000... Agent: Fuji Xerox Co., Ltd.
20130143153 - Transparent electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: A transparent electrostatic charge image developing toner satisfies the relationships of the following Formulas (1), (2), and (3) wherein Dt (μm) is a volume average particle diameter, upper GSDv is an upper volume particle size distribution index, and lower GSDp is a lower number particle size distribution index: Formula (1):... Agent: Fuji Xerox Co., Ltd.
20130143154 - Toner: A toner with good low-temperature fixability even in light-pressure type fixing units, which causes no contamination of fixing films and provides images having stable image densities and excellent image quality after long-term use. The toner includes a toner particle containing a binder resin, a coloring agent, a release agents (a)... Agent: Canon Kabushiki Kaisha
20130143155 - Toner for electrophotography, developer, image forming method, and process cartridge: To provide a toner, including: a crystalline binder resin including a urethane bond or a urea bond, or both thereof, and a colorant, wherein the colorant has a number-average particle diameter of 0.5 μm or less, and a ratio of particles having a particle diameter of 0.7 μm or greater... Agent:
20130143156 - Image forming apparatus:
20130143157 - Homoadamantane derivatives, process for preparing same, and photoresist compositions: A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.... Agent: Idemitsu Kosan Co., Ltd.
20130143158 - Photosensitive resin composition for color filter and color filter including the same: Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator;... Agent: Cheil Industries Inc.
20130143160 - Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound: A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the... Agent: Jsr Corporation
20130143159 - Resist composition for euv or eb, and method of forming resist pattern: A resist composition including a base component containing a polymer (A1) having a structural unit (a5) containing a group represented by general formula (a5-0-1) or (a5-0-2), wherein the amount of the monomer that derives the structural unit (a5) is not more than 100 ppm relative to (A1). In the formulas,... Agent: Tokyo Ohka Kogyo Co., Ltd.
20130143161 - Charged particle beam apparatus: An apparatus includes an irradiation device configured to irradiate an object with charged particle beams, a measurement device configured to measure a characteristic of each of charged particle beams, and a controller. The measurement device includes a plate including knife edges, and a sensor configured to detect a charged particle... Agent: Canon Kabushiki Kaisha
20130143162 - Resist-protective film-forming composition and patterning process: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a protective film-forming composition comprising a novolak resin of a bisphenol compound and a mixture of an alcohol solvent and an ether or aromatic... Agent: Shin-etsu Chemical Co., Ltd.
20130143163 - Resist-protective film-forming composition and patterning process: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer of hydroxystyrene with acenaphthylene and/or vinylnaphthalene and a mixture of an alcohol solvent and an ether or aromatic solvent.... Agent: Shin-etsu Chemical Co., Ltd.
20130143164 - Polymerizable composition: Provided is a polymerizable composition containing (A) a polymerization initiator, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, (D) a compound having a maximum absorption wavelength between 300 nm and 450 nm and assuming that the maximum absorbance between 300 nm and 450... Agent: Fujifilm Corporation
20130143165 - Photolithographed micro-mirror well for 3d tomogram imaging of individual cells: A micro-mirror well. In one embodiment the micro-mirror well includes a plurality of planar mirrors arranged around an axis of symmetry and inclined to form a pyramid well, where each of the plurality of planar mirrors is capable of reflecting light emitting from an object of interest placed inside the... Agent: Vanderbilt University
20130143166 - Resist film forming apparatus, resist film forming method, and mold original plate production method: There is provided a resist film forming apparatus including a coating unit configured to drop, rotate, and spread a resist while rotating a substrate, a heating unit configured to heat a specimen in which the resist is coated on the substrate, a metering unit configured to measure a weight of... Agent: Sony Corporation05/30/2013 > 36 patent applications in 16 patent subcategories.
20130137015 - Mask and pattern forming method: According to one embodiment, a mask used with an exposure apparatus is disclosed. The mask includes a main pattern, and a sub-pattern having a dimension smaller than a resolution limit of the exposure apparatus. The sub-pattern is arranged next to the main pattern. The sub-pattern includes a first sub-pattern arranged... Agent:
20130137016 - Phase shift focus monitor reticle, manufacturing method thereof and method for monitoring focus difference: The invention provides a phase shift focus monitor reticle, a manufacturing method thereof, and a method of monitoring focus difference using the phase shift focus monitor reticle. The phase shift focus monitor reticle comprises a shield comprising a plurality of light-transmitting portions with a certain width; and a glass layer... Agent: Shanghai Huali Microelectronics Corporation
20130137017 - Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures: Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain a plurality of distinct layers. Each of the layers has two or more characteristic parameters which are optimized through an optimization loop. Subsequently, specifications... Agent: Micron Technology, Inc.
20130137018 - Photomask constructions having liners of specified compositions along sidewalls of multi-layered structures: wherein in formula (5), Dye represents a dye structure; G1 represents NR or an oxygen atom; G2 represents a monovalent substituent group having an −Es′ value as a steric parameter of 1.5 or more; p represents an integer from 1 to 8; when p is 2 or greater, the two... Agent: Fujifilm Corporation
20130137019 - Electrophotographic photoreceptor, method for manufacturing the same, and electrophotographic photoreceptor unit, replaceable image-forming unit, and image-forming apparatus including the same: An electrophotographic photoreceptor includes a substantially cylindrical support and a coating disposed on the support and including a photosensitive layer. The coating has lines due to polishing extending in a direction crossing a circumferential direction of a surface of the photoreceptor in at least part of a region outside an... Agent: Fuji Xerox Co., Ltd.
20130137020 - Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member includes a support and a photosensitive layer. The electrophotographic photosensitive member includes a surface layer that contains a polymer produced by the polymerization of a compound having a chain-polymerizable functional group. The compound having a chain-polymerizable functional group is a compound represented by the following formula... Agent: Canon Kabushiki Kaisha
20130137021 - Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member has a surface layer that contains a polymer produced by the polymerization of a charge transporting substance having two or more methacryloyloxy groups per molecule. The surface layer contains a quinone derivative at a concentration of 5 ppm or more and 1500 ppm or less of... Agent: Canon Kabushiki Kaisha
20130137024 - Electrophotographic photosensitive member, method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: In an electrophotographic photosensitive member having a surface layer containing a polymer obtainable by polymerization of a compound having a chain-polymerizable functional group, the compound having a chain-polymerizable functional group includes a compound represented by formula (1).... Agent: Canon Kabushiki Kaisha
20130137025 - Electrophotographic photosensitive member, method of producing phthalocyanine crystal, method of producing electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and phthalocyanine crystal: Provided is an electrophotographic photosensitive member including a support and a photosensitive layer formed on the support, in which the photosensitive layer includes a phthalocyanine crystal containing a compound satisfying the following formulae (A) and (B) in itself: 8.9≦δP≦10.7 (A) and −3.2≦L≦−1.5 (B) (in the formula (A), δP represents a... Agent: Canon Kabushiki Kaisha
20130137023 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: In order to provide an electrophotographic photosensitive member with which a ghost is suppressed even under a low temperature and low humidity environment, and a process cartridge and an electrophotographic apparatus having the electrophotographic photosensitive member, the electrophotographic photosensitive member has a support, an undercoat layer formed on the support,... Agent: Canon Kabushiki Kaisha
20130137026 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member includes a support, a charge-generating layer disposed on the support, and a charge-transporting layer disposed on the charge-generating layer, in which the charge-generating layer contains a charge-generating substance and a compound represented by the formula (1). A process cartridge includes the electrophotographic photosensitive member described above.... Agent: Canon Kabushiki Kaisha
20130137022 - Image bearing member and image forming apparatus and process cartridge using the same: An image bearing member includes a substrate, a photosensitive layer overlying the substrate, and a surface protective layer overlying the photosensitive layer and having a surface comprising multiple concave structures with a maximum diameter of from 1 μm to 3 μm and a maximum depth of from 10 nm to... Agent:
20130137027 - Charge transport layer for organic photoconductors: An organic photoconductor includes an inner charge generation layer for generating charges and an outer charge transport layer for facilitating charge transport. The charge transport layer comprises a semi-interpenetrating hole-transport polymer or oligomer network in which the polymer or oligomer is cross-linked. A process for forming a charge transport layer... Agent:
20130137028 - Method of manufacturing toner carrier, device for manufacturing toner carrier, toner carrier, development agent, and process cartridge: A method of manufacturing toner carrier formed of a core and a cover thereon, including the steps of: coating the core with a liquid cover containing a solvent and a material for forming the cover on the core in a processing tank; heating the core and the cover by first... Agent:
20130137029 - Toner for electrostatic image development and image forming method: The toner for electrostatic image development contains toner particles and an external additive. The external additive includes silica fine particles whose surface is covered with a number of projections, and a number average particle diameter of the silica fine particles is 80 to 200 nm. The external additive may include... Agent:
20130137030 - Toner, developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: An electrostatic charge image developing toner includes toner particles containing a binder resin and pigment particles and an external additive containing fluorine resin particles, wherein the electrostatic charge image developing toner satisfies the following expression: 2≦A/B≦100, wherein A represents reflectance at an acceptance angle of +30° which is measured when... Agent: Fuji Xerox Co., Ltd.
20130137031 - Electrophotographic toner and method for producing the same: An electrophotographic toner produced by mixing a dispersion of colorant particles containing a colorant and a dispersion of release agent particles containing a release agent and having a volume average particle diameter smaller than that of the colorant particles, aggregating the colorant particles and the release agent particles in the... Agent: Toshiba Tec Kabushiki Kaisha
20130137032 - Method of producing gallium phthalocyanine crystal and method of producing electrophotographic photosensitive member using the method of producing gallium phthalocyanine crystal: Provided is a method of producing an electrophotographic photosensitive member having improved sensitivity and capable of outputting an image having less image defects due to a ghost phenomenon not only under a normal-temperature, normal-humidity environment but also under a low-temperature, low-humidity environment as a particularly severe condition. The method of... Agent: Canon Kabushiki Kaisha
20130137033 - Process for preparing structured organic films (sofs) via a pre-sof: A processes for preparing structured organic film (SOF) comprising a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be a multi-segment thick structured organic film.... Agent: Xerox Corporation
20130137034 - Method of pre-treating a wafer surface before applying a solvent-containing material thereon: A method for pre-treating a wafer surface before applying a material thereon. The method includes positioning the wafer on a rotating apparatus. The wafer is rotated at a first rotational speed between about 50 revolutions per minute (rpm) and about 300 rpm and for a period of about 1 second... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20130137035 - Surface active additive and photoresist composition comprising same: wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic... Agent: Rohm And Haas Electronic Materials LLC
20130137036 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film: Disclosed are a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and having a thermally polymerizable functional group at at least... Agent: Cheil Industries Inc.
20130137037 - Silicon compound, condensation product, resist compostion and pattern formation method: where R1 is each independently a hydrogen atom, a C1-C20 straight or C3-C20 branched or cyclic hydrocarbon group; a carbon atom of the hydrocarbon group may be replaced by an oxygen atom; and the hydrocarbon group may contain a fluorine atom; A is an acid decomposable group; B is a... Agent: Central Glass Company, Limited
20130137040 - Lithographic printing plate precursor and method of producing thereof: To provide an on-press development type lithographic printing plate precursor excellent in ink receptivity and printing durability. A lithographic printing plate precursor which includes a support, an image-recording layer which contains a sensitizing dye, a polymerization initiator and a polymerizable compound and an unexposed area of which is capable of... Agent: Fujifilm Corporation
20130137038 - Photoresist composition: wherein each Ra is independently a substituted or unsubstituted C1-30 alkyl group, C6-30 aryl group, C7-30 aralkyl group, or combination comprising at least one of the foregoing, Ar is a monocyclic, polycyclic, or fused polycyclic C6-30 aryl group, each Rb is independently H, F, a linear or branched C1-10 fluoroalkyl... Agent: Rohm And Haas Electronic Materials LLC
20130137042 - Photosensitive composition and photoresist: R1 is H or CH3, n is 2-40 of integer. The photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photo initiator has an amount of about 0.5-15 parts by weight relative to 100... Agent: Industrial Technology Research Institute
20130137043 - Photosensitive element having reinforcing particles and method for preparing a printing form from the element: The invention provides a photosensitive element and a method for preparing a printing form from the element. The photosensitive element includes a layer of a photosensitive composition containing a binder, a monomer, and a Norrish type II photoinitiator, wherein the photosensitive layer has a transmittance to actinic radiation of less... Agent: E I Du Pont De Nemours And Company
20130137039 - Photosensitive resin composition for color filter and color filter prepared using the same: Disclosed are a photosensitive resin composition for a color filter that includes a colorant including a phthalocyanine-based compound represented by the following Chemical Formula 1 and a triarylmethane-based compound represented by the following Chemical Formula 2, wherein the substituents of Chemical Formulas 1 and 2 are the same as same... Agent: Cheil Industries Inc.
20130137044 - Scanning apparatus, drawing apparatus, and method of manufacturing article: A scanning apparatus which performs scan on an object with a charged particle beam includes: a blanking deflector configured to individually blank a plurality of charged particle beams based on control data; a scanning deflector configured to collectively deflect the plurality of charged particle beams to perform the scan; and... Agent: Canon Kabushiki Kaisha
20130137045 - Uv glass production method: The present invention discloses a UV glass production method, comprising the steps: arranging a blade on an exposure stage; controlling the position of an exposure area on a glass substrate by regulating the position of the blade; removing a film layer from the area to be transparent; and forming a... Agent:
20130137046 - Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof: A phase difference layer laminated body used in a three-dimensional liquid crystal display device, wherein unit cells are divided into groups for left and right eyes, which are given different degrees of polarization, thereby creating a three-dimensional image, further wherein the phase difference layer laminated body has a base material... Agent: Dai Nippon Printing Co., Ltd.
20130137050 - Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device: In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data... Agent: Canon Kabushiki Kaisha
20130137049 - Method of forming polymeric compound, resist composition and method of forming resist pattern: A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO2— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from... Agent: Tokyo Ohka Kogyo Co., Ltd.
20130137047 - Method of forming resist pattern: A method of forming a resist pattern including: step (1) in which a resist composition including a base component and a photobase generator component is applied to a substrate to form a resist film; step (2) in which the resist film is subjected to immersion exposure; step (3) in which... Agent: Tokyo Ohka Kogyo Co., Ltd.
20130137048 - Resist composition and method of forming resist pattern: A resist composition containing a base component (A) which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a copolymer (A1) having a structural unit (a0) containing a group represented by the following general formula... Agent: Tokyo Ohka Kogyo Co., Ltd.05/23/2013 > 28 patent applications in 19 patent subcategories.
20130130156 - Methods of fabricating optical elements on substrates and related devices: In a method of fabricating an optical element, an alignment surface is photolithographically patterned using a birefringent mask having a holographic pattern therein to create an alignment condition in the alignment surface based on the holographic pattern. A layer is formed on the alignment surface such that local optical axes... Agent:
20130130159 - Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank: A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a halftone phase shift mask. The mask includes a transparent substrate and a pattern of halftone phase shift film of a material comprising a transition metal, silicon, nitrogen and oxygen and having an... Agent: Shin-etsu Chemical Co., Ltd.
20130130160 - Light pattern exposure method, photomask, and photomask blank: A light pattern exposure method is by irradiating ArF excimer laser light to a resist film through a photomask. The photomask includes a transparent substrate and a pattern of optical film of a material comprising a transition metal, silicon, nitrogen and oxygen, with contents thereof falling in a specific range.... Agent: Shin-etsu Chemical Co., Ltd.
20130130163 - Masks for microlithography and methods of making and using such masks: Masks for microlithography apparatus, methods for making such masks, and methods for exposing photosensitive materials to form arrays of microfeatures on semiconductor wafers using such masks. In one embodiment, a method of making a mask comprises forming a mask layer on a substrate and identifying a first opening in the... Agent: Micron Technology, Inc.
20130130158 - Method for fabricating pellicle, photo mask, and semiconductor device: An aspect of the present embodiment, there is provided a method for fabricating a pellicle, including acquiring a shape of a pellicle frame, deciding a thickness distribution of an adhesive to be coated on the pellicle frame on a basis of the acquired shape of the pellicle frame, and coating... Agent:
20130130157 - Method for manufacturing photo mask, method for manufacturing semiconductor device, and program: According to one embodiment, a method for manufacturing a photo mask, includes acquiring first data on respective shapes of a plurality of mask substrates, acquiring second data on respective shapes of a plurality of pellicles, and determining a combination of the mask substrate and the pellicle based on the first... Agent:
20130130161 - Photomask sets for fabricating semiconductor devices: Methods are provided for fabricating a semiconductor device. One method comprises providing a first pattern having a first polygon, the first polygon having a first tonality and having a first side and a second side, the first side adjacent to a second polygon having a second tonality, and the second... Agent:
20130130162 - Reticle carrier: A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges... Agent: International Business Machines Corporation
20130130164 - Polyester, pigment composition, and toner: in the formula (1) and the formula (2): R1 represents an alkyl group having 1 to 6 carbon atoms or a phenyl group; R2 to R6 each represent a hydrogen atom, a COOR7 group, or a CONR8R9 group, provided that at least one of the R2 to R6 represents the... Agent: Canon Kabushiki Kaisha
20130130165 - Toner: Provided is a toner comprising toner particles, wherein each of the toner particles has a core-shell structure composed of a core and a shell phase formed on the core, the shell phase contains a resin (B), and the core contains a binder resin (A), a colorant and a wax, wherein... Agent: Canon Kabushiki Kaisha
20130130166 - Binder resin for toner, toner and method for producing the same: A binder resin for a toner containing a vinyl resin (A), a non-crystalline polyester resin (SN) and a saturated crystalline polyester resin (SC), in which the content of the vinyl resin (A) is equal to or more than 65 mass % and equal to or less than 95 mass %,... Agent: Mitsui Chemicals, Inc.
20130130170 - Toner: Provided is a toner having an excellent low-temperature fixability and hot offset resistance, a broad fixing temperature latitude in low-temperature areas to high-temperature areas, and a high heat-resistant storage stability. The toner includes toner particles having a core-shell structure in which a shell phase containing a resin A is formed... Agent: Canon Kabushiki Kaisha
20130130168 - Toner: Provided is a toner containing toner particles, each of which includes a binder resin containing a polyester as a main component, a colorant, and a wax, in which the binder resin includes a block polymer in which a segment capable of forming a crystalline structure and a segment incapable of... Agent: Canon Kabushiki Kaisha
20130130169 - Toner: o
20130130167 - Toner for electrostatic image development: A toner for electrostatic image development containing at least a resin binder, the resin binder being composed of a crystalline resin and an amorphous resin, wherein the crystalline resin contains a crystalline polyester obtained by polycondensing an alcohol component containing an aliphatic diol having 2 to 10 carbon atoms and... Agent: Kao Corporation
20130130171 - Toner: t
20130130172 - Deinking a print: A method of deinking an image-bearing member using an organic solvent includes receiving the image-bearing member. The member has thereon a continuous or discontinuous image layer formed of toner particles that do not include colorant, and colorant particles or molecules. The colorant particles or molecules are arranged in a pattern... Agent:
20130130174 - Method of manufacturing toner: A method of manufacturing toner is provided. The method includes preparing a first liquid by dissolving or dispersing toner components in an organic solvent, preparing a second liquid by emulsifying the first liquid in an aqueous medium, and evaporating the organic solvent from the second liquid. The toner components include... Agent:
20130130173 - Method for producing toner: A method for producing a toner including the step of melt-kneading a mixture containing a resin binder and a wax with a twin-screw kneader, wherein the resin binder contains three kinds of a resin R1, a resin R2 and a resin R3 having different softening points to each other, wherein... Agent: Kao Corporation
20130130176 - Alkali-soluble resin and negative-type photosensitive resin composition comprising the same: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder... Agent: Lg Chem, Ltd.
20130130178 - Actinic-ray-or radiation-sensitive resin composition and method of forming pattern therewith: Wherein each of R1s independently represents a hydrogen atom, an alkyl group or a halogen atom, X1 represents a bivalent organic group, X2 represents a single bond or a bivalent organic group, each of Ar1s independently represents a monovalent aromatic ring group, Ar2 represents a bivalent aromatic ring group, and... Agent: Fujifilm Corporation
20130130177 - Negative pattern forming process and negative resist composition: A negative pattern is formed by applying a resist composition comprising (A) a polymer comprising recurring units (a1) having a hydroxyl group protected with an acid labile group and recurring units (a2) having an amino group, amide bond, carbamate bond or nitrogen-containing heterocycle, (B) a photoacid generator, and (C) an... Agent: Shin-etsu Chemical Co., Ltd.
20130130179 - Polysiloxane composition and pattern-forming method: A polysiloxane composition includes a polysiloxane, and a first compound. The first compound includes a nitrogen-containing heterocyclic ring structure, and a polar group, an ester group or a combination thereof. A pattern-forming method includes coating the polysiloxane composition on a substrate to be processed to provide a silicon-containing film. A... Agent: Jsr Corporation
20130130180 - Method for producing a ganled device: A method for producing a GaNLED device, wherein a stack of layers comprising at least a GaN layer is texturized, is disclosed. The method involves (i) providing a substrate comprising on its surface said stack of layers, (ii) depositing a resist layer directly on said stack, (iii) positioning a mask... Agent: Imec
20130130181 - Method of forming alignment film: A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area respectively defining a first sub-pixel area and the second sub-pixel area. In a first exposure, the photosensitive polymer material is... Agent: Innocom Technology(shenzhen)co., Ltd.
20130130182 - Apparatus and method of direct writing with photons beyond the diffraction limit: Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image... Agent: Periodic Structures, Inc.
20130130183 - Negative pattern forming process: A negative pattern is formed by applying a resist composition comprising (A) a polymer comprising recurring units (a1) having a carboxyl group protected with an acid labile group and recurring units (a2) having an amino group, amide bond, carbamate bond or nitrogen-containing heterocycle, (B) a photoacid generator, and (C) an... Agent: Shin-etsu Chemical Co., Ltd.Previous industry: Chemistry: electrical current producing apparatus, product, and process
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