|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
USPTO Class 430 | Browse by Industry: Previous - Next | All
Recent | 14: | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Radiation imagery chemistry: process, composition, or product thereofBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/13/2014 > 15 patent applications in 10 patent subcategories.
20140335447 - Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns: A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.... Agent:
20140335445 - Mask and method of manufacturing the same: A method of manufacturing a mask includes: providing a base substrate including light-absorbing layer patterns on a first surface thereof; providing a reflective layer on the light-absorbing layer patterns and the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer. The providing the... Agent: Samsung Display Co., Ltd.
20140335446 - Systems and methods for lithography masks: Structure of mask blanks and masks, and methods of making masks are disclosed. The new mask blank and mask comprise a tripe etching stop layer to prevent damages to the quartz substrate when the process goes through etching steps three times. The triple etching stop layer may comprise a first... Agent:
20140335448 - Photosensitive siloxane resin composition: [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured... Agent: Az Electronic Materials Usa Corp.
20140335449 - Magnetic toner: A magnetic toner including: magnetic toner particles containing a binder resin, a magnetic body, and a release agent; and inorganic fine particles present on the surface of the magnetic toner particles, wherein the inorganic fine particles present on the surface of the magnetic toner particles contain metal oxide fine particles,... Agent:
20140335450 - Magnetic toner: A magnetic toner is provided that exhibits an excellent electrostatic offset resistance both initially and after long-term use. The magnetic toner contains: magnetic toner particles containing a binder resin and a magnetic body; and inorganic fine particles present on the surface of the magnetic toner particles, wherein the inorganic fine... Agent:
20140335451 - Toner particles having an increased surface hardness and toners thereof: The present embodiments relate to toner particles having an increased surface hardness, and toners comprising said toner particles. More specifically, the present embodiments relate to toner particles having an average surface hardness of from about 130 mPa to about 250 mPa, comprising a core surrounded by a shell, wherein the... Agent: Xerox Corporation
20140335453 - Method for producing resist composition: Provided by the present invention is a method for producing a resist composition, especially a silicon-containing resist underlayer film composition, with fewer film defects, the composition used in immersion exposure, double patterning, development by an organic solvent, and so forth. Specifically, provided is a method for producing a resist composition... Agent: Shin-etsu Chemical Co., Ltd.
20140335452 - Positive photosensitive siloxane composition: A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be... Agent: Az Electronic Materials Usa Corp.
20140335454 - Underlayer composition and method of imaging underlayer: A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate.... Agent:
20140335455 - Underlayer composition and method of imaging underlayer composition: A method of forming a pattern comprises diffusing an acid formed by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer having acid decomposable groups and attachment groups covalently bonded to the surface of the substrate and/or forming an interpolymer crosslink. Diffusing comprises heating... Agent:
20140335456 - Method of improving print performance in flexographic printing plates: A method of tailoring the shape of a plurality of relief printing dots created in a photosensitive printing blank during a platemaking process including the steps of: (a) selectively exposing at least one photocurable layer to a source of actinic radiation to selectively crosslink and cure the at least one... Agent: Macdermid Printing Solutions, LLC
20140335457 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between... Agent: Asml Netherlands B.v.
20140335458 - Optical air slit and method for manufacturing optical air slits: A structure having an optical slit therein. The structure includes a substrate having an opening therethrough and a metal layer disposed on the substrate, such metal layer having a photolithographically formed slit therein, such slit being narrower than the opening and being disposed over the opening, portions of the metal... Agent: Raytheon Company
20140335459 - Method of forming polymer nanofiber metal-nanoparticle composite pattern: A method of forming a polymer nanofiber-metal nanoparticle composite pattern includes forming on a substrate a polymer nanofiber layer comprising polymer nanofibers made from polymers including a heteroaryl group; selectively exposing to UV-ozone a part of the polymer nanofiber layer through an aperture of a mask; selectively removing a part... Agent: Industry-academic Cooperation Foundation, Yonsei University11/06/2014 > 13 patent applications in 12 patent subcategories.
20140329172 - Anisotropic optical material: A method for producing a material with anisotropic optical properties, the method comprising: fabricating a patterned mask with alternating opaque and transparent regions; assembling a stack containing one or more layers of photosensitive material; and exposing the photosensitive material through the mask to photographically reproduce the pattern or its inverse.... Agent:
20140329174 - Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic... Agent: Hoya Corporation
20140329173 - Reticles for use in forming implant masking layers and methods of forming implant masking layers: In one example, a reticle disclosed herein includes a body having a center, an arrangement of a plurality of exposure patterns, wherein a center of the arrangement is offset from the center of the body, and at least one open feature defined on or through the body of the reticle.... Agent:
20140329175 - Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head: A photosensitive negative resin composition containing a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cation moiety structure represented by the formula b1 defined in the description and an anion moiety structure represented by the formula b2 defined in... Agent:
20140329176 - Toner and image forming method: Provided is a toner that allows a transferred image to be stably output regardless of smoothness of a transfer material even under high-temperature and high-humidity environment or under low-temperature and low-humidity environment, that is excellent in cleanability for a transfer member even at the time of high-speed printing, and that... Agent: Canon Kabushiki Kaisha
20140329177 - Cyclic compound, method for producing same, radiation-sensitive composition, and resist pattern formation method: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):... Agent:
20140329178 - Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method: A cyclic compound of the present invention has a molecular weight of 500 to 5000, and is represented by the following formula (1):... Agent: Mitsubishi Gas Chemical Company,inc
20140329179 - Methods of forming semiconductor device structures, and related semiconductor device structures: A method of forming a semiconductor device structure comprises forming a template material over a substrate, the template material exhibiting preferential wetting to a polymer block of a block copolymer. A positive tone photoresist material is formed over the template material. The positive tone photoresist material is exposed to radiation... Agent: Micron Technology, Inc.
20140329180 - Method of fabricating substrate for organic light-emitting device: A substrate for an organic light-emitting device which can improve the light extraction efficiency of an organic light-emitting device while realizing an intended level of transmittance, a method of fabricating the same, and an organic light-emitting device having the same. Light emitted from the OLED is emitted outward through the... Agent: Samsung Corning Precision Materials Co., Ltd.
20140329181 - Method of manufucturing liquid ejection head: A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film... Agent: Canon Kabushiki Kaisha
20140329182 - Method for producing layered materials using long-lived photo-induced active centers: The invention relates to a method for applying a photo-activated layered polymer coating to a substrate material in which one or more layers do not contain photoinitiator, or are not exposed to initiating light, but cure due to migration of cationic active centers. At least two separate monomer layers are... Agent:
20140329183 - Chemically amplified negative resist composition and patterning process: A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms... Agent: Shin-etsu Chemical Co., Ltd.
20140329184 - Stabilized choline solutions and methods for preparing the same: A method for the stabilization of an aqueous choline hydroxide solution includes, optionally adding a first stabilizer of a dithionite salt and/or a dialkylhydroxylamine to an aqueous solution containing reactants that will produce an aqueous choline hydroxide solution; and after the aqueous choline hydroxide solution is formed, adding a second... Agent: Taminco10/30/2014 > 23 patent applications in 13 patent subcategories.
20140322634 - Mask black, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: A mask blank for manufacturing a transfer mask adapted to be applied with ArF excimer laser exposure light that has a transparent substrate and a light-shielding film formed into a transfer pattern. The light-shielding film has at least two-layers, one a lower layer composed mainly of a first material containing... Agent: Hoya Corporation
20140322637 - Electrophotographic photosensitive member, method for manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: In an electrophotographic photosensitive member including a charge-generating layer, the charge-generating layer has a matrix-domain structure; in the matrix-domain structure, the domain contains a charge-generating substance, and the matrix contains a binder resin and a fluoranthene compound.... Agent: Canon Kabushiki Kaisha
20140322636 - Electrophotographic photosensitive member, process cartridge, electrophotographic apparatus, and imide compound: An electrophotographic photosensitive member includes a support, an undercoat layer formed on the support, and a photosensitive layer formed on the undercoat layer, in which the undercoat layer contains a polymerized product of a compound represented by the formula (1) or a polymerized product of a composition containing a compound... Agent: Canon Kabushiki Kaisha
20140322638 - Alcohol-soluble hole transport materials for organic photoconductor coatings: An alcohol-soluble organic coating including a hole transport material formed on a surface of organic photoconductor is provided. The coating comprises a cationic alternate fluorene-based copolymer with phosphonium salt terminal groups embedded in an in-situ cross-linked polymer.... Agent: Hewlett-packard Development Company, L.p.
20140322639 - Magnetic toner: A magnetic toner contains magnetic toner particles containing a binder resin, a release agent, and a magnetic body and inorganic fine particles present on the surface of the magnetic toner particles, wherein the inorganic fine particles present on the surface of the magnetic toner particles contain metal oxide fine particles,... Agent:
20140322640 - Magnetic toner: A magnetic toner containing: magnetic toner particles containing a binder resin and a magnetic body; and inorganic fine particles present on the surface of the magnetic toner particles, wherein the inorganic fine particles present on the surface of the magnetic toner particles contain silica fine particles and alumina fine particles... Agent: Canon Kabushiki Kaisha
20140322644 - Positively chargeable toner for electrostatic image development and developer: A positively chargeable toner for electrostatic image development according to the present disclosure is formed by aggregating at least binder resin-containing fine particles and colorant-containing fine particles in an aqueous medium in the presence of a dispersing agent and a metal ion to form fine particle aggregates and heating the... Agent: Kyocera Document Solutions Inc.
20140322642 - Biophenols for polyester toner resins: The present disclosure provides a polyester toner resin comprising a natural phenol used in manufacturing a toner for imaging devices.... Agent: Xerox Corporation
20140322641 - Polyester resins comprising gallic acid and derivatives thereof: The present disclosure provides a polyester toner resin comprising gallic acid for use in manufacturing an emulsion aggregation (EA) toner for imaging devices.... Agent: Xerox Corporation
20140322643 - Toner and developer: A toner including a non-crystalline polyester resin and a crystalline polyester resin, wherein a tetrahydrofuran soluble component of the non-crystalline polyester resin has a weight-average molecular weight of 3,000 to 8,000 measured by gel permeation chromatography, and wherein the toner has a glass transition temperature A before an extraction process... Agent:
20140322645 - Digital embossing and creasing sheet: A method of printing and embossing a receiver is disclosed. The method includes depositing a pattern of image toner on a side of an image bearing receiver, the image toner including toner particles; fixing the pattern of image toner onto the receiver; depositing an embossing pattern of embossing particles on... Agent:
20140322646 - Ablation imageable lithographic printing plate: A positive-working, ablation-imagable lithographic printing plate precursor can be imaged and used for lithographic printing without wet processing. This precursor has a sulfuric acid or phosphoric acid anodized aluminum-containing substrate, a crosslinked hydrophilic inner layer comprising a crosslinked polymer derived by using a crosslinking agent that comprises at least two... Agent:
20140322648 - Compositions and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched... Agent: Rohm And Haas Electronic Materials LLC
20140322649 - Method of improving surface cure in digital flexographic printing plates: A photocurable relief image printing element is described. The photocurable relief image printing element comprises (a) a support layer; (b) one or more photocurable layers disposed on the support layer, wherein the one or more photocurable layers comprise: (i) a binder; (ii) one or more monomers; (iii) a photoinitiator; and... Agent:
20140322647 - Photosensitive compositions and applications thereof: The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.... Agent: Promerus, LLC
20140322650 - Patterning process and resist composition: A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units of formulae (1) and (2) and a photoacid generator of formula (3) onto a substrate, baking, exposure, PEB and developing in an organic solvent. In formulae (1) and (2), R1 is H, F, CH3... Agent: Shin-etsu Chemical Co., Ltd.
20140322651 - Photosensitive polysiloxane composition, protecting film and element having the protecting film: A photosensitive polysiloxane composition including a nitrogen-containing heterocyclic compound (A), a polysiloxane (B), an o-naphthoquinone diazide sulfonate (C), and a solvent (D) is provided. The nitrogen-containing heterocyclic compound (A) is selected from the group consisting of compounds represented by formulas (1) to (4):... Agent: Chi Mei Corporation
20140322652 - Resist composition and method of forming resist pattern: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a... Agent: Tokyo Ohka Kogyo Co., Ltd.
20140322653 - Drawing apparatus, and method of manufacturing article: The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, including a stage configured to hold the substrate and be moved, a charged particle optical system configured to irradiate a plurality of charged particle beams arrayed along a first axis, and a... Agent: Canon Kabushiki Kaisha
20140322654 - Lithography apparatus, and method for manufacturing article: A lithography apparatus for substrate patterning, includes a substrate stage having a reference mark, an optical system irradiating the substrate with the charged particle beam, a first measurement device measuring a position of an alignment mark formed on the substrate, a second measurement device having an optical axis apart from... Agent: Canon Kabushiki Kaisha
20140322655 - Stage apparatus, lithography apparatus, and method of manufacturing article: A stage apparatus includes first, second, third, and fourth stages arranged along a plane defined by first and second axes orthogonal to each other, each of the first to fourth stages holding an article and being subjected to scanning along the plane, and a controller configured to control the scanning... Agent: Canon Kabushiki Kaisha
20140322656 - Method of patterning a device: A photoresist layer comprising a fluorinated photoresist material is formed on a device substrate and exposed to patterned radiation. The exposed photoresist layer is contacted with a developing agent to remove a portion of the exposed photoresist layer in accordance with the patterned light, thereby forming a developed structure having... Agent:10/23/2014 > 14 patent applications in 13 patent subcategories.
20140315122 - Pellicle and an assembly of photomask plus pellicle: A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws and elastic body layer; in particular the pellicle frame is screwed to the photomask while the sealing of... Agent: Shin-etsu Chemical Co., Ltd.
20140315123 - Clear toner composition: p
20140315124 - Method of producing electrophotographic photosensitive member, method of producing organic device, and emulsion for charge transporting layer: Provided are a method of producing an electrophotographic photosensitive member, particularly, a method of producing an electrophotographic photosensitive member and an organic device by which, in a method of forming a charge transporting layer, the stability of an application liquid for the layer after long-term storage is improved while the... Agent:
20140315127 - Single component developer composition: Emulsion aggregation toner comprising: a resin; a wax; a colorant; an encapsulating shell; and a silica external additive comprising: first silica particles comprising fumed silica particles surface treated with octyldimethylsiloxane and having average particle diameter about 6-20 nm, present in amount of about 0.1-1% by weight of the toner; second... Agent: Xerox Corporation
20140315125 - Magnetic toner: The magnetic toner contains magnetic toner particles containing a binder resin and a magnetic body, and inorganic fine particles present on the surface of the magnetic toner particles, wherein the inorganic fine particles present on the surface of the magnetic toner particles comprise metal oxide fine particles, wherein the metal... Agent:
20140315126 - Magnetic toner: when a coverage ratio A (%) is a coverage ratio of the magnetic toner particle's surface by the inorganic fine particles and a coverage ratio B (%) is a coverage ratio of the magnetic toner particle' surface by the inorganic fine particles that are fixed to the magnetic toner particle's... Agent: Canon Kabushiki Kaisha
20140315128 - Method for creating a scratch-off document: A method for creating a scratch-off document having hidden information, the method includes providing a substrate; depositing a first layer of first toner particles on the substrate, wherein the first layer includes at least two thicknesses in which one region is thicker than the other region; depositing a second layer... Agent:
20140315129 - Mask forming imageable material and use: An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing... Agent:
20140315130 - Photoacid generators and lithographic resists comprising the same: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.... Agent: University Of North Carolina At Charlotte
20140315131 - Developer and patterning process: An aqueous solution containing 0.1-20 wt % of a benzyltrialkylammonium hydroxide is a useful developer for photosensitive resist materials. When an exposed resist film is developed in the developer, any swell of the resist film during development is suppressed. A resist pattern with minimal edge roughness can be formed while... Agent: Shin-etsu Chemical Co., Ltd.
20140315132 - Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element: The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a... Agent: E I Du Pont De Nemours And Company
20140315133 - Method for fabricating a circuit: A method for fabricating a circuit, by defining a first set of resist features on a substrate and corresponding to a first mask layout, followed by defining a second set of resist features on the substrate corresponding to a second mask layout, wherein the second set adds to the first... Agent:
20140315134 - Method and apparatus for manufacturing donor substrate: In a method and apparatus for manufacturing a donor substrate, a pattern layer which exposes a surface of a substrate is arranged on the substrate, and an organic material is deposited on the exposed surface of the substrate. The pattern layer includes a film pattern that defines a plurality of... Agent:
20140315135 - Euv resist sensitivity reduction: A method for patterning a substrate is described. The method includes forming a layer of radiation-sensitive material on a substrate, and preparing a pattern in the layer of radiation-sensitive material using a lithographic process, wherein the pattern is characterized by a critical dimension (CD) and a roughness. Following the preparation... Agent:Previous industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
RSS FEED for 20141113:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.
Results in 0.435 seconds