Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents
FreshPatents.com Logo    FreshPatents.com icons
Monitor Keywords Patent Organizer File a Provisional Patent Browse Inventors Browse Industry Browse Agents



USPTO Class 430  |  Browse by Industry: Previous - Next | All     monitor keywords
Recent  |  14: Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan |  | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn |  | 2008 | 2007 |

Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
07/24/2014 > 23 patent applications in 14 patent subcategories.

20140205935 - Adjustable photo-mask: An adjustable photo-mask for providing variable properties is proposed. The adjustable photo-mask includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality... Agent: National Kaohsiung University Of Applied Sciences

20140205938 - Euv mask and method for forming the same: An extreme ultraviolet (EUV) mask can be used in lithography, such as is used in the fabrication of a semiconductor wafer. The EUV mask includes a low thermal expansion material (LTEM) substrate and a reflective multilayer (ML) disposed thereon. A capping layer is disposed on the reflective ML and a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140205936 - Mask blank for reflection-type exposure, and mask for reflection-type exposure: A reflective exposure mask blank and a reflective exposure mask are provided, and the mask enables accurate exposure and transcription without having light being reflected from areas other than a circuit pattern area. The reflective mask blank has, on a substrate (11), a multilayer reflective film (12), a protective film... Agent: Toppan Printing Co., Ltd.

20140205937 - Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: A mask blank is used for manufacturing a binary mask adapted to be applied with ArF excimer laser exposure light and has a light-shielding film for forming a transfer pattern on a transparent substrate. The light-shielding film has a laminated structure of a lower layer and an upper layer and... Agent: Hoya Corporation

20140205934 - Single reticle approach for multiple patterning technology: A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a second portion with a second layout pattern for multiple patterning the layer of the integrated circuit die.... Agent: Xilinx, Inc.

20140205939 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes a conductive substrate, and a photosensitive layer provided on the conductive substrate, and an outermost surface layer of the electrophotographic photoreceptor is constituted with a polymerized product or crosslinked product of a composition including at least one selected from reactive compounds represented by the formulae (I)... Agent: Fuji Xerox Co., Ltd.

20140205940 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: In an electrophotographic photosensitive member including a support, and a photosensitive layer formed on the support, a surface layer of the electrophotographic photosensitive member includes specific resin (α), resin (β) and compound (γ).... Agent: Canon Kabushiki Kaisha

20140205941 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The charge transporting layer as the surface layer of an electrophotographic photosensitive member includes a charge transporting substances represented by any one of formulae (1) to (5), a specific compound, and a specific resin (binder resin). The specific compound is hexanol, heptanol, cyclohexanol, benzyl alcohol, ethylene glycol, 1,4-butanediol, 1,5-pentanediol, diethylene... Agent: Canon Kabushiki Kaisha

20140205943 - Toner: Since a charge amount of a toner and a charge rise characteristic thereof are liable to be influenced by the change in temperature and humidity condition, the change in image density occurs in printing, and in particular, in high temperature and high humidity environment, inconveniences, such as image fogging, occur... Agent: Canon Kabushiki Kaisha

20140205942 - Toner additives: The disclosure relates generally to toner additives, and in particular, toner additives that provide desired higher and stable toner charge. The toner additives comprise silica nanotubes in combination with or in place of the commonly used silica or titania particulate additives.... Agent: Xerox Corporation

20140205944 - Toner for developing electrostatic images: e

20140205945 - Charge controlling agent and toner using same: To provide a charge controlling agent for electrophotography, which presents sufficient triboelectric chargeability to a toner, is useful particularly for a color toner and further for a polymerized toner, increases a charge rising rate, has a high electric charge amount, is excellent in charging characteristics, stability over time and environmental... Agent: Hodogaya Chemical Co., Ltd.

20140205946 - Method of producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: Provided is a method of producing an electrophotographic photosensitive member including a support and a surface layer formed on the support, the method including the steps of forming a coat of a surface-layer coating solution, and drying the coat to form the surface layer, in which the surface-layer coating solution... Agent: Canon Kabushiki Kaisha

20140205947 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by... Agent: Fujifilm Corporation

20140205949 - Photocurable resin composition and novel siloxane compound: Disclosed is a photocurable resin composition that is alkali-developable, provides a cured product having excellent adhesiveness and scratch resistance, and is useful as a hard-coat material for an image display surface of an image display device. Also disclosed is a novel siloxane compound that is useful as a resin component... Agent: Adeka Corporation

20140205948 - Self-imageable layer forming polymer and compositions thereof: Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k,... Agent: Promerus, LLC

20140205950 - Coating composition for duv filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by... Agent: Samsung Electronics Co., Ltd.

20140205951 - Thermal crosslinking accelerator, polysiloxane-containing resist underlayer film forming composition containing same, and patterning process using same: wherein R11, R12, R13, and R14 each represents a hydrogen atom, a halogen atom, a linear, a branched, a cyclic alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or an aralkyl group having 7 to 20 carbon atoms, wherein... Agent: Shin-etsu Chemical Co., Ltd.

20140205953 - Method for forming semiconductor device: A method for forming a semiconductor device comprises the following steps: first, a substrate is provided, a first photo-etching process is carried out with a first photomask to form at least one device structure and a plurality of compensation structures, wherein the first photomask comprises at least one device pattern... Agent: United Microelectronics Corp.

20140205952 - Methods of forming patterns for semiconductor device structures: Methods of forming a pattern in a semiconductor device structure include deprotecting an outer portion of a first photosensitive resist material, forming a second photosensitive resist material, exposing portions of the first and second photosensitive resist materials to radiation, and removing the deprotected outer portion of the first photosensitive resist... Agent: Micron Technology, Inc.

20140205954 - Method for forming patterns of semiconductor device by using mixed assist feature system: A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for restricting pattern distortion of the contact holes in an area outside of the array of the contact holes,... Agent: Sk Hynix Inc.

20140205955 - Method of forming tight-pitched pattern: A method of forming a tight-pitched pattern. A target pattern including a plurality of first stripe patterns is provided. Each of the first stripe patterns has a first width and a first length. A photomask includes a plurality of second stripe patterns corresponding to the first stripe patterns is provided.... Agent: Nanya Technology Corp.

20140205956 - Method for forming resist pattern: A method for forming a negative type resist pattern having a high residual film rate of exposed areas of a resist film by heating an exposed resist film and subjecting it to patterning by negative type development with a developing solution containing an organic solvent, in which a resist composition... Agent: Tokyo Ohka Kogyo Co., Ltd

  
07/17/2014 > 24 patent applications in 20 patent subcategories.

20140199615 - Method to print contact holes at high resolution: A two-dimensional dense array of contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque lines. The openings in the quadrupole illumination lens are aligned along the perpendicular directions of the opaque lines.... Agent: International Business Machines Corporation

20140199616 - Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging device, and novel dipyrromethene metal complex compound or tautomer thereof: A colored composition including a dipyrromethene metal complex compound represented by the following formula (I) or a tautomer thereof:... Agent: Fujifilm Corporation

20140199617 - Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent... Agent: Fujifilm Corporation

20140199618 - Methods of measuring overlay errors in area-imaging e-beam lithography: One embodiment relates to a method of measuring overlay errors for a programmable pattern, area-imaging electron beam lithography apparatus. Patterned cells of an overlay measurement target array may be printed in swaths such that they are superposed on patterned cells of a first (base) array. In addition, the overlay array... Agent: Kla-tencor Corporation

20140199619 - Electrophotographic photoreceptor, method for manufacturing same, and electrophotographic apparatus using same: A layered, positively-charged electrophotographic photoreceptor, a method for manufacturing the photoreceptor and an electrophotographic apparatus using the photoreceptor are disclosed. The layered, positively-charged electrophotographic photoreceptor includes a conductive support on which is provided a sequential stack composed of a charge transport layer containing at least a first hole transport material... Agent: Fuji Electric Co., Ltd.

20140199620 - Electrophotographic photoconductor, image forming apparatus, and process cartridge: An electrophotographic photoconductor, including: an electroconductive substrate; and at least a photoconductive layer and a surface layer in this order over the electroconductive substrate, wherein the surface layer includes a resin having no charge transport properties, and first inorganic fine particles, and wherein the first inorganic fine particles are inorganic... Agent:

20140199621 - Developer, method of manufacturing the same and toner cartridge: A toner or developer is provided having toner particles which exhibit a higher glass transition temperature on their surface than the interior thereof. In one aspect, the toner particles contain a crystalline polyester resin, an amorphous polyester resin and a coloring material, in which the core of the toner particles... Agent: Kabushiki Kaisha Toshiba

20140199622 - Erasable toner: According to one embodiment, an erasable toner of the present embodiment includes a binder resin, an electron donating coloring agent, an electron accepting developer, and a discoloring temperature regulating agent, in which when measuring for the first time by differential thermal scanning calorimetry, an endothermic peak temperature Tg of the... Agent: Toshiba Tec Kabushiki Kaisha

20140199623 - Tuning toner gloss with bio-based stabilizers: The disclosure describes a process to produce toner with tunable gloss levels comprising a stabilizer to freeze particle growth following aggregation, where the stabilizer does not chelate metal ions.... Agent: Xerox Corporation

20140199624 - Method of preparing environment-friendly toner: A method of preparing a toner. A toner having a low residual VOC content, a narrow particle size distribution, excellent fixing properties at low temperature, and high image quality may be prepared using the method by which a polyester resin dispersion is prepared by adding ingredients to a single reactor... Agent:

20140199625 - Preparing amorphous polyester resin emulsions: A process for making a latex emulsion including contacting at least one amorphous polyester resin with at least two organic solvents to form a resin mixture, adding a neutralizing agent, and deionized water to the resin mixture, removing the solvent from the formed latex, and separating the solvent from water.... Agent: Xerox Corporation

20140199626 - Method of manufacturing erasable toner: According to one embodiment, a method of manufacturing an erasable toner includes washing toner particles including therein a coloring material that is erasable by heating and a binder resin to obtain a toner cake having the amount of water of 20% by weight to 60% by weight, and drying the... Agent: Toshiba Tec Kabushiki Kaisha

20140199627 - Method and apparatus for concentrating an ink for an electrostatic printing process: c

20140199628 - Lithographic material stack including a metal-compound hard mask: A lithographic material stack including a metal-compound hard mask layer is provided. The lithographic material stack includes a lower organic planarizing layer (OPL), a dielectric hard mask layer, and the metal-compound hard mask layer, an upper OPL, an optional anti-reflective coating (ARC) layer, and a photoresist layer. The metal-compound hard... Agent: International Business Machines Corporation

20140199631 - Monomer, polymer, resist composition, and patterning process: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3 and R2 is H or an acid labile group. A resist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic... Agent: Shin-etsu Chemical Co., Ltd.

20140199630 - Sulfonium salt, resist composition and patterning process: wherein R represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms at least one or more of the hydrogen atoms of which are substituted by a fluorine atom, R0 represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1... Agent: Shin-etsu Chemical Co., Ltd.

20140199629 - Sulfonium salt, resist composition, and patterning process: e

20140199632 - Patterning process, resist composition, polymer, and monomer: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, PEB, and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring... Agent: Shin-etsu Chemical Co., Ltd.

20140199633 - Process for producing liquid ejection head: A process for producing a liquid ejection head by providing, in one chip, a liquid ejection head having a portion for ejection in which an ejection orifice array is arranged and a side portion having no ejection orifice array, these portions being provided with a member of a photosensitive material,... Agent: Canon Kabushiki Kaisha

20140199634 - Method of measuring a characteristic: During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used... Agent: Asml Netherlands B.v.

20140199635 - Processing apparatus and device manufacturing method: A processing apparatus for processing a substrate chucked by a chuck installed on a stage includes: a conveying unit configured to convey the substrate to the chuck; a robot configured to selectively convey, to the stage, a pressing member capable of pressing the substrate to reduce a warp of the... Agent: Canon Kabushiki Kaisha

20140199636 - Sub-diffraction-limited patterning and imaging via multi-step photoswitching: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength... Agent:

20140199637 - Pattern forming process: A pattern is formed by coating a first chemically amplified positive resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn soluble in alkaline developer upon elimination of the acid labile group, a photoacid generator, and a first organic solvent, onto a... Agent: Shin-etsu Chemical Co., Ltd.

20140199638 - Negative developing method and negative developing apparatus: After a developing step, a substrate is spun at high speeds without supplying a cleaning liquid to a surface of the substrate. This causes a large centrifugal force to act on a developer on a resist film. Consequently, the developer can be removed rapidly from the surface of the substrate.... Agent: Sokudo Co., Ltd.

  
07/10/2014 > 10 patent applications in 9 patent subcategories.

20140193748 - Visible light photoinitiating system for preparing high diffraction efficiency hologram optical polymer material: The present invention provides a visible light photoinitiating system for preparing a holographic photopolymer material with high-diffraction efficiency. The photoinitiating system comprises a photosensitizer and a co-initiator, and its mechanism is that the photosensitizer transforms from ground state to excited state after absorbing photons, and then interacts with the co-initiator... Agent:

20140193749 - Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent... Agent: Fujifilm Corporation

20140193750 - Electrostatic charge image developing toner, electrostatic charge image developer, and toner cartridge: An electrostatic charge image developing toner includes toner particles; and an external additive that is externally added to surfaces of the toner particles, in which a content of nitrogen atoms on the surfaces of the toner particles is from 0-8 atomic % to 5.0 atomic % and a content of... Agent: Fuji Xerox Co., Ltd.

20140193751 - Toner set, image forming apparatus, and image forming method: Provided is a toner set including a brilliant toner containing a brilliant pigment and at least one kind of color toner containing a colorant, in which a ratio (G′ A/G′B) of G′A to G′B satisfies a relationship of 1≦G′A/G′B≦10, when a storage modulus in 120° C. of the brilliant toner... Agent:

20140193753 - Composition for forming a developable bottom antireflective coating: The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for... Agent: Az Electronic Materials Usa Corp.

20140193752 - Stabilized acid amplifiers: There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.... Agent: The Research Foundation Of State University Of New York

20140193754 - Compositions of neutral layer for directed self assembly block copolymers and processes thereof: where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4... Agent: Az Electronic Materials (luxembourg) S.a.r.l.

20140193755 - Amplification method for photoresist exposure in semiconductor chip manufacturing: An electrical field is applied through an extreme ultraviolet (EUV) photoresist layer along a direction perpendicular to an interface between the EUV photoresist layer and an underlying layer. Secondary electrons and thermal electrons are accelerated along the direction of the electrical field, and travel with directionality before interacting with the... Agent: International Business Machines Corporation

20140193756 - Process for producing a liquid ejection head: A process for producing a liquid ejection head including, on a substrate, a flow path forming member forming ejection orifices and a liquid flow path communicating therewith, including forming, on the substrate, a first layer of photosensitive resin; forming, on the first layer, a mask layer in which at least... Agent: Canon Kabushiki Kaisha

20140193757 - Compositon for forming metal oxide-containing film and patterning process: The invention provides a composition for forming a metal oxide-containing film comprising, as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1), as a component (B), an aromatic compound shown... Agent: Shin-etsu Chemical Co., Ltd.

  
07/03/2014 > 28 patent applications in 15 patent subcategories.

20140186751 - Apparatus of repairing a mask and a method for the same: An apparatus includes a probe tip configured to contact the mask, a cantilever configured to mount the probe tip wherein the cantilever includes a mirror, an optical unit having a light source projecting a light beam on the mirror and a light detector receiving a reflected light beam from the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140186750 - Lithography mask repairing process: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography... Agent:

20140186754 - Method for manufacturing reflective mask and apparatus for manufacturing reflective mask: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the... Agent: Shibaura Mechatronics Corporation

20140186753 - Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank: The present invention relates to a reflective mask blank containing in this order, a substrate, a multilayer reflective film that reflects exposure light, and an absorber layer that absorbs the exposure light, in which the reflective mask blank further contains a fiducial mark indicating a reference position of the multilayer... Agent: Asahi Glass Company, Limited

20140186752 - Reflective mask blank for euv lithography, and process for its production: A process for producing a reflective mask blank for EUV lithography (EUVL), which comprises forming a multilayer reflective film for reflecting EUV light on a film-forming surface of a substrate, then forming a protective layer for protecting the multilayer reflective film, on the multilayer reflective film, and forming an absorber... Agent: Asahi Glass Company, Limited

20140186755 - Exposure apparatus and method of device fabrication: The present invention provides an exposure apparatus which exposes a substrate, the apparatus including an adjustment unit configured to adjust an oxygen concentration in a space between the projection optical system and the substrate, a measuring unit configured to measure an illuminance of light applied to the substrate, and a... Agent: Canon Kabushiki Kaisha

20140186756 - Crosslinkable urethane acrylate charge transport molecules for overcoat: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from a curable composition including a urethane methacrylate functional charge transport molecule, and a photoinitiator. The urethane acrylate functional charge transport molecule is a reaction product of hydroxyl functional... Agent: Lexmark International, Inc.

20140186758 - Photo conductor overcoat comprising radical polymerizable charge transport molecules and hexa-functional urethane acrylates: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from an (UV) ultraviolet curable composition including a urethane resin having at least six radical polymerizable functional groups and a charge transport molecule having at least one radical polymerizable... Agent: Lexmark International, Inc.

20140186757 - Wear resistant urethane hexaacrylate materials for photoconductor overcoats: An overcoat layer for an organic photoconductor drum of an electrophotographic image forming device is provided. The overcoat layer is prepared from a curable composition including a urethane resin having at least six radical polymerizable functional groups. The at least six radical polymerizable functional groups may include acrylate group, methacrylate... Agent: Lexmark International, Inc.

20140186759 - Electrostatic charge image development toner: An electrostatic charge image development toner contains a plurality of toner particles. The plurality of toner particles are each formed to have resin particulates in a surface layer. The resin particulates each include a particulate core and a coating layer covering the particulate core. The particulate core contains a quaternary... Agent: Kyocera Document Solutions Inc.

20140186762 - Toner: A toner having good environmental stability, low-temperature fixability, development durability, and storage stability is provided. A toner includes toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer is obtained by polymerizing a compound having a specific structure. The surface layers have a... Agent:

20140186760 - Toner: A toner having good development durability, storage stability, environmental stability, and low-temperature fixability is provided. The toner contains toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer contains a unit having a specific structure. The average thickness Dav. of the surface layers... Agent:

20140186761 - Toner: A toner having good development durability, storage stability, environmental stability, and low-temperature fixability is provided. The toner contains toner particles each including a surface layer that contains an organic silicon polymer. The organic silicon polymer contains a specific unit. In a chart obtained by 29Si-NMR measurement of THF insoluble components... Agent:

20140186763 - Liquid developer: A liquid developer containing toner particles containing a resin and a pigment, and an insulating liquid, the toner particles being dispersed in the insulating liquid, wherein the insulating liquid contains an olefin having 12 carbon atoms or more and 18 carbon atoms or less in an amount of 10% by... Agent: Kao Corporation

20140186764 - Method for producing liquid developer: A method for producing a liquid developer containing toner particles containing a resin containing a polyester and a pigment, and an insulating liquid, wherein the toner particles are dispersed in the insulating liquid, including: step 1: melt-kneading the resin and the pigment, and pulverizing a melt-kneaded mixture to provide toner... Agent: Kao Corporation

20140186765 - Photosensitive resin composition and cured product thereof: An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having... Agent: Nippon Kayaku Kabushiki Kaisha

20140186766 - Resin composition for masks: The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in... Agent:

20140186767 - Acid generators and photoresists comprising same: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a first onium salt acid generator that produces a first acid upon exposure of the photoresist composition to activating radiation; and (iii) a... Agent: Rohm And Haas Electronic Materials LLC

20140186768 - Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400... Agent: Cheil Industries Inc.

20140186770 - Dendritic compounds, photoresist compositions and methods of making electronic devices: Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well... Agent:

20140186771 - Radiation-sensitive resin composition, polymer, compound, and method for producing compound: A radiation-sensitive resin composition includes a polymer that includes a structural unit represented by a formula (1), and an acid generator. R1 is a hydrogen atom, a fluorine atom, or the like. R2 is a hydrogen atom or a monovalent hydrocarbon group. R3 is a hydrogen atom, a monovalent chain... Agent: Jsr Corporation

20140186769 - Resist composition, method for forming resist pattern, and high-molecular weight compound: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid,... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140186772 - Photoresist pattern trimming methods: Provided are methods of trimming a photoresist pattern. The methods comprise: (a) providing a semiconductor substrate; (b) forming a photoresist pattern on the substrate, wherein the photoresist pattern is formed from a chemically amplified photoresist composition comprising: a matrix polymer comprising an acid labile group; a photoacid generator; and a... Agent:

20140186773 - Coating material and method for photolithography: Provided is a method including providing a substrate and forming a bottom anti-reflective coating (BARC) on the substrate. The BARC includes a first portion overlying a second portion, which has a different composition than the first portion. The different composition may provide a different dissolution property of the BARC in... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140186774 - Acid-strippable silicon-containing antireflective coating: A silicon-containing antireflective coating formulation comprising: (i) an aqueous base insoluble organosilicon component having a multiplicity of hydrocarbon groups derivatized with hydroxy groups in the absence of Si—O—C and Si—O—H moieties; (ii) a vinylether component having a multiplicity of vinylether groups; and (iii) a casting solvent. Also disclosed is a... Agent: International Business Machines Corporation

20140186775 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition: A monomer for a hardmask composition is represented by the following Chemical Formula 1,... Agent:

20140186776 - Phenolic resin and material for forming underlayer film for lithography: There is provided a novel phenolic resin which can be used as a coating agent or a resist resin for a semiconductor, which has a high carbon concentration and a low oxygen concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility,... Agent: Mitsubishi Gas Chemical Company, Inc.

20140186777 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition: A monomer for a hardmask composition represented by the following Chemical Formula 1,... Agent:

Previous industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion


######

RSS FEED for 20140724: xml
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.

######

Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.



Results in 0.37384 seconds

PATENT INFO