Radiation imagery chemistry: process, composition, or product thereof inventions

20090263730 - Extreme ultra violet lithography mask and method for fabricating the same: A method for fabricating an extreme ultra violet lithography mask includes forming a reflective layer that reflects an extreme ultra violet light on a substrate; forming a capping layer that transmits the extreme ultra violet light on the reflective layer; and forming selectively pores in some region of the capping... Agent: Townsend And Townsend And Crew, LLP

20090263732 - Mask patterns including gel layers for semiconductor device fabrication: Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns... Agent: Myers Bigel Sibley & Sajovec

20090263731 - Method for fabricating fine pattern in photomask: A method for fabricating a fine pattern in a photomask includes forming a light shielding layer over a substrate; forming a first resist layer pattern over the light shielding layer to expose the light shielding layer with a first critical dimension; forming a groove by etching the portion of the... Agent: Marshall, Gerstein & Borun LLP

20090263733 - Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device: A photo mask includes an asymmetrical diffraction grating pattern in which diffraction efficiencies of plus primary diffracted light and minus primary diffracted light are different, the asymmetrical diffraction grating pattern including a shielding portion which shields light, a first transmitting portion which transmits light, and a second transmitting portion which... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090263729 - Templates for imprint lithography and methods of fabricating and using such templates: A template for use in imprint lithography is disclosed. The template includes at least two ultraviolet transparent materials bonded together by an ultraviolet transparent epoxy. The ultraviolet transparent epoxy is a polymeric, spin-on epoxy or a two-part, amine-cured epoxy having a viscosity at room temperature of from about 35,000 cps... Agent: Trask Britt, P.C./ Micron Technology

20090263734 - Lithographic apparatus and device manufacturing method: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090263735 - Exposure apparatus: An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a projection optical system configured to project the pattern of the original onto the substrate and designed to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090263736 - Exposure apparatus, exposure method, and device manufacturing method: A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that... Agent: Miles & Stockbridge PC

20090263737 - imaging member and methods of forming the same: The presently disclosed embodiments are directed to an imaging member having an outermost layer formulation that includes wax particles which creates a rough surface morphology for the layer and imparts increased scratch resistance, reduced torque, and improved cleaning performance to the layer. In embodiments, the outermost layer is an overcoat... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090263738 - Toner: An object of the present invention is to provide a spherical toner that has a sharp particle size distribution and a small particle diameter. This is a capsule-type toner that exhibits an excellent low-temperature fixability, while at the same time having a high offset resistance and excellent charging properties and... Agent: Fitzpatrick Cella Harper & Scinto

20090263739 - Resin-filled carrier for electrophotographic developer, and electrophotographic developer using the resin-filled carrier: A resin-filled carrier for an electrophotographic developer obtained by filling resin into voids of a porous ferrite core material, wherein the porous ferrite core material has a pore volume of 0.04 to 0.16 mL/g and a peak pore size of 0.9 to 2.0 μm, and an electrophotographic developer using this... Agent: Greenblum & Bernstein, P.L.C

20090263740 - Toner compositions: The present disclosure provides processes for reducing the particle size of latex resins and toners produced with such resins. In embodiments, a gel latex may be formed as a seed particle and then utilized to form latex resins and toner particles. In accordance with the present disclosure, one may be... Agent: Xerox Corporation (cdfs)

20090263742 - chemically amplified positive resist composition: e

20090263741 - Positive resist composition and method of forming resist pattern:

20090263743 - Resist polymer and resist composition: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090263744 - Ethylenically unsaturated compound, light sensitive composition, light sensitive planographic printing plate material and printing process employing the same: The present invention provides a novel ethylenically unsaturated compound which is highly sensitive to scanning exposure due to an ultraviolet to near-infrared laser and is cured to give good physical properties; a light sensitive composition providing good developability and high sensitivity and forming a high strength layer; a planographic printing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090263745 - Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition: In the formula (1), R1 is a tetravalent organic group; R2 is a divalent organic group; R1s may be the same or different from each other and R2s may be the same or different from each other in the repeating units; R3 and R4 respectively represent a monovalent organic group... Agent: Ladas & Parry LLP

20090263746 - Method of making lithographic printing plates with simple processing: A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution that has a pH of from about 2 to about 11 and contains an anionic surfactant. This single processing solution both develops the imaged precursor and provides... Agent: Andrew J. Anderson Patent Legal Staff

20090263747 - Three axis linear actuator: A mover (344) moving a stage (238) along a first axis, along a second axis and along a third axis includes a magnetic component (354), a conductor component (356), and a control system (324). The magnetic component (354) includes a plurality of magnets (354D) that are surrounded by a magnetic... Agent: Roeder & Broder LLP

20090263748 - Method of manufacturing wiring circuit board: A method of manufacturing a wiring circuit board includes: preparing an insulating layer; forming conductive thin films on the upper surface and the side end surface of the insulating layer; covering the conductive thin films formed on the upper surface and the side end surface of the insulating layer with... Agent: Akerman Senterfitt

20090263749 - Method of forming fine patterns of semiconductor device: A method of forming fine patterns of a semiconductor device, in which a plurality of conductive lines formed in a cell array region are integrally formed with contact pads for connecting the conductive lines to a peripheral circuit. In this method, a plurality of mold mask patterns, each including a... Agent: Myers Bigel Sibley & Sajovec

20090263750 - Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device: A foreign particle inspection apparatus includes a light projecting unit, a photo-receiving unit which receives the scattered light, and a. The photo-receiving unit is arranged such that its optical axis is tilted by a first angle with respect to a plane including the optical axis and the normal axis to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090263751 - Methods for double patterning photoresist: Embodiments of methods for double patterning photoresist are generally described herein. Other embodiments may be described and claimed.... Agent: Intel Corporation C/o Cpa Global

20090258301 - Fabricating and using hidden features in an image: Some implementations of the invention provide hidden static images. Some such images can only be perceived when viewed from an angle to the normal to a surface. Such images may appear as a solid color when viewed along an axis perpendicular to a surface, but may reveal a hidden image... Agent: Weaver Austin Villeneuve & Sampson LLP - Qual

20090258303 - Method of fabricating a photomask using self assembly molecule: A method of fabricating a photomask includes includes forming a light blocking layer over a transparent substrate, and forming a hard mask pattern over the light blocking layer. The hard mask pattern exposes a portion of the light blocking layer. The method also includes depositing a self assembly molecule (SAM)... Agent: Marshall, Gerstein & Borun LLP

20090258302 - Sub-resolution assist feature of a photomask: A photomask including a main feature, corresponding to an integrated circuit feature, and a sub-resolution assist feature (SRAF) is provided. A first imaginary line tangential with a first edge of the main feature and a second imaginary line tangential with the second edge of the main feature define an area... Agent: Haynes And Boone, LLPIPSection

20090258305 - Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method: A memory medium stores a program for generating data on an original pattern used in an exposure apparatus forming an image of a target pattern on a substrate, the program comprising a determination step of determining a final assist pattern based on a light intensity distribution formed by a projection... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090258304 - Substrate processing method, program, computer-readable storage medium and substrate processing system: In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning for the first time is measured. Based on the dimension measurement result of the patterning... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090258306 - Toner image stabilization processes: Image noise is reduced in halftone imaging processes by placing clear toner particles around the colored toner particles. The clear toner particles must be placed around the colored toner particles prior to transferring the developed image from an imaging member to a receiving member or substrate. The clear toner particles... Agent: Fay Sharpe / Xerox - Rochester

20090258307 - Developer and image forming apparatus: A developer used in an image forming apparatus, the developer containing: a toner, and a carrier that charges the toner, the toner containing a core toner, and an external additive that is added to a surface of the core toner, the core toner containing a colorant, a binder resin, a... Agent: Turocy & Watson, LLP

20090258308 - Toner and method of preparing the same: The present invention provides a toner having a core-shell structure which is formed by aggregation-coalescence of latex particles having bimodal particle size distribution. The toner according to the present invention can prevent scattering and image offset by enhancing adhesiveness and charge-up rate. The toner can also have controlled particle morphology... Agent: Summa, Additon & Ashe, P.A.

20090258309 - Toner for electrostatic charge image development and method for producing the same: e

20090258310 - Producing method of spherical particle, spherical particle, toner, developer, developing device and image forming apparatus: There are provided an economical method capable of obtaining very small resin particles, in particular, resin particles; resin particles produced by the method; a toner and developer containing the resin particles; a developing device; and an image forming apparatus. Spherical particles are produced according to a producing method of spherical... Agent: Nixon & Vanderhye, PC

20090258311 - Electrophotographic developer carrier core material, electrophotographic developer carrier, methods of manufacturing the same, and electrophotographic developer: The present invention provides a carrier core material for use in the production of an electrophotographic developer which, even when applied, for example, to MFPs (multifunction printers), can realize stable, high-quality and high-speed development, and has a prolonged replacing life of magnetic carriers, and a method of manufacturing the same,... Agent: Oliff & Berridge, PLC

20090258312 - Image forming method and image forming apparatus: An image forming method and image forming apparatus based on the application thereof wherein comet-like deposits do not appear on the surface of the photoreceptor even after prolonged use of small-diameter toner, and there is no dropout or damage on the photoreceptor surface in the image forming process using an... Agent: Lucas & Mercanti, LLP

20090258314 - Negative working, heat sensitive lithographic printing plate precursor: A heat-sensitive negative-working lithographic printing plate precursor include a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye; wherein the hydrophobic thermoplastic... Agent: Agfa C/o Keating & Bennett, LLP

20090258315 - Photoacid generator compounds and compositions: The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as... Agent: Schwegman, Lundberg & Woessner, P.A.

20090258313 - Resist composition and resist pattern forming method: The present invention provides a resist composition prepared by dissolving components in an organic solvent containing ethyl lactate, which suppresses deterioration of sensitivity with time and also has required lithographic characteristics, and a method for forming a resist pattern. The resist composition is prepared by dissolving a resin component (A)... Agent: Knobbe Martens Olson & Bear LLP

20090258316 - Method for patterning a covering material by using high-power exciting beam: The present invention relates to a method for patterning a covering material by using a high-power exciting beam. The method includes the steps of (a) providing a base material having a plurality of thin layers, the neighboring thin layers having different colors; and (b) utilizing a high-power exciting beam to... Agent: Volentine & Whitt PLLC

20090258317 - Writing apparatus and writing method: A writing apparatus includes a writing unit configured to a write a pattern onto a target workpiece, based on a writing data of the pattern to be written on the target workpiece, and a generation unit configured generate, after the pattern has been written, writing data of a figure code... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090258318 - Double patterning method: A method of making a device includes forming a first photoresist layer over an underlying layer, patterning the first photoresist layer to form a first photoresist pattern comprising a first grid, rendering the first photoresist pattern insoluble to a solvent, forming a second photoresist layer over the first photoresist pattern,... Agent: Sandisk Corporation C/o Foley & Lardner LLP

20090258319 - Exposure method and semiconductor device manufacturing method: In an exposure method, an anti-reflection film and a photoresist are stacked in order on the surface of a substrate. A periodic pattern of a pitch P is formed on a pattern surface of a photomask. A medium having a refractive index n is present between a projection lens having... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090258320 - Method of forming measuring targets for measuring dimensions of substrate in substrate manufacturing process: A method of forming measuring targets for measuring the dimensions of a substrate during a substrate manufacturing process is provided. First, a board having a base layer and a conductive layer is provided, wherein the conductive layer is disposed on a surface of the base layer. Then, at least one... Agent: J C Patents

20090258321 - Light absorbent and organic antireflection coating composition containing the same: An anti-reflection film using the compound of the present invention exhibits excellent adhesiveness and storage stability, and excellent resolution in both C/H patterns and L/S patterns. Also, the patterning method of the invention has an excellent process window, and thus excellent pattern profiles can be obtained irrespective of the type... Agent: Davidson, Davidson & Kappel, LLC

20090258322 - Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods: A wafer has a substrate and a photoresist layer thereon with a surface that is planarized by positioning over a starting surface of the photoresist layer a gray-scale mask having a pattern that correlates with a gradient height profile of unevenness present on the starting surface, patterning the photoresist layer... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090253050 - Holographic storage media: Described are holographic storage mediums and method of making holographic storage mediums. The holographic storage mediums may have write components that bind to the matrix to form a pattern in the media. The holographic storage mediums may also be rewriteable.... Agent: Morrison & Foerster LLP

20090253053 - Method of fabricating halftone phase shift mask: A method of fabricating a halftone phase shift mask, comprising: forming a structure by sequentially stacking a light blocking layer pattern defining a side surface and a phase shift layer pattern over a light transmitting substrate; and treating the structure with heat to make the phase shift layer pattern flow... Agent: Marshall, Gerstein & Borun LLP

20090253051 - Phase shift mask and method of fabricating the same: The present invention relates to a phase shift mask and a method of fabricating the same. According to an aspect of the present invention, a method of fabricating a phase shift mask includes forming a phase shift layer and a light-shielding layer over a transparent substrate including a cell area... Agent: Townsend And Townsend And Crew, LLP

20090253054 - Phase shift mask blank and method of manufacturing phase shift mask: Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an... Agent: Sughrue Mion, PLLC

20090253052 - Photomask and method of fabricating the same: A photomask comprises: a light transmitting substrate; patterns disposed over the light transmitting substrate to define a light transmitting region; and a light transmittance control layer disposed between the light transmitting substrate and the patterns having a relatively high light transmittance in a first control layer region overlapping a first... Agent: Marshall, Gerstein & Borun LLP

20090253055 - Reflective mask blank for euv lithography, and substrate with functional film for the mask blank: A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090253057 - Electrophotographic photoreceptor and image formation device provided with the same: s

20090253056 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising slippery polyhedral oligomeric silsequioxane molecules that enhance the physical and mechanical functions and reduce the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253061 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the same: An electrophotographic photoreceptor includes a conductive substrate, and a photosensitive layer, an intermediate layer having a thickness of 2 nm to 70 nm, and a surface layer, which are disposed in this order on the conductive substrate. The refractive index n1 of the photosensitive layer, the refractive index n2 of... Agent: Oliff & Berridge, PLC

20090253062 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253058 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253059 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253060 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising slippery polyhedral oligomeric silsequioxane molecules that enhance the physical and mechanical functions and reduce the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253063 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253064 - Process and composition for creating customized colors by using a series of neutral gray primaries: A process for creating custom colors including: creating a plurality of neutral gray scale primary components of varying darkness levels; selecting one or more non-gray scale primary components; and combining one or more of the plurality of neutral gray scale primary components with the one or more non-gray scale primary... Agent: Xerox Corporation (cdfs)

20090253065 - Toner, process for producing toner, and two-component developing agent: A toner or two-component developer is provided. The toner includes toner base particles obtained by mixing in an aqueous medium a first resin particle dispersion, a colorant particle dispersion, and a wax particle dispersion, aggregating the mixed dispersion to form core particles at least part of which is melted, adding... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090253066 - Wet developer: A wet developer in which toner particles containing at least a colorant and a binder resin are dispersed in a non-volatile carrier solution by using a dispersant. By using as the binder resin a polyester resin having a weight-average molecular weight Mw in a range of 20,000≦Mw≦350,000, it becomes possible... Agent: Brinks Hofer Gilson & Lione

20090253068 - Image transfer system and liquid toner for use therewith: A printing method comprising: forming a first image utilizing a liquid toner comprising carrier liquid and pigmented polymer particles having a first color; transferring the first image to an intermediate transfer member; forming at least one additional image utilizing a liquid toner comprising at least one carrier liquid and pigmented... Agent: Hewlett-packard Company Intellectual Property Administration

20090253067 - Wet developer: To provide a wet developer which is capable of improving fixability, while ensuring a sufficient heat-resistant storage property. The wet developer contains toner particles composed of a colorant and a binder resin, which are dispersed in a non-volatile carrier solution by using a dispersant. As the binder resin, a polyester... Agent: Sidley Austin LLP

20090253069 - Imageable elements useful for waterless printing: A non-ablative negative-working imageable element has first and second polymeric layers under a crosslinked silicone rubber layer. These elements can be used in a simple method to provide lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple using either water or an aqueous... Agent: Andrew J. Anderson Patent Legal Staff

20090253072 - Nanoparticle reversible contrast enhancement material and method: The invention is to a reversible photobleachable material comprised of nanoparticles of indium gallium oxide or gallium oxide, and a method of exposing a substrate, such as in semiconductor manufacture, using same.... Agent: Moore & Van Allen PLLC

20090253071 - Planographic printing plate precursor: A planographic printing plate precursor comprising a hydrophilic support having a surface roughness (Ra) in a range of from 0.45 to 0.60, and, on the support, a recording layer containing a phenolic resin, an infrared absorber and a polymer having at least one selected from the group consisting of a... Agent: Moss & Burke, PLLC

20090253070 - Resist composition and pattern forming method using the same: Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).... Agent: Sughrue-265550

20090253074 - Fluorinated polymers for use in immersion lithography: The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090253073 - Light-sensitive component for use in photoresists: e

20090253075 - Positive resist composition, and method of forming resist pattern:

20090253076 - Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative: [Means for solving problems] A coating-type underlayer coating forming composition that is used for lithography process by multiply coating, comprising a polymer containing a vinylnaphthalene based structural unit and an acrylic acid based structural unit containing an aromatic hydroxy group or a hydroxy-containing ester. A coating-type underlayer coating forming composition... Agent: Oliff & Berridge, PLC

20090253077 - Anti-reflection film forming material, and method for forming resist pattern using the same: Wherein, R1 and R2 represent a direct bond or a methylene chain; R3 and R4 represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a group represented by —(CH2)n—O—R5—R6; and at least one of R3 and R4 is a group represented by —(CH2)n—O—R5—R6, wherein: R5... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090253078 - Double exposure lithography using low temperature oxide and uv cure process: A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing the first pattern to ultra-violet radiation. The exposure of the first pattern to ultra-violet radiation increases the resistance of... Agent: Townsend And Townsend And Crew, LLP

20090253079 - Forming reverse illumination patterns: In photolithographic exposure, the illumination pattern (120R) formed on a photosensitive surface (106) is a reverse of the pattern (130) on the optical mask (124). The reverse pattern (120R) is obtained using off-axis illumination when the photosensitive surface is at other than the best focus position.... Agent: Haynes And Boone, LLPIPSection

20090253082 - Method for forming resist pattern: A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developing the photoresist film. The lower layer film contains at least... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090253080 - Photoresist image-forming process using double patterning: A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090253081 - Process for shrinking dimensions between photoresist pattern comprising a pattern hardening step: A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090253083 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a liquid supply unit which supplies a liquid to fill an optical path space for an exposure light beam therewith, a first land surface which is opposed to a surface of a substrate arranged at an exposure position and which surrounds the optical path space for... Agent: Oliff & Berridge, PLC

20090253084 - Double patterning process: Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a... Agent: Westerman, Hattori, Daniels & Adrian, LLP