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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
09/04/2014 > 12 patent applications in 9 patent subcategories.

20140248555 - Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof: An extreme ultraviolet photomask comprises a reflective layer over a substrate, a capping layer over the reflective layer, a hard mask layer over the capping layer, and an absorber. The absorber is in the hard mask layer, the capping layer and the reflective layer.... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20140248554 - Sub-resolution assist devices and methods: Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive... Agent: Micron Technology, Inc.

20140248556 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device: A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a... Agent: Fujifilm Corporation

20140248557 - Carrier for two-component developer, two-component developer using the carrier, and image forming method and process cartridge using the two-component developer: A carrier is provided. The carrier includes a particulate magnetic core, and a cover layer located on the surface of the particulate magnetic core and including a resin and a filler. When determined from observation of cross-section of the carrier, the shape factor SF2 of the carrier is from 120... Agent:

20140248559 - Acoustic method to prepare polyester resin emulsions: The disclosure relates to a process for making a latex emulsion suitable for use in a toner comprising at least one amorphous polyester resin and a solvent to form a resin mixture, including that the process is carried out at room temperature using acoustic mixing.... Agent: Xerox Corporation

20140248558 - Preparing colorant dispersions using acoustic mixing: The present disclosure provides processes for making inorganic or organic colorant dispersions using an acoustic mixer, where such dispersion may be used to make toner. Such processes apply low frequency, high intensity acoustic energy and a consistent shear field throughout an entire mixing vessel and provide uniform dispersion of colorants... Agent: Xerox Corporation

20140248560 - Process for preparing a particulate solid and a particulate solid: A process for preparing a particulate solid is described, which comprises the steps of a) aggregating a dispersion comprising the particles i) and ii) and a liquid medium, wherein i) is 25 to 50 parts by weight of non-polymeric particles having an average particle size of from 1 to 10... Agent: Fujifilm Imaging Colorants Limited

20140248562 - Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern: p

20140248561 - Resist composition, method for forming resist pattern, polyphenolic compound for in the composition, and alcoholic compound that can be derived therefrom: A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.... Agent: Mitsubishi Gas Chemical Company, Inc.

20140248563 - Composition, resist pattern-forming method, compound, method for production of compound, and polymer: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or... Agent: Jsr Corporation

20140248564 - Aromatic polycarbonate composition: The present invention relates to a polymer composition comprising the following components: a) 76,6-99,9 mass % of aromatic polycarbonate, b) 0,5-20 mass % of laser direct structuring additive, c) 0-2,4 mass % of rubber like polymer, and d) 0,01-1 mass % of acid and/or acid salt wherein the mass %... Agent: Mitsubishi Chemical Europe Gmbh

20140248565 - Method of patterning a device: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern... Agent:

  
08/28/2014 > 29 patent applications in 18 patent subcategories.

20140242502 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure... Agent: Fujifilm Corporation

20140242501 - Coating of shield surfaces in deposition systems: A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm2 of particles between... Agent: Asahi Glass Co., Ltd.

20140242499 - Light-reflective photomask and mask blank for euv exposure, and manufacturing method of semiconductor device: According to one embodiment, a light-reflective photomask including a circuit pattern area, and an outside area positioned outside the circuit pattern area includes a substrate, a low-reflectivity layer provided in both the circuit pattern area, and the outside area, formed on the substrate, including at least a conductive layer, and... Agent: Kabushiki Kaisha Toshiba

20140242500 - Process for cleaning shield surfaces in deposition systems: A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in... Agent: Asahi Glass Co., Ltd.

20140242498 - Production method and evaluation apparatus for mask layout: According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography... Agent: Kabushiki Kaisha Toshiba

20140242503 - Method of manufacturing a color filter: A color filter is manufactured on each of a plurality of light-receiving elements of an RGB sensor using a plurality of kinds of light-transmitting films having different transmission colors. In such a case, the light-transmitting film that is to be coated next does not uniformly spread across the entire semiconductor... Agent: Semiconductor Components Industries, LLC

20140242505 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid... Agent: Fujifilm Corporation

20140242504 - Positive photosensitive resin composition and method for forming patterns by using the same: The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a hydroxycompound (C) and a solvent (D). The novolac resin (A) further includes... Agent: Chi Mei Corporation

20140242508 - Electrophotographic photoreceptor and image forming apparatus including the same: An electrophotographic photoreceptor includes a cylindrical base and a photosensitive layer disposed on the cylindrical base. The photosensitive layer has a photoconductive layer disposed on the cylindrical base, a charge injection blocking layer disposed on the photoconductive layer, and a surface layer disposed on the charge injection blocking layer. The... Agent: Kyocera Corporation

20140242506 - Electrophotographic photosensitive member, method for manufacturing the same, and electrophotographic apparatus: A surface layer of the electrophotographic photosensitive member has a change region in which a ratio of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of carbon atoms gradually increases toward a surface side of the electrophotographic photosensitive member... Agent: Canon Kabushiki Kaisha

20140242507 - Positively chargeable single-layer electrophotographic photosensitive member and image forming apparatus: A positively chargeable single-layer electrophotographic photosensitive member includes a single-layer photosensitive layer. The single-layer photosensitive layer contains a charge generating material, a hole transport material, an electron transport material, and a binder resin. The electron transport material contains two or more compounds selected from the group consisting of compounds represented... Agent: Kyocera Document Solutions Inc.

20140242509 - Electrostatic latent image developing toner and method for producing electrostatic latent image developing toner: An electrostatic latent image developing toner containing a plurality of toner particles, each including a binder resin and a release agent, is provided. The surface hardness of the toner particle, measured by a nanoindentation method, satisfies the following conditions (1) and (2): (1) The surface hardness of the toner particle... Agent: Kyocera Document Solutions Inc.

20140242510 - Two-component color developer and image formation device using same: A two-component color developer containing a toner and a resin-coated carrier, the toner containing at least a polyester resin as a binding resin, an organic pigment as a colorant and inorganic fine particles as an external additive, wherein the inorganic fine particles have a negative polarity, the toner has a... Agent: Sharp Kabushiki Kaisha

20140242511 - Method for manufacturing carrier core particles for electrophotographic developer, carrier core particles for electrophotographic developer, carrier for electrophotographic developer, and electrophotographic developer: Provided is a method for manufacturing carrier core particles for electrophotographic developer capable of stably maintaining high chargeability over a long time. The method for manufacturing carrier core particles includes a granulation step of granulating a mixture of raw materials containing manganese, iron, strontium, and calcium and a firing step... Agent: Dowa Electronics Materials Co., Ltd.

20140242512 - Liquid developer, image forming apparatus, image forming method, liquid developer cartridge, and process cartridge: There is provided a liquid developer containing a toner that has a ratio G′ (65)/G′(90) of a storage modulus G′ (65) at 65° C. to a storage modulus G′ (90) at 90° C. of from 1×103 to 1×105, and a carrier liquid that has a difference ΔSP(tc) of SP value... Agent: Fuji Xerox Co., Ltd.

20140242513 - Liquid developer, image forming apparatus, image forming method, liquid developer cartridge, and process cartridge: There is provided a liquid developer containing a toner that has a ratio G′(65)/G′(90) of a storage modulus G′(65) at 65° C. to a storage modulus G′(90) at 90° C. of from 1×10 to 1×103, and a carrier liquid that has a difference ΔSP(tc) of SP value between the carrier... Agent: Fuji Xerox Co., Ltd.

20140242514 - Particulate material production method, and particulate material production apparatus: A particulate material production method is provided. The particulate material production method includes ejecting a particulate material composition liquid, which includes an organic solvent and a particulate material composition including at least a resin and dissolved or dispersed in the organic solvent, from at least one nozzle to form droplets... Agent:

20140242515 - Photoresist composition and method of manufacturing display device using same: p

20140242516 - Silane composition and cured film thereof, and method for forming negative resist pattern using same:

20140242517 - Lithographic printing plate precursors and use:

20140242518 - Patterning process and resist composition: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin... Agent: Shin-etsu Chemical Co., Ltd.

20140242520 - I-line photoresist composition and method for forming fine pattern using same: An I-line photoresist composition, having excellent thermal stability at high temperature of 200-250° C., by which fine photoresist patterns form using an acid diffusion layer and a method for forming a fine pattern using the same, comprising: a polymer containing 1-99 mol % of repeating unit selected from a group... Agent:

20140242519 - Monomer, polymer, resist composition, and patterning process: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is... Agent: Shin-etsu Chemical Co., Ltd.

20140242521 - Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device: wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group,... Agent:

20140242522 - Double-mask photolithography method minimizing the impact of substrate defects: In the field of photolithography and, notably, photolithography in the extreme ultraviolet, a photolithography method is provided in which a first mask blank is produced that can have defects, an individual mapping of the positions of the defects of this mask blank is established using an inspection machine, and, for... Agent:

20140242523 - Techniques for patterning a substrate: Various techniques for patterning a substrate are disclosed. Specifically, implantation of the first species into an anti-reflective coating layer is contemplated to reduce stress in the layer that may be generated during the exposure stage or development stage. During these steps, the resist layer or the resist structure may under... Agent:

20140242525 - Patterning of transparent conductive coatings: A method of patterning a conductive polymer includes providing a conductive polymer layer coated over a first support followed by pattern-wise transferring a layer containing polyvinyl acetal from a second support onto the conductive polymer to form a mask with at least one opening. The masked conductive polymer is subjected... Agent:

20140242524 - Two mask process for electroplating metal employing a negative electrophoretic photoresist: A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative electrophoretic photoresist that laterally surround the plurality of protruding disposable template portions. The negative electrophoretic photoresist is lithographically exposed employing the silo... Agent: International Business Machines Corporation

20140242526 - Positive tone organic solvent developed chemically amplified resist: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described... Agent: International Business Machines Corporation

  
08/21/2014 > 31 patent applications in 22 patent subcategories.

20140234755 - Mask blank substrate, mask blank, reflective mask blank, transfer mask, reflective mask, and methods of manufacturing the same: A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than 90° and the distance from the boundary between the main surface and the substrate mark to... Agent: Hoya Corporation

20140234756 - Reflective mask blank for euv lithography, and reflective layer-coated substrate for euv lithography: To provide a mask blank for EUVL wherein the incident angle dependence of EUV reflectivity and the film stress in a Mo/Si multilayer reflective film are improved, and a reflective layer-equipped substrate for such a mask blank. The reflective layer-equipped substrate for EUV lithography (EUVL), comprises a substrate, and a... Agent: Asahi Glass Company, Limited

20140234757 - Test pad structure for reuse of interconnect level masks: A test pad structure in a back-end-of-line metal interconnect structure is formed by repeated use of the same mask set, which includes a first line level mask, a first via level mask, a second line level mask, and a second via level mask. The test pad structure includes a two-dimensional... Agent: International Business Machines Corporation

20140234758 - Photosensitive resin composition for color filter and color filter using the same: Disclosed are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye represented by the following Chemical Formula 1, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and... Agent: Cheil Industries Inc.

20140234759 - Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern: s

20140234760 - Translucent electromagnetic shield film, producing method therefor and emulsifier: A producing method for a translucent electromagnetic shield film comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then executing a development process to form a metallic silver portion and a light transmitting portion respectively in an exposed area and... Agent: Fujifilm Corporation

20140234761 - Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a... Agent: Fujifilm Corporation

20140234762 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device: p

20140234764 - Electrophotographic member, process cartridge, and electrophotographic apparatus: Provided is an electrophotographic member for an electrophotographic apparatus, which suppresses the occurrence of a banding image caused by uneven charging. The electrophotographic member includes: an electroconductive substrate; and a surface layer, in which: the surface layer includes a binder resin and an aggregate of at least one crystal particle... Agent: Canon Kabushiki Kaisha

20140234763 - Image forming apparatus and process cartridge: o

20140234765 - Brilliant toner, electrostatic charge image developer, and toner cartridge: A brilliant toner includes a metallic pigment, and a Fe content in the brilliant toner is from 0.001% by weight to 2% by weight.... Agent: Fuji Xerox Co., Ltd.

20140234766 - Toner to develop electrostatic latent images: A toner T1 develops an electrostatic latent image, the toner T1 having relieved charge-up characteristics, improved development characteristics, and improved transfer characteristics. The toner T1 may ensure high charge stability against environmental condition changes, and an appropriate amount of charges at a high printing speed, may reduce background contamination on... Agent: Samsung Electronics Co., Ltd.

20140234767 - Electrostatic charge image developing toner: Provided is an electrostatic charge image developing toner, including: toner base particles including a polyester resin as a binder resin; and an external additive on the surface of the toner base particles. The external additive includes silica. The silica is produced by sol-gel method, and is aspherical. The percentage of... Agent:

20140234768 - Toner and method for producing the same: Provided is a method for producing a toner including: aggregating colorant particles and release agent particles, thereby forming aggregates containing the colorant particles and the release agent particles; aggregating binder resin particles and the obtained aggregates containing the colorant particles and the release agent particles, thereby forming toner particle precursors;... Agent: Toshiba Tec Kabushiki Kaisha

20140234769 - Liquid developer: A liquid developer includes an insulating liquid and a plurality of toner particles. The plurality of toner particles has a median size not smaller than 1 μm and not greater than 3 μm as a whole. In the plurality of toner particles, average circularity is not smaller than 0.90 and... Agent: Konica Minolta, Inc.

20140234770 - Liquid developer: A liquid developer includes an insulating liquid and a plurality of toner particles. The plurality of toner particles has a volume-based median size not smaller than 0.5 μm and not greater than 3 μm as a whole, and a volume-based coefficient of variation not lower than 40% and not higher... Agent: Konica Minolta, Inc.

20140234771 - Electrostatic ink composition: The present invention provides an electrostatic ink composition comprising a carrier liquid, a resin, a pigment and a conductive polymer. Method for producing the electrostatic ink composition and methods for printing the composition are also disclosed.... Agent: Hewlett-packard Indigo B.v.

20140234773 - Method of coating resist and resist coating apparatus: An aspect of the present embodiment, there is provided a method of coating resist, including providing solvent on a substrate to be processed being set to be nearly still, and rotating the substrate to be processed to provide resist solution on the substrate to be processed from a resist supply... Agent: Kabushiki Kaisha Toshiba

20140234772 - Photo resist (pr) profile control: One or more techniques or systems for controlling a profile for photo resist (PR) are provided herein. In some embodiments, a first shield layer is formed on a first PR layer and a second PR layer is formed on the first shield layer. A first window is formed within the... Agent: Taiwan Semiconductor Manufacturing Company Limited

20140234774 - Photoactive compound and light-sensitive resin composition comprising same: The present application relates to a photoactive compound including an oxime ester group and a phosphonate group together, and a photosensitive resin composition comprising the same, the compound of the present application having excellent storage stability and high-temperature process characteristics.... Agent:

20140234775 - Positive-type photosensitive resin composition, and insulating film and oled formed using the same: This invention relates to a positive-type photosensitive resin composition which includes an alkali soluble polyimide resin, a diazide-based photosensitive compound and a sensitivity enhancer, and in which the use of a polyimide resin wherein the degree of imidization of imidized polyimide resin is 50˜75% exhibits a light transmittance of 95%... Agent: Kolon Industries, Inc.

20140234776 - Photosensitive resin composition and method of forming pattern using the same: i

20140234777 - Photosensitive composition, cured film and production process thereof, and electronic part: It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the... Agent: Jsr Corporation

20140234778 - Method for recycling plate-making processing waste solution: A method of recycling waste liquid from a plate-making process, including: performing a plate-making process using a development replenisher liquid that includes at least one selected from the group consisting of anionic surfactants having a naphthalene skeleton and nonionic surfactants having a naphthalene skeleton at a total content of from... Agent: Fujifilm Corporation

20140234779 - Flexible circuit electrode array and a method for backside processing of a flexible circuit electrode device: m

20140234780 - Lithography with reduced feature pitch using rotating mask techniques: Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature pattern. Another technique uses a combination of rolling mask lithography and a self-aligned plasmonic mask lithography to obtain a desired feature pitch.... Agent: Rolith, Inc.

20140234781 - Pattern forming process: A pattern is formed by coating a resist composition comprising a resin comprising recurring units having an acid labile group, a photoacid generator, and a first organic solvent onto a processable substrate, prebaking, exposing, PEB, and developing in an organic solvent developer to form a negative pattern; heating the negative... Agent: Shin-etsu Chemical Co., Ltd.

20140234784 - Developing solution and development processing method of photosensitive resin composition: A developing solution for a polyimide precursor containing N,N,N′,N′-tetramethylurea and a lower alcohol having 1 to 5 carbon atoms. The developing solution increases a development margin and results in little or no decrease of the film thickness of a polyimide-based resin film. A development processing method of a photosensitive polyimide... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140234782 - Method for manufacturing a semiconductor device: A method for manufacturing a semiconductor device according to an embodiment of the invention includes applying a resist on a substrate surface in a resist application apparatus, light-exposing the resist on the substrate surface in a light exposure apparatus, and after the light-exposing the resist, developing the resist in a... Agent:

20140234783 - Rinse solution for lithography and pattern formation method employing the same: The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve the pattern collapse, surface roughness and surface defects. The solution contains at least a sulfonic acid a nonionic surfactant having an alkyleneoxy group and water.... Agent: Az Electronic Materials Usa Corp.

20140234785 - Pattern forming process: A pattern is formed by coating a chemically amplified resist composition comprising a resin having a dissolution rate in an organic solvent developer that lowers under the action of acid onto a processable substrate, prebaking, exposing the resist film, PEB, developing in an organic solvent developer to form a negative... Agent: Shin-etsu Chemical Co., Ltd.

  
08/14/2014 > 10 patent applications in 8 patent subcategories.

20140227635 - Reflection type blank masks, methods of fabricating the same, and methods of fabricating reflection type photo masks using the same: Reflection type blank masks are provided. The blank mask includes a substrate having a recessed pattern with a pretermined depth, a reflection layer substantially on the substrate, an absorption layer substantially on the reflection layer, and a resist layer substantially on the absorption layer, wherein the resist layer has a... Agent: Sk Hynix Inc.

20140227636 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted... Agent: Fujifilm Corporation

20140227637 - Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device: A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a... Agent: Fujifilm Corporation

20140227638 - Carrier for two-component developer, two-component developer using the carrier, and process cartridge and image forming method and apparatus using the two component developer: A carrier for use in a two-component developer for developing an electrostatic latent image is provided. The carrier includes a particulate magnetic core; and a cover layer located on a surface of the particulate magnetic core and including a resin and a particulate electroconductive material. The carrier has a BET... Agent:

20140227639 - Violet toner, developer, and toner set: A violet toner includes toner particles that contain a binder resin including an amorphous polyester resin composed of a polycondensate of a polyol and a polyvalent carboxylic acid including a trimellitic acid, and C.I. Pigment Violet 37, wherein a molar ratio of the trimellitic acid is from 0.1 mol %... Agent: Fuji Xerox Co., Ltd.

20140227640 - Electrophotography toner: Main performances of a toner are significantly affected by a shape and surface characteristics of toner particles. Using an external additive may be a factor that complicates control of surface characteristics of the toner particles, and anti-offset properties of toner change according to a wax and a binder composition at... Agent: Samsung Electronics Co., Ltd

20140227642 - Negative resist composition and pattern forming method using the same: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic... Agent: Fujifilm Corporation

20140227641 - Silicon-containing antireflective coatings including non-polymeric silsesquioxanes: Embodiments include a silicon-containing antireflective material including a silicon-containing base polymer, a non-polymeric silsesquioxane material, and a photoacid generator. The silicon-containing base polymer may contain chromophore moieties, transparent moieties, and reactive sites on an SiOx background, where x ranges from approximately 1 to approximately 2. Exemplary non-polymeric silsesquioxane materials include... Agent: International Business Machines Corporation

20140227644 - Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method: A functional film which is applied to a surface of a base material includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).... Agent: Nikon Corporation

20140227643 - Pattern forming process: A pattern is formed by coating a first resist composition comprising a resin comprising recurring units having an acid labile group so that it may turn insoluble in organic solvent upon elimination of the acid labile group, a photoacid generator, and a first organic solvent, onto a processable substrate, prebaking,... Agent: Shin-etsu Chemical Co., Ltd.

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