|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereofBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/28/2013 > 23 patent applications in 16 patent subcategories.
20130316270 - Mask having assist pattern: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the... Agent: Samsung Display Co., Ltd.
20130316273 - Method for fracturing and forming a pattern using shaped beam charged particle beam lithography: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of circular or nearly-circular shaped beam shots can form a non-circular pattern on a surface. Methods for manufacturing a... Agent: D2s, Inc.
20130316271 - Method of manufacturing a transfer mask and method of manufacturing a semiconductor device: In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at %... Agent: Hoya Corporation
20130316269 - Photomask and method for manufacturing the same: The present invention provides a photo-mask and a method for manufacturing the same. The method for manufacturing the photo-mask comprising: forming a shading pattern layer on a substrate; forming a protecting layer covering the shading pattern layer and the substrate; and; forming a reduced reflection layer on the protecting layer,... Agent: Shenzhen China Star Optoelectronics Technology Co., Ltd.
20130316272 - Reflective mask blank for euv lithography: e
20130316274 - Phase difference layer laminated body for three dimensional liquid crystal display device and manufacturing method thereof: A phase difference layer laminated body used in a three-dimensional liquid crystal display device, wherein unit cells are divided into groups for left and right eyes, which are given different degrees of polarization, thereby creating a three-dimensional image, further wherein the phase difference layer laminated body has a base material... Agent: Dai Nippon Printing Co., Ltd.
20130316276 - Electrophotographic photoconductor, production method thereof, and electrophotographic device: where, in formula (1), R is a hydrogen atom, a methyl group, an ethyl group or a propyl group; x, y and z represent mol % of the respective structural units, where x+y+z=100; n is an integer from 1 to 5; a degree of acetalization (x+z) is 86 to 99... Agent: Fuji Electric Co., Ltd.
20130316275 - Electrophotographic photoreceptor, image forming apparatus, and process cartridge: An electrophotographic photoreceptor includes a support; an undercoat layer which is provided on the support and contains at least a binder resin, metal oxide particles, and an electron-accepting compound having an anthraquinone structure, in which a content of the electron-accepting compound is from 0.5% by weight to 1.5% by weight... Agent: Fuji Xerox Co., Ltd.
20130316277 - Organic photoreceptor:
20130316278 - Electrophotographic photoconductor and method for producing same: Provided are an electrophotographic photoconductor that satisfies sufficient wear resistance as well as various characteristics as a photoconductor, and that is little affected by harmful gas or the temperature and humidity environment, and a method for producing such an electrophotographic photoconductor. The electrophotographic photoconductor has at least a photosensitive layer... Agent: Fuji Electric Co., Ltd.
20130316279 - Organic semiconductor composition: where R1 each independently represents a hydrogen atom, a methyl group, an ethyl group, a methoxy group, an ethoxy group, a fluorine atom or a chlorine atom; A, B, C and F each independently represents either —CR22—, —O— or —NR2—; D and E each independently represents either —CR2═ or —N═;... Agent: Central Glass Company, Limited
20130316280 - Toner set, developer set, and image forming apparatus: A toner set, including: at least one chromatic toner containing a colorant; and a transparent toner containing no colorant, wherein the chromatic toner and the transparent toner each include a releasing agent and a binder resin, and wherein an amount of a tetrahydrofuran insoluble matter in the transparent toner is... Agent:
20130316281 - Toner and method for its preparation: Disclosed are a toner and a preparation method thereof. The toner of the invention has honeycomb-shaped core-shell structured particles. The honeycomb-shaped core-shell structured particles comprise two or more core layers. Each core layer is completely covered by a shell layer.... Agent: Icmi (china) Limited
20130316282 - Magnetic carrier and two-component developer: The present invention provides a magnetic carrier that can stably impart charge to a toner on a long term basis and that exhibits an excellent toner separation property and thus exhibits an excellent developing performance. This magnetic carrier is a magnetic carrier in which a vinyl resin coats the surface... Agent: Canon Kabushiki Kaisha
20130316283 - Process for producing electrophotographic photosensitive member: e
20130316284 - Method for producing electrostatic latent image developing toner: The present invention relates to a process for producing a toner for development of electrostatic latent images which includes a step (1) of mixing and aggregating resin particles (A), releasing agent particles and an aggregating agent formed of a divalent to pentavalent amine salt in an aqueous medium to obtain... Agent: Kao Corporation
20130316286 - Acrylic acid ester derivative, polymer compound and photoresist composition: wherein R2 and R3 are each independently an alkyl group having 1 to 6 carbon atoms or a cyclic hydrocarbon group having 3 to 6 carbon atoms; Z is CH2 or —O—; and n is 0 or 1; with the proviso that in (A-1) there is no case where R2... Agent: Kuraray Co., Ltd.
20130316285 - Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound: A resist composition which generates acid upon exposure and exhibits changed solubility in an alkali developing solution under action of acid, the resist composition including a polymeric compound containing a base decomposable group in a main chain thereof.... Agent: Tokyo Ohka Kogyo Co., Ltd.
20130316287 - Photoresist composition: A photoresist composition includes a base polymer, a polymer and an acid generator. The base polymer includes a first structural unit that includes an acid-labile group. The polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content... Agent: Jsr Corporation
20130316288 - Charged particle beam lithography apparatus and charged particle beam pattern writing method: A apparatus, includes a unit to operate a number of other correction processing sections written before a relevant correction processing section, to ensure that a calculation time to calculate amounts of temperature rise for the all correction processing sections to does not exceed a pattern writing time for the all... Agent: Nuflare Technology, Inc.
20130316289 - Electron beam data storage system and method for high volume manufacturing: The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the... Agent: Taiwan Seminconductor Manufacturing Company, Ltd.
20130316290 - Liquid platemaking process: A method of making a relief printing element in a liquid photopolymer platemaking process is described. The method comprises the steps of: (a) selectively exposing the liquid photopolymer to actinic radiation through a negative to crosslink and cure portions of the liquid photopolymer; and (b) reclaiming uncured portions of the... Agent:
20130316291 - Inductor and method for manufacturing the same: The present invention relates to a stacked chip inductor. According to one aspect of the present invention, provided is an inductor including: a stacked structure; and an external electrode structure formed outside of the stacked structure, wherein the stacked structure: an insulating layer; and a polymer layer is stacked on... Agent: Samsung Electro-mechanics Co., Ltd.11/21/2013 > 18 patent applications in 10 patent subcategories.
20130309598 - Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask: A half-tone phase shift film 2 and a light-shielding film 3 are stacked on transparent substrate 1. The light-shielding film 3 has a monolayer structure or a multilayer structure. At least one layer is formed by film-formation with a chromium-containing material including tin. The half-tone phase shift film 2 is... Agent: Shin-etsu Chemical Co., Ltd.
20130309602 - Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film: A photomask blank includes a transparent substrate and a film containing at least two layers formed on the transparent substrate, the two layers being a first layer with a phase difference Δθ1 and a second layer with a phase difference Δθ2. The phase difference Δθ1 is a phase difference between... Agent: Hoya Corporation
20130309600 - Photomask blank and method for manufacturing photomask: A light-shielding film 2 is formed on a transparent substrate 1. A hard mask film 3 is formed on this light-shielding film 2. The entire hard mask film 3 is made of a chromium-containing material including tin. The film made a chromium-containing material including tin can cause a significant increase... Agent: Shin-etsu Chemical Co., Ltd.
20130309599 - Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method: The method for manufacturing a photomask blank according to the present invention, when manufacturing a photomask blank having at least one functional layer on a transparent substrate, in a step of film-formation of such a functional film where the functional film includes a chromium-containing element and an a metallic element... Agent:
20130309601 - Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask: A light-shielding film 2 formed on a transparent substrate 1 has a monolayer structure or a multilayer structure. At least one layer is formed by film-formation with a chromium-containing material including tin. The light-shielding film 2 has an optical density of 2 or higher and 4 or lower and has... Agent: Shin-etsu Chemical Co., Ltd.
20130309603 - Toner: l
20130309604 - Image-forming apparatus and cartridge:
20130309605 - Methods for forming resist features, patterns in a resist, and arrays of aligned, elongate resist features: Methods of forming resist features, resist patterns, and arrays of aligned, elongate resist features are disclosed. The methods include addition of a compound, e.g., an acid or a base, to at least a lower surface of a resist to alter acidity of at least a segment of one of an... Agent: Micron Technology, Inc.
20130309606 - Resist composition, patterning process, monomer, and copolymer: A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R2 is H or CH3, and m is 1 to... Agent: Shin-etsu Chemical Co., Ltd.
20130309607 - Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition: A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition... Agent: Dai Nippon Printing Co., Ltd.
20130309610 - Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of exposure passes are used, and where the sum of the base dosage levels for all of the exposure passes... Agent: D2s, Inc.
20130309609 - Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which the union of shots from one of a plurality of exposure passes is different than the union of shots from a... Agent: D2s, Inc.
20130309608 - Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein base dosages for a plurality of exposure passes are different from each other. Methods for manufacturing a reticle and manufacturing an integrated... Agent: D2s, Inc.
20130309611 - Immersion lithography watermark reduction: Provided is a method of performing a lithography process. The method includes: exposing, through an immersion lithography process, a photo-sensitive material on a substrate, the immersion lithography process using a fluid for the exposing; thereafter treating the photo-sensitive material with a solution to neutralize quenchers that have diffused into the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20130309612 - Enhanced scanner throughput system and method: A method and system to improve scanner throughput is provided. An image from a reticle is projected onto a substrate using a continuous linear scanning procedure in which an entire column of die or cells of die is scanned continuously, i.e. without stepping to a different location. Each scan includes... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20130309613 - Liquid based films: Inorganic films made by providing a solution comprising a metallic salt, an organo-metallic compound, or combinations thereof in a polar aprotic solvent, depositing the solution onto a substrate to form a coating on the substrate, and annealing the coating.... Agent: Corning Incorporated
20130309614 - Resist composition, method of forming resist pattern, polymeric compound and compound: There is provided a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a polymeric... Agent: Tokyo Ohka Kogyo Co., Ltd.
20130309615 - Process sequence for reducing pattern roughness and deformity: A method for patterning a substrate with reduced defectivity is described. Once a pattern is formed in a layer of radiation-sensitive material using lithographic techniques, the pattern formed on the substrate is post-treated. The post-treating of the pattern in the layer of radiation-sensitive material is performed to reduce a roughness... Agent: Tokyo Electron Limited11/14/2013 > 13 patent applications in 10 patent subcategories.
20130302726 - Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound: A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or... Agent:
20130302724 - Mask and method of forming pattern by using the same: A mask includes a substrate, at least a first strip pattern, at least a second strip pattern and an assist pattern. A width of the second strip pattern is substantially larger than a width of the first strip pattern. The assist pattern is disposed in the second strip pattern neighboring... Agent:
20130302725 - System and method for test patttern for lithography process: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural... Agent:
20130302727 - Photoresist composition and method of forming a color filter using the same: Exemplary embodiments of the present invention relate to a photoresist composition and method of forming a color filter using the same. A photoresist composition according to an exemplary embodiment includes about 5% by weight to about 10% by weight of a binder resin, about 5% by weight to about 10%... Agent: Samsung Display Co., Ltd.
20130302728 - Photoresist compositions: e
20130302729 - Toner wash comprising ionic liquid: A washing process using one or more ionic liquids (ILs) as a washing aid agent for toners, including toners produced using such ILs, such as, low melt toners, is provided. ILs are environmentally sound, green solvents that act to swell toner particle surfaces so that surface absorbed and adsorbed pollutants,... Agent:
20130302730 - Toner: To provide a toner that can keep its melt-sticking to sleeve from occurring and, even in double-sided printing, can keep high-temperature offset from occurring and obtain high-quality images on both the surface and the back. The toner comprises toner particles each of which contains a binder resin containing a resin... Agent: Canon Kabushiki Kaisha
20130302731 - Toner and method of producing toner: An object of the present invention is to provide a toner that produces an excellent bending resistance in the output image and that also exhibits an excellent low-temperature fixability and an excellent storage stability. This toner includes a binder resin and a thermoplastic elastomer having a crystalline part, wherein the... Agent: Canon Kabushiki Kaisha
20130302732 - Method for producing core-shell structured resin microparticles and core-shell structured toner containing core-shell structured resin microparticles: Provided is a method for producing core-shell structured resin particles, comprising the steps of: providing a dispersion liquid of hydrophobic resin particles in which the hydrophobic resin particles are dispersed into an aqueous medium containing an anionic surfactant A and an anionic surfactant B; providing a dispersion liquid of resin... Agent:
20130302733 - Liquid electrophotographic ink and method for making the same: A liquid electrophotographic ink is disclosed herein. One example of the liquid electrophotographic ink includes a non-polar carrier liquid; pigmented toner particles; a charge director; and polymer resin encapsulated metal oxide nanoparticles. A method for making the liquid electrophotographic ink is also disclosed herein.... Agent:
20130302734 - Deposition film forming apparatus, deposition film forming method and electrophotographic photosensitive member manufacturing method: The present invention provides a deposition film forming apparatus including a reaction container, an exhaust device and an exhaust gas flow path for causing a material gas to flow from the reaction container to the exhaust device, wherein the exhaust gas flow path includes a portion whose cross section expands... Agent:
20130302735 - Monomers, polymers and photoresist compositions: e
20130302736 - Resist composition, method for forming resist pattern, and compound: A resist composition including a base material component whose solubility in a developing solution changes by the action of an acid and an acid generator component which generates an acid upon exposure. The acid generator component includes an acid generator that includes a compound containing nitrogen atoms having proton acceptor... Agent: Tokyo Ohka Kogyo Co., Ltd.11/07/2013 > 15 patent applications in 11 patent subcategories.
20130295494 - Method for repairing photomask: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20130295495 - Photoresist composition for forming a color filter and method of manufacturing a substrate for a display device: A photoresist composition for forming a color filter, the composition including a binder resin, a monomer, a photo initiator, a dye compound including epoxy group, and an organic solvent.... Agent: Samsung Display Co., Ltd.
20130295496 - Electrophotographic photoconductor, and image forming method, image forming apparatus, and process cartridge using the electrophotographic photoconductor: An electrophotographic photoconductor including: a conductive substrate; and at least a photoconductive layer on the conductive substrate, wherein an uppermost surface layer of the photoconductive layer includes a three-dimensionally crosslinked film formed through polymerization among compounds each containing a charge transporting compound and three or more [(tetrahydro-2H-pyran-2-yl)oxy]methyl groups where the... Agent:
20130295497 - Electrophotographic photoconductor, image forming method, image forming apparatus, and process cartridge: An electrophotographic photoconductor including: a conductive substrate; and at least a photoconductive layer on the conductive substrate, wherein an uppermost surface layer of the photoconductive layer includes a three-dimensionally crosslinked film formed through polymerization among compounds each containing a charge transporting compound and three or more [(tetrahydro-2H-pyran-2-yl)oxy]methyl groups where the... Agent:
20130295498 - Enhancing color toner images with fluorescing magenta toners: A composite color toner image can be enhanced by applying a separate fluorescing toner image over it to provide an enhanced color toner image having a “pinkish” fluorescing effect. This separate fluorescing toner image is obtained using visible fluorescing dry magenta toner particles. Each of these toner particles consists essentially... Agent:
20130295499 - Process for producing toner for electrophotography: The present invention relates to a process for producing a toner for electrophotography which includes the step of fusing aggregated particles containing resin particles (A) and releasing agent particles in an aqueous mixed solution containing the aggregated particles and an anionic surfactant having a polyalkylene glycol moiety with an average... Agent: Kao Corporation
20130295500 - Use of fluorescing toners for imaging: A fluorescing dry toner particle comprises a polymeric binder phase comprising a non-fluorescing binder polymer and a polymeric fluorescing colorant dispersed within the non-fluorescing binder polymer. The polymeric fluorescing colorant comprises a fluorescing moiety that is covalently attached to a colorant polymer that is the same or different than the... Agent:
20130295501 - Surface modification of pigments and compositions comprising the same: Disclosed herein is a method of making a modified pigment, comprising: reacting, under Mitsunobu conditions: (a) a first reactant comprising a protonated nucleophile having a pKa<15, and (b) a second reactant comprising a hydroxyl-containing organic group, wherein a pigment is attached to either the first or second reactant. The method... Agent: Cabot Corporation
20130295502 - Preparing toner images with metallic effect: A method is used to provide a toner image with a metallic effect. After forming a latent image, it is developed with metallic dry toner particles to form a developed toner image that is transferred and fixed to a receiver material. Each metallic dry toner particle consists essentially of a... Agent:
20130295503 - Method for manufacturing toner: Disclosed is a method for manufacturing toner. The method for manufacturing toner according to the present invention uses specific polyester resin to obtain toner with a wide range of fixing temperatures and superior gloss and density of image.... Agent: Samsung Fine Chemicals Co., Ltd.
20130295504 - Preparing dry toner particles for metallic effect: Metallic dry toner particles are prepared by dry blending resin particles with non-conductive metal oxide particles to form a dry blend. This dry blend is melt extruded under low shear conditions to form an extruded composition that is broken up into metallic dry toner particles. Each metallic dry toner particle... Agent:
20130295507 - Processes to form aqueous precursors, hafnium and zirconium oxide films, and hafnium and zirconium oxide patterns: Embodiments of a method for synthesizing aqueous precursors comprising Hf4+ or Zr4+ cations, peroxide, and a monoprotic acid are disclosed. The aqueous precursors are suitable for making HfO2 and ZrO2 thin films, which subsequently can be patterned. The disclosed thin films are dense and continuous, with a surface roughness of... Agent: State Of Oregon Acting By And Through The State Board Of Higher
20130295505 - Radiation-sensitive resin composition, and radiation-sensitive acid generating agent: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having... Agent:
20130295506 - Resist pattern-forming method, and radiation-sensitive resin composition: A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having... Agent:
20130295508 - Apparatus for thermal development with a conformable support: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing... Agent:Previous industry: Chemistry: electrical current producing apparatus, product, and process
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