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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
05/21/2015 > 21 patent applications in 14 patent subcategories.

20150140477 - Euv mask for use during euv photolithography processes: The present disclosure is directed to various masks for use during EUV photolithography processes. In one example, an EUV mask is disclosed that includes, among other things, a substrate, a multilayer stack comprised of a plurality of multilayer pairs of ruthenium and silicon formed above the substrate, wherein the mask... Agent: Global Foundries Inc.

20150140478 - Method and apparatus for integrated circuit layout: Provided is an integrated circuit (IC) testline layout. The layout has a device boundary and a main pattern boundary inside the device boundary. The layout includes at least one main pattern inside the main pattern boundary. The layout further includes a plurality of dummy patterns in a region that is... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150140479 - Method of processing a semiconductor wafer such as to make prototypes and related apparatus: A method of processing a semiconductor wafer may include providing a rotatably alignable photolithography mask that includes different mask images. Each mask image may be in a corresponding different mask sector. The method may also include performing a series of exposures with the rotatably alignable photolithography mask at different rotational... Agent: Stmicroelectronics Pte Ltd

20150140480 - Photomask and methods for manufacturing and correcting photomask: The present invention provides a halftone mask comprising an assist pattern and a manufacturing method of the halftone mask, which uses an ArF excimer laser as an exposing source, is used for a projection exposure by an off axis illumination, does not resolve the assist pattern while keeping the focal... Agent:

20150140481 - Forming patterns using crosslinkable reactive polymers: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a λmax of at... Agent:

20150140482 - Pattern forming method, and, electronic device producing method and electronic device, each using the same: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first... Agent: Fujifilm Corporation

20150140484 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing method of electronic device, and electronic device: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol... Agent: Fujifilm Corporation

20150140483 - Electroless plating method: A conductive metal pattern is formed in a polymeric layer that has a polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the... Agent:

20150140485 - Processing liquid supplying apparatus, processing liquid supplying method and storage medium: A processing liquid supplying apparatus supplies a processing liquid to a process object via a discharging part. In one embodiment, the apparatus includes: a processing liquid source that supplies a processing liquid; an intermediate tank connected to the processing liquid source via a transport line; a feed line provided between... Agent:

20150140487 - Yellow toner: The present invention provides a yellow toner having excellent light resistance. The yellow toner includes toner particles, each of which contains a binder resin, a wax, and a colorant. The colorant is a compound represented by Formula (1).... Agent:

20150140486 - Toner and method of manufacturing same: A toner includes a plurality of toner particles that each include a toner mother particle and an external additive adhering to a surface of the toner mother particle. The toner mother particle includes a core and a shell layer disposed over a surface of the core. The external additive contains... Agent: Kyocera Document Solutions Inc.

20150140488 - Electrostatic charge image developing toner and method for producing electrostatic charge image developing toner: An electrostatic charge image developing toner contains a plurality of toner particles. Each of the toner particles includes a toner core containing a binder resin and a shell layer coating the toner core. The shell layers contain a thermosetting resin. The toner cores have a negative zeta potential in an... Agent: Kyocera Document Solutions Inc.

20150140489 - Composition of matter and molecular resist made therefrom: wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon... Agent:

20150140491 - Composition of matter and molecular resist made therefrom: wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon... Agent:

20150140490 - Overlay film forming composition and resist pattern formation method using same: An object of the present invention is to provide a composition enabling to form a topcoat layer capable of preventing outgassing and of keeping deep UV light from impairing pattern shape in a lithographic process with extreme UV light. The object can be achieved by a composition of the invention... Agent:

20150140492 - Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition: The present invention is a conductive polymer composition containing a π-conjugated conductive polymer, a polyanion, and a gemini surfactant. There can be provided a conductive polymer composition that has excellent antistatic performance and excellent application properties, does not adversely affect a resist, and can be suitably used in lithography using... Agent:

20150140493 - Compounders for enhancing generation of chemical species: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed. Also described is a method for manufacturing a device, the method including applying a liquid containing a composition to a member such that a coating film including the composition is formed on the... Agent:

20150140494 - Electroless plating method using bleaching: A conductive metal pattern is formed using a reactive polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to... Agent:

20150140495 - Electroless plating method using halide: A conductive metal pattern is formed using a reactive polymer that can provide pendant sulfonic acid groups upon exposure to radiation, and (2) pendant groups that are capable of providing crosslinking. The polymeric layer is patternwise exposed to radiation to provide first exposed regions that are then contacted with electroless... Agent:

20150140496 - Electroless plating method using non-reducing agent: A conductive metal pattern can be formed in a polymeric layer that has a reactive polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to... Agent:

20150140497 - Resist composition, method of forming resist pattern, polymeric compound, compound: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a... Agent:

  
05/14/2015 > 18 patent applications in 14 patent subcategories.

20150132685 - Lithography mask and method of forming a lithography mask: A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (MoxSiyNz) layer. The first MoxSiyNz layer is over the transparent substrate. A percentage of molybdenum (x) of the first MoxSiyNz layer is between 1 and 2. A percentage of silicon (y) of the... Agent:

20150132686 - Method for manufacturing color filter: A method manufactures a color filter including a transparent substrate, a black matrix and a resin layer having at least two colors of resin patterns. During an exposing process of the color filter, a particular photo mask is used to expose from a side of the transparent substrate adjacent to... Agent: Ye Xin Technology Consulting Co., Ltd.

20150132687 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (A); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method... Agent: Fujifilm Corporation

20150132688 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using... Agent: Fujifilm Corporation

20150132689 - Charge transport layer comprising silicone ester compounds: The presently disclosed embodiments are directed generally to an electrostatographic imaging member having low surface energy and is wear resistant. The imaging members include a charge transport layer that comprises a silicone ester additive that provides these beneficial properties.... Agent: Xerox Corporation

20150132690 - Toner, developer and image forming apparatus using the same: A toner includes a binder resin including a copolymer resin (A) having a structural unit derived from a crystalline polyester resin (A1) and another structural unit derived from an amorphous polyester resin (A2), and an amorphous resin (B) in an amount of from 30 to 70% by weight based on... Agent:

20150132691 - Super low melt toner having crystalline aromatic ethers: A toner includes a polymeric resin, optionally a colorant, and a small molecule crystalline aromatic ether having a molecular weight less than 1,000 g/mol. The polymeric resin may be an amorphous resin and a mixture of the amorphous resin and the crystalline aromatic ether may be characterized by a reduction... Agent: Xerox Corporation

20150132692 - Super low melt toner having crystalline imides: A toner includes a polymeric resin, optionally a colorant, and a small molecule crystalline imide having a molecular weight less than 1,000 g/mol. The polymeric resin may be an amorphous resin and a mixture of the amorphous resin and the crystalline imide may be characterized by a reduction in glass... Agent: Xerox Corporation

20150132693 - Super low melt toner having small molecule plasticizers: An emulsion aggregation (EA) toner includes an amorphous polymeric resin, optionally a colorant, and a small molecule crystalline organic compound having molecular weight less than 1,000 g/mol and melting point less than the fusing temperature of the EA toner, wherein a mixture of the resin and the small molecule compound... Agent: Xerox Corporation

20150132695 - Super low melt toner having crystalline aromatic monoesters: A toner includes a polymeric resin, a colorant, and a small molecule crystalline aromatic monoester having a molecular weight less than 1,000 g/mol. The polymeric resin may be an amorphous resin and a mixture of the amorphous resin and the crystalline aromatic monoester may be characterized by a reduction in... Agent: Xerox Corporation

20150132694 - Super low melt toner having crystalline diesters with an aromatic core: A toner includes a polymeric resin, optionally a colorant, and a small molecule crystalline diester having an aromatic core and a molecular weight less than 1,000 g/mol. The polymeric resin may be an amorphous resin and a mixture of the amorphous resin and the crystalline aromatic diester may be characterized... Agent: Xerox Corporation

20150132697 - Toner containing aromatic materials and method of forming an image using the same: A toner includes toner particles, each containing binder resin and a plurality of microcapsules dispersed therein, each of the microcapsules containing a liquid material. A method for forming an image on a medium includes forming an electrostatic latent image on a carrier, forming a toner image by developing the electrostatic... Agent:

20150132696 - Toner, developer, image forming apparatus, particles, method for producing toner and method for producing particles: A toner, including: a binder resin; and a releasing agent, wherein the toner includes a pressure plastic material as the binder resin, wherein the releasing agent includes a plurality of particulate releasing agents, and wherein the particulate releasing agents forming domain phases are dispersed in the pressure plastic material forming... Agent:

20150132698 - Resin and resist composition: t

20150132699 - Branched fluorinated photopolymers: A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication... Agent:

20150132700 - Photoresist with rare-earth sensitizers: A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is useful to pattern circuits by visible light.... Agent:

20150132701 - Photoresist system and method: A photoresist includes a group which will decompose that is attached to a hydrocarbon backbone at multiple points along the hydrocarbon chain. With such an attachment, the group which will decompose will cleave from one point in order to generate a desired shift in polarity while still remaining bonded to... Agent:

20150132702 - Photo-resist with floating acid: A method for fabricating a semiconductor product includes applying a photo-resist layer to a substrate, the photo-resist layer including a higher acid concentration at an upper portion of the photo-resist layer than at a lower portion of the photo-resist layer. The method also includes exposing the photo-resist layer to a... Agent:

  
05/07/2015 > 13 patent applications in 10 patent subcategories.

20150125784 - Photopolymer formulations having the adjustable mechanical modulus guv: The subject matter of the invention is a method for producing illuminated, holographic media comprising a photopolymer formulation having the adjustable mechanical modulus GUV. A further subject matter of the invention is an illuminated, holographic medium that can be obtained by means of the method according to the invention.... Agent:

20150125785 - Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method: A halftone phase shift photomask blank comprising a transparent substrate and a halftone phase shift film is provided. The phase shift film consists of Si and N, or Si, N and O, and is free of transition metals. The phase shift film has a thickness of 40-70 nm, offers a... Agent: Shin-etsu Chemical Co., Ltd.

20150125786 - Method for manufacturing transparent conductive film and method for manufacturing cf substrate having conductive film: The present invention provides a method for manufacturing a transparent conductive film and a method for manufacturing a CF substrate having the transparent conductive film. The method for manufacturing a conductive film includes: step 1: dissolving a mixed powder of graphene oxide and pure graphene in water and carrying out... Agent:

20150125787 - Electroless plating method using bleaching: A conductive pattern can be formed a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation, (c) a crosslinking agent that is capable of reacting in the presence of the acid, and (d) optionally, a photosensitizer. The polymeric layer is... Agent:

20150125788 - Multi-line width pattern created using photolithography: Systems and methods are provided for forming features through photolithography. A polymer layer is formed over a substrate. The polymer layer is patterned to form a first feature and a second feature, the first feature and the second feature being separated at a first distance. A rinse material is applied... Agent: Taiwan Semiconductor Manufacturing Company Limited

20150125789 - Photosensitive resin composition, pattern formed using same and display panel comprising same: The present specification provides a photosensitive resin composition comprising an alkali-soluble binder, a crosslinkable compound, a photopolymerization initiator, a solvent, a coloring agent and an epoxy adhesion promoter. The photosensitive resin composition has excellent insulating properties and light-shielding properties and shows excellent chemical resistance in an etching process and a... Agent: Lg Chem, Ltd.

20150125790 - Magnetic toner: the first inorganic fine particle contains an inorganic oxide fine particle selected from the group consisting of a silica fine particle, a titanium oxide fine particle and an alumina fine particle; has a number average particle diameter (D1) of 5 nm or more and 25 nm or less, and contains... Agent:

20150125791 - Line pattern collapse mitigation through gap-fill material application: Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line pattern rinse step. The gap-fill material dries into a solid layer filling the inter-line spaces of the line pattern, thereby preventing line pattern... Agent:

20150125792 - Phthalocyanine pigment and pigment dispersion, ink and color filter resist composition containing same: The present invention provides a phthalocyanine pigment having superior color development property, and a pigment dispersion, an ink and a color filter resist composition containing the phthalocyanine pigment, in which the phthalocyanine pigment having a structure represented by general formula (1), and the pigment dispersion, the ink and the color... Agent:

20150125793 - Processing liquid supplying apparatus and method of supplying processing liquid: A processing liquid supplying apparatus performs an ejecting step in which a processing liquid suctioned into a pump passes through a filter device and is ejected from an ejecting part without returning the processing liquid back to the pump; a returning step in which the processing liquid suctioned into the... Agent:

20150125794 - Resist composition and patterning process: A photoresist film containing a sulfonium or iodonium salt of carboxylic acid having an amino group has a high dissolution contrast and offers improved resolution, wide focus margin and minimal LWR when used as a positive resist film adapted for alkaline development and a negative resist film adapted for organic... Agent: Shin-etsu Chemical Co., Ltd.

20150125795 - Developing solution composition for lithographic printing plate precursor and method for producing lithographic printing plate: The present invention provides a novel low pH developing solution which does not contain an inorganic strong alkali component. The present invention is directed to an alkali developing solution composition for producing a lithographic printing plate, comprising: (A) an alkali agent, (B) a compound represented by the formula (I) shown... Agent:

20150125796 - Method of preparing flexographic printing members: Following imagewise exposure of a sandwiched photopolymer layer, the outer layers between which the photopolymer is interposed are separated in a manner that leaves some photopolymer on each of the separated layers. The photopolymer remaining on one layer contains the raised pattern that will carry ink, and may be subjected... Agent:

  
04/30/2015 > 28 patent applications in 19 patent subcategories.

20150118601 - Novel photoinitiators for photopolymers: The present invention further relates to a holographic medium which contains a photopolymer formulation of the present invention or is obtainable by using same, to the use of a photopolymer formulation of the present invention for producing holographic media and also to a process for producing a holographic medium by... Agent: Bayer Materialscience Ag

20150118604 - Method for fabrication of high aspect ratio trenches and formation of nanoscale features therefrom: A process for forming trenches in a target material includes forming a masking layer onto the target material, where the masking layer comprises a material having high selectivity to a plasma etch gas adapted for etching the target material. A pattern is formed in the masking layer to expose portions... Agent: The Regents Of The University Of California

20150118603 - Photo mask and method of manufacturing the same, and method of forming trenches by using photo mask: Embodiments of the invention provide a photo mask capable of simultaneously forming trenches for preventing an under-fill leakage in a process of forming an opening of a solder resist. In accordance with at least one embodiment, the photo mask includes a transparent base material having a non-transmitting film formed on... Agent: Samsung Electro-mechanics Co., Ltd.

20150118602 - Photomask and fabrication method thereof: A photomask including first opaque patterns and second opaque patterns is provided. The first opaque patterns are distributed in a first plane defined in the photomask, while the second opaque patterns are disposed above the first opaque patterns and spaced apart from the first opaque patterns. In other words, the... Agent: United Microelectronics Corp.

20150118605 - Coated photoconductors: The present disclosure is related to coated photoconductors. In an example, a coated photoconductor can comprise a photoconductor including a substrate having a charge generation layer and charge transport layer adhered thereto and a top coating adhered to the photoconductor. The top coating can comprise a cross-linkable polymer, a cross-linker,... Agent:

20150118608 - Multi-layer electrophotographic photosensitive member: A multi-layer electrophotographic photosensitive member contains a charge generating material including oxo-titanium phthalocyanine that among diffraction peaks for Bragg angles 2θ±0.2° with respect to characteristic X-rays of CuKα having a wavelength of 1.542 Å, at least exhibits a highest diffraction peak at 27.2°. The multi-layer electrophotographic photosensitive member also contains... Agent: Kyocera Document Solutions Inc.

20150118606 - Electrophotographic photosensitive member: An electrophotographic photosensitive member includes a photosensitive layer containing a naphthalenediimide derivative represented by the following general formula (1). In the general formula (1), R1 represents an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms and optionally having an alkyl group... Agent: Kyocera Document Solutions Inc.

20150118607 - Electrophotographic photosensitive member: An electrophotographic photosensitive member includes a photosensitive layer containing a naphthalenediimide derivative represented by the following formula (1) or (2). In the formula (1) or (2), R1 represents an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 12 carbon atoms and optionally having an... Agent: Kyocera Document Solutions Inc.

20150118609 - Tuning toner gloss with bio-based stabilizers: The disclosure describes a process to produce toner with tunable gloss levels comprising a stabilizer to freeze particle growth following aggregation, where the stabilizer does not chelate metal ions.... Agent:

20150118610 - Hybrid emulsion aggregate toner: Toners and processes useful in providing toners suitable for electrophotographic apparatuses, including apparatuses such as digital, image-on-image, and similar apparatuses. In particular, emulsion aggregate toner compositions that use two different emulsion aggregation (EA) technologies and which comprise a base resin composed of both styrene-acrylate and polyester resins. These toner compositions... Agent: Xerox Corporation

20150118611 - Toner to develop electrostatic latent images: A toner to develop electrostatic latent images which uses an appropriate combination of a high molecular weight binder resin and a low molecular weight binder resin, an appropriate amount of a releasing agent, and a combination of silica particles and iron oxide particles as external additives, and thus has the... Agent: Samsung Electronics Co., Ltd

20150118612 - Electrostatic latent image developing toner and method for producing the same: An electrostatic latent image developing toner includes toner particles each including a toner core containing a binder resin and a shell layer on a surface of the toner core. The shell layer includes a unit derived from a monomer of a thermosetting resin. The thermosetting resin is one or more... Agent: Kyocera Document Solutions Inc.

20150118613 - Hybrid emulsion aggregate toner: Emulsion aggregate toner compositions that use two different emulsion aggregation (EA) technologies. Namely, there is provided an emulsion aggregation toner that comprises a base resin composed of both styrene-acrylate and polyester resins. Such hybrid emulsion aggregation toner compositions are lower in cost but still maintain desirable developer properties like low... Agent: Xerox Corporation

20150118614 - Toner for developing electrostatic images and method for producing the toner: The present invention is to provide a toner which is able to prevent an odor generated from the toner upon fixing and which has excellent fixability. The present invention is also to provide a method for producing the toner. Disclosed is a method for producing a toner for developing electrostatic... Agent: Zeon Corporation

20150118615 - Toner and method for manufacturing the same: A toner includes a plurality of toner particles each having a core and a shell layer on a surface of the core. In a cross section of the toner particle analyzed by EELS, for at least 50% of a circumferential length of the core, the shell layer has one or... Agent: Kyocera Document Solutions Inc.

20150118616 - Method for forming resist pattern and resist composition: in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 is an integer of 0 to 2; R1 represents a chain or cyclic aliphatic hydrocarbon group;... Agent:

20150118617 - Negative-type photoresist composition for thick film and use thereof: (B) 10 to 30 wt % of crosslinker which can be a bisphenol fluorene derivative monomer having at least one ethylenically unsaturated double bond; (C) 5 to 15 wt % of photo initiator; and (D) residual solvent. The present invention also relates to use of the above-mentioned negative-type photoresist compound... Agent: Everlight Chemical Industrial Corporation

20150118618 - Photoacid generator, photoresist, coated substrate, and method of forming an electronic device: wherein a, b, c, d, e, x, L1, L2, L3, L4, R1, R2, X, and Z− are defined herein. The photoacid generator compound exhibits good solubility in solvents typically used to formulate photoresist compositions and negative tone developers. Described herein are a photoresist composition including the photoacid generator compound, a... Agent:

20150118619 - Salt and photoresist composition comprising the same: e

20150118620 - Salt and photoresist composition comprising the same:

20150118621 - Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method: Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing a repeating unit (P1) with a cyclic carbonic acid ester structure and any of repeating units (P2) of general formula (P2-1) below, and a compound... Agent: Fujifilm Corporation

20150118622 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.... Agent: Cheil Industries Inc.

20150118623 - Resin composition and pattern forming method using the same: s

20150118625 - Block copolymer self-assembly for pattern density multiplication and rectification: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating... Agent:

20150118624 - Composition for forming resist underlayer: The present invention provides a dendrimer compound capable of improving critical dimension uniformity and DOF (depth of focus) margin, and also provides a composition capable of forming an underlayer film. The dendrimer compound comprises a branched chain having a central aromatic skeleton and amide or ester bond, and is contained... Agent:

20150118626 - Tube nozzle electrospinning: Various examples are provided for tube nozzle electrospinning. In one example, among others, is a system including a nozzle tube with an array of nozzles configured to produce a plurality of electrospun nanofibers and a positioning stage configured to control deposition of the plurality of electrospun nanofibers on a substrate... Agent: University Of Florida Research Foundation, Inc.

20150118628 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, and semiconductor device: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain... Agent: Fujifilm Corporation

20150118627 - Pattern forming method, composition used tehrein, method for manufacturing electronic device, and electronic device: A pattern forming method includes: (i) a step of forming a first film by using an actinic ray-sensitive or radiation-sensitive resin composition (I), (ii) a step of exposing the first film, (iii) a step of developing the exposed first film by using an organic solvent-containing developer to form a negative... Agent: Fujifilm Corporation

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