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Radiation imagery chemistry: process, composition, or product thereof

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
12/18/2014 > 25 patent applications in 18 patent subcategories.

20140370425 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern: Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (I) of general formula (I) below or any of repeating units (II) of... Agent: Fujifilm Corporation

20140370423 - Extreme ultraviolet (euv) radiation pellicle formation method: An extreme ultraviolet (EUV) photolithography pellicle with at least 70% transmissivity to EUV can be formed from a layer of semiconductor material applied to a substrate. The bottom surface of the layer can be exposed by forming support structure(s) from the substrate. Semiconductor material between the exposed surfaces can become... Agent:

20140370424 - Substrate with multilayer reflective film, reflective mask blank for euv lithography, method of manufacturing reflective mask for euv lithography and method of manufacturing semiconductor device: An object of the present invention is to provide a substrate with a multilayer reflective film and the like used in the manufacturing of a reflective mask blank for EUV lithography which is to be subjected to dry etching with a Cl-based gas, wherein in the substrate with the multilayer... Agent: Hoya Corporation

20140370427 - Electrostatic charge image developing toner, toner container, and image forming apparatus: An electrostatic charge image developing toner includes toner particles and silica particles, wherein the silica particles have an average equivalent circle diameter of from 70 nm to 400 nm, an average circularity of from 0.5 to 0.9, and a pore volume of from 0.05 cm3/g to 2.5 cm3/g.... Agent: Fuji Xerox Co., Ltd.

20140370426 - Non-magnetic single-component toner, electrostatic charge image developer, and process cartridge: A non-magnetic single-component toner includes a toner base particle that contains at least a binder resin and a colorant, and an external additive, wherein the external additive includes an organic particle and an inorganic particle, the binder resin contains at least an amorphous polyester resin and a crystalline polyester resin,... Agent: Fuji Xerox Co., Ltd.

20140370433 - Polymerized toner and a method for preparing the same: This disclosure relates to a polymerized toner prepared by suspension polymerization. Particularly, this disclosure relates to a polymerized toner that comprises a binder resin, and a pigment, a charge control agent, and wax, which are dispersed in the binder resin, and maintains peak molecular weight (Mn) of the binder resin,... Agent: Lg Chem, Ltd.

20140370428 - Neutralizing agents for resin emulsions: Incorporation of organic amines as neutralization agents in based phase inversion emulsification (PIE) processes to provide emulsification of high molecular amorphous and high molecular branch amorphous polyester resins, which are traditionally difficult to emulsify. The organic amines facilitate emulsification of these resins to achieve desired particle size with a narrow... Agent:

20140370429 - Negative charge carrier resins with rh sensitivity: The instant disclosure describes methacrylate coated carrier resins with hydrophobic substituents for charge control and improved RH sensitivity.... Agent:

20140370430 - Low cost, low melt emulsion aggregation high gloss toners with low melt waxes: A toner particle includes a core containing a styrene-based resin; a low melting point wax; optionally an additive package; and optionally a colorant, wherein the low melting point wax has a melting point of less than about 80° C. A method of making a toner particle includes forming a slimy... Agent:

20140370431 - Magnetic toner: A magnetic toner contains magnetic toner particles containing a binder resin, a release agent, and a magnetic body, and inorganic fine particles present on the surface of the magnetic toner particles, wherein a ratio of coverage of the magnetic toner particles' surface by the inorganic fine particles is in a... Agent: Canon Kabushiki Kaisha

20140370432 - Carrier resins with improved rh sensitivity: The instant disclosure describes acrylate-coated carrier resins exhibiting both high charge and improved RH sensitivity, carrier compositions comprising the acrylate coated carriers and developers comprising the carrier resins.... Agent:

20140370435 - Carrier resins with improved rh sensitivity: The instant disclosure describes methacrylate coated carrier resins with aromatic substituent groups with optionally carbon atoms replaced by heteroatoms such as S, N, and O for charge control and improved RH sensitivity.... Agent:

20140370434 - Phase inversion emulsification reclamation process: A method for reclaiming an out-of-spec emulsion material includes recovering the out-of-spec emulsion material from a scrap manufacturing batch; distilling the out-of-spec emulsion material to raise a solids content of the out-of-spec emulsion material to about 45 wt % or more based on a total weight of the emulsion material;... Agent:

20140370436 - Liquid developer: A liquid developer includes an insulating liquid and toner particles dispersed in the insulating liquid. The insulating liquid has a flash point not lower than 100° C. The toner particles contain a resin, and the resin contains 80 mass % or more of a first resin containing a component derived... Agent:

20140370437 - Production of latex using a wipe film evaporator: A process is disclosed for making a resin emulsion suitable for use in forming toner particles including using a wiped film evaporator for removing residual solvents.... Agent:

20140370438 - Improved process for preparing polyester emulsions: A phase inversion emulsification process includes dissolving a polyester resin in a mixture comprising (1) an organic solvent, (2) a first portion of a total amount of neutralizing agent, and (3) a first portion of water, neutralizing the dissolved polyester resin with a second portion of neutralizing agent, the second... Agent:

20140370439 - Methods and systems for reducing bubbles in layers of photoresist material: One illustrative system disclosed herein includes a tank adapted to hold a fluid, a photoresist filter adapted to receive the fluid and allow the fluid to flow through the filter, and a vibrator that is operatively coupled to the photoresist filter and adapted to vibrate the photoresist filter as the... Agent:

20140370440 - Photosensitive resin composition for ctp flexographic printing original plate and printing original plate prepared therefrom: A photosensitive resin composition for CTP flexographic printing original plate containing at least a hydrophobic polymer obtained from water-dispersible latex (A), a hydrophilic polymer (B), a photopolymerizable unsaturated compound (C), a photopolymerization initiator (D), and if necessary, rubber (E), characterized in that, the photopolymerizable unsaturated compound (C) comprises a photopolymerizable... Agent: Toyobo Co., Ltd.

20140370442 - Block copolymers and lithographic patterning using same: Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of... Agent: Cornell University

20140370441 - Developer for photosensitive resist material and patterning process: An aqueous solution containing 0.1-20 wt % of a cyclic ammonium hydroxide is a useful developer for photosensitive resist materials. A resist pattern is formed by applying a chemically amplified positive resist composition onto a substrate to form a resist film, exposing the resist film to high-energy radiation, and developing... Agent: Shin-etsu Chemical Co., Ltd.

20140370443 - Gum solution containing specific poly siloxane compound: It is an object of the present invention to provide a plate surface protecting liquid composition which enables an improvement in adhesion of a printing ink onto a lithographic printing plate at the beginning of printing, and to provide a method for treating a lithographic printing plate using the plate... Agent:

20140370444 - Antireflective coating composition and process thereof: where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also... Agent: Az Electronic Materials (luxembourg) S.a.r.l.

20140370445 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device includes a photolithography process having steps of a developing solution immersing process. The steps of the developing solution immersing process includes step (a) of dropping a developing solution on a silicon carbide semiconductor substrate and forming a developing solution film so as to... Agent: Mitsubishi Electric Corporation

20140370446 - Composition for photoresist development and method of developing photoresist using the same: The present invention provides a composition for developing a photoresist containing a carboxyl group (—COOH) and a method of developing a photoresist using the composition. The composition includes: a first solution including a salt containing a monovalent cationic component; and a second solution including a salt containing a bivalent cationic... Agent: Samsung Electro-mechanics Co., Ltd.

20140370447 - Semiconductor device resolution enhancement by etching multiple sides of a mask: A mask is disclosed which includes a plurality of first phase shift regions disposed on a first side of the mask, and a plurality of second phase shift regions disposed on a second side of the mask. The first phase shift regions and second phase shift regions may be alternating... Agent: Globalfoundries, Inc.

  
12/11/2014 > 16 patent applications in 12 patent subcategories.

20140363758 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device: There is provided a pattern forming method comprising (A) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin containing a repeating unit having a phenol skeleton and a repeating unit having a group capable of decomposing by the action of an acid to produce... Agent: Fujifilm Corporation

20140363759 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: In order to provide an electrophotographic photosensitive member with which a ghost is suppressed even under a low temperature and low humidity environment, and a process cartridge and an electrophotographic apparatus having the electrophotographic photosensitive member, the electrophotographic photosensitive member has a support, an undercoat layer formed on the support,... Agent:

20140363760 - Polycarbonate copolymer, and coating liquid and electrophotographic photosensitive body using same:

20140363761 - Method of making toners: The present embodiments relate to methods of making a toner composition. More specifically, the present embodiments relate to methods of including a functional material into a toner composition.... Agent:

20140363762 - Two-component developing agent for developing electrostatic latent image and method for forming electrophotographic image: A two-component developing agent for developing an electrostatic latent image includes toner particles composed of toner base particles and an exterior additive attached on the toner base particles, and carrier particles composed of carrier core particles and a coating resin provided on the carrier core particles. The coating resin includes... Agent: Konica Minolta, Inc.

20140363763 - Electrostatic latent image developing toner and electrophotographic image forming method: Disclosed is an electrostatic latent image developing toner which contains a toner host particle having a domain-matrix structure. The matrix contains an amorphous resin which contains a vinyl resin having an acid group, the domain contains a crystalline resin which is formed by combining a vinyl polymerized segment and a... Agent: Konica Minolta, Inc.

20140363764 - Liquid developer containing electro-conductive particles and an electro-conductive pattern forming method using said material and an electro-conductive pattern forming apparatus using said material: A novel liquid toner development system is disclosed. The liquid development system includes conductive core-shell particles comprising silver-copper or copper-silver. A novel apparatus and method relying on the novel liquid toner development system results in electro-conductive patterning capable of high conductivity with low background fogging, reduced processing time and reduced... Agent: Afit Corporation

20140363765 - Method for producing toner for electrostatic image development: A method for producing a toner for electrostatic image development, including the steps of (1) polycondensing an alcohol component, a carboxylic acid component, and polyethylene terephthalate to provide an amorphous polyester; and (2) subjecting the amorphous polyester obtained in the step (1) and components containing a crystalline polyester in an... Agent: Kao Corporation

20140363767 - Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured film: The method for forming a resin cured film pattern according to the invention comprises a first step in which there is formed on a base material a photosensitive layer composed of a photosensitive resin composition comprising a binder polymer with a carboxyl group having an acid value of 75 mgKOH/g... Agent: Hitachi Chemical Company, Ltd.

20140363768 - Naphthalene derivative, resist bottom layer material, and patterning process: A naphthalene derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative... Agent: Shin-etsu Chemical Co., Ltd.

20140363769 - Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base: A photoresist composition containing a polymer having a structural unit including an acid-labile group, and a compound represented by the formula (1). In the formula (1), R1 represents a hydrogen atom or a monovalent acid-labile group. R2 represents an alicyclic hydrocarbon group having 3 to 20 carbon atoms and a... Agent: Jsr Corporation

20140363766 - Resist pattern-forming method, and radiation-sensitive resin composition: A resist pattern-forming method includes forming a resist coating film using a radiation-sensitive resin composition. The resist coating film is exposed and developed using a developer solution containing no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a polymer component including a polymer having... Agent:

20140363770 - Negative tone resist composition for solvent developing and method of forming resist pattern: A negative tone resist composition for solvent developing including: a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid; a photodecomposable quencher (D0) which generates acid having a pKa of 2.0 or more; and a fluorine additive (F) containing a fluorine-containing polymeric compound... Agent:

20140363771 - Display panel and manufacturing method thereof and image display system: An embodiment of the invention provides a manufacturing method of a display panel. The method includes: providing a first substrate, a second substrate and a liquid crystal layer sandwiched therebetween, wherein the liquid crystal layer is doped with a photopolymerization monomer, and the first substrate has a first surface facing... Agent:

20140363773 - Pattern-forming method: A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R1 represents a hydrogen atom or a methyl group, and each of R2s individually represents a monovalent alicyclic... Agent: Jsr Corporation

20140363772 - Resist composition and method for forming resist pattern: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1′) containing a group... Agent: Tokyo Ohka Kogyo Co., Ltd.

  
12/04/2014 > 25 patent applications in 18 patent subcategories.

20140356768 - Charged beam plasma apparatus for photomask manufacture applications: Embodiments of the present invention generally provide an apparatus and methods for etching photomasks using charged beam plasma. In one embodiment, an apparatus for performing a charged beam plasma process on a photomask includes a processing chamber having a chamber bottom, a chamber ceiling and chamber sidewalls defining an interior... Agent:

20140356769 - Method of manufacturing a mask: A method of manufacturing a mask, the method including forming initial ribs such that forming the initial ribs includes forming at least two photoresist patterns such that the at least two photoresist patterns have different widths, are formed on at least one side of a mask substrate, and overlap each... Agent: Samsung Display Co., Ltd.

20140356770 - Reflective mask blank for euv lithography: m

20140356771 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device and electronic device: There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out... Agent:

20140356773 - Electrophotographic photosensitive member and image forming apparatus: An electrophotographic photosensitive member includes a photosensitive layer. The photosensitive layer contains a charge generating material, a hole transport material, and a binder resin. The hole transport material contains an amine stilbene derivative represented by a general formula (1), and the binder resin contains a polycarbonate resin represented by a... Agent: Kyocera Documents Solutions, Inc.

20140356772 - Terpene polycarbonate containing photoconductors: A photoconductor that includes, for example, a supporting substrate, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, and a charge transport layer, and where the charge transport layer contains a mixture of a charge transport component and a bio-based polycarbonate.... Agent: Xerox Corporation

20140356774 - Latent electrostatic image developing toner: A toner including: a core particle containing at least a binder resin, a colorant and a releasing agent; and a shell on a surface of the core particle, wherein the toner gives a supernatant having a transmittance of 50% to 95% with respect to light having a wavelength of 800... Agent:

20140356778 - Toner comprising surface modified colorant: A toner including a resin; an optional wax; and a colorant; wherein the colorant has disposed thereon a reactive component having at least one cross-linkable carbon-carbon double bond and wherein the tribo electric charge of the toner is adjusted through surface treatment of the colorant with the reactive component. Also... Agent: Xerox Corporation

20140356779 - Black toner containing compound having azo skeleton: Provided is a black toner which has improved dispersibility of carbon black in a binding resin and has a high coloring power. Also provided is a black toner which suppresses fogging and has high transfer efficiency. The toner includes a toner particle containing a binding resin, a compound in which... Agent: Canon Kabuahik Kaisha

20140356775 - Alumina nanotubes as a toner additive to reduce impaction: The disclosure relates generally to toner additives, and in particular, toner additives that provide reduced impaction within a toner particle and improved adhesion to the toner particle. The toner additives include alumina nanotubes, and may be used with other non-conventional additives such as silica nanotubes and titania nanotubes.... Agent:

20140356776 - Core/shell charge control latex for ea particles: A toner particle includes a core including at least one resin, optionally a wax, and a colorant, and a shell comprising at least one charge control agent. The core is substantially free of the charge control agent. The toner particle has improved charging performance compared with core-shell toner particles having... Agent:

20140356777 - Toner: A toner having good low-temperature fixability, charge stability, environmental stability, and durability and capable of stably producing high-quality images for a long time is provided. The toner includes a toner particle having a core-shell structure constituted of a core and a shell phase. The core contains a binder resin, a... Agent: Canon Kabushiki Kaisha

20140356780 - Toner for electrostatic image development and production process of the same: Provided is a toner for electrostatic image development that has low-temperature fixability and long-term stable electrification performance, also has heat-resistant storage stability, and can suppress the occurrence of unevenness in gloss. Also provided is a production process of the toner. The toner for electrostatic image development includes toner particles having... Agent: Konica Minolta, Inc.

20140356781 - Magnetic carrier, two-component developer, replenishing developer, and image forming method: A magnetic carrier includes resin-filled magnetic core particles including porous magnetic particles whose pores are filled with a resin, and resin coating layers on the surfaces of the resin-filled magnetic core particles. The porous magnetic particles have specific electrical properties.... Agent:

20140356782 - Magnetic carrier, two-component developer, developer for replenishment, and image forming method: m

20140356783 - Magnetic carrier, two-component developer, developer for replenishment, and image forming method:

20140356784 - Method for creating a scratch-off document with low energy components: A method of creating a scratch-off document, the method includes the steps of providing a substrate; applying an image toner on the substrate; heating the image toner which causes the image toner to fix to the substrate and causes low surface energy component in the image toner to migrate to... Agent:

20140356785 - Photoresists comprising carbamate component: New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out... Agent:

20140356786 - Photosensitive resin composition and uses thereof: The invention relates to a photosensitive resin composition, and an overcoat and/or spacer for a liquid crystal display component. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B); a photoinitiator (C); a solvent (D); and an organic acid (E). The alkali-soluble resin... Agent: Chi Mei Corporation

20140356787 - Resist composition, compound, polymeric compound and method of forming resist pattern: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0− represents... Agent: Tokyo Ohka Kogyo Co., Ltd.

20140356789 - Fluorinated photopolymer with integrated anthracene sensitizer: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit... Agent:

20140356788 - Fluorinated photoresist with integrated sensitizer: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit... Agent:

20140356790 - Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a... Agent:

20140356791 - Method of making nanostructure: A method for making nanostructure is provided. The method includes following steps. A conductive layer including a graphene film is applied on an insulating substrate. A resist layer is placed on the conductive layer. A number of openings are formed by patterning the resist layer via electron beam lithography. A... Agent: Tsinghua University

20140356792 - Composition for forming tungsten oxide film and method for producing tungsten oxide film using same: The present invention provides a tungsten oxide film-forming composition comprising: water, a water-soluble metatungstate, and at least one additive selected from the group consisting of anionic polymers, nonionic polymers, anionic surfactants, and tertiary amino group-containing nonionic surfactants. For forming a pattern, this composition can be employed in place of a... Agent: Az Electronic Materials Usa Corp.

  
11/27/2014 > 20 patent applications in 16 patent subcategories.

20140349218 - Photosensitive material, holographic recording medium and holographic recording method: A photosensitive material includes: a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator, wherein the polymer matrix has stable nitroxy radical at side chain thereof, wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25.... Agent: Nippon Steel & Sumikin Chemical Co., Ltd

20140349219 - Exposure method, reflection type mask, and semiconductor device manufacturing method: According to embodiments, an exposure method is provided. In the exposure method, a transmittance of a pellicle is adjusted every position of a mask pattern included in a reflection type mask. And when adjusting the transmittance of the pellicle, a film thickness of the pellicle is adjusted on the basis... Agent: Kabushiki Kaisha Toshiba

20140349220 - Photosensitive resin composition for color filter and color filter using the same: Disclosed are a photosensitive resin composition for a color filter that includes (A) a squaraine dye including at least one selected from compounds represented by the following Chemical Formulae 1 and 2, (B) an alkali soluble resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and... Agent: Cheil Industries Inc.

20140349221 - Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these: and a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for... Agent: Fujifilm Corporation

20140349223 - Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound: Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.... Agent: Fujifilm Corporation

20140349224 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an... Agent: Fujifilm Corporation

20140349225 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid... Agent: Fujifilm Corporation

20140349222 - Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device: Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R1 to R7, m1 to m4, n1, n2, Y and W are each as defined in the description.... Agent: Asahi Kasei E-materials Corporation

20140349226 - Electrophotographic photosensitive member and electrophotographic apparatus: Provided is an electrophotographic photosensitive member that improves the sensitivity characteristic and high-humidity deletion resistance, and achieves compatibility between a high image-resolving power and the suppression of an image memory. The electrophotographic photosensitive member comprises an electrophotographic photosensitive member, including: a photoconductive layer; and a surface layer comprising hydrogenated amorphous... Agent: Canon Kabushiki Kaisha

20140349227 - Organic photoconductors having protective coatings with nanoparticles: An organic photoconductor includes: a conductive substrate; a charge generation layer formed on the conductive substrate; a charge transport layer formed on the charge generation layer; and a protective coating formed on the charge transport layer. The protective coating comprises nanoparticles incorporated in an in-situ cross-linked polymer matrix. A process... Agent:

20140349228 - Electrostatic latent image developing toner, production method of the toner for electrostatic latent image development and electrophotographic image formation method: A toner for electrostatic latent image development of the present invention includes toner particles containing toner mother particles and an external additive. The external additive contains fatty acid metal salt particles, and a volume based particle diameter (size) distribution of the fatty acid metal salt particles has two peaks on... Agent: Konica Minolta, Inc.

20140349229 - Toner composition: A toner composition includes a resin, optionally a wax, a colorant, and an acicular surface additive. The toner composition is suitable for use in a single component development system and which composition possesses excellent charging, stability, and flow characteristics.... Agent:

20140349230 - Toner for electrostatic image development, two-component developer, and image formation process: The toner for electrostatic image development includes toner particles containing at least a binder resin, a colorant and a parting agent, and the binder resin contains a polyfunctional acrylate-modified polyester resin obtained by modification with a polyfunctional acrylate compound. In the toner for electrostatic image development, it is preferable that... Agent: Konica Minolta, Inc.

20140349231 - Toner for electrostatic image development: Disclosed is a toner for electrostatic image development that has excellent low-temperature fixability and also has sufficient heat-resistant storage stability. The toner for electrostatic image development includes toner particles containing an amorphous resin including amorphous resins A and B and a crystalline polyester resin. The toner particles have a domain-matrix... Agent: Konica Minolta, Inc.

20140349232 - Toner production method: (wherein, Tp2 represents the onset temperature of the maximum endothermic peak derived from the resin (A)), wherein a peak temperature Tp1 of the maximum endothermic peak derived from the resin (A) during the first temperature rise of the toner particles as determined by differential scanning calorimetric measurement is 50° C.... Agent: Canon Kabushiki Kaisha

20140349233 - Water soluble norbornene-type polymers and photoimageable compositions thereof: Embodiments in accordance with the present invention encompass water soluble polycyclic vinyl addition polymers having a norbornene type repeat unit derived from a norbornene type of monomer that encompasses a saccharide functional moiety. Embodiments in accordance with the present invention also encompass low and high molecular weight polymers with low... Agent: Promerus, LLC

20140349234 - Positive working lithographic printing plate precursor and process for preparing lithographic printing plate: the imaging layer comprises either polyurethane or polyurethane urea or both of the polyurethane and the polyurethane urea, the polyurethane and the polyurethane urea comprising a unit having a substituent having an acidic hydrogen atom and a unit having a polysiloxane moiety in a side or main chain. The present... Agent:

20140349235 - Drawing apparatus, and method of manufacturing article: The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, the apparatus including an aperture array member in which a plurality of first apertures, for generating the plurality of charged particle beams, is formed, and a generating device configured to... Agent: Canon Kabushiki Kaisha

20140349236 - Method for forming semiconductor structure having opening: A method for forming a semiconductor structure having an opening is provided. First, a substrate is provided, wherein a first region and a second region are defined on the substrate and an overlapping area of the first region and the second region is defined as a third region. A pattern... Agent: United Microelectronics Corp.

20140349237 - Exposure photolithography methods: A method that forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second image pattern, respectively. The photoresist composition includes a polymer comprising at least one acid labile... Agent:

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