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Radiation imagery chemistry: process, composition, or product thereof January recently filed with US Patent Office 01/13

20130029255 - Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition: (in the formula, each of R11 and R12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X11 represents an aryl group; M11 represents a single bond or a divalent linking group; and Q11 represents an alkyl group, a cycloalkyl group... Agent: Fujifilm Corporation

20130029254 - Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition: A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity... Agent: Fujifilm Corporation

20130029253 - Extreme ultraviolet masks having annealed light-absorptive borders and associated fabrication methods: Embodiments of a method for fabricating an extreme ultraviolet (EUV) mask having a die pattern area are provided, as are embodiments of a method for fabricating an integrated circuit utilizing an EUV mask and embodiments of an EUV mask. In one embodiment, the EUV mask fabrication method includes obtaining an... Agent: Globalfoundries Inc.

20130029256 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The electrophotographic photosensitive member includes a surface layer containing (α), (β) and (γ).... Agent: Canon Kabushiki Kaisha

20130029258 - Hydrophobic silica particles and method of producing same: Hydrophobic silica particles are produced by reacting them with a hydrosiloxane agent.... Agent: Cabot Corporation

20130029257 - Thermochromic color-memorization toner, cartridge including same housed therein, image formation apparatus, cartridge set, and image formation apparatus set: The present invention relates to a thermochromic color-memory toner containing: a microcapsule pigment encapsulating a thermochromic color-memory composition; and a binder resin, in which the microcapsule pigment shows a hysteresis characteristic that, in a temperature-rise process, decoloration starts when the temperature reaches t3 and the pigment completely reaches a decolored... Agent: The Pilot Ink Co., Ltd.

20130029261 - Polymerized toner and preparation method of the same: The present invention relates to a polymerized toner prepared by suspension polymerization. In particular, the polymerized toner comprises a plurality of toner particles that each comprising a binder resin, a pigment, a pigment stabilizer, a charge control agent, and a wax. The polymerized toner maintains a ratio of toner particles... Agent: Lg Chem, Ltd.

20130029262 - Magenta polymerized toner: This disclosure relates to magenta polymerized toner comprising magenta pigment selected from quinacridone-based derivatives and magenta pigment selected from diketo-pyrrolopyrrole derivatives, having high transfer efficiency, high image density, and uniform particle distribution.... Agent: Lg Chem, Ltd.

20130029263 - Toner for non-contact fusing: A toner for non-contacting fusing containing toner matrix particles containing a resin binder and an external additive having an average particle size of from 10 to 100 nm, wherein the external additive is externally added to the toner matrix particles, wherein the resin binder contains one or more polyesters, wherein... Agent: Kao Corporation

20130029259 - Developer for electrostatic latent image development and image forming method: A developer for electrostatic latent image development including a positively chargeable toner and a fatty acid metal salt is used, in which the fatty acid metal salt is a metal salt selected from the group consisting of zinc, calcium, and magnesium salts of fatty acids of 12 to 20 carbon... Agent: Kyocera Document Solutions Inc.

20130029260 - Toner, developer and method for producing toner: A toner including: a core particle; and fine resin particles, the core particle containing at least a binder resin, a releasing agent and a colorant, wherein the toner is in shape of particles, and each toner particle has a sea-island structure having the core particle and island portions, which are... Agent:

20130029264 - Electrostatic image developing toner, electrostatic developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: An electrostatic image developing toner contains toner particles containing a polyester resin having a repeating unit deriving from a dicarboxylic acid and a repeating unit deriving from a rosin diol, and an external additive containing silica particles, wherein a weight average molecular weight (Mw) of the soluble matter in tetrahydrofuran... Agent: Fuji Xerox Co., Ltd.

20130029265 - New magenta quinacridone pigments: The invention relates to single phase solid solutions containing 65 to 98 wt.-% unsubstituted quinacridone, 1 to 34 wt.-% 2,9-dimethylquinacridone and 1 to 10 wt.-% 2,9-dichloroquinacridone, relative to the total weight of the single phase solid solution.... Agent: Clariant Finance (bvi) Limited

20130029266 - Method for producing electrophotographic photosensitive member: The present invention provides a method for producing an electrophotographic photosensitive member including a surface layer, the method including the steps of: forming a coat for the surface layer on the support by applying a surface-layer coating solution and forming the surface layer by drying the coat, wherein the surface-layer... Agent: Canon Kabushiki Kaisha

20130029267 - Flexographic printing plate precursor for thermal development, and process for making a flexographic printing plate: A flexographic printing plate precursor for thermal development is provided that comprises a relief-forming layer on/above a support; the relief-forming layer comprising (Component A) a polymer having a glass transition temperature (Tg) of at least 25° C., (Component B) a photopolymerization initiator, and (Component C) an ethylenically unsaturated compound having... Agent: Fujifilm Corporation

20130029268 - Photosensitive planographic printing plate precursor and method of producing a planographic printing plate: The invention provides a planographic printing plate precursor that is capable of providing a planographic printing plate in which ablation at the time of infrared laser exposure is inhibited and which has excellent developability of a non-image portion and printing durability of an image portion. The photosensitive planographic printing plate... Agent: Fujifilm Corporation

20130029269 - Positive resist composition and pattterning process: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR22)m—, B is... Agent: Shin-etsu Chemical Co., Ltd.

20130029270 - Resist composition and patterning process: A resist composition is provided comprising a (co)polymer comprising recurring units of acid labile group-substituted (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid and/or recurring units having an acid labile group-substituted phenolic hydroxyl group, an acid generator, and a metal salt of carboxylic acid or a metal complex of β-diketone. Due... Agent: Shin-etsu Chemical Co., Ltd.

20130029271 - Photosensitive composition and compound for use in the photosenesitive composition: Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.... Agent: Lg Chem, Ltd.

20130029272 - Process for producing fine pattern: The present invention provides a process for producing a fine pattern including, (1) forming a first resin layer containing a photosensitive resin on a substrate; (2) forming a second resin layer containing a secondary or tertiary alkynyl alcohol, a photoacid generator, and a resin on the first resin layer; (3)... Agent: Canon Kabushiki Kaisha

20130029273 - Fabrication of fluidic features within a plastic substrate: In one aspect of the invention, methods, and devices are provided for creating microfluidic and nanofluidic features. In some embodiments, such methods and devices are used to create at least one channel of a desired volume within a channel in a plastic substrate.... Agent: Affymetrix, Inc.

20130022900 - Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: In a simulation step of simulating a surface configuration of a substrate which is used for a mask blank and which is set to an exposure apparatus, height information from a reference plane is derived from a plurality of measurement points on a main surface of the substrate. From the... Agent: Hoya Corporation

20130022901 - Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device: A lithographic apparatus includes an illuminator for receiving a beam of EUV radiation from a radiation source apparatus and for conditioning the beam to illuminate a target area of a patterning device, such as a reticle. The reticle forms a patterned radiation beam. A projection system transfers the pattern from... Agent: Asml Netherlands B.v.

20130022902 - Electrophotographic photoreceptor, image forming method and apparatus, and process cartridge: l

20130022903 - Photoreceptor and image forming method, image forming apparatus, and process cartridge using the photoreceptor:

20130022904 - Electrophotographic photoreceptor and manufacturing method therefore: where, R1, R2 and R3 each independently represent a hydrogen atom, halogen atom, optionally substituted C1-6 alkyl group, optionally substituted C1-6 alkoxyl group, C6-20 aryl group or heterocyclic group, X and Z represent single bonds or optionally substituted C1-6 alkylene groups, and Y represents an OCO group or COO group.... Agent:

20130022905 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus and image forming method: An electrostatic image developing toner includes (A) an amorphous polyester resin containing at least a repeating unit derived from a dicarboxylic acid component and a repeating unit derived from a dialcohol component represented by the specific formula, and (B) an amorphous polyester resin differing in the weight average molecular weight... Agent: Fuji Xerox Co., Ltd.

20130022906 - Polyester resin for toner, toner, developer, toner cartridge, process cartridge, and image forming apparatus: wherein each of R1 and R2 independently represents a hydrogen atom or a methyl group, each of L1, L2 and L3 independently represents a divalent linking group selected from the group consisting of carbonyl groups, ester groups, ether groups, sulfonyl groups, substituted or unsubstituted chained alkylene groups, substituted or unsubstituted... Agent: Fuji Xerox Co., Ltd.

20130022907 - Polymer derived from dehydroabietic acid and uses thereof: Disclosed is a polymer which has a repeating unit containing a skeleton derived from dehydroabietic acid in the main chain, and has a glass transition point of 80° C. or lower.... Agent: Fujifilm Corporation

20130022908 - Polyester resin for toner, electrostatic-image-developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: wherein, each of R1 and R2 independently represents a hydrogen atom or a methyl group; L1 represents a divalent linking group having the following Formula (I); each of L2 and L3 independently represents a divalent linking group selected from the group consisting of carbonyl groups, carboxyl groups, ether groups, sulfonyl... Agent: Fuji Xerox Co., Ltd.

20130022914 - Homoadamantane derivative, method for producing the same and photosensitive materials for photoresist: A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of... Agent: Idemitsu Kosan Co., Ltd.

20130022913 - Method for producing positive-type photosensitive resin composition, positive-type photosensitive resin composition, and filter: A method for producing a positive-type photosensitive resin composition which includes a process of filtering the positive-type photosensitive resin composition containing a surfactant by using a filter, wherein a contact angle on one surface of the filter is equal to or more than 30 degrees and equal to or less... Agent: Sumitomo Bakelite Co., Ltd.

20130022911 - Polymer, resist composition and method of forming resist pattern: A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO2-containing cyclic group, a structural unit (a3) containing at least one group... Agent: Tokyo Ohka Kogyo Co., Ltd.

20130022912 - Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound: A radiation-sensitive resin composition includes a first polymer having a structural unit represented by a following formula (1), and a radiation-sensitive acid generator. RC in the formula (1) preferably represents an aliphatic polycyclic hydrocarbon group having a valency of (n+1) and having 4 to 30 carbon atoms. The structural unit... Agent: Jsr Corporation

20130022909 - Resist composition and method for producing resist pattern: r

20130022910 - Resist composition and method for producing resist pattern:

20130022915 - Resist composition and method for producing resist pattern:

20130022926 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the... Agent: Jsr Corporation

20130022916 - Resist composition and method for producing resist pattern: r

20130022917 - Resist composition and method for producing resist pattern:

20130022918 - Resist composition and method for producing resist pattern:

20130022919 - Resist composition and method for producing resist pattern:

20130022920 - Resist composition and method for producing resist pattern:

20130022921 - Resist composition and method for producing resist pattern:

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20130022923 - Resist composition and method for producing resist pattern:

20130022924 - Resist composition and method for producing resist pattern:

20130022925 - Resist composition and method for producing resist pattern:

20130022927 - Photosensitive composition and photosensitive lithographic printing plate material: A photosensitive composition containing at least an aqueous dispersion comprising an oil-in-water emulsion of a photopolymerization initiator and an oil-in-water emulsion of a compound having a polymerizable double bond group, at least one of the oil-in-water emulsion of the photopolymerization initiator and the oil-in-water emulsion of the compound having a... Agent: Mitsubishi Paper Mills Limited

20130022928 - Resist composition and method for producing resist pattern: p

20130022929 - Method and system for manufacturing a surface using shaped charged particle beam lithography: In the field of semiconductor production using shaped beam charged particle beam lithography, a pattern is formed on a surface by dragging a charged particle beam across the surface in a single extended shot to form a track. In some embodiments, the track may form a straight path, a curved... Agent: D2s, Inc.

20130022930 - Method for reversing tone of patterns on integrated circuit and patterning sub-lithography trenches: A method for reversing the tone of a lithographic image on a substrate comprises depositing a modifiable material on a substrate; applying a photolithographic material on the modifiable material; defining a removable patterned area in the photolithopgraphic material by photolithograpic means; removing the patterned area to produce an exposed region... Agent: International Business Machines Corporation

20130017474 - Method of forming assist feature patterns: A method of forming assist feature patterns includes providing an original layout pattern having at least a first region defined therein, the first region having a first light transmission rate larger than 0%; performing a search step to the original layout pattern to define at least a second region having... Agent:

20130017475 - Method of inspecting mask, mask inspection device, and method of manufacturing mask: There is provided a method of high-sensitively detecting both of a phase defect existing in a mask blank and a phase defect remaining after manufacturing an EUVL mask. When the mask blank is inspected, EUV light having illumination NA to be within an inner NA but a larger value is... Agent: Renesas Electronics Corporation

20130017476 - Measuring apparatus, drawing apparatus, and article manufacturing method: The beam measuring apparatus of the present invention includes a detection device including a shield member that has an edge, and a detector configured to detect the beam of which at least a part is not shielded by the shield member; a relative movement mechanism configured to cause a relative... Agent: Canon Kabushiki Kaisha

20130017477 - Electrostatic imaging member and methods for using the same: Embodiments pertain to a novel imaging member, namely, an electrostatic latent image generating member, and methods for using the same, that can generate an electrostatic latent image through charge acceptance control and without the need for conventional post charging photodischarge, eliminating process steps and avoiding limitations in system speed due... Agent: Xerox Corporation

20130017478 - Image-forming apparatus, electrophotographic photoreceptor, and process cartridge: b

20130017479 - Phenolic phosphite containing photoconductors: A photoconductor containing an optional supporting substrate layer, a photogenerating layer, a charge transport layer, and a top overcoat layer of a phenolic compound, a phosphite compound, an optional charge transport compound, an optional melamine resin, an optional acrylated polyol, and an optional catalyst.... Agent: Xerox Corporation

20130017480 - Toner set for electrophotography, and image forming method and apparatus: A toner set for electrophotography, including a black toner; a yellow toner; a magenta toner; a cyan toner; and a bright yellow toner, wherein the magenta toner includes a magenta colorant mainly including C.I. Pigment Red 122, the yellow toner has a hue angle of from 93 to 100° and... Agent:

20130017481 - Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: An electrostatic charge image developing toner includes: a polyester resin containing a graft copolymer, the graft copolymer being formed with a polyester skeleton as a main chain and block copolymers containing a styrene-based polymer block and a crystalline acrylate-based polymer block. The styrene-based polymer block is grafted onto the polyester... Agent: Fuji Xerox Co., Ltd.

20130017482 - Electrostatic image developing carrier, electrostatic image developer, process cartridge, image forming method, and image forming apparatus: An electrostatic image developing carrier includes a ferrite particle that contains magnesium element in an amount of about 3.0 wt % or more and about 10.0 wt % or less and manganese element in an amount of about 0.2 wt % or more and less than about. 1.0 wt %;... Agent: Fuji Xerox Co., Ltd.

20130017483 - Electrode and method for manufacturing the same: The invention relates to an electrode that can be formed by firing in air a conductive paste comprising a copper powder, a boron powder, an additional inorganic powder, a glass frit, and an organic medium, wherein the additional inorganic powder is selected from the group consisting of silica powder, indium... Agent: E. I. Du Pont De Nemours And Company

20130017485 - Lithographic printing plate precursor and method of producing thereof: To provide a lithographic printing plate precursor which is excellent in the gum development property, running processing property and scratch resistance and a lithographic printing plate precursor which is good in all performances of the on-press development property, ink receptivity, sensitivity and printing durability, and a method of producing thereof.... Agent: Fujifilm Corporation

20130017484 - Polymerizable ester compound, polymer, resist composition, and patterning process: Polymerizable ester compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 is an acid labile group, Aa is a divalent hydrocarbon group which may be separated by —O— or —C(═O)—, and k1 is 0 or 1. They are useful as monomers to produce polymers... Agent:

20130017486 - Process of making a lithographic structure using antireflective materials: A lithographic structure comprising: an organic antireflective material disposed on a substrate, and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or... Agent: International Business Machines Corporation

20130017487 - Compositions and processes for photolithography: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.... Agent: Rohm And Haas Electronic Materials LLC

20130017488 - Self-imageable layer forming polymer and compositions thereof: Copolymers and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such copolymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such and maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k,... Agent: Sumitomo Bakelite Co., Ltd.

20130017489 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130017490 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130017491 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130017492 - Patterning process and resist composition: An image is formed via positive/negative reversal on organic solvent development using a photoresist film comprising a polymer comprising recurring units of isosorbide (meth)acrylate in which one hydroxyl group of isosorbide is bonded to form (meth)acrylate and the other hydroxyl group is substituted with an acid labile group and an... Agent: Shin-etsu Chemical Co., Ltd.

20130017493 - Method for improving print performance of flexographic printing elements: A method of making a relief image printing element having a relief pattern comprising a plurality of relief dots, wherein the photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon and a masking layer on the at least one photocurable layer is provided. The... Agent:

20130017494 - Photoresist processing methods: A photoresist processing method includes treating a substrate with a sulfur-containing substance. A positive-tone photoresist is applied on and in contact with the treated substrate. The method includes selectively exposing a portion of the photoresist to actinic energy and developing the photoresist to remove the exposed portion and to form... Agent: Micron Technology, Inc.

20130017495 - Interference exposure apparatus, interference exposure method, and manufacturing method of semiconductor device: According to one embodiment, an interference exposure apparatus of the embodiment includes a light path changing section in which a changing element adapted to change a light path direction and a light path length of a plurality of light beams with respect to the plurality of light beams having coherency... Agent:

20130017496 - Method for manufacturing recording head: A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which... Agent: Canon Kabushiki Kaisha

20130017499 - Process for production of photoresist pattern: Disclosed is a process for producing a photoresist pattern, comprising the steps of: preparing a photomask that comprises a metal nano structure having a metal film arranged thereon and can generate a plasmon resonance, on a mask substrate; preparing a photoresist film that is formed on the surface of the... Agent: National University Corporation Hokkaido University

20130017497 - Synthesis and applications of soluble pentacene precursors and related compounds: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.... Agent: Academia Sinica

20130017498 - Tunable two-mirror interference lithography system: A two-beam interference lithography system offers large-area nanopatterning with tunability of pattern periodicities. The tunable feature is achieved by placing two rotatable mirrors in the two expanded beam paths which can conveniently be regulated for the designed pattern periodicities. While the effective interference pattern coverage is mainly determined by the... Agent:

20130017500 - Method of forming resist pattern: A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an... Agent: Tokyo Ohka Kogyo Co., Ltd.

20130017501 - Method of forming resist pattern: A method of forming a resist pattern, comprising: a step of forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of acid and an acid-generator component (B) which generates acid upon exposure; a... Agent: Tokyo Ohka Kogyo Co., Ltd.

20130017502 - Method of controlling surface roughness of a flexographic printing plate: A method of controlling surface roughness of a flexographic printing element during thermal processing is provided. An imaged and exposed relief image printing element is thermally developed to remove the portions of at least one layer of photopolymer that are not crosslinked and cured by a) heating the at least... Agent:

20130011773 - Optical member base material for euv lithography, and method for producing same: The present invention relates to a method for producing an optical member base material for EUVL, comprising performing the following in this order to obtain an optical member base material for EUVL: a preliminary-polishing step of preliminarily polishing a film forming surface and a back surface of the film forming... Agent: Asahi Glass Company, Limited

20130011772 - Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film: A photomask blank includes a transparent substrate and a film containing at least two layers having at least a first layer and a second layer formed on the transparent substrate. The first layer is made of a material containing one or more materials selected from the group Ta, Hf, Si,... Agent: Hoya Corporation

20130011777 - Decolorable toner and process for production thereof: Disclosed is a process for production of a decolorable toner, including: aggregating dispersed fine particles of a color material comprising at least a color-forming compound, a color-developing agent and a decoloring agent with dispersed fine particles comprising at least a binder resin comprising a polyester resin to form aggregates in... Agent: Toshiba Tec Kabushiki Kaisha

20130011774 - Electrostatic latent image developing toner, developer, toner cartridge, process cartridge, image forming method, and image forming apparatus: An electrostatic latent image developing toner includes: a release agent; a pigment; and a binder resin. The content of the pigment is from about 10% by weight to about 50% by weight, the glass transition temperature (Tg) of the toner is in the range of from about −60° C. to... Agent: Fuji Xerox Co., Ltd.

20130011776 - Erasable toner and process for production thereof: Disclosed is a decolorable toner produced by aggregating dispersed fine particles of a color material containing at least a color-forming compound, a color-developing agent and a decoloring agent with dispersed fine particles containing at least a binder resin having a carboxyl group, then adding a compound having a carbodiimide group... Agent: Toshiba Tec Kabushiki Kaisha

20130011775 - Toner and process for production thereof: Disclosed is a toner obtained by coating surfaces of core particles including at least a binder resin having a carboxyl group and a coloring agent with successive coatings of a water-soluble crosslinking agent capable of crosslinking with a carboxyl group and a water-soluble polymer having a carboxyl group, which have... Agent: Toshiba Tec Kabushiki Kaisha

20130011778 - Electrophotographic toner, method for producing toner, developer and image forming apparatus containing toner: An electrophotographic toner obtained from a dispersion or emulsion liquid of an oil phase containing a toner material in an aqueous medium, the toner including: a binder resin, wherein the toner material includes: (A) an epoxy resin prepolymer; (B) an adduct of a dihydric phenol with a polyalkylene oxide; (C)... Agent:

20130011779 - Toner, developer, process cartridge, image forming method, and image forming apparatus: A toner obtained by a method for producing a toner, which includes dissolving or dispersing in an organic solvent a toner material containing at least a binder resin, and a dispersion liquid of a crystalline polyester resin, so as to prepare a solution or dispersion liquid of the toner material,... Agent:

20130011780 - Carrier core particle for electrophotographic developer, carrier for electrophotographic developer and electrophotographic developer: A carrier core particle for an electrophotographic developer includes a core composition expressed by a general formula: MnxFe3−xO4+y (0<x≦1, 0<y) as a main ingredient, 0.1 wt % or more of Si, and 0.03 wt % or more of at least one metal element selected from the group consisting of Ca,... Agent: Dowa Electronics Materials Co., Ltd.

20130011781 - Carrier core particle for electrophotographic developer, method for manufacturing the same, carrier for electrophotographic developer and electrophotographic developer: A carrier core particle for an electrophotographic developer includes a composition expressed by a general formula: MnxFe3−xO4+y (0<x≦1, 0<y), a full width at half maximum z of the most intense peak (311) plane in a powder X-ray diffraction pattern satisfying 0.16 (degree)≦z, and a magnetization of 50 emu/g or higher... Agent: Dowa Electronics Materials Co., Ltd.

20130011782 - Polymer expanded particle, expanded toner and method for producing polymer expanded particle and expanded toner: A polymer expanded particle and an expanded toner having small pores, and a production method thereof are provided. A polymer expanded particle comprises micropores having an average pore diameter of less than 50 μm. An expanded toner comprises micropores having an average pore diameter of 1 μm to less than... Agent: Tp,pegawa Co., Ltd

20130011783 - Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns: Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and... Agent: Rohm And Haas Electronic Materials LLC

20130011785 - Pattern forming method and resist composition: o

20130011784 - Photosensitive sacrificial polymer with low residue: Embodiments according to the present invention relate generally to PAG bilayer and PAG-doped unilayer structures using sacrificial polymer layers that incorporate a photoacid generator having a concentration gradient therein. Said PAG concentration being higher in a upper portion of such structures than in a lower portion thereof. Embodiments according to... Agent: Georgia Tech Research Corporation

20130011786 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011787 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011788 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011789 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011790 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011791 - Coloring photosensitive composition, lithographic printing plate precursor and plate making method: e

20130011792 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011793 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011794 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011795 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20130011797 - Charged particle beam drawing apparatus and article manufacturing method: The drawing apparatus of the present invention includes an optical system housing configured to emit a charged particle beam toward the substrate; a stage configured to hold the substrate and be moved at least in a direction perpendicular to an axis of the optical system housing; a detection device including... Agent: Canon Kabushiki Kaisha

20130011796 - Drawing apparatus and method of manufacturing article: The present invention provides a drawing apparatus including a blanker including a plurality of deflectors configured to respectively deflect the plurality of charged particle beams, and a controller configured to transmit a control signal to the blanker, wherein the blanker includes a storage configured to store pattern data, a generator... Agent: Canon Kabushiki Kaisha

20130011798 - Method of applying patterned metallization to block filter resonators: An embodiment of the present invention provides a method of applying patterned metallization to a ceramic block comprising applying a photodefinable ink to said ceramic block; drying said ink; exposing said photodefinable ink to UV radiation through a predefined mask according to the thickness of the film to form a... Agent: Research In Motion Rf, Inc.

20130011799 - Method for the production of polymeric membranes having an ordered arrangement of high-aspect-ratio nanopores, by means of heavy ion bombing: A nanoporous polymeric membrane is obtained by bombing a polymer film by means of high energy focused heavy ion beams and subsequently performing chemical etching to remove the portions of the polymer film in the zones degraded by the ion bombing, in such a manner to obtain pores passing through... Agent: C.r.f. Societa Consortile Per Azioni

20130004887 - Holographic recording medium: Disclosed herein are novel nitrone compounds, holographic recording media that include the nitrone compound(s) and a polymer binder, a method of manufacturing a holographic recording medium where the nitrone compound, as a photochromic dye, is mixed with a polymer binder to form a holographic composition and molding the holographic composition... Agent: Sabic Innovative PlasticsIPB.v.

20130004888 - Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition: The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in... Agent: Fujifilm Corporation

20130004889 - Methods of forming patterned masks: Some embodiments include methods in which spaced-apart first features are formed from a first material having a reflow temperature. Second material is formed along sidewalls of the first features, and third material is formed over the second material and the first features. The third material may be formed at a... Agent: Micron Technology, Inc.

20130004890 - Toner for electrostatic latent image development: A toner used for electrostatic latent image development which is excellent in fixing separability with maintaining sufficient low temperature fixability even in a high-speed machine and is also superior in crashing resistance, comprising toner particles, each comprising a core particle and a shell layer provided on the surface of the... Agent: Konica Minolta Business Technologies, Inc.

20130004891 - Toner, manufacturing method thereof and image forming method: A toner comprising a modified polyester resin containing a structure represented by Formula (1a) or (1b), wherein, in Formula (1a) and (1b), R1 represents a hydrogen atom, a methyl group, or an ethyl group, R2 represents an aliphatic hydrocarbon which may be branched, or an aromatic hydrocarbon, and R3 represents... Agent: Konica Minolta Business Technologies, Inc.

20130004892 - Method of producting electronic circuit boards using electrophotography: The present invention provides a method producing printed electronic circuits using electrophotography.... Agent:

20130004893 - Coating compositions for use with an overcoated photoresist: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing,... Agent: Rohm And Haas Electronic Materials LLC

20130004894 - Under coat film material and method of forming multilayer resist pattern: Disclosed are: an underlayer underlayer film material for use in the formation of a resist underlayer film, which is highly soluble in safe solvents, has excellent etching resistance, and does not substantially cause the production of any sublimation product; and a resist pattern formation method using the underlayer film material.... Agent:

20130004895 - Photosensitive resin composition, photosensitive dry film and method for forming pattern: s

20130004896 - Compound for resist and radiation-sensitive composition specification: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic... Agent:

20130004897 - Method for manufacturing a planographic printing plate: A method of manufacturing a planographic printing plate is provided in which, even when an alkaline developer having a relatively low pH is used, the development property is excellent and the generation of development scum over time is inhibited. The manufacturing method includes, in this order: subjecting a positive-working planographic... Agent: Fujifilm Corporation

20130004898 - Making a microfluidic device with improved adhesion: A method for making a microfluidic device, the method includes providing at least one inorganic layer on a substrate; applying an alkoxysilane material containing a primary or secondary amine on the at least one inorganic layer; baking the applied alkoxysilane material at a temperature greater than 130 degrees C.; applying... Agent:

20130004899 - Sub-wavelength lithography via rabi oscillations: A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure... Agent:

20130004900 - Method for forming resist under layer film, pattern forming method and composition for resist under layer film: A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an... Agent: Jsr Corporation

20130004901 - Coating compositions for use with an overcoated photoresist: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal... Agent: Rohm And Haas Electronic Materials LLC