|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof December patent applications/inventions, industry category 12/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 12/27/2012 > 21 patent applications in 15 patent subcategories. patent applications/inventions, industry category
20120328973 - Method of recording data in an optical data storage medium and an optical data storage medium: In accordance with one aspect of the present invention, a method for recording holographic data in an optical data storage medium is provided. The method includes (i) providing an optical data storage medium including: (a) a thermoplastic polymer matrix, (b) a latent acid generator, (c) a non-linear sensitizer, and (d)... Agent: General Electric Company
20120328974 - Photomask defect correcting method and device: A photomask defect correction method and device correct an opaque or a clear defect of a photomask. An opaque or clear defect in a portion of a photomask to be corrected is observed and information of the observed defect for performing correction of the defect is acquired. The observed defect... Agent:
20120328975 - Perimidine-based squarylium dye, dye-containing composition, and image-forming material: wherein the isomer A is an isomer of the peak shown in the longest retention time among all peaks due to isomers obtained by analysis of the compound by means of reversed-phase high-performance liquid chromatography, and Pa represents a value of the peak area of the isomer A relative to... Agent: Fuji Xerox Co., Ltd.
20120328976 - Toner, method for producing the same, and image forming apparatus: A toner including: a base resin; and charge-controlling resin particles contained in the base resin, wherein the toner is in shape of particles, and the charge-controlling resin particles are present in a region of each toner particle which is 500 nm in depth from a surface of the toner particle... Agent:
20120328978 - Developing agent, method for evaluating developing agent, and method for producing developing agent: According to one embodiment, a developing agent includes a binder resin and a coloring agent, wherein when the developing agent is subjected to methanol extraction, and a filtrate of the resulting extract is subjected to HPLC measurement, the ratio of a peak area at a retention time of 10 minutes... Agent: Kabushiki Kaisha Toshiba
20120328977 - Toner and process for production thereof: Encapsulated toner particles are formed by: aggregating core material particles containing at least a colorant and a core material resin in an aqueous dispersion medium to form core particles; adding coating resin particles into the aqueous dispersion medium during progress of the formation of the core material at a point... Agent: Toshiba Tec Kabushiki Kaisha
20120328979 - Toner and process for producing toner: c
20120328981 - Preparation method for toner by using alkali-soluble resin containing acidic group: Disclosed is a preparation method for a toner. Problems according to use of a surfactant can be solved and it is possible to prepare toner particles having a uniform distribution of particle size by using an alkali-soluble resin containing an acidic group.... Agent: Samsung Fine Chemicals Co., Ltd.
20120328980 - Production process of toner for electrostatic image development: The toner for electrostatic image development has excellent charge properties, by which excellent toner particle size-controlling ability is achieved, and moreover the sharpening of a particle size distribution is achieved. The toner is composed of toner particles containing a binder resin. The process has an aggregating step of adding an... Agent: Konica Minolta Business Technologies, Inc.
20120328983 - Polymer composition and photoresist comprising same: e
20120328982 - Positive resist composition and method of forming resist pattern: A positive resist composition including: a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid; an acid generator component (B) which generates acid upon exposure; a fluorine-containing compound component (F); and a photosensitizer (G).... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120328984 - Process for producing azo compounds, pigment dispersion, coloring composition, ink for inkjet recording, coloring composition for color filter, and color filter: A process for producing, for example, an azo pigment represented by the general formula (9), which includes a step of preparing a solution containing a compound represented by the following general formula (7) and an acid, and a step of bringing the solution incontact with a diazonium salt (8) derived... Agent: Fujifilm Corporation
20120328987 - Patterning process and resist composition: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of cycloolefin... Agent: Shin-etsu Chemical Co., Ltd.
20120328988 - Drawing apparatus, method of manufacturing article, and processing apparatus: A drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams includes: a blanking deflector located in a vacuum chamber and configured to blank each of the plurality of charged particle beams; a device located in an external chamber in which a gas pressure is... Agent: Canon Kabushiki Kaisha
20120328989 - Slip film for relief image printing element: A method of preparing a photosensitive printing blank, the method comprising the steps of: a) coating a slip film onto a coversheet and drying the slip film; and depositing at least one layer of photosensitive material on top of the slip film coated coversheet and laminating a substrate layer to... Agent:
20120328990 - Underlayer composition and process thereof: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an... Agent: Az Electronic Materials Usa Corp.
20120328991 - Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate: Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition... Agent: Samsung Electronics Co., Ltd.
20120328992 - Semiconductor device manufacturing method: A semiconductor device manufacturing method includes applying illumination light to a photomask, and projecting diffracted light components from the photomask via a projection optical system to form a photoresist pattern on a substrate. The photomask includes a plurality of opening patterns which are arranged on each of a plurality of... Agent: Kabushiki Kaisha Toshiba
20120328993 - Method of producing polymeric compound, resist composition, and method of forming resist pattern: A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt... Agent: Tokyo Ohka Kogyo Co., Ltd.12/20/2012 > 15 patent applications in 13 patent subcategories. patent applications/inventions, industry category
20120321998 - Photopolymer formulation having triazine-based writing monomers: The invention relates to a photopolymer formulation comprising polyurethane matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where R1, R2, R3 independent of each other are each a halogen atom or an organic radical, wherein at least one of the radicals is an... Agent: Bayer Intellectual Property Gmbh
20120321997 - Urethanes used as additives in a photopolymer formulation: The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers and photo initiators, to a method for producing said photopolymer formulation, a photopolymer formulation obtained according to said method, a sheeting, a film, a layer, a layer structure or a moulded body made from said photopolymer formulation and... Agent: Bayer Intellectual Property Gmbh
20120321999 - Glass substrate-holding tool and method for producing an euv mask blank by employing the same: A glass substrate-holding tool, adapted to be employed during the production of a reflective mask blank for EUV lithography (EUVL), includes an electrostatic chuck and a supporting member. The chuck attracts a rear surface of a glass substrate in a non-contact manner by electrostatic attractive force. The supporting member partly... Agent: Asahi Glass Company, Limited
20120322000 - Reflective mask blank for euv lithography and process for producing the same: To provide an EUV mask blank provided with a low reflective layer, which has excellent properties as an EUV mask blank. A reflective mask blank for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light, an absorber layer for absorbing EUV light and a low reflective... Agent: Asahi Glass Company, Limited
20120322001 - Developing agent and image forming apparatus: According to one embodiment, a developing agent includes a toner core particle containing a binder resin having a carboxyl group and a coloring agent and a surface layer formed on the toner core particle. The surface layer is formed by crosslinking the toner core particle, a water-soluble polymeric crosslinking agent... Agent: Kabushiki Kaisha Toshiba
20120322002 - Toner additive comprising carbon-silica dual phase particles: The invention provides a toner composition comprising resin particles, a colorant, and a toner additive, wherein the toner additive comprises carbon-silica dual phase particles, wherein the carbon-silica dual phase particles comprise aggregates of carbon black comprising at least one silicon-containing region, and wherein the carbon-silica dual phase particles are distributed... Agent:
20120322003 - Natural oil-based chemically produced toner: A natural oil-based toner resin for producing toner in developing electrophotographic image comprising a copolymer of unsaturated polyester resins and vinyl monomers, wherein the polyester resins have a molecular weight of 500 to 30000 and obtained from polycondensation between a polycarboxylic acid, a natural oil or derivative thereof and a... Agent:
20120322004 - Electrostatic charge image developing carrier, method of producing electrostatic charge image developing carrier, electrostatic charge image developing developer, process cartridge, image forming apparatus, and image forming method: An electrostatic charge image developing carrier includes a core particle and a coating layer with which the surface of the core particle is coated. The coating layer includes an acrylic resin having a constituent unit in which a silicone chain is disposed in a branch.... Agent: Fuji Xerox Co., Ltd.
20120322005 - Particles and method for producing the same, toner and method for producing the same, developer, process cartridge, image forming method and image forming apparatus: A method for producing particles, including: bringing a compressive fluid into contact with a pressure plastic material, so as to plasticize the pressure plastic material; applying a shear force to the compressive fluid and the plasticized pressure plastic material, between which an interface exists, in the presence of a surfactant... Agent:
20120322007 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer containing an organic solvent, wherein the resist composition contains (A) a resin,... Agent: Fujifilm Corporation
20120322008 - Development of printing members having post-anodically treated substrates: Gum solutions are formulated to protect a negative-working photopolymer imaging layer coated on an anodized aluminum substrate that has undergone a post-anodic sealing treatment with inorganic phosphate and inorganic fluoride, followed by development. In various embodiments, the developer and gum solution have different compositions but contain at least one polycarboxylic... Agent:
20120322009 - Method of preparing lithographic printing plate and developer for lithographic printing plate precursor: By a method of preparing a lithographic printing plate having exposing a lithographic printing plate precursor including a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer in this order on a hydrophilic support with... Agent: Fujifilm Corporation
20120322010 - Novel polymer composition and method of making the same: A novel novolac prepared by acid catalyzed condensation between biphenols or bisphenofluorenes and fluorenone is presented. The polymers exhibit excellent oxidative thermal stability and high carbon content, suitable for dielectric, etch stop applications as spin-on material.... Agent: Silecs Oy
20120322011 - Methods and apparatus for performing multiple photoresist layer development and etching processes: The present invention provides methods and an apparatus controlling and minimizing process defects in a development process, and modifying line width roughness (LWR) of a photoresist layer after the development process, and maintaining good profile control during subsequent etching processes. In one embodiment, a method for forming features on a... Agent: Applied Materials, Inc.12/13/2012 > 12 patent applications in 9 patent subcategories. patent applications/inventions, industry category
20120315572 - Method of preparing carrier for electrophotography, carrier for electrophotography, developer for electrophotography, process cartridge and image forming apparatus: A method of preparing carrier for electrophotography, which includes a core material and a coating material layer formed on the surface of the core material, including coating a coating material of the coating material layer on the core material; and burning the coating material by an induction heater, wherein the... Agent:
20120315576 - Charge controlling agent and toner using same: where R1 represents a hydrogen atom, etc.; R2 represents a hydrogen atom, a linear or branched alkyl group having 1 to 8 carbon atoms which may have a substituent, a substituted or unsubstituted heterocyclic group, etc.; R3 to R7, which may be identical to or different from each other, represent... Agent: Hodogaya Chemical Co., Ltd.
20120315573 - Charge control agent composition and toner utilizing the same: A composition comprising a metal compound (A) of aromatic hydroxycarboxylic acid having an aromatic hydroxycarboxylic acid bonded with a metal atom selected from a zirconium atom, a calcium atom, an aluminum atom, a chromium atom, a boron atom and a zinc atom via at least any of ionic bond, covalent... Agent: Hodogaya Chemical Co., Ltd.
20120315574 - Toner: A toner is provided that exhibits a high long-term image stability even during high-speed printing and that also exhibits an excellent environmental stability. The toner comprises a binder resin, a colorant, and a nonionic surfactant, wherein the nonionic surfactant has an oxyethylene group (EO) and an oxypropylene group (PO) and... Agent: Canon Kabushiki Kaisha
20120315575 - Toner for developing electrostatic images: The present invention is to provide a toner for developing electrostatic images having excellent fixability, peelability, shelf stability (blocking resistance), printing durability, printing durability after being left at high temperature and thin line reproducibility. A toner for developing electrostatic images, comprising colored resin particles comprising a binder resin, a colorant... Agent: Zeon Corporation
20120315577 - Liquid developer: A liquid developer includes toner particles, an insulating liquid, and a dispersant, and is characterized in that the toner particles includes a resin and a pigment dispersed in the resin, the resin includes a polyester resin, the dispersant includes a basic polymeric dispersant, and a solid obtained by drying the... Agent: Konica Minolta Holdings, Inc.
20120315578 - Apparatus and method for spin-coating, and method for manufacturing substrate having structure: Disclosed herein are an apparatus and a method for spin coating, and a method for manufacturing a substrate having a structure. The spin-coating apparatus includes a support to support a substrate having a structure, a motor to rotate the support to perform spin-coating with respect to the structure, and a... Agent: Samsung Electro-mechanics Co., Ltd.
20120315579 - Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof: A colored curable composition is provided which has good developability, has excellent color purity, can be formed into a thin film, and has a high absorption coefficient. The colored curable composition includes at least one of specific dipyrromethene metal complex compounds and tautomers thereof. Also, a colored curable composition suitable... Agent: Fujifilm Corporation
20120315581 - Patterning process and resist composition: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units of (meth)acrylate... Agent:
20120315582 - Patterned substrate and method for producing same: Disclosed is a patterned substrate having a conductor pattern. The conductor pattern is obtained by forming a layer (B) containing an organic polysilane on a conductive substrate (A), irradiating a certain region of the layer (B) with a radiation for oxidizing the organic polysilane constituting the layer (B) in the... Agent: Sumitomo Chemical Company, Limited
20120315583 - Methods of generating three-dimensional process window qualification: In a method of generating a three-dimensional process window qualification, a photoresist layer is coated on a substrate including an underlying structure. A plurality of circular-shaped regions of the substrate are distinguished into 1 to n regions to partition the substrate into a center portion and an edge portion, n... Agent: Samsung Electronics Co., Ltd.12/06/2012 > 22 patent applications in 15 patent subcategories. patent applications/inventions, industry category
20120308918 - Photosensitive recording material: The present application provides an improved photosensitive holographic recording composition. In particular, the improvement comes from adding glycerol.... Agent:
20120308919 - Manufacturing method for color filter substrate, photomask and photoreactive layer: A manufacturing method for a color filter substrate is disclosed in the present disclosure, which comprises the following steps of: providing a substrate; providing a photoreactive layer that covers the substrate; providing a photomask disposed above the photoreactive layer; and providing light rays of different frequency bands for irradiating the... Agent: Shenzhen China Star Optoelectronics Technology Co. Ltd.
20120308921 - Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product: A method of optimizing a die size in a method of manufacturing devices using a lithographic apparatus, wherein the lithographic apparatus is arranged to expose an image field of variable size in a single exposure step, the image field having a certain maximum size, the method comprising: receiving a desired... Agent: Asml Netherlands B.v
20120308922 - Pellicle mounting apparatus and assembly with pellicle mounted on mask: An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is provided within the chamber. The mask is irradiated with a vacuum ultra violet (VUV)... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20120308920 - Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process: There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium... Agent: Shin-etsu Chemical Co., Ltd.
20120308923 - Surface treated toner: A toner composition includes resin core particles having outer surfaces, and surface treatment, wherein the surface treatment includes at least first metal oxide particles having a surface area equivalent average particle diameter of greater than 25 nm and a surface energy of less than 28 erg/cm2, as determined by methanol... Agent:
20120308924 - Process for adhering surface treatment to toner: A process for adhering surface treatment to toner resin core particles includes: providing resin core particles including a binder polymer having a Tg and having outer surfaces; providing surface treatment including at least first metal oxide particles having an average particle size of greater than 25 nm and a surface... Agent:
20120308925 - Hyperpigmented black low melt toner: The present disclosure describes a hyperpigmented low melt black toner containing a thermal carbon black which exhibits reduced dielectric loss and improved tribo charging.... Agent: Xerox Corporation
20120308926 - Toner and toner binder: e
20120308927 - Polymers, photoresist compositions and methods of forming photolithograhic patterns: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.... Agent: Rohm And Haas Electronic Materials LLC
20120308929 - Wet lamination of photopolymerizable dry films onto substrates and compositions relating thereto: The invention is directed to a lamination fluid useful in processes for wet laminating a photopolymerizable film onto circuit board panels or other substrates. The lamination system comprises 1) a dry film photoresist, 2) a laminate comprising i) copper ii) stainless steel iii) non metal on a surface, 3) a... Agent: E I Du Pont De Nemours And Company
20120308930 - Patterning process and resist composition: A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer comprising recurring units having an... Agent:
20120308932 - Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition: There is disclosed a polymer having a repeating unit shown by the following general formula (1). There can be, in a photolithography using a high energy beam such as an ArF excimer laser beam and an EUV as a light source, (1) a polymer that gives a resist composition having... Agent: Shin-etsu Chemical Co., Ltd.
20120308931 - Resist composition and method of forming resist pattern: in which R1 represents a monovalent chain-like aliphatic hydrocarbon group containing a hetero atom at an arbitrary position, Y5 represents an alkylene group of 1-4 carbons which may have a substituent or a fluorinated alkylene group of 1-4 carbons which may have a substituent, and A+ represents an organic... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120308933 - Radiation sensitive self-assembled monolayers and uses thereof: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive... Agent: International Business Machines Corporation
20120308935 - Flexographic processing solution and use: e
20120308934 - Method for preparing a composite printing form: The invention pertains to a method for preparing a composite printing form from a single precursor that is capable of forming a relief and a carrier. The single precursor can be a single photosensitive element or a single laser-engravable print element having a reinforced elastomeric layer. The single precursor has... Agent: E I Du Pont De Nemours And Company
20120308936 - Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display: An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts, where the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask... Agent: Samsung Electronics Co., Ltd.
20120308937 - Uni-directional beam splitter coating: A beam splitter optical surface comprises a transparent substrate and a multilayer optical coating applied in a pattern onto the transparent substrate. The multilayer optical coating has at least an optically reflective layer and an optically absorbent layer.... Agent: Oasys Technology, LLC
20120308938 - Method for forming pattern and developer: A pattern-forming method includes forming a resist film on a substrate using a photoresist composition, exposing the resist film, and developing the exposed resist film using a negative developer that includes an organic solvent. The photoresist composition includes (A) a polymer that includes a structural unit (I) including an acid-labile... Agent: Jsr Corporation
20120308939 - Bottom antireflective coating compositions and processes thereof: where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention... Agent: Az Electronic Materials Usa Corp.Previous industry: Chemistry: electrical current producing apparatus, product, and process
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