|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof November recently filed with US Patent Office 11/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/29/2012 > 17 patent applications in 11 patent subcategories. recently filed with US Patent Office
20120301817 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method: An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.... Agent: Fujifilm Corporation
20120301818 - Protective coatings for bias charge rollers: Exemplary embodiments provide materials and methods for an electrostatic charging member including a conductive substrate; a base layer disposed over the conductive substrate, the base layer comprising an elastomeric material and a semiconductive material; and a protective outer layer disposed over the base layer, the protective outer layer comprising a... Agent: Xerox Corporation
20120301820 - Liquid developer and method for producing liquid developer: A liquid developer is provided. The liquid developer includes a liquid insulator and toner particles. The liquid insulator toner particles include a resin material, a colorant, a substance A, a substance B, and a substance C. The substance A is an acrylic-modified silicone. The substance B is at least one... Agent: Seiko Epson Corporation
20120301821 - Method for producing toner: Disclosed is a method of producing toner. According to the method, a concentration of a dispersion stabilizer, a concentration of an aggregating agent, and a concentration of a hydrogen ion in a reaction solution of an aggregation process are controlled to produce toner particles having a narrow particle size distribution... Agent: Samsung Fine Chemicals Co., Ltd.
20120301822 - Method for producing toner: Disclosed is method of preparing toner. According to the method, a concentration of a surfactant, a concentration of an aggregating agent, and a concentration of a hydrogen ion in a reaction solution of an aggregation process are controlled to produce toner particles having a narrow particle size distribution and excellent... Agent: Samsung Fine Chemicals Co., Ltd.
20120301824 - Layered structure and photosensitive dry film to be used therefor: In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic filler in the photosensitive resin layer or cured film layer is low on the side contacting the substrate... Agent: Taiyo Holdings Co., Ltd.
20120301825 - Layered structure and photosensitive dry film to be used therefor: In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic filler in the photosensitive resin layer or cured film layer is lower in a surface layer region away... Agent: Taiyo Holdings Co., Ltd.
20120301823 - Polymer composition and photoresist comprising the polymer: wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising β-diketone, β-ester-ketone, β-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable... Agent: Rohm And Haas Electronic Materials LLC
20120301826 - Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same: Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the... Agent:
20120301827 - Positive photosensitive resin composition and lyophobic film: A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent... Agent: Nissan Chemical Industries, Ltd.
20120301828 - Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer: A composition comprising a polymer comprising repeat units selected from formulae (1) to (4), an aromatic ring-containing polymer, a near-infrared absorbing dye, and a solvent is used to form a near-infrared absorptive film. R1, R7, R9, and R14 are H, methyl, fluorine or trifluoromethyl, R2 to R6 are H, F,... Agent:
20120301831 - Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same: An actinic ray-sensitive or radiation-sensitive resin composition, and a resist film and a pattern forming method using the composition are provided, the composition including (A) a compound capable of decomposing by the action of an acid to increase the solubility of the resin (A) in an alkali developer; (B) a... Agent: Fujifilm Corporation
20120301832 - Substrate warpage removal apparatus, substrate processing apparatus, substrate warpage removal method, substrate processing method and storage medium: There is provided a substrate warpage removal apparatus and method which can remove warpage of a substrate which has a patterned surface having a film with a pattern, and a non-patterned surface having a film without a pattern. The substrate warpage removal apparatus includes: a holding plate configured to hold... Agent: Tokyo Electron Limited
20120301833 - Method of reducing microloading effect: The present invention provides a method of reducing microloading effect by using a photoresist layer as a buffer. The method includes: providing a substrate defined with a dense region and an isolated region. Then, a dense feature pattern and an isolated feature pattern are formed on the dense region and... Agent:11/22/2012 > 21 patent applications in 16 patent subcategories. recently filed with US Patent Office
20120295185 - Holographic reticle and patterning method: A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target.... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120295186 - Double patterning mask set and method of forming thereof: A double patterning mask set includes a first mask having a first set of via patterns, and a second mask having a second set of via patterns. The first set of via patterns includes at least two via patterns arranged along a diagonal direction, each of the at least two... Agent:
20120295187 - Dummy patterns and method for generating dummy patterns: A method for generating dummy patterns includes providing a layout region having a layout pattern with a first density, inserting a plurality of first dummy patterns with a second density corresponding to the first density in the layout pattern, dividing the layout region into a plurality of sub-regions with a... Agent:
20120295188 - Resin for use in toner, toner using the resin, developer using the toner, image forming apparatus and method using the toner, and method of manufacturing resin: A resin for use in toner is provided. The resin comprises an oligomer segment and a soft segment. The oligomer segment comprises a polyhydroxycarboxylic skeleton and an aromatic diol skeleton.... Agent:
20120295189 - Bicomponent developing agent: A two-component developer including at least a toner and a carrier. The toner includes a coloring particle prepared by agglutinating and fusing a resin particle having colorants and a resin particle having wax, and 0.2-2.0 wt. % hydrophobic silica and 0.01-1.0 wt. % a hydrotalcite-like compound as external additives. A... Agent: Hubei Dinglong Chemical Co., Ltd.
20120295190 - Toner: wherein R1 to R3 each independently represent a hydrogen atom, a hydroxyl group, a carboxyl group, an alkyl group having 1 to 18 carbon atom(s) or an alkoxyl group having 1 to 18 carbon atom(s); R4 to R8 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group... Agent: Canon Kabushiki Kaisha
20120295191 - Toner: wherein R1 to R3 each independently represent a hydrogen atom, a hydroxyl group, a carboxyl group, an alkyl group having 1 to 18 carbon atom(s) or an alkoxyl group having 1 to 18 carbon atom(s); R4 to R7 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group... Agent: Canon Kabushiki Kaisha
20120295192 - Toner, developer, toner container, image forming apparatus, image forming method, and process cartridge: To provide a toner which contains a binder resin, a colorant, and capsules, wherein the binder resin contains a thermoplastic elastomer, and wherein the capsules each encapsulate a plasticizer capable of softening the thermoplastic elastomer and the capsules are fractured upon application of predetermined pressure.... Agent: Ricoh Company, Ltd.
20120295193 - Toner and developer: To provide a toner, which contains a binder resin containing a crystalline resin and a non-crystalline resin, a colorant, and a releasing agent, wherein the toner has ½ flow onset temperature T½ of 120° C. to 135° C., and wherein a peak intensity ratio of an intensity of a peak... Agent:
20120295194 - Low density toner for optimal image quality and performance latitude: A toner composition includes toner particles including an average diameter ranging from about 3 μm to about 10 μm, an average particle density of about 1.4 g/cm3 or less, and for a given particle size configured to have a decreased mass and reduced particle momentum. The toner particle can include... Agent: Xerox Corporation
20120295195 - Carrier core particles for electrophotographic developer, method for manufacturing the same, carrier for electrophotographic developer and electrophotographic developer: The carrier core particles 11 for electrophotographic developer contain lithium as a core composition. When the carrier core particles 11 are immersed in pure water at a weight ratio of 1 part core particles 11 to 10 parts pure water and shaken, the amount of lithium that leaches out to... Agent: Dowa Electronics Materials Co., Ltd.
20120295196 - Bio-toner containning bio-resin, method for making the same, and method for printing with bio-toner containing bio-resin: There is provided in one embodiment a bio-toner having a bio-resin, a second resin, and one or more colorants. The second resin has at least one of a styrene acrylate resin or a polyester resin each having at least one molecular weight peak greater than 90,000 and at least one... Agent: Mitsubishi Kagaku Imaging Corporation
20120295198 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes a compound represented by a following formula (1), and a first polymer that serves as a base resin. R1 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or the like. The M+ represents a monovalent cation. The first polymer (B) is... Agent: Jsr Corporation
20120295197 - Radiation-sensitive resin composition, polymer and method for forming a resist pattern: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no... Agent: Jsr Corporation
20120295199 - Long-chain alkylene-containing curable epoxy resin composition: r
20120295200 - Photocurable and thermosetting resin composition and printed circuit boards made by using the same: A photocurable and thermosetting composition comprises (A) a carboxyl group-containing resin having at least one carboxyl group in its molecule, (B) a photopolymerization initiator having an oxime linkage represented by the following general formula (I), (C) a reactive diluent, and (D) an epoxy compound having two or more epoxy groups... Agent: Taiyo Ink Manufacturing Co., Ltd.
20120295202 - Drawing apparatus and method of manufacturing article: A drawing apparatus includes a first aperture array configured to split a diverging charged particle beam, a converging lens array configured to form a plurality of first crossovers of a plurality of charged particle beams from the first aperture array, a collimator lens having a principal plane where the plurality... Agent: Canon Kabushiki Kaisha
20120295203 - Drawing apparatus and method of manufacturing article: A drawing apparatus includes an aperture array, a lens array configured to form a plurality of crossovers of a plurality of charged particle beams from the aperture array, and a projection system including an element having a single aperture and configured to converge the plurality of charged particle beams corresponding... Agent: Canon Kabushiki Kaisha
20120295204 - Processing method of lithographic printing plate preursor: A processing method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor comprising a support on a surface of which at least one of: a hydrophilizing treatment; and an undercoat layer has been provided and an image-recording layer, to cure an exposed area of the... Agent: Fujifilm Corporation
20120295205 - Radiation source, lithographic apparatus and device manufacturing method: A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., H2O, H2O2, O2, NH3 or NOx, is provided to the chamber to assist in maintaining a protective oxide film... Agent: Asml Netherlands B.v.11/15/2012 > 19 patent applications in 14 patent subcategories. recently filed with US Patent Office
20120288785 - Holographic sensor: A sensor device comprising a holographic element comprises a grating or hologram recorded in a holographic recording medium wherein at least one physical and/or chemical and/or optical characteristic of the holographic element or the image produced by it varies as a result of variation in relative humidity or moisture content... Agent: Dublin Institute Of Technology
20120288787 - Beam exposure systems and methods of forming a reticle using the same: In a method of forming a reticle and electron beam exposure system, first electron beams are irradiated onto a first region of a blank reticle having a light shielding layer and a photosensitive layer, to form first shot patterns. Second electron beams having a cross-sectional area larger than the first... Agent: Samsung Electronics Co., Ltd.
20120288786 - Rc extraction for single patterning spacer technique: A method includes performing a place and route operation using an electronic design automation tool to generate a preliminary layout for a photomask to be used to form a circuit pattern of a semiconductor device. The place and route operation is constrained by a plurality of single patterning spacer technique... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20120288788 - Intermediate transfer member: Described herein is an intermediate transfer member that includes a layer of phenoxy resin having dispersed therein graphene particles.... Agent: Xerox Corporation
20120288790 - Clear styrene emulsion/aggregation toner: The present disclosure describes processes for making clear, high-gloss toners, including toner compositions resulting from such processes that find applications in overcoating and gloss enhancement.... Agent: Xerox Corporation
20120288789 - Super low melt toners: Environmentally friendly latex particles are provided which include a gelling agent and a pigment encapsulated in an amorphous resin which may be utilized in forming EA super low melt toners. Methods for providing these resins and toners are also provided.... Agent: Xerox Corporation
20120288792 - Developer: There is provided a developer that has excellent positive charging characteristics and charging stability, and which is compatible with high-speed developing. The developer of the invention contains toner particles and an insulating liquid, wherein a fatty acid ester is contained as the insulating liquid, a substance A expressed by the... Agent: Seiko Epson Corporation
20120288791 - Toner, developer, image forming apparatus, and image forming method: wherein X(L-form) and X(D-form) represent ratios (% by mole) of L-form and D-form optically-active monomers, respectively. The release agent includes an ester of a fatty acid having an average carbon number of 18 to 24 with glycerin or a polyglycerin having an average polymerization degree of 2 to 10. The... Agent:
20120288793 - Method for producing toner: Disclosed is a method for producing toner. The method for producing toner by emulsion aggregation according to the present invention, comprises adjusting viscosity at a homogenization stage, to thereby obtain toner particles having a dense particle size distribution via a simple process.... Agent: Samsung Fine Chemicals Co., Ltd.
20120288794 - Polymers, photoresist compositions and methods of forming photolithographic patterns: Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.... Agent: Rohm And Haas Electronic Materials LLC
20120288797 - Photoresist compositions and methods of use in high index immersion lithography: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition... Agent: International Business Machines Corporation
20120288796 - Resist composition and patterning process: A resist composition is provided comprising a polymer comprising recurring units having a hydroxyl group substituted with an acid labile group, an onium salt PAG capable of generating a sulfonic acid, imide acid or methide acid, and an onium salt PAG capable of generating a carboxylic acid. A resist film... Agent:
20120288799 - Charged-particle beam lithographic apparatus and method of manufacturing device: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to... Agent: Canon Kabushiki Kaisha
20120288800 - Electron beam drawing apparatus and method of manufacturing device: An electron beam drawing apparatus performs drawing on a substrate with an electron beam emitted by an electron gun. The apparatus includes a conditioning chamber configured to perform conditioning of a spare electrode that is a spare for an electrode which constitutes the electron gun, and a driving mechanism configured... Agent: Canon Kabushiki Kaisha
20120288801 - Flexographic printing plate assembly: A printing plate assembly for use in flexographic printing application is provided which includes an integral carrier layer, one or more cushion layers, and one or more photopolymer layers. The photopolymer layer(s) in the integral assembly are provided with relief images using digital imaging photopolymerization, which eliminates the need for... Agent: Day International, Inc.
20120288802 - Method of forming gate conductor structures: A method of forming gate conductor structures. A substrate having thereon a gate electrode layer is provided. A multi-layer hard mask is formed overlying the gate electrode layer. The multi-layer hard mask comprises a first hard mask, a second hard mask, and a third hard mask. A photoresist pattern is... Agent:
20120288803 - Manufacturing device of optical deflector and manufacturing method of the same: A manufacturing device of optical deflectors and a manufacturing method of the same are revealed. The manufacturing device includes a movable work platform, a substrate, a lens and a femtosecond laser source. The substrate is disposed on the movable work platform and is coated with a photoresist polymer film. The... Agent: National Central University11/08/2012 > 12 patent applications in 11 patent subcategories. recently filed with US Patent Office
20120282544 - Developing agent and method for producing the same: A method for producing a developing agent including preparing a dispersion liquid containing first fine particles containing a binder resin and second fine particles containing a color developable compound, a color coupler, and a color eraser, and aggregating the first and second fine particles in the dispersion liquid to form... Agent: Toshiba Tec Kabushiki Kaisha
20120282545 - Toner, method for producing the same, cartridge storing the same, process cartridge, and image forming apparatus: According to one embodiment, a toner includes at least one encapsulated particle containing a color developable compound, color developer and a color eraser and polymeric particles. The at least one encapsulated particle and the polymeric particles being aggregated and fused in dispersion liquid.... Agent: Toshiba Tec Kabushiki Kaisha
20120282546 - Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist... Agent:
20120282547 - Photosensitive adhesive: A photosensitive adhesive capable of alkali development, the photosensitive adhesive exhibiting adhesion property for an adherend after it has been patterned by light exposure and development, the photosensitive adhesive being used in a method for producing a semiconductor device 100 comprising a step of patterning the photosensitive adhesive 1 provided... Agent: Hitachi Chemical Company, Ltd.
20120282548 - Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive... Agent: Fujifilm Corporation
20120282549 - Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board: A photosensitive composition including: a photosensitive polyurethane resin; a phosphorus-containing flame retardant; a polymerizable compound; and a photopolymerization initiator, wherein the photosensitive polyurethane resin contains an ethylenically unsaturated bond group and a carboxyl group, and contains a polyurethane skeleton which contains a polyol group as a repeating unit.... Agent: Fujifilm Corporation
20120282550 - Radiation-sensitive composition: A radiation-sensitive composition includes a polymer composition and a radiation-sensitive acid generator. The polymer composition includes a first polymer and a second polymer. The first polymer includes a repeating unit shown by a following formula (1). The second polymer includes a repeating unit shown by a following formula (2) and... Agent: Jsr Corportion
20120282551 - Resist composition, method of forming resist pattern and polymeric compound: in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120282552 - Method for offset imaging: A method for writing an image to a surface of an offset media (100) includes mounting the offset media on the imaging drum (204); imaging on a first part of the surface with high energy radiation to ablate the first part wherein the first part represent non-image data; and imaging... Agent:
20120282553 - Immersion upper layer film forming composition and method of forming photoresist pattern: An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on... Agent: Jsr Corporation
20120282554 - Large area nanopatterning method and apparatus: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the... Agent: Rolith, Inc.11/01/2012 > 13 patent applications in 7 patent subcategories. recently filed with US Patent Office
20120276475 - Blank substrates for extreme ultra violet photo masks and methods of fabricating an extreme ultra violet photo mask using the same: Blank substrates for an extreme ultraviolet (EUV) photo mask are provided. The blank substrate includes a substrate, a reflection layer on the substrate, an absorption layer on the reflection layer opposite to the substrate, and a critical dimension (CD) compensation layer on the absorption layer opposite to the reflection layer.... Agent: Sk Hynix Inc.
20120276474 - Method of cleaning substrate: The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or cleaning particles from a injection nozzle to at least one surface of the substrate.... Agent: Osaka University
20120276473 - Pellicle for lithography: A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the pellicle is attached so that pattern transferred scarcely undergoes deformation; in particular the agglutinant layer has a Young's modulus... Agent: Shin-etsu Chemical Co., Ltd.
20120276476 - Toner for electrostatic use: p
20120276479 - Polyester resin and toner including same: Disclosed herein is a toner for use in an electronic photograph-duplicating process or in an electrostatic printing process, and a polyester resin included in the toner as a binder. The polyester resin comprises lactic acids (D or L-lactic acids) or lactides (D or L-lactides) which are derivative compounds thereof, and... Agent:
20120276477 - Toner compositions and processes: Environmentally friendly toner particles are provided which may include a bio-based amorphous polyester resin including camphoric acid, optionally in combination with a crystalline resin. Methods for providing these toners are also provided.... Agent: Xerox Corporation
20120276478 - Toner compositions and processes: Environmentally friendly toner particles are provided which may include a bio-based amorphous polyester resin including camphoric acid, optionally in combination with a crystalline resin. Methods for providing these toners are also provided.... Agent: Xerox Corporation
20120276480 - Method of preparing polymerized toner: This present invention relates to a method of preparing a polymerized toner, which comprises the steps of: preparing an aqueous dispersion medium containing calcium phosphate; preparing a monomer mixture including a styrene-based pigment stabilizer having a weight average molecular weight of 2,000 to 200,000, a charge control agent, a pigment,... Agent: Lg Chem, Ltd.
20120276481 - Method of forming resist pattern and negative tone-development resist composition: A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120276482 - Radiation sensitive resin composition, method for forming a pattern, polymer and compound: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each... Agent: Jsr Corporation
20120276484 - Method for manufacturing organic el display device: A method for manufacturing an organic EL display device is provided in which an organic compound layer is formed by vapor deposition after a layer used for patterning the organic compound layer has been formed, so that the organic compound layer is formed without being affected by the surface tension... Agent: Canon Kabushiki Kaisha
20120276483 - Patterning process: The invention provides a patterning process, comprising at least a step of forming a silicon-containing film on a body to be processed by using a composition for the silicon-containing film, a step of forming, on the silicon-containing film, a photoresist film by using a resist composition, a step of exposing... Agent: Shin-etsu Chemical Co., Ltd.
20120276485 - Patterning process: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer and a... Agent: Shin-etsu Chemical Co., Ltd.Previous industry: Chemistry: electrical current producing apparatus, product, and process
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