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Radiation imagery chemistry: process, composition, or product thereof October categorized by USPTO classification 10/12

20120270142 - Photosensitive composition and method of manufacturing a substrate for a display device using the same: A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved.... Agent: Samsung Electronics Co., Ltd.

20120270143 - Resist underlayer composition and method of manufacturing semiconductor integrated circuit devices using the same: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:... Agent:

20120270144 - Pattern forming device, pattern forming method, and device manufacturing method: Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the... Agent: Nikon Corporation

20120270145 - Electrostatic charge image developing toner, electrostatic charge image developing developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: An electrostatic charge image developing toner includes a binder resin that contains an amorphous polyester resin and a colorant. The toner satisfies the following expressions: 20 μS/cm≦ρ≦150 μS/cm, and 0.01<Cm/(Cc+Co)<0.1, where ρ represents the conductivity of a supernatant solution when 0.1 g of the toner is dissolved in 30 ml... Agent: Fuji Xerox Co., Ltd.

20120270146 - Magnetic toner compositions: The present disclosure relates to a process for preparing a polyester-based magnetic toner composition. The toner composition includes one or more polyester amorphous binder resins, optionally a crystalline polyester resin, and spherical barium iron oxide particles. In embodiments, the toner is prepared from barium iron oxide particles that are in... Agent: Xerox Corporation

20120270147 - Particulate material production method and apparatus, toner production method and apparatus, and toner: The particulate material production method includes vibrating a particulate material composition liquid in a liquid column resonance chamber having at least one nozzle to form a standing wave in the particulate material composition liquid caused by liquid column resonance, so that droplets of the particulate material composition liquid are ejected... Agent:

20120270148 - Method of manufacturing toner, apparatus for manufacturing toner, and method of manufacturing resin particle: A method of manufacturing toner includes forming liquid droplets. The forming liquid droplets includes vibrating a toner constituents liquid in a liquid column resonance liquid chamber having a plurality of nozzles to form a liquid column resonance pressure standing wave therein, and discharging the toner constituents liquid from the nozzles.... Agent:

20120270149 - Production process of toner for electrostatic image development: The production process is a production process of a toner for electrostatic image development, which is composed of toner particles containing at least a binder resin. The process has an aggregating and fusion-bonding step of adding a aggregating agent containing polysilicato-iron into an aqueous medium in which fine binder resin... Agent: Konica Minolta Business Technologies, Inc.

20120270151 - Radiation sensitive resin composition and method of forming an interlayer insulating film: The radiation sensitive resin composition can provide an interlayer insulating film which satisfies general requirements for an interlayer insulating film such as high light transmittance and has excellent heat-resistant dimensional stability, heat discoloration resistance and adhesion to a substrate along with the improvement of process efficiency for improving product yield... Agent: Sharp Corporation

20120270150 - Substrate distortion measurement: A substrate distortion measurement apparatus comprising one or more optical detectors arranged to measure the locations of pits or holes provided in a substrate, a memory arranged to store previously determined locations of the pits or holes in the substrate, and a comparator arranged to compare the measured locations of... Agent: Asml Netherlands B.v.

20120270152 - Aluminum substrates and lithographic printing plate precursors: Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude... Agent:

20120270153 - Photoresist composition and method for producing photoresist pattern: e

20120270155 - Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern: wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120270154 - Resin and photoresist composition comprising same: e

20120270156 - Photosensitive resin laminate and thermal processing of the same: A method of developing a photocurable printing blank to produce a relief pattern comprising a plurality of relief dots. The photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon, a barrier layer disposed on the at least one photocurable layer, and a laser ablatable... Agent:

20120270157 - Resist underlayer film-forming composition and method for forming pattern: A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000, and a solvent. Each of R3 to R8 independently represents a group shown by a formula (2), a hydrogen atom,... Agent: Jsr Corporation

20120270158 - Manufacturing method of metal structure of flexible multi-layer substrate: Disclosed is a metal structure of a multi-layer substrate, comprising a first metal layer and a dielectric layer. The first metal layer has an embedded base and a main body positioned on the embedded base. The base area of the embedded base is larger than the base area of the... Agent: Princo Corp.

20120270159 - Patterning process: A negative pattern is formed by applying a resist composition onto a substrate, baking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to selectively dissolve the unexposed region of resist film. The resist composition comprising a hydrogenated ROMP polymer comprising recurring... Agent: Shin-etsu Chemical Co., Ltd.

20120264039 - Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound: The invention provides a colored curable composition including a dipyrromethene compound having a structure in which a polymerizable group and a carboxyl group are introduced in the same molecule, a resist liquid, an ink for inkjet printing, a color filter, a method of producing a color filter, a solid-state image... Agent: Fujifilm Corporation

20120264040 - Clear overcoat compositions and methods for stabilizing the same: Present embodiments generally relate to a novel clear or colorless overcoat composition that may be used for overcoating, for example, ink based images and xerographic images. The overcoat composition, which may be used as a base for a clear solid ink, comprises one or more waxes. Also included in the... Agent: Xerox Corporation

20120264042 - Method of preparing carrier for electrophotography: e

20120264041 - Polyester resin for toner, toner, developer, toner cartridge, process cartridge, and image forming apparatus: wherein each of R1 and R2 independently represents a hydrogen atom or a methyl group, each of L1, L2 and L3 independently represents a divalent linking group selected from the group consisting of carbonyl groups, ester groups, ether groups, sulfonyl groups, substituted or unsubstituted chained alkylene groups, substituted or unsubstituted... Agent: Fuji Xerox Co., Ltd.

20120264044 - Negative-chargeable erasable electrophotographic toner and production method thereof: Disclosed is a negative-chargeable erasable electrophotographic toner including a binder resin, a near infrared absorption dye, a decolorizing agent, a charge controlling agent, and fluororesin particles. The toner is obtained by adding 5 to 20 parts by mass of the fluororesin particles to 100 parts by mass of the binder... Agent: Casio Electronics Manufacturing Co., Ltd.

20120264043 - Electrostatic image developing toner: An electrostatic image developing toner including: a binder resin; a colorant; and a wax, wherein the intensity ratio of an absorbance at 2,850 cm−1 derived from the wax to an absorbance at 828 cm−1 derived from the binder resin, represented by “absorbance derived from the wax/absorbance derived from the binder... Agent:

20120264045 - Foil transferring method and toner for forming foil transferring layer: A foil transferring method employing an electrophotography is disclosed, in which a toner used for forming a foil transferring layer contains at least a vinyl based resin and a polyester based resin as a binder resin and an amount of the vinyl based resin is 50 to 95% by weight... Agent: Konica Minolta Business Technologies, Inc,.

20120264046 - Toner for electrostatic image development: The toner is composed of toner particles obtained by forming a shell layer containing a styrene-acryl-modified polyester resin on the surface of each of core particles comprising a binder resin containing at least a styrene-acrylic resin. The styrene-acryl-modified polyester resin is obtained bonding a styrene-acrylic polymer segment to a terminal... Agent: Konica Minolta Business Technologies, Inc.

20120264047 - Polyester resin comprising a biopolyol: A polyester resin toner-forming composition containing a biopolyol is described. The biopolyol can enhance branching, crosslinking or both.... Agent: Xerox Corporation

20120264048 - Toner, image forming method, image forming apparatus, and process cartridge: Provided is a toner including: toner particles, each toner particle containing a toner base particle, wherein the toner contains a binder resin; and a colorant, wherein the toner base particle has protrusions at a surface thereof, wherein an average of lengths of long sides of the protrusions is 0.1 μm... Agent:

20120264049 - Method of manufacturing toner: A method of manufacturing toner is provided. The method includes preparing a toner constituents liquid by dissolving or dispersing toner constituents in an organic solvent. The toner constituents includes a binder resin and a charge controlling agent. The charge controlling agent includes a polycondensation product of a phenol with an... Agent:

20120264050 - Production process of toner for electrostatic image development: The production process is a production process of a toner for electrostatic image development, is composed of toner particles containing a binder resin. The process has the steps of adding a aggregating agent containing polysilicato-iron into an aqueous medium in which fine binder resin particles formed of the binder resin... Agent: Konica Minolta Business Technologies, Inc.

20120264051 - Pedestal covers: Examples of novel semiconductor processing pedestals, and apparatuses including such pedestals, are described. These pedestals are specifically configured to provide uniform heat transfer to semiconductor substrates and to reduce maintenance complexity and/or frequency. Specifically, a pedestal may include a removable cover positioned over a metal platen of the pedestal. The... Agent: Novellus Systems, Inc.

20120264052 - Resist composition, method of forming resist pattern, and polymeric compound: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1)... Agent: Tokyo Ohka Kogyo Co., Ltd

20120264053 - Compositions and processes for photolithography: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.... Agent: Rohm And Haas Electronic Materials LLC

20120264054 - Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film: The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition that contains a resin (A) and a compound (B) which has a polymerizable group and generates an acid by being irradiated with actinic rays or radiations; (2) exposing the film; and (3) developing the... Agent: Fujifilm Corporation

20120264055 - Photoresist composition: e

20120264056 - Method of making radiation-sensitive sol-gel materials: Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon.... Agent: Brewer Science Inc.

20120264057 - Patterning process and photoresist with a photodegradable base: A resist material and methods using the resist material are disclosed herein. An exemplary method includes forming a resist layer over a substrate, wherein the resist layer includes a polymer, a photoacid generator, an electron acceptor, and a photodegradable base; performing an exposure process that exposes portions of the resist... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120264059 - Resist composition and method for producing resist pattern: wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently... Agent: Sumitomo Chemical Company, Limited

20120264058 - Resist composition for negative development and method of forming resist pattern: A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes:... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120264061 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120264060 - Salt, photoresist composition, and method for producing photoresist pattern: r

20120264062 - Electron beam lithography system and method for improving throughput: An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120264063 - Method and system for feed-forward advanced process control: A method including providing a present wafer to be processed by a photolithography tool, selecting a processed wafer having a past chip design from a plurality of processed wafers, the processed wafer being previously processed by the photolithography tool, selecting a plurality of critical dimension (CD) data points extracted from... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120264064 - Method for fabricating an amplification gap of an avalanche particle detector: The invention relates to an improved method for fabricating the amplification gap of an avalanche particle detector in which two parallel electrodes are spaced apart by dielectric spacer elements. A foil including a bulk layer made of dielectric material sandwiched by two mutually parallel metallic electrodes is provided, and holes... Agent: Cern - European Organization For Nuclear Research

20120264065 - Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control: A method of optical fabrication comprises coating a substrate with a photocuring material, controlling the application of light to the photocuring material so as to control the intensity and pattern of the light both in-plane and out of plane, and developing the photocuring material.... Agent: Carnegie Mellon University

20120264067 - Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server: There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask... Agent: Kabushiki Kaisha Toshiba

20120264066 - Optical imaging writer system: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask... Agent: Pinebrook Imaging Systems Corporation

20120258387 - Method and mask for enhancing the resolution of patterning 2-row holes: A photolithography mask including a plurality of mask features. Adjacent mask features are separated by a gap and are offset from each other such that individual mask features have one-side dense portions and two-side dense portions. Also a photolithography method that includes a step of providing a substantially opaque mask... Agent: Sandisk Corporation

20120258386 - Model of defining a photoresist pattern collapse rule, and photomask layout, semiconductor substrate and method for improving photoresist pattern collapse: A model of defining a photoresist pattern collapse rule is provided. A portion of the photoresist pattern which corresponds to a second line pattern of a photomask layout is defined as non-collapse if d≧5a and c≧1.5b or if 5a>d≧3a and c≧1.2b, wherein b is the widths of two first line... Agent: Nanya Technology Corporation

20120258388 - Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a mask: Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched... Agent: Hoya Corporation

20120258389 - Titania-doped quartz glass and making method: On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of... Agent: Shin-etsu Chemical Co., Ltd.

20120258390 - Exposure method and exposure device: In an exposure method, a photomask and a substrate having a resist applied thereto are positioned so as to be opposed to a blinking light source that repeatedly emits light and emits no light. The blinking light source is caused to blink with the substrate being continuously conveyed in a... Agent: Toppan Printing Co., Ltd.

20120258391 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus which measures a position of a second object relative to a first object, the apparatus including a first measurement unit which includes a diffraction grating provided on the first object, and a first head and a second head provided on the second object,... Agent: Canon Kabushiki Kaisha

20120258392 - Process for production of electrophotographic toner: A method for producing an electrophotographic toner, including (1) a step of preparing a thermally treated resin particle dispersion by retaining, for one hour or longer at a temperature satisfying a specific formula, a dispersion of resin particles (A) having a volume median particle size of 0.02 μm to 2... Agent:

20120258393 - Co-emulsification of insoluble compounds with toner resins: A process for making a latex emulsion suitable for use in a toner composition includes co-emulsifying a bio-based resin with an insoluble component, such as a pigment or wax, whereby the resin encapsulates the insoluble component. The resulting latex, including the insoluble component encapsulated in the resin, may then be... Agent: Xerox Corporation

20120258394 - Magnetic toner for single component developer: A magnetic toner for a single component developer is provided, the magnetic toner including in a polyester resin at least a nigrosine dye that is immiscible with the polyester resin, a nigrosine dye that is miscible with the polyester resin, and a magnetic powder, the nigrosine dye that is immiscible... Agent: Kyocera Mita Corporation

20120258395 - Toner for developing electrostatic latent image: A toner for developing an electrostatic latent image includes toner particles. An average aspect ratio of the toner particles, having predetermined diameters of at least 3 μm and less than 10 μm, is in the range from about 0.820 to about 0.900, and the difference between the maximum value and... Agent: Kyocera Document Solutions Inc.

20120258397 - Co-emulsification of insoluble compounds with toner resins: A process for making a latex emulsion suitable for use in a toner composition includes co-emulsifying a bio-based resin with an insoluble component, such as a pigment or wax, whereby the resin encapsulates the insoluble component. The resulting latex, including the insoluble component encapsulated in the resin, may then be... Agent: Xerox Corporation

20120258396 - Method for preparing toner containing carbon black pigment with low surface sulfur levels: Disclosed is a process for preparing toner particles which comprises: (a) selecting a carbon black; (b) measuring the surface level of sulfur of the carbon black by X-ray Photoelectron Spectroscopy to ensure that the surface level of sulfur is no more than about 0.05 atomic percent; and (c) mixing the... Agent: Xerox Corporation

20120258398 - Toner compositions and processes: Toners are provided, which possess low melt properties capable of producing a low gloss finish. Methods for providing these resins and toners are also provided which include the process of controlling the gloss of the toner utilizing a slow acid addition during coalescence optionally combined with little or no chelating... Agent: Xerox Corporation

20120258399 - Radiation-sensitive resin composition, compound and producing method of compound: A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R1 and R2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents... Agent: Jsr Corporation

20120258400 - Novel tarc material for immersion watermark reduction: A coating material for use during a lithography process. In an example, a coating material disposed on a material layer includes a polymer and a quencher catcher chemically bonded to the polymer. The quencher catcher substantially neutralizes any quencher that diffuses into the coating material from the material layer.... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120258401 - Resist composition and method for producing resist pattern: c

20120258402 - Photoresist composition, resist-pattern forming method, polymer, and compound: A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group... Agent: Jsr Corporation

20120258404 - Resist composition and method for producing resist pattern: p

20120258403 - Salt and photoresist composition comprising the same:

20120258405 - Resist composition and method for producing resist pattern: wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently... Agent: Sumitomo Chemical Company, Limited

20120258406 - Apparatus and method for preparing relief printing form: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an... Agent: E I Du Pont De Nemours And Company

20120258407 - Multifield incoherent lithography, nomarski lithography and multifield incoherent imaging: The method provides the capacity to modify the multifield aerial image by changing the energy ratio between the fields, creating a shape variation of the multifield aerial image. The method provides also the capacity to perform the modification dynamically following a given predetermined functionality.... Agent:

20120258408 - Electroplating apparatus for tailored uniformity profile: Methods of electroplating metal on a substrate while controlling azimuthal uniformity, include, in one aspect, providing the substrate to the electroplating apparatus configured for rotating the substrate during electroplating, and electroplating the metal on the substrate while rotating the substrate relative to a shield such that a selected portion of... Agent:

20120251927 - Hologram-recording medium: In general formula (1), X and Y are not the same, and X and Y are selected from hydrogen, iodine, bromine, and chlorine atoms and from methyl, ethyl, isopropyl, tert-butyl, phenyl, naphthyl, hydroxyl, methoxy, ethoxy, isopropoxy, tert-butoxy, phenoxy, naphthoxy, acetyl, carboxyl, acetoxy, thiophenyl, thionaphthyl, thiomethyl, thioethyl, thioisopropyl, thio-tert-butyl, and thiol... Agent: Kabushiki Kaisha Toshiba

20120251928 - Method of manufacturing a transfer mask and method of manufacturing a semiconductor device: An internal defect or the like of a transfer mask is detected using transmitted light quantity distribution data of an inspection apparatus. Using a die-to-die comparison inspection method, inspection light is irradiated to a first region of a thin film to obtain a first transmitted light quantity distribution, the inspection... Agent: Hoya Corporation

20120251929 - Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank: A phase shift mask blank having, on a transparent substrate, a phase shift film including, as main components, a metal, silicon (Si) and nitrogen (N), having optical characteristics of a transmittance of equal to or greater than 9% and equal to or less than 30% with respect to a wavelength... Agent: Hoya Corporation

20120251930 - Photomask blank and method for manufacturing photomask: According to one embodiment, a photomask blank wherein a second film is stacked on a first film, the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing... Agent: Toppan Printing Co., Ltd.

20120251931 - Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: Provided is a transfer mask which has a transfer pattern formed in a pattern-forming thin film provided on a transparent substrate and is adapted to be applied with exposure light having a wavelength of 200 nm or less. The pattern-forming thin film is made of a material containing silicon an... Agent: Hoya Corporation

20120251932 - Electrophotographic photoreceptor, image forming apparatus, and process cartridge: Provided is an electrophotographic photoreceptor having a conductive substrate and a photosensitive layer, such that the layer constituting the outermost surface of the photosensitive layer is formed by polymerizing a cross-linkable charge transporting material having a reactive hydroxyl group and a cross-linkable charge transporting material having a reactive alkoxy group,... Agent: Fuji Xerox Co., Ltd.

20120251933 - Electrophotographic photoreceptor, image forming apparatus, and process cartridge: wherein A1 represents the proportion (%) of the area of the fluororesin particles occupying a region designated as a first region; A2 represents the proportion (%) of the area of the fluororesin particles occupying a region designated as a second region; and A3 represents the proportion (%) of the area... Agent: Fuji Xerox Co., Ltd.

20120251934 - Electrophotographic photoconductor, electrophotographic method, and electrophotographic apparatus: where “R3” represents substituted or unsubstituted alkyl group, aromatic hydrocarbon group, alkoxy group, alkoxycarbonyl group, or halogen group; “R4” represents substituted or unsubstituted alkyl or aromatic hydrocarbon group; “n” represents integer ranging from 0 to 4; and when “n” is integer of 2 to 4, “R3” may be the same... Agent:

20120251938 - Method for producing colored resin particles, colored resin particles, developer, image forming apparatus, image forming method, and process cartridge: A method for producing colored resin particles including: dissolving or dispersing at least binder resin and colorant in organic solvent to prepare oil phase; dissolving resin A and basic compound in aqueous medium to prepare aqueous phase, the resin A having solubility <2.0 g/100 g water having temperature 25° C.... Agent:

20120251936 - Toner for developing electrostatic image, method of producing toner, cartridge, image forming method, and image forming apparatus: A toner for developing an electrostatic image, includes: colored particles containing a colorant and a binder resin, and two or more kinds of inorganic particles that are externally added to a surface of the colored particles, in which the two or more kinds of inorganic particles contain titanium-containing particles and... Agent: Fuji Xerox Co., Ltd.

20120251937 - Toner for developing electrostatic image, method of producing toner, cartridge, image forming method, and image forming apparatus: A toner for developing an electrostatic image, includes: colored particles containing a colorant and a binder resin, and two or more kinds of inorganic particles that are externally added to a surface of the colored particles, in which the two or more kinds of inorganic particles contain titanium-containing particles and... Agent: Fuji Xerox Co., Ltd.

20120251935 - Toner for electrophotography, developer for electrophotography, toner cartridge, image forming apparatus, and image forming method: There is provided a toner for electrophotography containing at least a binder resin, a colorant and a barium compound, and having a relaxation modulus G(t) of from about 2.0×102 Pa to about 3.0×103 Pa in a relaxation time of t=10×Dt (wherein Dt is the heating time taken during fixing) as... Agent: Fuji Xerox Co., Ltd.

20120251939 - Pigment dispersion and yellow toner: To obtain a pigment dispersion and a yellow toner having high coloring power and high dispersibility of a pigment in a dispersion medium, a pigment dispersion containing a compound represented by general formula (1) and a yellow pigment represented by general formula (2) are provided in a dispersion medium.... Agent: Canon Kabushiki Kaisha

20120251940 - Process for producing a toner for electrophotography: The invention provides a process for producing a toner for electrophotography including the following (1) to (4): (1): adding an aggregating agent to a resin particle dispersion (a) so as to attain an aggregating agent concentration Ea (wt %), to thereby produce an aggregated particle dispersion (A); (2): adding a... Agent: Kao Corporation

20120251942 - Resin-coated carrier for electrophotographic developer, and electrophotographic developer: There are provided a resin-coated carrier for an electrophotographic developer, in which a magnetic particle is coated with a resin on its surface, and the coating resin contains a carbon nanotube having a carbon content of 75% by weight or more, and an electrophotographic developer using the resin-coated carrier.... Agent: Powdertech Co., Ltd.

20120251941 - Toner resins for electronic copying purposes: The present invention relates to a polycarbonate of number average molecular weight from 500 to 10000, glass transition point from 30 to 80° C. and hydroxyl group value of 30 mg KOH/g or less and the use of said polycarbonate in a urethane modified resin used as an ingredient for... Agent: Basf Se

20120251943 - Antireflective coating composition and process thereof: e

20120251944 - Photolithography method and apparatus: Embodiments of the disclosed technology disclose a photolithography method and apparatus, and the method comprises: hydrophobicity-treating edge portions of a surface of a substrate to be applied with photoresist; and applying hydrophilic photoresist to the surface of the substrate subject to hydrophobic treatment. With the disclosed technology, the usage amount... Agent: Boe Technology Group Co., Ltd.

20120251945 - Photoresist composition: b

20120251947 - Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a... Agent:

20120251946 - Photoresist composition: i

20120251948 - Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5)... Agent: Fujifilm Corporation

20120251950 - Composition for forming photosensitive resist underlayer film: the polymer being a polymer in which the unit structure of Formula (1) has a ratio of mole number (a) within a range of 0.20≦a≦0.90, the unit structure of Formula (2) has a ratio of mole number (b) within a range of 0.05≦b≦0.60, and the unit structure of Formula (3)... Agent: Nissan Chemical Industries, Ltd.

20120251949 - Positive type photosensitive resin composition: Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350° C. or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a... Agent: Toray Industries, Inc.

20120251952 - Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same: wherein R1, R2, and R3 are each independently a C1-30 alkyl group or a C3-30 cycloalkyl group that has or does not have hydrogen, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an aldehyde group, R4, R5, and R6... Agent: Korea Kumho Petrochemical Co., Ltd.

20120251953 - Photoresist composition: Certain methanofullerene derivatives are described, having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists.... Agent:

20120251951 - Resist composition and method of forming resist pattern: r

20120251954 - Lithographic printing plate precursor and method of preparing the same: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the... Agent: Fujifilm Corporation

20120251955 - Composition for formation of resist underlayer film: l

20120251956 - Antireflective coating composition and process thereof:

20120251957 - Substrate transfer method for performing processes including photolithography sequence: A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes... Agent: Tokyo Electron Limited