|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof September class, title,number 09/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 09/27/2012 > 21 patent applications in 18 patent subcategories. class, title,number
20120244458 - Etch process for controlling pattern cd and integrity in multi-layer masks: A method of patterning a multi-layer mask is described. The method includes preparing a multi-layer mask on a substrate, wherein the multi-layer mask includes a lithographic layer and an intermediate mask layer underlying the lithographic layer, and wherein the intermediate mask layer comprises a carbon-containing compound. The method further includes:... Agent: Tokyo Electron Limited
20120244460 - Mechanisms for patterning fine features: The embodiments described provide mechanisms for patterning features for advanced technology nodes with extreme ultraviolet lithography (EUVL) tools. One or more EUV pre-masks are generated by using a mask writer to form an EUV mask with an EUV scanner. The wafers are then patterned by using the EUV mask. The... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120244459 - Method for evaluating overlay error and mask for the same: A mask for evaluating overlay error comprises a plurality of replicate device regions and an overlay mark. The plurality of replicate device regions are disposed uniformly on the mask, wherein each comprises a plurality of device patterns; and a plurality of current layer check patterns are formed adjacent to the... Agent: Nanya Technology Corp.
20120244461 - Overlay control method and a semiconductor manufacturing method and apparatus employing the same: Overlay control methods, semiconductor manufacturing method and a semiconductor manufacturing apparatus are provided for restraining overlay error between lithography processes, of a semiconductor manufacturing process, within a tolerance of a semiconductor device. According to one or more aspects, enhanced overlay control mechanisms are provided to enable previous layers to perform... Agent: Toshiba America Electronic Components, Inc.
20120244462 - Method for preparing alizarin derivative compound, novel alizarin derivative compound, surface modification method, photoelectric conversion film, photoelectric conversion element, and electrophotographic photoreceptor: The present invention provides a novel alizarin derivative compound and a simplified and low cost method for preparing an alizarin derivative compound including: obtaining a compound represented by Formula (2) using a compound represented by Formula (3); and obtaining an alizarin derivative compound represented by Formula (1) using the compound... Agent: Fujifilm Corporation
20120244463 - Intermediate transfer member: There is disclosed an intermediate transfer member that includes a layer of a polymer blend of polyimide and amino silicone having conductive particles dispersed therein.... Agent: Xerox Corporation
20120244464 - Intermediate transfer member: The present teachings provide an intermediate transfer member which includes a substrate layer and a surface layer disposed on the substrate layer. The surface layer includes a plurality of core-shell particles wherein the core is a conductive particle and the shell is a fluoroplastic dispersed in a fluoroelastomer.... Agent: Xerox Corporation
20120244465 - Toner set for electrostatic image development, developer set for electrostatic image development, process cartridge set, image forming apparatus, and image forming method: A toner set for electrostatic image development includes a cyan toner, a magenta toner, and a yellow toner, wherein the Vicat softening temperatures of the toners are respectively in the range of from about 30° C. to about 60° C., and among the toners, the difference between the Vicat softening... Agent: Fuji Xerox Co., Ltd.
20120244466 - Toner wash comprising ionic liquid: A washing process using one or more ionic liquids (ILs) as a washing aid agent for toners, including toners produced using such ILs, such as, low melt toners, is provided. ILs are environmentally sound, green solvents that act to swell toner particle surfaces so that surface absorbed and adsorbed pollutants,... Agent: Xerox Corporation
20120244467 - Toner for electrostatic use: w
20120244468 - Polyvinyl acetal/polyester graft copolymer, and dispersant: A polyvinyl acetal/polyester graft copolymer obtained from a polyvinyl acetal having one or more of each of constituent units represented by the following general formulae (1) to (3) (wherein each of R1 and R2 represents a hydrogen atom, a linear or branched alkyl group having a carbon number of from... Agent:
20120244469 - Tunable gloss using aerogel ceramic fillers added to viton coatings for fusing applications: Exemplary embodiments provide materials, methods, and systems for a fuser member used in electrophotographic devices and processes, wherein the fuser member can include a coating material containing a plurality of aerogel fillers dispersed in and/or bonded to a polymer matrix for providing a desired gloss level of fused toner images.... Agent: Xerox Corporation
20120244470 - Toner compositions and processes: Processes for producing toners are provided. The processes include emulsion aggregation processes, whereby a reactive coalescent is utilized in the coalescence step to coalesce aggregated particles, thereby forming toner particles. The resulting toners may be highly pigmented, and may possess low melt characteristics.... Agent: Xerox Corporation
20120244471 - Photoresist resin composition and method of forming patterns by using the same: A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming... Agent:
20120244472 - Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same: Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with... Agent: Fujifilm Corporation
20120244473 - Photosensitive resin composition, laminate utilizing same and solid-state imaging device: A photosensitive resin composition which can impart insulating properties and light-shielding properties against light having a wavelength lying in an ultra-violet range, a visible range and a near-infrared range to a substrate more readily when applied onto the substrate, wherein the substrate has such properties that the permeability to light... Agent:
20120244474 - Method of forming pattern: According to one embodiment, a method of forming a pattern includes applying a block copolymer to a substrate, the block copolymer including a first block and a second block, the first block including polyacrylate or polymethacrylate having a side chain to which an alicyclic hydrocarbon group or a hydrocarbon group... Agent:
20120244475 - Method to produce a fuel cell flowfield with photopolymer walls: A method for fabricating a flowfield for a fuel cell includes the steps of: providing a substrate; providing a plurality of radiation sources configured to generate a plurality of radiation beams; disposing a radiation-sensitive material on the substrate; placing an imaging mask between the plurality of radiation sources and the... Agent: Gm Global Technology Operations LLC
20120244476 - Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus: The energy distribution of exposure light directed passing through the slit of an exposure apparatus is determined. A photoresist layer on a substrate is exposed over a plurality of shots while changing the intensity of the exposure light for each shot. Then the photoresist layer is developed to form a... Agent: Samsung Electronics Co., Ltd.
20120244477 - Pellicle for lithography: The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic procedure. The pellicle used in the photolithography using ArF excimer laser beams is characterized in that the pellicle has a pellicle membrane... Agent: Shin-etsu Chemical Co., Ltd.
20120244478 - Resist pattern formation method: A resist pattern formation method includes providing a first positive-tone radiation-sensitive resin composition on a substrate to form a first resist layer. The first resist layer is selectively exposed and developed to form a first resist pattern. The first resist pattern is coated with a resist pattern insolubilizing resin composition... Agent: Jsr Corporation09/20/2012 > 25 patent applications in 19 patent subcategories. class, title,number
20120237856 - Selection method for additives in photopolymers: The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer... Agent: Bayer Intellectual Property Gmbh
20120237859 - Method of approximating value of critical dimension of pattern formed by photolithography and method of fabricating photomask including opc based on approximated value of a cd of a pattern: A method of fabricating a photomask includes OPC of a mask pattern based on an approximated (i.e., a predicted) critical dimension (CD) of a film pattern formed using the photomask. First, a photomask is provided, a photosensitive film pattern is formed by a lithographic process using the photomask, a CD... Agent: Samsung Electronics Co., Ltd.
20120237858 - Photomask and a method for determining a pattern of a photomask: The present invention relates to a photomask and a method for determining a pattern of the photomask. The photomask includes a base and a plurality of square areas, wherein the light transmittancy of the square areas is different from that of the base. The square areas are arranged on the... Agent: Nanya Technology Corporation
20120237857 - Photomask and method for forming overlay mark using the same: The present invention relates to a photomask and a method for forming an overlay mark in a substrate using the same. The photomask comprises a plurality of patterns. At least one of the patterns comprises a plurality of ring areas and a plurality of inner areas enclosed by the ring... Agent: Nanya Technology Corp.
20120237861 - Photomask and photomask substrate with reduced light scattering properties: A mask substrate, photomask and method for forming the same are provided. The photomask includes a substantially light transparent substrate and a circuitry pattern disposed over the light transparent substrate. The circuitry pattern includes a phase shifting layer disposed over the substantially light transparent substrate. A substantially light shielding layer... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20120237860 - Reflective extreme ultraviolet mask and method of manufacturing the same: A reflective EUV mask and a method of manufacturing the same, the reflective EUV mask including a mask substrate having an exposing region and a peripheral region, the mask substrate including a light scattering crystalline portion that scatters light incident to the peripheral region and that decreases reflectivity of the... Agent:
20120237862 - Chemically resistive and lubricated overcoat: Embodiments provide novel imaging members used in electrostatography. More particularly, there is provided flexible electrophotographic imaging members which exhibit an extended functional life. These imaging members include an improved protective overcoat layer comprising: (1) a polymer blend of a low surface energy copolymer and a chemically resistive copolymer, (2) a... Agent: Xerox Corporation
20120237863 - Intermediate transfer member and composition: There is described an intermediate transfer member comprising a seamless layer comprising a polyphenylsulfone and a cyclic alkylene terephthalate having dispersed therein carbon black particles. The composition used to manufacture the seamless intermediate transfer member is also described.... Agent: Xerox Corporation
20120237864 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus and image forming method: An electrostatic image developing toner including: a toner particle containing a coloring agent and a binder resin; and an external additive on the toner particle, wherein the external additive contains a silica particle, a primary particle of the silica particle has an average particle diameter of from 70 nm to... Agent: Fuji Xerox Co., Ltd.
20120237865 - Toners with fluorescence agent and toner sets including the toners: A toner set includes a plurality of toners, at least one toner but less than all toners of the toner set including binder, colorant and fluorescence agent and remaining additional toners including binder, colorant and free of fluorescence agent. At least a first toner grouping and a second toner grouping... Agent: Xerox Corporation
20120237868 - Toner, image forming method, and process cartridge: A toner including a binder resin, a colorant, and a release agent is provided. The toner has a peak loss tangent (tan δ) value of 3 or more within a temperature range of 80 to 160° C. Here, the loss tangent (tan δ) is a ratio (G″/G′) of a loss... Agent:
20120237866 - Making method for titania nanoparticle: The present invention relates to a method of manufacturing titania nanoparticles, and specifically to a method of manufacturing titania nanoparticles wherein the particle size is uniform, it is possible to manufacture monodisperse particles without aggregation among particles, a uniform coating can be applied, that is suitable to large-scale production, and... Agent: Sukgyung At Co., Ltd.
20120237867 - Toner, developer, and method of manufacturing toner: A toner is provided including a mother particle and an external additive covering the surface of the mother particle. The mother particle includes a binder resin and a release agent. The external additive includes a hydroxyapatite silica complex porous particle having a number average particle diameter of 160 nm or... Agent:
20120237869 - Toner and method of manufacturing toner: A toner including a colorant and a binder resin is provided. The binder resin includes a polyester resin having a glass transition temperature of 18 to 40° C., a weight average molecular weight of 10,000 to 100,000, and a flow beginning temperature of 70 to 120° C. The toner has... Agent:
20120237870 - Toner, method of manufacturing toner, image forming method, image forming apparatus, and process cartridge: A toner including a main body particle, a layer B located overlying the main body particle, and a layer A located overlying the layer B is provided. The binder resin includes an amorphous resin and a crystalline resin. The layer B is comprised of particles of a resin B. The... Agent:
20120237871 - Flexographic printing plate precursor, imaging assembly, and use: A flexographic printing plate precursor can be imaged and developed to provide a flexographic relief image. This flexographic printing plate precursor includes a radiation curable layer in which a flexographic relief image can be formed. It also includes a transparent release layer disposed on the radiation sensitive layer, which release... Agent:
20120237872 - Black and white silver halide photosensitive material: A black and white silver halide photosensitive material, having: a support; at least one silver halide emulsion layer; and at least one non-photosensitive layer, wherein both of the silver halide emulsion layer and the non-photosensitive layer are positioned at one side of the support, the non-photosensitive layer includes carbon particles... Agent: Fujifilm Corporation
20120237873 - Positive photosensitive resin composition, cured film formed from the same, and device having cured film: The positive photosensitive resin composition exhibits high heat resistance, high transparency, and enables high sensitivity, high resolution patterning. The positive photosensitive resin composition can be used to form cured films such as planarization films used in TFT substrates, interlayer insulating films, core materials and cladding materials, and can be used... Agent: Toray Industries Inc.
20120237874 - Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of... Agent: Fujifilm Corporation
20120237876 - Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition: A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R1 to R3 independently represents a hydroxyl group, or the like. At least one of... Agent: Jsr Corporation
20120237877 - Electron beam data storage system and method for high volume manufacturing: The present disclosure provides for many different embodiments of a charged particle beam data storage system and method. In an example, a method includes dividing a design layout into a plurality of units; creating a lookup table that maps each of the plurality of units to its position within the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120237878 - Method and system for providing a side shield for a perpendicular magnetic recording pole: A method for fabricating a magnetic transducer having a nonmagnetic intermediate layer is described. A pole is provided on the intermediate layer. The pole has sides, a bottom, a top wider than the bottom and a leading bevel proximate to an ABS location. A side gap is provided adjacent to... Agent: Western Digital (fremont), LLC
20120237879 - Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns: A method for manufacturing a semiconductor device that includes a plurality of gate patterns in parallel with each other within one circuit block provided over a semiconductor substrate includes preparing a first photomask, performing a first photolithography process upon a photoresist layer within a circuit block by using the first... Agent: Renesas Electronics Corporation
20120237880 - Methods of forming patterns on substrates: A method of forming a pattern on a substrate includes forming spaced first features over a substrate. The spaced first features have opposing lateral sidewalls. Material is formed onto the opposing lateral sidewalls of the spaced first features. That portion of such material which is received against each of the... Agent: Micron Technology, Inc.09/13/2012 > 22 patent applications in 17 patent subcategories. class, title,number
20120231376 - Fluorourethane as an additive in a photopolymer formulation: The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photoinitiators, to the use of the photopolymer formulation for producing optical elements, in particular for producing holographic elements and images, to a method for illuminating holographic media made of the photopolymer formulation, and to special fluorourethanes.... Agent: Bayer Intellectual Property Gmbh
20120231377 - Photopolymer formulation having different writing comonomers: The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photo initiators, comprising a combination of at least two different writing monomers. The invention further relates to the use of the photopolymer formulation for producing optical elements, in particular for producing holographic elements and images, to a... Agent:
20120231378 - Reflective layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for production of the reflective layer-equipped substrate: Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV mask blank, and a process for producing the reflective layer-equipped substrate. A reflective layer-equipped substrate for EUV lithography... Agent: Asahi Glass Company, Limited
20120231379 - Fluorine-containing resin particle dispersion, method for preparing fluorine-containing resin particle dispersion, coating liquid which contains fluorine-containing resin particles, method for preparing coating film which contains fluorine-containing resi: Provided is a fluorine-containing resin particle dispersion including: fluorine-containing resin particles, a resin which is not dissolved in at least one solvent in a group of hydroxyl group-containing solvents including an alcohol-based solvent having 1 to 10 carbon atoms, containing no aromatic ring in the molecule structure, and a water-based... Agent: Fuji Xerox Co., Ltd.
20120231380 - Hydroxygallium porphyrazine derivative mixture and electrophotographic photoconductor: where A1, A2, A3, A4, B1, B2, B3 and B4 each independently represent a nitrogen atom or a carbon atom bonded to hydrogen, with the proviso that both of A1 and B1 are carbon atoms each bonded to hydrogen or only one of A1 and B1 is a nitrogen atom,... Agent:
20120231382 - Apparatus for heat-treating toner and method for producing toner: An apparatus for heat-treating a toner includes a raw-material supply unit configured to supply a toner treatment space with a raw-material toner, a hot-air supply unit configured to heat-treat the raw-material toner in the toner treatment space, a suction and ejection unit configured to eject hot air used for the... Agent: Canon Kabushiki Kaisha
20120231381 - Electrostatic image developing toner, toner cartridge, electrostatic image developer, process cartridge and image forming apparatus: An electrostatic image developing toner including: a toner particle containing a coloring agent and a binder resin; and an external additive having a volume average particle diameter of from 70 nm to 400 nm, an average circularity of from 0.5 to 0.9 and a standard deviation of circularity of not... Agent: Fuji Xerox Co., Ltd.
20120231383 - Resin for toner, toner using the resin, and development agent using the toner: A resin for toner containing a polyhydroxy carbonate skeleton and a rigid skeleton.... Agent: Ricoh Company, Ltd.
20120231384 - Magnetic toner: A magnetic toner which has superior charging stability and charging uniformity, maintains stable developing performance without any dependence on service environments and may less cause any decrease in image density and any image defects such as fog and ghost, the magnetic toner has magnetic toner particles, each of the magnetic... Agent: Canon Kabushiki Kaisha
20120231385 - Electrophotographic toner set: An electrophotographic toner set which is excellent in color reproduction of low lightness regions to high lightness regions in an intermediate color region (red) is disclosed, comprising at least a yellow toner, a magenta toner and a third electrophotographic toner, wherein, in a color specification system of a CIE LAB... Agent: Konica Minolta Business Technologies, Inc.
20120231388 - Azo compound, and pigment dispersant, pigment composition, pigment dispersion and toner including the azo compound: There is provided an azo compound for improvement in the dispersibility of an azo pigment into a water-insoluble solvent. The azo compound is represented by the following general formula (1):... Agent: Canon Kabushiki Kaisha
20120231386 - Toner particles comprising colorant-polyesters: A toner composition including a colorant-polyester polymer having at least one colorant and at least one polyester resin, an optional non-colorant polyester polymer, an optional additional colorant, an optional wax, and an optional additive, where the colorant is covalently linked to some or all of the polyester resin and the... Agent: Xerox Corporation
20120231387 - Toner, two-component developer, and image forming method: A toner including a mother particle and an external additive is provided. The mother particle includes a core including a crystalline polyester, an amorphous polyester, a colorant, and a release agent; and a shell including resin particles. A deformation amount H1 of the toner compressed by a pressure of 0.5... Agent:
20120231389 - Binder resin for toner, toner and method for producing same: Disclosed is a binder resin for a toner containing at least a carboxyl group-containing vinyl resin (C), a glycidyl group-containing vinyl resin (E), a reaction product of the vinyl resins and a saturated crystalline polyester (S), wherein the saturated crystalline polyester (S) has a predetermined melting point and a predetermined... Agent: Mitsui Chemicals, Inc.
20120231390 - Method of fixing toner image: Energy consumption in a fixing process of an electrophotographic image-forming apparatus is reduced. An unfixed toner image T1 is fixed on a recording medium by applying a photopolymerizable composition D1 to the unfixed toner image T1 formed on the recording medium and then performing irradiation with light having a maximum... Agent: Canon Kabushiki Kaisha
20120231393 - Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of... Agent: Fujifilm Corporation
20120231394 - Imageable elements with colorants: Both positive-working and negative-working imageable element can have a radiation-sensitive imageable layer that has at least one pigment colorant that does not change color when heated, and at least one dye that can change color when heated. The dye is soluble in the solvent or mixture of solvents used to... Agent:
20120231395 - Iterative rinse for semiconductor fabrication: An iterative rinse for fabrication of semiconductor devices is described. The iterative rinse includes a plurality of rinse cycles, wherein each of the plurality of rinse cycles has a different resistivity. The plurality of rinse cycles may include a first rinse of a semiconductor substrate with de-ionized (DI) water and... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")
20120231396 - Resin pattern, method for producing the pattern, method for producing mems structure, method for manufacturing semiconductor device, and method for producing plated pattern: There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied... Agent: Fujifilm Corporation
20120231397 - Wafer fabrication process: A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask... Agent: Rave LLC09/06/2012 > 17 patent applications in 15 patent subcategories. class, title,number
20120225375 - Optical member for euv lithography: There are provided an EUV optical member, in which deterioration in the reflectivity due to oxidation of the Ru protective layer is prevented, a functional film-equipped substrate to be employed for production of the EUV optical member. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective... Agent: Asahi Glass Company, Limited
20120225374 - Photomask and method for manufacturing the same: According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in... Agent: Kabushiki Kaisha Toshiba
20120225376 - Intermediate transfer belt and method for producing the same: c
20120225377 - Particle producing method, particle, toner, developer, process cartridge, image forming method, image forming apparatus, and particle producing method: A particle producing method is provided including bringing a material into contact with a compressible fluid to prepare a melt of the material, and discharging the melt from a vibrated through hole to form particles of the melt. A particle producing apparatus is also provided including a discharger to discharge... Agent:
20120225378 - Toner composition having dual wax: Included is an emulsion aggregation toner formulation having at least one latex and a combination of at least two waxes, wherein one wax is a synthetic wax, and another wax is a natural wax, and further including a developer containing a carrier and the just-described toner.... Agent: Xerox Corporation
20120225379 - Two-component developer: A two-component developer is disclosed, composing a toner comprising parent toner particles with an attached external additive and a carrier provided with a resin covering layer on a surface of a core particle, wherein the resin covering layer comprises a binder resin comprising an acrylic resin and when the resin... Agent: Konica Minolta Business Technologies, Inc.
20120225380 - Sulfonamide-doped undercoat for imaging device: A photoreceptor undercoat containing a sulfonamide facilitates removal of coatings from the substrate.... Agent: Xerox Corporation
20120225381 - Method for producing electrophotographic photosensitive member: An electrophotographic photosensitive member is provided in which black spots on an output image are hardly caused by local charge injection from a support to a photosensitive layer. For this purpose, a conductive layer is formed using a coating liquid for a conductive layer prepared using a solvent, a binder... Agent: Canon Kabushiki Kaisha
20120225382 - Method for manufacturing toner: A method of preparing toner. Due to the use of an inorganic salt of a monovalent metal as a coagulant when toner particles are aggregated, formed toner particles have a narrow particle size distribution, low-temperature fixability, and high image quality.... Agent: Samsung Fine Chemicals Co., Ltd.
20120225383 - Resist composition for immersion exposure and method of forming resist pattern: A resist composition for immersion exposure and a method of forming a resist pattern which can satisfy both of excellent resistance to an immersion medium and lithography properties. The resist composition for immersion exposure includes a resin component (A) which exhibits changed alkali solubility under action of acid and an... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120225384 - Compositions and processes for photolithography: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.... Agent: Rohm And Haas Electronic Materials LLC
20120225385 - Salt and photoresist composition comprising the same: wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or... Agent: Sumitomo Chemical Company, Limited
20120225386 - Chemically amplified resist composition and patterning process: A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of... Agent: Shin-etsu Chemical Co., Ltd.
20120225387 - Method of forming semiconductor device by using reduction projection aligner: A method of forming a semiconductor device, including exposing a first shot to light on a semiconductor wafer, the first shot including a plurality of elongated chip patterns, the plurality of elongated chip patterns being arranged in parallel to each other and exposing a second shot to light on the... Agent: Renesas Electronics Corporation
20120225388 - Pattern forming method and method for producing device: In a pattern forming method, a first L & S pattern is formed on a wafer; a first protective layer, a second L & S pattern having a perpendicular periodic direction to that of the first L & S pattern, and a photoresist layer are formed to cover the first... Agent: Nikon Corporation
20120225389 - Substrate treatment method: A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting and heating the substrate on a stage in a treatment container; then supplying a solvent... Agent: Tokyo Electron Limited
20120225390 - Substrate treatment method, substrate treatment apparatus, and non-transitory computer storage medium: A substrate treatment method of performing treatment on a substrate on which a pattern mask has been formed by exposure and developing treatment to improve roughness of the pattern mask includes the processes of: mounting the substrate on a stage in a treatment container; and repeating a plurality of times... Agent: Tokyo Electron LimitedPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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