SEARCH:      Monitor Keywords |  Custom RSS

Radiation imagery chemistry: process, composition, or product thereof August inventions list 08/12

20120219883 - Method for producing a holographic film: The invention relates to a method for producing a holographic film, wherein a photopolymer formulation comprising matrix polymers, writing monomers, photoinitiator system, and optionally auxiliary materials and additives is provided, the photopolymer formulation is applied as a film to the surface of a substrate, and the film is dried, wherein... Agent: Bayer Intellectual Property Gmbh

20120219885 - Novel non-crystallizing methacrylates, production and use thereof: The invention relates to a novel non-crystallizing methacrylate and a method for the production thereof. The invention further relates to a photopolymer formulation comprising the methacrylate of the invention as well as to use of said photopolymer formulation for producing holographic media.... Agent: Bayer Intellectual Property Gmbh

20120219884 - Photopolymer formulations having the adjustable mechanical modulus guv: The subject matter of the invention is a method for producing illuminated, holographic media comprising a photopolymer formulation having the adjustable mechanical modulus GUV. A further subject matter of the invention is an illuminated, holographic medium that can be obtained by means of the method according to the invention.... Agent: Bayer Intellectual Property Gmbh

20120219887 - Chemically amplified negative resist composition and patterning process: A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more... Agent: Shin-etsu Chemical Co., Ltd.

20120219888 - Chemically amplified negative resist composition and patterning process: A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms... Agent: Shin-etsu Chemical Co., Ltd.

20120219886 - Method and system for forming patterns using charged particle beam lithography with variable pattern dosage: A method and system for fracturing or mask data preparation or optical proximity correction or proximity effect correction or mask process correction is disclosed in which a set of shaped beam shots is determined that is capable of forming a pattern on a surface, where the set of shots provides... Agent: D2s, Inc.

20120219890 - Optical member for euv lithography, and process for production of reflective layer-equipped substrate: There are provided an EUV optical member, in which deterioration in the reflectivity due to oxidation of the Ru protective layer is prevented, a functional film-equipped substrate to be employed for production of the EUV optical member, and a process for producing the functional film-equipped substrate. A reflective layer-equipped substrate... Agent: Asahi Glass Company, Limited

20120219889 - Photomask blank, photomask, and photomask manufacturing method: A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and containing less than 62 at % nitrogen. The material is capable of being dry-etched with a chlorine-based... Agent: Hoya Corporation

20120219891 - Resist composition, resist film therefrom and method of forming negative pattern using the composition: Provided is a resist composition including a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of... Agent: Fujifilm Corporation

20120219892 - Green toner for developing static latent image and full color image forming method: in the Formula (1), M1 is a metal atom of Group 14, Q is independently a monovalent substituent, m and n are each 0 or 1, at least one of m and n is 1, and A is independently an atomic group forming an aromatic ring which may have a... Agent: Konica Minolta Business Technologies, Inc.

20120219893 - Electrically tunable and stable imaging members: Embodiments provide novel imaging members used in electrostatography. More particularly, there is provided flexible electrophotographic imaging members which have improved imaging layer(s) formulated to comprise of a plasticizer in a material matrix of a solid solution comprising a charge transporting compound and a film forming polymer binder which is a... Agent: Xerox Corporation

20120219896 - Electrostatic image forming toner and resin for toner: An electrostatic image forming toner including: a colorant; a binder resin; and a releasing agent, wherein the binder resin contains at least two types of polyester resins A and B, wherein a difference of (T1/2−Tg) is 65° C. or more but less than 90° C., where T1/2 denotes a softening... Agent:

20120219895 - Polyester styrene vinyl hybrid polymer latex for chemically produced toner: A process is provided for preparing a polyester styrene vinyl hybrid polymer latex composition which may be used to prepare toner for use in electrographic applications by the emulsion aggregation process. The process includes preparing a polyester by polycondensation, preparing a solution of the polyester in a mixture of styrene... Agent: Image Polymers Company, LLC

20120219894 - Toner compositions and processes: Environmentally friendly toner particles are provided which may include a bio-based amorphous polyester resin, optionally in combination with another amorphous resin and/or a crystalline resin. Methods for providing these toners are also provided. In embodiments, the bio-based amorphous polyester resin includes a biologically derived diol, such as 2,3-butanediol.... Agent: Xerox Corporation

20120219900 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes a support and an image-recording layer containing a star polymer, a radical polymerizable compound and a radical polymerization initiator, the star polymer is a star polymer in which a polymer chain is branched from a central skeleton via a sulfide bond and the polymer... Agent:

20120219901 - Photoresist compositions and methods of forming photolithographic patterns: Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.... Agent: Rohm And Haas Electronic Materials LLC

20120219902 - Photoresist compositions and methods of forming photolithographic patterns: Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.... Agent: Rohm And Haas Electronic Materials LLC

20120219897 - Photoresist having improved extreme-ultraviolet lithography imaging performance: o

20120219903 - Radiation-sensitive resin composition: The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or... Agent: Jsr Corporation

20120219898 - Resist composition and method for producing resist pattern: e

20120219899 - Resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one... Agent: Sumitomo Chemical Company, Limited

20120219904 - Resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to... Agent: Sumitomo Chemical Company, Limited

20120219905 - Resist composition and method for producing resist pattern: e

20120219910 - Photosensitive composition and pattern forming method using same: A photosensitive composition comprises (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups... Agent: Fujifilm Corporation

20120219906 - Resist composition and method for producing resist pattern: p

20120219907 - Resist composition and method for producing resist pattern:

20120219908 - Resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom, R3 and R4 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group,... Agent: Sumitomo Chemical Company, Limited

20120219909 - Resist composition and method for producing resist pattern: e

20120219911 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of forming an image by removing an unexposed area of the image-recording layer with at least one of printing ink and dampening water on a printing machine after exposure and contains an... Agent:

20120219913 - Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film: The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all... Agent: Fujifilm Corporation

20120219912 - Resist composition and method for producing resist pattern: e

20120219914 - Drawing apparatus, drawing method and method of manufacturing article: A drawing apparatus for drawing on a substrate by a plurality of charged particle beams includes: an aperture array, a blanker array, a scanning mechanism, and a controller. The aperture array specifies the dimension of each of the plurality of charged particle beams on the substrate. The blanker array carries... Agent: Canon Kabushiki Kaisha

20120219915 - Preparation of lithographic printing plates: Negative-Working Lithographic Printing Plate Precursors can be provided with desired contrast coloration after imaging using a coloring fluid that includes a water-insoluble colorant that is soluble in a water-insoluble fatty alcohol. The coloring fluid provides an optical density change in the exposed regions of at least OD2 that is greater... Agent:

20120219916 - Microstructure manufacturing method: A microstructure manufacturing method includes forming a layer of a photosensitive resin on a substrate surface having an electrical conductivity, forming a structure of the photosensitive resin by exposing the layer of the photosensitive resin to light and developing the layer of the photosensitive resin to expose a part of... Agent: Canon Kabushiki Kaisha

20120219917 - Multiple patterning consistency processing: Disclosed techniques for performing a multiple patterning consistency analysis of an integrated circuit design identify, in a standard cell array of the integrated circuit design, a set of standard cells for multiple patterning consistency analysis. The technique may also identify cell groups in the set where all of the cells... Agent: Freescale Semiconductor, Inc.

20120219918 - Method for forming a wiring pattern by laser irradiation: A method for forming a wiring pattern by laser irradiation includes the steps of coating a light-sensitive material on a substrate to form a light-sensitive layer, irradiating a laser beam on the light-sensitive material of the substrate to form a pattern including an exposed region exposed to laser irradiation and... Agent:

20120219919 - Composition for coating over a photoresist pattern comprising a lactam: The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating... Agent:

20120214089 - Method for producing a holographic film: The invention relates to a method for producing holographic films, in which a photopolymer formulation is provided which comprises as constituents matrix polymers, writing monomers, a photoinitiatior system, optionally a non-photopolymerizable component and optionally catalysts, radical stabilizers, solvents, additives and other auxiliaries and/or additives. The photopolymer formulation is applied in... Agent: Bayer Intellectual Property Gmbh

20120214090 - Method for producing holographic media: The invention relates to a method for producing holographic media, wherein a photopolymer formulation comprising matrix polymers, writing monomers, a photoinitiator system, and optionally auxiliary materials and additives as components is provided, the photopolymer formulation is applied as a coating on the surface of a carrier film and the photopolymer... Agent: Bayer Intellectual Property Gmbh

20120214092 - Method of manufacturing a photomask: A method for correcting a position error of a lithography apparatus comprises inputting position data of exposure pattern, irradiating laser light onto a position reference mask from a position measurement laser system, calculating actual position data of the laser light irradiated onto the position reference mask, and comparing the position... Agent:

20120214093 - Photomask blank, photomask blank manufacturing method, and photomask manufacturing method: A photomask blank manufacturing method that forms, on a light-transmissive substrate, a thin film for forming a transfer pattern, thereby producing a thin-film coated substrate and then presses the thin-film coated substrate. The pressing is carried out, for example, by a cold isostatic pressing method in a range of 1000... Agent: Hoya Corporation

20120214091 - Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition: wherein, R1 represents a hydrocarbon group, R2 represents a hydrogen atom or a hydrocarbon group, and Ar represents an aryl group. R1 may also bind to Ar to form a ring which may also contain a heteroatom. * represents a binding position with an oxygen atom of the phenolic hydroxyl... Agent: Fujifilm Corporation

20120214094 - Method of forming pattern: According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with... Agent:

20120214095 - Image forming apparatus and method, and toner, developer and process cartridge for forming image: An image forming apparatus including an image forming device forming a toner image on a recording material, and a fixing device including an endless fixing belt feeding the recording material at a speed of 400 to 1,700 mm/sec while heating to fix the toner image thereon. The fixing belt has... Agent: Ricoh Company, Ltd.

20120214096 - Toner for developing electrostatic charge image, method of preparing the same, device for supplying the same, and apparatus and method for forming image using the same: A toner to develop an electrostatic charge image, a method of preparing the toner, a toner supply device employing the toner, an apparatus to form an image employing the toner, and a method of forming an image using the toner are provided. The toner includes a binder resin including a... Agent: Samsung Electronics Co., Ltd

20120214097 - Magnetic carrier and two-component developer: Provided are a magnetic carrier and a two-component developer comprising the magnetic carrier. The magnetic carrier comprises magnetic carrier particles, each of which comprises a magnetic carrier core, the surface of which is coated with a charge control agent and further coated with a resin coat layer containing a resin... Agent: Canon Kabushiki Kaisha

20120214098 - Carrier for two-component developer, two-component developer, image forming method, and image forming apparatus: A carrier for a two-component developer, includes: magnetic particles and a resin coating layer that is coated on the magnetic particles, the resin coating layer containing metal nitride particles having a volume average primary particle diameter of from about 300 to about 2,000 nm.... Agent: Fuji Xerox Co., Ltd.

20120214099 - Photoresist compositions: A composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of acid upon exposure to a second dose of radiation. The second amount of acid is greater than... Agent: International Business Machines Corporation

20120214101 - Resist composition and method of forming resist pattern: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120214100 - Resist composition and patterning process using the same: There is disclosed a resist composition, wherein the composition is used in a lithography and comprises at least: a polymer (A) that becomes a base resin whose alkaline-solubility changes by an acid, a photo acid generator (B) generating a sulfonic acid represented by the following general formula (1) by responding... Agent: Shin-etsu Chemical Co., Ltd.

20120214102 - Photosensitive resin laminate and thermal processing of the same: A method of thermally developing a photocurable printing blank to produce a relief pattern comprising a plurality of relief dots. The photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon and a laser ablatable mask layer disposed on top of the at least one... Agent:

20120214103 - Method for fabricating semiconductor devices with fine patterns: A method for fabricating semiconductor devices with fine patterns includes the steps of providing a semiconductor substrate, forming a first photoresist layer on the semiconductor substrate, forming a second photoresist layer on the first photoresist layer, and performing an exposing process to change the state of at least one first... Agent: Nanya Technology Corp.

20120214104 - Method for producing microstructure: A first mask pattern (22) containing a light transmitting section and a light blocking section is disposed along an unexposed photosensitive resin (42), and a second mask pattern (32) containing a light transmitting section and a light blocking section is disposed on the reverse side of the first mask pattern... Agent: Kyoto University

20120208110 - Holographic storage medium and method of making holographic storage medium: Articles for recording a holographic image are described. The articles include a holographic recording medium having a plurality of surfaces, having a transparent polymeric binder and a photochemically active dye, the holographic recording medium having a holographic image recorded therein formed by exposed areas of the photochemically active dye and... Agent: Sabic Innovative PlasticsIPB.v.

20120208109 - Reflection hologram storage method: exposing the holographic recording medium to a signal coherent light source that includes image or other information to be recorded in the holographic recording medium and a reference coherent light source, the signal coherent light source and reference coherent light source emitting light at the wavelength W and entering the... Agent: Sabic Innovative PlasticsIPB.v.

20120208113 - Lithographic processing method, and device manufactured thereby: A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test structures through a selected range of dimensions, simulating an image of the test structures, determining an image quality metric for the simulated image, analyzing... Agent: Asml Netherlands B.v.

20120208111 - Method of manufacturing photo-mask: Provided is a method of manufacturing a photo-mask having a micro pattern. The method includes providing an analyzing design layout, dividing the analyzing design layout into a two-dimensionally repeated portion, a one-dimensionally repeated portion, and a non-repeated portion, forming a first corrected layout by performing optical proximity correction (OPC) in... Agent:

20120208112 - Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device: A before-chucking main surface shape is measured in an actual measurement region of a main surface of a substrate which has been precision-polished. Based on that shape and a shape of a mask stage (1), a simulated after-chucking main surface shape of the substrate, when a photomask (2) manufactured from... Agent: Hoya Corporation

20120208114 - Pigment composition containing pyrimidines and derivatives thereof: Disclosed is a pigment composition comprising a metal complex of azo compound of formula 1 containing at least one pyrimidine or a pyrimidine derivative. The pigment composition exhibits improved color characteristics, improved stability and easy dispersion.... Agent: Kyung-in Synthetic Corporation

20120208115 - Imaging optics: An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The... Agent: Carl Zeiss Smt Gmbh

20120208116 - Bis(enylaryl)arylamine charge transport layer containing photoconductors: A photoconductor containing an optional supporting substrate layer, a photogenerating layer, a bis(enylaryl)arylamine containing charge transport layer, and a top overcoat layer, which includes charge transport compounds and melamine resins.... Agent: Xerox Corporation

20120208117 - Diphenylnaphthylamine derivatives: wherein R1 to R3 are alkyl groups, k is an integer of 0 to 3, j is an integer of 0 to 4, l is an integer of 0 to 6, and X1 and X2 are hydrocarbon groups having at least one ethylenically unsaturated bond.... Agent: Hodogaya Chemical Co., Ltd.

20120208119 - Toner for electrophotography and toner set: A toner for electrophotography characterized in that, when a monochromatic image of the toner for electrophotography is formed and the reflection absorption spectrum thereof is measured, said reflection absorption spectrum shows a maximum density within a range of 600-700 nm, and, excluding the light absorption by a substrate, the maximum... Agent: Konica Minolta Business Technologies, Inc.

20120208118 - Resin compositions and processes: Environmentally friendly resin particles are provided which include a monomer having a color, which is able to impart color to the resulting resin. The resulting resin may be used to form various articles, including toner. A toner of the present disclosure may thus include the bio-based polyester resin, optionally in... Agent: Xerox Corporation

20120208120 - Toner for use in the development of electrostatic latent images, electrostatic latent image developer, and image forming method: A toner for use in the development of electrostatic latent images contains colored particles including at least a binder resin, a coloring agent and a releasing agent, and an external additive. An average circularity of the toner is 0.975 or more; a median of arithmetic average height distribution of the... Agent: Fuji Xerox Co., Ltd.

20120208121 - Carrier core material for electrophotographic developer, method for manufacturing the same, carrier for electrophotographic developer and electrophotographic developer: A carrier core material for electrophotographic developer containing a soft ferrite, expressed by (MgXMn1-x)Fe2O4 (wherein X is in a range of 0.1≦X<1.), wherein an analysis value of P on the surface of the carrier core material is 0.1 mass % or more, an analysis value of Mg is 2 mass... Agent: Dowa Electronics Materials Co., Ltd.

20120208122 - Continuous emulsification-aggregation process for the production of particles: A continuous emulsion aggregation process for the production of particles is presented including a plurality of continuous stirred-tank reactors (CSTR). The plurality of continuous stirred-tank reactors includes at least one feed tank of raw materials, at least one reactor for facilitating cold addition, at least two reactors for facilitating an... Agent: Xerox Corporation

20120208123 - Continuous emulsification-aggregation process for the production of particles: A continuous emulsion aggregation process for the production of particles is presented including a plurality of continuous stirred-tank reactors (CSTR). The plurality of continuous stirred-tank reactors includes at least one feed tank of raw materials, at least one reactor for facilitating cold addition, at least two reactors for facilitating an... Agent: Xerox Corporation

20120208124 - Resist composition for euv, method for producing resist composition for euv, and method of forming resist pattern: c

20120208126 - Novel cyanine dyes and lithographic printing plate precursors comprising such dyes: A lithographic printing plate precursor includes a cyanine dye, characterized in that the cyanine dye includes two different chromophoric groups, a chromophoric group that has its main absorption in the infrared region and another chromophoric group that has its main absorption in the visible light region. The cyanine dye has... Agent: Agfa Graphics Nv

20120208125 - Resist composition and patterning process: A resist composition comprising a complex of a β-diketone with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium, indium, tin, antimony, cesium, zirconium, and hafnium, and a solvent is improved in film uniformity when coated, and exhibits a high resolution, high sensitivity, and minimal... Agent: Shin-etsu Chemical Co., Ltd.

20120208127 - Resist composition and patterning process: A resist composition comprising a salt of a mono- to tetrafunctional carboxylic acid with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium, indium, tin, antimony, cesium, zirconium, and hafnium, and a solvent is improved in film uniformity when coated, and exhibits a high resolution,... Agent: Shin-etsu Chemical Co., Ltd.

20120208128 - Resist composition, method of forming resist pattern and polymeric compound: A resist composition including a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the base component (A) including a resin component (A1) containing a structural unit (a0-1) having a group represented by general formula (a0-1) shown below and... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120208129 - Process for forming an anti-oxidant metal layer on an electronic device: A process for forming an anti-oxidant metal layer on an electronic device comprises the steps of providing a substrate; forming a conductive metal layer on the substrate; forming a first photoresist layer on the conductive metal layer; patterning the first photoresist layer to form apertures and first grooves; forming a... Agent:

20120208130 - Method for manufacturing structure: A method for manufacturing a structure includes forming a layer of photosensitive material above a substrate, disposing a mask above the layer of photosensitive material, shielding a portion of the layer of photosensitive material other than a first region of the layer of photosensitive material, exposing the first region, moving... Agent: Seiko Epson Corporation

20120208131 - Method of forming resist pattern: m

20120202139 - Boundary layer formation and resultant structures: A method for forming anti-boundary layer patterns includes patterning a first masking layer on a chrome layer, etching to remove portions of the chrome layer and expose portions of a first quartz layer, removing the first masking layer, patterning a second masking layer on portions of the chrome layer and... Agent: International Business Machines Corporation

20120202141 - Chemical amplification type positive resist composition, and resist film, resist coated mask blanks and resist pattern forming method using the composition: m

20120202140 - Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium: According to one embodiment, a flare prediction method in photolithography includes determining a pattern density distribution of a pattern layout, determining an inclination of a variation in the pattern density distribution, and performing a flare calculation in a plurality of partition sizes based on the inclination of a variation in... Agent:

20120202142 - Manufacturing method of exposure mask, shipment judgment method and manufacturing method of semiconductor device using exposure mask: A manufacturing method of a semiconductor device that produces a first mask having a first pattern including a alignment shift measuring pattern after exposure and a pattern inside a body integrated circuit, measures a position shift of the alignment shift measuring pattern after exposure and the position shift of the... Agent: Kabushiki Kaisha Toshiba

20120202144 - Pellicle and mask adhesive therefor: Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes... Agent: Mitsui Chemicals, Inc.

20120202143 - Reduced lens heating methods, apparatus, and systems: In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque area and at least one opening within the opaque area includes a slanted, sub-resolution feature that redistributes... Agent:

20120202138 - Single field zero mask for increased alignment accuracy in field stitching: A single field photomask includes a first set of targets formed on a first side of the photomask, and a second set of targets formed on a second side of the photomask, opposite the first side. In operation, the photomask is to be applied to a wafer without any alignment... Agent: Micrel, Inc.

20120202145 - Radiation-sensitive colored composition, color filter and method for producing the same, solid state image device, and liquid crystal display apparatus: s

20120202146 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: Provided is an electrophotographic photoreceptor including: a functional layer containing: a polymer of a first compound having a chain polymerizable functional group and a charge transporting skeleton in one molecule, and at least one second compound selected from a compound including at least one kind of the repeating unit represented... Agent: Fuji Xerox Co., Ltd.

20120202147 - Anisotropic magnetic material-dispersed resin carrier, electrophotographic developer, and developing device: An anisotropic magnetic material-dispersed resin carrier including: fine magnetic particles; and a binder resin in which at least the fine magnetic particles are dispersed, wherein the anisotropic magnetic material-dispersed resin carrier has a magnetic anisotropy where magnetic fields of the fine magnetic particles are orientated in the same direction, and... Agent: Ricoh Company, Ltd.

20120202148 - Emulsion aggregation toner compositons: Disclosed is a toner which comprises particles comprising: (a) a core comprising: (1) a first resin; and (2) a first conductive colorant; and (b) a shell comprising: (1) a second resin; and (2) a second conductive colorant.... Agent: Xerox Corporation

20120202149 - Electrophotographic toner and method of preparing the same: An electrophotographic toner and a method of preparing the same, the electrophotographic toner including a binder that includes two kinds of resin having different weight average molecular weights, a colorant, and a releasing agent.... Agent: Samsung Electronics Co., Ltd.

20120202151 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula... Agent:

20120202150 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value γ of... Agent: Jsr Corporation

20120202152 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor comprising a support, tin image-recording layer which contains (A) an infrared absorbing agent, (B) a radical polymerization initiator and (C) a radical polymerizable compound and in which an unexposed area can be removed by supplying printing ink and dampening water after exposure, and an overcoat... Agent:

20120202153 - Resist composition and patterning process: A resist composition comprising a polymer having recurring units having an acid labile group and recurring units of a magnesium, copper, zinc or cesium salt of (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid copolymerized together exhibits a high resolution, high sensitivity, and minimal LER. The resist composition is best suited... Agent: Shin-etsu Chemical Co., Ltd.

20120202154 - Black curable composition for wafer level lens and wafer level lens: A black curable composition for a wafer level lens includes (A) a metal-containing inorganic pigment, (B) a polymerization initiator, and (C) a polymerizable compound. The (A) metal-containing inorganic pigment is preferably titanium black.... Agent: Fujifilm Corporation

20120202155 - Underlayer coating composition and processes thereof: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates... Agent:

20120202156 - Cleaning process for semiconductor device fabrication: A method of making an integrated circuit is provided. The method includes providing a substrate having a photosensitive layer. The photosensitive layer is exposed to a radiation beam. The exposed photosensitive layer is developed in a first chamber. In the first chamber, a cleaning process is performed on the developed... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20120202157 - Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in... Agent: Nikon Corporation

20120202159 - Manufacturing method of metal structure in multi-layer substrate: Disclosed is a manufacturing method of metal structure in multi-layer substrate. The manufacturing method includes following steps: coating at least one photoresist layer on a surface of a dielectric layer; exposing the photoresist dielectric layer to define a predetermined position of the metal structure; removing the photoresist layer at the... Agent: Princo Corp.

20120202158 - Patterning process: A negative pattern is formed by coating a resist composition onto a substrate, exposure, bake, and development in alkaline water. The resist composition comprises a polymer comprising acid labile group-containing recurring units, adapted to turn soluble in alkaline developer under the action of acid, an acid generator and/or an acid,... Agent: Shin-etsu Chemical Co., Ltd.

20120196208 - Multilayer mirror for euv lithography and process for its production: Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for... Agent: Asahi Glass Company, Limited

20120196210 - Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge: The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for determining a manufacturing penalty in making the mask. The manufacturability of the mask, including the manufacturing penalty in making the mask,... Agent:

20120196209 - L-shaped feature, method of making an l-shaped feature and method of making an l-shaped structure: In accordance with an embodiment of the present invention, a method for making a semiconductor device comprises forming a photo sensitive layer on a semiconductive substrate, and forming an L-shaped structure in the photo sensitive layer by exposing the photo sensitive layer to light via a reticle, wherein the reticle... Agent:

20120196212 - Method and apparatus for sub-pellicle defect reduction on photomasks: In one embodiment, the invention is a method and apparatus for sub-pellicle defect reduction on photomasks. One embodiment of a photomask for use in photolithography includes a substrate on which a pattern is formed, the substrate having a frontside and an opposite backside, and a protective coating formed on at... Agent: International Business Machines Corporation

20120196211 - Resist pattern forming process: A resist pattern is formed by coating a chemically amplified positive resist composition onto a substrate and prebaking to form a resist film, exposing to high-energy radiation, baking and developing with a developer to form a resist pattern, and heating the pattern for profile correction to such an extent that... Agent: Shin-etsu Chemical Co., Ltd.

20120196214 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: Provided is an electrophotographic photoreceptor including a substrate and an outermost layer containing a cured film of a composition containing a compound having a chain polymerizable functional group and a charge transporting skeleton in the same molecule, and at least one chain transfer agent selected from a compound having 4... Agent: Fuji Xerox Co., Ltd.

20120196213 - Method for producing photoreceptor and process cartridge and image-forming apparatus including photoreceptor: A method for producing a photoreceptor includes forming at least a photosensitive layer as a coating layer on a surface of a substantially cylindrical photoreceptor; and polishing a surface of the coating layer formed on the photoreceptor in the layer formation by rotating the photoreceptor and moving a polishing member... Agent: Fuji Xerox Co., Ltd.

20120196215 - Thiol group-containing charge transporting material, thiol group-containing charge transporting material-dissolving solution, photoelectric conversion device, electrophotographic photoreceptor, image forming apparatus, and process cartridge: wherein F represents an organic group derived from a charge transporting compound, G represents a divalent organic group having 1 to 5 carbon atoms, X represents a group selected from a —CO—O— group, an —O—CO— group, and an —O— group, Y represents a divalent organic group having 1 to 5... Agent: Fuji Xerox Co., Ltd.

20120196216 - Photoconductor undercoat layer: A photoconductor comprising a substrate, an undercoat layer, a photogenerating layer and a charge transport layer is described. The undercoat layer is disposed on the substrate and comprises a metal oxide, and a mixture of a phenolic resin and a cyclohexanecarboxylate.... Agent: Xerox Corporation

20120196217 - Polyalkylene glycol benzoate containing photoconductors: A photoconductor containing an optional supporting substrate layer, a photogenerating layer, a polyalkylene glycol benzoate containing charge transport layer, and a top overcoat layer in contact with and contiguous to the charge transport layer, and which overcoat layer includes charge transport compounds and melamine resins.... Agent: Xerox Corporation

20120196218 - Toner for developing electrostatic charge image, method of preparing the same, device for supplying the same, and apparatus and method for forming image using the same: A toner for developing an electrostatic charge image includes a core layer including a first binder resin, a colorant and a releasing agent; and a shell layer coating the core layer and including a second binder resin. The first binder resin of the core layer includes a low molecular weight... Agent: Samsung Electronics Co., Ltd.

20120196219 - Magnetic toner: Provided is a magnetic toner capable of preventing electrostatic offset while attaining a high image quality by a high speed machine. The magnetic toner comprises magnetic toner particles, each of which contains a binder resin and a magnetic material, and a fine inorganic powder, in which the binder resin contains... Agent: Canon Kabushiki Kaisha

20120196220 - Magnetic toner: Provided is a magnetic toner capable of providing a stable image by suppressing sleeve contamination even under a high-temperature and high-humidity environment and under a normal-temperature and low-humidity environment and further suppressing large-particle fogging caused after the toner is left alone for a week. The magnetic toner contains toner particles,... Agent: Canon Kabushiki Kaisha

20120196221 - Carbon based black toners prepared via limited coalescence process: A black toner composition comprising toner particles prepared by a chemical process of manufacture comprising carbon black pigment, a first addition polymer comprising carboxylic acid groups along the polymer backbone, and a thermoplastic second polymer binder distinct from the first polymer, wherein the first polymer has an Acid Value of... Agent:

20120196222 - Liquid electrophotographic ink concentrates and methods for preparing the same: Liquid electrophotographic ink concentrates and methods of preparing the same are disclosed herein. An example of the method includes preparing a mixture of ink components using a first predetermined thermal profile. The ink components include a resin, a pigment, and a carrier. The method further includes preparing a microfluidizer with... Agent:

20120196223 - Balancing charge area developed and transferred toner: Printing methods are provided. In one aspect, at least one first toner image is formed and transferred onto a receiver to form a composite toner image on a receiver having a first polarity. A second net development difference of potential of the first polarity is created between a second development... Agent:

20120196224 - Balancing discharge area developed and transferred toner: Printing methods are provided. In one aspect, at least one first toner image is formed and transferred onto a receiver to form a composite toner image on a receiver having a first polarity. A second net development difference of potential of the first polarity is created between a second development... Agent:

20120196227 - Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound: A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high... Agent: Shin-etsu Chemical Co., Ltd.

20120196225 - Photo patternable coating compositions of silicones and organic-inorganic hybrids: A negative-tone photo patternable coating composition containing: (1) at least one silicone or organic-inorganic hybrid resin with acid labile alkoxysilane groups which can be thermally decomposed into silanol groups at 80-160° C. in the presence of a catalytic amount of strong acid; (2) optionally, an organic/polymer with two or more... Agent: Namitek Specialty Materials Corp.

20120196226 - Resist composition and method of forming resist pattern: In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and R1 represents an organic group having one or more primary or secondary alcoholic hydroxyl groups, or a chain-like tertiary alcoholic hydroxyl... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120196228 - Resist composition and patterning process using the same: There is disclosed a resist composition comprising at least: (A) a polymer containing one or more repeating units having a structure shown by the following general formula (1) and/or (2), an alkaline-solubility of the polymer being increased by an acid, (B) a photo acid generator generating, with responding to a... Agent: Shin-etsu Chemical Co., Ltd.

20120196229 - Embedding data into solid areas, text or line work: A method of encoding data in printed solid image features on a receiver includes providing a relief printing member; modifying at least one surface of the relief printing member within a boundary of a solid image feature; and printing the encoded data in at least one solid image feature on... Agent:

20120196230 - Layout decomposition method and apparatus for multiple patterning lithography: An initial layout of at least a portion of a given layer of an integrated circuit design is decomposed into multiple sub-layouts by splitting each of a plurality of shapes of the initial layout into multiple segments, constructing a constraint graph to represent relationships between the segments, reducing the constraint... Agent: International Business Machines Corporation

20120196231 - Polymer washout solvent, and the use thereof for developing a flexographic printing plate: A polymer washout solvent for developing a flexographic printing plate comprising:-an ester hydrocarbon component,-an ether hydrocarbon component,-an alcoholic hydrocarbon component. The washout solvent of the invention has less hazardous properties than the known solvents. Use of a polymer washout solvent for developing a flexographic printing plate in a washing step.... Agent: