|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof July category listing 07/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 07/26/2012 > 19 patent applications in 16 patent subcategories. category listing
20120189946 - Mask blank and transfer mask: Provided is a mask blank which enables EB defect correction to be suitably applied and which further enables a reduction in the thickness of a light-shielding film. A mask blank 10 is used for producing a transfer mask adapted to be applied with ArF exposure light and has a light-shielding... Agent: Hoya Corporation
20120189947 - Color filter substrate, electronic apparatus and manufacturing method thereof: A method of manufacturing a color filter substrate is provided. The color filter substrate includes a substrate, a light-shielding layer, and a plurality of color filter patterns. The substrate has a plurality of annular trough areas, a plurality of central areas, and a light-shielding area positioned among the annular trough... Agent: Au Optronics Corporation
20120189948 - Charge transport film, organic electronic device, electrophotographic photoreceptor, process cartridge, and image forming apparatus: Provided is a charge transport film including an enethiol resin having a charge transporting skeleton, and having a sulfur atom content of from 2.0% by mass to 15% by mass.... Agent: Fuji Xerox Co., Ltd.
20120189949 - Photoconductor overcoat layer: A photoconductor containing a photogenerating layer, and at least one charge transport layer, and an overcoat layer in contact with, and contiguous to the charge transport layer. The overcoat layer is comprised polyethylene-block-polyethylene glycol copolymer and a charge transport component.... Agent: Xerox Corporation
20120189950 - Electrostatic charge image developing toner, electrostatic charge image developer, toner cartridge, process cartridge, image forming apparatus, and image forming method: The electrostatic charge image developing toner includes a colorant containing rutile type and anatase type titanium oxides, and a binder resin.... Agent: Fuji Xerox Co., Ltd.
20120189951 - Toner and developer: where Tp denotes lowest exothermic peak temperature [° C.] in 0° C. to 200° C. in DSC curve obtained DSC of the crystalline polyester resin, Tc denotes lowest exothermic peak temperature [° C.] in 0° C. to 200° C. in DSC curve obtained DSC of the crystal nucleating agent, and... Agent:
20120189953 - Positively chargeable toner for electrostatic image development: Domains of a charge control resin are formed by dispersing a charge control resin containing a quaternary ammonium salt functional group-containing resin of a copolymer of an addition-polymerizable monomer having a quaternary ammonium salt functional group and a styrene and/or acrylic monomer into a polyester resin as binder resin, and... Agent: Kyocera Mita Corporation
20120189952 - Electrophotographic toner and process of preparing the same: An electrophotographic toner and a process for preparing the same. The electrophotographic toner includes a binder, a coloring agent, and a release agent. The binder includes two resins having different weight average molecular weights.... Agent: Samsung Electronics Co.,
20120189954 - Liquid developer, developer cartridge, image forming method, and image forming apparatus: A liquid developer includes: a carrier liquid and toner particles dispersed in the carrier liquid, including a binder resin which contains a thermoplastic resin having repeating units derived from a monomer having a styrene skeleton and repeating units derived from a monomer having an acrylic ester structure, and a thermoplastic... Agent: Fuji Xerox Co., Ltd.
20120189957 - Chemical toner composition and method for preparing the same: The present invention relates to a chemical toner composition and a method for preparing the same. The chemical toner composition includes: a resin emulsion; a pigment dispersion; a wax dispersion; and a dispersible polymer coagulant, wherein the dispersible polymer coagulant is a copolymer comprising unsaturated ester monomers and amino-containing monomers.... Agent: Trend Tone Imaging, Inc.
20120189955 - Emulsion aggregation toners: The present disclosure provides processes for producing toners. In embodiments, silica is added as a chelating agent during the toner production process contributing to enhanced triboelectric charging properties of the toner particles.... Agent: Xerox Corporation
20120189956 - Solvent-free toner processes: The present disclosure provides processes for producing toners. In embodiments, alkyl or alkyl ether sulfates are used in a solvent-free toner production process as surfactants to provide for higher parent particle charge without adversely affecting particle size, distribution control and circularity of the toner particles. The present disclosure also provides... Agent: Xerox Corporation
20120189958 - Image transfer process: The present invention relates to an image transfer process. The process includes the steps of: a) providing an image carrying device including at least one photoluminescent surface; b) displaying a luminous image on a display surface of a light-emitting medium; and c) positioning the display surface of the light-emitting medium... Agent:
20120189959 - Lithographic printing original plate: A presensitized plate having a long press life and excellent resistance to scum and corrosive micro-stains and capable of on-press development is provided. The presensitized plate includes a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer; and a... Agent: Fujifilm Corporation
20120189960 - Hydrophilic monomer, hydrophilic photoresist composition containing the same, and resist pattern formation method: The present invention is to provide a hydrophilic monomer, and hydrophilic photoresist composition containing the same. The photoresist composition further comprises a hydrophilic resin. The hydrophilic monomer and the hydrophilic resin respectively have a hydrophilic group which is used to react to H2O for the purpose of solving them in... Agent: Chunghwa Picture Tubes, Ltd.
20120189961 - Photosensitive resin composition and photosensitive material comprising the same: The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a... Agent: Lg Chem, Ltd.
20120189962 - Method for manufacturing stamper for injection molding: The present invention relates to a method for manufacturing a stamper for injection molding, and more particularly, to a method for manufacturing a stamper for injection molding which can prevent a scratch from forming thereon and has an excellent durability owing to high hardness even after manufacturing of the metal... Agent:
20120189964 - Method of controlling the states and vortex chirality in hexagonal ring structures comprising nanoscale magnetic elements: A method is provided for achieving specific magnetic states with a given vortex chirality in artificial kagome spin ice building block structures containing one or more hexagonal rings of ferromagnetic islands created with electron beam lithography, where a subgroup of the ferromagnetic islands have a smaller width and therefore higher... Agent: Paul Scherrer Institut07/19/2012 > 22 patent applications in 15 patent subcategories. category listing
20120183888 - Photopolymer for volume holographic recording and its production process: The present invention refers to the manufacturing method of a holographic film and its development; the compositions of the films used in this invention are substantially solid and applied on a substrate in film or glass form; the photopolymerizable layer consists of a thickness of about 10 to 100 μm... Agent:
20120183891 - Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device: A manufacturing method of a photomask by which a resist pattern corresponding to a pattern with designed values can be formed, a method for optical proximity correction, and a manufacturing method of a semiconductor device are provided. Proximity design features that are close to each other and estimated to violate... Agent: Renesas Electronics Corporation
20120183890 - Method for fabricating a mask: A method for making a mask, in which, an imprinting lithography process is employed to form a pattern in a first region of a mask substrate, and an E-beam writing process is employed to form another pattern in a second region of the mask substrate. Furthermore, these two patterns may... Agent:
20120183889 - Multiple lithographic system mask shape sleeving: A mask fabrication method can include receiving a mask design, sending first exposure parameters to a first exposure machine, sending second exposure parameters to a second exposure machine, sending a first exposure generation command to the first machine based on the first exposure parameters and sending a second exposure generation... Agent: International Business Machines Corporation
20120183892 - Resist composition and patterning process: The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser,... Agent: Shin-etsu Chemical Co., Ltd.
20120183893 - Resist composition and patterning process: The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser,... Agent: Shin-etsu Chemical Co., Ltd.
20120183894 - Magenta toner, toner set, magenta developer, toner cartridge, process cartridge, and image forming apparatus: A magenta toner includes a binder resin containing a polyester resin having a dodecenylsuccinic acid structure as a constituent unit, and a solid solution of C.I. Pigment Violet 19 and C.I. Pigment Red 122, the magenta toner having an amount of the solid solution of from 2% by mass to... Agent: Fuji Xerox Co., Ltd.
20120183896 - Rosin-based resin and toner containing same: Disclosed is a polyester resin comprising the polycondensation product of (a) at least one diacid, acid ester, or diester; and (b) at least one diol; wherein either (i) at least one diacid, acid ester, or diester comprises a rosin diacid, rosin acid ester, or rosin diester; or (ii) at least... Agent: Xerox Corporation
20120183897 - Rosin-based resin and toner containing same: Disclosed is a polyester resin comprising the polycondensation product of (a) at least one diacid, acid ester, or diester; and (b) at least one diol; wherein either (i) at least one diacid, acid ester, or diester comprises a rosin diacid, rosin acid ester, or rosin diester; or (ii) at least... Agent: Xerox Corporation
20120183898 - Continuous emulsification-aggregation process for the production of particles: A continuous emulsion aggregation process for the production of particles is presented including a plurality of continuous stirred-tank reactors (CSTR). The plurality of continuous stirred-tank reactors includes a first reactor and a second reactor for facilitating an aggregation process; a third reactor for facilitating a shell addition process; a fourth... Agent: Xerox Corporation
20120183899 - Resist composition and method of forming resist pattern: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, dissolved in an organic solvent (S) which contains an alcohol-based solvent, wherein the base component (A) contains a... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120183900 - Resist composition, method of forming resist pattern and polymeric compound: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1).... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120183901 - Method for producing lithographic printing plate precursor: To provide a method for producing a lithographic printing plate precursor excellent in development property and printing durability, which method restrains mixture of both layers at coating and drying an overcoat layer on an image-recording layer. A method for producing a polymerizable lithographic printing plate precursor including (a) a step... Agent:
20120183903 - Patterning process and resist composition: A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having a nitrogen atom bonded to an acid labile group, an acid generator, and an organic solvent onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, baking, and... Agent: Shin-etsu Chemical Co., Ltd.
20120183902 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1... Agent: Jsr Corporation
20120183904 - Nitrogen-containing monomer, polymer, resist composition, and patterning process: A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group... Agent: Shin-etsu Chemical Co., Ltd.
20120183905 - Charged-particle beam drawing apparatus and article manufacturing method: A drawing apparatus for drawing a pattern on a substrate by using a charged-particle beam comprises: a blanking deflector which deflects the charged-particle beam; a stopping aperture member which can block the charged-particle beam deflected by the blanking deflector; a catalyst which generates, from a gas, an active species for... Agent: Canon Kabushiki Kaisha
20120183906 - Mask pattern generating method, manufacturing method of semiconductor device, and computer program product: According to a mask pattern generating method of the embodiments, an undesired pattern, which is transferred onto a substrate due to an auxiliary pattern when an on-substrate pattern is formed on the substrate by using a mask pattern in which the auxiliary pattern is placed, is extracted as an undesired... Agent:
20120183907 - Patterning process for small devices: A method according to one embodiment includes applying a photoresist to a substrate; exposing the photoresist such that a local intensity of radiation applied to the photoresist at each pixel thereof is a function of a mathematically-generated representation of a target surface shape; developing the resist; and performing a subtractive... Agent: International Business Machines Corporation
20120183908 - Resist pattern-forming method: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes... Agent: Jsr Corporation
20120183909 - Developing treatment method: A developing treatment method includes: a treatment solution supplying step of supplying a treatment solution made by diluting a hydrophobizing agent hydrophobizing a resist pattern with hydrofluoroether onto a substrate on which a rinse solution has been supplied after development of the resist pattern; a hydrophobic treatment stabilizing step of... Agent: Tokyo Electron Limited07/12/2012 > 11 patent applications in 10 patent subcategories. category listing
20120178019 - Method of making holographic recording materials and articles formed thereby: A method of manufacturing an article for display of a holographic image is described that includes thermally fusing a holographic recording medium containing a photochemically active dye dispersed in a transparent thermoplastic polymer binder to another layer or material; and then exposing the holographic film to intersecting beams of coherent... Agent: Sabic Innovative PlasticsIPB.v.
20120178020 - Method and composition for reducing waste in photo-imaging applications: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste... Agent: DsmIPAssets
20120178022 - Positive photosensitive resin composition, cured film obtained using same, and optical device: Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or... Agent:
20120178021 - Resin and photoresist composition comprising the same: s
20120178024 - Polymer, radiation-sensitive composition, monomer, and method of producing compound: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which... Agent: Jsr Corporation
20120178025 - Charged particle beam drawing apparatus and article manufacturing method: The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams... Agent: Canon Kabushiki Kaisha
20120178026 - Imaging devices, methods of forming same, and methods of forming semiconductor device structures: An imaging device comprising at least one array pattern region and at least one attenuation region. A plurality of imaging features in the at least one array pattern region and a plurality of assist features in the at least one attenuation region are substantially the same size as one another... Agent: Micron Technology, Inc.
20120178027 - Multiple exposure photolithography methods: A method. The method forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second image pattern, respectively. The photoresist composition includes a polymer including labile group(s), base soluble... Agent: International Business Machines Corporation
20120178028 - Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method: According to one embodiment, a spatial light modulator unit is used in the illumination optical system for illuminating an illumination target surface with light from a light source and comprises: a spatial light modulator with a plurality of optical elements arrayed in a predetermined plane and controlled individually; a spatial... Agent: Nikon Corporation
20120178029 - Developable bottom antireflective coating compositions especially suitable for ion implant applications: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion... Agent: International Business Machines Corporation07/05/2012 > 28 patent applications in 19 patent subcategories. category listing
20120171600 - Time differential reticle inspection: Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.... Agent: Asml Holding N.v.
20120171601 - Furan derivative and electrophotographic photoconductor: s
20120171603 - Coating composition including fluorescent material for producing secure images: A coating composition, system, and method for printing documents that are difficult to chemically or physically forge and that are easy to visually verify are disclosed. The system includes a substrate, a toner, including a colorant and a dye, a coating including fluorescent material, e.g., a primary migration-enhancing coating, applied... Agent: Troy Group, Inc.
20120171602 - Toner for developing electrostatic charge image, and apparatus and method for forming image using the same: Disclosed is a toner for developing an electrostatic charge image, including a toner particle coated with a combination of sol-gel silica particles, hydrophobically surface-treated fumed silica particles, and hydrophobically surface-treated titanium dioxide particles.... Agent: Samsung Electronics Co., Ltd.
20120171604 - Coloured aqueous polymer dispersions, and production and use of same: The invention relates to a coloured polymer dispersion containing, as main ingredients: (a) a coloured polymer produced by polymerisation of monomer A with monomer B, monomer A being a pigment B which is coated with a polymerisable wax D wherein the polymerisable function is an ethylenically unsaturated group, monomer B... Agent: Clariant Finance (bvi) Limited
20120171605 - Porous particles with multiple markers: Polymeric porous particles have a continuous solid phase and at least two different internal pores that are isolated from each other within the continuous phase. At least one set of discrete pores contains a marker material, and some instances, each set of discrete pores contain different pores marker materials that... Agent:
20120171606 - Bimodal styrene vinyl polymer latex for chemically produced toner: A process is provided for preparing a bimodal styrene vinyl polymer latex composition, which may be used to prepare toner for use in electrophotographic applications by the emulsion aggregation process. The process includes preparing a low molecular weight styrene polymer (LMWP) by solution polymerization, preparing a solution of the LMWP... Agent: Image Polymers Company, LLC
20120171607 - Toner: Toner characterized in that assuming that the glass transition point of the toner measured by a differential scanning calorimeter (DSC) is represented by T1(° C.), in a micro compression test at T1−10 (° C.), when a load from 0.00N (0.00 mgf) to 7.85×10−4 N (80.00 mgf) is applied at the... Agent: Canon Kabushiki Kaisha
20120171608 - Toner: A toner in which, in a loss tangent (tan δ) curve obtained by a dynamic viscoelasticity test, the tan δ shows a maximal value δa in the temperature region of 28.0-60.0° C., which maximal value δa is 0.50 or more, and shows a minimal value δb in the temperature region... Agent: Canon Kabushiki Kaisha
20120171611 - Aromatic hydrocarbon resin and composition for forming underlayer film for lithography: The aromatic hydrocarbon resin can be used as a coating material and a resist resin for a semiconductor, and has a high carbon concentration and a low oxygen concentration. A composition for forming an underlayer film for lithography that has excellent etching resistance as an underlayer film for a multilayer... Agent:
20120171610 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a novolac resin including a repeating unit represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, a photosensitive resin film prepared by using the positive photosensitive... Agent: Cheil Industries Inc.
20120171609 - Positive photosensitive resin composition, photosensitive resin layer prepared by using the same, and semiconductor device including the photosensitive resin layer: Provided is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by Chemical Formula 1 and a repeating unit represented by Chemical Formula 2, and having a thermally polymerizable functional group at least one terminal end; (B) a... Agent: Cheil Industries Inc.
20120171612 - Radiation-sensitive resin composition, resist pattern formation method, and polymer: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer includes a repeating unit (I) shown by the following general formula (1), a fluorine atom in a molecule of the first polymer. The second a polymer includes an acid-labile group, and... Agent: Jsr Corporation
20120171613 - Upper layer film-forming composition and method of forming photoresist pattern: An upper layer film-forming composition includes a resin and a solvent component. The resin is soluble in a developer. The solvent component includes first solvent which has a boiling point of 180 to 280° C. at 101.3 kPa and a vapor pressure of 0.001 to 0.1 kPa at 20° C.... Agent: Jsr Corporation
20120171614 - Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a dissolution controlling agent including the compound represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, and a photosensitive resin film prepared by using the same.... Agent: Cheil Industries Inc.
20120171618 - Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action... Agent: Fujifilm Corporation
20120171616 - Polymerizable photoacid generators: wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached... Agent:
20120171617 - Polymers, photoresist compositions and methods of forming photolithographic patterns: Provided are polymers that include a unit comprising a particular acetal moiety and a unit comprising a lactone moiety. Also provided are photoresist compositions containing such a polymer, substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, compositions, methods and coated substrates find particular applicability... Agent: Rohm And Haas Electronic Matericals LLC
20120171619 - Method of studying chirality controlled artificial kagome spin ice building blocks: A method is provided for achieving low energy states for the study of chirality kagome spin ice structures, the method having the steps of providing a silicon substrate; spin coating a polymethyl acrylate resist on said silicon substrate; providing an electron beam writer; exposing said coated substrate to an electron... Agent: Paul Scherrer Institut
20120171620 - Method of improving print performance in flexographic printing plates: A method of controlling the shape of a plurality of relief dots created in a photosensitive printing blank during a digital platemaking process is provided. The photosensitive printing blank comprises a laser ablatable mask layer disposed on at least one photocurable layer. The method comprises the steps of a) laser... Agent:
20120171621 - Method for manufacturing electronic device and electronic device: A method for manufacturing an electronic device comprises a step for forming a coating film (100) on a surface of a conductor portion-containing body (500), a step for forming a photosensitive film (110) on the conductor (500) on which the coating film (100) has been formed, a step for exposing... Agent: Tpo Hong Kong Holding Limited
20120171623 - Fabrication of a high fill ratio silicon spatial light modulator: A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region... Agent: Miradia Inc.
20120171622 - Filter, exposure apparatus, and method of manufacturing device: A filter reflects first light having a first wavelength, and transmits second light having a second wavelength shorter than the first wavelength. The filter includes a plurality of plate members positioned parallel to each other with gaps therebetween in a first direction. An enveloping surface formed by end surfaces of... Agent: Canon Kabushiki Kaisha
20120171624 - Printed circuit board for optical waveguide and method of manufacturing the same: Disclosed herein is a printed circuit board for an optical waveguide, including a base board, and an optical waveguide formed on the base board. The optical waveguide includes a lower clad layer formed on the base board, an insulation layer formed on the lower clad layer and having a core-forming... Agent: Samsung Electro-mechanics Co., Ltd.
20120171625 - Immersion exposure apparatus and method of operating thereof: An immersion exposure apparatus includes a light source, a projection lens set, a photomask, a liquid medium, and a supporting stage. The projection lens set has a front surface facing the light source and a first back surface facing away from the light source. The photomask has a second back... Agent:
20120171626 - Compositions comprising base-reactive component and processes for photolithography: New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.... Agent: Rohm And Haas Electronic Materials LLC
20120171627 - Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method: An inspection device is for inspecting a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and controlled individually. The inspection device includes a Fourier transform optical system which is arranged optically downstream the spatial light modulator and which forms a Fourier transform plane optically in a Fourier... Agent: Nikon CorporationPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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