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Radiation imagery chemistry: process, composition, or product thereof June invention type 06/12

20120164564 - Advanced photomask repair: Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form... Agent: Nanoink, Inc.

20120164565 - Fluorinated coating and phototools made therewith: A coating including an oligomer is disclosed, the oligomer being the reaction product of an epoxy silane, a multi-functional (meth)acrylate; and a polymerizable fluorochemical. The polymerizable fluorochemical can be fluorinated (meth)acrylate or a polymerizable fluorinated urethane. Phototools having a layer of the coating on a substrate can be made. A... Agent:

20120164563 - High resolution phase shift mask: Techniques are disclosed for fabricating lithography masks, which include a first level process comprising lithography and etching to form mask frame and in-die areas, and a second level process comprising lithography and etching to form one or more mask features in the in-die area. At least one of the mask... Agent:

20120164562 - Lithography mask having sub-resolution phased assist features: Techniques are disclosed for using sub-resolution phased assist features (SPAF) in a lithography mask to improve through process pattern fidelity and/or mitigate inverted aerial image problems. The technique also may be used to improve image contrast in non-inverted weak image sites. The use of SPAF in accordance with some such... Agent:

20120164566 - Patterning mask and method of formation of mask using step double patterning: A method of forming a mask for use in fabricating an integrated circuit includes forming first non-removable portions of a photoresist material through a mask having a plurality of apertures, shifting the mask, forming second non-removable second portions of the photoresist material overlapping the first portions, and removing removable portions... Agent:

20120164567 - Multilayer electrophotographic photoconductor and image- forming apparatus: A photosensitive layer in a multilayer electrophotographic photoconductor includes a charge-generation layer including a charge-generating material having, as a major component, a titanyl phthalocyanine crystal which satisfies the conditions (A) and (B) below and a base resin, and a charge-transport layer including a charge-transporting material, the charge-generating material having, as... Agent: Kyocera Mita Corporation

20120164568 - Charge transport layer containing symmetric charge transport molecules and high tg resins for imaging device: A photoreceptor charge transport layer containing a film-forming material or binder with a higher Tg and a symmetric charge transport molecule is described.... Agent: Xerox Corporation

20120164569 - Resin for toner and toner: A resin for toner containing a resin component having both a polyester unit produced by polycondensation of a polyhydric alcohol component and a polycarboxylic acid component, and an aryl group having a sulfonic ester group as a substituent; and a toner that contains the resin for toner.... Agent: Canon Kabushiki Kaisha

20120164570 - Thermally conductive fuser coating: The present invention is directed towards a fuser member having as its outermost layer, a cured composite comprising: a) a continuous phase of an elastomer; and b) thermally conductive particles dispersed in the elastomer, where the conductive particles comprise inorganic particles coated with a layer of fluoroplastic.... Agent:

20120164571 - Polymerized toner having high resolution: A polymerized toner is provided. The polymerized toner comprises a reactive anionic surfactant having at least one reactive functional group. The reactive anionic surfactant is added simultaneously with a dispersant to prepare an aqueous dispersion or is added within 2 hour after a polymerization reaction of a monomer mixture is... Agent:

20120164572 - Coating method, coating device, and storage medium: A device to form a coating film which can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device is configured such that nozzles for a preceding lot and a following lot are integrated into a common movement mechanism and moved between an upper side... Agent: Tokyo Electron Limited

20120164574 - Actinic-ray-sensitive or radiation-sensitive resin composition, and actinic-ray-sensitive or radiation-sensitive film and pattern forming method using the same: An actinic-ray-sensitive or radiation-sensitive resin composition according to the present invention includes (A) a first resin which decomposes by an action of an acid to increase a solubility of the first resin in an alkaline developer, (B) a second resin which includes at least one of a fluorine atom and... Agent: Fujifilm Corporation

20120164573 - Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same: The actinic-ray-sensitive or radiation-sensitive resin composition of the present invention includes (A) a resin containing a repeating unit having a specific lactone structure and a repeating unit having a specific monocyclic alicyclic structure, which increases a solubility in an alkaline developer by the action of an acid, and (B) a... Agent: Fujifilm Corporation

20120164575 - Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern: e

20120164576 - Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern:

20120164577 - Positive resist composition and patterning process: A positive resist composition includes at least: (A) a polymer containing a repeating unit (a1) and an acid labile repeating unit (a2), wherein the repeating unit (a1) generates an acid of a structure represented by general formula (1) as a result that the repeating unit (a1) is sensed to a... Agent: Shin-etsu Chemical Co., Ltd.

20120164581 - Negative resist composition, method of forming resist pattern and polymeric compound: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2)... Agent:

20120164580 - Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120164582 - Radiation-sensitive composition and compound: A radiation-sensitive composition includes a photoacid generator shown by a general formula (0-1a). Each of R0 individually represents a substituted or unsubstituted organic group which includes a carbon atom, a hydrogen atom, and an oxygen atom, and which includes at least one ester bond, and M+ represents a monovalent onium... Agent: Jsr Corporation

20120164578 - Resist composition, method of forming resist pattern: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, an acid generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound component (D), wherein the acid generator component (B) includes an acid generator (B1) containing... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120164579 - Salt, photoresist composition and process for producing photoresist pattern: r

20120164583 - Drawing apparatus and method of manufacturing article: A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect... Agent: Canon Kabushiki Kaisha

20120164584 - Method of improving print performance in flexographic printing plates: A method of making a relief image printing element from a photosensitive Printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to... Agent:

20120164585 - Local exposure method and local exposure apparatus: A local exposure method includes steps of: dividing a large block into a plurality of small blocks; setting irradiation illuminances different in a stepwise fashion; controlling light emission of light emitting elements based on the irradiation illuminances respectively set for the small blocks for a photosensitive film on a substrate... Agent: Tokyo Electron Limited

20120164586 - Patern forming method: A pattern forming method includes forming a photoresist film on a substrate using a radiation-sensitive composition. An immersion liquid protecting film insoluble in an immersion liquid is formed on the photoresist film. The photoresist film is exposed to radiation through a mask having a predetermined pattern and through the immersion... Agent: Jsr Corporation

20120164587 - Hybrid lithographic method for fabricating complex multidimensional structures: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect... Agent: Massachusetts Institute Of Technology

20120156595 - Compositions comprising sugar component and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography... Agent: Rohm And Haas Electronic Materials LLC

20120156597 - Lithographic mask and manufacturing method thereof: Cleaning is carried out by using a sulfuric acid type detergent at a resist stripping and cleaning step (step 5) in a semitranslucent portion forming process and a resist stripping and cleaning step (step 10) in a shielding band forming process, and a sulfuric acid removing step of partially or... Agent: Hoya Corporation

20120156596 - Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: A mask blank for use in the manufacture of a transfer mask adapted to be applied with ArF excimer laser exposure light is disclosed. The mask blank has, on a transparent substrate, a light-shielding film for forming a transfer pattern. The light-shielding film has an at least two-layer structure including... Agent: Hoya Corporation

20120156593 - Method for patterning trenches with varying dimension: Methods for patterning integrated circuit (IC) features with varying dimensions are provided. In an example, a method includes forming a first patterned radiation-sensitive resist layer over a device substrate using a first mask, wherein the first patterned radiation-sensitive resist layer includes a first portion of an IC pattern; using the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120156594 - Photomask including super lens and manufacturing method thereof: A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The... Agent: Samsung Electronics Co., Ltd.

20120156592 - Use of patterned uv source for photolithography: A system and method of exposing photoresist on the surface of the solar cell to light so as to create an appropriate mask is disclosed. A microcavity array is used to expose the photoresist to UV light in a pattern that matches the desired pattern on the solar cell. Microcavity... Agent: Varian Semiconductor Equipment Associates, Inc.

20120156598 - Photosensitive resin composition for microlens: There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent,... Agent: Nissan Chemical Industries, Ltd.

20120156599 - Electrophotographic photoconductor and image forming apparatus including the same: wherein Ar1 represents an optionally substituted arylene or bivalent heterocyclic group; Ar2s, which may be the same or different, each represent a hydrogen atom or an optionally substituted alkyl, aralkyl, aryl or monovalent heterocyclic group; R1 represents an optionally substituted alkyl group; R2s each represent a hydrogen atom or an... Agent:

20120156600 - Electrophotographic photoconductor and image forming apparatus using the same: e

20120156604 - Electrophotographic clear toner and image forming method: Provide is a clear toner having a wide fixing temperature latitude so as to improve the degree of glossiness in a wide range of image density areas, from a white portion to a high image density portion, while ensuring sufficient fixing performance and color mixing in color portions. The clear... Agent: Canon Kabushiki Kaisha

20120156601 - Toner for developing electrostatic image, developer for electrostatic image, toner cartridge, process cartridge, and image forming apparatus: A toner for developing an electrostatic image, including: toner particles containing at least a binder resin, a release agent, and a colorant; and an external additive having a volume average particle diameter (d) of from 70 nm to 400 nm, a ratio (d/σ) of the volume average particle diameter (d)... Agent: Fuji Xerox Co., Ltd.

20120156602 - Toner for electrostatic image development: A toner for electrostatic image development containing toner matrix particles having at least a resin binder and a colorant, and an external additive, the external additive having composite oxide particles (an external additive A) that have titania and silica, wherein the external additive A has a core-shell structure in which... Agent: Kao Corporation

20120156603 - Toner for electrostatic image development: A toner for electrostatic image development containing an external additive comprising composite oxide particles made of titania and silica (external additive A), and hydrophobic silica particles (external additive B), wherein the external additive A has a core-shell structure in which a core portion is made of titania and a shell... Agent: Kao Corporation

20120156605 - Toner compositions and processes: The present disclosure provides polymeric additives for use with toner particles. The polymeric additive of the present disclosure includes a copolymer possessing at least one monomer having a high carbon to oxygen ratio, a monomer having more than one vinyl group, and at least one amine-functional monomer. Toners possessing this... Agent: Xerox Corporation

20120156606 - Toner compositions and processes: The present disclosure provides polymeric additives for use with toner particles. The polymeric additive of the present disclosure includes a copolymer possessing at least one monomer having a high carbon to oxygen ratio and at least a second amine-functional monomer. Toners possessing this polymeric additive exhibit excellent stability with respect... Agent: Xerox Corporation

20120156607 - Toner compositions and processes: Environmentally friendly toner particles are provided which may include a bio-based amorphous polyester resin, optionally in combination with another amorphous resin and/or a crystalline resin. Methods for providing these toners are also provided. In embodiments, the bio-based amorphous polyester resin is modified with a multi-functional bio-based acid, thereby providing acid-functionalized... Agent: Xerox Corporation

20120156608 - Toner for electrostatic image development: A toner for electrostatic image development which is excellent in latitude for environment conditions and is capable of giving prints superior in outputted image stability is disclosed, comprising a resin and a colorant, and the resin comprising a resin (A) having a structural unit represented by the following formula (1)... Agent: Konica Minolta Business Technologies, Inc.

20120156609 - Method for producing print having foil image and toner image: Provided is a method for producing a print having a toner image and a foil image, the method containing the steps of forming a foil transferring toner image with a foil transferring toner on an image supporting substrate produced; heating and pressing by laminating the foil transferring toner image onto... Agent: Konica Minolta Business Technologies, Inc.

20120156610 - Toner compositions and processes: Processes for producing toners are provided. The processes include determining the desired gloss for a given toner, and determining the desired amount of aluminum in the toner to obtain that gloss. Utilizing the processes of the present disclosure, the solids content of an emulsion utilized to produce such a toner,... Agent: Xerox Corporation

20120156611 - Fluoroalcohol containing molecular photoresist materials and processes of use: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.... Agent: International Business Machines Corporation

20120156612 - Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer: A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R1 represents a methyl group or the... Agent: Jsr Corporation

20120156613 - Anti-reflective coatings using vinyl ether crosslinkers: Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the... Agent: Brewer Science Inc.

20120156615 - Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern: v

20120156614 - Novel phenol compounds and positive photosensitive resin composition including the same: Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.... Agent: Cheil Industries Inc.

20120156617 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: s

20120156618 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below... Agent: Fujifilm Corporation

20120156616 - Positive photosensitive resin composition: c

20120156619 - Acrylate-based compounds and photosensitive composition comprising the same: The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging... Agent: Lg Chem, Ltd.

20120156621 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R2 represents a hydrogen atom or a methyl group, and each of R2s individually represents a monovalent alicyclic... Agent: Jsr Corporation

20120156620 - Resist composition and method for producing resist pattern: r

20120156622 - Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same: An ortho-nitrobenzyl ester compound including a compound represented by Chemical Formula 1, and a positive photosensitive resin composition including the same are provided.... Agent: Cheil Industries Inc.

20120156623 - Semiconductor device manufacturing method, exposure method for exposure apparatus, exposure apparatus, and light source for exposure apparatus: A semiconductor device manufacturing method which improves exposure characteristics. The method includes the step of making preparations for use of an exposure apparatus. The apparatus includes a light emitting unit with a first electrode and a second electrode for generating EUV light, a heating light source for heating the first... Agent: Renesas Electronics Corporation

20120156624 - Waterless printing members and related methods: In various embodiments, a recording medium comprises an oleophilic substrate and, thereover, a topmost oleophobic layer comprising a cured polymeric silicone matrix that consists essentially of the addition-cure reaction product of a vinyl-functional polydialkylsiloxane and a silane cross-linking agent. The vinyl-functional polydialkylsiloxane has a molecular weight ranging from 30,000 to... Agent:

20120156626 - Coating and developing system and coating and developing method: A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of... Agent: Tokyo Electron Limited

20120156625 - Nano-fabrication method: Disclosed herein is a nano-fabrication method, which includes the step of: (a) forming an inorganic resist layer on a substrate; (b) forming an organic photoresist layer on the inorganic resist layer; (c) irradiating both the organic photoresist layer and the inorganic resist layer with a laser beam to form a... Agent: Ritek Corporation

20120148942 - Diagonal interconnect for improved process margin with off-axis illumination: Mask or reticle methods and structures having pattern feature segments formed at oblique angles to each other. When illuminated using off-axis illumination techniques, a mask or reticle according to the present teachings can result in a more accurately reproduced feature within a photosensitive layer.... Agent:

20120148943 - Method for determining a grey level etch mask: s

20120148944 - Photomasks and methods of manufacturing the same: In a method of manufacturing a photomask pattern, a light-shielding layer pattern and an anti-reflective layer pattern are formed sequentially on a transparent substrate. Oxidation and nitridation processes are performed on a sidewall of the light-shielding layer pattern to form a protection layer pattern on a lateral portion of the... Agent:

20120148945 - Resist composition and patterning process: A polymer having a partial structure —C(CF3)2OH in recurring units is used as an additive to formulate a resist composition. A photoresist film formed from the resist composition has sufficient barrier performance against water to prevent any resist components from being leached in water and thus minimize any change of... Agent: Shin-etsu Chemical Co., Ltd.

20120148946 - Color filter of liquid crystal on silicon display device: A color filter of a liquid crystal on silicon (LCOS) display device is disclosed, including a substrate including a plurality of pixel regions wherein each pixel region includes a first color dot, a second color dot and a third color dot; and a first color resist, a second color resist... Agent: Himax Technologies Limited

20120148947 - Developer, developer container, image forming unit and image forming apparatus: Disclosed is a developer including at least a toner for developing electrostatic latent images. The toner includes toner base particles each containing at least one binder resin, and external additives for adhering to the outer surfaces of the toner base particles. The toner has a first triboelectric charge obtained by... Agent: Oki Data Corporation

20120148948 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming method, and image forming apparatus: An electrostatic image developing toner contains a binder resin and at least two different kinds of white pigments, wherein from about 10% by weight to about 30% by weight of the at least two kinds of white pigments is porous titanium oxide having a volume average particle diameter of from... Agent: Fuji Xerox Co., Ltd.

20120148949 - Resin composition for printing plate:

20120148951 - Solvent-free bio-based emulsion: Solvent-free extrusion processes are disclosed that are suitable for forming high bio-based polyester latexes that may be utilized in forming a toner, as well as other commercial products.... Agent: Xerox Corporation

20120148950 - Toner processes utilizing washing aid: A process for making toner particles is provided. In embodiments, a suitable process includes adding a washing aid agent to toner particles at the time of washing the toner particles prior to their drying and recover. The washing aid agent assist in the removal of ionic species, including surfactants and... Agent: Xerox Corporation

20120148952 - Radiation-sensitive resin composition and compound: A radiation-sensitive resin composition includes a compound, a resin and a radiation-sensitive acid generator. The compound has a structure in which a group represented by a following formula (1) is bound to a nitrogen atom. The resin has an acid-dissociative dissolution-controlling group and has a property such that alkali solubility... Agent: Jsr Corporation

20120148953 - Resist composition, and method of forming resist pattern: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120148954 - N-acyl-b-lactam derivative, macromolecular compound, and photoresist composition: In the formula, R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R2, R3, R4, and R5 independently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or... Agent:

20120148957 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains: (A) a resin substantially insoluble... Agent: Fujifilm Corporation

20120148956 - Resist composition and method of forming resist pattern: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1))... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120148955 - Resist composition, method of forming resist pattern, and new compound: wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120148959 - Pattern forming method: A pattern forming method includes providing a first mask with a first aperture, forming a first transfer pattern on a resist by irradiating a first electron beam through the first aperture, the first transfer pattern extending in a first direction and having a boundary along a circumference thereof, and the... Agent:

20120148958 - Sulfur-containing macromolecules and methods for their preparation: A sulfur-containing macromolecule and a method of preparing the sulfur-containing macromolecule comprising a polymerization step are provided, where the sulfur-containing macromolecule contains internal units of formula (I) and the polymerization step is formula (II) wherein n is greater than 1, said precursor comprises alkyne having one or more acetylene groups... Agent: The Hong Kong University Of Science And Technology

20120148960 - Method of manufacturing printed circuit board: A method of manufacturing a printed circuit board, including: applying a conductive paste including carbon nanotubes and a photosensitive binder on a bump-forming area of a circuit substrate having a circuit layer for transferring electrical signals; and patterning the conductive paste, thus forming bumps.... Agent: Samsung Electro-mechanics Co., Ltd.

20120141926 - Lcd panel photolithography process and mask: Disclosed is an LCD panel photolithography process, employed in a lithography system for manufacturing a plurality of LCD panel, comprising steps of: performing photolithography to a glass substrate with a first mask, and the first mask comprises a plurality of sets of alignment marks corresponding to a plurality of following... Agent: Shenzhen China Star Optoelectronics Technology Co., Ltd.

20120141922 - Method and apparatus for euv mask having diffusion barrier: A photomask is provide. The photomask includes a substrate having a multi-layer stack disposed over the substrate. The multilayer stack has alternating first second and third layers disposed over each other, wherein the first, second and third layers are composed of first, second and third materials, respectively, and wherein at... Agent:

20120141929 - Method for manufacturing half-tone mask, and half-tone mask: Provided is a method of manufacturing a half-tone mask that can reduce the number of film forming steps. The method according to the present invention is for manufacturing a half-tone mask to be interposed between a light source and a photosensitive layer so as to form plural kinds of exposure... Agent: Sharp Kabushiki Kaisha

20120141928 - Methos and device for keeping mask dimensions constant: The present application describes a method and a device for keeping the mask dimensions of a mask (6) constant in the mask plane in lithography. The mask (6) is heated due to the exposure during lithography. By means of thermal and/or mechanical methods, the dimensions of the mask (6) are... Agent: S&#xdc Ss Microtec Lithography Gmbh

20120141924 - Multiresolution mask writing: Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to write a second shot pattern having a second resolution finer than the first resolution, such that the... Agent:

20120141925 - Photo-mask and method for manufacturing liquid crystal display device using the same: A photo-mask is capable of preventing stain defects and a method for fabricating a liquid crystal display device using the photo-mask which achieves the same capability. The photo-mask includes a transparent substrate configured to transmit ultraviolet light and a light shielding layer configured to block ultraviolet light on a surface... Agent: Samsung Mobile Display Co., Ltd.

20120141923 - Protective cap for extreme ultraviolet lithography masks: An extreme ultraviolet (EUV) lithography mask is provided. The EUV lithography mask includes a reflective layer and an absorptive layer deposited over the reflective layer. The absorptive layer is patterned so as to define absorptive regions of the mask for absorbing EUV radiation and reflective regions of the mask for... Agent:

20120141927 - Reflective mask and method for manufacturing the same: According to one embodiment, a method for manufacturing a reflective mask includes producing a reflective mask includes a substrate, a reflection layer provided on a front surface of the substrate and configured to reflect exposure light, an absorption layer provided on the reflection layer and configured to absorb the exposure... Agent:

20120141930 - Low torque overcoat for imaging device: An overcoat containing a copolymer of a first propylene monomer and a second hydrophilic monomer provides superior wear resistance and low torque to a photoreceptor.... Agent: Xerox Corporation

20120141931 - Polymerized toner comprising cyclic phenol sulfide: A negatively charged polymerized toner having high charging performance, which comprises a charge control agent particularly useful for color toners and polymerized toners, the charge control agent comprising a cyclic phenol sulfide as an active ingredient, which speeds up charging risetime, has a high charge amount and charging characteristics particularly... Agent:

20120141932 - Developer and method for producing the same: A method for producing a developer, the method includes aggregating first fine particles and second fine particles in a dispersion liquid, said dispersion liquid containing the first fine particles which contain at least a binder resin, and the second fine particles which contain a coloring compound, a color developer and... Agent: Kabushiki Kaisha Toshiba

20120141933 - Liquid developer, process cartridge, image forming apparatus, and image forming method: The present invention provides a liquid developer including an insulating carrier liquid and toner particles containing a binder resin, the binder resin including a styrene-based thermoplastic elastomer and a styrene thermoplastic resin, and the toner particles being dispersed in the insulating carrier liquid.... Agent: Fuji Xerox Co., Ltd.

20120141934 - Toners made from latexes: A toner comprising toner particles which comprise binder resin and colorant, wherein the binder resin is made from latexes which comprise a low molecular weight (LMW) latex of resin particles having a weight average molecular weight (Mw) less than 50,000 and a medium molecular weight (MMW) latex of resin particles... Agent:

20120141935 - Developer and its use to prepare lithographic printing plates: A developer solution can be used to prepare lithographic printing plates from negative-working precursors. The developer solution has a pH of at least 4 and up to and including 11. It also comprises both an ethylene/propylene glycol block copolymer and either or both of a sugar alcohol or a mono-... Agent:

20120141936 - Photo-curing polysiloxane composition and protective film formed from the same: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular... Agent: Chi Mei Corporation

20120141937 - Photosensitive composition and photoresist: A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition comprises a binder agent, a photomonomer and a photoinitiator. The binder agent is formed by polymerizing a binder composition. The binder composition comprises a lactic oligomer. The photomonomer has an... Agent: Industrial Technology Research Institute

20120141938 - Basic compound, chemically amplified resist composition, and patterning process: A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a... Agent: Shin-etsu Chemical Co., Ltd.

20120141940 - Chemically amplified positive-type photoresist composition for thick film, and method for producing thick film resist pattern: A chemically amplified positive-type photoresist composition for a thick film capable of forming a thick film resist pattern having superior resolving ability and controllability of dimensions, and being favorable in rectangularity, as well as a method for producing a thick film resist pattern using such a composition. The photoresist composition... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120141939 - Photoacid generators: In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol,... Agent:

20120141941 - Developing lithographic printing plate precursors in simple manner: Imaged lithographic printing plates are processed using a developer that is replenished with only water, but replenishment is at a rate to allow developer volume to slowly decrease from a developer reservoir. This allows for a longer processing cycle especially when the developer is supplied from a container having a... Agent:

20120141942 - Method of preparing lithographic printing plates: Lithographic printing plates are prepared by imaging and developing negative-working lithographic printing plate precursors that include certain particulate polymeric binders in the photosensitive imageable layer. Such particulate polymeric binders are poly(urethane-acrylic) hybrids. Development is carried out using a working strength developer that includes one or more organic solvents in a... Agent:

20120141944 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device including: forming a resist film 11 on a film to be processed 32; baking the resist film 11; performing immersion exposure on the resist film 11 after the baking; performing post exposure bake on the resist film 11 after performing the immersion exposure;... Agent: Kabushiki Kaisha Toshiba

20120141943 - Methods of forming patterns: Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material... Agent: Micron Technology, Inc.