|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
USPTO Class 430 | Browse by Industry: Previous - Next | All
05/2012 | Recent | 13: May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Radiation imagery chemistry: process, composition, or product thereof May archived by USPTO category 05/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 05/31/2012 > 21 patent applications in 18 patent subcategories. archived by USPTO category
20120135338 - Holographic recording medium with control of photopolymerization and dark reactions: The present invention relates to a system, as well as articles and holographic recording medium comprising the system, where the system comprises: a polymerizable component comprising at least one photoactive polymerizable material; and a photoinitiator component comprising at least one photoinitiator for causing the polymerizable component to polymerize to thereby... Agent: Inphase Technologies, Inc.
20120135341 - Method for double patterning lithography and photomask layout: A method for double patterning lithography which is applied to a semiconductor substrate to form a plurality of trenches, includes a pattern formation process. In the pattern formation process, a plurality of predetermined patterns corresponding to the trenches are formed by using a graphic data system. A first pattern file... Agent:
20120135340 - Photomask and formation method thereof: A method for forming a photomask includes detecting a defect of the photomask which has a mirror layer formed on a first surface of a substrate, and forming a recess groove on a first layer which is formed on a second surface of the substrate, wherein the coordinate of the... Agent: Hynix Semiconductor Inc.
20120135339 - Reflective extreme ultraviolet mask and method of manufacturing the same: A reflective extreme ultraviolet mask includes a mask substrate having an exposing region and a peripheral region, the mask substrate including a light-scattering portion in the peripheral region, a reflective layer on an upper surface of the mask substrate, the reflective layer having a first opening exposing the light-scattering portion,... Agent:
20120135342 - Fixing solution, fixing method, fixing device, image forming method and image forming apparatus: To provide a fixing solution for fixing fine resin particles to a recording medium, the fixing solution including: a diluent which contains water; a foaming agent which allows the fixing solution to be in the form of foam; and plasticizers which soften or swell at least part of the fine... Agent: Ricoh Company, Ltd.
20120135344 - Toner for developing electrostatic images and method for producing the same: The present invention is to provide a toner for developing electrostatic images having a low minimum fixing temperature, and high hot offset resistance and high heat-resistant shelf stability, and a method for producing the toner. Also, the present invention is to provide a toner for developing electrostatic images, comprising a... Agent: Zeon Corporation
20120135346 - Processes for producing polyester latexes with bio-based solvents: A process for making a latex emulsion suitable for use in a toner composition includes contacting at least one polyester resin with a bio-based solvent to form a resin mixture, adding a neutralizing agent and deionized water to the resin mixture, removing the solvent from the formed latex, and recovering... Agent: Xerox Corporation
20120135347 - Resist composition, method of forming resist pattern, polymeric compound and compound: [wherein A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.]... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120135348 - Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, and pattern forming method: The actinic-ray-sensitive or radiation-sensitive resin composition includes (A) a compound which generates an acid represented by the following general formula (I) or (I′) upon irradiation with an actinic-ray or a radiation, and (B) a resin which decomposes by an action of an acid to increase a solubility of the resin... Agent: Fujifilm Corporation
20120135349 - Positive resist composition and patterning process: A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved... Agent: Shin-etsu Chemical Co., Ltd.
20120135350 - Positive resist composition and patterning process: A positive resist composition comprising (A) a polymer comprising recurring units of a specific structure adapted to generate an acid in response to high-energy radiation and acid labile units, the polymer having an alkali solubility that increases under the action of an acid, and (B) a sulfonium salt of a... Agent:
20120135351 - Salt and photoresist composition comprising the same: wherein R1 and R2 independently each represent a C1-C6 alkyl group or R1 and R2 are bonded each other to form a C5-C20 aliphatic ring together with the carbon atom to which they are bonded, R3 and R4 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1... Agent: Sumitomo Chemical Company, Limited
20120135352 - Preparation of norbornane-based pac ballasts: Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble positive-tone polymer compositions that encompass such norbornane-type photoactive compounds and one of a PBO or PNB resin.... Agent: Promerus LLC
20120135353 - Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pat: A functionally gradient inorganic resist that changes in its state by heat, having a main surface irradiated with laser beams and a rear surface opposed to the main surface; the functionally gradient inorganic resist including a single layer resist, wherein at least a composition of the single layer resist is... Agent: Hoya Corporation
20120135354 - Method of producing a relief image for printing: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in... Agent:
20120135355 - Method of forming patterns: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the... Agent: Fujifilm Corporation
20120135356 - Semiconductor device: A semiconductor device includes a memory cell array area, a peripheral circuit area on a periphery of the memory cell array area, and a boundary area having a specific width between the memory cell array area and the peripheral circuit area, the memory cell array area including a cell area... Agent:
20120135357 - Polymer, positive resist composition, and patterning process: A positive resist composition comprising a polymer comprising recurring units of a specific structure adapted to generate an acid upon exposure to high-energy radiation, recurring units of a lactone ring-containing structure, and acid labile units, all the recurring units being free of hydroxyl, can form a fine size pattern having... Agent:
20120135358 - Coating treatment method, computer-readable storage medium, and coating treatment apparatus: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the... Agent: Tokyo Electron Limited05/24/2012 > 27 patent applications in 17 patent subcategories. archived by USPTO category
20120129083 - Method for manufacturing reflective mask and apparatus for manufacturing reflective mask: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the... Agent: Shibaura Mechatronics Corporation
20120129084 - Photomask blank and production method thereof, and photomask production method, and semiconductor device production method: A photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern. The photomask blank provides a good pattern accuracy through optimization of the dry etching rate along the depth direction of the shielding film, and is capable of reducing the... Agent: Hoya Corporation
20120129085 - Method for producing a color filter: A color filter including a transparent substrate; a light shielding part formed on the transparent substrate and contains at least a light shielding material and a resin; and a colored layer formed in the opening part of the light shielding part on the transparent substrate to cover a part of... Agent: Dai Nippon Printing Co., Ltd.
20120129086 - Photoconductors containing charge transporting polycarbonates: A photoconductor that includes a supporting substrate, a ground plane layer, a hole blocking layer, an adhesive layer, a photogenerating layer, and at least one charge transport layer of a charge transporting polycarbonate or a mixture of a charge transporting polycarbonate and a second polymer such as a polycarbonate.... Agent: Xerox Corporation
20120129087 - Magnetic carrier for electrophotographic developer and process for producing the same, and two-component system developer: The present invention relates to a magnetic carrier for an electrophotographic developer comprising spherical magnetic composite particles comprising a phenol resin as a binder and ferromagnetic iron oxide particles bonded to each other through the phenol resin, wherein the spherical magnetic composite particles have a ten-point mean roughness Rz of... Agent:
20120129088 - Non-magnetic single component emulsion/aggregation toner composition: A toner composition with a novel surface additive package for developing images. The additive package includes sol-gel silica, a PDMS silica, an organic spacer such as PMMA and HMDS silica. The toner composition exhibits improved control of voltage, higher print density, lower toner amount remaining on the roll, lower toner... Agent: Xerox Corporation
20120129089 - Toner compositions and developers containing such toners: A toner composition with a novel surface additive package for developing images. The additive package includes sol-gel silica, a PDMS silica, an organic spacer such as PMMA and two HMDS silicas. The toner composition exhibits improved control of voltage, higher print density, lower toner amount remaining on the roll, lower... Agent: Xerox Corporation
20120129090 - Heat absorbing additives: The invention relates to a powder composition comprising particles of a) an alkali metal tungsten bronze, b) tungsten oxide, and c) tungsten metal, a method for the preparation of said powder composition, and to the use of said powder composition in form of a dispersion in a polymer material or... Agent: Basf Se
20120129091 - Apparatus for producing toner, method for producing toner, and toner: To provide an apparatus for producing a toner, including: a droplet forming unit configured to periodically discharge a toner composition liquid, which includes at least a resin and a colorant, from a plurality of nozzles so as to form droplets; a gas flow forming unit configured to form a gas... Agent:
20120129092 - Electrically chargeable encapsulated particles: Methods of encapsulating particles (260) in polymer (280, 382, 384) and compositions of matter using such encapsulated particles (260). Methods include mixing particles (260) of one or more materials with one or more initial radical polymerizable monomers (265) and one or more initial charge-generating components (270) to form a first... Agent:
20120129093 - Silicate-free developer compositions: A silicate-free alkaline aqueous developer composition has a pH of at least 12 and comprises a hydroxide alkali agent, a metal cation M2+ selected from barium, calcium, strontium, and zinc cations, a chelating agent for the metal cation, and an alkali metal salt that is different than the other components.... Agent:
20120129094 - Toner: A toner prepared by a method comprising granulating while polymerizing a ring-opening polymerizable monomer with a catalyst under the presence of a surfactant and a colorant in a compressible fluid.... Agent:
20120129096 - Light reactive media: A light reactive medium comprises an imaging layer reactive to radiation of a first frequency to exhibit a visible change, and a further layer above the imaging layer, the further layer being changeable from being substantially transparent to said first frequency to being substantially opaque to said first frequency, in... Agent:
20120129095 - Silicate-free developer compositions: A silicate-free alkaline aqueous developer composition has a pH of at least 12 and comprises a metal cation M2+ selected from barium, calcium, strontium, and zinc cations, and a chelating agent that has a complex formation constant (log K) for the metal cation of at least 3.5 and less than... Agent:
20120129100 - Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same: An actinic ray-sensitive or radiation-sensitive resin composition including: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein... Agent: Fujifilm Corporation
20120129099 - Method for producing pigments:
20120129098 - Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus: A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.... Agent: Asml Netherlands B.v.
20120129097 - Photopolymer printing plates with in situ non-directional floor formed during extrusion: A photocurable relief image printing element is provided. The relief image printing element comprises at least a backing layer and at least one photocurable layer on the backing layer. The photocurable layer comprises at least one binder, at least one ethylenically unsaturated monomer, at least one photoinitiator, and an effective... Agent:
20120129101 - Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom: Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive tone imaging or negative tone imaging. The films formed thereby are useful as self-imageable layers in... Agent: Sumitomo Bakelite Co., Ltd.
20120129104 - Lactone photoacid generators and resins and photoresists comprising same: New lactone-containing photoacid generator compounds (“PAGs”) and photoresist compositions that comprise such PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic devices... Agent: Rohm And Haas Electronic Materials LLC
20120129102 - Photosensitive composition including photopolymerizable polymer having fluorene skeleton: herein each R1 is independently a C1-10 alkyl group or a halogen atom; each L is an integer of 0 to 4; X is an organic group having an unsaturated bond at a terminal thereof; and Y is a linking group including a portion that is obtained by removing an... Agent: Nissan Chemical Industries, Ltd.
20120129105 - Photosensitive copolymer and photoresist composition: wherein R1-R5 are independently H, C1-6 alkyl, or C4-6 aryl, R6 is a fluorinated or non-fluorinated C5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C6-20 aryl group; each R7 and R8 is —OR11 or —C(CF3)2OR11 where each R11 is H, a fluorinated or non-fluorinated C5-30... Agent: Rohm And Haas Electronic Materials LLC
20120129103 - Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method: A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and... Agent:
20120129106 - Positive lift-off resist composition and patterning process: A positive lift-off resist composition is provided comprising (A) an alkali-soluble novolac resin, (B) a quinonediazidosulfonate photosensitive agent, (C) an alkali-soluble cellulose resin, and (D) an aromatic hydroxy compound having a formula weight of 180-800. The composition has shelf stability, high sensitivity, and a film retention after development of at... Agent: Shin-etsu Chemical Co., Ltd.
20120129107 - Method for manufacturing a patterned retarder: The present disclosure relates to a method for manufacturing the patterned retarder used in the three-dimensional display device. The present disclosure suggests a method for manufacturing a patterned retarder comprising: defining a first retarder region and a second retarder region in the patterned retarder; forming a first polarization pattern at... Agent:
20120129108 - Base reactive photoacid generators and photoresists comprising same: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise base-cleavable groups.... Agent: Rohm And Haas Electronic Materials LLC05/17/2012 > 18 patent applications in 13 patent subcategories. archived by USPTO category
20120122021 - Method of forming hologram image, electrostatic image developing toner and hologram image forming apparatus: A method of forming a hologram image comprising the steps of forming an electrophotographic image by forming an electrophotographic image area on an image support via an electrophotographic image forming method using a toner containing at least a thermoplastic resin; laminating an emboss hologram transferring member over the electrophotographic image... Agent: Konica Minolta Business Technologies, Inc.
20120122023 - Method and apparatus for performing model-based opc for pattern decomposed features: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second... Agent: Asml Masktools B.v.
20120122024 - Pellicle for lithography: There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer... Agent: Shin-etsu Chemical Co., Ltd.
20120122025 - Pellicle frame and pellicle containing same: Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In... Agent: Mitsui Chemicals, Inc.
20120122022 - Reflective photomask and method of fabricating the same: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on... Agent:
20120122027 - Toner, production method thereof, developer and image forming method: To provide a toner, containing: a binder resin; a crystalline polyester resin; a colorant; and wax, wherein the toner has a fluidized powder characteristic value of 35% to 45%, and a BET specific surface area of 2.8 m2/g to 4 m2/g, and wherein the toner has an intensity ratio P2850/P828... Agent:
20120122028 - Carrier for developing electrostatic image, developer for electrostatic image, developing device, cartridge, process cartridge, image forming method, and image forming apparatus: wherein R1 represents a hydrogen atom or a methyl group; R2 to R4 each independently represent a hydrogen atom, an alkyl group, an aryl group or an aralkyl group; R5 independently represents an alkyl group, an aryl group or an aralkyl group; n represents an integer of from 0 to... Agent: Fuji Xerox Co., Ltd.
20120122030 - Compositions comprising base-reactive component and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the... Agent: Rohm And Haas Electronic Materials LLC
20120122029 - Underlayer developable coating compositions and processes thereof: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention... Agent:
20120122031 - Photoresist composition for negative development and pattern forming method using thereof: The present invention relates to a photoresist composition capable of negative development and a pattern forming method using the photoresist composition. The photoresist composition includes an imaging polymer and a radiation sensitive acid generator. The imaging polymer includes a first monomeric unit having a pendant acid labile moiety and a... Agent: International Business Machines Corporation
20120122032 - Salt and photoresist composition comprising the same: e
20120122033 - Polymer precursor, high transparency polyimide precursor, polymer compound, resin composition and article using thereof: A polymer precursor including a part which sequences an unsaturated bond having a π electron orbit and a single bond alternately is disclosed. The polymer precursor has a first functional group and a second functional group which form a repeating unit constituting a polymer skeleton of an end product by... Agent: Dai Nippon Printing Co., Ltd.
20120122034 - Resin and photoresist composition comprising the same: wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—,... Agent: Sumitomo Chemical Company, Limited
20120122035 - Patterning method and method for fabricating dual damascene opening: A patterning method and a method for fabricating a dual damascene opening are described, wherein the patterning method includes following steps. An organic layer, a silicon-containing mask layer and a patterned photoresist layer are formed on a material layer in sequence. The silicon-containing mask layer is removed using the patterned... Agent: United Microelectronics Corp.
20120122037 - Method and materials for reverse patterning: A silsesquioxane resin is applied on top of the patterned photo-resist and cured to produce a cured silsesquioxane resin on top of the pattern surface. Subsequently, a reactive ion etch recipe containing CF4 to “etch back” the silicon resin to the top of the photoresist material, exposing the entire top... Agent:
20120122036 - Pattern forming method: A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of... Agent: Jsr Corporation
20120122038 - Developing apparatus: A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one... Agent: Sokudo Co., Ltd.05/10/2012 > 19 patent applications in 16 patent subcategories. archived by USPTO category
20120115075 - Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device: A mask blank for use in the manufacture of a transfer mask adapted to be applied with ArF exposure light is disclosed. The mask blank has a light-shielding film on a transparent substrate. The light-shielding film has an at least two-layer structure comprising a lower layer composed mainly of a... Agent: Hoya Corporation
20120115074 - Methods of forming patterned masks: Some embodiments include methods in which spaced-apart first features are formed from a first material having a reflow temperature. Second material is formed along sidewalls of the first features, and third material is formed over the second material and the first features. The third material may be formed at a... Agent:
20120115073 - Sub-resolution rod in the transition region: The present disclosure provides a photomask. The photomask includes a first integrated circuit (IC) feature formed on a substrate; and a second IC feature formed on the substrate and configured proximate to the first IC feature. The first and second IC features define a dense pattern having a first pattern... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120115076 - Electrophotographic photosensitive member, method for producing the same, process cartridge, and electrophotographic apparatus: A charge generating layer of an electrophotographic photosensitive member contains a charge generating substance, polyvinyl acetal, and a fluorenone derivative.... Agent: Canon Kabushiki Kaisha
20120115077 - Photoconductors containing biaryl polycarbonate charge transport layers: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a biaryl polycarbonate, or a mixture of a biaryl polycarbonate and a... Agent: Xerox Corporation
20120115078 - Magnetic carrier for electrophotographic developer and process for producing the same, and two-component system developer: The present invention relates to a magnetic carrier for an electrophotographic developer comprising spherical composite particles comprising spherical composite core particles comprising at least ferromagnetic iron oxide fine particles and a cured phenol resin and having an average particle diameter of 1 to 100 μm, and a melamine resin coating... Agent:
20120115079 - Toner: A toner containing toner particles, each of which contains a binder resin and a colorant, and silica particles, wherein the silica particles have a volume average particle diameter (Dv) of 70 nm or more and 500 nm or less, the variation coefficient of diameters of the silica particles, based on... Agent: Canon Kabushiki Kaisha
20120115080 - Toner for developing electrostatic image, method for preparing toner for developing electrostatic image, developer for electrostatic image, toner cartridge, process cartridge, image forming method, and image forming apparatus: A toner for developing an electrostatic image, contains a binder resin having an acid value of from approximately 10 mgKOH/g to approximately 20 mgKOH/g and carbon black having a surface carboxyl group density of from approximately 2×10−6 mol/m to approximately 8×10−6 mol/m2, and is prepared in an aqueous medium.... Agent: Fuji Xerox Co., Ltd.
20120115081 - Electrostatic image developing toner, electrostatic image developer, process cartridge, image forming apparatus, and image forming method: An electrostatic image developing toner including: a toner particle containing a binder resin having a polyester resin and a coloring agent; and a non-colored particle containing a polyester but not containing a coloring agent and having a shape factor SF1 of not more than 110, wherein an amount of Sn... Agent: Fuji Xerox Co., Ltd.
20120115082 - Resin and photoresist composition comprising the same: wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—,... Agent: Sumitomo Chemical Company, Limited
20120115083 - Biodegradable film for flexographic printing plate manufacture and method of using the same: The use of biodegradable polymer films in the manufacture of photosensitive relief image printing plates is described, including printing plates produced from liquid photopolymer resins and from sheet polymers as well as direct write/laser engravable printing plates. The biodegradable polymer films can be used as substrate layers, oxygen barrier layers,... Agent:
20120115085 - Positive resist composition and method of pattern formation with the same: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group... Agent: Fujifilm Corporation
20120115086 - Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate: A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization... Agent: Mitsubishi Rayon Co., Ltd.
20120115087 - Method for improving electron-beam: A method for improving the efficiency of the electron-beam exposure is provided, comprising: step 1) coating a positive photoresist on a wafer to be processed, and performing a pre-baking; step 2) separating pattern data, optically exposing a group of relatively large patterns, and then performing a post-baking; step 3) developing... Agent:
20120115088 - Development of printing members having post-anodically treated substrates: Gum solutions are formulated to develop a negative-working photopolymer imaging layer coated on an anodized aluminum substrate that has undergone a post-anodic sealing treatment with inorganic phosphate and inorganic fluoride. The gum solution contains at least one polycarboxylic acid—which may be a polymer—that beneficially desensitizes the surface after the unexposed... Agent: Presstek, Inc.
20120115089 - Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head: A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin... Agent: Canon Kabushiki Kaisha
20120115090 - Substrate treatment method, computer storage medium and substrate treatment apparatus: The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the... Agent:
20120115091 - Developer, process for treating developing solution, process for producing printing plate, and filter apparatus: The present invention provides a developer that can efficiently remove photosensitive resin components dispersing in a developing solution. The present invention provides a developer comprising: a feeder 31 that feeds a developing solution 5 to a printing raw plate 1; a dispersing-object-filter 13, wherein the developing solution 5 in which... Agent: Asahi Kasei E-materials Corporation05/03/2012 > 21 patent applications in 16 patent subcategories. archived by USPTO category
20120107732 - Curable compositions, method of coating a phototool, and coated phototool: A curable composition comprises: an epoxy silane represented by formula X—Si(OR1)(OR2)(OR3) wherein R1-R3 represent C1 to C4 alkyl groups, and X represents an organic group having at least one oxirane ring; a fluorinated silane represented by formula; wherein: Rf represents a perfluoroalkyl group having from 3 to 5 carbon atoms,... Agent:
20120107729 - Gate cd control using local design on both sides of neighboring dummy gate level features: A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having a line width 0.8W1 to 1.3W1. The neighboring dummy feature has a first side... Agent: Texas Instruments Incorporated
20120107731 - Photomask: A photomask includes a transparent substrate for passage of an exposure light, and a plurality of photomask pattern units formed on a surface of the transparent substrate. Each of the photomask pattern units includes a first light-blocking layer connected to the surface of the transparent substrate, and a second light-blocking... Agent:
20120107730 - Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method: A mask includes a main pattern for resolving a target pattern to be formed on a substrate and an auxiliary pattern not resolving. Values of parameters of the main pattern and the auxiliary pattern are set. An image is calculated that is formed when the main pattern and the auxiliary... Agent: Canon Kabushiki Kaisha
20120107733 - Reflective mask blank for euv lithography: m
20120107734 - Methods of forming sheeting with composite images that float and sheeting with composite images that float: Microlens sheetings with different types of composite images are disclosed, in which the composite image floats above, in, or below the sheeting, or some combination. One type of composite image may be viewable to the unaided eye or an observer and another type of composite image is viewable only to... Agent: 3m Innovative Properties Company
20120107735 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member comprises a conductive support, an intermediate layer provided on the conductive support, and a photosensitive layer provided on the intermediate layer, in which at least one of the intermediate layer and the photosensitive layer comprises a compound represented by the following formula (1):... Agent: Canon Kabushiki Kaisha
20120107737 - Toner compositions: Toner particles are provided which may, in embodiments, include a core and a shell formed in situ. The resins utilized to form the core, the shell, or both, may be contacted with a water soluble initiator. The resin, in embodiments present in the shell, cross-links at a temperature near the... Agent: Xerox Corporation
20120107736 - Process for preparing polymerized toner: The present invention relates to a process for preparing a polymerized toner, and in particular to a process for preparing a polymerized toner and a polymerized toner prepared therefrom, wherein a certain block copolymer and copper phthalocyanine are used within a predetermined range of the amounts for a carbon black... Agent: Lg Chem, Ltd
20120107738 - Taggent flakes for covert security applications having a selected shape: A plurality of flakes are provided that can be used in ink or paint wherein the flakes are of a size that requires magnification to see their shape. The flakes are in the form of regular polygons, such as squares, triangle or rectangles. A breaking or grinding process is used... Agent: Jds Uniphase Corporation
20120107739 - Electrostatic latent image developer, image forming apparatus, process cartridge and image forming method: The present invention provides an electrostatic latent image developer used in an image forming apparatus including: an image holding member; a charging unit; a latent image forming unit; a developing unit which stores the electrostatic latent image developer and includes a developer holding member, wherein the developing unit develops the... Agent: Fuji Xerox Co., Ltd.
20120107740 - Magnetic toner compositions: The present disclosure relates to a process for preparing a polyester based magnetic toner composition. The toner composition includes one or more polyester amorphous binder resins, optionally a cystalline polyester resin, and spherical ferromagnetic particles. In embodiments, the toner is prepared from ferromagentic particles that have been previously encapsulated in... Agent: Xerox Corporation
20120107741 - Electrostatic charge image developing toner and method of manufacturing the same: Provided is a method of manufacturing toner by which the toner capable of forming high quality images and reproducing high density gradation, which exhibits an excellent high-temperature offsetting property together with excellent low-temperature fixability, and provides appropriate gloss with respect to images to be formed, can be stably prepared; and... Agent: Konica Minolta Business Technologies, Inc.
20120107742 - Method and photoresist with zipper mechanism: The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first zipper portion and a second zipper portion, wherein the first and second zipper portions each include a plurality of zipper branches bonded... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120107743 - Lithography using photoresist with photoinitiator and photoinhibitor: Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a photoinitiator and a photoinhibitor. The photoinitiator may be effective to generate a first reactant upon the absorption of at... Agent: Empire Technology Development LLC
20120107744 - Resist composition, method of forming resist pattern, novel compound and acid generator: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120107745 - Via structure in multi-layer substrate and manufacturing method thereof: Disclosed is a via structure in a multi-layer substrate, comprising a first metal layer, a dielectric layer and a second metal layer. The first metal layer has an upper surface. The dielectric layer covers the first metal layer in which a via is opened to expose the upper surface. The... Agent: Princo Corp.
20120107746 - Method for manufacturing inkjet recording head: A method for manufacturing an inkjet recording includes forming a photo-cationic polymerizable resin layer containing a photo-cationic polymerizable resin material on a substrate; performing pattern exposure of the photo-cationic polymerizable resin layer to form a latent image of a fine pattern including an ejection port; forming a water repellent layer... Agent: Canon Kabushiki Kaisha
20120107747 - Method of lithography: A lithography method of manufacturing integrated circuits is disclosed. A photoalignment layer is formed on a substrate. A treatment is performed to reorganize and align the photoalignment molecules. A photoresist layer may be formed on the photoalignment layer in a bi-layer separate coating or with the photoalignment layer in a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120107748 - Drawing apparatus and method of manufacturing article: A drawing apparatus, that performs drawing on a substrate using an array of charged particle beams, includes a projection system and a controller. The projection system is configured such that the array includes a plurality of sub arrays arranged discretely on the substrate with a space between the sub arrays... Agent: Canon Kabushiki Kaisha
20120107749 - Resist pattern forming method and developer: There are provided a method of forming a resist pattern, comprising the steps of forming a resist film containing a specific calixarene derivative on a substrate; forming a pattern latent image by selectively exposing the resist film to a high-energy beam; and developing the latent image by removing parts not... Agent: Tokuyama CorporationPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
RSS FEED for 20130516:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.
FreshPatents.com Support - Terms & Conditions
Results in 0.7158 seconds