|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof March listing by industry category 03/12Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 03/29/2012 > 19 patent applications in 12 patent subcategories. listing by industry category
20120077114 - Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process: A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: segmenting a plurality of the features into a plurality of polygons; determining the image log slope... Agent: Asml Masktools B.v.
20120077115 - Liquid crystal display device treated by uv irradiation: A liquid crystal display device includes a pair of substrates, a liquid crystal between substrates and alignment layers disposed on the inner surface sides of the substrates. The alignment layer is made from a material including polyamic acid containing a diamine component and polyimide containing a diamine component different from... Agent: Sharp Kabushiki Kaisha
20120077116 - Electrophotographic photoreceptor and image forming apparatus: l
20120077119 - Orange toner and toner cartridge for storing the same, orange developer and process cartridge for storing the same, color toner set, and image forming apparatus: An orange toner including a binder resin containing a polyester resin having a dodecenyl succinic acid structure as a constituent unit; and C.I. Pigment Orange 38 in a blending amount of from 5% by mass to 18% by mass relative to the whole mass of the toner and a toner... Agent: Fuji Xerox Co., Ltd.
20120077118 - Toner for electrostatic image development, developer for electrostatic image development, developer cartridge, process cartridge, image-forming apparatus, and image-forming method: A toner for electrostatic image development including: a toner particle containing a polyester resin and a coloring agent; and an uncolored particle containing a polyester resin and not containing a coloring agent, wherein shape factor SF1 of the uncolored particles is 110 or less, and the number of the uncolored... Agent: Fuji Xerox Co., Ltd.
20120077121 - Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process: Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any... Agent:
20120077122 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by... Agent: Fujifilm Corporation
20120077120 - Photoresists comprising multi-amide component: New photoresist compositions are provided that comprise a component that comprises two or more amide groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a multi-amide component that can function to decrease undesired photogenrated-acid diffusion out of unexposed regions of a... Agent: Rohm And Haas Electronic Materials LLC
20120077123 - Organic pigments for colour filters: w
20120077125 - Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120077124 - Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device: A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1).... Agent: Jsr Corporation
20120077127 - Methods of forming patterns: Some embodiments include methods of forming patterns in which a block copolymer-containing composition is formed over a substrate, and is then patterned to form a first mask. The block copolymer of the composition is subsequently induced into forming a repeating pattern within the first mask. Portions of the repeating pattern... Agent: Micron Technology, Inc.
20120077128 - Substrate edge treatment for coater/developer: A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image... Agent:
20120077129 - Production method of optical waveguide for connector: A production method of an optical waveguide for a connector is provided, which reduces an optical coupling loss. Cores are formed in a crossing pattern, a branched pattern or a linear pattern, and then an over-cladding layer formation photosensitive resin layer is formed over the cores. In turn, a heat... Agent: Nitto Denko Corporation
20120077130 - Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process: A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification is to reduce the full problem to an unconstrained formulation. The full problem of minimizing dark region intensity... Agent: International Business Machines Corporation
20120077131 - Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern: According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the... Agent: Fujifilm Corporation
20120077132 - Processess and compositions for removing substances from substrates: Processes associated apparatus and compositions useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added... Agent: Eastman Chemical Company03/22/2012 > 21 patent applications in 18 patent subcategories. listing by industry category
20120070768 - Reticles with subdivided blocking regions and methods of fabrication: Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may include forming radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart... Agent: Micron Technology, Inc.
20120070767 - Set of masks, method of generating mask data and method for forming a pattern: A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging... Agent: Kabushiki Kaisha Toshiba
20120070769 - Intermediate transfer member: There is disclosed an intermediate transfer member that includes a layer of a poly(imide-carbonate) copolymer having dispersed therein conductive particles. The layer can be a surface layer.... Agent: Xerox Corporation
20120070770 - Magnetic toner compositions: The present disclosure relates to a magnetic toner composition. The toner composition includes one or more resins, and spherical ferromagnetic nanoparticles. Also provided is a process for preparing these toners including ferromagnetic nanoparticles. In embodiments, the aggregation of the toner is conducted at a pH greater than about 7, without... Agent: Xerox Corporation
20120070773 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming apparatus and image forming method: The present invention provides a toner for developing an electrostatic charge image including toner particles having residual ammonium ions and silica particles containing a chlorine compound as an external additive.... Agent: Fuji Xerox Co., Ltd.
20120070771 - Electrophotographic toner: Disclosed is an electrophotographic toner, comprising: toner base particles having a volume average particle diameter of 3 μm or more and 7 μm or less; OTES-treated silica particles which are treated with octyltriethoxysilane (OTES) and are externally added to the toner base particles; and silica-coated titanium oxide particles which are... Agent: Toshiba Tec Kabushiki Kaisha
20120070772 - Electrostatic image developing toner, method for manufacturing electrostatic image developing toner, developer, and image forming method: An electrostatic image developing toner including: a toner matrix particle having an adhering particle adhered onto the surface of a central particle, wherein a volume average value of a ratio X of a peripheral length PM to a circle-corresponding diameter D is from 3.6 to 5.0.... Agent: Fuji Xerox Co., Ltd.
20120070774 - Method of manufacturing toner and toner manufactured by the method: A method of manufacturing toner including mixing mother toner particles containing a binder resin and a coloring agent and first particles having an average primary particle diameter of from 100 nm to 1 μm to using a mixer including a rotary shaft member, multiple stirring members provided to the surface... Agent:
20120070775 - Toner, two-component developer, developing device and image forming apparatus: A toner capable of ensuring cleanness and the amount of specific charge for extended periods of time and having excellent charge stability and fixing property, a two-component developer, a developing device and an image forming apparatus are provided. A toner includes toner particles containing at least a binding resin and... Agent: Sharp Kabushiki Kaisha
20120070776 - Emulsion aggregation toners having flow aids: The present disclosure provides processes for producing toners. In embodiments, flow aids are added to a wet cake including the toner particles, prior to drying. The addition of the flow aid improves flow characteristics of the toner, thereby enhancing overall drying time, reducing the amount of coarse particles, and improving... Agent: Xerox Corporation
20120070777 - Method and apparatus for producing toner: An apparatus for producing a toner, including a liquid droplet-forming unit configured to discharge a toner composition liquid containing at least a resin and a colorant at a uniform discharge speed from a plurality of discharge holes some of which have different shapes from each other to thereby form liquid... Agent:
20120070778 - Resin, resist composition and method for producing resist pattern: A resin having a structural unit derived from a compound represented by the following formula (I), wherein R1, A1 and ring X1 are as defined in the instant specification:... Agent: Sumitomo Chemical Company, Limited
20120070779 - Lithographic printing plate precursor: r
20120070780 - Photosensitive resin composition, dry film solder resist, and circuit board: The present invention relates to a photosensitive resin composition including an acid modified oligomer, a photopolymerizable monomer, a thermosetting binder resin, a photoinitiator, and a thioxanthone compound, a dry film solder resist obtained from the resin composition, and a circuit board including the dry film solder resist.... Agent: Lg Chem, Ltd.
20120070781 - Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same: An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into... Agent: Dai Nippon Printing Co., Ltd.
20120070782 - Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a... Agent: International Business Machines Corporation
20120070783 - Radiation-sensitive resin composition, polymer, and method for forming resist pattern: A radiation sensitive resin composition capable of forming a photoresist film which has excellent basic resist performances concerning sensitivity, LWR, development defects, etc., gives a satisfactory pattern shape, has an excellent depth of focus, is reduced in the amount of components dissolving in a liquid for immersion exposure which is... Agent: Jsr Corporation
20120070784 - System, method and apparatus for fabricating a c-aperture or e-antenna plasmonic near field source for thermal assisted recording applications: A method of fabricating a c-aperture or E-antenna plasmonic near field source for thermal assisted recording applications in hard disk drives is disclosed. A c-aperture or E-antenna is built for recording head applications. The technique employs e-beam lithography, partial reactive ion etching and metal refill to build the c-apertures. This... Agent: Hitachi Global Storage Technologies Netherlands B.v.
20120070785 - Method of manufacturing micro lens array: A method of manufacturing a micro lens array, wherein the quality of an image is prevented from being deteriorated as a beam on an off-axis surface reaches a focal plane of a micro lens by forming a shading film for preventing the beam from penetrating through a space between micro... Agent:
20120070786 - Method for monitoring photolithography process and monitor mark: A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with the product patterns through the photolithography process onto a substrate, and measuring the deviation dimension of the monitor mark formed on the... Agent:
20120070787 - Photoresist compositions and methods for shrinking a photoresist critical dimension: A method for reducing a photoresist critical dimension, the method comprising depositing a photoresist film on a substrate, wherein the photoresist film includes a thermal base generator; patterning the photoresist film to form a first patterned film possessing a first critical dimension; depositing a crosslinkable film over the first patterned... Agent: International Business Machines Corporation03/15/2012 > 27 patent applications in 18 patent subcategories. listing by industry category
20120064440 - Method for design and manufacture of diagonal patterns with variable shaped beam lithography: In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage information such as dosage maps for a plurality of shots into the... Agent: D2s, Inc.
20120064441 - Method for photo-alignment treatment, mask for photo-alignment treatment, and method for producing alignment film: A method for photo-alignment treatment in which at least the number of kinds of photo masks or the number of exposure that are necessary for domain division can be reduced. The method for forming domains 8A, 8B, which are sectioned with respect to alignment regulation directions 11A, 11B, on a... Agent:
20120064439 - Optical compensation devices, systems, and methods: Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first... Agent:
20120064438 - Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film: A photomask blank has a film of a transition metal/silicon base material comprising a transition metal, silicon, oxygen and nitrogen, having an oxygen content of at least 3 atom %, and satisfying the formula: 4×CSi/100−6×CM/100>1 wherein CSi is a silicon content in atom % and CM is a transition metal... Agent:
20120064443 - Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, and process cartridge for electrophotographic image forming apparatus: p
20120064442 - Electrophotographic photoreceptor, method for producing electrophotographic photoreceptor, image forming apparatus, and process cartridge: An electrophotographic photoreceptor is provided, which includes: a substrate; a photosensitive layer; and a surface protective layer, in this order, in which the protective layer contains a crosslinked product of a curable charge transporting material in a content of from about 90 to 98% by weight, and fluorinated resin particles... Agent: Fuji Xerox Co., Ltd.
20120064444 - Image bearing member:
20120064446 - Image forming apparatus:
20120064445 - Image forming apparatus and toner for developing latent electrostatic images: A toner which contains: toner base particles having Dv of 4.0-6.0 μm; and two or more additives on surfaces of the toner base particles, where the additives contains Additives A and B, wherein the toner base particles are obtained by the method containing: dispersing, in an aqueous medium, an oil... Agent:
20120064447 - Toner, developer, image forming method and image forming apparatus: t
20120064448 - Magnetic composite particles, magnetic carrier and developer: The present invention relates to magnetic composite particles comprising at least magnetic fine particles and a bio-based polymer, wherein the magnetic composite particles have an average particle diameter of 10 to 100 μm, and a content of the magnetic fine particles in the magnetic composite particles is 50 to 99.9%... Agent:
20120064449 - Black magnetic iron oxide particles: The present invention relates to black magnetic iron oxide particles comprising magnetite as a main component, wherein when the black magnetic iron oxide particles are molded into a tablet shape, an electric resistance value of the tablet in an alternating current electric field is controlled to produce an impedance of... Agent:
20120064450 - Toner for developing electrostatic latent image and method of preparing the same: A toner includes a binder including two different weight molecular weight resins, a colorant, and a releasing agent, wherein a gel permeation chromatogram (GPC) molecular weight distribution curve of the toner has a major peak (Mp) present in a range of about 1.0×104 to about 3.0×104 g/mol and a shoulder... Agent: Samsung Electronics Co., Ltd.
20120064451 - Carrier for developing electrostatic latent image, and two-component developer, supplemental developer, image forming apparatus, process cartridge, and image forming method using the carrier: A carrier comprising a magnetic core particle having a shape factor SF-2 of 130 to 160 and a resin layer covering a surface of the magnetic core particle. The resin layer comprises a conductive particle and a resin obtained by heating a copolymer comprising a silicon-containing A unit and another... Agent:
20120064452 - Carrier for developing electrostatic charge image, developer for developing electrostatic charge image, developer cartridge for developing electrostatic charge image, process cartridge, image forming apparatus, and image forming method: A carrier for developing an electrostatic charge image comprising a core material and a coating resin layer that covers the core material,wherein the core material is a ferrite particle having a Brunauer-Emmitt-Teller (BET) specific surface area of from about 0.12 m2/g to about 0.20 m2/g, and having a fluidity of... Agent: Fuji Xerox Co., Ltd.
20120064453 - Processes for producing polyester latexes with improved hydrolytic stability: A process for making a latex emulsion suitable for use in a toner composition includes contacting at least one crystalline polyester resin with an organic solvent and a stabilizing agent to form a resin mixture, adding a neutralizing agent, and deionized water to the resin mixture, removing the solvent from... Agent: Xerox Corporation
20120064454 - Producing method of toner for developing static image: p
20120064457 - Functionalized perfluoropolyether material as a hydrophobic coating: In some embodiments, without limitation, a hydrophobic photoresist material and a method of making the photoresist material are provided. The photoresist material is derived by creating a high resolution insoluble, or more soluble, polymer structure as a result of a controlled chemical reaction with a functionalized perfluoropolyether. Also provided are... Agent:
20120064455 - Photoresist composition and method of forming pattern using the same: A photoresist composition and method of forming a pattern using the same are provided. The photoresist composition includes a 60 to 90 wt % novolac resin, a diazide compound, an organic solvent, and an anticorrosive agent.... Agent: Samsung Techwin Co., Ltd.
20120064456 - Photoresist compositions and methods of forming photolithographic patterns: Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor... Agent: Rohm And Haas Electronic Materials LLC
20120064458 - Optical waveguides and methods thereof: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods... Agent: Sumitomo Bakelite Company Limited
20120064459 - Water repellent additive for immersion resist: b
20120064461 - Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method: On a +X side of a first air floating unit which supports a substrate subject to carry-out, a second air floating unit which supports a substrate subject to carry-in is placed, and a third air floating unit is placed tilted in a θy direction below the second air floating unit.... Agent: Nikon Corporation
20120064460 - Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method: By a substrate support member moving in predetermined strokes in a scanning direction on a Y step surface plate, a substrate held by the substrate support member moves in the scanning direction in predetermined strokes in a state supported from below by an air floating device. Further, because a Y... Agent: Nikon Corporation
20120064462 - By-product mitigation in through-silicon-via plating: Methods, systems, and apparatus for plating a metal onto a work piece with a plating solution having a low oxygen concentration are described. In one aspect, a method includes reducing an oxygen concentration of a plating solution. The plating solution includes about 10 parts per million or less of an... Agent:
20120064463 - Method of forming micropatterns: Provided is a method of forming micropatterns, in which a line-and-space pattern is formed using a positive photoresist, and a spin-on-oxide (SOX) spacer is formed on two sidewalls of the line-and-space pattern and used in etching a lower layer, thereby doubling a pattern density. Accordingly, all operations may be performed... Agent:
20120064464 - Radiographic silver halide films having incorporated developer: Radiographic silver halide materials coated onto a support contain a portion of the developer chemistry incorporated within the radiographic film. The remainder of the developer chemistry is contained in a developer solution. Use of a reflective support permits the developed materials to be viewed without a light box.... Agent:03/08/2012 > 19 patent applications in 13 patent subcategories. listing by industry category
20120058418 - Three-dimensional holographic display device: A three-dimensional holographic display device includes a holographic display medium constituted by a photorefractive organic composition, and an optical system for recording and reproducing a holographic image using the holographic display medium. The photorefractive organic composition includes a photorefractive organic polymer having a tri-alkyl amino side-chain group.... Agent: Nitto Denko Corporation
20120058420 - Mask for forming patterns of semiconductor device: A mask for forming patterns of a semiconductor device is provided. The mask includes first and second main patterns disposed to be spaced apart from each other about a cross point and extending in first and second directions different from each other, a third main pattern disposed spaced apart from... Agent: Samsung Electronics Co., Ltd.
20120058421 - Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit: A phase shift mask is provided which includes: a substrate that is transparent to irradiation light, a shielding region formed on the substrate and in which a line pattern is formed, and a first transparent region and a second transparent region located on respective opposite sides of the shielding region... Agent: Elpida Memory, Inc.
20120058419 - Titania-doped quartz glass and making method: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on... Agent: Shin-etsu Chemical Co., Ltd.
20120058422 - Photoreceptor for electrophotography, process for producing the same, and electrophotographic apparatus: Provided is a photoreceptor for electrophotography, a process for producing the photoreceptor, and an electrophotographic apparatus that includes the photoreceptor. The photoreceptor has a photosensitive layer which contains a resin binder that is a copolymerized polyallylate resin. An electrophotographic apparatus having a photoreceptor drum that includes this photoreceptor has a... Agent: Fuji Electric Co., Ltd
20120058423 - Contact developing method, image forming apparatus, and process cartridge: A contact developing method including supplying a two-component developer to an electrostatic latent image on a rotating image bearing member by rotating a developing sleeve and a rotatable magnet having multiple magnetic poles provided inside the developing sleeve, to develop the electrostatic latent image into a toner image. The developing... Agent:
20120058424 - Electrostatic charge developing toner, electrostatic charge developing developer, and image forming apparatus: To provide an electrostatic charge developing toner in which resin fine particles and inorganic fine particles are externally added to toner base particles, wherein the toner base particles include at least binder resin and colorant, the resin fine particles are monodispersed and fixed to surfaces of the toner base particles,... Agent: Kyocera Mita Corporation
20120058425 - Toner, premix agent, and agent container: A toner including a release promoter and a binder resin containing crystalline polyester resin and non-crystalline polyester resin, wherein W/R is 0.045 to 0.850 where W denotes height of third bottom peak in infrared absorption spectrum of crystalline polyester resin and R denotes height of maximum top peak in infrared... Agent:
20120058426 - Marking agent concentration methods, marking agents, and hard imaging methods: A marking agent concentration method includes concentrating the marking agent by removing at least some liquid carrier between particles without substantially removing retained liquid carrier within the particles and without substantially modifying the particle structure, which is supported by the retained liquid carrier. The concentrated marking agent is supplied to... Agent:
20120058427 - Pattern forming method, chemical amplification resist composition and resist film: A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an organic solvent, wherein the chemical amplification resist composition contains: (A) a resin... Agent: Fujifilm Corporation
20120058428 - Patterning process and resist composition: A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator having both a 9-fluorenylmethyloxycarbonyl-substituted amino group and a carboxyl group onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first... Agent: Shin-etsu Chemical Co., Ltd.
20120058429 - Radiation-sensitive resin composition and polymer: R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms.... Agent: Jsr Corporation
20120058431 - Positive photosensitive composition and method of forming pattern using the same: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group,... Agent: Fujifilm Corporation
20120058430 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula... Agent: Tokyo Ohka Kogyo Co., Ltd.
20120058432 - Methods of forming semiconductor devices using photolithographic shot grouping: A method of forming a semiconductor device can include determining a shot set including a plurality of shots, based on a final pattern used to form a mask. Shots included in the plurality shots can be classified as being in a first pass shot set or in a second pass... Agent: Samsung Electronics Co., Ltd.
20120058433 - Process for producing ink jet head: A process for producing an ink jet head, including forming an ink flow path pattern whose surface has been subjected to insolubilization treatment on a substrate having an energy-generating element, applying a UV curable flow path forming material on the pattern and substrate to form an ink flow path forming... Agent: Canon Kabushiki Kaisha
20120058434 - Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate: A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem comprises one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to... Agent: Asml Netherlands B.v.
20120058435 - Pattern formation method: According to one embodiment, a pattern formation method contains: forming first guides by changing a surface energy of an underlayer material by transferring a pattern of a photomask onto the underlayer material by exposure, and forming second guides by changing the surface energy of the underlayer material between the first... Agent:
20120058436 - Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D)... Agent: Fujifilm Corporation03/01/2012 > 35 patent applications in 20 patent subcategories. listing by industry category
20120052415 - Stamps with micrometer-and nanometer-scale features and methods of fabrication thereof: Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions and features. High throughput manufacturing and high resolution methods are used to make the stamps including electron beam lithography and optical lithography. Anti-fouling coatings... Agent: Nanoink, Inc.
20120052417 - Circuit apparatus having a rounded trace: In various embodiments of the present invention a circuit apparatus having a rounded trace, a method to manufacture the circuit apparatus, and a design structure used in the design, testing, or manufacturing of the circuit apparatus are described. An artwork layer having an adaptable-mask section allows a graded amount of... Agent: International Business Machines Corporation
20120052420 - Half tone mask having multi-half permeation part and a method of manufacturing the same: A half tone mask having a multi semi-transmission part and a manufacturing method thereof that can pattern a plurality of layers using one mask, by having at least two or more semi-transmission parts with light transmission that are different from each other, are provided. The half tone mask having a... Agent: Lg Innotek Co., Ltd.
20120052418 - Method for optimizing source and mask to control line width roughness and image log slope: A method for illuminating a mask with a source to project a desired image pattern through a lithographic system onto a photoactive material including: defining a representation of the mask; obtaining a fractional resist shot noise (FRSN) parameter; determining a first relationship between a first set of optical intensity values... Agent: International Business Machines Corporation
20120052419 - Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method: The photomask has four annularly arranged main features based on design information of a circuit feature to be formed on a wafer, and a sub-feature is laid at an intersection point of two diagonal lines of a quadrangle formed by four vertices inside the four main features in order to... Agent: Renesas Electronics Corporation
20120052416 - Reticles, and methods of mitigating asymmetric lens heating in photolithography: A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. The reticle is then fabricated to include non-printing features within a... Agent:
20120052421 - Manufacturing method of polymer film with photonic crystal structure: A manufacturing method of a polymer film with the photonic crystal structure includes a mixing step for at least mixing an achiral liquid crystal (LC), a chiral dopant, a monomer and a photo initiator together to form an LC-monomer mixture, at least one exposure step for exposing the LC-monomer mixture... Agent:
20120052422 - Mask-shift-aware rc extraction for double patterning design: A method includes providing a layout of an integrated circuit design, and generating a plurality of double patterning decompositions from the layout, with each of the plurality of double patterning decompositions including patterns separated to a first mask and a second mask of a double patterning mask set. A maximum... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20120052424 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using same: A photoreceptor including an electroconductive substrate; a photosensitive layer located overlying the electroconductive substrate; and a crosslinked outermost layer located overlying the photosensitive layer and including a crosslinked material and a specific carbazole compound serving as a charge transport material. An image forming apparatus including the photoreceptor; a charger to... Agent: Ricoh Company, Ltd.
20120052423 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: The present invention is an electrophotographic photosensitive member including a conductive support, an intermediate layer which is placed on the conductive support, and a photosensitive layer which is placed on the intermediate layer, wherein the intermediate layer comprises a metal-oxide particle and a compound having a structure represented by the... Agent: Canon Kabushiki Kaisha
20120052425 - Multilayer electrophotographic photoconductor and image-forming apparatus: An electrophotographic photoconductor includes an electrically conductive base and a photosensitive layer disposed on the electrically conductive base. The photosensitive layer has a structure 1) in which a charge-generation layer including at least a charge-generating material and a charge-transport layer including at least a charge-transporting material and a binder resin... Agent: Kyocera Mita Corporation
20120052427 - Indole derivatives: wherein R1 and R2 are alkyl groups, k is an integer of 0 to 3, j is an integer of 0 to 4, a ring Z is a 5- to 6-membered ring and is, specifically, a cyclopentane ring, and X1 and X2 are hydrocarbon groups having at least one ethylenically... Agent: Hodogaya Chemical Co., Ltd.
20120052426 - Poly(imide-carbonate) polytetrafluoroethylene containing photoconductors: A photoconductor that includes for example, a supporting substrate, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, and a charge transport layer, and where the charge transport layer contains a charge transport component, and a mixture of a poly(imide-carbonate) polymer and... Agent: Xerox Corporation
20120052428 - Pentanediol ester containing photoconductors: A photoconductor that includes, for example, a supporting substrate, an undercoat layer thereover that contains a metal oxide, a phenolic resin, and a pentanediol ester; a photogenerating layer; and at least one charge transport layer.... Agent: Xerox Corporation
20120052432 - Developer, development device, image forming device and method of forming developer: A negatively chargeable developer includes: negatively chargeable toner mother particles including at least binding resin and colorant; and an external additive that is externally added to a surface of the toner mother particles, wherein the external additive includes polymethyl methacrylate that is within a range from approximately 0.4 parts by... Agent: Oki Data Corporation
20120052430 - Electrostatic image developing toner, electrostatic image developer, image forming method, toner cartridge, process cartridge, and image forming apparatus: An electrostatic image developing toner includes a core particle containing a binder resin and a coating layer on the core particle. The coating layer contains a resin having a crosslinked structure formed by using at least one of boric acid and derivatives thereof, and the resin having the crosslinked structure... Agent: Fuji Xerox Co., Ltd.
20120052431 - Toner for developing latent electrostatic images, developer, developer container housing developer therein, process cartridge, image forming apparatus and image forming method: To provide a toner, containing: a crystalline polyester resin; and a non-crystalline polyester resin, wherein the crystalline polyester resin has a melting point of 60° C. to 80° C., and wherein the toner satisfies the relationship represented by the following formula: (W1−W1′)/W1<0.50, where W1 is a temperature width at a... Agent:
20120052429 - Toner processes: Toners are provided which may be suitable for use in cold fusing pressure apparatus. The toners include low molecular weight amorphous resins and wax. The wax content is specific to optimize performance of toners used in a cold fusing pressure apparatus.... Agent: Xerox Corporation
20120052433 - Toner compositions and processes: Toners are provided, which possess low melt properties capable of producing a low gloss finish. The toners include a core and a shell. The shell includes a crystalline resin. The core may include at least one amorphous resin, an optional crystalline resin, an optional wax, and an optional colorant.... Agent: Xerox Corporation
20120052434 - Toner and developer: n
20120052435 - Tin-zinc complex oxide powder, method for producing the same, electrophotographic carrier, and electrophotographic developer: A tin-zinc complex oxide powder includes particles containing a tin-zinc complex oxide and having a volume resistivity of about 1×105 Ω·cm or less.... Agent: Fuji Xerox Co., Ltd.
20120052436 - Direct digital marking systems: Various embodiments provide systems and methods for direct digital marking, wherein an electrostatic latent image or a surface charge contrast can be formed and developed at a development nip formed by a nano-enabled imaging member and a negatively-biased development subsystem.... Agent: Xerox Corporation
20120052437 - High resolution, solvent resistant, thin elastomeric printing plates: The present invention relates to a printing element having at least one polymer layer which has photoimageable constituents and a chemically functionalized polymer to make the polymer layer either more hydrophobic or hydrophilic. In one embodiment, the printing element comprises two adjacent polymer layers on a substrate in which the... Agent: E.i. Du Pont De Nemours And Company
20120052441 - Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process: An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a... Agent:
20120052439 - Photo-curing polysiloxane composition and protective film formed from the same: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500... Agent: Chi Mei Corporation
20120052438 - Photoresist composition and method of forming pattern using the same: A photoresist composition and method of forming pattern using the same are provided. The photoresist composition contains an alkali-soluble novolac resin, a photosensitizer including a compound of Chemical Formula 1, and a solvent.... Agent:
20120052440 - Salt and photoresist composition comprising the same: wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36... Agent: Sumitomo Chemical Company, Limited
20120052442 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of forming an image by removing an unexposed area with at least one of printing ink and dampening water on a printing machine after exposure and contains (A) an infrared absorbing dye,... Agent:
20120052443 - Resist composition and method for producing resist pattern: wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or... Agent: Sumitomo Chemical Company, Limited
20120052444 - Polymerizable composition, and lithographic printing plate precursor, antifouling member and antifogging member each using the same: and in the formula (a1-1), R11 and R12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, a sulfo group, an alkylsulfonyl group, a arylsulfonyl group, an acyl group, an aryloxycarbonyl group, an alkoxycarbonyl group or a carbamoyl group, R13, R14 and R15 each... Agent:
20120052445 - Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate: The invention provides an infrared-sensitive positive-working image forming material which provides excellent development latitude, image formability and image region strength, and in which decrease in development property is prevented even when a certain time has passed after pattern exposure until development treatment; an infrared-sensitive positive-working planographic printing plate precursor which... Agent: Fujifilm Corporation
20120052446 - High resolution, solvent resistant, thin elastomeric printing plates: The present invention relates to a printing element comprising at least one polymer layer on a substrate which has photoimagable constituents and a chemically functionalized polymer to make the polymer layer either more hydrophobic or hydrophilic. In one embodiment of the present invention, the printing element comprises two adjacent polymer... Agent: E. I. Du Pont De Nemours And Company
20120052448 - Determination method, exposure method and storage medium: The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cut line used to evaluate an image of a pattern of a mask,... Agent: Canon Kabushiki Kaisha
20120052447 - Lithographic apparatus and device manufacturing method: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to... Agent: Asml Netherlands B.v.
20120052449 - Method of forming pattern: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm... Agent: Fujifilm CorporationPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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