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Radiation imagery chemistry: process, composition, or product thereof February patent applications/inventions, industry category 02/12

20120045712 - Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120045714 - Pellicle for lithography and manufacturing method thereof: A pellicle for lithography according to the present invention comprises a pellicle film (10) of single crystal silicon, and the pellicle film (10) is supported by a support member (20) including an outer frame portion (20a) and a porous portion (mesh structure) (20b) that occupies an inner area surrounded by... Agent: Shin-etsu Chemical Co., Ltd.

20120045713 - Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same: A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and... Agent: Hoya Corporation

20120045715 - Slippery and conductivity enhanced anticurl back coating: The presently disclosed embodiments relate generally to the formulation of an anticurl back coating layer that renders imaging apparatus flexible members and components their desirable flatness, for use in electrostatographic, including digital apparatuses. More particularly, the embodiments pertain to an imaging member comprising an anticurl back coating layer formulated to... Agent: Xerox Corporation

20120045716 - Developing agent and image forming apparatus: According to one embodiment, a developing agent includes a toner particle containing a binder resin and a coloring agent, and additives added onto the surface of the toner particle. The additives contain a silica fine particle having an average circularity of 0.90 or more. In the additives existing on the... Agent: Kabushiki Kaisha Toshiba

20120045717 - Toner: A magnetic toner is provided that exhibits an excellent dot reproducibility and developing performance after being allowed to stand in a high temperature and high humidity environment and an excellent low-temperature fixability. The magnetic toner has an inorganic fine powder and a magnetic toner particle containing a binder resin, a... Agent: Canon Kabushiki Kaisha

20120045718 - Cyan toner for developing electrostatic image: m

20120045719 - Radiation-sensitive resin composition and compound: wherein Z− represents a monovalent anion shown by a general formula (2), M+ represents a monovalent onium cation, R1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12... Agent: Jsr Corporation

20120045720 - Developers and method of coloring lithographic printing members: A color contrast image in imaged lithographic printing precursors can be obtained by contacting the imaged precursor with a coloration solution containing a colorless form of a photochromic compound. Residual amounts of this compound attached to the oleophilic surface of the imaged precursor can be changed to its colored form... Agent:

20120045721 - Method for forming a self-aligned double pattern: The invention can provide a method of processing a substrate using Double-Patterned-Shadow (D-P-S) processing sequences that can include (D-P-S) creation procedures, (D-P-S) evaluation procedures, and (D-P-S) transfer sequences. The (D-P-S) creation procedures can include deposition procedures, activation procedures, de-protecting procedures, sidewall angle (SWA) correction procedure, and Double Patterned (DP) developing... Agent: Tokyo Electron Limited

20120045724 - Sulfonium salt, resist composition, and patterning process: A sulfonium salt of a naphthylsulfonium cation having a hydrophilic phenolic hydroxyl group or ethylene glycol chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the... Agent:

20120045722 - Technique to form a self-aligned double pattern: The invention can provide a method of processing a substrate using Double-Patterned-Shadow (D-P-S) processing sequences that can include (D-P-S) creation procedures, (D-P-S) evaluation procedures, and (D-P-S) transfer sequences. The (D-P-S) creation procedures can include deposition procedures, activation procedures, de-protecting procedures, sidewall angle (SWA) correction procedure, and Double Patterned (DP) developing... Agent:

20120045723 - Vibration isolation device, exposure apparatus, and device manufacturing method using same: The vibration isolation device of the present invention includes a first position feedback control system including a reference body system that is fixed to an object to be isolated from vibration and includes a reference body; a first driving unit that drives the object with respect to a base; and... Agent: Canon Kabushiki Kaisha

20120040277 - Damascene reticle and method of manufacture thereof: A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plate and internal edges... Agent: International Business Machines Corporation

20120040278 - Intensity selective exposure photomask: An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20120040276 - Method of forming and using photolithography mask having a scattering bar structure: A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially perpendicular to the at least one linear non-dense design feature. In an embodiment, the photolithography mask further includes a first transverse linear... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20120040279 - Method, device, and system for forming circular patterns on a surface: A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size... Agent: D2s, Inc.

20120040280 - Simultaneous optical proximity correction and decomposition for double exposure lithography: A mechanism is provided for simultaneous optical proximity correction (OPC) and decomposition for double exposure lithography. The mechanism begins with two masks that are equal to each other and to the target. The mechanism simultaneously optimizes both masks to obtain a wafer image that both matches the target and is... Agent: International Business Machines Corporation

20120040281 - Curable sublimation toner and sublimation transfer process using same: A transfer printing method including applying a curable sublimation toner having at least one curable component and at least one sublimation colorant in a desired pattern onto a transfer substrate to form an image on the transfer substrate at a first temperature which is below the sublimation temperature of the... Agent: Xerox Corporation

20120040282 - Imaging devices comprising structured organic films: An imaging member for a xerographic liquid immersion development machine having an outermost layer including a solvent resistant structured organic film (SOF) having a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be multi-segment thick.... Agent: Xerox Corporation

20120040283 - Imaging members for ink-based digital printing comprising structured organic films: An imaging member for ink-based digital printing having an outermost layer including a structured organic film (SOF) having a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be multi-segment thick.... Agent: Xerox Corporation

20120040284 - Electrostatic image-developing toner, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus: An electrostatic image developing toner that includes a toner particle including a binder resin containing a resin selected from an acrylic resin, a styrene-acrylic resin, and a styrene-(meth)acrylic acid ester copolymer. The resin has a crosslinked structure formed by using at least one of boric acid and boric acid derivatives.... Agent: Fuji Xerox Co., Ltd.

20120040285 - Toner production process and toner: A process for producing a core-shell toner is provided in which the toner has core particles containing at least a binder resin (1), a colorant and a release agent and shell layers which contain at least a resin (2) and with which the core particles are covered; and the process... Agent: Canon Kabushiki Kaisha

20120040286 - Fixing systems including contact pre-heater and methods for fixing marking material to substrates: Fixing systems and methods for fixing marking material to a substrate are provided. An exemplary embodiment of the fixing systems includes a pre-heating device including: a first fixing member including a first surface; a second fixing member including a second surface forming a first nip with the first surface; and... Agent: Xerox Corporation

20120040287 - Curable sublimation marking material and sublimation transfer process using same: A curable sublimation marking material including at least one curable component and at least one sublimation colorant. Also disclosed is a transfer printing method including applying a curable sublimation marking material in a desired pattern onto a transfer substrate to form an image on the transfer substrate at a first... Agent: Xerox Corporation

20120040289 - Chemically amplified silsesquioxane resist compositions: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise β- and γ-substituted alkyl groups... Agent: International Business Machines Corporation

20120040288 - Epoxy formulations with controllable photospeed: The present invention is directed to an epoxy film composition, comprising: novolac resin; solvent; a photoacid generator having the structure A+B− and having a pKa of −5 or less; and a photolabile quencher generator having the structure C+D− and having a pKa greater than −10; wherein B− and D− are... Agent: Microchem Corp.

20120040290 - Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same: The present invention relates to a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the (C) photopolymerization initiator comprises a compound represented by the following general formula (1). In formula (1), R1 represents a halogen... Agent: Hitachi Chemical Company, Ltd.

20120040291 - Composition for forming resist underlayer film for euv lithography: There is provided a compositions of resist underlayer films for EUV lithography that is used in a production process of devices employing EUV lithography, that reduces adverse effects caused by EUV, and that has a beneficial effect on the formation of a favorable resist pattern; and a method for forming... Agent: Nissan Chemical Industries, Ltd.

20120040293 - Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device: A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated and... Agent: Kabushiki Kaisha Toshiba

20120040292 - Transfer method, transfer apparatus, and method of manufacturing organic light emitting element: A transfer method and a transfer apparatus capable of making the shape and quality of a transferred layer uniform and a method of manufacturing an organic light emitting element. A transfer method includes a step of disposing a transfer substrate and an acceptor substrate so as to face each other,... Agent: Sony Corporation

20120040294 - Top coating composition: t

20120034551 - Binary photomask blank and binary photomask making method: A binary photomask blank has on a transparent substrate a light-shielding film including substrate-side and surface-side compositionally graded layers, having a thickness of 35-60 nm, and composed of a silicon base material containing a transition metal and N and/or O. The substrate-side compositionally graded layer has a thickness of 10-58.5... Agent:

20120034554 - Method for fracturing and forming a pattern using circular characters with charged particle beam lithography: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a... Agent: D2s, Inc.

20120034552 - Method of manufacturing a photomask: A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent... Agent: Hoya Corporation

20120034553 - Photomask blank, photomask, and pattern transfer method using photomask: A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is characterized by comprising an antireflective film (6), which at least contains silicon and oxygen... Agent: Hoya Corporation

20120034555 - Anti-static and slippery anti-curl back coating: The presently disclosed embodiments relate generally to the formulation of an anticurl back coating layer that renders imaging apparatus flexible members and components their desirable flatness, for use in electrostatographic, including digital apparatuses. More particularly, the embodiments pertain to an imaging member comprising an anticurl back coating layer formulated to... Agent: Xerox Corporation

20120034556 - Electrophotographic photoreceptor, process for producing the electrophotographic photoreceptor, and electrophotographic device: An electrophotographic photoreceptor includes an electroconductive substrate; an undercoat layer provided on the electroconductive substrate and composed of: metal oxide fine particles including particles of at least one metal oxide and at least one organic compound provided on the particles of the at least one metal oxide as a surface... Agent: Fuji Electric Co., Ltd.

20120034559 - Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith: Provided is an actinic-ray- or radiation-sensitive resin composition, includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a repeating unit (B) with a structure that when acted on by an acid, is decomposed to... Agent: Fujifilm Corporation

20120034557 - Method for preparing alignment mark for multiple patterning: A method for image pattern recognition in a multi-image patterning scheme is described. The method includes forming a first feature pattern on a substrate using a lithographic process, and forming a second feature pattern on the substrate using the lithographic process. The method further includes forming an inspection alignment mark... Agent: Tokyo Electron Limited

20120034558 - Photolithography material for immersion lithography processes: A photolithography material is provided. The photolithography material is a surface modifying material. The photolithography material includes a polymer (e.g., fluorine polymer) that includes less than approximately 80% hydroxyl groups. In an embodiment, the photolithography material includes less than approximately 80% fluoro-alcohol functional units. Methods of using the photolithography material... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20120034560 - Radiation-sensitive resin composition, method for forming resist pattern and polymer: A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The... Agent: Jsr Corporation

20120034561 - Resist polymer and resist composition: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam... Agent: Mitsubishi Rayon Co., Ltd.

20120034562 - Coating composition for use with an overcoated photoresist: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in... Agent:

20120034564 - Positive resist composition and pattern forming method:

20120034563 - Resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or the like; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic... Agent:

20120034565 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising a coating provided on a support having a hydrophilic surface, the coating containing thermoplastic polymer particles and an infrared radiation absorbing dye characterized in that the coating further comprises a phenolic stabilizer.... Agent: Agfa Graphics Nv

20120034566 - Micro-channel device and method for fabricating micro-channel device: Where, w is a width of the curved channel, uc is a channel passing speed of a solution in the curved channel, γ is a molecular diffusion inhibition factor by basic members present in the curved channel, and Dm is a molecular diffusion coefficient of the solution.... Agent: Shinwa Chemical Industries Ltd.

20120028174 - Defense system in advanced process control: A method includes performing a lithography process on a wafer to form a patterned photo resist, and measuring the wafer to determine an overlay error of the patterned photo resist. A high/low specification is determined using the overlay error. An overlay process value setting is generated and compared with the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120028173 - Methods, apparatus and systems to control the tribo-electric charge of a toner material associated with a printing development system: Disclosed are printing methods, apparatus and systems for developing a latent image recorded on a surface, for example, a photoreceptor with developer material. According to an exemplary embodiment, the development method applies a development field voltage between a development station donor member and a development station transport member as a... Agent: Xerox Corporation

20120028175 - Foil transferring face forming toner and image forming method: A method for forming an image at least comprising steps of forming an electrostatic latent image by exposing an electrophotographic photoreceptor, forming a foil transferring face by supplying a toner onto the electrophotographic photoreceptor having the electrostatic latent image, transferring the foil transferring face formed on the electrophotographic photoreceptor to... Agent: Konica Minolta Business Technologies, Inc.

20120028177 - Imaging members comprising capped structured organic film compositions: A imaging member, such as a photoreceptor, comprising a capped structured organic film comprising a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film may be a multi-segment thick structured organic film.... Agent: Xerox Corporation

20120028176 - Imaging members comprising structured organic films: A photoreceptor comprising a composite structured organic film comprising a plurality of segments and a plurality of linkers arranged as a covalent organic framework, wherein the structured organic film includes a secondary component and may be a multi-segment thick structured organic film.... Agent: Xerox Corporation

20120028178 - Photoreceptor outer layer and methods of making the same: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrophotographic, including digital apparatuses. Embodiments pertain to an improved electrophotographic imaging member used in customer replaceable units (CRU) comprising a very thin outer layer on the imaging member surface, where... Agent: Xerox Corporation

20120028179 - Electrophotographic photoreceptor, image forming method, image forming apparatus, and process cartridge for image forming apparatus using the photoreceptor: wherein each of R1 and R2 represents a monovalent alkyl group having 1 to 4 carbon atoms or a monovalent phenyl group; Each of Ar1 to Ar4 represents a phenyl group, a naphtyl group and a biphenylyl group or a phenyl group, a naphtyl group and a biphenylyl group substituted... Agent:

20120028180 - Spirodilactam polycarbonate containing photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a spirodilactam based polycarbonate.... Agent: Xerox Corporation

20120028181 - Surface decorated particles: A surface decorated particle including a core particle phase having an outer surface; and fine inorganic particles on the outer surface of the core particle phase; wherein the fine inorganic particles have hydrophobic groups covalently bonded primarily on portions of surfaces of the fine inorganic particles positioned away from the... Agent:

20120028182 - Toner having core-shell structure and method of preparing the same: A toner having a core-shell structure and a method of preparing the same. Since a shell includes a crosslinked resin, a toner preventing hot offsets and having excellent charge stability is prepared.... Agent: Samsung Fine Chemicals Co., Ltd.

20120028183 - Developing method and image forming method: The developing method includes developing an electrostatic latent image on an image bearing member with a two-component developer including a toner and a carrier and born on at least one developer bearing member, whose surface moves at a linear speed of from 300 mm/sec to 2,000 mm/sec. The carrier includes... Agent:

20120028184 - Bending receiver using heat-shrinkable film: A receiver having an image side and a non-image side bent in a bend area including a bend axis. Toner is deposited on the image side of the receiver in the bend area using an electrophotographic print engine. The deposited toner is fused to the receiver. During or after fusing,... Agent:

20120028185 - Method for forming surface decorated particles: A method for forming surface decorated particles including stabilizing dispersed hydrophobic phase particles in an aqueous phase with fine inorganic particles having a relatively hydrophilic surface; and treating the stabilized dispersed hydrophobic phase particles with a hydrophobic group containing reactant to form hydrophobic groups covalently bonded to surfaces of the... Agent:

20120028186 - Production method of two-component developer: Disclosed is a production method of a two-component developer for developing an electrostatic image comprising a toner and a resin coated carrier having a porous magnetic core particle and a resin coated layer, wherein the porous magnetic core particle are composed of a porous ferrite material and have pit apertures... Agent: Konica Minolta Business Technologies, Inc.

20120028187 - Method of producing electrostatic latent image developing toner: A method of producing an electrostatic latent image developing toner includes: preparing a resin particle dispersion by polymerizing, in a water-based solvent, a polymerizable monomer that comprises a polymerizable monomer comprising a vinyl-based double bond; extracting a liquid from the resin particle dispersion by heating; mixing the distilled resin particle... Agent: Fuji Xerox Co., Ltd.

20120028188 - Photoresist composition: m

20120028190 - Polymer, chemically amplified negative resist composition, and patterning process: A polymer is provided comprising recurring units having a N,N′-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically amplified negative resist composition is formulated using the polymer and processed by lithography, a fine resist pattern can be formed with the advantages of improved LER and high resolution.... Agent: Shin-etsu Chemical Co., Ltd.

20120028189 - Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound: wherein RC represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, RE represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a... Agent: Jsr Corporation

20120028191 - Azide functionalized poly(3-hexylthiophene) and method of forming same: The invention relates azide functionalized poly(3-hexylthiophene)s. Various azide functionalized poly(3-hexylthiophene)s and intermediates are disclosed and described, as well as method for making novel monomers that are synthesized and transformed into P3HT-Nmp for use as organic conducting polymers in organic photovoltaic devices.... Agent: Brookhaven Science Associates, LLC

20120028192 - Control method and control system for exposure apparatus: According to one embodiment, a control method for an exposure apparatus is disclosed. The method can include retrieving, from a database, a correction amount of alignment correction at a time of exposure of a wafer and an inclination amount of a wafer stage with respect to an optical axis of... Agent: Kabushiki Kaisha Toshiba

20120028193 - Birefringence pattern builder: A birefringence pattern builder used in a method of producing a patterned birefringent product including a step of patterned light exposure of an optically anisotropic layer and a step of heating the layer after the light exposure to 50° C. or higher but not higher than 400° C., which include... Agent:

20120028194 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask: A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type... Agent: Renesas Electronics Corporation

20120028195 - Composition for coating over a photoresist pattern: The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for... Agent:

20120028196 - Method of forming pattern and organic processing liquid for use in the method: An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is... Agent: Fujifilm Corporation

20120028197 - Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method: According to one embodiment, a transmission optical system which guides light in a nearly parallel beam state emitted from an optical outlet port of a light source, to an optical inlet port of an exposure apparatus body and which injects the light in the nearly parallel beam state into the... Agent: Nikon Corporation

20120028198 - Upper layer-forming composition and photoresist patterning method: c