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Radiation imagery chemistry: process, composition, or product thereof January recently filed with US Patent Office 01/12

20120021342 - Photomask having transcribing pattern and method of forming photoresist pattern using the same: A photomask for a proximate type exposure apparatus includes: a transparent substrate; and a transcribing pattern and a peripheral region surrounding the transcribing pattern on the transparent substrate, the transcribing pattern having at least one bar including a plurality of discontinuous regions and a plurality of light controlling regions between... Agent:

20120021343 - Process window signature patterns for lithography process control: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs... Agent: Asml Netherlands B.v.

20120021344 - Reflective photomask and reflective photomask blank: Provided is a reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask including: a substrate; a high reflection part formed on the substrate; and a low reflection part formed on the high reflection part and being patterned, wherein the... Agent:

20120021341 - Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process: There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed having a conductive... Agent: Shin-etsu Chemical Co., Ltd.

20120021346 - Image bearing member and image forming method, image forming apparatus, and process cartridge using same: An image bearing member having a substrate and a layer provided overlying the substrate, which has a cured material in which a compound comprising three or more methylol groups and a charge transport group is cross-linked.... Agent:

20120021345 - Photoelectric conversion device, electrophotographic photoreceptor, process cartridge, and image forming apparatus: Provided is to provide a photoelectric conversion device including an organic compound layer which contains polymer (a) having partial structures represented by the following formulae (1) and (2) respectively. In the formula, R1, R2, R3 each independently represent a hydrogen atom or an alkyl group having from 1 to 4... Agent: Fuji Xerox Co., Ltd.

20120021347 - Toner, method for forming toner, developer, and image forming method: To provide a toner A containing: base particles, each containing polyester, microcrystalline wax, and a colorant; and spherical silica particles having an average primary particle diameter of 100 nm to 150 nm, wherein the microcrystalline wax has an onset temperature of 45° C. to 60° C. as determined by DSC,... Agent:

20120021350 - Electrophotographic toner: wherein R1a is a hydrogen atom, a hydroxyl group, or a methoxy group; and Xa is a hydrogen atom, an aldehyde group, an allyl group, a vinyl group, a methoxy group, or a hydroxyl group or carboxyl group which may have a linking group. The toner for electrophotography containing a... Agent: Kao Corporation

20120021348 - Toner: In a toner formed of toner particles which include a colorant, a wax, and a binder resin containing a crystalline resin (a) primarily composed of a polyester, the crystalline resin has an endothermic peak temperature (Tp) in a range of 50° C. to 80° C., and in a viscoelasticity measurement... Agent: Canon Kabushiki Kaisha

20120021349 - Toner: In differential scanning calorimetry of a toner, regarding a binder resin in the toner, (i) the peak temperature T10 of a maximum endothermic peak (temperature raising rate 10.0° C./min; P10) is 50° C. to 80° C. and the half-width W10 is 2.0° C. to 3.5° C. and (ii) W1, W10,... Agent: Canon Kabushiki Kaisha

20120021351 - Continuous process for producing toner using an oscillatory flow continuous reactor: The present disclosure provides for oscillatory flow continuous reactors suitable for use in forming emulsion aggregation toners. The reactor may include at least one receptacle being a flexible, tubular member. The reactor may also include a plurality of baffles disposed, at spaced apart intervals, along an interior space of the... Agent: Xerox Corporation

20120021352 - Toner manufacturing method: Disclosed is a manufacturing method of toner which includes at least polyester resin and colorant, comprising the steps of: (A) dissolving, into an organic solvent, the polyester resin and ultrahigh molecular weight styrene resin in which a peak is present in a range larger than 500 thousands and smaller than... Agent: Konica Minolta Business Technologies, Inc.

20120021353 - Method for producing toner: Disclosed is a method for producing toner, comprising (1) mixing, with an aqueous medium, a resin solution of an organic solvent in which amorphous polyester resin having unsaturated dicarboxylic acid monomer units is dissolved, and forming an amorphous polyester resin particle dispersion; (2) adding a radical polymerization initiator to the... Agent: Konica Minolta Business Technologies, Inc.

20120021354 - Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof: s

20120021355 - Coating composition for duv filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by... Agent:

20120021356 - Lithographic printing plate support and presensitized plate: A presensitized plate bringing about the lithographic printing plate which exhibits a high resistance to scumming and in which formation of bulges causing image dropouts is suppressed is provided with the lithographic printing plate support which includes an aluminum plate and an anodized film of aluminum provided on the aluminum... Agent: Fujifilm Corporation

20120021357 - Positive-type photosensitive insulating resin composition, and pattern forming method using same: p

20120021358 - Process for making lithographic printing plate, developer for lithographic printing plate precursor, and replenisher for lithographic printing plate precursor development: A process for making a lithographic printing plate is provided that includes (A) a step of preparing a lithographic printing plate precursor that includes above a support a photosensitive layer that includes (i) a binder polymer, (ii) an ethylenically unsaturated compound, and (iii) a radical polymerization initiator, (B) an exposure... Agent: Fujifilm Corporation

20120021359 - Upper layer-forming composition and resist patterning method: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a... Agent: Jsr Corporation

20120021360 - Method of manufacturing liquid ejection head: A method of manufacturing a liquid ejection head includes: exposing a negative organic resin layer to be a flow path forming member except for regions in which an ejection orifice and a fluid resistance portion are to be formed, respectively, and heating the negative organic resin layer and a flow... Agent: Canon Kabushiki Kaisha

20120021361 - Radiation-protection device: A radiation-protection device is provided that includes a substrate and a surface structure formed on the substrate. The surface structure has an arrangement and interacts with radiation and the substrate to at least (a) substantially transmit or attenuate radiation at a wavelength and an energy below a threshold energy, and... Agent: Bae Systems Information And Electronic Systems Integration Inc.

20120021362 - Laser imaging: A method of forming an image on a substrate, which comprises applying to the substrate an activatable colour forming compound wherein said activatable colour forming compound is initially unreactive but becomes reactive upon activation; activating said colour forming compound in the areas of the substrate where the image is to... Agent:

20120021363 - Co-crystals and their use: A method of forming an image on a substrate by irradiation thereof, wherein the substrate comprises therein or thereon a co-crystal of a polymerisable unsaturated monomer and a spacing component, wherein the co-crystal is capable of undergoing a radiation-activated colour change reaction. A co-crystal of a diacetylene and a spacing... Agent:

20120015286 - Mask blank substrate, mask blank, photomask, and methods of manufacturing the same: A mask blank substrate for a photomask is chucked on a mask stage of an exposure apparatus. A main surface, on the side where a thin film for a transfer pattern is to be formed, of the mask blank substrate has a flatness of 0.3 μm or less in a... Agent: Hoya Corporation

20120015288 - Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate: A member for masking films which includes a base film transparent to ultraviolet rays and, on one surface thereof, an ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and having an average thickness of 0.1 to 30 μm, wherein the ultraviolet-shielding resin layer is a... Agent:

20120015287 - Method of fabricating a half tone mask having a shielding pattern and plural overlapping halftone patterns of different widths: A halftone mask includes a shielding pattern partially formed on a transparent substrate; a first halftone transmission pattern partially formed on the transparent substrate; and a second halftone transmission pattern formed on the first halftone transmission layer.... Agent:

20120015289 - Alignment method and method for manufacturing flat panel display: An alignment method is disclosed, in which a distance between a substrate and a photomask is set at a predetermined exposure gap. The photomask is rectangular, and includes a first side, and a second side opposite to the first side. A distance between a midpoint of the first side and... Agent: Panasonic Corporation

20120015290 - Image holding member for image forming apparatus, process cartridge, and image forming apparatus: An image holding member for an image forming apparatus is disclosed which the image holding member includes a support and a photosensitive layer disposed on or above the support, the photosensitive layer including a compound including a partial structure represented by the following Formula (A), wherein Ar represents a substituted... Agent: Fuji Xerox Co., Ltd.

20120015291 - Electrostatic image developing carrier, electrostatic image developer, image-forming method, developer cartridge, process cartridge, and image forming apparatus: An electrostatic image developing carrier includes a core particle and a coating layer on the core particle. The coating layer contains a resin having a crosslinked structure formed by using at least one compound selected from boric acid and boric acid derivatives.... Agent: Fuji Xerox Co., Ltd.

20120015292 - Toner compositions: The present disclosure provides processes for producing toner particles, and toner particles produced by such processes. The processes of the present disclosure combine melt-mixing and grinding of toner components to produce toner particles, followed by a coalescing treatment which provides toner particles having desirable spherical properties.... Agent: Xerox Corporation

20120015294 - Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element: The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation from a source of radiation having a range of wavelengths and a photoluminescent tag that is responsive to at least... Agent: E.i. Du Pont De Nemours And Company

20120015293 - Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray... Agent: Fujifilm Corporation

20120015295 - Infrared-sensitive composition for printing plate precursors: A lithographic printing plate precursor has a substrate and an infrared radiation-sensitive composition comprising a polymeric binder, a free radical polymerizable system consisting of at least one polymerizable component, a compound capable of absorbing infrared radiation, and an initiator system comprising an iodonium salt that is capable of producing free... Agent:

20120015296 - Photosensitive resin composition for flexographic printing having excellent solvent resistance: A photosensitive resin composition for flexographic printing having excellent resistance to an ink comprising an organic solvent and an emulsion ink used in flexographic printing, for example, a UV-curable ink or an ink using a vegetable oil or light naphtha and having excellent suitability for printing applications such as image... Agent: Nippon Soda Co., Ltd.

20120015298 - Photosensitive resin composition and cured film: Disclosed is a photosensitive resin composition capable of displaying satisfactory patterning performance against an alkaline developer and yielding a cured film of a sufficiently low coefficient of linear thermal expansion. The photosensitive resin composition contains a photopolymerization initiator and a polyimide precursor obtained by the reaction of an ester-containing diamine... Agent:

20120015297 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including... Agent: Tokyo Ohka Kogyo.co., Ltd.

20120015302 - Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the... Agent: Fujifilm Corporation

20120015301 - Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition:

20120015300 - Photosensitive resin composition: Disclosed is a photosensitive resin composition which has excellent transparency, heat resistance, thermal discoloration resistance, adhesion to a substrate and electrical characteristics, while exhibiting good developability and storage stability. Specifically disclosed is a photosensitive resin composition which contains the following components (A), (B) and (C). (A) a copolymer which contains... Agent:

20120015299 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) [in the formula, Y0 represents... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120015303 - Drawing apparatus and method of manufacturing article: A drawing apparatus for drawing a pattern on a substrate with a plurality of charged-particle beams, includes a blanking aperture array including a plurality of apertures, a blanking unit including a plurality of blankers and configured to respectively deflect the plurality of charged-particle beams by the plurality of blankers to... Agent: Canon Kabushiki Kaisha

20120015304 - Method for fabricating an interposer: Method for fabricating an interposer is provided. A substrate is provided having thereon at least a conductive via and at least a flange. The flange is bonded on the substrate and shades a portion of the via. A photoresist layer is formed on the interior surface of the via, on... Agent:

20120015305 - Digital optical chemistry micromirror imager: An apparatus and method for catalyzing a reaction on a substrate (24) comprising, a light source (12), a micromirror (16) positioned to redirect light (14) from the light source (12) toward a substrate (24) wherein the redirected light (14) catalyzes a chemical reaction proximate a substrate (24), is disclosed. A... Agent:

20120015307 - Coating and developing apparatus and method, and storage medium: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting... Agent: Tokyo Electron Limited

20120015306 - Illumination optical system, exposure apparatus, and device manufacturing method: [Solving Means] An illumination optical system 13 is provided with an optical integrator 26 which forms a predetermined light intensity distribution on an illumination pupil plane 27 in an illumination optical path of the illumination optical system 13 with incidence of exposure light EL from a light source device 12... Agent: Niko Corporation

20120009508 - Laser marking hologram having a volume hologram with interference fringes using selective irradiation: The present invention is provided to enhance security of a volume hologram by recording therein individualized information such as information of character, numerical character, picture pattern, biometric matter and/or the like by irradiating laser light to the volume hologram thereby modifying the same physically or chemically, and is related to... Agent: Dai Nippon Printing Co., Ltd.

20120009512 - Extreme ultraviolet photomask: A method of manufacturing a photomask includes forming an upper layer on a photomask substrate, and patterning the upper layer to form an upper pattern having an inclined sidewall, wherein patterning the upper layer includes anisotropically etching the upper layer using charged particles moving in parallel to a first direction... Agent: Samsung Electronics Co., Ltd.

20120009509 - Generation method, creation method, exposure method, device fabrication method, storage medium, and generation apparatus: The present invention provides a generation method that obtains a position at which an auxiliary pattern is to be placed and generates a mask pattern (its data), which achieves excellent imaging performance, even when a halftone mask is used as an original.... Agent: Canon Kabushiki Kaisha

20120009510 - Lithography mask and method of manufacturing semiconductor device: A lithography mask is disclosed. The lithography mask is for use with an exposure apparatus which forms an unpatterned first region and a patterned second region that includes groups of desired patterns in a photosensitive layer. The lithography mask includes a transparent substrate; and a patterned light blocking layer that... Agent: Kabushiki Kaisha Toshiba

20120009511 - Method and apparatus for correcting errors of a photolithographic mask: A method for correcting a plurality of errors of a photolithographic mask, comprising optimizing first parameters of a imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask, and correcting the plurality of errors by applying an imaging transformation using optimized... Agent: Carl Zeiss Sms Ltd.

20120009513 - Electrophotographic photoconductor, image forming apparatus, and process cartridge: To provide an electrophotographic photoconductor, containing: a conductive support; a photosensitive layer provided above the conductive support; and a hardened protective layer provided above the photosensitive layer, wherein the hardened protective layer contains a hardened product of a radical polymerizable compound containing an adamantane skeleton.... Agent:

20120009514 - Image forming method, two-component developer, image forming apparatus and process cartridge: In the image forming method, at least one color toner image and a transparent toner image are formed using a color developer including a color toner and a carrier and contained in a first developing device, and a second developer including a transparent toner and a carrier and contained in... Agent:

20120009515 - Developer for electrophotography: The present invention provides a developer for electrophotography which is superior in property of build up of electrification and in charge stability even in environments of high temperature and high humidity or in an environment of low temperature and low humidity where it is difficult for a developer to retain... Agent: Konica Minolta Business Technologies, Inc.

20120009516 - Electrophotographic ink: The present disclosure provides inks, systems, and methods directed towards dispersed pigments. In one embodiment, an electrophotographic ink can comprise an aliphatic solvent and a pigment having a surface comprising carbonyl groups stabilized by an amine dispersant having the structure: R1R2N[(CH2)nNR5]m(CH2)pNR3R4, where R1, R3, R4, and R5 are independently selected... Agent:

20120009517 - Electrophotographic ink: The present disclosure provides inks, systems, and methods directed towards polyurethane encapsulated pigments. In one embodiment, an electrophotographic ink can comprise an electrophotographic ink vehicle and a polyurethane encapsulated pigment. The polyurethane encapsulated pigment can comprise a pigment and a polyurethane, wherein the polyurethane fully encapsulates the pigment and forms... Agent:

20120009518 - Developing device, image forming method and apparatus, and process cartridge: In the image forming method, a color toner image and a transparent toner image are formed using a first developing device containing a first developer including color toner and carrier, and a second developing device containing a second developer including transparent toner and carrier. At least the second developing device... Agent:

20120009519 - Compound, resin and photoresist composition: wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more —CH2— in the C2-C36 heterocyclic group can be replaced by —CO— or... Agent: Sumitomo Chemical Company, Limited

20120009520 - Positive resist composition and method of forming resist pattern: A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120009521 - Resist composition, method of forming resist pattern, compound and acid generator: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group... Agent: Tokyo Ohka Kogyo Co., Ltd.

20120009522 - Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same: An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method... Agent: Fujifilm Corporation

20120009523 - Method for forming contact hole of semiconductor device: A method for forming a contact hole of a semiconductor device, includes forming a hard mask over an etch target layer, forming a first line pattern over the hard mask, forming a second line pattern over the hard mask and the first line pattern in a direction crossing the first... Agent:

20120009524 - Material and method for photolithography: A photosensitive material for use in semiconductor manufacture comprises a copolymer that includes a plurality of photoresist chains and a plurality of hydrophobic chains, each hydrophobic chain attached to the end of one of the photoresist chains. The copolymer in response to externally applied energy will self-assemble to a photoresist... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120009525 - Method and apparatus for printing a periodic pattern with a large depth of focus: A method for printing a desired pattern into a photosensitive layer that includes providing a mask bearing a pattern of linear features that are parallel to a first direction, arranging the layer parallel to and separated from said mask, generating substantially monochromatic light, and illuminating the mask pattern with said... Agent:

20120009526 - Method of forming fine patterns: A method of forming fine patterns comprises forming a first auxiliary layer having an acid diffusion rate on an underlying layer, forming a light-transmitting second auxiliary layer having a slower acid diffusion rate than the first auxiliary layer on the first auxiliary layer, exposing respective regions of the first and... Agent: Hynix Semiconductor Inc.

20120009528 - Coating and developing apparatus and method: In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on... Agent: Tokyo Electron Limited

20120009527 - Patterning process: A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group and recurring units having an acid labile group-substituted carboxyl group, an acid generator, and an organic solvent onto a substrate, prebaking to form a resist film, exposing the... Agent: Shin-etsu Chemical Co., Ltd.

20120009529 - Patterning process: A pattern is formed by applying a resist composition comprising a (meth)acrylate copolymer comprising both recurring units having an acid labile group-substituted carboxyl group and recurring units having a lactone ring, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing... Agent: Shin-etsu Chemical Co., Ltd.

20120003573 - Photomasks: Some embodiments include methods of forming photomasks. A stack of at least three different materials is formed over a base. Regions of the stack are removed to leave a mask pattern over the base. The mask pattern includes a pair of spaced-apart adjacent segments of the stack. A liner is... Agent: Micron Technology, Inc.

20120003576 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: The charge generation layer of an electrophotographic photosensitive member is made to contain a specific amine compound in order to provide an electrophotographic photosensitive member that can output images that are practically free from an image flaw or have less image flaws attributable to a ghost phenomenon under low temperature... Agent: Canon Kabushiki Kaisha

20120003574 - Electrophotography photoreceptor, method of manufacturing the same, and electrophotography device using the same: A positive-charging electrophotography photoreceptor includes a laminated structure having a conductive supporting member, a charge transport layer formed of at least a hole transport material and a first binder resin, and a charge generation layer formed of at least a charge generation material, hole transport material, electron transport material, and... Agent: Fuji Electric Systems Co., Ltd.

20120003575 - Imaging members having a chemical resistive overcoat layer: The presently disclosed embodiments are directed to imaging members used in electrostatography. More particularly, the embodiments pertain to electrophotographic imaging members which have an added-on protective overcoat layer formulated to comprise of a novel A-B diblock copolymer comprising two segmental blocks of a bisphenol polycarbonate and an organic acid terminal... Agent: Xerox Corporation

20120003577 - Electrophotographic photoreceptor and image formation devise comprising same: An electrophotographic photoreceptor, comprising a conductive support, an undercoat layer and a photosensitive layer formed in sequence, the electrophotographic photoreceptor characterized in that a coating solution for undercoat layer formation for producing the electrophotographic photoreceptor contains at least a binder resin and metal oxide particles surface-treated with anhydrous silicon dioxide.... Agent:

20120003578 - Single layer photoreceptor and methods of using the same: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrophotographic, including digital, apparatuses. In particular, the present embodiments pertain to an improved imaging member comprising a single layer in which the single layer further comprises a photoactive material in... Agent: Xerox Corporation

20120003579 - Ferrite carrier core material and ferrite carrier for electrophotographic developer, and electrophotographic developer using the ferrite carrier: There are provided a ferrite carrier core material for an electrophotographic developer, which contain 10 to 30% by weight of Mn, 1.0 to 3.0% by weight of Mg, 0.3 to 1.5% by weight of Ti and 40 to 60% by weight of Fe, a ferrite carrier for an electrophotographic developer... Agent: Powdertech Co., Ltd.

20120003580 - Image forming method: Provided is an image forming method in which hydrophobized calcium carbonate particles having a number average particle diameter of 30 to 300 nm and hydrophobized strontium titanate particles having a number average particle diameter of 30 to 300 nm are applied to the surface of an image bearing member.... Agent: Canon Kabushiki Kaisha

20120003581 - Method of manufacturing wax-containing polymer particles: The present invention is directed towards methods of manufacturing wax-containing polymer particles by limited coalescence processes employing aqueous wax dispersions. In one embodiment, an aqueous wax dispersion or emulsion is dispersed in an oil phase comprising a water-immiscible solvent and a polymer to form a transient water-in-oil (W/O) emulsion, and... Agent:

20120003582 - Photoresist and patterning process: A method and photoresist material for the patterning of integrated circuit (IC) components using ultra violet (UV) and extreme ultraviolet lithography (EUV) that includes providing a substrate, forming a first material layer over the substrate, forming a second material layer over the first material layer, the second material layer having... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20120003583 - Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition: An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.... Agent: Fujifilm Corporation

20120003584 - Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer... Agent: American Dye Source, Inc.

20120003585 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: i

20120003586 - Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method:

20120003587 - Method of forming fine patterns using a block copolymer: A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component,... Agent: Samsung Electronics Co., Ltd

20120003588 - Method of improving print performance in flexographic printing plates: A method of making a relief image printing element from a photosensitive printing blank is provided. The method comprising the steps of: 1) providing a photosensitive printing blank comprising a backing layer, at least one layer of photoresin on top of the backing layer and a removable coversheet on top... Agent:

20120003589 - Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition: m

20120003590 - Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same: An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation.... Agent: Fujifilm Corporation

20120003591 - Method of forming pattern and developer for use in the method: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of... Agent: Fujifilm Corporation

20120003592 - Imaging particulates, paper and process, and imaging of paper using dual wavelength light: The present invention provides dual wavelength imaging compositions, processes for forming dual wavelength imaging compositions, methods for forming images using dual wavelength imaging compositions and substrate (e.g., paper web) treated (e.g., coated) on one or both sides with dual wavelength imaging compositions. Also provided is a dual wavelength imaging particulate... Agent: International Paper Comapny