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Radiation imagery chemistry: process, composition, or product thereof November recently filed with US Patent Office 11/11

20110287343 - Hologram recording material and hologram recording medium: P

20110287345 - Electron beam drawing apparatus, electron beam drawing method, semiconductor device manufacturing mask manufacturing method, and semiconductor device manufacturing template manufacturing method: According to one embodiment, there is provided a electron beam drawing apparatus includes an irradiation module which irradiates a resist coated onto a substrate with a electron beam, and a control module which controls the irradiation module and which acquires the relationship between an irradiation dose of the electron beam... Agent:

20110287348 - Laser-reflective mask and method for manufacturing same: There are provided a laser reflective mask and a fabricating method thereof, in which reflective layers with different reflectances are sequentially and repeatedly laminated on top of a base substrate which has a reflective layer filling groove having a predetermined depth in a reflection region for a laser beam and... Agent: Wi-a Corporation

20110287346 - Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask: Provided is a method of manufacturing a mask blank having a thin film on a transparent substrate. The method includes forming the thin film made of a material containing a transition metal on the transparent substrate and applying a superheated steam treatment to the thin film.... Agent: Hoya Corporation

20110287349 - Multi-chip reticle photomasks: A multi-chip reticle, methods of designing and fabricating multi-chip reticles, a system for designing a multi-chip reticle, and a method of fabricating integrated circuit chips using the multi-chip reticle. The multi-chip reticle includes a transparent substrate having two or more separate chip images arranged in an array, each chip image... Agent: International Business Machines Corporation

20110287344 - Reflective photomask, manufacturing method of the photomask, and pattern formation method: A reflective photomask includes a phase shift portion, a reflective portion located outside the phase shift portion; and a semi-light-absorbing portion located between the phase shift portion and the reflective portion. The semi-light-absorbing portion includes a first multilayer film reflective to exposure light, a first interlayer film, a second multilayer... Agent:

20110287347 - Thin film evaluation method, mask blank, and transfer mask: Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby... Agent: Hoya Corporation

20110287350 - Electrophotographic apparatus and electrophotographic photosensitive member: An electrophotographic apparatus and an electrophotographic photosensitive member for use in the electrophotographic apparatus are provided. The number of intermediate layers between a photoconductive layer and a surface layer is an odd number more than 2, and the refractive index monotonically decreases from the photoconductive layer toward the surface layer.... Agent: Canon Kabushiki Kaisha

20110287351 - Electrophotographic photoreceptor and image forming apparatus: An electrophotographic photoreceptor having a photosensitive layer on a conductive support, wherein the photosensitive layer comprises a pigment containing an adduct of titanyl phthalocyanine and 2,3-butanediol, and a ratio of an absorbance at a wavelength of 780 nm of the photosensitive layer (referred to as Abs780) divided by an absorbance... Agent: Konica Minolta Business Technologies, Inc.

20110287353 - Acrylic ester compound and manufacturing intermediate thereof, method for manufacturing acrylic ester compound, and latent electrostatic image bearing member, image forming method, image forming apparatus and process cartridge: To provide: a latent electrostatic image bearing member including one of a cured material obtained through radical polymerization of a radically polymerizable compound of component (A1), and a cured material obtained through radical polymerization of a radically polymerizable compound of component (A2) in the outermost layer, wherein the component (A1)... Agent:

20110287352 - Flexible imaging members having stress-free imaging layer(s): Present embodiments are directed to the preparation of curl-free flexible imaging members used in electrostatography. More particularly, the embodiments pertain to a structurally simplified flexible electrophotographic imaging member, including the incorporation of a plasticizer or a blend of plasticizers in the imaging layer(s) to effect imaging layer(s) stress relieving outcome... Agent: Xerox Corporation

20110287354 - Polycarbonate resin, coating liquid containing same, and electrophotographic photosensitive body: Provided are: a urethane-based polycarbonate resin, including a repeating unit represented by the general formula [1], and a repeating unit represented by the general formula [2], in which the urethane-based polycarbonate resin has high wear resistance by virtue of a strong hydrogen bond between urethane groups; and an electrophotographic photoconductor,... Agent: Idemitsu Kosan Co., Ltd.

20110287355 - Electrophotographic toner: Disclosed is an electrophotographic toner, including toner particles which contain at least a binder resin and a coloring agent and have been prepared in an aqueous medium, wherein the surfaces of the toner particles are treated with an Si compound in an amount of from 0.1 to 5.0 wt %... Agent: Toshiba Tec Kabushiki Kaisha

20110287356 - Toner, image forming apparatus, image forming method and process cartridge: An electrostatic image developing toner including toner core particles each containing at least a first resin and a colorant, and fine resin particles formed of a second resin, wherein part of each of the fine resin particles is embedded in each of the toner core particles, and the remaining part... Agent:

20110287357 - Electrophotographic print binding method: Methods for forming bound electrophotographic prints are provided. In one aspect a method comprises the steps of applying a toner to a receiver to form a toner image with having toner in a binding area and in an image area. The binding area is proximate to a binding edge of... Agent:

20110287358 - Fixing device: A fixing device includes a fixing belt including a metal layer, a pressing member to form a nip between the pressing member and the fixing belt, an induction current generating coil that faces an outer periphery of the fixing belt, and heats the fixing belt located at a nip position... Agent: Kabushiki Kaisha Toshiba

20110287359 - Emulsion aggregation process: The present disclosure provides emulsion aggregation (EA) toner particles having less pigment on the particle surface and a more uniform pigment distribution. The process of preparing the toner includes specific mixing speeds and use of specific temperatures during the emulsion aggregation process and the addition of a shell to the... Agent: Xerox Corporation

20110287361 - Photoacid generators and photoresists comprising same: New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more PAGs of the invention.... Agent: Rohm And Haas Electronic Materials LLC

20110287360 - Photoresist composition and method of forming pattern by using the same: R1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the... Agent: Samsung Electronics Co., Ltd.

20110287362 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula,... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110287363 - High-resolution photolithographic method for forming nanostructures, in particular in the manufacture of integrated electronic devices: A photolithographic process, wherein a photosensitive layer is formed on a surface of a body to be defined; the photosensitive layer is exposed through a photolithographic mask having zones with lower transparency and zones with higher transparency so as to obtain exposed portions and shielded portions of the photosensitive layer;... Agent: Stmicroelectronics S.r.l.

20110287364 - Lithographic printing plate precursor: p

20110287365 - Lithographic printing plate precursors: A backside coating is applied to lithographic printing plate precursors and this coating provides sufficient protection so that adjacent precursors are not scratched or otherwise damaged when stacked. The backside coating is readily dissolved during processing or development at a pH of at least 6.5 after the precursors are imaged.... Agent:

20110287366 - Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition: A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit... Agent: Lg Chem. Ltd.

20110287367 - Method and apparatus for verifying stitching accuracy of stitched chips on a wafer: A method for verifying stitching accuracy of a stitched chip on a wafer is disclosed. Initially, a set of test structures are inserted within a reticle layout. An exposure program is executed to control a photolithography equipment having a stepper to perform multiple exposures of the reticle on a wafer... Agent:

20110287368 - Method of manufacturing electronic device: A method of manufacturing an electronic device, comprises forming a material layer, forming an anti-halation layer on the material layer, forming a resist layer on the anti-halation layer, forming a resist pattern including a plurality of island patterns by patterning the resist layer through an exposure step and a development... Agent: Canon Kabushiki Kaisha

20110287369 - Resist underlayer film forming composition containing silicon having anion group: There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a... Agent: Nissan Chemical Industries, Ltd.

20110287370 - Method for making micron or submicron cavities: e

20110287371 - Component of an immersion system, an immersion lithographic apparatus and a device manufacturing method: A component of an immersion system of a lithographic apparatus is disclosed having a superhydrophobic surface which in use is not exposed to DUV radiation. Also, there is disclosed a surface of a lithographic apparatus which may come into contact with immersion liquid and is a threshold distance from a... Agent: Asml Netherlands B.v.

20110281206 - Exposure apparatus, mask plate and exposing method: An exposure apparatus comprises: a loading stage for supporting a substrate; a mask plate parallel to the loading stage and above the loading stage, the mask plate including a light transmitting region and a light absorbing region on its lower surface, a light reflecting region being provided in the light... Agent: Beijing Boe Optoelectronics Technology Co., Ltd.

20110281208 - Hybrid multi-layer mask: A hybrid mask set for exposing a plurality of layers on a semiconductor substrate to create an integrated circuit device is disclosed. The hybrid mask set includes a first group of one or more multi-layer masks (MLMs) for a first subset of the plurality of layers. Each MLM includes a... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110281207 - Reflective mask blank and method of manufacturing a reflective mask: Disclosed is a reflective mask blank (10) which comprises a substrate (1), a multilayer reflective film (2) for reflecting exposure light, a buffer film (3), and an absorber film (4) for absorbing exposure light, said films being sequentially formed on the substrate. The absorber film (4) has a multilayer structure... Agent: Hoya Corporation

20110281209 - Toner, two component developer, process cartridge and color image forming apparatus: A toner containing: a core containing at least a first binder resin, a colorant, and a releasing agent; and a shell containing at least a second binder resin; wherein the toner has a core-shell structure, and has a softening index of 86° C. to 95° C. and a thermal hardness... Agent:

20110281210 - Developing agent: According to one embodiment, a developing agent includes a toner resin containing a coloring material, a binder resin, an ester wax and a crystalline polyester resin. The ester wax has an alkyl group with a carbon number of from 32 to 46, when an ion intensity ratio at each carbon... Agent: Kabushiki Kaisha Toshiba

20110281212 - Aqueous dispersions for use as toners: A compound that includes an aqueous dispersion, wherein the dispersion includes a thermoplastic resin and at least one stabilizing agent, and at least one selected from the group consisting of a colorant and a magnetic pigment, wherein the dispersion has an average volume diameter particle size from about 0.05 to... Agent: Dow Global Technologies LLC

20110281211 - Electrostatic image developing toner: Provided is an electrostatic image developing toner containing, (i) toner particles containing: a binder resin having a domain-matrix structure; and (ii) a colorant; wherein the toner particles have a volume-based median diameter of 4.3 to 7.0 μm; a domain phase in the binder resin contains a polymer containing a structure... Agent: Konica Minolta Business Technologies, Inc.

20110281213 - Toner, development agent, and image forming method: A toner containing a binder resin comprising a first binder resin A and a second binder resin B, a coloring agent, and a releasing agent, wherein the first binder resin A is formed by reacting a compound A1 having an active hydrogen group with a resin A2 having a portion... Agent:

20110281214 - Developing agent: t

20110281215 - Processes for producing polyester latexes via solvent-based emulsification: A process for making a latex emulsion suitable for use in a toner composition includes contacting at least one amorphous polyester resin with an organic solvent to form a resin mixture, adding a neutralizing agent, and deionized water to the resin mixture, removing the solvent from the formed latex, separating... Agent: Xerox Corporation

20110281216 - Processes for producing polyester latexes via single-solvent-based emulsification: A process for making a latex emulsion suitable for use in a toner composition includes contacting at least one crystalline polyester resin with an organic solvent to form a resin mixture, adding a neutralizing agent, and deionized water to the resin mixture, removing the solvent from the formed latex, and... Agent: Xerox Corporation

20110281217 - Negative photosensitive insulating resin composition and method for patterning using the same: p

20110281218 - Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition: In the formula (1), R1 is a tetravalent organic group; R2 is a divalent organic group; R1s may be the same or different from each other and R2 s may be the same or different from each other in the repeating units; R3 and R4 respectively represent a monovalent organic... Agent: Dai Nippon Printing Co., Ltd.

20110281219 - Apparatus and method for thermally developing flexographic printing elements: A method for developing an imaged and exposed photopolymer printing element is disclosed where the printing element is heated to a temperature sufficient to selectively melt or soften the non-cured portions of the photopolymer such that the softened or melted non-cured photopolymer is removable from the printing element by contacting... Agent:

20110281221 - Applications of semiconductor nano-sized particles for photolithography: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle... Agent: Pixelligent Technologies LLC

20110281220 - Pattern formation method: A first resist film is irradiated with first exposure light and performing first development, thereby forming a first pattern in a first region including an interconnect trench pattern and forming a dummy pattern in a second region connected to the first region and having a pattern density lower than that... Agent:

20110275014 - Exposure mask with double patterning technology and method for fabricating semiconductor device using the same: An exposure mask for forming a G-type active region with a double patterning technology includes a bar shaped first light-blocking pattern to define an I-type active region, and an island shaped second light-blocking pattern to define a bit line contact region. The first light-blocking pattern and the second light-blocking pattern... Agent:

20110275012 - Pellicle: There is provided a pellicle in which the agglutinant, that is, the mask-bonding adhesive, is designed to have a light transmission of no greater than 70 percents; preferably the agglutinant is black in color.... Agent: Shin-etsu Chemical Co., Ltd.

20110275013 - Reflective extreme ultraviolet mask: According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned... Agent: Samsung Electronics Co., Ltd.

20110275015 - Fixing device, image forming apparatus, and fixing method: A disclosed fixing device applying a bubble-like fixing liquid to resin-containing particles adhered to a medium so that the resin-containing particles are fixed to the medium, the bubble-like fixing liquid being formed by transforming a fixing liquid into foam that dissolves or swells at least a part of the resin,... Agent:

20110275016 - Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure: Using a photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing... Agent: Asahi Kasei E-materials Corporation

20110275017 - Method for preparing a printing form: The invention pertains to a method for preparing a printing form from a photosensitive element having a support and a layer of photopolymerizable material adjacent the support. The method includes exposing the photosensitive element through an image mask and through a backside mask, treating the exposed element to form a... Agent: E.i.du Pont De Nemours And Company

20110275018 - Circuit architecture on an organic base and related manufacturing method: A method comprises providing a bottom electrode, depositing, on the bottom electrode, an active material comprising a first structural portion having an absorption peak at a UV wavelength, wherein such first structural portion is photo-activatable at such wavelength and which is constituted by monomers or oligomers that, when irradiated at... Agent: Stmicroelectronics S.r.l.

20110275019 - Hardmask composition having antireflective properties and method of patterning material on substrate using the same: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:... Agent: Cheil Industries, Inc.

20110275020 - Methods of forming photoresist patterns: Methods of forming photoresist patterns may include forming a photoresist layer on a substrate, exposing the photoresist layer using an exposure mask, forming a preliminary pattern by developing the exposed photoresist layer and treating a surface of the preliminary pattern using a treatment agent that includes a coating polymer.... Agent: Samsung Electronics Co., Ltd.

20110275021 - Silver halide photographic light-sensitive material for movie: A silver halide photographic light-sensitive material for movie, having a specific layer structure by using particles of at least one kind of electroconductive metal oxide and at least one kind of an electroconductive polymer.... Agent: Fujifilm Corporation

20110269060 - Photomask: A photomask is provided, with which the roundness of a corner portion of a resist mask can be reduced in a photolithography step. Further, a method for manufacturing a semiconductor device with less variation is provided. A photomask includes an auxiliary pattern at a corner portion of a light-blocking portion,... Agent: Semiconductor Energy Laboratory Co., Ltd.

20110269061 - Developing method: Disclosed is a developing method that performs a developing for forming a second resist pattern after forming and exposing a resist film on a surface of a substrate on which a first resist pattern is formed. The method includes a first process for developing the substrate for a first time... Agent: Tokyo Electron Limited

20110269062 - Phosphate containing photoconductors: A photoconductor that includes, for example, a supporting substrate, an undercoat layer thereover wherein the undercoat layer contains a metal oxide, a phenolic resin, and a phosphate; a photogenerating layer; and at least one charge transport layer.... Agent: Xerox Corporation

20110269064 - Dendritic polyester polyol photoconductors: A photoconductor that includes, for example, a supporting substrate, an undercoat layer thereover wherein the undercoat layer contains a metal oxide a phenolic resin and a dendritic polyester polyol; a photogenerating layer; and at least one charge transport layer.... Agent: Xerox Corporation

20110269063 - Phenolic glycoluril containing photoconductors: A photoconductor that includes, for example, a substrate; an undercoat layer thereover wherein the undercoat layer contains a metal oxide dispersed in a mixture of a phenolic resin and a glycoluril resin; a photogenerating layer; and at least one charge transport layer.... Agent: Xerox Corporation

20110269065 - Fluorescent toner compositions and fluorescent pigments: A fluorescent particle includes a fluorescent pigment, such as a trans-dicarboxylic-indenofluorenone, and at least one stabilizing wax chemically attached to the fluorescent pigment. The stabilizing wax includes an amine group at its terminal end and the fluorescent pigment includes at least one carboxylic acid group, where the amine group reacts... Agent: Xerox Corporation

20110269066 - Bronsted acid compound, manufacturing method of condensation compound, dispersion liquid of condensation compound particles, manufacturing method of electrostatic image developing toner, manufacturing method of binder resin, binder resin, dispersion liqui: f

20110269067 - Method of preparing toner having narrow particle size distribution: According to a method of preparing a toner by emulsion aggregation, viscosity of dispersions is controlled during an initial reaction by using an abietic acid so that a particle diameter distribution of the toner is narrowed.... Agent: Samsung Fine Chemicals Co., Ltd.

20110269068 - Method of preparing toner having narrow particle size distribution: According to preparing toner by emulsion aggregation, viscosity of dispersions is controlled during an initial reaction by using a cellulose derivative and/or a cyclodextrin derivative so that a particle diameter distribution of the toner is narrowed and environmental problems caused by the use of the toner may be reduced.... Agent: Samsung Fine Chemicals Co., Ltd.

20110269069 - Method of charging toner particles: A method of charging toner particles in a liquid toner includes mixing the toner with an acid, and mixing the toner with a base that reacts with the acid to charge the toner particles. The base is added first and the acid subsequently to charge the toner particles with a... Agent:

20110269071 - Actinic ray-sensitive or radiation-sensitive resin composition, chemical amplification resist composition, and resist film and pattern forming method using the composition: An actinic ray-sensitive or radiation-sensitive resin composition of the first invention includes (A1) an acid-decomposable resin, the resin containing three kinds of repeating units each having a specific structure, (B) a photo-acid generator and (C1) a 2-phenylbenzimidazole-based basic compound; an actinic ray-sensitive or radiation-sensitive resin composition of the second invention... Agent: Fujifilm Corporation

20110269072 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same: Provided is an actinic-ray- or radiation-sensitive resin composition excelling in the LWR, pattern collapse performance and DOF, and a method of forming a pattern using the same. The composition according to the present invention contains (A) a resin containing a repeating unit with any of partial structures of general formula... Agent: Fujifilm Corporation

20110269073 - Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer: A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.... Agent: Infineon Technologies Ag

20110269070 - Photoacid generators and photoresists comprising same: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO3− moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons... Agent: Rohm And Haas Electronic Materials LLC

20110269074 - Novel polymers and photoresist compositions: New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in... Agent: Rohm And Haas Electronic Materials LLC

20110269075 - Method of fabricating color filter with flexible substrate: A method of fabricating a color filter includes steps of forming a transparent-matrix on a flexible and transparent substrate for dividing the substrate to a plurality of pixel regions; printing the a plurality of pixel regions with color ink; and curing the ink to form a plurality of color filters... Agent: Hon Hai Precision Industry Co., Ltd.

20110269077 - Method and apparatus for measurement and control of photomask to substrate alignment: A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction minor arrays on the substrate, each diffraction minor... Agent: International Business Machines Corporation

20110269076 - Surface modifying material, method of forming resist pattern, and method of forming pattern: m

20110269078 - Substrate treatment to reduce pattern roughness: A method for patterning a substrate with extreme ultraviolet (EUV) radiation is provided. The method includes contacting a surface of the substrate with at least one surface modification agent that reacts with and bonds to the surface 402 of the substrate 401 to provide a modified surface. A layer of... Agent: Tokyo Electron Limited