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Radiation imagery chemistry: process, composition, or product thereof October categorized by USPTO classification 10/11

20110262844 - Fabrication of high efficiency, high quality, large area diffractive waveplates and arrays: The objective of the present invention is providing a method for fabricating high quality diffractive waveplates and their arrays that exhibit high diffraction efficiency over large area, the method being capable of inexpensive large volume production. The method uses a polarization converter for converting the polarization of generally non-monochromatic and... Agent: Beam Engineering For Advanced Measurement Co.

20110262845 - Method for modulating light of photorefractive composition without external bias voltage: A method for modulating light, comprising the steps of providing a photorefractive composition containing a sensitizer and a polymer, wherein the sensitizer includes at least one selected from the group consisting of anthraquinone, -nitro-9-fluorenone and 2,7-dinitro-9-fluorenone and irradiating the photorefractive composition with a laser. The photorefractive composition provides a grating... Agent: Nitto Denko Corporation

20110262848 - Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server: There is disclosed a manufacturing method for exposure mask, which comprises acquiring a first information showing surface shape of surface of each of a plurality of mask substrates, and a second information showing the flatness of the surface of each of mask substrates before and after chucked on a mask... Agent: Kabushiki Kaisha Toshiba

20110262847 - Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method: A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask manufacturing department, the mask blank manufacturing department provides optical characteristic information (transmittance variation) of the mask blank... Agent: Hoya Corporation

20110262846 - Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device: A before-chucking main surface shape is measured in an actual measurement region of a main surface of a substrate which has been precision-polished and, based on the before-chucking main surface shape of the substrate and a shape of a mask stage (1), an after-chucking main surface shape of the substrate... Agent: Hoya Corporation

20110262849 - Photomask and pattern formation method using the same: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than... Agent: Panasonic Corporation

20110262851 - Electrohphotographic toner: Disclosed is an electrophotographic toner containing a binder resin, a coloring agent, and a release agent, having a volume average particle diameter of 7 μm or less, and having an acid value per unit surface area SAV (mgKOH/m2) of 0.05 or more but not exceeding 0.2.... Agent: Toshiba Tec Kabushiki Kaisha

20110262850 - Toner producing method and toner: There is provided a method for producing a toner that includes encapsulated erasable colored fine particles aggregated with fine particles that contain at least a binder resin and a release agent. The method includes: mixing a dispersion of erasable fine particles with an aggregating agent to form an aggregating agent-containing... Agent: Toshiba Tec Kabushiki Kaisha

20110262852 - Decolorizable electrophotographic toner: A heat-decolorizable toner of an embodiment of the present invention includes a heat-decolorizable color material, a binder resin, and a foaming agent.... Agent: Toshiba Tec Kabushiki Kaisha

20110262853 - Toner, developer, and image forming method: A toner containing a fatty acid having 6 to 22 carbon atoms, and a binder resin, wherein the toner is obtained by a method for producing a toner, which contains dissolving or dispersing in an organic solvent the fatty acid having 6 to 22 carbon atoms, and a toner material... Agent:

20110262854 - Electrophotographic toner: Disclosed is a toner having a controlled micro/semimacro roughness ratio, such that the toner surface has a ratio of {an average of an arithmetic average height (Ra) in a 0.5 μm-square region} to {an average of an arithmetic average height (Ra) in a 1 μm-square region} of 0.5 or more.... Agent: Toshiba Tec Kabushiki Kaisha

20110262857 - Electrophotographic toner: An electrophotographic toner contains an electron donating color developable agent, an electron accepting color developing agent, and a polyester resin binder which is a polyester resin obtained by polycondensation of a carboxylic acid component and an alcohol component and has a crosslinked structure formed of a crosslinking component including at... Agent: Toshiba Tec Kabushiki Kaisha

20110262855 - Toner compositions: The present disclosure relates to a binder resin system suitable for use in forming toner compositions. In embodiments, the binder resin system includes at least one amorphous resin, at least one crystalline resin, and at least one fatty acid salt. The presence of the fatty acid salt reduces plasticization which... Agent: Xerox Corporation

20110262856 - Toner containing crystalline polyester: A toner including a binder resin which contains a crystalline polyester resin and a non-crystalline polyester resin, wherein the crystalline polyester resin has at least two diffraction peaks in a range of 20°<2θ<25° as detected by X-ray diffraction measurement, and has a melting point which is 60° C. or higher... Agent:

20110262858 - Toner containing metallic flakes and method of forming metallic image: The present invention relates to a porous toner particle with encapsulated metallic flakes. The porous particle containing metallic flakes can be useful for reproduction of a metallic hue upon fusing to a substrate, preferably golden or silvery hue, and for manufacturing of printed circuits, by a printing process, especially electrophotography.... Agent:

20110262860 - Novel dual-tone resist formulations and methods: Dual tone photoresist formulations comprising a photoacid generator are described and employed in fabrication techniques, including methods of making structures on substrates, and more particularly, methods of making electronic devices (e.g. transistors and the like) on flexible substrates wherein two patterns are formed simultaneously in one layer of photoresist.... Agent: Board Of Regents, The University Of Texas

20110262861 - Photosensitive composition: Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps.... Agent: Rohm And Haas Electronic Materials LLC

20110262859 - Upper layer-forming composition and resist patterning method: An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0... Agent: Jsr Corporation

20110262862 - Near-infrared absorptive layer-forming composition and multilayer film: A composition comprising (A) a near-infrared absorbing dye of formula (1), (B) a polymer, and (C) a solvent is used to form a near-infrared absorptive layer. In formula (1), R1 and R2 are a monovalent hydrocarbon group which may contain a heteroatom, k is 0 to 5, m is 0... Agent:

20110262863 - Near-infrared absorptive layer-forming composition and multilayer film: A near-infrared absorptive layer is formed from a composition comprising (A) an acenaphthylene polymer, (B) a near-infrared absorbing dye, and (C) a solvent. When a multilayer film comprising the near-infrared absorptive layer and a photoresist layer is used in optical lithography, the detection accuracy of optical auto-focusing is improved, allowing... Agent:

20110262864 - Method of forming resist pattern and negative tone-development resist composition: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110262865 - Radiation-sensitive resin composition and polymer: m

20110262866 - Exposure apparatus and device manufacturing method: An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean... Agent: Canon Kabushiki Kaisha

20110262869 - Method of aligning photomask with base material and method of manufacturing printed circuit board: An exposure system includes an exposure device and an image processing device. The exposure device includes a plurality of cameras. Each of the cameras is configured so as to be selectively set to a full scan mode and a partial scan mode. The camera transmits all of obtained image data... Agent: Nitto Denko Corporation

20110262867 - Method of creating an evaluation map, system, method of manufacturing a semiconductor device and computer program product: According to one embodiment, evaluation map creating method is disclosed. The method determines number (N) of times on changing division starting position of layout for segmenting the layout into areas M to create the map by segmenting the layout into areas m and obtaining evaluation value v corresponding to area... Agent:

20110262868 - Method of detecting alignment mark and method of manufacturing printed circuit board: When an alignment mark does not exist within an area of an image obtained by a camera, the coordinate of the alignment mark is calculated based on an identification mark existing in the area of the image and a previously stored positional relationship between the alignment mark and the identification... Agent: Nitto Denko Corporation

20110262871 - Novel tarc material for immersion watermark reduction: Various lithography methods are disclosed herein. In an example, a method includes forming a resist layer over a substrate; forming a coating material layer that includes one of an acid and a chelate compound over the resist layer; and exposing the resist layer and the coating material layer to radiation,... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110262870 - Purge ring with split baffles for photonic thermal processing systems: A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region. The first layer and the second layer define a first plenum and a first baffle. The... Agent:

20110262872 - Method of forming resist pattern and resist composition: There are provided a method of forming a resist pattern in which a resist pattern is formed on top of a substrate by using a chemically amplified resist composition and conducting patterning two or more times, the method being capable of reducing the extent of damage, caused by the second... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110256473 - Mask blank substrate set and mask blank set: A substrate set is a mask blank substrate set including a plurality of substrates each for use in a mask blank for producing a photomask to be chucked on a mask stage of an exposure apparatus. In each of the substrates in the mask blank substrate set, a main surface,... Agent: Hoya Corporation

20110256475 - Imaging members having a novel slippery overcoat layer: The presently disclosed embodiments relate in general to electrophotographic imaging members which include a protective overcoat layer comprising specific low surface energy polycarbonates of excellent optical clarity and having a slippery and adhesive surface to impact toner image transfer efficiency to receiving papers and effect contact friction reduction by which... Agent: Xerox Corporation

20110256474 - Imaging members having stress/strain free layers: The presently disclosed embodiments relate in general to electrostatography comprising improved features in the flexible imaging member that enhance function when used in the electrostatographic imaging system. These embodiments pertain, more particularly, to a structurally simplified curl-free flexible electrostatographic imaging member belt containing a stress/strain free ground strip layer and... Agent: Xerox Corporation

20110256476 - Toner for developing electrostatic image and manufacturing method thereof: A toner for developing electrostatic image comprising a toner particle containing a binding resin is disclosed. which, and In the toner the binding resin has a domain-matrix structure composed of a high elastic resin composing a domain and a low elastic resin composing a matrix, an arithmetic mean value of... Agent: Konica Minolta Business Technologies, Inc.

20110256477 - Toner: t

20110256478 - Method for printing of a recording: In a method or system for printing of a recording medium, potential images of images to be printed are generated on a potential image carrier. The potential images are developed into an image film comprising image regions and non-image regions on the potential image carrier via application of a liquid... Agent:

20110256479 - Image forming method: An image forming method is disclosed, comprising transferring and fixing steps, wherein fixing is performed by a fixing device in which at least one of a heating member and a pressing member comprises an endless belt entrained about plural rollers, and the heating member and the pressing member are pressed... Agent: Konica Minolta Business Technologies, Inc.

20110256480 - Toner: An object of the present invention is to provide a toner which allows fixation at low temperatures, which is excellent in anti-offset ability, and which provides a high quality image at high and low humidities in a stable manner without causing any image defect over time. Provided is a toner,... Agent: Canon Kabushiki Kaisha

20110256481 - Photoresists and methods of use thereof: New photoresist are provided that comprises a low-Tg component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit good adhesion to underlying inorganic surfaces such as SiON, silicon oxide, silicon nitride and other inorganic surfaces.... Agent: Rohm And Haas Electronic Materials LLC

20110256482 - Photosensitive resin composition, method of manufacture thereof and articles including the same: Provided herein is a photosensitive resin composition which is patternable and exhibits adhesion even after being crosslinked. The photosensitive resin composition includes a (meth)acryl-based polymer having a carboxyl group and a reactive double bond on a side chain and having a specific acid value and a specific content of reactive... Agent: Samsung Electronics Co., Ltd.

20110256483 - Residue removing liquid composition and method for cleaning semiconductor element using same: The residue removing liquid composition contains (A) ammonium fluoride, (B) methanesulfonic acid, (C) a carbon-carbon triple bond-having compound, (D) a water-soluble organic solvent, and (E) water, wherein the content of (A), (C), (D) and (E) in the residue removing liquid composition is from 0.005 to 2% by mass, from 0.1... Agent: Mitsubishi Gas Chemical Company, Inc.

20110256484 - Method for producing comb-shaped electrode: To provide a method for producing a comb-shaped electrode capable of precisely carrying a large amount of active materials on a surface of current collectors with a fine shape. The method for producing comb-shaped electrodes 1a, 1b of the present invention includes a current collector forming step of forming a... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110256485 - Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same: An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate... Agent:

20110256486 - Photolithography focus improvement by reduction of autofocus radiation transmission into substrate: An anti-reflective coating material, a microelectronic structure that includes an anti-reflective coating layer formed from the anti-reflective coating material and a related method for exposing a resist layer located over a substrate while using the anti-reflective coating layer provide for attenuation of secondary reflected vertical alignment beam radiation when aligning... Agent: International Business Machines Corporation

20110250527 - Mask layout: A mask layout is disclosed. The mask layout includes a mask body, a mask pattern disposed on a surface of the mask body, and a cover disposed on the mask body. Preferably, the mask body and the cover include a medium therebetween and the cover includes no filter.... Agent:

20110250528 - Method for correcting image placement error in photomask: A method for correcting an image placement error in a photomask includes, forming a photomask including a light absorbing layer formed on a frame region of a substrate and a mask pattern formed on a field region inside the frame region, measuring a first registration error of the photomask, and... Agent: Hynix Semiconductor Inc.

20110250529 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank is for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift portion adapted to give a predetermined phase difference to transmitted exposure light. The phase shift portion is a dug-down part that is dug down from a surface of the light-transmitting substrate... Agent: Hoya Corporation

20110250530 - Semiconductor devices and methods of manufacturing thereof: Semiconductor devices and methods of manufacturing thereof are disclosed. A plurality of features is formed on a workpiece, the plurality of features being located in a first region and a second region of the workpiece. Features in the first region have a first lateral dimension, and features in the second... Agent: Infineon Technologies Ag

20110250531 - Photosensitive resin composition for color filter, and color filter using the same: m

20110250532 - Method of lifting off and fabricating array substrate for liquid crystal display device using the same: A method of lifting off includes forming a first material layer on a substrate; forming a photoresist pattern including first and second holes and on the first material layer; patterning the first material layer using the photoresist pattern as a patterning mask to form a material pattern having first and... Agent:

20110250533 - Toner for electrostatic image developer, process cartridge and image forming apparatus: To provide a toner for an electrostatic image developer, including: a core particle obtained by dispersing, in an aqueous medium, an oil phase prepared by dissolving or dispersing at least a binder resin, a colorant and a release agent in an organic solvent; and a shell layer formed of vinyl... Agent:

20110250534 - Solubilizer for metal ions: The invention relates to solubilizers for metal ions and poorly soluble metal compounds, containing an oxidation product of starch hydrolysate as a solubilizing agent, to a method for solubilizing metal ions and to the use of said solubilizer.... Agent: Suedzucker Aktiengesellschaft Mannheim/ochsenfurt

20110250536 - Imaging processes: The present disclosure provides processes for producing images with toner particles. In embodiments, toner particles of a certain diameter in size are applied to a substrate as an incomplete monolayer, and then fused to form an image that is a complete monolayer and possesses a thickness less than the diameter... Agent: Xerox Corporation

20110250535 - Toner compositions and processes: The present disclosure provides processes for producing polyester toners by emulsion aggregation where the resulting toner particles have high pigment loadings and desired circularity. The methods include adding a metal, in embodiments a metal compound, at the beginning of coalescence, which speeds the coalescence process and produces toner particles having... Agent: Xerox Corporation

20110250537 - Cholate photoacid generators and photoresists comprising same: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.... Agent: Rohm And Haas Electronic Materials LLC

20110250539 - Fluorinated monomer, polymer, resist composition, and patterning process: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived... Agent:

20110250538 - Photoacid generators and photoresists comprising same: New methods are provided for synthesis of photoacid generator compounds (“PAGs”), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.... Agent: Rohm And Haas Electronic Materials LLC

20110250540 - Semiconductor lithography process: A semiconductor lithography process. A photoresist film is coated on a substrate. The photoresist film is subjected to a flood exposure to blanket expose the photoresist film across the substrate to a first radiation with a relatively lower dosage. The photoresist film is then subjected to a main exposure using... Agent:

20110250541 - Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern: To provide a pattern forming method, which contains: forming a first resist pattern on a processing surface using a first resist composition; forming a coating layer using a coating material so as to cover a surface of the first resist pattern; applying a second resist composition over the first resist... Agent: Fujitsu Limited

20110250544 - Bottom antireflective coating compositions: Antireflective coating compositions are discussed.... Agent: Az Electronic Materials Usa Corp.

20110250543 - Pattern forming method: A pattern forming method, includes: (i) a step of applying a resist composition whose solubility in a positive tone developer increases and solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation, the resist composition containing a resin capable of increasing a polarity by the... Agent: Fujifilm Corporation

20110250542 - Sulfonyl photoacid generators and photoresists comprising same: New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.... Agent: Rohm And Haas Electronic Materials LLC

20110250545 - Composition, process of preparation and method of application and exposure for light imaging paper: The present invention provides dual energy imaging compositions, processes for forming dual energy imaging compositions, methods for forming images using dual energy imaging compositions and substrate (e.g., paper web) treated (e.g., coated) on one or both sides with a dual energy imaging composition. Also provided is a particulate comprising a... Agent: International Paper Comapny

20110244378 - Device and method for providing wavelength reduction with a photomask: Disclosed is a photomask having a wavelength-reducing material that may be used during photolithographic processing. In one example, the photomask includes a transparent substrate, an absorption layer having at least one opening, and a layer of wavelength-reducing material (WRM) placed into the opening. The thickness of the WRM may range... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110244377 - Fluorine-passivated reticles for use in lithography and methods for fabricating the same: Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through... Agent: Advanced Micro Devices, Inc.

20110244373 - Mask blank, transfer mask, and methods of manufacturing the same: In a mask blank for manufacturing a transfer mask adapted to exposure light having a wavelength of 200 nm or less, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a... Agent: Hoya Corporation

20110244375 - Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device: In a mask blank for manufacturing a transfer mask, the mask blank has a light-shielding film on a transparent substrate. The light-shielding film is made of a material containing tantalum as a main metal component and includes a highly oxidized layer which has an oxygen content of 60 at %... Agent: Hoya Corporation

20110244379 - Method for forming convex pattern, exposure apparatus and photomask: The present invention is a photomask 3 for exposing a substrate coated with a positive photosensitive material. At least a first mask pattern group 16 and a second mask pattern group 17 are formed on a transparent substrate at a predetermined arrangement pitch. The first mask pattern group 16 has... Agent:

20110244374 - Methods of correcting optical parameters in photomasks: A method of correcting an optical parameter in a photomask is provided. The method includes providing a photomask, exposing the photomask, detecting an aerial image to estimate the photomask, and irradiating gas cluster ion beams to the photomask based on an estimation result to correct the optical parameter in the... Agent: Samsung Electronics Co., Ltd.

20110244376 - Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method: A method of fabricating a photomask may include forming a light-shielding layer and a first resist film on a substrate, forming a first resist pattern by exposing first exposed regions of the first resist film to a first exposure source that may have a first energy, forming a first light... Agent: Samsung Electronics Co., Ltd.

20110244380 - Image forming apparatus and image forming method: According to one embodiment, an image forming apparatus includes: an image forming unit configured to form a toner image on an image bearing member according to printing information; a transfer unit configured to transfer an unfixed toner image formed by the image forming unit onto a printing sheet; a fixing... Agent: Toshiba Tec Kabushiki Kaisha

20110244381 - Electrophotographic photoconductor, manufacturing method thereof, and electrophotographic device: Provided is an electrophotographic photoconductor that has good coating solution stability and metal oxide dispersibility, is free of image defects including ground fogging and black spots, and affords good image characteristics in various environments, as well as a manufacturing method therefore and a device including the same. The electrophotographic photoconductor... Agent: Fuji Electric Systems Co., Ltd.

20110244382 - Hydrophobic silica particles and method of producing same: Hydrophobic silica particles are produced by reacting them with a hydrosiloxane agent.... Agent:

20110244383 - Toner, and method for producing the same: A toner including an amorphous resin (R), a crystalline material (A) which is compatible with the amorphous resin (R) and has a melting point of 80° C. or lower, a resin (I) which is different from the amorphous resin (R), and a colorant, wherein the crystalline material (A) is capsulated... Agent:

20110244384 - Carbon black granulate, method for producing carbon black granulate, and use thereof: The invention relates to carbon black granulates having an APC value, measured at a conveying speed of 8 m/s and a solid load of 27 g/kg, less than or equal to 20 and a 25 [mu]m pressure filter value of less than 5 bar cm2/g. The carbon black granulate is... Agent: Evonik Carbon Black Gmbh

20110244386 - Toner and toner particle producing method: A toner includes a toner particle, which contains at least a binding resin, a colorant, and two types of polar resins, i.e., a polar resin H and a polar resin L, and which is obtained with granulation in a water-based medium, wherein solubility parameters, glass transition points, and weight-average molecular... Agent: Canon Kabushiki Kaisha

20110244385 - Water-based pigment preparations: The invention relates to aqueous pigment preparations containing (A) at least one organic and/or inorganic pigment, (B) a dispersant of formula (I) or (II), or mixtures of the dispersants of formula (I) and (II), (C) optionally wetting agents, (D) optionally other surfactants and/or dispersants, (E) optionally one or more organic... Agent:

20110244387 - Low-surface area fumed silicon dioxide powder: Fumed silicon dioxide powder with a BET surface area of 20 to 35 m2/g, characterized in that a) the number-based median particle diameter is 60 to 150 nm, and b) the proportion of particles with a diameter of 200 nm or more is at most 10%, and c) the proportion... Agent: Evonik Degussa Gmbh

20110244389 - Ferrite carrier core material for electrophotographic developer, ferrite carrier for electrophotographic developer and methods for producing the ferrite carrier core material and the ferrite carrier, and electrophotographic developer using the ferrite car: Disclosed are a ferrite carrier core material for an electrophotographic developer including a ferrite particle having an apparent density of 2.30 to 2.80 g/cm3, a BET specific surface area of 0.09 to 0.70 m2/g and an average degree of circularity of 0.90 or more, wherein the Cl concentration of the... Agent: Powdertech Co., Ltd.

20110244388 - Resin-coated carrier for electrophotographic developer, and electrophotographic developer using the resin-coated carrier: There is provided a resin-coated carrier for an electrophotographic developer, including: a carrier core particle; and a coating resin layer comprising a silicone resin or a modified silicone resin formed on a surface of the carrier core particle, wherein a titanium-ethyl acetoacetate chelate or a titanium-octylene glycol chelate is contained... Agent: Powdertech Co., Ltd.

20110244390 - Donor element with maleic anhydride based polymers for thermal transfer: This invention pertains to a donor element for use with a receiver element in an imagable assemblage for light-induced transfer of material from the donor element to the receiver element. Specifically, this invention relates to such a donor element comprising a copolymer based on styrene and maleic anhydride.... Agent:

20110244391 - Composition and method for reducing pattern collapse: A radiation-sensitive composition and method for using the composition to reduce the probability of pattern collapse is provided. The radiation-sensitive composition includes a bulk matrix of radiation-sensitive material with a base-reactive, surface-modifying agent dispersed throughout the matrix. The base-reactive, surface-modifying agent is reactive to hydroxide and increases the surface hydrophobicity... Agent: Tokyo Electron Limited

20110244394 - Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method: Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of... Agent: Daicel Chemical Industries, Ltd.

20110244393 - Photosensitive resin composition and method for producing liquid discharge head: A method for producing a liquid discharge head having a flow path wall member which includes walls of a liquid flow path communicating with discharge ports that discharge a liquid includes: preparing a substrate having a resin layer formed from a resin composition containing a polyhydroxystyrene-based resin in which the... Agent: Canon Kabushiki Kaisha

20110244392 - Positive resist composition, method of forming resist pattern and polymeric compound: A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A′) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110244395 - Apparatus and method for haze control in a semiconductor process: A method for haze control in a semiconductor process, includes: providing an exposure tool with a photocatalyzer coating inside and exposing a wafer in the exposure tool in the presence of activation of the photocatalyzer coating. The photocatalyzer coating may be formed within an opaque region of a reticle.... Agent:

20110244396 - Exposure apparatus, exchange method of object, exposure method, and device manufacturing method: A first carrier unit carries out a substrate tray that supports a substrate from below from a substrate holder by sliding the substrate tray in one axis direction (Y-axis direction) parallel to the substrate surface. Meanwhile, a second carrier unit carries in a substrate tray that supports a substrate subject... Agent: Nikon Corporation

20110244397 - Methods of fabricating a microarray: f

20110244398 - Patterning method: A patterning method is provided. First, a first mask layer, a second mask layer and a patterned photoresist layer are sequentially formed on a target layer. Thereafter, the second mask layer is etched by using the patterned photoresist layer as a mask, so as to form a patterned second mask... Agent: United Microelectronics Corp

20110244399 - Method of forming resist pattern and negative tone-development resist composition: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110244400 - Norbornene-type polymers, compositions thereof and lithographic process using such compositions: Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers... Agent: Sumitomo Bakelite Co., Ltd.

20110244401 - Reduced pitch multiple exposure process: A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form an image having enhanced resolution.... Agent: Asml Netherlands B.v.

20110244402 - Method of slimming radiation-sensitive material lines in lithographic applications: A method and system for patterning a substrate using a radiation-sensitive material is described. The method and system include forming a layer of radiation-sensitive material on a substrate, exposing the layer of radiation-sensitive material to a pattern of radiation, and then performing a post-exposure bake following the exposing. The imaged... Agent: Tokyo Electron Limited

20110244403 - Method of slimming radiation-sensitive material lines in lithographic applications: A method and system for patterning a substrate using a radiation-sensitive material is described. The method and system include forming a layer of radiation-sensitive material on a substrate, exposing the layer of radiation-sensitive material to a pattern of radiation, and then performing a post-exposure bake following the exposing. The imaged... Agent: Tokyo Electron Limited

20110244404 - Photoresist processing methods: A photoresist processing method includes treating a substrate with a sulfur-containing substance. A positive-tone photoresist is applied on and in contact with the treated substrate. The method includes selectively exposing a portion of the photoresist to actinic energy and developing the photoresist to remove the exposed portion and to form... Agent: Micron Technology, Inc.