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Radiation imagery chemistry: process, composition, or product thereof August inventions list 08/11

20110207029 - Media for volume-holographic recording based on self-developing polymer: The present invention relates to novel self-developing films for incorporation of volume holograms by exposure, a method for production thereof and the use thereof.... Agent: Bayer Materialscience Ag

20110207034 - Matching method of pattern layouts from inverse lithography: The present invention relates to a matching method of pattern layouts from inverse lithography, which makes the pattern cells in the same groups identical to avoid a repeated verification and to improve the yield. The method comprises the step of: analyzing a target designed layout by hierarchy; categorizing the pattern... Agent: Nanya Technology Corp.

20110207033 - Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers: A photo mask blank structure for transferring a mask to an integrated circuit includes a transparent substrate, which has a surface region. The photo mask structure further includes an opaque film overlying the surface region, a negative photoresist material overlying the opaque film, a stop layer overlying the negative photoresist... Agent: Semiconductor Manufacturing International (shanghai) Corporation

20110207032 - Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film: The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the... Agent: Hoya Corporation

20110207030 - Pellicle for lithography and method for manufacturing pellicle film: Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to... Agent: Shin-etsu Chemical Co., Ltd.

20110207031 - Substrate processing method, manufacturing method of euv mask, and euv mask: According to the substrate processing method in the embodiments, as a mask substrate used for forming an EUV mask, a mask substrate in which a first film having a first hydrophilicity is formed on one main surface and a resist is applied to another main surface is exposed from a... Agent:

20110207035 - Exposure apparatus and exposure method: An exposure apparatus includes an exposure unit selectively performing exposure on a resist layer with a first laser beam, focused by a lens system, in a pattern including pits and lands arranged in a scanning direction; a detecting unit detecting a reflection of a second laser beam applied through the... Agent: Sony Dadc Corporation

20110207036 - Electrophoretic particle salt for electrophoretic display and method of making: An electrophoretic particle salt that includes a cationic electrophoretic particle and an anionic group ionically associated with the cationic electrophoretic particle is employed in an electrophoretic display. A spacer group chemically bonds a cationic moiety to a surface of the electrophoretic particle. A method of making the electrophoretic particle salt... Agent:

20110207037 - Method for forming full color image and full color image forming apparatus: Disclosed is a manufacturing method for forming a full color image and an apparatus for forming a full color image exhibiting excellent color chroma for a secondary color and extension of a color reproduction area in a range of red to orange color. A method for forming a full color... Agent: Konica Minolta Business Technologies, Inc.

20110207041 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: The present invention provides an electrophotographic photoreceptor including at least an electroconductive substrate and a photosensitive layer provided on or above the electroconductive substrate, wherein an outermost layer of the electrophotographic photoreceptor is a layer composed of a cured film of a composition including at least one of compound having... Agent: Fuji Xerox Co., Ltd.

20110207039 - Electrophotographic photoreceptor, process cartridge, image forming apparatus, cured film, and organic electroluminescent device: An electrophotographic photoreceptor is disclosed, in which an outermost surface layer of the electrophotographic photoreceptor is made of a cured film of a composition including a compound represented by the following Formula (M1) and a charge transporting material having a chain polymerizable functional group:... Agent: Fuji Xerox Co., Ltd.

20110207040 - Image holding member for image forming apparatus, process cartridge, and image forming apparatus: wherein in Formula (II-2), Ar represents a substituted or unsubstituted phenyl group, a substituted or unsubstituted monovalent polynuclear aromatic hydrocarbon group having from 2 to 10 aromatic rings, a substituted or unsubstituted monovalent condensed aromatic hydrocarbon group having from 2 to 10 aromatic rings, or a substituted or unsubstituted monovalent... Agent: Fuji Xerox Co., Ltd.

20110207038 - Slippery surface imaging members: A flexible imaging member comprising a slippery charge transport layer including a novel low surface energy polymer binder and a charge transport compound in the layer. In specific embodiments, the novel low surface energy polymer binder in the charge transport layer is a bisphenol A polycarbonate containing short polysiloxane segments... Agent: Xerox Corporation

20110207042 - Phenolic urea hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, an undercoat layer thereover wherein the undercoat layer contains a metal oxide dispersed in a mixture of a urea formaldehyde resin and a phenolic formaldehyde resin; a photogenerating layer; and at least one charge transport layer.... Agent: Xerox Corporation

20110207043 - Gallium phthalocyanine compound, and image bearing member, image forming method, image forming apparatus, and process cartridge using the gallium phthalocyanine compound: where X represents a substituted or non-substituted alkyl group, a substituted or non-substituted alkenyl group, a substituted or non-substituted alkynyl group, a substituted or non-substituted aralkyl group, a substituted or non-substituted cycloalkyl group, a substituted or non-substituted aryl group, or a hydrogen atom, where substitution groups thereof are an alkoxy... Agent:

20110207044 - Tunable gloss toners: The present disclosure provides toners having a tunable gloss level, electrophotographic apparatuses for using such toners as well as processes for making such toners.... Agent: Xerox Corporation

20110207045 - Toner for electrostatic latent image development and production method thereof: A toner for electrostatic latent image development is disclosed, comprising a binder resin which comprises a resin A comprising a copolymer comprised of at least a styrenic monomer unit and a (meth)acrylic monomer unit and a resin B comprising a copolymer comprised of at least a methacrylate monomer unit and... Agent: Konica Minolta Business Technologies, Inc.

20110207046 - Toner compositions and processes: wherein each n independently represents an integer of 1 to about 20 and x and y represent respective ratios of respective monomeric units and x ranges from about 0 to about 1000 and y ranges from about 0 to about 300; adding a colorant, a coagulant, and optionally a wax... Agent: Xerox Corporation

20110207047 - Antireflective hardmask composition and a method of preparing a patterned material using same: An antireflective hardmask composition layer including a polymer having Si—O and non-silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.... Agent: International Business Machines Corporation

20110207049 - Asymmetric photo-patternable sol-gel precursors and their methods of preparation: Described herein are photo-patternable sol-gel precursors and their methods of preparation. The sol-gel precursors are thermally stable and form compositions that have high refractive indices and low optical loss values. The precursors can be used to make sol-gel compositions that are ideally suited toward optical waveguide applications in the realm... Agent: Nito Denko Corporation

20110207048 - Method of producing electrical component, electrical component production device, and photosensitive resist: A method of producing an electrical component includes the steps of: selectively forming a powder containing organic layer containing conductive powders on an exposed surface of a first conductive member exposed through an opening portion formed in an insulation film; and thermally processing the powder containing organic layer to agglutinate... Agent:

20110207050 - Storage medium, reproducing method, and recording method: According to one embodiment, a write-once type information storage medium comprises a recording layer which is formed by mixing a plurality of organic dye based recording materials whose molecular weights are different from each other, and wherein a mixture ratio of organic dye based recording materials whose molecular weight is... Agent:

20110207052 - Sulfonamide-containing photoresist compositions and methods of use: Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as... Agent: Central Glass Co., Ltd

20110207051 - Sulfonamide-containing topcoat and photoresist additive compositions and methods of use: Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in... Agent: Central Glass Co., Ltd

20110207053 - Exposure method and method of making a semiconductor device: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating... Agent: Fujitsu Semiconductor Limited

20110207054 - Self-aligned, sub-wavelength optical lithography: Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending therethrough. At least a portion of the region of photoresist is then exposed to a... Agent:

20110207055 - Fabricating method for touch screen panel: In a fabricating method of a touch screen panel, a conductive layer and an insulating layer are sequentially formed on a same surface of a transparent substrate. The conductive layer and the insulating layer are co-patterned using a halftone mask to form first connection patterns having separated patterns and the... Agent: Samsung Mobile Display Co., Ltd.

20110207056 - Contact or proximity printing using a magnified mask image: Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended through the use of phase-shifting masks, off-axis illumination, and proximity effect correction. More recently, liquid immersion lithography has been proposed as... Agent:

20110207057 - Edge smoothness with low resolution projected images for use in solid imaging: A solid imaging apparatus and method employing sub-pixel shifting in multiple exposures of the digitally light projected image of a cross-section of a three-dimensional object on a solidifiable liquid medium. The multiple exposures provide increased resolution, preserving image features in a three-dimensional object and smoothing out rough or uneven edges... Agent: 3d Systems, Inc.

20110207058 - Method for developing three dimensional surface patterns for a papermaking belt: A process for making an image for a papermaking belt wherein the image is the product of: (a) providing an image, said image being a simple geometric figure; (b) performing a first alpha image modification algorithm on said image; (c) performing a first beta image modification algorithm upon said image... Agent:

20110200918 - Photosensitive composition for volume hologram recording and producing method thereof: A photosensitive composition (I) for volume hologram recording includes a binder polymer (A), a photo-induced cationically polymerizable compound (B), a photoinitiator (C), and a sensitizing dye (D), in which the binder polymer (A) is a polymer containing naphthalene rings and having a weight-average molecular weight of 1×104 to 100×104. A... Agent:

20110200919 - Chemically amplified positive resist composition and pattern forming process: A chemically amplified positive resist composition is provided comprising a polymer PB having an amine structure bound thereto and a polymer PA comprising recurring units having an acidic side chain protected with an acid labile protective group and recurring units having an acid generating moiety on a side chain.... Agent:

20110200920 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography having a reflective layer for reflecting EUV light, an absorbing layer for absorbing EUV light and a low-reflective layer with respect to a mask pattern inspection light (wavelength: 190 to 260 nm), which are formed in this order on a substrate, wherein the... Agent: Asahi Glass Company, Limited

20110200921 - Pigment dispersion composition, color resist composition including the same, and color filter using the same: The present invention related to a pigment dispersion composition, a color resist composition including the same, and a color filter fabricated by using the color resist composition. The pigment dispersion composition includes [A] a pigment, [B] a dispersing agent, [C] a cardo-based binder resin, and [D] a solvent.... Agent: Cheil Industries Inc.

20110200922 - Lithographic apparatus and method: Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate... Agent: Asml Netherlands B.v.

20110200923 - Substrate treatment method: A substrate treatment method including a first treatment process (S13 to S16) for exposing, heating, and developing a substrate on which a first resist is formed, thereby forming a first resist pattern, and a second treatment process (S17 to S20) for forming a second resist film on the substrate on... Agent: Tokyo Electron Limited

20110200924 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; a photosensitive layer; a crosslinked surface layer comprising α-alumina and tin oxide, wherein a first one-dimensional data array obtained from measuring a concavo-convex shape of the surface of the photoreceptor is subjected to a wavelet conversion to be separated into 6 frequency components,... Agent: Ricoh Company, Ltd.,

20110200925 - Image bearing member, image forming method, image forming apparatus, and process cartridge: where R1, R2, R5, and R6 independently represent a hydrogen atom, a substituted or non-substituted alkyl group, an alkoxy group, a substituted or non-substituted aromatic hydrocarbon group, a halogen atom, and nitro group, and k represents an integer of 1 to 4, and l, n, and p represent integers of... Agent:

20110200926 - Electrophotographic photoconductor, image forming method, image forming apparatus, and process cartridge: e

20110200927 - Electrophotographic toner: An electrophotographic toner, a method of preparing the electrophotographic toner, and an image forming apparatus using the electrophotographic toner. The electrophotographic toner includes a binder resin, a colorant, a releasing agent, and a spherical metal nanoparticle having a volume average diameter of about 10 to about 100 nm.... Agent: Samsung Electronics Co., Ltd

20110200928 - Method for producing toner, toner, and image forming method using the same: A method for producing a toner, including: dispersing toner particles containing at least a binder resin in a first aqueous medium so as to produce an aqueous dispersion; and subjecting the aqueous dispersion to heat treatment, wherein the electric conductivity of the aqueous dispersion after the heat treatment is higher... Agent:

20110200930 - Processes for producing polyester latexes via solvent-based and solvent-free emulsification: A process for making a latex emulsion suitable for use in a toner composition includes contacting at least one polyester resin optionally with an organic solvent to form a resin mixture, adding a primary amine, optionally a surfactant, and deionized water to the mixture.... Agent: Xerox Corporation

20110200929 - Electrostatic image developing toner and two-component developer: The present invention provides an electrostatic image developing toner capable of improving the dispersibility of wax in the toner and superior in offset resistance and in storageability (heat-resistant storageability) at high temperatures, and a two-component developer which uses this electrostatic image developing toner. The electrostatic image developing toner includes: a... Agent:

20110200931 - Polyester resin for toner, toner composition and resin particle: A polyester resin for toners which is obtained by polycondensing a polyol component and a polycarboxylic acid component is characterized by containing 20-100 weight % of one or more polyester resins (A1) having a storage elastic modulus from 2.5×103 Pa to 5×106 Pa at 150° C. wherein the molar average... Agent: Sanyo Chemical Industries, Ltd

20110200932 - Raised letter printing using large yellow toner particles: Electrophotographic printing of one or more layers of toner to enable the printing of a wide range of toner mass laydown using electrophotography to produce prints with raised letters. This method encompasses the steps of forming multicolor toner images and fusing the print one or more times to create the... Agent:

20110200933 - Raised printing using small toner particles: Electrophotographic printing of one or more layers of toner to enable the printing of a wide range of toner mass laydown using electrophotography to produce prints with raised letters. This method encompasses the steps of forming multicolor toner images and fusing the print one or more times to create the... Agent:

20110200934 - Method of producing heat-sensitive transfer image-receiving sheet having a lenticular lens: A method of producing a heat-sensitive transfer image-receiving sheet, having the steps of: conveying a transparent support by web handling; providing at least one receptor layer on the transparent support; and drying the heat-sensitive transfer image-receiving sheet, in which the at least one receptor layer contains a latex polymer having... Agent: Fujifilm Corporation

20110200935 - Photoresist composition: wherein R1 and R2 independently represent a hydrogen atom, a C1-C12 aliphatic hydrocarbon group, a C3-C20 saturated cyclic hydrocarbon group, a C6-C20 aromatic hydrocarbon group or a C7-C21 aralkyl group, and the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group can have... Agent: Sumitomo Chemical Company, Limited

20110200937 - Positive photosensitive resin composition for spray coating and method for producing through electrode using the same: The present invention provides a positive photosensitive resin composition for spray coating, which comprises an alkali-soluble resin, a compound which generates an acid when exposed to light and a solvent, and which has a viscosity of 0.5 to 200 cP. By using the positive photosensitive resin composition, it is possible... Agent: Sumitomo Bakelite Co., Ltd.

20110200936 - Salt and photoresist composition containing the same: wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having... Agent: Sumitomo Chemical Company, Limited

20110200938 - Antireflective compositions and methods of using same: wherein U1 and U2 are independently a C1-C10 alkylene group; V is selected from a C1-C10 alkylene, arylene and aromatic alkylene; W is selected from H, C1-C10 alkyl, aryl, alkylaryl and V—OH; Y is selected from H, W, and U3C(O)OW, wherein U3 is independently a C1-C10 alkylene group, and m... Agent:

20110200939 - Polyamic acid, polyimide, photosensitive resin composition comprising the same and dry film manufactured by the same: The present invention relates to a polyamic acid or polyimide comprising a heat-polymerizable or photo-polymerizable functional group, a photosensitive resin composition comprising the polyamic acid or the polyimide, a photosensitive resin composition being capable of providing a cured film that can be used for patterning at a high resolution and... Agent: Lg Chem, Ltd.

20110200940 - Salt and photoresist composition comprising the same: wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which can have one or more fluorine atoms, R3 represents a hydrogen atom... Agent: Sumitomo Chemical Company, Limited

20110200942 - Chemically amplified negative resist composition for eb or euv lithography and patterning process: A chemically amplified negative resist composition is provided comprising (A) an alkali-soluble polymer, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component, the polymer (A) turning alkali insoluble under the catalysis of acid. A basic polymer having a secondary or tertiary amine structure on a side... Agent:

20110200941 - Chemically amplified positive resist composition for eb or euv lithography and patterning process: A chemically amplified positive resist composition for EB or EUV lithography is provided comprising (A) a polymer or a blend of polymers wherein a film of the polymer or polymer blend is insoluble in alkaline developer, but turns soluble under the action of acid, (B) an acid generator, (C) a... Agent:

20110200943 - Method for producing a planographic printing plate: Provided is a method of producing a planographic printing plate, including: subjecting a planographic printing plate precursor, which has a support and a positive-working image recording layer, to image-wise exposure; and developing it using an alkaline aqueous solution which contains a specific compound and has a pH of from 8.5... Agent: Fujifilm Corporation

20110200944 - Manufacturing method of exposure apparatus and device manufacturing method: A manufacturing method of an exposure apparatus includes adjusting a positioning device that determines a positional relation at the time of docking between a body and a stage module such that a positional relation between an absolute reference surface of a metrology frame of the body and a stage position... Agent: Nikon Corporation

20110200945 - Method of manufacturing flat panel display: An alignment mark having high precision and good visibility is formed in a simple manner without modification of a manufacturing line or a significant increase of man hours and a flat panel display is manufactured at low cost and with good productivity. To achieve this, the method includes a step... Agent:

20110200946 - Microlithography projection exposure apparatus having at least two operating states: A microlithography projection exposure apparatus for producing microelectronic components has at least two operating states. The microlithography projection exposure apparatus includes a reflective mask in an object plane. In the first operating state, a first partial region of the mask is illuminated by a first radiation, which has an assigned... Agent: Carl Zeiss Smt Gmbh

20110200947 - Patterning method: A method of patterning a dielectric layer with a Zep 520 positive EB photoresist as a mask, comprising the steps of depositing an α-Si film on the dielectric layer; providing a layer of Zep 520 positive EB photoresist having high-resolution patterns therein by electron beam direct writing; etching the α-Si... Agent:

20110200948 - Method of fabricating micro-devices: While microelectronic processes have been used for fabricating integrated circuit (“IC”) devices such as microprocessors, digital signal processors (“DSP”) and memory chips for the past two to three decades, their use has not been extended to most areas of bioscience and medicine. While there have been some application of micro-chips... Agent:

20110200950 - Photocurable composition: A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting... Agent: Huntsman International LLC

20110200949 - Substrate processing method: A substrate processing method includes a first process (step S12 to step S16) of forming a first resist pattern by exposing a substrate having thereon a first resist film to lights, developing the exposed substrate and cleaning the developed substrate; and a second process (step S17 to step S20) of... Agent: Tokyo Electron Limited

20110200951 - Method for removing photoresist pattern: Disclosed is a method of removing a photoresist pattern, which includes radiating light onto a substrate having a photoresist pattern formed thereon and implanted with a predetermined dopant so that the temperature of the substrate is increased to be equal to or higher than a temperature able to remove the... Agent: Korea University Research And Business Foundation

20110200952 - Developing apparatus, developing method and storage medium: There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing... Agent: Tokyo Electron Limited

20110200953 - Developing apparatus, developing method and storage medium: There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form... Agent: Tokyo Electron Limited

20110195349 - Chromeless phase-shifting photomask with undercut rim-shifting element: A phase-shifting photomask with a self aligned undercut rim-shifting element and methods for its manufacture are provided. One embodiment of the invention provides a method of manufacturing a phase-shifting photomask having a self aligned rim-shifting element, the method comprising: applying a patterning film to a first portion of a transparent... Agent: International Business Machines Corporation

20110195352 - Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same: A mask for laser induced thermal imaging and a method of fabricating an organic electro-luminescence display device using the mask. A mask includes a transparent substrate including a transmitting region; a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and a scattering... Agent:

20110195348 - Method and system for automated generation of masks for spacer formation from a desired final wafer pattern: Methods and systems for generating masks for spacer formation are disclosed. As a part of a disclosed method, a predefined final wafer pattern is accessed, areas related to features in the predefined final wafer pattern are identified and a template mask is formed based on the identified areas for forming... Agent:

20110195350 - Pellicle for lithography: There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which... Agent: Shin-etsu Chemical Co., Ltd.

20110195351 - Pellicle for lithography: There is provided a pellicle in which the mask-bonding adhesive is formed to have a corner-rounded cross section in a shape akin to a trapezoid whose upper parallel side represents the face of the mask-bonding adhesive layer by which the adhesive layer is attached to the pellicle frame, and whose... Agent: Shin-etsu Chemical Co., Ltd.

20110195354 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: The present invention provides an electrophotographic photoreceptor including a photosensitive layer on a conductive substrate, an outermost layer of the electrophotographic photoreceptor including a cured film of a composition which includes at least one charge transporting compound (a) having a charge transporting skeleton and at least two structural units represented... Agent: Fuji Xerox Co., Ltd.

20110195353 - Single layer photoreceptor comprising high mobility transport mixtures: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrophotographic, including digital, apparatuses. In particular, the present embodiments pertain to an improved imaging member comprising a single layer in which the single layer further comprises a combination of one... Agent: Xerox Corporation

20110195355 - Charge-transporting varnishes: e

20110195356 - Polyester resin for toner, toner composition and resin particle: Disclosed is a heat-fusible electrostatic image developing toner which has an excellent balance between fixability at low temperatures and grindability and is excellent in glossiness after fixing. Also disclosed is a resin for toners. A polyester resin for toners which is obtained by polycondensing a polyol component and a polycarboxylic... Agent: Sanyo Chemical Industries, Ltd.

20110195357 - Resin-filled ferrite carrier core material for electrophotographic developer, ferrite carrier and electrophotographic developer using the ferrite carrier: s

20110195358 - Fixing device and image forming apparatus using the same: A fixing device including a fixing member to melt a toner so as to fix a toner image onto a recording medium, a temperature sensor to detect a temperature of the fixing member, and a heater to heat the fixing member based on the temperature detected by the temperature sensor.... Agent:

20110195359 - Self-contained proximity effect correction inspiration for advanced lithography (special): A lithography method is disclosed. An exemplary lithography method includes providing an energy sensitive resist material on a substrate; providing a desired pattern; performing a lithography process on the substrate, wherein the lithography process includes exposing the energy sensitive resist material to a charged particle beam, such that the desired... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110195360 - Methods to fabricate a photoactive substrate suitable for microfabrication: A method of fabrication and device with holes for electrical conduction made by preparing a photosensitive glass substrate comprising at least silica, lithium oxide, aluminum oxide, and cerium oxide, masking a design layout comprising one or more holes to form one or more electrical conduction paths on the photosensitive glass... Agent: Life Bioscience, Inc.

20110195361 - Solution to optical constraint on microtruss processing: A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has... Agent: Gm Global Technology Operations, Inc.

20110195362 - Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative: There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used... Agent: Shin-etsu Chemical Co., Ltd.

20110195363 - Layered radiation-sensitive materials with varying sensitivity: A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and a second radiation-sensitive material adjacent the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has the first sensitivity and a second sensitivity... Agent: Gm Global Technology Operations LLC

20110189591 - Prepolymer-based polyurethane formulations for producing holographic media: P

20110189593 - Defect repair apparatus and method for euv mask: an ion optical system that scans and irradiates the hydrogen ion beam by focusing the hydrogen ion beam onto the EUV mask; a sample stage on which to place the EUV mask; a detector that detects secondary charged-particles generated from the EUV mask; and an image forming unit that forms... Agent:

20110189592 - Extreme ultraviolet mask and method of manufacturing the same: An extreme ultraviolet (EUV) mask includes a quartz substrate including an absorption region and a reflection region, first and second multi-layered thin films formed on the quartz substrate, and a structure pattern disposed between the first and second multi-layered thin films.... Agent: Hynix Semiconductor Inc.

20110189596 - Method for manufacturing a surface and integrated circuit using variable shaped beam lithography: A method is disclosed in which a plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface. In this method some shots within the plurality of shots overlap each other. Additionally, the union of any subset of the plurality of shots differ from... Agent: D2s, Inc.

20110189595 - Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask , and method of manufacturing a semiconductor device: In a simulation step, based on information of a main surface shape of a transparent substrate and shape information of a mask stage of an exposure apparatus and using a deflection differential equation taking into account a twist deformation, height information at a plurality of measurement points is obtained by... Agent: Hoya Corporation

20110189594 - Pellicle for lithography and method for manufacturing the same: A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly,... Agent: Shin-etsu Chemical Co., Ltd.

20110189598 - Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device: m

20110189599 - Method for producing a color filter: A color filter including: a transparent substrate; a light shielding part formed on the transparent substrate and contains at least a light shielding material and a resin; and a colored layer formed in the opening part of the light shielding part on the transparent substrate to cover a part of... Agent: Dai Nippon Printing Co., Ltd.

20110189597 - Method of forming exposure patterns: The present invention discloses a method of forming exposure patterns. These steps of the present method comprise: a substrate is provided; a photoresist layer is formed over the substrate; subsequently, a photo mask with a pattern is placed and aligned to a corresponding location over the photoresist layer for at... Agent: Chunghwa Picture Tubes, Ltd.

20110189602 - Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method: The disclosed heating device is to perform a heating process on an exposed substrate formed with a resist film before a developing process, the device including a heating part to perform a heating process on the exposed substrate, the heating part including a plurality of two-dimensionally arranged heating elements; a... Agent: Tokyo Electron Limited

20110189600 - Method for automated control of processing parameters: The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a plate recognition system that includes a senseing and authenication subsystem. The processor is automated to make adjustments according to the information provided.... Agent:

20110189601 - Method of forming pattern, system for calculating resist coating distribution and program for calculating the same: In one embodiment, a method of forming a resist pattern on a substrate is provided. Information of a template pattern formed on a template based on template pattern data is obtained. A resist coating distribution is set based on the information of the template pattern. A resist is formed on... Agent:

20110189603 - Electrophotographic photoconductor and manufacturing method thereof:

20110189604 - Toner for electrostatic latent image development, electrostatic latent image developer, toner cartridge, process cartridge, and image forming apparatus: A toner for electrostatic latent image development is disclosed. The toner for electrostatic latent image development includes toner particles, the toner particles includes a binder resin and a release agent, and the toner has a linear thermal expansion coefficient in accordance with JIS K 7197-1991 of from about 6×10−5/C.° to... Agent: Fuji Xerox Co., Ltd.

20110189605 - Making method for titania nanoparticle: The present invention relates to a method of manufacturing titania nanoparticles, and specifically to a method of manufacturing titania nanoparticles wherein the particle size is uniform, it is possible to manufacture monodisperse particles without aggregation among particles, a uniform coating can be applied, that is suitable to large-scale production, and... Agent: Sukgyung At Co., Ltd.

20110189606 - Treated fluoropolymer particles, methods of making treated fluoropolymer particles, toner compositions, and methods of making toner compositions: Toner compositions, treated fluoropolymer particles, methods of making treated fluoropolymer particles, and the like, are disclosed.... Agent:

20110189609 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated... Agent: Fujifilm Corporation

20110189607 - Novel sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process: There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R1 represents a divalent hydrocarbon... Agent: Shin-etsu Chemical Co., Ltd.

20110189610 - Photoresist composition: e

20110189608 - Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabri: A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.... Agent:

20110189611 - Plate recognition system for automated control of processing parameters: The invention relates to processing imaged precursors such as lithographic printing plates. The invention relates specifically to adjusting a processing device for optimal processing performance using a pltae recognition system that includes a sensing and authenication subsystem. The processor is automated to make adjustments according to the information provided.... Agent:

20110189612 - Method for fixing a flexographic plate: A method includes removing the previously imaged area (120) from the flexographic plate (104) to create an opening in the flexographic plate; providing a portion (108) from a flexographic plate built from similar material of the previously imaged flexographic plate; adding adhesive material (116) to the portion or to the... Agent:

20110189613 - Exposure apparatus, exposure method, and device fabrication method: An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference... Agent: Nikon Corporation

20110189614 - Lithographic apparatus and device manufacturing method with double exposure overlay control:

20110189615 - Semiconductor processing method of manufacturing mos transistor: A method of manufacturing MOS transistor includes providing a substrate having a gate formed thereon; forming a hard mask layer on the substrate, performing an acid treatment to a surface of the hard mask layer, forming a photoresist layer on the hard mask layer after performing the acid treatment, performing... Agent:

20110189616 - Pattern formation method: After forming a lower layer film, an intermediate layer film and a first resist film on a substrate, a first resist pattern is formed by performing first exposure. Then, after a first intermediate layer pattern is formed by transferring the first resist pattern onto the intermediate layer film, a second... Agent: Panasonic Corporation

20110189617 - Method of forming organic thin film and exposure method: According to one embodiment, a method of forming an organic thin film includes coating organic solution onto a substrate and heating the coated organic solution after the coating. The organic solution contains a first component and a second component. The second component has higher hydrophobicity than hydrophobicity of the first... Agent:

20110189618 - Resist processing method: A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an... Agent: Sumitomo Chemical Company, Limited