SEARCH:      Monitor Keywords |  Custom RSS

Radiation imagery chemistry: process, composition, or product thereof July category listing 07/11

20110183240 - Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method: According to certain embodiments, a mask blank for an electron beam writing is provided, capable of forming a resist pattern of a 3-dimensional topology through an one-time writing. The mask blank includes a substrate, a thin film formed on the substrate, and an electron beam resist film formed on the... Agent: Hoya Corporation

20110183239 - Photolithography mask, blank photomask, reflective photomask, and methods of manufacturing the same: Photolithography masks include an optically transparent substrate having a plurality of fiducial position aligning marks on sidewalls thereof. A reflective layer is also provided on an upper surface of the optically transparent substrate. The reflective layer includes a composite of a lower reflective layer of a first material and an... Agent:

20110183243 - Electrophotographic photoreceptor and electrophotographic imaging apparatus including the photoreceptor: The disclosure provides an electrophotographic photoreceptor and an electrophotographic imaging apparatus including the photoreceptor, wherein the electrophotographic photoreceptor comprises: a conductive substrate; a charge generating layer formed on the conductive substrate; a charge transport layer formed on the charge generating layer; and an overcoat layer formed on the charge transport... Agent: Samsung Electronics Co., Ltd.

20110183242 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes: a conductive substrate; a photosensitive layer including a charge-generating layer containing a charge-generating material and a charge-transporting layer containing a charge-transporting material, the charge-transporting layer having a hole mobility of about 5.0×10−6 (cm2/V·sec) or less at an electric field of 2 V/cm; and an overcoat layer... Agent: Fuji Xerox Co., Ltd.

20110183241 - Protective photoreceptor outer layer: Embodiments pertain to a novel imaging member, namely, an imaging member or photoreceptor comprising a protective outer layer which comprises light-absorbing composition that substantially prevents any light absorption by the overcoat layer. The composition comprises a low strength thermal plastic resin and a high optical density yellow dye. Thus, the... Agent: Xerox Corporation

20110183244 - Releasable undercoat layer and methods for using the same: Embodiments relate generally to an imaging member that facilitates removal of the imaging member coating layers disposed over the imaging member and environmentally or “green” methods for using the same. More specifically, the present embodiments disclose an electrophotographic photoreceptor that includes a specifically formulated undercoat layer that allows easy removal... Agent: Xerox Corporation

20110183245 - Polyamideimide containing photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a polyamideimide.... Agent: Xerox Corporation

20110183246 - Novel ethylene compound, charge transport material containing ethylene compound, electrophotographic photoreceptor containing ethylene compound, and process for producing electrophotographic photoreceptor: wherein R1, R2 and R3 are each independently a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbons or an alkoxyl group of 1 to 6 carbons; R4 is an alkyl group of 1 to 3 carbons, phenyl or tolyl; and Ar is an aryl group... Agent: Fuji Electric Systems Co., Ltd

20110183248 - Developing agent and method of manufacturing the same: According to one embodiment, a method of manufacturing a color erasable developing agent including preparing a dispersion containing a fine particle containing a leuco dye and a developer, a fine particle containing a color erasing agent, a toner binder resin fine particle and a medium, aggregating the fine particles in... Agent: Toshiba Tec Kabushiki Kaisha

20110183249 - Process for producing toner for electrophotography: The present invention relates to a process for producing a toner for electrophotography which is excellent in dispersibility of a colorant in the toner and capable of considerably improving an image density, as well as a toner for electrophotography which is produced by the process. There is provided a process... Agent: Kao Corporation

20110183247 - White toner for electrostatic charge image developement, electrostatic charge image developer, toner cartridge, process cartridge, and image forming apparatus: A white toner for electrostatic charge image development is disclosed. The white toner for electrostatic charge image development includes a binder resin, a first white pigment, a second white pigment, and a release agent, a specific gravity D1 of the first white pigment satisfying a condition of 3.5<D1<6.0, a specific... Agent: Fuji Xerox Co., Ltd.

20110183250 - Developing agent: According to one embodiment, a developing agent includes toner particles containing a coloring agent, a binder resin, and a moisturizing agent, and an additive which is added to the surfaces of the toner particles is provided. The moisturizing agent is added in an amount of from 5 to 20% by... Agent: Toshiba Tec Kabushiki Kaisha

20110183251 - Developing agent and method for manufacturing the same: According to one embodiment, there is provided a developing agent including a toner particle containing a coloring agent, a binder resin and an ester wax having an alkyl group having a carbon number of from 32 to 46. When the wax is analyzed by an mass spectrometry, an ester compound... Agent: Toshiba Tec Kabushiki Kaisha

20110183252 - Toner for developing electrostatic image and method of preparing the same: Toner for developing an electrostatic image, which satisfies charging stability, low-temperature fixability, high-temperature storage characteristics, and durability with respect to an environment up to a predetermined level or above, and a method of preparing the toner. The toner includes: a core layer including a first binder resin, a colorant, and... Agent: Samsung Electronics Co., Ltd.

20110183253 - Core material of ferrite carrier and ferrite carrier for electrophotographic developer, and electrophotographic developer using the ferrite carrier: A core material of a ferrite carrier for an electrophotographic developer, the core material being composed of a ferrite particle containing at least one or more temperature compensation-type dielectric components selected from Mg2TiO4, MgTiO3 and MgTi2O4, a ferrite carrier for an electrophotographic developer, the ferrite carrier being prepared by coating... Agent: Powdertech Co., Ltd.

20110183254 - Photocurable liquid developer, method for producing the same, developing device and image forming apparatus: c

20110183255 - Image forming method and image forming apparatus: A high-quality, stable image forming apparatus and method which are free from abnormal images, particularly afterimages, after prolonged repeated use by using a photoconductor a conductive substrate and a single-layered photosensitive layer which contains a charge generating material, an electron transporting material, a positive-hole transporting substance and a binder resin,... Agent:

20110183256 - Method of manufacturing toner: A method of manufacturing a toner is provided which is excellent in low temperature fixation property, whose fixable temperature width is large, as well as excellent in durability while giving consideration to the global environment conservation. The method of manufacturing a toner includes a step of producing a polyester resin... Agent:

20110183257 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.... Agent: Asml Netherlands B.v.

20110183263 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing a repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and at least two types of repeating units (B1), (B2) that when acted on by an... Agent: Fujifilm Corporation

20110183261 - Developer composition: A developer composition with low metal corrosiveness is provided. The developer composition includes 1 to 10 weight parts of tetraalkylammonium hydroxide; 0.01 to 3 weight parts of a metal corrosion inhibiting agent; 0.1 to 5 weight parts of a pH control agent; 0.1 to 5 weight parts of a surfactant;... Agent: Everlight Usa, Inc.

20110183260 - Flexographic processing solution and use: d

20110183259 - Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of... Agent: International Business Machines Corporation

20110183258 - Positive resist composition, pattern forming method using the composition, and compound for use in the composition: A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by... Agent: Fujifilm Corporation

20110183262 - Positive resist compositions and patterning process: A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl... Agent:

20110183264 - Resist processing method and use of positive type resist composition: wherein, Ra1 represents a hydrogen atom, a halogen atom or a C1 to C3 saturated hydrocarbon group which may be substituted with a halogen atom; Ra2 represents a single bond or a divalent organic group; Ra3 represents a hydrogen atom, a C1 to C12 saturated hydrocarbon group which may be... Agent: Sumitomo Chemical Company, Limited

20110183265 - Polymer-based long life fusers and their methods of making: Exemplary embodiments provide materials and methods for polymer-based fixing members that have a textured surface with reduced surface energy and increased surface hydrophobicity.... Agent: Xerox Corporation

20110183266 - Semiconductor device manufacturing methods: Methods for manufacturing semiconductor devices are disclosed. One preferred embodiment is a method of processing a semiconductor device. The method includes providing a workpiece having a material layer to be patterned disposed thereon. A masking material is formed over the material layer of the workpiece. The masking material includes a... Agent:

20110183267 - Method of producing multilayer printed wiring board and photosensitive dry film used therefor: A method of producing a multilayer printed wiring board by attaching a photosensitive dry film onto an interlaminar resin insulating layer having a thin-film conductor layer and conducting a light exposure and development to form a plating resist and then forming a conductor circuit on a portion not forming the... Agent: Ibiden Co., Ltd.

20110183268 - Process for making contained layers and devices made with same: m

20110183269 - Methods of forming patterns, and methods for trimming photoresist features: Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features may be exposed to a combination of chloroform, oxidant and additional carbon-containing material besides chloroform to reduce the widths of the photoresist features... Agent:

20110183270 - Method for forming three-dimensional pattern: A method for forming a three-dimensional pattern includes following steps. A shaped workpiece having an inner surface and an outer surface is provided, and a first photoresist layer and a second photoresist layer are respectively formed on the outer surface and the inner surface. The shaped workpiece is placed on... Agent: Compal Electronics, Inc.

20110183271 - Method of manufacturing mask for depositing thin film: A method of manufacturing a mask for depositing a thin film is disclosed. In one embodiment, the method includes i) providing a raw material substrate for a deposition mask; ii) removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in... Agent: Samsung Mobile Display Co., Ltd.

20110183272 - Method for fabricating microbeads and microbeads: In one example embodiment, a method fabricates microbeads, which can supply a bead set containing a various types of microbeads and having distinct populations of the respective types of microbeads. In one example embodiment, the method includes forming a hydrophilic layer made of a hydrophilic organic material on a substrate.... Agent: Sony Corporation

20110183273 - Water mark defect prevention for immersion lithography: A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in response to radiation energy and a quencher capable of neutralizing acid and having a reduced mobility. The photoresist... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110177437 - Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-d mask effect using the same: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask... Agent:

20110177436 - Mask blank and method of manufacturing a transfer mask: A mask blank includes a transparent substrate and a light-shielding film formed on the transparent substrate. The light-shielding film is made of a material composed mainly of a metal that is dry-etchable with a chlorine-based gas. A resist film is used to form a transfer pattern in the light-shielding film.... Agent: Hoya Corporation

20110177435 - Photomasks having sub-lithographic features to prevent undesired wafer patterning: A photomask that is used as a light filter in an exposure system is made of at least one layer of material comprising one or more transparent regions and one or more non-transparent regions. The difference between the transparent regions and the non-transparent regions defines the features that will be... Agent: International Business Machines Corporation

20110177438 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: A charge transport layer, which is the surface layer of an electrophotographic photosensitive member, contains a charge transporting material, and a polyester resin A having a repeating structural unit including a specific siloxane moiety and at least one of a polyester resin C having a specific structure and a polycarbonate... Agent: Canon Kabushiki Kaisha

20110177439 - Curl-free flexible imaging member and methods of making the same: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrophotographic, including digital, apparatuses. Embodiments pertain to an improved flexible electrophotographic imaging member that does not require an anticurl back-coating layer to prevent curling. The charge transport layer of the... Agent: Xerox Corporation

20110177440 - Method of manufacturing toner and toner manufactured by the method: A method of manufacturing toner including: preparing a first liquid by dissolving or dispersing toner components including a colorant, a release agent, and one or both of a binder resin and a precursor thereof in an organic solvent; preparing a second liquid having a viscosity of from 50 to 800... Agent:

20110177443 - Colored toners: The present disclosure provides blue toners and methods for their production. In embodiments, methods of the present disclosure include systems which may be utilized to predict the color properties of a blue toner, thereby permitting adjustment of the pigment loading and/or toner mass per unit area.... Agent: Xerox Corporation

20110177441 - Toner compositions: The present disclosure provides processes for producing images of excellent color fidelity when incorporating a cyan toner with a lower colorant loading in addition to a first cyan toner. In embodiments, the cyan pigmented particles may be cyan emulsion aggregation toners. In accordance with the present disclosure, a pair of... Agent: Xerox Corporation

20110177442 - Toner compositions: The present disclosure provides processes for producing images of excellent color fidelity when incorporating a magenta toner with a lower colorant loading in addition to a first magenta toner. In embodiments, the magenta pigmented particles may be magenta emulsion aggregation toners. In accordance with the present disclosure, a pair of... Agent: Xerox Corporation

20110177447 - Toner, method for producing the same, and developer: The present invention provides a toner containing base particles formed by emulsifying or dispersing, in an aqueous medium, a toner composition liquid which is obtained by dissolving or dispersing, in an organic solvent, at least a binder resin soluble in the organic solvent and a colorant masterbatch containing a colorant... Agent:

20110177444 - Additive package for toner: An additive package is provided for use with toners. The additive package may be utilized with ultra low melt toners formed by emulsion aggregation processes. The additive package of the present disclosure provides toners with a low minimum fusing temperature to enable high speed printing. Toners possessing the additive package... Agent: Xerox Corporation

20110177445 - Manufacturing method for polyester particle dispersion liquid: The present invention relates to a process for producing a dispersion of polyester particles which includes the step of emulsifying mixed polyester containing (1) an amorphous polyester containing a constitutional unit derived from a trivalent or higher-valent carboxylic acid in an amount of from 2.0 to 12.0 mol % on... Agent: Kao Corporation

20110177446 - Hydrophobic silica microparticles and composition for electrophotographic toner: Provided are silica microparticles having a fine primary particle size suitable for an external toner additive, the microparticles including no bulky agglomerated particles responsible for a decrease in dispersibility into toner and fluidity of toner. The microparticles are capable of preventing detachment from toner, and are superior in effects of... Agent: Nippon Aerosil Co., Ltd.

20110177448 - Liquid developer and image-forming apparatus: A liquid developer contains a liquid insulator formed of a liquid hydrocarbon, toner particles formed by chemically modifying surfaces of mother toner particles formed of a material containing a rosin-based resin and a polyester resin with a polyalkyleneimine, and a metal soap dissolved in the liquid insulator.... Agent: Seiko Epson Corporation

20110177449 - Image forming apparatus and image forming method: An image forming apparatus includes a latent image carrier on which a latent image is formed, a developer carrier being in contact with the latent image carrier and configured to develop the latent image by using a liquid developer that contains toner and a carrier liquid, an image carrier belt... Agent: Seiko Epson Corporation

20110177450 - Toner image fixing method: A toner image fixing method reduces energy consumed in a fixing step in an electrophotographic image forming apparatus. A photopolymerization composition is coated on an unfixed toner image formed on a recording medium. Then, the photopolymerization composition is irradiated with light, which does not have an emission wavelength band in... Agent: Canon Kabushiki Kaisha

20110177451 - Method for manufacturing capsule toner: A method for manufacturing a capsule toner, capable of obtaining a capsule toner including a coating layer having uniform thickness at high yield is provided. The method for manufacturing a capsule toner includes a fine resin particle adhering step of adhering fine resin particles to surfaces of toner base particles,... Agent:

20110177452 - Production method of toner for developing electrostatic image: A production method of a toner for developing an electrostatic image composed of toner parent particles and external additives adhered to a surface the toner parent particles is disclosed. The method includes steps of preparing toner parent particles dispersion liquid in which toner parent particles are dispersed in a medium,... Agent: Konica Minolta Business Technologies, Inc.

20110177453 - Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same: In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic... Agent: Central Glass Company, Limited

20110177454 - Resist material and pattern formation method using the resist material: First, a resist film is formed on a substrate from a resist material including cyclic oligomer which does not contain any acid-labile group, is soluble in alkali, and is a trimer or a higher multimer; a molecular compound containing an acid-labile group; a photoacid generator; and no polymer. Then, pattern... Agent: Panasonic Corporation

20110177455 - Polymer, resist composition, and patterning process: A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful... Agent:

20110177456 - Method of making lithographic printing plates: Lithographic printing plates can be provided by imagewise exposing a negative-working lithographic printing plate precursor comprising an aluminum-containing substrate having thereon an imageable layer, to provide exposed and non-exposed regions in the imageable layer. This imaged element is then processed to remove the non-exposed regions in the imageable layer and... Agent:

20110177458 - Exposure determining method, method of manufacturing semiconductor device, and computer program product: According to one embodiment, a deviation amount distribution of a two-dimensional shape parameter between a mask pattern formed on a mask and a desired mask pattern is acquired as a mask pattern map. Such that a deviation amount of the two-dimensional shape parameter between a pattern on substrate formed when... Agent:

20110177457 - Mask pattern generating method, manufacturing method of semiconductor device, and computer program product: According to the embodiment, a pattern after lithography is derived by using a mask pattern. The mask pattern is corrected by moving a first moving target pattern so that a first evaluation value calculated with respect to this pattern after lithography satisfies a first condition. Next, a pattern after lithography... Agent:

20110177459 - Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process: There is disclosed a resist underlayer film-forming composition comprising, at least: a resin (A) obtained by condensing a compound represented by the following general formula (1) with a compound represented by the following general formula (2) by the aid of an acid catalyst; a compound (B) represented by the general... Agent: Shin-etsu Chemical Co., Ltd.

20110177460 - process for producing an image on a substrate: The present invention is directed to a process for producing an image on a substrate and a substrate having an image deposited thereon using the aforementioned processes.... Agent: Nanofilm Technologies International Pte Ltd

20110177464 - Chemically amplified negative resist composition and patterning process: A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from... Agent: Shin-etsu Chemical Co., Ltd.

20110177463 - Illumination system for euv microlithography: An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used... Agent: Carl Zeiss Smt Gmbh

20110177461 - Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method: A stage is driven (position control) using a hybrid signal which is obtained by synthesizing an output signal of an interferometer (an interferometer system) and an output signal of an encoder (an encoder system) that are made to pass through a high pass filter and a low pass filter, respectively.... Agent: Nikon Corporation

20110177462 - Patterning process: A pattern is formed by coating a resist composition comprising a polymer comprising recurring units having an optionally acid labile group-substituted naphthol group, an acid generator, and an organic solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the... Agent: Shin-etsu Chemical Co., Ltd.

20110171568 - Mask blank substrate: Provided is a mask blank substrate that can reduce the change in flatness of a main surface thereof before and after chucking to make very small the position offset caused by a photomask and that can significantly reduce the difference in tendency of substrate deformation before and after chucking between... Agent: Hoya Corporation

20110171567 - Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank: Means for solving the problems: A phase shift mask blank of the present invention has, on a transparent substrate, a phase shift film including, as main components, a metal, silicon (Si) and nitrogen (N), having optical characteristics of a transmittance of equal to or greater than 9% and equal to... Agent: Hoya Corporation

20110171566 - Reflective mask blank for euv lithography: the absorbing layer has a B content that is 1 at % or greater but less than 5 at %, an H content that is between 0.1 and 5 at %, a Ta+N total content that is between 90 and 98.9%, and a Ta:N composition ratio (Ta:N) that is between... Agent: Asahi Glass Company, Limited

20110171569 - Sulfonium derivatives and the use therof as latent acids: Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO,... Agent:

20110171570 - Electrophotographic photoreceptor, method of producing same, process cartridge, and image forming apparatus: The invention provides an electrophotographic photoreceptor having at least: a substrate; a photosensitive layer provided on the substrate; and an overcoat layer provided on the photosensitive layer. The overcoat layer of the photoreceptor includes at least: a cross-linked component that is obtained by cross-linking of at least one selected from... Agent: Fuji Xerox Co., Ltd.

20110171571 - Electrophotographic toner and method of preparing electrophotographic toner: The disclosure provides an electrophotographic toner and methods for preparing the same, including a first binder resin, a second binder resin, a colorant, a releasing agent, a charge control agent, and an ionomer, wherein the second binder resin is a resin derived biomass.... Agent: Samsung Electronics Co., Ltd

20110171572 - Toner for developing electrostatic image, developer for electrostatic image, toner cartridge, process cartridge, image forming method, and image forming apparatus: wherein, the temperature T(10 Mpa) is a temperature at which a viscosity of the toner under a pressure of 10 Mpa applied with a flow tester becomes 104 Pa·s, and the temperature T(1 Mpa) is a temperature at which a viscosity of the toner under a pressure of 1 Mpa... Agent: Fuji Xerox Co., Ltd.

20110171573 - Carrier, developer using the carrier, and developing device, image forming method, image forming apparatus and process cartridge using the developer: A carrier for use in a two component developer for developing an electrostatic latent image is provided. The carrier includes a particulate core material; and a cover layer located on a surface of the core material and including a silicone resin and barium sulfate. The cover layer includes Ba and... Agent:

20110171574 - Method for manufacturing capsule toner: A method for manufacturing a capsule toner having improved preservability with no deterioration in low-temperature fixability is provided. The method for manufacturing a capsule toner includes a mixed fine resin particle adhering step of adhering mixed fine resin particles including crystalline polyester fine resin particles and amorphous fine resin particles... Agent:

20110171577 - Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition: m

20110171575 - Photoresist composition:

20110171578 - Positive photosensitive resin composition: A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and... Agent: Cheil Industries Inc.

20110171576 - Salt and photoresist composition containing the same: wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents *—CO—O-La- or *—CH2—O-Lb-, * represents a binding position to —C (Q1) (Q2)-, La and Lb independently represent a C1-C15 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by... Agent: Sumitomo Chemical Company, Limited

20110171579 - Negative resist composition and patterning process: A negative resist composition comprises a base polymer comprising recurring units having an alkylthio group and having a Mw of 1000-2500, an acid generator, and a basic component, typically an amine compound containing a carboxyl group, but not active hydrogen. A 45-nm line-and-space pattern with a low value of LER... Agent: Shin-etsu Chemical Co., Ltd.

20110171580 - Positive resist composition and patterning process: A positive resist composition comprising a polymer having a tetrahydrobenzocycloheptane-substituted secondary or tertiary carboxyl group ester as an acid labile group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness after exposure, a significant effect of... Agent:

20110171581 - Photoresist compostion and method of manufacturing array substrate using the same: A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.... Agent: Az Electronic Materials(japan) K.k.

20110171582 - Three dimensional integration with through silicon vias having multiple diameters: A method is disclosed which includes patterning a photoresist layer on a substrate of a structure, removing a first portion of the photoresist layer to expose a first area of the substrate, etching the first area to form a cavity having a first depth, removing a second portion of the... Agent: International Business Machines Corporation

20110171584 - Method of manufacturing high resolution organic thin film pattern: A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a... Agent: Snu R&db Foundation

20110171583 - Process solutions containing surfactants: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain embodiments, the process solution may reduce post-development defects such as pattern collapse or line width roughness when employed as a rinse solution either during or after the... Agent: Air Products And Chemicals, Inc.

20110171585 - Photolithography method: A photolithography method is provided which includes: arranging a layout topography in a first mask and a second mask in such a way that at least a layout pattern of the layout topography is defined by an overlap area. The overlap area is formed when at least a first pattern... Agent: Semiconductor Manufacturing International (shanghai) Corporation

20110171586 - Resist processing method: A resist processing method having the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an... Agent: Sumitomo Chemical Company, Limited

20110165502 - Method and system for feature function aware priority printing: A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot size and passing fractured... Agent: International Buiness Machine Corporation

20110165503 - Method of generating photomask data, method of fabricating photomask, memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array: A method of generating photomask data for fabricating a microlens array, the photomask having a microlens pattern including light-shielding portions and non-light-shielding portions, in each rectangular region including a surrounding region having four sides of the rectangular region as outer edges and a primary region having boundaries that are inner... Agent: Canon Kabushiki Kaisha

20110165506 - Photomasks and methods of forming photomasks: Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain a plurality of distinct layers. Each of the layers has two or more characteristic parameters which are optimized through an optimization loop. Subsequently, specifications... Agent: Micron Technology, Inc.

20110165505 - Photomasks, methods of forming photomasks, and methods of photolithographically-patterning substrates: Some embodiments include methods of forming photomasks. A stack of at least three different materials is formed over a base. Regions of the stack are removed to leave a mask pattern over the base. The mask pattern includes a pair of spaced-apart adjacent segments of the stack. A liner is... Agent: Micron Technology, Inc.

20110165504 - Reflective mask blank for euv lithography, process for producing the same and mask for euv lithography: wherein the process further comprises after formation of the above multilayer reflective film, heating a portion of a surface of the multilayer reflective film outside a portion to be a mask pattern region in a reflective mask for EUV lithography produced by employing the reflective mask blank for EUV, to... Agent: Asahi Glass Company, Limited

20110165507 - Erasable toner and method for producing the same: An erasable toner is prepared by mixing colored particles containing at least a color former compound, a color developer agent and a binder resin with de-coloring particles having a melting point higher than the fixing temperature of the colored particles. By using this toner, a colored image is formed by... Agent: Toshiba Tec Kabushiki Kaisha

20110165508 - Toner and developer: A toner containing at least a binder resin, releasing agent, and colorant, wherein the binder resin contains polyester resin (A), polyester resin (B), and polyester resin (C), which is prepared by condensation-polymerizing (i) an alcohol component containing an alkylene oxide adduct of bisphenol compound and (ii) a carboxylic acid component;... Agent:

20110165509 - Toner: Disclosed is a decolorable toner containing a binder resin and a coloring agent which contains a color former compound and a color developing agent and has a capsule structure such that it is covered with an outer shell, and having a volume average particle diameter of from 5.0 to 15.0... Agent: Toshiba Tec Kabushiki Kaisha

20110165510 - Toner, process for producing toner, and two-component developing agent: A toner or two-component developer is obtained by mixing, aggregating, and heating resin particles, colorant particles, and wax particles in an aqueous medium. A gel permeation chromatography (GPC) measurement of the resin particles shows that a weight-average molecular weight is 10000 to 60000, and the ratio of the weight-average molecular... Agent: Panasonic Corporation

20110165511 - Method for producing toner: A method for producing an electrostatic image developing toner by: a) adding a free radical polymerizable monomer to an aqueous medium comprising dispersed wax particles containing a colorant, b) polymerizing the free radical polymerizable monomer to yield a resin particle comprising the wax and colorant, and c) agglutinating and fusing... Agent:

20110165516 - Compound for resist and radiation-sensitive composition: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic... Agent:

20110165515 - Novel photoresist materials and photolithography processes: A material for use in lithography processing includes a polymer that turns soluble to a base solution in response to reaction with acid and a plurality of magnetically amplified generators (MAGs) each having a magnetic element and each decomposing to form acid bonded with the magnetic element in response to... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110165517 - Organic el element, organic el display apparatus, and manufacturing method of organic el element: An organic EL element includes a substrate and a light refractive layer, a first transparent electrode layer, an insulation layer, a hole transport layer, and a photosensitive resin layer stacked above the substrate. A luminous function layer is above the hole transport layer in a recess defined by the photosensitive... Agent: Panasonic Corporation

20110165513 - Photoresist composition:

20110165514 - Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate: A photosensitive conductive film 10 according to the invention includes a support film 1, a conductive layer 2 containing conductive fiber formed on the support film 1, and a photosensitive resin layer 3 formed on the conductive layer 2.... Agent:

20110165512 - Resist composition and method of forming resist pattern: A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component (B) that generates acid upon exposure, and a nitrogen-containing organic compound (D), wherein the acid generator component (B) includes an acid generator (B1) consisting of... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110165518 - lithographic printing plate precursor: A lithographic printing plate precursor includes a coating provided on a support having a hydrophilic surface, the coating containing thermoplastic polymer particles and an infrared radiation absorbing dye characterized in that the dye contains a substituent selected from bromo and iodo.... Agent: Agfa Graphics Nv

20110165519 - Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.... Agent:

20110165520 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask: A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type... Agent: Renesas Electronics Corporation

20110165522 - Imaging optical system: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of... Agent: Carl Zeiss Smt Gmbh

20110165521 - Process for producing photoresist pattern: Process for producing a photoresist pattern containing the steps: (A) applying a first photoresist composition containing a resin having a structural unit containing an acid-labile group in its side chain, an acid generator and a cross-linking agent on a substrate to form a first photoresist film, exposing the film to... Agent: Sumitomo Chemical Company, Limited

20110165523 - Substrate treating solution and method employing the same for treating a resist substrate: The present invention provides a resist substrate treating solution and a method employing the solution for treating a resist substrate. This treating solution enables to remove efficiently resist residues remaining on a surface of the resist substrate after development, and further to miniaturize a resist pattern. The solution is used... Agent: