|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
USPTO Class 430 | Browse by Industry: Previous - Next | All
06/2011 | Recent | 13: May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Radiation imagery chemistry: process, composition, or product thereof June invention type 06/11Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 06/30/2011 > 39 patent applications in 19 patent subcategories. invention type
20110159409 - Decorated device and method of fabricating the same: A decorated device including a body, a hologram layer, and an adhesion layer and a method of fabricating the same are provided. The hologram layer is disposed on the body and includes a transparent base layer having an uneven structure and a reflective layer substantially conformable covering the uneven structure... Agent: Sipix Chemical Inc.
20110159416 - Blank mask and method of fabricating mask using the same: A blank mask includes a substrate, a multilayer reflection layer disposed over the substrate, a capping layer disposed over the multilayer reflection layer, a self-assembled monolayer disposed over the capping layer, a buffer layer disposed over the self-assembled monolayer, and an absorption layer disposed over the buffer layer.... Agent: Hynix Semiconductor Inc.
20110159410 - Cost-effective method for extreme ultraviolet (euv) mask production: The present disclosure provides for many different embodiments. An exemplary method can include providing a blank mask and a design layout to be patterned on the blank mask, the design layout including a critical area; inspecting the blank mask for defects and generating a defect distribution map associated with the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20110159415 - Etching apparatus and method for fabricating alternating phase shift mask using the same: An etching apparatus includes: an etching space including a chamber; a chuck in the chamber and on which a transparent object to be etched can be loaded; a light source configured to irradiate light onto the object to be etched in order to detect a degree of etching of the... Agent: Hynix Semiconductor Inc.
20110159414 - Method and system of fabricating alternating phase shift mask: An alternating phase shift mask is fabricated by defining transparent regions by forming light blocking patterns over a transparent substrate and forming an etch stop layer within the transparent substrate of a phase shift region among the transparent regions. The transparent substrate of the phase shift region may be etched... Agent: Hynix Semiconductor Inc.
20110159417 - Method for manufacturing a photomask: A method for manufacturing a photomask based on design data includes the steps of forming a figure element group including a figure element in a layout pattern on the photomask and a figure element affecting the figure element due to the optical proximity effect, adding identical identification data to a... Agent: Fujitsu Semiconductor Limited
20110159412 - Method of correcting defect in euv mask: Provided is a method of correcting a defect in an extreme ultraviolet (EUV) mask. A monomolecular film is chemically bonded onto a surface of a repair tip. The repair tip is positioned over a defect disposed on the EUV mask, so that the monomolecular film bonded onto the repair tip... Agent: Hynix Semiconductor Inc.
20110159411 - Phase-shift photomask and patterning method: A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.... Agent:
20110159413 - Titania-doped quartz glass and making method: A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member.... Agent: Shin-etsu Chemical Co., Ltd.
20110159418 - Hydroxygallium phthalocyanine composite pigment, electrophotographic photoconductor containing the same, and image forming device and process cartridge for image forming device using the same: where A is a residue of an azo compound; H is a hydrogen atom; the residue A is bonded to one or more hydrogen atoms, where the number of the hydrogen atoms is expressed with n, via one or more heteroatoms which are selected from the group consisting of N... Agent:
20110159419 - Image bearing member, image forming apparatus, and process cartridge: where Ra represents a hydrogen atom or methyl group and Rb represents a straight-chained saturated aliphatic hydrocarbon group having 8 to 34 carbon atoms, the second component containing at least one of a radical polymerizable monomer and a radical polymerizable oligomer without a charge transport structure, and the third component... Agent:
20110159423 - Method for producing resinous particles: There is provided a method for producing resinous particles, containing: melting a mixture containing a binder resin and at least one additive having a melting point lower than T1/2 of the binder resin so as to prepare a molten material; atomizing resinous particles from the molten material in an atmosphere... Agent:
20110159421 - Production of toner for use in printing applications: The present invention provides a process for producing a colored toner comprising the steps of: providing a polymer composition comprising at least one polymer wherein the at least one polymer has a softening temperature from about 30° C. to about 160° C.; and a colorant; forming an aqueous mineral suspension... Agent: Penn Color, Inc.
20110159422 - White toner for electrostatic image development, electrostatic image developing agent, toner cartridge, process cartridge and image forming apparatus: The present invention provides a white toner for electrostatic image development, including a binder resin, a first white pigment and a second white pigment, the specific gravity D1 of the first white pigment satisfies the relationship of about 3.5<D1<about 6.0, and the specific gravity D2 of the second white pigment... Agent: Fuji Xerox Co., Ltd.
20110159424 - Method of forming toner image and electrophotographic image forming apparatus capable of realizing wide color gamut: Provided are a method of forming a toner image and an electrophotographic image forming apparatus including a toner. The method of forming a toner image is performed using a first toner having a yellow color and color coordinate values of a lightness (L) ranging from 91 to 94, a redness... Agent: Samsung Fine Chemicals Co., Ltd
20110159425 - Toner: To obtain a toner which has excellent charge rise and stability, tends to have a sharp charge distribution, has excellent pigment dispersion properties, exhibits no disarray in an image even during a high-speed copying operation, and can stably output high-resolution images. A toner comprising toner particle containing a binder resin,... Agent: Canon Kabushiki Kaisha
20110159427 - Electrophotographic toner and method of preparing the same: The disclosure provides an electrophotographic toner and methods for preparing the electrographic toner. The electrographic toner includes a binder, a colorant and a releasing agent, wherein the electrophotographic toner includes strontium (Sr), iron (Fe), titanium (Ti), and silicon (Si) containing particles; wherein, if [Sr], [Fe], [Ti] and [Si] denote the... Agent: Samsung Electronics Co., Ltd.
20110159426 - Silica-titania mixed oxide particle: As for a pyrogenically produced silica-titania mixed oxide particle, titanium content is 50 wt % or more, a BET specific surface area is 100 m2/g or less. When these particles are observed using an electron microscope, a ratio of a silica single particle and a titania single particle is controlled... Agent:
20110159431 - Photoacid generators and lithographic resists comprising the same: The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.... Agent:
20110159429 - Photosensitive compositions: Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.... Agent: Rohm And Haas Electronic Materials LLC
20110159430 - Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board: [In formulas (I), (II) and (III), R1, R2, R4 each independently represents a hydrogen atom or a methyl group, R3 is C1-C3 alkyl group, etc., m is an integer of 0-5, R5, R6 and R7 each independently represents a hydrogen atom or a C1-C5 alkyl group, and at least two... Agent: Hitachi Chemical Company, Ltd.
20110159432 - Positive photosensitive resin composition, cured film, protecting film, insulating film and semiconductor and display devices using the same: The positive photosensitive resin composition of the present invention comprises a polyamide resin and a photosensitive agent, wherein the polyamide resin has a specific structure. The cured film of the present invention comprises a cured product of the positive photosensitive resin composition. The protecting film and insulating film of the... Agent:
20110159428 - Positive type photosensitive resin composition: This disclosure relates to a positive photosensitive resin composition including (A) a resin precursor including a polybenzoxazole precursor, a polyamic acid, or a combination thereof, (B) a dissolution-controlling agent having a boiling point ranging from about 210° C. to about 400° C. and a polarity ranging from about 1D to... Agent: Cheil Industries Inc.
20110159433 - Photosensitive composition, pattern-forming method using the composition, and resin used in the composition: Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or... Agent: Fujifilm Corporation
20110159436 - Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of exposure passes are used, and where the sum of the base dosage levels for all of the exposure passes... Agent: D2s, Inc.
20110159434 - Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein base dosages for a plurality of exposure passes are different from each other. Methods for manufacturing a reticle and manufacturing an integrated... Agent: D2s, Inc.
20110159435 - Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area: In the field of semiconductor production using charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which the union of shots from one of a plurality of exposure passes is different than the union of shots from a... Agent: D2s, Inc.
20110159437 - Method of preparing lithographic printing plate: A plate-making method includes: exposing a lithographic printing plate precursor with laser; and rubbing a surface of the exposed lithographic printing plate precursor with a rubbing member in the presence of a developer having pH of from 2 to 11 and containing a water-soluble polymer compound to remove the protective... Agent: Fujifilm Corporation
20110159439 - Thermally crosslinkable resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same: A process for making a relief printing plate is provided that includes a layer formation step of forming a relief-forming layer from a resin composition that contains (Component A) a compound having a hydrolyzable silyl group and/or a silanol group, (Component B) a binder polymer, and (Component C) a peroxide,... Agent: Fujifilm Corporation
20110159438 - Thermally crosslinkable resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same, and relief printing plate and process for making same: A process for making a relief printing plate is provided, the process including a layer formation step of forming a relief-forming layer from a resin composition containing (Component A) a compound having a hydrolyzable silyl group and/or a silanol group and (Component B) a conjugated diene monomer unit-containing polymer, and... Agent: Fujifilm Corporation
20110159440 - Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device: In one embodiment, a method for cleaning a reticle stage of an extreme ultraviolet exposure apparatus is disclosed. The method can include pressing a particle catching layer of a cleaning reticle onto the reticle stage, and the cleaning reticle includes the particle catching layer formed on a substrate. The method... Agent:
20110159441 - Lithographic apparatus and device manufacturing method: A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in... Agent: Asml Netherlands B.v.
20110159443 - Method of forming a pattern in a semiconductor device and method of forming a gate using the same: A method of forming a pattern in a semiconductor device is described. A substrate divided into cell and peripheral regions is provided, and an object layer is formed on a substrate. A buffer pattern is formed on the object layer in the cell region along a first direction. A spacer... Agent:
20110159442 - Method of manufacturing semiconductor device: A semiconductor device is manufactured by a method including processes of trimming and molding resist patterns. A resist layer formed on a substrate is exposed and developed to form the resist patterns. The resist patterns are trimmed using a first gas plasma to change the profiles of the resist patterns.... Agent: Samsung Electronics Co., Ltd.
20110159444 - Method for manufacturing probe sheet: An embodiment of the invention provides a method for manufacturing a probe sheet in which a probe tip can be arranged at a predetermined accurate position without the need for troublesome positional adjustment operations of the probe tip in coupling operations of each contactor and a probe sheet main body.... Agent: Kabushiki Kaisha Nihon Micronics
20110159445 - Method for making a texture on a transparent conductive film of a solar cell: Disclosed is a method for making a texture on a face of a transparent conductive film coated on a glass substrate. The method includes the steps of forming a texture on the face of the glass substrate and coating the transparent conductive film on the texture formed on the face... Agent: Chung-shan Institute Of Science And Technology, Armaments, Bureau, Ministry Of National Defense
20110159446 - Plasmon head with hydrostatic gas bearing for near field photolithography: A low-cost approach to near field nano-scale photolithography using a plasmonic head with hydrostatic gas bearings. The hydrostatic gas bearing flies the plasmonic head at less than 100 nm, and more preferably less than 50 nm, above the photo-resist without the need to spin the substrate. The plasmonic head concentrates... Agent: First Principles Technology, LLC
20110159447 - Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography: Firstly, to provide a developing solution for photolithography in which tetrabutylammonium hydroxide (TBAH) is used as an alkaline agent of the developing solution and deposition of TBAH is suppressed. Secondary, to provide a method for producing a developing solution for photolithography capable of suppressing TBAH deposition when producing the developing... Agent: Tokyo Ohka Kogyo Co., Ltd.06/23/2011 > 28 patent applications in 18 patent subcategories. invention type
20110151357 - Exposure dose monitoring method and method of manufacturing exposure dose monitoring mask: According to one embodiment, a monitoring pattern is transferred to a wafer by irradiation with EUV light by using a reflective mask including the monitoring pattern. Then, the line width of the monitoring pattern transferred to the wafer is measured, and a flare intensity distribution to be generated on the... Agent:
20110151359 - Integrated circuit layout design: Provided is a photolithography apparatus including a photomask. The photomask includes a pattern having a plurality, of features, in an example, dummy line features. The pattern includes a first region being in the form of a localized on-grid array and a second region where at least one of the features... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20110151360 - Photolithographic method and mask devices utilized for multiple exposures in the field of a feature: A photolithographic mask set for creating a plurality of characters on a device includes a plurality of photolithographic masks, wherein each mask includes at least one mask character area and at least one mask character field area that surrounds said mask character area; wherein each said mask character field area... Agent: Hitachi Global Storage Technologies Netherlands B.v.
20110151358 - Reflective exposure mask, method of fabricating reflective exposure mask, method of inspecting reflective exposure mask, and method of cleaning reflective exposure mask: According to one embodiment, a reflective exposure mask comprises a first layer formed on a substrate and including a first light absorbing part which absorbs exposure light and a light reflecting part which reflects the exposure light, and a second layer formed on the light reflecting part and including a... Agent:
20110151361 - Optical-image-intensity calculating method, pattern generating method, and manufacturing method of semiconductor device: According to the embodiment, an optical image intensity distribution to be formed in a resist arranged on a lower layer side of a diffraction pattern is calculated by performing a whole image exposure from an upper surface side of the diffraction pattern formed on a substrate. The optical image intensity... Agent:
20110151362 - Electrostatic image developing gray toner and image forming method: An electrostatic image developing gray toner is disclosed. The gray toner is composed of toner particles comprising a binding resin, two species of chromatic color coloring agents and carbon black in an amount of 0 to 0.001 weight % of amount of the chromatic color coloring agents, the toner having... Agent: Konica Minolta Business Technologies, Inc.
20110151364 - Electrophotographic photoreceptor, image forming method and image forming apparatus: Provided is an electrophotographic photoreceptor exhibiting not only excellent durability together with high sensitivity but also excellent image reproduction, which is suitable for an image forming method by which imagewise exposure is performed employing a light source having an emission wavelength peak being in the range of 350-500 nm to... Agent: Konica Minolta Business Technologies, Inc.
20110151363 - Undercoat layer and imaging members comprising same: o
20110151365 - Polyalkylene glycol benzoate containing photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a polyalkylene glycol benzoate.... Agent: Xerox Corporation
20110151366 - Sulfonamide containing photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, an optional adhesive layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer or layers contains a sulfonamide.... Agent: Xerox Corporation
20110151367 - Electrostatic charge image developing toner: Provided is an electrostatic charge image developing toner capable of reproducing color exhibiting high lightness and chroma, and obtaining a wide color reproduction range. Disclosed is the toner possessing a toner particle containing at least a binder resin and a colorant, wherein the colorant possesses a yellowish color nonfluorescent dye... Agent: Konica Minolta Business Technologies, Inc.
20110151368 - Electrophotographic toner and method of preparing the same: An electrophotographic toner including a binder, a colorant and a releasing agent, and a method of preparing the electrophotographic toner.... Agent: Samsung Electronics Co., Ltd
20110151369 - Toner: Toner having good dispersibility of a pigment and a release agent therein and having excellent low temperature fixability is provided. The toner includes a binder resin, a pigment and a release agent, and the binder resin includes a graft polymer in which abietic acids and a fatty acid are grafted... Agent:
20110151370 - Toner: The present invention provides a toner including: a colorant, and a binder resin, wherein the toner is fixed on a recording medium using a fixing liquid containing a softening agent for softening the toner, and wherein a weight average molecular weight of a THF soluble fraction of the toner in... Agent:
20110151371 - Toner for electrostatic latent image development and image forming method: A toner for electrostatic latent image development is disclosed, comprising colored particles containing a binder resin and a colorant, and an external-additive, wherein the external additive comprises boron nitride particles exhibiting a number average primary particle size of 10 to 500 nm. The production method of the toner is also... Agent: Konica Minolta Business Technologies, Inc.
20110151372 - Toner, image forming method using the toner, and image forming apparatus using the toner: A toner obtained by a toner production method which includes dissolving or dispersing in an organic solvent a toner material containing at least a calixarene derivative and a binder resin or a binder resin precursor, to thereby prepare a solution or dispersion liquid of the toner material, adding the solution... Agent:
20110151373 - Full-color image-forming method: Provided are a toner containing at least a binder resin and a colorant, the toner having a specific hue angle and an absorbance at a specific wavelength in reflectance spectrophotometry, and a full-color image-forming method involving the use of the toner, the method including the steps of: forming an electrostatic... Agent: Canon Kabushiki Kaisha
20110151374 - Method and apparatus of rapid continuous drop formation process to produce chemical toner and nano-composite particles: A process for making particles is provided. In embodiments, a suitable process includes a mixing tank for mixing a plurality of droplets dispersed within a liquid media. The process further includes a drop ejector controlling unit in operable communication with a drop ejector array for launching a plurality of droplets,... Agent: Xerox Corporation
20110151375 - Method and apparatus of rapid continuous process to produce chemical toner and nano-composite particles: A process for making particles is provided. In embodiments, a suitable process includes a mixing tank for mixing a plurality of particles dispersed within a liquid media and a vane unit for applying a swirling effect to the plurality of droplets received from the mixing tank through a spray nozzle.... Agent: Xerox Corporation
20110151376 - Antireflective coating composition and process thereof: p
20110151379 - Black matrix composition with high light-shielding and improved adhesion properties: The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display including the same. The black matrix photosensitive resin composition comprises an alkali-soluble binder resin, a multi-functional monomer having an ethylenic unsaturated double bond,... Agent: Lg Chem, Ltd.
20110151377 - Compositions including magnetic materials: Compositions including hard magnetic photoresists, soft photoresists, hard magnetic elastomers and soft magnetic elastomers are provided.... Agent: Simon Fraser University
20110151378 - Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming method: A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an... Agent: Jsr Corporation
20110151380 - Data storage medium: A data storage medium comprising recording information in the form of a track of data points, the colour of each data point being selected from at least three different colours, wherein the recording information is disposed on a substrate which comprises a colour forming composition, wherein said colour forming comprises... Agent:
20110151381 - Fluorinated monomer, fluorinated polymer, resist composition, and patterning process: A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with... Agent:
20110151382 - Method and apparatus for manufacturing semiconductor device: A method and apparatus for manufacturing a semiconductor device is disclosed. In particular, the application discloses a method that performs a lithography process using a material capable of increasing a depth of focus so as to prevent efficiency of the lithography process from being degraded due to high integration of... Agent:
20110151383 - Method of manufacturing optical element, and optical element: A manufacturing method of an optical element is provided, the optical element comprising: a shield part formed by a light shielding film formed and patterned on a substrate; a light transmission part formed by partially exposing a surface of the substrate; and a phase shifter part formed by partially etching... Agent: Hoya Corporation
20110151384 - Colour forming composition: A composition comprising i) a colour forming component which is susceptible to changing colour when irradiated; ii) an amine neutralised alkylaromatic sulphonic acid; and iii) a binder. Methods of marking a substrate comprising incorporating within or applying to a substrate the composition of this invention, and substrates coated with the... Agent:06/16/2011 > 25 patent applications in 19 patent subcategories. invention type
20110143266 - Negative resist composition and patterning process: There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the... Agent: Shin-etsu Chemical Co., Ltd.
20110143267 - Photomask-forming glass substrate and making method: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward... Agent:
20110143269 - Radiation source, lithographic apparatus, and device manufacturing method: A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a... Agent: Asml Netherlands B.v.
20110143268 - Scattering bar opc application method for sub-half wavelength lithography patterning: A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding- the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features... Agent: Asml Masktools B.v.
20110143270 - Azo compound, azo pigment, pigment dispersion, coloring composition, ink for inkjet recording, coloring composition for color filter, color filter, and process for preparing a coloring composition for color filter: (wherein G represents a hydrogen atom, an aliphatic group, an aryl group, a heterocyclic group, an acyl group, an aliphatic oxycarbonyl group, a carbamoyl group, a sulfonyl group, R1 represents an amino group, an aliphatic oxy group, an aliphatic group, an aryl group, or a heterocyclic group, R2 represents a... Agent: Fujifilm Corporation
20110143272 - Image forming apparatus and image stabilization control method used in image forming apparatis: According to an embodiment, an image forming apparatus includes an image holding member, a plurality of image forming units, an image density detection unit, an image density comparison unit, a control unit, a developer residual amount acquisition unit, and an image stabilization kind determination unit. The plurality of image forming... Agent: Toshiba Tec Kabushiki Kaisha
20110143271 - Pattern generating method and process determining method: A pattern generating method includes obtaining an on-substrate pattern by performing a process for forming the on-substrate pattern by simulation or experiment based on a design pattern of the on-substrate pattern formed by an imprint process using a template, employing the design pattern when a comparison result of the design... Agent:
20110143273 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: The present invention relates to an electrophotographic photosensitive member obtained by providing an intermediate layer and a photosensitive layer on a conductive support in the stated order, the electrophotographic photosensitive member being characterized in that the intermediate layer contains a specific polyolefin resin and a specific organic electron-transporting substance, and... Agent: Canon Kabushiki Kaisha
20110143274 - Toner processes: The present disclosure provides toners and processes for making said toners. In embodiments, the toners are invisible when viewed under natural light, but possess a UV emitter that renders them visible when exposed to UV light of a specific wavelength. By selecting the appropriate UV emitter and utilizing an ionic... Agent: Xerox Corporation
20110143275 - Producing method of water dispersion of polyester resin particles, resin composition, producing method of resin composition and electrophotographic toner: A method of producing a water dispersion of polyester resin particles containing the steps of: emulsifying and dispersing at least a diol, a dicarboxylic acid and at least one polycondensation catalyst selected from a surfactant catalyst and a rare earth metal catalyst in water to form an emulsified dispersion liquid;... Agent: Konica Minolta Business Technologies, Inc.
20110143276 - Biomass chemical toner composition and method for manufacturing the same: Disclosed are a biomass chemical toner composition and a method for manufacturing the same. First, a biomass resin is mixed with a first hydrophobic resin to form organic particles. The organic particles, a second hydrophobic resin, and a pigment are mixed by emulsion aggregation to form cores. Subsequently, a third... Agent: Industrial Technology Research Institute
20110143277 - Toner, binary developer, and image forming method: A toner characterized in that the average circularity of the above-described toner is 0.960 or more, and 0.985 or less, where the average circularity is analyzed by dividing particles having a circle equivalent diameter of 1.98 μm or more, and 200.00 μm or less, the number A of toners having... Agent: Canon Kabushiki Kaisha
20110143278 - Toner processes: The present disclosure provides toners and processes for making said toners. In embodiments, the toners are invisible when viewed under natural light, but possess a fluorescent agent that renders them visible when exposed to UV light of a specific wavelength. In other embodiments the toners have a color under natural... Agent: Xerox Corporation
20110143280 - Positive resist composition for immersion exposure and pattern forming method: A positive resist composition for immersion exposure includes the following (A) to (D): (A) a resin capable of decomposing by an action of an acid to increase a solubility of the resin in an alkali developer; (B) a compound capable of generating an acid upon irradiation with an actinic ray... Agent: Fujifilm Corporation
20110143279 - Radiation-sensitive resin composition: wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a... Agent: Jsr Corporation
20110143281 - Coating compositions for photoresists: In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion... Agent: Rohm And Haas Electronic Materials LLC
20110143282 - Photosensitive composition, partition walls, color filter and organic el device: and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and... Agent: Asahi Glass Company, Limited
20110143283 - Method for improving sensitivity of resist: It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The method for improving sensitivity of a resist of the present invention is a method to improve sensitivity... Agent: Showa Denko K.k.
20110143284 - Method and apparatus for preparing lithographic printing plate precursors: A method of preparing a lithographic printing plate in which no pre-heat step is used comprising the steps of:—providing a lithographic printing plate precursor comprising a support and a photopolymerizable image-recording layer, the image-recording layer comprising a monomer and a binder;—image-wise exposing the precursor in an exposure unit;—off press developing... Agent: Agfa Graphics Nv
20110143285 - Method of fabricating liquid crystal display device: A method of fabricating a transflective type liquid crystal display device includes: forming gate and data lines with a gate insulating layer therebetween on a substrate and crossing each other to define a pixel region that includes a switching region, a reflective region, and a transmissive region; forming a thin... Agent:
20110143286 - Laser apparatus, light therapy apparatus, exposure apparatus, device manufacturing method, and object inspection apparatus: The present invention greatly reduces the likelihood that fiber fusion will occur. A laser apparatus comprises an excitation light source and an optical amplifier unit, which optically amplifies by receiving excitation light that is output from the excitation light source and that transits an optical fiber. A monitor unit monitors... Agent: Nikon Corporation
20110143287 - Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method: According to one embodiment relates to an optical system radially downsized and corrected well for aberration and is applicable, for example, to an aberration measuring apparatus for measuring wavefront aberration of a liquid immersion projection optical system. A catadioptric system of a coaxial type is provided with a first optical... Agent: Nikon Corporation
20110143288 - Radiation source, lithographic apparatus and device manufacturing method: A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning... Agent: Asml Netherlands B.v.
20110143289 - Substrate processing method, computer-readable storage medium and substrate processing system: A PEB unit has a first heat plate and a second heat plate. After an exposure process for a resist film for EUV on a wafer and before a development process, the PEB unit heats the wafer through the first heat plate at a first heating temperature. A heating time... Agent: Tokyo Electron Limited
20110143290 - Developing treatment method and computer-readable storage medium: An extreme ultra violet (EUV) resist film is formed on a wafer W, and then a EUV light is radiated onto the EUV resist film formed on the wafer W so that a predetermined pattern is selectively exposed on the EUV resist film. Thereafter, a developing solution with a concentration... Agent: Tokyo Electron Limited06/09/2011 > 18 patent applications in 14 patent subcategories. invention type
20110136048 - Photomask and pattern formation method using the same: A photomask includes: a transparent substrate having a transparent property against exposing light; a first light-shielding pattern formed on the transparent substrate and having a first dimension; a second light-shielding pattern formed on the transparent substrate and having a second dimension larger than the first dimension; and an opening provided... Agent: Panasonic Corporation
20110136049 - Imaging members comprising fluoroketone: Improved electrophotographic imaging members which pertain to the incorporation of a fluoroketone into the charge transport layer to achieve a structurally simplified flexible electrophotographic imaging member that remains flat without the need for an anticurl back coating layer. The imaging member is both more slippery and has a reduced coefficient... Agent: Xerox Corporation
20110136052 - Method of manufacturing toner and toner: p
20110136051 - Toner, and developer, image forming method and process cartridge using the toner: A toner for use in developing an electrostatic latent image is provided. The toner includes a colored particulate material including at least a binder resin and a colorant; and an external additive present on a surface of the colored particulate material and including a particulate crystalline hydroxyapatite. The particulate crystalline... Agent:
20110136056 - Toner compositions: The present disclosure relates to a toner including a core comprising at least one amorphous resin, at least one crystalline resin and one or more optional ingredients such as optional colorants, optional waxes, gels, and combinations thereof. The toner also includes a shell having an environmentally friendly charge control agent... Agent: Xerox Corporation
20110136053 - Hyper-branched polyester for use in cpt toner and method of preparing the same: A hyper-branched polyester and a method of making the same having a tri-functional monomer A3, a di-functional monomer B2 and a mono-functional monomer C1 having a monomer ratio of A3:B2:C1 from about 1:0.2:2 to about 1:1.4:0.2 for use in a chemically processed electrophotographic toner providing a lower fusing temperature. In... Agent:
20110136054 - Toner: A toner having toner base particles each of which contains at least a binder resin and a colorant, and silica titania composite particles. The silica titania composite particles contain silica in an amount of from 55.0% by mass to 85.0% by mass; and, in a chart obtained by the measurement... Agent: Canon Kabushiki Kaisha
20110136055 - Toner: A toner having good dispersibility of a pigment and a release agent therein and having excellent low temperature fixability is provided. The toner includes a binder resin, a pigment and a release agent, and the binder resin includes a graft polymer in which abietic acids and an unsaturated fatty acid... Agent:
20110136057 - Method for treating electrophotographic carrier, method for producing electrophotographic carrier, core material and carrier: A method for treating an electrophotographic carrier, including treating, with supercritical pure water, the electrophotographic carrier containing at least a core material and a coating layer, so that the coating layer is separated from the core material, wherein the supercritical pure water is obtained by bringing, into a supercritical state,... Agent:
20110136058 - Emulsion aggregation methods: A method of making toner particles, including: mixing, at less than about 17° C. and without homogenizing, a resin emulsion with a coagulant, a colorant, an optional wax, and optional additives, to form pre-aggregated particles in a slurry; heating the slurry to form aggregated toner particles; freezing aggregation of the... Agent: Xerox Corporation
20110136059 - Method for preparing multiple emulsion and porous polymer particles therefrom: A method of manufacturing a double emulsion with narrow dispersed phase particle size distribution comprising: providing an organic phase comprising solid hydrocolloid particles dispersed in an organic solvent; and dispersing the organic phase in an aqueous phase in the presence of a controlled amount of stabilizing agent to form an... Agent:
20110136060 - Toner and two-component developer: m
20110136061 - Crosslinked polyimide, composition comprising the same and process for producing the same: A novel polyimide which retains the characteristics of polyimides, that is, excellent heat resistance, electrical insulation and chemical resistance, of which dielectric constant is lower than those of the known polyimides, as well as a composition containing the same and a process for producing the same, is disclosed. The polyimide... Agent:
20110136062 - Positive photosensitive composition and pattern forming method using the same: A positive photosensitive composition, includes: (A) a resin having a repeating unit represented by formula (1) as defined in the specification and a repeating unit represented by formula (2) as defined in the specification and being capable of increasing a solubility of the resin (A) in an alkali developer by... Agent: Fujifilm Corporation
20110136063 - Method to fabricate a redirecting mirror in optical waveguide devices: A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer... Agent: Pgt Photonics S.p.a.
20110136064 - Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacutring method: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the... Agent: Asml Netherlands B.v.
20110136065 - Color intermediate motion picture film: Silver halide photographic elements that are color intermediate motion picture films have at least one green sensitive silver halide emulsion that includes a green sensitizing dye that is a cyanine dye having two oxazole groups in the molecule, and another green sensitizing dye having either two imidazole groups in the... Agent:06/02/2011 > 19 patent applications in 17 patent subcategories. invention type
20110129764 - Sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof: A sensitive liquid crystalline polymeric material suitable for the reflective hologram recording and the preparing method thereof are disclosed. The material includes a base film, a buffer layer coated on one side of the base film, a sensitive polymeric layer coated on the other side of the buffer layer and... Agent: Shanghai Fundan Techsun New Technology Co. Ltd.
20110129766 - Lithographic pellicle: A lithographic pellicle comprises a pellicle film (1), a pellicle frame (3), and a PSA layer (4). The pellicle film (1) is stretched across and mounted to the pellicle frame (3) at its top end. The PSA layer (4) is disposed on the bottom end of the frame (3) and... Agent: Shin-etsu Chemical Co., Ltd.
20110129765 - Negative resist composition and patterning process: There is disclosed a negative resist composition wherein a base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000, and the compound containing a nitrogen atom as a basic component contains... Agent: Shin-etsu Chemical Co., Ltd.
20110129767 - Pellicle for lithography: A pellicle 10 for lithography includes a pellicle frame 3, a pellicle membrane 1 adhered onto the upper end surface of the pellicle frame 3 and an agglutinant layer 4 formed on the lower surface of the pellicle frame 3 and the agglutinant layer 4 is formed by hardening a... Agent: Shin-etsu Chemical Co., Ltd.
20110129768 - Electrophotographic photosensitive member, method for producing the same, process cartridge, and electrophotographic apparatus: According to aspects of the present invention, an electrophotographic photosensitive member includes a surface layer comprising a cured resin obtained by polymerizing a compound having at least one polymerizable functional group. Aspects of the present invention provide an electrophotographic photosensitive member whose surface layer comprises a compound (urea derivative) having... Agent: Canon Kabushiki Kaisha
20110129769 - Corona and wear resistant imaging member: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of an ozone quenching compound into the charge transport layer to quench the corona effluents and protect the... Agent: Xerox Corporation
20110129770 - Electrophotographic photosensitive member and electrophotographic apparatus: The present invention provides an electrophotographic photosensitive member including: a conductive substrate; a photoconductive layer on the conductive substrate; and a surface layer made of hydrogenated amorphous silicon carbide on the photoconductive layer, wherein (C/(Si+C)) in the surface layer is 0.61 to 0.75 (both inclusive), Si+C atom density in the... Agent: Canon Kabushiki Kaisha
20110129774 - Incorporation of an oil component into phase inversion emulsion process: A process for making a resin emulsion suitable for use in forming toner particles including an oil component incorporated into the latex core of the toner particles.... Agent: Xerox Corporation
20110129771 - Transparent toner and image forming method: A transparent toner for forming a glossy surface is disclosed, wherein a critical surface tension of a glossy surface formed by the transparent toner at 20° C. is at least 50 mN/m, and the transparent toner comprises a resin composed of a polymer formed by employing at least a polymerizable... Agent: Konica Minolta Business Technologies, Inc.
20110129772 - Porous ferrite core material for electrophotographic developer, resin-filled ferrite carrier and electrophotographic developer using the ferrite carrier: A porous ferrite core material for an electrophotographic developer, the porous ferrite core material including Mg in a content of 0.3 to 3% by weight, Ti in a content of 0.4 to 3% by weight and Fe in a content of 60 to 70% by weight, and the porous ferrite... Agent: Powdertech Co., Ltd.
20110129773 - Toner, developer, developer container, method of manufacturing toner, and image forming method: A toner including a binder resin comprising a modified polyester having an ester bond and a chemical bond other than the ester bond, and a crystalline polyester; and a release agent comprising a microcrystalline wax comprising a hydrocarbon having 20 to 80 carbon atoms which comprises 55 to 70% by... Agent:
20110129775 - Image forming toner, image forming apparatus, image forming method, and process cartridge: The present invention provides an image forming toner including at least a linear polyester resin (b1) as a binder resin, wherein the linear polyester resin (b1) is obtained by reacting a polyester diol (b11) having a polyhydroxycarboxylic acid skeleton, with a polyester diol (b12) other than the polyester diol (b11)... Agent:
20110129776 - Image-forming method: An image-forming method is provided which enable high-quality images to be formed over a long time period. In the image-forming method, an electrophotographic photosensitive member is used having a surface layer formed of a hydrogenated amorphous silicon carbide in which a ratio of the number of carbon atoms to the... Agent: Canon Kabushiki Kaisha
20110129777 - Chemically amplified resist composition and patterning process: A chemically amplified resist composition comprising a base polymer, an acid generator, and a basic compound of thiomorpholine dioxide structure has many advantages including a high contrast of alkaline dissolution rate before and after exposure, a good pattern profile after exposure, minimized roughness, and a wide focus margin. The resist... Agent: Shin-etsu Chemical Co., Ltd.
20110129778 - Oxime ester compound and photopolymerization initiator containing the same: wherein, R1 and R2 each represent R11, COR11, CONR12R13, CN, etc.; R11, R12, and R13 each represent a C1-20 alkyl group, etc.; R3 and R4 each represent R11, OR11, COR11, CONR12R13, OCOR11, CN, a halogen atom, etc.; a and b each represent an integer of 0 to 4; X represents... Agent: Adeka Corporation
20110129779 - Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same: A laser induced thermal imaging (LITI) method, a method of patterning an organic layer using the same and a method of manufacturing an organic light emitting diode (OLED) display device using the same. The LITI method includes preparing a substrate including a transfer layer, preparing a donor substrate including a... Agent: Samsung Mobile Display Co., Ltd.
20110129780 - Method for manufacturing semiconductor device: According to one embodiment, a manufacturing method includes performing lithography processes for manufacturing a semiconductor device that includes a three-dimensional stacked device. The stacked device includes layers stacked above a substrate. Each of the layers includes a device circuit. The lithography processes include a lithography process for forming a lower... Agent:
20110129781 - Methods of forming a pattern using photoresist compositions: In a photoresist composition, methods of forming a pattern using the same, and methods of manufacturing a semiconductor device using the same A photoresist film may be formed on a substrate by coating a photoresist composition including a polymer and a solvent. The polymer includes a first repeating unit and... Agent:
20110129782 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is provided having a table configured to support a substrate; a sensor or target for a sensor is provided on a surface of the table and a cover is provided extending from an edge of the table; in addition, a liquid displacement device is provided including... Agent: Asml Netherlands B.v.Previous industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
RSS FEED for 20130516:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.
FreshPatents.com Support - Terms & Conditions
Results in 0.97897 seconds