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Radiation imagery chemistry: process, composition, or product thereof March listing by industry category 03/11

20110076599 - Apparatus and method for aligning mask: An apparatus and method for aligning a mask that includes disposing and firstly aligning a mask over a first substrate, with a space interposed therebetween, bringing the mask into contact with the first substrate and then measuring the alignment state of the mask with respect to the first substrate to... Agent: Samsung Mobile Display Co., Ltd.

20110076600 - Method for manufacturing parallax barrier and method for manufacturing photomask: A method for manufacturing a parallax barrier including light blocking portions that block light and openings that transmit light, includes: a light-blocking layer formation step of forming a light-blocking layer on a light-transmissive substrate; a pattern formation step of forming the openings, which are formed of a plurality of rectangular... Agent: Seiko Epson Corporation

20110076601 - Monitoring method of exposure apparatus: Here, α, β1 and β2 are constants, ΔE=E−E0, ΔF=F−F0, E represents a real exposure dose, F represents a real exposure focus, E0 represents a dose defined when a middle critical dimension of the test pattern is equal to a predetermined value, F0 represents a focus defined when TCD of the... Agent: United Microelectronics Corp.

20110076602 - Electrophotographic photoconductor and image forming apparatus including the same: r

20110076603 - Organic photoreceptor, image forming apparatus and process cartridge: An object of the invention is to provide an image forming apparatus and process cartridge both employing the organic photoreceptor by improving an abrasion resistance of the organic photoreceptor up to the same level as an amorphous silicone photoreceptor, the image blur and image flow problem liable to generate in... Agent: Konica Minolta Business Technologies, Inc.

20110076604 - Polyester-based photoreceptor overcoat layer: The presently disclosed embodiments are directed generally to an improved electrostatographic imaging member in which the overcoat layer comprises cross-linkable polyester resins. The overcoat layer not only provides wear resistance, but it also provides higher charge transport efficiency and therefore better photoelectrical properties. In addition, the polyesters can cross-link with... Agent: Xerox Corporation

20110076605 - Electrophotographic photoreceptor, method for producing electrophotographic photoreceptor, process cartridge and image forming apparatus: An electrophotographic photoreceptor includes an electroconductive substrate and a photosensitive layer formed thereon, the photosensitive layer including a sub-layer that constitutes an outermost surface of the photosensitive layer, the sub-layer including an organic solvent having a boiling point of from about 65° C. to about 250° C. in an amount... Agent: Fuji Xerox Co., Ltd.

20110076607 - Toner, developer, toner accommodating container, process cartridge and image forming method: A toner including at least one polyester resin serving as a binder resin, a colorant, a releasing agent, and a fixing aid, wherein the fixing aid includes a fatty acid amide-based compound, and the fatty acid amide-based compound is at least one of a fatty acid amide compound having a... Agent:

20110076606 - Toner, developer, toner cartridge, process cartridge, and image forming apparatus: There is provided a toner for electrostatic latent image developing, which includes a binder resin; a carbon black-surface treated with an isocyanate compound including a plurality of isocyanate groups which include one or more isocyanate groups that are not bonded to the carbon black; and a release agent having an... Agent: Fuji Xerox Co., Ltd.

20110076608 - Carbon black, a process for preparation thereof and use thereof: Carbon black with a content of polycyclic aromatic hydrocarbons measured by the 22 PAH method of less than 5 ppm and an STSA surface area of <90 m2/g. The carbon black is prepared by treating the starting carbon black with electromagnetic radiation. The carbon black can be used in rubber,... Agent: Evonik Degussa Gmbh

20110076609 - Toner containing binder resin having wax properties and method of preparing the toner: Provided are a toner containing a resin having wax properties and a method of preparing the toner. The toner includes a binder resin into which at least one residue of the group consisting of a C8-C60 higher fatty acid residue and a C8-C60 higher alcohol residue is introduced by esterification,... Agent: Samsung Fine Chemicals Co., Ltd.

20110076610 - Method of manufacturing toner and toner manufactured by the method: A method of manufacturing toner including melting, mixing, and kneading a releasing agent and a coloring agent with at least part of a polyester binder resin, and suspending and granulating an oil phase comprising the binder resin, the coloring agent, and the releasing agent in an aqueous medium.... Agent:

20110076611 - Digital manufacture of an optical waveguide: The electrographic printing of one or more multi-channeled layers having a particular pattern by electrographic techniques that produces a three-dimensional optical waveguide electrographically. Such electrographic printing comprises the steps of forming a desired print image, electrographically, on a receiver member utilizing predetermined sized marking particles; and, where desired, forming one... Agent:

20110076612 - Toner, method for producing the same, and developer: A method for producing a toner, containing: dispersing, in an aqueous medium, an oil phase which contains an organic solvent, and a binder resin component contained in the organic solvent, where the binder resin component contains a crystalline polyester resin and an amorphous polyester resin; and removing the organic solvent... Agent:

20110076615 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: m

20110076614 - Method of drying organic pigment, method of processing phthalocyanine pigment, and method of manufacturing electrophotographic photosensitive member: A method of drying an organic pigment is provided which includes an under-depressurization microwave drying step of irradiating the organic pigment with microwaves under depressurization and drying the organic pigment. A method of processing a phthalocyanine pigment and a method of manufacturing an electrophotographic photosensitive member are also provided each... Agent: Canon Kabushiki Kaisha

20110076613 - Resin composition for laser engraving, relief printing plate precursor for laser engraving and method for producing the same, and relief printing plate and method for making the same: A resin composition for laser engraving, including at least a phenol derivative (A) represented by the following Formula (A), a binder polymer (B), and a crosslinking agent (C), wherein the content of the phenol derivative (A) with respect to the total solid content of the resin composition is from 5%... Agent: Fujifilm Corporation

20110076616 - Lithographic printing plate precursor and plate making method of lithographic printing plate: A lithographic printing plate precursor, comprising a support having thereon an image-recording layer containing (A) an infrared absorbing agent, (B) a radical polymerization initiator, (C) a radical polymerizable compound, (D) a polymer compound containing a polyoxyalkylene structure and (E) an ultraviolet absorbing agent and being capable of forming an image... Agent:

20110076618 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes an aluminum support subjected to a surface roughening treatment, and an image-recording layer, the image-recording layer contains an infrared absorbing agent, a radical polymerization initiator, a radical polymerizable compound and an inorganic particle which has, on a surface of the inorganic particle, an acrylic... Agent:

20110076617 - Photoresist composition: l

20110076619 - Method for modifying first film and composition for forming acid transfer resin film used therefor: A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid... Agent: Jsr Corporation

20110076620 - Dithiane derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition: f

20110076621 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes a support, and an image-recording layer, the image-recording layer contains a urethane resin having a polyalkylene oxide chain represented by the formula (1) as defined herein in a side chain, an infrared absorbing agent, a radical polymerizable compound and a radical polymerization initiator, and... Agent:

20110076622 - Positive resist composition for immersion exposure and pattern-forming method using the same: A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with... Agent: Fujifilm Corporation

20110076623 - Method for reworking silicon-containing arc layers on a substrate: A method is provided for reworking film structures containing silicon-containing anti-reflective coating (SiARC) layers in semiconductor device manufacturing. The method includes providing a substrate containing a film stack that includes SiARC layer thereon, and a resist pattern formed on the SiARC layer. The method further includes removing the resist pattern... Agent: Tokyo Electron Limited

20110076625 - Method of forming patterns: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the... Agent: Fujifilm Corporation

20110076624 - Photoresist stripping technique: A method for fabricating an integrated circuit device is disclosed. The method may include providing a substrate; forming a first material layer over the substrate; forming a patterned second material layer over the substrate; and removing the patterned second material layer with a fluid comprising a steric hindered organic base... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110076626 - Positive-working photoimageable bottom antireflective coating: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces... Agent:

20110070532 - Color filter manufacturing method, patterned substrate manufacturing method, and small photomask: A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed... Agent: Toppan Printing Co., Ltd.

20110070533 - Photomask blank, photomask , and method for manufacturing photomask blank: The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive substrate; the light-shielding film has a laminated structure in which a back-surface antireflection layer, a light-shielding layer and a... Agent: Hoya Corporation

20110070531 - Photomask designing method, photomask manufacturing method, and photomask designing program: In one embodiment, a photomask designing method is disclosed. The method includes dividing design pattern data into predetermined regions and obtaining a pattern perimeter for each of the divided regions. The method includes obtaining the pattern perimeter for an entire region of the design pattern data by repeating the obtaining... Agent: Kabushiki Kaisha Toshiba

20110070534 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer to reflect EUV light, an absorber layer to absorb EUV light and a low reflective layer to an inspection light (wavelength:190 nm to 260 nm) for a mask pattern, formed in this order over the substrate,... Agent: Asahi Glass Company Limited

20110070535 - Toner for electrostatic latent image development and image forming method: A toner for electrostatic latent image development is disclosed comprising colored particles containing a binder resin and a colorant and external-additive particles attached to the surfaces of the colored particles, wherein the external-additive particles comprise resin particles covered with an inorganic layer, and the resin particles are bound to the... Agent: Konica Minolta Business Technologies, Inc.

20110070537 - Electrophotographic photoreceptor: An image forming method employing a photoreceptor and a polymerization toner, wherein the photoreceptor comprises a photosensitive layer provided on a surface of a cylindrical electroconductive substrate, a surface of the photoreceptor has a shape composed of plural lower portions and plural higher portions, a surface roughness of a top... Agent: Konica Minolta Business Technologies, Inc.

20110070536 - Oxide material, electrophotographic photoreceptor, process cartridge, and image forming device: An oxide material including gallium, zinc and oxygen, a ratio of the number of atoms of zinc to the number of atoms of gallium (number of atoms of zinc/number of atoms of gallium) being from about 0.01 to about 0.6 and a ratio of the number of atoms of oxygen... Agent: Fuji Xerox Co., Ltd.

20110070539 - Electrostatic-image-developing toner, electrostatic image developer, image forming apparatus, and image forming method:

20110070538 - Coated carriers: The present disclosure provides carriers for use with toner compositions. In embodiments, a carrier may include a core, having a dry powder polymer coating. In embodiments, the coating may also include a colorant, such as carbon black. Processes for coating such carriers with the dry powder polymer coatings are also... Agent: Xerox Corporation

20110070540 - Coated carriers: The present disclosure provides carriers for use with toner compositions. In embodiments, a carrier may include a core, having a dry powder polymer coating. In embodiments, the coating may also include a colorant, such as carbon black. Processes for coating such carriers with the dry powder polymer coatings are also... Agent: Xerox Corporation

20110070541 - Capsule toner and method of manufacturing capsule toner: A capsule toner achieving both low temperature fixability and hot offset resistance, and a method of manufacturing the capsule toner are provided. A capsule toner includes a toner base particle containing a binder resin and a colorant, and a resin coating layer formed on a surface of the toner base... Agent:

20110070542 - Photoresist and patterning process: A method and material layer for forming a pattern are disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photoacid generator and a photobase generator; and exposing... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110070543 - Aqueous base-developable negative-tone films based on functionalized norbornene polymers: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imageable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.... Agent: Promerus LLC

20110070544 - Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method: By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity,... Agent: Central Glass Company,ltd.

20110070545 - High normality solution for removing freeze material in lithographic applications: A method for patterning a substrate is described. The method comprises forming a layer of radiation-sensitive material on the substrate, preparing a pattern in the layer of radiation-sensitive material, and applying a chemical freeze layer over the layer of radiation-sensitive material to form a frozen layer of radiation-sensitive material. Thereafter,... Agent: Tokyo Electron Limited

20110070547 - Methods for mastering microstructures through a substrate using negative photoresist: Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems,... Agent: Bright View Technologies Corporation

20110070546 - Single photoresist approach for high challenge photo process: A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110070548 - Silver halide photosensitive material and process of producing black and white image using the same: Disclosed is a silver halide photographic photosensitive material which includes a support and at least one silver halide photosensitive layer on the support, wherein the average equivalent sphere diameter of the silver halide of the silver halide photosensitive layer is 0.30 μm or less, the silver halide photosensitive layer includes... Agent: Fujifilm Corporation

20110065027 - Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device: In one embodiment, a flare correction method is disclosed. The method can acquire a flare point spread function. The method can calculate a pattern density distribution in a first region of the mask, the distance from the pattern being equal to or shorter than a predetermined value in the first... Agent:

20110065029 - Method of manufacturing mask structure: A method of forming a mask structure for an extreme ultraviolet ray lithography (EUVL) process includes defining a substrate including a first area and a second area, such that the first area has a pattern structure configured to selectively transmit light for the EUVL process and the second area encloses... Agent:

20110065028 - Pattern generating method, manufacturing method of mask, and manufacturing method of semiconductor device: According to the embodiments, each of a main pattern of a mask to be transferred onto a substrate by using a lithography process, a first assist pattern that improves a resolution of an on-substrate pattern obtained by transferring the main pattern onto the substrate, and a second assist pattern that... Agent:

20110065030 - Mask pattern determining method, mask manufacturing method, and device manufacturing method: According to one embodiment, a mask pattern determining method includes a mask-pattern dimension variation amount of a first photomask is derived. Moreover, a correspondence relationship between a target dimension value of an on-substrate test pattern formed by using a second photomask and a dimension allowable variation amount of a mask... Agent:

20110065031 - Image forming apparatus and image forming method: An image forming apparatus comprising an exposure device for exposing an image bearing member to light in accordance with monochromatic image data provided by color separation of inputted multi-color image data to form an electrostatic latent image; a control device for calculating an exposure amount of each pixel of the... Agent: Canon Kabushiki Kaisha

20110065032 - Electrophotographic pohotoreceptor, image forming method, image forming apparatus, and process cartridge for image forming apparatus using the photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; a charge generation layer overlying the substrate; a first charge transport layer mostly formed of a molecular dispersion film in which a binder resin comprises a low-molecular-weight charge transport material, overlying the charge generation layer; and a second charge transport layer formed of... Agent: Ricoh Company , Ltd.

20110065033 - Toner, method of forming images, and process cartridge: A toner including a binder resin, a coloring agent, a releasing agent, and an additive, the releasing agent having a loss on heat of from 0.5 to 2.0% after being left at 165° C. for 10 minutes, the ratio (P2850/P828) of an absorption strength of a peak at 2,850 cm−1... Agent:

20110065035 - Electrostatic charge image developing toner, electrostratic charge image developer, toner cartridge, process cartridge, and image forming apparatus: An electrostatic charge image developing toner including: toner particles including a binder resin and a colorant; polytetrafluoroethylene particles in which a content of perfluorooctanoic acid and a salt thereof is 0.5 ppm or less; and silica particles in which a content of water is from 0.1% by weight to 10%... Agent: Fuji Xerox Co., Ltd.

20110065034 - Toner for electrostatic charge image development, electrostatic charge image developer, toner cartridge, process cartridge and image forming device:

20110065036 - Toner, developer, and image forming method: wherein the crystalline organic compound is any one of a crystalline polyester resin (b) and a crystalline low molecular compound having a melting point of 60° C. to 100° C., and being selected from a group consisting of fatty acid having 16 to 24 carbon atoms, alcohol having 16 to... Agent:

20110065037 - Latent electrostatic image developing carrier, two-component developer and image forming method: A latent electrostatic image developing carrier including a carrier core material, and a coating layer containing a resin and provided on a surface of the carrier core material, wherein the coating layer includes a particulate material containing at least first fine conductive particles and second fine conductive particles, and wherein... Agent:

20110065038 - Curable toner compositions and processes: Processes for producing emulsion aggregation toners are provided. In embodiments, methods of the present disclosure may be utilized to produce toners suitable for low melt applications, including use in flexible packaging applications, where low pile height is desired for low cost and flexibility. In embodiments, the EA toners may include... Agent: Xerox Corporation

20110065039 - Toner binder and toner: o

20110065042 - Photopolymerizable composition: A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt. % of a polythiol compound and has a very... Agent: Agfa Graphics Nv

20110065040 - Photoresist composition: c

20110065041 - Photoresist composition:

20110065043 - Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part: A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a photopolymerization initiator.... Agent:

20110065044 - Polymer for lithographic purposes and method for producing same: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen... Agent:

20110065045 - Epoxy-functionalized perfluoropolyether polyurethanes: Disclosed are epoxy-functionalized perfluoropolyether polyurethane compounds having the following general structure (RfQX1C(O)NH)m—Ri—(NHC(O)X2Q(E)o)n wherein Rf is a monovalent perfluoropolyether moiety; Q is independently a connecting group of valence at least 2, which may contain heteroatoms; X1 is O, S, or NR, wherein R is H or a lower alkyl of 1... Agent:

20110065047 - Photoresist composition: s

20110065046 - Photosensitive resin compositions and photosensitive dry films using the same: It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a... Agent:

20110065048 - Lithographic imaging and printing with printing members having fusible polymeric particles: Embodiments of the present invention involve printing members that utilize a particle-fusion imaging mechanism but avoid susceptibility to handling damage. In particular, printing plates in accordance with the invention may utilize two phases, and these may originate, during manufacture, as two particle systems. Both systems are initially dispersed in a... Agent: Presstek, Inc.

20110065049 - Pattern forming method and manufacturing method of semiconductor device: A disclosed mask pattern forming method includes isotropically coating a surface of a resist pattern array having a predetermined line width with a silicon oxide film, embedding a gap in the resist pattern array coated by the silicon oxide film with a carbon film, removing the carbon film from the... Agent: Tokyo Electron Limited

20110065050 - Methods of forming intermediate semiconductor device structures using spin on, photopatternable, interlayer dielectric materials: A cap material may be formed over a photopatternable material on a semiconductor substrate. The cap material absorbs or reflects radiation and protects the photopatternable material from a first wavelength of radiation used in patterning the photoresist layer. Upon exposure to a first wavelength of radiation, the photopatternable material may... Agent: Micron Technology, Inc.

20110065053 - Material for forming protective film and method for forming photoresist pattern: In the general formula (A-1), R1 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; R2, R3, and R4 are each independently an alkylene chain having 1 to 6 carbon atoms or the like; R5 and R6 are each independently an alkyl group... Agent: Tokyo Ohka Kogyo Co., Ltd.

20110065052 - Resist coating and developing apparatus and method: A resist coating/developing apparatus includes: a resist film-forming unit configured to apply a resist onto a substrate to form thereon a resist film; a resist developing unit configured to develop the resist film after exposure to pattern the resist film; a solvent gas generator configured to generate a solvent gas... Agent: Tokyo Electron Limited

20110065051 - Supporting device, optical apparatus, exposure apparatus, and device manufacturing method: A supporting device that supports an optical element in a gravitational force direction, the supporting device comprises: a supporting member to be connected via an adhesive to an outer circumference of the optical element, the supporting member including a plurality of members each of which has a projection for supporting... Agent: Canon Kabushiki Kaisha

20110059390 - Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask: A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no... Agent: Hoya Corporation

20110059391 - Reflective mask, reflective mask blank and method of manufacturing reflective mask: A reflective mask of this invention includes a multilayer reflective film (13), on a substrate (11), having a structure in which high refractive index layers and low refractive index layers are alternately laminated, and an absorbing film (15) stacked on the multilayer reflective film (13) and adapted to absorb EUV... Agent: Hoya Corporation

20110059392 - Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, and electrophotographic process cartridge: An electrophotographic photoreceptor including a conductive substrate and a photosensitive layer overlying the conductive substrate. The photosensitive layer comprises a phthalimide isoindole derivative having a specific chemical formula.... Agent: Ricoh Company, Ltd.

20110059393 - Image bearing member, image forming apparatus, and process cartridge: where A1, A2, A3, and A4 independently represent an alkyl group having 1 to 4 carbon atoms, a substituted or non-substituted aryl group, or —CH2(CH2)mZ, where Z represents a substituted or non-substituted aryl group, a substituted or non-substituted cycloalkyl group, and a substituted or non-substituted heterocycloalkyl group, and m represents... Agent:

20110059394 - Capsule toner, method of manufacturing the same, and two-component developer: There are provided a capsule toner, a two-component developer, and a capsule toner manufacturing method. The capsule toner in which a resin coating layer made of fine release-agent particles and fine resin particles is made on the surfaces of toner base particles, and thus excellent offset resistance without impairing blocking... Agent:

20110059395 - Light fixing toner, and one-component developer and two-component developer containing the light fixing toner: A light fixing toner fixed by light irradiation without containing an infrared absorber, a one-component and a two-component developer containing the light fixing toner are provided. An infrared absorber-free light fixing toner is constituted of toner base particles containing a binder resin and a colorant, and having a shape factor... Agent:

20110059396 - Patterning process and chemical amplified photoresist with a photodegradable base: A method for fabricating an integrated circuit device is disclosed. The method includes providing a substrate; forming a first material layer over the substrate; forming a second material layer over the first material layer, wherein the second material layer comprises a photodegradable base material; and exposing at least a portion... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110059398 - Photopolymerizable composition: A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt. % of a polythiol compound and has a very... Agent: Agfa Graphics Nv

20110059397 - Positive photosensitive polyimide composition: The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to... Agent: Lg Chem, Ltd.

20110059399 - Positive-working radiation-sensitive imageable elements: Positive-working imageable elements having improved sensitivity, high resolution, and solvent resistance are prepared using a water-insoluble polymeric binder comprising vinyl acetal recurring units that have pendant hydroxyaryl groups, and recurring units comprising carboxylic acid aryl ester groups that are substituted with a cyclic imide group. These imageable elements can be... Agent:

20110059400 - Photoresist composition: wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more... Agent: Sumitomo Chemical Company, Limited

20110059401 - Method for preparing lithographic printing plates: A method of preparing a lithographic printing plate including the steps of providing a lithographic printing plate precursor including a photopolymerizable coating provided on a hydrophilic support;—image-wise exposing the precursor;—pre-heating the exposed precursor;—developing the exposed precursor in a gum solution; wherein after pre-heating and before developing the precursor an accelerated... Agent: Agfa Graphics Nv

20110059402 - Exposure method: According to the embodiments, exposure is performed on a resist on a substrate at a first focus position by using a phase shift mask in which a first light transmitting area and a second light transmitting area are formed adjacently via a light shielding pattern and a phase difference between... Agent:

20110059403 - Method of forming wiring pattern, method of forming semiconductor device, semiconductor device, and data processing system: A method of forming a pattern includes the following processes. A first lithography process is performed. The first lithography process is applied to a first region of a substrate. A second lithography process is performed. The second lithography process is applied to the first region and to a second region... Agent: Elpida Memory, Inc.

20110059404 - Resist underlayer film forming composition and forming method of resist pattern using the same: It is an object to provide a resist underlayer film forming composition having a large selection ratio of a dry etching rate, and having a k value and an n value at a short wavelength such as an ArF excimer laser, both of which exhibit desired values. There is provided... Agent: Nissan Chemical Industries, Ltd.

20110059406 - Pattern forming method: According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each... Agent:

20110059405 - Substrate processing method: A substrate processing method, includes: forming a resist film above a substrate; exposing the resist film; developing the resist film using a developing fluid after the exposing of the resist film; cleaning the resist film using a rinsing fluid after the developing of the resist film; and drying the resist... Agent:

20110059407 - Double patterning strategy for forming fine patterns in photolithography: A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer within the hardened first resist features, and patterning the second resist layer to form at least one second resist feature between... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20110053054 - Compositions, optical data storage media and methods for using the optical data storage media: There are provided compositions, optical data storage media and methods of using the optical data storage. The compositions comprise a non-linear sensitizer comprising one or more platinum ethynyl complexes capable of absorbing actinic radiation to cause upper triplet energy transfer to a reactant that undergoes a photochemical change upon triplet... Agent:

20110053055 - Compositions, optical data storage media and methods for using the optical data storage media: There are provided compositions, optical data storage media and methods of using the optical data storage media. The compositions comprise a non-linear sensitizer comprising one or more subphthalocyanine reverse saturable absorbers capable of absorbing actinic radiation to cause upper triplet energy transfer to a reactant that undergoes a photochemical change... Agent:

20110053057 - Mask blank, transfer mask, and methods of manufacturing the same: Provided is a mask blank for producing a transfer mask adapted to ArF excimer laser exposure light. The mask blank has a light-shielding film on a transparent substrate. The light-shielding film has a structure in which a light-shielding layer and a front-surface antireflection layer are laminated in this order from... Agent:

20110053059 - Mask blanks: The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the... Agent:

20110053056 - Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography: In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of... Agent:

20110053058 - Semiconductor device fabrication mask and method of manufacturing the same: According to one embodiment, a semiconductor device fabrication mask comprises a light-transmitting substrate, and a semi-light-shielding pattern and a light-shielding pattern formed on portions of the light-transmitting substrate, wherein the concentration of an S-containing material is 0.4% or less within the range of a depth of 1 nm from the... Agent:

20110053061 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four heads installed on the wafer stage on a scale plate which covers the movement range of the wafer stage except for the area right under a... Agent:

20110053060 - Exposure device, exposure method, and method for manufacturing semiconductor device: An exposure device includes a determining unit determines specific transfer patterns, which are transfer patterns of predetermined portions of a unit pattern, among transfer patterns projected through a photomask including an internal pattern having a plurality of unit patterns that is arranged at a predetermined interval and has the same... Agent:

20110053062 - Exposure method, exposure apparatus, and device manufacturing method: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven... Agent:

20110053063 - Toner, developer, developing device, process cartridge, image forming apparatus, image forming method, and method of manufacturing toner: A toner is provided including a core particle comprising a binder resin, a colorant, and a release agent, and a shell layer comprising particles of a vinyl resin. The vinyl resin comprises 80% by weight or more of a unit of an aromatic compound having a vinyl-polymerizable functional group. A... Agent:

20110053064 - Overcoat layer comprising core-shell fluorinated particles: The presently disclosed embodiments are directed generally to an improved electrophotographic imaging member in which the overcoat layer incorporates core-shell fluorinated nano- or micro-particles encapsulated in a melamine shell to reduce torque and cleaning failures during the photoreceptor cleaning process.... Agent:

20110053068 - Flexible imaging member belts: Embodiments pertain to a flexible imaging member used in electrostatography and processes for making and using the imaging member. More particularly, the embodiments pertain to a structurally simplified flexible electrophotographic imaging member that has reasonable flatness and exhibits good performance without the need of an anticurl back coating layer.... Agent:

20110053067 - Anticurl backside coating (acbc) photoconductor: A photoconductor that includes a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer of at least one charge transport component, and wherein the first layer is in contact with the supporting substrate on the reverse side thereof, and which first layer is... Agent:

20110053065 - Plasticizer containing photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a cyclohexanecarboxylate.... Agent:

20110053066 - Poss melamine overcoated photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, a charge transport layer or layers, and an overcoating layer containing a crosslinked mixture of a POSS component, a melamine polymer, and a charge transport like a hole transport compound.... Agent:

20110053069 - Flexible imaging member belts: Embodiments pertain to a flexible imaging member used in electrostatography and processes for making and using the imaging member. More particularly, the embodiments pertain to a structurally simplified flexible electrophotographic imaging member that has reasonable flatness and exhibits good performance without the need of an anticurl back coating layer.... Agent:

20110053070 - Glycoluril resin and acrylic resin dual members: A dual layered intermediate transfer member, such as a belt, that includes a substrate that is coated with a layer of a mixture of a glycoluril resin, and a self crosslinking acrylic resin.... Agent:

20110053071 - Toner, image forming apparatus, and process cartridge: d

20110053072 - Toner set, developer set, image forming apparatus and image forming method:

20110053073 - Toner: A toner is provided which is excellent in development stability in both a low-temperature, low-humidity environment and a high-temperature, high-humidity environment over a long time period. The toner includes toner particles containing at least a binder resin and a colorant, and a fatty acid metal salt. The fatty acid metal... Agent:

20110053074 - Capsule toner and method of manufacturing the same: A capsule toner that a blocking resistance is improved without harming a low temperature fixation property, and a method of manufacturing the same are provided. A capsule toner includes a toner base particle containing a binder resin and a colorant, and a resin coating layer containing a crystalline polyester resin... Agent:

20110053075 - Toner and method for manufacturing the same: A toner comprising: a component consisting of a thermoplastic resin containing an amorphous plant-derived resin having a carboxyl group; a component consisting of a crystalline epoxy resin having a glycidyl group; a component consisting of a cross-linked resin generated through a reaction between the carboxyl group of the plant-derived resin... Agent:

20110053076 - Supercritical fluid microencapsulation of dye into latex for improved emulsion aggregation toner: The present disclosure provides methods for incorporating a dye into latex particles via a supercritical fluid microencapsulation technique, in order to achieve improved dispersion of a colorant in the latex and an increase in color gamut.... Agent:

20110053077 - Colored resin particle and method for producing the same: The present invention provides a method for producing a colored resin particle, the method including: preparing an oil phase in which at least a resin and a colorant are dissolved or dispersed in an organic solvent; preparing an aqueous phase containing at least a surfactant in an aqueous medium; dispersing... Agent:

20110053078 - Curable toner compositions and processes: An emulsion aggregation toner composition includes toner particles including: an unsaturated polymeric resin, such as amorphous resins, crystalline resins, and combinations thereof; an optional colorant; an optional wax; an optional coagulant; and a photoinitiator. By optimizing the particle size of the emulsion, the aggregant concentration utilized in the emulsion aggregation... Agent:

20110053079 - Polyester process: The present disclosure provides processes for the preparation of unsaturated polyesters. In embodiments, a process of the present disclosure includes reacting an organic diol with a cyclic alkylene carbonate in the presence of a first catalyst to thereby form a polyalkoxy diol, optionally adding thereto a further amount of cyclic... Agent:

20110053081 - Positive type photosensitive composition: where R1 and R2 independently represent a bivalent to hexavalent aryl group with at least two carbon atoms, R3 represents either a hydrogen atom or an alkyl group with 1 to 20 carbon atoms, R4 represents either an alkyl group having a linear structure or an aryl group having a... Agent:

20110053080 - Positive typed photosensitive composition: where R1, R2, R4, and R5 independently represent a bivalent to hexavalent aryl group with at least two carbon atoms, R3 represents either a hydrogen atom or an alkyl group with 1 to 10 carbon atoms, k represents an integer of 10 to 1,000, 1 represents an integer of 1... Agent:

20110053082 - Resin, resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a... Agent:

20110053083 - Chemically amplified photoresist composition and process for its use: Photoresist compositions include a blend of a phenolic polymer with a (meth)acrylate-based copolymer free of ether-containing and/or carboxylic acid-containing moieties. The (meth)acrylate copolymer includes a first monomer selected from the group consisting of an alkyl acrylate, a substituted alkyl acrylate, an alkyl (meth)acrylate, a substituted alkyl methacrylate and mixtures thereof,... Agent:

20110053084 - Photosensitive compound and photosensitive composition including the same: Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with... Agent:

20110053085 - Lithographic printing plate precursors and stacks: Lithographic printing plate precursors have been designed so that they can be stored, shipped, and used in stacks without interleaf paper between individual precursors. This is achieved by incorporating polymeric particles having an average diameter of from about 3 to about 20 μm into the outermost precursor layer such as... Agent:

20110053086 - Compound, resin, resist composition and method for producing resist pattern: wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W... Agent:

20110053088 - Electron beam lithography method and method for producing a mold: Fine patterns to be formed on recording media such as DTM or BPM are drawn onto a mold original plate, on which resist is coated, by scanning an electron beam with an electron beam lithography apparatus. At this time, at least two types of patterns from among a group of:... Agent:

20110053087 - Method for performing electron beam lithography: The present invention relates to a method for performing high speed electron beam lithography (EBL). An electron beam source (EBS), capable of emitting an electron beam towards the energy sensitive resist, forms a first pattern (P1) on the substrate, the first pattern defining a first direction (D1) on the substrate.... Agent:

20110053089 - Method of processing elements with coalesced particles: Imageable elements can be imaged and then processed using a solution containing core-shell particles that are designed to complex with non-coalesced particles in the non-exposed regions of imaged element. A separate development step is not needed, but the non-coalesced particles and complexed core-shell particles can be removed from the resulting... Agent:

20110053090 - Flexographic processing solution and method of use: A processing solution is used to provide flexographic relief printing plates. This solution includes diisopropylbenzene, and one or more organic co-solvents, at least one of which is an aliphatic dibasic acid ester. The processing solution may also include one or more alcohols as co-solvents.... Agent:

20110053093 - Method and system for manufacturing a surface using charged particle beam lithography with variable beam blur: A charged particle beam writer system is disclosed comprising a generator for a charged particle beam having a beam blur radius, wherein the beam blur radius may be varied from shot to shot, or between two or more groups of shots. A method for fracturing or mask data preparation or... Agent:

20110053092 - Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method: A plurality of air levitation units that jet air to the lower surface of a substrate are placed below the substrate, and the substrate is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate is held from below in... Agent:

20110053091 - Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern: It is an object to provide a resist underlayer film forming composition having a selection ratio of dry etching rate larger than that of a resist film and exhibiting a low k value and a high n value at a short wavelength such as that of an ArF excimer laser,... Agent:

20110053094 - Method for fabricating roller mold for nanoimprinting: A method for fabricating a roller mold is provided, including providing a roller substrate, wherein the roller substrate is a cylinder and has a curved surface. An inorganic resist layer is formed over the curved surface of the roller substrate. A laser exposure device is provided for irradiating the inorganic... Agent:

20110053095 - Manufacturing method of planar optical waveguide device with grating structure: A method for manufacturing a planar optical waveguide device including a core of which a top face is provided with a groove section filled with a groove section filler made of a low refractive index material having a refractive index lower than that of the core, the method including; a... Agent:

20110053096 - Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device: The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and... Agent:

20110053097 - Protective film-forming material and method of photoresist patterning with it: Means for Solution: A material for forming a protective film to be layered on a photoresist film on a substrate, a protective film-forming material containing (a) an alkali-soluble polymer, and (b) at least one selected from fluoroalkyl ethers and fluoroalkyl esters which do not contain an epoxy ring and in... Agent:

20110053098 - Film with blue dye: A radiographic X-ray film comprising a polymer support. One or more silver halide emulsion layers are coated on each side of the support. A blue dye is contained within at least one of the polymer support or in an adjacent hydrophilic layer in a sufficient amount to result in a... Agent: