|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof February patent applications/inventions, industry category 02/11Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 02/24/2011 > 28 patent applications in 20 patent subcategories. patent applications/inventions, industry category
20110045388 - Masks for microlithography and methods of making and using such masks: Masks for microlithography apparatus, methods for making such masks, and methods for exposing photosensitive materials to form arrays of microfeatures on semiconductor wafers using such masks. In one embodiment, a method of making a mask comprises forming a mask layer on a substrate and identifying a first opening in the... Agent: Perkins Coie LLP Patent-sea
20110045389 - Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect: Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask are provided. The method is useful for recovering the exposure sensitivity of a chemically amplified resist disposed on a photomask blank from a... Agent: Whyte Hirschboeck Dudek S.c. Intellectual Property Department
20110045392 - Charge-carrier transport layer for an electro-optical component, method for its production and electro-optical component: A charge-carrier transport layer for an electro-optical component includes an organic charge-carrier transport material. A plurality of first particles having a diameter ranging from 1 nm to 100 nm is incorporated in the organic charge-carrier transport material and contains a first transparent oxide. A plurality of second particles having a... Agent: Leydig, Voit & Mayer, Ltd. (frankfurt Office)
20110045390 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: An electrophotographic photosensitive member having a support and a photosensitive layer formed on the support, wherein the photosensitive layer contains a boron complex which is a product of the reaction of a compound having a phenolic hydroxyl group and a carbonyl group with a boron halide. Also disclosed are a... Agent: Fitzpatrick Cella Harper & Scinto
20110045391 - Organic photoreceptor, image forming apparatus, and process cartridge: An organic photoreceptor, comprises: a conductive support; a photosensitive layer provided on the conductive support; and a protective layer provided on the photosensitive layer, wherein the protective layer contains alumina particles which contain 2 to 50 ppm of phosphorus atoms and is subjected to a surface treatment with a compound... Agent: Lucas & Mercanti, LLP
20110045393 - Organic photoreceptor and manufacturing method thereof: Disclosed is an organic photoreceptor, which is composed of a photosensitive layer and a protective layer, provided on an electric conductive support, and the protective layer contains a composition obtained by hardening reaction of γ-alumina particles treated with a compound having a reactive functional group with a hardenable compound. A... Agent: Lucas & Mercanti, LLP
20110045394 - Toner set and image forming method: s
20110045395 - Electrostatic-image-developing toner, electrostatic image developer, method of manufacturing electrostatic-image-developing toner, toner cartridge, process cartridge, method of image formation, and image forming apparatus: An electrostatic image developing toner includes toner particles that contain a binding resin, a coloring agent and a release agent and that have D50 of from about 2.0 μm to about 8.0 μm, D50 standing for a volume-average particle size of the toner particles; and non-colored release agent particles, wherein... Agent: Oliff & Berridge, PLC
20110045397 - Charge control agent and related art: Each of R1 to R4: a hydrogen atom, a carboxyl group, an aminocarbonyl group having or not having a substituent, an aminocarbonylmethyl group having or not having a substituent, an alkoxycarbonyl group, an alkyl group, a phenyl group having a substituent or not having a substituent, or a group that... Agent: Mcglew & Tuttle, PC
20110045398 - Black toner: A black toner has a toner particle including at least a resin (a) having a polyester as a main component, carbon black, and a wax, and a fine inorganic particle. When the Tgs of the black toner measured by DSC at temperature rise rate of 0.5° C./min and 4.0° C./min... Agent: Fitzpatrick Cella Harper & Scinto
20110045396 - Charge controlling agent and toner using metal compound of cyclic phenol sulfide: wherein at least one of several Y is a metal atom. The present invention also discloses a toner which comprises one or more kinds of said metal compound, a coloring agent and a binder resin. The charge control agent of the present invention overcomes disadvantages such as lack of sharpness... Agent: Marshall, Gerstein & Borun LLP
20110045399 - Electrostatic image developing carrier, electrostatic image developer, process cartridge, image forming method and image forming apparatus: An electrostatic image developing carrier includes a ferrite particle and a resin layer that coats the ferrite particle, wherein a magnesium element content of the ferrite particle is from about 3.0% by weight to about 20.0% by weight; wherein a manganese element content of the ferrite particle is from about... Agent: Oliff & Berridge, PLC
20110045400 - Liquid developer and image-forming apparatus: A liquid developer contains toner, a carrier liquid in which the toner are dispersed, and a graft copolymer of an acrylic polymer and a polysiloxane.... Agent: Nutter Mcclennen & Fish LLP
20110045401 - Image forming method and apparatus: is provided. The image forming apparatus contains a photoreceptor; a charger configured to charge the photoreceptor with a charger contacting thereto; an irradiator configured to irradiate the photoreceptor to form an electrostatic latent image thereon; an image developer configured to develop the electrostatic latent image with a toner to form... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110045402 - Method for producing toner: A method for producing a toner including the steps of melt-kneading at least a resin binder and a colorant to give a kneaded product (step 1); and heat-treating the kneaded product obtained in the step 1 (step 2), wherein the resin binder contains a crystalline resin and an amorphous resin,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110045403 - Toner composition and method for manufacturing the toner composition: A toner composition including toner particles, wherein the toner particles are prepared by a method in which toner constituents including at least a binder resin and a colorant are kneaded upon application of heat to prepare a toner constituent mixture; the toner constituent mixture is dissolved or swelled in an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110045405 - (meth)acrylate compound, photosensitive polymer, and resist composition: Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.... Agent: Lee & Morse, P.C.
20110045404 - Composition for forming resist underlayer film for lithography and production method of semiconductor device: (where R1 and R2 are independently a group of —X—Y (where X is an oxygen atom, a C1-18 alkylene group or a group of —OCnH2n— (where n is an integer of 1 to 18) and Y is a lactone ring or an adamantane ring), or one of R1 and R2... Agent: Oliff & Berridge, PLC
20110045407 - Functionalized carbosilane polymers and photoresist compositions containing the same: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that... Agent: Cantor Colburn LLP - IBM Arc Division
20110045406 - Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture: Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without... Agent: Klarquist Sparkman, LLP
20110045408 - Color-forming photosensitive composition, lithographic printing plate precursor and novel cyanine dye: A color-forming photosensitive composition contains: a cyanine dye having at least two polymerizable groups selected from an acryloyl group, a methacryloyl group and a vinyl group; a radical generator; and a monomer having an ethylenically unsaturated group.... Agent: Birch Stewart Kolasch & Birch
20110045409 - Method and system for manufacturing a surface using character projection lithography with variable magnification: A character projection charged particle beam writer system is disclosed comprising a variable magnification reduction lens which will allow different shot magnifications on a shot by shot basis. A method for fracturing or mask data preparation or optical proximity correction is also disclosed comprising assigning a magnification to each calculated... Agent: The Mueller Law Office, P.C.
20110045411 - Film adhesion device and film adhesion method: A film adhesion device includes a table carrying a semiconductor wafer, a pressing member (pressing roller) which presses a film (photoresist film) onto a surface side of the semiconductor wafer placed on the table, a bumper member provided on an outer peripheral side of the table and including a contact... Agent: Morgan Lewis & Bockius LLP
20110045410 - Production method of liquid crystal display device and liquid crystal display device: To provide a production method of a liquid crystal display device and a liquid crystal display device, in which generation of a joint line on a display screen is suppressed and yield can be improved even if a substrate is subjected to an alignment treatment by completing exposure for the... Agent: Nixon & Vanderhye, PC
20110045412 - Pigment dispersion, colored curable composition, color filter and method of manufacturing the same: There are provide a pigment dispersion containing (A) a halogenated zinc phthalocyanine pigment, and (B) a copolymer of at least (b-1) a monomer having at least one group selected from an amino group and a nitrogen-containing heterocyclic group, (b-2) a monomer having a carboxyl group, and (b-3) a macromonomer having... Agent: Sughrue Mion, PLLC
20110045413 - Resist composition for negative tone development and pattern forming method using the same: A resist composition for negative tone development, comprising (A) a resin capable of increasing the polarity by the action of an acid to increase the solubility in a positive tone developer and decrease the solubility in a negative tone developer, (B) a compound capable of generating an acid having an... Agent: Sughrue-265550
20110045414 - Rinsing method, developing method, developing system and computer-read storage medium: The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.02/17/2011 > 23 patent applications in 17 patent subcategories. patent applications/inventions, industry category
20110039194 - Solid inks for masks for printed circuit boards and other electronic devices: A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, at least one compound including at least one ethylene oxide group and at least one ultraviolet radiation blocking agent, wherein the printed mask is removable using an alkaline solution in about... Agent: Oliff & Berridge, PLC
20110039193 - Solid inks for printed masks: A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, and at least one compound including at least one ethylene oxide group. The printed mask is removable using an alkaline solution in about 30 seconds or less.... Agent: Oliff & Berridge, PLC
20110039195 - Photosensitive transparent resin composition, production method of color filter, and color filter: wherein each of R1 and R2 independently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 20 or an aryl group having a carbon number of 6 to 20, R1 and R2 may be the same or different but are not a hydrogen atom at... Agent: Sughrue-265550
20110039196 - Digital electrostatic latent image generating member: Embodiments pertain to a novel imaging member, namely, an electrostatic latent image generating member that can generate an electrostatic latent image digitally without using a raster output scanner (ROS), photoreceptor and charger. The imaging member facilitates the charge injection process between an organic conjugated polymer and N,N′-diphenyl-N,N′bis(3-methylphenyl)-[1,1′-biphenyl]-4,4′diamine charge transport layer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20110039197 - Organic photoreceptor and preparation method thereof: An organic photoreceptor is disclosed, comprising, on an electrically conductive support, a photosensitive layer and a protective layer containing metal oxide particles produced by a plasma method, and the protective layer being formed by curing a composition containing the metal oxide particles and a curable compound. There is also disclosed... Agent: Lucas & Mercanti, LLP
20110039198 - Magenta toner with binder resin of selected molecular weight composition: The present disclosure relates to a magenta toner formulation that may be used in a toner printer cartridge for an electrophotographic printer. The magenta toner may include polymer resin binder containing three polymer resins with different number average molecular weight values. The concentration of such polymer resins may be selected... Agent: Lexmark International, Inc. Intellectual Property Law Department
20110039199 - Toner compositions: A toner having a core with a first latex having a specific glass transition temperature, and further having a shell surrounding the core with a second latex having a specific glass transition temperature and possessing functional groups, and processes for producing the same.... Agent: Xerox Corporation (cdfs)
20110039200 - Yellow toner: A yellow toner is provided which can form high-quality images and has high offset resistance and excellent charging performance while being a capsule-type toner having excellent low-temperature fixability. The yellow toner satisfies, in DSC measurement, 40.0≦Tg(0.5)≦60.0 and 2.0≦Tg(4.0)−Tg(0.5)≦10.0, wherein when the concentration of the yellow toner in an ethyl acetate... Agent: Fitzpatrick Cella Harper & Scinto
20110039202 - Adjustable gloss control method with different substrates and 3-d image effect with adjustable gloss: By using a high or low viscosity transparent toner, with respect to the other color toners, and different amounts of transparent toner lay-down, the gloss of an image printed by an electrophotographic device may be adjusted. By also applying the transparent toner as a negative mask, the differential gloss of... Agent: Raymond L. Owens Patent Legal Staff
20110039201 - Digital electrostatic latent image generating member: Provided are electrostatic latent image generators, printing apparatuses including the electrostatic latent image generators, and methods of forming an electrostatic latent image. The electrostatic latent image generator can include a substrate and an array of pixels disposed over the substrate, wherein each pixel of the array of pixels can include... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20110039204 - Ester compounds and their preparation, polymers, resist compositions and patterning process: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic... Agent: Birch Stewart Kolasch & Birch
20110039203 - Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers: Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20110039205 - Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof: An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20110039206 - Novel resins and photoresist compositions comprising same: Provided are new resins that comprise multi-ring, aromatic and/or multi-cyclic ester unit which preferably are photoacid-labile. Also provided are chemically-amplified positive photoresist that comprise such resins as well as multi-ring, aromatic and/or multi-cyclic ester monomers.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20110039209 - Compound and photoresist composition containing the same: o
20110039208 - Photoresist composition containing the same: wherein Rc3 and Rc4 each independently represent a hydrogen atom or a linear, branched chain or cyclic C1-C12 aliphatic hydrocarbon group, Rc5 represents a C1-C30 divalent organic group, and Rc3 and Rc4 or Rc5 can be bonded each other to form a ring together with the nitrogen atom to which... Agent: Birch Stewart Kolasch & Birch
20110039207 - Resist composition and method of forming resist pattern: A resist composition that includes a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an epoxy resin (G). Also, a method of forming a resist pattern that includes using the... Agent: Knobbe Martens Olson & Bear LLP
20110039210 - Novel resins and photoresist compositions comprising same: Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20110039211 - Method for preparing a composite printing form: The invention pertains to a method for preparing a composite printing form from a single precursor that is capable of forming a relief and a carrier. The single precursor can be a single photosensitive element or a single laser-engravable print element having a reinforced elastomeric layer. The single precursor has... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20110039212 - Circuitized substrate with internal resistor, method of making said circuitized substrate, and electrical assembly utilizing said circuitized substrate: A circuitized substrate which utilizes at least one internal (embedded) resistor as part thereof, the resistor comprised of a material including resin and a quantity of powders of nano-particle and/or micro-particle sizes. The resistor serves to decrease the capacitance in the formed circuit while only slightly increasing the high frequency... Agent: Mark Levy Hinman, Howard & Kattell, LLP
20110039213 - Method and system for photolithographic fabrication with resolution far below the diffraction limit: A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first... Agent: Sughrue Mion, PLLC
20110039214 - Pattern forming method and method of manufacturing semiconductor device: A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20110039215 - Label and method for preparing the same: Disclosed is a label having an ink layer which has a metal or a metal oxide as its pigment, the color of the metal or the metal oxide being changed with an oxidation reaction of the metal or the metal oxide by laser irradiation, the laser irradiation causing the oxidation... Agent: Sughrue Mion, PLLC02/10/2011 > 20 patent applications in 13 patent subcategories. patent applications/inventions, industry category
20110033785 - Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask: An integrated circuit is fabricated using photolithography by selectively exposing a photoresist layer to pattern a coarse line region of a wafer layer using a trim mask, and to pattern a fine line region of the wafer layer using an alternating phase-shift mask. The trim mask includes transparent, attenuated phase-shift... Agent: Texas Instruments Incorporated
20110033786 - Pitch multiplication using self-assembling materials: Self-assembling materials, such as block copolymers, are used as mandrels for pitch multiplication. The copolymers are deposited over a substrate and directed to self-assemble into a desired pattern. One of the blocks forming the block copolymers is selectively removed. The remaining blocks are used as mandrels for pitch multiplication. Spacer... Agent: Knobbe Martens Olson & Bear LLP
20110033788 - Charged particle beam drawing apparatus and method: A charged particle beam drawing apparatus has a drawing chamber including a movable stage which supports a mask, the mask being formed by applying a resist to an upper surface of a mask substrate, an optical column for applying a charged particle beam to draw patterns in the resist, a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110033790 - Detection apparatus, exposure apparatus, and device fabrication method: The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion... Agent: Rossi, Kimms & Mcdowell LLP.
20110033789 - Exposure method using charged particle beam: A charged particle beam exposure method that includes preparing of exposure data for a plurality of device patterns; obtaining of an integral of forward scattering components in an exposure intensity distribution with each of the device patterns near the center of the exposure intensity distribution as domain of integration; correcting... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20110033787 - Frame cell for shot layout flexibility: A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An initial shot layout having a chip count is established in which a number of shots, each including... Agent: Duane Morris LLP (tsmc)IPDepartment
20110033791 - Electrophotographic photoreceptor, image forming method, image forming apparatus: Disclosed is an electrophotographic photosensitive body which does not cause image defects such as black spots and image unevenness when image exposure is performed using light having a wavelength of 350-500 nm, which is so-called short-wavelength light. The electrophotographic photosensitive body is characterized by having at least an intermediate layer,... Agent: Squire, Sanders & Dempsey L.L.P.
20110033792 - Electrophotographic photoreceptor and image-forming apparatus: (wherein R1 represents a group having a chiral center, R2 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent, R3 and R4 each independently represents an alkylene group which may have a substituent, or an arylene group which... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110033793 - Toner processes: Toners are provided which may be suitable for use in cold fusing pressure apparatus. The toners include low molecular weight amorphous resins having low softening points and low molecular weights, compared with resins utilized in conventional emulsion aggregation toners for low melt fusing applications.... Agent: Xerox Corporation (cdfs)
20110033794 - Toner, method for producing the same, and process cartridge: A toner containing a binder, a colorant, and a wax having a molecular chain consisting of C—H bond and C—C bond, wherein the mass reduction of the wax at 165° C. is 10% by mass or less, and the total amount of the wax in the toner measured by a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110033795 - Toner, production method of toner, developer and image formation method: A toner which can be improved in both low-temperature fixability and offset resistance is disclosed, comprising a colorant and a binder resin containing a polyester ionomer resin which has been reacted with a polyvalent isocyanate compound.... Agent: Lucas & Mercanti, LLP
20110033796 - Method of preparing toner and toner prepared thereby: A method of preparing a toner, including dissolving toner constituents including a binder resin or a binder resin precursor, a colorant and a release agent in an organic solvent to prepare a first liquid; emulsifying the first liquid in an aqueous medium to prepare a second liquid having a viscosity... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20110033797 - Image formation apparatus: An image formation apparatus including: a two-component developer that contains toner and carrier; a photoconductor that forms a toner image by the two-component developer; and an intermediate transfer body to which the toner image on the photoconductor is transferred. The intermediate transfer body has a surface layer that is provided... Agent: K&l Gates LLP
20110033798 - Photoreceptor outer layer and methods of making the same: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrophotographic, including digital, apparatuses. Embodiments pertain to an improved electrophotographic imaging member comprising a very thin outer layer on the imaging member surface, where the outer layer comprises healing materials... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20110033799 - Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition: A pattern is formed by (1) coating a first positive resist composition onto a substrate, baking, patternwise exposing, PEB, and developing to form a first positive resist pattern including a large area feature, (2) applying a resist-modifying composition comprising a basic nitrogen-containing compound and heating to modify the first resist... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20110033800 - Coating compositions for use with an overcoated photoresist: Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20110033801 - Coating compositions for use with an overcoated photoresist: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20110033802 - Method for preparing a photo-crosslinkable composition: The invention relates to a photo-crosslinkable composition that can be obtained by a method including the following steps: (a) the hydrolysis and condensation reaction of a [(epoxycycloalkyl)alkyl]thalkoxysilane in solution in an organo-aqueous medium containing water in an initial water/monomer molar ratio of between 3 and 15, with at least one... Agent: Occhiuti Rohlicek & Tsao, LLP
20110033803 - Patterning process and resist composition: A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units, acid labile group-containing recurring units and carbamate-containing recurring units, and a photoacid generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20110033804 - Photoresist composition: p02/03/2011 > 31 patent applications in 18 patent subcategories. patent applications/inventions, industry category
20110027697 - Holographic recording medium: A composition for holographic recording is provided, comprising an inert polyphenyl ether binder capable of supporting radical polymerization, wherein the inert binder is substantially transparent in visible light, and is viscous at room temperature; a photopolymerizable part comprising a matrix forming component comprising at least one radically photopolymerizable multifunctional (meth)acrylic... Agent: Wilson, Sonsini, Goodrich & Rosati
20110027698 - Apparatus and method for repairing photo mask: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to... Agent: Lee & Morse, P.C.
20110027702 - Hardcoat composition: A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.... Agent: 3m Innovative Properties Company
20110027701 - Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method: A method includes a preparation step of preparing a transparent substrate having a precision-polished main surface, a surface shape information obtaining step of obtaining, as surface shape information, height information at a plurality of measurement points on the main surface of the transparent substrate that contacts a mask stage of... Agent: Sughrue Mion, PLLC
20110027700 - Pellicle: A pellicle for lithography is provided that include a pellicle frame, a pellicle film stretched over one end face of the pellicle frame, and a pressure-sensitive adhesive layer provided on the other end face, the pressure-sensitive adhesive layer having a bubble content of 10 to 90 volume %.... Agent: Kratz, Quintos & Hanson, LLP
20110027699 - Reducing ion migration of absorber materials of lithography masks by chromium passivation: The deterioration of photomasks caused by chromium migration in COG masks may be reduced or suppressed by avoiding substantially pure chromium materials or encapsulating these materials, since the chromium layer has been identified as a major contributor to the chromium diffusion.... Agent: Globalfoundries Inc. C/o Williams, Morgan & Amerson
20110027703 - Reflective mask blank, reflective mask, and method of manufacturing the same: A reflective mask blank includes a substrate, a multilayer reflective film formed on the substrate and having a structure in which a high refractive index layer and a low refractive index layer are alternately laminated, and an absorbing film stacked on the multilayer reflective film and adapted to absorb EUV... Agent: Sughrue Mion, PLLC
20110027704 - Methods and scatterometers, lithographic systems, and lithographic processing cells: In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20110027708 - Aminosilane urea containing hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, an optional ground plane layer, an undercoat layer thereover wherein the undercoat layer contains an aminosilane and a urea resin mixture; a photogenerating layer; and at least one charge transport layer.... Agent: Oliff & Berridge, PLC.
20110027705 - Epoxysilane hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, an optional ground plane layer, an undercoat layer thereover, wherein the undercoat layer contains an aminosilane and an epoxysilane, a photogenerating layer, and at least one charge transport layer.... Agent: Oliff & Berridge, PLC.
20110027706 - Melamine polymer hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, an optional ground plane layer, an undercoat layer thereover wherein the undercoat layer contains an aminosilane and a melamine polymer, a photogenerating layer, and at least one charge transport layer.... Agent: Oliff & Berridge, PLC.
20110027707 - Sn containing hole blocking layer photoconductor: A photoconductor that includes a supporting substrate, a hole blocking layer, a ground plane layer, a photogenerating layer, and at least one charge transport layer, and where the hole blocking layer includes a SN containing compound and an aminosilane.... Agent: Oliff & Berridge, PLC.
20110027709 - Fluoroelastomer containing intermediate transfer members: An intermediate transfer member that includes a core shell component wherein the core is, for example, comprised of a metal oxide, and the shell is comprised of a silica, which shell contains or includes a hydrophobic agent, and where the core shell is dispersed in or mixed with a fluoroelastomer.... Agent: Oliff & Berridge, PLC.
20110027710 - Self emulsifying granules and process for the preparation of emulsions therefrom: A process for making a self-emulsifying granule suitable for use in forming latex emulsions includes contacting a resin with a solid or highly concentrated surfactant, a solid neutralization agent and water in the absence of an organic solvent to form a mixture, melt mixing the mixture, and forming self-emulsifying granules... Agent: Xerox Corporation (cdfs)
20110027711 - Toner for electrophotography, developer and image forming apparatus: Toner for electrophotography contains toner base particles containing a binder resin and a colorant, and an external additive to be externally added to the toner base particles, and the external additive includes surface treated particles obtained by surface treating resin fine particles with a fatty acid metal salt.... Agent: Hespos & Porco LLP
20110027714 - Toner compositions: Toner particles are provided which may, in embodiments, include an additive package possessing both a silica that has been treated with polydimethyl siloxane and a titanium dioxide that has been subjected to a fluorine treatment. The silica that has been treated with polydimethyl siloxane has low levels of free polydimethyl... Agent: Xerox Corporation (cdfs)
20110027713 - Electrophotographic toner: The disclosure provides an electrophotographic toner including a binder resin; and a light absorber, wherein the light absorber includes a metal nanorod and a surfactant covering a surface of the metal nanorod.... Agent: Staas & Halsey LLP
20110027712 - Toner compositions: The present disclosure provides toner compositions able to prevent the formation of mold or bacterial growth during storage. In embodiments, toners may include at least one biocide that prevents the formation of mold and/or bacteria in a toner composition, including any emulsion that may be utilized in forming the toner... Agent: Xerox Corporation (cdfs)
20110027715 - Developer, image forming apparatus and image forming method: A developer for forming an image on a transfer medium includes a toner having a volume average particle size of 3 to 8 μm, and a mixed carrier including a first carrier having a volume average particle size of 25 to 40 μm and conductivity that corresponds to a current... Agent: Turocy & Watson, LLP
20110027716 - Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds (A) of general formula (I) below that when exposed to actinic rays or radiation, generates an acid and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of... Agent: Sughrue Mion, PLLC
20110027717 - Photoresist composition: c
20110027718 - Radiation-sensitive resin composition and compound: A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R1 represents a divalent hydrocarbon group having 1 to 20 carbon atoms and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 form a heterocyclic... Agent: Ditthavong Mori & Steiner, P.C.
20110027719 - Photomask etching method for chemical vapor deposition film: The present invention discloses a photomask etching method for a CVD film, which comprises steps: exposing an optical resin layer to an ultraviolet ray through a photomask; baking the optical resin layer to gasify the exposed portion of the optical resin layer with the unexposed portion remaining; using a CVD... Agent: Muncy, Geissler, Olds & Lowe, PLLC
20110027720 - Method and device for fabricating volume bragg gratings: A system for recording multiple volume Bragg gratings (VBGs) in a photo thermo-refractive material is configured to implement a method which provides for irradiating the material by a coherent light through a phase mask. The system has a plurality of actuators operative to displace the light source, phase mask and... Agent: Ipg Photonics Corporation
20110027721 - Lithographic apparatus and device manufacturing method: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20110027723 - Measuring apparatus, optical system manufacturing method, exposure apparatus, device manufacturing method, and processing apparatus: The present invention provides a processing apparatus which executes sampling of data and represents the sampled data by linear combination of orthogonal functions, the apparatus including a device configured to execute the sampling, and a processor configured to process the data sampled by the device, wherein the processor is configured,... Agent: Canon U.s.a. Inc. Intellectual Property Division
20110027726 - Polymer compound for photoresist: e
20110027725 - Polyol compound for photoresist: By protecting phenolic hydroxyl group(s) thereof with a protecting group capable of leaving with an acid, the polyol compound for photoresists gives a compound for photoresists. A photoresist composition containing this compound can form a resist pattern which shows less line edge roughness (LER), excels in resolution and etching resistance,... Agent: Birch Stewart Kolasch & Birch
20110027724 - Spatial light modulating unit, illumination optical system, exposure apparatus, and device manufacturing method: There is disclosed a spatial light modulating unit comprising, a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and controlled individually, and an exit-side optical system which guides light having traveled via the plurality of optical elements of the spatial light modulator, wherein the exit-side optical system... Agent: Miles & Stockbridge PC
20110027727 - Substrate developing method, substrate processing method and developing solution supply nozzle: According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-reflective film having solubility in the developing solution is formed... Agent: Rader Fishman & Grauer PLLCPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
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