|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof December patent applications/inventions, industry category 12/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 12/30/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100330468 - Halftone mask and manufacturing method thereof and method for forming film using the same: Embodiments relate to halftone masks that can uniformly form the height of an underlying layer in two regions that are spaced apart from each other, a manufacturing method thereof, and a method for forming a film using the same. The halftone mask includes a first light blocking unit and a... Agent: Robert E. Bushnell & Law Firm
20100330464 - Method of correcting an error in phase difference in a phase shift mask: Disclosed is a method of correcting an error in a phase difference in a phase shift mask, in which a phase shift pattern is formed on a light transmitting substrate, wherein the method includes: determining generation of an error in a phase difference by measuring a phase of a light... Agent: Marshall, Gerstein & Borun LLP
20100330469 - Overlay target for polarized light lithography: A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second layer, and a second structure located on the second layer, wherein the second structure is formed from a photomask... Agent: Slater & Matsil, L.L.P.
20100330466 - Pellicle frame and lithographic pellicle: A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section are parallel to each other and each of side edges of the basic quadrilateral has one quadrilateral recess. There is... Agent: Kratz, Quintos & Hanson, LLP
20100330467 - Pellicle frame and lithographic pellicle: A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and an area of no greater... Agent: Kratz, Quintos & Hanson, LLP
20100330465 - Photomask for forming a line-type pattern and method of fabricating the pattern using the photomask: Disclosed is a photomask for forming a line-type pattern extending in a first direction, which includes a light transmitting substrate, and a main pattern corresponding to the line-type pattern provided with a plurality of unit patterns slanted relative to the first direction by a predetermined angle and arranged on the... Agent: Marshall, Gerstein & Borun LLP
20100330470 - Reflective mask blank for euv lithography and reflective mask for euv lithography: a step on at least a part of the substrate being provided between a first portion where the absorber layer is removed at the time of patterning, and a second portion where the absorber layer is not removed at the time of patterning, adjacent to the first portion where the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100330471 - Methods of adjusting dimensions of resist patterns: Methods of adjusting dimensions of resist patterns are provided. The methods allow for control of photoresist pattern dimensions and find particular applicability in resist pattern rework in semiconductor device manufacturing.... Agent: Rohm And Haas Electronic Materials LLC
20100330473 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: The invention provides an electrophotographic photoreceptor having a surface protection layer that satisfies the following requirements: (1) including a crosslinked substance of at least one selected from a guanamine compound or a melamine compound, and at least one charge transporting material having at least one substituent selected from —OH, —OCH3,... Agent: Oliff & Berridge, PLC
20100330475 - Image forming apparatus, process cartridge, and image bearing member: An image forming apparatus including an image bearing member having an electroconductive substrate on which are provided at least a photosensitive layer and a protection layer, in that sequence, a charging device that charges the surface of the image bearing member to form a latent electrostatic image thereon, a development... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100330476 - Polyfluorinated core shell photoconductors: A photoconductor that includes a photogenerating layer and a charge transport layer containing a charge transport component, a fluorinated polymer, and a core shell component, and wherein the core is comprised of a metal oxide and the shell is comprised of silica.... Agent: Oliff & Berridge, PLC.
20100330480 - Electrophotographic photoreceptor, image forming method, image forming apparatus and process cartridge: An electrophotographic photoreceptor comprising an electrically conductive support having thereon a photo sensitive layer having a laminated structure comprising a charge generation layer and a charge transport layer, wherein the charge generation layer comprises a titanyl phthalocyanine pigment having a crystal structure exhibiting the following peaks of Bragg angles 2θ... Agent: Lucas & Mercanti, LLP
20100330477 - Core shell photoconductors: A photoconductor that includes a photogenerating layer, and a charge transport layer containing a charge transport component, and a core shell component, and wherein the core is comprised of a metal oxide and the shell is comprised of silica.... Agent: Oliff & Berridge, PLC.
20100330479 - Fluorinated nano diamond anticurl backside coating (acbc) photoconductors: A photoconductor that includes a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer of at least one charge transport component, and wherein the first layer is in contact with the supporting substrate on the reverse side thereof, and which first layer includes... Agent: Oliff & Berridge, PLC.
20100330478 - Polysulfone containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein the charge transport layer contains a polysulfone.... Agent: Oliff & Berridge, PLC.
20100330481 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: There is provided an electrophotographic photoreceptor comprising, in this order a substrate; a photosensitive layer; and a protective layer including oxygen and gallium, the protective layer including a first region and a second region that is present closer to the substrate than the first region and has a ratio of... Agent: Oliff & Berridge, PLC
20100330483 - Coated carrier regenerating method, developing cartridge containing two component developer containing toner and coated carrier regenerated by same coated carrier regenerating method, and image forming apparatus detachably provided with same developing ca: A coated carrier regenerating method in accordance with the present invention includes the step of: determining an amount of a worn-away coating resin of a used coated carrier. Accordingly, an amount of the coating resin layer to be supplemented, namely an amount of the coating resin with which the coating... Agent: Nixon & Vanderhye, PC
20100330482 - Toner for electrostatic charge image development, electrostatic charge image developer, toner cartridge, process cartridge and image forming device: A toner for electrostatic charge image development includes toner particles and fatty acid metal salt particles. The content of the fatty acid metal salt particles is from 0.2 parts by weight to 5 parts by weight with respect to 100 parts by weight of the toner particles; the weight of... Agent: Oliff & Berridge, PLC
20100330484 - Black particles and a manufacturing method of the same, a black toner using the same, and a particle container and a toner container: Black particles include a black pigment; and a cyan pigment, wherein when the reflectance to light of wavelength of 420 nm and the reflectance to light of wavelength of 770 nm of plural samples are measured, the standard deviations (1σ) of the measured values are about 1 or less with... Agent: Oliff & Berridge, PLC
20100330491 - Electrostatic charge image developing toner: Provided is an electrostatic charge image developing toner producing neither halftone image unevenness nor density drop of solid images, even though a large number of print sheets are printed at high temperature and high humidity, and subsequently printing is further carried out at high temperature and high humidity after standing... Agent: Lucas & Mercanti, LLP
20100330489 - Electrostatic image developing toner, developer, image forming apparatus, image forming method, and process cartridge: An electrostatic image developing toner including a toner particle (C), wherein the toner particle (C) has a structure in which a resin particle (A) containing at least a first resin (a) or a coated film (P) containing the first resin (a) is attached to a surface of a resin-containing particle... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100330488 - Positively-chargeable toner for developing electrostatic images: The present invention is to provide a positively-chargeable toner for developing electrostatic images, which is excellent in reproductivity of thin lines and in durability and has a stable charging ability and flowability over time. A positively-chargeable toner comprises a colored resin particle and external additives, wherein a spherical colloidal silica... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100330485 - Purified polyester resins for toner performance improvement: A toner that includes at least one polyester resin wherein the amount of free polyvalent acid monomer in the polyester resin is less than 4 mg/gram, and wherein the percentage of the at least one polyester resin with a Mw less than 1500 is less than about 10%.... Agent: Oliff & Berridge, PLC.
20100330486 - Toner compositions: A toner including at least one amorphous polyester, at least one crystalline polyester and at least one ester wax, wherein the linear polyester and the at least one ester wax have a difference in solubility parameter of from about 0.1 to about 1.7.... Agent: Marylou J. Lavoie, Esq. LLC
20100330487 - Toner compositions: Coated phosphorescent pigments are provided which may be utilized in toner compositions. In embodiments, the phosphorescent pigment may be coated by a powder coating process. The large pigment particles may be dry blended with dried resin latex particles, thereby coating the pigment surface, followed by heating and shearing in a... Agent: Xerox Corporation (cdfs)
20100330490 - Positively-chargeable toner for developing electrostatic image: A positively-chargeable toner for developing electrostatic images which can prevent damage of photosensitive members and filming due to an external additive, can impart a stable charge property and flowability to toner particles over time, and thus hardly causes deterioration of image quality due to fog, blur, white streaks or the... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100330492 - Carrier for electrostatic development, developer for electrostatic development, developer cartridge for electrostatic development, process cartridge and image forming apparatus: The invention provides a carrier for electrostatic development, including ferrite particles and a coating layer including a resin having a cycloalkyl group, the ferrite particles including strontium in an amount of from about 0.1% by weight to about 1.0% by weight and having a BET specific surface area of from... Agent: Oliff & Berridge, PLC
20100330493 - Surface-modified complex oxide particles: Disclosed are particles which are useful as an external toner additive which can control physical properties of a toner. Specifically disclosed are surface-modified complex oxide particles which are obtained by surface-modifying silica-titania complex oxide particles produced by a dry process.... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP
20100330495 - Image sheet forming method and image sheet forming apparatus: An image sheet forming method includes supplying a first sheet including a non-transparent layer, and transferring a toner image onto a toner image carrying surface of the first sheet. The method further includes integrating a second sheet, which includes a base layer and a transparent layer, with the first sheet... Agent: Harness, Dickey & Pierce P.L.C
20100330494 - Apparatuses useful in printing and methods of fixing marking material on media: Apparatuses useful in printing and methods of treating marking material on media are disclosed. An embodiment of the apparatuses includes a roll including a first outer surface; a continuous belt including an inner surface and a second outer surface forming a nip by contact with the first outer surface, the... Agent: Prass LLP
20100330496 - Simultaneous two-photon absorption recording-reproduction method, and simultaneous two-photon absorption recording material for use therein: A simultaneous two-photon absorption recording-reproduction method of recording and reproducing a data by inducing changes in the fluorescence intensities in a recorded part and an unrecorded part by simultaneous two-photon absorption, comprising: generating a fluorescence quencher in a two-photon recording part; and inducing quenching by excitation energy transfer between the... Agent: Sughrue-265550
20100330497 - Chemically amplified photoresist composition and method for forming resist pattern: The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained... Agent: Birch Stewart Kolasch & Birch
20100330502 - High aspect ratio microstructures: e
20100330499 - Methods of forming electronic devices: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC
20100330500 - Methods of forming electronic devices: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC
20100330501 - Methods of forming electronic devices: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC
20100330498 - Self-aligned spacer multiple patterning methods: Self-aligned spacer multiple patterning method are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC
20100330503 - Methods of forming electronic devices: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC
20100330504 - Method for electroconductive pattern formation: A method for forming a conductor pattern comprising the steps of (a) forming a photo-crosslinkable resin layer on a substrate provided with a conductive layer on its surface, (b) treating the photo-crosslinkable resin layer with an alkali aqueous solution to render it thinner, (c) carrying out exposure for a circuit... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100330506 - Method for transferring an epitaxial layer from a donor wafer to a system wafer appertaining to microsystems technology: For bonding a donor wafer (1) and a system wafer (9) an edge bead (3) of an epitaxial layer (2) on the donor wafer is flattened or completely removed by etching so that a reliable contact after bonding up to the edge region (5, 6) is possible. The etching mask... Agent: Hunton & Williams LLP Intellectual Property Department
20100330507 - Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method: r
20100330508 - Developing apparatus and developing method: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.12/23/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100323282 - method of correcting a flare and computer program product: A method of correcting a flare comprising: calculating a distribution of a flare value corresponding to pattern data on the pattern data as a flare map; calculating an occupancy of a pattern having a predetermined flare value on the pattern data as a flare value occupancy for each flare value,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100323280 - Mask for euv lithography and method for exposure using the same: Disclosed is a mask for an EUV lithography, which includes: a mirror layer which reflects EUV incident on a substrate; an absorber pattern formed on the mirror layer so as to expose a first region and a second region in the mirror layer; and a first groove formed by recessing... Agent: Marshall, Gerstein & Borun LLP
20100323283 - Optical compensation devices, systems, and methods: Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first... Agent: Schwegman, Lundberg & Woessner/micron
20100323281 - Pellicle: There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the external opening of the ventilation hole for preventing entrance of a foreign substance, and at... Agent: Kanesaka Berner And Partners LLP
20100323285 - Photosensitive colored composition, color filter and method for producing the same: There is provided a photosensitive colored composition including a pigment, a polymerizable monomer, a photopolymerization initiator, and a compound represented by a general formula (I) [Each of R1 and R2 independently represents a hydrogen atom, an alkyl group with 1 to 20 carbon atoms, or an aryl group with 6... Agent: Sughrue Mion, PLLC
20100323284 - Pigment-dispersed composition, curable composition, color filter and production method thereof: The present invention provides a pigment-dispersed composition including at least a polymer compound (A-1) having at least one selected from the structural units represented by the following formulae (1) to (3), a pigment (B) and a solvent (C), and a pigment-dispersed composition including at least a resin (D) having an... Agent: Sughrue Mion, PLLC
20100323287 - Image erasing apparatus and image erasing method: An image erasing apparatus includes a stacking tray stacking the recording medium, a heater heating the recording medium to a temperature equal to or higher than the temperature at which developer on the recording medium is erased, a detector disposed downstream in a recording medium carrying direction from the heater... Agent: Patterson & Sheridan, L.L.P.
20100323286 - Image erasing apparatus and method of carrying recording medium in image erasing apparatus: An image erasing apparatus includes a recording medium height sensor sensing the height of recording mediums stacked on a discharge tray, a discharge tray lifting and lowering mechanism lifting and lowering the discharge tray, a shifting mechanism shifting and discharging the recording mediums, and a controller controlling a discharging operation... Agent: Patterson & Sheridan, L.L.P.
20100323288 - Photoreceptor with release layer: The disclosed embodiments are directed to an electrophotographic photoreceptor having a release layer. More particularly, the disclosure relates to an electrophotographic photoreceptor having a release layer which comprises an organosilane compound coated over the substrate surface. Other embodiments include methods for coating layer removal using a specifically configured electrophotographic photoreceptor... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100323289 - Chemical toners comprising modified pigments: The present invention relates to chemical toner compositions comprising a resin and a polymer modified pigment comprising a pigment having attached at least one polymeric group. The polymer modified pigment comprises the reaction product or combination product of a modified pigment comprising the pigment having attached at least one organic... Agent: Cabot Corporation/finchmaloney
20100323290 - Toner and manufacturing method thereof: e
20100323291 - Method for producing liquid developer: wherein a colored resin particle is dispersed in an insulating hydrocarbon dispersion medium in the presence of a particle dispersant and an acid group-containing resin, and the particle dispersant is a reaction product of a polyamine compound and a self-condensation product of a hydroxycarboxylic acid.... Agent: Hamre, Schumann, Mueller & Larson, P.C.
20100323293 - Optical recording material, optical recording method, photosensitive material, photolithography method, photopolymerization initiator, and photosensitizer: Provided is a nonlinear optical material, an optical recording material, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes... Agent: Mcginn Intellectual Property Law Group, PLLC
20100323294 - Photoacid generators and photoresists comprising same: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20100323292 - Resist pattern formation method, and resin composition capable of insolubilizing resist pattern: A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first... Agent: Ditthavong Mori & Steiner, P.C.
20100323295 - Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins: The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the... Agent: Mckenna Long & Aldridge LLP
20100323296 - Resin and resist composition: wherein T represents a C4 to C36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C1 to C12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C1 to C12 alkoxyl... Agent: Birch Stewart Kolasch & Birch
20100323297 - Method of manufacturing optical waveguide laminated wiring board: A via hole is formed in a first cladding layer laminated on a wiring board. A conductive material is filled in the via hole so as to form a first conductor portion (a portion of a conductive via) having a mushroom-like shape projecting from a surface of the first cladding... Agent: Kratz, Quintos & Hanson, LLP
20100323300 - Digital optical chemistry micromirror imager: An apparatus and method for catalyzing a reaction on a substrate (24) comprising, a light source (12), a micromirror (16) positioned to redirect light (14) from the light source (12) toward a substrate (24) wherein the redirected light (14) catalyzes a chemical reaction proximate a substrate (24), is disclosed. A... Agent: Quarles & Brady LLP
20100323298 - Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof: Disclosed herein may be a photosensitive composition, a microfabricated structure including the same, a device including the microfabricated structure, and methods of fabricating the microfabricated structure and the device. The photosensitive composition, including a multifunctional photosensitive resin, a two-photon photosensitizer, an organic solvent, and a silver compound, may be subjected... Agent: Harness, Dickey & Pierce, P.L.C
20100323299 - Projection objective for immersion lithography: A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive... Agent: Sughrue Mion, PLLC
20100323304 - Inspection method for patterning of photoresist: A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure... Agent: Antonelli, Terry, Stout & Kraus, LLP
20100323303 - Liquid immersion member, exposure apparatus, exposing method, and device fabricating method: An exposure apparatus including: an optical system, which has an emergent surface; a first surface, which is disposed at least partly around an optical path of exposure light from the emergent surface; a second surface, which is disposed at least partly around the first surface; a third surface, which is... Agent: Oliff & Berridge, PLC
20100323301 - Method and apparatus for making three-dimensional parts: Method and apparatus for fabricating 3D parts with slurry are disclosed. The slurry comprises at least a polymer, an organic binder and a solvent. The process comprises paving the slurry to form a sacrificial layer which is then dried to a solid state. The sacrificial layer is soaked in a... Agent: Wpat, PC Intellectual Property Attorneys
20100323305 - Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D)... Agent: Sughrue-265550
20100323302 - Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus: A protective apparatus that protects a predetermined area of the front surface of a mask substrate, provided with a pellicle frame that is disposed on at least a portion of the circumference of the predetermined area and bonded to the front surface of the mask substrate, and a pellicle that... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100323306 - Substrate treatment system, substrate treatment method, and computer readable storage medium: In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided which transfer a substrate in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100323307 - Developing apparatus and method: A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.12/16/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100316938 - Multi-chip reticle photomasks: A multi-chip reticle, methods of designing and fabricating multi-chip reticles, a system for designing a multi-chip reticle, and a method of fabricating integrated circuit chips using the multi-chip reticle. The multi-chip reticle includes a transparent substrate having two or more separate chip images arranged in an array, each chip image... Agent: Schmeiser, Olsen & Watts
20100316939 - Photolithography monitoring mark, photolithography mask comprising an exposure monitoring mark, and phase shift mask comprising an exposure monitoring mark: A photolithography monitoring mark on a substrate includes a plurality of sets of lines. Individual of the sets include a plurality of substantially parallel lines comprising different widths arrayed laterally outward in opposing lateral directions from an axial center of the set. The different widths decrease in each of the... Agent: Wells St. John P.s.
20100316940 - Photomask for forming contact hole in semiconductor device: Disclosed is a photomask for forming a contact hole arranged on a wafer in a zigzag form along a transverse direction, including: a light transmitting substrate; a main pattern disposed on the light transmitting substrate with a zigzag form as an upper main pattern disposed in a relatively upper portion... Agent: Marshall, Gerstein & Borun LLP
20100316942 - Photomask making method: A photomask is manufactured from a photomask blank comprising a transparent substrate and a light-shielding film consisting of upper and lower layers of transition metal-containing silicon base materials, the content of O+N in the upper layer being higher than that of the lower layer. The light-shielding film is processed in... Agent: Birch Stewart Kolasch & Birch
20100316941 - Solid-state imaging device producing method and exposure mask: A solid-state imaging device producing method includes the steps of: applying a resist material onto a substrate in which a channel region is formed; forming a resist layer by exposure and development of the resist material using a mask, the resist layer having an opening and a thin-film portion, the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100316943 - Illumination optical system, exposure apparatus, and device manufacturing method: There is disclosed an illumination optical system which illuminates an illumination target surface on the basis of light from a light source, said illumination optical system comprising, a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and being individually controllable, a distribution forming optical system which forms... Agent: Miles & Stockbridge PC
20100316944 - Toner, developer, toner container, process cartridge, image forming method, and image forming apparatus: An electrostatic image developing toner including a resin fine particle, and a toner material containing a polyester-based resin, wherein the electrostatic image developing toner is obtained by dissolving and/or dispersing the toner material containing the polyester-based resin in an organic solvent to prepare a toner material liquid, and dispersing the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100316945 - Methods for making customized black toners: According to embodiments illustrated herein, there is provided a black toner having a resin, an optional additive, and at least two or more colored pigments, and the at least two or more colored pigments are selected from the group consisting of a blue pigment, a green pigment, a red pigment.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100316946 - Self emulsifying granules and solvent free process for the preparation of emulsions therefrom: A process for making a self-emulsifying composite suitable for use in forming latex emulsions includes contacting a resin with a solid or highly concentrated surfactant, a solid neutralizing agent in the absence of water and an organic solvent to form a mixture, melt mixing the mixture, and forming a self-emulsifying... Agent: Xerox Corporation (cdfs)
20100316947 - Method for producing resin emulsion: The present invention relates to a resin emulsion which has a good emulsification performance even when produced by using a crosslinked polyester resin having a good fusing ability and a good durability, and also is capable of producing a toner having an excellent heat-resistant storage property therefrom; and a process... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100316950 - Composition for forming base film for lithography and method for forming multilayer resist pattern: A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100316951 - Salt and photoresist composition containing the same:
20100316952 - Salt and photoresist composition containing the same:
20100316953 - Siloxane-based resin composition: The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound... Agent: Birch Stewart Kolasch & Birch
20100316949 - Spin on organic antireflective coating composition comprising polymer with fused aromatic rings: The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further... Agent: Sangya Jain Az Electronic Materials Usa Corp.
20100316955 - Chemically amplified positive photoresist composition and pattern forming process: A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems... Agent: Birch Stewart Kolasch & Birch
20100316956 - Preparing lithographic printing plates with enhanced contrast: Lithographic printing plates can be prepared with enhanced contrast between the image and background by coloring the imaged or exposed regions using a coloring fluid containing a water-insoluble colorant (dye or pigment) and an organic solvent that swells the imaged regions sufficiently for the colorant to be embedded or diffused... Agent: Raymond L. Owens Patent Legal Staff
20100316957 - Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method: The invention relates to a method of producing a relief image arrangement, usable especially in the fields of flexography, embossing and heliogravure, and comprising a base layer and a layer of photosensitive material fixed on the base layer. The method is of the type according to which an image is... Agent: Arthur G. Schaier Carmody & Torrance LLP
20100316958 - Method and system for calibrating exposure system for manufacturing of integrated circuits: Method and system for calibrating exposure system for manufacturing of integrated circuits. According to an embodiment, the present invention provides a method for determining one or more focus parameters for an exposure system. As an example, the exposure system is used for forming patterns on semiconductor wafer. The method includes... Agent: Townsend And Townsend And Crew, LLP
20100316959 - Methods for forming sheeting with a composite image that floats and a master tooling: A sheeting and a method of forming a sheeting from a master tool are described where the sheeting has a composite image that floats above or below the sheeting. The method includes providing a first sheeting comprising a first array of microlenses and a photopolymerizable first material layer adjacent to... Agent: 3m Innovative Properties Company
20100316960 - Patterning nano-scale patterns on a film comprising unzipping polymer chains: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g. thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During... Agent: Wilson Ham & Holman/arc
20100316961 - Substrate treatment method and substrate treatment apparatus: A substrate treatment apparatus which uniformly forms a fine resist pattern with a desired dimension within a plane of a substrate is disclosed. In a solvent vapor supply unit, a solvent vapor discharge nozzle is provided which can discharge a solvent vapor for swelling a resist pattern while moving above... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.12/09/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100310974 - Method of fabricating photo mask for organic light emitting display and photo mask so fabricated: A method of fabricating a photo mask for an organic light emitting display comprises forming a light shielding layer on a transparent substrate, coating the light shielding layer with an electron beam resist, performing exposure on the electron beam resist by a vector scan method in accordance with a specific... Agent: Robert E. Bushnell & Law Firm
20100310972 - Performing double exposure photolithography using a single reticle: A reticle includes a first pattern formed in a first die flash region of the reticle and a second pattern different than the first pattern formed in a second die flash region of the reticle. A method for patterning a wafer having a plurality of die regions defined thereon includes... Agent: Williams, Morgan & Amerson
20100310973 - Pressure body and pellicle mounting apparatus: A pressure body comprises: three or more pressure pins 40 that come into contact with a photomask 70 at downward positions in a pressure direction D; a main body 10 provided with an opening 16, the opening 16 supporting the pressure pins 40 so as to prevent the pins from... Agent: Crowell & Moring LLP Intellectual Property Group
20100310976 - Photoconductive device, and terahertz wave generation and detection apparatuses each using the photoconductive device: A photoconductive device includes: a photoconductive layer configured to generate carriers upon irradiation with excitation light, a first electrode arranged on the photoconductive layer, a second electrode arranged on the photoconductive layer with a gap between the first and second electrodes, and a third electrode arranged in a region over... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100310977 - Charge blocking layer and coating solution for forming the same: The present embodiments are generally directed to an improved imaging member exhibiting various advantages over conventional imaging members. More specifically, the present embodiments are directed to an improved charge blocking layer formed from an aqueous-based coating solution which exhibits improved shelf life and coating properties, such as increased homogeneity and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100310978 - Two-component developer: Provided is a two-component developer containing: a magnetic carrier obtained by coating a magnetic core with a resin; and toner, in which: the magnetic core contains at least a ferrite component and at least one kind of an oxide selected from the group consisting of SiO2 and Al2O3; the content... Agent: Fitzpatrick Cella Harper & Scinto
20100310979 - Efficient solvent-based phase inversion emulsification process with defoamer: A process and system for making a resin emulsion suitable for use in forming toner particles including a silicone free anti-foam agent to control foam during formation of a polyester dispersion.... Agent: Xerox Corporation (cdfs)
20100310981 - Developing agent and method for producing the same: According to one embodiment, a method for producing a developing agent includes pulverizing a mixture in the form of coarse particles of a toner material including a coloring agent and a binder resin by mechanical shearing, aggregating and fusing the resulting fine particles. The solid content concentration in a dispersion... Agent: Turocy & Watson, LLP
20100310982 - Method for producing carrier for electrophotographic developer, carrier for electrophotographic developer, electrophotographic developer, and image forming method: A method for producing a carrier, including a step of periodically forming and discharging liquid droplets of a carrier core composition liquid from a plurality of nozzles formed in a thin film, using a liquid droplet forming unit having the thin film and a ring-shaped vibration generating unit disposed in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100310983 - Toner process including modifying rheology: A process for making particles is provided. In embodiments, a suitable process includes adding a rheology modifier to an emulsion utilized to form toner particles. The rheology modifier permits the use of a higher solid content in the emulsion, with a resulting higher yield of toner particles, without requiring the... Agent: Xerox Corporation (cdfs)
20100310984 - Toner processes utilizing a defoamer as a coalescence aid for continuous and batch emulsion aggregation: A process for making toner particles is provided. In embodiments, a suitable process includes adding a defoamer to an emulsion utilized to form toner particles. Utilization of the defoamer allows for a reduction in the overall aggregation/coalescence cycle time and slurry viscosity, while producing a toner with improved GSDs, low... Agent: Xerox Corporation (cdfs)
20100310987 - Polymer, radiation-sensitive composition, monomer, and method of producing compound: A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl... Agent: Ditthavong Mori & Steiner, P.C.
20100310985 - Positive resist composition and method of forming resist pattern: A positive resist composition including a base component, an acid-generator component and a fluorine-containing polymer component (F) in a specific amount, the fluorine-containing polymer component (F) including a fluorine-containing polymer (F1) consisting of a structural unit (F-1) represented by general formula (F-1) (RC represents a hydrogen atom or a methyl... Agent: Knobbe Martens Olson & Bear LLP
20100310986 - Positive resist compositions and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. Resin component (A) is a polymer comprising recurring units of formula (1) wherein R1 is H, CH2 or CF3, R2 is an acid... Agent: Birch Stewart Kolasch & Birch
20100310988 - Resist pattern-forming method and resist pattern miniaturizing resin composition: A resist pattern-forming method includes forming a first resist pattern using a first positive-tone radiation-sensitive resin composition. A resist pattern-miniaturizing resin composition is applied to the first resist pattern. The resist pattern-miniaturizing resin composition applied to the first resist pattern is baked and developed to form a second resist pattern... Agent: Ditthavong Mori & Steiner, P.C.
20100310989 - Method of providing lithographic printing plates: Lithographic printing plates can be obtained by contacting infrared radiation-imaged negative-working lithographic printing plate precursors with a processing solution having a pH less than 9 and comprising a UV photoinitiator. After this processing, the lithographic printing plate is floodwise exposed with UV radiation. Providing a UV-photoinitiator in the processing solution... Agent: Raymond L. Owens Patent Legal Staff
20100310990 - Method for manufacturing structure: A method for manufacturing a structure includes the followings in this order: preparing a substrate having a positive-type photosensitive resin layer and an absorption layer that can absorb a light having a photosensitive wavelength which the positive-type photosensitive resin senses stacked thereon in this order; pressing a projecting portion of... Agent: Fitzpatrick Cella Harper & Scinto
20100310992 - Device and method for exposing a photo material: The invention relates to a method and an imagesetter by means of which a photo material comprising a plurality of zones to be exposed individually, such as hundreds of thousands of such zones, can be done in an economical manner and particularly in acceptable exposure times. To this end, a... Agent: Sand & Sebolt
20100310991 - Positive resist composition for immersion exposure and pattern-forming method using the same: A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V≧230 and... Agent: Sughrue-265550
20100310994 - Stage device, method for controlling stage device, exposure apparatus using same, and device manufacturing method: The stage device of the present invention includes a linear motor having a coil and a plurality of permanent magnets, a current driver that supplies current to the coil, and a control section that generates a command for the current driver. The control section generates the command through commutation processing... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100310993 - Transporting method, transporting apparatus, exposure method, and exposure apparatus: A ladder type stage apparatus that transports a film-shaped substrate includes a plurality of rods whose longitudinal directions are aligned in a direction that is orthogonal to the moving direction of the film-shaped substrate in order to support the film-shaped substrate; chains that join the rods along a closed-loop trajectory;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100310995 - Double patterning strategy for contact hole and trench in photolithography: A method of lithography patterning includes forming a first resist pattern on a substrate, wherein the first resist pattern including a plurality of openings. A second resist pattern is formed on the substrate and within the plurality of openings of the first resist pattern, wherein the second resist pattern includes... Agent: Lowe Hauptman Ham & Berner, LLP12/02/2010 > patent applications in patent subcategories. patent applications/inventions, industry category
20100304281 - Exposure mask and method for manufacturing same and method for manufacturing semiconductor device: An exposure mask used to transfer a pattern defined by exposure onto a wafer, includes: a substrate; a pattern formation region provided on the substrate, and having pattern elements formed therein, the pattern elements having a size not smaller than a resolution limit after being transferred onto the wafer; and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100304279 - Manufacturing method of phase shift mask, creating method of mask data of phase shift mask, and manufacturing method of semiconductor device: A phase shift mask having a plurality of mask patterns or mask data thereof is prepared, and an overlapped focus range in each of the mask patterns in a case where a result of exposure to each of the mask patterns, obtained by an exposure experiment or a lithography simulation,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100304276 - Mask and method for fabricating the same: A method of fabricating a mask includes sequentially depositing a phase shift layer and a light shielding layer on a transparent substrate; forming a light shielding layer pattern and a phase shift layer pattern by selectively etching the light shielding layer and the phase shift layer; forming side walls on... Agent: Marshall, Gerstein & Borun LLP
20100304278 - Method for fabricating a phase shift mask using a binary blank: A method for fabricating a phase shift mask using a binary blank is disclosed. A light shielding pattern is formed on a transparent substrate in which a main cell region and a frame region are defined. A phase shift layer is formed that buries the light shielding pattern on the... Agent: Marshall, Gerstein & Borun LLP
20100304282 - Method for finishing surface of preliminary polished glass substrate: A glass substrate obtained by a method including measuring flatness of a glass substrate surface and measuring concentration distribution of dopant in the substrate. Processing conditions of the surface are set up for each site of the substrate based on results from the measuring the flatness and the measuring the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100304280 - Method of forming a template, and method of manufacturing a semiconductor device using the template: A method of manufacturing a semiconductor device using a template on which a pattern is formed beforehand is disclosed. An error between a position of the pattern formed on the template and a reference position where the pattern is to be formed is obtained. An outer shape of the template... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100304277 - Photomask for extreme ultraviolet lithography and method for fabricating the same: A method for fabricating a photomask for extreme ultraviolet lithography is provided. A reflection layer reflecting extreme ultraviolet light is formed over a transparent substrate having a main chip region and a frame region. A phase shifter pattern is formed over the reflection layer to selectively expose the reflection layer.... Agent: Marshall, Gerstein & Borun LLP
20100304283 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography, which comprises a substrate, and at least a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), nitrogen (N) and hydrogen (H); and in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100304284 - Thermally stable cationic photocurable compositions: The invention relates to a cationic photocurable composition comprising at least one cationically polymerizable compound, at least one onium salt photoinitiator, at least a moisture scavenger, and at least a stabilizer selected from the group consisting of sterically hindered nitroxyl stabilizers, sterically hindered phenolic antioxidants, organic phosphorous stabilizers and mixtures... Agent: Basf Corporation Patent Department
20100304285 - Crack resistant imaging member preparation and processing method: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the development of a structurally simplified flexible electrophotographic imaging member without the need of an anticurl back coating layer and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100304286 - Electrophotographic toner and process for producing electrophotographic toner: Disclosed is an decolorizable electrophotographic toner, containing a binder resin, an electron-donating color-developable agent, and a wax having a color-developing action and having an acid value of 60 mgKOH/g or more.... Agent: Turocy & Watson, LLP
20100304287 - Polyester synthesis: The present disclosure provides processes for the production of block copolymer polyester resins suitable for use in manufacturing toners. In embodiments, the copolymers include both a crystalline block and an amorphous block, which can self-assemble to form nanoparticles suitable for use in forming toners.... Agent: Xerox Corporation (cdfs)
20100304288 - Electrophographic toner: A toner comprising toner particles, wherein a surface-treated titanate compound is contained on the surface of parent toner particles comprising a resin and a colorant, and the titanate compound having a carbon amount of not less than 0.15% by mass and not more than 0.50% by mass.... Agent: Lucas & Mercanti, LLP
20100304295 - Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process: An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R2 is H or monovalent hydrocarbon, R3 and R4 are H or monovalent hydrocarbon, or R3... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100304299 - Chemically amplified positive photoresist composition: A photoresist composition. The composition has the following: (a) one or more resin binders that include one or more acid sensitive groups and that are substantially free of phenolic groups protected by acetal or ketal groups; (b) one or more photo acid generators, that, upon exposure to a source of... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP
20100304290 - Compositions and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. In one preferred aspect, photoresist composition are provided that comprise: (i) one or more resins that comprise photoacid-labile groups, (ii) a photoactive component, and (iii) one or more materials that comprise photoacid labile groups and that are distinct from... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20100304297 - Patterning process and resist composition: A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100304292 - Salt and photoresist composition containing the same: B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and... Agent: Birch Stewart Kolasch & Birch
20100304293 - Salt and photoresist composition containing the same: Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the... Agent: Birch Stewart Kolasch & Birch
20100304294 - Salt and photoresist composition containing the same: m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the... Agent: Birch Stewart Kolasch & Birch
20100304296 - Salt and photoresist composition containing the same: m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the... Agent: Birch Stewart Kolasch & Birch
20100304302 - Chemically amplified resist composition and pattern forming process: A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R1 is H, F, CH3 or CF3, Rf is H, F, CF3... Agent: Birch Stewart Kolasch & Birch
20100304301 - Negative resist composition and patterning process using the same: There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with... Agent: Oliff & Berridge, PLC
20100304303 - Novel sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent: In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates... Agent: Crowell & Moring LLP Intellectual Property Group
20100304304 - Method for making lithographic plates: Method for producing an imaged lithographic printing plate comprising the step of developing an imagewise exposed negative working precursor with a developer comprising an alkylene oxide derivative of formula (A), wherein R1 is a linear or branched C1 to C6 alkyl group or H, (n+m) is an integer from 2... Agent: Eastman Kodak Company Patent Legal Staff
20100304307 - Exposure apparatus and device manufacturing method: While one ends of ropes are respectively tied to a −Y side leg section and a +Y side leg section of a frame caster, the other ends of the ropes hang down in a −Z direction via a plurality of pulleys fixed to the upper sections of frames that are... Agent: Oliff & Berridge, PLC
20100304306 - Flexible micro/nanofluidic devices: The present invention relates to a method for manufacturing micro/nanofluidic devices that incorporate overhanging micromechanical and metal components monolithically integrated with the fluidic circuitry.... Agent: Merchant & Gould PC
20100304308 - Process for thick film circuit patterning: The invention relates to forming an electrically functional pattern on a substrate and to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support. The process for forming a pattern having electrically functional properties on a substrate comprises the... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20100304312 - Cleaning liquid used in photolithography and a method for treating substrate therewith: It is disclosed a cleaning liquid for stripping and dissolving a photoresist pattern having a film thickness of 10-150 μm, which contains (a) 0.5-15 mass % of a quaternary ammonium hydroxide, such as tetrapropylammonium hydroxide and tetrabutylammonium hydroxide, (b) 65-97 mass % of a water-soluble organic solvent, such as dimethylsulfoxide... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100304310 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;... Agent: Oliff & Berridge, PLC
20100304309 - Method and apparatus for photoimaging a substrate: A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an exposure zone; ii)... Agent: 3m Innovative Properties Company
20100304311 - Method of producing resist pattern: A method of producing a resist pattern includes the steps of: forming a resist layer on the semiconductor substrate; performing a first exposure process on the resist layer; performing a first developing process for developing the resist layer to form a first resist pattern having an excess region; performing a... Agent: Kubotera & Associates, LLC
20100304313 - Process solutions containing surfactants: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after... Agent: Air Products And Chemicals, Inc. Patent DepartmentPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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