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Radiation imagery chemistry: process, composition, or product thereof November recently filed with US Patent Office 11/10

20100297538 - Holographic reticle and patterning method: A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target.... Agent: Slater & Matsil, L.L.P.

20100297539 - Antireflective hard mask compositions: The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20100297540 - Sulphonium salt initiators: Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa,... Agent: Basf Corporation Patent Department

20100297541 - Sulphonium salt initiators: Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of... Agent: Basf Corporation Patent Department

20100297542 - Sulphonium salt initiators: Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl,... Agent: Basf Corporation Patent Department

20100297543 - interfacial layer and coating solution for forming the same: The present embodiments are generally directed to an improved imaging member exhibiting various advantages over conventional imaging members. More specifically, the present embodiments are directed to an improved interfacial layer formed from an aqueous-based coating solution which exhibits improved formation and coating properties, such as increased homogeneity and adhesion, and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100297544 - Flexible imaging members having a plasticized imaging layer: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structural simplification, and material reformulation for making and using the same. More particularly, the embodiments pertain to the incorporation of a plasticizer into the charge transport layer such that an anticurl back coating is no... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100297546 - Toner compositions: Toner particles are provided which may, in embodiments, include a core and a shell. In embodiments, charge control agents may be co-emulsified with a resin utilized to form a shell. The shell may prevent a crystalline resin in the core from migrating to the toner surface. Inclusion of the charge... Agent: Xerox Corporation (cdfs)

20100297545 - Preparation method of composite silica nanoparticles with monodispersity: The present invention provides a preparation method of composite silica microparticles with monodispersity, comprising the steps of: (a) adding at least one precursor selected from a titania precursor and an alumina precursor, and a silica precursor to a solvent, which are hydrolyzed to form composite silica microparticles; (b) drying and... Agent: Bishop & Diehl, Ltd.

20100297547 - Resin composition for electrophotographic toners and electrophotographic toners: An object of the present invention is to provide the resin composition for electro-photographic toner, which the electro-photographic toner to be obtained by it is superior to low temperature fixing properties and a hot offset resistance, and the electro-photographic toner thereof. To be achieved this purpose, multi-branched state polyester structure... Agent: Edwards Angell Palmer & Dodge LLP

20100297548 - Method for producing toner for developing electrostatic image and apparatus for producing resin particles: A method for producing resin particles, including ejecting a liquid containing at least a resin in the form of droplets from a droplet ejecting unit having a plurality of holes provided in a part of a flow channel for feeding the liquid containing at least a resin, and drying and... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100297549 - Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20100297550 - Compositions comprising sulfonamide material and processes for photolithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20100297555 - Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition: The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water... Agent: Birch Stewart Kolasch & Birch

20100297553 - Positive resist composition and pattern-forming method using the same: A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and... Agent: Sughrue-265550

20100297551 - Process for producing photoresist polymeric compounds: Disclosed is a process for producing a photoresist polymeric compound. The process includes the steps of polymerizing a monomer mixture containing at least one monomer selected from a monomer (a) containing a group capable of leaving with an acid to allow the polymeric compound to be soluble in an alkali,... Agent: Birch Stewart Kolasch & Birch

20100297552 - Resist film forming method: The method prepares a substrate provided thereon with a first resist film having a first pattern of first pillars spaced at intervals, the pillars having a first height, and forms a second resist film on the substrate. The second resist film is formed by alternately performing, each at least twice,... Agent: Burr & Brown

20100297554 - Resist-modifying composition and pattern forming process: A patterning process includes (1) coating a first positive resist composition onto a substrate, baking, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) coating a resist-modifying composition onto the first resist pattern and heating to effect modifying treatment, and (3) coating a second positive resist... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100297556 - Coating compositions suitable for use with an overcoated photoresist: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20100297557 - Coating compositions suitable for use with an overcoated photoresist: Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20100297558 - Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom: The invention relates to photopolymerizable flexographic printing elements which contain ethylenically unsaturated, alicyclic monomers and hard flexographic printing plates, in particular cylindrical continuous seamless flexographic printing plates, which can be produced therefrom.... Agent: Connolly Bove Lodge & Hutz, LLP

20100297559 - Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board: [Solution Means] A photosensitive resin composition comprising (a) 20-90 wt % of a thermoplastic copolymer having a specific copolymerizing component copolymerized, and having a carboxyl group content of 100-600 acid equivalents and a weight-average molecular weight of 5,000-500,000, (b) 5-75 wt % of an addition polymerizable monomer having at least... Agent: Birch Stewart Kolasch & Birch

20100297560 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1)... Agent: Knobbe Martens Olson & Bear LLP

20100297561 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100297562 - Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method: A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a vertical direction, makes the chuck member approach a position which is a predetermined distance away from the upper surface of the wafer,... Agent: Oliff & Berridge, PLC

20100297564 - Polymerizable fluorine-containing monomer, fluorine-containing polymer and method of forming resist pattern: wherein R1 is hydrogen atom or a monovalent saturated or unsaturated hydrocarbon group of 1 to 15 carbon atoms, and the hydrocarbon group may be chain or cyclic structure and may have oxygen atom, nitrogen atom, sulfur atom or halogen atom, the polymer is a homopolymer or copolymer of the... Agent: Sughrue Mion, PLLC

20100297563 - Resist-modifying composition and pattern forming process: A patterning process includes (1) coating a first positive resist composition onto a substrate, baking, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) coating a resist-modifying composition onto the first resist pattern and heating to effect modifying treatment, and (3) coating a second positive resist... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100291474 - Compositions and coatings containing fluorescent, inorganic nanoparticles: Compositions and coatings are described that contain fluorescent, inorganic nanoparticles that can fluoresce when excited with actinic radiation. The compositions and coatings can be used for marking purposes, particularly for providing a mark that is invisible to the unaided human eye but that can be detected as a fluorescence signal... Agent: 3m Innovative Properties Company

20100291478 - Etching method and photomask blank processing method: Disclosed herein is a dry etching method for a work layer formed over a substrate, including the steps of forming a hard mask layer over the work layer formed over the substrate, forming a resist pattern over the hard mask layer, transferring the resist pattern to the hard mask layer... Agent: Birch Stewart Kolasch & Birch

20100291477 - Pattern forming method, pattern designing method, and mask set: A pattern designing method according to an embodiment of the present invention includes: designing a first pattern for inspection formed by arraying a plurality of first mark rows, in which rectangular marks are arrayed at predetermined intervals in a first direction, in a second direction perpendicular to the first direction... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100291476 - Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers: A multiple mask and a multiple masking layer technique can be used to pattern an IC layer. A RET can be used to define one or more fine-line patterns in a first masking layer. Portions of the fine-line features are then removed or designated for removal using a mask. This... Agent: Bever, Hoffman & Harms, LLP

20100291475 - Silicone coating compositions: where S is a siloxane chain or an inorganic/organic hybrid chain; L is a thermally labile group; R1 is alkyl, aryl, alkaryl, —O-L, or 13 O—S; and R2 is alkyl, aryl, alkaryl, S or L; and n is an integer. The invention also relates to compositions comprising the novel polymer... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20100291479 - Method for fabricating color filter layer: A method of fabricating a color filter layer is provided. An active device array substrate having an opaque metal pattern formed thereon is provided. A planarization layer covering the opaque metal pattern is formed. A back-side exposure process is performed on the active device array substrate using the opaque metal... Agent: Jianq Chyun Intellectual Property Office

20100291480 - Electrophotographic photosensitive body: m

20100291481 - Toner, developer, image forming method, process cartridge and developer to be supplied: A toner including: a binder resin containing at least a polyester resin (A) and a polyester resin (B) as main components; a colorant; a release agent; and a graft polymer containing a polyolefin resin and a vinyl resin, wherein the polyester resin (A) is a condensation product resulting from condensation... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100291482 - Novel polymer, charge control agent, and toner for developing electrostatic latent images: t

20100291483 - Resist underlayer film forming composition containing branched polyhydroxystyrene: There is provided a resist underlayer film which does not intermix with a photoresist coated and formed as the overlying layer and which dissolves in an alkaline developer and can be developed and removed at the same time as the photoresist; and a resist underlayer film-forming composition for forming such... Agent: Oliff & Berridge, PLC

20100291484 - Negative resist composition, patterning process, and testing process and preparation process of negative resist composition: There is disclosed a negative resist composition comprising at least (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid,... Agent: Oliff & Berridge, PLC

20100291485 - Nanoscale molecule synthesis: This invention relates to nanoscale molecule synthesis, including three-dimensional addressable arrays of biopolymeric nucleic acids and processes for manufacturing such arrays. Such arrays can be functionalized with complementary chemical reactive probes to provide catalytic enzymes.... Agent: The Grafe Law Office, P.C.

20100291486 - Method of manufacturing carbon nanotube device array: Provided is a method of manufacturing carbon nanotube (CNT) device arrays. In the method of manufacturing CNT device arrays, catalyst patterns may be formed using a photolithography process, CNTs may be grown from the catalyst patterns, and electrodes may be formed on the grown CNTs.... Agent: Harness, Dickey & Pierce, P.L.C

20100291487 - Silicon-containing resist underlayer film forming composition having urea group: o

20100291488 - Manufacturing method for multilayer core board: A method for manufacturing a cone board including: preparing a core insulation layer including one or more resins selected from the group consisting of epoxy resins and bismaleimide triazine resins; and forming a first nickel layer on at least one surface of the core insulation layer by electroless plating... Agent: Staas & Halsey LLP

20100291489 - Exposure methods for forming patterned layers and apparatus for performing the same: Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the... Agent: Ratnerprestia

20100291490 - Resist pattern slimming treatment method: A resist pattern slimming treatment method includes: a slimming treatment step of performing a slimming treatment on a resist pattern by applying a solution containing an acid onto a substrate having the resist pattern formed thereon, then performing a heat treatment, and then performing a developing treatment. A database storing... Agent: Posz Law Group, PLC

20100291491 - Resist pattern slimming treatment method: A resist pattern slimming treatment method of performing a slimming treatment on a resist pattern formed on a substrate includes: a slimming treatment step of performing a slimming treatment on the resist pattern by applying a reactant solubilizing the resist pattern onto the resist pattern, then performing a heat treatment... Agent: Posz Law Group, PLC

20100285398 - Tamper indicating article: Tamper indicating articles that include a surface-feature image-generating layer and an adhesive layer are described. The surface-feature image-generating layer generates a visible, surface-feature-generated image upon exposure to light. The intensity of the surface-feature-generated image is reduced when taped-over. Single-image and dual-image tamper indicating articles are also described, including buried dual-image... Agent: 3m Innovative Properties Company

20100285400 - Position detecting apparatus, position detecting method, exposure apparatus and device manufacturing method: A position detecting apparatus includes a light source which supplies a detecting light; a light-collecting optical system which collects the detecting light onto a diffracted light generating portion provided on the object; a light guiding optical system which guides, to a predetermined position, a diffracted measuring light generated from the... Agent: Klarquist Sparkman, LLP

20100285399 - Wafer edge exposure unit: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light... Agent: Duane Morris LLP (tsmc)IPDepartment

20100285401 - Curable toner compositions and processes: Processes for producing emulsion aggregation toners are provided. In embodiments, methods of the present disclosure may be utilized to produce toners suitable for low melt applications, including use in flexible packaging applications, where low pile height is desired for low cost and flexibility. In embodiments, the EA toners may be... Agent: Xerox Corporation (cdfs)

20100285402 - Toner and method of manufacturing toner: A toner is provided which includes a first binder resin, a second binder resin that is a reaction product of a compound having an active hydrogen group with a polymer reactive with the active hydrogen group, a colorant, and a release agent. The toner includes the second binder resin in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100285403 - Curable toner compositions and processes: Processes for producing emulsion aggregation toners are provided. In embodiments, methods of the present disclosure may be utilized to produce toners suitable for low melt applications, including use in flexible packaging applications, where low pile height is desired for low cost and flexibility. In embodiments, the EA toners may be... Agent: Xerox Corporation (cdfs)

20100285406 - Ablatable elements for making flexographic printing plates: Flexographic printing plates and other relief images can be formed from a laser-ablatable element having a laser-ablatable layer that is from about 300 to about 4,000 μm in thickness. The laser-ablatable layer includes a film-forming material that is a laser-laser-ablatable material or the film-forming material has dispersed therein a laser-ablatable... Agent: Raymond L. Owens Patent Legal Staff,

20100285404 - Method for producing polyamide and resin composition: Disclosed is a method for producing polyamide, wherein a diimidazolide compound represented by the general formula (1) shown below is reacted with a diamine compound represented by the general formula (2) shown below. The present invention provides a method for producing a chlorine-free high molecular weight alkali-soluble polyamide by simple... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100285405 - Radiation-sensitive resin composition: wherein M+ represents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m... Agent: Ditthavong Mori & Steiner, P.C.

20100285407 - Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same: There is disclosed a thermosetting silicon-containing antireflection film-forming composition, to form a silicon-containing antireflection film in a multilayer resist process used in a lithography, wherein the composition is at least capable of forming—on an organic film that is an underlayer film having a naphthalene skeleton—a silicon-containing antireflection film whose refractive... Agent: Oliff & Berridge, PLC

20100285408 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board: wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one... Agent: Antonelli, Terry, Stout & Kraus, LLP

20100285409 - Method for manufacturing semiconductor device: A reverse pattern is formed once by combining a negative exposure mask having a wiring pattern with a positive resist, and then a positive wiring pattern is formed by use of the reverse pattern. That is, a positive resist applied on a semiconductor substrate is exposed by use of the... Agent: Mcdermott Will & Emery LLP

20100285410 - Method for manufacturing a semiconductor device using a modified photosensitive layer: The present disclosure provides a method for manufacturing a semiconductor device. The method includes coating a photoresist on a substrate. The photoresist is exposed to radiation. The radiation exposed photoresist is baked. The radiation exposed and baked photoresist is developed to create an image pattern. The image pattern is treated... Agent: Haynes And Boone, LLPIPSection

20100285411 - Micro-fluid ejection devices with a polymeric layer having an embedded conductive material: Micro-fluid ejection devices, methods for making a micro-fluid ejection device, and methods for reducing a size of a substrate for a micro-fluid ejection head. One such micro-fluid ejection device has a polymeric layer adjacent a substrate and at least one conductive layer embedded in the polymeric layer. The polymeric layer... Agent: Lexmark International, Inc. Intellectual Property Law Department

20100285412 - Method for fabricating 3d microstructure: A method for fabricating 3D microstructure is disclosed. A matching fluid is arranged between the mask and the photoresist layer. When the mask and photoresist layer perform the relative scanning and exposure process simultaneously, the matching fluid will reduce the diffraction error, so that the gap between the mask and... Agent: Muncy, Geissler, Olds & Lowe, PLLC

20100279211 - Method for designing assistant pattern: The invention is directed to a method for designing an assistant pattern of a mask pattern on a mask. The mask pattern has an assistant pattern arrangement region around a main pattern. The method comprising defining a reverse pattern of the main pattern. The reverse pattern is shrunken to be... Agent: J C Patents

20100279212 - Photomask: A photomask is provided that includes a transparent substrate having a pattern region and a pellicle frame-mounting region formed thereon, wherein the pellicle frame-mounting region is formed outside the outer periphery of the pattern region, and at least the pellicle frame-mounting region is covered with a light shielding film. Specifically,... Agent: Kratz, Quintos & Hanson, LLP

20100279213 - Methods and systems for controlling variation in dimensions of patterned features across a wafer: Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer during a lithography process. The method also includes altering a parameter of... Agent: Entropy Matters LLC

20100279214 - Polyaryl ether copolymer containing intermediate transfer members: A polyaryl ether intermediate transfer media, such as a belt, and a multi layered intermediate transfer media, that includes a supporting substrate, like a polyimide and deposited on the substrate a polyaryl ether.... Agent: Patent Documentation Center Xerox Corporation

20100279216 - Fatty ester containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein the photogenerating layer contains a vulcanized fatty ester.... Agent: Patent Documentation Center Xerox Corporation

20100279218 - Flexible imaging members without anticurl layer: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of a liquid compound having a high boiling point into the charge transport layer such that an anticurl... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100279219 - Flexible imaging members without anticurl layer: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of a liquid compound having a high boiling point into the charge transport layer such that an anticurl... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100279215 - Phenol polysulfide hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, an optional ground plane layer, an undercoat layer thereover wherein the undercoat layer contains an aminosilane and a phenol polysulfide, a photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20100279217 - Structurally simplified flexible imaging members: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to the incorporation of a liquid compound having a high boiling point into the charge transport layer such that an anticurl... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100279220 - Method of recycling image forming material: A method of recycling an image forming material comprising the steps of holding a toner image formed by employing toner particles in a toner holding layer formed on an image supporting substrate to form a first generation image print, separating the toner particles from the first generation image print; and... Agent: Lucas & Mercanti, LLP

20100279221 - Resin-coated carrier method of manufacturing the same, two-component developer including resin-coated carrier, developing device and image forming apparatus: A resin-coated carrier is provided. A resin-coated carrier includes a carrier core and a resin coating layer formed on a surface of the carrier core. The carrier core is composed of a porous material having surface fine pores formed on a surface thereof, and has an apparent density of 1.6... Agent: Nixon & Vanderhye, PC

20100279222 - High iv melt phase polyester polymer catalyzed with antimony containing compounds: A melt phase process for making a polyester polymer melt phase product by adding an antimony containing catalyst to the melt phase, polycondensing the melt containing said catalyst in the melt phase until the It.V. of the melt reaches at least 0.75 dL/g. Polyester polymer melt phase pellets containing antimony... Agent: Michael K. Carrier

20100279223 - Toner and method for producing toner: Disclosed is a toner including: a toner particle including at least a resin, a coloring agent and a mold release agent, wherein an average value e of degree of circularity of the toner particle is within 0.935=e=0.982, a maximum endothermic peak temperature of the mold release agent exists within 85-98°... Agent: Lucas & Mercanti, LLP

20100279224 - Method for producing electrophotographic carrier and electrophotographic carrier produced by using the method: In a method for coating electrophotographic carrier core surfaces with a resin composition by rotating a rotator having a plurality of agitating blades on its surface in a casing; a coating treatment material that is introduced to a space defined between the rotator and the casing is in a packing... Agent: Fitzpatrick Cella Harper & Scinto

20100279225 - Method of filtering porous particles: The present invention is a method of manufacturing porous polymer particles comprising: forming a dispersion of porous polymer particles in an external aqueous phase, wherein individual porous particles each comprise a continuous polymer phase and internal pores containing an internal aqueous phase; and filtering the dispersion of porous polymer particles... Agent: Andrew J. Anderson Patent Legal Staff

20100279226 - Resist processing method: The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning... Agent: Birch Stewart Kolasch & Birch

20100279227 - Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound: There is provided an underlayer coating forming composition for lithography that is used in lithography process of manufacture of semiconductor device; and an underlayer coating having a high dry etching rate compared with photoresist. Concretely, it is a composition for forming an underlayer without use of crosslinking reaction by an... Agent: Oliff & Berridge, PLC

20100279228 - Organo-metallic hybrid materials for micro- and nanofabrication: One embodiment of the present invention provides a photosensitive organo-metallic hybrid material which functions as both a structural material and a photoresist material. More specifically, this photosensitive organo-metallic hybrid material includes an organo-metallic compound comprised of at least one unsaturated double bond. The photosensitive organo-metallic hybrid material also includes a... Agent: Park, Vaughan & Fleming LLP

20100279229 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board: wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one... Agent: Antonelli, Terry, Stout & Kraus, LLP

20100279230 - Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method: A method for producing a lithographic printing plate is provided, wherein, in the non-alkaline development of a lithographic printing plate precursor having a protective layer, even if the protective layer components are mingled into the developer, the reduction in development removability of the image recording layer and the generation of... Agent: Birch Stewart Kolasch & Birch

20100279231 - Method and device for marking objects: A description is given of methods and devices for product marking of objects using a light-sensitive layer applied to the objects and a light source. The invention may be used, for example, to simultaneously mark or label a first plurality of objects at a first time with individual marks or... Agent: Dicke, Billig & Czaja

20100279232 - Immersion lithographic apparatus and a device manufacturing method: An immersion lithographic apparatus has a surface that in use is contacted by the immersion liquid and the surface has a surface roughness Ra that is less than or equal to 0.2 μm. Immersion liquid on the surface may have a contact angle of 60° or greater. The surface may... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100279234 - Double patterning method using metallic compound mask layer: A hard mask layer and a developable bottom anti-reflective coating (dBARC) layer are formed over a dielectric layer of a substrate. A first photosensitive layer is formed above the dBARC layer, exposed, and developed to form a first pattern. The dBARC layer is developed. The first pattern is etched into... Agent: Lowe Hauptman Ham & Berner, LLP (tsmc)

20100279233 - Method for laser interference lithography using diffraction grating: A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material... Agent: Mckenna Long & Aldridge LLP

20100279235 - Composition for formation of top anti-reflective film, and pattern formation method using the composition: The present invention provides a composition for forming a top anti-reflection coating having a low refractive index, realizing a gradual swing curve and giving a small swing ratio. This composition comprises a solvent and an anthracene skeleton-containing polymer having a hydrophilic group. The composition forms an anti-reflection coating on a... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.