|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
USPTO Class 430 | Browse by Industry: Previous - Next | All
10/2010 | Recent | 13: May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Radiation imagery chemistry: process, composition, or product thereof October categorized by USPTO classification 10/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 10/28/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100273096 - Photopolymer media with enhanced dynamic range: Dynamic range enhancing dopants for photopolymeric media are described. Also described are optical articles using these dopants and methods for making such optical articles.... Agent: Vedder Price, PC
20100273098 - Mask blank, production method of mask blank and production method of mask: A mask blank that can be formed without causing a shape defect in a transfer pattern having a high resolution. A mask blank (10) includes a transparent substrate (11), an etched layer (14) located above the transparent substrate (11), a suppression layer (20) located above the etched layer (11) and... Agent: J. Rodman Steele Novak Druce & Quigg LLP
20100273097 - Pellicle: A pellicle is provided that includes an aluminum pellicle frame having an anodized layer on its entire surface; and a pellicle film stretched over and affixed to an end face of the pellicle frame, the anodized layer having a thickness of 4 to 8 μm.... Agent: Kratz, Quintos & Hanson, LLP
20100273099 - Flood exposure process for dual tone development in lithographic applications: A method and system for patterning a substrate using a dual tone development process is described. The method and system comprise a flood exposure of the substrate to improve process latitude for the dual tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100273100 - Coating for optically suitable and conductive anti-curl back coating layer: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to an improved electrostatographic imaging member incorporating a thermoplastic material pre-compounded to impart conductivity to the anti-curl back coating layer and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100273101 - Yellow toner: To provide a yellow toner satisfying good toner particles and a superior coloring power, the toner has toner base particles having at least a binder resin, a colorant and a wax component, and contains as the colorant at least a coloring matter compound represented by the following general formula (1)... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100273102 - Color toner: The color toner has capsule toner particles each having a surface layer (B) mainly formed of a resin (b) on the surface of a toner base particle (A), the toner base particle (A) containing at least a binder resin (a), a colorant, and a wax, in which (1) a temperature... Agent: Fitzpatrick Cella Harper & Scinto
20100273103 - Magnetic carrier and two-components developer: The present invention provides an image of high image quality by using a magnetic carrier coated with a novel coating resin composition. Further, the present invention stably provides a good image which is hardly influenced by environmental fluctuation and long-term use and has a superior stability of a charging amount... Agent: Fitzpatrick Cella Harper & Scinto
20100273105 - Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator: wherein RX represents a hydrocarbon group which may have a hetero atom; R1 represents a divalent linking group; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms; n represents an integer of 1 to 3; and Z... Agent: Knobbe Martens Olson & Bear LLP
20100273106 - Positive resist composition, method of forming resist pattern, polymeric compound, and compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing... Agent: Knobbe Martens Olson & Bear LLP
20100273107 - Dual tone development with a photo-activated acid enhancement component in lithographic applications: A method and system for patterning a substrate using a lithographic process, such as a dual tone development process, is described. The method comprises use of at least one photo-activated acid enhancement component to improve process latitude for the dual tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100273108 - Method for producing regenerated porous sheet: The present invention provides a method for producing a regenerated porous sheet including a step of bringing a porous sheet which has adsorbed an uncured part of a photosensitive resin, into contact with a solvent to separate the uncured part from the porous sheet, the porous sheet that has adsorbed... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100273109 - Method for producing optical part: A method for producing an optical part includes an irradiation process for irradiating a radiation-sensitive polymerizable composition with a radiation. The radiation-sensitive polymerizable composition includes at least a polymerizable compound (a) and a polymerizable or non-polymerizable component (c). The irradiation process includes at least a first step of irradiating with... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100273110 - Patterning process: There is disclosed a patterning process comprises at least (1) a step of forming an organic underlayer film on a substrate and then forming a photoresist pattern on the organic underlayer film, (2) a step of attaching an alkaline solution containing an alkaline substance onto the photoresist pattern and then... Agent: Oliff & Berridge, PLC
20100273114 - Device manufacturing apparatus and method of manufacturing device: A device manufacturing apparatus includes a driving unit configured to perform driving for processing an object, a conduit through which a coolant that recovers heat generated by the driving unit flows, a cooler configure to cool the coolant that flows through the conduit, a heater configured to heat the coolant... Agent: Rossi, Kimms & Mcdowell LLP.
20100273111 - Dual tone development with plural photo-acid generators in lithographic applications: A method and system for patterning a substrate using a dual tone development process is described. The method comprises use of plural photo-acid generators with or without a flood exposure of the substrate to improve process latitude for the dual tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100273115 - Particle inspection apparatus, exposure apparatus, and device manufacturing method: A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100273112 - Process for producing photoresist pattern: p
20100273113 - Process for producing photoresist pattern: The present invention provides a process for producing a photoresist pattern that contains steps (1) to (11)as described in the specification.... Agent: Birch Stewart Kolasch & Birch
20100273116 - Silver halide photosensitive material: A silver halide color photosensitive material comprising a support and, superimposed thereon, a blue-sensitive layer unit, a green-sensitive layer unit and a red-sensitive layer unit, each of these light-sensitive layer units composed of at least one silver halide emulsion layer, together with at least one nonphotosensitive layer, wherein the following... Agent: Sughrue Mion, PLLC10/21/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100266935 - Low-cost tough decorative printable film products having holographic-type images: Tough decorative printable film products having holographic-type images are provided that are low in cost. These film products include a relatively high temperature film that is made by continuous extrusion of the film resin onto a master film having pre-etched holographic-type imaging in order to provide a high-temperature primary film... Agent: Cook Alex Ltd
20100266936 - Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram: The volume hologram recording photosensitive composition provided by the present invention contains at least a fluorine-contained photoreactive compound represented by the following formula (1): R1—R3—(CF2)n-R4—R2 wherein R1 and R2 are photoreactive groups which can be bonded to each other by photoreaction, and each of R3 and R4 is independently a... Agent: Ladas & Parry LLP
20100266939 - Lithographic mask and method of forming a lithographic mask: A lithographic mask comprises a first layer including grooves, a second layer including regions, sections and a groove-like structure that encloses the sections. The first and second layers are formed so as to reduce electrical potential differences within the second layer. A method of forming a lithographic mask includes forming... Agent: Mayback & Hoffman, P.A.
20100266937 - Method for repairing phase shift masks: The invention relates to a method for repairing phase shift masks for photolithography in which a phase shift mask is checked for the presence of defects and, if defects are present, (i) an analysis is conducted as to which of the defects negatively affect imaging properties of the phase shift... Agent: Fish & Richardson PC
20100266938 - Reflective mask blank and method of manufacturing a reflective mask: Provided are a reflective mask blank and a reflective mask that can improve the contrast for EUV exposure light in use of the mask and further can improve the pattern resolution at a pattern edge portion of the mask, thereby enabling high-resolution pattern transfer. A reflective mask blank of this... Agent: Sughrue Mion, PLLC
20100266940 - Charge transport layer comprising anti-oxidants: The presently disclosed embodiments are directed generally to an improved electrostatographic imaging member incorporating specific anti-oxidants into the charge transport layer to achieve substantially reduced lateral charge migration. The imaging members having such an charge transport layer can include charge transport molecules such as N,N,N,′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine without increased sensitivity to corona-induced... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100266941 - Conductive roller: A conductive roller including a plurality of protrusion and a plurality of recessed grooves is manufactured by cylindrically extrusion-molding a thermoplastic elastomer composition that includes an elastomer composition a salt of an anion having a fluoro group and a sulfonyl group and lithium; an ethylene oxide-propylene oxide-allyl glycidyl ether copolymer;... Agent: Birch Stewart Kolasch & Birch
20100266942 - Electrostatic image developing toner: A manufacturing method of an electrophotographic toner is disclosed. The method includes steps of dispersing the minute colored particles having a volume average particle diameter of D1 in the toner binder resin, the toner particle satisfies formula of 3=D2/D1>1, wherein D2 is an average diameter of dye cloud formed by... Agent: Lucas & Mercanti, LLP
20100266945 - Pigment, method for manufacturing the same, pigment dispersion, and yellow toner: A pigment has a compound expressed by Formula (1). The pigment has a number average primary particle size of 30 to 70 nm and has a CuKα characteristic X-ray diffraction spectrum having, when θ represents a Bragg angle, a peak at 2θ±0.20° equal to 10.0° and a peak at 2θ±0.20°... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100266944 - Pigment, method of producing pigment, pigment dispersion, and yellow toner: A pigment represented by the following formula has a CuKα characteristic X-ray diffraction spectrum having, when θ represents a Bragg angle, a peak at 2θ±0.20 degrees equal to 10.0 degrees and a peak at 2θ±0.20 degrees equal to 11.1 degrees, the intensity ratio of the 11.1 degree peak to the... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100266943 - Magnetic toner: To provide a toner excellent in low-temperature fixability, releasing performance, and development stability in long-term use under a high-temperature and high-humidity environment, provided is a magnetic toner including: magnetic toner particles each containing at least a binder resin and a magnetic particles; and an inorganic fine powder, in which: the... Agent: Fitzpatrick Cella Harper & Scinto
20100266946 - Image forming method:
20100266947 - Capsule toner and method of manufacturing capsule toner: A capsule toner in which fine solid particles constituting a shell layer are less likely to become detached from the surfaces of toner particles in spite of a long-term use within an image forming apparatus and which is capable of prevention of occurrence of filming on a photoreceptor drum, and... Agent: Nixon & Vanderhye, PC
20100266948 - Solvent-free emulsion process: A process for making a resin emulsion suitable for use in forming toner particles is provided. In embodiments, a suitable process includes melt mixing a resin in the absence of an organic solvent, optionally adding a surfactant to the resin, adding to the resin a basic agent and water, and... Agent: Xerox Corporation (cdfs)
20100266949 - Solvent-free emulsion process using acoustic mixing: A process for making toner particles is provided. In embodiments, a suitable process includes melt mixing a resin in the absence of an organic solvent, optionally adding a surfactant to the resin, adding to the resin at least one colorant and other optional toner additives, adding to the resin a... Agent: Xerox Corporation (cdfs)
20100266950 - Toner: The toner of the present invention, comprising a colored resin particle and an external additive, wherein said external additive contains a silica fine particle (A) having a Dv50/Dv10 of 1.8 or more, in which Dv10 represents a particle diameter at which a volume cumulative total from small particle diameter side... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100266953 - Copolymer and top coating composition: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not... Agent: Ditthavong Mori & Steiner, P.C.
20100266952 - Cyclic compound, photoresist base, photoresist composition, microfabrication process, and semiconductor device: wherein, of two R1s which are present on the same aromatic ring, one is a group shown by R3, and the other is a dissolution controlling group; R3s are independently hydrogen, a substituted or unsubstituted linear aliphatic hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted branched... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100266951 - Resist underlayer film forming composition and method for forming resist pattern: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist... Agent: Oliff & Berridge, PLC
20100266954 - Adamantane derivative, method for producing the same, and curing composition containing adamantane derivative: where R1 represents a group selected from a hydroxyl group, an acrylate group, a methacrylate group and a trifluoromethacrylate group, R2 represents a group selected from a hydrogen atom, a methyl group and a trifluoromethyl group, k is an integer of 0 to 4 and n is an integer of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100266955 - Positive resist composition and method of forming resist pattern: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1)... Agent: Knobbe Martens Olson & Bear LLP
20100266957 - Resist composition and patterning process: An additive polymer comprising recurring units of formula (1) is added to a resist composition comprising a base resin, a photoacid generator, and an organic solvent. R1 is hydrogen or methyl, R2 is alkylene or fluoroalkylene, and R3 is fluoroalkyl. The additive polymer is highly transparent to radiation with wavelength... Agent: Birch Stewart Kolasch & Birch
20100266958 - Resist material and method for forming pattern using the same: Initially, on a substrate, a resist film is formed from a resist material including a monomer containing a halogen atom (fluorine) and stable to acid, a polymer containing fluorine and stable to acid, a polymer containing an acid-labile group, and a photo acid generator. Next, while liquid is provided on... Agent: Mcdermott Will & Emery LLP
20100266959 - Pattern forming method: A pattern forming method includes providing a resist, irradiating a first electron beam to a first region of the resist, and irradiating a second electron beam to a second region which is defined along a boundary of the first region of the resist, wherein the first electron beam has a... Agent: Lee & Morse, P.C.
20100266960 - Method of manufacturing semiconductor device and exposure device: A method of manufacturing a semiconductor device according to an embodiment includes determining a second exposure parameter including exposure parameters except for an exposure amount from a dimension distribution information so that a resist pattern of a first resist pattern formed based on a second pattern has a desired dimension... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100266962 - Methods of forming a plurality of capacitors: A method of forming a plurality of capacitors includes forming a plurality of individual capacitor electrodes using two masking steps. An earlier of the two masking steps is used to form an array of first openings over a plurality of storage node contacts. A later of the two masking steps... Agent: Wells St. John P.s.
20100266961 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: In a substrate stage device, when an X coarse movement stage moves in an X-axis direction, a Y coarse movement stage, an empty-weight cancelling device and a Y beam move integrally with the X coarse movement stage, and when the Y coarse movement stage moves in a Y-axis direction on... Agent: Oliff & Berridge, PLC
20100266963 - Method for manufacturing mechanical shutter blades using beryllium-copper alloy substrate: An exemplary method for manufacturing mechanical shutter blades using a beryllium-copper substrate is provided. The method includes providing a beryllium-copper alloy substrate having a first surface and a second surface opposite to the first surface; respectively applying a first and second photoresist layers onto the first and second surfaces; exposing... Agent: Altis Law Group, Inc. Attn: Steven Reiss
20100266964 - Graphene oxide deoxygenation: A graphene oxide (GO) target is exposed to light having power sufficient to initiate a deoxygenation reaction of the GO target. The deoxygenation reaction of the GO target transforms the GO target to graphene.... Agent: Carmen Patti Law Group , LLC
20100266965 - Etch-enhanced technique for lift-off patterning: An enhanced process forming a material pattern on a substrate deposits the material anisotropically on resist material patterned to correspond to an image of the material pattern. The material is etched isotropically to remove a thickness of the material on sidewalls of the resist pattern while leaving the material on... Agent: Molecular Imprints
20100266966 - Methods of forming a pattern using photoresist compositions: A method of forming a pattern and a photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymerized photoresist additive, a polymer including an acid-labile protective group at a side chain, a photoacid generator, and a... Agent: Lee & Morse, P.C.
20100266967 - Polymer for forming organic anti-reflective coating layer: Wherein, R1 is a hydrogen atom (H) or a methyl group (—CH3), R2 is a sulfur atom (S) or an oxygen atom (O), R3 is a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, R4 is an alkylene group or a cycloalkylene group, and if necessary,... Agent: Jae Y. Park
20100266968 - Exposure apparatus, device manufacturing system, and method of manufacturing device: An exposure apparatus comprises an exposure device configured to perform an exposure process for a substrate, and a controller configured to control an operation of the exposure device in accordance with control software and perform an update process for the control software. The controller is configured to queue an exposure... Agent: Rossi, Kimms & Mcdowell LLP.
20100266969 - Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising: A resist film processing unit is disclosed that can improve an etching resistance of a resist film formed on a substrate. The resist film processing unit includes a light source to irradiate an ultraviolet light on a resist film patterned by a development process, a heating part configured to heat... Agent: Cantor Colburn, LLP- None available for 10/01/2010
- None available for 10/7/2010
Previous industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
RSS FEED for 20130516:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.
FreshPatents.com Support - Terms & Conditions
Results in 0.43043 seconds