|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof September class, title,number 09/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 09/30/2010 > patent applications in patent subcategories. class, title,number
20100248088 - Photopolymerisable system for hologram formation: A photopolymerisable system comprises an organic-inorganic compound with a metal and an organic unit having a organic photopolymerisable subunit capable of undergoing a polymerisation, a support matrix compound being polymer or capable of forming a polymer upon polymerisation, and a photoinitiator system adapted to initiate the polymerisation of the photopolymerisable... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100248092 - Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method: In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to... Agent: Sughrue Mion, PLLC
20100248091 - Method for inspecting photomask blank or intermediate thereof, method for determining dosage of high-energy radiation, and method for manufacturing photomask blank: A photomask blank which is manufactured by depositing a phase shift film on a substrate and irradiating the phase shift film with high-energy radiation to effect substrate shape adjusting treatment is inspected by measuring a surface topography of the photomask blank after the substrate shape adjusting treatment, removing the phase... Agent: Birch Stewart Kolasch & Birch
20100248089 - Method for optical proximity correction: Provided is a method for optical proximity correction for use in manufacturing highly resolved semiconductor chips. The method includes setting a target layout; setting a peculiar area; sorting the peculiar area from the target layout; generating a marking layer; resetting a critical dimension (CD) of a peculiar pattern; compensating an... Agent: Ladas & Parry LLP
20100248094 - Methods of forming and using reticles: Some embodiments include methods of treating reticles to provide backside masking across regions of the reticle to compensate for problems occurring during photolithographic processing. The problems may be, for example, defects in the reticle, problems associated with deposition or development of photoresist, or problems associated with substrate topography. The masking... Agent: Wells St. John P.s.
20100248090 - Photomask blank and photomask: A photomask blank comprises a transparent substrate, a light-shielding film of an optionally transition metal-containing silicon material, and an etching mask film of a chromium compound base material. The etching mask film consists of multiple layers of different composition which are deposited by reactive sputtering, the multiple layers including, in... Agent: Birch Stewart Kolasch & Birch
20100248093 - Reticle constructions: The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over... Agent: Wells St. John P.s.
20100248095 - Colored curable composition for color filter, color filter and method for producing the same, and solid state imaging device: A colored curable composition for a color filter includes: (A) a pigment in an amount of from 35 to 70 mass % with respect to the total solid content of the colored curable composition, (B) an amino resin, (C) an alkali-soluble resin, (D) a polymerizable monomer, and (E) a photopolymerization... Agent: Solaris Intellectual Property Group, PLLC
20100248097 - Negative-working thermal imageable elements: Negative-working imageable elements have a hydrophilic substrate and a single thermally-sensitive imageable layer. This layer can include an infrared radiation absorbing compound and polymeric particles that coalesce upon thermal imaging. These coalesceable polymeric particles comprise a thermoplastic polymer and a colorant to provide improved visible contrast between exposed and non-exposed... Agent: Raymond L . Owens Patent Legal Staff
20100248098 - Image forming apparatus, image forming method, and storage medium in which abnormality judging program is stored: An image forming apparatus is provided. An exposure component is equipped with a plurality of light emitting elements arrayed along a first direction. An output component is equipped with output ends corresponding to each of the light emitting elements and the output component, when correcting an amount of misalignment in... Agent: Sughrue Mion, PLLC
20100248099 - Software-controlled maskless optical lithography using fluorescence feedback: A software-controlled maskless optical lithography system uses fluorescence feedback to control an aspect of the lithography, such as light source dose, wavelength, or flashing instances or duration, spatial light modulator (SLM) pattern, an optics parameter, a beamsplitter control parameter, or movement or positioning of a stage carrying a target workpiece,... Agent: Schwegman, Lundberg & Woessner/columbia University
20100248100 - Electrophotographic photoreceptor, image-forming device, and process cartridge: An electrophotographic photoreceptor includes a conductive support and, on the conductive support, at least a photosensitive layer, the electrophotographic photoreceptor comprising a surface layer that may be the same as or different from the photosensitive layer and that includes fluororesin particles and a fluorinated alkyl group-containing copolymer containing a repeating... Agent: Oliff & Berridge, PLC
20100248101 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: wherein in formula (I), F represents an n-valent organic group having a hole transporting property, R represents a hydrogen atom or an alkyl group, L represents a divalent organic group, n represents an integer of 1 or more, and j represents 0 or 1.... Agent: Oliff & Berridge, PLC
20100248103 - Resin mixture backing layer containing photoconductor: A photoconductor that includes, for example, a backing layer, a supporting substrate, a photogenerating layer, and a charge transport layer, and where the outermost layer of the backing layer is comprised of a mixture of a glycoluril resin and a polyol resin.... Agent: Patent Documentation Center Xerox Corporation
20100248102 - Crosslinked resin mixture backing layer containing photoconductor: A photoconductor that includes, for example, a backing layer, a supporting substrate, a photogenerating layer, and a charge transport layer, and where the outermost layer of the backing layer is comprised of a mixture of a glycoluril resin and a polyacetal resin.... Agent: Patent Documentation Center Xerox Corporation
20100248105 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: The present invention provides an electrophotographic photoreceptor that includes: at least a photosensitive layer on a conductive support; a surface layer that contains fluororesin particles and a fluorocarbon comb graft polymer containing a repeating unit derived from a macromonomer and a repeating unit derived from a monomer having a fluoroalkyl... Agent: Oliff & Berridge, PLC
20100248104 - Polyaniline dialkylsulfate complexes containing intermediate transfer members: An intermediate transfer media, such as a belt, that includes a polyaniline dialkylsulfate complex.... Agent: Patent Documentation Center Xerox Corporation
20100248108 - Glycoluril resin and polyol resin dual members: An intermediate transfer member, such as a belt, where the surface of the belt contains as a coating a mixture of a glycoluril resin and a polyol resin.... Agent: Patent Documentation Center Xerox Corporation
20100248107 - Glycoluril resin and polyol resin members: An intermediate transfer member, such as a belt, where the seam or seams thereof on the member contain a coating mixture of a glycoluril resin and a polyol resin.... Agent: Patent Documentation Center Xerox Corporation
20100248106 - Polyimide polysiloxane intermediate transfer members: An intermediate transfer media, such as a belt of a polyimide/polyetherimide/polysiloxane, a polyimide polysiloxane, a mixture of a polyimide/polyetherimide/polysiloxane and a polyimide polysiloxane, and copolymers and block copolymers thereof.... Agent: Patent Documentation Center Xerox Corporation
20100248113 - Carrier coated with resin for electrophotographic developer and electrophotographic developer using the carrier coated with resin: A carrier coated with a resin for an electrophotographic developer in which a carrier particle surface is coated with the resin and the coating resin contains a lithium salt, and an electrophotographic developer using the carrier coated with the resin.... Agent: Greenblum & Bernstein, P.L.C
20100248109 - Carrier for replenishment, developer for replenishment, developer cartridge for replenishment, and image forming apparatus: The present invention provides a carrier for replenishment including an associated particle in which single particles each having a core material and a resin layer covering the core material, are bound via the resin layer, the carrier being used in a developer for replenishment of a trickle development system, and... Agent: Oliff & Berridge, PLC
20100248115 - Method for producing toner: Provided is a method for producing a toner having excellent particle size distribution and storage stability. The method set forth in the present specification is a method for producing a toner by aggregating and fusing base microparticles whose main component is a binder resin including anionic groups, wherein an aggregate... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689
20100248114 - Method of manufacturing toner, toner obtained by method thereof, one-component developer, two-component developer, developing device, and image forming apparatus: There are provided a toner manufacturing method of manufacturing a toner which has excellent characteristics such as fluidity and preservation stability and in which a resin layer having uniform thickness is formed on a surface of tone core particle, a toner obtained by a method thereof, a one-component developer, a... Agent: Nixon & Vanderhye, PC
20100248111 - Particle dispersion liquid, particles, particle dispersion liquid cartridge, process cartridge, image forming apparatus, and image forming method: The present invention provides a particle dispersion liquid including (meth)acrylic resin-containing hydrophobic particles, an acetylene glycol surfactant adsorbed to the hydrophobic particles, and water; the particle size, in a state of being swollen due to absorbing water until saturation, of the hydrophobic particles to which the acetylene glycol surfactant has... Agent: Oliff & Berridge, PLC
20100248110 - Toner for electrostatic image development, toner cartridge, process cartridge and image forming apparatus: The invention provides a toner for electrostatic image development, containing a toner particle and external additive particles adhered to the surface of the toner particle, each of the external additive particles being constituted of plural irreversibly coalesced primary particles.... Agent: Oliff & Berridge, PLC
20100248112 - Two-component developer, developer cartridge, process cartridge and image formation apparatus: A two-component developer including a yellow toner and a carrier, the yellow toner including at least one of C. I. Pigment Yellow 155 or C. I. Pigment Yellow 185, and an azo pigment, the carrier including a first resin, magnetic particles dispersed in the first resin, and elements of Cu,... Agent: Oliff & Berridge, PLC
20100248116 - Method for producing resin-coated carrier, resin-coated carrier, two-component developer, developing device, image forming apparatus and image forming method: A method for producing a low density resin-coated carrier having a small resin amount to a carrier core material and having a uniform resin coating layer formed on the carrier core material is provided. A resin-coated carrier has a carrier core material and a resin coating layer formed on the... Agent: Nixon & Vanderhye, PC
20100248117 - Image forming method, image forming device, and light-irradiation-fusible toner set: An image forming method includes forming at least one electrostatic charge image on at least one image holding member, developing the at least one electrostatic charge image using a black toner and a color toner to form toner images, transferring toner images to a receiving body, and fixing the toner... Agent: Oliff & Berridge, PLC
20100248119 - Compounds and methods of forming compounds useful as a toner: Compounds and methods of forming compounds useful as a toner or toner precursor are disclosed. The compounds may include an aqueous dispersion, the dispersion including: (A) at least one thermoplastic resin; and (B) 0 to 5 weight percent of a stabilizing agent, based on the total weight of (A) and... Agent: The Dow Chemical Company Osha Liang LLP
20100248118 - Toner processes: The present disclosure provides toners and processes for making said toners. In embodiments, the toners are invisible when viewed under natural light, but possess a UV additive that renders them visible when exposed to UV light of a specific wavelength. By selecting the appropriate UV additive and ionic crosslinker, with... Agent: Xerox Corporation (cdfs)
20100248120 - Carbon black, method for the production of carbon black or other flame aerosols, and device for carrying out said method: The invention relates to a method for producing carbon black or other flame aerosols, comprising the following steps: the heat is removed from the flame by dissipation and/or radiation; a thin gas boundary layer is formed; the flow formed by the flame and the gas boundary layer is accelerated or... Agent: Smith, Gambrell & Russell
20100248121 - Binder resin for color toners and color toner using the same: Provided is a binder resin for color toners which comprises at least a carboxyl group-containing vinyl resin (C), a glycidyl group-containing vinyl resin (E) and a reaction product thereof, and contains both a tetrahydrofuran (THF) soluble portion and a THF insoluble gel portion, wherein the THF soluble portion has a... Agent: Buchanan, Ingersoll & Rooney PC
20100248123 - Electrostatic-image-developing toner, production method thereof, electrostatic image developer, and image forming apparatus: An electrostatic-image-developing toner includes a binder resin that contains a crystalline polyester resin and an amorphous polyester resin; and a coloring agent, wherein the crystalline polyester resin has a melting temperature Tmc of about 25° C. or greater but not greater than about 50° C., and a content of the... Agent: Oliff & Berridge, PLC
20100248122 - Toner having polyester resin: Embodiments include a toner having a) a polyester resin derived from a naphthalenic material, a 2-alkyl succinic material, and 2,2-ethyl-butyl-1,3-propanediol, b) a wax, and c) an optional colorant.... Agent: Xerox Corporation (cdfs)
20100248124 - Method of manufacturing toner, toner obtained by method thereof, one-component developer, two-component developer, developing device and image forming apparatus: A toner manufacturing method, a toner obtained by the method, a one-component developer, a two-component developer, a developing device and an image forming apparatus are provided. By using a toner manufacturing apparatus including a powder passage, a spraying section for spraying a predetermined substance in the powder passage and a... Agent: Nixon & Vanderhye, PC
20100248125 - Resin-filled ferrite carrier for electrophotographic developer and electrophotographic developer using the ferrite carrier: A resin-filled ferrite carrier for an electrophotographic developer obtained by filling voids of a porous ferrite core material with a resin, wherein the resin is a silicone resin having a phenyl group, and an electrophotographic developer using this ferrite carrier.... Agent: Greenblum & Bernstein, P.L.C
20100248126 - Two-component developer, replenishing developer, and image-forming method: A two-component developer containing a magenta toner and a magnetic carrier, wherein the magenta toner has the characteristics: (i) when the concentration of the magenta toner in a solution of the magenta toner in chloroform is represented by Cm (mg/ml) and the absorbance of the solution at a wavelength of... Agent: Fitzpatrick Cella Harper & Scinto
20100248127 - Liquid developer, method for producing liquid developer, and image forming apparatus: A liquid developer includes: magnetic polymer particles including a magnetic material containing yttrium iron garnet (YIG), a polymer compound having a carboxylate salt structure, and a colorant; and a dispersion medium in which the magnetic polymer particles are dispersed.... Agent: Oliff & Berridge, PLC
20100248128 - Liquid developer and image forming method: Provided is a liquid developer containing toner particles and an insulating liquid containing a hydrogen modified silicon compound.... Agent: Workman Nydegger 1000 Eagle Gate Tower
20100248129 - Image forming apparatus and image forming method: An image forming apparatus includes: a latent image carrier which circumferentially rotates in a predetermined rotational direction; a conductive blade which cleans a surface of the latent image carrier by being in contact with the surface of the latent image carrier, and charges the surface of the latent image carrier... Agent: Workman Nydegger 1000 Eagle Gate Tower
20100248130 - Image forming method and method of recycling image forming material: An image forming method comprising the step of: forming a toner image employing toner particles containing at least a resin on an image supporting substrate having thereon a toner holding layer via a toner image holding process to form an image print, the toner image being held in the toner... Agent: Lucas & Mercanti, LLP
20100248131 - Image forming apparatus and image forming method: Provided is an image forming apparatus including: a latent image carrier; a lubricant applying unit configured to bring a conductive contact member into contact with a surface of the latent image carrier; a development unit configured to attach toner to the surface of the latent image carrier; and a conductive... Agent: Workman Nydegger 1000 Eagle Gate Tower
20100248132 - Production process of polymerized toner: A production process of a polymerized toner composed of polymer particles, including a step of polymerizing a polymerizable monomer composition containing a colorant and a polymerizable monomer in the presence of a polymerization initiator in an aqueous dispersion medium, wherein, in a stripping treatment step, the dispersion containing the polymer... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100248136 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) comprises any of repeating units (a) of general formula (I) or (II) below:... Agent: Sughrue Mion, PLLC
20100248137 - Antireflective coating compositons: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.
20100248134 - Methods of forming a pattern using negative-type photoresist compositions: A method of forming a pattern and a negative-type photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymer, a photoacid generator, and a solvent, wherein the polymer includes an alkoxysilyl group as a side chain... Agent: Lee & Morse, P.C.
20100248133 - Positive resist composition and method of forming resist pattern: A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including: a polymer (A1) including a structural unit (a0) represented by general formula (a0) shown below and no... Agent: Knobbe Martens Olson & Bear LLP
20100248135 - Sulfonium compound: wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A+ represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit... Agent: Birch Stewart Kolasch & Birch
20100248138 - Lithographic printing plate precursor: wherein R1 represents an alkyl, alkenyl or aryl group having from 6 to 36 carbon atoms which may have a substituent, R2 and R3 each independently represents a methyl group, an ethyl group, a hydroxyethyl group or a hydroxypropyl group, L represents a single bond or a divalent connecting group,... Agent: Birch Stewart Kolasch & Birch
20100248140 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes an aluminum support subjected to a roughening treatment and an image-recording layer containing an infrared absorbing agent, a radical polymerization initiator, a radical polymerizable monomer, a compound having two or more mercapto group-containing groups per molecule and a polymer particle containing a polyalkylene oxide... Agent: Birch Stewart Kolasch & Birch
20100248141 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes a support and an image-recording layer, a non-image area of the image-recording layer is capable of being removed by supplying printing ink and dampening water, and the image-recording layer contains (A) a compound containing two or more isocyanuric acid skeletons each having at least... Agent: Birch Stewart Kolasch & Birch
20100248139 - Printing plate precursor for laser engraving, printing plate, and method for producing printing plate: A printing plate precursor for laser engraving, including a relief forming layer including a cured resin material formed by thermally crosslinking a resin composition including at least (A) non-porous inorganic particles, (B) a binder polymer having a glass transition temperature (Tg) of 20° C. or higher, and (C) a crosslinking... Agent: Solaris Intellectual Property Group, PLLC
20100248142 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of being removed with at least one of printing ink and dampening water and contains a polymerizable compound represented by the formula (1) as defined herein, a polymer particle containing a structural... Agent: Birch Stewart Kolasch & Birch
20100248144 - Positive resist composition, method of forming resist pattern: in those cases where a resist film is formed on a substrate using the positive resist composition and is then subjected to a selective exposure and developing to form a hole pattern, followed by the entire surface exposure and then by a bake treatment, a bake treatment temperature (Tf′), at... Agent: Knobbe Martens Olson & Bear LLP
20100248147 - Photoresist compositions and process for multiple exposures with multiple layer photoresist systems: A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having a hydroxyl moiety; a photoacid generator; and a solvent. The polymer when formed on a substrate is substantially insoluble to the solvent after heating to a... Agent: Schmeiser, Olsen & Watts
20100248148 - Polymer compound, positive resist composition, and method of forming resist pattern: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to... Agent: Knobbe Martens Olson & Bear LLP
20100248146 - Positive resist composition and pattern forming method using the same: A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or... Agent: Sughrue-265550
20100248145 - Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same: A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a... Agent: Schmeiser, Olsen & Watts
20100248149 - Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure... Agent: Sughrue-265550
20100248150 - Method for preparing lithographic printing plate precursors: The method of preparing a lithographic printing plate precursor according to the present invention comprises the steps of: providing an aluminum support; graining and anodizing the aluminum support; without applying a hydrophilic layer on the anodized aluminum support, coating a composition which is photopolymerizable upon absorption of light having a... Agent: Leydig Voit & Mayer, Ltd
20100248151 - Method of making a printing plate: A method of making a printing plate which has easy removability of engraving residue generated in laser engraving and has excellent reproducibility of thin lines is provided. The method includes in the following order: engraving by laser irradiation a relief forming layer of a printing plate precursor, the relief forming... Agent: Solaris Intellectual Property Group, PLLC
20100248152 - Using electric-field directed post-exposure bake for double-patterning (d-p): The invention provides a method of processing a substrate using Double-Patterning (D-P) processing sequences and Electric-Field Enhanced Layers (E-FELs). The D-P processing sequences and E-FELs can be used to create lines, trenches, vias, spacers, contacts, and gate structures using a minimum number of etch processes.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100248153 - Method for forming pattern of semiconductor device: A method for forming a pattern of a semiconductor device is provided. Specifically, in a method for manufacturing a NAND flash memory device using a spacer patterning process, a dummy pattern, which is not used in an actual device operation, is additionally formed in a peripheral circuit region when a... Agent: Ampacc Law Group
20100248155 - Illumination control module, and diffraction illumination system and photolithography system including the same, and methods of fabricating semiconductors using the same: An illumination control module, which enables one diffraction optical element (DOE) to be applied to various photolithography processes, and a diffraction illumination system and a photolithography system including the same are provided. The illumination control module includes a convex-ring-shaped upper lens, and a concave-ring-shaped lower lens.... Agent: Myers Bigel Sibley & Sajovec
20100248157 - Method for manufacturing a reflection plate: It is to suppress the interference of the reflected light easily and securely even in a highly fine liquid crystal display device. The reflection plate comprises recessed or protruded parts and a reflection film formed over the recessed or protruded parts. A unit shape of the recessed or protruded parts... Agent: Young & Thompson
20100248158 - High-volume manufacturing massive e-beam maskless lithography system: The present disclosure provides a maskless lithography apparatus. The apparatus includes a plurality of writing chambers, each including: a wafer stage operable to secure a wafer to be written and a multi-beam module operable to provide multiple radiation beams for writing the wafer; an interface operable to transfer wafers between... Agent: Haynes And Boone, LLPIPSection
20100248159 - Patterning via optical-saturable transisions: An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the spectrally selective reversible transitions with an optical node retaining a single molecule in a configuration and exposing the single molecule to its spectrally... Agent: Gauthier & Connors, LLP
20100248161 - Method for making alignment mark on substrate: An exemplary method for making an alignment mark on a substrate includes the following steps. First, a substrate with a recess is provided. Second, a photoresist layer is formed on a surface of the substrate including in the recess. Third, the photoresist layer is exposed and developed to leave a... Agent: Altis Law Group, Inc. Attn: Steven Reiss
20100248160 - Patterning method: A patterning method is provided. First, a material layer is formed on a substrate. Thereafter, an ashable layer is formed on the material layer. Afterwards, a patterned transfer layer is formed on the ashable layer, wherein the patterned transfer layer has a critical dimension less than the exposure limit dimension.... Agent: J C Patents
20100248164 - Cleaning liquid for lithography and method for forming a resist pattern using the same: Provided are a cleaning liquid for lithography capable of suppressing occurrence of CD shift without inhibiting the effect of preventing pattern collapse by a surfactant, and a pattern formation method using the cleaning liquid for lithography. A cleaning liquid for lithography containing (A) an anionic surfactant, (B) an amine compound,... Agent: Knobbe Martens Olson & Bear LLP
20100248166 - Deflector array, exposure apparatus, and device manufacturing method: A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening... Agent: Fitzpatrick Cella Harper & Scinto
20100248165 - Information processing method, exposure processing system using same, device manufacturing method, and information processing apparatus: The information processing method of the present invention is provided that specifies an extraction period for extracting apparatus data to be generated by an industrial apparatus and analyzes a state of the industrial apparatus based on the apparatus data having an occurrence time within the extraction period. The information processing... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100248163 - Pattern formation method: A pattern formation method, includes: bringing a template into contact with a photo-curable agent to fill the photo-curable agent into a concave pattern formed on the template; forming a hydrophilizing component in the photo-curable agent to hydrophilize the photo-curable agent; irradiating the filled photo-curable agent with a first light to... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100248167 - Pattern-forming method: A pattern-forming method includes selectively exposing a resist layer formed using a positive-tone radiation-sensitive resin composition including a resin component and an acid generator. The resist layer is developed to form a first pattern. An uncrosslinked embedded section is formed adjacent the first the pattern using a pattern-forming resin composition... Agent: Ditthavong Mori & Steiner, P.C.09/23/2010 > patent applications in patent subcategories. class, title,number
20100239962 - Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method: A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference... Agent: Sughrue-265550
20100239963 - Exposure mask, exposure method, and method of manufacturing optical element: An exposure mask of the present invention is an exposure mask for patterning a three-dimensional shape on a resist. The exposure mask comprises a first region where a plurality of openings having a first size smaller than a resolution limit of an exposure apparatus are arranged, a second region where... Agent: Rossi, Kimms & Mcdowell LLP.
20100239964 - Test structures and methods: Test structures and methods for semiconductor devices, lithography systems, and lithography processes are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes using a lithography system to expose a layer of photosensitive material of a workpiece to energy through a lithography mask, the lithography mask including a... Agent: Slater & Matsil, L.L.P.
20100239965 - Colored curable composition, color filter, and method for producing color filter: A colored curable composition for a solid-state image pickup device, including a polyhalogenated zinc phthalocyanine pigment, a photopolymerization initiator, a polymerizable compound, and an epoxy compound.... Agent: Solaris Intellectual Property Group, PLLC
20100239966 - Coating dispersion for optically suitable and conductive anti-curl back coating layer: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to an improved electrostatographic imaging member incorporating a carbon nano tube dispersion into a high molecular weight polycarbonate and an anti-static... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100239967 - Overcoat layer comprising metal oxides: The presently disclosed embodiments are directed generally to an improved electrostatographic imaging member in which the overcoat layer is inorganic and based on the incorporation of metal oxides, such as aluminum oxide, in specific amounts. The imaging members having such an overcoat layer exhibit improved wear resistance and life extension... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100239968 - Polymer coated toner pigments for electrophotographic printing: Toner compositions for electrophotographic printing are disclosed, along with methods for making such toners, and printing systems utilizing them. The disclosed process imparts qualities to the toner making it more efficiently and effectively incorporated into printed images.... Agent: Hewlett-packard Company Intellectual Property Administration
20100239969 - Bio-toner containing bio-resin, method for making the same, and method for printing with bio-toner containing bio-resin: A bio-toner for use in electrophotographic image forming that contains a bio-resin component that is at least partially derived from a renewable resource is provided. A method of making the bio-toner that contains a bio-resin component for use in electrophotographic image forming is also provided. A method for electrophotographic image... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100239970 - Polyester resin and toner including the same: A toner for an electrophotographic image forming process or an electrostatic printing process, and a polyester resin for the toner are disclosed. The polyester resin comprises: acid components including 70 to 96 mol % of aromatic dibasic acid component, 3 to 20 mol % of cycloaliphatic dibasic acid component, and... Agent: Blakely Sokoloff Taylor & Zafman LLP
20100239971 - Toner for electrophotography and process for producing the same: A toner for electrophotography includes toner particles containing at least a binder resin and a colorant, to which strontium titanate and hydrophobic silica as external additives are admixed, wherein the strontium titanate has a BET specific surface area of 20-50 m2/g and contains particles in a rectangular parallelepiped shape and... Agent: Jordan And Hamburg LLP
20100239972 - Toner using resin having active hydrogen-containing group and method of preparing the same: Provided are a toner using a resin having an active hydrogen-containing group, and a method of preparing the toner. The toner using a resin having an active hydrogen-containing group includes a binder resin (A), a cross-linked resin including a THF insoluble content of 99-100 weight %, a colorant, and at... Agent: Nixon Peabody LLP
20100239973 - Toner having polyester resin: Embodiments include a toner having a polyester resin derived from a terephthalic material, 2,2-ethyl-butyl-1,3-propanediol and bis-(4-hydroxycyclohexyl)-dimethylmethane, a wax, and an optional colorant.... Agent: Xerox Corporation (cdfs)
20100239974 - Toner and method of manufacturing toner: A toner containing a mother toner particle containing at least two kinds of resins having a polyester skeleton, and a coloring agent, and a releasing agent, wherein the mother toner particle has a core and a shell layer thereon, and no peak that derives from magnesium, calcium, or aluminum in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100239975 - Carrier for use in developer developing electrostatic image, developer using the carrier, and image forming method and apparatus and process cartridge using the developer: The carrier includes a particulate core material having magnetism; and a resin layer located on the surface of the particulate core material. The resin layer is prepared by forming a layer including a copolymer, which includes a unit (A) having a specific acrylic siloxane structure, a unit (B) having a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100239979 - Graded arc for high na and immersion lithography: A method of forming a device using a graded anti-reflective coating is provided. One or more amorphous carbon layers are formed on a substrate. An anti-reflective coating (ARC) is formed on the one or more amorphous carbon layers wherein the ARC layer has an absorption coefficient that varies across the... Agent: Patterson & Sheridan, LLP - - Appm/tx
20100239976 - Lithographic imaging with printing members having metal imaging bilayers: Printing members include very thin metal imaging bilayers that combine to trap and utilize imaging radiation and, due to their minimal thicknesses, ablate easily. The bilayer may include a first (bottommost) metal layer having a high extinction coefficient in the imaging wavelength range (e.g., 600-1200 nm) and, thereover, a second... Agent: Goodwin Procter LLP Patent Administrator
20100239978 - Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition: A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.... Agent: Sughrue-265550
20100239982 - Photoresist composition with high etching resistance: A resist composition includes a first polymer including a repeating unit having the following Chemical Formula 1 and a repeating unit having the following Chemical Formula 2, a second polymer including a repeating unit having the following Chemical Formula 3, a repeating unit having the following Chemical Formula 4, and... Agent: Lee & Morse, P.C.
20100239981 - Polymer and positive-tone radiation-sensitive resin composition: wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms,... Agent: Ditthavong Mori & Steiner, P.C.
20100239983 - Methods of forming patterns on substrates: A method of forming a pattern on a substrate includes forming spaced first features over a substrate. The spaced first features have opposing lateral sidewalls. Material is formed onto the opposing lateral sidewalls of the spaced first features. That portion of such material which is received against each of the... Agent: Wells St. John P.s.
20100239985 - Method for using compositions containing fluorocarbinols in lithographic processes: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing... Agent: Canaanlaw, P.C.
20100239984 - Pattern forming method: A pattern forming method, includes: (i) a step of applying a resist composition whose solubility in a positive tone developer increases and solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation, the resist composition containing a resin capable of increasing a polarity by the... Agent: Sughrue-265550
20100239986 - Substrate processing apparatus: The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure... Agent: Townsend And Townsend And Crew, LLP09/16/2010 > patent applications in patent subcategories. class, title,number
20100233590 - Method for manufacturing photo mask using fluorescence layer: A method for fabricating a photo mask using a fluorescence layer, comprising: forming a fluorescence layer on a frame region of a light-transmitting substrate that defines a main cell region and the frame region; forming a phase-shift layer and a light-shielding layer on the light-transmitting substrate and the fluorescence layer;... Agent: Marshall, Gerstein & Borun LLP
20100233589 - Method for manufacturing photomask using self-assembled molecule layer: A method for fabricating a photomask using a self-assembled molecule layer, comprising: forming, on a transparent substrate, a stacked structure of a phase shift pattern and a light shielding pattern over the phase shift pattern, the stacked structure exposing a portion of a surface of the transparent substrate; exposing the... Agent: Marshall, Gerstein & Borun LLP
20100233588 - Phase shift mask with enhanced resolution and method for fabricating the same: A method for fabricating a phase shift mask includes obtaining a layout of a mask region which sets up alight transmitting region; obtaining a layout of a phase shift region placed in a border portion of the mask region by disposing a shadow core region for light-shielding in a middle... Agent: Marshall, Gerstein & Borun LLP
20100233592 - Photomask and method of forming photomask: A photomask includes a resolution pattern, and a non-resolution pattern. The non-resolution pattern has a center portion and first and second side portions. The first and second side portions are each greater in distance from the resolution pattern than the center portion.... Agent: Mcdermott Will & Emery LLP
20100233591 - Process for producing pellicle, and pellicle: There is provided a process for producing a pellicle, the process including a step of irradiating a pellicle film comprising a fluorine resin with UV light having a wavelength of no greater than 220 nm. There is also provided a preferred step of irradiating the pellicle film with UV light... Agent: Kratz, Quintos & Hanson, LLP
20100233593 - Reflective photomask and method of fabricating the same: A reflective photomask comprises a photomask substrate, a photomask pattern, formed on an upper surface of the photomask substrate, at least one alignment mark, formed on the upper surface of the photomask substrate, for aligning the reflective photomask with an exposure apparatus, and at least one fiducial mark, formed on... Agent: F. Chau & Associates, LLC
20100233594 - System and method for quality assurance for reticles used in manufacturing of integrated circuits: System and method for quality assurance for reticles used in manufacturing of integrated circuits. According to an embodiment, the present invention provides a method for inspecting one or more blanks For example, the blanks are prepared to be used as reticles for manufacturing of integrated circuits. The method includes a... Agent: Townsend And Townsend And Crew, LLP
20100233595 - Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group... Agent: Sughrue Mion, PLLC
20100233596 - Thiourethane compound and photosensitive resin composition: e
20100233597 - Method for scheduling transient document erase cycle: A method of handling documents which can be imaged and erased comprises entry of a scheduled time which a device such as a multipurpose imager and eraser has a low probability of being used. At the scheduled time, erasure of transient documents to be erased is initiated. A transient document... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20100233600 - Level sensor arrangement for lithographic apparatus and device manufacturing method: A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100233599 - Lithographic apparatus and device manufacturing method: A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100233598 - Pattern correcting apparatus, mask-pattern forming method, and method of manufacturing semiconductor device: A mask-pattern correcting apparatus according to an embodiment of the present invention includes: a pattern-shape variable mask, transmittance or reflectance of which can be changed; a light-receiving element unit that detects an optical image of a mask pattern formed by light irradiated on the pattern-shape variable mask; and a control... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100233601 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor has at least an electroconductive substrate, and a photosensitive layer formed on or above the electroconductive substrate, wherein an outermost layer of the photoreceptor is a cured membrane of a composition containing at least one compound (a) having in a single molecule thereof a charge transporting skeleton... Agent: Oliff & Berridge, PLC
20100233602 - Electrophotographic photoconductor: An electrophotographic photoconductor including a conductive substrate, and a photosensitive layer formed on the conductive substrate, wherein the photosensitive layer contains at least a charge generation agent, a specific charge transfer agent and a specific antioxidant.... Agent: Cooper & Dunham, LLP
20100233604 - Electrostatic image developing toner, method for manufacturing electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image-forming method and image-forming apparatus: wherein T( 0.5 MPa) represents a temperature at which a viscosity of the block copolymer is 104 Pa·s when a pressure applied by a flow tester is 0.5 MPa; and T(30 MPa) represents a temperature at which a viscosity of the block copolymer is 104 Pa·s when a pressure applied... Agent: Oliff & Berridge, PLC
20100233605 - Toner for electrostatic charge image development, electrostatic charge image developer, toner cartridge, process cartridge and image forming device: A toner for electrostatic charge image development has toner mother particles including a release agent, a colorant, and a binder resin including a crystalline resin, and an external additive to the toner mother particles including at least metatitanic acid and at least one selected from the group consisting of silicon... Agent: Oliff & Berridge, PLC
20100233606 - Black toner formulation: A black toner formulation includes at least one non-black colorant selected from the group consisting of dyes, pigments, and combinations thereof. The black toner formulation has a total pigment loading of about 2 percent to less than or equal to about 9.5 percent by weight of total weight of the... Agent: Lexmark International, Inc. Intellectual Property Law Department
20100233609 - Toner, developer and image forming apparatus: The present invention relates to toner compositions containing: toner particles made of: binder resin; colorant; and a wax which is dispersed in the toner particles, where the toner composition satisfies relationship (2): B≦394−400A′ when 0.950<A′≦0.965 (2) where A′ represents an average circularity of the toner composition, B represents a content... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100233608 - Electrostatic image developing carrier, process of making the same, electrostatic image developer, process cartridge, image forming method, and image forming apparatus: An electrostatic image developing carrier includes a ferrite particle that contains from about 1.0% by weight to about 14.0% by weight of elemental magnesium, wherein an average distribution ratio D of the elemental magnesium in the ferrite particle is from about 1.1 to about 2.0, wherein the average distribution ratio... Agent: Oliff & Berridge, PLC
20100233607 - Toner for developing electrostatic images and process for producing the toner: A toner for developing electrostatic images which is obtained by melt mixing at least a binder resin and a coloring agent, forming a powder material by pulverizing the obtained mixture after cooling and removing rough particles and fine particles from the formed powder material by classification, wherein inorganic fine particles... Agent: Frishauf, Holtz, Goodman & Chick, PC
20100233611 - Toner and two-component developer: t
20100233613 - Carrier: A carrier which is capable of avoiding excess blocking of the carrier particles at the time of forming a covering layer and is excellent in durability, a developer containing the carrier, and a developer container containing the developer, as well as an image forming method and a process cartridge which... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100233614 - Liquid developer and image forming method: Provided is a liquid developer containing toner particles and an insulating liquid containing an epoxy modified fatty acid alkyl ester.... Agent: Workman Nydegger 1000 Eagle Gate Tower
20100233615 - Method of producing a carrier for electrophotography and method of producing a developer for electrophotography: A method of producing a carrier for electrophotography includes: covering a surface of a core particle with a coating layer including resin particles and a crosslinking resin in an uncrosslinked state present in spaces between the resin particles; and applying a mechanical impact from the outer surface of the coating... Agent: Oliff & Berridge, PLC
20100233620 - Copolymer and photoresist composition including the same: A resist copolymer includes a repeating unit having the following Chemical Formula 1, a repeating unit having the following Chemical Formula 2, and a repeating unit having the following Chemical Formula 3:... Agent: Lee & Morse, P.C.
20100233616 - Method for producing plastic lens: Disclosed is a method for producing a plastic lens having reflow heat resistance at 260° C., which is characterized in that a photosensitive resin composition containing a specific resin and a photopolymerization initiator is molded into a lens shape. The resin is obtained by mining one or more compounds (a)... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100233619 - Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation: wherein R3 and R4 are a hydrogen atom or an alkyl group, and R5 is an alkyl group, an aryl group, or an aralkyl group. R3 and R4, R3 and R5, or R4 and R5 may be bonded to each other to form a ring together with the carbon atom... Agent: Birch Stewart Kolasch & Birch
20100233617 - Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition: wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or... Agent: Sughrue-265550
20100233618 - Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same: Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the... Agent: Mckenna Long & Aldridge LLP
20100233621 - Photoacid generator and photoreactive composition: wherein R1c and R2c each independently represents an optionally substituted monocyclic carbon ring group, an optionally substituted condensed polycyclic carbon ring group or an optionally substituted monocyclic heterocyclic group, and R3c to R7c each independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, alkoxy group... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100233622 - Method for forming fine pattern in semiconductor device: Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to... Agent: Hyun Jong Park Park & Associates Intellectual Property Law LLC
20100233623 - Positive resist composition and method of forming resist pattern: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Q0 represents a single bond or a divalent linking group having a fluorine atom; and RX0 represents an acid dissociable, dissolution inhibiting group-containing group... Agent: Knobbe Martens Olson & Bear LLP
20100233624 - Positive resist composition and method of forming resist pattern: e
20100233626 - Positive resist composition and method of forming resist pattern: A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group,... Agent: Knobbe Martens Olson & Bear LLP
20100233625 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic... Agent: Knobbe Martens Olson & Bear LLP
20100233628 - Compound and chemically amplified positive resist composition: wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the... Agent: Birch Stewart Kolasch & Birch
20100233629 - Photosensitive compostion, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition: A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.... Agent: Sughrue-265550
20100233627 - Photosensitive resin composition, method for forming resist pattern, method for manufacturing printed wiring board, and method for producing substrate for plasma display panel: A photosensitive resin composition comprising (A) a binder polymer with a weight-average molecular weight of 35000 to 65000, (B) a photopolymerizable compound with an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein component (B) includes (B1) a photopolymerizable compound with one ethylenically unsaturated bond, (B2) a photopolymerizable compound with... Agent: Griffin & Szipl, PC
20100233630 - Method for manufacturing liquid discharge head: A method for manufacturing a liquid discharge head that includes a flow path wall member which forms a wall of a flow path communicating with a discharge port for discharging a liquid and a substrate which forms the flow path in contact with the flow path wall member includes providing... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100233631 - Recessed portion forming method, method for manufacturing pit-projection product, method for manufacturing light emitting element, and method for manufacturing optical element: A recessed portion forming method for forming a plurality of recessed portions in a thermally deformable heat mode recording material layer is provided, which method includes: a recessed portion forming step of applying condensed light emitted from an optical system including a light source, to the recording material layer to... Agent: Sughrue Mion, PLLC
20100233633 - Engineering boron-rich films for lithographic mask applications: Methods for processing a substrate with a boron rich film are provided. A patterned layer of boron rich material is deposited on a substrate and can be used as an etch stop. By varying the chemical composition, the selectivity and etch rate of the boron rich material can be optimized... Agent: Dergosits & Noah LLP
20100233632 - Silicon-containing film-forming composition, silicon-containing film, and pattern forming method: A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein... Agent: Ditthavong Mori & Steiner, P.C.
20100233637 - Developing apparatus, developing method, and storage medium: A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies... Agent: Burr & Brown
20100233636 - Measurement apparatus, exposure apparatus, and method of manufacturing device: A measurement apparatus comprises: a light source; a first optical system configured to reflect a certain component of a light beam emitted by the light source by a final surface thereof and transmit a remaining component of the light beam; a reflecting surface configured to reflect the remaining component; an... Agent: Rossi, Kimms & Mcdowell LLP.
20100233635 - Method of forming pattern and composition for forming of organic thin-film for use therein: A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate;... Agent: Ditthavong Mori & Steiner, P.C.
20100233634 - Processing liquid for resist substrate and method of processing resist substrate using the same: The present invention provides a resist substrate treating solution and a method for pattern formation using that treating solution, and thereby problems such as foreign substances on the substrate surface, pattern collapse and pattern roughness can be easily solved at the same time. The treating solution comprises water and an... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.
20100233638 - Substrate treatment apparatus, substrate treatment method, coating and developing apparatus, coating and developing method, and storage medium: The substrate treatment apparatus includes a heating plate that heats the substrate prepared by coating a surface of the substrate with a resist and exposing the resist-coated substrate to light; a surface treatment liquid atomizing unit that atomizes a surface treatment liquid used to improve wettability of the substrate with... Agent: Burr & Brown09/09/2010 > patent applications in patent subcategories. class, title,number
20100227261 - Flare-measuring mask, flare-measuring method, and exposure method: A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter... Agent: Oliff & Berridge, PLC
20100227260 - Photomasks, methods of forming photomasks, and methods of photolithographically-patterning substrates: Some embodiments include methods of forming photomasks. A stack of at least three different materials is formed over a base. Regions of the stack are removed to leave a mask pattern over the base. The mask pattern includes a pair of spaced-apart adjacent segments of the stack. A liner is... Agent: Wells St. John P.s.
20100227262 - Method for manufacturing semiconductor device: A condition for adjusting contact angle between the resist film surface and the liquid is controlled so that the contact angle assumes a desired value, the condition including at least one selected from the group consisting of spin drying time for the resist film, resist temperature during the supplying, pressure... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100227263 - Position detector and exposure apparatus: A position detector includes a first planar encoder including a first encoder head unit mounted on a test object that is a movable member, and a first grating unit mounted on a fixed member, the first planar encoder being configured to detect a position of the test object in two... Agent: Rossi, Kimms & Mcdowell LLP.
20100227264 - Photoreceptor, method of manufacturing same, image formation method, image forming apparatus, and process cartridge: A photoreceptor including an electroconductive substrate, a photosensitive layer located overlying the electroconductive substrate, and a surface layer located overlying the photosensitive layer, the surface layer including a cross-linked material of a radical polymerizable monomer having at least 3 functional groups with no charge transport structure and a radical polymerizable... Agent: Cooper & Dunham, LLP
20100227265 - Electrophotographic toner: A colorless transparent toner including a binder resin and a layered inorganic mineral, wherein the layered inorganic mineral is an organic modified layered inorganic mineral, in which at least part of ions present between layers are modified with an organic ion.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100227266 - Toner for forming images, one-component developer, two-component developer, image forming method, image forming apparatus and process cartridge: A toner prepared by pulverization methods, including a binder resin; and a colorant, wherein the binder resin is prepared by melting and kneading a polyester resin having an unsaturated bond with a crosslinking reaction initiator diluted with a release agent, and the colorant is a press cake pigment after washed.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100227267 - Method for producing toner and toner: A method for producing a toner, containing: ultrasonically vibrating a liquid toner composition in which a toner material containing at least a binder resin and a colorant is dissolved or dispersed in a solvent; introducing the liquid toner composition to a liquid chamber, and ejecting the liquid toner composition as... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100227268 - Method of manufacturing electrostatic charge image developing toner: Provided is a method of manufacturing an electrostatic charge image developing toner exhibiting reduced variation in charging amount among manufacturing lots, which is capable of generating no fog, and acquiring high density print images. Disclosed is a method of manufacturing an electrostatic charge image developing toner, possessing the step of... Agent: Lucas & Mercanti, LLP
20100227272 - Highly functional multiphoton curable reactive species: A multiphoton curable photoreactive composition including hydantoin hexaacrylate and a photoinitiator system. In some embodiments, the multiphoton curable photoreactive composition consists essentially of hydantoin hexaacrylate and a photoinitiator system. Additionally, the applying a multiphoton curable photoreactive composition comprising hydantoin hexaacrylate and a photoinitiator system may be applied to a substrate... Agent: 3m Innovative Properties Company
20100227269 - Imageable elements with colorants: Both positive-working and negative-working imageable element can have a radiation-sensitive imageable layer that has at least one pigment colorant that does not change color when heated, and at least one dye that can change color when heated. The dye is soluble in the solvent or mixture of solvents used to... Agent: Amelia Buharin Patent Legal Staff
20100227271 - Method for making a lithographic printing plate: A method for making a lithographic printing plate is disclosed which comprises the steps of: (1) providing a heat-sensitive lithographic printing plate precursor comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating, (2) image-wise exposing said precursor with IR-radiation or... Agent: Leydig Voit & Mayer, Ltd
20100227270 - Reusable paper media with compatibility markings and printer with incompatible media sensor: A reusable image forming medium, including a substrate; an imaging layer coated on or impregnated into the substrate, wherein an irradiation of the imaging layer produces an image; and a signature material coated on or impregnated into the substrate or the imaging layer, the signature material being detectable by a... Agent: Oliff & Berridge, PLC.
20100227273 - Positive resist composition and patterning process: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of acenaphthene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure,... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100227274 - Positive resist composition and patterning process: A positive resist composition comprising as a base resin a polymer having carboxyl groups whose hydrogen is substituted by an acid labile group of fluorene structure exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal LER after exposure,... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100227276 - Method of manufacturing semiconductor device: In a method of manufacturing a semiconductor device, a protection film can be formed using a double exposure technology to increase a developer resistance of the protection film without increasing the thickness of the protection film for realizing fine patterning. The method comprises forming a protection film on a first... Agent: Brundidge & Stanger, P.C.
20100227278 - Manufacturing process of semiconductor device: A resist pattern thickening material has resin, a crosslinking agent and a compound having a cyclic structure, or resin having a cyclic structure at a part. A resist pattern has a surface layer on a resist pattern to be thickened with etching rate (nm/s) ratio of the resist pattern to... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100227277 - Movable body apparatus, exposure apparatus and device manufacturing method: In a liquid crystal exposure apparatus, base pads are respectively placed on two surface plates, and one step board is supported by the base pads. A device main body of an empty-weight cancelling device moves from above one of the surface plates to above the other by moving on the... Agent: Oliff & Berridge, PLC
20100227279 - Methods for producing codes for microparticles: Methods and apparatus are provided for forming a plurality of encoded microparticles with a printing process to define a code for identifying the microparticles. In some embodiments the printing process includes printing steps performed with photolithography.... Agent: Cooley Godward Kronish LLP Attn: Patent Group
20100227280 - Method of measuring a characteristic: During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100227281 - Methods of forming patterns: Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material... Agent: Wells St. John P.s.
20100227282 - Methods of patterning positive photoresist: A method of patterning positive photoresist includes providing positive photoresist over a substrate. An area of the positive photoresist is exposed to a pattern of activating radiation at a dose which is below the Dose To CD of the pattern with the positive photoresist. The area of the positive photoresist... Agent: Wells St. John P.s.09/02/2010 > patent applications in patent subcategories. class, title,number
20100221645 - Film having hologram pattern and container having hologram pattern: There is provided a film having hologram pattern and a container having hologram pattern which prevents the hologram pattern from disappearing by liquid droplets, sebum, and sweat being adhered to the hologram pattern, and in which, the hologram pattern can be checked visually, without selecting a state and a condition... Agent: Frishauf, Holtz, Goodman & Chick, PC
20100221646 - Holographic recording medium: In the above formula (1), Ar represents a substituted or unsubstituted group selected from benzothiophene group, naphthothiophene group, dibenzothiophene group, thienothiophene group, dithienobenzene group, benzothiazole group, naphthothiazole group, benzoisothiazole group, naphthoisothiazole group, phenothiazine group, phenoxathiin group, dithianaphthalene group, thianthrene group, thioxanthene group, and bithiophene group. In addition, n is an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100221647 - Pyrrole containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein at least one of the charge transport layer and the photogenerating layer contains a pyrrole.... Agent: Patent Documentation Center Xerox Corporation
20100221648 - Zinc thione photoconductors: A photoconductor that includes a supporting substrate, an optional ground plane layer, an optional hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the charge transport layer contains a zinc thione.... Agent: Patent Documentation Center Xerox Corporation
20100221649 - Boron containing hole blocking layer photoconductor: A photoconductor that includes a supporting substrate, a ground plane layer, a hole blocking layer, a photogenerating layer, and at least one charge transport layer, and where the hole blocking layer includes a boron containing compound.... Agent: Patent Documentation Center Xerox Corporation
20100221650 - Carbazole containing photogenerating photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and where the photogenerating layer contains a carbazole.... Agent: Patent Documentation Center Xerox Corporation
20100221651 - Epoxy carboxyl resin mixture hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate; an undercoat layer thereover wherein the undercoat layer contains a metal oxide, and a mixture of an epoxy resin and a carboxyl resin; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation
20100221652 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes a conductive substrate, and at least a photosensitive layer on the conductive substrate, a layer located at a surface of the photosensitive layer side of the electrophotographic photoreceptor contains fluorine containing resin particles and a fluoro graft polymer having a fluoroalkyl group having 1 to 7... Agent: Oliff & Berridge, PLC
20100221653 - Process for preparing stable photoresist compositions:
20100221654 - Pigment preparations based on c.i. pigment blue 15,6: The invention relates to novel fine-particle pigment preparations comprising fine-particle C.I. Pigment Blue 15:6 as a base pigment and pigment dispersants of formula (II) wherein CPC is a radical of a copper phthalocyanine, n is a number between 0.1 and 4, preferably between 0.2 and 2; m is number between... Agent: Clariant Corporation Intellectual Property Department
20100221655 - Resin particle: To provide resin particles which are excellent in electrostatic properties, thermal resistance storage stability, and thermal properties and have uniform particle diameter. The invention is the resin particles (D) having a structure formed by depositing resin particles (A) comprising a first resin (a) having an initial softening temperature of 40... Agent: Edwards Angell Palmer & Dodge LLP
20100221659 - Compound, salt, and radiation-sensitive resin composition: wherein R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents... Agent: Ditthavong Mori & Steiner, P.C.
20100221660 - Lithographic apparatus, device manufacturing method and a substrate: A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100221658 - Lithographic printing plate precursor and method of preparing lithographic printing plate: A lithographic printing plate precursor includes a support and one or more layers, one of the one or more layers is a photosensitive layer containing an initiator compound, a polymerizable compound and a binder polymer, and a layer being in contact with the support of the one or more layers... Agent: Sughrue-265550
20100221656 - Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process: wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine... Agent: Fitzpatrick Cella Harper & Scinto
20100221657 - Resist underlayer film forming composition and method of forming resist pattern using the same: There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer... Agent: Oliff & Berridge, PLC
20100221661 - Methods for producing photosensitive microparticles: Described are various methods of producing non-aqueous dispersions of photosensitive polymeric microparticles, comprising: (a) preparing one or more aqueous dispersions of a polymerizable component, at least one of which contains a photosensitive material and, wherein the polymerizable components comprise at least one hydrophilic functional group and/or at least one hydrophobic... Agent: Ppg Industries, Inc. Law Department - Intellectual Property
20100221662 - Heat-sensitive imaging element: wherein at least one of the Rd groups is a group which is transformed by a chemical reaction, induced by exposure to IR-radiation or heat, into a group which is a stronger electron-donor than the Rd; or wherein at least one of the Ra groups is a group which is... Agent: Agfa C/o Keating & Bennett, LLP
20100221663 - Light sensitive planographic printing plate material, and image formation method employing the same: The present invention provides a light sensitive planographic printing plate material which excels in printing durability and tone reproduction property in high resolution printing as in FM screening, and an image formation method employing the light sensitive planographic printing plate material. The light sensitive planographic printing plate material is characterized... Agent: Cantor Colburn, LLP
20100221664 - Radiation-sensitive composition: e
20100221665 - Manufacturing method of semiconductor device: A manufacturing method includes forming a stacked film including first/second/third layers on a substrate, forming a first resist pattern on the stacked film, forming a first film pattern by etching the first layer through the first resist pattern, removing the first resist pattern, partially covering the first film pattern with... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100221666 - Silsequioxane-titania hybrid polymers: The invention relates to silsesquioxane-titania hybrid polymers, wherein the titania domain size is less than about five nanometers. Such polymers are useful, for example, to form anti-reflection coatings in the fabrication of microelectronic devices.... Agent: The Dow Chemical Company
20100221667 - Catalyst for microelectromechanical systems microreactors: A microreactor comprising a silicon wafer, a multiplicity of microchannels in the silicon wafer, and a catalyst coating the microchannels. In one embodiment the catalyst coating the microchannels comprises a nanostructured material. In another embodiment the catalyst coating the microchannels comprises an aerogel. In another embodiment the catalyst coating the... Agent: Lawrence Livermore National Security, LLC
20100221668 - Resin composition for optical material, resin film for optical material, and optical waveguide: A resin composition for an optical material, which is excellent in heat resistance and transparency and is soluble in an aqueous alkali solution, a resin film for an optical material made of the resin composition, and an optical waveguide using the same are provided. The resin composition for an optical... Agent: Antonelli, Terry, Stout & Kraus, LLP
20100221669 - Method, program product and apparatus for performing double exposure lithography: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100221670 - Pattern formation method: A method for forming a finer hole or line pattern including the step of sequentially depositing a first mask layer (3) and a first ARL (4) on a first layer (2) and patterning the first ARL; the step of sequentially depositing a second mask layer (6) and a second ARL... Agent: Young & Thompson
20100221671 - Printhead integrated circuit attachment film: A method of fabricating a film used in attaching a printhead integrated circuit to an ink supply manifold is disclosed. An adhesive polymeric film having a protective liner is provided. Photoresist is then deposited onto the protective liner, and the photoresist is photopatterned. Ink supply holes are etched through the... Agent: Silverbrook Research Pty Ltd
20100221672 - Pattern forming method: A resist film of a positive type containing a photoacid generator is formed on a substrate. Then, pattern exposure is performed by selectively irradiating the resist film with exposure light. Thereafter, first heating is performed on the resist film subjected to the pattern exposure. After the heating, first development is... Agent: Mcdermott Will & Emery LLPPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
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