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Radiation imagery chemistry: process, composition, or product thereof August inventions list 08/10

20100216058 - Block terpolymer with confined crystallization: A polyester block terpolymer comprising an amorphous block comprising a polystyrene dicarboxylate; a crystallizable block comprising a polyethylene glycol; and an aliphatic diol block; wherein the amorphous block is a continuous phase and the crystallizable block is a dispersed phase, and wherein the dispersed phase is less than about 200... Agent: General Electric Company Global Research

20100216060 - Method and system for producing multiple images in a single image plane using diffraction: Methods create images viewable under different selected angles on optical storage devices and other photosensitive surfaces and optical storage devices with super-imposed images. Generally, a photosensitive surface is exposed with multiple diffraction patterns creating super-imposed images. These diffraction patterns create super-imposed images on the photosensitive surfaces, which can be read... Agent: Snell & Wilmer L.L.P. (main)

20100216059 - Polymer composites with confined crystallization: A polymer composite prepared by melt blending, comprising an amorphous polymer; and a crystallizable polymer; wherein upon cooling the polymer composite, the amorphous polymer forms a continuous phase and the crystallizable polymer forms a dispersed phase, and wherein the dispersed phase is less than 200 nanometers in size.... Agent: General Electric Company Global Research

20100216061 - Inverse lithography for high transmission attenuated phase shift mask design and creation: Various implementations of the invention provide for generation of a high transmission phase shift mask layout through inverse lithography techniques. In various implementations of the present invention, a set of mask data having a plurality of pixels is generated. The transmission value associated with each pixel may then be determined... Agent: Mentor Graphics Corp. Patent Group

20100216063 - Masks and methods of forming the same: Methods of forming masks. According to the methods, a target pattern is set. Generation of a side lobe caused by the target pattern is verified. A preliminary target pattern and a preliminary side lobe pattern are set, in the target pattern and a region where the side lobe is generated,... Agent: Harness, Dickey & Pierce, P.L.C

20100216062 - Reflective photomask and method of fabricating, reflective illumination system and method of process using the same: A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the... Agent: Lee & Morse, P.C.

20100216064 - Semiconductor-device manufacturing method, computer program product, and exposure-parameter creating method: A semiconductor-device manufacturing method includes: correcting a systematic component of process proximity effect, which occurs in a process other than exposure processing to thereby set a target pattern after exposure; adjusting an exposure parameter such that a difference between a dimension of the target pattern and a pattern dimension after... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100216065 - Electrophotographic photoreceptor, image forming apparatus, and process cartridge: An electrophotographic photoreceptor is provided with a conductive support; a photosensitive layer provided on the conductive support; and a surface layer provided on the photosensitive layer, wherein the surface layer contains a reaction product of surface-treated inorganic fine particles which are applied with a surface treatment with a metal oxide... Agent: Lucas & Mercanti, LLP

20100216066 - Transparent toner for electrostatic latent image developing, electrostatic latent image developer, toner cartridge, process cartridge, image forming apparatus and image forming method: A transparent toner for electrostatic latent image developing, including a binder resin and a release agent, the difference between Tm and Tc being from about 30° C. to about 50° C., wherein Tm is an endothermic peak temperature of the release agent determined in a temperature rising process and Tc... Agent: Oliff & Berridge, PLC

20100216067 - Lithographic printing plate developing compositions: A concentrated developer can be prepared with less than 60 weight % water and still remain in a single phase with little or no haze or precipitation. This developer concentrate also includes a water-soluble or water-miscible organic solvent, one or more alkyl ether carboxylic acid, coconut oil alkanolamine, coconut fatty... Agent: Amelia Buharin Patent Legal Staff

20100216068 - Toner, and developer, toner cartridge, image forming apparatus, process cartridge and image forming method using the same: A toner including a colorant, a thermoplastic resin (a) comprising an amorphous polyester resin having a main chain having a polyhydroxycarboxylic acid skeleton, and a thermoplastic resin (b) is provided. The toner is manufactured by a method including mixing the colorant with the thermoplastic resin (a) to prepare a preliminary... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100216069 - Method of preparing toner: Provided is a method of preparing a toner, the method including: preparing a solvent emulsion by stirring a medium including a polar medium, an organic solvent, and a surfactant; adding toner components including a resin and a pigment to the solvent emulsion; removing the organic solvent from the solvent emulsion... Agent: Nixon Peabody LLP

20100216070 - Photosensitive polyimides and methods of making the same: Photosensitive polyimide compositions include a photosensitive additive and a polymer comprising a repeating unit represented by the following formula (I): wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group, an aromatic group, a... Agent: Cantor Colburn, LLP

20100216073 - Photosensitive resin composition: Disclosed is a photosensitive resin composition suitable for use in a transflective liquid crystal display (LCD). The photosensitive resin composition uses, as an alkali-soluble binder resin, a blend of two kinds of binder resins. The first binder resin has a weight average molecular weight greater than or equal to 1,000... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20100216072 - Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition: A positive photosensitive composition ensuring wide exposure latitude and reduced line edge roughness not only in normal exposure (dry exposure) but also in immersion exposure, a pattern forming method using the positive photosensitive composition, and a novel resin contained in the positive photosensitive composition are provided, which are a positive... Agent: Sughrue-265550

20100216071 - Ultra low post exposure bake photoresist materials: Polymers comprising a first methacrylate monomer having a pendent spacer between the polymer backbone and an acid-liable acetal group, a second methacrylate monomer having a pendent group including a fluorinated alkyl group and a third methacrylate monomer having a pendent hydrocarbon group. Photoresist formulations include the polymers, a photoacid generator... Agent: Schmeiser, Olsen & Watts

20100216074 - Method for on-press developable lithographic plate utilizing light-blocking material: A method for applying a light-blocking material onto an imagewise exposed lithographic printing plate is disclosed. The exposed plate comprises on a substrate a photosensitive layer having hardened areas and non-hardened areas (for negative plate) or solubilized areas and non-solubilized areas (for positive plate). The non-hardened or solubilized areas of... Agent: Gary Ganghui Teng

20100216075 - Method and apparatus for generating periodic patterns by step-and-align interference lithography: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving... Agent: Birch Stewart Kolasch & Birch

20100216077 - Developing apparatus and developing method: A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to... Agent: Smith, Gambrell & Russell

20100216076 - Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby: A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a... Agent: Renner, Otto, Boisselle & Sklar, LLP

20100216078 - Developing method: Disclosed is a developing method that develops a substrate, which has a surface coated with a resist having been exposed, while the substrate is held horizontally and is rotating about a vertical axis. The method includes supplying a developing liquid from a discharge port of a developer nozzle onto the... Agent: Burr & Brown

20100209826 - Apparatus for processing photomask, methods of using the same, and methods of processing photomask: An apparatus and method for improving global flatness of a photomask is provided. The apparatus may include an adsorbing plate including vacuuming holes on one surface thereof, the adsorbing plate being adapted to adsorb the photomask thereon, a photomask supporting part including a plurality of supporting portions adapted to support... Agent: Lee & Morse, P.C.

20100209825 - Exposure mask and method for forming semiconductor device by using the same:

20100209827 - Novel sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same: (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high... Agent: Oliff & Berridge, PLC

20100209824 - Photomask: A photomask that includes an assistant pattern is provided. The photomask comprises a target pattern transcribed over a wafer by an exposing process, and an assistant pattern formed symmetrically with a main pattern of the target pattern based on the outer pattern of the target pattern, thereby minimizing the loss... Agent: Ampacc Law Group

20100209829 - Photomask manufacturing method and semiconductor device manufacturing method: This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100209828 - Reticle manufacturing method, surface shape measuring apparatus and signal processor: A reticle manufacturing method of the present invention comprises the steps of holding a reference mask blank by a reference chuck to measure a surface shape of the reference mask blank as a first surface shape, holding the reference mask blank by a reticle chuck of the exposure apparatus to... Agent: Rossi, Kimms & Mcdowell LLP.

20100209833 - Charged particle beam writing method and charged particle beam writing apparatus: Based on the pattern writing data input to an input unit 20, a control computer 19 divides a predetermined region on which writing is effected by an electron beam 54 into smaller regions each consisting of one or the same number of frames and determines the areal density of a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100209834 - Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure: In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a... Agent: Fujitsu Patent Center Fujitsu Management Services Of America, Inc.

20100209832 - Measurement apparatus, exposure apparatus, and device fabrication method: The present invention provides a measurement apparatus which measures a surface shape of a measurement target surface, the apparatus including an optical system configured to split light from a light source into measurement light and reference light, guide the measurement light onto the measurement target surface, and guide the reference... Agent: Rossi, Kimms & Mcdowell LLP.

20100209831 - Method for correcting a position error of lithography apparatus: A method for correcting a position error of a lithography apparatus comprises inputting position data of exposure pattern, irradiating laser light onto a position reference mask from a position measurement laser system, calculating actual position data of the laser light irradiated onto the position reference mask, and comparing the position... Agent: Lee & Morse, P.C.

20100209830 - Multi-pitch scatterometry targets: The invention can provide a method of processing a substrate using multi-pitch scatterometry targets (M-PSTs) for de-convolving lithographic process parameters during Single-Patterning (S-P), Double-Patterning (D-P) procedures, and Double-Exposure (D-E) procedures.... Agent: Tokyo Electron U.s. Holdings, Inc.

20100209835 - Transparent toner for electrostatic latent image development, method for producing the same, electrostatic latent image developer, toner cartridge, process cartridge, and image forming apparatus: The invention provides a transparent toner for electrostatic latent image development, containing a polyester resin and a release agent, the difference between an endothermic peak Tm of the release agent in a temperature increasing process and an exothermic peak Tc of the release agent in a temperature decreasing process when... Agent: Oliff & Berridge, PLC

20100209836 - Color toner for electrophotography: A color toner for electrophotography comprises, at least, a binder resin, a colorant and an antistatic composition. The antistatic composition comprises as the main components: (A) at least one member selected from a compound containing an ether linkage(s) and/or ester linkage(s) and a (co)polymer containing an ether linkage(s) and/or ester... Agent: Jordan And Hamburg LLP

20100209837 - Binder resin for color toners and color toner using the same: Provided is a binder resin for color toners which comprises at least a carboxyl group-containing vinyl resin (C), a glycidyl group-containing vinyl resin (E) and a reaction product thereof, wherein the storage modulus G′ at 160 degrees centigrade is not less than 20 and less than 800 Pa measured at... Agent: Buchanan, Ingersoll & Rooney PC

20100209838 - Toner and development agent: A toner including a binder resin, a coloring agent, and a releasing agent, the toner formed by dispersing a toner liquid material which is prepared by dispersing the binder resin, the prepolymer, an elongation agent and/or a cross-linking agent for the prepolymer, the coloring agent, and the releasing agent in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100209839 - Developing agent and method for producing the same: A method for producing a developing agent including preparing a dispersion liquid containing first fine particles containing a binder resin and second fine particles containing a color developable compound, a color coupler, and a color eraser, and aggregating the first and second fine particles in the dispersion liquid to form... Agent: Turocy & Watson, LLP

20100209840 - Developing agent and method for producing the same: m

20100209841 - Toner, toner production method, and image forming method: The present invention provides a method for producing a toner including preparing an emulsified dispersion which contains emulsion particles by emulsifying or dispersing an oil phase containing at least a pigment and any one of a binder resin and a binder resin precursor in an aqueous medium, and granulating toner... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100209842 - Electrophotographic photoreceptor and method of preparing the photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor: An electrophotographic photoreceptor, including at lest an electroconductive substrate and a photosensitive layer including at least a tri- or more functional radical polymerizing monomer having no charge transport structure and a monofunctional radical polymerizing compound having a charge transport structure, wherein the photosensitive layer includes radical polymerizing functional groups in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100209843 - Process for thick film circuit patterning: The invention relates to forming an electrically functional pattern on a substrate. More specifically, the invention relates to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100209845 - Dispersion composition, photosensitive resin composition for light-shielding color filter, light-shielding color filter, method of producing the same, and solid-state image sensor having the color filter: A method of producing a dispersion composition containing titanium black, a solvent and a dispersant including at least a first dispersant and a second dispersant, and the method includes dispersing a mixed liquid containing the titanium black, the first dispersant and the solvent, and adding the second dispersant to the... Agent: Solaris Intellectual Property Group, PLLC

20100209844 - Method and apparatus for preparing a printing form using vibrational energy: This invention pertains to a method and apparatus for preparing a relief printing form from a photosensitive element that includes a photopolymerizable composition layer having an exterior surface and capable of being partially liquefied. The method includes the steps of (a) heating the exterior surface of the photopolymerizable composition layer... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100209846 - Negative-working imageable elements: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a λmax in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation sensitive... Agent: Amelia Buharin Patent Legal Staff

20100209847 - Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer: Without the use of a third monomer, no copolymer practicable as a base polymer for a radiation-sensitive resin composition has been obtained by copolymerizing two ingredients, i.e., a carboxylated monomer and an epoxidized monomer. A carboxylated monomer is reacted with a specific nonpolymerizable compound, and this reaction mixture is then... Agent: Knobbe Martens Olson & Bear LLP

20100209849 - Pattern forming process and resist-modifying composition: A patterning process includes (1) coating and baking a first positive resist composition to form a first resist film, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) applying a resist-modifying composition to the first resist pattern and heating to modify the first resist pattern, (3)... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100209848 - Positive resist composition, method of forming resist pattern, and polymeric compound: A polymeric compound (A1) includes a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) represented by general formula (a0-2), and a structural unit (a1-0-1) represented by general formula (a1-0-1), wherein relative to the combined total of all the structural units, the proportion of the structural unit... Agent: Knobbe Martens Olson & Bear LLP

20100209850 - Pattern forming method: A first resist film is formed on a substrate, and first pattern exposure is performed such that the first resist film is irradiated with exposure light through a first mask. Then, the first resist film is developed, thereby forming a first resist pattern out of the first resist film. Subsequently,... Agent: Mcdermott Will & Emery LLP

20100209851 - Method of making a lithographic printing plate: A method of making a lithographic printing plate comprising the steps of: a) providing a lithographic printing plate precursor comprising a support having a hydrophilic surface or which is provided with a hydrophilic layer, and a coating provided thereon, said coating comprising (i) a contiguous photopolymerisable layer having a photopolymerisable... Agent: Leydig Voit & Mayer, Ltd

20100209852 - Track nozzle system for semiconductor fabrication: The present disclosure provides a method for fabricating a semiconductor device using a track pipeline system. The method includes storing a plurality of chemicals in a plurality of storage units of the system, wherein each storage unit is operable to store one of the chemicals, mixing the chemicals into a... Agent: Haynes And Boone, LLPIPSection

20100209853 - Method for selectively adjusting local resist pattern dimension with chemical treatment: A method forms a first patterned mask (comprising rectangular features and/or rounded openings) on a planar surface and forms a second patterned mask on the first patterned mask and the planar surface. The second patterned mask covers protected portions of the first patterned mask and the second patterned mask reveals... Agent: Frederick W. Gibb, Iii Gibb Intellectual Property Law Firm, LLC

20100209854 - Method for producing an electro-optical printed circuit board with optical waveguide structures: An electro-optical printed circuit board contains electrical conductor tracks on the one hand and optical waveguide structures on the other hand. The optical waveguide structures comprise a bottom layer, a core layer and a cladding layer. Visible areas are applied to the printed circuit board, and the core layer is... Agent: Nixon Peabody LLP

20100209856 - Lithographic apparatus and device manufacturing method for writing a digital image: A device manufacturing method is provided. The method includes generating a first patterned beam, projecting the first patterned beam onto a substrate to form a first plurality of spot exposures on the substrate, scanning the substrate in a direction while projecting the first patterned beam, generating a second patterned beam,... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100209855 - Method and apparatus for manufacturing semiconductor device and resist material: Disclosed is a method for manufacturing semiconductor devices including steps of: forming on a wafer W a resist film 102 of a developer-repellent material, which has a contact angle of, e.g., 65 degrees or more with a developer; exposing the resist film 102 with a desired pattern of light; oxidizing... Agent: Mcdermott Will & Emery LLP

20100209857 - Lithography process for the continuous direct writing of an image: According to the invention, the position of the beam is displaced by undergoing a continuous movement relative to the surface of the support, and the beam is switched on or off according to the feature to be written into the support. The feature is such that the smallest width of... Agent: Lariviere, Grubman & Payne, LLP

20100203429 - Volume phase hologram recording material and optical information recording medium using the same: Disclosed are a volume phase hologram recording material having high sensitivity, high contrast, and excellent multiple recording and record holding properties and a volume phase hologram recording medium using the same. The volume phase hologram recording material comprises mainly a polymer matrix (a), a radically photopolymerizable compound (b), and a... Agent: Birch Stewart Kolasch & Birch

20100203431 - Beam-induced etching: A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chromium materials on lithography masks. In one embodiment, a polar compound, such... Agent: Meyertons, Hood, Kivlin, Kowert & Goetzel, P.C.

20100203432 - Exposure mask and method for manufacturing same and method for manufacturing semiconductor device: An exposure mask includes: an insulative substrate; a light reflecting film provided on the substrate; a light absorbing film provided on the light reflecting film and forming a pattern in a center region on the substrate; and an interconnect provided on the substrate, the light reflecting film and the light... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100203430 - Methods for performing model-based lithography guided layout design: Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window.... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100203433 - Manufacturing method for a semiconductor device: In a manufacturing method for divisionally exposing a wafer, a focus correction processing is performed after a shot is moved to a position where the focus correction processing for all foci is enabled when the shot is at a wafer outer periphery, and a portion overlapped with an adjacent exposure... Agent: Bruce L. Adams, Esq Adams & Wilks

20100203434 - Substrate treatment method and substrate treatment system: After a cassette is mounted on a cassette mounting part, a control unit instructs a substrate treatment apparatus to start treatment on substrates in the cassette. Thereafter, the control unit indicates, to the substrate treatment apparatus, a cassette on the cassette mounting part to which a substrate is transferred at... Agent: Posz Law Group, PLC

20100203435 - Electrophotographic photoreceptor, and process cartridge and image forming apparatus using the same: Disclosed is an electrophotographic photoreceptor including: an electroconductive substrate; a photosensitive layer arranged on or above the electroconductive substrate; and a surface layer arranged on or above the photosensitive layer, and containing about 90% or more by atom of gallium (Ga), oxygen (O) and hydrogen (H), and having an atomic... Agent: Oliff & Berridge, PLC

20100203436 - Photoconductor system for electrophotographic device: An electrophotographic photoconductor system for use in an electrophotographic device and method of using the same. The electrophotoconductor system comprises an electroconductive support, a charge generation layer disposed on the electroconductive support, and a charge transport layer disposed on the charge generation layer. The charge generation layer includes a photosensitive... Agent: Lexmark International, Inc. Intellectual Property Law Department

20100203437 - Electrophotographic toner, invisible electrophotographic toner, electrophotographic developer, toner cartridge, process cartridge, and image formation apparatus: The invention provides an electrophotographic toner containing at least a binder resin and an infrared absorber, the infrared absorber comprising a perimidine-squarylium dye represented by the following Formula (1). The invention further provides an invisible electrophotographic toner containing at least a binder resin and an infrared absorber, the infrared absorber... Agent: Oliff & Berridge, PLC

20100203438 - Two-component developer, replenishing developer, and image-forming method: A two-component developer containing a yellow toner and a magnetic carrier, wherein the yellow toner has the characteristics: (i) when the concentration of the yellow toner in a solution of the yellow toner in chloroform is represented by Cy (mg/ml) and the absorbance of the solution at a wavelength of... Agent: Fitzpatrick Cella Harper & Scinto

20100203440 - Toner for electrostatic image development: A toner for electrostatic image development containing a resin binder, a negatively chargeable charge control agent, and a positively chargeable charge control agent, wherein the resin binder contains at least one polyester, wherein a carboxylic acid component of the polyester contains isophthalic acid and/or an ester thereof and fumaric acid... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100203439 - Toner compositions and processes: Environmentally friendly toner particles are provided which may, in embodiments, include a bio-based amorphous polyester resin, optionally in combination with another amorphous resin and/or a crystalline resin. Toner particles may, in embodiments, have a core-shell configuration, with the shell formed of the bio-based amorphous polyester resin, the amorphous polyester resin,... Agent: Xerox Corporation (cdfs)

20100203441 - Electrostatic image developing toner, electrostatic image developer, image forming method, and image forming apparatus: An electrostatic image developing toner includes toner mother particles that contain a binder resin, a coloring agent, and a release agent; and an external additive that contains a zinc-containing particles, wherein the number of free zinc-containing particles in all toner particles is from about by number to about 1.0% by... Agent: Oliff & Berridge, PLC

20100203442 - Manufacturing method of magenta toner for developing electrostatic image and toner: Disclosed is a manufacturing method of a magenta toner including the steps of dispersing an oil phase containing a radical polymerizable monomer for forming the binder resin and the colorant in an aqueous medium to form dispersion liquid in which the oil phase is dispersed in a form of droplets... Agent: Lucas & Mercanti, LLP

20100203443 - Electrostatic image developing toner, electrostatic image developer, image forming method and image forming apparatus: An electrostatic image developing toner includes a toner mother particle that contains a binder resin and a releasing agent; and an external additive that contains a zinc compound particle and a silica particle, wherein the zinc compound particle has a number average particle diameter of from about 2.0 μm to... Agent: Oliff & Berridge, PLC

20100203446 - Chemically amplified photoresist composition and method for forming pattern: Wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents a single bond or —[CH2]k—, a —CH2— contained in the —[CH2]k— may be replaced by —O— or —CO, and a hydrogen atom contained in the —[CH2]k— may be replaced by a C1... Agent: Birch Stewart Kolasch & Birch

20100203445 - Negative resist composition and resist pattern forming method using the same: An object of the present invention is to solve the technical task of enhancing the performance in micro-photofabrication using far ultraviolet light, particularly ArF excimer laser at a wavelength of 193 nm, and more specifically, provide a negative resist composition hardly allowing occurrence of pattern collapse and exhibiting good resolution... Agent: Sughrue-265550

20100203444 - Photoresist composition and patterning method thereof: Disclosed is a resist composition which has desirable physical properties such as sensitivity, resolution, residual film ratio and coating property, and forms a pattern having the desirable profile and depth of focus due to excellent light transmissivity during a semiconductor process and a flat panel display process using a short... Agent: Baker & Hostetler LLP

20100203447 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or... Agent: Ditthavong Mori & Steiner, P.C.

20100203448 - Method for manufacturing printing plate and printing plate-forming photocurable liquid for manufacturing: A method for manufacturing a printing plate includes applying a printing plate-forming photocurable liquid containing an epoxy-modified fatty acid ester and/or an acrylic-modified fatty acid ester and a photopolymerization initiator onto a printing original plate to form an uncured coating, selectively irradiating the uncured coating with UV light to cure... Agent: Workman Nydegger 1000 Eagle Gate Tower

20100203449 - Method of fabricating thin film transistor substrate and negative photoresist composition used therein: A method of fabricating a thin film transistor substrate and a negative photoresist composition used therein are provided, which can reduce pattern inferiority. The method of fabricating a thin film transistor substrate includes forming a conductive film composed of a conductive material on a substrate, forming an etch pattern composed... Agent: Innovation Counsel LLP

20100203450 - Photoresist compositions and methods of use: A photoresist composition comprises a polymer capable of radiation induced main chain scission and acid-catalyzed deprotection, wherein the polymer is derived by free radical polymerization of two or more monomers, each having an alpha-substituent on a polymerizable vinyl group; and a photochemical acid generator.... Agent: Cantor Colburn, LLP - IBM Arc Division

20100203451 - Positive resist composition and pattern forming method using the same: Provided is a positive resist composition using a resin having, in the polymer main chain, a specific acid decomposable structure and further having, in the side chain thereof, several specific acid decomposable groups, satisfactory in an exposure latitude, a focus latitude, and pattern collapse prevention at a high level, and... Agent: Sughrue-265550

20100203452 - Radiation-sensitive composition: wherein R1 is a methyl group, R2 is a linear or branched alkyl group having 1 to 12 carbon atoms, and R3 is a linear or branched alkyl group having 1 to 4 carbon atoms, and n is an integer from 1 to 5. The composition is useful as a... Agent: Ditthavong Mori & Steiner, P.C.

20100203454 - Enhanced transparent conductive oxides: A method of engineering of enhanced transparent conducting oxides by incorporating discrete metallic particles and structures, nonmetallic, organic and inorganic metamaterials or nanostructures in order to manipulate optical, thermal, electronic or electrical energy, properties or effects. A method of using transparent conducting oxides (TCO) incorporating discrete metallic particles and structures,... Agent: Matter, Inc.

20100203453 - Method for producing conductive film: A conductive film producing method includes a metallic silver forming step of exposing and developing a photosensitive material having a 95-μm-thick long support and thereon a silver salt-containing emulsion layer, thereby forming a metallic silver portion to prepare a conductive film precursor, and a smoothing treatment step of subjecting the... Agent: Young & Thompson

20100203455 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine: An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece... Agent: Oliff & Berridge, PLC

20100203456 - Method of forming resist pattern and method of manufacturing semiconductor device: The present invention improves the OPE characteristic generated by the difference between sparse and dense mask patterns and promotes fidelity in the design of the pattern. Because of this, the present invention includes a step of forming a resist having an acid dissociative dissolution suppression group on a substrate, a... Agent: Mcdermott Will & Emery LLP

20100203457 - Patterning process: A pattern is formed by coating a chemically amplified positive resist composition comprising a resin comprising acid labile group-containing recurring units and a photoacid generator onto a substrate, drying to form a resist film, exposing the resist film to high-energy radiation through a phase shift mask including a lattice-like first... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100203458 - Method for developing a printing plate precursor: A method for developing a printing plate precursor comprising the step of immersing the precursor in an aqueous alkaline developing solution comprising a (co) polymer comprising a monomeric unit which is represented by the following formula (I): wherein L is a linking group; R1, R2 and R3 independently represent hydrogen... Agent: Leydig Voit & Mayer, Ltd

20100196805 - Mask and method to pattern chromeless phase lithography contact hole: A method of making a mask is disclosed. The method includes providing a first and a second mask layers and disposing a first phase shift region on the first mask layer. A second phase shift region is disposed on the second mask layer, wherein the first and second phase shift... Agent: HorizonIPPte Ltd

20100196804 - Mask inspection apparatus and image creation method: Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission of the electron beams, from the sample with patterns formed thereon; image processing unit for generating image data for the patterns... Agent: Muramatsu & Associates

20100196803 - Methods for cell boundary isolation in double patterning design: A method of designing a double patterning mask set for a layout of a chip includes designing standard cells. In each of the standard cells, all left-boundary patterns are assigned with one of a first indicator and a second indicator, and all right-boundary patterns are assigned with an additional one... Agent: Slater & Matsil, L.L.P.

20100196807 - Prevention of photoresist scumming: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer... Agent: Knobbe Martens Olson & Bear LLP

20100196806 - Structures and methods for low-k or ultra low-k interlayer dielectric pattern transfer: The present invention relates to improved methods and structures for forming interconnect patterns in low-k or ultra low-k (i.e., having a dielectric constant ranging from about 1.5 to about 3.5) interlevel dielectric (ILD) materials. Specifically, reduced lithographic critical dimensions (CDs) (i.e., in comparison with target CDs) are initially used for... Agent: Scully, Scott, Murphy & Presser, P.C.

20100196808 - Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device therewith: An objective of the present invention is to achieve both prevention of scum generation in an open area and improvement in sensitivity in patterning process of the positive photosensitive resin composition. This objective can be achieved by a positive photosensitive resin composition comprising an alkali-soluble resin (A) containing an ingredient... Agent: Smith, Gambrell & Russell

20100196809 - Semiconductor device fabrication method and semiconductor device: A resist pattern (5) is formed in a dimension of a limitation of an exposure resolution over a hard mask material film (4) over a work film (3). The material film (4) is processed using the resist pattern (5) as a mask. A hard mask pattern (6) is thereby formed.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100196810 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: An electrophotographic photoreceptor, includes: a conductive support; and a photosensitive layer provided on or above the conductive support, the photosensitive layer including an outermost surface layer at the farthest location from the conductive support, wherein the outermost surface layer contains: coated insulating inorganic particles obtained by subjecting insulating inorganic particles... Agent: Oliff & Berridge, PLC

20100196811 - Highly disperse metal oxides having a high positive surface charge: Metal oxides are modified by aminohydrocarbyl-substituted monoalkyltrisiloxy groups in a defined percentage of T1 and T2 groups relative to total T groups wherein the T groups denote connectivity of siloxy bonds to the metal oxide have a high positive triboelectric chargeability, the triboelectric charge being stable even in conditions of... Agent: Brooks Kushman P.C.

20100196816 - Pigment preparations based on dioxazines: The invention relates to a pigment preparation characterized by a content of a) a dioxazine compound of Formula (I) as the basic pigment; and b) a dioxazine compound of the general Formula (II) as a pigment dispersing agent Q-[Y—X]m (II), wherein Q represents an m-valent group of the basic pigment... Agent: Clariant Corporation Intellectual Property Department

20100196813 - Electrophotographic toner and method of preparing the same: An electrophotographic toner including a latex, a coloring agent, and a release agent, wherein a difference between an average circularity of toner having a particle size of D16p or less (S16) and an average circularity of toner having a particle size of D50p or less (S50) is about 0.01 or... Agent: Stanzione & Kim, LLP

20100196812 - Resin for toner and toner composition:

20100196814 - Toner usable with electrophotography and method of preparing the same: A toner usable with electrophotography includes an iron (Fe) content in the toner is in a range of about 1.0×102 ppm to about 1.0×104 ppm and a circle equivalent diameter of a sectional area of an Fe agglomerating agent is in a range of about 1.0 nm to about 2.0×102... Agent: Stanzione & Kim, LLP

20100196815 - Electrostatic charge image developing toner: Electrostatic charge image developing toner Electrostatic charge image developing toner containing external additives comprising pyrogenically prepared surface modified silicon-dioxide-titanium mixed oxides.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100196817 - Polyester resin for electrostatic image developing toner and manufacturing method of the same, electrostatic image developing toner, electrostatic image developer and image forming apparatus: A polyester resin for electrostatic image developing toner includes: two or more polyester blocks, and the polyester resin satisfying the following conditions (A) to (C): (A) an ester concentration of the polyester resin is about 0.01 or more and less than about 0.1; (B) a weight average molecular weight of... Agent: Oliff & Berridge, PLC

20100196818 - Carrier core material and carrier for electrophotographic developer and process for producing the same, and electrophotographic developer using the carrier: Employment of a carrier core material for an electrophotographic developer containing 0.8 to 5% by weight of Mg, 0.1 to 1.5% by weight of Ti, 60 to 70% by weight of Fe and 0.2 to 2.5% by weight of Sr and having an amount of Sr dissolved with a pH4... Agent: Greenblum & Bernstein, P.L.C

20100196819 - Method for paper treatment: Provided herein is a surface treatment method of oil contaminated xerographic prints which increases the adhesion of the print to levels close to the values corresponding to the original uncontaminated paper. Subjecting the contaminated surface to corona treatment alone and in combination with ultraviolet (UV) radiation and ozone can change... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100196821 - Positive resist composition, method of forming resist pattern using the same, and polymeric compound: A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a... Agent: Knobbe Martens Olson & Bear LLP

20100196820 - Resist composition, method of forming resist pattern, novel compound and acid generator: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100196822 - Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film: A photosensitive insulating resin composition includes (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent.... Agent: Ditthavong Mori & Steiner, P.C.

20100196824 - Alkali-soluble resin and negative-type photosensitive resin composition comprising the same: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder... Agent: Mckenna Long & Aldridge LLP

20100196823 - Positive resist composition for immersion exposure and method of forming resist pattern: wherein R1′ and R2′ each independently represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group of 5 to 16 carbon... Agent: Knobbe Martens Olson & Bear LLP

20100196825 - Developable bottom antireflective coating compositions especially suitable for ion implant applications: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion... Agent: International Business Machines Corporation Dept. 18g

20100196826 - Photoinitiators for energy curing: Photopolymerisable systems for coatings or photolithography comprising radically photopolimerisable oligomers and/or monomers having ethylenically unsaturated groups and, as photoinitiator, at least one compound of formula (I).... Agent: Mossman, Kumar & Tyler PC

20100196827 - Method of making a flexographic printing sleeve forme: A method of making a flexographic printing sleeve forme includes the steps of forming a sleeve body by providing one or more at least partially cured uniform layers on a sleeve carrier; forming a relief image on the sleeve body by imagewise jetting a curable jetting fluid; and optionally overall... Agent: Agfa C/o Keating & Bennett, LLP

20100196828 - Method of manufacturing semiconductor device: A film which becomes an outgassing generation source under reduced pressure or in a vacuum is formed on a substrate. A resist film an outgassing generation amount per unit area of which is smaller than the film under reduced pressure or in a vacuum is formed on the film in... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100196829 - Semiconductor device fabrication method and semiconductor device: A resist pattern (5) is formed in a dimension of a limitation of an exposure resolution over a hard mask material film (4) over a work film (3). The material film (4) is processed using the resist pattern (5) as a mask. A hard mask pattern (6) is thereby formed.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100196830 - Method for obtaining microfluidic polymer structures: The present invention relates to a method for manufacturing high-resolution microfluidic structures by means of the modification of the sealing temperature and photolithography.... Agent: Merchant & Gould PC

20100196831 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a communication device configured to communicate with a host computer; an input-output device for an operator to execute a manual operation of the apparatus; a storage device; and a processor. The apparatus exposes a substrate to radiant energy in accordance with an on-line operation from the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100196832 - Exposure apparatus, exposing method, liquid immersion member and device fabricating method: An exposure apparatus comprises: an optical system, which has an emergent surface wherefrom exposure light emerges; a first surface, which is disposed at least partly around an optical path of the exposure light from the emergent surface; and a second surface, which is disposed at least partly around the first... Agent: Oliff & Berridge, PLC