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Radiation imagery chemistry: process, composition, or product thereof June invention type 06/10

20100159367 - A half tone mask having multi-half permeation part and a method of manufacturing the same: Disclosed are a half tone mask having a multi semi-transmission part and a manufacturing method thereof that can pattern a plurality of layers using one mask, by having at least two or more semi-transmission parts with light transmission that are different from each other. The half tone mask having a... Agent: Lrk Patent Law Firm

20100159370 - Method for forming microscopic structures on a substrate: s

20100159368 - Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film: The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] manufacture the phase-shift mask; and a method for designing the... Agent: Oliff & Berridge, PLC

20100159369 - Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit: There are provided a phase shift mask with a new structure. The phase shift mask provided includes: a substrate that is transparent to irradiation light, a shielding region formed on the substrate and in which a line pattern is formed, and a first transparent region and a second transparent region... Agent: Sughrue Mion, PLLC

20100159371 - Pigment dispersion solution, pigment photoresist and color filter: The present invention relates to a pigment dispersion solution, a pigment photoresist and a color filter. The pigment dispersion solution includes a colored pigment, a dispersant, a binder resin and a solvent, and further includes particles of white pigment. The pigment photoresist using the pigment dispersion solution of the present... Agent: J C Patents

20100159372 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface... Agent: Ostrolenk Faber Gerb & Soffen

20100159373 - Method of producing electronic circuit boards using electrophotography: The present invention provides a method producing printed electronic circuits using electrophotography.... Agent: Eastman Kodak Company Patent Legal Staff

20100159374 - Method for manufacturing toner, toner, developer, developing device, and image forming apparatus: A method for manufacturing a toner includes a pre-mixing step and a coating step. In the pre-mixing step, a secondary aggregate of the fine resin particles is disaggregated, while toner base particles and fine resin particles are mixed and stirred using a rotary stirring apparatus. Thus obtained disaggregated fine resin... Agent: Nixon & Vanderhye, PC

20100159375 - Toners containing polyhedral oligomeric silsesquioxanes: Disclosed is a toner composition comprising toner particles which comprise a resin, an optional colorant, and a polyhedral oligomeric silsesquioxane compound.... Agent: Marylou J. Lavoie, Esq. LLC

20100159376 - Toners containing polyhedral oligomeric silsesquioxanes: Disclosed is a toner composition comprising toner particles which comprise (a) a resin having chemically bonded thereto a polyhedral oligomeric silsesquioxane, (b) and an optional colorant.... Agent: Marylou J. Lavoie, Esq. LLC

20100159378 - Toner having improved charge characteristics: This invention provides a toner with improved charge and charge stability by suitable addition of extra particulate additives (EPA) such as aluminum cerium oxide and/or cerium zirconium oxide. The additives may be combined with toner in a conical mixer having selected temperature control. The invention also provides toner which may... Agent: Lexmark International, Inc. Intellectual Property Law Department

20100159377 - Toner surface treatment: The present invention is directed to surface treatment of toner particles and the toner developers used for the dry development of electrostatic charge images.... Agent: Andrew J. Anderson Patent Legal Staff

20100159379 - Toner for developing electrostatic latent image and method of preparing the same: Disclosed are a toner for developing an electrostatic latent image and a method of preparing the same. The toner may include latex, a pigment and a releasing agent. The lowest crossover temperature of the toner at which the storage modulus (G′) and the loss modulus (G″) of the toner are... Agent: Dla Piper LLP Us

20100159380 - Two-component developer, replenishing developer, and image-forming method: A two-component developer containing a cyan toner and a magnetic carrier, wherein the cyan toner has the characteristics: (i) when the concentration of the cyan toner in a solution of the cyan toner in chloroform is represented by Cc (mg/ml) and the absorbance of the solution at a wavelength of... Agent: Fitzpatrick Cella Harper & Scinto

20100159381 - Toner for developing electrostatic charge image, developer for developing an electrostatic charge image, toner cartridge, process cartridge, and image forming apparatus: A toner for developing an electrostatic charge image, the toner including a binder resin containing a crystalline polyester resin and a noncrystalline polyester resin, a colorant, a releasing agent, a ketone solvent, and an alcoholic solvent, the total concentration of the ketone solvent and the alcoholic solvent in the toner... Agent: Oliff & Berridge, PLC

20100159382 - Electrophotographic development carrier, two-component developer and image-forming method using the two-component developer: A carrier has an impedance Z having a frequency dependence, obtained by alternating current impedance measurement. When the frequency dependence is fitted by a fitting function, parameter α lies in a range of 0.70 to 0.90 in an electric field of 103 V/cm.... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100159383 - Method for producing color print: The method for manufacturing a color print by an electrophotographic image forming process employs forming toner images by non-contact developing electrostatic latent images on electrostatic latent image holding members in developing devices. For each color, cyan, magenta and yellow, there is a separate electrostatic latent image, a separate electrostatic latent... Agent: Lucas & Mercanti, LLP

20100159384 - Enhanced fusing for electrophotographic toners: An electrophotographic method for producing fused toner images on a receiver medium comprising the steps of: forming an electrostatic image pattern on an image forming member; developing the image pattern on the image forming member with fusible toner particles thereby forming a toner image thereon; transferring the toner image to... Agent: Andrew J. Anderson Patent Legal Staff

20100159385 - Method of preparing toner having controlled morphology: A method for the preparation of shaped polymeric particles, and in a particular embodiment shaped electrostatographic toner particles, of controlled morphology including the following steps. A selected solvent or solvent mixture is used to dissolve a polyester polymer material to form an organic phase, wherein the polyester material is formed... Agent: Andrew J. Anderson Patent Legal Staff

20100159386 - Method for producing developing agent: A method for producing a developing agent, wherein in the formation of aggregated particles, particles in a dispersion liquid have a volume average particle diameter of 2 μm or less when the pH of the dispersion liquid is 7, and also the pH of the dispersion liquid is from 3.0... Agent: Turocy & Watson, LLP

20100159387 - Toner process: The present disclosure provides processes for preparing toner particles, in which fewer coarse particles are generated. The process includes introducing a buffer solution during coalescence of the toner slurry. The amount of coarse particles in the resulting toner particles may, in embodiments, be reduced to less than about 5 percent... Agent: Xerox Corporation (cdfs)

20100159388 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising an image-recording layer, said image-recording layer being photopolymerizable upon exposure to light having a wavelength of from 300 to 500 nm and containing a mixture of sensitizers.... Agent: Leydig Voit & Mayer, Ltd

20100159391 - Photosensitive paste and process for production of pattern using the same: Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100159390 - Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved sensitivity and solvent resistance. These elements are useful for making lithographic printing plates and printed circuit boards. The composition includes a water-insoluble polymeric binder that has at least 20 mol % of recurring units comprising hydroxyaryl carboxylic... Agent: Eastman Kodak Company Patent Legal Staff

20100159389 - Resin, resist composition and method of forming resist pattern: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2... Agent: Knobbe Martens Olson & Bear LLP

20100159392 - Patterning process and resist composition: A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units and acid labile group-containing recurring units onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, applying an amine or oxazoline compound... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100159393 - Method of developing lithographic printing plate precursors: The invention relates to a method for making a lithographic printing plate which comprises imagewise exposing a lithographic printing plate precursor comprising one or more layers at least one of which is associated with one or more unsubstituted or substituted triarylmethane dyes and at least one of which layers is... Agent: Eastman Kodak Company Patent Legal Staff

20100159395 - Method of differentiation of unexposed and exposed planographic printing plates: The invention relates to a method of differentiating an unexposed planographic printing plate from an exposed planographic printing plate by means of making a planographic printing plate comprising a substrate having thereon one or more layers of aluminum oxide, and one or more layers of radiation-sensitive titanium dioxide coated thereon... Agent: Raymond L. Owens Patent Legal Staff

20100159394 - Method of making a planographic printing plate: The invention relates to a method of making a planographic printing plate comprising a substrate having thereon one or more layers of a radiation-sensitive metal oxide, sulfide or nitride and excluding an organic hydrophobic material or a binder within or above a radiation-sensitive layer, the method comprising depositing the one... Agent: Raymond L. Owens Patent Legal Staff

20100159397 - Method and system for forming a data recording medium: An embodiment of a method of forming a data recording medium includes the initial step of applying a resist material to a surface of a keepered medium. The embodiment of the method also includes the step of forming the resist material into a three-dimensional resist structure that corresponds to a... Agent: Hewlett-packard Company Intellectual Property Administration

20100159396 - Method for production of a medical marker:

20100159400 - Composition for removing a photoresist pattern and method of forming a metal pattern using the composition: A composition for removing a photoresist pattern includes about 5 percent by weight to about 20 percent by weight of an aminoethoxy ethanol, about 2 percent by weight to about 10 percent by weight of a polyalkylene oxide, about 10 percent by weight to about 30 percent by weight of... Agent: H.c. Park & Associates, PLC

20100159398 - Layered radiation-sensitive materials with varying sensitivity: A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and applying a second radiation-sensitive material to the first radiation-sensitive material. The first radiation-sensitive material has a first sensitivity. The second radiation-sensitive material has a second sensitivity different from the... Agent: Fraser Clemens Martin & Miller LLC

20100159399 - Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100159401 - Projection optical system, exposure system, and exposure method: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a... Agent: Oliff & Berridge, PLC

20100159402 - Method, program and system for processing substrate: The invention relates to a method for processing a substrate on which a target film is formed. The method includes forming a first film on the target layer; forming a second film on the first film, the second film being photosensitive; patterning the second film with a photolithography process; removing... Agent: Cantor Colburn, LLP

20100159403 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: In an exposure station, positional information of a stage holding a wafer is measured by a first fine movement stage position measurement system including a measurement arm, and in a measurement station, positional information of a stage holding a wafer is measured by a second fine movement stage position measurement... Agent: Oliff & Berridge, PLC

20100159405 - Method of manufacturing structure and method of manufacturing ink jet head: According to the fine pattern manufacturing method of the invention, the residue of a pattern which is obtained by pressing a mold is prevented from occurring, so that the structure can be more easily manufactured.... Agent: Fitzpatrick Cella Harper & Scinto

20100159404 - Patterning process: A pattern is formed by applying a first positive resist composition onto a substrate, heat treatment, exposure, heat treatment and development to form a first resist pattern; causing the first resist pattern to crosslink and cure by irradiation of high-energy radiation of 200-320 nm wavelength; further applying a second positive... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100151364 - Method for identifying and using process window signature patterns for lithography process control: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100151365 - Patterning methods and masks: Masks for patterning material layers of semiconductor devices, methods of patterning and methods of manufacturing semiconductor devices, and lithography systems are disclosed. A lithography mask includes a pattern of alternating lines and spaces, wherein the lines and spaces comprise different widths. When the lithography mask is used to pattern a... Agent: Slater & Matsil LLP

20100151366 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: According to an aspect of the invention, an electrophotographic photoreceptor including a conductive substrate and a photosensitive layer provided on a surface of the conductive substrate is provided. In the electrophotographic photoreceptor, an outermost layer of the photosensitive layer containing a crosslinked product formed from at least one charge transporting... Agent: Oliff & Berridge, PLC

20100151367 - Titanyl phthalocyanine with improved milling properties: The invention is directed to mixtures of PcTiO and a minor amount of another, substituted titanyl phthalocyanine and the synthesis of mixtures of PcTiO and a minor amount of another, substituted titanyl phthalocyanine. The invention is further directed towards milled pigment compositions of such mixtures, and to use of such... Agent: Andrew J. Anderson, Patent Legal Staff Eastman Kodak Company

20100151368 - Imaging member: Disclosed is an imaging member comprising a conductive substrate, a photogenerating layer comprising a photogenerating material in contact with the substrate, a first charge transport layer in contact with the photogenerating layer, the first charge transport layer comprising a charge transport material and a polymer containing carboxylic acid groups or... Agent: Marylou J. Lavoie, Esq. LLC

20100151369 - Imaging member: Disclosed is an imaging member comprising a conductive substrate, a photogenerating layer comprising a photogenerating material in contact with the substrate, and a charge transport layer in contact with the photogenerating layer, the charge transport layer comprising a charge transport material, a polymer containing carboxylic acid groups or groups capable... Agent: Marylou J. Lavoie, Esq. LLC

20100151370 - Imaging member: Disclosed is an imaging member comprising a conductive substrate, a photogenerating layer comprising a photogenerating material in contact with the substrate, a first charge transport layer in contact with the photogenerating layer, the first charge transport layer comprising a charge transport material and an organic phosphate or organic phosphonite antioxidant,... Agent: Marylou J. Lavoie, Esq. LLC

20100151371 - Imaging member: Disclosed is an imaging member comprising a conductive substrate, a photogenerating layer comprising a photogenerating material in contact with the substrate, and a charge transport layer in contact with the photogenerating layer, the charge transport layer comprising a charge transport material, an organic phosphite or organic phosphonite antioxidant, and a... Agent: Marylou J. Lavoie, Esq. LLC

20100151372 - Toner for developing electrostatic latent image and method of preparing the same: Provided are toner for developing an electrostatic latent image and a method of preparing the same. The toner has G′(60) of about 4.0×107 Pa to about 4.0×108 Pa, G′(60)/G′(80) of about 100 to about 500, and G′(100, 140) of about 3.0×103 Pa to about 1.5×105 Pa. The G′(60) and G′(80)... Agent: Dla Piper LLP Us

20100151373 - Toner particle having excellent charging characteristics,long term credibility and transferring property, method for producing the same and toner containing said toner particle: The invention relates to toner particles having excellent charging characteristics and transferring properties, a method for producing the same and toner including the same. More particularly, the invention relates to toner particles, a method for producing the same and toner including the same, in which a CCA highly compatible with... Agent: Mckenna Long & Aldridge LLP

20100151375 - Toner product and image forming method: An objective is to provide a toner product with which the difference between the water content of a toner in a toner container and the water content of another toner present in an image forming apparatus is minimized, and a sharp charging amount distribution can be obtained to form high-quality... Agent: Lucas & Mercanti, LLP

20100151374 - Toner product and method of forming image: A toner product containing a toner and a toner container holding the toner, wherein the toner contains a toner particle having an amount of a carboxyl group present on a surface of the toner particle of 1.0×10−7-2.5×10−5 mol/g, the amount of the carboxyl group present on the surface of the... Agent: Lucas & Mercanti, LLP

20100151376 - Toner for developing electrostatic latent image and method of preparing the toner: Disclosed are a toner for developing an electrostatic latent image and a method of preparing the toner. The toner may include a latex, a colorant and a releasing agent, and may further include sulfur (S), iron (Fe) and silicon (Si). The [S]/[Fe] ratio may be within the range between about... Agent: Dla Piper LLP Us

20100151377 - Toner and manufacturing method of toner: Disclosed is a toner, comprising: a noncrystalline polyester resin; a crystalline polyester resin; a release agent; and a coloring agent, wherein the toner has a domain matrix structure in which the matrix comprises the noncrystalline polyester resin and the domain comprises the crystalline polyester resin and the release agent, and... Agent: Lucas & Mercanti, LLP

20100151378 - Toner: Disclosed is toner in which is used in an image formation process comprising the steps of transferring an image of toner formed on a photoreceptor onto a recording sheet, and removing any residual toner remaining on any of the photoreceptor, an intermediate transfer member and a secondary transfer member with... Agent: Lucas & Mercanti, LLP

20100151381 - Antireflective coating composition, antireflective coating , and patterning process: A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure... Agent: Birch Stewart Kolasch & Birch

20100151382 - Bottom resist layer composition and patterning process using the same: There is disclosed a bottom resist layer composition for a multilayer-resist film used in lithography which comprises, at least, a polymer having a repeating unit represented by the following general formula (1). Thereby, there can be provided a bottom resist layer composition which shows an antireflection effect against an exposure... Agent: Oliff & Berridge, PLC

20100151379 - Compound and chemically amplified resist composition containing the same: e

20100151383 - Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern:

20100151380 - Resist composition:

20100151384 - Composition for resist underlayer film and process for producing same: wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b... Agent: Ditthavong Mori & Steiner, P.C.

20100151385 - Stack of negative-working imageable elements: A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and an outermost topcoat that has a dry coating weight equal to or less than 1 g/m2. The non-imaging backside of the substrate is free... Agent: Eastman Kodak Company Patent Legal Staff

20100151386 - Photobase generator and photocurable resin composition: Disclosed is a photobase generator comprising a compound having a nitrogen atom and a conjugated multiple bond.... Agent: Morgan Lewis & Bockius LLP

20100151388 - (meth)acrylate compound, photosensitive polymer, and resist composition including the same: A (meth)acrylate compound having a nitrogen-containing cyclic group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1:... Agent: Lee & Morse, P.C.

20100151387 - High resolution, solvent resistant, thin elastomeric printing plates: The present invention relates a printing element comprising at least one polymer layer which has photoimageable constituents and additions to make the polymer layer either hydrophobic or hydrophilic. The printing element may have two polymer layers on a substrate in which one of the layers comprises fluorinated acrylates or methacrylates.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100151389 - Alkaline developable photosensitive materials: Disclosed is a photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also disclosed is a method of forming barrier ribs for LCD pixels using such photosensitive resin composition.... Agent: Edwin Oh Rohm And Haas Electronic Materials LLC

20100151390 - Method of making a photopolymer printing plate: A method for making a lithographic printing plate includes the steps of providing a printing plate precursor including a support and photosensitive coating wherein the photosensitive coating includes a photopolymerizable composition; image wise exposing the printing plate precursor on an external drum apparatus emitting one or more scanning laser beams... Agent: Agfa C/o Keating & Bennett, LLP

20100151391 - Method and apparatus for high density storage of analog data in a durable medium: Analog data such as text and images are stored in microscopic analog format on a disk surface capable of maintaining the information for 1000 years or more whereby simple optical magnification will result in one being able to read the information formed therein. For a disk read by backlighting, as... Agent: Marger Johnson & Mccollom, P.C.

20100151392 - Antireflective coating compositions: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer, a linking component, a crosslinker, and an acid generator. The invention further relates to a process for imaging the present composition.... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20100151393 - Method of manufacturing nano-structure and method of manufacturing a pattern using the method: According to an example embodiment of the present invention, a photoresist pattern is formed on a base substrate including a neutral layer. A sacrifice structure including a first sacrifice block and a second sacrifice block is formed on the base substrate having the photoresist pattern, and the sacrifice structure is... Agent: Cantor Colburn, LLP

20100151395 - Protective film-removing solvent and method of photoresist patterning with it: Disclosed are a protective film-removing solvent for re-moving a protective film laminated on a photoresist film, which contains at least a hydrofluoroether; and a method of photoresist patterning in liquid immersion lithography, using the protective film-removing solvent.... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100151394 - System for contactless cleaning, lithographic apparatus and device manufacturing method: Embodiments of the invention relate to a system for contactless cleaning of an object surface, a lithographic apparatus including the system, and a method of manufacturing a device. The system may include a He plasma source contained in a chamber and a control unit constructed to modify plasma parameters in... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100143827 - Methods of making holographic devices: A method of making a holographic device (4) comprises the steps of: forming a heterogeneous support medium (2) having at least two regions (1) which are heterogeneous; placing the heterogeneous support medium under recording conditions, e.g. in a liquid X, which are selected to change one or more physical properties... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20100143828 - Method of mask forming and method of three-dimensional microfabrication: (1) An energy beam 4a, 4b is selectively irradiated onto a natural oxide layer 2 formed on the surface of the layer 1 of AlXGaYIn1-X-YAsZP1-Z or AlXGaYIn1-X-YNZAs1-Z. (2) Of the natural oxide layer 2, parts other than parts onto which the energy beam 4a, 4b has been irradiated is removed... Agent: Young & Thompson

20100143831 - Photomask blank and photomask: A photomask blank to be used as a material for a photomask is provided with a mask pattern having a transparent area and an effectively opaque area to exposure light on a transparent substrate. On the transparent board, one or more layers of light shielding films are formed with or... Agent: Birch Stewart Kolasch & Birch

20100143830 - Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process: A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified... Agent: Birch Stewart Kolasch & Birch

20100143829 - Use of soft adhesive to attach pellicle to reticle: A pellicle is attached to a reticle by a soft adhesive. The distortion of the reticle is less than if a hard adhesive were used.... Agent: Intel Corporation C/o Cpa Global

20100143832 - Lithographic apparatus and device manufacturing method: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table. The gap size is reduced using an edge member which may be, for example, a ring known as a BES (Bubble Extraction System) ring. Information... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20100143833 - Magnetic carrier, two-component developer and image forming method: A magnetic carrier is provided which uses a toner having high coloring power and enables development to be performed at low electric field intensity and can form high quality images while keeping gradation characteristics. The magnetic carrier includes magnetic carrier particles including at least porous magnetic core particles and a... Agent: Fitzpatrick Cella Harper & Scinto

20100143834 - Toner: Provided is a toner including toner particles each containing a binder resin, a colorant, and a wax, and inorganic fine particles, the toner having such a characteristic that a temperature-storage elastic modulus curve at a high frequency shows a characteristic change in its behavior in a specific temperature region with... Agent: Fitzpatrick Cella Harper & Scinto

20100143835 - Electrophotographic toner and method of preparing the same: Provided are an electrophotographic toner and a method of preparing the same. The toner includes a latex, a coloring agent, and a release agent, and has a selected amount of wax exposed on the surface of the toner.... Agent: Dla Piper LLP Us

20100143836 - Electrophotographic toner: This invention provides a toner for a method for image formation by electrophotography, particularly a toner that, in a one-component development method, has stable fluidity and electrostatic properties for a long period of time, is free from image defects, and is also excellent in transferability and transfer efficiency. The toner... Agent: Wood, Herron & Evans, LLP

20100143837 - Aqueous dispersions for use as toners: A compound that includes an aqueous dispersion, wherein the dispersion includes a thermoplastic resin and at least one stabilizing agent, and at least one selected from the group consisting of a colorant and a magnetic pigment, wherein the dispersion has an average volume diameter particle size from about 0.05 to... Agent: The Dow Chemical Company

20100143838 - Silver halide photographic photosensitive material and production method thereof: Silver halide photographic photosensitive materials are disclosed. A silver halide photographic photosensitive material has a support, and on or above the support, a red-sensitive silver halide emulsion layer, a first interlayer, a green-sensitive silver halide emulsion layer, a second interlayer, and a blue-sensitive silver halide emulsion layer in this order... Agent: Solaris Intellectual Property Group, PLLC

20100143839 - Toner process: The present disclosure provides processes for increasing the shelf life and stability of resin emulsions suitable for use in forming toner particles. In embodiments, the pH of the resin emulsion is monitored, and a base is added as needed to maintain the pH of the emulsion at from about 6.5... Agent: Xerox Corporation (cdfs)

20100143841 - Enhanced relief printing plate: An improved relief printing plate and method for producing said plate is disclosed. Substantially all sizes of relief features resolve a fixed pattern which improves print quality. The pattern is applied to image areas in halftone data used to produce an image mask that is subsequently used to convert a... Agent: Amelia A. Buharin Patent Legal Staff

20100143840 - Flexographic element and method of imaging: A relief (or flexographic) printing precursor has first and second radiation-sensitive layers, or a plurality of radiation-sensitive layers. The first radiation-sensitive layer is sensitive to a first imaging radiation having a first λmax. The second radiation-sensitive layer is disposed on the first radiation-sensitive layer and is sensitive to a second... Agent: J. Lanny Tucker, Patent Legal Staff Eastman Kodak Company

20100143842 - Method for producing a copolymer solution with a uniform concentration for semiconductor lithography: A method of producing a copolymer solution for semiconductor lithography having a copolymer and a solvent for coating film formation, which copolymer contains at least one repeating unit selected from the group consisting of: a repeating unit (A) having a hydroxyl group; a repeating unit (B) having a structure in... Agent: Burr & Brown

20100143843 - Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition: Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line... Agent: Hammer & Associates, P.C.

20100143845 - Positive resist composition and method of forming resist pattern: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms; R21 represents an alkyl group; and R22 represents a group that forms an aliphatic monocyclic group of 7 to 10-membered ring together with the... Agent: Knobbe Martens Olson & Bear LLP

20100143844 - Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin: A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100143846 - Process for producing photosensitive resin plate and relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the process: The present invention provides a process for producing a photosensitive resin plate or relief printing plate having a recessed and projected pattern, which comprises the steps of: making a liquid containing an ink-repellent component (A) and a curing component (B) attach to the plate surface of the photosensitive resin plate... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100143847 - Photosensitive self-assembled monolayer for selective placement of hydrophilic structures: A photosensitive monolayer is self-assembled on an oxide surface. The chemical compound of the photosensitive monolayer has three components. A first end group provides covalent bonds with the oxide surface for self assembly on the oxide surface. A photosensitive group that dissociates upon exposure to ultraviolet radiation is linked to... Agent: Scully, Scott, Murphy & Presser, P.C.

20100143848 - Patterning methods for stretchable structures: Described herein are processing techniques for fabrication of stretchable and/or flexible electronic devices using laser ablation patterning methods. The laser ablation patterning methods utilized herein allow for efficient manufacture of large area (e.g., up to 1 mm2 or greater or 1 m2 or greater) stretchable and/or flexible electronic devices, for... Agent: Greenlee Winner And Sullivan P C

20100143850 - Method of manufacturing a semiconductor device: A method of manufacturing a semiconductor device by performing divisional exposure on a predetermined area on a wafer, through two or more reticles, on each of which a mask pattern region is formed. The method includes arranging the reticles such that an outer most periphery of a field circle of... Agent: Fitzpatrick Cella Harper & Scinto

20100143849 - Semiconductor device manufacturing method: A semiconductor device manufacturing method includes: forming a foundation film on a semiconductor wafer; after forming the foundation film, forming a reaction layer of the semiconductor wafer and the foundation film therebetween; removing the foundation film and leaving the reaction layer on the semiconductor wafer; forming a resist film on... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100136466 - Exposure mask and method for manufacturing semiconductor device using the same: A method for manufacturing a semiconductor device comprises forming a photoresist pattern by an exposure process with an exposure mask including a shifter pattern and further performing a reflow process on the photoresist pattern to obtain a line/space pattern having a wave type with a uniform a pattern line-width and... Agent: Townsend And Townsend And Crew, LLP

20100136465 - Method of fabricating photomask: A method of fabricating a photomask including forming a light-shielding pattern on a substrate, determining whether a critical dimension (CD) of the light-shielding pattern deviates by at least a predetermined amount from a predetermined CD range, and correcting the CD of the light-shielding pattern if the CD of the light-shielding... Agent: Lee & Morse, P.C.

20100136464 - Reflective mask blank and method of producing the same, and method of producing a reflective mask: A reflective mask blank has a substrate, a multilayer reflective film formed on the substrate to reflect exposure light, a protective film formed on the multilayer reflective film, and an absorber film formed on the protective film to absorb the exposure light. The protective film is made of an Ru... Agent: Sughrue Mion, PLLC

20100136467 - Oxime ester photoinitiators: Compounds of the formula (I) and (II) M1, M2 and M3 independently of one another are no bond, a direct bond, CO, O, S, SO, SO2or NR14; provided that at least one of M1, M2 or M3 is a direct bond, CO, O, S, SO, SO2 or NR14; M4 is... Agent: Ciba Corporation Patent Department

20100136468 - Diffraction order measurement: The present invention relates to an integrated mastering system and a method for manufacturing master discs for optical media. The system according to the invention comprises means for recording information on a master disc including means for applying a material layer to a master disc, a laser beam recorder for... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP

20100136469 - Toner: A toner containing a resin binder containing two kinds of polyesters having softening points that differ by 10° C. or more, a colorant and a charge control agent, wherein the two kinds of polyesters contain a polyester A having a softening point of from 105° to 140° C. and a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100136470 - Method for production of resin emulsion: The present invention relates to a resin emulsion which has a good emulsification performance even when produced by using a crosslinked polyester resin as a binder resin, and also is capable of producing a toner having an excellent storage property therefrom; and a process for producing the resin emulsion. The... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100136471 - Toner and developer: e

20100136472 - Toner compositions: Toner particles are provided which may, in embodiments, include a high molecular weight branched or cross-linked polyester to decrease image gloss and to increase toner elasticity to prevent surface additives impaction. In embodiments, the toner particles may have a core-shell configuration, with the high molecular weight polyester in the core,... Agent: Xerox Corporation (cdfs)

20100136473 - Magnetic carrier and two-component developer: A magnetic carrier which has magnetic carrier particles each having at least porous magnetic core particles and a resin, in which, in a backscattered electron image of the magnetic carrier particles, photographed with a scanning electron microscope as taken at an accelerating voltage of 2.0 kV, magnetic carrier particles having... Agent: Fitzpatrick Cella Harper & Scinto

20100136474 - Process for production of liquid developer, and liquid developer produced by the process: Disclosed is a process for production of a liquid developer for use in electrophotograph or electrostatic recording by coacervation method. The process can produce a liquid developer in which a coloring agent (e.g., a pigment) is included completely within a resin particle by distillation of a solvent while retaining the... Agent: Antonelli, Terry, Stout & Kraus, LLP

20100136475 - Process for production of liquid developer, and liquid developer produced by the process: Disclosed is a process for production of a liquid developer for use in electrophotograph or electrostatic recording by coacervation method. The process can produce a liquid developer in which a coloring agent (e.g., a pigment) is included completely within a resin particle by distillation of a solvent while retaining the... Agent: Antonelli, Terry, Stout & Kraus, LLP

20100136476 - Image forming method: Provided is a method for forming an image with a set of electrostatic charge image developing toners using a digital electrophotographic method, provided that the set of electrostatic charge image developing toners comprises a black toner and a light gray toner, the method comprising the steps of: forming an electrostatic... Agent: Lucas & Mercanti, LLP

20100136483 - Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element: The invention relates to an imaging element and a method of using the imaging element to form a recording element. The imaging element includes a composition sensitive to actinic radiation from a source of radiation having a range of wavelengths and a photoluminescent tag that is responsive to at least... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100136477 - Photosensitive composition: e

20100136479 - Positive photosensitive composition: wherein each of X1 and X2 independently represents a fluorine atom or a fluoroalkyl group, R1 represents a group with a polycyclic structure, provided that the polycyclic structure may have a substituent, and R2 represents a hydrogen atom, a chain alkyl group, a monocyclic alkyl group, a group with a... Agent: Sughrue Mion, PLLC

20100136481 - Resist composition: e

20100136480 - Resist composition and method of forming resist pattern:

20100136482 - Resist composition and patterning process: A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an... Agent: Birch Stewart Kolasch & Birch

20100136478 - Resist composition, method of forming resist pattern, novel compound, and acid generator: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100136484 - Photosensitive paste and sintered layer: Disclosed is a photosensitive paste including glass frit; organic binder; polymerizable monomer; photopolymerization initiator; and organic solvent, wherein at least a part of the polymerizable monomer contains phosphorus atom within the structure.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20100136485 - Acetal compounds and their preparation, polymers, resist compositions and patterning process: An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or... Agent: Birch Stewart Kolasch & Birch

20100136486 - Resist protective coating compositon and patterning process: A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.... Agent: Birch Stewart Kolasch & Birch

20100136487 - Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask: A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure step of performing exposure using a half tone-type... Agent: Mcdermott Will & Emery LLP

20100136488 - Pattern creation method, semiconductor device manufacturing method, and computer-readable storage medium: A pattern creation method has extracting a first pattern and a second pattern which are different from each other from among first mask patterns created based on a first design pattern, calculating a best focus difference between the first pattern and the second pattern based on first exposure conditions, comparing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100136489 - Manufacturing device and manufacturing method for polymer waveguide device: A manufacturing device and a manufacturing method for polymer waveguide devices are revealed. The manufacturing device includes a substrate coated with a photoresist polymer membrane and set on a work platform, a femtosecond laser emitting onto the photoresist polymer membrane, and a lens arranged between the femtosecond laser and the... Agent: Sinorica, LLC

20100136490 - Multi-scale cantilever structures having nano sized holes and method of preparing the same: Provided are a multi-scale cantilever structure having nano-sized holes prepared by anodic oxidation and a method of preparing the same. The multi-scale cantilever structure is prepared using anodic oxidation and electro-polishing so that a manufacturing process is simple and a manufacturing cost is inexpensive. In addition, the multi-scale cantilever structure... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20100136491 - Oxime ester photoinitiators: Compounds of formula (I), (II), and (III), wherein R1, R2, R′2 and R′″2 for example are C1-C20alkyl, provided that at least one of R1, R2, R′2 and R′″2 carries a specified substituent; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that... Agent: Ciba Corporation Patent Department

20100136492 - Substrate processing apparatus and substrate processing method: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure... Agent: Townsend And Townsend And Crew, LLP