|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof April category listing, related patent applications 04/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 04/29/2010 > patent applications in patent subcategories. category listing, related patent applications
20100104952 - Method of producing volume hologram laminate: A method of producing a volume hologram laminate which can regenerate a hologram image in an arbitrary wavelength by a simple process. The method uses a volume hologram forming substrate which includes: a substrate, a volume hologram layer formed on the substrate and containing a photopolymerizable material, a resin layer,... Agent: Ladas & Parry LLP
20100104955 - Mask blank substrate manufacturing method, reflective mask blank manufacturing method, and mask blank substrate: Provided is a mask blank substrate manufacturing method in which a low thermal expansion glass substrate containing titanium (Ti) oxide is polished using a polishing agent, then treated using an aqueous solution containing hydrofluoric acid, then cleaned using an acidic solution with a pH of 4 or less, and then... Agent: Sughrue Mion, PLLC
20100104954 - Matching method of pattern layouts from inverse lithography: The present invention relates to a matching method of pattern layouts from inverse lithography, which makes the pattern cells in the same groups identical to avoid a repeated verification and to improve the yield. The method comprises the step of: analyzing a target designed layout by hierarchy; categorizing the pattern... Agent: Volpe And Koenig, P.C.
20100104953 - Process and hardware for plasma treatments: A H2O vapor based dry plasma process for pre-treating and strip-cleaning a reticle, a three layer gas distribution plate (GDP) assembly to control the heat load to the reticle during the plasma process, and a modified hole pattern for the GDP that further enhances stripping of resist from the edges... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP
20100104956 - Manufacturing methods of asymmetric bumps and pixel structure: A manufacturing method of asymmetric bumps is provided. First, a substrate is provided. A film layer is then formed on the substrate. Next, a complex photomask including at least one transparent region, a number of opaque regions, and a number of semi-transparent regions is provided. Each of the semi-transparent regions... Agent: Jianq Chyun Intellectual Property Office
20100104957 - Method of curing color filter for electronic display using electron-beam and method of fabricating color filter for electronic display using the same: Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not suitable for a process of fabricating next generation flexible displays. In the method of the invention, after... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association
20100104958 - Photosensitive resin composition for color filter and color filter prepared using the same: Disclosed is a color filter photosensitive resin composition that includes (A) an acryl-based binder resin having at least one carboxyl group, (B) an acryl-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, where at least one of the acryl-based binder resin or the acryl-based photopolymerizable monomer includes a... Agent: Summa, Additon & Ashe, P.A.
20100104960 - Exposure apparatus: An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of a stage... Agent: Rossi, Kimms & Mcdowell LLP.
20100104959 - Lithographic method, apparatus and controller: A method for lithographically applying a pattern to a substrate involves obtaining temperature as a function of time during a post exposure bake for one or more locations on a substrate coated with a layer of chemically amplified resist. A relationship between radiation dosage directed onto the chemically amplified resist... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100104961 - Particle beam writing method, particle beam writing apparatus and maintenance method for same: A first exposure dose for a shot area based upon layout data is determined. A correction dose compensating a dose deviation between a first point in time, at which a control unit configured to control a shot time period of a particle beam writing apparatus considers a charged particle beam... Agent: Mayback & Hoffman, P.A.
20100104962 - Patterning method, exposure system, computer readable storage medium, and method of manufacturing device: A method includes measuring a line width of a pattern formed on a first substrate through forming a first edge and a second edge of the pattern on the first substrate, and determining, based on the measured line width, a correction value which corrects information for positioning the first substrate... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100104963 - Nanosized particles of benzimidazolone pigments: A nanoscale pigment particle composition includes an organic benzimidazolone pigment, and a sterically bulky stabilizer compound, wherein the benzimidazolone pigment associates non-covalently with the sterically bulky stabilizer compound that is a substituted pyridine derivative; and the presence of the associated stabilizer limits the extent of particle growth and aggregation, to... Agent: Oliff & Berridge, PLC.
20100104964 - Photoreceptor for electrophotography: n
20100104966 - Crystal phase of a benzimidazolone azo pigment: The invention relates to a new γ crystal modification of the pigment of formula (I) characterized by a CuKα X-ray powder diagram having maxima at 8.5, 14.7, 17.2, 26.0 and 28.4 2Θ, as well as to a process for its preparation and compositions comprising it.... Agent: Ciba Corporation Patent Department
20100104967 - Electrostatic-image-developing toner and preparation process thereof, electrostatic image developer, toner cartridge, process cartridge, image forming method and image forming apparatus: An electrostatic-image-developing toner includes: a binder resin; and a yellow pigment in an amount of from about 5 to about 50 ppm.... Agent: Oliff & Berridge, PLC
20100104968 - Polymerized toner having high resolution: A polymerized toner is provided. The polymerized toner comprises a reactive anionic surfactant having at least one reactive functional group. The reactive anionic surfactant is added simultaneously with a dispersant to prepare an aqueous dispersion or is added within 2 hour after a polymerization reaction of a monomer mixture is... Agent: Mckenna Long & Aldridge LLP
20100104965 - Toner, developer, and image forming method and apparatus using the toner: The toner includes a binder resin; a release agent; a colorant; and a dispersing resin configured to disperse the release agent. The dispersing resin includes a polyhydroxycarboxylic acid unit obtained from an optically active monomer. The polyhydroxycarboxylic acid unit has an optical purity of not greater than 80%, wherein the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100104969 - Organic photoconductor, image forming method and image forming apparatus: An organic photoreceptor is disclosed, comprising on an electrically conductive support an intermediate layer, a charge generation layer, a charge transport layer and a protective layer in this order, wherein the protective layer contains inorganic particles in an amount of not less than 5% by mass and not more than... Agent: Lucas & Mercanti, LLP
20100104970 - Method and apparatus for producing toner: A method and an apparatus for producing toner are provided. A fluid comprising a resin and a colorant is supplied to a retention member that includes a film on which multiple discharge openings are formed. The fluid which is supplied to the retention member is resonated so that liquid droplets... Agent: Cooper & Dunham, LLP
20100104971 - Toner, method for producing toner, two component developer, and image forming apparatus: First toner of the present invention includes colored particles and an external additive. The colored particles are produced by heating and aggregating a mixture that includes a resin particle dispersion in which first resin particles are dispersed and a pigment particle dispersion in which pigment particles are dispersed, so that... Agent: Hamre, Schumann, Mueller & Larson, P.C.
20100104976 - Oxime derivative, photopolymerizable composition, color filter, and process for producing the same: There are provided a compound represented by the following formula (I), a photopolymerizable composition containing (A) a photopolymerization initiator represented by the formula (I) and (B) a radical polymerizable monomer, a color filter produced by using the photopolymerizable composition, and a process for producing the color filter.... Agent: Sughrue Mion, PLLC
20100104974 - Positive resist composition and pattern forming method: wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two members out of Ry1 to Ry3 may combine to form a ring structure; and Z represents a... Agent: Sughrue-265550
20100104972 - Resist composition and method of forming resist pattern: A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent... Agent: Knobbe Martens Olson & Bear LLP
20100104975 - Use of blended solvents in defectivity prevention: The present invention provides a blended solvent for solubilizing an ultraviolet photoresist. The blended solvent comprises a mixture of from about 5 vol % to about 95 vol % of a first solvent, wherein the first solvent comprises a cyclic ester. A balance of the mixture comprises a second solvent,... Agent: Texas Instruments Incorporated
20100104977 - Photoresist undercoat-forming material and patterning process: A material comprising a novolac resin having a C6-C30 aromatic hydrocarbon group substituted with a sulfo group or an amine salt thereof is useful in forming a photoresist undercoat. The undercoat-forming material has an extinction coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm,... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100104979 - Alpha-hydroxyketones: Compounds of the Formula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR5, C3-C5alkenyl or C1-C6alkyl which optionally is... Agent: Ciba Corporation Patent Department
20100104978 - Composition for antireflection film formation and method of forming resist pattern with the same: A composition for forming an anti-reflection film on a resist film is provided, which is superior in handling characteristics, and is not accompanied by generation of deposits and the like after forming the film. A composition for forming an anti-reflection film to be provided on a resist film is provided,... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100104980 - Lithographic printing plate precursor: A lithographic printing plate precursor comprising an image-recording layer, said image-recording layer being photo-polymerizable upon exposure to actinic light and containing a mixture of sensitizers characterized in that said mixture of sensitizers has in 1-methoxy-2-propanol at 80° C. a solubility of at least 30 wt. %. and preferably a MetaStable... Agent: Leydig Voit & Mayer, Ltd
20100104981 - Colored dispersion, photoresist composition and black matrix: Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could... Agent: Mckenna Long & Aldridge LLP
20100104982 - Printing resist, method for preparing the same and patterning method using the same: Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus... Agent: Mckenna Long & Aldridge LLP
20100104983 - Pattern forming method, semiconductor device manufacturing method and exposure mask set: First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100104984 - Method of manufacturing semiconductor device: A template having a first recess pattern is brought into contact with a mask material formed on a substrate. The mask material with which the first recess pattern is filled is cured. A mask material pattern is formed on the substrate by releasing the template from the mask material. A... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100104985 - Compound for photoresist, photoresist liquid, and etching method using the same: The present invention relates to a compound for photoresist, selected from the group consisting of a compound comprising an oxonol dye skeleton, a cyanine dye, a styryl dye, a compound comprising a merocyanine dye skeleton, a compound comprising a phthalocyanine dye skeleton, an azo compound, and a complex compound of... Agent: Birch Stewart Kolasch & Birch
20100104986 - Method for forming pattern: In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling pattern pitch in the first photomask within a... Agent: Leydig Voit & Mayer, Ltd
20100104987 - Composition for antireflection film formation and method for resist pattern formation using the composition: A composition for forming an anti-reflection film for use in forming an anti-reflection film on a resist film is provided, the composition for forming an anti-reflection film being easily handled, and capable of forming an anti-reflection film having superior optical characteristics similarly to anti-reflection films formed using PFOS. A composition... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100104988 - Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle: There is disclosed a developing method of developing a photo-sensitive resist film in which a desired pattern is exposed, including subjecting the exposed photosensitive resist film to a first developing treatment; supplying a cleaning solution having an oxidizing property or alkalinity with respect to the surface of the resist film... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP04/22/2010 > patent applications in patent subcategories. category listing, related patent applications
20100099033 - Method and system for measuring in patterned structures: A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a pattern in the patterned area, the patterns in the patterned area and in the at least test... Agent: Daniel J Swirsky
20100099032 - System for generating and optimizing mask assist features based on hybrid (model and rules) methodology: An optimal assist feature rules set for an integrated circuit design layout is created using inverse lithography. The full chip layout is lithographically simulated, and printability failure areas are determined. The features are analyzed for feature layout patterns, and inverse lithography is performed on the unique feature layouts to form... Agent: Ditthavong Mori & Steiner, P.C.
20100099034 - Method of compensation for bleaching of resist during three-dimensional exposure of resist: The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and... Agent: Haynes Beffel & Wolfeld LLP
20100099035 - Method of iterative compensation for non-linear effects in three-dimensional exposure of resist: The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and... Agent: Haynes Beffel & Wolfeld LLP
20100099036 - Pattern forming method and method of manufacturing semiconductor device: A pattern forming method includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist film to form the cover film on the resist film, transferring a pattern onto the resist film by an immersion lithography method... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100099038 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, image forming method, and image forming apparatus: An electrostatic image developing toner includes a binder resin; and a pigment having a complementary relationship with a color hue of the binder resin, the pigment being contained in an amount of about 1 ppm or greater but not greater than about 20 ppm.... Agent: Oliff & Berridge, PLC
20100099037 - Toner compositions and processes: Environmentally friendly toner particles are provided which may, in embodiments, include a biodegradable semi-crystalline polyester resin and a biodegradable amorphous polyester resin.... Agent: Xerox Corporation (cdfs)
20100099039 - Pigment composition based on c.i. pigment yellow 191: The invention relates to a pigment composition based on P.Y. 191 of the formula (1) containing 0.05 to 30 mol %, based on the sum of P.Y. 191 and a further yellow colorant, of at least one further yellow colorant of the formula (2) and/or of C.I. Pigment Yellow 100... Agent: Clariant Corporation Intellectual Property Department
20100099040 - Toners comprising modified pigments and processes for preparing the same: The present invention relates to toner compositions comprising a resin and a colorant. Various embodiments of the colorant used in the toner compositions are disclosed, including a modified pigment comprising a pigment having attached at least one organic group having the formula −X-I, wherein X, which is directly attached to... Agent: Law Department Cabot Corporation
20100099042 - Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S,... Agent: Birch Stewart Kolasch & Birch
20100099041 - Positive-type photosensitive resin composition: p
20100099043 - Positive photosensitive resin composition: Disclosed is a positive photosensitive resin composition that includes (A) a first polybenzoxazole precursor that includes: a repeating unit of Chemical Formula 1 and a thermally polymerizable functional group at least one terminal end; (B) a second polybenzoxazole precursor that includes a repeating unit of Chemical Formula 3; (C) a... Agent: Summa, Additon & Ashe, P.A.
20100099044 - Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film: There is disclosed a method for forming a resist underlayer film of a multilayer resist film having at least three layers used in a lithography, comprising at least; a step of coating a composition for resist underlayer film containing a novolak resin represented by the following general formula (1) obtained... Agent: Oliff & Berridge, PLC
20100099045 - Methods for performing photolithography using barcs having graded optical properties: Photolithography methods using BARCs having graded optical properties are provided. In an exemplary embodiment, a photolithography method comprises the steps of depositing a BARC overlying a material to be patterned, the BARC having a refractive index and an absorbance. The BARC is modified such that, after the step of modifying,... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)
20100099046 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device comprises forming a protective film over a photoresist pattern to improve the residual ratio of the photoresist pattern. The method comprises forming a photoresist pattern over an underlying layer and forming a protective pattern on an upper portion and sidewalls of the photoresist... Agent: Ampacc Law Group
20100099047 - Manufacture of drop dispense apparatus: A drop dispense apparatus may be manufactured utilizing an imprint lithography process. Exemplary methods for manufacturing a drop dispense apparatus are described.... Agent: Molecular Imprints
20100099049 - Pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method and device: During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a... Agent: Oliff & Berridge, PLC
20100099048 - Stop flow interference lithography system: Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase... Agent: Ditthavong Mori & Steiner, P.C.
20100099050 - Liquid recovery apparatus, exposure apparatus, and device manufacturing method: A liquid recovery apparatus of the present invention is a liquid recovery apparatus 20 which recovers a liquid f, the liquid recovery apparatus 20 comprises a liquid recovery nozzle 6 having a porous plate 22, a container 23 configured to be filled with the liquid f, a recovery pipe 17... Agent: Rossi, Kimms & Mcdowell LLP.
20100099051 - Multi-focus method of enhanced three-dimensional exposure of resist: The field of this disclosure is making three-dimensional topographic structures by means of graduated exposure in a photosensitive material, such as a photoresist, photosensitive polymide, or similar. Such patterns may be written either to be used directly as optical, mechanical, fluidic, etc. components, e.g. diffusors, non-reflecting surfaces, Fresnel lenses and... Agent: Haynes Beffel & Wolfeld LLP04/15/2010 > patent applications in patent subcategories. category listing, related patent applications
20100092875 - Exposure mask for forming photodiode and method of manufacturing image sensor using the same: An exposure mask for forming a photodiode of an image sensor and a method of manufacturing an image sensor using the exposure mask may be disclosed. An exposure mask for forming a photodiode of an image sensor includes a plurality of main open patterns, each having a first open pattern... Agent: The Law Offices Of Andrew D. Fortney, Ph.d., P.C.
20100092876 - Method for repairing photo mask, system for repairing photo mask and program for repairing photo mask: There is provided a method for repairing a photo mask in this invention, including, obtaining a first image being a photo mask image including a defect area of the photo mask by a repair apparatus, obtaining a second image being a wafer printing image of the photo mask including the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100092877 - Method of manufacturing mask blank and transfer mask: In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent... Agent: Sughrue Mion, PLLC
20100092873 - Methods of utilizing block copolymer to form patterns: Some embodiments include methods of forming patterns in which a block copolymer-containing composition is formed over a substrate, and is then patterned to form a first mask. The block copolymer of the composition is subsequently induced into forming a repeating pattern within the first mask. Portions of the repeating pattern... Agent: Wells St. John P.s.
20100092874 - Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank: Means for Solving the Problems: A phase shift mask blank of the present invention has, on a transparent substrate, a phase shift film including, as main components, a metal, silicon (Si) and nitrogen (N), having optical characteristics of a transmittance of equal to or greater than 9% and equal to... Agent: Sughrue Mion, PLLC
20100092878 - Phase shift mask with two-phase clear feature: Systems and methods are provided for use in photolithography. In one embodiment, a reticle is provided that comprises a phase shift and transmission control layer, wherein a gap in the phase shift and transmission control layer defines a line. Adjacent to the phase shift and transmission control layer is an... Agent: Knobbe Martens Olson & Bear LLP
20100092882 - Exposure apparatus and device fabrication method: The present invention provides an exposure apparatus including a projection optical system configured to project a pattern of a reticle located on an object plane onto a substrate located on an image plane, a phase shift type mark mounted on a stage which holds the substrate, an image sensor which... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100092880 - Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography: One embodiment of the present invention provides a method to facilitate using a synchrotron as a source in an extreme ultraviolet lithography (EUVL) system, wherein the synchrotron's energy decreases over time. The EUVL system can includes a stepper which uses a step-and-repeat process or a step-and-scan process to transfer patterns... Agent: Pvf -- Synopsys, Inc C/o Park, Vaughan & Fleming LLP
20100092881 - Process, apparatus and device: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20100092883 - Imaging member exhibiting lateral charge migration resistance: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to an improved electrostatographic imaging member incorporating amino triphenymethane into the charge generating layer which results in a surprisingly lateral charge... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100092884 - Toner compositions: Single component toners are provided with at least one surface additive including a large polymeric spacer, and processes for producing the same. In embodiments, the toner is a non-magnetic single component toner produced by emulsion aggregation methods. The large polymeric spacer additives provide excellent flow characteristics to the resulting toners,... Agent: Xerox Corporation (cdfs)
20100092885 - Image forming material: An image forming material includes a perimidine-substituted squarylium dye that has a structure represented by the following formula (I) and shows diffraction peaks at least at Bragg angles (2θ±0.2°) of 17.7°, 19.9°, 22.1°, 23.2° and 24.9° in its X-ray powder diffraction spectrum measured by irradiation with X rays generated from... Agent: Sughrue-265550
20100092886 - Toner compositions: The present disclosure provides processes for producing toners by emulsion aggregation where the resulting toner particles have high pigment loadings and desired circularity. The methods include adding a metal, in embodiments a metal salt, at the beginning of coalescence, which surprisingly speeds the coalescence process and produces toner particles having... Agent: Xerox Corporation (cdfs)
20100092887 - Fluorine-containing quinacridones in colour filters for lcds: e
20100092888 - Process for structuring silicon: A process for etching a silicon-containing substrate to form structures is provided. In the process, a metal is deposited and patterned onto a silicon-containing substrate (commonly one with a resistivity above 1-10 ohm-cm) in such a way that the metal is present and touches silicon where etching is desired and... Agent: Mintz, Levin, Cohn, Ferris, Glovsky And Popeo, P.c
20100092889 - Mandrel: Pixel wells and a grid of electrical lines including electrical bridges are formed using an ultraviolet transparent mandrel having a three-dimensional surface and an integrated mask.... Agent: Hewlett-packard Company Intellectual Property Administration
20100092890 - Method to align mask patterns: Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, for forming interconnects in the periphery of the integrated circuit, are increased. The narrow mask lines are formed by pitch multiplication and the wider mask lines are formed by... Agent: Knobbe Martens Olson & Bear LLP
20100092891 - Pitch reduced patterns relative to photolithography features: Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively large features of the... Agent: Knobbe Martens Olson & Bear LLP
20100092893 - Method of manufacturing optical waveguide device: A method of manufacturing an optical waveguide device capable of suppressing the surface roughening of core side surfaces of an optical waveguide. Forming an under cladding layer on the front surface of a substrate; forming a photosensitive resin layer for core formation on a surface of the under cladding layer;... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100092892 - Photopolymerized resin laminate and method for manufacturing board having black matrix pattern: An object is to manufacture a substrate having a black matrix pattern with excellent ink repellency on the surface by an easy method. A fluorine-containing compound coated film in which 1 to 60 mm3 of an organic material layer containing 30 to 100% of a fluorine-containing compound is provided on... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100092894 - Bottom antireflective coating compositions: Antireflective coating compositions are discussed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.
20100092895 - Silicon-based antireflective coating compositions: A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.04/08/2010 > patent applications in patent subcategories. category listing, related patent applications
20100086859 - Hologram recording material and hologram recording medium: The present invention provides a hologram recording material and a hologram recording medium, which are suitable for volume hologram record and can attain high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, that is, storage stability, durability, low dimensional change (low shrinkage) and high multiplicity in holographic memory... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100086860 - Photopolymer compositions for optical elements and visual displays: The invention relates to novel photopolymers based on specific urethane acrylates as writing monomers, which are suitable for producing holographic media, in particular for visual display of images.... Agent: Connolly Bove Lodge & Hutz, LLP
20100086861 - Special polyether-based polyurethane formulations for the production of holographic media: The present invention relates to novel polyurethane compositions which are advantageous for the production of holographic media, inter alia for data storage, but also for optical applications of different types.... Agent: Connolly Bove Lodge & Hutz, LLP
20100086863 - Lithographic processing method, and device manufactured thereby: A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test structures through a selected range of dimensions, simulating an image of the test structures, determining an image quality metric for the simulated image, analyzing... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100086862 - Mask pattern correction and layout method: A mask pattern correction method is provided. The method comprises the following steps. An original layout, which has a plurality of device patterns, is provided. Then, a simulation process is performed on the device patterns to correspondingly form a plurality of simulated patterns. Thereafter, the simulated patterns are analyzed to... Agent: North America Intellectual Property Corporation
20100086864 - Method of polishing glass substrate: The present invention is to provide a method of polishing a glass substrate required to have extremely high surface smoothness and surface accuracy like glass substrates for mask blanks. The invention relates to a method of polishing a glass substrate which comprises polishing the glass substrate with a polishing pad... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100086865 - Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method: A measuring member has a first face and a plurality of first marks arranged on the first face. The first marks have respective orientations corresponding to their positions in a first direction.... Agent: Oliff & Berridge, PLC
20100086866 - Undercoat layers comprising silica microspheres: The presently disclosed embodiments are directed to an improved imaging member exhibiting little or no plywood print defect comprising an undercoat layer formed from an undercoat layer dispersion comprising silica microspheres, a binder resin and a solvent, and a method for making the undercoat layer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100086868 - Finely divided epsilon-copper phthalocyanine composition (pigment blue 15:6) for use as pigment: The invention relates to a pigment composition of C.I. Pigment Blue 15:6, containing 0.5% to 15% by weight of an additive of the formula (1), based on the weight of the pigment, in which R1, R2, R3, R4, R5 and R6 independently of one another are hydrogen; C1-C22 alkyl or... Agent: Clariant Corporation Intellectual Property Department
20100086867 - Toner containing fluorescent nanoparticles: A method for making toners to include at least one nanoscale fluorescent pigment particle composition and/or a fluorescent organic nanoparticle composition. The particles are incorporated into emulsion of toner and used in making toner via emulsion aggregation. Such toners may have a core and/or a shell and the clay composites... Agent: Oliff & Berridge, PLC.
20100086869 - Carrier core material for electrophotographic developer and method for producing the same, carrier for electrophotographic developer, and electrophotographic developer: To provide a carrier for two-component electrophotographic developer not only having excellent fluidity but also having proper surface irregularities necessary for imparting electric charge, without generating cracks/chipping of particles even under an influence of stirring stress over a long period of time. A particle surface has raised parts of striped... Agent: Oliff & Berridge, PLC
20100086870 - Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process: There is disclosed a thermosetting composition for forming a silicon-containing film to form a silicon-containing film formed in a multilayer resist process used in lithography, including at least (A) a silicon-containing compound obtained by hydrolyzing and condensing a hydrolyzable silicon compound using an acid as a catalyst, (B) a thermal... Agent: Oliff & Berridge, PLC
20100086871 - Photosensitive polyimides: The invention pertains to an epoxy-modified photosensitive polyimide, which possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used in a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed circuit board.... Agent: Ladas & Parry LLP
20100086872 - Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process: There is disclosed a thermosetting metal oxide-containing film-forming composition for forming a metal oxide-containing film to be formed in a multilayer resist process used in lithography, the thermosetting metal oxide-containing film-forming composition comprising, at least: (A) a metal oxide-containing compound obtained by hydrolytic condensation of a hydrolyzable silicon compound and... Agent: Oliff & Berridge, PLC
20100086873 - Positive resist composition and method of forming resist pattern: (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In... Agent: Knobbe Martens Olson & Bear LLP
20100086874 - Photosensitive polymides: The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.... Agent: Bacon & Thomas, PLLC
20100086875 - Method of making sub-resolution pillar structures using undercutting technique: A method of making a device includes forming an underlying mask layer over an underlying layer, forming a first mask layer over the underlying mask layer, patterning the first mask layer to form first mask features, undercutting the underlying mask layer to form underlying mask features using the first mask... Agent: Sandisk Corporation C/o Foley & Lardner LLP
20100086876 - Techniques for reducing degradation and/or modifying feature size of photomasks: A photomask includes a light transmitting substrate and an absorber layer adjacent thereto. The absorber layer includes a silicide, such as molybdenum silicide, patterned into a plurality of features. The surrounding environment is controlled to prevent undesirable growth by oxidation of the absorber layer when the mask is exposed to... Agent: Ryan, Mason & Lewis, LLP
20100086877 - Pattern forming method and pattern form: One embodiment of the present invention is a pattern forming method for forming a fine three-dimensional structural pattern, including: forming a resist material film on a substrate having a projecting pattern on a step in such a manner as to cover at least a marginal portion of the projecting pattern... Agent: Squire, Sanders & Dempsey L.L.P.
20100086878 - Patterning process: A pattern is formed by applying a first positive resist material onto a substrate, heat treating, exposing to high-energy radiation, heat treating, then developing with a developer to form a first resist pattern; applying a protective coating solution comprising a hydrolyzable silicon compound having an amino group onto the first... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100086880 - Developing solution and method for production of finely patterned material: A developing solution is provided comprising an aqueous alkali solution, at least one anion selected from a silicate ion, a carbonate ion, a borate ion and a phosphate ion, and at least one cation selected from an ammonium ion, an organic ammonium ion and an alkali metal ion. The aqueous... Agent: K&l Gates LLP
20100086879 - Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film: Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the photoresist film, which has little influence on the environment, which has a high water repellent property, which sparingly causes... Agent: Knobbe Martens Olson & Bear LLP
20100086881 - Oxime ester photoinitiators: Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the... Agent: Ciba Corporation Patent Department
20100086882 - Positive resist processing liquid composition and liquid developer: m04/01/2010 > patent applications in patent subcategories. category listing, related patent applications
20100081066 - Mask blank and method of manufacturing a transfer mask: A mask blank having, on a light-transmissive substrate, a light-shielding film made of a material mainly containing chromium, and adapted to use a resist film for electron beam writing when forming a transfer pattern in the light-shielding film. In the mask blank, an etching mask film made of a material... Agent: Sughrue Mion, PLLC
20100081069 - Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of... Agent: Sughrue Mion, PLLC
20100081067 - Mask blank substrate set and mask blank set: A substrate set is a mask blank substrate set including a plurality of substrates each for use in a mask blank for producing a photomask to be chucked on a mask stage of an exposure apparatus. In each of the substrates in the mask blank substrate set, a main surface,... Agent: Sughrue Mion, PLLC
20100081065 - Photomask and method of fabricating a photomask: A method of fabricating a photomask is provided. A masking layer (e.g., chrome) is deposited on a substrate. A plasma treatment may be performed on the chrome layer. A photoresist layer may be formed on the treated chrome layer. In an embodiment, the plasma treatment roughens the chrome layer. In... Agent: Haynes And Boone, LLPIPSection
20100081068 - Systems and methods for detecting focus variation in photolithograph process using test features printed from photomask test pattern images: Systems and methods are provided for detecting focus variation in a lithographic process using photomasks having test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the... Agent: F. Chau & Associates, LLC
20100081070 - Colored curable composition, color filter and production method thereof, and solid-state imaging device: A colored curable composition is provided which has desired transmittance properties, has stability in a state of a chemical solution such as dispersion uniformity or long-term viscosity stability, is excellent in developing properties and is capable of forming a color pattern with high resolving power. The colored curable composition includes... Agent: Solaris Intellectual Property Group, PLLC
20100081071 - Colored curable composition, fluorine-containing dipyrromethene compound and tautomer thereof, and fluorine-containing dipyrromethene metal complex and tautomer thereof, and color filter using the same and method for producing the color filter: A colored curable composition contains a dipyrromethene metal complex compound formed from a fluorine-containing dipyrromethene compound represented by Formula (1) and a metal or metal compound. (R1 to R7: H or substituent (at least one of R1 to R7 includes a substituent represented by Formula (2)); Rg: H or substituent;... Agent: Solaris Intellectual Property Group, PLLC
20100081072 - Lithographic apparatus and method: A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20100081073 - Titanyl phthalocyanin crystal, method for preparing the same and electrophotographic photoconductor: According to the present invention, a titanyl phthalocyanin crystal excellent in storage stability in organic solvents, a method for preparing the same and an electrophotographic photoconductor using the same are provided. In the titanyl phthalocyanin crystal, the method for preparing such a titanyl phthalocyanin crystal and the electrophotographic photoconductor using... Agent: Arthur G. Schaier Carmody & Torrance LLP
20100081074 - Toner for developing electrostatic image, developer for developing electrostatic image, toner cartridge, process cartridge, and image forming apparatus: A toner for developing an electrostatic image includes a toner particle to which particles of an external additive A having a number average particle diameter of from 7 nm to 200 nm and particles of an external additive B having a number average particle diameter of from 30 nm to... Agent: Oliff & Berridge, PLC
20100081075 - Magenta toner and developer: A magenta toner, produced by a method including suspending an oily liquid comprising a binder resin and a colorant in an aqueous medium, wherein the colorant comprises a naphthol pigment and a quinacridone pigment, and the quinacridone pigment comprises a pigment having a specific formula.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100081076 - Production of polyesters in a continuous packed-bed reactor using immobilized enzyme catalysts: In accordance with various embodiments, there is a method of making a polyester. The method can include providing a monomer solution, the monomer solution including one or more cyclic esters in a concentration ranging from about 1 to about 100% and one or more solvents in a concentration ranging from... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20100081077 - Method for reducing wear on an electro-photographic printer drum: A method for reducing wear upon an electro-photographic printer drum includes the steps of determining a non-image region of a page to be printed, applying a halftone pattern of toner to a portion of the printer drum corresponding to the non-image region, and rotating the printer drum against a cleaning... Agent: Hewlett-packard Company Intellectual Property Administration
20100081078 - Method for producing toner: The present invention is to provide a method for producing a toner capable of sufficiently decreasing the percentage of moisture content of a wet cake in the process of obtaining colored resin particles in wet state (wet cake), capable of reducing the workload in the following drying process, and thus... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100081083 - printing original plate capable of being laser-engraved: The present invention provides a printing original plate for laser engraving which generates no printing deficiencies and from which a printing plate with a satisfactory resolution can be produced. A printing original plate for laser engraving which is obtained by molding a resin composition containing (A) at least one latex... Agent: Fish & Richardson P.C.
20100081082 - Composition for resist under layer film formation and method for pattern formation: A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can... Agent: Ditthavong Mori & Steiner, P.C.
20100081084 - Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof: The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is... Agent: Ladas & Parry LLP
20100081085 - Polymer and resist composition comprising the same: e
20100081080 - Polymer compound, resist composition and method of forming resist pattern: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100081079 - Polymer for resist and resist composition manufactured using the same: and a resist composition using the same. In the above Chemical formula 1, X represents vinyl ether derivatives or olefin derivatives, at least one of R1, R2, R3 and R4 is an alkyl group with 1 to 30 carbon atoms containing at least one functional group of a hydrogen atom,... Agent: Hammer & Associates, P.C.
20100081086 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1′) containing an acid dissociable, dissolution inhibiting group within the... Agent: Knobbe Martens Olson & Bear LLP
20100081081 - Resist underlayer film forming composition for electron beam lithography: There is provided a resist underlayer film forming composition for an electron beam lithography that is used in a device production process using electron beam lithography and is effective for reducing adverse effects caused by an electron beam to obtain a favorable resist pattern, and a method of forming a... Agent: Oliff & Berridge, PLC
20100081087 - Composition for formation of antireflection film and pattern formation method using the same: The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.
20100081088 - Resist composition, method of forming resist pattern, compound and acid generator including the same: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable... Agent: Knobbe Martens Olson & Bear LLP
20100081089 - Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and... Agent: Mckenna Long & Aldridge LLP
20100081090 - Process for making lithographic printing plate: A process for making a lithographic printing plate, comprising: an exposure step of imagewise exposing a lithographic printing plate precursor that comprises, above a hydrophilic support, a photosensitive layer comprising (A) a compound that generates a radical upon the application of light or heat, (B) a polymer having an aromatic... Agent: Sughrue Mion, PLLC
20100081091 - Method for manufacturing semiconductor device: According to an aspect of the present invention, there is provided a method for manufacturing a semiconductor device, the method including; sequentially forming a first film and a second film on a base film; processing the second film, thereby forming a second pattern; processing the first film with the second... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100081092 - Method for fabricating metal interconnection of semiconductor device: A method includes forming an interlayer dielectric layer including a contact plug over a semiconductor substrate, forming a metal layer, a hard mask layer, and an anti-reflection layer over the interlayer dielectric layer, forming a photoresist pattern over the anti-reflection layer, etching the anti-reflection layer in a primary etching process,... Agent: Sherr & Vaughn, PLLC
20100081093 - Exposure apparatus inspection method and method for manufacturing semiconductor device: A mask pattern includes a first pattern having a line-and-space pattern extending in a first direction, a second pattern formed as a line-and-space pattern having a larger period than the first pattern and extending in the first direction, a third pattern having a line-and-space pattern extending in a second direction,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100081094 - Mask pattern forming method, fine pattern forming method, and film deposition apparatus: In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by photolithography, slimming of the resist patterns is performed, and an oxide film is formed on the thin film and the resist patterns... Agent: Ipusa, P.l.l.c
20100081096 - Exposure apparatus and device manufacturing method: An information processing apparatus, for processing information of a plurality of measured heights respectively corresponding to a plurality of measurement points on a surface of a substrate held by a chuck, includes a processor and an output device. The processor is configured to specify, with respect to the surface, a... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100081095 - Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method: A drive system drives a movable body, based on measurement results of a first measurement system which measures the position of the movable body in an XY plane by irradiating a measurement beam from an arm member on a grating placed on a surface parallel to the XY plane of... Agent: Oliff & Berridge, PLC
20100081097 - Substrate processing apparatus: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. These blocks are arranged in the substrate processing... Agent: Townsend And Townsend And Crew, LLPPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
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