|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof March listing by industry category 03/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 03/25/2010 > patent applications in patent subcategories. listing by industry category
20100075234 - Generation of contact masks for inkjet printing on solar cell substrates: A contact mask for inkjet printing on a solar cell substrate may be generated by creating a printing bitmap of contacts to be printed on the solar cell substrate. The contacts may be located on the solar cell substrate by mapping coordinates of the printing bitmap to coordinates of the... Agent: Okamoto & Benedicto LLP
20100075236 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank is for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. The phase shift part is a dug-down part formed by digging down the light-transmissive substrate from a surface thereof... Agent: Sughrue Mion, PLLC
20100075235 - Writing pattern producing method, photomask manufacturing method, and semiconductor device manufacturing method: A writing pattern producing method includes obtaining a width of an overlapping portion of first and second patterns, determining whether the width of the overlapping portion is greater than a predetermined width, producing a writing pattern according to a first method when the width of the overlapping portion is determined... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100075237 - Process for producing substrate having partition walls and pixels formed thereon: A process for producing a substrate having partition walls and pixels formed thereon, which comprises forming partition walls on a substrate by a step (11) of coating the substrate with a photosensitive composition comprising a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100075238 - Variable resist protecting groups: A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100075239 - Azo pigment, electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: The present invention provides an azo pigment comprising a group represented by the general formula (1) below, an electrophotographic photosensitive member comprising an intermediate layer comprising the azo pigment, and a process cartridge and an electrophotographic apparatus that comprise the electrophotographic photosensitive member.... Agent: Fitzpatrick Cella Harper & Scinto
20100075240 - Electrostatic-latent-image-developing toner, electrostatic latent image developer, process for producing electrostatic-latent-image-developing toner, image-forming method, and image-forming apparatus: An electrostatic-image-developing toner includes toner particles containing a binder resin, a colorant, and a release agent, wherein the toner contains colorless binder resin particles and, of the colorless binder resin particles, particles having a volume-average particle size diameter 1.5 times as large as, or larger than that of, D50 of... Agent: Oliff & Berridge, PLC
20100075241 - Toners with fluorescence agent and toner sets including the toners: A toner set includes a plurality of toners, at least one toner but less than all toners of the toner set including binder, colorant and fluorescence agent and remaining additional toners including binder, colorant and free of fluorescence agent. At least a first toner grouping and a second toner grouping... Agent: Oliff & Berridge, PLC.
20100075242 - Toner for electrostatic image development: A toner for electrostatic image development containing (a) a toner matrix particle containing a resin binder, and (b) an external additive added to the toner matrix particles, wherein the resin binder contains a polyester A obtained by polycondensing an alcohol component and a carboxylic acid component containing isophthalic acid and/or... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100075243 - Toner for electrophotography, and two-component developer and image forming method using the toner: A toner for electrophotography, including a release agent; a binder resin; a colorant; and an external additive, wherein the binder resin is a polyester resin, and wherein the toner has a loss on heat not greater than 0.40% by weight at 165° C. and a difference between a loss on... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100075244 - Carrier core material for electrophotographic developer, and manufacturing method of the same, carrier for electrophotographic developer, and electrophotographic developer: To provide a carrier for electrophotographic developer, capable of realizing a high image quality and full colorization and reducing carrier scattering, and a manufacturing method of the same, and an electrophotographic developer containing the carrier. A carrier core material for electrophotographic developer, with a general formula expressed by MgxMn(1-x)FeyO4 (where... Agent: Oliff & Berridge, PLC
20100075245 - Resin particle, toner, and image forming method and process cartridge using the same: where R1 to R7 each independently represent a group selected from the group consisting of hydrogen, alkyl having 1 to 40 carbon atoms, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl; any hydrogen in the alkyl group is optionally substituted by fluorine and any —CH2— is optionally substituted by... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100075246 - Method of producing solid body having depressed portions on its surface and method of producing electrophotographic photosensitive member: A method for producing a solid body having depressed portions on its surface is provided. The method includes: using a solution which includes a solvent A, a solvent B, a solvent C, and a polymer compound, where the solvent B is a hydrophobic solvent, the solvent A is a hydrophilic... Agent: Fitzpatrick Cella Harper & Scinto
20100075247 - Method and preparation of chemically prepared toners: A method of making polymeric particles having a controlled size and size distribution, and in particular a method for the preparation of chemically prepared toners, via evaporative limited coalescence process, wherein basic silicate salts are employed to remove particulate stabilizer from precipitated polymer particles. The process includes the steps of... Agent: Andrew J. Anderson Patent Legal Staff
20100075248 - Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same: Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided. According to one exemplary embodiment, a bottom antireflective coating (BARC) composition comprises an inorganic-based compound, an absorbing material, and a wet strip-rate modifier combination. The... Agent: Honeywell International Inc. Patent Services
20100075251 - Method of preparing lithographic printing plate and lithographic printing plate precursor: A method for preparing a lithographic printing plate includes: imagewise exposing a lithographic printing plate precursor including a photosensitive layer containing a sensitizing dye, a polymerization initiator, a polymerizable compound and a binder polymer and an aluminum support on which a divalent cation is adsorbed in an amount of from... Agent: Sughrue-265550
20100075249 - Positive resist composition and method of forming resist pattern: A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2)... Agent: Knobbe Martens Olson & Bear LLP
20100075250 - Waterless planographic printing plate precursor: A waterless planographic printing plate precursor is capable of plate inspection without a post-dyeing step, capable of being handled in a light room and excellent in coloring matter fixing in silicone rubber layer. The waterless planographic printing plate precursor has at least a photosensitive layer or heat sensitive layer and... Agent: Ip Group Of Dla Piper LLP (us)
20100075252 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes: a support; and an image-recording layer containing (A) an infrared absorbing agent, (B) a radical polymerization initiator, (C) a polymerizable compound and (D) an epoxy compound having a molecular weight of 1,000 or less.... Agent: Birch Stewart Kolasch & Birch
20100075254 - Oxime ester compound and photopolymerization initiator containing the same: Disclosed is an oxime ester compound represented by the general formula (I). (I) wherein R1 and R2 independently represent R11, OR11, COR11, SR11, CONR12R13 or CN; R11, R12 and R13 independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to... Agent: Young & Thompson
20100075253 - Resist underlayer film forming composition containing low molecular weight dissolution accelerator: There is provided a resist underlayer film forming composition that is used in a lithography process for the production of semiconductor devices and that can be developed with an alkaline developer for photoresists, and a method of forming a photoresist pattern by using the resist underlayer film forming composition. The... Agent: Oliff & Berridge, PLC
20100075256 - Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition:
20100075258 - On-press developable imageable elements: wherein one or both of Q1 and Q2 are independently substituted or unsubstituted acyl groups —(C═O)—R3′ and —(C═O)—R4′ respectively, wherein R3′ and R4′ are independently substituted or unsubstituted alkyl or aryl groups, or they are joined together to form a ring structure, or one of Q1 and Q2 is hydrogen... Agent: J. Lanny Tucker Patent Legal Staff
20100075259 - Illuminating waveguide fabrication method: A nanolithography system comprising a novel optical printing head suitable for high throughput nanolithography. This optical head enables a super-resolution lithographic exposure tool that is otherwise compatible with the optical lithographic process infrastructure. The exposing light is transmitted through specially designed super-resolution apertures, of which the “C-aperture” is one example,... Agent: Franklin Schellenberg
20100075260 - Plate making method of lithographic printing plate precursor: A plate making method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor including a support and an image-forming layer and containing (A) a compound generating an acid with light or heat, (B) an aromatic hydrocarbon compound or heterocyclic compound substituted with a functional group... Agent: Birch Stewart Kolasch & Birch
20100075261 - Methods for manufacturing a contact grid on a photovoltaic cell: Processes for fabricating a contact grid for a photovoltaic cell generally includes providing a photovoltaic cell having an antireflective coating disposed on a sun facing side, the photovoltaic cell comprising a silicon substrate having a p-n junction; soft stamping a pattern of a UV sensitive photoresist and/or polymer onto the... Agent: Cantor Colburn LLP - IBM Research Triangle Park
20100075262 - Post arrays and methods of making the same: In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of... Agent: Fish & Richardson P.C.
20100075263 - Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent: It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to... Agent: Wenderoth, Lind & Ponack, L.L.P.03/18/2010 > patent applications in patent subcategories. listing by industry category
20100068630 - Method for manufacturing photo mask: The present invention provides a method for manufacturing a photo mask. First, a transparent substrate is provided, and a patterned filling layer and a patterned mask layer are formed on the transparent substrate. Then, a crystal material layer is formed on the transparent substrate and the patterned mask layer to... Agent: North America Intellectual Property Corporation
20100068632 - Optical component for euvl and smoothing method thereof: The present invention provides a method for smoothing an optical surface of an optical component for EUVL. Specifically, the present invention provides a method for smoothing an optical surface of an optical component for EUVL made of a silica glass material containing TiO2 and comprising SiO2 as a main component... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100068631 - Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask: A photomask includes an ion trapping layer and a method of manufacturing a semiconductor device uses the photomask. The photomask includes a transparent substrate and an ion trapping layer formed on a first region of the transparent substrate to trap ions present near the transparent substrate. In manufacturing a semiconductor... Agent: Mills & Onello LLP
20100068633 - Sub-resolution assist features: Systems and techniques relating to the layout and use of sub-resolution assist features. In one implementation, a mask includes a first feature and a second feature separated from each other by a gap and a sub-resolution assist feature bridging the gap between the first feature and the second feature.... Agent: Fish & Richardson, PC
20100068634 - Measurement apparatus, exposure apparatus, and device manufacturing method: A measurement apparatus comprises a mirror configured to reflect test light which passes through an optical system, an interferometer unit which includes an image sensor and is configured to form an interference fringe on an image sensing plane of the image sensor by reference light and the test light reflected... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100068635 - Electrophotographic photoreceptor, and image forming method, image forming apparatus and process cartridge using the electrophotographic photoreceptor: A photoreceptor including a layer including a crosslinked material obtained by polymerizing at least a vinyl group-containing triarylamine compound, a radically polymerizable monomer which has at least three radically polymerizable groups in a molecule and has no charge transport structure, and an optional radically polymerizable polycarbonate. An image forming apparatus... Agent: Cooper & Dunham, LLP
20100068638 - Zinc dithiol containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, a zinc dithiol containing charge transport layer, a zinc dithiol containing photogenerating layer, or where the charge transport layer and the photogenerating layer both include a zinc dithiol.... Agent: Patent Documentation Center Xerox Corporation
20100068636 - Photoreceptor protective overcoat layer including silicone polyether and method of making same: Disclosed is an electrophotographic imaging member including a substrate; a charge generating layer; a charge transport layer with a hole transport material; and a protective overcoat layer having a silicone polyether additive with at least one carbinol function group; a polyol binder; a hole transport material; a curing agent; and... Agent: Oliff & Berridge, PLC.
20100068637 - Thiobis(thioformate) containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a thiobis(thioformate) containing charge transport layer; a thiobis(thioformate) containing photogenerating layer, or where both at least one charge transport layer and the photogenerating layer includes, in addition to other components, a thiobis(thioformate).... Agent: Patent Documentation Center Xerox Corporation
20100068639 - Photoconductive imaging members: Exemplary embodiments provide charge generating layers and electrographic imaging members containing the charge generating layers. In various embodiments, an imaging member can be a multilayered photoconductive imaging member with a charge generating layer including, for example, a photogenerating pigment, such as a metal phthalocyanine; a dopant material, such as a... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20100068640 - Binder resin for photosensitive layers and electrophotographic photoreceptor belts: An electrophotographic photoreceptor belt which is excellent in durability and therefore little cracks even when fingerprints of an operator or hand cream adheres to the belt, wherein a binder resin for photosensitive layers comprising as the main component a polycarbonate resin which comprises bisphenol A type constituent units represented by... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100068641 - Electrophotographic developer and image forming method: An electrophotographic developer including: magnetic particles, and a toner containing toner particles charged with the magnetic particles and having a particle diameter distribution, wherein the toner exhibits cumulative toner weight distributions of both square of charge amount q2 [C2] and attachment force F [N] per particle with respect to a... Agent: Turocy & Watson, LLP
20100068642 - Universal stir-in pigments: The invention relates to a pigment preparation containing (a) 50-99 percent by weight of at least one pigment, (b) 1 to 50 percent by weight of an additive based on polyalkylene glycols, and (c) 0 to 10 percent by weight of an auxiliary agent from among the group comprising fillers,... Agent: Clariant Corporation Intellectual Property Department
20100068643 - Electrostatic-image-developing toner, process for producing electrostatic-image-developing toner, electrostatic image developer, and image-forming apparatus: An electrostatic-image-developing toner includes a binder resin; a colorant; a releasing agent having a melting temperature of from about 70° C. to about 100° C.; and an ethylenediaminedisuccinic acid.... Agent: Oliff & Berridge, PLC
20100068644 - Toner, and developer: The present invention provides a toner which contains at least a binder resin, and a colorant, wherein the binder resin contains a polyester resin (A) obtained by polycondensation of an alcohol component with a carboxylic acid component containing one of a purified rosin and a modified rosin, and a polyester... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100068645 - Carrier for developing electrostatic latent image, two-component developer, supplemental developer, process cartridge, and image forming method: A carrier for developing an electrostatic latent image which includes a core material and a resin coating layer provided on the core material. The resin coating layer includes a resin and a particulate tin oxide, and the surface of the particulate tin oxide is coated with carbon.... Agent: Cooper & Dunham, LLP
20100068646 - Toner, and image forming method and apparatus using the toner: The toner includes at least a binder resin, and a colorant. The toner has properties such that the percentage W(3000) of components having a molecular weight of 3,000 or less in tetrahydrofuran-soluble components of the toner determined by a GPC-RALLS viscosity analysis is 20% by weight or less; the molecular... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100068647 - Radiation-sensitive resin composition: A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount... Agent: Ditthavong Mori & Steiner, P.C.
20100068649 - Photosensitive resin composition, and pattern formation method using the same: A photosensitive resin composition is provided that is highly safe, provides a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100068648 - Photosensitive resin composition, and resist pattern formation method using the same: A photosensitive resin composition capable of controlling occurrence of defects and capable of forming a resist pattern having a favorable configuration, and a method for forming a resist pattern using the same are provided. According to a photosensitive resin composition including, as component (a), a polyfunctional epoxy resin, and, as... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100068650 - Positive-working radiation-sensitive composition and method for resist pattern formation using the composition: A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a... Agent: Ditthavong Mori & Steiner, P.C.
20100068651 - Developing solution for flexographic printing plates: A developing or processing solution can be used to provide flexographic relief printing plates. This processing solution comprises dipropylene glycol dimethyl ether (DME) and optionally one or more alcohols or other co-solvents. The processing solution is used to remove non-polymerized material after imaging while leaving polymerized material in a relief... Agent: Eastman Kodak Company Patent Legal Staff
20100068652 - Semiconductor device manufacturing method: To include transferring simultaneously by lithography a first region from a position opposed between a first constituent member and a second constituent member in a longitudinal direction of a third constituent member to the end of a side of the first constituent member and a first mask pattern for forming... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100068653 - Manufacturing method of optical waveguide device: A manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a roughened surface of a substrate. An under cladding layer is formed on a roughened surface of a substrate... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100068654 - Method for creating gray-scale features for dual tone development processes: A method of patterning a substrate using a dual-tone development process is described. The patterning method comprises forming a layer of radiation-sensitive material on a substrate, wherein the layer of radiation-sensitive material comprises a dual tone resist. Thereafter, the patterning method comprises performing one or more exposures of the layer... Agent: Tokyo Electron U.s. Holdings, Inc.
20100068655 - Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method: A position measuring module includes a movement mirror provided on a movable member and having a reflecting surface along a first axis direction; detection-light units which are arranged for a plurality of measuring axes disposed in the first axis direction respectively and which irradiate, onto the movement mirror, detection lights... Agent: Miles & Stockbridge PC
20100068656 - High etch resistant material for double patterning: The present invention includes a lithography method comprising forming a first patterned insist layer including at least one opening therein over a substrate. A water-soluble polymer layer is formed over the first patterned resist layer and the substrate, whereby a reaction occurs at the interface of the first patterned resist... Agent: Birch, Stewart, Kolasch & Birch, LLP
20100068657 - Method of patterning target layer on substrate: A method of patterning a target layer on a substrate is described. A patterned photoresist layer is formed over the target layer, wherein the patterned photoresist layer has unexposed parts as separate islands and each unexposed part has a low proton concentration at least in its sidewalls. Acid-crosslinked polymer layers... Agent: J C Patents
20100068659 - Exposure apparatus and device manufacturing method: An exposure apparatus of the present invention is an EUV exposure apparatus 700 which is configured to expose a circuit pattern formed on a reticle 6 onto a wafer 9 in a vacuum environment. The EUV exposure apparatus 700 comprises a plurality of vacuum chambers 1 to 5 which separate... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100068658 - Photolithographic patterning of arrays of pillars having widths and lengths below the exposure wavelengths: A pillar array is printed in positive photoresist using an optical mask (108) having an array of features (310) corresponding to the pillars. The pillars' width/length dimensions are below the exposure wavelength. Superior results can be achieved (less peeling off of the pillars and less overexposure at the center of... Agent: Haynes And Boone, LLPIPSection
20100068661 - Pattern forming method: A pattern forming method which uses a positive resist composition comprises: (A) a fluorine-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a fluorine-containing resin having... Agent: Sughrue-265550
20100068660 - Pattern forming method and device production method: A pattern forming method includes coating, on a wafer, a negative resist and a positive resist which has a higher sensitivity; exposing the positive resist and the negative resist on the wafer with an image of a line-and-space pattern; and developing the positive resist and the negative resist in a... Agent: Oliff & Berridge, PLC
20100068662 - Method of forming fine patterns: It is disclosed a method of forming fine patterns comprising: subjecting a substrate having photoresist patterns to a hydrophilic treatment, covering the substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100068663 - Method for contaminant removal: Method for removing contaminants from a surface during semiconductor fabrication. A preferred embodiment comprises developing a resist layer on a top surface of a semiconductor substrate, curing the developed resist layer, and cleaning the developed resist layer with a developer solution to remove contaminants. The cleaning makes use of the... Agent: Texas Instruments Incorporated
20100068664 - Developing roller, electrophotographic process cartridge and electrophotographic image-forming apparatus: A developing roller has a mandrel, an elastic layer and a cover layer as a surface layer. The cover layer includes a silicon oxide film containing a carbon atom chemically bonded to a silicon atom. In the silicon oxide film, the proportion of the total number of the elements of... Agent: Fitzpatrick Cella Harper & Scinto03/11/2010 > patent applications in patent subcategories. listing by industry category
20100062348 - Method and apparatus for gating photomask contamination: A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to pass through and having one or more features formed of a first material, and an inspection structure... Agent: Haynes And Boone, LLPIPSection
20100062350 - Photomask substrate, photomask substrate forming member, photomask substrate fabrication method, photomask, and exposing method that uses the photomask: A photomask substrate with a substantially uniform thickness comprises: a first surface, which is a continuous curved surface whereon a mask pattern is to be formed; and a second surface. The first surface exhibits a square shape that comprises an opposing pair of first set sides and an opposing pair... Agent: Staas & Halsey LLP
20100062349 - Stencil, stencil design system and method for cell projection particle beam lithography: Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a... Agent: The Mueller Law Office, P.C.
20100062351 - Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method: A surface position detecting apparatus according to an aspect of the present invention has a light-sending optical system which makes first light and second light from first and second patterns incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an... Agent: Staas & Halsey LLP
20100062352 - Toner, and production method of the same: The present invention provides a method for producing a toner, the method including: preparing a wax dispersion liquid by cooling a wax solution, in which a wax is heated and dissolved or dispersed in an organic solvent, in a container so that a standard deviation σ of a temperature distribution... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100062354 - Full-color toner, image forming method, and image forming apparatus: e
20100062353 - Multicolor image forming apparatus and image forming method thereof: A multicolor image forming apparatus which includes a developer image forming unit to form an image using a developer and a transferring unit to transfer the formed developer image to a recording medium, wherein the developer comprises a plurality of dark developers and one or more light developers, wherein the... Agent: Stanzione & Kim, LLP
20100062355 - Cyan toner: Provided is a cyan toner which, while being a capsule-type toner having excellent low-temperature fixability, has excellent offset resistance and charging performance and can obtain high-quality images. A cyan toner having at least a resin (a) having a polyester as a main component, a colorant, and a wax, in which... Agent: Fitzpatrick Cella Harper & Scinto
20100062357 - Pigment preparation based on diketopyrrolopyrroles: The invention relates to a pigment preparation based on C.I. Pigment Red 254 content with an average particle size of between 20 and 100 nm, and to at least one pigment dispersant of formula (II).... Agent: Clariant Corporation Intellectual Property Department
20100062356 - Toner for electrostatic development, image forming appratus, and image forming method: An embodiment of toner for electrostatic development may include toner base particles, and resin fine particles. Further, some embodiments may include external additives, such as hydrophobic silica. In some embodiments, the resin fine particles may include a polymer having an isobornyl group-containing acrylate monomer.... Agent: Frommer Lawrence & Haug
20100062358 - Polyester synthesis: The present disclosure provides methods for modifying polymeric resin materials after polymerization to make fine adjustments in the chemical or physical properties of the resin, or in modifying the structure of the polymer chains. The resulting resins may be useful in forming toner particles. In embodiments, a polymeric resin may... Agent: Xerox Corporation (cdfs)
20100062359 - Emulsion aggregation toner formulation: An emulsion aggregation toner formulation for electrophotography and a method for preparation thereof. The emulsion aggregation toner formulation includes a polyester resin emulsion formed using an extruded polyester binder resin having a broad molecular weight distribution. The extruded polyester binder resin is formed using a plurality of polyester binder resins.... Agent: Lexmark International, Inc. Intellectual Property Law Department
20100062360 - Methods of producing ink toners and ink compositions including ink toners: Methods of making ink toners for use in electrostatic imaging are disclosed.... Agent: Hewlett-packard Company Intellectual Property Administration
20100062361 - Liquid developing agent and process for producing the same: A liquid developing agent for electrophotography or electrostatic recording that can realize a high solid content and has excellent developing properties is characterized in that colored chips produced by heat kneading a pigment with a thermoplastic resin are dispersed by wet pulverization in an electrically insulating hydrocarbon solvent containing at... Agent: Antonelli, Terry, Stout & Kraus, LLP
20100062362 - Toner for electrophotography: wherein t1 represents a thickness of the thickest part of the outer layer, and t2-t5 each represent a thickness of a second to a fifth thickest part of the outer layer in one particle, and wherein a glass transition point Tg of the inner layer is about 2-about 45° C.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100062365 - Chemically amplified positive resist composition: e
20100062363 - Composition for upper surface antireflection film, and method for pattern formation using the same: The present invention provides a composition for forming a top anti-reflection coating and also provides a pattern formation method employing that composition. The composition prevents pattern failures caused by light reflected in the resist layer in the exposure step, and it further avoids troubles caused by residues produced in the... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.
20100062366 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100062364 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100062368 - Low outgassing photoresist compositions: wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso... Agent: Cantor Colburn, LLP - IBM Arc Division
20100062370 - Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use: This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer... Agent: Goudreau Gage Dubuc
20100062369 - Positive resist composition, method of forming resist pattern, and polymeric compound: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100062371 - Copolymer and composition for semiconductor lithography and process for producing the copolymer: [Means for Achievement] The copolymer for semiconductor lithography according to the present invention is a copolymer which has at least (A) a repeating unit having a structure which has an alkali-soluble group protected by an acid-labile, dissolution-suppressing group, (B) a repeating group having a lactone structure and (C) a repeating... Agent: Melvin I. Stoltz, Esq.
20100062372 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by at least one of formulae (1-1) to... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100062373 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100062374 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100062375 - Method of preparing lithographic printing plate: A method of preparing a lithographic printing plate includes: exposing imagewise a lithographic printing plate precursor including a hydrophilic support and a photosensitive layer containing a spectral sensitizer, a polymerization initiator, a co-initiator, a polymerizable monomer and a binder polymer with a laser light source having an emission wavelength in... Agent: Sughrue-265550
20100062376 - Method and apparatus for thermal development with a conformable support: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20100062377 - Method for manufacturing color filter and color filter manufactured by using the same: The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate... Agent: Mckenna Long & Aldridge LLP
20100062378 - Optical waveguides and methods thereof: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100062380 - Double patterning process: A double pattern is formed by coating a first positive resist composition onto a substrate, patternwise exposure to radiation, and development with alkaline developer to form a first resist pattern; applying heat and/or radiation to render the first resist pattern insoluble in a second solvent and in a second developer;... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100062379 - Method of forming resist pattern: Disclosed is a method of forming a resist pattern, including: applying a positive resist composition on a support 1 to form a first resist film 2; selectively exposing the first resist film 2 through a first mask pattern, and developing it to form a first resist pattern 3; applying a... Agent: Knobbe Martens Olson & Bear LLP03/04/2010 > patent applications in patent subcategories. listing by industry category
20100055581 - Method for design and manufacture of a reticle using variable shaped beam lithography: A method is disclosed for using non-overlapping variable shaped beam (VSB) shots in the design and manufacture of a reticle, where the union of the plurality of shots deviates from the desired pattern. Methods are described for fracturing or mask data preparation or proximity effect correction of a desired pattern... Agent: The Mueller Law Office, P.C.
20100055579 - Method for fabricating chromeless phase shift mask: A method for fabricating a chromeless phase shift mask having a phase shift mask with a groove shape includes: forming a recess region with a first depth between the phase shift regions of a substrate; forming a plug for a mask that fills the recess region; forming a mask pattern... Agent: Marshall, Gerstein & Borun LLP
20100055580 - Method for fracturing circular patterns and for manufacturing a semiconductor device: A method for manufacturing a semiconductor device using a photomask and optical lithography is disclosed, wherein circular patterns on the semiconductor wafer are formed by using circular patterns on the photomask, which is manufactured using a charged particle beam writer. In one embodiment, circular patterns of varying sizes have been... Agent: The Mueller Law Office, P.C.
20100055578 - Method for manufacturing a surface and integrated circuit using variable shaped beam lithography: A method is disclosed in which a plurality of variable shaped beam (VSB) shots is used to form a desired pattern on a surface. Shots within the plurality of shots are allowed to overlap each other. Dosages of the shots may also be allowed to vary. The union of the... Agent: The Mueller Law Office, P.C.
20100055577 - Process of patterning small scale devices: A process is provided that includes forming a first mask on an underlying layer, where the mask has two adjacent portions with an open gap therebetween, and depositing a second mask material within the open gap and at an inclined angle with respect to an upper surface of the underlying... Agent: Ditthavong Mori & Steiner, P.C.
20100055582 - Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof: A colored curable composition is provided which has good developability, has excellent color purity, can be formed into a thin film, and has a high absorption coefficient. The colored curable composition includes at least one of specific dipyrromethene metal complex compounds and tautomers thereof. Also, a colored curable composition suitable... Agent: Solaris Intellectual Property Group, PLLC
20100055583 - Method for fabicating color filter substrate: A method for fabricating a color filter substrate is disclosed, to realize the simplified fabrication process by forming a film-type color filter layer, which includes preparing a mask having patterns for forming color filter layers and a black matrix layer; positioning the mask above a film; irradiating light to the... Agent: Mckenna Long & Aldridge LLP
20100055584 - Exposure device and exposure method: An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective mask with an alignment light and an optical element having a structure that a light path of the exposure light extending... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20100055586 - Method and system for forming circular patterns on a surface: A method for forming circular patterns on a surface using a character projection (CP) charged particle beam writer is disclosed, wherein circular patterns of different sizes may be formed using a single CP character, by varying dosage. A method for forming circular patterns on a surface using a variable shaped... Agent: The Mueller Law Office, P.C.
20100055587 - Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography: In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage maps for a plurality of shots into the dosage map for the... Agent: The Mueller Law Office, P.C.
20100055585 - Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography: A method for optical proximity correction (OPC) of a desired pattern for a substrate is disclosed in which a plurality of variable shaped beam (VSB) shots are determined which can form on a surface an OPC-corrected version of the desired substrate pattern. Shots within the plurality of VSB shots are... Agent: The Mueller Law Office, P.C.
20100055588 - Charge transport layer having high mobility transport molecule mixture: The presently disclosed embodiments relate generally to layers that are useful in imaging apparatus members and components, for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a specific mixture of high mobility molecules in the charge transport layer which exhibits... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20100055589 - Process for making cnt/pfa composite coatings for fuser applications: Exemplary embodiments provide nanotube-containing coating compositions and methods for making and using the coating compositions. In an exemplary embodiment, the coating composition can include a plurality of nanotubes (e.g., carbon nanotubes (CNTs)) dispersed stably and uniformly in a polymer matrix containing fluoropolymers. The coating composition can further include stabilizers to... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20100055590 - Toner, method for producing toner, and developer: A method for producing a toner including periodically forming and discharging liquid droplets of a toner composition liquid containing at least a resin, a releasing agent and a colorant from a plurality of nozzles formed in a thin film which is provided in a reservoir for the toner composition liquid,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100055591 - Chemical toner composition and method for preparing the same: The present invention relates to a chemical toner composition and a method for preparing the same. The chemical toner composition includes: a resin emulsion; a pigment dispersion; a wax dispersion; and a dispersible polymer coagulant, wherein the dispersible polymer coagulant is a copolymer comprising unsaturated ester monomers and amino-containing monomers.... Agent: Bacon & Thomas, PLLC
20100055592 - Toner compositions: Toner particles are provided which may, in embodiments, include a core and a shell formed in situ. The resins utilized to form the core, the shell, or both, may be contacted with a water soluble initiator. The resin, in embodiments present in the shell, cross-links at a temperature near the... Agent: Xerox Corporation (cdfs)
20100055593 - Toner compositions: Toner particles are provided which may, in embodiments, include a core and a shell, one or both of which may include a polyester gel. The gel in the shell and/or core may prevent a crystalline resin in the core from migrating to the toner surface.... Agent: Xerox Corporation (cdfs)
20100055594 - Toner for developing electrostatically charged images: Toner for developing electrostatically charged images contains at least a binder resin, a colorant and a charge control agent. The charge control agent is an aromatic compound generating at least sulfur dioxide and a butylphenol upon thermal decomposition by raising temperature from room temperature to 250° C. at 10° C./min;... Agent: Jordan And Hamburg LLP
20100055598 - Toner compositions: Toner particles are provided which may, in embodiments, include a gel. In embodiments, the toner particles may have a core-shell configuration, with the gel in the core, the shell, or both. The gel may prevent a crystalline resin in the core of the toner particles from migrating to the toner... Agent: Xerox Corporation (cdfs)
20100055596 - Toner for developing electrostatic latent image: A toner for developing an electrostatic latent image, the toner comprising: a releasing agent; and a binder resin, wherein: the releasing agent includes at least a first releasing agent material and a second releasing agent material, the first releasing agent material having a different melting point compared to the second... Agent: Ostrolenk Faber Gerb & Soffen
20100055595 - Toners for electrophotography: The present invention relates to a toner for electrophotography including a polyester obtained by subjecting a crystalline polyester-containing aqueous dispersion and a non-crystalline polyester-containing aqueous dispersion to aggregation and coalescence, as a resin binder, wherein the crystalline polyester is produced by polycondensing an alcohol component containing 70 mol % or... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100055599 - Method of preparing toner having core-shell structure and toner prepared using the same: A method of preparing a toner having a core-shell structure. The method includes: preparing a mixture by mixing a resin with acid groups, a coloring agent and at least one additive with an organic solvent, and neutralizing the acid groups of the resin with a base; forming a micro-suspension solution... Agent: Nixon Peabody LLP
20100055601 - Resin-filled carrier for electrophotographic developer and electrophotographic developer using the resin-filled carrier: A resin-filled carrier for an electrophotographic developer which carrier is obtained by filling a resin in the voids of a porous ferrite core material, wherein the Cl concentration of the porous ferrite core material, measured by an elution method, is 10 to 280 ppm and the resin contains an amine... Agent: Greenblum & Bernstein, P.L.C
20100055600 - Method of manufacturing a toner, device of manufacturing a toner, and toner: Disclosed is a method of manufacturing a toner, wherein a liquid drop forming part including a storage part configured to store a toner composition liquid in which a toner composition including at least a resin and a coloring agent is dispersed or dissolved, a thin film on which a nozzle... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100055602 - Liquid developer and image forming method: A liquid developer includes: toner particles containing a rosin resin; an insulating liquid containing an epoxy-modified compound in liquid form; and a cationic photopolymerization initiator.... Agent: Hogan & Hartson L.L.P.
20100055603 - Toner, process cartridge and method of forming image: A toner including a resin having a polyester skeleton, a coloring agent, a vinyl based copolymer resin, and a releasing agent, wherein the toner is manufactured by dissolving or dispersing a resin including the resin having a polyester skeleton and a mixture of the vinyl based copolymer resin and the... Agent: Cooper & Dunham, LLP
20100055604 - Image-forming apparatus and image-forming process: An image-forming apparatus comprises: an image carrier; a charging unit; a latent image forming unit; a developing unit that uses a toner maintaining a non-color-developing state when provided with coloring information through exposure to light; a coloring information providing unit that provides the toner image with coloring information by exposing... Agent: Morgan Lewis & Bockius LLP
20100055609 - Compound, method for preparing the compound and resist composition containing the compound: wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings... Agent: Birch Stewart Kolasch & Birch
20100055607 - Lithographic printing plate precursor and plate making method thereof: A lithographic printing plate precursor includes, in the following order: a support, an image-recording layer and a protective layer, and the image-recording layer contains (A) an infrared absorbing agent, (B) a radical generator, and a polymer which exhibits electrical conductivity upon oxidation.... Agent: Birch Stewart Kolasch & Birch
20100055608 - Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S,... Agent: Birch Stewart Kolasch & Birch
20100055606 - Positive resist composition and method of forming resist pattern: wherein P represents an a-valent organic group; a represents an integer of 2 to 20; Y represents an arylene group or an alkylene group of 1 to 12 carbon atoms; and X represents a specific linking group which can be cleaved under action of acid, and arm portions that are... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100055605 - Printed circuit board and method of manufacturing the same: A printed circuit board and a method of manufacturing the printed circuit board are disclosed. The method of manufacturing the printed circuit board in accordance with an embodiment of the present invention can include: forming an opaque conductive pattern on one side of a transparent insulation layer; forming a photosensitive... Agent: Mcdermott Will & Emery LLP
20100055611 - Resist composition and method for forming a pattern using the same: The present invention relates to a resist composition with a hardener and a solvent, and a method for forming a pattern using the resist composition. The hardener has a thermal-decomposable core part, and a first photosensitive bond art. The solvent has a low-molecular resin, and a second photosensitive bond part.... Agent: F. Chau & Associates, LLC
20100055612 - Nagative-working photosensitive resin composition and photosensitive resin plate using the same: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100055613 - Negative-working lithographic printing plate precursor and method of lithographic printing using same: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can... Agent: Birch Stewart Kolasch & Birch
20100055614 - Lithographic printing plate having specific polymeric binders: Negative lithographic printing plate having on a substrate a photosensitive layer comprising an alkaline soluble polymeric binder, an alkaline insoluble polymeric binder, a polymerizable monomer, and an initiator is described. The photosensitive layer is imagewise exposed with a radiation to cause hardening in the exposed areas, and then developed to... Agent: Gary Ganghui Teng
20100055615 - Method of preparing lithographic printing plate: A method for preparing a lithographic printing plate, includes: exposing imagewise a lithographic printing plate precursor including a hydrophilic support and an image-recording layer containing a sensitizing dye, a polymerization initiator, an addition polymerizable compound having an ethylenically unsaturated double bond and a binder polymer; and processing the imagewise exposed... Agent: Birch Stewart Kolasch & Birch
20100055616 - Method for fabricating saddle type fin transistor: A method for fabricating a saddle type fin transistor includes: preparing a substrate where a device isolation structure is already formed; forming a hard mask pattern over the substrate, the hard mask pattern including a coating layer obtained through a coating method; and performing an etching process using the hard... Agent: Blakely Sokoloff Taylor & Zafman LLP
20100055617 - Method of forming pattern in semiconductor device: Disclosed is a method of forming a pattern in a semiconductor device. A first mask pattern to form dense lines and a second mask pattern to form spaces (parts where ends of lines are opposite to each other) are used when double patterning is applied to a photolithography process to... Agent: Sherr & Vaughn, PLLC
20100055618 - Method of manufacturing array substrate of transreflective liquid crystal display: A method of manufacturing an array substrate of a transreflective LCD is provided in the invention. In the method, a gate line, a common line and an embossing pattern are formed with a full tone mask, a data line, a source/drain electrode, a reflective plate and a TFT channel region... Agent: Ladas & Parry LLP
20100055619 - Method and system for manufacturing a reticle using character projection lithography: A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use... Agent: The Mueller Law Office, P.C.
20100055620 - Nanostructure fabrication: Techniques for fabricating nanostructures are provided. In one embodiment a method includes forming a multilayer stack including at least one pair of a structural layer and a sacrificial layer on a substrate, patterning the multilayer stack in order to fabricate a nanostructure, and releasing the nanostructure from the patterned multilayer... Agent: Knobbe Martens Olson & Bear LLP
20100055621 - Patterning process: There is disclosed a patterning process including steps of at least: forming a photoresist film on a substrate; exposing the photoresist film to a high energy beam; developing by using a developer; forming a photoresist pattern; and then forming a spacer on the photoresist pattern sidewall, thereby forming a pattern... Agent: Oliff & Berridge, PLC
20100055623 - Exposure apparatus and device manufacturing method: An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect... Agent: Canon U.s.a. Inc. Intellectual Property Division
20100055622 - Method for making light blocking plate: An exemplary method for making a plurality of light blocking plates is provided. Firstly, a photoresist layer is formed on a substrate. Secondly, the photoresist layer is exposed using a gray scale photomask. Thirdly, the photoresist layer is developed to form a plurality of conical frustums on the substrate, and... Agent: PCe Industry, Inc. Att. Steven Reiss
20100055626 - Method for pattern formation: A resist film made of a chemically amplified positive resist is formed on a substrate. On the resist film, a light absorbing film containing a fluoropolymer which is alkali-soluble and has an aromatic ring is formed. Thereafter, first pattern exposure is performed by irradiating the resist film through the light... Agent: Mcdermott Will & Emery LLP
20100055624 - Method of patterning a substrate using dual tone development: A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.
20100055625 - Method of process optimization for dual tone development: A method for patterning a substrate is described. In particular, the invention relates to a method for double patterning a substrate using dual tone development. Further, the invention relates to optimizing a dual tone development process.... Agent: Tokyo Electron U.s. Holdings, Inc.Previous industry: Chemistry: electrical current producing apparatus, product, and process
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