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Radiation imagery chemistry: process, composition, or product thereof January recently filed with US Patent Office 01/10

20100021830 - Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.... Agent: Lee & Morse, P.C.

20100021829 - Deposition mask and method for manufacturing organic light emitting display using the same: A deposition mask for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated... Agent: H.c. Park & Associates, PLC

20100021828 - Halftone mask and method of fabricating the same, and method of fabricating display device using the same: A halftone mask includes a shielding pattern partially formed on a transparent substrate; a first halftone transmission pattern partially formed on the transparent substrate; and a second halftone transmission pattern formed on the first halftone transmission layer.... Agent: Birch Stewart Kolasch & Birch

20100021825 - Mask pattern data creation method and mask: A mask pattern data creation method includes: determining whether or not a spacing of adjacent assist pattern feature data is not more than a prescribed spacing, based on: initial position data indicating an initially set position of the assist pattern feature data determined based on an illumination condition; and initial... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100021827 - Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method: In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the second exposure process includes at least one localized adjustment to... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20100021824 - Photo-mask and wafer image reconstruction: A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is... Agent: Wilson, Sonsini, Goodrich & Rosati

20100021826 - Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device: A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated and... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100021832 - Photoresist composition and method of manufacturing a color filter substrate by using the same: A photoresist composition includes a coloring agent, a binder resin, a cross-linker, a photo-polymerization initiator and a solvent. The coloring agent includes an anthraquinone-based dye and a pigment. A color filter formed from the photoresist composition has a relatively greater light-transmittance. Thus, a contrast of a display apparatus having the... Agent: Innovation Counsel LLP

20100021831 - Transparent colourants and colourant compositions, and their use: The invention relates to a colourant composition comprising in a weight ratio of from 99:1 to 10:90, preferably a weight ratio of from 95:5 to 30:70, particularly preferred a weight ratio of from 95:5 to 50:50, a pigment of average particle size from 10 to 200 nm and a 1-... Agent: Joann Villamizar Ciba Corporation/patent Department

20100021833 - Dithiolene metal complex colorless ir absorbers: The invention relates to the use of compounds of formulae (I) and/or (II) as colorless IR absorbers wherein M is Ni, Pd, Pt, Au, Ir, Fe, Zn, W, Cu, Mo, In, Mn, Co, Mg, V, Cr or Ti, X1, X2 and X3 are each independently of the others sulfur or... Agent: Joann Villamizar Ciba Corporation/patent Department

20100021834 - Coating compositions for fusers and methods of use thereof: There is disclosed a fuser member comprising a substrate; and an outer layer thereover comprising (a) a polymer and (b) an organometallic species, wherein said polymer and said organometallic species forms an interpenetrating network upon curing; and wherein the outer layer comprises an increased number of uniform organometallic binding sites,... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)

20100021835 - Electrophotographic photosensitive member and electrophotographic apparatus: e

20100021836 - Electrophotographic photosensitive member and electrophotographic apparatus: In an electrophotographic photosensitive member having a photoconductive layer and, provided on the photoconductive layer, a surface layer constituted of a hydrogenated amorphous silicon carbide, the ratio of the number of atoms of carbon atoms (C) to the sum of the number of atoms of silicon atoms (Si) and number... Agent: Fitzpatrick Cella Harper & Scinto

20100021837 - Method for manufacturing electrophotographic photosensitive member: The present invention provides a method for manufacturing an electrophotographic photosensitive member including: forming a first surface layer and a second surface layer of the electrophotographic photosensitive member by supplying a source gas into a reaction vessel so that C2/S2 which are respectively flow rates of CH4 and SiH4 flowing... Agent: Fitzpatrick Cella Harper & Scinto

20100021838 - Polymer particles with additives encapsulated in microvoids: Porous particles comprising a polymer binder and at least one additive distinct from any pore stabilizing compound present in the particle, wherein: the polymer binder comprises a solid compositionally continuous phase having an external particle surface; discrete pores are dispersed within the solid compositionally continuous phase, forming internal pore surfaces;... Agent: Eastman Kodak Company Patent Legal Staff

20100021839 - Toner compositions: Methods for modifying the acid value of an unsaturated polyester resin suitable for use in forming toner particles are provided. In embodiments, methods may include contacting at least one unsaturated polyester resin with at least one grafting monomer, polymerizing the graft monomer and unsaturated polyester resin to form a graft... Agent: Xerox Corporation (cdfs)

20100021840 - Decolorizable emulsion coloring material and method of producing the same: There is provided an emulsion coloring material which can be used on ordinary paper, has good color developability, and can be used for conventional erasable pens or printing inks of black or blue color, having sufficiently high densities. When use is made of an erasable emulsion coloring material capable of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100021841 - Low melt toners and processes thereof: A process for preparing toner particles and compositions adapted for use in preparing toners that comprise a blend of a first polyester resin with a second sharp melting polyester resin. The process includes forming an emulsion resin comprising a branched polyester resin, a crystalline polyester resin, a colorant, and optionally... Agent: Fay Sharpe / Xerox - Rochester

20100021843 - Inorganic resist sensitizer: Methods and compositions for enhancing the sensitivity of an inorganic resist composition are disclosed. In one aspect, compositions for use with a matrix material (e.g., a lithographically sensitive polymeric material such as a hydrogen-bearing siloxane material) can be formulated with a sensitizer, where the sensitizer can be present in a... Agent: Nutter Mcclennen & Fish LLP

20100021842 - Laser engravable flexographic printing articles based on millable polyurethanes, and method: A flexographic printing sleeve or plate is made by a method that includes providing a millable polyurethane, crosslinking the millable polyurethane, and forming a relief by at least laser engraving the crosslinked millable polyurethane. For example, crosslinking may be accomplished by a peroxide-based process or by a vulcanization process using... Agent: Adams Intellectual Property Law

20100021844 - Negative-working imageable elements and method of use: Negative-working imageable elements can be imaged and processed with water to provide lithographic printing plates. These imageable elements have imageable layers that contain a particulate polymeric binder having polyetheramine side chains. Rapid processing speeds are also possible using water and optional mechanical rubbing means for processing the imaged element.... Agent: J. Lanny Tucker Patent Legal Staff

20100021845 - Negative working, heat-sensitive lithographic printing plate precursor: g

20100021846 - Negative working, heat-sensitive lithographic printing plate precursor:

20100021847 - Oxime compound and resist composition containing the same: wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1) represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent... Agent: Hogan & Hartson L.L.P.

20100021848 - Method for forming pattern and method for manufacturing semiconductor device: According to an aspect of the present invention, there is provided a method for forming a pattern including: applying a photosensitive resin onto a film on a wafer substrate; partly exposing the photosensitive resin to light and developing the photosensitive resin to form a first pattern having an opening portion;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100021849 - Method of forming patterns of semiconductor device: In a method of forming patterns of a semiconductor device, a semiconductor substrate defining photoresist patterns formed over a target etch layer is provided. An auxiliary layer is formed over the semiconductor substrate and the photoresist patterns. The auxiliary layer formed on a surface of the photoresist patterns is denatured... Agent: Marshall, Gerstein & Borun LLP

20100021850 - Pattern forming method: A pattern forming method has forming a first resist film on a processed film, patterning the first resist film into a first resist pattern, forming a first film containing a photo acid generator so as to cover the first resist pattern, forming a second resist film so as to cover... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100021852 - Composition for formation of upper layer film, and method for formation of photoresist pattern: [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently... Agent: Ditthavong Mori & Steiner, P.C.

20100021851 - Methods for producing organic nanocrystals: Methods for producing small crystals on islands formed on specialized substrates by, inter alia, subjecting the substrate to a hydrophilic SAMs solution for self-assembling hydrophilic SAMs on certain portions of the substrate surface and subjecting the substrate to a hydrophobic SAMs solution for self-assembling hydrophobic SAMs on certain other portions... Agent: Smith, Gambrell & Russell

20100015535 - Fabrication method of lithography mask and formation method of fine pattern using the same: There is provided a method of fabricating a lithography mask, the method including: forming a transparent polymer layer on a surface of a first substrate where a convex-concave pattern is formed; separating the transparent polymer layer from the first substrate, the transparent polymer layer having a convex-concave surface formed by... Agent: Mcdermott Will & Emery LLP

20100015534 - Method for monitoring photolithography process and monitor mark: A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together with the product patterns through the photolithography process onto a substrate, and measuring the deviation dimension of the monitor mark formed on the... Agent: North America Intellectual Property Corporation

20100015537 - Beam dose computing method and writing method and record carrier body and writing apparatus: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100015536 - Photoresist solution dispensing volume monitoring system and method thereof: A photoresist solution dispensing volume monitoring system comprises: a photoresist solution dispensing apparatus having a photoresist bottle storing photoresist solution; and a weight scale being installed at the circumferential surface of the photoresist bottle, the weight scale measuring the weight of photoresist solution within the photoresist bottle. Via this arrangement,... Agent: Rosenberg, Klein & Lee

20100015538 - Electrophotographic photoconductor, image forming apparatus using the same, and process cartridge: The present invention provides an electrophotographic photoconductor which includes at least a photosensitive layer and a surface protective layer over a support, wherein the surface protective layer contains a filler, a charge transporting material and a specific compound; and the photosensitive layer contains at least a charge transporting material; the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100015539 - Overcoat layer in photoreceptive device: The presently disclosed embodiments are directed to an improved low wear overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat layer positioned on the charge transport layer, and a process for preparing the same, where the overcoat layer includes an aromatic polyol binder, a... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100015540 - Binderless overcoat layer: Embodiments pertain to a novel imaging member, namely, an imaging member or photoreceptor comprising a binderless overcoat layer which exhibits substantially improved electrical performance, such as low residual potential and good electrical cyclic stability. The overcoat layer of the present embodiments is formed from a formulation comprising a small transport... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20100015541 - Electrophotographic photoreceptor belt: An electrophotographic photoreceptor which is excellent in wear resistance and crack resistance and has a long photoreceptor lifetime can be produced by using a polycarbonate resin composition prepared by blending 100 parts by weight of a polycarbonate resin with 0.01 to 5 parts by weight of a silicone-modified polyurethane obtained... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100015542 - P-terphenyl compound and photosensitive body for electrophotography using such compound:

20100015543 - Black toner and image forming method: A black toner includes: toner mother particles containing carbon black as a colorant and a binder resin, the toner mother particles being surface-modified with a polyalkyleneimine.... Agent: Hogan & Hartson L.L.P.

20100015544 - Toner process: The present disclosure provides toners and processes for preparing toner particles possessing excellent charging characteristics. The process includes forming a dispersion including at least one organic and/or organometallic charge control agent, and then combining that dispersion with an emulsion suitable for use in forming toner particles.... Agent: Xerox Corporation (cdfs)

20100015545 - Toner: A toner containing a resin binder and a colorant, wherein the resin binder contains a polyester (A) having a softening point Tm(A) of from 100° to 160° C., and a polyester (B) having a softening point Tm(B) of from 80° to 120° C., the softening point of which is lower... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100015546 - Process for producing toner for liquid developer, toner for liquid developer, process for producing liquid developer, liquid developer, and image forming apparatus: A process for producing a toner for a liquid developer includes: preparing an emulsion liquid containing an aqueous dispersion medium and, dispersed therein, dispersoids containing a resin material which has an acidic group having a salt structure formed with a basic substance and has an acid value of from 5.0... Agent: Hogan & Hartson L.L.P.

20100015547 - Method for producing electrostatic image developing toner: Provided is a method for producing an electrostatic image developing toner comprising: agglutinating wax and resin particles in aqueous medium; manufacturing a toner composed of wax and resin for developing an electrostatic image, wherein the wax is inside colorants. The method solves the problems of existing toner for developing an... Agent: Matthias Scholl

20100015549 - On-press developable negative-working imageable elements: The present invention relates to negative-working imageable elements that can be used for the manufacture of printing plates. These imageable elements can be developed on on-press by the action of a lithographic printing ink used in combination with either water or a fountain solution. The imageable elements comprise an imageable... Agent: Raymond L. Owens Patent Legal Staff

20100015548 - Positive resist composition and method of forming resist pattern: e

20100015550 - Dual damascene via filling composition: Compositions for use in dual damascene process are disclosed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20100015551 - Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition: X, Y, and Z each independently represent an alkyl group having 1-10 carbon atoms and optionally substituted with a halogen atom, an aryl group having 6-20 carbon atoms and optionally substituted with a halogen atom, an arylalkyl group having 7-20 carbon atoms and optionally substituted with a halogen atom, a... Agent: Young & Thompson

20100015553 - Positive resist composition and method of forming resist pattern: A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; R1 represents a C3 or more branched alkyl group; and each of R2 and R3 independently... Agent: Knobbe Martens Olson & Bear LLP

20100015552 - Resist composition, method of forming resist pattern, compound and acid generator: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group... Agent: Knobbe Martens Olson & Bear LLP

20100015554 - Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition: An actinic-ray- or radiation-sensitive resin composition comprises (A) a resin that when acted on by an acid, exhibits an increased solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, (C) a resin containing two or more resins (c) each having... Agent: Sughrue Mion, PLLC

20100015555 - Resist composition, method of forming resist pattern, and novel compound and acid generator: A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X... Agent: Knobbe Martens Olson & Bear LLP

20100015556 - Negative-working imaging elements and methods of use: Negative-working imageable elements such as lithographic printing plate precursors, include a free-radically polymerizable component, an initiator composition that is capable of generating free radicals sufficient to initiate polymerization of the free-radically polymerizable component upon exposure to imaging radiation in the presence of a radiation absorbing compound, a radiation absorbing compound,... Agent: J. Lanny Tucker Patent Legal Staff

20100015557 - Sealed cell structure: A method for forming a sealed cell structure is disclosed. The sealed cell structure comprises first (10) and second (12) substrates that are spaced apart by a plurality of partition walls (14). The partition walls define a plurality of cells (18, 19) between the first and second substrates. At least... Agent: Philips Intellectual Property & Standards

20100015558 - Laser marking: An ink formulation comprises a marking component, e.g. ammonium octamolybdate, and a metal salt that absorbs laser irradiation at 780-2500 nm, e.g. reduced indium tin oxide, and thereby causes the marking component to change colour.... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20100009269 - Holographic recording media: in both formulae I and II, R1 and R2 are independently at each occurrence an aliphatic radical having from 1 to about 10 carbons, a cycloaliphatic radical having from about 3 to about 10 carbons, or an aromatic radical having from about 3 to about 12 carbons; R3, R4, and... Agent: General Electric Company Global Research

20100009273 - Mask and method for manufacturing the same: A mask for use in an exposure process and a method for manufacturing the same are provided, the mask including a main pattern formed over a reticle substrate; a plurality of dummy patterns formed over the reticle substrate and spaced apart from the main pattern by a predetermined distance; and... Agent: Sherr & Vaughn, PLLC

20100009272 - Mask fabrication method, exposure method, device fabrication method, and recording medium: The present invention provides a method including generating mask data to be used in an exposure apparatus including an illumination optical system and a projection optical system which projects a pattern of the mask onto a substrate, and fabricating a mask based on the generated mask data.... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100009270 - Method for optimizing the layout of at least one transfer device for production of a direct or indirect structure: e

20100009271 - Resist patterning process and manufacturing photo mask: There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid... Agent: Oliff & Berridge, PLC

20100009275 - Exposure method and memory medium storing computer program: A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20100009274 - Substrate processing method and substrate processing system: There is disclosed a substrate processing method by a multi-patterning technique, which comprises a lithography process and an etching process, each of the processes is performed to one substrate at least twice. The substrate processing method is performed by using a substrate processing system comprising a plurality of process units... Agent: Burr & Brown

20100009279 - Toner for electrophotography: A toner for electrophotography comprising a charge control agent comprising a specified iron-azo complex or a specified metal compound of a benzilic acid derivative, a colorant, and a resin binder comprising a polyester, the polyester being a polyester obtained by polycondensing an alcohol component containing a propylene oxide adduct of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100009280 - Treated metal oxide particles and toner compositions: wherein Ar represents an aromatic group, EW represents an electron withdrawing group, Y represents a spacer group, Z represents an alkylene group, An represents an anchor group, a is an integer from 1 to 5, b is 0 or 1, and c is 0 or 1. The treated metal oxide... Agent: Law Department Cabot Corporation

20100009276 - Developing agent and method for producing the same: In a method for producing a developing agent by coagulating a toner fine particle dispersion including a toner fine particle, an aqueous medium and a dispersant to obtain a toner particle, the coagulation is carried out only by pH adjustment, the dispersant is a surfactant, and a concentration of the... Agent: Turocy & Watson, LLP

20100009277 - Hydrophobic inorganic fine particles and toner: Hydrophobic inorganic fine particles are provided which: does not cause melt adhesion of toner to a photosensitive member and contamination of a contact charging member; imparts excellent flowability, charging performance and durability to toner even after the toner is stored in a high-temperature, high-humidity environment over a long time period;... Agent: Fitzpatrick Cella Harper & Scinto

20100009278 - Toner and image forming method: d

20100009281 - Developing agent and method for producing developing agent: The method for producing a developing agent according to the invention contains subjecting the toner material dispersion liquid to mechanical shearing to make the granular mixture into fine particles, thereby providing a dispersion liquid containing fine particles having a smaller particle diameter than a particle diameter of the granular mixture.... Agent: Turocy & Watson, LLP

20100009283 - Electrophotographic toner, process for preparing the same, image forming method and apparatus using the toner: Provided are an electrophotographic toner, a process for preparing the same, image forming method and an image forming apparatus using the toner. The electrophotographic toner may include a latex, colorant, wax, Si and Fe. A molar ratio of Si/Fe may be about 0.1 to about 5.... Agent: Dla Piper LLP Us

20100009282 - Image forming method, image forming apparatus and process cartridge: An image forming method, including charging the surface of an electrostatic latent image bearer by a charger; irradiating the surface of the electrostatic latent image bearer to form an electrostatic latent image thereon; developing the same with a toner to form a toner image; transferring the toner image onto a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100009288 - Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same: An actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin that exhibits an increased solubility in an alkali developer when acted on by an acid, and (B) at least two types of sulfonic acid generators that generate a sulfonic acid when exposed to actinic rays or radiation, wherein the... Agent: Sughrue Mion, PLLC

20100009286 - Chemically-amplified positive resist composition and patterning process thereof: There is disclosed a chemically-amplified positive resist composition comprising, as main components, (A) a base polymer, which contains one or more kinds of a monomer unit represented by the following general formula (1) and the like, and is an alkali-insoluble polymer whose hydroxyl group is partly protected by an acetal... Agent: Oliff & Berridge, PLC

20100009284 - Compound, positive resist composition and method of forming resist pattern: A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic... Agent: Knobbe Martens Olson & Bear LLP

20100009287 - Curable composition for imprints, patterning method and pattern: A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The... Agent: Sughrue Mion, PLLC

20100009285 - Flexographic printing forme precursor for laser engraving: c

20100009290 - Photosensitive polybenzoxazines and methods of making the same: Photosensitive polybenzoxazine compositions include a photosensitive additive such as an o-diazoquinone and a polymer comprising a repeating unit represented by the following formula (I) wherein R1 comprises an aliphatic group, an alicyclic group, an aromatic group, a heterocyclic group, or combinations thereof, R2 comprises an aliphatic group, an alicyclic group,... Agent: Cantor Colburn, LLP

20100009289 - Resist sensitizer: Methods and compositions for enhancing the sensitivity of a resist composition are disclosed. In one aspect, compositions for use with a matrix material (e.g., a lithographically sensitive polymeric material) can be formulated with an acid generator and a sensitizer, where the sensitizer can be present in a relatively small amount.... Agent: Nutter Mcclennen & Fish LLP

20100009292 - Resin composition for micropattern formation and method of micropattern formation: A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having... Agent: Ditthavong Mori & Steiner, P.C.

20100009291 - Resist composition for immersion exposure and method of forming resist pattern: r

20100009293 - Antireflective coating compositions: Antireflective coating compositions and related polymers are disclosed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20100009294 - Exposure method: An exposure method is disclosed. A wafer coated with a photoresist layer having an exposure threshold dose is provided. The wafer has at least a central region and a peripheral region. Then, a compensating light beam having a first dose directs on the photoresist layer within the peripheral region. Next,... Agent: North America Intellectual Property Corporation

20100009295 - Method of fine patterning a thin film and method of manufacturing a display substrate using the method: A method of fine patterning a thin film and a method of manufacturing a display substrate by using the same, in which a fine photo pattern is formed on a base substrate, and a photoresist pattern is formed on the thin film. A fine photo pattern is formed by ashing... Agent: F. Chau & Associates, LLC

20100009296 - Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head: A material for forming a conductive antireflection film contains: a base resin having conductivity; a crosslinking agent; a thermal acid generator; and a solvent.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20100009297 - Antireflective coating compositions: Antireflective coatings and related polymers are disclosed.... Agent: Alan P. Kass Az Elecronic Materials Usa Corp.

20100009298 - Forming sub-lithographic patterns using double exposure: Methods are presented of forming sub-lithographic patterns using double exposure. One method may include providing a photoresist layer over a layer to be patterned; exposing the photoresist layer using a first mask having a first opening; developing the photoresist layer to transfer the first opening into the photoresist layer, forming... Agent: Hoffman Warnick LLC

20100009299 - Resist composition and patterning process: The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser,... Agent: Oliff & Berridge, PLC

20100009300 - Industrial x-ray photosensitive material: An industrial X-ray photosensitive material including at least one silver halide emulsion layer on both sides of a transparent support, wherein the silver halide emulsion layer contains tabular silver halide particles having an average particle thickness of less than 0.2 μm and an aspect ratio of more than 8, a... Agent: Moss & Burke, PLLC

20100003605 - system and method for projection lithography with immersed image-aligned diffractive element: A novel system and method and computer program product for exposing a photoresist film with patterns of finer resolution than can physically be projected onto the film in an ordinary image formed at the same wavelength. A hologram structure containing a set of resolvable spatial frequencies is first formed above... Agent: Scully, Scott, Murphy & Presser, P.C.

20100003606 - Process for producing holograms: In a process for processing a hologram, a holographic image is formed in a photopolymer layer carried on a substrate. A colour tuning film is applied to the opposed photopolymer layer to form a laminate. The temperature of the laminate is raised and is subsequently cooled and is then exposed... Agent: Prass LLP

20100003607 - Method for correcting pattern critical dimension in photomask: A method for correcting pattern critical dimension (CD) in a photomask includes forming a multilayer structure over a substrate by stacking at least two thin films capable of forming a compound by application of energy from an energy source; forming a light-shielding layer over the multilayer structure; forming a light-shielding... Agent: Marshall, Gerstein & Borun LLP

20100003608 - Method for generating mask pattern data and method for manufacturing mask: A method for generating data on mask pattern used to form a device pattern formed on a reflective exposure mask, wherein data on the mask pattern is generated based on a position correction amount table used to correct an amount of transfer position error occurring depending on at least one... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20100003609 - Titania-doped quartz glass member and making method: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a... Agent: Birch Stewart Kolasch & Birch

20100003610 - Electrophotographic roller with resistance to nip banding: An endless electrophotographic member, such as a developer roller, which indicates an improved resistance to nip banding. The improvement to nip banding may be provided by the use of an organic salt within a roller surface region. The roller may provide, at a nip location, a resistive surface layer having... Agent: Lexmark International, Inc. Intellectual Property Law Department

20100003611 - Resin composition for toner, and toner using the resin composition: Disclosed is a resin composition for toners, which contains a resin (D) obtained by reacting a styrene polymer (A) containing an active hydrogen group and having a peak molecular weight (Mp) of not less than 30,000 but not more than 2,000,000, a styrene polymer (B) containing a carboxyl group and... Agent: Buchanan, Ingersoll & Rooney PC

20100003612 - Isoindoline pigments: s

20100003613 - Toner, method of producing toner, and image forming method: A toner produced by a method including dissolving or dispersing toner components comprising a resin, a colorant, and a release agent in a solvent to prepare a toner components liquid, discharging the toner components liquid from multiple nozzles provided on a thin film by vibrating the thin film by a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100003614 - Resin coated carrier, two-component developer, developing device and image forming apparatus: wherein A represents a volume resistance value (Q/cm) of the resin coated carrier in an electric field of 1000 V/cm that is obtained by conducting a stirring test, B represents a volume resistance value (Ω/cm) of the resin coated carrier in an electric field of 1000 V/cm before the stirring... Agent: Nixon & Vanderhye, PC

20100003616 - Photosensitive self-assembled monolayer for selective placement of hydrophilic structures: A photosensitive monolayer is self-assembled on an oxide surface. The chemical compound of the photosensitive monolayer has three components. A first end group provides covalent bonds with the oxide surface for self assembly on the oxide surface. A photosensitive group that dissociates upon exposure to ultraviolet radiation is linked to... Agent: Scully, Scott, Murphy & Presser, P.C.

20100003615 - Upper layer-forming composition and photoresist patterning method: An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an... Agent: Ditthavong Mori & Steiner, P.C.

20100003617 - Optical information recording medium: An optical information recording medium includes a recording layer that absorbs recording light in accordance with its wavelength, the recording light being condensed for information recording, and increases the temperature in the vicinity of a focus so as to form a recording mark and that has properties of increasing a... Agent: Wolf Greenfield & Sacks, P.C.

20100003618 - Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same: A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a polymerizable compound and a polymerization initiator. Also provided is a planographic printing plate precursor having a polymerizable layer on a hydrophilic support, the... Agent: Birch Stewart Kolasch & Birch

20100003619 - Systems and methods for fabricating three-dimensional objects: Systems and methods for fabricating three-dimensional objects. The system includes an optical imaging system providing a light source; a photosensitive medium adapted to change states upon exposure to a portion of the light source from the optical imaging system; a control system for controlling movement of the optical imaging system,... Agent: Troutman Sanders LLP Bank Of America Plaza

20100003620 - Exposure method: An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted lights from the contact hole pattern interfere with... Agent: Rossi, Kimms & Mcdowell LLP.

20100003621 - Etching method for forming a multi-step surface on a substrate: An etching method for forming a multi-step surface on a substrate includes: (1) coating a first photo-resist layer on a predetermined surface of the substrate; (2) coating a second photo-resist layer on the first photo-resist layer, the second photo-resist layer having a characterization opposite to that of the first photo-resist... Agent: Nixon & Vanderhye, PC

20100003622 - Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material: A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a... Agent: Knobbe Martens Olson & Bear LLP

20100003623 - Method of patterning multiple photosensitive layers: A method of patterning multiple photosensitive layers is provided. A first photosensitive layer is formed on a substrate. The first photosensitive layer is exposed by using a first mask. A second photosensitive layer is formed on the first photosensitive layer. The second photosensitive layer is exposed by using a second... Agent: North America Intellectual Property Corporation