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Radiation imagery chemistry: process, composition, or product thereof December patent applications/inventions, industry category 12/09

20090325079 - Data storage medium comprising colloidal metal and preparation process thereof: Disclosed is a photopolymerizable holographic recording medium for data storage that comprises colloidal metal, and which exhibits a threshold for a second stage polymerization which is substantially insensitive to the light used for both forming holograms and interrogating the medium during servo and/or read events. Also disclosed is a method... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20090325078 - Holographic recording medium: A holographic recording medium including an optically transparent substrate is provided. The optically transparent substrate includes an optically transparent plastic material and a photochemically active dye. The optically transparent substrate has an absorbance of greater than 1 at a wavelength that is in a range of from about 300 nanometers... Agent: General Electric Company Global Research

20090325081 - Exposure mask and manufacturing method of a semiconductor using the same: An exposure mask for EUV comprises an absorber formed over a mask substrate and a reflecting pattern formed over the absorber. The exposure mask for EUV prevents re-absorption of light reflected from a reflector by an absorber pattern to prevent a shadowing effect. As a result, a photoresist pattern reflects... Agent: Townsend And Townsend And Crew, LLP

20090325080 - Method and structure for fabricating dark-periphery mask for the manufacture of semicondutor wafers: A method for manufacturing an integrated circuit devices. The method includes providing a substrate, which includes an opaque film overlying the substrate, an overlying negative photoresist layer, a stop layer overlying the negative photoresist layer, and a positive photoresist layer overlying the stop layer. The method includes patterning the positive... Agent: Townsend And Townsend And Crew, LLP

20090325082 - Method for fabricating patterns using a photomask: Disclosed herein is a method for fabricating a pattern using a photomask that includes forming a first light shielding layer pattern over a substrate; forming a first resist layer pattern aligned to the first light shielding layer pattern over the first light shielding layer pattern; forming a phase shift region... Agent: Marshall, Gerstein & Borun LLP

20090325084 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure light. An etching mask film serving as an etching mask when forming a phase shift part is provided on the front... Agent: Sughrue Mion, PLLC

20090325083 - Photomask manufacturing method: A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of... Agent: Sughrue Mion, PLLC

20090325085 - Stencil design and method for improving character density for cell projection charged particle beam lithography: The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP... Agent: The Mueller Law Office, P.C.

20090325086 - Color filter and method of fabricating the same: A method of fabricating a color filter having a target transmittance distribution is provided. First, a substrate having a first photodetector thereon is provided. Thereafter, a first pixel having a first transmittance distribution is formed on the substrate. The method of forming the first pixel includes forming a first organic... Agent: J C Patents

20090325088 - Method and apparatus for overlay compensation between subsequently patterned layers on workpiece: Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.... Agent: Harness, Dickey & Pierce, P.L.C

20090325087 - Parallel process focus compensation: Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090325089 - Polymer containing charge transport photoconductors: A photoconductor that includes a supporting substrate, a photogenerating layer, and at least one charge transport layer that contains at least one charge transport component, and a polysiloxane/polyetherimide polymer.... Agent: Patent Documentation Center Xerox Corporation

20090325095 - Tris and bis(enylaryl)arylamine mixtures containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer that includes a charge transport component, and a mixture of a bis(enylaryl)arylamine and a tris(enylaryl)amine.... Agent: Patent Documentation Center Xerox Corporation

20090325093 - (enylaryl)bisarylamine containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and an (enylaryl)bisarylamine containing charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090325092 - Bis(enylaryl)arylamine containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a bis(enylaryl)arylamine containing charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090325094 - Imaging member: Provided is an imaging member such as photoreceptor comprising a substrate, a charge generation layer, a first charge transport layer, a second charge transport layer, and an optional overcoat layer. The first charge transport layer is formed from a first CTL formulation comprising an aromatic monoamine and a first polymeric... Agent: Fay Sharpe / Xerox - Rochester

20090325090 - Phenolic resin hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate, a first layer like a ground plane layer, an undercoat layer thereover wherein the undercoat layer contains an aminosilane and a phenolic resin, a photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090325091 - Phosphonate containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a suitable phosphonate.... Agent: Patent Documentation Center Xerox Corporation

20090325096 - Tris(enylaryl)amine containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a tris(enylaryl)amine containing charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090325097 - Developer, developer container, and image forming apparatus: An aspect of the invention provides a developer that comprises first charged particles and second charged particles that have smaller charge than the first charged particles, or that are charged opposite to the first charged particles. Here, the first particles are colored, while the second particles may be colorless. Alternatively,... Agent: Mots Law, PLLC

20090325098 - Ferromagnetic nanoparticles with high magnetocrystalline anisotropy for micr toner applications: A toner including stabilized magnetic single-crystal nanoparticles, wherein the value of the magnetic anisotropy of the magnetic nanoparticles is greater than or equal to 2×104 J/m3. The magnetic nanoparticle may be a ferromagnetic nanoparticle, such as FePt. The toner includes a magnetic material that minimizes the size of the particle,... Agent: Oliff & Berridge, PLC.

20090325099 - Toner, image forming method, and process cartridge: A toner produced by a method including dissolving or dispersing toner components comprising a colorant and at least one of a binder resin and a precursor thereof in an organic solvent to prepare a toner components liquid, dispersing the toner components liquid in an aqueous medium including a surfactant, a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090325100 - Toner, and method for producing the same: The present invention provides a toner containing at least two binder resins composed of at least a resin A and a resin B which are incompatible with each other, and a colorant, wherein the toner has an average circularity of 0.93 to 0.98 and is produced by atomizing a toner... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090325101 - Method for producing toner: The present teachings provide a method for producing a yet superior toner by emulsification aggregation. The method for producing toner by emulsification aggregation comprises the following steps (a) and (b): (a) preparing primary base particles through aggregation and fusion of base microparticles obtained by emulsifying and dispersing a binder resin... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20090325103 - Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same: e

20090325102 - Photosensitive composition and pattern forming method using same: A photosensitive composition comprises (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups... Agent: Sughrue Mion, PLLC

20090325104 - Process for manufacturing semiconductor device: An operation for forming a trench after forming a via hole includes an operation for exposing a region for forming the via hole to light and an operation for exposing a region for forming the interconnect trench. More specifically, even if chemically amplified resist is buried in the via hole... Agent: Young & Thompson

20090325105 - Printed circuit board with embedded capacitors therein, and process for manufacturing the same: Disclosed herein is a printed circuit board with embedded capacitors therein which comprises inner via holes filled with a high dielectric polymer capacitor paste composed of a composite of BaTiO3 and an epoxy resin, and a process for manufacturing the printed circuit board.... Agent: Christensen, O'connor, Johnson, Kindness, PLLC

20090325106 - Method for implant imaging with spin-on hard masks: A semiconductor fabrication method that includes forming a patterned mask (62, 72) by spin coating a developable hard mask layer (32) and a resist layer (42) over a semiconductor substrate (4). Subsequently, the resist layer (42) is exposed and developed to form a patterned resist layer (62), where the development... Agent: Hamilton & Terrile, LLP - Freescale

20090325107 - Thermal embossing of resist reflowed lenses to make aspheric lens master wafer: Methods of forming a lens master wafer having aspheric lens shapes. In one embodiment, a substrate is coated with a polymer material. Isolated sections are formed in the polymer material. The isolated sections are reflowed. The reflowed sections are formed into aspheric lens shapes using a lens stamp.... Agent: Dickstein Shapiro LLP

20090325108 - Color photographic materials with magenta minimum density dyes: Silver halide color photographic elements having multiple color imaging layers contain a permanent, pre-formed magenta dye that is present in an amount to provide a status M green density greater than 0.005 per mg/m2. This dye provides minimum density at lower cost and enables lower dye levels and a reduced... Agent: J. Lanny Tucker Patent Legal Staff

20090317729 - Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method: A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation... Agent: Sughrue Mion, PLLC

20090317731 - Mask having multiple transmittances: A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting... Agent: J C Patents

20090317727 - Means for transferring a pattern to an object: A template (10) having a first surface (13, 14), usable for transferring a pattern of the first surface to an object (20) having a second surface (23) covered by a light-sensitive coating (22), by contacting the patterned first surface with the coating, wherein the template comprises a carrier base (11)... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090317728 - Method for fabricating extreme ultraviolet lithography mask: A method for fabricating an extreme ultraviolet (EUV) lithography mask comprises forming a reflecting layer, an absorber layer, and a resist layer over a substrate; defining a plurality of split regions by partially splitting the resist layer with regular spacing; performing an exposure process, wherein the exposure region is irradiated... Agent: Marshall, Gerstein & Borun LLP

20090317730 - System and a method for improved crosshatch nanomachining of small high aspect three dimensional structures by creating alternating superficial surface channels: This invention provides the user the ability to accurately nanomachine surfaces with reduced tip induced errors. Nanomaching has two types of errors, a first type of error is brought about by the tip's shape and its aspect ratio. A second type of error due to the tip's deflection as it... Agent: Baker & Hostetler LLP

20090317732 - Pattern verification-test method, optical image intensity distribution acquisition method, and computer program: A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090317733 - Quinone compound, electrophotographic photoconductor and electrophotographic apparatus: Disclosed is a compound having excellent electron transporting ability, which is useful for electrophotographic photosensitive bodies or organic EL devices. Specifically disclosed is a novel quinone compound having a structure represented by general formula (I). Also disclosed is a highly sensitive, positive charge type electrophotographic photosensitive body for copying machines... Agent: Rabin & Berdo, PC

20090317734 - Electrophotographic apparatus, electrophotographic photoconductor drum, developing device and image forming device: An electrophotographic apparatus includes a photoconductor, a plurality of a series of bump portions formed on a surface of the photoconductor, the bump portions having slopes with respect to a circumferential direction of the photoconductor, and each of the bump portions being spaced apart by a predetermined interval from adjacent... Agent: Posz Law Group, PLC

20090317736 - Toner for hybrid development, developer for hybrid development and image-forming apparatus: A toner for hybrid development, comprising toner particles containing at least a binder resin and a colorant and being charged when made in friction-contact with a carrier; reverse polarity particles that are charged to polarity reversed to the charged polarity of the toner particles when made in friction-contact with the... Agent: Buchanan, Ingersoll & Rooney PC

20090317735 - Toner manufacturing method, a toner manufacturing apparatus, and a toner: A toner manufacturing method, a toner manufacturing apparatus, and a toner are disclosed. The toner manufacturing apparatus includes a droplet generating unit that includes a thin film in which plural nozzles are formed, and an annular vibrating unit that is arranged at a perimeter of a deformable domain of the... Agent: Cooper & Dunham, LLP

20090317737 - Color toner and preparation method thereof: A color toner is provided which has a dielectric strength equal to or lower than that of a black toner containing carbon black, and which has an improved charging rate and charge stability against changes in the environment.... Agent: Dla Piper LLP Us

20090317738 - Method and apparatus for producing toner: A method for producing a toner, including ejecting a toner composition liquid containing at least a resin and a colorant periodically from a plurality of nozzles into a chamber using a vibration unit, so as to form droplets in a gas phase; and solidifying the droplets, wherein the droplets are... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090317739 - composition for coating over a photoresist pattern: m

20090317740 - Composition containing hydroxylated condensation resin for forming resist underlayer film:

20090317741 - Compound, acid generator, resist composition and method of forming resist pattern: (wherein, R41, R42, and R43 each independently represents an alkyl group, an acetyl group, an alkoxy group, a carboxy group, or a hydroxyalkyl group; n1 represents an integer of 0 to 3; n2 and n3 each independently represents an integer of 0 to 3; not all of n1, n2, and... Agent: Knobbe Martens Olson & Bear LLP

20090317742 - Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device: The present invention relates to a photosensitive composition, which is capable of being irradiated with high energy beam having a wave length of 1 to 300 nm band. The photosensitive composition includes a binder resin; and a photoelectron absorbent, capable of being excited with photoelectron emitted from the binder resin... Agent: Mcginn Intellectual Property Law Group, PLLC

20090317744 - Polymer and chemically amplified resist composition comprising the same: wherein R10 represents a hydrogen atom etc., R11 represents a methyl group, R12 is independently in each occurrence a carboxyl group etc., j represents an integer of 0 to 3, a represents an integer of 0 to 5, b represents an integer of 0 to 3, c represents an integer... Agent: Birch Stewart Kolasch & Birch

20090317743 - Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090317745 - Positive resist composition and method of forming resist pattern: r

20090317746 - Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board:

20090317747 - Anti-reflective coatings using vinyl ether crosslinkers: Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the... Agent: Hovey Williams LLP

20090317748 - Method for forming fine patterns of semiconductor device: A method for forming fine patterns of a semiconductor device employs a double patterning characteristic using a mask for forming a first pattern including a line pattern and a mask for separating the line pattern, and a reflow characteristic of a photoresist pattern.... Agent: Marshall, Gerstein & Borun LLP

20090317749 - Method for forming patterns of semiconductor device by using mixed assist feature system: Disclosed is a method for forming patterns of a semiconductor device, which includes: arranging dense patterns to be transferred in a dense pattern region of a wafer; inserting a first dummy pattern for restricting pattern distortion of the dense patterns in an outside of the array of the dense patterns;... Agent: Townsend And Townsend And Crew, LLP

20090317750 - Method for manufacturing piezoelectric/electrostrictive film type element: A manufacturing method for a piezoelectric/electrostrictive film type element and a film constituting a laminated vibrator made of laminations of an electrode film and a piezoelectric/electrostrictive film in a plane position. The piezoelectric/electrostrictive film type element includes a substrate, a lower electrode film provided on the substrate, and a laminated... Agent: Burr & Brown

20090317751 - Optical arrangement of autofocus elements for use with immersion lithography: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which... Agent: Oliff & Berridge, PLC

20090317753 - Bicyclo compound, method for producing pentacene and a film thereof using the same, and method for producing bicyclo compound: wherein R1 and R3 each denotes a group to form an aromatic ring or a heteroaromatic ring which may be substituted, together with a group to which each thereof is bonded; R2 and R4 each denotes a hydrogen atom, an alkyl group, an alkoxy group, an ester group or a... Agent: Fitzpatrick Cella Harper & Scinto

20090317752 - Rinse liquid for lithography and method for forming resist pattern using same: The present invention provide with a rinse solution for lithography and a resist pattern forming method using the same, which can prevent an inclination and peeling-off of a resist pattern and form a resist pattern having a high aspect ratio with high reproducibility. The rinse solution for lithography of the... Agent: Az Electronic Materials Usa Corp. Industrial Property Department

20090311613 - Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same: A mask for exposure, which is used in a multi-column electron beam exposure apparatus having multiple column cells, includes a stencil pattern group constituted by multiple stencil patterns for each of the multiple column cells. The stencil pattern groups are arranged at intervals corresponding to arrangement intervals of the multiple... Agent: Muramatsu & Associates

20090311612 - Photomask: A photomask which improves the imaging performance that the photomask has and forming a good micro image on a wafer in photolithography with a half pitch of 60 nm or less. Provided is a photomask used for photolithography using an ArF excimer laser as an exposing source for immersion exposure... Agent: Ladas & Parry LLP

20090311614 - Charge director for liquid toner: p

20090311615 - Method of photolithographic patterning: A method of photolithographic patterning mainly includes: converting a first photolithographic pattern by a digital transformation in a first magnification to a second photolithographic pattern; producing a first optical reticle corresponding to the second photolithographic pattern by an initial lithography in a 1-to-1 image transfer; fabricating a second optical reticle... Agent: J C Patents

20090311616 - Electrophotographic photoconductor: An electrophotographic photoconductor including an electroconductive support and a photoconductive layer provided thereon, wherein the photoconductive layer includes a charge generating material, an electron transporting material and a hole transporting material, the electron transporting material being a diphenoquinone compound represented by formula (1) described herein, the hole transporting material being... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090311617 - Black magnetic iron oxide particles, magnetic carrier for electrophotographic developer and two-component developer:

20090311618 - Surface-modified non-magnetic mono-component color toner with improvements in background contamination and transfer efficiency and method of preparing the same: Provided is a non-magnetic mono-component color toner with improved charge properties by surface modification with a charge control agent. The color toner is prepared by spheroidizing toner core particles including a binder and a colorant in the presence of 0.5 to 3 parts by weight of a charge control agent... Agent: Mckenna Long & Aldridge LLP

20090311619 - Toner for electrophotography and binder resin for toner: Disclosed is a toner for electrophotography containing at least a binder resin. This toner for electrophotography is characterized in that (a) the tetrahydrofuran (THF) soluble content in the toner has a first peak in the molecular weight region of not less than 2,000 but less than 5,000 and a second... Agent: Buchanan, Ingersoll & Rooney PC

20090311620 - Carrier, two-component developer comprising the same, and developing device and image forming apparatus using the two-component developer: A carrier has a thermosetting silicone resin layer formed of a core particle and a thermosetting silicone resin on the surface of the core particle, and the thermosetting silicone resin layer is formed by subjecting a thermosetting silicone resin to a thermosetting treatment at a temperature lower than the melting... Agent: Nixon & Vanderhye, PC

20090311622 - Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film: A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon... Agent: Ditthavong Mori & Steiner, P.C.

20090311623 - Photolithography: The invention relates to a method of photolithography comprising the steps of: providing a substrate and forming a layer of a photoresist (100) on the substrate, performing a first exposure (120) in which a predetermined part of the layer of photoresist is irradiated through a mask having a pattern for... Agent: Nxp, B.v. Nxp Intellectual Property & Licensing

20090311621 - Support for planographic printing plate material, manufacturing method thereof, and planographic printing plate material employing the same: An objective is to provide a light sensitive planographic printing plate material exhibiting excellent tone reproduction, printing durability and anti-stain property during printing at high printing pressure; a support employed for the material; a manufacturing method thereof; and a plate-making method of the light sensitive planographic printing plate material. Also... Agent: Lucas & Mercanti, LLP

20090311624 - Resist underlayer film forming composition containing liquid additive: To provide a resist underlayer film forming composition for lithography that is used in a lithography process for production of a semiconductor device. There is provided a resist underlayer film forming composition used in a lithography process for production of a semiconductor device, comprising a resin (A), a liquid additive... Agent: Oliff & Berridge, PLC

20090311625 - Method for forming photoresist pattern and photoresist laminate: A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound;... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090311626 - Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.... Agent: Raymond L. Owens Patent Legal Staff

20090311627 - Resist composition for immersion exposure and method of forming resist pattern using the same: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090311628 - Method for etching an ultra thin film: A method for etching an ultra thin film is provided which includes providing a substrate having the ultra thin film formed thereon, patterning a photosensitive layer formed over the ultra thin film, etching the ultra thin film using the patterned photosensitive layer, and removing the patterned photosensitive layer. The etching... Agent: Haynes And Boone, LLPIPSection

20090311629 - Method for manufacturing roller mold: A method for manufacturing a roller mold is described, including the following steps. A body is provided, wherein the body is a cylinder. A photoresist layer is formed to completely cover a cambered surface of the body. A mold including a pattern structure including a convex portion and a concave... Agent: Chih Feng Yeh Brian M. Mcinnis

20090311630 - Process for producing optical component: The present invention relates to a process for producing an optical component, the process including: disposing a transparent stamp tool on a substrate or an imaging element through a transparent ultraviolet-curable resin composition layer; and irradiating the resin composition layer with an ultraviolet ray through the transparent stamp tool to... Agent: Sughrue-265550

20090311632 - Developing method and developing apparatus: A developing method comprising a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the... Agent: Burr & Brown

20090311631 - Near-field exposure apparatus and near-field exposure method: A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative alignment of the near-field exposure mask and the substrate to be exposed, a mechanism to closely contact the near-field exposure mask... Agent: Fitzpatrick Cella Harper & Scinto

20090311635 - Double exposure patterning with carbonaceous hardmask: Methods to pattern features in a substrate layer by exposing a photoresist layer more than once. In one embodiment, a single reticle may be exposed more than once with an overlay offset implemented between successive exposures to reduce the half pitch of the reticle. In particular embodiments, these methods may... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP

20090311634 - Method of double patterning using sacrificial structure: A method of patterning a thin film on a substrate is described. The method includes forming a sacrificial structure over the thin film, and forming a photo-resist layer over the sacrificial structure. The sacrificial structure has anti-reflective properties, comprises silicon and is capable of withstanding the photo-resist layer removal process... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20090311633 - Pattern forming method: A pattern forming method includes a step of forming a photosensitive organic material layer by providing, on a substrate, a photosensitive organic material which is protected by a hydrophobic photodegradable group and is capable of generating a hydrophilic group selected from the group consisting of amino group, hydroxyl group, carboxyl... Agent: Fitzpatrick Cella Harper & Scinto

20090311636 - Exposure apparatus, device manufacturing method, and aperture stop manufacturing method: A projection exposure apparatus includes an aperture stop that includes a light attenuation part that is located between a light shielding part and an opening part, and has a transmittance larger than that of the light shielding part and smaller than that of the opening part. A width of the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090311637 - Block copolymer and substrate processing method: A block copolymer that can form selectively a microphase-separated structure under exposure with an ultraviolet exposure device, and a substrate processing method by which a micropattern can be formed at a low cost on the substrate by using the block copolymer. The block copolymer has as a basic skeleton a... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090305146 - Optical recording medium and method for manufacturing the same: An optical recording medium includes a support substrate and an information recording layer which is supported on the support substrate and made of a photosensitive material which is irradiated with light to be refractive index modulated and amplitude modulated, thereby recording information. The information recording layer has the shape of... Agent: Oliff & Berridge, PLC

20090305149 - Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method: A dummy light-exposed substrate used for dummy light-exposure in an immersion exposure apparatus which exposes a substrate to light via a projection optical system and a liquid, comprises a lyophilic region, and a liquid repellent region surrounding the lyophilic region.... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090305147 - Extreme ultraviolet photolithography mask, with resonant barrier layer: The invention relates to extreme ultraviolet photolithography masks that operate in reflection. These masks comprise a lower mirror covering a substrate, and two types of reflecting zones Z1 and Z2 in order to form a phase shift mask. An etch stop layer is interposed between the lower mirror and an... Agent: Lowe Hauptman Ham & Berner, LLP

20090305148 - Pattern data creating method, photomask fabricating method, and method of manufacturing semiconductor device: A pattern data creating method according to an embodiment of the present invention creates data of a mask pattern to be arranged on a photomask. The method includes creating a test mask pattern by moving positions of plural edges in a given mask pattern according to a predetermined probability density... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305150 - Exposure method, exposure apparatus, and device manufacturing method: An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and preventing an integration value of a contact time during which the liquid of the immersion region and a first region... Agent: Oliff & Berridge, PLC

20090305151 - Lithographic apparatus and device manufacturing method: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090305152 - Semiconductor device manufacturing method: A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the first resist pattern, and forming a second resist pattern on the semiconductor substrate by using an imprinter, and then, forming... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305153 - Substrate processing method and mask manufacturing method: A substrate processing method uses a processing fluid to selectively process only a region of a portion of a processing surface of a substrate to be processed, by causing a discharge aperture and a suction aperture of a nozzle having the discharge aperture and the suction aperture for the processing... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305154 - Tri-level xerography for hypochromatic colorants: A xerogrpahic system and method use a tri-level development process in which at least one xerographic imaging unit includes a photoreceptor and a pair of developer units. A first developer unit includes a conventional first toner of a given color (CYMK) and a second developer unit includes a hypochromatic light... Agent: Oliff & Berridge, PLC.

20090305155 - Electrophotographic photoreceptor and image forming apparatus provided with the same: wherein Ar1 and Ar2, which may be the same or different, respectively represent an aryl group which may have a substituent or a monovalent heterocyclic residue which may have a substituent; R1 and R2, which may be the same or different, respectively represent a hydrogen atom, a halogen atom, an... Agent: Nixon & Vanderhye, PC

20090305156 - Pigment preparation based on an azo pigment: The invention relates to a pigment preparation which contains the mono-azo pigment of formula (1) and 0.1 to 40% by weight, preferably 0.5 to 25% by weight, in particular 1.0 to 17.5% by weight, of a pigment dispersant, in relation to the weight of the mono-azo pigment of formula (I),... Agent: Clariant Corporation Intellectual Property Department

20090305157 - Resin for toner and toner composition: A toner and a resin for toner are provided which are of good low-temperature fixing ability and good anti-blocking property of toner at high temperature and high humidity and good pulverisability. The present invention is directed to a resin for toner, the resin comprising a polyester resin (A) produced by... Agent: Edwards Angell Palmer & Dodge LLP

20090305158 - Toner and toner binder: wherein R is H or a hydrocarbon group having from 1 to 24 carbon atoms which may contain from 1 to 3 ether bonds and/or from 1 to 2 hydroxyl groups; X is a residue formed by removing H of one carboxyl group from an aromatic mono- or polycarboxylic acid,... Agent: Edwards Angell Palmer & Dodge LLP

20090305159 - Toner compositions: Toner particles are provided which may, in embodiments, include a core possessing at least one polyester resin in combination with a colorant, optional wax, and optional other additives, and a shell over the core including a high molecular weight amorphous polyester resin. The high molecular weight amorphous polyester resin in... Agent: Xerox Corporation (cdfs)

20090305160 - Toner compositions for decreasing background development in liquid electrostatic printing and methods for making and using same: A toner for use in liquid electrostatic printing, comprising: a carrier liquid; and, a plurality of toner particles, the toner particles being comprised of a pigment; and a mixture of resins, a major portion of the mixture comprising at least a first resin and a minor portion comprising at least... Agent: Hewlett-packard Company Intellectual Property Administration

20090305161 - Liquid immersion lithography: A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film... Agent: Ditthavong Mori & Steiner, P.C.

20090305162 - imageable elements and methods useful for providing waterless printing plates: An imageable element can be imaged using non-ablative processes. This element has a non-silicone, non-crosslinked layer contiguous to and under an ink-repelling crosslinked silicone rubber layer. These elements can be used for providing lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple with... Agent: Eastman Kodak Company Patent Legal Staff

20090305163 - Negative resist composition: A negative resist composition is used for either a first or second resist layer within a method of forming a resist pattern that includes the following steps (i) and (ii): (i) a step of forming the first resist layer on a substrate using a first resist composition, and then conducting... Agent: Knobbe Martens Olson & Bear LLP

20090305164 - Method for making a lithographic printing plate: A method for making a lithographic printing plate includes the steps of: (1) providing a heat-sensitive lithographic printing plate precursor including a heat-sensitive coating on a support having a hydrophilic surface or which is provided with a hydrophilic layer, the heat-sensitive coating including a first layer including a first polymer... Agent: Agfa C/o Keating & Bennett, LLP

20090305165 - Wafer exposing method, euv exposing apparatus, and eb exposing apparatus: A wafer exposing method comprising EUV-exposing a product area, which is formed as a product chip, on a wafer and EB-exposing a peripheral area on the wafer, wherein the EB exposure of a wafer different from the wafer being EUV-exposed is performed while the EUV exposure of the wafer is... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305166 - Method of manufacturing a semiconductor device: A method of manufacturing a semiconductor device according to one embodiment, includes: forming a first mask material film on a workpiece film formed on a semiconductor substrate; forming a resist pattern on the first mask material film; forming a second mask material film having a desired film thickness on the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305167 - Method for manufacturing semiconductor device: In the method for manufacturing a semiconductor device, a resist film is formed on a substrate and is processed to be provided with openings to form a first resist pattern. Additive-containing layers containing an additive that changes a state of the resist film to a soluble state for a developer... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305168 - Techniques for marking product housings: Techniques or processes for providing markings on products are disclosed. The markings provided on products can be textual and/or graphic. The techniques or processes can provide high resolution markings on surfaces that are flat or curved. In one embodiment, the products have housings and the markings are to be provided... Agent: Technology & Innovation Law Group, PC

20090305169 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device including: forming a resist film 11 on a film to be processed 32; baking the resist film 11; performing immersion exposure on the resist film 11 after the baking; performing post exposure bake on the resist film 11 after performing the immersion exposure;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305170 - Optical waveguide manufacturing method: An optical waveguide manufacturing method which obviates a developing step and stably provides greater differences in refractive index between a core and cladding layers. A core formation photosensitive resin layer is formed on a surface of an under-cladding layer, and then exposed in a predetermined pattern. A core is formed... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090305171 - Apparatus for scanning sites on a wafer along a short dimension of the sites: An exposure apparatus (210) for transferring a mask pattern (346) from a mask (212) to a substrate (214) includes a first site (315) having a first site dimension (348) along a first axis and a second site dimension (350) along a second axis that is perpendicular to the first axis.... Agent: Roeder & Broder LLP

20090305172 - Lithography simulation method, computer program product, and pattern forming method: A lithography simulation method for estimating an optical image to be formed on a substrate when a mask pattern is transferred onto the substrate includes dividing the mask pattern into first calculation areas having sizes determined by a range affected by OPC, the range being obtained correspondingly to an exposure... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305173 - Formation of a device using block copolymer lithography: The formation of a device using block copolymer lithography is provided. The formation of the device includes forming a block copolymer structure. The block copolymer structure includes a first polymer and a second polymer. The block copolymer structure also includes a first component deposited between adjacent blocks of the first... Agent: Pietragallo Gordon Alfano Bosick & Raspanti, LLP

20090305174 - Method of forming resist pattern: Provided is a method of forming a resist pattern capable of forming a resist pattern, whose dimensional variations and defects are reduced as far as possible, with a high throughput. The invention provides a method of forming a resist pattern involving the following: forming a resist film on a substrate;... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090305176 - Exposure apparatus and method of manufacturing device: An exposure apparatus includes a first measurement device, a second measurement device, and a controller. The first measurement device measures the position of a substrate stage in the optical axis direction when the substrate stage is scanned in the first direction. The second measurement device measures the surface positions of... Agent: Fitzpatrick Cella Harper & Scinto

20090305175 - Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method: A surface position detecting apparatus comprises a light-sending optical system which makes first light from a first pattern and second light from a second pattern incident at different incidence angles to a predetermined surface to project an intermediate image of the first pattern and an intermediate image of the second... Agent: Staas & Halsey LLP