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Radiation imagery chemistry: process, composition, or product thereof November recently filed with US Patent Office 11/09

20090291372 - Pellicle and method for producing pellicle: A pellicle film of a silicon single crystal film and a base substrate supporting the pellicle film are formed of a single substrate using an SOI substrate. The base substrate is provided with an opening whose ratio in area to an exposure region when a pellicle is used on a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090291373 - Green photoresist and color filter substrate using the same: In a green photoresist for a color filter substrate, GY×Gy is greater than 33 when the green photoresist is tested by a standard C light source and Gy is greater than or equal to 0.6. A light beam from the standard C light source after passing through the green photoresist... Agent: Hdls Patent & Trademark Services

20090291374 - Exposure aligning method and exposure apparatus: In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second shift amount indicating a shift amount of the lower layer pattern in at lease one past lot... Agent: Mcginn Intellectual Property Law Group, PLLC

20090291375 - Full color image formation process:

20090291377 - Electrophotographic toner: A set of toners comprising a yellow toner, a magenta toner, a cyan toner and a black toner for forming a full color image with an electrophotographic method, wherein the yellow toner comprises toner particles containing at least one pigment selected from the group consisting of C. I. Pigment Yellow... Agent: Lucas & Mercanti, LLP

20090291376 - Full-color image forming method: Disclosed is a full-color image forming method by which an image exhibiting comfortable image quality reliably suitable for a human visual system can be obtained in such a way that a halftone image exhibiting excellent granularity and evenness thereof is acquired.... Agent: Lucas & Mercanti, LLP

20090291378 - Electrophotographic toner set: Provided is a set of toners comprising a yellow toner, a magenta toner, a cyan toner and a black toner for forming a full color image with an electrophotographic method, wherein the yellow toner comprises toner particles containing at east one pigment selected from the group consisting of C. I.... Agent: Lucas & Mercanti, LLP

20090291380 - Toner: A toner in which, in a loss tangent (tan δ) curve obtained by a dynamic viscoelasticity test, the tan δ shows a maximal value δa in the temperature region of 28.0-60.0° C., which maximal value δa is 0.50 or more, and shows a minimal value δb in the temperature region... Agent: Fitzpatrick Cella Harper & Scinto

20090291379 - Toner for electrostatic charge image development: t

20090291381 - Electrophotographic toner: Provided is a toner comprising toner particles containing a binder resin and coloring matters, wherein the coloring matters comprise a dye represented by Formula (X-1), a metal compound represented by Formula (1) and a quinacridone pigment represented by Formula (2):... Agent: Lucas & Mercanti, LLP

20090291382 - Electrostatic latent image developing toner and method of image forming: An electrostatic latent image developing toner comprising at least a resin, a wax and a colorant, wherein the wax comprises 40 to 98% by mass of a first release agent comprising an ester wax and 2 to 60% by mass of a second release agent comprising a hydrocarbon having at... Agent: Lucas & Mercanti, LLP

20090291383 - Toner: Toner characterized in that assuming that the glass transition point of the toner measured by a differential scanning calorimeter (DSC) is represented by T1 (° C.), in a micro compression test at T1−10 (° C.), when a load from 0.00 N (0.00 mgf) to 7.85×10−4 N (80.00 mgf) is applied... Agent: Fitzpatrick Cella Harper & Scinto

20090291384 - Method of manufacturing toner, apparatus of manufacturing a toner, a toner, an image forming method and an image forming apparatus: A method of manufacturing a toner including a first dispersing wherein (i) at least two binder resins having different weight average molecular weight, (ii) a coloring agent and (iii) a releasing agent are dispersed in an organic solvent to obtain an oil phase, a second dispersing comprising continuously mixing the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090291385 - Image forming apparatus and method of forming color image using the same: Provided are an image forming apparatus and a method of forming a color image using the same. The image forming apparatus including an image forming medium which includes a plurality of cells, wherein each cell operates independently, and the cells are charged according to a color image to be recorded,... Agent: Sughrue Mion, PLLC

20090291386 - Image forming apparatus and method of forming color image using the same: Provided are an image forming apparatus and a method of forming a color image using the same. The image forming apparatus includes: an image forming medium forming a latent image and having a plurality of cells, wherein each cell operates independently and the cells are charged according to a color... Agent: Sughrue Mion, PLLC

20090291390 - Acid generating agent for chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group,... Agent: Davidson, Davidson & Kappel, LLC

20090291388 - Method for forming a self-aligned hard mask for contact to a tunnel junction: A method of forming a hard mask in a semiconductor device which is self-aligned with a MTJ formed in the device is provided. The method includes the steps of: forming a hard mask material layer on an upper surface of a magnetic stack in the MTJ; forming an anti-reflective coating... Agent: Ryan, Mason & Lewis, LLP

20090291387 - Method of imaging and developing positive-working imageable elements: A method of making imaged elements such as lithographic printing plates is achieved by imagewise exposing an infrared radiation-sensitive positive-working imageable element to provide exposed and non-exposed regions. The imaged element is developed using a single processing solution having a pH of from about 9 to about 11.5 and containing... Agent: Andrew J. Anderson Patent Legal Staff

20090291389 - Photopatternable dielectric materials for beol applications and methods for use: A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted... Agent: Schmeiser, Olsen & Watts

20090291391 - Optical information-recording medium, method for manufacturing optical information-recording medium, method for visible information recording, use of mixture, and mixture: This invention provides an optical information recording medium that can record information by laser beam irradiation. The optical information recording medium comprises a visible information recording layer on which visible information is to be recorded. The visible information recording layer contains a coloring matter, and at least one metal atom... Agent: Sughrue Mion, PLLC

20090291392 - Wet developable bottom antireflective coating composition and method for use thereof: The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected... Agent: Scully, Scott, Murphy & Presser, P.C.

20090291393 - Positive photoresist composition and method of forming photoresist pattern using the same: A positive photoresist composition capable of forming a film thickness of 5 μm or greater, preventing cracking due to thermal shock even if exposed to a low temperature atmosphere, having high sensitivity, and easily releasable with general solvents; and a method of forming a photoresist pattern using the positive photoresist... Agent: Knobbe Martens Olson & Bear LLP

20090291394 - Manufacturing method of printing plate using free-seal, free-quantity liquid photopolymer sachet and apparatus using the same: This invention is related to a manufacturing method of a printing plate by using a free-seal, free-quantity liquid photopolymer sachet and an apparatus thereof. Using this technology, the liquid photopolymer sachet is no longer to be limited by quantity with 3 dimensions—width, length and thickness. It is now very free,... Agent: Hilson Huang

20090291395 - Methods for imaging and processing positive-working imageable elements: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a positive-working imagable element having inner and outer imagable layers. One or both layers contain a polymeric binder having pendant 1H-tetrazole groups. The imaged element is developed with a single processing solution... Agent: Andrew J. Anderson, Patent Legal Staff Eastman Kodak Company

20090291396 - Process for on-press developing high speed laser sensitive lithographic printing plate: A method of on-press developing a high-speed laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed... Agent: Gary Ganghui Teng

20090291397 - Methods of forming structures supported by semiconductor substrates: Some embodiments include methods of forming structures supported by semiconductor substrates. Radiation-imageable material may be formed over a substrate and patterned into at least two separated features. A second material may be formed over the features and across one or more gaps between the features. At least one substance may... Agent: Wells St. John P.s.

20090291398 - Liquid discharge head producing method: Three positive-type photosensitive material layers which are photosensitive to light having the same wavelength range are provided on a substrate, and an intermediate layer contains a light-absorbing agent. The ultraviolet absorbing agent contains in the intermediate layer prevents the intermediate layer and lower layer from being exposed during the exposure... Agent: Fitzpatrick Cella Harper & Scinto

20090291399 - Coating/developing apparatus and method: A coating/developing apparatus includes a first storage section that stores data comprising correlations of different pattern information units including at least a line width of the resist pattern, different values of a film thickness of the underlying film, and different light information profiles. The apparatus further includes a mechanism configured... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090286165 - Hologram laminate, hologram copy method, and hologram producing method: A hologram laminate is provided. The hologram laminate includes a hologram record layer, and a surface protection layer. The hologram record layer is made of a photosensitive material. The surface protection layer is coated on one surface of the hologram record layer. The surface protection layer is made of an... Agent: K&l Gates LLP

20090286167 - Cross technology reticles: A method of fabricating a device is presented. The method includes forming a mask that includes multiple images. A substrate is patterned using the mask. An image of the multiple images corresponds to a respective patterning process. The substrate is processed further to complete the processing of the substrate to... Agent: HorizonIPPte Ltd

20090286171 - Lithographic mask and manufacturing method thereof: Cleaning is carried out by using a sulfuric acid type detergent at a resist stripping and cleaning step (step 5) in a semitranslucent portion forming process and a resist stripping and cleaning step (step 10) in a shielding band forming process, and a sulfuric acid removing step of partially or... Agent: Sughrue-265550

20090286168 - Method for stripping pellicle and stripping apparatus used therein: A method for stripping a pellicle from an exposure master plate is provided, the pellicle being a lithographic pellicle that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate pressure-sensitive adhesion layer provided... Agent: Kratz, Quintos & Hanson, LLP

20090286170 - Pellicle: A pellicle used in semiconductor lithography is provided and comprises a pellicle frame made of aluminum or an aluminum alloy. The surface of the frame is free of pigment.... Agent: Millen, White, Zelano & Branigan, P.C.

20090286169 - Pellicle for use in semiconductor lithography: A pellicle used in semiconductor lithography is provided and includes a photomask adhesive layer for affixing the pellicle to a photomask. The photomask adhesive layer has a surface layer and a lower layer. The lower layer has one or more sub-layers. A Young's modulus of the surface layer is higher... Agent: Millen, White, Zelano & Branigan, P.C.

20090286166 - Process for smoothing surface of glass substrate: A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090286173 - Electronic component forming apparatus, electronic component formed with it and forming method thereof: An electronic component forming apparatus for forming an electronic component by radiating light to a photosensitive conductive resin provided on a forming work material, comprising radiation device for radiating light to the forming work material, detection device for detecting reflecting light reflected from the forming work material, and control device... Agent: Wenderoth, Lind & Ponack L.L.P.

20090286174 - Manufacturing method and manufacturing system of semiconductor device: In an exposure process forming a predetermined circuit pattern of a semiconductor device on a wafer, a resist dimension of the resist pattern formed on a wafer and a focus position in the exposure process at past time are measured, a resist dimension and a focus position of a wafer... Agent: Mattingly & Malur, P.C.

20090286172 - Surface shape measurement apparatus and exposure apparatus: A surface shape measurement apparatus is configured to measure a surface shape of an object to be measured, and includes a beam splitter configured to split white light from a light source into two light beams, a pair of prisms each configured to increase an incident angle of each light... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090286175 - Organic photoreceptor, image forming apparatus, process cartridge, and color image forming apparatus: An organic photoreceptor comprising a photosensitive layer on a conductive substrate and a protective layer on the photosensitive layer, wherein the protective layer is a surface layer prepared via reaction curing of a compound having a radical polymerizable, curable functional group using a polymerization initiators and the content of the... Agent: Lucas & Mercanti, LLP

20090286176 - Electrophotographic color toner: A set of a yellow toner, a magenta toner, a cyan toner and a black toner is disclosed. Each of the color toners contains a colored particle and cerium oxide particles, the colored particle containing an amorphous polyester resin, a crystalline polyester resin, a colorant and a releasing agent; and... Agent: Lucas & Mercanti, LLP

20090286177 - Adjustable gloss document printing: A method and system for printing adjustable gloss image documents using a variety of toners where some toners have a relatively low melt viscosity and others have a relatively high melt viscosity. These toners are co-printed prior to fixing, on the receiver proximate to and overlying at least a portion... Agent: Andrew J. Anderson Patent Legal Staff

20090286181 - Clear and colorless three-dimensional articles made via stereolithography and method of making said articles: The invention is a radiation curable liquid resin that can be used to make a clear and colorless, three-dimensional article by a stereolithography process. The clear and colorless three-dimensional articles have a clarity and transmittance of greater than about 67% as measured by UV-Visible spectrophotometer in the 400-500 nm range;... Agent: Nixon & Vanderhye, PC

20090286180 - Fused aromatic structures and methods for photolithographic applications: A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, and a photosensitive acid generator. The method includes... Agent: Schmeiser, Olsen & Watts

20090286179 - Positive resist composition and method of forming resist pattern: r

20090286178 - Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition: A process for producing a resist composition that yields a resist composition in which the occurrence of defects has been suppressed, a filtering apparatus that can be used favorably within the production process, a resist composition applicator that is fitted with the filtering apparatus, and a resist composition in which... Agent: Knobbe Martens Olson & Bear LLP

20090286182 - Resist protective coating composition and patterning process: A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl)acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second polymer containing sulfonic acid and/or sulfonic acid amine salt in repeat units is applied onto a resist film. The protective coating is effective in minimizing... Agent: Birch Stewart Kolasch & Birch

20090286183 - Truly processless lithographic printing plate precursor: A true processless lithographic printing precursor comprising a substrate, a layer of imaginable element on the substrate. The imaginable element comprising: (1) a substance capable of converting radiation into heat; (2) hydrophobic polymer particles and (3) hydrophilic polymer particles. The imaginable element can not be removed by water or fountain... Agent: Yisong Yu

20090286184 - Method for manufacturing conductive member pattern: A method capable of easily and simply manufacturing a conductive member pattern such as a nano-size fine wiring or electrode is disclosed. Specifically, the disclosed method for manufacturing a conductive member pattern includes the steps of: forming an ion-exchangeable resin pattern on a substrate by using a photosensitive resin; making... Agent: Fitzpatrick Cella Harper & Scinto

20090286185 - Method of manufacturing semiconductor device: Disclosed herein is a method of manufacturing a semiconductor device that includes: performing a first exposure process with a first exposure mask having a first space pattern formed in a first direction; performing a second exposure process with a second exposure mask different from the first exposure mask, the second... Agent: Marshall, Gerstein & Borun LLP

20090286186 - Method of manufacturing a coordinate detector: A method of manufacturing a coordinate detector having a resistive film and a common electrode for applying a voltage to the resistive film is disclosed that includes the steps of (a) applying a photoresist onto the resistive film formed on a substrate formed of an insulator; (b) forming a resist... Agent: Ipusa, P.l.l.c

20090286187 - Manufacturing method of optical waveguide device: To provide a manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a surface of a metal substrate. An under cladding layer 2 containing an irradiation light absorbing agent... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090286188 - Patterning process: A resist patterning process of the present invention using a positive-negative reversal comprises at least a step of forming a resist film by applying a positive resist composition; a step of obtaining a positive pattern by exposing and developing the resist film; a step of crosslinking the positive resist pattern... Agent: Oliff & Berridge, PLC

20090280415 - Transparent substrate for mask blank and mask blank: In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.... Agent: Sughrue Mion, PLLC

20090280416 - Black photosensitive resin composition, and color filter and method of producing the same: A black photosensitive resin composition, a light-shielding color filter using the composition and its production method are provided, the black photosensitive resin composition including: a black colorant; a compound represented by Formula (I) or (II) as defined in the specification; and a photopolymerization initiator.... Agent: Sughrue-265550

20090280418 - Exposure apparatus, correction method, and device manufacturing method: An exposure apparatus comprising a projection optical system configured to project a pattern of an original onto a substrate; and a control unit, wherein the control unit acquires a result of measuring a line width of an image of a first mark and a position of an image of a... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090280417 - Method for fabricating mold core: An exemplary method for fabricating a mold core includes the following steps. First, a substrate is provided. Second, a photo resist layer is formed on the substrate, the photo resist layer has a top surface. Third, the photo resist layer is etched using a direct writing process to form the... Agent: PCe Industry, Inc. Att. Steven Reiss

20090280419 - Electrophotographic photoreceptor and image forming apparatus:

20090280420 - Organic photoreceptor, image forming method, image forming apparatus, and image forming unit: An organic photoreceptor comprising a conductive support having thereon at least an intermediate layer and a photosensitive layer, wherein a skewness Rsk of a cross sectional curve of a surface of the conductive support meets the condition of −8<Rsk<0, a method of forming an image and an image forming unit... Agent: Lucas & Mercanti, LLP

20090280421 - Method of manufacturing toner and toner: A method of manufacturing a toner including dispersing a binder resin, a coloring agent and a releasing agent in an organic solvent to obtain an oil phase; dispersing the oil phase in an aqueous medium with a shearing force to obtain a dispersion emulsion; wherein the shearing force is made... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280422 - Toner for development of electrostatic image: A toner for development of electrostatic images, comprising colored resin particles containing a binder resin and a colorant, and an external additive, wherein the external additive contains fine particles of an inorganic layered clay compound, and the inorganic layered clay compound is an intercalation compound with a quaternary ammonium ion... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090280426 - Toner for electrostatic image development: wherein each of R1 and R4, which may be identical or different, is a linear or branched alkyl group having 3 to 8 carbon atoms; each of R2, R3, R5, and R6, which may be identical or different, is a hydrogen atom, an alkyl group having 1 to 8 carbon... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280423 - Method for producing resin dispersions and resin particles: The present invention concerns a method for producing an aqueous dispersion (X1), the method including a step that includes mixing an aqueous dispersion liquid (W) of resin particles (A) comprising a resin (a) with a precursor (b0) of a resin (b) or an oily liquid (OL) comprising the precursor (b0)... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090280424 - Toner for developing electrostatically charged image and process for producing the same: Provided as toners for developing electrostatically charged images capable of preventing a sticking and curling phenomenon even with an increase in number of printed sheets and processes for producing the same, with the use of a cyclic polyolefinic resin, are a toner for developing electrostatically charged images contains a cyclic... Agent: Jordan And Hamburg LLP

20090280425 - Black toner formulations: Black toner formulations for electrophotography. The black toner formulations include an optimum concentration of one or more black colorants. Further, the black toner formulation includes either a polymeric dispersant, a binder, a wax, or combinations thereof. The one or more black colorants exhibit a low absorption in near infrared spectrum... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090280427 - Toner for non-contact fusing: A toner for non-contacting fusing containing toner matrix particles containing a resin binder and an external additive having an average particle size of from 10 to 100 nm, wherein the external additive is externally added to the toner matrix particles, wherein the resin binder contains one or more polyesters, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090280428 - Image formation apparatus that solves uneven gloss in a page, and image formation method and recording medium for the method: The present invention reduces delay in supplying heat to fixing nip when sheet passes therethrough and overcomes disadvantages like uneven gloss in page and fixing faults by including temperature detector 83 detecting temperatures of fixing member including heat application roller and fixing belt, leading end detector 85 detecting timing leading... Agent: Buchanan, Ingersoll & Rooney PC

20090280430 - Method for manufacturing toner: There is provided a method for manufacturing a toner capable of providing a toner having excellent low-temperature fixing property and anti-offset property by adjusting a molecular weight distribution of a polymerization toner to a narrow distribution range. The method is characterized in that a toner is polymerized using a reversible... Agent: Mckenna Long & Aldridge LLP

20090280429 - Polyester synthesis: The present disclosure provides for enzymatic polymerization to produce polyester resins suitable for use in manufacturing toners.... Agent: Xerox Corporation (cdfs)

20090280431 - Material for protective film formation, and method for photoresist pattern formation using the same: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an alkylene chain having 1 to 5 carbon atoms; R3 represents a fluorinated alkylene chain having 1 to 10 carbon atoms in which a part or all of hydrogen atoms have been substituted by a fluorine atom; and... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090280432 - Photosensitive sheets and method and apparatus for manufacturing the same: Photosensitive film can be protected in stacking photosensitive sheets and a sheet can be separated one at a time in a state where photosensitive sheets are stacked, ensuring its taking out. An apparatus for manufacturing PS plates, which is adapted to provide photosensitive film on one side of both surfaces... Agent: Sughrue Mion, PLLC

20090280433 - Radiation-sensitive composition and process for producing low-molecular compound for use therein: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per... Agent: Ditthavong Mori & Steiner, P.C.

20090280434 - Resist composition and patterning process: A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.... Agent: Birch Stewart Kolasch & Birch

20090280435 - Antireflective coating composition: c

20090280436 - Immersion system, exposure apparatus, exposing method, and device fabricating method: An immersion system is used in an immersion exposure, wherein a substrate is exposed with an exposure light through an optical member and a liquid, and that fills an optical path of the exposure light between the optical member and the substrate with the liquid. The immersion system comprises: a... Agent: Oliff & Berridge, PLC

20090280437 - Projection exposure methods and systems: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P... Agent: Fish & Richardson PC

20090280438 - Method of forming pattern: A method of forming a pattern including: forming an underlayer film on a support using an underlayer film-forming material, forming a hard mask on the underlayer film using a silicon-based hard mask-forming material, forming a first resist film by applying a chemically amplified positive resist composition to the hard mask,... Agent: Knobbe Martens Olson & Bear LLP

20090280439 - Exposure apparatus, exposure method, and device manufacturing method: A light branching unit and a reflecting mirror are fixed to a barrel in a state where the distance between the members is constantly maintained. And, a laser beam from a light source is guided to the light branching unit via an optical fiber, separated to a measurement beam and... Agent: Oliff & Berridge, PLC

20090280440 - Surface treating agent for resist-pattern, and pattern-forming method using same: A surface treating agent for resist pattern, characterized by containing not only a chemical species having a functional group capable of chemical adsorption to resist pattern and a polymerizable group but also a solvent.... Agent: Sughrue Mion, PLLC

20090280441 - Exposure method, exposure device, and micro device manufacturing method: An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the... Agent: Miles & Stockbridge PC

20090274961 - Photosensitive composition for volume type hologram memory: To provide photosensitive composition for volume type hologram memory with superior photosensitivity and large differences in reflective index before and after photo-curing and with controllable curing shrinkage. The photosensitive composition for volume type hologram memory of the present invention comprises a photo-curable volume expansion compound and a photoinitiator. According to... Agent: Birch Stewart Kolasch & Birch

20090274962 - Pellicle and method for producing pellicle: A silicon single crystal film having a crystal plane as its principal plane, the crystal plane being inclined at 3 to 5° from any lattice plane belonging to {100} planes or {111} planes is used as a pellicle film. The silicon single crystal having such a crystal plane as its... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090274963 - Measurement apparatus, measurement method, exposure apparatus, and device manufacturing method: A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 via a slit 54 on the image plane, the measurement apparatus including a stage 60 moving the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090274964 - Measuring apparatus and exposure apparatus having the same: A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system... Agent: Fitzpatrick Cella Harper & Scinto

20090274965 - Metal mercaptoimidazoles containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer, and where the at least one charge transport layer and the photogenerating layer contain a metal mercaptoimidazole.... Agent: Patent Documentation Center Xerox Corporation

20090274966 - Phenazine containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein at least one of the photogenerating layer and charge transport layer contains a phenazine.... Agent: Patent Documentation Center Xerox Corporation

20090274969 - Phenothiazine containing photogenerating layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a phenothiazine.... Agent: Patent Documentation Center Xerox Corporation

20090274968 - Pyrazine containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the charge transport layer contains a pyrazine.... Agent: Patent Documentation Center Xerox Corporation

20090274967 - Quinoxaline containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein at least one of the photogenerating layer and charge transport layer contains a quinoxaline, including derivatives thereof.... Agent: Patent Documentation Center Xerox Corporation

20090274971 - Thiophthalimides containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a thiophthalimide containing photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090274970 - Carbazole containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the charge transport layer contains a carbazole.... Agent: Patent Documentation Center Xerox Corporation

20090274972 - Electrostatic-image-developing toner, method of producing the same, electrostatic image developer, image forming method and image forming apparatus: An electrostatic-image-developing toner includes a phosphonic acid based sequestering agent.... Agent: Oliff & Berridge, PLC

20090274973 - Liquid developer, process cartridge, and image forming apparatus: A liquid developer includes: an aqueous medium; and a magnetic toner which is substantially dispersed in the aqueous medium and includes a polymer compound and a magnetic powder, the amount of the magnetic powder being from about 0.2 volume % to about 5 volume % with respect to the magnetic... Agent: Fildes & Outland, P.C.

20090274977 - Compound and radiation-sensitive composition: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.... Agent: Ditthavong Mori & Steiner, P.C.

20090274976 - Negative resist composition for immersion exposure and method of forming resist pattern: A negative resist composition for immersion exposure including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C); and a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090274975 - Positive photosensitive composition and method of forming pattern therewith: wherein each of R1, R2 and R3 independently represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted cycloalkyl group, provided that R2 and R3 may be bonded with each other to thereby form a ring structure, and Ra represents a hydrogen atom, an alkyl group or a... Agent: Sughrue Mion, PLLC

20090274974 - Spin-on graded k silicon antireflective coating: Graded absorption silicon based antireflective coating compositions are described.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090274978 - Novel photoacid generator, resist composition, and patterning process: a

20090274979 - Device and method for removing overcoat of on-press developable lithographic plate: A device as well as method for removing the overcoat without developing an imagewise exposed lithographic printing plate is disclosed. The device comprises a structure for providing water or an aqueous solution and a transfer means for transporting said plate through said structure. The plate comprises a substrate, an ink... Agent: Gary Ganghui Teng

20090274980 - Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion: A method of forming fine patterns of a semiconductor device according to a double patterning process that uses acid diffusion is provided. In this method, a plurality of first mask patterns are formed on a substrate so as to be separated from one another. A capping film including an acid... Agent: Myers Bigel Sibley & Sajovec

20090274981 - Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions: Mask defects, such as crystal growth defects and the like, may be efficiently detected and estimated at an early stage of their development by generating test images of the mask under consideration and inspecting the images on the basis of wafer inspection techniques in order to identify repeatedly occurring defects.... Agent: Williams, Morgan & Amerson

20090274982 - Method of making a semiconductor device using negative photoresist: Negative photoresist over an insulating layer is exposed to radiation according to a pattern for an opening in the insulating layer for filling conductive material. A post of the negative photoresist is left over the location where the opening in the insulating layer is to be formed. A developable hard... Agent: Freescale Semiconductor, Inc. Law Department

20090274984 - Carboxyl-containing lactone compound, polymer, resist composition, and patterning process: Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and... Agent: Birch Stewart Kolasch & Birch

20090274983 - Scanning exposure apparatus and method of manufacturing device: A scanning exposure apparatus (300) includes a first stage (325), a second stage (345), a projection optical system (330), a first measurement unit (20) arranged on the second stage (345), and a controller (350). A measurement mask (10) is arranged on the first stage (325). The first measurement unit (20)... Agent: Canon U.s.a. Inc. Intellectual Property Division