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Radiation imagery chemistry: process, composition, or product thereof October categorized by USPTO classification 10/09

20090258301 - Fabricating and using hidden features in an image: Some implementations of the invention provide hidden static images. Some such images can only be perceived when viewed from an angle to the normal to a surface. Such images may appear as a solid color when viewed along an axis perpendicular to a surface, but may reveal a hidden image... Agent: Weaver Austin Villeneuve & Sampson LLP - Qual

20090258303 - Method of fabricating a photomask using self assembly molecule: A method of fabricating a photomask includes includes forming a light blocking layer over a transparent substrate, and forming a hard mask pattern over the light blocking layer. The hard mask pattern exposes a portion of the light blocking layer. The method also includes depositing a self assembly molecule (SAM)... Agent: Marshall, Gerstein & Borun LLP

20090258302 - Sub-resolution assist feature of a photomask: A photomask including a main feature, corresponding to an integrated circuit feature, and a sub-resolution assist feature (SRAF) is provided. A first imaginary line tangential with a first edge of the main feature and a second imaginary line tangential with the second edge of the main feature define an area... Agent: Haynes And Boone, LLPIPSection

20090258305 - Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method: A memory medium stores a program for generating data on an original pattern used in an exposure apparatus forming an image of a target pattern on a substrate, the program comprising a determination step of determining a final assist pattern based on a light intensity distribution formed by a projection... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090258304 - Substrate processing method, program, computer-readable storage medium and substrate processing system: In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning for the first time is measured. Based on the dimension measurement result of the patterning... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090258306 - Toner image stabilization processes: Image noise is reduced in halftone imaging processes by placing clear toner particles around the colored toner particles. The clear toner particles must be placed around the colored toner particles prior to transferring the developed image from an imaging member to a receiving member or substrate. The clear toner particles... Agent: Fay Sharpe / Xerox - Rochester

20090258307 - Developer and image forming apparatus: A developer used in an image forming apparatus, the developer containing: a toner, and a carrier that charges the toner, the toner containing a core toner, and an external additive that is added to a surface of the core toner, the core toner containing a colorant, a binder resin, a... Agent: Turocy & Watson, LLP

20090258308 - Toner and method of preparing the same: The present invention provides a toner having a core-shell structure which is formed by aggregation-coalescence of latex particles having bimodal particle size distribution. The toner according to the present invention can prevent scattering and image offset by enhancing adhesiveness and charge-up rate. The toner can also have controlled particle morphology... Agent: Summa, Additon & Ashe, P.A.

20090258309 - Toner for electrostatic charge image development and method for producing the same: e

20090258310 - Producing method of spherical particle, spherical particle, toner, developer, developing device and image forming apparatus: There are provided an economical method capable of obtaining very small resin particles, in particular, resin particles; resin particles produced by the method; a toner and developer containing the resin particles; a developing device; and an image forming apparatus. Spherical particles are produced according to a producing method of spherical... Agent: Nixon & Vanderhye, PC

20090258311 - Electrophotographic developer carrier core material, electrophotographic developer carrier, methods of manufacturing the same, and electrophotographic developer: The present invention provides a carrier core material for use in the production of an electrophotographic developer which, even when applied, for example, to MFPs (multifunction printers), can realize stable, high-quality and high-speed development, and has a prolonged replacing life of magnetic carriers, and a method of manufacturing the same,... Agent: Oliff & Berridge, PLC

20090258312 - Image forming method and image forming apparatus: An image forming method and image forming apparatus based on the application thereof wherein comet-like deposits do not appear on the surface of the photoreceptor even after prolonged use of small-diameter toner, and there is no dropout or damage on the photoreceptor surface in the image forming process using an... Agent: Lucas & Mercanti, LLP

20090258314 - Negative working, heat sensitive lithographic printing plate precursor: A heat-sensitive negative-working lithographic printing plate precursor include a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye; wherein the hydrophobic thermoplastic... Agent: Agfa C/o Keating & Bennett, LLP

20090258315 - Photoacid generator compounds and compositions: The invention provides various photoacid generator compounds and ionic components thereof. Photoresist compositions that include the ions and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as... Agent: Schwegman, Lundberg & Woessner, P.A.

20090258313 - Resist composition and resist pattern forming method: The present invention provides a resist composition prepared by dissolving components in an organic solvent containing ethyl lactate, which suppresses deterioration of sensitivity with time and also has required lithographic characteristics, and a method for forming a resist pattern. The resist composition is prepared by dissolving a resin component (A)... Agent: Knobbe Martens Olson & Bear LLP

20090258316 - Method for patterning a covering material by using high-power exciting beam: The present invention relates to a method for patterning a covering material by using a high-power exciting beam. The method includes the steps of (a) providing a base material having a plurality of thin layers, the neighboring thin layers having different colors; and (b) utilizing a high-power exciting beam to... Agent: Volentine & Whitt PLLC

20090258317 - Writing apparatus and writing method: A writing apparatus includes a writing unit configured to a write a pattern onto a target workpiece, based on a writing data of the pattern to be written on the target workpiece, and a generation unit configured generate, after the pattern has been written, writing data of a figure code... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090258318 - Double patterning method: A method of making a device includes forming a first photoresist layer over an underlying layer, patterning the first photoresist layer to form a first photoresist pattern comprising a first grid, rendering the first photoresist pattern insoluble to a solvent, forming a second photoresist layer over the first photoresist pattern,... Agent: Sandisk Corporation C/o Foley & Lardner LLP

20090258319 - Exposure method and semiconductor device manufacturing method: In an exposure method, an anti-reflection film and a photoresist are stacked in order on the surface of a substrate. A periodic pattern of a pitch P is formed on a pattern surface of a photomask. A medium having a refractive index n is present between a projection lens having... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090258320 - Method of forming measuring targets for measuring dimensions of substrate in substrate manufacturing process: A method of forming measuring targets for measuring the dimensions of a substrate during a substrate manufacturing process is provided. First, a board having a base layer and a conductive layer is provided, wherein the conductive layer is disposed on a surface of the base layer. Then, at least one... Agent: J C Patents

20090258321 - Light absorbent and organic antireflection coating composition containing the same: An anti-reflection film using the compound of the present invention exhibits excellent adhesiveness and storage stability, and excellent resolution in both C/H patterns and L/S patterns. Also, the patterning method of the invention has an excellent process window, and thus excellent pattern profiles can be obtained irrespective of the type... Agent: Davidson, Davidson & Kappel, LLC

20090258322 - Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods: A wafer has a substrate and a photoresist layer thereon with a surface that is planarized by positioning over a starting surface of the photoresist layer a gray-scale mask having a pattern that correlates with a gradient height profile of unevenness present on the starting surface, patterning the photoresist layer... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090253050 - Holographic storage media: Described are holographic storage mediums and method of making holographic storage mediums. The holographic storage mediums may have write components that bind to the matrix to form a pattern in the media. The holographic storage mediums may also be rewriteable.... Agent: Morrison & Foerster LLP

20090253053 - Method of fabricating halftone phase shift mask: A method of fabricating a halftone phase shift mask, comprising: forming a structure by sequentially stacking a light blocking layer pattern defining a side surface and a phase shift layer pattern over a light transmitting substrate; and treating the structure with heat to make the phase shift layer pattern flow... Agent: Marshall, Gerstein & Borun LLP

20090253051 - Phase shift mask and method of fabricating the same: The present invention relates to a phase shift mask and a method of fabricating the same. According to an aspect of the present invention, a method of fabricating a phase shift mask includes forming a phase shift layer and a light-shielding layer over a transparent substrate including a cell area... Agent: Townsend And Townsend And Crew, LLP

20090253054 - Phase shift mask blank and method of manufacturing phase shift mask: Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an... Agent: Sughrue Mion, PLLC

20090253052 - Photomask and method of fabricating the same: A photomask comprises: a light transmitting substrate; patterns disposed over the light transmitting substrate to define a light transmitting region; and a light transmittance control layer disposed between the light transmitting substrate and the patterns having a relatively high light transmittance in a first control layer region overlapping a first... Agent: Marshall, Gerstein & Borun LLP

20090253055 - Reflective mask blank for euv lithography, and substrate with functional film for the mask blank: A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090253057 - Electrophotographic photoreceptor and image formation device provided with the same: s

20090253056 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising slippery polyhedral oligomeric silsequioxane molecules that enhance the physical and mechanical functions and reduce the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253061 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the same: An electrophotographic photoreceptor includes a conductive substrate, and a photosensitive layer, an intermediate layer having a thickness of 2 nm to 70 nm, and a surface layer, which are disposed in this order on the conductive substrate. The refractive index n1 of the photosensitive layer, the refractive index n2 of... Agent: Oliff & Berridge, PLC

20090253062 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253058 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253059 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253060 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising slippery polyhedral oligomeric silsequioxane molecules that enhance the physical and mechanical functions and reduce the... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253063 - Low friction electrostatographic imaging member: Present embodiments pertain to an improved electrostatographic imaging member having low contact friction surfaces to ease sliding mechanical interaction and suppressing abrasion/wear failure and methods of preparing thereof. The improved imaging member has layers comprising one or two low surface energy polymeric materials that enhance the physical and mechanical functions... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090253064 - Process and composition for creating customized colors by using a series of neutral gray primaries: A process for creating custom colors including: creating a plurality of neutral gray scale primary components of varying darkness levels; selecting one or more non-gray scale primary components; and combining one or more of the plurality of neutral gray scale primary components with the one or more non-gray scale primary... Agent: Xerox Corporation (cdfs)

20090253065 - Toner, process for producing toner, and two-component developing agent: A toner or two-component developer is provided. The toner includes toner base particles obtained by mixing in an aqueous medium a first resin particle dispersion, a colorant particle dispersion, and a wax particle dispersion, aggregating the mixed dispersion to form core particles at least part of which is melted, adding... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090253066 - Wet developer: A wet developer in which toner particles containing at least a colorant and a binder resin are dispersed in a non-volatile carrier solution by using a dispersant. By using as the binder resin a polyester resin having a weight-average molecular weight Mw in a range of 20,000≦Mw≦350,000, it becomes possible... Agent: Brinks Hofer Gilson & Lione

20090253068 - Image transfer system and liquid toner for use therewith: A printing method comprising: forming a first image utilizing a liquid toner comprising carrier liquid and pigmented polymer particles having a first color; transferring the first image to an intermediate transfer member; forming at least one additional image utilizing a liquid toner comprising at least one carrier liquid and pigmented... Agent: Hewlett-packard Company Intellectual Property Administration

20090253067 - Wet developer: To provide a wet developer which is capable of improving fixability, while ensuring a sufficient heat-resistant storage property. The wet developer contains toner particles composed of a colorant and a binder resin, which are dispersed in a non-volatile carrier solution by using a dispersant. As the binder resin, a polyester... Agent: Sidley Austin LLP

20090253069 - Imageable elements useful for waterless printing: A non-ablative negative-working imageable element has first and second polymeric layers under a crosslinked silicone rubber layer. These elements can be used in a simple method to provide lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple using either water or an aqueous... Agent: Andrew J. Anderson Patent Legal Staff

20090253072 - Nanoparticle reversible contrast enhancement material and method: The invention is to a reversible photobleachable material comprised of nanoparticles of indium gallium oxide or gallium oxide, and a method of exposing a substrate, such as in semiconductor manufacture, using same.... Agent: Moore & Van Allen PLLC

20090253071 - Planographic printing plate precursor: A planographic printing plate precursor comprising a hydrophilic support having a surface roughness (Ra) in a range of from 0.45 to 0.60, and, on the support, a recording layer containing a phenolic resin, an infrared absorber and a polymer having at least one selected from the group consisting of a... Agent: Moss & Burke, PLLC

20090253070 - Resist composition and pattern forming method using the same: Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).... Agent: Sughrue-265550

20090253074 - Fluorinated polymers for use in immersion lithography: The present invention relates to partially fluorinated (meth)acrylic polymers that can be blended with other (meth)acrylic polymers to provide enhanced surface properties.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090253073 - Light-sensitive component for use in photoresists: e

20090253075 - Positive resist composition, and method of forming resist pattern:

20090253076 - Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative: [Means for solving problems] A coating-type underlayer coating forming composition that is used for lithography process by multiply coating, comprising a polymer containing a vinylnaphthalene based structural unit and an acrylic acid based structural unit containing an aromatic hydroxy group or a hydroxy-containing ester. A coating-type underlayer coating forming composition... Agent: Oliff & Berridge, PLC

20090253077 - Anti-reflection film forming material, and method for forming resist pattern using the same: Wherein, R1 and R2 represent a direct bond or a methylene chain; R3 and R4 represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a group represented by —(CH2)n—O—R5—R6; and at least one of R3 and R4 is a group represented by —(CH2)n—O—R5—R6, wherein: R5... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090253078 - Double exposure lithography using low temperature oxide and uv cure process: A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing the first pattern to ultra-violet radiation. The exposure of the first pattern to ultra-violet radiation increases the resistance of... Agent: Townsend And Townsend And Crew, LLP

20090253079 - Forming reverse illumination patterns: In photolithographic exposure, the illumination pattern (120R) formed on a photosensitive surface (106) is a reverse of the pattern (130) on the optical mask (124). The reverse pattern (120R) is obtained using off-axis illumination when the photosensitive surface is at other than the best focus position.... Agent: Haynes And Boone, LLPIPSection

20090253082 - Method for forming resist pattern: A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developing the photoresist film. The lower layer film contains at least... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090253080 - Photoresist image-forming process using double patterning: A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090253081 - Process for shrinking dimensions between photoresist pattern comprising a pattern hardening step: A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090253083 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus includes a liquid supply unit which supplies a liquid to fill an optical path space for an exposure light beam therewith, a first land surface which is opposed to a surface of a substrate arranged at an exposure position and which surrounds the optical path space for... Agent: Oliff & Berridge, PLC

20090253084 - Double patterning process: Double patterns are formed by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090246642 - Holographic detection of analyte by active dye: We propose a method of detecting the presence of certain chemical and biochemical substances by virtue of the fact that they are, or have attached to them, either a dye molecule which acts as a photosensitizer for a holographic recording process, or another essential molecular component of the holographic recording... Agent: Hogan & Hartson LLP

20090246643 - Photosensitive composition containing organic-zirconia composite fine particles: [Means for solving problems] A photosensitive composition used for forming a pattern by a pattern exposure containing (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic-zirconia composite fine particles having a zirconia volume concentration of 20% by volume to 80% by volume; and a forming method of a... Agent: Oliff & Berridge, Plc

20090246646 - Lithographic pellicle: A lithographic pellicle is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and an exposure master plate adhesive provided on the other end face, wherein corners formed between a pellicle film adhesion face and exposure... Agent: Kratz, Quintos & Hanson, LLP

20090246644 - Low stress pellicle frames and reticle pellicle assemblies: Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame induces in a reticle plate. In other embodiments, a pellicle frame of reduced adhesive surface is employed to reduce the stress... Agent: Blakely, Sokoloff, Taylor & Zafman LLP

20090246648 - Photolithography scattering bar structure and method: A photolithography mask includes a design feature located in an isolated or semi-isolated region of the mask and a plurality of parallel linear assist features disposed substantially perpendicular to the design feature. The plurality of parallel linear assist features may include a first series of parallel assist features disposed on... Agent: Haynes And Boone, LLP Ip Section

20090246645 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank is for manufacturing a phase shift mask having a light-transmitting substrate provided with a phase shift portion adapted to give a predetermined phase difference to transmitted exposure light. The phase shift portion is a dug-down part that is dug down from a surface of the light-transmitting substrate... Agent: Sughrue Mion, Pllc

20090246647 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank has a light shieldable film formed on a light transmitting substrate. The light shieldable film has a light shielding layer which is formed of molybdenum silicide metal containing molybdenum in a content greater than 20 atomic % and not greater than 40 atomic % and which has... Agent: Sughrue Mion, Pllc

20090246652 - Color filter and method of fabricating the same: A color filter having a bi-layer metal grating is formed by nanoimprint lithography. Nanoimprint lithography, a low cost technology, includes two alternatives, i.e., hotembossing nanoimprint lithography and UV-curable nanoimprint lithography. Manufacture steps comprises providing a substrate with a polymer material layer disposed thereon. A plurality of lands and grooves are... Agent: Birch Stewart Kolasch & Birch

20090246649 - Green curable composition, color filter and method of producing same: The invention provides a green curable composition including a colorant in an amount of 47.5% by mass or more with respect to the total solid content of the green curable composition, the colorant containing a halogenated copper phthalocyanine pigment and a barbituric acid derivative yellow pigment at a ratio of... Agent: Moss & Burke, Pllc

20090246650 - Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) two or more types of polymerizable compounds, (C) a resin, (D) a photopolymerization initiator, and (E) an organic solvent. There are also provided a light-shielding color filter formed by using the photosensitive resin composition, and a... Agent: Sughrue Mion, Pllc

20090246651 - Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor: A photosensitive resin composition is provided that includes at least (A) titanium black, (B) a polymerizable compound, (C) a photopolymerization initiator (D) a resin, and (E) an organic solvent, the photopolymerization initiator (C) using in combination two or more types of photopolymerization initiators including at least one type of oxime-based... Agent: Sughrue Mion, Pllc

20090246653 - Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate: The invention provides a relief printing plate precursor for laser engraving, comprising a relief forming layer, the relief forming layer comprising a resin composition for laser engraving, and the resin composition for laser engraving comprising a binder polymer (A) that is insoluble in water and soluble in an alcohol having... Agent: Moss & Burke, Pllc

20090246655 - Electron beam writing apparatus and method: A Z stage is placed on an XY stage in avoidance of an area to which a mark table is fixed. The mask M is placed on a holding mechanism provided on the Z stage. A middle value of the range adjustable by the focal adjustment mechanism is made coincident... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090246654 - Method for evaluating lithography apparatus and method for controlling lithography apparatus: An evaluation method for lithography apparatus including a coating unit, an exposure unit, a heating unit and a development unit, the evaluation method including forming an evaluation resist pattern by using the lithography apparatus, the evaluation resist pattern including first and second evaluation patterns, the first and second evaluation patterns... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090246656 - Toner for electrostatic image development, full-color toner kit and image forming method: An electrophotographic toner for electrostatic image development which is capable of obtaining a high chroma full-color image exhibiting clear color without color contamination and achieving enhanced lightfastness is disclosed, comprising a resin and a colorant, wherein the colorant comprises a pigment of C.I. Pigment Red 209. There are also disclosed... Agent: Lucas & Mercanti, LLP

20090246657 - Overcoat containing titanocene photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, a charge transport layer, and an overcoat layer that contains a titanocene.... Agent: Patent Documentation Center Xerox Corporation

20090246664 - Oxadiazole containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein at least one of the charge transport layer and the photogenerating layer contains an oxadiazole.... Agent: Patent Documentation Center Xerox Corporation

20090246660 - Additive containing photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains an aminoquinoline.... Agent: Patent Documentation Center Xerox Corporation

20090246659 - Benzothiazole containing photogenerating layer: A photoconductor that includes a supporting substrate, a photogenerating layer, and at least one charge transport layer that contains at least one charge transport component, and where the photogenerating layer contains a benzothiazolesulfenimide additive.... Agent: Patent Documentation Center Xerox Corporation

20090246662 - Hydroxyquinoline containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer that contains at least one charge transport component, and where the photogenerating layer contains a hydroxyquinoline.... Agent: Patent Documentation Center Xerox Corporation

20090246658 - Thiuram tetrasulfide containing photogenerating layer: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a thiuram sulfide additive.... Agent: Patent Documentation Center Xerox Corporation

20090246663 - Titanocene containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein at least one of the charge transport layer and the photogenerating layer contains a titanocene.... Agent: Patent Documentation Center Xerox Corporation

20090246661 - Urea resin containing photogenerating layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a urea resin.... Agent: Patent Documentation Center Xerox Corporation

20090246665 - Metal oxide overcoated photoconductors: A photoconductor containing a photogenerating layer, and at least one charge transport layer, and a top polymeric overcoat layer in contact with, and contiguous to the charge transport layer, and which overcoat layer includes an indium tin oxide.... Agent: Patent Documentation Center Xerox Corporation

20090246667 - Thiadiazole containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer containing at least one charge transport component, and wherein the charge transport layer also contains a thiadiazole.... Agent: Patent Documentation Center Xerox Corporation

20090246666 - Thiadiazole containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one, charge transport layer, such as 1, 2, 3, or 4 layers, and more specifically, 2 layers, and wherein the photogenerating layer contains a thiadiazole.... Agent: Patent Documentation Center Xerox Corporation

20090246668 - Carbazole hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate; an undercoat layer thereover wherein the undercoat layer contains a metal oxide and a carbazole containing compound; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090246671 - Developer and processing method for light sensitive planographic printing plate material: The invention provides a developer and a processing method for a light sensitive planographic printing plate material (also referred to simply as a planographic printing plate material) providing excellent contamination resistance during printing and high reproduction of dot and line images. The developer for a light sensitive planographic printing plate... Agent: Cantor Colburn, LLP

20090246669 - Method for producing negative charging toner: An object of the present teachings is to provide a method for producing a negative charging toner having a fine surface charge state. For this object the present teachings provide a method for producing a negative charging toner comprising a polyester resin as a main component is provided. The method... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20090246672 - Toner for the development of electrostatic image and the production process thereof: A toner for the development of an electrostatic image is provided wherein at least one layer of a particulate resin is coated onto a substantial portion of the surface of an agglomerate of particles made from at least primary polymer particles and primary colorant particles, wherein at least one of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090246670 - Carrier particles for forming wiring circuit pattern and developer: Carrier particles for forming a wiring circuit pattern by an electrophotographic developing method which are used for directly forming a circuit shape on an insulating layer, with any of a metal powder, an inorganic compound powder, or a mixed raw material powder thereof used as a toner powder for forming... Agent: Greenblum & Bernstein, P.L.C

20090246673 - Method for manufacturing a toner having good charging characteristics: There is provided a toner having good charging characteristics that is composed of a core region and a thin shell in which a charge control agent is densely distributed so as to improve charging characteristics of the toner, and a method for manufacturing the same. The method for manufacturing a... Agent: Mckenna Long & Aldridge LLP

20090246674 - Silica encapsulated organic nanopigments and method of making same: Core-shell nanoscale pigment particles include a core organic pigment composition including nanoscale particles of organic pigments, and a shell layer of surface-deposited silica, where the organic pigment particles are selected from azo-type pigment particles, azo laked pigment particles, quinacridone pigment particles, phthalocyanine pigment particles, and mixtures thereof. The core-shell nanoscale... Agent: Oliff & Berridge, Plc.

20090246675 - Two-component developer, replenishing developer, and image-forming method using the developers: An object of the present invention is to suppress the adhesion of a carrier to an image bearing member and the generation of a flaw in the surface layer of the image bearing member, and to improve the dot reproducibility of an electrostatic latent image, and so on. The object... Agent: Fitzpatrick Cella Harper & Scinto

20090246677 - Carrier core material for an electrophotographic developer, carrier, and electrophotographic developer using the carrier: A carrier core material for an electrophotographic developer containing Li ferrite, maghemite, and Fe3O4, wherein a part thereof is substituted with Mn, a Li content is 1 to 2.5% by weight, a Mn content is 2 to 7.5% by weight, and a silicon content is 25 to 10,000 ppm, a... Agent: Greenblum & Bernstein, P.L.C

20090246676 - Carrier core material for electrophotographic developer, carrier, and electrophotographic developer using the carrier: c

20090246678 - Liquid developer:

20090246680 - Latex processes: Processes for continuously forming latex emulsions useful in preparing toners are provided which do not require the use of solvents.... Agent: Xerox Corporation (cdfs)

20090246681 - Method for producing positive charging toner: The present teaching provides a method for producing a positive charging toner that can exhibit stable charge characteristics. According to the present teaching, a positive charging toner is produced by preparing a base particle suspension having a conductivity not higher than 70 μS/cm and comprising base particles that are obtained... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20090246679 - Toner process: The present disclosure provides processes for preparing toner particles, in which fewer coarse particles are generated. The process includes introducing a buffer solution during coalescence of the toner slurry. The amount of coarse particles in the resulting toner particles may, in embodiments, be reduced to less than about 5 percent... Agent: Xerox Corporation (cdfs)

20090246682 - Method for producing developing agent: A surfactant is added in an amount of from 0.1 to 5% by weight of the total weight of a developing agent at the time of at least either kneading a toner material or subjecting the toner material to mechanical shearing.... Agent: Turocy & Watson, LLP

20090246684 - Photosensitive compound and photoresist composition including the same: s

20090246686 - Polymer, polymer preparation method, resist composition and patterning process: A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.... Agent: Birch Stewart Kolasch & Birch

20090246683 - Positive resist composition and method of forming resist pattern: p

20090246685 - Positive resist composition for electron beam, x-ray or euv and pattern forming method using the same:

20090246687 - Azo-metal chelate dye and optical recording medium: The azo-metal chelate dye to which the present invention is applied is a compound formed as follows: for example, 1,3,4-thiadiazole ring is selected as the diazo component; the diazo component is combined with a coupler component having condensed rings including a fluorine-substituted alkylsulfonylamino group and an amino group, to form... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090246688 - Negative-working lithographic printing plate precursor and method of lithographic printing using same: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits excellent... Agent: Birch Stewart Kolasch & Birch

20090246689 - Processless lithographic printing plate precursor: A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The... Agent: Raymond L. Owens Eastman Kodak Company

20090246690 - Lithographic printing plate precursor: A lithographic printing plate precursor includes a support and a layer containing a polymer compound having at least one support-adsorbing group at a terminal of a main chain.... Agent: Sughrue-265550

20090246691 - Antireflective coating composition: where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090246692 - Lithographic printing plate precursor: A lithographic printing plate precursor includes, in the following order: a support; an intermediate layer; and an image-forming layer, and the intermediate layer contains a polymer (A) comprising a repeating unit (a1) represented by the formula (I) as defined herein.... Agent: Sughrue-265550

20090246693 - Negative-working lithographic printing plate precursor and method of lithographic printing using same: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can... Agent: Birch Stewart Kolasch & Birch

20090246694 - Novel photoacid generator, resist composition, and patterning process: n

20090246695 - Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound: An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin... Agent: Sughrue-265550

20090246696 - Planographic printing plate precursor and plate making method using the same: The invention provides a planographic printing plate precursor having at least: a support; and an image recording layer that is provided on or above the support, the image recording layer containing at least: an infrared ray absorbing agent (A); a polymerization initiator (B); a polymerizable monomer (C); and a polymer... Agent: Birch Stewart Kolasch & Birch

20090246701 - Method for preparing lithographic printing plate: A method for preparing a lithographic printing plate includes: exposing a lithographic printing plate precursor including a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) or (II) as defined... Agent: Sughrue-265550

20090246702 - Method for preparing lithographic printing plate: A method for preparing a lithographic printing plate includes: exposing a lithographic printing plate precursor including a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye having an absorption maximum in a wavelength range of from 350 to 450 nm represented by the formula (I) as defined herein, (B)... Agent: Sughrue-265550

20090246697 - Method of processing overcoated lithographic printing plate: A method of processing an on-press developable lithographic printing plate involves the removal of overcoat by brushing or rubbing while in contact with water or an aqueous solution after imagewise exposure and before on-press development. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and... Agent: Gary Ganghui Teng

20090246698 - Methods for imaging and processing negative-working imageable elements: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imageable element having an outermost imageable layer that includes an acid generating compound that generates acid upon exposure to imaging infrared radiation, an infrared radiation absorbing compound, an acid activatable... Agent: Andrew J. Anderson Patent Legal Staff

20090246699 - Plate-making method of lithographic printing plate precursor: A plate-making method of a lithographic printing plate precursor including a support and an image forming layer, includes: (a) a step of preparing a lithographic printing plate precursor that contains, in the image forming layer, a polymer particle containing a repeating unit having a polyalkylene oxide segment in a side... Agent: Birch Stewart Kolasch & Birch

20090246700 - Plate-making method of lithographic printing plate precursor: A plate-making method of a lithographic printing plate precursor including an image forming layer and a support, includes: (a) a step of preparing a lithographic printing plate precursor containing, in the image forming layer, an infrared absorber, a polymerization initiator, a polymerizable compound, a hydrophobic binder polymer and a compound... Agent: Birch Stewart Kolasch & Birch

20090246703 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090246704 - Manufacturing method for conducting films on two surfaces of transparent substrate of touch control circuit: A manufacturing method for conducting films on two opposite surfaces of a transparent substrate of a touch control circuit, includes: contacting a first photoresist layer having photosensitive and discolored emulsion on a first conducting coat formed on a first surface of the transparent substrate, and contacting a second photoresist layer... Agent: Hdls Patent & Trademark Services

20090246705 - Di water rinse of photoresists with insoluble dye content: A method of forming a pattern in a photoresist layer which contains a dye that is insoluble in the developer solution is disclosed. A rinse liquid, typically deionized water, is dispensed onto the substrate while it is rotated at less than 750 rpm. The dye in the exposed regions is... Agent: Texas Instruments Incorporated

20090246706 - Patterning resolution enhancement combining interference lithography and self-aligned double patterning techniques: A method for providing regular line patterns using interference lithography and sidewall patterning techniques is provided according to one embodiment. The method comprising may include producing regularly spaced parallel lines on a template using interference lithography techniques and then depositing sidewalls on the longitudinal sides of the regularly spaced parallel... Agent: Townsend And Townsend And Crew LLP

20090246707 - Semiconductor buried grating fabrication method: Methods for forming grating profiles in semiconductor laser structures comprise the steps of providing a semiconductor wafer comprising a wafer substrate, an etch stop layer disposed over the wafer substrate, a grating layer disposed over the etch stop layer, an etch mask layer disposed over the grating layer, and a... Agent: Corning Incorporated

20090246709 - Manufacturing method of semiconductor device: A manufacturing method of a semiconductor device includes preparing a first circuit pattern original plate including a first pattern part of a mark pattern, preparing a second circuit pattern original plate including a second pattern part of the mark pattern, transferring the first pattern part to a mask film on... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090246708 - Method of forming mask pattern: A mask pattern forming method which can form desired resist patterns accurately and stably on a substrate material like SiC having transparency to light. The method comprising forming a light reflective film on a semiconductor substrate having transparency to light; forming a photo-resist on the light reflective film; projecting exposure... Agent: Rabin & Berdo, Pc

20090246710 - Pattern forming method and a semiconductor device manufacturing method: A pattern forming method is disclosed, which comprises forming a photo resist film on a substrate, irradiating the photo resist film with an energy ray to form a desired latent image pattern, placing the substrate on a spacer provided on a hot plate, heating the photo resist film by using... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090246711 - Method for manufacturing magnetic recording medium: A method for manufacturing a patterned medium employing an imprinting method is provided, which can prevent the occurrence of resist pattern faults due to gas trapped between the imprinting mold surface and the resist layer, as well as resist pattern faults due to bubbles which can be formed in the... Agent: Rossi, Kimms & Mcdowell LLP.

20090246712 - Method of producing multilayer optical recording medium, stamper for producing multilayer optical recording medium, and method therefor: Provided is a stamper for producing a multilayer optical recording medium, which can be produced in simple steps and can be repeatedly used. Particularly, provided is a stamper for producing a multilayer optical recording medium, including: a translucent substrate; and a translucent inorganic resist layer in which a pit or... Agent: Fitzpatrick Cella Harper & Scinto

20090246713 - Oxygen-containing plasma flash process for reduced micro-loading effect and cd bias: A method for transferring a feature pattern to a thin film on a substrate using a hard mask layer is described. The method comprises exposing the substrate to an oxygen-containing flash process after the feature pattern is transferred to the hard mask layer and before the feature pattern is transferred... Agent: Tokyo Electron U.s. Holdings, Inc.

20090246715 - Plating method and method of forming magnetic pole: The plating method is capable of firmly adhering a resist pattern on a plating base in case that, for example, a main magnetic pole of a vertical recording magnetic head is formed by using the resist pattern and accurately configurating a sectional shape of a plated pattern. The plating method... Agent: Greer, Burns & Crain

20090246714 - Thin film etching method: A thin film etching method includes the steps of: projecting a ultraviolet light to expose an optical resin layer coated on a substrate through a photo mask; heating the substrate to vaporize the exposed optical resin layer and retain the unexposed optical resin layer; forming a thin film to fill... Agent: Muncy, Geissler, Olds & Lowe, Pllc

20090246716 - High refractive index sol-gel composition and method of making photo-patterned structures on a substrate: Described herein are sol-gel compositions, sol-gel composition precursors, and methods of fabricating photo-patterned structures on a substrate. The sol-gel compositions possess a combination of high refractive index and low optical loss, even without incorporating metal oxides or metal alkoxides. The sol-gel compositions are further useful in waveguide fabrication applications, especially... Agent: Knobbe Martens Olson & Bear LLP

20090246717 - Method for forming a patterned photoresist layer: A photoresist layer is disclosed. Utilizing light diffraction properties, a transparent layer is disposed between a light-shielding layer and a photoresist layer during an exposure step, such that the patterned photoresist layer has non-vertical sidewalls. The method of the invention can be applied during front side exposure or back side... Agent: Quintero Law Office, Pc

20090246718 - Method of creating a graded anti-reflective coating: A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and applying a solvent to the ARC layer causing it to swell. A photo-resist layer is... Agent: Wood, Herron & Evans, LLP (tokyo Electron)