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Radiation imagery chemistry: process, composition, or product thereof September class, title,number 09/09

20090239156 - Apparatus and method for the removal of pellicles from masks: An apparatus and a method for the removal of pellicles from masks which can be used for photolithographic purposes. The pellicles are removed from masks in a universal manner without them being further contaminated or damaged. In an apparatus, at least one grip is present for the manipulation of masks... Agent: Fay Kaplun & Marcin, LLP

20090239161 - Applications of semiconductor nano-sized particles for photolithography: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle... Agent: Nixon & Vanderhye, PC

20090239155 - Fluorine-passivated reticles for use in lithography and methods for fabricating the same: Fluorine-passivated reticles for use in lithography and methods for fabricating and using such reticles are provided. According to one embodiment, a method for performing photolithography comprises placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer and causing electromagnetic radiation to pass from the illumination source through... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)

20090239157 - Method for fabricating photomask: Provided is a method for fabricating a photomask. A light blocking layer is formed on a transparent substrate having a first region and a second region. A hard mask layer is formed on the light blocking layer. A first polymer film is formed on the hard mask layer. Here, the... Agent: Townsend And Townsend And Crew, LLP

20090239160 - Method for preparing data for exposure and method for manufacturing photo mask: A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the first rectangular patterns, and extracting a second plurality of rectangular patterns, disposed in an N×N matrix, from the first plurality... Agent: Arent Fox LLP

20090239158 - Method of maintaining mask for semiconductor process: A method of maintaining a mask for a semiconductor process, the method includes providing a first structure and a second structure being attached to each other via a thermosetting material, detaching the first and second structures from each other, and performing an ashing process on the first structure.... Agent: Lee & Morse, P.C.

20090239162 - Methods of forming reticles: The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over... Agent: Wells St. John P.s.

20090239159 - Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask: A photomask is disclosed which can suppress deterioration of the depth of focus even in the case where main features are arranged randomly. Sub-features are replaced by a quadrangular sub-feature located inside an external quadrangle which includes as part of its outer periphery the outermost portions of the original sub-features.... Agent: Miles & Stockbridge PC

20090239163 - Color filter and method of fabricating the same: A color filter fabricated by an ink jet process is disclosed. The color filter includes a substrate, a plurality of pixel regions positioned on the surface of the substrate, and a plurality of colored photoresists. Each pixel region includes a plurality of sub-pixel regions, and each colored photoresist is positioned... Agent: North America Intellectual Property Corporation

20090239164 - Toner for electrostatic image development, full-color toner kit and image forming method: An electrophotographic toner for electrostatic image development which is capable of obtaining a high chroma full-color image exhibiting clear color without color contamination and excellent light stability is disclosed, comprising a resin and a colorant, wherein the colorant comprises a pigment of C.I. Pigment Blue 76. There are also disclosed... Agent: Lucas & Mercanti, LLP

20090239165 - Image forming apparatus using amorphous silicon photoconductor: An image forming apparatus is provided with an image forming unit including an amorphous silicon photoconductor. The amorphous silicon photoconductor includes a base and a photosensitive layer provided on the base. The photosensitive layer includes a highly resistive layer, a charge-injection inhibition layer, a photoconductive layer and a surface protecting... Agent: Casella & Hespos

20090239166 - Imaging member having nano polymeric gel particles in various layers: Imaging members useful in electrostatographic apparatuses, including printers, copiers, other reproductive devices, and digital apparatuses. More particularly, imaging members having nano polymeric gel particles embedded into one or more layers of the imaging member that provide for increased mechanical strength and improved wear.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090239167 - Electrophotographic photoreceptor: This invention provides an electrophotographic photoreceptor having improved resistance to soiling by a human body-derived substance and a high image stability. The electrophotographic photoreceptor comprises an electroconductie substrate and a photosensitive layer provided on the substrate and is characterized in that the photosensitive layer contains, as a binder resin, a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090239168 - Toner for developing electrostatic image, full color toner kit, and image formation method: Disclosed are a toner for developing an electrostatic image, a full color toner kit and an image formation method layer, the toner comprising at least a resin and a colorant, wherein the colorant includes quinacridone pigment having a number average primary particle size of from 30 to 150 nm and... Agent: Lucas & Mercanti, LLP

20090239169 - Oxidized mixed cyclic phenol sulfides, and charge control agents and toners using the same: wherein R is a straight or branched alkyl group having 1 to 6 carbon atoms, m is an integer from 4 to 9, and n is 1 or 2; or an oxidized cyclic phenol sulfide of formula (1) wherein m is 8. The present invention also discloses a charge control... Agent: Hoffmann & Baron, LLP

20090239170 - Method for producing toner, and toner: A method for producing a toner, the method including discharging a toner composition liquid from a plurality of nozzles to form liquid droplets thereof, the toner composition liquid being prepared by dissolving or dispersing in a solvent a toner composition containing at least a binder resin, a colorant, an acid-modified... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090239171 - Toner: It is to provide a toner which can form an image of high image quality exhibiting high resolution wherein a final visible image exhibits high image density and high thin-line reproducibility even in long-term use. In a toner incorporating at least a colored particle containing a binder resin composed of... Agent: Lucas & Mercanti, LLP

20090239173 - Resin-filled carrier for electrophotographic developer, and electrophotographic developer using the resin-filled carrier: A resin-filled carrier for an electrophotographic developer obtained by filling resin into voids of a porous ferrite core material, wherein the porous ferrite core material has a pore volume of 0.04 to 0.16 mL/g and a peak pore size of 0.9 to 2.0 μm, and wherein microparticles are included in... Agent: Greenblum & Bernstein, P.L.C

20090239172 - Chilled finish roller system and method: An apparatus for fixing of toner onto a receiver, including: a non-contact fuser capable of fusing one or more layers of toner on a receiver such that one or more toner layers reach a fusing temperature above a glass transition temperature. The apparatus also includes one or more cooling finish... Agent: Andrew J. Anderson Patent Legal Staff,

20090239174 - Fluorescent magnetic powder, method of manufacturing the same, magnetic ink composition, magnetic polymer particle, liquid developer for magnetic latent image, cartridge, and image forming apparatus: Fluorescent magnetic powder in which a fluorescent dye is attached to the particles of magnetic powder is provided.... Agent: Fildes & Outland, P.C.

20090239175 - Stereolithographic resins containing selected oxetane compounds: u

20090239176 - Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin: A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface includes a residual monomer in an amount of 1 mass % or less to the resin as a whole in terms of solid content.... Agent: Sughrue-265550

20090239177 - Mask pattern data generation method, mask manufacturing method, semiconductor device manufacturing method, and pattern data generation program: According to an aspect of the present invention, there is provided a mask pattern data generation method including: a first step of obtaining a mask data representing from a design pattern by performing a process simulation with a process parameter having a first value; a second step of obtaining a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.

20090239178 - Optical attenuator plate, exposure apparatus, exposure method, and device manufacturing method: There is disclosed an optical attenuator plate and an optical attenuator plate to adjust a quantity of light from a light source, which has a plurality of high-transmittance regions with a relatively high transmittance, and in which shapes of the high-transmittance regions are so defined that an intensity distribution of... Agent: Klarquist Sparkman, LLP

20090239179 - Hydroxyl-containing monomer, polymer, resist composition, and patterning process: A hydroxyl-containing monomer of formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent C1-C15 hydrocarbon groups, or R2 and R3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up... Agent: Birch Stewart Kolasch & Birch

20090233181 - Porous holographic film: The present invention relates to a method for the manufacture of a holographic film. The method includes a polymerizable composition that comprises monomers with high reactivity, monomers with low reactivity and a non-reactive material. The method comprises a patterned exposure to obtain a patterned polymerization of the monomers with high... Agent: Thorne & Halajian Applied Technology Center

20090233187 - Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask: In a method of designing a photo-mask, a graphic pattern as a target of development simulation is divided into a plurality of sub graphic patterns which are respectively assigned with a plurality of orthogonal coordinate systems which are not orthogonal to each other. A model-based OPC (optical proximity correction) is... Agent: Mcginn Intellectual Property Law Group, PLLC

20090233189 - Device and method for obtaining exposure correction information, and manufacturing method of semiconductor device: A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution, and includes obtaining the exposure correction information as a distribution of the adjusted intensity of light incident on the photomask.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090233183 - Exposure mask and a method of making a semiconductor device using the mask: Disclosed herein are an exposure mask and a method of making a semiconductor device using the mask. The exposure mask includes a transparent substrate; and a light blocking pattern having first and second patterns, and an assist feature disposed between the first and second patterns and including a dot pattern... Agent: Marshall, Gerstein & Borun LLP

20090233185 - Extreme ultraviolet mask and method for fabricating the same: An EUV mask comprises a multi-reflecting layer is formed over a substrate and reflecting EUV light; an absorber layer pattern defining a sidewall formed over the multi-reflecting layer formed and selectively exposing a region of the multi-reflecting layer; and a reflecting spacer which additionally reflects the EUV light at the... Agent: Marshall, Gerstein & Borun LLP

20090233184 - Manufacturing method of a semiconductor device: An exposure mask provides a minute pattern formation which enables the high integration of semiconductor devices by preventing the generation of a scum in a space between a first pattern and a second pattern. The exposure mask includes a first pattern and a second pattern adjacent to the first pattern.... Agent: Townsend And Townsend And Crew, LLP

20090233190 - Mask blank and method for manufacturing transfer mask: [Means for Solving Problems] A mask blank including a thin film for forming a mask pattern, the thin film being formed on a substrate, and a resist film formed over the thin film, wherein the thin film and the resist film sandwich an adhesion layer that is bonded to the... Agent: Sughrue Mion, PLLC

20090233192 - Method for finishing surface of preliminary polished glass substrate: The invention is to provide a method in which waviness generated on a glass substrate surface during pre-polishing is removed, thereby finishing the glass substrate so as to have a surface excellent in flatness. The invention relates to a method for finishing a pre-polished glass substrate surface using any one... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090233191 - Overlay target for polarized light lithography: A target and method for use in polarized light lithography. A preferred embodiment comprises a first structure located on a reference layer, wherein the first structure is visible through a second layer, and a second structure located on the second layer, wherein the second structure is formed from a photomask... Agent: Slater & Matsil LLP

20090233182 - Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device: A photomask blank of the present invention includes a light-shielding film containing at least chromium on a light-transmitting substrate. The light-shielding film is formed so as to cause a desired film stress in the direction opposite to that of a change in the film stress that is anticipated to be... Agent: Sughrue Mion, PLLC

20090233188 - Reflective mask blank, reflective mask, method of inspecting reflective mask, and method for manufacturing the same: A main object of the invention is to provide a reflective mask for EUV lithography, which may detect an alignment mark by transmission. The invention achieves the object by providing a reflective mask comprising a substrate, a multilayer formed on one side of the substrate, an intermediate layer formed on... Agent: Ladas & Parry LLP

20090233186 - Scattering bar opc application method for sub-half wavelength lithography patterning field of the invention: A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding—the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090233195 - Linewidth measuring method, image-forming-state detecting method, adjustment method, exposure method, and device manufacturing method: A pattern area that includes a plurality of line patterns with a predetermined spacing therebetween formed on a wafer is imaged, and based on the imaging results, a contrast value of an image of the pattern area is computed, and the computed contrast value is converted into the linewidth of... Agent: Oliff & Berridge, PLC

20090233194 - Parameter determination method, exposure method, device fabrication method, and storage medium: The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090233193 - Pattern prediction method, pattern correction method, method of fabricating semiconductor device, and recording medium: A pattern prediction method according to an embodiment includes: predicting a second pattern shape from a first pattern shape by using a conversion function and a conversion difference residual error amount function, wherein; the conversion function makes the connection between the first pattern formed by a first step and the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090233197 - Crosslinking outer layer and process for preparing the same: The presently disclosed embodiments are directed to an improved low wear overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for preparing the same including combining a binder, a hole transport molecule, a melamine formaldehyde... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090233196 - Photoconductors containing copper phthalocyanine and titanyl phthalocyanine in the charge generation layer: Embodiments of a photoconductor comprise an electrically conductive substrate, a charge generation layer disposed over the electrically conductive substrate, wherein the charge generation layer comprises titanyl phthalocyanine and copper phthalocyanine, and a charge transport layer disposed over the charge generation layer.... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090233198 - Photocurable composition, overprint, and production process therefor: the photocurable composition including (1) a bridged ring hydrocarbon group-containing cationically polymerizable compound and (2) a photo-acid generator. There is also provided an overprint produced by the process. Furthermore, there is provided a photocurable composition that includes (1) a bridged ring hydrocarbon group-containing cationically polymerizable compound and (2) a photo-acid... Agent: Sughrue Mion, PLLC

20090233199 - Gloss control particle, developer set, and image forming method: A gloss control particle is provided that is configured to form a transparent and colorless gloss control layer on a colored toner image which is to be fixed on a recording medium upon application of heat, wherein the gloss control particle contains a binder resin and a softening agent configured... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090233200 - Developer and image forming apparatus: A developer to be used in an image forming apparatus includes a toner containing a core toner including a colorant, a binder resin, a release agent and a charge controlling agent containing Al and Mg, a first inorganic oxide externally added to the core toner, having a primary particle diameter... Agent: Turocy & Watson, LLP

20090233201 - Developer and image forming apparatus: A developer to be used in an image forming apparatus has a carrier and a toner containing a colorant, a binder resin, a release agent, a charge controlling agent containing Al and Mg, and a conductive inorganic oxide having an intrinsic resistivity of from 1.0×103Ω to 1.0×1010Ω in an amount... Agent: Turocy & Watson, LLP

20090233207 - Pyrazolotriazole compound and electrophotographic toner: in the formula, Rx1, and Rx2 each independently represents an alkyl group, Lx is a hydrogen atom or an alkyl group, Gx1 is an alkyl group having 2 or more carbon atoms, Gx2 is an alkyl group or an aromatic hydrocarbon group, Gx3 is a hydrogen atom, a halogen atom,... Agent: Lucas & Mercanti, LLP

20090233206 - Toner having excellent image uniformity: There is provided a toner having narrow charge distribution, high chargeability and low image contamination, as well as excellent physical properties such as long-term stability, transfer property and image uniformity, by improving shapes of toner core particles and adding a suitable external additive to surfaces of the toner core particles.... Agent: Mckenna Long & Aldridge LLP

20090233208 - Copper complex compound and electrophotographic toner containing the same: e

20090233209 - Electrophotographic toner: An electrophotographic toner is disclosed. The toner contains a compound of Formula X-1 and a copper complex compound represented by the following Formula (1), which are defined detain in the specification.... Agent: Lucas & Mercanti, LLP

20090233202 - Two component developer and image forming method: A two component developer comprising a toner and a carrier, wherein the toner includes: colored particles; and external additive particles comprising a complex oxide incorporating silicon atoms and at least one of titanium atoms and aluminum atoms, and a surface existing ratio of the silicon atoms (R2) in a surface... Agent: Lucas & Mercanti, LLP

20090233203 - Toner and method for producing the same: The present invention provides a toner comprising core particles that contain at least first resin particles, colorant particles, and wax particles, in an aqueous medium, wherein the core particles contain nucleus particles in which the first resin particles and the colorant particles are aggregated and particles in which the first... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090233204 - Toner for image formation, method for producing toner, container containing toner, two-component developer, process cartridge, and image forming method: e

20090233205 - Two-component developer: Provided is a two-component developer with which degradation of development is inhibited even in the case of prolonged use, and thereby a high quality image exhibiting high resolution and sufficient image density can be formed for a long duration. Also disclosed is a two-component developer possessing a carrier and a... Agent: Lucas & Mercanti, LLP

20090233211 - Positively chargeable two-component developer, image forming method, and image forming apparatus: A positively chargeable two-component developer, including at least a toner and a carrier, wherein the toner contains a binder resin, a colorant, a wax, and a charge control agent, the binder resin contains at least a polyester resin and an addition polymerization resin grafted with a polyolefin, the wax and... Agent: Oliff & Berridge, PLC

20090233212 - Toner and two-component developer: p

20090233210 - Toner for developing electrostatic charge image, electrostatic charge image developer, toner cartridge, process cartridge, and image forming apparatus: There is provided a toner for developing an electrostatic charge image including a binder resin, a colorant and a releasing agent, wherein the content ratio of particles having a number particle diameter of 4.5 μm or more and less than 7.5 μm and a circularity degree of 0.980 or more... Agent: Oliff & Berridge, PLC

20090233213 - Method for preparing toner, toner prepared by the method, and image forming apparatus using the toner: A method for preparing a toner including primarily pulverizing a toner composition powder including at least a binder resin and a colorant using a mechanical pulverizer to prepare a first particulate material with a weight average particle diameter of 7 to 30 μm; secondarily pulverizing the first particulate material using... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090233214 - Liquid developer and image forming apparatus: A liquid developer includes an insulating liquid; toner particles constituted by a material containing a polyester resin; and an alkyl diamine and an amide compound having a hydroxy fatty acid skeleton as dispersants.... Agent: Hogan & Hartson L.L.P.

20090233215 - Liquid developer and image forming apparatus: A liquid developer includes an insulating liquid; toner particles mainly constituted by a resin material; and a dispersant having an amine value, wherein a power of hydrogen ion concentration pH of the liquid developer at 24° C. is from 4 to 7.... Agent: Hogan & Hartson L.L.P.

20090233216 - Liquid developer and a method of forming image: A liquid developer is provided. The liquid developer comprises: an insulation liquid constituted of a modified epoxy compound as a main component thereof; toner particles dispersed in the insulation liquid; and a cation type photopolymerization initiator used for polymerizing the modified epoxy compound. The liquid developer has superior fixing characteristics... Agent: Hogan & Hartson L.L.P.

20090233217 - Toner, image forming method, and process cartridge: A toner is provided that includes a binder resin which is selected from (a) a polyester resin, (b) a hybrid resin comprising a polyester unit and a vinyl copolymer unit, and (c) a mixture of a polyester resin and a hybrid resin, a colorant, a release agent, and at least... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090233219 - Change control resin particles and toner for developing electrostatic images: Charge control resin particles comprising a mixture of at least a charge control agent and a resin, wherein a crystalline zinc 3,5-di-tert-butylsalicylate represented by General Formula below, and having major peaks of X-ray diffraction using the CuKα-characteristic X-ray at Bragg angles 2θ of at least 6.4±0.2° and 15.4±0.2°, is contained... Agent: Mcglew And Tuttle John James Mcglew

20090233218 - Method for preparing toner: A method for preparing a toner including as toner components at least a binder resin, a pigment and a dispersant for the pigment. The method includes firstly mixing at least the pigment and the dispersant to prepare a first mixture; secondly mixing the first mixture with the other toner components... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090233222 - Lithographic printing plate precursor: A lithographic printing plate precursor includes an image recording layer and a support obtained by subjecting an aluminum plate having an iron content of 0.28 mass % or less to a surface roughening treatment and to an anodization treatment.... Agent: Birch Stewart Kolasch & Birch

20090233221 - Negative-working photosensitive material and negative-working planographic printing plate precursor: The present invention provides a negative-working photosensitive material formed by sequentially layering an undercoat layer and a photosensitive layer on a support, wherein the undercoat layer contains a polymer containing (a) a structural unit containing at least one selected from a carboxylic acid or a carboxylic acid salt and (b)... Agent: Sughrue Mion, PLLC

20090233220 - Positive resist composition and method of forming resist pattern: Provided are a positive resist composition and a resist pattern forming method having fewer defects and superior lithographic characteristics. The positive resist composition includes a resin component (A) which has on a main chain a structural unit derived from an (α-lower alkyl)acrylate ester and exhibits increased alkali solubility under the... Agent: Knobbe Martens Olson & Bear LLP

20090233223 - Sulfonium salt-containing polymer, resist composition, and patterning process: A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, methyl or trifluoromethyl, R2 to R4 are C1-C10 alkyl or alkoxy, R5 is C1-C30 alkyl or C6-C14 aryl, k, m... Agent: Birch Stewart Kolasch & Birch

20090233224 - Compositions and processes for photolithography: Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.... Agent: Jonathan D. Baskin Rohm And Haas Electronic Materials LLC

20090233225 - Low chlorine epoxy resin formulations: This invention relates to the need to improve the corrosion resistance of very low total chlorine epoxy resins which contain very low contents of organically bound chlorine. The invention relates to the improvement of corrosion resistance of such epoxy resins for electronic applications by the addition of specific additives acceptable... Agent: Wiggin And Dana LLP Attention: Patent Docketing

20090233229 - Lithographic printing plate precursor and method of lithographic printing: A lithographic printing plate precursor is provided that, using laser exposure, exhibits an excellent capacity for plate inspection, an excellent on-press development performance or gum development performance, and an excellent scumming behavior, while maintaining a satisfactory printing durability. There is also provided a method of lithographic printing that uses this... Agent: Birch Stewart Kolasch & Birch

20090233227 - Negative-working imageable elements with improved abrasion resistance: Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500... Agent: Andrew J. Anderson Patent Legal Staff

20090233226 - Photopatternable dielectric materials for beol applications and methods for use: Compositions, a method, and a photopatternable blend. The compositions include a blend of a first and a second polymer. The first polymer is a substituted silsesquioxane copolymer. The second polymer is a substituted silsesquioxane polymer. The second polymer is configured to undergo chemical crosslinking with the first polymer, the second... Agent: Schmeiser, Olsen & Watts

20090233228 - Positive photosensitive resin composition: The present invention provides a positive photosensitive resin composition, characterized by comprising 1 to 50 parts by mass of a photo-acid generator and 0.01 to 70 parts by mass of a terpene compound in combination with 100 parts by mass of a hydroxypolyamide having repeating units. A terpene compound can... Agent: Greenblum & Bernstein, P.L.C

20090233232 - Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process: wherein R1 to R5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene... Agent: Fitzpatrick Cella Harper & Scinto

20090233231 - Photosensitive resin composition: A photosensitive resin composition of the present invention includes an acid group-containing vinyl ester resin and a photopolymerization initiator as essential components, wherein the acid group-containing vinyl ester resin is an acid group-containing vinyl ester resin having a multiple-branched molecular structure obtained by the following steps where a polybasic anhydride... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090233230 - Photosensitive resin composition and laminates: (wherein A, B, and C each independently represent a substituent selected from the group consisting of an aryl group, a heterocyclic group, a linear or branched alkyl group having 3 or more carbon atoms, and NR2 (R represents a hydrogen atom or an alkyl group); and each of a, b,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.

20090233233 - Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part... Agent: Sughrue Mion, PLLC

20090233234 - Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method: By a force generation device which can generate a magnetic attraction and gas static pressure between a detection system provided on a lower surface side of an FIA surface plate and a surface plate, a predetermined clearance is formed between the detection system and the surface plate, and in a... Agent: Oliff & Berridge, PLC

20090233235 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP

20090233236 - Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom: In one embodiment, the present invention provides a method for patterning a surface that includes forming a block copolymer atop a heterogeneous reflectivity surface, wherein the block copolymer is segregated into first and second units; applying a radiation to the first units and second units, wherein the heterogeneous reflectivity surface... Agent: Scully, Scott, Murphy & Presser, P.C.

20090233237 - Process for preparing conductive material:

20090233238 - Double patterning strategy for contact hole and trench in photolithography: A method of lithography patterning includes forming a first resist pattern on a substrate, the first resist pattern including a plurality of openings therein on the substrate; forming a second resist pattern on the substrate and within the plurality of openings of the first resist pattern, the second resist pattern... Agent: Haynes And Boone, LLPIPSection

20090233240 - Method of fabricating triode-structure field-emission device: Example embodiments provide a method of fabricating a triode-structure field-emission device. A cathode, an insulating layer, and a gate metal layer may be sequentially formed on a substrate. A first resist pattern having a first opening and a second resist pattern having a second opening smaller than the first opening... Agent: Harness, Dickey & Pierce, P.L.C

20090233239 - Reticle for use in a semiconductor lithographic system and method for modifying the same: A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one of the two separated reticle parts is independently replaceable.... Agent: Slater & Matsil LLP

20090233241 - Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control: A method of optical fabrication comprises coating a substrate with a photocuring material, controlling the application of light to the photocuring material so as to control the intensity and pattern of the light both in-plane and out of plane, and developing the photocuring material.... Agent: Jones Day

20090233242 - Lactone-containing compound, polymer, resist composition, and patterning process: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O... Agent: Birch Stewart Kolasch & Birch

20090233243 - Structure for pattern formation, method for pattern formation, and application thereof: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.... Agent: Ladas & Parry LLP

20090233244 - Method and system for overlay correction during photolithography: A method of performing overlay error correction includes forming a photoresist layer over a substrate and exposing a first set of apertures to incident radiation. The method also includes determining an overlay error associated with the first set of apertures and determining an overlay correction as a function of the... Agent: Townsend And Townsend And Crew, LLP

20090233245 - Color film developer composition and process therefor: A method and composition for processing color film is described. The color film is processed by developing it using first and second compositions. The second composition is an aqueous composition including a buffer, an antioxidant, a preservative, a hydroxide and a developer selected from the group consisting of a hydroquinone... Agent: Thomson Licensing LLC

20090233246 - Method for producing material containing sensitizer dispersed therein for thermal recording article and thermal recording article: The invention provides a heat-sensitive recording material, which is highly sensitive, is almost free of staining on the background, and gives a recorded image excellent in stability during storage, by using a finely divided sensitizer dispersion excellent in shelf stability produced in a short time with high volumetric efficiency. The... Agent: Frommer Lawrence & Haug

20090233247 - Infrared dye for silver halide-based photographic elements: A non-infrared sensitized low silver photographic element with a non-light sensitive layer, preferably an antihalation layer, containing a diphenylaminocyclopentene heptacyanine benzothiazolium infrared dye where the benzothiazolium groups have electron-withdrawing substituents on the phenyl ring and solubilzed alkyl groups on the nitrogen. The infrared dye can be present as a liquid-crystalline... Agent: Andrew J. Anderson Patent Legal Staff

20090226822 - Recording medium: A holographic recording medium is provided, which includes a recording layer including a radically polymerizable monomer having an ethylenically unsaturated bond, a photo-acid generator, a photo-radical polymerization initiator, and a polymeric matrix. The polymeric matrix includes a repeating unit expressed by any one of the following chemical formulae.... Agent: Charles N.j. Ruggiero, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20090226824 - Hardmask composition and associated methods: h

20090226825 - Method for fabricating euvl mask: A method for fabricating EUVL mask, by which the pattern of absorption layer can be fabricated at a high precision is provided. The method includes an etching step of etching black defect of the absorption layer of the EUVL mask by the irradiation of ion beam on the absorption layer... Agent: Bruce L. Adams, Esq

20090226826 - Photomask blank, photomask, and photomask manufacturing method: A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and containing less than 62 at % nitrogen. The material is capable of being dry-etched with a chlorine-based... Agent: Sughrue Mion, PLLC

20090226823 - Reticles including assistant structures, methods of forming such reticles, and methods of utilizing such reticles: Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive material, such as chromium. The assistant structures provide reduced scumming defects in features produced using the reticles. Methods of forming the reticles... Agent: Trask Britt, P.C./ Micron Technology

20090226827 - Method for correcting critical dimension of mask pattern: A method for correcting a critical dimension (CD) of a mask pattern includes forming an light shielding layer over a substrate including a main cell region and a frame region at a periphery of the main cell region; forming an light shielding main pattern in the main cell region and... Agent: Marshall, Gerstein & Borun LLP

20090226829 - Photoreceptors comprising aligned nano-sized domains of charge transport components that have significant intermolecular pi-pi orbital overlap: Described herein are photoreceptor devices that include aligned domains of charge transport materials that have a pi-pi orbital overlap.... Agent: Oliff & Berridge, PLC.

20090226828 - Self-healing photoreceptor: Disclosed is a photoconductive member including a self-healing composite coating having a polymer matrix, a photoconductive component, a healing material encapsulated within nano- or microcapsules, and an optional catalyst, that is capable of repairing physical damage to the photoconductive member when the capsule ruptures. Also disclosed is photoconductive member including... Agent: Oliff & Berridge, PLC.

20090226830 - Electrophotographic photosensitive body: s

20090226831 - Photocurable coating composition, and overprint and process for producing same: A photocurable coating composition is provided that includes (A) a photopolymerization initiator residue-containing polymer compound and (B) a polymerizable compound. There are also provided an overprint that includes an overprint layer formed by photocuring the photocurable coating composition on a printed material, and a process for producing an overprint that... Agent: Sughrue Mion, PLLC

20090226833 - Electrophotographic toner, method for manufacturing the same, electrophotographic developing agent, toner cartridge, process cartridge and image forming apparatus: There is provided an electrophotographic toner, which includes a binder resin and a colorant, wherein, with a total intensity (kcps) of all elements detected in the toner due to fluorescent X-ray measurement designated as A and an intensity of nitrogen designated as B, B/A is from about 0.01 to about... Agent: Oliff & Berridge, PLC

20090226834 - Electrostatic image developing toner for pressure fixing, production method of the same, electrostatic image developer, image forming method and image forming apparatus: An electrostatic image developing toner for pressure fixing includes a binder resin that has a sea-island structure, wherein a difference between a glass transition temperature of a resin forming the sea phase and a glass transition temperature of a resin forming the island phase is about 30° C. or more,... Agent: Oliff & Berridge, PLC

20090226832 - Toner of static charge image and method for manufacturing the same: The invention is related to a toner of static charge image and a method for manufacturing such a toner of static charge image, which solve the problems of existing toner of static charge image, namely easy detachment of colorant, the pollution of carriers and developing sleeves and low durability. For... Agent: Matthias Scholl

20090226835 - Nanosized particles of phthalocyanine pigments: Nano-sized phthalocyanine pigment particles include a phthalocyanine chromogen structure as the main component, and a substituted soluble metal-phthalocyanine dye as a minor component that is associated non-covalently with the phthalocyanine chromogen structure, wherein the presence of one or more sterically bulky substituents on the substituted soluble metal-phthalocyanine dye limits an... Agent: Oliff & Berridge, PLC.

20090226836 - Method of manufacturing toner: A method of manufacturing a toner including granulating mother toner particles in an aqueous medium to obtain a slurry containing the mother toner particles and adjusting a size distribution of the mother toner particles by screening coarse mother toner particles from the slurry with a screen to obtain the toner... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090226837 - Toner manufacturing method, toner manufacturing apparatus, and toner manufactured by way of the toner manufacturing method thereof: A method of manufacturing a toner includes preparing a droplet forming device, comprising a storage portion to store a toner composition solution, a thin film formed from a rigid material, bonded to the storage portion by a bonding material, and provided with a nozzle and an oscillation device including an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090226838 - Carrier, developer, developing apparatus and image forming apparatus: There are provided a carrier which enables stable charging of toner and formation of a stable, high-definition and high-quality image which has very few image defects such as a fog, as well as a developer, a developing apparatus, and an image forming apparatus. A carrier is obtained by including a... Agent: Nixon & Vanderhye, PC

20090226839 - Method and apparatus for liquid electrostatic printing: Novel UV-curable liquid toner compositions, methods for preparing same and imaging processes and apparatus utilizing same are provided. The UV-curable liquid toner compositions include a dispersion of toner particles in a hydrocarbon based liquid carrier and one or more UV-curable component(s) which form a part of the carrier.... Agent: Hewlett Packard Company

20090226840 - Filter cloth traveling type belt filter and production method of toner particles: A production apparatus and a production method of toner particles are provided which efficiently and stably reduce the water content of the wet toner particle cake obtained by separating and washing toner particles from toner particle dispersion in a production apparatus of toner particles granulated in a wet process. A... Agent: Fitzpatrick Cella Harper & Scinto

20090226841 - Photosensitive planographic printing plate and fabrication process thereof: A photosensitive planographic printing plate which can avoid quality defects such as residue films and the like and improve yield, and a fabrication process thereof. A coating layer of a region corresponding to an edge portion of a PS plate is preparatorily cleared by coating removal. Hence, pressure fogging which... Agent: Sughrue Mion, PLLC

20090226842 - Resist composition and method of forming resist pattern: p

20090226843 - Monomer, resist composition, and patterning process: A pattern is formed by applying a positive resist composition comprising a polymer comprising hydroxyalkylnaphthalene-bearing recurring units and acid labile group-bearing recurring units onto a substrate to form a resist film, heat treating and exposing the resist film to radiation, heat treating and developing the resist film with a developer... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090226844 - Resist pattern thickening material and process for forming resist pattern,and semiconductor device and process for manufacturing the same: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090226845 - Printing element with an integrated printing surface: A relief image printing element with an integral imageable printing surface and a method of preparing the relief image printing element are described. The relief image printing element comprises a dimensionally stable base layer; a floor layer comprised of a cured polymer selected from the group consisting of photopolymers, and... Agent: Arthur G. Schaier Carmody & Torrance LLP

20090226846 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus (EX) includes: a substrate stage (ST1) that is movable while holding substrate (P); a first immersion mechanism (1) that fills an optical path space (K1) between a final optical member (LS1) and the substrate stage (ST1) with a liquid (LQ) when the substrate stage (ST1) is disposed... Agent: Oliff & Berridge, PLC

20090226847 - Method of reducing photoresist defects during fabrication of a semiconductor device: Reducing or eliminating watermark-type defects during semiconductor device fabrication are described and can comprise treating photoresist using one of several embodiments. In some embodiments, the propensity for defect formation is reduced/eliminated by conditioning the photoresist surface through the application and removal of a sacrificial overcoat. In other embodiments, existing defects... Agent: Micron Technology, Inc.

20090226849 - Exposure apparatus and device manufacturing method: An exposure apparatus configured to expose a substrate using exposure light provided by a light source, comprises an optical element located in an optical path of the exposure light, a gas supply configured to supply a gas into a space including the optical path, a decomposing unit configured to process... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090226848 - Method of manufacturing light receiving device: A method of manufacturing a light receiving device 1 includes: providing a resin layer 14 containing a photo curing resin on a transparent substrate 13 where a plurality of transparent substrate portions 13A are integrated so that the resin layer covers the transparent substrate 13; selectively irradiating the resin layer... Agent: Michael A. Makuch Smith Gambrell & Russell

20090226851 - (meth)acrylate, polymer and resist composition: A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090226850 - Process for producing resist pattern and conductor pattern: This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type... Agent: Knobbe Martens Olson & Bear LLP

20090220867 - Gradated photomask and its fabrication process: The invention provides a gradated photomask for reducing photolithography steps and its fabrication process, which make use of a generally available photomask blank, prevents the reflectance of a light shield film from growing high, makes alignment easy during the formation of a semitransparent film, and enables the semitransparent film on... Agent: Sughrue Mion, PLLC

20090220864 - Inspection method for transparent article: In an inspection method of transparent articles used in photolithography, for inspecting whether or not there are inhomogeneities within transparent articles (4) formed of transparent material wherein optical properties regionally or locally change with regard to exposure light (specifically, interior defects 16), inspection light having a wavelength of 200 nm... Agent: Sughrue Mion, PLLC

20090220868 - Mask and design method thereof: A mask and the design method thereof are provided. The mask includes a light-shielding area shielding off a light, wherein the light-shielding area includes a photonic crystal having a lattice constant, and a ratio of the lattice constant to a wavelength of the light is a specific value within a... Agent: Volpe And Koenig, P.C.

20090220870 - Measuring the effect of flare on line width: In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a method for determining the effect of flare on line shortening. The method comprises, at a first die position on... Agent: Nxp, B.v. Nxp Intellectual Property & Licensing

20090220865 - Method and apparatus for source field shaping in a plasma etch reactor: A method and apparatus for improved plasma etching uniformity are provided herein. In one embodiment, a field-shaping magnet is disposed above the chamber processing volume and adjacent to field induction coils. The field-shaping magnet provides improved control of the etch rate at various locations along the surface of a substrate... Agent: Patterson & Sheridan, LLP - - Appm/tx

20090220866 - Pre-alignment marking and inspection to improve mask substrate defect tolerance: A method includes determining defect types and defect locations on a mask blank and storing the defect types and the defect locations on the mask blank. The method further includes generating at least one alignment mark on the mask blank and selecting a mask pattern for the mask blank based... Agent: Greenblum & Bernstein, P.L.C

20090220869 - Reflection-type mask and method of making the reflection-type mask: To provide a reflection-type mask having a reduced shadowing effect, capable of phase shift exposure and having a shading frame of sufficient shading performance. The mask includes a substrate 11, a multilayer reflective film 12 which is formed above the substrate 11, and which reflects exposure light, a first photoabsorber... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090220873 - Belt skew correction controlling method, belt transportation device, and recording apparatus: A belt skew correction controlling method includes detecting a skew speed of a wound endless belt, calculating a difference between the skew speed that is acquired in the detecting of the skew speed and the initial target value, determining whether a value acquired in the calculating of the difference is... Agent: Workman Nydegger 1000 Eagle Gate Tower

20090220872 - Detecting apparatus, exposure apparatus, and device manufacturing method: A detecting apparatus includes a image pickup device configured to supply an output signal, an imaging optical system configured to form an image of an alignment mark formed on a substrate onto the image pickup device, and a signal processing unit including a restoration filter having a parameter that can... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090220871 - Device manufacturing method, lithographic system, lithographic apparatus and design for manufacturing system: In an embodiment, a device manufacturing method for transferring a pattern from a patterning device onto a substrate includes receiving a design layout information associated with a device, determining the pattern from the design layout information, providing the pattern to a patterning device, determining feed-forward requirement data from the design... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090220874 - Exposure apparatus and device manufacturing method: An exposure apparatus includes an optical path in which a plurality of optical units are arranged and which includes a portion of projecting a pattern of an original onto a substrate to expose the substrate to light, and a controller configured to monitor deteriorations, due to light, of the plurality... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090220875 - Electrophotographic photoconductor, image forming apparatus, and process cartridge: The present invention provides an electrophotographic photoconductor having a support, at least an intermediate layer, and a photosensitive layer, the intermediate layer and photosensitive layer being laid in this order over the support, wherein the intermediate layer comprises an amorphous oxide semiconductor.... Agent: Cooper & Dunham, LLP

20090220876 - Self lubricating photoreceptor: Disclosed is an electrophotographic imaging member that includes a lubricant delivering coating having a polymer matrix, a charge transport component, and a lubricant encapsulated within nano- or microcapsules. Also disclosed is an imaging forming apparatus including a charging device, a toner developer device, a cleaning device, and a photoreceptor having... Agent: Oliff & Berridge, PLC.

20090220877 - Photocurable composition, overprint, and production process therefor: A process for producing an overprint is provided, the process including a step of preparing a printed material by printing on a printing substrate, a step of coating the printed material with a photocurable composition, and a step of photocuring the photocurable composition, the photocurable composition comprising (A) a polymerizable... Agent: Sughrue Mion, PLLC

20090220878 - Exposure unit, image forming apparatus and image forming method: An exposure unit which exposes photoconductive drums having rotary axes thereof arranged parallel to each other on a single plane by light beams, includes one or more polygon mirrors each having a plurality of reflection surfaces, where the one or more polygon mirrors rotate about a common rotary axis. Each... Agent: Ipusa, P.l.l.c

20090220879 - Toner for developing latent electrostatic image, image forming device and process cartridge using the same: Provision of a toner for developing a latent electrostatic image, including a colorant, a binder resin, and a releasing agent, where molecular weight distribution of THF-soluble components of the toner measured by a GPC is in the range of Mw 4,000 to Mw 11,000, and a peak area of low... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090220880 - Grafting functionalized pearlescent or metallic pigment onto polyester polymers for special effect images: Pigment particles with at least one metal oxide surface additive, wherein the at least one metal oxide surface additive is a metal oxide particle covalently bonded with at least one polycondensation polymer, wherein the pigment particle is a pearlescent or metallic pigment.... Agent: Oliff & Berridge, PLC.

20090220881 - Toner binder and toner: wherein X is a residue formed by removing H of one OH group from a (poly)alkanolamine having 2 to 12 carbon atoms; R is H or a C1 to C8 alkyl group which may have 1 to 3 ether bonds; m is 1 to 4, n is 0 to 3,... Agent: Edwards Angell Palmer & Dodge LLP

20090220882 - Toner compositions: Toner particles are provided which may, in embodiments, include a core possessing an amorphous resin and a crystalline resin in combination with a colorant, optional wax, and optional other additives, and a shell over the core including a branched amorphous resin. The branched resin in the shell may prevent the... Agent: Xerox Corporation (cdfs)

20090220883 - Toner, developer, and image forming method: n

20090220884 - Method for charging toner particles: A charge adjuvant for promoting charging of toner particles comprising a dielectric carrier liquid; and an organic aluminum salt dissolved in the liquid, said organic aluminum salt being soluble in the carrier liquid at room temperature is disclosed. Also disclosed are solutions of the charge adjuvant with a charge director,... Agent: Hewlett Packard Company

20090220885 - Toner production method and toner granulating apparatus: Provided is a toner production method that reuses a fine particle toner having a particle diameter failing to meet a predetermined standard diameter which is generated in pulverizing and classifying processes carried out for a toner material including at least a binder resin, release agent and pigment. The method includes... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090220886 - Polyhydric compound and chemically amplified resist composition containing the same: o

20090220888 - Dyed photoresists and methods and articles of manufacture comprising same: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such... Agent: Rohm And Haas Electronic Materials LLC

20090220887 - Molecular resists based on functionalized polycarbocycles: The present invention refers to new organic molecules, derived from the class of polycarbocycle derivatives, and their application as components of photoresists, and in particular as components of photoresist compositions where no polymer is comprised as one of the photoresists components. In these photoresist formulations the new molecule(s) is/are the... Agent: Mathews, Shepherd, Mckay, & Bruneau, P.A.

20090220890 - Chemically amplified resist composition and chemically amplified resist composition for immersion lithography: wherein X1 represents a hydrogen atom, a C1 to C4 alkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, R1 to R4 independently represent a hydrogen atom, an alkyl group, etc., and A+ represents... Agent: Birch Stewart Kolasch & Birch

20090220889 - Photosensitive resin composition and method of forming pattern: A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090220891 - Method of on-press developing overcoated lithographic printing plate: A method of processing an on-press developable lithographic printing plate involving the removal of overcoat after imagewise exposure and before on-press development is described. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and an overcoat. The laser imaged plate is stripped off the overcoat,... Agent: Gary Ganghui Teng

20090220892 - Method of manufacturing semiconductor device, and resist coating and developing system: A method of manufacturing a semiconductor device includes: forming a resist layer on an underlayer, forming an exposed pattern in the resist layer, wherein the exposed pattern comprises a soluble layer and an insoluble layer, forming a resist pattern by removing the soluble layer from the resist layer in which... Agent: Cantor Colburn, LLP

20090220893 - Method for patterning a semiconductor wafer: A method for etching a pattern on a surface is disclosed. A mask layer is disposed over a surface and a resist is disposed over the mask layer. The resist is exposed to light through the mask exposing primary pattern and sidelobe regions. The resist is developed and the mask... Agent: Slater & Matsil LLP

20090220894 - Semiconductor device manufacturing method: A semiconductor device manufacturing method includes applying illumination light to a photomask, and projecting diffracted light components from the photomask via a projection optical system to form a photoresist pattern on a substrate. The photomask includes a plurality of opening patterns which are arranged on each of a plurality of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090220895 - Metrology of bilayer photoresist processes: A method for patterning a substrate is provided, which comprises (a) providing a substrate; (b) applying a first layer comprising a first photo resist to the substrate; (c) applying a second layer comprising a second photo resist over the first layer; (d) patterning the second layer; and (e) inspecting the... Agent: Fortkort & Houston P.C.

20090220896 - Pattern forming method: A pattern forming method has forming a lower layer film on a film to be processed, forming a silicon-containing intermediate film containing a protecting group which is removed by an acid, on said lower layer film, forming a resist film on said silicon-containing intermediate film, exposing a predetermined region of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090220897 - Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide: The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090220898 - Pattern forming method and method of manufacturing semiconductor device by using the same: The pattern forming method includes forming a catalyst film on a base layer having an uneven surface, wherein the catalyst layer is formed along the uneven surface of the base layer; forming a coating film by coating a fluid material on the catalyst film; forming an insoluble layer which is... Agent: Cantor Colburn, LLP