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Radiation imagery chemistry: process, composition, or product thereof August inventions list 08/09

20090214961 - Photomask blank, photomask, and methods of manufacturing the same: A photomask blank has a light-shielding film composed of at least two layers on a transparent substrate. The light-shielding film includes a light-shielding layer made of a material mainly containing tantalum nitride and further containing xenon and a front-surface antireflection layer formed on the light-shielding layer and made of a... Agent: Sughrue Mion, Pllc

20090214959 - Photoresist compositions and methods related to near field masks: A structure and a photolithography method. The method includes forming a first layer of a first photoresist including a first polymer and a first photosensitive acid generator. A second layer of a second photoresist, including a second polymer having at least one phenyl or phenolic moiety, is formed directly onto... Agent: Schmeiser, Olsen & Watts

20090214960 - Resist composition and patterning process: In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1400-5000 pbw of the solvent is present per 100 pbw of the resin. The solvent comprises a major proportion of PGMEA, 10-40 wt % of ethyl lactate, a total of PGMEA and ethyl lactate... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090214962 - Exposure apparatus: An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a position detector configured to detect a position of the original or the substrate that has an alignment... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090214964 - Semiconductor device manufacturing method, semiconductor device manufacturing equipment, and computer readable medium: A first storage section stores a relation between a PEB temperature and a photoresist dimension of a post-lithography. A second storage section stores a relation between a PEB temperature and a post-etching dimension. A primary correction section determines a first corrected PEB temperature for conforming the photoresist dimension of a... Agent: Mcginn Intellectual Property Law Group, Pllc

20090214963 - Substrate processing method, computer-readable storage medium, and substrate processing system: The present invention has: a first step of measuring, as an initial condition of a substrate, any of a film thickness of a processing film on the substrate, a refractive index of the processing film, an absorption coefficient of the processing film, and a warpage amount of the substrate; a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090214965 - Toner for electrophotography: An electrophotographic toner includes a binder resin, a colorant, and a releasing agent, wherein the electrophotographic toner has a complex viscosity (η) of 4e2 Pa·s to 8e3 Pa·s at a temperature range of 120 to 160° C. and an angular velocity range of 1.6 to 10 rad/s, a rate of... Agent: Stanzione & Kim, LLP

20090214966 - Toner, and image forming apparatus and image forming method using the toner: A toner including toner particles; and external additives including a fatty acid metal salt having an average primary particle diameter of from 0.5 to 1.5 μm; a positively chargeable particulate inorganic material; and a negatively chargeable particulate inorganic material. An image forming apparatus including a photoreceptor bearing an electrostatic image,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090214967 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the same: The present invention provides an electrophotographic photoreceptor having at least a photosensitive layer and a surface layer provided at a surface of the photosensitive layer The surface layer contains a first layer which is provided at the photosensitive layer side and has a refractive index of n1 and a second... Agent: Oliff & Berridge, Plc

20090214968 - Mixture of bisamine compounds, electrophotographic photoreceptor, method for forming image, and image forming apparatus: e

20090214969 - Protective overcoat of photoreceptor having a charge transport compound: A photoconductive member a layer including a substantially crosslinked product of a film-forming composition having at least a curing agent and a charge transport compound, wherein the charge transport compound has at least one group imparting charge transporting functionality, at least one crosslinking group and at least one fluorene moiety.... Agent: Oliff & Berridge, Plc.

20090214970 - Electrophotographic photoreceptor, coating liquid for undercoat layer of electrophotographic photoreceptor, and method for producing the same: A coating liquid for an undercoat layer of an electrophotographic photoreceptor which is formed by sequentially stacking the undercoat layer and a photosensitive layer on an electrically conductive support, wherein the coating liquid comprises titanium oxide microparticles and silicon nitride microparticles as an inorganic compound, a binder resin and an... Agent: Nixon & Vanderhye, Pc

20090214971 - Hybrid developing method using specified developer and image-forming apparatus using thereof: An image-forming method includes a process in which a toner is supported and transported on the surface of a toner supporting member placed face to face to an electrostatic latent image-supporting member, and electrostatic latent images formed on the electrostatic latent image-supporting member is developed by the toner; and a... Agent: Buchanan, Ingersoll & Rooney Pc

20090214972 - Toner compositions: The present disclosure provides resins having fluorescent agents suitable for use in toner compositions that are capable of imparting fluorescent properties to images printed with the toners.... Agent: Xerox Corporation (cdfs)

20090214974 - Toner for developing electrostatic image, full color toner kit, and image formation method: Disclosed is a toner for developing an electrostatic image, a full color toner kit comprising the toner and an image formation method employing the a full color toner kit, the toner comprising at least a resin and a colorant, wherein the colorant includes C.I. Pigment Blue 60 having a powder... Agent: Lucas & Mercanti, LLP

20090214973 - Toner, developer, toner container, process cartridge, image forming method, and image forming apparatus: A toner is provided that includes a release agent, a colorant, a binder resin including a polyester resin, and a fixing auxiliary component including an ester compound of a fatty acid with an alcohol. The fatty acid includes stearic acid and behenic acid in a total amount of 80% by... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090214975 - Toner for developing electrostatic latent image and method of preparing the toner, and image forming method using the toner: A toner prepared by a method including dissolving or dispersing at least at least one member selected from the group consisting of binder resins and precursors thereof, a colorant, a release agent, and a layered inorganic mineral in which ions between its layers are at least partially modified with an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20090214976 - Method of producing liquid developer and liquid developer produced by the method: A liquid developer comprised of toner particles having excellent fixing properties to a recording medium is provided, and a liquid developer in which toner particles having uniform shape and small particle size distribution are dispersed is also provided, and further a method of producing a liquid developer capable of producing... Agent: Hogan & Hartson L.l.p.

20090214977 - Image forming apparatus and image forming method: The present invention relates to an image forming apparatus 1 including a photosensitive member 2 on which an electrostatic latent image is formed according to an image signal, a development mechanism 5 for forming a toner image by developing the electrostatic latent images, and a transfer body 60 for transferring... Agent: Hogan & Hartson L.l.p.

20090214978 - Photoreceptor member: An electrophotographic photoreceptor and method for forming a photoreceptor is disclosed which is provided with an anticorrosion layer on the interface between the supporting substrate surface and the undercoat layer. The photoreceptor has a high mechanical strength and minimizes defects in print for longer periods of time.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090214979 - Photosensitive resin composition and photosensitive element: A photosensitive resin composition comprising (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and (b) a 1,2-quinonediazide compound. The photosensitive resin composition, which comprises component (b) composed of a 1,2-quinonediazide compound in combination with a component (a) obtained... Agent: Antonelli, Terry, Stout & Kraus, LLP

20090214980 - Melts: A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition... Agent: John J. Piskorski Rohm And Haas Electronic Materials Llc

20090214981 - Photoresists and methods for optical proximity correction: Photolithography compositions and methods. A first layer of a first photoresist is formed on a substrate. A second layer of a second photoresist is formed directly onto the first layer. The second polymer of the second photoresist includes an absorbing moiety. The second layer is patternwise imaged and developed, resulting... Agent: Schmeiser, Olsen & Watts

20090214982 - Positive resist composition, method of forming resist pattern, and polymeric compound: o

20090214983 - Laser-engraveable flexographic printing plate precursors: Laser-engraveable flexographic printing plate precursors have a laser-engraveable elastomeric layer that comprises a non-free radical crosslinked polymeric binder, an infrared radiation absorbing compound, and a compound that remains stable in the precursor but upon imaging thermally degrades to produce gaseous products. The thermally degradable compounds can generate or liberate one... Agent: Andrew J. Anderson Patent Legal Staff

20090214984 - Methods for enhancing photolithography patterning: A method for fabricating a a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern,... Agent: Horizon Ip Pte Ltd

20090214986 - Lithographic apparatus and device manufacturing method: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090214985 - Method for reducing surface defects on patterned resist features: A method is provided for post-processing lithographically patterned resists to reduce surface defects on a patterned resist feature. The method includes providing a substrate with a patterned resist feature containing surface defects with convex and concave regions, applying an acid solution to the patterned resist feature to form a surface... Agent: Tokyo Electron U.s. Holdings, Inc.

20090208850 - Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method: Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field... Agent: Fitzpatrick Cella Harper & Scinto

20090208852 - Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus: Provided are a pattern forming method capable of accurately forming a microscopic pattern without employing a hard mask, thereby simplifying a process in comparison to a conventional process and reducing a manufacturing cost of a semiconductor device, a semiconductor device manufacturing method and a semiconductor device manufacturing apparatus. A pattern... Agent: Pearne & Gordon LLP

20090208851 - Photomask, fabrication method for the same and pattern formation method using the same: A mask pattern including, for example, a light-shielding portion 101 and a first transparent portion 104A surrounded with a semi-light-shielding portion 102 are provided on a transparent substrate 100. The mask pattern includes a first pattern region and a second pattern region opposing each other with the semi-light-shielding portion 102... Agent: Mcdermott Will & Emery LLP

20090208853 - Mother substrate, film formation region arrangement method, and color filter manufacturing method: A mother substrate for forming a plurality of substrate elements includes a first film formation region and a second film formation region. The first film formation region corresponds to a first substrate element and includes at least one first film formation section. The second film formation region corresponds to a... Agent: GlobalIPCounselors, LLP

20090208854 - Photosensitive resin composition for forming column spacer of liquid crystal display, method for forming column spacer using the composition, column spacer formed by the method, and display device comprising the column spacer: Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented... Agent: Summa, Additon & Ashe, P.A.

20090208855 - Exposure apparatus and device manufacturing method: An exposure apparatus is configured to project a pattern of an original onto a substrate using a projection optical system, thereby exposing the substrate, and comprises a substrate stage configured to hold the substrate, a first detector configured to detect positions of marks on the substrate in a first direction... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090208856 - Overcoated photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, a charge transport layer, and a top overcoating layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center Xerox Corporation

20090208859 - Anticurl backside coating (acbc) photoconductors: A photoconductor that includes a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer containing at least one charge transport component, and where the first layer is in contact with the supporting substrate on the reverse side thereof, and which first layer is... Agent: Patent Documentation Center Xerox Corporation

20090208858 - Backing layer containing photoconductor: A photoconductor that includes, for example, a backing layer, a supporting substrate, a photogenerating layer, and a charge transport layer, and wherein the outermost layer of said backing layer is comprised of a self crosslinked acrylic resin and a crosslinkable siloxane component.... Agent: Patent Documentation Center Xerox Corporation

20090208857 - Overcoat containing fluorinated poly(oxetane) photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and in contact with the charge transport layer an overcoat layer comprised of a fluorinated poly(oxetane) polymer.... Agent: Patent Documentation Center Xerox Corporation

20090208860 - Organic photoreceptor and image forming apparatus: An object of the present invention is to form a high density electrostatic latent image on an organic photoreceptor via image exposure using a semiconductor laser or a light-emitting diode of an oscillation wavelength of 350-500 nm; and to provide an organic photoreceptor exhibiting improved sensitivity and repetition characteristics or... Agent: Cantor Colburn, LLP

20090208861 - Developer and image forming apparatus: A developer used in an image forming apparatus contains a binder resin containing a polyester resin, a releasing agent containing natural ester wax (A) and synthetic ester wax (B), and a colorant.... Agent: Turocy & Watson, LLP

20090208862 - Two component developer and image forming method: Provided is a method for forming an image containing the steps of: (a) forming an electrostatic latent image on an electrostatic latent image carrier; and (b) developing the electrostatic latent image by a two component developer comprising a toner and a carrier, wherein the two component developer is continually replenished... Agent: Lucas & Mercanti, LLP

20090208863 - Electrophotographic toner, electrophotographic developer and production method of electrophotographic toner: An electrophotographic toner which is thermally stable in storage or as an image after being fixed and exhibits a sufficiently low melt viscosity and a high fluidity when heated during fixing is disclosed, comprising a colorant and a binder resin, wherein the binder resin contains a poly-branched resin composition in... Agent: Lucas & Mercanti, LLP

20090208864 - Solvent-free phase inversion process for producing resin emulsions: A process for making a resin emulsion suitable for use in forming toner particles includes melt mixing a resin possessing acid groups at a temperature higher than the glass transition temperature of the resin, optionally adding a surfactant before, prior to, during, or after melt mixing the resin, and adding... Agent: Xerox Corporation (cdfs)

20090208865 - Photolithography focus improvement by reduction of autofocus radiation transmission into substrate: An anti-reflective coating material, a microelectronic structure that includes an anti-reflective coating layer formed from the anti-reflective coating material and a related method for exposing a resist layer located over a substrate while using the anti-reflective coating layer provide for attenuation of secondary reflected vertical alignment beam radiation when aligning... Agent: Scully, Scott, Murphy & Presser, P.C.

20090208866 - Photosensitive composition: A photosensitive composition is provided, which includes a compound expressed by the formula T3 and a photo-acid generator which generates an acid by an action of actinic radiation. In the formula T3, R3s are hydrogen atoms and hydrophobic groups. The hydrophobic groups are selected from the group consisting of (AD-1),... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090208867 - Resist composition, resist protective coating composition, and patterning process: A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist... Agent: Birch Stewart Kolasch & Birch

20090208868 - Positive photosensitive resin composition and method for forming pattern: wherein m is an integer of 1 or greater, and R is an aromatic group or an aliphatic group having a valency of 1 or higher. The positive photosensitive resin composition can be developed by using an aqueous solution of alkali metal carbonate, is capable of forming micropatterns, and has... Agent: Buchanan, Ingersoll & Rooney PC

20090208869 - Lithographic-printing plate precursor and image forming method using the same: To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties capable of preventing the formation of deposits during the development. In an infrared-sensitive or heat-sensitive lithographic printing plate precursor, comprising a substrate, a first image... Agent: Eastman Kodak Company Patent Legal Staff

20090208870 - Photosensitive composition and lithographic printing original plate using the composition: A thermal negative type lithographic printing original plate has a photosensitive layer featuring high sensitivity, excellent reproducibility in FM screening, and excellent print durability and chemical resistance at a minute image portion. A photosensitive composition for the photosensitive layer contains an alkali soluble resin having a monomer unit represented by... Agent: Foley And Lardner LLP Suite 500

20090208871 - Novel compound and method of producing same, acid generator, resist composition, and method of forming resist pattern: wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes... Agent: Knobbe Martens Olson & Bear LLP

20090208873 - Polymer, resist composition, and patterning process: A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency... Agent: Birch Stewart Kolasch & Birch

20090208872 - Sulphonium salt initiators: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example... Agent: Joann Villamizar Ciba Corporation/patent Department

20090208874 - Method of processing on-press developable lithographic printing plate having overcoat: A method of processing an on-press developable lithographic printing plate involving the removal of the overcoat after laser imaging and before on-press development is described. The plate comprises a substrate, an on-press ink and/or fountain solution developable photosensitive layer, and an overcoat. The laser imaged plate is mechanically stripped off... Agent: Gary Ganghui Teng

20090208875 - Surface position detecting apparatus, exposure apparatus, and device manufacturing method: A surface position detecting apparatus disclosed herein has a light-sending optical system SL to guide light to a detection target surface, a light-receiving optical system to guide the light to a light-receiving surface, a detector arranged on the light-receiving surface, a splitter to split the light guided to the detection... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090208876 - Long-length fiber bragg creating sequential uv writing by probing phase mask: A new fiber position monitoring method for sequential FBG UV-writing processes with a reference phase mask as the phase reference is proposed. Also, the new method by probing a reference phase mask can overcome the optical alignment difficulties in using reference fiber as well as provide more signal power for... Agent: Bacon & Thomas, PLLC

20090208877 - Methods of making optical fiber gratings: Optical fibers and optical fiber lasers including gratings and methods of writing gratings into fibers. A method can comprise providing a photosensitive optical fiber having a region having an original refractive index (RI) profile along the elongate direction of the fiber; exposing the optical fiber to actinic radiation to alter... Agent: Nufern Peter J. Rainville

20090208878 - Lithographic system, lithographic apparatus and device manufacturing method: A lithographic system includes two lithographic apparatus. A first lithographic apparatus is configured to project a patterned radiation beam onto a first target portion of a substrate. The second lithographic apparatus includes an interferometric arrangement configured to split the radiation beam and to recombine the split beams so as to... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090208879 - Substrate processing method, program, computer-readable recording medium, and substrate processing system: In the present invention, a substrate on which a resist film has been formed is transferred to an aligner and subjected to exposure processing. The substrate is then subjected to post-exposure baking in a second processing system. The substrate is then transferred again to the aligner and subjected to exposure... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090208881 - Immersion ultraviolet photolithography process: The invention relates to ultraviolet photolithography at 193 nanometres or 157 nanometres. To maximize resolution, optics having a very high numerical aperture are used, but without photoresists of sufficient index to best benefit from this high numerical aperture. It is proposed to use standard resists (PR) but with a thickness... Agent: Lowe Hauptman & Berner, LLP

20090208880 - Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch: Method and systems for patterning a hardmask film using ultraviolet light is disclosed according to one embodiment of the invention. Embodiments of the present invention alleviate the processing problem of depositing and etching photoresist in order to produce a hardmask pattern. A hardmask layer, such as, silicon oxide, is first... Agent: Townsend And Townsend And Crew LLP

20090208882 - Stamp for patterning, method for manufacturing such stamp and method for manufacturing an object using the stamp: A stamp for patterning onto a receiving surface of an object (101) according to a defined pattern (P) comprises a stamping surface (21) of a resilient diaphragm (20). The stamping surface is planar at rest. The pattern is reproduced on the stamping surface and the diaphragm is affixed to a... Agent: Occhiuti Rohlicek & Tsao, LLP

20090208884 - Exposure apparatus: An exposure apparatus includes a driver used for one of height, inclination, curvature-of-field, magnification, and rotation corrections, and a controller configured to control a substrate stage so that it can change an exposure area from a first shot to a third shot even if a moving distance of the substrate... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090208885 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus includes a first optical member from which an exposure beam is emitted; a first object movable at a light-exit side of the first optical member; a second object movable, independently of the first object, at the light-exit side of the first optical member; and a driving unit... Agent: Oliff & Berridge, PLC

20090208883 - Stage device, exposure apparatus, exposure method and device manufacturing method: A stage apparatus 2 includes a table member 17 which holds a first object; a liquid recovery port 40 which is provided on the table member and via which a first liquid is recovered; a first flow passage 41 which is formed in the table member, which is connected to... Agent: Oliff & Berridge, PLC

20090208886 - Double patterning process: Double patterns are formed by coating a first chemically amplified positive resist composition comprising an acid labile group-bearing resin and a photoacid generator and prebaking to form a resist film on a processable substrate, exposing the resist film to high-energy radiation, PEB, and developing with an alkaline developer to form... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090208887 - Removing solution for photosensitive composition: A removing solution for photosensitive composition for removal of pigment-containing photosensitive compositions, comprising an alicyclic ketone, an alkylene glycol monoalkyl ether and/or alcohol, and optionally an acetic acid ester. The removing solution has excellent photosensitive composition removing performance.... Agent: Sughrue Mion, PLLC

20090202919 - Apparatus and methods for threshold control of photopolymerization for holographic data storage using at least two wavelengths: A polymerizable media, including holographic recording media, and methods of use of the same. The media comprises at least one monomer or oligomer which undergoes polymerization to form a polymer; a compound, which absorbs actinic radiation of a first wavelength and forms a sensitizer which absorbs actinic radiation of a... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20090202920 - Optical recording composition and holographic recording medium: The present invention provides an optical recording composition comprising at least one optical recording compound selected from the group consisting of cyanine compounds having specific structures and a holographic recording medium comprising a recording layer, wherein the recording layer comprises at least one optical recording compound selected from the group... Agent: Sughrue Mion, PLLC

20090202921 - Optical recording composition and holographic recording medium: In general formula (I), each of A1 and A2 independently denotes —CR4R5—, —O—, —NR6—, —S—, or —C(═O)—, each of R4, R5, and R6 independently denotes a hydrogen atom or a substituent, R1 denotes a substituent, n denotes an integer ranging from 0 to 4, each of R2 and R3 independently... Agent: Sughrue Mion, PLLC

20090202922 - Dimensional stabilization of precision etched masks: Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the sheet of mask material to a temperature within a predetermined range for a predetermined amount of time to produce... Agent: Rader Fishman & Grauer PLLC

20090202926 - Exposure mask and pattern forming method therefor: An exposure mask is constituted of hole-patterns whose scales are higher than the limit resolution of exposure light and which are repetitively aligned in X-Y directions with the prescribed pitch (ranging from 140 nm to 180 nm) therebetween, halftone phase shift regions whose transmission factors range from 2% to 20%... Agent: Young & Thompson

20090202924 - Method of evaluating a photo mask and method of manufacturing a semiconductor device: A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090202925 - Photomask defect correction method, photomask manufacturing method, phase shift mask manufacturing method, photomask, phase shift mask, photomask set, and pattern transfer method: A first photomask 1 has a first transfer pattern to be transferred onto an object and is adapted to be used in combination with a second photomask having a second transfer pattern to be transferred onto the object. Among pattern defects 4 and 5 generated in the first transfer pattern,... Agent: Sughrue Mion, PLLC

20090202923 - Photomask manufacturing method, photomask manufacturing apparatus and photomask: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090202927 - Charge control agent, toner, image forming method, and image forming apparatus: To provide: a charge control agent having negative chargeability, which contributes to environmental conservation and the like to an increased degree, has high performance (high charge amount, quick rise-up of charge, excellent stability with time, and high environmental stability), and has improved dispersibility; a toner for developing an electrostatic charge... Agent: Fitzpatrick Cella Harper & Scinto

20090202929 - Electrophographic photoreceptor including diphenoquinone-based compounds including oxadiazolene group, and electrophotographic imaging apparatus using the same: wherein R1, R2, R3, R4, R5, R6, R7 and R8 are each independently selected from the group consisting of a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C1-C20 substituted or unsubstituted alkoxy group, a C6-C30 substituted or unsubstituted aryl group, a C7-C30 substituted or unsubstituted aralkyl group,... Agent: Stanzione & Kim, LLP

20090202928 - Control of crazing, cracking or crystallization of a charge transport layer in a photoconductor: Embodiments of a photoconductor for use in a printer or printer cartridge comprise an electrically conductive substrate, a charge generation layer disposed over the electrically conductive substrate, and a charge transport layer disposed over the charge generation layer, wherein the charge transport layer comprises charge transport molecules with octyl/decyl glycidyl... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090202930 - Infrared dye composition, infrared ray absorbing ink and electrophotographic toner: An infrared dye composition including at least: a compound (I) whose spectral absorption maximum wavelength is in a range of from 750 nm to 1,050 nm; and a compound (II) whose spectral absorption maximum wavelength is in a range of from 400 nm to 700 nm, wherein, when an absorbance... Agent: Birch Stewart Kolasch & Birch

20090202932 - Medium for laser printing including optical special effect flakes: A laser toner includes optical effect taggent flakes or other structures in a binder suitable for binding particles to a substrate. Preferably the optical effect taggent structures have a substantially same shape or same indicia within the binder sized to be suitable for laser printing. After printing the flakes or... Agent: Pequignot + Myers LLC

20090202931 - Charge control agents for toner compositions: The present disclosure provides polymer-ionic complexes useful as charge control agents. Such charge control agents may be utilized with toner particles to impart excellent triboelectric charging characteristics to the toner.... Agent: Xerox Corporation (cdfs)

20090202933 - Yellow toner: e

20090202935 - Carrier, two-component developer containing carrier and toner, and image forming method: A carrier including magnetic core particles and a coating layer, wherein the coating layer is formed by applying a coating liquid containing at least colloidal silica, a condensate of alkoxysilane represented by General Formula (1) and a solvent onto the core particles; an amount of colloidal silica contained in the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202934 - Electrostatic image developing toner, two-component developer, image forming method and process cartridge: A toner including: toner particles which include: a colorant, a releasing agent, and a binder resin. The number average particle diameter of the toner particles is in the range of from 3.5 μm to 6.5 μm, wherein the number average particle diameter is determined by the Coulter method, the variation... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202936 - Heat regulated printer element, use of a rubber material having a phase change material dispersed therein, a printer and a method of printing: A surface temperature of a heat regulated printer element is accurately controlled by providing at least a layer of a rubber material with a phase change material dispersed therein. A method of printing uses an image receiving intermediate carrier including at least a layer of a rubber material with a... Agent: Birch Stewart Kolasch & Birch

20090202937 - Method for preparing an electrophotographic photoreceptor: A method for preparing an electrophotographic photoreceptor, includes coating an electroconductive substrate with an undercoat layer containing a blocked isocyanate compound, an oil-free alkyd resin including a hydroxyl group and basic amine; crosslinking the blocked isocyanate compound, oil-free alkyd resin including a hydroxyl group and basic amine; and coating the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202939 - Compound, positive resist composition and method for forming resist pattern: Specifically disclosed is a compound represented by a formula (A-1). In the formula (A-1), R11 to R17 each represents an alkyl group or an aromatic hydrocarbon group; g and j each represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater,... Agent: Knobbe Martens Olson & Bear LLP

20090202938 - Method of improving surface abrasion resistance of imageable elements: A computer-to-press multi-layer, positive-working imageable element has improved surface abrasion resistance from a micro-roughening of the outermost surface. This improvement is provided by spraying a solution consisting essentially of one or more dissolved organic resins in a solvent onto the outermost imageable layer of the imageable element. The one or... Agent: Eastman Kodak Company Patent Legal Staff

20090202940 - Positive resist composition and patterning process using the same: c

20090202941 - Silsesquioxane resin systems with base additives bearing electron-attracting functionalities: Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) least one organic base additive selected from bulky tertiary amines, imides, amides and the polymeric amines wherein the organic base additive contains an electron-attracting group with the... Agent: Darby & Darby P.C.

20090202942 - Process for producing patterned film and photosensitive resin composition: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of... Agent: Cheng Law Group, PLLC

20090202943 - Positive resist composition and patterning process: A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of... Agent: Birch Stewart Kolasch & Birch

20090202945 - Fluorine-containing polymer, purification method, and radiation-sensitive resin composition: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid... Agent: Ditthavong Mori & Steiner, P.C.

20090202944 - Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition:

20090202946 - Positive resist composition for use with electron beam, x-ray or euv and pattern forming method using the same: A positive resist composition for use with electron beam, X-ray or EUV and a pattern forming method using the positive resist composition are provided, the positive resist composition including: (A) a resin capable of decomposing under an action of an acid to increase a dissolution rate in an aqueous alkali... Agent: Sughrue-265550

20090202947 - Positive resist composition and patterning process using the same: p

20090202948 - Method for developing and sealing of lithographic printing plates: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound... Agent: Eastman Kodak Company Patent Legal Staff

20090202949 - Producing method of wired circuit board: A producing method of a wired circuit board includes the steps of preparing a two-layer base material including a metal supporting layer and an insulating layer, covering an upper surface of the insulating layer and respective side end surfaces of the insulating layer and the metal supporting layer with a... Agent: Akerman Senterfitt

20090202950 - Laser irradiation apparatus and method of fabricating organic light emitting display using the same: Provided are a laser irradiation apparatus and method of fabricating an organic light emitting display using the same. The laser irradiation apparatus includes a mask positioned below the laser generator, and the mask is patterned such that lengths of an upper portion and a lower portion of a mask pattern... Agent: H.c. Park & Associates, PLC

20090202951 - Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202952 - Sublithographic patterning method incorporating a self-aligned single mask process: A method of implementing sub-lithographic patterning of a semiconductor device includes forming a first set of patterned features with a single lithography step, the initial set of patterned features characterized by a linewidth and spacing therebetween; forming a first set of sidewall spacers on the first set of patterned features,... Agent: Cantor Colburn LLP-ibm Yorktown

20090202919 - Apparatus and methods for threshold control of photopolymerization for holographic data storage using at least two wavelengths: A polymerizable media, including holographic recording media, and methods of use of the same. The media comprises at least one monomer or oligomer which undergoes polymerization to form a polymer; a compound, which absorbs actinic radiation of a first wavelength and forms a sensitizer which absorbs actinic radiation of a... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20090202920 - Optical recording composition and holographic recording medium: The present invention provides an optical recording composition comprising at least one optical recording compound selected from the group consisting of cyanine compounds having specific structures and a holographic recording medium comprising a recording layer, wherein the recording layer comprises at least one optical recording compound selected from the group... Agent: Sughrue Mion, PLLC

20090202921 - Optical recording composition and holographic recording medium: In general formula (I), each of A1 and A2 independently denotes —CR4R5—, —O—, —NR6—, —S—, or —C(═O)—, each of R4, R5, and R6 independently denotes a hydrogen atom or a substituent, R1 denotes a substituent, n denotes an integer ranging from 0 to 4, each of R2 and R3 independently... Agent: Sughrue Mion, PLLC

20090202922 - Dimensional stabilization of precision etched masks: Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the sheet of mask material to a temperature within a predetermined range for a predetermined amount of time to produce... Agent: Rader Fishman & Grauer PLLC

20090202926 - Exposure mask and pattern forming method therefor: An exposure mask is constituted of hole-patterns whose scales are higher than the limit resolution of exposure light and which are repetitively aligned in X-Y directions with the prescribed pitch (ranging from 140 nm to 180 nm) therebetween, halftone phase shift regions whose transmission factors range from 2% to 20%... Agent: Young & Thompson

20090202924 - Method of evaluating a photo mask and method of manufacturing a semiconductor device: A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090202925 - Photomask defect correction method, photomask manufacturing method, phase shift mask manufacturing method, photomask, phase shift mask, photomask set, and pattern transfer method: A first photomask 1 has a first transfer pattern to be transferred onto an object and is adapted to be used in combination with a second photomask having a second transfer pattern to be transferred onto the object. Among pattern defects 4 and 5 generated in the first transfer pattern,... Agent: Sughrue Mion, PLLC

20090202923 - Photomask manufacturing method, photomask manufacturing apparatus and photomask: A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090202927 - Charge control agent, toner, image forming method, and image forming apparatus: To provide: a charge control agent having negative chargeability, which contributes to environmental conservation and the like to an increased degree, has high performance (high charge amount, quick rise-up of charge, excellent stability with time, and high environmental stability), and has improved dispersibility; a toner for developing an electrostatic charge... Agent: Fitzpatrick Cella Harper & Scinto

20090202929 - Electrophographic photoreceptor including diphenoquinone-based compounds including oxadiazolene group, and electrophotographic imaging apparatus using the same: wherein R1, R2, R3, R4, R5, R6, R7 and R8 are each independently selected from the group consisting of a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C1-C20 substituted or unsubstituted alkoxy group, a C6-C30 substituted or unsubstituted aryl group, a C7-C30 substituted or unsubstituted aralkyl group,... Agent: Stanzione & Kim, LLP

20090202928 - Control of crazing, cracking or crystallization of a charge transport layer in a photoconductor: Embodiments of a photoconductor for use in a printer or printer cartridge comprise an electrically conductive substrate, a charge generation layer disposed over the electrically conductive substrate, and a charge transport layer disposed over the charge generation layer, wherein the charge transport layer comprises charge transport molecules with octyl/decyl glycidyl... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090202930 - Infrared dye composition, infrared ray absorbing ink and electrophotographic toner: An infrared dye composition including at least: a compound (I) whose spectral absorption maximum wavelength is in a range of from 750 nm to 1,050 nm; and a compound (II) whose spectral absorption maximum wavelength is in a range of from 400 nm to 700 nm, wherein, when an absorbance... Agent: Birch Stewart Kolasch & Birch

20090202932 - Medium for laser printing including optical special effect flakes: A laser toner includes optical effect taggent flakes or other structures in a binder suitable for binding particles to a substrate. Preferably the optical effect taggent structures have a substantially same shape or same indicia within the binder sized to be suitable for laser printing. After printing the flakes or... Agent: Pequignot + Myers LLC

20090202931 - Charge control agents for toner compositions: The present disclosure provides polymer-ionic complexes useful as charge control agents. Such charge control agents may be utilized with toner particles to impart excellent triboelectric charging characteristics to the toner.... Agent: Xerox Corporation (cdfs)

20090202933 - Yellow toner: e

20090202935 - Carrier, two-component developer containing carrier and toner, and image forming method: A carrier including magnetic core particles and a coating layer, wherein the coating layer is formed by applying a coating liquid containing at least colloidal silica, a condensate of alkoxysilane represented by General Formula (1) and a solvent onto the core particles; an amount of colloidal silica contained in the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202934 - Electrostatic image developing toner, two-component developer, image forming method and process cartridge: A toner including: toner particles which include: a colorant, a releasing agent, and a binder resin. The number average particle diameter of the toner particles is in the range of from 3.5 μm to 6.5 μm, wherein the number average particle diameter is determined by the Coulter method, the variation... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202936 - Heat regulated printer element, use of a rubber material having a phase change material dispersed therein, a printer and a method of printing: A surface temperature of a heat regulated printer element is accurately controlled by providing at least a layer of a rubber material with a phase change material dispersed therein. A method of printing uses an image receiving intermediate carrier including at least a layer of a rubber material with a... Agent: Birch Stewart Kolasch & Birch

20090202937 - Method for preparing an electrophotographic photoreceptor: A method for preparing an electrophotographic photoreceptor, includes coating an electroconductive substrate with an undercoat layer containing a blocked isocyanate compound, an oil-free alkyd resin including a hydroxyl group and basic amine; crosslinking the blocked isocyanate compound, oil-free alkyd resin including a hydroxyl group and basic amine; and coating the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202939 - Compound, positive resist composition and method for forming resist pattern: Specifically disclosed is a compound represented by a formula (A-1). In the formula (A-1), R11 to R17 each represents an alkyl group or an aromatic hydrocarbon group; g and j each represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater,... Agent: Knobbe Martens Olson & Bear LLP

20090202938 - Method of improving surface abrasion resistance of imageable elements: A computer-to-press multi-layer, positive-working imageable element has improved surface abrasion resistance from a micro-roughening of the outermost surface. This improvement is provided by spraying a solution consisting essentially of one or more dissolved organic resins in a solvent onto the outermost imageable layer of the imageable element. The one or... Agent: Eastman Kodak Company Patent Legal Staff

20090202940 - Positive resist composition and patterning process using the same: c

20090202941 - Silsesquioxane resin systems with base additives bearing electron-attracting functionalities: Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) least one organic base additive selected from bulky tertiary amines, imides, amides and the polymeric amines wherein the organic base additive contains an electron-attracting group with the... Agent: Darby & Darby P.C.

20090202942 - Process for producing patterned film and photosensitive resin composition: A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of... Agent: Cheng Law Group, PLLC

20090202943 - Positive resist composition and patterning process: A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of... Agent: Birch Stewart Kolasch & Birch

20090202945 - Fluorine-containing polymer, purification method, and radiation-sensitive resin composition: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid... Agent: Ditthavong Mori & Steiner, P.C.

20090202944 - Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition:

20090202946 - Positive resist composition for use with electron beam, x-ray or euv and pattern forming method using the same: A positive resist composition for use with electron beam, X-ray or EUV and a pattern forming method using the positive resist composition are provided, the positive resist composition including: (A) a resin capable of decomposing under an action of an acid to increase a dissolution rate in an aqueous alkali... Agent: Sughrue-265550

20090202947 - Positive resist composition and patterning process using the same: p

20090202948 - Method for developing and sealing of lithographic printing plates: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound... Agent: Eastman Kodak Company Patent Legal Staff

20090202949 - Producing method of wired circuit board: A producing method of a wired circuit board includes the steps of preparing a two-layer base material including a metal supporting layer and an insulating layer, covering an upper surface of the insulating layer and respective side end surfaces of the insulating layer and the metal supporting layer with a... Agent: Akerman Senterfitt

20090202950 - Laser irradiation apparatus and method of fabricating organic light emitting display using the same: Provided are a laser irradiation apparatus and method of fabricating an organic light emitting display using the same. The laser irradiation apparatus includes a mask positioned below the laser generator, and the mask is patterned such that lengths of an upper portion and a lower portion of a mask pattern... Agent: H.c. Park & Associates, PLC

20090202951 - Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090202952 - Sublithographic patterning method incorporating a self-aligned single mask process: A method of implementing sub-lithographic patterning of a semiconductor device includes forming a first set of patterned features with a single lithography step, the initial set of patterned features characterized by a linewidth and spacing therebetween; forming a first set of sidewall spacers on the first set of patterned features,... Agent: Cantor Colburn LLP-ibm Yorktown

20090197185 - Document recording method and apparatus: A document recording method for recording a document on a microfilm, the document including a series of pages, a format of which is specified so as to include at least a page representing commencement, a page representing an original, and a page representing conclusion. The method includes recording all or... Agent: Sughrue Mion, PLLC

20090197187 - Hologram fabrication process and fabricated hologram: The invention provides a hologram in which a visually unidentifiable microtext or other micropattern of the order of 10 μm is recorded, and a process for the fabrication of the same. A volume hologram recording material 2 is located on the side of a reflection type volume hologram master 1... Agent: Sughrue Mion, PLLC

20090197186 - Optical devices responsive to blue laser and method of modulating light: An optical device comprising a photorefractive composition configured to be photorefractive upon irradiation by a blue laser. The photorefractive composition comprises a polymer comprising a repeating unit including at least a moiety selected from the group consisting of the formulas (Ia), (Ib) and (Ic), as defined herein.... Agent: Knobbe Martens Olson & Bear LLP

20090197189 - Focus measurement method and method of manufacturing a semiconductor device: In a focus measurement method and a method of manufacturing a semiconductor device relating to the present invention, a focus value is obtained by using a fluctuation where shrinkage of a resist pattern by an electron beam irradiation depends upon the focus value. In the case of obtaining the focus... Agent: Mcdermott Will & Emery LLP

20090197188 - Method for a multiple exposure beams lithography tool: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of exposure beams. In an example embodiment it is determined if any of the beams have an actual position relative to... Agent: Haynes Beffel & Wolfeld LLP

20090197190 - Two-component developer, replenishing developer, and image-forming method using the developers: An object of the present invention is to suppress the adhesion of a carrier to an image bearing member and the generation of a flaw in the surface layer of the image bearing member, and to improve the dot reproducibility of an electrostatic latent image, and soon. The object is... Agent: Fitzpatrick Cella Harper & Scinto

20090197191 - Electrophotographic photoreceptor having excellent stability in terms of electrical properties and interlayer adhesion strength and electrophotographic imaging apparatus employing the same:

20090197192 - Magnetic toner: A magnetic toner having magnetic toner particles containing at least a binder resin and a magnetic material, wherein, in the test of dissolution level of the magnetic material, the dissolution percentages S3 (% by mass), S15 (% by mass) and S30 (% by mass), and the dissolution level proportion Sc... Agent: Fitzpatrick Cella Harper & Scinto

20090197193 - Toner: To provide a toner which has superior low-temperature fixing performance, high-temperature anti-offsetting properties and developing performance and may cause neither melt sticking of toner to photosensitive member nor turn-up of cleaning blade. The toner contains at least a binder resin, a colorant and a wax, and the wax is characterized... Agent: Fitzpatrick Cella Harper & Scinto

20090197194 - Carrier core material for electrophotographic developer, carrier and electrophotographic developer using the carrier: There are adopted: a carrier core material for an electrophotographic developer, including Mg, Ti and Fe as main components, and containing Fe, Mg and Ti in contents of 52 to 66% by weight, 3 to 12% by weight and 0.2 to 12% by weight, respectively; an electrophotographic developer carrier prepared... Agent: Greenblum & Bernstein, P.L.C

20090197195 - Electrophotographic photoreceptor and image forming method: Provide is an electrophotographic photoreceptor exhibiting excellent evenness of halftone images together with fine line reproduction, and an image forming method thereof, as to a photoreceptor in which an oxytitanium phthalocyanine pigment having a maximum diffraction peak at a Bragg angle (2θ±0.2°) of 27.2° in CuKα X-ray diffraction. Also disclosed... Agent: Buchanan, Ingersoll & Rooney PC

20090197196 - Imaging member and methods of forming the same: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved imaging member having a charge transport layer comprising a top layer and a bottom layer, wherein the layers have varying concentrations of high quality N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine to provide tunable discharge... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090197198 - Photosensitive molecular compound and photoresist composition including the same: In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an... Agent: Birch Stewart Kolasch & Birch

20090197197 - Resist composition and method of forming resist pattern: A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D), the nitrogen-containing organic compound (D) including a nitrogen-containing polymeric compound (D1) having a structural... Agent: Knobbe Martens Olson & Bear LLP

20090197199 - Material for forming resist protective film and method for forming resist pattern using same: In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes,... Agent: Nixon Peabody LLP

20090197200 - Resist top coat composition and patterning process: The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a... Agent: Oliff & Berridge, PLC

20090197201 - Fluorosurfactants: The present invention relates to the use of end groups Y, where Y stands for (formula I), where Rf stands for CF3—(CH2)r—, CF3—(CH2)r—O—, CF3—(CH2)r—S—, CF3CF2—S—, SF5—(CH2)r—, [CF3—(CH2)r]2N—, [CF3—(CH2)r]NH— or (CF3)2N—(CH2)r—, B stands for a single bond, O, NH, NR, CH2, C(O)—O, C(O), S, CH2—O, O—C(O), N—C(O), C(O)—N, O—C(O)—N, N—C(O)—N, O—SO2... Agent: Millen, White, Zelano & Branigan, P.C.

20090197205 - Lithographic printing plate precursor and printing method: A lithographic printing plate precursor includes a support, an image-recording layer and a protective layer in this order, wherein the protective layer contains a stratiform compound and the image-recording layer contains a polymer compound having a phosphonium structure in a side chain.... Agent: Birch Stewart Kolasch & Birch

20090197203 - Photosensitive conductive paste for transferring and photosensitive transfer sheet: A photosensitive conductive paste for transferring including a metal powder, an inorganic material powder, a photosensitive resin and a polymerization initiator, and to be applied onto a surface of a transfer support, comprising an acrylic resin or a rosin-based resin.... Agent: Oliff & Berridge, PLC

20090197202 - Photosensitive planographic printing plate material: Disclosed is a photosensitive surface printing plate material which is suitable for the exposure to a laser beam having a light emission wavelength ranging from 350 to 450 nm, is highly sensitive, and has excellent storage stability. The material has a substrate and a photosensitive layer provided on the substrate,... Agent: Lucas & Mercanti, LLP

20090197204 - Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2... Agent: Knobbe Martens Olson & Bear LLP

20090197206 - Method of making images using fresh processing solution: A method for providing lithographic printing plates is achieved by imaging a lithographic printing plate precursor and processing it with fresh (not reused) samples of a processing solution that both develops and protects the resulting lithographic image. The lithographic printing plate precursors can be either negative-working or positive-working.... Agent: Andrew J. Anderson Patent Legal Staff

20090197207 - Negative laser sensitive lithographic printing plate having specific photosensitive composition: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or... Agent: Gary Ganghui Teng

20090197208 - Method for manufacturing a perpendicular magnetic write pole using an electrical lapping guide for tight write pole flare point control: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method provides for accurate definition of a device feature such as a write pole flare point. A functional lapping guide is formed to determine when a lapping operation should be terminated to define an air bearing surface... Agent: Zilka-kotab, PC- Hit

20090197209 - Lithographically patterned nanowire electrodeposition: Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography is employed to define the position of a sacrificial nanoband electrode, preferably formed from a metal such as nickel, copper, silver, gold or the like, which is stripped using electrooxidation or a chemical... Agent: Orrick, Herrington & Sutcliffe, LLPIPProsecution Department

20090197210 - Method for preparing photonic crystal slab waveguides: A method for preparing a photonic crystal slab waveguides is disclosed, wherein the photonic crystal slab waveguides are prepared by combining near-field phase-shifting contact lithography (NFPSCL) with interference lithography (IL). Conventional methods used for preparing the photonic crystal slab waveguides, such as electron beam lithography or direct laser writing, are... Agent: Bacon & Thomas, PLLC

20090197211 - Lithographic apparatus and device manufacturing method: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from... Agent: Pillsbury Winthrop Shaw Pittman, LLP