|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
USPTO Class 430 | Browse by Industry: Previous - Next | All
07/2009 | Recent | 13: May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Radiation imagery chemistry: process, composition, or product thereof July category listing 07/09Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 07/30/2009 > patent applications in patent subcategories. category listing
20090191467 - Image-formed object and method for producing the same: An image-formed object comprises a background region where an optical diffraction structure for background focusing a predetermined design as a hologram image at a predetermined image-formation distance, and at least one inset region provided so as to be inset in the background region, wherein, in the inset region, an optical... Agent: Ladas & Parry LLP
20090191472 - Blank mask and method for fabricating the same: A blank mask includes a pattern target layer formed over a transparent substrate and a self-assembly monolayer disposed over and modifying the surface of a back side of the transparent substrate opposite to the pattern target layer.... Agent: Marshall, Gerstein & Borun LLP
20090191471 - Composition for cleaning a phase shift mask and associated methods: A composition for cleaning a phase shift mask, including an organic acid ammonium salt, wherein a base ionization constant (Kb) of organic acid ions is larger than an acid ionization constant (Ka) of ammonium ions, hydrogen peroxide, and water, and associated methods.... Agent: Lee & Morse, P.C.
20090191468 - Contact level mask layouts by introducing anisotropic sub-resolution assist features: This disclosure includes a SRAF layout that minimizes the number of SRAFs required to reliably print contact shapes. A method is provided that reduces the number of necessary SRAF features on a mask, placing at least two elongated SRAF shapes on the mask such that the elongated SRAF shapes extend... Agent: Hoffman Warnick LLC
20090191475 - Method of manufacturing photomask: A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.... Agent: Mills & Onello LLP
20090191474 - On-track process for patterning hardmask by multiple dark field exposures: This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development... Agent: Hovey Williams LLP
20090191470 - Pellicle frame: The present invention is directed to provide a pellicle that can control the deformation of the photomask to a minimum without particular consideration of the flatness of a pellicle frame even in the case where a pellicle is affixed to a photomask for lithography. In the pellicle of the present... Agent: Lowe Hauptman Ham & Berner, LLP
20090191473 - Photomask manufacturing method, photomask manufacturing system, and device manufacturing method: A drawing apparatus is first adjusted so that a pattern is drawn on the photomask at a pattern position at which a position variation amount of the pattern position on a surface of the photomask due to distortion of the photomask that occurs when the photomask is held on a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090191469 - Reflection photolithography mask, and process for fabricating this mask: The invention relates to an extreme ultraviolet photolithography mask, operating in reflection, the mask comprising a substrate, a mirror structure deposited uniformly on the substrate, and an absorbent layer which is absorbent at the operating wavelength of the mask and is deposited on top of the mirror structure and etched... Agent: Lowe Hauptman & Berner, LLP
20090191476 - Thermoplastic materials comprising charge transfer agents and photo acid generating agents: The present invention relates to a thermoplastic material comprising polymer, at least one charge transfer agent, wherein the charge transfer agent is substantially colourless when neutral, but which develops colour when a charge is acquired, and at least one photo acid generating agent. The present invention further relates to a... Agent: The Procter & Gamble Company Global Legal Department - Ip
20090191477 - Method for producing toner: e
20090191478 - Method of forming resist pattern and negative resist composition: A novel method of forming a resist pattern in which thickness loss from the resist pattern is reduced, and a negative resist composition that can be used in this method of forming a resist pattern. The method of forming a resist pattern includes: forming a first resist film by applying... Agent: Knobbe Martens Olson & Bear LLP
20090191479 - Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same: The present invention provides a resin composition for laser engraving containing at least an acetylene compound and a binder polymer, a relief printing plate precursor for laser engraving using the same, a relief printing plate, and a method for producing a relief printing plate.... Agent: Moss & Burke, PLLC
20090191480 - Thermoplastic material comprising polychromic substances: The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic... Agent: The Procter & Gamble Company Global Legal Department - Ip
20090191482 - Device and method for preparing relief printing form: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20090191483 - Device and method for preparing relief printing form: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20090191481 - Method of manufacturing relief printing plate and printing plate precursor for laser engraving: The invention provides a method of manufacturing a relief printing plate having at least engraving an area which is in a relief forming layer of a relief printing plate precursor for laser engraving and is to be exposed by scanning exposure using a fiber-coupled semiconductor laser which emits laser beam... Agent: Moss & Burke, PLLC
20090191484 - Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that... Agent: Cantor Colburn, LLP
20090191486 - Production method for electroluminescent element: In order to achieve the object, the present invention provides a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a... Agent: Ladas & Parry LLP
20090191488 - Ink jet recording head and manufacturing method: A method of manufacturing a liquid discharge head including a flow path forming member configured to form a flow path communicating with a discharge port to discharge liquid, includes, providing a first layer which includes a photosensitive resin and a light absorption agent on a substrate, and providing a second... Agent: Canon U.s.a. Inc. Intellectual Property Division
20090191487 - Liquid jet head, method for manufacturing liquid jet head, and method for forming structure for liquid jet head: A liquid ejecting head including a coating resin layer including a plurality of ejection outlets for ejecting liquid and flow paths which are in fluid communication with the ejection outlets, respectively; an energy generating element for generating energy for ejecting liquid; and an adhesion improving layer provided between the coating... Agent: Fitzpatrick Cella Harper & Scinto
20090191489 - Pattern generator: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by... Agent: Harness, Dickey & Pierce, P.L.C
20090191490 - Method and apparatus for structuring a radiation-sensitive material: A method and to an apparatus for structuring a radiation-sensitive material are disclosed. The method can include using a dynamic mask to generate a first radiation pattern in a layer of the radiation-sensitive material, where the first radiation pattern has a thickness that is at most 50% of the thickness... Agent: Fish & Richardson PC
20090191491 - Method of creating an image in a photoresist laminate: A process for creating an image in a dry-film resist laminate. The dry-film resist laminate comprises in order, a peelable top layer, a layer of dry-film resist, a clear or translucent coating layer, and a peelable bottom layer. The top layer is peeled from the laminate and the laminate is... Agent: Arthur G. Schaier Carmody & Torrance LLP07/23/2009 > patent applications in patent subcategories. category listing
20090186281 - Method for producing silicon-containing complex oxide sol, method for producing silicon-containing hologram recording material, and hologram recording medium: The present invention provides a method for producing a homogeneous complex oxide sol comprising Si and a metal other than Si as metal elements, and a method for producing a Si-containing hologram recording material using a homogeneous complex oxide sol. A method for producing a complex oxide sol comprising Si... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090186282 - Contamination prevention in extreme ultraviolet lithography: Embodiments of the present invention provide methods and apparatus for removing debris particles using a stream of charged species. One embodiment of the present invention provides an apparatus for removing debris particles from a beam of radiation comprising a charged species source configured to dispense electrically charged species, and a... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090186283 - Photomasks and methods of forming photomasks: Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain a plurality of distinct layers. Each of the layers has two or more characteristic parameters which are optimized through an optimization loop. Subsequently, specifications... Agent: Wells St. John P.s.
20090186284 - Reticle, and method of laying out wirings and vias: Provided is a reticle used for forming a plurality of vias for connecting first wirings provided in a first wiring layer and second wirings provided in a second wiring layer formed above the first wiring layer. The first wirings and the second wirings are provided along one of a first... Agent: Mcginn Intellectual Property Law Group, PLLC
20090186285 - Color filter composition: The invention relates to a color filter composition comprising a) a photoresist binder, b) a transparent pigment, c) optionally a solvent and/or optionally a photoinitiator or a photolatent catalyst, d) a dispersant which is a polymer or copolymer obtainable by a process comprising the steps of a1) polymerizing in a... Agent: Joann Villamizar Ciba Corporation/patent Department
20090186286 - Method to control semiconductor device overlay using post etch image metrology: A method of determining positioning error between lithographically produced integrated circuit patterns on at least two different lithographic levels of a semiconductor wafer comprising. The method includes exposing, developing and etching one or more lithographic levels to create one or more groups of marks comprising a target at one or... Agent: Law Office Of Delio & Peterson, LLC.
20090186287 - Photoreceptor and method of making same: Disclosed is an electrophotographic photoreceptor having a protective overcoat layer including a polyol binder; a hole transport material; a curing agent; and a surface-treated tin oxide particle filler. Also disclosed is a process for forming a photoreceptor that includes providing a photoreceptor substrate; applying a charge generating layer; applying a... Agent: Oliff & Berridge, PLC.
20090186288 - Magnetic toner: The object of the present invention is to provide a magnetic toner enabling an image with high image density and excellent image reproducibility to be obtained, which is excellent in fluidity, charging stability, and charging uniformity, even for long-term use, and also enabling an image whose fogging, ghost, and scattering... Agent: Fitzpatrick Cella Harper & Scinto
20090186289 - Toner, image formation method and image forming apparatus: A toner including a binder resin, a coloring agent, an infrared absorbing agent having at least a maximum absorption wavelength in a wavelength range of from 700 to 1,100 nm, and a fixed surface protective agent, wherein, for a cross section observation of the toner, the infrared absorbing agent which... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090186290 - Non-magnetic toner: Provided is anon-magnetic toner including toner particles each containing at least a binder resin, a colorant, and a wax component, and an inorganic fine powder, in which: (1) when a temperature in a temperature range of 50 to 80° C. at which a loss tangent (tan δ) shows a maximum... Agent: Fitzpatrick Cella Harper & Scinto
20090186292 - Carrier, production method thereof, developer and image forming method: There is provided a method for producing a carrier, which includes depositing a resin coating layer on the surface of a magnetic material; adding a treatment agent for a conductor precursor to the resin coating layer so as to treat the resin coating layer with the treatment agent; and exposing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090186293 - Dry film protoresist for a micro-fluid ejection head and method therefor: A method for making a dry film photoresist layer for a micro-fluid ejection head and a micro-fluid ejection head made by the method. The method includes applying a photoimageable liquid to a moving web of release material to provide a photoimageable layer on the release material using a slot die... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090186294 - Organic graded spin on barc compositions for high na lithography: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.... Agent: Connolly Bove Lodge & Hutz LLP
20090186295 - Photosensitive ink composition for screen printing and method of forming positive relief pattern with use thereof: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are... Agent: Birch Stewart Kolasch & Birch
20090186296 - Positive resist compositions and patterning process: s
20090186297 - Positive resist compositions and patterning process:
20090186298 - Positive resist compositions and patterning process:
20090186299 - Methods for imaging and processing negative-working imageable elements: An imaged and developed element, such as a lithographic printing plate, is provided by infrared radiation imaging of a negative-working imageable element having a free radically polymerizable component, a free radical initiator composition, an infrared radiation absorbing compound, and adhesion promoter that is an organic compound having an ethylenically unsaturated... Agent: Andrew J. Anderson Patent Legal Staff
20090186300 - Resist composition for liquid immersion lithography, method of forming resist pattern, and fluorine-containing copolymer: A resist composition for immersion exposure including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing copolymer (C) containing a structural unit (c1) represented by general formula (c1-1)... Agent: Knobbe Martens Olson & Bear LLP
20090186301 - Method of making lithographic printing plates: A multi-layer, positive-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution that has a pH greater than 6 and up to about 11. This single processing solution both develops the imaged precursor and provides a protective coating... Agent: Andrew J. Andreson Patent Legal Staff
20090186302 - Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern: The present invention is to provide a method for forming various patterns such as a metal or metal compound pattern, in which the amounts of the materials constituting the pattern which are removed during the formation step can be suppressed to the minimum. The method comprises a resin pattern forming... Agent: Fitzpatrick Cella Harper & Scinto
20090186303 - Method of creating a digital mask for flexographic printing elements in situ: A method of creating a digital mask in situ for use in a process of making digital flexographic printing elements. The digital mask is created by laminating the negative image that is the by-product of a thermal proofer to a photosensitive printing plate. Thereafter, the photosensitive printing element can be... Agent: Arthur G. Schaier Carmody & Torrance LLP
20090186304 - Gravity and pressure enhanced reflow process to form lens structures: A lens structure and methods of forming the lens structure are disclosed. The method includes attaching a lens block to a substrate such that gravitational force acts to push the lens block against the substrate. The substrate is positioned such that gravitational force acts to pull the lens block from... Agent: Ratnerprestia
20090186305 - Manufacturing method of optical waveguide device: A method of manufacturing an optical waveguide device which is capable of connecting light-receiving and light-emitting elements mounted on a board and an optical waveguide to each other with high accuracy. Insulation layers are formed on a first surface of a metal substrate. A first photomask is positioned by using... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20090186306 - Polymeric microfluidic devices from liquid thermoset precursors: A method and apparatus for the fabrication of polymeric microfluidic devices through sequential photolithographic polymerization of micropatterned polymeric layers.... Agent: Lynn E Barber
20090186307 - Hydrogenated ring-opening metathesis polymer, resist composition and patterning process: Resist compositions comprising a hydrogenated ring-opening metathesis polymer bearing an alicyclic structure in its backbone and comprising structural units having an oxygen atom incorporated as part of the cyclic structure exhibit a high resolution and minimal proximity bias upon ArF excimer laser lithography and have high etching resistance.... Agent: Birch Stewart Kolasch & Birch
20090186308 - Method for printing a pattern on a substrate: The invention provides a method for printing a pattern of ink on a substrate, such as corrugated paperboard, with a relief printing form made from a photosensitive element. The method includes forming an in-situ mask for the photosensitive element, exposing the element to actinic radiation through the in-situ mask in... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center07/16/2009 > patent applications in patent subcategories. category listing
20090181313 - Pigment layer and method especially for a durable inscription of glass using a high energy radiation: A pigment layer intended more particularly for the permanent marking of glass, based on a polymer matrix which reacts predominantly with pulverization to a high-energy beam, more particularly to laser irradiation, and comprising at least one titanium compound and free carbon.... Agent: Norris, Mclaughlin & Marcus, P.A.
20090181315 - Production of micro- and nanopore mass arrangements by self-organization of nanoparticles and sublimation technology: The invention relates to a method for the production of micro- and/or nanopore mass arrangements on a substrate including functionalization of the substrate surface in selected areas; deposition of colloidal particles that have the capacity to selectively bond to the functionalized areas of the substrate surface from an aqueous dispersion... Agent: Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd.
20090181314 - Reverse dummy insertion algorithm: A method of inserting dummy patterns includes providing a window area comprising a main pattern. The main pattern includes first patterns of a first type of features, and second patterns of a second type of features. The first and the second types are different types. The method further includes globally... Agent: Slater & Matsil, L.L.P.
20090181316 - Substrate processing method, program, computer-readable storage medium, and substrate processing system: In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the substrate during application of a coating solution... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090181317 - Toner for developing electrostatic image and process for producing the same: Toner for developing an electrostatic image which hardly causes an offset phenomenon and a wrapping phenomenon and which excels in anti-fusing property, and the production process thereof is provided. The toner for developing an electrostatic image contains at least a binder resin and a colorant, in which the binder resin... Agent: Wood, Herron & Evans, LLP
20090181318 - Liquid developer and image forming apparatus: A liquid developer includes an insulation liquid, toner particles dispersed in the insulation liquid, which at least a part of the surface of each of the toner particles contains a rosin resin and a dispersant improving dispersibility of the toner particles in the insulation liquid, which the dispersant is consisted... Agent: Hogan & Hartson L.L.P.
20090181319 - Aromatic fluorine-free photoacid generators and photoresist compositions containing the same: Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic... Agent: International Business Machines Corporation Dept. 18g
20090181320 - Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same: Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free heteroaromatic sulfonate anionic component. The photoacid generators preferably contain an onium cationic component, more preferably a sulfonium cationic component. The... Agent: International Business Machines Corporation Dept. 18g
20090181321 - Photoresist compositions and methods of use in high index immersion lithography: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition... Agent: Robert Martin
20090181322 - Photoresist compositions and methods of use in high index immersion lithography: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition... Agent: Robert Martin
20090181323 - Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray... Agent: Sughrue-265550
20090181324 - Photosensitive polyimides: The present invention relates to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used as a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed wiring board.... Agent: Ladas & Parry LLP
20090181325 - Positive resist composition and method of forming resist pattern: the positive resist composition includes a resin component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2), which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon... Agent: Knobbe Martens Olson & Bear LLP
20090181326 - Positive-working imageable elements with chemical resistance: wherein R1 and R2 are independently hydrogen or alkyl groups having 1 to 8 carbon atoms or aryl groups having 6 or 10 carbon atoms in the carbocyclic ring, L is a direct bond or a linking group having at least 1 carbon atom and optionally one or more nitrogen,... Agent: Andrew J. Anderson Patent Legal Staff
20090181327 - Method of manufacturing semiconductor devices: The present invention relates to a method of manufacturing semiconductor devices. According to the method, an etch target layer, a chemically amplified photoresist layer, and a Bottom Anti-Reflective Coating (BARC) layer are first sequentially formed over a semiconductor substrate. An exposure process is performed in order to form exposure portions... Agent: Townsend And Townsend And Crew, LLP
20090181328 - Laser irradiation apparatus and method of fabricating organic light emitting display using the same: A laser irradiation apparatus and method of fabricating an organic light emitting display using the same are provided. The laser irradiation apparatus includes: a laser generator; a mask having means for changing a propagation path of a laser beam; and a projection lens. The method of fabricating an organic light... Agent: H.c. Park & Associates, PLC
20090181329 - Method for manufacturing a liquid jet head, a liquid jet head, and a liquid jet apparatus: When a liquid passage is formed by etching a passage forming substrate by using a protective film formed on the surface of the passage forming substrate, there are provided a first step of forming the protective film, as a process of forming the protective film having a predetermined pattern, a... Agent: Townsend And Townsend And Crew, LLP
20090181330 - Methods for forming a composite pattern including printed resolution assist features: An underlayer to be patterned with a composite pattern is formed on a substrate. The composite pattern is decomposed into a first pattern and a second pattern, each having reduced complexity than the composite pattern. A hard mask layer is formed directly on the underlying layer. A first photoresist is... Agent: Scully, Scott, Murphy & Presser, P.C.
20090181331 - Method for forming film pattern: A method for forming a film pattern includes applying a water-soluble photosensitive resin on a substrate, exposing the photosensitive resin to light, developing the photosensitive resin with a developer, after developing the photosensitive resin, depositing a material for the film pattern on the substrate, and, after depositing the material for... Agent: Canon U.s.a. Inc. Intellectual Property Division
20090181332 - Protective overcoats for thermally developable materials: Mixtures of an alkyl vinyl ether/maleic anhydride copolymer or an alkylethylene/maleic anhydride copolymer with cellulose acetate provide protective overcoats for thermally developable materials. These protective overcoats exhibit good adhesion to the emulsion layer, are physically hard, and have good optical clarity while maintaining the sensitometric properties of the materials.... Agent: Carestream Health, Inc.07/09/2009 > patent applications in patent subcategories. category listing
20090176166 - Method for manufacturing photomasks and device for its implementation: The device for implementing the inventive method comprises a sealed chamber containing at least one photomask, a pumping unit for creating and maintaining a vacuum inside the chamber, a system for holding at least one photomask, placed inside the sealed chamber, infrared radiation means and a gas injection system.... Agent: Fay Sharpe/lucent
20090176167 - Alignment system and alignment marks for use therewith: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20090176168 - Exposure data preparation method and exposure method: In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of: classifying a pattern in terms of a target linewidth; setting a standard characteristic showing the relationship between a standard... Agent: Staas & Halsey LLP
20090176169 - Toner for developing electrostatic latent image, and image forming method using the toner: A toner for developing electrostatic latent images, including a binder resin; and a colorant, wherein the toner further includes propyleneglycolmonomethylether in an amount of from 30 to 200 ppm.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090176170 - Resin-filled carrier for electrophotographic developer, and electrophotographic developer using the resin-filled carrier: A resin-filled carrier for an electrophotographic developer obtained by filling resin into voids of a porous ferrite core material, wherein the porous ferrite core material has a pore volume of 0.055 to 0.16 mL/g and a peak pore size of 0.20 to 0.7 μm, and an electrophotographic developer using this... Agent: Greenblum & Bernstein, P.L.C
20090176171 - Image forming apparatus and image forming method: In a disclosed image forming apparatus, a developing bias applied to a developer carrier or exposure energy with which an image carrier is exposed is adjusted such that an isolated one-dot image on the image carrier has a predetermined image density. When the image carrier is exposed to form dot... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090176172 - Photosensitive polyimide composition and polyimide precursor composition: There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20090176173 - Ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions: wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. P+ comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P+ may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another... Agent: Robert J. Eichelburg The Law Offices Of Robert J. Eichelburg
20090176174 - Multiple exposure photolithography methods and photoresist compostions: A method and a composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of acid upon exposure to a second dose of radiation. The second amount of acid... Agent: Schmeiser, Olsen & Watts
20090176175 - Photoacid generators for extreme ultraviolet lithography: A photoacid generator P+ A− comprises (a) an antenna group P+ comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− anions; or (b) an antenna group P+ and A− comprising anions with low photoabsorption cross-sections for EUV; or (c) an antenna group P+, comprising atoms with... Agent: Robert J. Eichelburg, Esq. The Law Offices Of Robert J. Eichelburg
20090176176 - Photosensitive resin composition for flexographic printing: There is provided a photosensitive resin composition for a solvent-developing or thermally-developing flexographic printing plate, the photosensitive resin composition comprising: (a) a block copolymer containing a polymer block having conjugated diene as a main component and a polymer block having a vinyl aromatic hydrocarbon as a main component; (b) a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090176177 - method of forming a pattern using a photoresist composition for immersion lithography: A photoresist composition for immersion lithography and a method of forming a photoresist pattern using the photoresist composition are disclosed. The photoresist composition includes a photosensitive polymer including a cycloaliphatic group blocked with at least two cyclic acetal groups as a side chain, a photoacid generator and an organic solvent.... Agent: Myers Bigel Sibley & Sajovec07/02/2009 > patent applications in patent subcategories. category listing
20090170008 - Holographic recording composition and holographic recording medium: In general formula (1), each of R1 and R2 independently denotes a hydrogen atom, alkyl group, aryl group, heterocyclic group, acyl group, or sulfonyl group, each of R3, R4, and R5 independently denotes a hydrogen atom, alkyl group, or aryl group, each of A and B independently denotes an electron-withdrawing... Agent: Sughrue Mion, PLLC
20090170009 - Holographic recording composition and holographic recording medium: In general formula (I), R1 denotes a hydrogen atom or a substituent having a Hammett value, σp, of equal to or greater than −0.30, each of R2, R3, R4, R5, and R6 independently denotes a hydrogen atom or a substituent, each of A and B independently denotes a substituent and... Agent: Sughrue Mion, PLLC
20090170010 - High-resolution, patterned-media master mask: A high-resolution, patterned-media master mask is disclosed. The high-resolution, patterned-media master mask includes an electron-absorption substrate for absorbing electrons from an electron beam (e-beam) during an e-beam exposure by an e-beam lithography process and suppressing a backscattering of the electrons based on an electron-backscattering-suppressing atomic number associated with a constituent... Agent: Hitachi C/o Wagner Blecher LLP
20090170013 - Mask and method of fabricating the same: The invention relates to a mask and a method of fabricating the same. When a mask pattern is formed using E-Beam, the size of the divisional region obtained by a fracturing process can not be formed equally. Therefore, the uniformity of the mask pattern is degraded. In order to form... Agent: Marshall, Gerstein & Borun LLP
20090170014 - Mask, exposure apparatus and device manufacturing method: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with... Agent: Miles & Stockbridge PC
20090170012 - Phase-shifting masks with sub-wavelength diffractive opical elements: The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the... Agent: Intel Corporation C/o Cpa Global
20090170011 - Reflective photomask and method of determining layer thicknesses of the same: A reflective photomask and a method of determining or optimizing thicknesses of layers of the reflective photomask are provided. The reflective photomask may include a substrate, a reflective layer, an absorptive pattern, and a spacer. The substrate may include a reflective region and an absorptive region, the reflective layer may... Agent: Harness, Dickey & Pierce, P.L.C
20090170015 - Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor: The invention provides a dye-containing negative curable composition containing at least a dye soluble in an organic solvent, a photopolymerization initiator, a photopolymerizable compound containing an amine structure, and an organic solvent; a color filter formed from the dye-containing negative curable composition; a method of producing the color filter; and... Agent: Moss & Burke, PLLC
20090170017 - Beam recording apparatus and beam adjustment method: An electron beam recording apparatus includes: a displacement detection unit including at least three displacement sensors disposed at each different angle in a radial direction of the turntable; a shape calculation unit for calculating, based on the detected displacements by the at least three displacement sensors, shape data corresponding to... Agent: Sughrue Mion, PLLC
20090170016 - Image enhancement for multiple exposure beams: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exposing a pattern onto said workpiece, where said... Agent: Haynes Beffel & Wolfeld LLP
20090170019 - Toner for developing electrostatic charge image, image forming method and image forming apparatus: To provide a toner for developing an electrostatic charge image, the toner containing at least a colorant obtained by reacting a polymer with a basic dye, wherein the polymer contains 10 mol % or more of a monomer unit having any one of a sulfonic acid group, a sulfonic acid... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090170018 - Toner for developing latent electrostatic image, method for producing the same and apparatus for producing the same, and developer, toner container, process cartridge, image forming method and image forming apparatus: There is provided a toner for developing a latent electrostatic image, obtained by a method containing: ejecting a toner composition fluid from an ejection hole so as to make the toner composition fluid into droplets; and solidifying the droplets in an atomizing space so as to form solid particles, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090170021 - Toner: Provided is magnetic toner including capsule type toner particles each having a surface layer (B) on a surface of a toner base particle (A) containing at least a binder resin (a) mainly formed of a polyester, a magnetic substance, and a wax, in which, the surface layer (B) includes a... Agent: Fitzpatrick Cella Harper & Scinto
20090170020 - Toner, two-component developer, developing device, and image forming apparatus: A toner in which even a toner containing crystalline polyester exhibits excellent fixing property, chargeability, color reproducibility, and long-term stability, as well as a two-component developer, a developing device, and an image forming apparatus are provided. The toner includes toner base particles which contain a colorant and a binder resin... Agent: Nixon & Vanderhye, PC
20090170022 - Electrophotographic developer carrier and electrophotographic developer using the same carrier: There are adopted: an electrophotographic developer carrier that includes on the surface of a carrier core material a coating resin including a silicone resin containing a fluorine silane coupling agent, has an intensity ratio (F/Si), measured with fluorescent X-ray, between the fluorine atom and the silicon atom present on the... Agent: Greenblum & Bernstein, P.L.C
20090170023 - Process for producing electrophotographic photosensitive member: A process for producing an electrophotographic photosensitive member. The electrophotographic photosensitive member includes a conductive support and a surface layer provided thereon containing at least a resin. The process has the step of forming a plurality of depressed portions on the surface layer by irradiation with laser light having a... Agent: Fitzpatrick Cella Harper & Scinto
20090170025 - Lithographic method and carrier substrate: A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20090170024 - Method of patterning a substrate, photosensitive layer stack and system for lithography: A photosensitive layer stack, lithographic systems and methods of patterning a substrate are disclosed having a patterning layer and a photochromic layer with an absorption switching from transmissive to absorptive upon exposure.... Agent: Slater & Matsil, L.L.P.
20090170027 - Optical recording medium: The present invention provides an optical recording medium (10), comprising at least one recording layer (16) being adapted to form marks upon radiation of a laser beam having a particular recording wavelength, wherein a material constituting the recording layer (16) has an absorption maximum at a wavelength that is 100... Agent: Muncy, Geissler, Olds & Lowe, PLLC
20090170028 - Heat-sensitive positive-working lithographic printing plate precursor: A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resins and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit... Agent: Agfa C/o Keating & Bennett, LLP
20090170029 - (meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods: In Formula 1, R1 is hydrogen or methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, R3 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having... Agent: Lee & Morse, P.C.
20090170030 - Method of making a pillar pattern using triple or quadruple exposure: Methods of making pillar shaped device array using a triple or quadruple exposure technique are described. A plurality of pillar shaped devices are formed arranged in a hexagonal or rectangular pattern.... Agent: Sandisk Corporation C/o Foley & Lardner LLP
20090170031 - Method of forming a pattern of a semiconductor device: A pattern for a gate line is formed using a first photoresist pattern and a first BARC layer. A pad and patterns for a select line, which has a width that is larger than that of the gate line, are formed using a second photoresist pattern and a second BARC... Agent: Townsend And Townsend And Crew, LLP
20090170032 - Method of manufacturing electronic device: A method of manufacturing an electronic device includes forming a photosensitive SOG oxide layer on a multi-layer ceramics substrate having a penetrating electrode, forming an opening by subjecting the photosensitive SOG oxide layer to an exposure treatment and developing treatment so that an upper face of the penetrating electrode is... Agent: Arent Fox LLP
20090170034 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device comprises: forming a first photoresist pattern in a double patterning technology (DPT) for overcoming a resolution limit of an exposer; and forming a second photoresist pattern. The method further comprises forming a hard mask film and an anti-reflective film to prevent an intermixing... Agent: Townsend And Townsend And Crew, LLP
20090170033 - Method of forming pattern of semiconductor device: The present invention relates to a method of forming patterns of a semiconductor device. In aspect of the present invention, a photoresist layer is formed on a semiconductor substrate. Exposure regions are formed in the photoresist layer to which light, which corresponds to an intermediate value of a maximum intensity... Agent: Townsend And Townsend And Crew, LLP
20090170035 - Method for fabricating semiconductor device: A method for fabricating a semiconductor device includes forming a first mask pattern over an etch target layer, forming a second mask pattern over the etch target layer, forming spacers at sidewalls of the first mask pattern and the second mask pattern, and etching the etch target layer with an... Agent: Townsend And Townsend And Crew, LLP
20090170036 - Method for manufacturing transparent electrode pattern and method for manufacturing electro-optic device having the transparent electrode pattern: Provided are a method for manufacturing a transparent electrode pattern and a method for manufacturing an electro-optic device having the transparent electrode pattern. The method for manufacturing the transparent electrode pattern includes forming a transparent electrode on a light-transmissive substrate, patterning the transparent electrode by removing a portion of the... Agent: Hosoon Lee
20090170037 - Composition for removing photoresist and method of manufacturing an array substrate using the same: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using... Agent: Cantor Colburn, LLP
20090170038 - Method for producing fine structure: A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a... Agent: Harness, Dickey & Pierce, P.L.C
20090170039 - Exposure method: The invention provides an exposure method for manufacturing a device. The method includes providing a wafer having several exposure regions with a photoresist layer covering thereon. A feedback parameter map with several exposure-region feedback parameter sets respectively corresponds to the exposure regions of the wafer. At least one of the... Agent: J C Patents, Inc.
20090170042 - Exposure apparatus and device manufacturing method: An exposure apparatus comprises an illumination optical system which illuminates an original, a light intensity distribution along a scanning direction of the original formed by the illumination optical system having a slope at a peripheral portion thereof, a projection optical system which projects a pattern of the original onto a... Agent: Locke Lord Bissell & Liddell LLP Attn:IPDocketing
20090170041 - Immersion lithography: A method of obtaining information related to a defect present in the irradiation of a substrate coated with a layer of radiation sensitive material using immersion lithography is disclosed. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20090170040 - Treatment of laser exposed lithographic printing plate before development: A method of treating a laser exposed lithographic printing plate with a deactivating solution followed by overall irradiation is described. The plate comprises on a substrate a photosensitive layer capable of photo hardening. The deactivating solution is capable of deactivating the photo hardening capability of the photosensitive layer in the... Agent: Gary Ganghui TengPrevious industry: Chemistry: electrical current producing apparatus, product, and process
Next industry: Combustion
RSS FEED for 20130509:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Radiation imagery chemistry: process, composition, or product thereof patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Radiation imagery chemistry: process, composition, or product thereof patents we recommend signing up for free keyword monitoring by email.
FreshPatents.com Support - Terms & Conditions
Results in 0.87759 seconds