|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof June invention type 06/09Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 06/25/2009 > patent applications in patent subcategories. invention type
20090162756 - Multi-layer body with volume hologram: Described is a process for the production of a multi-layer body having a volume hologram with at least two different items of image information, wherein a photosensitive layer (46) of the multi-layer body is directly or with the interposition of a transparent optical medium (44s, 45) brought into contact with... Agent: Hoffmann & Baron, LLP
20090162757 - Phase shift mask and method for manufacturing the same: Embodiments relate to a phase shift mask and a method for manufacturing the same. According to embodiments, a phase shift mask may include a substrate, a phase shift layer disposed on and/or over an area of the substrate corresponding to a pattern to be exposed, and a dummy phase shift... Agent: Sherr & Vaughn, PLLC
20090162758 - Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication method: Design data of a wafer pattern to be formed on a semiconductor wafer is converted into mask data corresponding to a mask pattern to be formed on a photomask for use in the formation of the wafer pattern, and the mask pattern is formed on the photomask on the basis... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090162760 - Semiconductor device, method for manufacturing semiconductor device, and computer readable medium: In a multi-project-chip semiconductor device, semiconductor elements fabricated on a wafer have a layout that corresponds to an exposure order of a pattern of the semiconductor elements and that is based on information indicating manufacture conditions and the number of shots and are arranged such that the semiconductor elements having... Agent: Staas & Halsey LLP
20090162759 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program: A pattern forming system 1 includes a checking apparatus 400, a storage device 502, and a control section 500. The checking apparatus 400 is configured to measure and check a state of a resist pattern formed on a substrate W after a developing process and output a first check result... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090162762 - Electrostatic image developing toner, production method thereof, electrostatic image developer, image forming method and image forming apparatus: An electrostatic image developing toner includes a binder resin that includes a polyester carbonate resin or a polyester amide resin, the polyester carbonate resin or the polyester amide resin containing a dodecenylsuccinic acid unit in an mount from about 0.5 mol % to about 30 mol % as a monomer... Agent: Oliff & Berridge, PLC
20090162761 - Optically transparent solvent coatable carbon nanotube ground plane: In accordance with the invention, there are xerographic photoreceptors, image forming apparatus, and methods of forming an image on image. The xerographic photoreceptor can include a substrate and a conductive ground plane having an optical transparency disposed over the substrate, the conductive ground plane including a carbon nanotube layer, such... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20090162763 - Photoreceptor, image formation method, image forming apparatus and process cartridge: A photoreceptor including an electroconductive substrate and a photosensitive layer located overlying the electroconductive substrate, the photosensitive layer including a cross-linking surface layer including a cross-linked copolymer of a radical polymerizable monomer (I) having at least three functional groups without a charge transport structure and a radical polymerizable monomer (II)... Agent: Cooper & Dunham, LLP
20090162767 - Benzophenone containing photoconductors: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the charge transport layer contains a benzophenone.... Agent: Patent Documentation Center Xerox Corporation
20090162768 - Aminoketone containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one α-aminoketone.... Agent: Patent Documentation Center Xerox Corporation
20090162764 - Nitrogen heterocyclics containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and a nitrogen heterocyclic component such as a triazine.... Agent: Patent Documentation Center Xerox Corporation
20090162769 - Phosphine oxide containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one phosphine oxide.... Agent: Patent Documentation Center Xerox Corporation
20090162765 - Ketal containing photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one of ketal. In embodiments, the charge transport layer may include... Agent: Patent Documentation Center Xerox Corporation
20090162766 - Photoconductors containing ketal overcoats: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and an overcoat, and where the overcoat contains at least one of ketal. In embodiments the overcoat layer may include α-hydroxyketone, α-diketone, or... Agent: Patent Documentation Center Xerox Corporation
20090162770 - Colored polymer particles, method for producing the same, and toner and developer using the same: A method for producing colored polymer particles, including adding a colorant-containing composition containing a radically polymerizable monomer and a colorant in a supercritical fluid or a subcritical fluid and polymerizing the radically polymerizable monomer, so as to produce colored polymer particles which are insoluble in the supercritical fluid or subcritical... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090162771 - Electrophotographic toner, developer for electrophotography using the toner, process cartridge, and image forming apparatus using the same: The invention further provides an electrophotographic developer having the electrophotographic toner, a process cartridge having a developer bearing body which accommodates the electrophotographic developer, and an image forming apparatus having a toner image forming member that forms a toner image on a recording medium by using the electrophotographic developer and... Agent: Oliff & Berridge, PLC
20090162772 - Image forming method: e
20090162773 - Polymer having sulfonic acid group or sulfonic acid ester group and amide group, and toner for developing electrostatic latent image having the polymer: wherein R represents -A1-SO2R1; R1w and R1X are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or... Agent: Fitzpatrick Cella Harper & Scinto
20090162775 - Ink with solid phase and liquid phase: The present invention is an ink comprising a solid phase and a liquid phase wherein the solid phase comprises a polymeric binder and the liquid phase comprises oil and a pigment, the solid phase and the liquid phase forming a discrete particle having multiple domains of the liquid phase.... Agent: Andrew J. Anderson Patent Legal Staff
20090162776 - Magenta toner for developing electrostatic image: e
20090162774 - Toner and manufacturing process therefor:
20090162777 - Electrically resistive coatings/layers using soluble carbon nanotube complexes in polymers: A process and result for forming an electrically relaxable coating composite for an electrophotographic imaging component includes providing a non-functionalized soluble carbon nanotube complex, and mixing a polymer material with the soluble carbon nanotube complex. The electrically relaxable coating composite exhibits resistivity in the range or about 107 to about... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)
20090162778 - Binder resin for electrostatic image developing toner, binder resin particle liquid dispersion for electrostatic image developing toner, production method of electrostatic image developing toner, electrostatic image developing toner, electrostatic image d: A binder resin for an electrostatic image developing toner is obtained by polycondensation reaction of at least two polycarboxylic acids and at least one polyol, wherein the at least two polycarboxylic acids include at least one of a first specific polycarboxylic acid and a second specific polycarboxylic acid in an... Agent: Oliff & Berridge, PLC
20090162779 - Method of manufacturing ink: The present invention is a method of manufacturing ink. The method includes providing a first organic phase of a solvent containing a dissolved polymer, an oil and a pigment. The organic solvent is dispersed in an aqueous phase containing a stabilizer to form an emulsion containing droplets of the organic... Agent: Andrew J. Anderson Patent Legal Staff
20090162780 - Dry toner and method of preparing same: A dry toner for developing an electrostatic image, including a toner binder containing a urea-modified polyester. The toner has an average sphericity of 0.96 or more and contains no more than 30% by weight of particles having a sphericity of less than 0.95.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090162781 - Resist composition, resist pattern forming method and compound: This resist composition is a resist composition containing a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are substituted with at least... Agent: Knobbe Martens Olson & Bear LLP
20090162782 - Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating: The underlayer coating forming composition for forming by light irradiation an underlayer coating used as an underlayer of a photoresist in a lithography process of the manufacture of semiconductor devices, comprises a polymerizable compound containing 5 to 45% by mass of silicon atom (A), a photopolymerization initiator (B), and a... Agent: Oliff & Berridge, PLC
20090162783 - Radiation-sensitive elements with developability-enhancing compounds: Positive-working imageable elements can be imaged and developed to prepare imaged elements such as lithographic printing plates. The imageable elements including an imageable layer that has one or more alkaline soluble polymeric binders and a developability-enhancing compound that is represented by Structure (DEC) or (DEC1) described herein that are organic... Agent: Eastman Kodak Company Patent Legal Staff
20090162788 - Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an... Agent: Knobbe Martens Olson & Bear LLP
20090162787 - Novel compound, acid generator, resist composition and method of forming resist pattern: (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom... Agent: Knobbe Martens Olson & Bear LLP
20090162785 - Polymer compound, negative resist composition, and method of forming resist pattern: Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by... Agent: Knobbe Martens Olson & Bear LLP
20090162784 - Polymer compound, positive resist composition and resist pattern forming method: The present invention relates to a polymer compound comprising at least one constituent unit (a0) selected from the group consisting of constituent units represented by the following general formulas (A0-1), (A0-2), (A0-3) and (A0-4) [wherein R represents a hydrogen atom or a lower alkyl group], and a constituent unit (a1)... Agent: Knobbe Martens Olson & Bear LLP
20090162786 - Positive resist composition and method of forming resist pattern: (in the formula, Y represents an aliphatic cyclic group or a lower alkyl group; n represents an integer from 0 to 3; m represents 0 or 1; R represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogenated lower alkyl group; and R1′ and R2′ each... Agent: Knobbe Martens Olson & Bear LLP
20090162789 - Method for transferring a predetermined pattern reducing proximity effects: A method for transferring a predetermined pattern onto a flat support performed by direct writing by means of a particle beam comprises at least: deposition of a photoresist layer on a free surface of the support, application of the beam on exposed areas of the photoresist layer, performing correction by... Agent: Oliff & Berridge, PLC
20090162791 - Electronic device and method of manufacturing thereof: The device has a carrier and an electric element. The carrier has a first and an opposed side and is provided with an connection layer, an intermediate layer and contact pads. The element is present at the first side and coupled to the connection layer. It is at least partially... Agent: Nxp, B.v. Nxp Intellectual Property Department
20090162790 - Photoresist double patterning: A method for etching an etch layer formed on a substrate is provided. A first photoresist (PR) mask with first mask features is provided on the etch layer. A protective coating is provided on the first PR mask by a process including at least one cycle. Each cycle includes (a)... Agent: Beyer Law Group LLP
20090162792 - Method for manufacturing a semiconductor device: A spacer is formed on side and top portions of a photoresist pattern after a mask process is performed so that the spacer may be used as an etching mask. The spacer is formed using a polymer deposition layer which is a low temperature oxide or nitride that can be... Agent: Townsend And Townsend And Crew, LLP
20090162793 - Method of manufacturing metal interconnection of semiconductor device: Provided is a method of manufacturing a metal interconnection of a semiconductor device. According to the method, a first dielectric is formed on a semiconductor substrate having a device thereon, and a second dielectric and a metal layer pattern are formed on the first dielectric. Then, a first polymer pattern... Agent: The Law Offices Of Andrew D. Fortney, Ph.d., P.C.
20090162794 - Method for fabricating semiconductor device: A method for fabricating a semiconductor device is provided. The method includes forming an even number of first hard mask patterns over an etch target layer, forming sacrificial patterns on sidewalls of the first hard mask patterns and forming second hard mask patterns on sidewalls of the sacrificial patterns. The... Agent: Townsend And Townsend And Crew, LLP
20090162795 - Method for manufacturing a semiconductor device: A method for manufacturing a semiconductor device includes forming an etch-target layer over a semiconductor substrate having a lower structure, forming a first mask pattern over the etch-target layer, forming a spacer material layer with a uniform thickness over the etch-target layer including the first mask pattern, forming a second... Agent: Townsend And Townsend And Crew, LLP
20090162796 - Methods of forming a pattern of a semiconductor device: In polymers for an anti-reflective coating, compositions for an anti-reflective coating and methods of forming a pattern of a semiconductor device using the same, the compositions for an anti-reflective coating include a polymer that includes a first repeating unit having a basic side group, a second repeating unit having a... Agent: F. Chau & Associates, LLC
20090162797 - Method of manufacturing liquid ejection head: A method of manufacturing a liquid ejection head includes a step of forming a layer of a positive-type photosensitive resin on a substrate; a step of forming a pattern, used to form a liquid channel, by exposing the positive-type photosensitive resin layer to light; a step of forming a photosensitive... Agent: Fitzpatrick Cella Harper & Scinto
20090162798 - Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus: A method of manufacturing a master plate includes the steps of forming a photoresist film on a substrate, disposing a photomask having a plurality of island radiation shields on the photoresist film followed by integrating the photomask and the photoresist film, applying light from a light source to the photoresist... Agent: Staas & Halsey LLP
20090162799 - Method and system for fabricating three-dimensional structures with sub-micron and micron features: A method and system are provided for fabricating three-dimensional (3D) structures having micron or submicron features. The method includes providing a continuously-formed relief structured material, the relief structured material having a first layer comprising a material having a pattern of relief structures formed on a first surface thereof. The structured... Agent: 3m Innovative Properties Company
20090162800 - process for imaging a photoresist coated over an antireflective coating: The process of the present invention relates to imaging a photoresist film coated over an antireflective coating film comprising a) forming an antireflective coating film from an antireflective coating composition, where the composition comprises a siloxane polymer, b) treating the antireflective film with an aqueous alkaline treating solution, c) rinsing... Agent: Sangya Jain Az Electronic Materials Usa Corp.06/18/2009 > patent applications in patent subcategories. invention type
20090155699 - Phase-shift mask and method for forming a pattern: A phase-shift mask for forming a pattern includes a glass substrate and a pattern, a first phase-shift region, a second phase-shift region and a third phase-shift region on the glass substrate. The first phase-shift region and the second phase-shift region are alternately arranged and the third phase-shift regions are formed... Agent: North America Intellectual Property Corporation
20090155698 - Photomask blank and production method thereof, and photomask production method, and semiconductor device production method: The photomask blank of the present invention includes a translucent substrate having thereon a shielding film composed mainly of chromium and the shielding film contains hydrogen. The shielding film is formed in such a manner that the film formation rate of the layer at the surface side is lower than... Agent: Sughrue Mion, PLLC
20090155701 - Toner and process of preparing the same: A toner includes a core containing a binder resin, wax, and a colorant, and an external additive layer coating the core, wherein the core is prepared such that it is extruded and extended to have a fiber phase, and is pulverized. The toner has an improved fixing ability to allow... Agent: Stanzione & Kim, LLP
20090155700 - Toner, method of preparing the same, method of forming images using the toner and image forming device using the toner: A toner including a plurality of fine particles includes a core including first latex particles, a wax and a pigment, or a first latex particle-wax complex and a pigment, and a first shell layer including second latex particles and covering at least a portion of the surface of the core,... Agent: Stanzione & Kim, LLP
20090155702 - Method for producing developing agent: After fine particles containing a binder resin and a coloring agent are agglomerated in a dispersion liquid to form agglomerated particles, an inverting agent which inverts a sign of a zeta potential of the agglomerated particles is added to the dispersion liquid to stabilize the agglomerated particles, and then, the... Agent: Amin, Turocy & Calvin, LLP
20090155703 - Toner compositions and processes: A toner composition includes toner particles including a polymeric resin, a colorant, a wax, and a optional coagulant.... Agent: Oliff & Berridge, PLC.
20090155705 - Release agent formulation for chemically prepared toner: A method for producing toner, and a toner composition, which includes polymer binder and a release agent composition that has relatively high viscosity and associated melting characteristics that improve filming resistance and/or fusing performance. The toner may be prepared by a chemical process wherein the toner particles may be grown... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090155704 - Toner composition: The present invention is a toner that includes a polymeric binder and a polyethylene wax or ester wax. A dispersing agent of poly(ethylene vinyl acetate) is included in the toner that dispersed the wax and reduces the amount of free wax particles.... Agent: Andrew J. Anderson Patent Legal Staff
20090155708 - Developing agent and method for producing the same: With the proviso that a volume of a portion in which the dispersion liquid flows in the heating unit and the mechanical shearing unit is expressed as A cc, a volume of a portion in which the dispersion liquid flows in the cooling unit is expressed as B cc, and... Agent: Amin, Turocy & Calvin, LLP
20090155706 - Image forming apparatus, toner, and process cartridge: An image forming apparatus including a fixing device to fix a toner image on a recording medium including a heat roller and an oil applicator to apply a silicone oil to the heat roller, having a system speed of from 500 to 1700 mm/sec, and using a toner including a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090155707 - Toner for electrostatic charge image development and manufacturing method thereof, and electrostatic charge image developer, toner cartridge, process cartridge and image forming apparatus: There is provided a toner for electrostatic charge image development, which includes a binder resin that includes a non-crystalline polyester resin and a crystalline polyester resin, and a colorant, wherein in a measurement of an acetone-soluble fraction of the toner by gel permeation chromatography, in which W1 represents the total... Agent: Oliff & Berridge, PLC
20090155709 - Toner, vessel with the toner, developer, image forming apparatus and process cartridge and image forming method: Toner and a developer which are excellent in cleaning property and fixing property at low temperature, and capable of forming images with high quality are provided. A toner prepared by dispersing and/or emulsifying an oil phase or a monomer phase comprising a toner composition and/or a toner composition precursor in... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090155710 - Method of manufacturing toner and toner produced by the method: A method of manufacturing toner including the steps of preparing a preliminary mixture by mixing a colorant and a release agent; preparing a raw material mixture by mixing the preliminary mixture with a binder resin and other raw materials; melt-kneading the raw material mixture using an open system roll type... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090155711 - Toner composition and method for manufacturing the toner composition: A toner composition including toner particles, wherein the toner particles are prepared by a method in which toner constituents including at least a binder resin and a colorant are kneaded upon application of heat to prepare a toner constituent mixture; the toner constituent mixture is dissolved or swelled in an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090155712 - Curable polyester latex made by phase inversion emulsification: A process for preparing a curable polyester based emulsion is provided in embodiments, containing one or more unsaturated polyesters and one or more photoinitiators obtained by a phase inversion process, in which the particle size and particle size distribution is controlled by process parameters, such as solvent, solvent ratio, neutralization... Agent: Oliff & Berridge, PLC.
20090155715 - Photoresist compositions and method for multiple exposures with multiple layer resist systems: A method and a resist composition. The resist composition includes a polymer having repeating units having a lactone moiety, a thermal base generator capable of generating a base and a photosensitive acid generator. The polymer has the properties of being substantially soluble in a first solvent and becoming substantially insoluble... Agent: International Business Machines Corporation Dept. 18g
20090155714 - Photosensitive compound and photoresist composition including the same: In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20... Agent: Birch Stewart Kolasch & Birch
20090155716 - Polymeric material, containing a latent acid: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.... Agent: Joann Villamizar Ciba Corporation/patent Department
20090155713 - Resist composition and process for producing same: A resist composition that includes an organic solvent (S) and a base material component dissolved in the organic solvent (S), wherein the organic solvent (S) contains ethyl lactate and an antioxidant, and the concentration of the antioxidant within the organic solvent (S) is 10 ppm or greater.... Agent: Knobbe Martens Olson & Bear LLP
20090155718 - Photoresist compositions and method for multiple exposures with multiple layer resist systems: A method and a resist composition. The resist composition includes a polymer having repeating units having a lactone moiety, a thermal base generator capable of generating a base and a photosensitive acid generator. The polymer has the properties of being substantially soluble in a first solvent and becoming substantially insoluble... Agent: Schmeiser, Olsen & Watts
20090155719 - Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods: In Formula 1, R1 is hydrogen or a methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, and carbon CAR is bonded... Agent: Lee & Morse, P.C.
20090155720 - Photosensitive polymer, resist composition, and associated methods: wherein R1 and R3 are independently hydrogen or methyl, R2 is a C4 to C20 acid-labile group, R4 is a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon CAR is bonded directly to... Agent: Lee & Morse, P.C.
20090155721 - Flexographic printing plate: According to the present invention, a flexographic printing plate and a photosensitive resin composition used therein are provided. The flexographic printing plate comprises a photocured product which is obtained by photocuring a photosensitive resin composition comprising a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b) and a photopolymerization initiator (c)... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090155722 - Method for making a lithographic printing plate: A method for making a lithographic printing plate includes the steps of (i) providing a negative-working, heat-sensitive lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic... Agent: Agfa C/o Keating & Bennett, LLP
20090155723 - Process for forming an organic electronic device including an organic device layer: A process of forming an electronic device is disclosed. An organic device layer is formed. The organic device layer includes a charge-selective material and a radiation sensitizer and has a first electrical conductivity and a first surface energy. First portions of the organic device layer are selectively exposed to radiation.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20090155724 - Method for fabricating probe needle tip of probe card: Disclosed herein is a method for fabricating a probe needle tip of a probe card, in which, in order to prevent a poor grinding effect caused by irregular removal or flexibility of the photoresists laminated to be high in the course of polishing a first metal loaded into the opening... Agent: Dickstein Shapiro LLP
20090155725 - Method of fine patterning semiconductor device: For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of... Agent: Law Office Of Monica H Choi
20090155726 - Methods of forming electronic devices by ion implanting: A method of forming an electronic device is provided that includes forming a resist layer over a substrate having a first region, a second region, and a third region. The method further includes directing radiation through a reticle, wherein the reticle comprises different radiation zones having significantly different transmission values... Agent: Larson Newman Abel & Polansky, LLP
20090155728 - Fabrication method of topographically modulated microstructures using pattern homogenization with uv light: A method for microfabrication of a microfluidic device having sub-millimeter three dimensional relief structures is disclosed. In this method, homogeneous surfaces, which do not exhibit apparent pixel geometry, emerge from the interaction of the overlapping of diffracted light under opaque pixels and the nonlinear polymerization properties of the photoresist material.... Agent: National Institute Of Standards And Technology
20090155727 - Method of forming a flat media table for probe storage device: A method of forming a flat media table for a probe-based storage device includes applying a first-photo-resistive coating to one side of a silicon wafer and a second photo-resistive coating to an opposite side of the silicon wafer. The silicon wafer includes a table layer, a suspension layer and a... Agent: Cantor Colburn LLP-ibm Europe
20090155729 - Photoimageable nozzle members and methods relating thereto: Nozzle members, such as for a micro-fluid ejection head, micro-fluid ejection heads, and a method for making the same. One such nozzle member includes a negative photoresist composition derived from a first di-functional epoxy compound, a relatively high molecular weight polyhydroxy ether, a photoacid generator devoid of aryl sulfonium salts,... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090155730 - Method for manufacturing storage medium and apparatus for manufacturing information storage master disc: A method for manufacturing an information storage medium in which information is stored as a concave-convex pattern includes forming an inorganic-resist master disc by depositing on a substrate an inorganic resist layer reactive to thermal reaction associated with laser beam irradiation, recording on the inorganic-resist master disc by differentiating depths... Agent: Robert J. Depke Lewis T. Steadman
20090155731 - Method and system for reducing line edge roughness during pattern etching: A method of mitigating pattern defects, such as critical dimension (CD) bias and line-edge roughness (LER), during a pattern transfer process is described. The method comprises forming one or more layers on a substrate, forming a radiation sensitive mask layer on the one or more layers, and forming a pattern... Agent: Tokyo Electron U.s. Holdings, Inc.
20090155732 - Method for patterning using phase-change material: A patterned layer over a wafer is produced by depositing a print-patterned mask structure. Energized particles of a target material are deposited over the wafer and the print-patterned mask such that particles of said target material incident on the mask structure enter the mask structure body and minimally accumulate, if... Agent: JasIPConsulting
20090155733 - Method of forming iso space pattern: A method of forming an iso space pattern is provided. In the method, a first material layer is provided, and then a second material layer and a patterned material layer are formed thereon. After that, a first patterned photoresist layer is formed on the patterned material layer to partially cover... Agent: Jianq Chyun Intellectual Property Office06/11/2009 > patent applications in patent subcategories. invention type
20090148782 - Exposure method, photo mask, and reticle stage: An exposure method includes setting a photo mask into an exposure apparatus. The exposure apparatus includes an opening/closing unit configured to block a part of exposure light from a light source to the wafer. The photo mask having a product area in which a pattern to be used when a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090148780 - Method for correcting mask pattern, and exposure mask: A method for correcting optical proximity effect of a mask pattern for exposure light, the mask pattern including a rectangular pattern formed by a transparent region having a dimension of limiting resolution of exposure light, includes (a) performing exposure by means of an evaluating mask on which an evaluation pattern... Agent: Young & Thompson
20090148783 - Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process: A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20090148781 - Reflective-type mask: A reflective-type mask having a main surface including a pattern region in the main surface, the pattern region including a multilayer reflective film which reflects the exposure light and a first absorber pattern on the multilayer reflective film, the first absorber pattern including a pattern which absorbs the exposure light... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090148779 - Sub-wavelength diffractive elements to reduce corner rounding: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near... Agent: Intel Corporation C/o Cpa Global
20090148784 - Electrophotographic photoreceptor and image formation method: Disclosed is an electrophotographic photoreceptor comprising on or over an electrically conductive support a photosensitive layer containing a pyranthrone compound represented by the following formula and the pyranthrone compound has a crystal structure exhibiting a CuKα X-ray diffraction spectrum having peaks at angles (2θ±0.2°) of 16.9°, 18.7° and 20.6°.... Agent: Cantor Colburn, LLP
20090148786 - Regulated cooling for chemically prepared toner manufacture: The present disclosure relates generally to chemically prepared toner (CPT) that employs a regulated cooling process subsequent to coalescence and fusing. The cooling process may influence the distribution of domain morphology of the components within a toner particle such as controlling release agent domain formation and accompanying migration to the... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090148787 - Method for fluorescent image formation, print produced thereby and thermal transfer sheet thereof: The present invention relates to a method for fluorescent image formation which can form a highly scratch-resistant fluorescent full-color image using a colorless fluorescent agent and can freely regulate the tone of color mixture of a combination of two or more fluorescent colors in order to impart, to articles, a... Agent: Oliff & Berridge, PLC
20090148788 - Compositions and processes for preparing color filter elements: Provided are compositions derived from a polycarboxylic acid, a copper phthalocyanine complex, and a plasticizer. The compositions can be used to prepare color filter films that exhibit lower lip heights, suitable in color filter elements, for example, in liquid crystal display devices.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20090148789 - Coating compositions for use with an overcoated photoresist: In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20090148791 - Positive photosensitive composition: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.... Agent: Sughrue-265550
20090148790 - Radiation-sensitive resin composition: A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown... Agent: Morris Manning Martin LLP
20090148792 - Method of preparing lithographic printing plate and lithographic printing plate precursor: A method for preparing a lithographic printing plate includes: exposing imagewise a lithographic printing plate precursor comprising, in the following order, a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound and (D) a binder polymer and a protective layer containing... Agent: Sughrue-265550
20090148794 - Method for processing of photopolymer printing plates with overcoat: Method is described for producing an imaged lithographic printing plate from a precursor comprising a free-radical polymerizable coating and an oxygen-impermeable overcoat, characterized in that removing the overcoat, developing and gumming is carried out in one single step.... Agent: Eastman Kodak Company Patent Legal Staff
20090148793 - Processing method of lithographic printing plate precursor: A processing method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor comprising a support on a surface of which at least one of: a hydrophilizing treatment; and an undercoat layer has been provided and an image-recording layer, to cure an exposed area of the... Agent: Sughrue-265550
20090148795 - Patterning method using a combination of photolithography and copolymer self-assemblying lithography techniques: Disclosed are embodiments of a lithographic patterning method that incorporates a combination of photolithography and self-assembling copolymer lithography techniques in order to create, on a substrate, a grid-pattern mask having multiple cells, each with at least one sub-50 nm dimension. The combination of different lithographic techniques further allows for precise... Agent: International Business Machines Corporation Dept. 18g
20090148796 - Lithographic method: A method for providing a pattern on a substrate is disclosed. The method includes providing a first pattern in a first layer of photoresist and a first layer of bottom anti-reflective coating material on the substrate, etching the first pattern into the substrate, providing a second layer of photoresist and... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.06/04/2009 > patent applications in patent subcategories. invention type
20090142671 - Optical recording composition and holographic recording medium: P
20090142674 - Photo mask and method for manufacturing semiconductor device using the same: A photo mask includes a dot pattern formed between a line pattern and an island pattern. Methods of making a semiconductor device employing such a photo mask improves yield and productivity of the device.... Agent: Marshall, Gerstein & Borun LLP
20090142675 - Reticle for optical proximity correction test pattern and method of manufacturing the same: A reticle for an Optical Proximity Correction (OPC) test pattern and a method of manufacturing the same. In one example embodiment of the present invention, a reticle for an OPC test pattern includes test patterns formed apart from each other at regular intervals and dummy patterns for controlling a light... Agent: Workman Nydegger 1000 Eagle Gate Tower
20090142673 - Semi-transparent film grayscale mask: A grayscale mask made from semi-transparent film layers is provided, along with an associated fabrication method. The method provides a transparent substrate, such as quartz, with a surface. A first layer of a semi-transparent film having a surface with a first surface area, is formed overlying the substrate surface. At... Agent: Sharp Laboratories Of America, Inc. C/o Law Office Of Gerald Maliszewski
20090142676 - Process for producing a phase difference control component and liquid crystal display device: There are provided a phase difference control component, which can realize a liquid crystal display device having a wide angle of visibility, has excellent phase difference symmetry and can realize optical compensation, and a process for producing the same. The phase difference control component comprises a base material; and a... Agent: Burr & Brown
20090142678 - Electrophotographic developer carrier, electrophotographic developer, image forming method, process cartridge and image forming apparatus: To provide an electrophotographic developer carrier including a carrier core material, and a coat layer containing a binder resin and conductivity-imparted microparticles which are produced by imparting conductivity to inorganic microparticles, the coat layer being formed over the carrier core material, wherein the electrophotographic developer carrier has a static resistivity... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142677 - Electrophotographic image forming method and apparatus: An image forming method including electrostatic image forming step, developing step, transferring step, fixing step and oil application step for applying an oil to a fixing member, wherein the toner includes a binder resin, a colorant and a wax, and the relationship (A2/A1)×100<200 is satisfied, wherein A1 represents the area... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142679 - Conductive member, process cartridge using the conductive member, and image forming device using the process cartridge: A conductive member includes a conductive supporting body, an electrostatic resistance adjusting layer formed on the conductive supporting body, and a space holding member, which is formed on each of both end portions of the electric resistance adjusting layer, has a material different from a material of the electric resistance... Agent: Cooper & Dunham, LLP
20090142680 - Full-color image forming method: wherein the toner includes a black, a yellow, a magenta and a cyan toner and the carrier is formed of a magnetic particulate material coated with a resin, wherein each of the toners are contained in each toner cartridge comprising the carrier, from which the two-component developer is fed into... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142681 - Pigment preparations based on diketopyrrolopyrroles: The invention relates to a pigment preparation, characterized in that it contains C.I. Pigment Red 254 with an average particle size of 20 to 100 nm and at least one pigment dispersant of the formula (II) or (III). In said formulaes, Q2, s, n, R3, R4, E+ and G+ are... Agent: Clariant Corporation Intellectual Property Department
20090142682 - Toner, method of manufacturing toner and image formation method: A toner including a binder resin, a coloring agent, a releasing agent and a modified laminar inorganic mineral, wherein the toner is granulated by dispersing the coloring agent, the releasing agent, the modified laminar inorganic mineral and at least one of the binder resin and a precursor thereof in an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142683 - Color toner and two-component developer: The present invention relates to a toner which has good property such as fixability, coloring power, developability, durability, and environmental stability and so on. More specifically, the present invention relates to a color toner containing at least a binder resin, a colorant, and a wax, in which: a wax concentration... Agent: Fitzpatrick Cella Harper & Scinto
20090142685 - Image forming apparatus, image forming method, and toner for image forming apparatus: An image forming method including charging an image bearing member by applying combination of DC voltage and AC voltage with frequency of 6.5 to 8.5 cycle/mm; irradiating the image bearing member with light to form an electrostatic image; developing the electrostatic image with a developer including toner to form a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142684 - Toner: Disclosed is a toner which can be charged at a designated level even when a lot of print is carried out with severity of charging by stirring and when the printing is carried out under the low temperature-low humidity or the high temperature-high humidity condition. A toner comprising (a) a... Agent: Cameron Kerrigan Squire, Sanders & Dempsey L.L.P.
20090142686 - Image forming method, toner and image forming apparatus: To provide an image forming method including conveying a toner by means of a toner supply device that supplies the toner from inside a toner housing container into a developer housing section of a developing device with the use of a screw pump, and forming an image on a recording... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142687 - Toner and method for manufacturing the toner, two-component developer, developing device and image forming apparatus: A toner which takes into account preservation of the global environment and which is excellent in fixability and storage stability and moreover, good in light transmittance and a method for manufacturing the toner, a two-compartment developer, a developing device and an image forming apparatus are provided. In toner including at... Agent: Nixon & Vanderhye, PC
20090142688 - Composition for coating carrier particles: A dry powder carrier coating composition that may be used to coat carrier particles that imparts desired triboelectric charging characteristics and conductivity values to make the carrier particles more insulative. In embodiments, the coating composition includes a styrene acrylate copolymer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20090142689 - Polyester-wax based emulsion aggregation toner compositions: Emulsion aggregation toners comprising a polyester-wax resin, wherein the polyester-wax resin includes a wax that is chemically incorporated into the main chain of the polyester resin.... Agent: Oliff & Berridge, PLC.
20090142690 - Method of manufacturing toner: A method of manufacturing a toner including forming a wax liquid dispersion in which a wax is dispersed in an organic solvent (A1), mixing an organic layer including the wax liquid dispersion, a binder resin and an organic solvent (A) to form an oil phase and dispersing and emulsifying the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142691 - Ionic polymer flocculants for the preparation of chemically processed toner: The present disclosure relates to a process for producing a toner particulate composition from aqueous dispersions containing aggregates of a polymer binder and other toner ingredients. An ionic surfactant may be used to form the dispersion along with an ionic polymer flocculent wherein the ionic polymer flocculent undergoes a molecular... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090142692 - Low molecular weight latex and toner compositions comprising the same: Provided are a latex process and a toner process, both of which include the preparation of a latex having weight average molecular weight of from about 12×103 to about 24×103. The latex is manufactured under monomer-starved polymerization condition such as monomer feeding rate equal to or less than 0.516% per... Agent: Fay Sharpe / Xerox - Rochester
20090142695 - Imageable elements with components having 1h-tetrazole groups: Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working... Agent: Andrew J. Anderson Patent Legal Staff
20090142693 - Negative resist composition and method of forming resist pattern: A negative resist composition and a method of forming a resist pattern that are capable of suppressing resist pattern swelling are provided. The negative resist composition includes an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent component (C), wherein the... Agent: Knobbe Martens Olson & Bear LLP
20090142696 - Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method: (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents an acid dissociable, dissolution inhibiting group containing a tertiary alkyl group; a represents an integer from 1 to 3, b represents an integer... Agent: Knobbe Martens Olson & Bear LLP
20090142694 - Siloxane polymer compositions and methods of using the same: A siloxane composition and a method of producing the Same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing.... Agent: Mccormick, Paulding & Huber LLP
20090142697 - Photosensitive resin, and photosensitive composition: s
20090142698 - Negative resist composition and method of forming resist pattern: A negative resist composition that includes an alkali-soluble resin component, an acid generator component that generates acid upon exposure, and a cross-linker component, wherein the alkali-soluble resin component is a copolymer that includes a structural unit containing an aliphatic cyclic group having a fluorinated hydroxyalkyl group, and a structural unit... Agent: Knobbe Martens Olson & Bear LLP
20090142700 - Resin for photoresist composition, photoresist composition and method for forming resist pattern: A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the... Agent: Knobbe Martens Olson & Bear LLP
20090142701 - Double patterning strategy for contact hole and trench: A method of lithography patterning includes forming a first resist pattern on a substrate, the first resist pattern including at least one opening therein on the substrate; curing the first resist pattern; forming a second resist pattern on the substrate; forming a material layer on the substrate; and removing the... Agent: Haynes And Boone, LLPIPSection
20090142702 - Methods of using violet-sensitive imageable elements: m
20090142703 - Display member exposing method and plasma display member manufacturing method: A manufacturing method for a plasma display member wherein generation of defects such as interruption and short-circuit of a pattern obtained after exposure and development is suppressed and yield is improved, even when a foreign material is adhered on a photomask or photomask is scratched. An exposing method for a... Agent: Ratnerprestia
20090142705 - Method for forming mask pattern: A method for forming a mask pattern for forming a semiconductor device may include coating a photoresist, performing a primary bake process on the photoresist, exposing and developing the photoresist, and then performing a secondary bake process on the photoresist under a nitrogen and/or hydrogen gas atmosphere.... Agent: Sherr & Vaughn, PLLC
20090142704 - Method for reducing side lobe printing using a barrier layer: A method suitable for reducing side lobe printing in a photolithography process is enabled by the use of a barrier layer on top of a photoresist on a substrate. The barrier layer is absorbing at the imaging wavelength of the underlying photoresist and thus blocks the light from reaching the... Agent: International Business Machines Corporation Dept. 18g
20090142706 - Method of manufacturing semiconductor device: A method of manufacturing a semiconductor includes performing exposure using a first photomask having a pattern line in which hole patterns and assist patterns not transferred onto the semiconductor substrate are arrayed at an equal pitch on the mask, the pitch being converted a first pitch Phole on the substrate... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090142707 - Method to build a wirebond probe card in a many at a time fashion: Resilient spring contacts for use in wafer test probing are provided that can be manufactured with a very fine pitch spacing and precisely located on a support substrate. The resilient contact structures are adapted for wire bonding to an electrical circuit on a space transformer substrate. The support substrates with... Agent: N. Kenneth Burraston Kirton & Mcconkie
20090142709 - Imager with tuned color filter: An optimized color filter array is formed in, above or below one or more damascene layers. The color filter array includes filter regions which are configured to optimize the combined optical properties of the layers of the device to maximize the intensity of the particular wavelength of light incident to... Agent: Dickstein Shapiro LLP
20090142708 - Optical fiber illuminator, method of fabricating optical fiber illuminator, and optical recording head and optical recording and reading apparatus having the optical fiber illuminator: Provided is an optical fiber illuminator used for recording and reading high density optical information according to a near field recording (NFR) scheme, a method of fabricating the optical fiber illuminator, and an optical recording head and recording apparatus having the optical fiber illuminator. The optical fiber illuminator includes: an... Agent: Blakely Sokoloff Taylor & Zafman LLP
20090142710 - Method for patterning a photoresist layer: The disclosed is a method for patterning a photoresist layer. An object is provided, a photoresist layer is formed on the object, and an ink pattern is printed on the photoresist layer. Shielded by the ink pattern, the photoresist is exposed and developed to be patterned. In addition, a layered... Agent: Quintero Law Office, PC
20090142711 - Method of forming mask pattern: The present invention relates to a method of forming a mask pattern. According to the present invention, a negative photoresist layer is formed over a substrate. Some regions of the negative photoresist layer are exposed. The exposed negative photoresist layers are developed. A positive photoresist layer is formed over the... Agent: Townsend And Townsend And Crew, LLP
20090142712 - Method of manufacturing image forming element, image forming element, and image forming apparatus having the same: A method of manufacturing an image forming element which can reduce a manufacturing time and a manufacturing cost with a simplified manufacturing process, an image forming element manufactured by the method, and an image forming apparatus having the same. The method includes preparing a cylindrical image drum having at least... Agent: Stanzione & Kim, LLP
20090142713 - Substrate processing system and substrate processing method: A substrate processing system is used for a light exposure apparatus which performs light exposure at least twice on each of substrates. The system includes a carrier block, and a process section configured to process each of substrates transferred from the carrier block one by one. The process section includes... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090142715 - Laminated resist used for immersion lithography: There is provided a laminated resist which is transparent in the case of exposure light of not less than 193 nm and can form a fine pattern having an intended form without defects with good reproducibility. The laminated resist has a photoresist layer (L1) and a transparent protective layer (L2)... Agent: Sughrue Mion, PLLC
20090142714 - Method for using a topcoat composition: A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation... Agent: Schmeiser, Olsen & WattsPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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