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Radiation imagery chemistry: process, composition, or product thereof May archived by USPTO category 05/09

20090136857 - Correcting 3d effects in phase shifting masks using sub-resolution features: Using phase shifting on a mask can advantageously improve printed feature resolution on a wafer, thereby allowing greater feature density on an integrated circuit. Phase shifting can create an intensity imbalance between 0 degree and 180 degree phase shifters on the mask. An improved method of designing an alternating PSM... Agent: Bever Hoffman & Harms, LLP

20090136856 - Photo-mask and thin-film transistor substrate: A photo-mask having a first exposure area, a second exposure area and a third exposure area is for manufacturing a thin-film transistor substrate. The photo-mask includes a first peripheral line pattern, a first dummy line pattern, a first overlapping pixel pattern and a second overlapping pixel pattern. The first peripheral... Agent: Bacon & Thomas, PLLC

20090136858 - Electrophotographic transfer paper: The present invention is an electrophotographic transfer paper where at least one side of the base paper is given a coating layer with a pigment and an adhesive agent to form coated paper and where the aforementioned adhesive contains a branched poly(meth)acrylamide copolymer having a cationic groups and/or anionic groups... Agent: Millen, White, Zelano & Branigan, P.C.

20090136859 - Sol gel overcoats incorporating zinc antimonate nanoparticles: The present invention is directed to an electrophotographic element that comprises: an electrically conducting layer, a charge generating layer overlying the electrically conducting layer, and a charge transport layer overlying the electrically conducting layer. The charge transport layer, which can be an overcoat overlying the charge generating layer, includes the... Agent: Andrew J. Anderson, Patent Legal Staff Eastman Kodak Company

20090136860 - Electrophotographic photoreceptor containing bisazo-based compound as a charge generating material in a charge transporting layer and electrophotographic imaging apparatus employing the same: wherein R1 and R2 each independently represent a hydrogen atom, a halogen atom, a C1-C20 substituted or unsubstituted alkyl group, or a C1-C20 substituted or unsubstituted alkoxy group, and n is an integer from 0 to 6. The laminate type electrophotographic photoreceptor according to the present general inventive concept has... Agent: Stanzione & Kim, LLP

20090136861 - Electrophotographic photoreceptor, image-forming apparatus, and electrophotographic cartridge: An electrophotographic photoreceptor having high sensitivity and low residual potential is provided. The electrophotographic photoreceptor includes an undercoat layer containing metal oxide particles and a binder resin on an electroconductive substrate, and a photosensitive layer disposed on the undercoat layer, wherein the metal oxide particles have a volume average particle... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090136863 - Emulsion aggregation toner having zinc salicylic acid charge control agent: A toner for developing electrostatic images including emulsion aggregation toner particles with a styrene acrylate latex resin, at least one additive, at least one colorant, and a charge control agent comprising 3,5 di-tert-butylsalicyclic acid zinc salt.... Agent: Patent Documentation Center

20090136862 - Process for producing binder resin for electrostatic charge image developing toner and process for producing toner therewith: A process for producing a binder resin for electrostatic charge image developing toner, including the step (1) of mixing in combination with a raw material containing a low-molecular-weight resin and a high-molecular-weight resin and the step (2) of simultaneously therewith and/or thereafter removing a volatile component, characterized in that the... Agent: Young & Thompson

20090136864 - Developing agent and method for manufacturing the same: It is intended to provide a method includes the step of forming agglomerated particles by agglomerating fine particulate mixture containing a binder resin and a colorant. In the step of forming agglomerated particles, a cationic organic coagulating agent having an average molecular weight of from 1000 to 100000 is added... Agent: Amin, Turocy & Calvin, LLP

20090136865 - Method for producing toner: A method for producing a toner, including at least the following steps: step (A): pulverizing a negatively chargeable charge control resin that does not soften at a temperature of 180° C. or lower to an average particle size of from 0.05 to 2 μm; step (B): melt-kneading at least a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090136866 - Methods of screen printing images onto fibrous substrates: Methods of making a stenciled screen for use in screen printing an image onto a substrate are generally disclosed. The method involves removing a portion of a transfer coating from a transfer sheet via heat transfer with a printable sheet defining a printable surface. The portion of the transfer coating... Agent: Dority & Manning, P.A.

20090136869 - Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method: A metal oxide-containing film is formed from a heat curable composition comprising (A) a metal oxide-containing compound obtained through hydrolytic condensation between a hydrolyzable silicon compound and a hydrolyzable metal compound, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Cs, or a sulfonium, iodonium or... Agent: Birch Stewart Kolasch & Birch

20090136868 - Photoacid generator compounds and compositions: The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as... Agent: Schwegman, Lundberg & Woessner, P.A.

20090136870 - Positive resist composition and pattern making method using the same: A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit... Agent: Sughrue-265550

20090136867 - Si-polymers and photoresists comprising same: New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be... Agent: Rohm And Haas Electronic Materials LLC

20090136871 - Topcoat composition: A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol.... Agent: Schmeiser, Olsen & Watts

20090136872 - Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same: t

20090136873 - System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules: A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The... Agent: Bracewell & Giuliani LLP

20090136874 - Method for manufacturing printed circuit board: A method of manufacturing a printed circuit board is disclosed. The method, which includes forming a base pattern over one side of a negative photoresist, exposing the one side, attaching an insulation layer on the one side, developing the negative photoresist such that the base pattern is uncovered, and forming... Agent: Staas & Halsey LLP

20090136875 - Manufacturing method of liquid ejection head: A manufacturing method of a liquid ejection head including an ejection outlet forming member provided with an ejection outlet for ejecting liquid and a flow passage communicating with the ejection outlet is constituted by the steps of: preparing a substrate on which a flow passage wall forming member for forming... Agent: Fitzpatrick Cella Harper & Scinto

20090136876 - System and method for photolithography in semiconductor manufacturing: A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at least one exposure of the pattern onto a layer of the substrate by a lower-precision lithography mechanism. The... Agent: Haynes And Boone, LLPIPSection

20090136877 - Method for organic material layer formation: An organic material layer formation method capable of realizing the formation of an ultra microscopic pattern while maintaining an electrical characteristic of an organic material layer is provided. This method includes the steps of forming a resist in a reversal pattern of an organic material layer pattern to be formed... Agent: Rabin & Berdo, PC

20090136878 - Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same: A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F atom, and increasing a contact angle on a surface of the topcoat film; and (C) a... Agent: Sughrue-265550

20090130568 - Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same: Disclosed is a volume phase hologram recording material characterized by excellent photosensitivity, low cure shrinkage, high transparency, and particularly good storage stability and also disclosed is a recording medium prepared therefrom. Further disclosed is a photosensitive resin composition for volume phase hologram recording that comprises a soluble aromatic copolymer (A),... Agent: Edwards Angell Palmer & Dodge LLP

20090130569 - Adjustable mask blank structure for an euv phase-shift mask: s

20090130571 - Masking process using photoresist: The invention provides a masking process using photoresist, comprising: attaching a compress mask plate to a substrate; coating photoresist in a mask pattern of the compress mask plate; baking the photoresist from the substrate side; removing the compress mask plate from the substrate to form a desired photoresist pattern on... Agent: Ladas & Parry LLP

20090130570 - Methods for inspecting and optionally reworking summed photolithography patterns resulting from plurally-overlaid patterning steps during mass production of semiconductor devices: A batch of wafers is temporarily stalled during a Double Pattern Technology (DPT) process before a temporary representation of a second of to-be-overlaid patterns is permanently combined with a first of the patterns. Sampled ones of the stalled wafers are inspected to determine if sufficiently close alignment is present between... Agent: Haynes And Boone, LLPIPSection

20090130573 - Multilayer active mask lithography: An active mask emits a patterned energy flux in response to an energy input.... Agent: Searete LLC Clarence T. Tegreene

20090130572 - Reticle for forming microscopic pattern: A reticle for forming a microscopic pattern is formed that prevents a ghost image generated in a photolithography process for patterning microscopic-sized holes. The reticle may include a quartz substrate; a first pattern formed by exposing a portion of the surface of the quartz substrate; a second pattern surrounding the... Agent: Sherr & Vaughn, PLLC

20090130574 - Sputtering target used for production of reflective mask blank for euv lithography: A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090130575 - Photoreceptor: in which Ar1, Ar2, Ar3, Ar4 and Ar5 each independently represents a substituted or unsubstituted aryl group, or Ar5 independently represents a substituted or unsubstituted arylene group, and k represents 0 or 1, and in which at least two of Ar1, Ar2, Ar3 and Ar4 includes a hydroxymethyl group or... Agent: Oliff & Berridge, PLC.

20090130576 - Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member having excellent electrophotographic properties, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member includes a polymer having a specific repeating structural unit and... Agent: Fitzpatrick Cella Harper & Scinto

20090130577 - Recording medium for electrophotographic applications: A recording medium for electrophotographic applications includes a base layer and an outermost coating layer containing a porous adsorptive material. According to the present general inventive concept, since a porous adsorptive material is contained in an outermost coating layer of the recording medium, volatile hazardous material generated from toner during... Agent: Stanzione & Kim, LLP

20090130579 - Developing agent and method for manufacturing the same: r

20090130578 - Toner and process of production of the same: [Means for Solving Problems] A process of production of a toner containing colored polymer particles obtained by polymerizing a polymerizable monomer composition containing a polymerizable monomer and colorant in an aqueous medium in the presence of a polymerization initiator, wherein the polymerization initiator is an organic peroxide having a molecular... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090130580 - Magnetic toner: In a magnetic toner which has magnetic toner base particles containing at least a binder resin and a magnetic material, and an inorganic fine powder, (i) the magnetic toner has an average circularity of from 0.950 or more to 1.000 or less, (ii) the magnetic toner has a compressibility of... Agent: Fitzpatrick Cella Harper & Scinto

20090130581 - Developer composition and method for preparing the same, and method for forming resist pattern:

20090130582 - Toner and image forming process: A toner which has i) toner base particles containing at least a binder resin and a colorant and ii) a fatty acid metal salt composition as an external additive. The fatty acid metal salt composition contains a nonionic surface-active agent and a fatty acid metal salt. This toner and an... Agent: Fitzpatrick Cella Harper & Scinto

20090130583 - Toner: Provided is a toner including toner particles each containing at least a binder resin, a colorant, and a wax component, and an inorganic fine powder, the toner being wherein: in a microscopic compression test on the toner, a recovery ratio Z(25) and the gradient of a load-displacement curve R(25) each... Agent: Fitzpatrick Cella Harper & Scinto

20090130584 - Developing agent, image forming method and image forming apparatus: A developing agent includes a carrier; a toner in which an inorganic oxide external additive has a coverage of from 60 to 120% relative to a core toner; and a charging auxiliary particle having charge properties of a positive electrode and having a volume average particle size of from 5... Agent: Amin, Turocy & Calvin, LLP

20090130585 - Developing agent and method for manufacturing the same: A coarse particle containing a polyester based resin and a coloring agent is added in an aqueous medium containing a surfactant, a basic substance and an inorganic water-soluble electrolyte, and dispersion and coagulation are carried out to form a toner particle.... Agent: Amin, Turocy & Calvin, LLP

20090130586 - Toner composition and method: A method for forming toner particles includes polymerizing monomers to form a latex comprising polymer particles; combining the latex with an unsaturated curable resin to form aggregates containing the polymer particles and the unsaturated curable resin particles; and heating the aggregates to form coalesced particles. A toner composition that may... Agent: Oliff & Berridge, PLC.

20090130587 - Resin-coated ferrite carrier for electrophotographic developer, its production method, and electrophotographic developer using the resin-coated ferrite carrier: A spherical resin-coated ferrite carrier for an electrophotographic developer which can maintain a stable resistance and chargeability, a favorable charge rising property because of an excellent fluidity, and has a suitable durability, its production method which is excellent in economic efficiency and production stability, and an electrophotographic developer using the... Agent: Greenblum & Bernstein, P.L.C

20090130588 - Acid-base property considerations for improved additive attachement on toner: A developer comprised of a toner and at least one external surface additive, wherein an acid-base interaction has an Interaction Surface Parameter (ISP) of greater than 0, and wherein ISP is defined by the following equation: [(Ka)toner×(Kb)additive]+[(Kb)toner×(Ka)additive]−[(Ka)toner×(Ka)additive]−[(Kb)toner×(Kb)additive], wherein Ka is the Lewis acid value and Kb is the Lewis base... Agent: Oliff & Berridge, PLC.

20090130589 - Method for producing developing agent: A method for producing a developing agent contains mechanically shearing a mixture containing a polyester resin, a colorant and a releasing agent to form first fine particles, aggregating the first fine particles to form aggregated particles as a core, aggregating second fine particles containing a polyester resin onto the core... Agent: Amin, Turocy & Calvin, LLP

20090130591 - Antireflective coating composition and process thereof: where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090130592 - Compositions and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20090130590 - Photoresist compositions and process for multiple exposures with multiple layer photoresist systems: A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having a hydroxyl moiety; a photoacid generator; and a solvent. The polymer when formed on a substrate is substantially insoluble to the solvent after heating to a... Agent: Schmeiser, Olsen & Watts

20090130593 - Stabilizer for enhancing performance of optical recording layer and high density optical recording medium using the same: A recording dye layer for recording high density information and reproduction/playback of the high density information recordings is provided. The recording dye layer includes a chemical composition including a diimonium salt and or ammonium compound and a metal-azo complex for a high density optical recording medium that may effectively promote... Agent: Jianq Chyun Intellectual Property Office

20090130594 - Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating: r

20090130595 - Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom: (wherein R1 represents C1-20 alkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen atoms in these groups may have been replaced with fluorine atoms); R2 represents linear, branched, or cyclic C1-20 alkyl, alkenyl, oxoalkyl, or oxoalkenyl, C6-20 aryl, or C7-12 aralkyl or aryloxoalkyl; R3 represents hydrogen or alkyl; and Y− represents a non-nucleophilic... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090130596 - Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders: Negative lithographic printing plate having on a substrate a photosensitive layer comprising an alkaline soluble polymeric binder, an alkaline insoluble polymeric binder, a polymerizable monomer, and an initiator is described. The photosensitive layer is imagewise exposed with a radiation to cause hardening in the exposed areas, and then developed to... Agent: Gary Ganghui Teng

20090130597 - Resist composition, method of forming resist pattern, novel compound, and acid generator: wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an... Agent: Knobbe Martens Olson & Bear LLP

20090130598 - Method of creating a template employing a lift-off process: A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exposing portions of the conducting layer; depositing a hard mask material... Agent: Molecular Imprints

20090130601 - Method for fabricating semiconductor device: A method for fabricating a semiconductor device may include forming first and second photoresist patterns that intersect with each other on and/or over an etched film, and forming a fine pattern on the etched film by etching the etched film using the first and second photoresist patterns as an etching... Agent: Sherr & Vaughn, PLLC

20090130599 - Method for forming an electrical structure comprising multiple photosensitive materials: An electrical structure and method of forming. The method comprises providing a substrate structure. A first layer comprising a first photosensitive material having a first polarity is formed over and in contact with the substrate structure. A second layer comprising photosensitive material having a second polarity is formed over and... Agent: Schmeiser, Olsen & Watts

20090130602 - Method for manufacturing image sensor: A method for manufacturing an image sensor that does not include a reflow process but includes exposing a photoresist film a plurality of times from various angles and then forming one or more micro lenses by developing the exposed photoresist film.... Agent: Sherr & Vaughn, PLLC

20090130600 - Multicolored mask process for making display circuitry: A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a... Agent: Andrew J. Anderson Patent Legal Staff

20090130603 - Method for manufacturing semiconductor device: A method for manufacturing a semiconductor device includes the steps of: forming a resist film above a semiconductor wafer having a layer to be processed, the resist film not being formed on a circumferential portion of the semiconductor wafer; exposing the resist film; after exposing the resist film, forming a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090130605 - Resist composition: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a... Agent: Knobbe Martens Olson & Bear LLP

20090130604 - Solution for immersion exposure and immersion exposure method: The object is to resolve a finer pattern with a narrower line/space width by immersion lithography technology in the manufacture of a semiconductor or the like. A liquid for use in immersion exposure includes a saturated hydrocarbon compound as a main component, wherein the content of an impurity or impurities... Agent: Buchanan, Ingersoll & Rooney PC

20090130606 - Photoresist developer and method for fabricating substrate by using the developer thereof: A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist developer makes it possible to form a favorable resist pattern with out causing scum even when developing thick photoresists.... Agent: Ladas & Parry LLP

20090130607 - Roll-to-roll patterning of transparent and metallic layers: Systems and methods are disclosed by which patterns of various materials can be formed on flexible substrates by a continuous roll-to-roll manufacturing process. The patterns may include metallic, transparent conductive, or non-metallic elements with lateral dimensions including in the range from below 100 nanometers to millimeters and with thickness dimensions... Agent: Mcdermott Will & Emery LLP

20090130609 - Colored mask combined with selective area deposition: The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first layer comprising a deposition inhibitor material that is sensitive to visible light; (d) patterning the first layer... Agent: Andrew J. Anderson Patent Legal Staff

20090130608 - Photopatternable deposition inhibitor containing siloxane: An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the deposition inhibitor material comprises an organosiloxane compound; and patterning the deposition inhibitor material. The thin film is substantially deposited only in the selected areas of the... Agent: Andrew J. Anderson Patent Legal Staff

20090130610 - Integrated color mask: The invention relates to a process for forming a structure comprising providing a support, coating one side of said support with a colored mask, coating a layer photopatternable by visible light, and exposing the layer through the colored mask with visible light to photopattern the layer.... Agent: Andrew J. Anderson Patent Lega Staff

20090130611 - Lithographic method: The present invention provides a method of lithographic patterning. The method comprisese: applying to a surface to be patterned a photoresist (18) comprising a polymer resin, a photocatalyst generator which generates a catalyst on exposure to actinic radiation, and a quencher; exposing the photoresist (18) to actinic radiation through a... Agent: Nxp, B.v. Nxp Intellectual Property Department

20090130612 - Patterning process: The invention is directed to a method for patterning a material layer. The method comprises steps of forming a first mask layer on the material layer and then patterning the first mask layer. The patterned first mask layer has a pattern therein and a plurality of gaps within the patterns... Agent: J C Patents, Inc.

20090130613 - Silver halide color photographic light-sensitive material and color image-forming method: e

20090130614 - Development device and development method: A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090123852 - Hard-material object comprising visional color-varying surface: A hard-material object comprising a visional color-varying surface comprises a hard-material carrier and a pattern disposed on the surface of the hard-material carrier. The pattern comprises a plurality of multi-color pellets to compose a picture. Each of the multi-color pellets comprises the distinct coloring regions distinguishable by the eyes so... Agent: Bacon & Thomas, PLLC

20090123853 - Aligning apparatus, aligning method, exposure apparatus, exposure method, and device manufacturing method: An aligning apparatus and the like are provided which can improve stage alignment accuracy during stage acceleration and suppress the generation of internal vibration of the stage to improve throughput. An aligning apparatus including a table part (43) with an aligning target object (W) placed thereon and movable at least... Agent: Oliff & Berridge, PLC

20090123854 - Image forming method: An electrophotographic image forming method is disclosed, wherein a cylindrical developing sleeve carrying a developer is brought into contact with a photoreceptor with rotating the developing sleeve in the counter direction to the rotation of the photoreceptor, and a lubricant is supplied to the photoreceptor and the photoreceptor comprises a... Agent: Lucas & Mercanti, LLP

20090123855 - Pattern forming method: By using an intaglio plate for holding a pattern formed by a developing agent, a transfer device for transferring patterns developed on the intaglio plate to a transfer object medium, and a baking chamber for eliminating an electrode layer after transfer or heightening resistance thereof, the patterns developed on the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090123856 - Developer for replenishment and image forming method: Provided is a developer for replenishment capable of forming a high-quality image even upon duration. The developer for replenishment includes at least a toner and a magnetic carrier, and in the developer for replenishment, 1 part by mass of the magnetic carrier is blended with 2 to 50 parts by... Agent: Fitzpatrick Cella Harper & Scinto

20090123857 - Toner, image forming apparatus using the same, and image forming method: An image forming apparatus of the present invention includes a latent electrostatic image bearing member, a latent electrostatic image forming unit configured to form a latent electrostatic image on the latent electrostatic image bearing member, at least three developing units each configured to develop the latent electrostatic image using a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090123859 - Toner: Provide is a toner including toner particles each containing at least a binder resin and a colorant, and an inorganic fine powder, in which the inorganic fine powder has a ratio (A/B) of a total pore volume A measured in a pore diameter range of from 1.9 nm or more... Agent: Fitzpatrick Cella Harper & Scinto

20090123858 - Toner, two-component developer, developing device, and image forming apparatus: A toner is composed of toner particles which contain at least a binder resin, a colorant, and a release agent. As to particle size distribution and particle number distribution of the toner particles, a volume average particle size of the toner particles is set to be 3.0 μm to 6.0... Agent: Nixon & Vanderhye, PC

20090123861 - Toner for developing electrostatic latent image: in the formula, M1 is a silicon atom (Si), a germanium atom (Ge) and a tin atom (Sn); Z is independently a chlorine atom, a hydroxy group, an alkoxy group having 1 to 8 carbon atoms, or an aryloxy group having 6 to 8 carbon atoms; and A1, A2, A3... Agent: Buchanan, Ingersoll & Rooney PC

20090123860 - Toner compositions: A toner having charge control agents which impart excellent triboelectric charging characteristics.... Agent: Xerox Corporation (cdfs)

20090123863 - Method for producing a toner for electrostatic image development: A method for producing a toner for electrostatic image development, including the steps of melt-kneading a resin binder containing a crystalline polyester and an amorphous resin as main components, and heat-treating the melt-kneaded product obtained in the step of melt-kneading at a temperature of from 50° to 80° C., wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090123862 - Toner compositions: The present disclosure provides toners including amorphous resins and crystalline resins. Toners with high glass transition temperatures and little plasticization may be obtained in accordance with the present disclosure.... Agent: Xerox Corporation (cdfs)

20090123864 - Ultra low melt toners comprised of crystalline resins: A toner having an amorphous resin, a crystalline resin, and a colorant, wherein the crystalline resin has a melting temperature of at least 70° C. and a recrystallization point of at least 47° C. exhibits improved document offset properties and improved heat cohesion. Annealing the toner further improves the heat... Agent: Oliff & Berridge, PLC.

20090123865 - Toner composition having fluorinated polymer additive: A toner having a core with at least one resin and at least one colorant, and having physically attached on a surface thereof, an additive package including fluorinated polymer particles, and a method of forming toner particles having surface particles attached thereto, wherein the surface particles include fluorinated polymer particles,... Agent: Patent Documentation Center

20090123866 - Method for producing toner: A method for producing toner is described. In the method for producing a toner, a resin liquid is prepared by mixing at least a binder resin made of polyester resin and a colorant with an organic solvent, the resin liquid is dispersed in an aqueous medium to form an emulsion,... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20090123869 - Compositions and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially non-mixable with a resin component of the resist. Further preferred photoresist compositions of the invention comprise 1) Si substitution, 2) fluorine substitution; 3) hyperbranched... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20090123867 - Photosensitive resin composition and adhesion promoter: The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present... Agent: Darby & Darby P.C.

20090123868 - Resist polymer and method for producing the polymer: Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the... Agent: Melvin I. Stoltz, Esq.

20090123870 - Method of and system for electon beam lithography of micro-pattern and disc substrate having micro-pattern to be transferred: An electron beam lithographic method and system for forming a micro-pattern, including servo patterns each of which comprises a plurality of recessed servo elements in a track and groove patterns each of which comprises an inter-track groove extending along the track and to be formed on a discrete track medium,... Agent: Young & Thompson

20090123872 - Inkjet-imageable lithographic printing members and methods of preparing and imaging them: Lithographic printing plates are imaged using an inkjet printer to imagewise apply a chemical or masking agent onto the plate surface. In some embodiments, the chemical causes an affinity change, thereby facilitating lithographic printing.... Agent: Goodwin Procter LLP Patent Administrator

20090123871 - Lithographic imaging with printing members having hydrophilic, surfactant-containing top layers: Printing members that include a topmost layer comprising a polymer and a silicone surfactant are durable and enable use of low imaging-power densities. The protective layer may contain an inorganic crosslinker.... Agent: Goodwin Procter LLP Patent Administrator

20090123874 - Exposure method, exposure apparatus, and method for manufacturing device: An exposure apparatus for efficiently exposing patterns onto corresponding regions of a substrate. The apparatus includes a first wafer stage, a second wafer stage, an alignment sensor which detects marks of wafers on the wafer stages, a projection optical system which irradiates a first region of a wafer with first... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090123873 - Lamination for printed photomask: A method for masking regions of photoresist in the manufacture of a soldermask for printed circuit boards is disclosed. Following application of photoresist over patterned traces on a substrate, a sheet-like thin film is applied over the photosensitive material. The thin film may adhere to the photosensitive material by way... Agent: JasIPConsulting

20090123875 - Method for manufacturing semiconductor device, and method for processing etching-target film: The present invention provides a method for processing an etching-target film, which can achieve both of a highly precise dry etching process and a reduction of LER. A method for processing an etching-target film, comprises: forming, in sequence from the bottom, an organic mask layer 40, a silicon-containing layer 50... Agent: Young & Thompson

20090123876 - Optical disc and method of producing the same: An optical disk has a first and a second intermediate disk structure. The first structure includes at least a first transparent substrate, a first recording layer, and a first reflective layer. The first substrate has a first surface and a second surface. The first surface is a beam incidence surface... Agent: Renner Kenner Greive Bobak Taylor & Weber

20090123877 - Method for forming an opening of nano-meter scale: A method for forming an opening of nano-meter scale includes providing a substrate with a material layer, and later forming a first part of the opening and then forming a second part of the opening in the material layer. At least one of the first part and the second part... Agent: North America Intellectual Property Corporation

20090123878 - Patterning method: A patterning method includes: forming a first film on a workpiece substrate; forming a second film on the first film, the second film being a silicon film having a lower optical absorption coefficient with respect to EUV (extreme ultraviolet) light than the first film; forming a resist film on the... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090123879 - Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method: A surface position detecting apparatus which detects position information of a predetermined surface in an object, comprising a first optical system which projects light from an oblique direction to the predetermined surface; a second optical system which receive the light from the object; a detecting system which receives the light... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090123880 - Pattern forming method: A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having... Agent: Sughrue-265550

20090123881 - Photothermographic material and image formation method: Disclosed is a photothermographic material having an image-forming layer containing a silver salt of an organic acid, photosensitive silver halide grains and a reducing agent on a support, wherein ratio of scratch strength measured before heat development and scratch strength measured 30 minutes after the heat development is in the... Agent: Birch Stewart Kolasch & Birch

20090117474 - Methods of manufacturing mask blank and transfer mask: In a method of manufacturing a mask blank adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching of the light-shielding film which are formed in this order on a transparent... Agent: Sughrue Mion, PLLC

20090117475 - Multilayer active mask lithography: An active mask emits a patterned energy flux in response to an energy input.... Agent: Searete LLC Clarence T. Tegreene

20090117477 - Magnetic toner and image-forming method: To solve a thin image density and sweeping occurring when a toner carrying member having a small diameter is used, provided is an image-forming method including: a charging step; an electrostatic latent image-forming step; a developing step; a transferring step; and a fixing step, in which a magnetic toner to... Agent: Fitzpatrick Cella Harper & Scinto

20090117476 - Protective overcoat layer and photoreceptor including same: Disclosed is an electrophotographic imaging member that includes a substrate; a charge generating layer; a charge transport layer; and a protective overcoat layer having a polyol binder; a hole transport material; an acid catalyst; a leveling agent; and no melamine formaldehyde curing agent or cross-linking additive. Also disclosed is a... Agent: Oliff & Berridge, PLC.

20090117478 - Polycarbonate resin and electrophotographic photosensitive body using same: An electrophotographic photosensitive body which has both good image stability and wear resistance under high temperature and high humidity conditions can be obtained by using a novel polycarbonate resin, which contains a structural unit represented by the general formula (I) below and having a long-chain unsaturated hydrocarbon group having a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090117479 - Method and apparatus for manufacturing developer, and developer: The invention provides a method and an apparatus for manufacturing a developer, which can manufacture a developer having a uniform and fine particle shape in a narrow particle size distribution and having a coloring agent highly dispersed therein at the primary particle level, the method and apparatus at the same... Agent: Edwards Angell Palmer & Dodge LLP

20090117480 - Toner and developer, toner container, process cartridge, image forming apparatus, and image forming method using the same: To provide a toner containing an ethyl acetate-soluble polyester component and an ethyl acetate-insoluble polyester component, wherein the toner is granulated in an aqueous medium, the ethyl acetate-insoluble polyester component is obtained by elongating and/or cross-linking a modified polyester resin during granulating and/or after granulating, the modified polyester resin is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117482 - Electrophotographic toner: wherein R1 and R2 are not identical; R1 is an alkyl group, alkenyl group, or alkynyl group, each having 4 to 24 carbon atoms; R2 is an alkyl group, alkenyl group, or alkynyl group, each having 1 to 10 carbon atoms; and X− is an anion. The toner for electrophotography... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117481 - Toner for one-component developer: A toner for one-component developer, including a mother toner including a binder resin including a polyester resin as a main component, a colorant and a release agent; and an external additive in an amount of from 2.5 to 5.0 parts by weight per 100 parts by weight of the mother... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117483 - Toner: The object can be achieved with a toner having a glass transition temperature (TgA) of 40 to 60° C. and a temperature (P1) of the highest peak of 70 to 120° C.; cyclohexane (CHX) insoluble matter in the tetrahydrofuran (THF) soluble matter of the toner has a glass transition temperature... Agent: Fitzpatrick Cella Harper & Scinto

20090117484 - Negative charge control agents and their preparation: e

20090117485 - Toner for electrophotography: A toner for electrophotography, containing a resin binder containing a polyester-based resin (A) and a polyester-based resin (B) having a softening point of a temperature higher than the polyester-based resin (A) by 10° C. or more, wherein at least one of the polyester-based resins (A) and (B) is a resin... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117486 - Method of preparing toner and the toner, and developer and image forming method using the toner: wherein the binder resin and the colorant are dissolved or dispersed in the organic solvent; forming a droplet of the toner constituent liquid in a gas phase; and solidifying the droplet, wherein the aperture diameter is from 3 to 30 μm, and the binder resin has a ratio (Mw/Mn) of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117487 - Production method of static charge image developing toner and screen device: A method for producing a toner for developing an electrostatic charge image, which comprises a step of screening a dispersion of toner host particles by a screen, characterized in that when the above step is carried out, Y≦{1/(M2+r2+2Mr)}×108×0.6 is satisfied where Y is the number of particles (number/cm2) existing on... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090117489 - Compositons and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC

20090117488 - Compound, positive resist composition and resist pattern forming method: [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group,... Agent: Knobbe Martens Olson & Bear LLP

20090117490 - Positive resist composition for immersion lithography and method for forming resist pattern: A positive resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits increased alkali solubility under the action of acid; and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) includes a cyclic main chain resin (A1) containing... Agent: Knobbe Martens Olson & Bear LLP

20090117491 - Resolution enhancement techniques combining interference-assisted lithography with other photolithography techniques: Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or... Agent: Townsend And Townsend And Crew LLP

20090117492 - Method for forming fine pattern in semiconductor device: A method is used in forming a fine pattern in a semiconductor device. The method includes forming an etch target layer; forming a photoresist pattern over the etch target layer; forming a polymer pattern including silicon-oxygen (Si—O) bonds on sidewalls of the photoresist pattern; removing the photoresist pattern; and etching... Agent: Townsend And Townsend And Crew, LLP

20090117493 - Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound: There is provided anti-reflective coating forming composition containing a reaction product of an isocyanuric acid compound having two or three 2,3-epoxypropyl groups with a benzoic acid compound. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, can form a... Agent: Oliff & Berridge, PLC

20090117494 - Controller for optical device, exposure method and apparatus, and method for manufacturing device: An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light... Agent: Miles & Stockbridge PC

20090117495 - Method for forming a pattern in a semiconductor device and method for manufacturing a flash memory device: A pattern formation method of a semiconductor device, and to a manufacturing method of a flash memory, in which spacer patterning technology is performed while two hard mask layers having a different etching characteristics are used, such that the patterning can be performed by using only a spacer as a... Agent: Marshall, Gerstein & Borun LLP

20090117496 - Method for treating surface of element: A method for treating a surface of an element includes the steps of providing a photo-sensitive and flexible thin film, providing a planar photomask having a micro-structural pattern, transferring the micro-structural pattern to the thin film, attaching the thin film to the surface of the element and partially exposing a... Agent: North America Intellectual Property Corporation

20090117497 - Method of forming pattern using fine pitch hard mask: A method of forming a fine pattern of a semiconductor device using a fine pitch hard mask is provided. A first hard mask pattern including first line patterns formed on an etch target layer of a substrate with a first pitch is formed. A first layer including a top surface... Agent: Volentine & Whitt PLLC

20090117498 - Pattern forming method: A pattern forming method according to an embodiment of the present invention includes forming a resist layer on a semiconductor substrate, selectively exposing the resist layer, developing the selectively exposed resist layer, decomposing photosensitizer in the resist layer after developing the resist layer, removing the photosensitizer or acid generated from... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090117499 - Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution: A cleaning solution for an immersion photolithography system according to example embodiments may include an ether-based solvent, an alcohol-based solvent, and a semi-aqueous-based solvent. In the immersion photolithography system, a plurality of wafers coated with photoresist films may be exposed pursuant to an immersion photolithography process using an immersion fluid.... Agent: Harness, Dickey & Pierce, P.L.C

20090117500 - Photoresist strip with ozonated acetic acid solution: A solution, apparatus, and method for stripping photoresist from a workpiece are disclosed. Embodiments of the invention describe a solution comprising diluted liquid acetic acid and dissolved gaseous ozone. In an embodiment an ozonated liquid acetic acid solution is prepared by dissolving ozone in liquid DI water and then mixing... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP