Radiation imagery chemistry: process, composition, or product thereof inventions 04/09

20090111035 - Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask: Provided are a binary mask, a method for fabricating the binary mask, and a method for fabricating a fine pattern of semiconductor device. In the method for fabricating the fine pattern, a binary mask including phase shift layer patterns is prepared on a transparent substrate. A semiconductor substrate including an... Agent: Marshall, Gerstein & Borun LLP

20090111032 - Euvl mask, method of fabricating the euvl mask, and wafer exposure method using the euvl mask: A mask for extreme ultra violet lithography (EUVL) and a method of fabricating the same, and a wafer exposure method using the same. According to a method of fabricating the mask, a light reflective layer pattern is formed on a transparent substrate to reflect extreme ultraviolet light. The extreme ultraviolet... Agent: Marshall, Gerstein & Borun LLP

20090111034 - Method for fabricating rim type photomask: Provided is a method for fabricating a rim type photomask. The method includes forming a light blocking pattern and a phase shift pattern on a substrate, forming a groove in the substrate by etching an exposed portion of the substrate using the light blocking pattern and the phase shift pattern... Agent: Marshall, Gerstein & Borun LLP

20090111033 - Method of fabricating photomask: A method for fabricating a photomask includes forming a phase shift layer and a light blocking layer on a transparent substrate, forming a light blocking pattern including a space through which the phase shift layer is selectively exposed by etching light blocking layer, forming a resist pattern to fill the... Agent: Marshall, Gerstein & Borun LLP

20090111036 - Photolithography mask repair: Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper... Agent: Michael O. Scheinberg

20090111037 - Protective overcoat transfer compensation: Observable matte-finish indicia on a printer medium having a matte finish includes the steps creating a matte image-viewing area; creating a glossy finish region within the image-viewing area; creating indicia having a matte finish within the glossy region. The printing medium has a dye-receiving element; and the steps of controlling... Agent: David A. Novais Patent Legal Staff

20090111038 - Electrophotographic toner and method of preparing the same: An electrophotographic toner includes a latex, a coloring agent, a wax and 3 to 1,000 ppm of each of Si and Fe, wherein a mole ratio of Si to Fe is from 0.1 to 5.... Agent: Stanzione & Kim, LLP

20090111039 - Methods for making false watermarks in a fibrous substrate: Methods of making fibrous webs having a visible transparency variation image and products constructed from such methods are generally disclosed. The variation in transparency creates a transparency variation image in the fibrous substrate in the form of a false watermark and/or a false shadow mark. In the method disclosed, a... Agent: Dority & Manning, P.A.

20090111041 - Electrophotographic toner: The purpose of the present invention is to provide an electrographic toner, which is used for an image forming method of electrophotography, and particularly, used for mono-component development. The toner has a stable charge property, can form a toner layer on a developing sleeve wherein the thickness thereof is suitable... Agent: Wood, Herron & Evans, LLP

20090111040 - Resin-coated pearlescent or metallic pigment for special effect images: A pigment particle coated with at least one of a resin and a charge control surface additive, wherein the pigment particle is a pearlescent or metallic pigment. The pigment adds pearlescent effects and is a size and charge as to be used as a toner material in electrostatographic image formation.... Agent: Oliff & Berridge, PLC.

20090111042 - Electrostatic charge image developer, process cartridge and image forming apparatus: An electrostatic charge image developer includes a toner containing an external additive and a carrier comprising a resin-coated layer formed on a surface of a core material. The average shape factor SF1 of the toner is from 125 to 135, the number of particles having shape factor SF1 of less... Agent: Oliff & Berridge, PLC

20090111043 - Environment-friendly toner for electrophotography and method of preparing the same: A toner for electrophotography includes a polyester-based resin, a colorant, a charge controlling agent, and a releasing agent, wherein the toner does not substantially comprise of an organic tin, and generates about 100 ppm or less of volatile organic compounds at a temperature of about 150 to about 200° C.... Agent: Stanzione & Kim, LLP

20090111044 - Process for preparing an electrophotographic imaging member: The presently disclosed embodiments are directed to imaging members for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to processes for preparing the substrate of such imaging members that use laser technology.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090111045 - Method for producing polymerized toner: The present invention provides a method of producing a polymerized toner which removes a by-product microparticle generated as a by-product upon polymerization in a by-product microparticle removing step, efficiently obtains a wet colored resin particle which has low moisture content (wet cake) by decreasing clogs caused at filter element in... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090111048 - Alkali-developable black photosensitive resin composition for forming light-shielding barrier wall: An alkali-developable black photosensitive resin composition for forming a light-shielding barrier wall which comprises, as indispensable components, (A) a carboxyl group-containing photosensitive prepolymer, (B) a photopolymerization initiator, (C) a black pigment, and (D) light-transmitting fine particles. By the use of this composition, light-shielding barrier walls (11) having sufficient light-shielding properties... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090111046 - Direct laser and ultraviolet lithography of porous silicon photonic crystal devices: We have developed a simple method to locally change the optical properties of porous silicon multilayers and photonic crystal architectures. This technique allows for the direct photolithography of porous silicon multilayers, heterostructures, and photonic crystals. The procedure controls the local oxidation within the porous silicon layers via ultraviolet radiation or... Agent: John Bruckner, P.C.

20090111047 - Positive resist composition for electron beam, x-ray or euv and pattern forming method using the same: A positive resist composition for electron beam, X-ray or EUV includes a compound having a proton acceptor functional group and capable of producing an acid radical upon irradiation with an actinic ray or radiation to reduce or lose the acceptor property or to change the proton acceptor functional group to... Agent: Sughrue-265550

20090111049 - Lithographic printing plate precursor: A lithographic printing plate precursor capable of being subjected to on-press development by supplying at least one of printing ink and dampening water and including a support, an image-recording layer and optionally an undercoat layer between the support and the image-recording layer, wherein at least one of the undercoat layer... Agent: Birch Stewart Kolasch & Birch

20090111050 - Novel photosensitive resin compositions: l

20090111051 - Negative-working imageable elements and methods of use:

20090111054 - Negative resist composition and method of forming resist pattern:

20090111052 - Photopolymerizable composition: A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt.-% of a polythiol compound, and wherein the composition when... Agent: Agfa C/o Keating & Bennett, LLP

20090111053 - Positive resist composition and pattern forming method using the same: A positive resist composition for electron beam, X-ray or EUV exposure, including (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a sulfonic acid upon irradiation with an actinic ray or radiation,... Agent: Sughrue-265550

20090111055 - Method of forming an image having multiple phases: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second... Agent: 3m Innovative Properties Company

20090111056 - Resolution enhancement techniques combining four beam interference-assisted lithography with other photolithography techniques: Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or... Agent: Townsend And Townsend And Crew LLP

20090111057 - Photoimageable branched polymer: Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure... Agent: Hovey Williams LLP

20090111058 - Method of forming micro pattern of semiconductor device: The present invention relates to a method of forming a micro pattern of a semiconductor device. According to an aspect of the present invention, a first photoresist layer and a second photoresist layer with different exposure types are formed over a semiconductor substrate on which an etch target layer is... Agent: Marshall, Gerstein & Borun LLP

20090111059 - Patterning method of semiconductor device: The invention relates to a patterning method of a semiconductor device. In an aspect of the invention, the method may include forming a target etch layer on a semiconductor substrate, forming a photoresist film on the target etch layer, forming photoresist patterns using exposure and development processes employing an exposure... Agent: Marshall, Gerstein & Borun LLP

20090111060 - Exposure method: An exposure method suitable for a photolithography process is described. First, a wafer with a group of alignment marks formed thereon is provided. A first alignment step is conducted by using the group of the alignment marks on the wafer to obtain a first calibration data. Next, a second alignment... Agent: Jianq Chyun Intellectual Property Office

20090111061 - Methods of minimizing etch undercut and providing clean metal liftoff: A method of minimizing etch undercut and providing clean metal liftoff in subsequent metal deposition is provided. In one embodiment a bilayer resist mask is employed and used for etching of underlying substrate material and subsequent metal liftoff. In one embodiment, the top layer resist such as positive photoresist which... Agent: Morgan, Lewis & Bockius, LLP.

20090111062 - Pattern formation method: The present invention provides a pattern formation method comprising a step of forming on a substrate a film of a first photosensitive material having low sensitivity to a light beam with a main wavelength at h-line emitted from a mask-less drawing exposure apparatus but having high sensitivity to an energy... Agent: Crowell & Moring LLP Intellectual Property Group

20090104539 - Fabrication process for cholesteric liquid crystal media having a volume hologram: A volume hologram layer (2) is formed on a substrate (1), and a cholesteric liquid crystal layer (3) is then formed on the hologram layer (2). After the substrate (1) is peeled off the volume hologram layer (2), an adhesive layer (4) is formed on the surface of the volume... Agent: Sughrue Mion, PLLC

20090104540 - Graded lithographic mask: In one aspect there is provided a gray scale lithographic mask that comprises a transparent substrate and a metallic layer located over the substrate, wherein the metallic layer has tapered edges with a graded transparency. The lithographic mask, along with etching processes may be used to transfer a pattern 450a... Agent: Texas Instruments Incorporated

20090104543 - Method of fabricating halftone phase shift mask: A method of fabricating a halftone phase shift mask is disclosed, by which a process time and a failure ratio can be reduced by sequentially forming a phase shift layer a first photoresist, a metal layer and a second photoresist over a transparent substrate, performing a process to expose a... Agent: Sherr & Vaughn, PLLC

20090104544 - Pellicle and method for manufacturing the same: A pellicle of the present invention is provided with a silicon crystal film, the absorption coefficient of which is 0.005/nm or lower with respect to light having a wavelength of 13.5 nm, as a pellicle film. The silicon crystal film is an indirect transition type semiconductor film and, therefore, the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090104541 - Plasma surface treatment to prevent pattern collapse in immersion lithography: The present invention comprises a method of reducing photoresist mask collapse when the photoresist mask is dried after immersion development. As feature sizes continue to shrink, the capillary force of water used to rinse a photoresist mask approaches the point of being greater than adhesion force of the photoresist to... Agent: Patterson & Sheridan, LLP - - Appm/tx

20090104542 - Use of chromeless phase shift masks to pattern contacts: Method for using chromeless phase shift lithography (CPL) masks to pattern contacts corresponding CPL masks. The method for patterning contacts includes illuminating a CPL mask comprising a reticle having plurality of phase-shifting features interspersed with non-phase-shifting areas with a short wavelength light source, wherein the phase-shifting features are configured in... Agent: R. Alan Burnett Blakely, Sokoloff, Taylor & Zafman LLP

20090104545 - Color filter and fabrication method thereof: Embodiments disclose a method for fabricating a color filter, comprising: providing a substrate; forming a planarization layer on the substrate; forming a first color layer over the planarization layer; exposing and developing the first color layer to form a patterned first color filter unit over the planarization layer; forming a... Agent: Joe Mckinney Muncy

20090104546 - Fabricating methods of multi-domain vertical alignment display panel and color filter substrate: A fabricating method of a color filter substrate includes following steps. First, a base is provided. A patterned color filter film layer having a plurality of recesses is then formed on the base. Next, a common electrode layer is formed on the patterned color filter film layer and the base.... Agent: Jianq Chyun Intellectual Property Office

20090104547 - Image sensor: A method is provided for processing a substrate. The substrate has at least one filter region, a plurality of bond pads, and a plurality of scribe lines arranged around the filter region and bond pads. A first planarization layer is formed above the substrate. The planarization layer has a substantially... Agent: Duane Morris LLP - PhiladelphiaIPDepartment

20090104549 - Method for error reduction in lithography: The present invention relates to a method and a system for predicting and/or measuring and correcting geometrical errors in lithography using masks, such as large-area photomasks or reticles, and exposure stations, such as wafer steppers or projection aligners, printing the pattern of said masks on a workpiece, such as a... Agent: Harness, Dickey & Pierce, P.L.C

20090104548 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program: A pattern forming system 1 includes a checking apparatus 400 and a control section 500. The checking apparatus 400 is configured to measure and check a sidewall angle SWA of a resist pattern formed on a substrate W after a developing process. The control section 500 is configured to use... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090104550 - Nanoscale electric lithography: A nanoscale lithographic method in which a reusable conductive mask, having a pattern of conductive surfaces and insulating surfaces, is positioned upon a substrate whose surface contains an electrically responsive resist layer over a buried conductive layer. When an electric field is applied between the conductive mask and buried conductive... Agent: John P. O'banion O'banion & Ritchey LLP

20090104551 - Electrophotographic photoreceptor, image forming method and image forming: Disclosed is an electrophotographic photoreceptor comprising on an electrically conductive support, a charge generation layer and a charge transport layer, wherein the charge transport layer comprises a charge transport material represented by formula (1) and exhibits a transmittance at 370 nm of not more than 10% and a transmittance at... Agent: Lucas & Mercanti, LLP

20090104552 - Photoreceptor for electrophotography: s

20090104553 - Methods and apparatus for providing a liquid coating for an organic photoconductive drum: A method of cleaning and coating a used organic photoconductive drum is disclosed. Using this method remanufacturers can reliably reuse certain used organic photoconductive drums which could not be reused without this method. The method comprises providing a used organic photoconductive drum, cleaning the surface of the used organic photoconductive... Agent: William L. London

20090104555 - Toner, developer, and image forming method: The present invention provides a toner containing at least a binder resin and a pigment, wherein the amount of the pigment in the toner is 3.0% by mass to 8.5% by mass, the volume average particle diameter of the toner is 2.0 μm to 6.0 μm, and a monochrome image,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090104556 - Polymeric colour electrophotographic toner compositions and process of preparing polymeric electrophotographic toner composition: The present invention relates to micron to sub-micron sized coloured polymeric electrophotographic toner particles, a process for making those particles and their use as dry or liquid electrophotographic toners, and as component in the preparation of two-component electrophotographic developers. The particles comprise two different kinds of polymers and are made... Agent: Joann Villamizar Ciba Corporation/patent Department

20090104554 - Charge control agent composition and toner utilizing the same: A composition comprising a metal compound (A) of aromatic hydroxycarboxylic acid having an aromatic hydroxycarboxylic acid bonded with a metal atom selected from a zirconium atom, a calcium atom, an aluminum atom, a chromium atom, a boron atom and a zinc atom via at least any of ionic bond, covalent... Agent: Greenblum & Bernstein, P.L.C

20090104557 - Negative imaging method for providing a patterned metal layer having high conductivity: Disclosed is a method negative imaging method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090104560 - Barrier film material and pattern formation method: In exposing a resist film to light with a liquid provided on a positive chemically amplified resist film, a barrier film material for a barrier film formed between the resist film and the liquid includes a compound having an acid leaving group and a thermal acid generator.... Agent: Mcdermott Will & Emery LLP

20090104559 - Bottom antireflective coating compositions: Developable bottom antireflective coating compositions are provided.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090104558 - Solution for a treatment of a resist, a modified resist, a process for the treatment of a resist and an intermediate product: Solutions for the treatment of a resist used in the manufacturing of a semiconductor device or masks used in the manufacturing of semiconductor devices are described. Preferably, the solution includes a transition metal organic compound. Furthermore embodiments of modified resists, a process and an intermediate product are described.... Agent: Slater & Matsil, L.L.P.

20090104561 - High performance, crosslinked polymeric material for holographic data storage: An optical recording material and methods of making such material is provided. The material comprises of a dewar benzene monomer, with at least two cross-linkable groups, a sensitizer, a cross-linker, and an initiator. The material does not require a binder or a co-sensitizer. The material can be fabricated by an... Agent: Berliner & Associates

20090104562 - Photopolymerizable composition: A composition that is photopolymerizable upon absorption of light and/or heat, the composition including a binder, a polymerizable compound, a sensitizer, and a photoinitiator, characterized in that the composition includes, with respect to its non-volatile compounds, at least about 0.01 wt.-% of a polythiol compound and has a very high... Agent: Agfa C/o Keating & Bennett, LLP

20090104563 - Resist composition, method of forming resist pattern, novel compound, and acid generator: (wherein RX represents a hydrocarbon group which may contain a substituent group; Q1 represents an alkylene group of 1 to 12 carbon atoms which may contain a substituent group, or a single bond; n represents an integer of 0 or 1; Y1 represents an alkylene group of 1 to 4... Agent: Knobbe Martens Olson & Bear LLP

20090104565 - Method for forming photoelectric composite board: In a method for forming a photoelectric composite board (10) on which a photoelectric transducer (5) is mounted, photo-masks (111, 112, 113) which are used in processes to form the photoelectric composite board (10) are respectively disposed on the basis of a reference mark (33) previously formed on a metal... Agent: Greenblum & Bernstein, P.L.C

20090104564 - Patterning process: The invention is directed to a method for patterning a material layer. The method comprises steps of forming a mask layer on the material layer. A multiple patterning process is performed on the mask layer for transferring at least a first pattern from a first photomask through a first photoresist... Agent: J C Patents, Inc.

20090104566 - Process of multiple exposures with spin castable film: Methods of multiple exposure in the fields of deep ultraviolet photolithography, next generation lithography, and semiconductor fabrication comprise a spin-castable methodology for enabling multiple patterning by completing a standard lithography process for the first exposure, followed by spin casting an etch selective overcoat layer, applying a second photoresist, and subsequent... Agent: The Law Offices Of Robert J. Eichelburg

20090104567 - Apparatus for fabricating semiconductor device and method thereof: An apparatus for fabricating a semiconductor device and method thereof are disclosed, by which an angle of light diffracted by a reticle can be decreased in a manner of filling up an empty space between a reticle and a frame with a transparent substance of high purity to maximize real... Agent: Sherr & Vaughn, PLLC

20090104568 - Exposure method, exposure apparatus, and method for producing device: An exposure method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid by using a projection optical system while moving the substrate in a predetermined direction. A temperature distribution of the liquid in a direction intersecting the predetermined direction is measured. A projection... Agent: Oliff & Berridge, PLC

20090104569 - Plane waves to control critical dimension: The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask;... Agent: Intel Corporation C/o Cpa Global

20090104570 - Apertured media embellishing template and system and method using same: A multi-function media embellishing template and a system and method of embellishing media with the template is provided. The template includes a body having a media abutment surface and an aperture in the media abutment surface extending through the template, and an embellishing wall extending from the media abutment surface... Agent: Fay Sharpe LLP

20090104571 - Method for air gap formation using uv-decomposable materials: A method of selectively removing a sacrificial material on a substrate is described. The method comprises forming a sacrificial layer on a substrate. Thereafter, the sacrificial layer is selectively decomposed at a temperature less than the temperature required to thermally decompose the sacrificial layer by selectively exposing the sacrificial layer... Agent: Tokyo Electron U.s. Holdings, Inc.

20090104572 - Composition and method for providing a patterned metal layer having high conductivity: Disclosed is a method for making a metal pattern with high conductivity comprising providing a patterned substrate comprising a patterned catalyst layer on a base substrate by a thermal imaging method followed by plating to provide the metal pattern. The metal patterns provided are suitable for electrical devices including electromagnetic... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090098467 - Holographic sensor based on a volume hologram in a porous medium: A sensor for the detection of an analyte, comprising a holographic element comprising a medium and a hologram disposed throughout the volume of the medium, wherein an optical characteristic of the hologram changes as a result of a variation of a physical property occurring throughout the volume of the medium,... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association

20090098471 - Mask for sequential lateral solidification laser crystallization: A mask suitable for SLS laser crystallization includes a transparent substrate with a mask pattern thereon. The mask pattern includes a first region pattern and a second region pattern in mirror symmetry. When a laser beam irradiates on the mask to form a scanning region, the area of the scanning... Agent: J C Patents, Inc.

20090098470 - Method of correcting defect in photomask: Disclosed herein is a method of correcting defects in photomasks. According to one embodiment, a light absorption layer is formed on a photomask where pin hole defects occur in a light blocking layer, and light absorption patterns are formed on the pin hole defect portions by selectively etching the light... Agent: Marshall, Gerstein & Borun LLP

20090098468 - Photo-masks and methods of fabricating photonic crystal devices: Improved photo-masks for use in fabricating photonic crystal devices are disclosed herein. Methods of making photonic crystal devices, as well as the photonic crystal devices fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on... Agent: Troutman Sanders LLP/marco/ga Tech Ryan A. Schneider, Esq.

20090098469 - Process for fabrication of alternating phase shift masks: Design rules are described for a phase alternating shift mask for minimum chrome width and maximum segment length, where an embodiment employs during a cleaning process of the mask a megasonic power of 50 Watts at 1 MHz, and 30 Watts at 3 MHz. Some embodiments utilize an dry etch... Agent: Seth Kalson C/o Cpa Global

20090098472 - Pattern evaluation method: In a pattern evaluation method of determining whether a pattern formed on a photomask is acceptable, an aberration parameter of an image quality evaluation apparatus for determining a pattern image intensity in transferring a pattern formed on a photomask onto a wafer is acquired. An acceptance criterion value used in... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090098473 - Photomask, method of lithography, and method for manufacturing the photomask: A photomask has a monitoring pattern configured to obtain information required for adjusting optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090098474 - Electrophotographic photoreceptor containing naphthalenetetracarboxylic acid diimide derivatives as electron transport materials in a charge transporting layer and electrophotographic imaging apparatus including the same: A laminated type electrophotographic photoreceptor including an electrically conductive substrate and a charge generating layer and a charge transporting layer disposed on the electrically conductive substrate, wherein the charge transporting layer includes a naphthalenetetracarboxylic acid diimide derivative represented by Formula 1 below, and an electrophotographic imaging apparatus including the electrophotographic... Agent: Stanzione & Kim, LLP

20090098477 - Black toners containing infrared transmissive and reflecting colorants: A toner formulation is disclosed comprising a binder and an IR absorbing black pigment at a concentration of 0.25-2.0% by weight, including one or more infrared transmissive pigments, wherein the infrared transmissive pigments are configured to provide a black color. Such toner formulation may provide a response to a toner... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090098475 - Toner, method of manufacturing the same, two-component developer, developing device, and image forming apparatus: There are provided a toner, a method of manufacturing the toner, a two-component developer, a developing device, and an image forming apparatus, which are excellent in a charge rising property, environmental stability, and life stability during printing and which cause less fogging. The toner contains a core particle containing binder... Agent: Nixon & Vanderhye, PC

20090098476 - Black toners containing infrared transmissive: A toner formulation is disclosed comprising a binder, an IR absorbing colorant, and one or more infrared transmissive colorants, wherein the colorants are configured to provide a low reflectivity in the visible region of the spectrum and an intermediate reflectivity in the near infrared region of the spectrum when the... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090098478 - Method of manufacturing multi-layer circuit board: A method of manufacturing a multi-layer circuit layer is provided. One example method includes the steps of: preparing an upper substrate and a lower substrate, wherein each of the upper and lower substrates includes a carrier layer and a seed layer, which are detachably connected to each other; forming circuits... Agent: Drinker Biddle & Reath LLP Attn: Patent Docket Dept.

20090098479 - Exposure method and tool: m

20090098480 - Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same: A conductive film forming photosensitive material including a support having thereon an emulsion layer containing a silver salt emulsion and capable of manufacturing a conductive film by exposing the emulsion layer, performing a development treatment and further performing physical development and/or plating treatment, wherein the emulsion layer is disposed substantially... Agent: Sughrue-265550

20090098481 - Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same: A conductive film forming photosensitive material including a support having thereon an emulsion layer containing a silver salt emulsion and capable of manufacturing a conductive film by exposing the emulsion layer, performing a development treatment and further performing physical development and/or plating treatment, wherein the emulsion layer is disposed substantially... Agent: Sughrue-265550

20090098482 - Methods for imaging and processing negative-working imageable elements: wherein A represents recurring units comprising a pendant reactive vinyl group, A′ represents recurring units other than those represented by A, w is from about 1 to about 70 mol %, and w′ is from about 30 to about 99 mol %. The imagewise exposed element is developed with a... Agent: Andrew J. Anderson Patent Legal Staff

20090098483 - Positive resist composition and method for forming resist pattern: e

20090098485 - Positive resist composition and pattern forming method using the same: A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having... Agent: Sughrue-265550

20090098484 - Resist composition and method of forming resist pattern: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D1) having a molecular weight of 200 or more, which is represented by general formula... Agent: Knobbe Martens Olson & Bear LLP

20090098486 - Composition for forming lower layer film and pattern forming method: wherein R1 represents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more R1s may... Agent: Ditthavong Mori & Steiner, P.C.

20090098487 - Method of forming variable patterns using a reticle: A method of forming a variable pattern across a wafer using a reticle forms a plurality of first patterns on the wafer. The first pattern is repeated across the wafer and each first pattern has a first readable element. The method also forms a plurality of second patterns on the... Agent: Bromberg & Sunstein LLP

20090098488 - Thick film layers and methods relating thereto: Thick film layers for a micro-fluid ejection head, micro-fluid ejection heads, and methods for making micro-fluid ejection head and thick film layers. One such thick film layer is derived from a difunctional epoxy component having a weight average molecular weight ranging from about 2500 to about 4000 Daltons, a photoacid... Agent: Lexmark International, Inc. Intellectual Property Law Department

20090098489 - Method for forming resist pattern: A method for forming a resist pattern that includes the following steps (i) and (ii): (i) a step of forming a first resist layer on a substrate using a positive resist composition, and then conducting selective exposure, thereby forming a latent image of a dense pattern on the first resist... Agent: Knobbe Martens Olson & Bear LLP

20090098490 - Radiation-sensitive, wet developable bottom antireflective coating compositions and their applications in semiconductor manufacturing: The present invention is directed to novel radiation-sensitive, wet developable bottom antireflective coating (DBARC) compositions and their use in semiconductor device manufacturing. The DBARC compositions contain a photoacid generator that produces a photoacid upon exposure to activating radiation. In a photolithographic imaging process, the relatively strong photoacid reduces or eliminates... Agent: Squire, Sanders & Dempsey L.L.P.

20090098491 - Method and apparatus for thermal development: This invention pertains to a method and an apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for controlling vapor and condensate created during thermal treating of the photosensitive element.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090092904 - Hologram recording medium: The present invention provides a hologram recording medium wherein, in holographic memory recording using a blue laser as well as a green laser, a fall in light transmittance is very small even after recording. A hologram recording medium comprising at least a hologram recording material layer, wherein the hologram recording... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090092906 - Method of manufacturing phase shift photomask: In the case where the amount of variation in dimension of a made photomask exceeds an allowable range, a glass portion of the photomask is partially subjected to etching so that a dimension of a transcribed pattern obtained when a pattern formed on the photomask is transcribed on a wafer... Agent: Sughrue Mion, PLLC

20090092905 - Photomask defect correction device and photomask defect correction method: Provided is a photomask defect correction method of correcting a defect on a photomask including a substrate (2) and a mask pattern (3) by cutting and removing processing a defect portion (5) based on observation data obtained through AFM observation of the photomask in advance, including: an area setting step... Agent: Brinks Hofer Gilson & Lione/seiko Instruments Inc.

20090092907 - Sensitized photochemical switching for cholesteric liquid crystal displays: The present invention relates to photo-tunable dopant compositions comprising a photo-reactive chiral compound capable of undergoing a photochemical reaction resulting in the loss of chirality, and a triplet sensitizer. The present invention also relates to a display comprising a substrate, a liquid crystalline layer thereon, wherein the liquid crystalline layer... Agent: Alston & Bird LLP

20090092912 - Imidazolium salt containing charge transport layer photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one imidazolium salt.... Agent: Patent Documentation Center

20090092908 - Charge trapping releaser containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one charge trapping releaser.... Agent: Patent Documentation Center

20090092909 - Charge trapping releaser containing photogenerating layer photoconductors: A photoconductor that includes for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the photogenerating layer contains at least one charge trapping releaser.... Agent: Patent Documentation Center

20090092910 - Salt additive containing photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein at least one of the photogenerating layer and the charge transport layer contains at least one of a pyridimium salt and a tetrazolium salt.... Agent: Patent Documentation Center

20090092913 - Additive containing photogenerating layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the photogenerating layer contains an ammonium salt, an imidazolium salt, or mixtures thereof.... Agent: Patent Documentation Center

20090092915 - Phosphonium containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the at least one charge transport layer contains at least one phosphonium salt.... Agent: Patent Documentation Center

20090092914 - Phosphonium containing photogenerating layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a phosphonium salt containing photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component.... Agent: Patent Documentation Center

20090092911 - Additive containing charge transport layer photoconductors: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the charge transport layer contains at least one of an ammonium salt.... Agent: Patent Documentation Center

20090092916 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: An electrophotographic photoreceptor includes an electrically conductive substrate, an organic photosensitive layer and a surface layer laminated in this order. The surface layer includes at least gallium (Ga) and oxygen (O) as constituent elements thereof, and has a thickness of 0.2 μm to 1.5 μm, and a microhardness of 2... Agent: Oliff & Berridge, PLC

20090092917 - Toner, developer, and image forming method: A toner including a binder resin including a polyester resin, a colorant, and a release agent including a polyglycerin ester having a melt viscosity of from 1.0 to 40 mPa·sec at 120° C. and a hydroxyl value of from 0 to 100 mgKOH/g is provided. The polyglycerin ester is an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090092918 - Grafting metal oxides onto polymer for toner: Toner particles, including at least one binder, at least one colorant, and at least one metal surface additive, wherein the at least one metal oxide surface additive is a metal oxide particle covalently bonded with at least one polycondensation polymer.... Agent: Oliff & Berridge, PLC.

20090092919 - Magnetic toner: n

20090092920 - Carrier, developer, image forming method and process cartridge: The present invention is to provide a carrier and a developer, which have fewer occurrences of carrier adhesion and background smear, excellent granularity and longer durability. The carrier comprises the core material particles having magnetism and resin coating layer covering the core material particles, and wherein the weight average particle... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090092921 - Positive resist composition and resist pattern forming method: A positive resist composition includes a base material component (A) which exhibits increased alkali solubility under an action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the base material component (A) contains a compound (A1) in which phenolic hydroxyl groups in a... Agent: Knobbe Martens Olson & Bear LLP

20090092922 - Imaging layers, structures including imaging layers, methods of making imaging layers, and imaging systems: Imaging layers, image recording media, and methods of preparation of each, are disclosed.... Agent: Hewlett Packard Company

20090092923 - Modified silica particles, and photosensitive composition and photosensitive lithographic printing plate each containing the particles: a

20090092924 - Method of producing positive resist composition, positive resist composition, and method of forming resist pattern: A method of forming a positive resist composition of the present invention includes a step (I) of passing a positive resist composition, which is obtained by dissolving a resin component (A) that displays increased alkali solubility under the action of acid and an acid generator component (B) that generates acid... Agent: Knobbe Martens Olson & Bear LLP

20090092925 - Projection optical system, exposure apparatus, and exposure method: An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a... Agent: Klarquist Sparkman, LLP

20090092926 - Lithography systems and methods of manufacturing using thereof: Multi-beam lithography systems and methods of manufacturing semiconductor devices using the same are disclosed. For example, the method utilizes non-coincidence of boundaries of electrical fields emanating from chrome on glass or phase shifted mask features distributed over two masks for the optimization of lithographic process windows, side lobe suppression, or... Agent: Slater & Matsil LLP

20090092927 - Image drum and fabricating method thereof: A method of fabricating an image drum includes preparing a hollow drum body having a slot extending in a longitudinal direction, preparing a printed circuit board (PCB) having a plurality of board terminals, mounting the PCB inside the hollow drum body with a fixing member such that the board terminals... Agent: Stanzione & Kim, LLP

20090092928 - Component fabrication using thermal resist materials: m

20090092929 - Piezoelectric-actuator driving device and exposure apparatus including the same: A driving device includes a plurality of laminated units formed by alternately stacking piezoelectric element layers and electrode layers, a failure detecting unit configured to detect failure of the laminated units, a plurality of switches provided corresponding to the laminated units and configured to enable and disable current supply to... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090092932 - Method for forming pattern: In an exposure step, a combination of a first photomask and a second mask is used. The first mask has a real pattern corresponding to the pattern actually formed on the film to be processed, and a dummy pattern added for controlling pattern pitch in the first photomask within a... Agent: Leydig Voit & Mayer, Ltd

20090092931 - Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device: A method of forming a blocking pattern includes forming a preliminary blocking layer on first and second regions of a substrate, the preliminary blocking layer being formed of a photosensitive composition including a siloxane polymer, a cross-linking agent, a photoacid generator, and a thermal acid generator, selectively exposing to light... Agent: Lee & Morse, P.C.

20090092930 - Pattern formation method: After forming an underlying layer film and an intermediate layer film are formed over a substrate, a resist pattern formed by first pattern exposure using a first resist film and second pattern exposure using a second resist film is transferred onto the intermediate layer film. Furthermore, the underlying layer film... Agent: Mcdermott Will & Emery LLP

20090092934 - Gray-tone lithography using optical diffusers: A method of: directing an exposing light through an optical diffuser; directing the diffused light though a photomask having transparent areas corresponding to a gray-tone pattern; directing the masked light onto a photoresist material on a substrate; developing the photoresist to produce a three dimensional structure in the photoresist.... Agent: Naval Research Laboratory Associate Counsel (patents)

20090092933 - Methods of lithographically patterning a substrate: A method of lithographically patterning a substrate that has photoresist having removal areas and non-removal areas includes first exposing at least the non-removal areas to radiation effective to increase outer surface roughness of the photoresist in the non-removal areas at least post-develop but ineffective to change photoresist solubility in a... Agent: Wells St. John P.s.

20090087755 - Photomask and method of making thereof: The disclosure is related to photomasks used in photolithography and methods of making photomasks. The method involves providing a transparent substrate with one or more reflective films disposed over a surface of the substrate, applying a photoresist to the solution-contacted reflective film and forming a pattern in the photoresist that... Agent: Connolly Bove Lodge & Hutz LLP

20090087756 - Structure and method for determining an overlay accuracy: An enhanced technique for determination of an alignment accuracy involves an overlay target assembly which comprises at least two targets, each target having a first sub-structure of a first layer and a second sub-structure of a second layer, wherein, when the first layer and the second layer are correctly aligned,... Agent: Williams, Morgan & Amerson

20090087754 - System and method for making photomasks: The present disclosure is directed a method for preparing a system of photomask patterns for implementing a drawn pattern on a substrate with a multi-patterning lithography process. The method comprises receiving data describing a drawn pattern. A first photomask pattern is formed for implementing a region of the drawn pattern... Agent: Texas Instruments Incorporated

20090087759 - Oxime ester photoinitiators: Compounds of the formula (I), (II), and wherein R1, R2, R′2 and R′″2 for example are C1-C20alkyl; R3, R4, and R5 for example independently of one another are hydrogen or a defined substituent provided that at least one of R3, R4 or R5 is other than hydrogen or C1-C20alkyl; R6,... Agent: Joann Villamizar Ciba Corporation/patent Department

20090087760 - Image forming device, and method and computer readable medium therefor: An image forming device includes an image forming unit forming an image on a sheet with an image forming property, a pattern forming unit forming a pattern on an object, a detection value determining unit determining a first detection value representing the image forming property of the image forming unit... Agent: Banner & Witcoff, Ltd. Attorneys For Client No. 016689

20090087764 - Photoconductors containing terephthalate esters: The present invention is an electrophotographic photoconductor having a photosensitive layer on a conductive substrate. The photosensitive layer contains terephthalate esters additives.... Agent: Andrew J. Anderson Patent Legal Staff

20090087761 - Resin composition for electrophotographic photoconductor and electrophotographic photoconductor using the same: e

20090087763 - Photoconductors containing n-arylphthalimides: The present invention is an electrophotographic photoconductor having a photosensitive layer on a conductive substrate. The photosensitive layer contains N-arylphthalimides additives.... Agent: Andrew J. Anderson Patent Legal Staff

20090087762 - Photoconductors containing trimellitimide esters: The present invention is an electrophotographic photoconductor having a photosensitive layer on a conductive substrate. The photosensitive layer contains trimellitimide esters additives.... Agent: Andrew J. Anderson Patent Legal Staff

20090087765 - Toner for developing electrostatic latent image: A toner for developing an electrostatic latent image, comprising a toner particles containing at least a binder resin, a colorant and a charge control agent, the toner particles having a volume mode diameter (a) from 5 to 10 μm, a ratio (Dv/Dp), of a volume average particle diameter (Dv) to... Agent: Kratz, Quintos & Hanson, LLP

20090087766 - Toner for developing electrostatic latent image: t

20090087769 - Finely divided azo dye and process for producing the same: Finely divided azo dye and process for producing the same. The invention relates to a finely divided mono-azo pigment of formula (I) in the beta crystal phase (I), characterised in that at least 90 % by weight of the particles have a stoke equivalent diameter equal to or smaller than... Agent: Clariant Corporation Intellectual Property Department

20090087768 - Non-magnetic toner: An object of the present invention is to provide a toner excellent in fixing ability and developing ability. Provided is a non-magnetic toner including: toner particles each containing at least a binder resin, a colorant, and a wax component; and an inorganic fine powder, wherein: the toner has a specific... Agent: Fitzpatrick Cella Harper & Scinto

20090087770 - Toner for electrophotography: An electrophotographic toner is disclosed, meeting the requirement that G′ (60)/G′ (80) is from 1×102 to 1×104, where G′ (60) G′ (80) are each a storage modulus of the toner at 60° C. and 80° C., respectively; G′ (100)/G′ (130) is from 1 to 102, where G′ (100) and G′... Agent: Lucas & Mercanti, LLP

20090087771 - Electrophotographic carrier: An objective is to provide an electrophotographic carrier as a resin coating type carrier containing a conductive particle in a resin coating layer, which inhibits an edge effect via appropriately sufficient action as a developing electrode for a long duration, and acquires high fine line reproduction. Disclosed is an electrophotographic... Agent: Lucas & Mercanti, LLP

20090087772 - Developer, image forming method and image forming apparatus: A yellow toner, a magenta toner and a cyan toner, which are used for forming a color image, each contain a yellow pigment having an average dispersed diameter dy, a magenta pigment having an average dispersed diameter dm and a cyan pigment having an average dispersed diameter dc, respectively, and... Agent: Amin, Turocy & Calvin, LLP

20090087773 - Liquid developing agent and process for producing the same: A liquid developing agent includes a toner particle having a nuclear particle and a covering layer containing a wax, provided on the surface of the nuclear particle in which the wax has at least one of polar groups and aromatic substituent groups, is substantially insoluble in an electric insulation solvent... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090087774 - Compositions and methods for wet lamination of photopolymerizable dry films onto substrates: The invention is directed to a lamination fluid useful in processes for wet laminating a photopolymerizable film onto circuit board panels or other substrates. The lamination system comprises 1) a dry film photoresist, 2) a laminate comprising i) copper ii) stainless steel iii) non metal on a surface, 3) a... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090087775 - Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same: A curable resin composition comprises: (I) 100 parts by-weight of a curable resin; (II) 10 to 1200 parts by weight of an inorganic filler; and (III) 1 to 100 parts by weight of an organic filler having an elastic modulus of 1 to 2000 (MPa) and an average particle diameter... Agent: Young & Thompson

20090087776 - Positive resist composition and pattern forming method using the same: c

20090087777 - Optical disk storage medium: The surface of a transparent layer provided on the uppermost layer of the label side of an optical disk is subjected to pearskin finish. As a result, a light from a reflection layer is prevented from directly entering a user who has viewed an image on the label side, and... Agent: Crowell & Moring LLP Intellectual Property Group

20090087778 - Method for manufacturing original plate of planographic printing plate and original plate of planographic printing plate: An aspect of the present invention provides a method for manufacturing an original plate of a planographic printing plate, comprising: a process of forming a photosensitive layer on a substrate; a process of coating an overcoat layer over the photosensitive layer; a first drying process of supplying hot air toward... Agent: Sughrue Mion, PLLC

20090087779 - Printing plate material:

20090087780 - Negative-working photosensitive material and negative-working planographic printing plate precursor: A negative-working photosensitive material is provided which includes: a support; an undercoat layer; and a photosensitive layer including a polymerization initiator, a polymerizable compound, and a binder polymer, wherein the support, the undercoat layer, and the photosensitive layer are sequentially layered, the undercoat layer includes a polymer including a structural... Agent: Sughrue Mion, PLLC

20090087784 - Positive resist composition and pattern forming method using the same:

20090087785 - Polymerizable composition and planographic printing plate precursor using the same, alkali-soluble polyurethane resin, and process for producing diol compound: A polyurethane resin is synthesized from a compound represented by the following Formula (1), a polymerizable composition includes the polyurethane resin, a planographic printing plate precursor includes a photosensitive layer including the composition, and a method produces a diol compound that can be used as a raw material of the... Agent: Buchanan, Ingersoll & Rooney PC

20090087786 - Patterning process and resist composition used therein: A pattern is formed by applying a first positive resist composition onto a substrate, heat treatment, exposure, heat treatment and development to form a first resist pattern, the first positive resist composition comprising a polymer having copolymerized recurring units having naphthol and recurring units with an alkaline solubility that increases... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090087788 - Curable composition, image forming material, and planographic printing plate precursor: A curable composition in which polymerization inhibition due to oxygen is suppressed and which may be cured with high sensitivity by exposure to laser light or the like is provided. The curable composition includes: a polymerizable compound having an ethylenically unsaturated bond; a binder; a radical polymerization initiator; and at... Agent: Sughrue Mion, PLLC

20090087787 - Planographic printing plate precursor and method of producing a copolymer used therein: wherein R1, R2 and R3 each represent a hydrogen atom, a substituent having from 1 to 30 carbon atoms, or a halogen atom, L1 represents a single bond or a (n+1)-valent connecting group, n represents an integer of from 0 to 10, L2 represents a single bond or a (m+1)-valent... Agent: Sughrue Mion, PLLC

20090087789 - Resist composition and pattern-forming method using the same: wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra... Agent: Sughrue-265550

20090087791 - Lithographic printing plate surface protective agent and platemaking method for lithographing printing plate: e

20090087790 - Method of producing a negative planographic printing plate: The invention a method of producing a negative planographic printing plate of the invention, including: exposing, to an infrared laser, a negative planographic printing plate precursor at least having a hydrophilic support, and on the hydrophilic support, a polymerizable recording layer including (A) an infrared absorber, (B) an onium salt,... Agent: Sughrue Mion, PLLC

20090087792 - Method for manufacturing electroluminescence element: The present invention provides a method for manufacturing an electroluminescence element that has a light emitting layer containing a quantum dot and exhibits excellent life characteristics. In the method, patterning of the light emitting layer can be stably performed by a lift-off method. A photoresist layer is formed on a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090087793 - Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method: A method of nano-patterning, a method of manufacturing a nano-imprinting master and a discrete track magnetic recording medium are all provided. The method of nano-patterning includes (a) sequentially forming on a substrate an etching object material layer, a photoresist layer, and a metal layer patterned to a first pattern having... Agent: Sughrue Mion, PLLC

20090087794 - Method for manufacturing diffractive optical element: Means for Solving the Problems A diffractive optical element assuming cyclical stage patterns is manufactured through a procedural sequence of steps of exposing and developing a substrate 1 with a resist 2 applied thereupon by using a mask to form a resist pattern and then repeatedly etching the substrate by... Agent: Volentine & Whitt PLLC

20090087796 - Cyclopentene as a precursor for carbon-based films: The present invention provides a method for forming an amorphous carbon layer on a substrate. The method comprises the steps of: positioning the substrate in a processing chamber; introducing a process gas into the processing chamber, wherein the process gas comprises a composition comprising a C4 to C10 cyclic hydrocarbon... Agent: Air Products And Chemicals, Inc. Patent Department

20090087795 - Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system: A method and apparatus for reduction and prevention of residue formation and removal of residues formed in an immersion lithography tool. The apparatus including incorporation of a cleaning mechanism within the immersion head of an immersion lithographic system or including a cleaning mechanism in a cleaning station of an immersion... Agent: Schmeiser, Olsen & Watts

20090087798 - System and method for absorbance modulation lithography: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.... Agent: Gauthier & Connors, LLP

20090087797 - System and method for contrast enhanced zone plate array lithography: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.... Agent: Gauthier & Connors, LLP

20090087799 - Antireflective coating composition, antireflective coating, and patterning process: A composition comprising (A) a polymer having an alcohol structure with plural fluorine atoms substituted at α- and α′-positions and having k=0.01-0.4 and (B) an aromatic ring-containing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art... Agent: Birch Stewart Kolasch & Birch

20090087800 - Method and apparatus for producing conductive material: A photosensitive film, which has a transparent support and a silver salt emulsion layer containing a silver salt formed thereon, is exposed and developed to form a metallic silver portion. The base material to be plated is electrified in a solution containing a metal ion, using the metallic silver portion... Agent: Young & Thompson