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Radiation imagery chemistry: process, composition, or product thereof March listing by industry category 03/09

20090081560 - Compositions and methods for storing holographic data: The present invention provides a method for storing holographic data comprising providing a holographic storage medium comprising an optically transparent substrate including a photochemically active dye having at least two nitrone groups; and irradiating the optically transparent substrate with a holographic interference pattern, wherein the pattern has a first wavelength... Agent: General Electric Company Global Research

20090081561 - Photosensitive composition, optical recording medium and method for manufacturing same, optical recording method, and optical recording apparatus: The present invention provides a photosensitive composition containing (A) a photoreactive material, (B) an epoxy compound having an average epoxy equivalent of 230 g/eq. or less and having two or more epoxy groups in the molecule thereof, and (C) a thiol group-containing compound, which is used for forming a recording... Agent: Sughrue Mion, PLLC

20090081564 - Exposure mask, pattern formation method, and exposure mask fabrication method: An exposure mask has a rectangular pattern, an auxiliary pattern, a translucent region, and a shielding region. The rectangular pattern includes a transparent region having a dimension equal to or greater than a critical resolution of exposure light. The auxiliary pattern is arranged around the rectangular pattern and includes a... Agent: Young & Thompson

20090081563 - Integrated circuits and methods of design and manufacture thereof: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first... Agent: Slater & Matsil LLP

20090081565 - Method for forming etching mask, control program and program storage medium: Disclosed is a method for forming an etching mask, capable of precisely and easily forming an etching mask having a microscopic pattern of a non-straight-line shape. An exposure pattern of a straight-line shape is transferred to a photoresist by using a first reticle and developed, and after a trimming process,... Agent: Pearne & Gordon LLP

20090081562 - Photolithographic method and mask devices utilized for multiple exposures in the field of a feature: A photolithographic method for forming a plurality of characters on a device utilizes a mask set that includes a plurality of photolithographic masks, wherein each mask includes at least one non-opaque mask character field area that surrounds a non-opaque mask character area. Photoresist is exposed to radiation energy density through... Agent: Intellectual Property Law Offices

20090081567 - Soft pellicle and method of making same: The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm, 167 nm, 193 nm, 248 nm, 365 nm, and 436 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.... Agent: Fulbright & Jaworski L.L.P.

20090081566 - Wafer having scribe lanes suitable for sawing process, reticle used in manufacturing the same, and method of manufacturing the same: A wafer that is less susceptible to chipping or peeling during a sawing process is disclosed. The wafer includes a plurality of chips, scribe lanes formed between the plurality of chips, and a passivation film, which is formed on the plurality of chips and the scribe lanes and has a... Agent: Marger Johnson & Mccollom, P.C.

20090081568 - Exposure apparatus and method of manufacturing device: An exposure apparatus comprises a light source, a measuring instrument, a processor, and a controller, wherein the processor is configured to obtain a synthetic spectrum by synthesizing a spectrum of a first pulsed light and a spectrum of a second pulsed light, to obtain a central wavelength and light intensity... Agent: Morgan & Finnegan, L.L.P.

20090081569 - Electrophotographic photosensitive body: Provided is an electrophotographic photosensitive body having a photosensitive layer on a conductive base, in which at least the outermost layer thereof contains particles having a double structure composed of a core member and a shell member having a lager rubber hardness than the core member. The electrophotographic photosensitive body... Agent: Millen, White, Zelano & Branigan, P.C.

20090081570 - Electrophotographic photoreceptor: o

20090081571 - Fixing solution, capsule structure, fixing method, fixing device and image forming apparatus: A fixing solution for fixing toner to a recording medium, includes aliphatic ester held by solvent in a soluble manner, and having solubility or swelling property with respect to resin included in the toner.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090081572 - Single component developer: A toner for use in a single component development system, said toner including emulsion aggregation toner particles with a styrene acrylate polymer binder resin having a molecular weight Mw of from about 50 to about 100 Kpse and a number average molecular weight (Mn) of from about 10 to about... Agent: Patent Documentation Center

20090081574 - Black color material and toner: A black color material includes a squarylium compound represented by the following formula (1); and a blue color material:... Agent: Sughrue-265550

20090081573 - Toner for development of electrostatic image, method for manufacturing the same, developer for development of electrostatic image, toner cartridge, process cartridge, and image forming apparatus: A toner for development of an electrostatic image includes at least a crystalline polyester resin and a colorant. The toner shows a dielectric loss index ∈″ of 0.1 or less at 0.1 Hz and 500 V at 30° C. and 90% RH.... Agent: Oliff & Berridge, PLC

20090081575 - Single component developer: A method for developing toner for use in a single component development system, wherein the process includes a) contacting a styrene acrylate polymer binder resin having a weight average molecular weight (Mw) of from about 50 to about 100 Kpse, and a number average molecular weight (Mn) of from about... Agent: Patent Documentation Center

20090081576 - Toner compositions: The present disclosure provides processes for reducing the particle size of latex resins and toners produced with such resins. In embodiments, a carboxylic acid may be added to materials utilized to produce a latex in forming a seed resin or a master batch which, in turn, may be utilized to... Agent: Xerox Corporation (cdfs)

20090081577 - Toner compositions: The present disclosure provides processes for producing toners which include an annealing step and toners produced by these processes. The process includes a continuous annealing step, which increases the glass transition temperature of the resulting toner.... Agent: Xerox Corporation (cdfs)

20090081580 - Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the... Agent: Knobbe Martens Olson & Bear LLP

20090081579 - Functionalized carbosilane polymers and photoresist compositions containing the same: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that... Agent: Cantor Colburn, LLP - IBM Arc Division

20090081583 - Method for making a lithographic printing plate: A method for making a lithographic printing plate includes the steps of: (1) providing a heat-sensitive lithographic printing plate precursor including on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating, (2) image-wise exposing the precursor with IR-radiation or heat, and (3)... Agent: Agfa C/o Keating & Bennett, LLP

20090081578 - Method of preparing silver carboxylate soaps: Silver salts of long chain carboxylic acids are prepared from long chain carboxylic acids by sequential addition of at least two different alkali metal hydroxides, one of which is lithium hydroxide, followed by converting the mixture of alkali metal carboxylates to silver carboxylates. Photothermographic materials prepared from such silver carboxylates... Agent: Susan L. Parulski Carestream Health, Inc.

20090081582 - Photosensitive composition: l

20090081581 - Positive photosensitive composition and a pattern-forming method using the same: wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.... Agent: Sughrue-265550

20090081584 - Imaging layers and structures including imaging layers: Imaging layers, imaging media, and methods of preparation of each, are disclosed.... Agent: Hewlett Packard Company

20090081585 - Functionalized carbosilane polymers and photoresist compositions containing the same: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that... Agent: Cantor Colburn, LLP - IBM Arc Division

20090081587 - Photosensitive compound and photoresist composition including the same: n

20090081586 - Process for producing radiation-sensitive resin composition: A process for producing a radiation-sensitive resin composition includes the steps of providing a filter apparatus equipped with a filter composed of a polyamide resin filter and a polyethylene resin filter connected in series, circulating a precursor composition for the radiation-sensitive resin composition in the filter apparatus so that the... Agent: Ditthavong Mori & Steiner, P.C.

20090081588 - Resist composition and patterning process: A resist composition comprises a base polymer which changes its alkali solubility under the action of an acid, and an additive copolymer comprising recurring units (a) and (b). R1 is F or CF3, R2 and R3 are H or alkyl or form a ring, R4 is H or an acid... Agent: Birch Stewart Kolasch & Birch

20090081589 - Thick film resists: Thick film photoresist compositions are disclosed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090081590 - Negative resist composition and process for forming resist patterns: A negative resist composition is provided wherein the composition has the sensitivity to g-rays, i-rays, KrF excimer lasers and electron rays, and can be used for mix and match wherein exposure is conducted using at least two exposure light sources selected form g-rays, i-rays, KrF excimer lasers and electron rays.... Agent: Knobbe Martens Olson & Bear LLP

20090081591 - Method for patterning a photosensitive layer: The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with... Agent: Haynes And Boone, LLPIPSection

20090081592 - Fountain solution composition for lithographic printing and heat-set offset rotary printing process: A fountain solution composition for lithographic printing characterized by comprising at least one acyclic hydrocarbon diol compound, having 6 to 8 carbon atoms in total and two —OH groups, wherein said two —OH groups bind to carbon atoms at 1- and 2-positions, respectively; said fountain solution composition can be used... Agent: Sughrue Mion, PLLC

20090081593 - Method for forming resist pattern and method for manufacturing a semiconductor device: The resist material contains a photo-acid generator having an absorption peak to exposure light having a wavelength of less than 300 nm, and a second photo-acid generator having an absorption peak to exposure light having a wavelength of 300 nm or more. The method for forming a resist pattern comprises... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090081594 - Applications of semiconductor nano-sized particles for photolithography: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle... Agent: Nixon & Vanderhye, PC

20090081596 - Metal photoetching product and production method thereof: A metal photoetching product comprising at least one large cavity of minor axis W1S, major axis W1L and depth D1 in a surface of the product, wherein one or more cavities are included inside at least one of the at least one large cavity, and a smallest hole among the... Agent: Staas & Halsey LLP

20090081595 - Patterning process: A pattern is formed through positive/negative reversal by coating a chemically amplified positive resist composition comprising an acid labile group-bearing resin, a photoacid generator, and an organic solvent onto a substrate, prebaking the resist composition, exposing the resist film to high-energy radiation, post-exposure heating, and developing the exposed resist film... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090081597 - Functionalized carbosilane polymers and photoresist compositions containing the same: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that... Agent: Cantor Colburn, LLP - IBM Arc Division

20090081598 - Functionalized carbosilane polymers and photoresist compositions containing the same: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that... Agent: Cantor Colburn, LLP - IBM Arc Division

20090075179 - Extreme ultraviolet (euv) mask protection against inspection laser damage: Extreme Ultraviolet (EUV) mask protection against laser inspection damage is generally described. In one example, a photomask includes a substrate, a bilayer stack coupled with the substrate, the bilayer stack including about 30-50 bilayers wherein the bilayers include alternating films of a first material and a second material, a protective... Agent: Cool Patent, P.C. C/o Intellevate

20090075185 - Mask blank and method of manufacturing mask: A mask blank is formed on a transparent substrate with a light-shielding film of a material mainly containing chromium and is used for obtaining a photomask by forming the light-shielding film into a transfer pattern by lithography using an electron beam writing resist. The mask blank includes a mask layer... Agent: Sughrue Mion, PLLC

20090075184 - Mask blank for euv exposure and mask for euv exposure: Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection performance for the mask. This mask blank for EUV exposure includes a substrate, a reflecting layer which is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090075178 - Mask with registration marks and method of fabricating integrated circuits: A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.... Agent: Edell, Shapiro & Finnan, LLC

20090075181 - Method for fabricating photomask: A method for fabricating a photomask includes forming a light blocking layer, a hard mask layer, and a resist layer on a transparent substrate, forming a resist pattern to selectively expose the hard mask layer by removing the resist layer selectively, forming a hard mask pattern by etching the exposed... Agent: Marshall, Gerstein & Borun LLP

20090075180 - Method of correcting pattern critical dimension of photomask: Disclosed herein is a method of correcting a pattern critical dimension of a photomask. The method may include forming a phase shift layer and a light blocking pattern on a substrate, measuring a critical dimension (CD) of the light blocking pattern, and forming a negative resist pattern that has a... Agent: Marshall, Gerstein & Borun LLP

20090075186 - Method of manufacturing mask: There is provided a method of manufacturing a photomask for forming a semiconductor pattern. The method may include forming a plurality of dies including a main pattern, and forming a pseudo pattern to an area adjacent to the main pattern between the plurality of dies. A multi developing process of... Agent: Harness, Dickey & Pierce, P.L.C

20090075187 - Pattern forming method, semiconductor device manufacturing method and exposure mask set: First, a first exposure process is performed using dipole illumination with only a grating-pattern forming region as a substantial object to be exposed. Next, a second exposure process is performed with only a standard-pattern forming region as a substantial object to be exposed. A development process is then performed to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090075182 - Photomask and pattern formation method using the same: A photomask includes: a transparent substrate having a transparent property against exposing light; a first light-shielding pattern formed on the transparent substrate and having a first dimension; a second light-shielding pattern formed on the transparent substrate and having a second dimension larger than the first dimension; and an opening provided... Agent: Mcdermott Will & Emery LLP

20090075177 - Positive resist composition and resist pattern forming method: A positive resist composition having excellent size controllability, and a resist pattern forming method are provided. This positive resist composition contains a resin component (A) comprising an alkali soluble constituent unit (a1) which comprises a constituent unit (a11) derived from (α-methyl)hydroxystyrene, and a constituent unit (a2) which has an acid... Agent: Knobbe Martens Olson & Bear LLP

20090075183 - Technique for determining mask patterns and write patterns: During a method for generating a third mask pattern to be used on a photo-mask in a photolithographic process, first features are added to a first mask pattern to produce a second mask pattern. A majority of the first features may have a size characteristic larger than a pre-determined value,... Agent: Wilson Sonsini Goodrich & Rosati

20090075188 - Azo compound, curable composition, color filter, and method of producing the same: r

20090075189 - Methods for fabricating transflective liquid crystal displays: A method for fabricating a display is disclosed. A first substrate comprising a plurality of pixels is provided, each pixel comprises a plurality of sub pixels. A second substrate substantially opposite to the first substrate is provided, wherein the second substrate is divided into a plurality of regions corresponding to... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20090075190 - Imaging member having a dual charge generation layer: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved imaging member having a dual charge generation layer comprising a top layer and a bottom layer, wherein the bottom layer comprises a blend of phthalocyanine pigments having different sensitivities... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090075191 - Electrophotographic recording medium: An electrophotographic recording medium including a base layer and a toner receiving layer formed on one surface or both surfaces of the base layer, wherein the toner receiving layer includes a filler, a binder, a fluorescent whitening agent, and an ultraviolet absorber.... Agent: Stanzione & Kim, LLP

20090075192 - Toner: Disclosed is a toner comprising a resin and a colorant, wherein the colorant comprises a compound represented by formula (I) and a compound represented by formula (II).... Agent: Squire, Sanders & Dempsey L.L.P.

20090075193 - Coloring compound, yellow toner, sheet for heat-sensitive transfer recording, and ink: A coloring compound is provided which is excellent in coloring ability and transparency, has high solubility in organic solvents, and is superior in light resistance. A toner, a sheet for heat-sensitive transfer recording and an ink that use the coloring compound are also provided. The coloring compound is represented by... Agent: Fitzpatrick Cella Harper & Scinto

20090075194 - Developing agent, method for manufacturing a developing agent, and image forming apparatus: A developing agent includes a toner particle containing a binder resin including a first polyester resin synthesized from an aromatic monomer and an aliphatic monomer blended with a molar ratio in an alcohol component being satisfied with the relationship of {(aromatic monomer)>(aliphatic monomer)≧0} and with a molar ratio in an... Agent: Amin, Turocy & Calvin, LLP

20090075195 - Image forming method, image forming apparatus, and toner: A toner is provided including a mother toner including a crystalline polyester resin, an amorphous resin, and a wax, and an external additive in an amount of from 0.30 to 0.55 parts by weight based on 100 parts by weight of the mother toner. The toner satisfies the following equation... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090075196 - Toner, electrostatic latent image developer, magnetic latent image developer, toner cartridge, process cartridge, and image forming apparatus: The present invention provides a toner including a binder resin and metal particles containing Au, Ag, Cu, Pt, or an alloy thereof having a volume average particle diameter of from about 1 nm to about 300 nm, or an average maximum length of from about 10 nm to about 200... Agent: Sughrue Mion, PLLC

20090075197 - Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head: e

20090075198 - Photosensitive polyimide resin composition: The developability of a photosensitive polyimide resin composition with a weakly alkaline aqueous solution is improved without reduction in the solubility in general-purpose organic solvents even when a part of the diamine component is replaced with a diaminopolysiloxane-based compound or a bis(aminobenzoate)-based compound in order to reduce the warpage characteristics... Agent: Oliff & Berridge, PLC

20090075200 - Negative-working photosensitive resin composition and photosensitive resin plate using the same: in a range of 3.5 wt % or less based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090075199 - Photosensitive element having reinforcing particles and method for preparing a printing form from the element: The invention provides a photosensitive element and a method for preparing a printing form from the element. The photosensitive element includes a layer of a photosensitive composition containing a binder, a monomer, and a Norrish type II photoinitiator, wherein the photosensitive layer has a transmittance to actinic radiation of less... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20090075201 - Planographic printing plate material, and cyclic ureide moiety-containing phenolic resin and its synthetic process: Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, an image formation layer containing a cyclic ureide moiety-containing phenolic resin in which a phenolic resin has a cyclic ureide moiety through a linkage group, the cyclic ureide moiety being derived from a cyclic ureide and... Agent: Cantor Colburn, LLP

20090075203 - Photoresist compositions comprising diamondoid derivatives: Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain... Agent: Crowell & Moring LLP Intellectual Property Group

20090075202 - Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.... Agent: Sughrue-265550

20090075204 - Positive resist composition and method of forming resist pattern: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and... Agent: Knobbe Martens Olson & Bear LLP

20090075205 - Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions: The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.... Agent: The Dow Chemical Company

20090075206 - Curable composition, image forming material, and planographic printing plate precursor: A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided.... Agent: Sughrue Mion, PLLC

20090075207 - Norbornene polymer for photoresist and photoresist composition comprising the same: Disclosed herein is a photoresist composition which includes a norbornene copolymer having an epoxy group, an acid generator, and an organic solvent. The norbornene polymer shows superior mechanical and thermal properties, high transparency, excellent insulating properties, and particularly, improved mechanical properties due to the presence of an epoxy group. The... Agent: Buchanan, Ingersoll & Rooney PC

20090075208 - Plate making method of lithographic printing plate precursor: A plate making method of a lithographic printing plate precursor includes: exposing a lithographic printing plate precursor including an image-recording layer and a support; and developing the exposed lithographic printing plate precursor to prepare a lithographic printing plate, wherein the developing includes, in the following order, (i) a process of... Agent: Birch Stewart Kolasch & Birch

20090075209 - Device manufacturing apparatus and device manufacturing method: An apparatus for manufacturing a device comprises a processing unit configured to perform a process for manufacturing the device, a conveying unit configured to convey an article to the processing unit, and a controller configured to control the conveying unit based on a job queue. Information for controlling conveyance of... Agent: Morgan & Finnegan, L.L.P.

20090075210 - Exposure apparatus and method of manufacturing device: An exposure apparatus which includes a projection optical system configured to project light from an original onto a substrate and performs an exposure of the substrate to light via a liquid that fills a gap between a final optical element of the projection optical system and the substrate, the apparatus... Agent: Morgan & Finnegan, L.L.P.

20090075211 - Immersion lithography fluid control system: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from... Agent: Oliff & Berridge, PLC

20090075212 - Immersion lithography fluid control system: An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from... Agent: Oliff & Berridge, PLC

20090075214 - Manufacturing method of light emitting device, and evaporation donor substrate: An object is to provide a manufacturing method of a light emitting device, by which manufacturing costs in manufacturing a flat panel display can be reduced. A first substrate provided with a reflective layer having an opening over a first surface, and provided with a light absorption layer and an... Agent: Eric Robinson

20090075213 - Method of forming an auto-calibration label using a laser: An auto-calibration circuit or label (20) is formed to be used with an instrument (10). A structure is provided that includes an electrically conductive layer. A pattern is created with the electrically conductive layer using a laser to form an auto-calibration circuit or label. The pattern is adapted to be... Agent: Nixon Peabody LLP

20090075215 - Photoplate for oled deposition screen: A photoplate for manufacturing a deposition mask that is used to form a matrix of pixel areas used in a display panel. The photoplate comprises a layer of material such as quartz, on which a matrix of pixel etching areas is defined. The pixel etching areas are configured to form... Agent: Rader Fishman & Grauer PLLC

20090075216 - Storage medium storing exposure condition determination program, exposure condition determination method, exposure method, and device manufacturing method: A computer-readable storage medium storing a program for causing a computer to execute determination of an exposure condition for use in illuminating an original plate with an illumination optical system and projecting an image of a pattern of the original plate onto a substrate through a projection optical system. The... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090075217 - Tapered edge bead removal process for immersion lithography: A method and apparatus for forming a tapered photoresist edge. The method includes: forming a photoresist layer on a substrate; exposing a first annular region of the photoresist layer adjacent to a perimeter of the substrate to actinic radiation, the first annular region having a first outer perimeter proximate to... Agent: Schmeiser, Olsen & Watts

20090075218 - Silver halide color photographic light-sensitive material: wherein Z represents an alkyl, alkenyl, alkynyl, aryl, or heterocyclic group, or OR5, or NR6R7, in which R5, R6 and R7 represent an alkyl alkenyl, alkynyl, aryl, or heterocyclic group.... Agent: Sughrue Mion, PLLC

20090068569 - Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium: The sensitivity, diffraction efficiency, etc. of hologram recording materials is improved. Disclosed is a resin composition for a hologram recording material, the resin composition comprising: a photosensitive component comprising (a) a monomer having a vinyloxy group, (b) a compound having a (meth)acryloxy group, and (c) a photopolymerization initiator; and a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090068571 - Gray scale mask: A gray scale mask for fabricating a thin film transistor, comprising: a source mask region; a drain mask region; and a channel mask region between the source mask region and the drain mask region, wherein a plurality of light-blocking bars are arranged regularly in the channel mask region, and the... Agent: Ladas & Parry LLP

20090068572 - Gray scale mask: A scale mask comprises a U-shaped source mask region, a drain mask region with an end extending into the source mask region, and a U-shaped light-blocking bar arranged between the source mask region and the drain mask region. Slits are formed between the source mask region and the light-blocking bar... Agent: Ladas & Parry LLP

20090068573 - Pellicle frame: The present invention is directed to reduce pellicle frame distortions due to the tension of a pellicle film and caused during handling, thereby providing an excellent pellicle frame capable of reducing the distortion of a photomask due to a pellicle affixation. In the pellicle frame of the present invention, the... Agent: Lowe Hauptman Ham & Berner, LLP

20090068570 - Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography: A nanophotolithography mask includes a layer of an electrically conductive optically opaque material deposited on a mask substrate in which regular arrays of sub-wavelength apertures are formed. The plasmonic excitation in the layer perforated with the sub-wavelength apertures arrays under the light incident on the mask produces high resolution far-field... Agent: Rosenberg, Klein & Lee

20090068575 - Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element: wherein, RC, RD, A1 and P1 respectively represent an organic linkage group, a single bond or a divalent organic linkage group, a monovalent organic group containing such as an organic dye structure, and a polymer skeleton.... Agent: Buchanan, Ingersoll & Rooney PC

20090068574 - Substrate with bank, and substrate with color pattern: An embodiment of the present invention is disclosed. A substrate with a bank, comprising a substrate; and a bank on the substrate, wherein the bank comprises a resin composition containing at least a binder resin, and melamine resin or a derivative thereof, and the amount of the melamine resin or... Agent: Squire, Sanders & Dempsey L.L.P.

20090068576 - Gallium phthalocyanine crystal, production process thereof, photoreceptor, process cartridge and image forming apparatus: A gallium phthalocyanine crystal has a peak of spectral absorption spectrum within a wavelength range of from about 760 nm to about 773 nm or within a wavelength range of from about 790 nm to about 809 nm.... Agent: Oliff & Berridge, PLC

20090068577 - Naphthalenetetracarboxylic acid diimide derivative and electrophotographic photoconductor having the same: wherein R1 and R2, which are identical or different, each represent a substituted or non-substituted alkyl group or a substituted or non-substituted aromatic hydrocarbon group; R3 represents an alkyl group having 1 to 8 carbon atoms or an aromatic hydrocarbon group; R4, R5, R6 and R7, which are identical or... Agent: Cooper & Dunham, LLP

20090068578 - Binder resin for toner, toner, and method of manufacturing binder resin for toner: A binder resin for toner includes a hybrid resin of a crystalline resin (X) and an amorphous resin (Y), having a peak molecular weight of 30,000 or larger, and an amorphous resin (Z) having a peak molecular weight of smaller than 30,000.... Agent: Buchanan, Ingersoll & Rooney PC

20090068580 - External additive, method of manufacturing same and toner: An external additive including titanium dioxide having a water-soluble component of at least 0.2% by weight and a fluorosilane compound, wherein the titanium dioxide is surface-reformed by the fluorosilane compound.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090068581 - Magenta toner for developing electrostatic image: A magenta toner for developing an electrostatic image, the magenta toner comprising at least a binder resin and a magenta colorant, wherein the magenta colorant comprises a compound represented by Formula (1), wherein D is represented by one of Formulas (2) to (4):... Agent: Cameron Kerrigan Squire, Sanders & Dempsey L.L.P.

20090068579 - Full-color toner for electrophotography, and production method for the same: A production method for a full-color toner for electrophotography includes melt-kneading a toner material by use of an open-roll kneader, the toner material containing at least a binder resin, a wax, a colorant, and a charge control agent, wherein Mze/Mzi is 0.3 to 0.7, where Mze is a Z-average molecular... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090068582 - Developer, image forming method and image forming apparatus: A developer includes a core toner containing a magenta colorant including a quinacridone pigment, the magenta colorant having a dispersed diameter d=(major diameter+minor diameter)/2 of 0.25≦d≦0.50 μm being present in a number of from 5 to 200 per 10 particles of the core toner on observation of one sliced surface... Agent: Amin, Turocy & Calvin, LLP

20090068585 - Dissolution promoter and photoresist composition including the same: Moreover, the photoresist composition comprises 3 to 30 wt % (weight %) of the photosensitive compound; 1 to 30 weight parts of a dissolution promoter represented by the formula, with respect to 100 weight parts of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to... Agent: Birch Stewart Kolasch & Birch

20090068584 - Positive photosensitive resin composition, cured layer, protecting layer, insulating layer and semiconductor device and display therewith: A positive-type photosensitive resin composition comprises (A) an alkali-soluble resin having at least a polybenzoxazole precursor structure, (B) a sensitizer, and (C) a cyclic compound having an alcoholic hydroxyl group. A protecting layer and an insulating layer include a cured layer which is a cured product of the positive-type photosensitive... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090068583 - Positive resist composition and method for forming resist pattern: (wherein R51 represents a straight chain, branched chain, or cyclic alkyl group, or a straight chain, branched chain, or cyclic fluorinated alkyl group; R52 represents a hydrogen atom, a hydroxyl group, a halogen atom, a straight chain, branched chain, or cyclic alkyl group, a straight chain or branched chain halogenated... Agent: Knobbe Martens Olson & Bear LLP

20090068586 - Silsesquioxane resin, positive resist composition, resist laminate, and method of forming resist pattern: A silsesquioxane resin, a positive resist composition, a resist laminate, and a method of forming a resist pattern that are capable of suppressing a degas phenomenon are provided, and a silicon-containing resist composition and a method of forming a resist pattern that are ideally suited to immersion lithography are also... Agent: Knobbe Martens Olson & Bear LLP

20090068587 - (meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method: The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents... Agent: Young & Thompson

20090068589 - Multi-tone resist compositions: Multi-tone resists can enhance the resolution limit of a lithographic process by advantageously using the changeable solubility of a resist composition as a function of lithographic radiation dosage. By imaging a multi-tone resist with different doses of lithographic radiation in a selected pattern, the pattern can be imparted to the... Agent: Nutter Mcclennen & Fish LLP

20090068590 - Polymer compound, positive resist composition, and method of forming resist pattern: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to... Agent: Knobbe Martens Olson & Bear LLP

20090068588 - Positive resist composition and method of forming resist pattern: A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure to radiation, wherein the component (A) includes a structural unit (a1) represented by a general formula (a1-2) or (a1-4),... Agent: Knobbe Martens Olson & Bear LLP

20090068592 - Positive resist composition and method of forming resist pattern: wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; Y1 represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such... Agent: Knobbe Martens Olson & Bear LLP

20090068591 - Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator: wherein X represents —O—, —S—, —O—R3— or —S—R4—, wherein each of R3 and R4 independently represents an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of... Agent: Knobbe Martens Olson & Bear LLP

20090068593 - Photosensitive resin composition: The present invention relates to a photosensitive resin composition comprising at least a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), and a photopolymerization initiator (c), characterized in that the thermoplastic elastomer (a) comprises at least vinyl aromatic hydrocarbon units, butadiene units, and alkylene units and contains alkylene units not... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090068595 - Photosensitive resin composition, composition for solder resist, and photosensitive dry film: A photosensitive resin composition which is excellent in storage stability required for one-part type compositions and in processability required for dry-film formation and gives a cured product suitable for FPC substrates or suspension substrates for hard-disc which each retains essential properties required for solder resists, such as heat resistance, water... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090068594 - Positive resist composition and method for forming resist pattern: A positive resist composition for producing MEMS using an electron beam, the composition comprising a resin component (A) that displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon irradiation, wherein the resin component (A) is a resin prepared by protecting... Agent: Knobbe Martens Olson & Bear LLP

20090068596 - Negative-tone,ultraviolet photoresists for fabricating high aspect ratio microstructures: UV photoresist materials are disclosed, based on EPON 154 or EPON 165. Preferred embodiments, based on a composite of EPON 154 and EPON 165, spread evenly into a flat, uniform layer, even without spin-coating. The preferred embodiments bond strongly to all substrates, and are resistant to cracking and debonding following... Agent: Patent Department Taylor, Porter, Brooks & Phillips, L.l.p

20090068597 - Exposure method and apparatus, and electronic device manufacturing method: An exposure method provided is a high-resolution and inexpensive method suitable for use in formation of a fine pattern for making up an electronic device. A diffraction grating is located in proximity to a wafer or the like for making up an electronic device, and illumination light with a predetermined... Agent: Staas & Halsey LLP

20090068598 - Laser processing apparatus and laser processing method, debris collection mechanism and debris collection method, and method for producing display panel: A laser processing apparatus is provided for patterning with laser light a resin film or a metal film formed on a substrate. The apparatus includes a laser light source; and a debris collection device having a transmission window through which the laser light is transmitted, a vortex generation mechanism generating... Agent: Sonnenschein Nath & Rosenthal LLP

20090068599 - Method of manufacturing image sensor: Provided is a method of manufacturing image sensor capable of maximizing light condensing efficiency so that the light input through a micro-lens is condensed onto a light receiving element. According to the present invention, inner micro-lenses or a condensing efficiency of the light input through the micro-lens. Therefore, light condensing... Agent: Ipla P.A.

20090068600 - Method for enhancing optical stability of three-dimensional micromolded product: In order to enhance the optical stability of a three-dimensional micromolded product having optical transparency produced by irradiating a molded layer formed of a photosensitive resin composition provided on a transparent substrate with an actinic radiation from the transparent substrate side so that the quantity of light is varied along... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090061328 - Photomask and pattern formation method using the same: A photomask includes a transparent substrate having a transparent property against exposing light and a halftone portion formed on the transparent substrate. In the halftone portion, a first opening having a first dimension and a second opening having a second dimension larger than the first dimension are formed. A light-shielding... Agent: Mcdermott Will & Emery LLP

20090061330 - Photomask and pattern formation method using the same: A photomask includes a transparent substrate having a transparent property against exposing light, a semi-light-shielding portion formed on the transparent substrate, a first opening formed in the semi-light-shielding portion and having a first dimension and a second opening formed in the semi-light-shielding portion and having a second dimension lager than... Agent: Mcdermott Will & Emery LLP

20090061327 - Removal of ionic residues or oxides and prevention of photo-induced defects, ionic crystal or oxide growth on photolithographic surfaces: Techniques associated with surface treatments for photomasks, semiconductor wafers, and/or optics are generally described. In one example, a method includes preparing a surface of a photomask or semiconductor wafer for cleaning, and removing ionic contamination from a surface of a photomask or semiconductor wafer using radical or atomic hydrogen, or... Agent: Cool Patent, P.C. C/o Intellevate

20090061329 - Semiconductor device manufacturing method and hard mask: A semiconductor device manufacturing method includes forming a target film to be processed on a semiconductor substrate in which a semiconductor element has been formed; forming a hard mask on the target film; and patterning the target film. The hard mask is a multilayer film including a conductive carbon film... Agent: Scully Scott Murphy & Presser, PC

20090061331 - Exposure method and apparatus, maintenance method, and device manufacturing method: An exposure method for exposing a substrate with an exposure light via an projection optical system and a liquid includes: a first step of optically observing a liquid contact portion which comes into contact with the liquid and storing first image data obtained by the optical observation; a second step... Agent: Oliff & Berridge, PLC

20090061332 - Image-recording material support, method for producing the same, and image-recording material: To this end, the present invention provides a image-recording material support which has a raw paper and a polymer coating layer on both surfaces of the raw paper, wherein the raw paper has a value of tensile energy absorption (TEA) in the CD direction/basis weight of 1,000 mJ/g to 2,100... Agent: Sughrue Mion, PLLC

20090061333 - Carrier for electrostatic latent image development, and developer for electrostatic latent image development, method of forming an image, developer cartridge for electrostatic latent image development, process cartridge and image forming apparatus using t: A carrier for developing an electrostatic latent image includes carrier particles, and the carrier particles include magnetic particles and a coating layer coating the surfaces of the magnetic particles. The BET specific surface area of the magnetic particles is 0.1300 m2/g to 0.2500 m2/g, and the difference in BET specific... Agent: Oliff & Berridge, PLC

20090061334 - Toner, method of preparing toner, method of forming image using the toner, and image forming apparatus employing the toner: A toner and a method of preparing the toner, the method including: preparing first latex particles by polymerizing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group, and at least one reactive functional group; at least one polymerizable monomer; and a wax; preparing a first agglomerated... Agent: Stanzione & Kim, LLP

20090061335 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a specific photoreceptor material package comprising an undercoat layer, a charge generation layer having a specific pigment blend, a long life charge transport layer, and... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090061338 - Boron containing photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the photogenerating layer contains a boron containing compound.... Agent: Patent Documentation Center

20090061340 - Hydroxy benzophenone containing photoconductors: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a photogenerating pigment or pigments, and a hydroxyalkoxy benzophenone.... Agent: Patent Documentation Center

20090061336 - Light stabilizer containing photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein said photogenerating layer contains a light stabilizer.... Agent: Patent Documentation Center

20090061337 - Photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the photogenerating layer contains a triazine.... Agent: Patent Documentation Center

20090061339 - Triazole containing photoconductors: A photoconductor comprising a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and where the photogenerating layer contains a triazole.... Agent: Patent Documentation Center

20090061341 - Electrophotographic photoreceptor having improved dark decay characteristics and electrophotographic imaging apparatus employing the same: An electrophotographic photoreceptor including an electrically conductive substrate and a photosensitive layer formed on the electrically conductive substrate, wherein the photosensitive layer includes a charge generating layer and a charge transporting layer, the charge transporting layer containing a predetermined amount of a titanium chelating compound, and an electrophotographic imaging apparatus... Agent: Stanzione & Kim, LLP

20090061342 - Toner compositions: The present disclosure provides processes for reducing the particle size of latex resins and toners produced with such resins. In embodiments, a buffer may be added to materials utilized to produce a latex and reduce the particle size of the resulting latex particles and toner particles. In accordance with the... Agent: Xerox Corporation (cdfs)

20090061343 - Toner compositions: A toner having its surface functionalized with functional groups, and processes for producing the same, are provided.... Agent: Xerox Corporation (cdfs)

20090061344 - Dual component dual roll toner: A toner comprising toner particles having at least one type of surface additive, the toner particles having an FPIA average circularity of at least 0.95, whereby at least 80 % wt of the total amount of surface additives stays onto the surface of the toner particles when an ultrasonic treatment... Agent: Bacon & Thomas, PLLC

20090061345 - Toner: A toner including a binder resin, a colorant, and a release agent is provided. The difference in absorbance ratio between the toner heated for 1 minute in an atmosphere of 100° C. and the toner stored in an atmosphere of 23° C. is from 0.1 to 0.2. The absorbance ratio... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090061346 - Liquid developer and image forming apparatus: A liquid developer includes an insulating liquid containing a fatty acid monoester and a toner particle constituted mainly of a resin material, the main toner particle being shaped in a disc form.... Agent: Hogan & Hartson L.L.P.

20090061347 - Base soluble polymers for photoresist compositions: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.... Agent: Az Electronic Materials Usa Corp.

20090061348 - Electrophotographic image-receiving sheet and image forming method using the same: The present invention provides an electrophotographic image-receiving sheet including a support having raw paper and a resin layer on at least one surface of the raw paper; and at least one coating layer on the support, wherein the thickness of the resin layer at least on the image-forming side is... Agent: Sughrue Mion, PLLC

20090061349 - Low melt toners and processes thereof: A process for preparing toner particles and compositions adapted for use in preparing toners that comprise a blend of a first polyester resin with a second sharp melting polyester resin. The process includes forming an emulsion resin comprising a branched polyester resin, a crystalline polyester resin, a colorant, and optionally... Agent: Fay Sharpe / Xerox - Rochester

20090061351 - Heat transfer masking sheet materials and methods of use thereof: In one embodiment, a method of applying an image to a substrate includes the steps of: imaging a printable surface with an image to form an imaged surface having a printed area and a non-printed area; positioning a masking sheet comprising an outer masking layer adjacent the imaged surface such... Agent: Dority & Manning, P.A.

20090061350 - Thermal transfer ink sheet, ink cartridge, coating composition for dye layer of thermal transfer ink sheet, and thermal transfer recording method:

20090061352 - Imageable elements with improved abrasion resistance: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer that includes inorganic, non-metallic, inert discrete particles, such as nano-sized silica, aluminum oxide, or titanium dioxide particles. The presence of these particles in the outermost layer improves the abrasion and scratch resistance of the elements.... Agent: Andrew J. Anderson Patent Legal Staff

20090061354 - Lithographic printing plate support, method of manufacturing the same, and presensitized plate: A lithographic printing plate support in which surface unevenness due to surface treatment has been suppressed and a presensitized plate of excellent sensitivity are produced from an aluminum alloy plate containing iron, silicon, titanium and boron by specifying the state in which TiB2 particles are present in the surface layer... Agent: Sughrue Mion, PLLC

20090061353 - Positive-type resist composition: wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4,... Agent: Crowell & Moring LLP Intellectual Property Group

20090061355 - Process of making a lithographic structure using antireflective materials: A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiOx backbone, a chromophore, and a transparent organic group that is substantially transparent to 193 nm or... Agent: Connolly Bove Lodge & Hutz LLP

20090061356 - Polymer compound, positive resist composition and method of forming resist pattern: [wherein, R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; A represents a divalent aliphatic cyclic group that may have a substituent; B represents a divalent hydrocarbon group that may have a substituent; r represents an integer of 0 or 1; and R1 represents... Agent: Knobbe Martens Olson & Bear LLP

20090061357 - Ionic polymer particles for processless printing plate precursor: A processless lithographic printing precursor comprising a substrate, a layer of imaginable element on the substrate. The imaginable element comprising: (1) a substance capable of converting radiation into heat; (2) anionic polymer particles and (3) cationic polymer particles. The imaginable element can not be removed by water or fountain used... Agent: Yisong Yu

20090061358 - Novel photoacid generator, resist composition, and patterning process: p

20090061359 - Resist composition for immersion exposure and method for manufacturing a semiconductor device using the same: According to an aspect of an embodiment, a resist composition for immersion exposure includes a matrix resin so that the matrix resin is turned alkali-soluble by an acid. The resist composition further includes a resin having a side chain containing silicon, the resin being capable of being turned alkali-soluble by... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090061361 - Integrated circuit manufacturing methods with patterning device position determination: Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.

20090061360 - Material for resist protective film for immersion lithography: An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (FU) formed by polymerizing a polymerizable compound (fm) having a fluorine-containing bridged cyclic structure. For example, repeating units (FU) are repeating units formed by polymerizing a compound (f) selected from the group... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090061362 - Semiconductor device manufacturing method using double patterning and mask: To provide a semiconductor device manufacturing method using double patterning, in which layout patterns are distributed avoiding yield reduction factors. The semiconductor device manufacturing method includes the steps of: preparing a plurality of masks for use in the double patterning; and performing the double patterning using the plurality of masks.... Agent: Mcdermott Will & Emery LLP

20090061363 - Method for on-press developing laser sensitive lithographic printing plate: A method of on-press developing a high-speed laser sensitive lithographic printing plate with ink and/or fountain solution is described. The plate comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with... Agent: Gary Ganghui Teng

20090061364 - Process for on-press developable lithographic printing plate involving preheat: A method of processing an on-press developable lithographic printing plate with ink and/or fountain solution is described. The plate comprises on a substrate a photosensitive layer which is either capable of hardening (negative-working) or solubilization (positive-working) upon exposure to a laser, the non-hardened or solubilized areas of the photosensitive layer... Agent: Gary Ganghui Teng