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Radiation imagery chemistry: process, composition, or product thereof February patent applications/inventions, industry category 02/09

20090053616 - Holographic recording medium: A holographic recording medium is provided, which includes a recording layer. The recording layer comprises a radical polymeric monomer having an aromatic ring-containing group and a polymeric group, a polymer matrix having the aromatic ring-containing group, and a photo-radical polymerization initiator.... Agent: Charles N.j. Ruggiero, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20090053617 - Holographic recording medium: A holographic recording medium includes: a recording layer in which is recordable an interference pattern formed by interference of a plurality of laser beams; a pair of substrates between which is arranged the recording layer; and a spacer positioned between the substrates so as to cover an outer perimetrical surface... Agent: Sughrue Mion, PLLC

20090053615 - Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same: The present invention relates to a volume phase hologram recording material excellent in transparency, sensitivity, low curing shrinkage, and transparency, a volume phase hologram recording medium, and a volume phase hologram. A photosensitive resin composition for volume phase hologram recording contains a low-molecular-weight solvent-soluble aromatic copolymer (A) having a structural... Agent: Edwards Angell Palmer & Dodge LLP

20090053620 - Blank mask and method for fabricating photomask using the same: A photomask is formed on an etch target layer of a transparent substrate using a blank mask that includes a carbon layer and an oxide layer. The carbon layer and the oxide layer are disposed on the etch target layer. The oxide layer is formed into an oxide layer pattern... Agent: Marshall, Gerstein & Borun LLP

20090053622 - Fine mask and method of forming mask pattern using the same: In a semiconductor technology, a fine mask for a semiconductor and a method of forming a mask pattern using the same are disclosed. In order to improve accuracy of line width resolution and optical resolution in forming a pattern of a semiconductor wafer, the fine mask includes a first mask,... Agent: Sherr & Vaughn, PLLC

20090053623 - Mask for semiconductor device and patterning method using the same: A mask for a semiconductor device and a patterning method using the same are disclosed. The mask for a semiconductor device includes a first mask including main patterns constituted by a plurality of split patterns arranged at intervals, and a second mask including first auxiliary patterns disposed corresponding to regions... Agent: Sherr & Vaughn, PLLC

20090053624 - Modifying merged sub-resolution assist features of a photolithographic mask: Modifying merged sub-resolution assist features includes receiving a mask pattern comprising the merged sub-resolution assist features, where a segmenting sub-resolution assist feature intersects a segmented sub-resolution assist feature at an intersection. Each sub-resolution assist feature is represented by an axis of the sub-resolution assist feature. The length of at least... Agent: Texas Instruments Incorporated

20090053619 - Pattern producing method, semiconductor device manufacturing method and program: A pattern producing method includes specifying a first pattern and a second pattern obtained by modifying the first pattern, specifying a correction area based on the second pattern, in a part of an area including the first pattern and the second pattern, producing at least a part of the first... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090053618 - Projection exposure method and projection exposure system therefor: In the case of a projection exposure method for exposing a radiation-sensitive substrate, arranged in the region of an image surface of a projection objective, with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, a mask... Agent: Fish & Richardson PC

20090053621 - Source and mask optimization by changing intensity and shape of the illumination source: An illumination source is optimized by changing the intensity and shape of the illumination source to form an image in the image plane that maximizes the minimum ILS at user selected fragmentation points while forcing the intensity at the fragmentation points to be within a small intensity range. An optimum... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090053626 - Colored photosensitive composition, color filter, and method for manufacturing color filter: The invention provides a colored photosensitive composition including: a coloring agent with a content of from 50% by weight to 80% by weight with respect to the total solid content of the composition; an oxime-based initiator with a content of from 5% by weight to 20% by weight with respect... Agent: Sughrue Mion, PLLC

20090053625 - Substrate provided with bank and substrate provided with color pattern: An embodiment of the present invention will be disclosed below. A bank substrate comprising: a substrate and a bank on the substrate, wherein a surface energy of the bank is 30 to 45 mJ/m2. Further, colored pixels are present between zones of the bank, and the difference of height within... Agent: Squire, Sanders & Dempsey L.L.P.

20090053628 - Method of performing model-based scanner tuning: A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090053627 - Methods and systems for normalizing error: A method for fabricating parts using a photolithography system, includes: performing a search of normalization data for an estimated dose operating point; and using the estimated dose operating point for fabrication of new parts. Other methods are provided.... Agent: Cantor Colburn LLP - IBM Fishkill

20090053629 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method: At the same time, positional information of the wafer stage is measured using an interferometer system such as, for example, a Z interferometer. When abnormality of the surface position measurement system is detected or when the wafer stage moves off from a measurement area of the surface position measurement system,... Agent: Oliff & Berridge, PLC

20090053631 - Image forming method and image forming apparatus: An image forming method includes forming an electrostatic latent image on a surface of a latent image carrier; developing the electrostatic latent image with a developing agent including a toner to form a toner image; transferring the toner image onto a surface of a target to obtain a transferred toner... Agent: Oliff & Berridge, PLC

20090053630 - Method of preparing toner and toner prepared using the method: A method of preparing toner, the method including: preparing latex particles for a core which contain wax by polymerizing a toner composition comprising at least one polymerizable monomer and a macromonomer having a hydrophilic group, a hydrophobic group, and at least one reactive functional group; mixing the latex particles for... Agent: Stanzione & Kim, LLP

20090053632 - Pattern forming apparatus and pattern forming method: A pattern forming apparatus includes a depressed plate holding patterns by developers, a charging device for charging the depressed plate, a developing device for developing a red pattern, a developing device for developing a green pattern, a developing device for developing a blue pattern, and a stage for holding the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090053633 - P-terphenyl compound mixture and electrophotographic photoreceptors made by using the same: An object of the invention is to provide: a p-terphenyl compound mixture useful as a charge-transporting agent which has improved solubility in organic solvents to thereby diminish a cracking phenomenon, which poses problems concerning photoreceptor characteristics, and can realize an electrophotographic photoreceptor having high sensitivity and high durability; and an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090053634 - Image forming apparatus:

20090053635 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a charge transport layer that is dual-dopant, wherein operating life improvement is achieved by incorporating a small amount of compatible thermalsetting resin and polyhedral oligomeric... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090053636 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a charge transport layer that is partially crosslinked, wherein the crosslinking is achieved by incorporating a small amount of compatible thermalsetting resins into the layer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090053637 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a charge transport layer that is partially crosslinked, wherein the crosslinking is achieved by incorporating a small amount of compatible thermalsetting resins into the layer.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20090053638 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge and image forming apparatus: wherein CA represents an amount of a carboxyl group and its salt on a surface of the toner, CB represents an amount of a carboxyl group and its salt in the entire toner, Nt represents an amount of a nitrogen element on the surface of the toner, and St represents... Agent: Oliff & Berridge, PLC

20090053639 - Developing agent: A developing agent contains magnetic particles having a surface coated layer containing an organic material on at least a part of a surface thereof, and colored particles provided with an external additive having a weak charging property with respect to the surface coated layer of the magnetic particles on a... Agent: Amin, Turocy & Calvin, LLP

20090053641 - Charge control agent and related art: Each of R1 to R4: a hydrogen atom, a carboxyl group, an aminocarbonyl group having or not having a substituent, an aminocarbonylmethyl group having or not having a substituent, an alkoxycarbonyl group, an alkyl group, a phenyl group having a substituent or not having a substituent, or a group that... Agent: Mcglew & Tuttle, PC

20090053640 - Toner and method for producing toner: A toner is obtained in an aqueous medium by dispersing second resin particles into a core particles dispersion including at least first resin particles, and fusing the second resin particles with core particles. A second resin particle dispersion in which the second resin particles are dispersed is added after adjusting... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090053642 - Toner, method of forming images using the toner and image forming device using the toner: A toner having a cohesion level of 50 or less when measured using an ASTM D 6393-99 includes a first agglomerated toner including latex particles for a core, a pigment and an inorganic salt, and latex particles for a shell layer coated on the first agglomerated toner, wherein the latex... Agent: Stanzione & Kim, LLP

20090053643 - Magnetic mono-component toner for developing electrostatic latent image and image forming method: t

20090053644 - Core-shell polymer nanoparticles and method for making emulsion aggregation particles using same: The method of making nano-sized particles for use in making emulsion aggregation toner particles, the nano-sized particles having a core portion and a shell portion, wherein the core portion of the nano-sized particles includes crystalline resin and the shell portion includes amorphous resin and is substantially to completely free of... Agent: Oliff & Berridge, PLC.

20090053645 - Coated glass substrate with ultraviolet blocking characteristics and including a rheological modifier: There is provided a forming a solution by mixing at least a polymeric silane, a solvent, acetone, acetic acid, and a rheological enhancer, wherein the rheological enhancer may comprise an acrylic latex; and agitating the solution. Also provided are methods of using the same in coated articles, and coated articles... Agent: Nixon & Vanderhye, PC

20090053647 - Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative: wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1... Agent: Oliff & Berridge, PLC

20090053646 - Material for protective film formation and method of forming resist pattern therewith: A material for protective film formation that is used to form an upper-layer protective film for a resist film and that contains at least a polymer component soluble in water or alkali and an alcohol containing a fluorine atom; and a method of forming a resist pattern with the use... Agent: Procopio, Cory, Hargreaves & Savitch LLP

20090053648 - Light sensitive planographic printing plate material: The present invention provides a light sensitive planographic printing plate material which is adapted to exposure employing a laser emitting light with an emission wavelength of from 350 to 450 nm, and which exhibits high sensitivity and excellent safelight property, and a light sensitive planographic printing plate material comprising a... Agent: Cantor Colburn, LLP

20090053649 - Lactone copolymer and radiation-sensitive resin composition: e

20090053651 - Patterning process: A pattern is formed by applying a first positive resist composition onto a substrate, heat treatment, exposure, heat treatment and development to form a first resist pattern; causing the first resist pattern to crosslink and cure by irradiation of high-energy radiation of up to 180 nm wavelength or EB; further... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090053650 - Resist composition for immersion exposure and method of forming resist pattern: A resist composition for immersion exposure and a method of forming a resist pattern are provided which can satisfy both of excellent resistance to an immersion medium and lithography properties. The resist composition for immersion exposure includes a resin component (A) which exhibits changed alkali solubility under action of acid... Agent: Knobbe Martens Olson & Bear LLP

20090053652 - Photoresist compositions: Photoresist compositions are disclosed.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090053653 - Polymerizable composition and lithographic printing plate precursor: wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n... Agent: Sughrue-265550

20090053654 - Mask and method for patterning a semiconductor wafer: A method for generating a mask pattern is provided. A target lithographic pattern comprising a plurality of first geometric regions is provided, wherein the regions between the plurality of first geometric regions comprise first spaces. The target lithographic pattern is transformed, and the transformed pattern is decomposed into a first... Agent: Slater & Matsil LLP

20090053655 - Methods for forming patterned structures: In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second... Agent: Fish & Richardson PC

20090053656 - Process to form a mold of nanoimprint technique for making diffraction grating for dfb-ld: A process using the nanoimprint technique to form the diffraction grating for the DFB-LD is disclosed. The process includes (a) coating a resist for the EB exposure on a dummy substrate, (b) irradiating the resist as varying the acceleration voltage, (c) forming a resist pattern by developing the irradiated resist,... Agent: Michael A. Makuch, Esq. Smith, Gambrell & Russell, LLP

20090053657 - Patterning process and pattern surface coating composition: A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090047584 - Mask blank and mask: [Means for Solving Problems] A mask blank (10) on which a chemically amplified resist film (20) is formed, the mask blank (10) comprising a substrate (12), a light shielding film (13) provided on the substrate (12), and a resist substrate film (18) provided on the light shielding film (13), for... Agent: Sughrue Mion, PLLC

20090047583 - Masks for microlithography and methods of making and using such masks: Masks for microlithography apparatus, methods for making such masks, and methods for exposing photosensitive materials to form arrays of microfeatures on semiconductor wafers using such masks. In one embodiment, a method of making a mask comprises forming a mask layer on a substrate and identifying a first opening in the... Agent: Perkins Coie LLP Patent-sea

20090047585 - Colored curable composition, color filter and manufacturing method thereof: wherein Rc1: a halogen atom, aliphatic group, aryl group, heterocyclic group, cyano group, carboxyl group, carbamoyl group, aliphatic oxycarbonyl group, aryloxycarbonyl group, acyl group, hydroxyl group, aliphatic oxy group, aryloxy group, etc.; Zc1: a non-metal atom group necessary for forming a 6-membered ring together with the carbon atom; M: two... Agent: Sughrue Mion, PLLC

20090047586 - Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program: A pattern forming system 1 is configured to execute a series of processes, which includes a first heat process for performing a heat process on a substrate W after a resist liquid coating process, a light exposure process for performing light exposure on a resist film in accordance with a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090047587 - Electrophotography device: Embodiments of an electrophotography device are disclosed.... Agent: Hewlett Packard Company

20090047588 - Photosensitive member having an overcoat: An imaging member including a substrate; a charge generation layer; a charge transport layer containing a mixture including a polymer and charge transport components, wherein the mixture has a glass transition temperature of less than about 70° C.; and an overcoat having a crosslinked polymer network including a resin, charge... Agent: Patent Documentation Center

20090047589 - Electrophotographic photoreceptor: In the formula A, each of Ra1 and Ra2 independently represents a hydrogen atom or a monovalent substituent which may have a substituent, and each of n and m is independently an integer from 0 to 4. In the formula B, each of R1 and R2 independently represents one selected... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090047590 - Toner for developing electrostatic image:

20090047591 - Nano-sized composites containing polymer modified clays and method for making toner particles using same: A toner comprising toner particles, a polymer binder, at least one colorant and clay composites distributed in the polymer binder, wherein the clay composites comprise a polymer modified clay.... Agent: Oliff & Berridge, PLC.

20090047592 - Toner: An object of the present invention is to provide a toner which: is excellent in fixing ability such as low-temperature fixability, hot offset property, and separability even in a fixing system excellent in quick start property and energy saving property; has high gloss; and is excellent in development stability and... Agent: Fitzpatrick Cella Harper & Scinto

20090047593 - Toner compositions and processes: An emulsion aggregation toner including a core and a shell wherein the core includes an amorphous polyester, a wax, a crystalline polyester and an optional colorant and wherein the shell includes an amorphous polyester and a wax and is substantially free of crystalline polyester.... Agent: Oliff & Berridge, PLC.

20090047594 - Developer: A developer according to the present invention is arranged such that the composition of particulate metal oxide added as an external additive to a toner surface and the composition of particulate metal oxide added to a resin layer covering a carrier surface are identical to each other, so that the... Agent: Edwards Angell Palmer & Dodge LLP

20090047595 - Nano-sized composites containing polymer modified clays and method for making toner particles using same: A method for making toners to include clay composites. The clay composites are incorporated into emulsion of toner and used in making toner via emulsion aggregation. Such toners may have a core and/or a shell and the clay composites may be included with the core, the shell or both.... Agent: Oliff & Berridge, PLC.

20090047596 - Donor element with release-modifier for thermal transfer: A donor element useful in an assemblage for imaging by exposure to light comprises a support layer, a light-to-heat conversion layer disposed adjacent the support layer containing a light absorber, and a transfer layer disposed adjacent the light-to-heat conversion layer opposite the support layer. The donor element also includes a... Agent: Magee, Thomas H. E.i. Du Pont De Nemours And Company

20090047597 - Donor element for radiation-induced thermal transfer: A donor element useful in an assemblage for imaging by exposure to radiation comprises a substrate, a transfer-assist layer disposed adjacent the substrate comprising one or more water-soluble or water-dispersible radiation-absorbing compound(s), and a transfer layer disposed adjacent the transfer-assist layer opposite the substrate.... Agent: Magee H Thomas E I Du Pont De Nemours And Company

20090047598 - Resist composition for electron beam, x-ray, or euv, and pattern-forming method using the same: A positive resist composition for electron beam, X-ray or EUV includes (A) a compound represented by the following formula (I), and (B) a resin capable of decomposing by the action of an acid to increase solubility in an alkali developing solution, which includes a repeating unit represented by the following... Agent: Sughrue-265550

20090047599 - Negative-working imageable elements and methods of use: A negative-working imageable element has an imageable layer that includes an initiator composition including an iodonium cation and a boron-containing anion at a molar ratio of at least 1.2:1, an infrared radiation absorbing compound, a primary polymeric binder, and a spirolactone or spirolactam colorant precursor. The imaged element exhibits improved... Agent: Andrew J. Anderson Patent Legal Staff

20090047602 - Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern: n

20090047601 - Planographic printing plate precursor and printing method using the same: The invention provides a planographic printing plate precursor comprising: a hydrophilic support; and an image recording layer that is provided on the support, the image recording layer comprising: an infrared ray absorbing agent (A); a polymerization initiator (B); a polymerizable monomer (C); and a specific polymer compound (D) having an... Agent: Birch Stewart Kolasch & Birch

20090047600 - Positive resist composition and resist pattern forming method: Disclosed is a positive resist composition which can provide a positive resist composition and a resist pattern forming method, capable of forming a high resolution pattern with reduce LER, the positive resist composition comprising a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility... Agent: Knobbe Martens Olson & Bear LLP

20090047603 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of: (a) providing a lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer, and a coating on the support, the coating including (i) at least one image-recording layer which... Agent: Agfa C/o Keating & Bennett, LLP

20090047604 - Lithographic apparatus and device manufacturing method: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090047605 - Method of manufacturing photosensitive epoxy structure using photolithography process and method of manufacturing inkjet printhead using the method of manufacturing photosensitive epoxy structure: Provided are a method of manufacturing a photosensitive epoxy structure using a photolithograph process, and a method of manufacturing an inkjet printhead using the method of manufacturing a photosensitive epoxy structure. The method of manufacturing the photosensitive epoxy structure includes forming an epoxy material layer formed of photosensitive epoxy; forming... Agent: Stanzione & Kim, LLP

20090047608 - Apparatus and method for transferring features to an edge of a wafer: An edge shot (“ES”) exposure apparatus (14) for transferring edge features (ef) to a substrate edge region (222) of a substrate (18) includes a feature transferer (55), and an ES wafer stage assembly (62). The feature transferer (55) transfers one or more edge features (ef) to the substrate edge region... Agent: Roeder & Broder LLP

20090047607 - Exposure method, exposure apparatus and device fabricating methods: A liquid immersion region (LR) is formed on a measuring member (65) by use of the liquid immersion mechanism (1), and measurement is performed by receiving measurement light through liquid (LQ) which forms the liquid immersion region (LR), in order to determine an exposure condition of a substrate (P). The... Agent: Miles & Stockbridge PC

20090047606 - Lithography meandering order: An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted in the imprintable medium is such that, for the majority of the patterns, two consecutively imprinted patterns are not imprinted... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20090047609 - Metal conservation with stripper solutions containing resorcinol: Resist stripping agents useful for fabricating circuits and/or forming electrodes on semiconductor devices for semiconductor integrated circuits and/or liquid crystals with reduced metal and metal alloy etch rates (particularly copper etch rates and TiW etch rates), are provided with methods for their use. The preferred stripping agents contain low concentrations... Agent: Woodard, Emhardt, Moriarty, Mcnett & Henry LLP

20090042105 - Sensitizer dyes for photoacid generating systems: Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable absorption of light when used in a sufficient concentration, such that the intensity of light decreases significantly with penetration into a recording medium. The present... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20090042111 - Imaging and devices in lithography: Systems and techniques for lithography. In one aspect, a method includes producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation.... Agent: Fish & Richardson, PC

20090042112 - Magnetic recording media: A magnetic recording media has a substrate and a magnetic recording layer containing ferromagnatic patterns on the substrate, the magnetic recording layer including a data zone to constitute a recording track and a servo zone to constitute a preamble region, an address region and a burst region, in which the... Agent: Nixon & Vanderhye, PC

20090042109 - Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate: An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of... Agent: Sughrue Mion, PLLC

20090042108 - Pattern forming method and mask: Hole patterns are repeatedly arranged on a mask at a constant pitch in each of predetermined directions. In the predetermined directions, a first direction with the smallest pitch and a second direction with the second smaller pitch are specified. A Levenson phase shifter is formed corresponding to the hole patterns... Agent: Young & Thompson

20090042107 - Pellicle for high numerical aperture exposure device: A pellicle that is used in a semiconductor lithography process and that can be used in an exposure device with an optical system having a numerical aperture of 1.0 or above, is provided. The pellicle of the present invention uses a pellicle film that has had its film thickness adjusted... Agent: Buchanan, Ingersoll & Rooney PC

20090042106 - Photomask, and method and apparatus for producing the same: A shading area having a transmissivity in the range of 0 to 2% is formed at the center of a clear defect in a wiring pattern of a half tone mask. Semitransparent areas having a transmissivity in the range of 10 to 25% are formed, adjacently to shading area, in... Agent: Mcdermott Will & Emery LLP

20090042110 - Reflection type photomask blank, manufacturing method thereof, reflection type photomask, and manufacturing method of semiconductor device: A reflection type photomask blank includes: a substrate; a multilayer reflection film formed on the substrate for reflecting exposure light; a protection film formed on the multilayer reflection film for protecting the multilayer reflection film; an absorber layer for absorbing the exposure light on the protection film; and a shock... Agent: Staas & Halsey LLP

20090042114 - Halogenated oxime derivatives and the use therof as latent acids: wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene,... Agent: Joann Villamizar Ciba Corporation/patent Department

20090042113 - Manufacturing method of filter and color filter: A manufacturing method of a filter is provided. The manufacturing method includes steps as follows. First, a substrate is provided and a black matrix is formed on the substrate. The black matrix has a number of openings arranged in array. Next, a filter material is individually formed in the openings... Agent: Jianq Chyun Intellectual Property Office

20090042115 - Exposure apparatus, exposure method, and electronic device manufacturing method: An exposure apparatus for exposing a bright-dark pattern on a substrate via a projection optical system includes a position detection system which detects a plurality of predetermined positions in a unit exposure field of the substrate. A plurality of reference detection positions fall within a range substantially equal to the... Agent: Staas & Halsey LLP

20090042116 - Method for producing alpha-form titanylphthalocyanine and electrophotographic photoreceptor comprising alpha-form titanylphthalocyanine: The present invention consists in a provision of a method for conveniently producing the α-form titanylphthalocyanine having a peak at a Bragg angle (2θ±0.2°) in X-ray diffraction spectrum with CuK α-ray: 7.5°, 10.2°, 12.6°, 13.2°, 15.1°, 16.3°, 17.3°, 18.3°, 22.5°, 24.2°, 25.3° and 28.6°, wherein a crude titanylphthalocyanine having an... Agent: Birch Stewart Kolasch & Birch

20090042117 - Conductive member, and process cartridge and image forming apparatus including the conductive member: A conductive member for use in an image forming apparatus, a process cartridge including the conductive member as a charging member, an image forming apparatus including the process cartridge, a charging member, and a process cartridge and an image forming apparatus including the charging member. The conductive member includes a... Agent: Cooper & Dunham, LLP

20090042119 - Method of manufacturing toner particles, toner particles, two-component developer, developing device and image forming apparatus: A method of manufacturing toner particles capable of decreasing the manufacturing costs by simplifying the manufacturing apparatus and by decreasing the number of the steps, as well as to provide toner particles, a two-component developer, a developing apparatus and an image forming apparatus are provided. A high-pressure homogenizer is constituted... Agent: Nixon & Vanderhye, PC

20090042118 - Toner for electrophotography and method of preparing the toner: A method of preparing a toner, including dripping a toner constituent liquid comprising an organic solvent; and toner constituents comprising a resin and a colorant, which are dissolved or dispersed in the organic solvent through a nozzle to form a droplet; and removing the organic solvent from the droplet, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090042120 - Oxidized mixed cyclic phenol sulfides, and charge control agents and toners using the same: wherein R is a straight or branched alkyl group having 1 to 6 carbon atoms, m is an integer from 4 to 9, and n is 1 or 2; or an oxidized cyclic phenol sulfide of formula (1) wherein m is 8. The present invention also discloses a charge control... Agent: Hoffmann & Baron, LLP

20090042121 - Toner, two-component developer, developing device and image forming apparatus: A toner capable of ensuring cleanness and the amount of specific charge for extended periods of time and having excellent charge stability and fixing property, a two-component developer, a developing device and an image forming apparatus are provided. A toner includes toner particles containing at least a binding resin and... Agent: Nixon & Vanderhye, PC

20090042122 - Methods of producing toner compositions and toner compositions produced therefrom: Toner compositions, methods for making toner compositions, and methods for coating toner particles. A method for coating toner particles may include mixing dry toner particles and a dispersion including shell particles to coat at least a portion of an exterior surface of the toner particles with an essentially continuous layer... Agent: Crompton, Seager & Tufte, LLC

20090042123 - Calixresorcinarene compound, photoresist base comprising the same, and composition thereof: n

20090042124 - Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound: wherein each of R1 to R13 independently represents a hydrogen atom or a substituent, provided that at least one of R1 to R13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X− represents an anion containing a proton acceptor... Agent: Sughrue-265550

20090042125 - Photothermographic material: A photothermographic material comprising on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and on the other side of the support a back coating layer, wherein a dry thickness of the light-sensitive layer is 9 to... Agent: Lucas & Mercanti, LLP

20090042126 - Photosensitive resin composition and cured article thereof: p

20090042127 - Photoresist composition and method of forming a photoresist pattern using the same: A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about... Agent: Cantor Colburn, LLP

20090042128 - Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same: p

20090042129 - Positive resist composition and method for resist pattern formation: A positive resist composition includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the resin component (A) is a mixture of a copolymer (A1) that includes a structural unit (a1) derived from... Agent: Knobbe Martens Olson & Bear LLP

20090042130 - Positive resist composition for immersion exposure and method of forming resist pattern: A positive resist composition for immersion exposure including a resin component (A) which has an acid dissociable dissolution inhibiting group and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a1) derived from... Agent: Knobbe Martens Olson & Bear LLP

20090042131 - Positive resist composition, method of forming resist pattern, polymeric compound, and compound: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent;... Agent: Knobbe Martens Olson & Bear LLP

20090042132 - Resist composition for immersion lithography and method for forming resist pattern: A resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits changed alkali solubility under the action of acid; and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) includes a resin (A1) containing a fluorine atom and... Agent: Knobbe Martens Olson & Bear LLP

20090042133 - Antireflective coating composition: An antireflective coating composition which forms films with high n values is described.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20090042134 - Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material: A photosensitive composition containing: (A) a polymerizable compound containing an ethylenic double bond in the molecule; (B) a photopolymerization initiator; (C) a polymer binder; and (D) a dye exhibiting a maximum absorption wavelength of 350-450 nm, wherein the dye is represented by Formula (1):... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090042135 - Multi-layer imageable element with improved properties: wherein A represents recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl (alkyl)acrylates, B represents recurring units derived from one or more ethylenically unsaturated polymerizable monomers having a pendant cyano group, C represents recurring units derived from one or more ethylenically unsaturated polymerizable monomers having one or more... Agent: Eastman Kodak Company Patent Legal Staff

20090042136 - Carbon nanotube-silicon composite structures and methods for making same: The present invention is directed toward methods of attaching or grafting carbon nanotubes (CNTs) to silicon or other surfaces, wherein such attaching or grafting occurs via functional groups on either or both of the CNTs and silicon surface. The present invention is also directed to the novel compositions produced by... Agent: Winstead PC

20090042137 - Method for translating a structured beam of energetic particles across a substrate in template mask lithography: The present inventors have developed an accurate method for forming a plurality of images on a substrate. The present method provides an improved pattern replication technique that provides submicron resolution, for example 20 nm or less, especially 10 nm or less. The method may involve moving a structured beam of... Agent: Winstead PC

20090042138 - Method of pre-exposing relief image printing plate: The present invention is directed to a method of selectively pre-exposing a photosensitive printing element prior to imagewise exposure in order to remove oxygen from the photosensitive layer prior to imagewise exposure. The invention is usable in a computer-to-plate process to produce flexographic relief image printing elements.... Agent: John L. Cordani Carmody & Torrance LLP

20090042140 - Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.... Agent: Marshall, Gerstein & Borun LLP

20090042141 - Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.... Agent: Marshall, Gerstein & Borun LLP

20090042139 - Exposure method and electronic device manufacturing method: An exposure method enabling deformation occurring in a unit exposure field to be measured rapidly and accurately and enabling a plurality of patterns to be superimposed on a substrate with high accuracy. The exposure method of the present embodiment for exposing a bright-dark pattern on the substrate using a projection... Agent: Staas & Halsey LLP

20090042142 - Organic triodes with novel grid structures and method of production: An organic semiconductor device is provided. The device has a first electrode and a second electrode, with an organic semiconductor layer disposed between the first and second electrodes. An electrically conductive grid is disposed within the organic semiconductor layer, which has openings in which the organic semiconductor layer is present.... Agent: Kenyon & Kenyon LLP

20090042143 - Thin-film magnetic head structure, method of manufacturing the same, and thin-film magnetic head: A method of manufacturing a thin-film magnetic head structure comprises the steps of preparing an insulating layer 10; forming a first resist layer 51 provided with a first slit pattern 51a corresponding to a very narrow groove part and a second slit pattern 51b corresponding to a temporary groove part... Agent: Oliff & Berridge, PLC

20090042144 - Printed wiring board, method for forming the printed wiring board, and board interconnection structure: A board interconnection structure having a first printed wiring board in which a first conductive circuit is arranged on a first insulating layer, the first conductive circuit having, on an end portion thereof, a first connection terminal in which an upper surface width is narrower than a bottom surface width;... Agent: Sughrue Mion, PLLC

20090042145 - Method for detecting light intensity distribution for gradient filter and method for improving line width consistency: A method for detecting light intensity distribution for a gradient filter, including: providing a mask plate which has patterns with identical line widths; providing a semiconductor substrate with a photosensitive material layer, and transferring the patterns of the mask plate to the photosensitive material layer, to form patterns of the... Agent: Squire, Sanders & Dempsey L.L.P.

20090042146 - Method of forming fine patterns using a block copolymer: A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component,... Agent: Lee & Morse, P.C.

20090042147 - Method of forming patterns: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less... Agent: Sughrue-265550

20090042148 - Photoresist composition for deep uv and process thereof: The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv) a polymer B, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and;... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20090042149 - Rinsing method and developing method: A rinsing process is performed by supplying a rinsing-liquid onto a substrate with a light-exposed pattern formed thereon and treated by a developing process. The rinsing liquid contains a polyethylene glycol family surfactant or an acetylene glycol family surfactant in a critical micelle concentration or less. Preferably, the surfactant includes... Agent: Smith, Gambrell & Russell

20090042150 - Transparent electrically conductive film and process for producing the same: This invention provides a transparent electrically conductive film, which, while maintaining the light transparency of a transparent film, has excellent electrical conductivity, can be utilized for electromagnetic wave shielding, and does not cause inclusion of air bubbles in the lamination onto other base material, and a process for producing the... Agent: Dilworth & Barrese, LLP

20090035666 - Container for housing a mask blank, method of housing a mask blank, and mask blank package: A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like... Agent: Sughrue Mion, PLLC

20090035667 - Method for correcting mask: The present method is consisted of: producing a test mask which acts as a mask for extracting process model for applying an optical proximity effect correction method (s1); transferring and measuring the dimensions of the transferred pattern using the test mask (s2 and s3); obtaining a function model (referred to... Agent: Robert J. Depke Lewis T. Steadman

20090035665 - Process of semiconductor fabrication with mask overlay on pitch multiplied features and associated structures: Spacers are formed by pitch multiplication and a layer of negative photoresist is deposited on and over the spacers to form additional mask features. The deposited negative photoresist layer is patterned, thereby removing photoresist from between the spacers in some areas. During patterning, it is not necessary to direct light... Agent: Knobbe Martens Olson & Bear LLP

20090035668 - Method and materials for patterning a neutral surface: A self assembly step for the manufacture of an electronic component comprising, e.g., a semiconductor chip or semiconductor array or wafer comprises forming a diblock copolymer film placed on a random copolymer film substrate operatively associated with the electronic component and the diblock copolymer film wherein the surface energy of... Agent: Robert J. Eichelburg The Law Offices Of Robertj. Eichelburg

20090035669 - Work position information obtaining method and apparatus: A work position information obtaining apparatus capable of obtaining a position of a work with respect to a table with high accuracy. Moving a table with a work placed thereon relative to an imaging section. Obtaining work position information representing a position of the work with respect to the table... Agent: Sughrue Mion, PLLC

20090035671 - Adjustment method, exposure method, device manufacturing method, and exposure apparatus: An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20090035670 - Hard imaging methods, liquid marking agent monitoring methods, and hard imaging devices: Hard Imaging Methods, Liquid Marking Agent Monitoring Methods, and Hard Imaging Devices are described. According to one embodiment, a hard imaging method includes forming a plurality of latent images using a hard imaging device, using the hard imaging device, developing the latent images using a liquid marking agent, wherein bubbles... Agent: Hewlett Packard Company

20090035672 - Electrophotographic photoconductor, production method thereof, image forming method and image forming apparatus using photoconductor, and process cartridge: To provide an electrophotographic photoconductor that comprises a support and a cross-linked layer formed over the support, wherein the cross-linked layer comprises at least light curable of radically polymerizable compound, the difference of maximum value of the post-exposure electrical potential and minimum value of the post-exposure electrical potential when writing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090035675 - Copper containing hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate; an undercoat layer thereover wherein the undercoat layer contains a metal oxide, and a copper containing compound; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20090035676 - Iodonium hole blocking layer photoconductors: A photoconductor that includes, for example, a substrate; an undercoat layer thereover wherein the undercoat layer contains a metal oxide and an iodonium containing compound; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20090035673 - Iron containing hole blocking layer containing photoconductors: A photoconductor that includes a substrate; an undercoat layer thereover wherein the undercoat layer contains, for example, a metal oxide, and an iron containing compound; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20090035674 - Uv absorbing hole blocking layer containing photoconductors: A photoconductor that includes a substrate; an undercoat layer thereover comprised of a metal oxide, and an ultraviolet light absorber component; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20090035677 - Condensation polymer photoconductive elements: The present invention relates to photoconductive elements having an electrically conductive support, an electrical barrier layer and, disposed over the conductive layer, a charge generation layer capable of generating positive charge carriers when exposed to actinic radiation. The electrical barrier layer, which restrains injection of positive charge carriers from the... Agent: Andrew J. Anderson Patent Legal Staff

20090035678 - Mixed cyclic phenol sulfides, and charge control agents and toners using the same: wherein R is a straight or branched alkyl group having 1 to 6 carbon atoms, and m is an integer from 4 to 9; or a cyclic phenol sulfide of formula (1) wherein m is 8. The present invention also discloses a charge control agent which comprises the above sulfide(s)... Agent: Hoffmann & Baron, LLP

20090035679 - Magnetic toner: A magnetic toner is disclosed having magnetic toner particles containing a binder resin and a magnetic iron oxide. The magnetic toner has a specific saturation magnetization and a specific residual magnetization in ascertain magnetic field. The binder resin includes a polyester component polymerized with an aromatic carboxylic acid titanium compound... Agent: Fitzpatrick Cella Harper & Scinto

20090035680 - Positive charge controlling agent, process for producing the same, and electrophotographic toner containing the same: Provided are a positive charge controlling agent which is excellent in compatibility with and dispersibility in a binder resin, prevented from discoloring, excellent in chargeability, and reduced in the content of organic compounds having low boiling points, thereby giving no strong odor; a process for producing the same; and an... Agent: Wood, Herron & Evans, LLP

20090035682 - Toner and process for producing the same: A toner of the present invention includes a first wax and a second wax. The endothermic peak temperature of the first wax by the DSC method is 50° C. to 90° C. The endothermic peak temperature of the second wax is 5° C. to 50° C. higher than that of... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090035681 - Toner, process for producing toner, and two-component developing agent: A toner or two-component developer is obtained by mixing, aggregating, and heating resin particles, colorant particles, and wax particles in an aqueous medium. A gel permeation chromatography (GPC) measurement of the resin particles shows that a weight-average molecular weight is 10000 to 60000, and the ratio of the weight-average molecular... Agent: Hamre, Schumann, Mueller & Larson P.C.

20090035683 - Toner, two-component developer and image formation device: A toner comprising a small-particle diameter external additive having a number average particle diameter of 7 to 20 nm, a large-particle diameter external additive having a number average particle diameter of 40 to 80 nm and a toner particle having a volume average particle diameter of 4 to 7 μm,... Agent: Nixon & Vanderhye, PC

20090035684 - Image forming apparatus and image forming method: An image forming method is disclosed, which includes steps of cleaning toner remaining on a photoreceptor surface by a cleaning blade which is arranged on counter direction to rotation direction of the photoreceptor, supplying a fatty acid metal salt onto the photoreceptor surface after the cleaning, spreading the supplied fatty... Agent: Lucas & Mercanti, LLP

20090035685 - Color toner: The color toner has capsule type toner particles each having a surface layer (B) mainly formed of a resin (b) on the surface of a toner base particle (A) containing at least a binder resin (a), a colorant, and a wax, in which (1) a temperature Tp at which a... Agent: Fitzpatrick Cella Harper & Scinto

20090035687 - Colored particles and manufacturing method thereof: e

20090035686 - Core-shell polymer nanoparticles and method of making emulsion aggregation particles using same: Nano-sized particles for use in making emulsion aggregation toner particles have a core portion and a shell portion, wherein the core portion of the nano-sized particles includes crystalline resin and the shell portion includes amorphous resin and is substantially to completely free of the crystalline resin.... Agent: Oliff & Berridge, PLC.

20090035688 - Toner, and toner production process: In a chart of molecular weight distribution measured of a toner, i) the toner has a main peak in the region of molecular weight of 16,000 to 60,000, and ii) where the molecular weight at the main peak is represented by M1, and where the height at the molecular weight... Agent: Fitzpatrick Cella Harper & Scinto

20090035689 - Treatment for enhancing crack resistance of organic photoconductors: A method of treating a photoconductor for enhancing crack resistance when it comes into contact with a liquid toner comprises bending a photoconductor sheet having a length and a width to a tube having an outer diameter and a length corresponding to the width of the photoconductor sheet with the... Agent: Hewlett Packard Company

20090035690 - Printing system, process, and product with microprinting: The invention relates to printing of documents, for example bank checks. According to the various aspects of the invention, a printing system, process and product with microprinting are provided. Documents printed as described may include digitally variable microprint and other enhancements. The invention is particularly useful for enhanced security documents... Agent: David A. Novais Patent Legal Staff

20090035693 - Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device: According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at least two sulfonate ester groups; a production method for a cured relief pattern using the photosensitive resin composition; and a semiconductor device... Agent: Sughrue-265550

20090035692 - Positive resist composition and pattern forming mehtod: A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid; (C) a compound capable of decomposing under an action of an acid to... Agent: Sughrue-265550

20090035691 - Positive resist composition, method for forming resist pattern and compound: A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which... Agent: Knobbe Martens Olson & Bear LLP

20090035694 - Polymeric dyes, overcoat compositions and thermal lithographic printing plates: A thermal lithographic printing plate overcoat composition comprising (a) a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm; and (b) micro-particles or nano-particles is provided. A negative-working thermal lithographic printing plate comprising (a) a hydrophilic substrate; (b) a near infrared imaging layer disposed on... Agent: Goudreau Gage Dubuc

20090035695 - Positive working lithographic printing plates: t

20090035696 - Photoresist composition: Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R1 and R2 may be the same as... Agent: Fitzpatrick Cella Harper & Scinto

20090035699 - Fluorinated monomer, fluorinated polymer, resist composition and patterning process: Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R1 is H or monovalent C1-C20 hydrocarbon group, R2 is H, F, methyl or trifluoromethyl, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, or R3 and R4 may form an... Agent: Birch Stewart Kolasch & Birch

20090035697 - Negative resist composition and method of forming resist pattern: (where R51 represents a straight chain, branched chain or cyclic alkyl group or a fluorinated alkyl group; R52 represents a hydrogen atom, hydroxyl group, halogen atom, straight chain, branched chain or cyclic alkyl group, straight chain or branched chain halogenated alkyl group, or straight chain or branched chain alkoxy group;... Agent: Knobbe Martens Olson & Bear LLP

20090035698 - Positive resist composition and resist pattern forming method: h

20090035700 - Tertiary alcohol derivative, polymer compound and photoresist composition: (In the formula, wherein R1 represents a linear alkyl group having from 1 to 6 carbon atoms, a branched alkyl group having from 3 to 6 carbon atoms or a cyclic alkyl group having from 3 to 6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090035701 - Photoresist and pattern-forming process using the same: A photolithography process using a photoresist is as following. A substrate is provided for coating a photoresist thereon to form a photoresist layer and the photoresist is formed by mixing photocatalyst particles and polymer binder in a solvent. The photoresist layer is well-adhesive and has good mechanical strength. A light... Agent: Rosenberg, Klein & Lee

20090035702 - Process for producing compound having acid-labile group: p

20090035703 - Regeneratable, structured plate comprising oxidation catalysts: A regeneratable plate having a structured surface comprising hydrophilic and hydrophobic regions. The plate comprises a substrate, a first layer comprising a hydrophilic oxidation catalyst arranged on the substrate, and a second layer which is hydrophobic and is imagewise arranged on the first layer to thereby afford the structured surface... Agent: Greenblum & Bernstein, P.L.C

20090035704 - Underlayer coating composition based on a crosslinkable polymer: r

20090035705 - Method of forming pattern, method of manufacturing semiconductor device, and cleaning apparatus: A method of forming a pattern includes forming a resist layer on a substrate, cleaning a surface of the substrate under a control that a shear stress acting on an interface between a cleaning liquid and the substrate during the cleaning becomes larger than a shear stress acting on an... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090035706 - Method for fabricating micromachine component of resin: A method for fabricating a micromachine component of resin comprising step (a) of forming a sacrifice layer on a substrate, step (b) of forming at least two photosensitive resin composition layers sequentially on the sacrifice layer, and performing photolithography of each photosensitive resin composition layer to form an air gap... Agent: Nields & Lemack

20090035707 - Rheology-controlled conductive materials, methods of production and uses thereof: Compositions comprising at least one conductive nanomaterial and at least one rheology control additive are disclosed. These compositions can be used to form a film for uses requiring sufficient conductivity and light transparency. Methods of forming a conductive composition include: providing at least one conductive nanomaterial, providing at least one... Agent: Buchalter Nemer

20090035708 - Layer patterning using double exposure processes in a single photoresist layer: A structure and a method for forming the same. The method includes providing a structure which includes (a) a to-be-patterned layer, (b) a photoresist layer on top of the to-be-patterned layer wherein the photoresist layer includes a first opening, and (c) a cap region on side walls of the first... Agent: Schmeiser, Olsen & Watts