|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof January recently filed with US Patent Office 01/09Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 01/29/2009 > patent applications in patent subcategories. recently filed with US Patent Office
20090029271 - Container for housing a mask blank, method of housing a mask blank, and mask blank package: A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like... Agent: Sughrue Mion, Pllc
20090029269 - Lithographic pellicle: The present invention is directed to provide a pellicle that can control the deformation of the photomask to a minimum without particular consideration of the flatness of a pellicle frame even in the case where a pellicle is affixed to a photomask for lithography. In the pellicle of the present... Agent: Lowe Hauptman Ham & Berner, LLP
20090029266 - Multi-layer alternating phase shift mask structure: A multi-layer alternating phase shift mask and associated techniques are generally described. In one example, a photomask includes a glass substrate, a compensating layer of material coupled with the glass substrate, the material having optical properties to compensate for thick mask effects, an absorber layer coupled with the compensating layer,... Agent: Cool Patent, P.c. C/o Intellevate
20090029268 - Pellicle stress relief: The present disclosure provides a mask-pellicle system for lithography patterning. The mask-pellicle system includes a mask substrate; a predefined pattern formed on the transparent pattern; a pellicle configured approximate the transparent substrate; a pellicle frame designed to secure the pellicle; and a stress-absorbing feature configured between the pellicle frame and... Agent: Haynes And Boone, LLP Ip Section
20090029267 - Photomask layout pattern: A photomask layout pattern including an H-shaped pattern having a first opaque line pattern in parallel with a second opaque line pattern and a central zone connecting the first and second line patterns. A zebra-crossing-like dense line and space pattern is disposed in the central zone. The pitch of the... Agent: North America Intellectual Property Corporation
20090029270 - Projection exposure device and method of separate exposure: A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20 are larger than the board marks 30 so as to shield the board marks 30 from the exposing light,... Agent: Weingarten, Schurgin, Gagnebin & Lebovici LLP
20090029272 - Merging sub-resolution assist features of a photolithographic mask: Merging sub-resolution assist features includes receiving a mask pattern that includes the sub-resolution assist features. A first sub-resolution assist feature is selected to merge with a second sub-resolution assist feature. A merge bar width of a merge bar is established. A distance between the first sub-resolution assist feature and the... Agent: Texas Instruments Incorporated
20090029273 - Ink formulations and methods of making ink formulations: Briefly described, embodiments of this disclosure include ink composition for use in electrostatic imaging, method of making an ink formulation for use in electrostatic imaging, and the like.... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP
20090029274 - Method for removing contamination with fluorinated compositions: A method of removing contamination from a substrate having an ion-implanted region is described. The method comprises applying a composition comprising a fluorinated solvent and a co-solvent to the substrate in an amount sufficient to assist in the removal of contamination from the substrate. As contaminant is removed, metal patterns... Agent: 3m Innovative Properties Company
20090029276 - Photoreceptor: An electrophotographic imaging member includes a substrate, a photo generating layer, and an optional overcoating layer, wherein the photo generating layer includes a cyclic triphenylamine derivative material.... Agent: Oliff & Berridge, Plc.
20090029275 - Photoconductor formulation containing boron nitride: The present disclosure relates to incorporation of boron nitride in the charge transport layer of a photoconductor. The boron nitride may have an aspect ratio of greater than 1.0, a D50 mean particle size of less than about 10.0 μm and be present at about 5.0% (wt) or less in... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090029277 - Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus: An electrophotographic photosensitive member is provided which has a photosensitive layer formed on a support. The electrophotographic photosensitive member has a surface layer containing a silicon-containing compound or a fluorine-containing compound. The surface layer has a plurality of depressed portions which are independent from one another, on the surface. When... Agent: Fitzpatrick Cella Harper & Scinto
20090029278 - Uv curable toner with improved scratch resistance:
20090029279 - Toner, two-component developer, and image forming apparatus using the toner and the two-component developer: A toner is provided which is capable of preventing a decrease in a toner charge amount and thus preventing fog and a decrease in image density even in a case where images of low coverage are continuously printed or where a printing operation restarts immediately after long suspension of operation... Agent: Nixon & Vanderhye, Pc
20090029280 - Toner, method of manufacturing the same, two-component developer, developing device, and image forming apparatus: A toner includes toner particles containing at least binder resin and colorant. The toner particles contain a large-sized toner particle group of particles and a small-sized toner particle group of particles having a volume average particle size smaller than that of the large-sized toner particle group. In the toner, a... Agent: Nixon & Vanderhye, Pc
20090029281 - Two-component developer and image forming device: To provide a two-component developer and an image forming device which are excellent in stability of image density in formed images even when image formation is continued for a long time, by controlling non-electrostatic adhesion force between toner particle and a carrier or developing roll and maintaining the charge property... Agent: Casella & Hespos
20090029282 - Polyester resin toner produced by emulsion aggregation: The present disclosure relates to chemically processed toner. The toner may be prepared by an emulsion aggregation method by forming a polyester dispersion wherein the polyester has an acid value of about 5 to about 50 and a particle size of about 50 to about 500 nanometers. The polyester dispersion... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090029283 - Manufacturing method of aluminum support for planographic printing plate material, aluminum support for planographic printing plate material, and planographic printing plate material: Disclosed is a manufacturing method of an aluminum support for a planographic printing plate material, which comprises electrolytically surface-roughening an aluminum plate in an electrolytic solution containing mainly hydrochloric acid at current density of from 35 to 150 A/dm2 and at a quantity of electricity of from 600 to 1500... Agent: Lucas & Mercanti, LLP
20090029286 - Method for fabricating photoresist pattern: Disclosed is a method for fabricating a photoresist pattern. The method includes coating photoresist on an etch target layer, forming an initial photoresist pattern through an exposure process using a mask, and growing the initial photoresist pattern to form a final photoresist pattern by using an application of a photoresist... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association
20090029285 - Method for producing photosensitive laminate original printing plate for letterpress printing, photosensitive laminate original printing plate for letterpress printing, and method for producing letterpress printing plate: A mask pattern of high outline precision is formed on a photosensitive resin layer by a step of printing a predetermined pattern of a printing ink composition containing a light-blocking substance for absorbing light in a predetermined wavelength region and curable when receiving a predetermined energy on the photosensitive resin... Agent: Hoffmann & Baron, LLP
20090029284 - Pattern coating material and pattern forming method: m
20090029287 - Photosensitive resin composition: The present invention provides a photosensitive resin composition and a resin film obtained from the photosensitive resin particularly useful for a buffer coating material for LSI chips. For this purpose, there are used a photosensitive resin composition, comprising: 100 parts by weight of a polycondensate obtained by condensation-polymerizing compounds represented... Agent: Greenblum & Bernstein, P.L.C
20090029288 - Method for producing resist composition and resist composition: A method for producing a resist composition including a resin component (A) that exhibits changed alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure, the method including the steps of: obtaining the component (A) by mixing a plurality of copolymers, which... Agent: Knobbe Martens Olson & Bear LLP
20090029289 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board: wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one... Agent: Antonelli, Terry, Stout & Kraus, LLP
20090029290 - Tertiary alcohol derivative, polymer compound and photoresist composition: (In the formula, R1 and R2 are taken together to form a ring together with a carbon atom to which R1 and R2 are bonded, and R1 and R2 as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.
20090029291 - Positive resist composition for thin-film implantation process and method for forming resist pattern: A positive resist composition for a thin-film implantation process of the present invention includes: a resin component (A) with an acid-dissociable dissolution inhibiting group, whose alkali solubility increases by the action of an acid; an acid generator component (B) which generates an acid by irradiation with radiation; and a compound... Agent: Knobbe Martens Olson & Bear LLP
20090029292 - Engraving with amplifier having multiple exit ports: An apparatus for direct engraving comprises: a plurality of laser diode emitting at different wavelengths; a multiplexer (11) for collecting the plurality of laser sources into a single laser beam; a rare earth doped fiber amplifier (12) to amplify the single laser beam to form an amplified single laser beam;... Agent: David A. Novais Patent Legal Staff
20090029293 - Manufacturing method of silicon carbide semiconductor apparatus: A manufacturing method of a silicon carbide semiconductor apparatus is provided. The method includes forming a first resist pattern on a surface of a silicon carbide layer formed on a silicon carbide substrate, implanting a first conduction type impurity ion in the silicon carbide layer on which the first resist... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.
20090029294 - Method for manufacturing semiconductor device: Disclosed is a method for manufacturing a semiconductor device. The method comprises: forming a resist layer over a substrate; exposing the resist layer to light thereby to form a first exposed pattern and a second exposed pattern on the resist layer, the second exposed pattern being used for forming one... Agent: Young & Thompson
20090029295 - Micromachined imaging transducer: The present invention generally relates to medical devices, and more particularly to an improved medical imaging device. In one embodiment, an imaging device includes a drive shaft having proximal and distal ends received within the lumen; and an imaging transducer assembly coupled to the distal end of the drive shaft... Agent: Boston Scientific Corporation Darby & Darby P.c.
20090029296 - Image recording method and device: A light quantity of a laser beam (L) outputted from exposure heads (24a-24j) is detected by a photosensor (68). At a light quantity locality data calculating section (88), light quantity locality correcting data for correcting the locality of the detected light quantity is calculated by divided area of a DMD... Agent: Sughrue Mion, Pllc
20090029297 - Method of forming fine patterns: It is disclosed a method of forming fine patterns comprising: covering a substrate having photoresist patterns with an over-coating agent for forming fine patterns, applying heat treatment to cause thermal shrinkage of the over-coating agent so that the spacing between adjacent photoresist patterns is lessened by the resulting thermal shrinking... Agent: Wenderoth, Lind & Ponack, L.l.p.
20090029298 - Method of manufacturing patterned magnetic recording medium: Provided is a method of manufacturing a patterned magnetic recording medium. The method includes (a) forming a patterned recording layer on an underlayer of a first substrate; (b) coating a polymer layer on a surface of a second substrate; (c) transferring the polymer layer on the patterned recording layer; and... Agent: Sughrue Mion, Pllc01/22/2009 > patent applications in patent subcategories. recently filed with US Patent Office
20090023078 - Lithography masks and methods of manufacture thereof: Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom attenuated phase shift material layers, intermediate opaque material layers, and finally top resist layers. The method further includes patterning the stack... Agent: Slater & Matsil LLP
20090023080 - Mask and manufacturing method thereof: A mask according to embodiments includes a substrate and a phase delay material layer formed over the substrate. At least one mask pattern including a hole pattern may be formed on the phase delay material layer, the hole pattern allowing light to pass through the mask pattern. Assist patterns compensate... Agent: Sherr & Vaughn, Pllc
20090023083 - Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in du: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.... Agent: Thomas A. Beck Esq.
20090023082 - Pellicle frame: The present invention is directed to provide a pellicle frame that causes little harm to the flatness of a photomask, even in the case where a pellicle is affixed after completion of the photomask.... Agent: Lowe Hauptman Ham & Berner, LLP
20090023081 - Phase shift mask: A phase shift mask includes a substrate including first and second transmissive regions alternately disposed, and absorbers disposed on a surface of the substrate such that each absorber is sandwiched between the first and second transmissive regions. A phase shifter is defined by a difference between a surface height of... Agent: Canon U.s.a. Inc. Intellectual Property Division
20090023079 - Photomask and method of forming overlay vernier of semiconductor device using the same: This patent relates to a photomask and a method of forming an overlay vernier of a semiconductor device employing the same. The photomask includes a reticle formed of a first material through which light can transmit, a first pattern formed on the reticle and formed of a material through which... Agent: Marshall, Gerstein & Borun LLP
20090023085 - Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors: A photosensitive composition includes a compound represented by Formula (I) and a curable composition contains the compound of Formula (I) and a polymerizable compound. A compound is represented by a Formula (1) and a photocurable composition contains the compound of Formula (1) and a polymerizable compound. In Formula (I), R,... Agent: Buchanan, Ingersoll & Rooney Pc
20090023084 - Photosensitive resin composition and color filter: wherein R0 represents a hydrogen atom or a methyl group; R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 5 carbon atoms; and a represents an integer of 1 to 5, and b represents 0 or... Agent: Knobbe Martens Olson & Bear LLP
20090023087 - Hybrid toner and method of preparing the same: A hybrid toner includes micro cylinders, cores inserted into the micro cylinders, and an external addition layer covering the micro cylinders to which the cores are inserted. The hybrid toner prevents a toner blocking phenomenon, image contamination, and low storage stability which occur due to dispersion of wax and colorants... Agent: Stanzione & Kim, LLP
20090023086 - Recording medium for electrophotographic printer: A recording medium for an electrophotographic printer is provided. The recording medium includes a substrate and a toner receiving layer formed on at least one surface of the substrate. The toner receiving layer includes a white pigment, an acryl based emulsion latex and polyvinyl alcohol, and an average viscosity of... Agent: Stanzione & Kim, LLP
20090023088 - Liquid developer and image forming apparatus: A liquid developer includes an insulation liquid containing a fatty acid monoester and toner particles comprised of a resin material, the resin material containing a first resin component and a second resin component of which weight-average molecular weight Mw2 is larger than a weight-average molecular weight Mw1 of the first... Agent: Hogan & Hartson L.l.p.
20090023089 - Liquid developer and image forming apparatus: A liquid developer includes an insulation liquid containing a fatty acid monoester and toner particles comprised of a resin material. The resin material is characterized in that a weight-average molecular weight Mw of the resin material is in the range of 20,000 to 200,000, and an amount of a component... Agent: Hogan & Hartson L.l.p.
20090023090 - Support for image recording material, method of producing the same, and image recording material and image recording method using the same: In order to attain the object, a support for image recording material is provided that comprises a raw paper, and at least one polyolefin resin layer on both sides of the raw paper, wherein two or more polyolefin resin layers are disposed at the front side where an image recording... Agent: Sughrue Mion, Pllc
20090023091 - Method for preparing electrophotographic photosensitive member: A method for preparing in high productivity and stably an electrophotographic photosensitive member having depressed portions on its surface, is provided. The method is characterized in that a coating liquid for a surface layer which includes a solvent including a hydrophilic solvent and a hydrophobic solvent and a polymer compound... Agent: Fitzpatrick Cella Harper & Scinto
20090023092 - Toner for developing electrostatic image, method for producing the same, developer, image forming apparatus, process cartridge, and image forming method: A toner is disclosed, for developing electrostatic images by means of image forming apparatuses, that comprises toner particles, and an external additive, wherein the toner particles comprise a binder resin and a colorant, the external additive is introduced onto the surface of the toner particles, the external additive liberates from... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.
20090023095 - Novel compound, manufacturing method thereof, acid generator, resist composition and method of forming a resist pattern: (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a... Agent: Knobbe Martens Olson & Bear LLP
20090023094 - Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate: A photosensitive laminated original printing plate for letterpress printing that does not contaminate developers, being capable of suppressing a cost increase due to developer replacement and is of high quality; and a process for producing a letterpress printing plate using the photosensitive laminated original printing plate for letterpress printing. There... Agent: Hoffmann & Baron, LLP
20090023096 - Positive resist composition and pattern forming method: A positive resist composition, includes: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under an action of an acid, the resin containing 80 mol % or more of an aromatic group-free copolymerization... Agent: Sughrue-265550
20090023097 - Positive resist composition and method of forming resist pattern: p
20090023098 - Method for fabricating dual damascene profiles using sub pixel-voting lithography and devices made by same: This invention provides processing steps, methods and materials strategies for making patterns of structures for integrated electronic devices and systems. Processing methods of the present invention are capable of making micro-and nano-scale structures, such as Dual Damascene profiles, recessed features and interconnect structures, having non-uniform cross-sectional geometries useful for establishing... Agent: Greenlee Winner And Sullivan P C
20090023099 - Mask registration correction: A method of manufacturing a semiconductor device comprising forming an active region in a device substrate using a first phase shift mask (PSM) having a first patterned light shielding layer formed thereon, forming a polysilicon feature on the device substrate over the active region using a second PSM having a... Agent: Haynes And Boone, LLP Ip Section
20090023100 - Patterning a surface comprising silicon and carbon: Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is... Agent: Hitachi C/o Wagner Blecher LLP
20090023101 - Lithography track systems and methods for electronic device manufacturing: The present invention provides systems, methods, and apparatus for processing a lot of substrates in a lithography track system with an integrate metrology sensor. The invention includes performing a coating process on substrates; transferring the substrates to a stepper for alignment and exposure; transferring the substrates to a post-exposure bake... Agent: Dugan & Dugan, Pc
20090023102 - Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern: A positive resist composition for forming a thick-film resist having a film thickness of 1 to 15 μm, the composition comprising: a resin component (A) that includes a polymer compound (A1), which has a weight average molecular weight of 20,000 to 50,000, and includes a structural unit (a1) derived from... Agent: Knobbe Martens Olson & Bear LLP
20090023103 - Solid dispersion, process of producing solid dispersion, and heat developable photosensitive material: A process of producing a solid dispersion of an organic compound comprising a step in which after solid dispersing an organic compound, a temperature is elevated stepwise to subject the dispersion to heat treatment.... Agent: Sughrue-26555001/15/2009 > patent applications in patent subcategories. recently filed with US Patent Office
20090017387 - Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film: To provide a reflective mask blank for exposure that can solve a problem of adsorption failure in fixing a reflective mask using an electrostatic chuck and thus can flatten the surface of the mask using the electrostatic chuck, thereby realizing high-accuracy pattern transfer. In a reflective mask blank for exposure... Agent: Sughrue Mion, PLLC
20090017388 - Substrate structure for color filter and color filter having the same: Provided is a substrate structure for a color filter and a color filter having the same. The substrate structure for color filter includes: a transparent substrate on which a plurality of pixels are defined by a black matrix; and an ink-philic pattern which is formed in a predetermined pattern on... Agent: Stanzione & Kim, LLP
20090017389 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a specific photoreceptor material package comprising a thick conductive undercoat layer, a charge generation layer, a long life charge transport layer, and an optional overcoat... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20090017390 - External toner additive, toner and image forming apparatus using the same: To provide a toner and an image forming apparatus using the toner, the toner contains an external additive that can suppress adherence of impurities to a discharge electrode of a corona discharger and prevent occurrence of charging unevenness. The external toner additive is comprised of a particulate metal oxide with... Agent: Nixon & Vanderhye, PC
20090017392 - Toner, developer and image forming apparatus:
20090017391 - Toner, method for manufacturing the toner, and process cartridge using the toner: A toner including a colorant, a polyester (I), and an urea-modified polyester is provided. The urea-modified polyester is a reaction product of an isocyanate-modified polyester with an amine. The isocyanate-modified polyester is obtained by modifying a polyester (II) with an isocyanate. The polyester (II) has specific number average molecular weight... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090017393 - Toner compositions: Disclosed herein are emulsion aggregation toner particles having less than about 15 atomic percent oxygen in relation to a total atomic percent of 100 for all elements on the surface thereof. Such toner particles exhibit lower marks on print defects.... Agent: Oliff & Berridge, PLC.
20090017394 - Hollow toner and process of preparing the same: Hollow toner and a process of preparing the same are provided. The hollow toner has a hollow sphere shape, wherein an outer layer surrounding the hollow sphere includes a polymer, a wax and a pigment. The hollow toner has excellent fixing properties under low energy and low pressure, and can... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20090017395 - Toner, two-component developer, developing device, and image forming apparatus: A toner has columnar particles manufactured through: a kneading step of melt-kneading toner raw materials including at least binder resin, colorant and a release agent to prepare a kneaded product; a spinning step of extruding the kneaded product from orifices disposed at the tip of a spinning nozzle to prepare... Agent: Nixon & Vanderhye, PC
20090017396 - Silicone wax-containing toner particles with controlled morphology: The present invention is a method for the preparation of electrostatographic toner including the following steps. A first dispersion is prepared with a solvent, a silicone wax, and a hyperdispersant. The first dispersion is added to an organic solvent containing a polymer material to form an organic phase. The organic... Agent: Andrew J. Anderson Patent Legal Staff
20090017397 - Photosensitive resin composition and microlens formed with use thereof: A photosensitive resin composition according to the present invention includes: a copolymer having a repeating unit having a thermal crosslinking group; and a photosensitive agent. As such, the photosensitive resin composition according to the present invention can form a resin with improved heat resistance. Further, a microlens-forming photosensitive resin composition... Agent: Morrison & Foerster LLP
20090017398 - Method for making a lithographic printing plate: A method for making a lithographic printing plate includes the steps of providing a heat-sensitive lithographic printing plate precursor including on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating; image-wise exposing the precursor with IR-radiation or heat; and developing the image-wise... Agent: Agfa C/o Keating & Bennett, LLP
20090017399 - Imageable elements with low ph developer solubility: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline... Agent: Eastman Kodak Company Patent Legal Staff
20090017400 - Pattern forming method: A pattern forming method, includes: exposing a resist film with actinic rays or radiation a plurality of times; and heating the resist film at a first temperature in at least one interval between the exposures.... Agent: Sughrue-265550
20090017401 - Method of forming micropattern: A resist film provided on one major surface of a process target substrate is patterned to form a resist pattern. A solubilization process is carried out on the resist film remaining in a space portion of the resist pattern to make the resist film easily soluble in a liquid for... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP01/08/2009 > patent applications in patent subcategories. recently filed with US Patent Office
20090011342 - Method to optimize grating test pattern for lithography monitoring and control: A method of making a process monitor grating pattern for use in a lithographic imaging system comprises determining minimum resolvable pitch of a plurality of spaced, adjacent line elements, and selecting a process monitor grating period that is an integer multiple M, greater than 1, of the minimum resolvable pitch.... Agent: Law Office Of Delio & Peterson, LLC.
20090011343 - Microstructure and manufacturing method thereof: A microstructure includes a substrate and a photoresist layer. The substrate has a surface, and the photoresist layer is disposed on the substrate. The photoresist layer has at least one recess, which has a sidewall, a depth and a width. An oblique angle of the sidewall is not less than... Agent: Birch Stewart Kolasch & Birch
20090011341 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and an absorber layer for absorbing EUV light formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B), silicon (Si) and nitrogen (N), and in the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090011344 - Method of manufacturing color filter: A method of manufacturing a color filter including providing pixels defined by a black matrix on a substrate, forming a liquid ink layer in the pixels, drying the liquid ink layer to form a film on a surface of the liquid ink layer, coating an overcoating solution on the film... Agent: Stanzione & Kim, LLP
20090011346 - Focus blur measurement and control method: A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system. The method includes correlating the dimensions of a first set of at least one control pattern printed in a lithographic resist layer, measured at three or more locations on or within the pattern... Agent: Law Office Of Delio & Peterson, LLC.
20090011345 - Lithographic apparatus and device manufacturing method utilizing data filtering: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the... Agent: Sterne, Kessler, Goldstein & Fox P.l.l.c.
20090011347 - Electrophotographic toner, electrophotographic developer, toner cartridge, and image forming method: The invention provides an electrophotographic toner having a crystalline polyester resin; a non-crystalline polyester resin; a colorant; and a releasing agent. A resin (i), that is included in a toluene-soluble component of the toner and having a molecular weight of 30,000 to 100,000 as measured by gel permeation chromatography relative... Agent: Oliff & Berridge, PLC
20090011348 - Electrophotographic photoreceptor and image formation method: Disclosed is an electrophotographic photoreceptor comprising on or over an electrically conductive support a photosensitive layer containing a pyranthrone compound represented by the following formula and the pyranthrone compound has a crystal structure exhibiting a CuKα X-ray diffraction spectrum having peaks at angles (2θ±0.2°) of 12.3°, 20.5°, 25.3° and 28.3°.... Agent: Lucas & Mercanti, LLP
20090011349 - Photoreceptor for electrophotography: s
20090011350 - Method to produce conductive transfer roller, transfer roller, and image forming apparatus having the same: A method to produce a conductive transfer roller, and the transfer roller. The method to produce the conductive transfer roller includes adding and mixing a conductive substance, an ionic conductive agent, a vulcanizing agent, and a blowing agent and at least one of elastic materials selected from a group consisting... Agent: Stanzione & Kim, LLP
20090011351 - Method of manufacturing toner, toner, two-component developer, developing device, and image forming apparatus: A toner capable of forming high quality images of excellent image reproducibility at high definition and high resolution, being decreased for the bleed-out of a wax ingredient to the surface, causing less filming to a photoreceptor and offset phenomenon in a high temperature region, is provided. The toner is manufactured... Agent: Nixon & Vanderhye, PC
20090011352 - Process for preparing novel composite imaging materials and novel composite imaging materials prepared by the process: The invention relates to a versatile process for preparing composite powders that can be used as novel electrostatic charge control agents, dry or liquid toners, and specialty imaging materials. The process involves impregnating specific sized, porous, inorganic core particles with chemical compositions that include one or more polymers or waxes... Agent: John F. Cooper
20090011354 - Electrostatic image developing toner, invisible information toner, electrostatic image developer, process cartridge and image formation apparatus: wherein R1 to R57 respectively represent a hydrogen atom, an alkyl group, an aryl group, an arylalkyl group, an amino group, a halogen group, an alkoxy group, an alkylthio group, a nitro group, a hydroxy group, a thiol group, an alkylcarbonyl group, an alkoxycarbonyl group, an alkylcarbonylamino group, an alkoxycarbonylamino... Agent: Oliff & Berridge, PLC
20090011353 - Black toner: In a black toner having at least a binder resin and an iron-titanium composite oxide as a colorant; the iron-titanium composite oxide is contained in a specific amount; the black toner has a specific weight average particle diameter and a specific saturation magnetization; the black toner has, in X-ray diffraction... Agent: Fitzpatrick Cella Harper & Scinto
20090011355 - Toner, method of manufacturing the toner, developing device, and image forming apparatus: There are provided a toner that allows prevention of environmental contamination and is nevertheless free from toner durability degradation, wherein a sufficiently wide color reproduction range can be secured even when it is applied to color toner, and variation in characteristics among toner particles can be suppressed, as well as... Agent: Nixon & Vanderhye, PC
20090011356 - Electrostatic image developing toner and image forming apparatus using the same: where X is a residue resulting from removing an H atom in one hydroxyl group from (poly)alkanolamine having 2 to 12 carbon atoms, R represents an H atom or an alkyl group that has 1 to 8 carbon atoms and may contain 1 to 3 ether bonds, m, n, p,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090011357 - Toner, method of manufacturing the same, two-component developer using the same, developing device, and image forming apparatus: A toner is a capsule particle including a toner particle composed of a core particle that is a resin particle and shell particles covering the surface of the core particle. The toner is manufactured by controlling the particle size so that the toner particles have a volume average particle size... Agent: Nixon & Vanderhye, PC
20090011358 - Method of manufacturing toner, toner, two-component developer, developing device and image forming apparatus: A method of manufacturing a toner in which uneven distribution of toner ingredients by subjecting them to fine dispersion is prevented and which is excellent in transferability, cleaning properties, anti-filming properties, anti-blocking properties, high-temperature offset resisting properties and transparency is provided. Melt-kneaded substances include binder resins, colorants and release agents,... Agent: Nixon & Vanderhye, PC
20090011359 - Liquid developer: It is an object of the present invention to provide a liquid developer in which, in liquid developers for electrophotography or electrostatic recording, the adverse effect on electric resistance of the liquid developer and the electrically charged characteristics of toner particles is minimized and the dispersibility of a pigment and... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20090011361 - Amine-arresting additives for materials used in photolithographic processes: Novel, poison-blocking compositions and methods of using those compositions to form poison-blocking layers are provided. The compositions comprise a typical composition used in microlithographic processes, but with a poison-blocking additive included in that composition. The preferred additive is a compound comprising one or more blocked isocyanates. Upon heating to certain... Agent: Hovey Williams LLP
20090011362 - Pattern forming method: A pattern forming method performs a multiple exposure process, the multiple exposure process comprising: exposing a resist film with actinic rays or radiation a plurality of times, wherein a contact angle of the resist film for water is 75° or more.... Agent: Sughrue-265550
20090011360 - Photo-resist material structure and method of producing the same: An apparatus includes a substrate and a photoresist material structure arranged adjacent to the substrate so that a cavity is formed between the substrate and the photoresist material structure. The cavity has an opening. The photoresist material structure includes a frame portion disposed on a main side of the substrate... Agent: Slater & Matsil LLP
20090011363 - Photopolymer composition usable for lithographic plates: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the... Agent: Eastman Kodak Company Patent Legal Staff
20090011364 - Positive photosensitive resin composition, method for forming pattern, and electronic part: Provided is a positive photosensitive resin composition which is advantageous not only in excellent sensitivity, resolution and adhesion, but also in excellent heat resistance even when the composition is cured by a low-temperature process at equal to or lower than 280° C., as well as low water absorption and capability... Agent: Antonelli, Terry, Stout & Kraus, LLP
20090011365 - Resist composition and patterning process: To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.... Agent: Birch Stewart Kolasch & Birch
20090011366 - Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method:
20090011367 - Interface binder, resist composition containing the same, laminate for forming magnetic recording medium having layer containing the same, manufacturing method of magnetic recording medium using the same, and magnetic recording medium produced by the manu: To provide an interface binder for binding a resist layer and a laminate for forming magnetic recording medium having a substrate and a magnetic layer, the interface binder containing a first functional group crosslinkable with a surface of the laminate, and a second functional group crosslinkable with the resist layer.... Agent: Sughrue Mion, PLLC
20090011368 - Exposure method and apparatus, and electronic device manufacturing method: An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the... Agent: Staas & Halsey LLP
20090011369 - Lithographic method and device manufactured thereby: A substrate processing method of a substrate provided with an anti-reflective coating which extends to or beyond a peripheral edge of the substrate is disclosed. The method includes removing a portion of the anti-reflective coating adjacent to and around a periphery of the substrate using a back-side removal process, depositing... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20090011370 - Pattern forming method using two layers of resist patterns stacked one on top of the other: A pattern forming method using two layers of resist pattern stacked one on the other has been disclosed. First, a first resist pattern is formed on a to-be-processed film. The first resist pattern is slimmed. On the slimmed first resist pattern and to-be-processed film, a second resist pattern is formed.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090011371 - Reflective film interface to restore transverse magnetic wave contrast in lithographic processing: A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of... Agent: Law Office Of Delio & Peterson, LLC.
20090011374 - Method and material for forming high etch resistant double exposure patterns: The present invention includes a lithography method comprising forming a first patterned resist layer including at least one opening therein over a substrate. A protective layer is formed on the first patterned resist layer and the substrate whereby a reaction occurs at the interface between the first patterned resist layer... Agent: Birch, Stewart, Kolasch & Birch, LLP
20090011373 - Method of manufacturing mechanical and micromechanical parts: e
20090011372 - Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method: A silicon-containing film is formed from a heat curable composition comprising (A) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, (B) a hydroxide or organic acid salt of Li, Na, K, Rb or Ce, or a sulfonium, iodonium or... Agent: Birch Stewart Kolasch & Birch
20090011376 - Exposure system and method for manufacturing device: An exposure system includes an exposure apparatus and a fluid supplying apparatus that supplies fluid to the exposure apparatus via flow channels. The fluid supplying apparatus includes a fluid sending unit, a heat exchanger, a first temperature sensor that measures the temperature of the fluid, a filter that removes unwanted... Agent: Canon U.s.a. Inc. Intellectual Property Division
20090011375 - Immersion liquid for liquid immersion lithography process and method for forming resist pattern using the same: A liquid immersion lithography process is provided. In particular, the liquid immersion lithography process is one in which the resolution of a resist pattern is improved by exposure to light through a liquid having a refractive index higher than that of air and a predetermined thickness, while being arranged on... Agent: Knobbe Martens Olson & Bear LLP
20090011377 - Photoresist topcoat for a photolithographic process: A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous... Agent: Schmeiser, Olsen & Watts01/01/2009 > patent applications in patent subcategories. recently filed with US Patent Office
20090004571 - Optically variable security device: P
20090004575 - Exposure mask with double patterning technology and method for fabricating semiconductor device using the same: An exposure mask for forming a G-type active region with a double patterning technology includes a bar shaped first light-blocking pattern to define an I-type active region, and an island shaped second light-blocking pattern to define a bit line contact region. The first light-blocking pattern and the second light-blocking pattern... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090004577 - Mask for semiconductor device and manufacturing method thereof: Embodiments relate to a mask used for manufacturing a semiconductor device and a method for manufacturing the same. The mask includes a first and second region formed on a semiconductor mask. First and second mask patterns may be formed in the first and second regions and aligned at first and... Agent: Sherr & Vaughn, PLLC
20090004574 - Method for fabricating photomask: Provided is a method for fabricating a photomask. The method includes following processes. Light blocking patterns are formed on a mask substrate, and surface properties of the mask substrate on which the light blocking patterns are formed are changed into hydrophobicity. When the surface properties of the mask substrate are... Agent: Townsend And Townsend And Crew, LLP
20090004572 - Method of monitoring focus in lithographic processes: The present disclosure is directed to a method for monitoring focus of a photolithography system. The method comprises providing a substrate and depositing a photoresist layer on the substrate. At least one photomask is provided comprising one or more forbidden pitch photomask patterns formed thereon. The forbidden pitch patterns are... Agent: Texas Instruments Incorporated
20090004576 - Photomask and method for forming a resist pattern: A resist pattern forming method capable of obtaining a smooth resist pattern. An exemplary method may utilize a photomask including a plurality of mask cells arranged in the form of a matrix. The length of one side of each of the mask cells may be smaller than the length corresponding... Agent: Taft, Stettinius & Hollister LLP
20090004573 - System and method for making photomasks: The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an... Agent: Texas Instruments Incorporated
20090004579 - Clear and colorless three-dimensional articles made via stereolithography and method of making said articles: The invention is a radiation curable liquid resin that can be used to make a clear and colorless, three-dimensional article by a stereolithography process. The clear and colorless three-dimensional articles have a clarity and transmittance of greater than about 67% as measured by UV-Visible spectrophotometer in the 400-500 nm range;... Agent: Nixon & Vanderhye, PC
20090004580 - Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method: By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign substance) of the scale is... Agent: Oliff & Berridge, PLC
20090004581 - Exposure apparatus, exposure method and optical proximity correction method: There is disclosed an exposure apparatus which includes an illumination optical system including a light source which emits illumination light, a mask stage which holds a photomask having a mask pattern thereon to be illuminated with the illumination light, and a light intensity distribution filter arranged on a plane, which... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20090004582 - Electrophotographic toner: An electrophotographic toner is provided including parent toner particles having a small average particle diameter and external additives applied to the surface of the parent toner particles. The external additives include: a large particulate silica; a small particulate silica; a conductive titanium oxide; strontium titanate; and an aluminum oxide. High-quality... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.
20090004583 - Electrophotographic photoreceptor, process cartridge, image forming apparatus, and film forming coating solution: According to the invention, there is provided an electrophotographic photoreceptor comprising a conductive substrate and a photosensitive layer provided on a surface of the conductive substrate, an outermost layer of the photosensitive layer containing a crosslinked product composed of a guanamine compound and at least one charge transporting material having... Agent: Oliff & Berridge, PLC
20090004584 - Hydroxygallium phthalocyanine processes and photoconductors thereof: A process which comprises treating a hydroxygallium phthalocyanine Type I with a weak acid having a pKa of at least equal to or greater than about −3, and subsequently contacting the hydroxygallium phthalocyanine Type I with an organic solvent.... Agent: Patent Documentation Center
20090004585 - Electrophotographic photoreceptor and electrophotographic apparatus: An electrophotographic photoreceptor which can respond to a reduction in diameter of photoreceptor and a process having high circumferential speed, due to the demand in the miniaturization and increase in the speed of copiers and printers. The photoreceptor has high sensitivity in long-wavelength region, and is free from deterioration of... Agent: Kratz, Quintos & Hanson, LLP
20090004586 - Polymer blends for light sensitive photoconductor: The present disclosure relates to an electrophotoconductive element comprising a conductive substrate, a charge generation layer including a charge generating compound and a charge transport layer. The charge generation layer includes a first polymer resin and second polymer resin to provide a blend including the charge generating compound. The first... Agent: Lexmark International, Inc. Intellectual Property Law Department
20090004587 - Imaging member: A layer on the reverse side of an imaging member provides excellent crack resistance to the imaging layer(s) on the front side. The crack-deterring backing layer can be a laminated self-adhesive, such as tape, or a coating. Because the crack-deterring backing layer is on the reverse side, it does not... Agent: Fay Sharpe / Xerox - Rochester
20090004588 - Photoconductor structure processing methods and imaging device photoconductor structures: Photoconductor structure processing methods and imaging device photoconductor structures are described. According to one embodiment, a photoconductor structure processing method includes processing a photoconductor structure of an imaging device and wherein the photoconductor structure comprises charge transport material configured to conduct electrical charges generated responsive to reception of light to... Agent: Hewlett Packard Company
20090004589 - Toner and process for producing the same: The present invention provides toner containing core particles prepared by mixing and aggregating in an aqueous medium at least a first resin particle dispersion in which first resin particles are dispersed, a colorant particle dispersion in which particles of colorant are dispersed and a wax particle dispersion in which particles... Agent: Hamre, Schumann, Mueller & Larson P.C.
20090004590 - Toner and method of manufacturing the same, two-component developer, developing device, and image forming apparatus: in a toner at least containing a binder resin and a colorant, a value obtained by dividing a particle size D50p by a particle size D84p is 1.43 or more and 1.64 or less, wherein D50p and D84p respectively represent particle sizes at 50% and 84% of cumulative number counted... Agent: Nixon & Vanderhye, PC
20090004591 - Electrostatic image developing toner and method for producing the same: Disclosed is a toner for developing electrostatic image containing toner particles prepared with a method containing a step of: coagulating resin particle A, resin particle B and a colorant, wherein resin particle A and resin particle B respectively have volume average particle diameters Da and Db which are different in... Agent: Lucas & Mercanti, LLP
20090004592 - Carrier compositions: Coated carrier particles are provided for use in developer compositions for electrophotographic imaging. The coated carrier particles include a carrier core and a resin coating that includes first and second polymer components. The coated carrier particles exhibit stable triboelectric charging during aging, decreased coating hardness, higher coating coverage, and an... Agent: Oliff & Berridge, PLC.
20090004593 - Method of producing liquid developer and liquid developer produced by the method: A liquid developer which includes toner particles having small particle size distribution, uniform shape, and excellent fixing properties to a recording medium is provided, a liquid developer which includes toner particles having small particle size distribution and uniform shape and being capable of exhibiting a property of each of materials... Agent: Hogan & Hartson L.L.P.
20090004594 - Method for producing toner for devoloping electrostatic image: The method is a method for producing a toner for developing electrostatic image comprising a suspending step of suspending a polymerizable monomer composition containing at least a polymerizable monomer and a colorant into an aqueous dispersion medium containing a dispersion stabilizer to yield a suspension wherein droplets of the polymerizable... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20090004596 - Fused aromatic structures and methods for photolithographic applications: A resist composition and a method for forming a patterned feature on a substrate. The composition comprises a molecular glass having at least one fused polycyclic moiety and at least one base soluble functional group protected with an acid labile protecting group, and a photosensitive acid generator. The method includes... Agent: Schmeiser, Olsen & Watts
20090004595 - Initiator compositions, negative-working imageable elements, and methods of use: An initiator composition and infrared radiation-sensitive composition include an onium cation and a boron-containing anion as well as a metallocene. These compositions can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates that have desired imaging speed, excellent run length, and... Agent: Andrew J. Anderson Patent Legal Staff
20090004597 - Photosensitive composition, display member, and process for producing the same: Disclosed is a photosensitive composition comprising to 5% by weight of a photosensitive organic component and 50 to 95% by weight of a glass powder, wherein the glass powder contains 70 to 85% by weight of Bi2O3, 3 to 15% by weight of SiO2, 5 to 20% by weight of... Agent: Kubovcik & Kubovcik
20090004599 - Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s: A radiation-sensitive composition can be used to prepare positive-working imageable elements having improved solvent resistance and is useful for making lithographic printing plates. The composition includes an alkaline soluble polymeric binder that is a specific poly(vinyl acetal) that exhibits improved resistance to press chemicals, and a radiation absorbing compound.... Agent: Andrew J. Anderson Patent Legal Staff
20090004598 - Resist composition and method for forming resist pattern: A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), in an... Agent: Knobbe Martens Olson & Bear LLP
20090004600 - Chemically amplified positive resist composition: r
20090004601 - Chemically amplified positive resist composition:
20090004602 - Fabricating method of nano-ring structure by nano-lithography: The present invention is to provide a “fabricating method of nano-ring structure by nano-lithography” for fabricating out a new nano-ring structure in more miniature manner than that of the current fabricating facilities by directly using the current fabricating facilities without any alteration or redesign of the precision so that the... Agent: Bacon & Thomas, PLLC
20090004603 - Method for forming fine pattern of semiconductor device: A method for forming a fine pattern of a semiconductor device comprises: forming anti-reflection coating patterns over an underlying layer of a semiconductor substrate using an anti-reflection coating composition comprising a silicon-containing polymer; forming a photoresist pattern between the anti-reflection coating patterns using a photoresist composition comprising a silicon-containing polymer;... Agent: Marshall, Gerstein & Borun LLP
20090004604 - Method for forming fine pattern of semiconductor device: A method for forming a fine pattern of a semiconductor device comprises forming a spin-on-carbon layer over an underlying layer, forming an anti-reflection pattern including a silicon containing polymer with a first etching mask pattern, forming a photoresist pattern including a silicon containing polymer with a second etching mask pattern... Agent: Marshall, Gerstein & Borun LLP
20090004605 - Semiconductor processing methods of transferring patterns from patterned photoresists to materials: The invention includes a semiconductor processing method. A first material comprising silicon and nitrogen is formed. A second material is formed over the first material, and the second material comprises silicon and less nitrogen, by atom percent, than the first material. An imagable material is formed on the second material,... Agent: Scott Jeffrey Deboer
20090004608 - Detergent for lithography and method of forming resist pattern with the same: Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in dissolution of the resin component of a photoresist composition and hence in a dimensional change of a resist pattern. However, the conventional detergents have had a... Agent: Wenderoth, Lind & Ponack, L.L.P.
20090004606 - Radiation sensitive silicone resin composition: This invention relates to acrylic functional resin compositions. More particularly, this invention relates to Poly [organ-co-(meth)acryloxyorgano]silsequioxane resins that are curable upon exposure to ultraviolet radiation with photo initiator or upon heating with or without a free radical generator. The resin compositions have high storage stability at room temperature and produces... Agent: Dow Corning Corporation Co1232
20090004607 - Substrate processing method: A resist film is formed on a surface of a wafer. Then, a liquid layer used for irradiating the resist film with exposure light rays is formed from a liquid between an optical component facing the resist film and the surface of the wafer. The liquid is capable of transmitting... Agent: Michael A. Makuch Smith, Gambrell & Russell
20090004609 - Lithography process: A lithography process for manufacturing bit-island storage mediums that results in improved resolution and uniformity between bit-islands. The lithography process includes applying a resist coating polymer to a surface of a substrate. Selected areas of the resist coating polymer are then exposed to an energy source, wherein each selected area... Agent: Kinney & Lange, P.A.
20090004610 - Method and apparatus for manufacturing semiconductor device: A method and apparatus for manufacturing a semiconductor device is disclosed. In particular, the application discloses a method that performs a lithography process using a material capable of increasing a depth of focus so as to prevent efficiency of the lithography process from being degraded due to high integration of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLPPrevious industry: Chemistry: electrical current producing apparatus, product, and process
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