Radiation imagery chemistry: process, composition, or product thereof inventions 12/08

20080318138 - Euv mask and method for repairing an euv mask: An EUV mask comprises a substrate, a reflective multilayer on the substrate, a phase-shifting material disposed above the multilayer in at least one first portion of the substrate, and a masking material disposed above the multilayer in second portions of the substrate and corresponding to mask patterns of an EUV... Agent: Mayback & Hoffman, P.A.

20080318137 - Lithography masks for improved line-end patterning: In one embodiment, a mask for use in semiconductor processing comprises a first region formed from a first material that is primarily opaque, a second region formed from a second material that is primarily transmissive, and a third region in which at least a portion of the second material is... Agent: Caven & Aghevli C/o Intellevate, LLC

20080318139 - Mask blank, photomask and method of manufacturing a photomask: Mask blanks of the invention include an absorber layer, an anti-reflective layer disposed over the absorber layer, and a hard mask layer disposed over the anti-reflective layer. The absorber layer is absorbent at an exposure wavelength and is reflective at an inspection wavelength. The inspection wavelength is greater than or... Agent: Mayback & Hoffman, P.A.

20080318140 - Reflective mask blank for euv lithography and substrate with functional film for the same: A substrate with a reflective layer for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer formed in this order on the substrate, wherein the protective layer contains ruthenium (Ru) and at least one element selected from... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080318142 - Electrophotographic photoreceptor, method for preparing the electrophotographic photoreceptor, and image forming method and apparatus and process cartridge using the electrophotographic photoreceptor: A photoreceptor including an electroconductive substrate; a photosensitive layer, which is located overlying the electroconductive substrate and which includes a charge generation material, a charge transport material having no radical polymerizability, a binder resin having no radical polymerizability, and a crosslinked polymer including a unit obtained from a first radically... Agent: Cooper & Dunham, LLP

20080318145 - External surface additive compositions: A toner having at least one binder, at least one colorant and external additives. The external additives include at least one fluoropolymer. An electrophotographic image forming machine and method includes the toner with at least one fluoropolymer.... Agent: Oliff & Berridge, PLC.

20080318143 - Image forming apparatus, image forming method, and process cartridge: An image forming apparatus including a charging unit, an exposing unit, a developing unit, a transferring unit, and a fixing unit. A toner containing a colorant and a binder resin which contains a polyester resin (A) and a polyester resin (B) having a softening point 10° C. or more higher... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080318141 - Method of preparing toner and toner prepared using the method: A method of preparing toner, the method including preparing a latex for a core by polymerizing a composition for a core including a macromonomer having a hydrophilic group, a hydrophobic group and at least one reactive functional group, at least one polymerizable monomer, and a wax; agglomerating the latex for... Agent: Stanzione & Kim, LLP

20080318144 - Toner, developer, and image forming method: To provide a toner including: a toner material that contains at least a binder resin, a pigment, and a pigment dispersant, wherein the pigment dispersant has an acid value of 20 mgKOH/g to 50 mgKOH/g and an amine value of 1 mgKOH/g to 50 mgKOH/g, and wherein the pigment contains... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080318146 - Imaging member having high charge mobility: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an electrostatographic imaging member comprising a charge transport layer that exhibits improved charge mobility transport and comprises novel terphenyl compounds.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080318147 - Electrophotographic toner, and image forming method and image forming apparatus employing the same: An objective is to provide an electrophotographic photoreceptor having a protective layer in which no unevenness is generated in a coated layer even though a coating solution containing a large addition amount of metal oxide is coated, mechanical strength of a protective layer is high; productivity is high with long... Agent: Lucas & Mercanti, LLP

20080318148 - Toner and method for producing the same and developer: A toner containing base particles produced by dissolving and/or dispersing a toner material in an organic solvent so as to prepare a toner material solution, and emulsifying and/or dispersing the toner material solution in an aqueous medium, wherein the toner material contains a binder resin and a releasing agent, the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080318149 - Marking liquid: A liquid electrostatographic toner or liquid ink jet ink prepared by the steps of heating a marking particle mix of particles of a resin and a colourant blend in a carrier liquid to a temperature between about the first softening point of the resin and about the second softening point... Agent: Klauber & Jackson

20080318150 - Paper compositions, imaging methods and methods for manufacturing paper: Paper compositions are provided that include an amine group-containing cationic polymeric material and a binder material. The paper compositions are particularly useful as receiver materials for images formed by electrophotographic imaging methods utilizing liquid developers. Also described are imaging methods that utilize the paper compositions as receiver materials and methods... Agent: Wilmerhale/boston

20080318151 - Preparation method of latex for toner and preparation method of toner from the same: A method for preparing latex for a toner includes heating a mixture of distilled deionized water and poly (ethylene glycol)-ethyl ether methacrylate (PEG-EEM) with stirring, adding a monomer mixture, 1-dodecanethiol and an ester wax to the mixture, dispersing the mixture with ultrasonic vibration, adding potassium persulfate (KPS) to the dispersion... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20080318156 - Adamantane based molecular glass photoresists for sub-200 nm lithography: Disclosed are glass photoresists generated from adamantane derivatives containing acetal and/or ester moieties as novel high-performance photoresist materials. Some of the disclosed adamantane-based glass resists have a tripodal structure and other disclosed adamantane-based glass resists include one or more cholic groups. The disclosed adamantane derivatives can be synthesized from starting... Agent: Miller, Matthias & Hull

20080318154 - Ink-less printing: A method of ink-less printing comprises the steps of: providing a source (1) for emitting an energy beam,—providing an array of programmable shutters (3), each adapted for selectively blocking or allowing passage of at least some of an energy beam therethrough; providing a substrate (4) including an additive susceptible to... Agent: Levenfeld Pearlstein, LLC Intellectual Property Department

20080318155 - Lithographic printing plate precursor and plate making method: A lithographic printing plate precursor includes: an aluminum support; an intermediate layer; and an image-recording layer, in this order, wherein at least one of the intermediate layer and the image-recording layer contains a compound having an amino group and a functional group capable of interacting with the aluminum support in... Agent: Birch Stewart Kolasch & Birch

20080318153 - Photosensitive layer stack: A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon irradiation and a photochromic layer having a second absorption switching from transmissive to absorptive upon irradiation.... Agent: Edell, Shapiro & Finnan, LLC

20080318157 - Radiation sensitive self-assembled monolayers and uses thereof: The invention is directed to a radiation sensitive compound comprising a surface binding group proximate to one end of the compound for attachment to a substrate, and a metal binding group proximate to an opposite end of the compound. The metal binding group is not radiation sensitive. The radiation sensitive... Agent: Connolly Bove Lodge & Hutz LLP

20080318152 - Substrate for exposure, exposure method and device manufacturing method: A substrate for exposure prevents interference with a substrate holder at the time of being loaded onto the substrate holder and prevents a liquid from entering into a rear plane side after being loaded. A substrate (P) for exposure is a substrate to be exposed by irradiation of exposure light... Agent: Miles & Stockbridge PC

20080318158 - Underlayer coating forming composition for lithography containing polysilane compound: s

20080318159 - Positive photosensitive composition: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution,... Agent: Sughrue-265550

20080318160 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: p

20080318161 - Photosensitive resin composition for flexographic printing: A photosensitive resin composition for flexographic printing comprising a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), and a photopolymerization initiator (c) as essential ingredients, wherein the thermoplastic elastomer (a) is a block copolymer composition containing a block copolymer (i) having at least one polymer block comprised mainly of a... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080318164 - Heated water spray processor: Excellent development of planographic printing plates can be achieved by exposing an imaged, negative working, photopolymerizable coating to a high pressure stream of essentially heated but otherwise untreated tap water, whereby the water completely removes only the less cohesive and adhesive (e.g., partially polymerized) regions to the substrate, thereby directly... Agent: Alix Yale & Ristas LLP

20080318162 - Use of highly alkaline developer regenerator composition: A method for providing a lithographic printing plate includes developing an exposed imageable element with an alkali silicate-containing developer composition having a pH of at least 12.0. The developer composition is regenerated by adding to it an alkali silicate-containing regenerator composition having a pH of at least 12.0. Conductivity of... Agent: Andrew J. Anderson, Patent Legal Staff Eastman Kodak Company

20080318163 - Water spray development of planographic plates: Excellent development of planographic printing plates can be achieved by exposing an imaged, negative working, photopolymerizable coating to a high pressure stream of essentially untreated tap water, whereby the water completely removes only the less cohesive and adhesive (e.g., partially polymerized) regions to the substrate, thereby directly producing a printing... Agent: Alix Yale & Ristas LLP

20080318165 - Composition for forming antireflective film and wiring forming method using same: c

20080318167 - Copolymer and composition for organic and antireflective layer: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a... Agent: Davidson, Davidson & Kappel, LLC

20080318166 - Method of manufacturing semiconductor device: An object of the present invention is to provide a method of manufacturing semiconductor device, in which a water repellent layer on a resist film surface is removed to improve pattern-size controllability in a developing process. The pattern controllability of a resist pattern is improved by forming the resist pattern... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080318168 - Method and device for structuring a substrate: The invention relates to a method for structuring a substrate. According to said method, at least one mask with at least one opening is arranged over the substrate, and unmasked regions are modified in relation to masked regions of the substrate in order to form structures. The inventive method is... Agent: K.f. Ross P.C.

20080318169 - Pattern forming method: A pattern forming method according to an embodiment of the present invention includes: forming a plurality of pole-like structures above a film to be processed; forming a sidewall film on each of sidewalls of the plurality of pole-like structures so as to form a depression portion in a region surrounded... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080318170 - Method of making an optical disc: A method of making an optical disc is disclosed, in which, a flexible imprint mold is made from a fluid-state flexible silicone and has a reversal pattern of a first pattern on a surface. Also, a substrate is provided and has a second pattern on the surface with a semi-reflective... Agent: North America Intellectual Property Corporation

20080318171 - Method of forming patterns: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the... Agent: Sughrue-265550

20080311482 - Radiation-crosslinking and thermally crosslinking pu systems comprising iminooxadiazinedione: The present invention relates to polyurethane compositions which cure by radiation and thermal action with crosslinking, and use thereof for the production of holographic media. The polyurethane compositions of the invention comprise A) one or more iminooxadiazinedione-group-containing polyisocyanates, B) one or more polyfunctional, isocyanate-reactive compounds, C) one or more compounds... Agent: Connolly Bove Lodge & Hutz LLP

20080311483 - Radiation-crosslinking and thermally crosslinking pu systems-based on poly(epsilon-caprolactone) polyester polyols: The present invention provides polyurethane systems which cure by radiation and thermal action with crosslinking, and use thereof for the production of holographic media. The polyurethane compositions of the invention comprise A) polyisocyanates, B) polyols, comprising at least one poly(ε-caprolactone)polyester polyol, C) compounds having groups which react on exposure to... Agent: Connolly Bove Lodge & Hutz LLP

20080311484 - Radiation image conversion panel, scintillator panel, and radiation image sensor: The radiation image conversion panel in accordance with the present invention has an aluminum substrate, an alumite layer formed on a surface of the aluminum substrate, an intermediate film covering the alumite layer and having a radiation transparency and a light transparency, and a converting part provided on the intermediate... Agent: Drinker Biddle & Reath (dc)

20080311487 - Glass substrate for mask blank and method of polishing for producing the same: The present invention aims at providing a glass substrate required to have a surface polished with extremely high accuracy as in glass substrates for reflective masks for use in EUVL; and a polishing method for producing the glass substrate. The present invention provides a glass substrate for mask blank, which... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080311486 - Photomask manufacturing method and semiconductor device manufacturing method: A photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a reflective layer formed on a substrate and an absorber pattern is formed on the layer. A reflection correction coefficient map is generated by dividing a mask region, where the absorber pattern is formed,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080311485 - Photomasks used to fabricate integrated circuitry, finished-construction binary photomasks used to fabricate integrated circuitry, methods of forming photomasks, and methods of photolithographically patterning substrates: A finished-construction binary photomask used to fabricated integrated circuitry includes a substrate having a device region and a non-device region. The device region has a transparent substrate having a pair of spaced adjacent binary features formed thereover. The spaced adjacent binary features have an opaque material and a phase-shifting material.... Agent: Wells St. John P.s.

20080311488 - Color photoresist with gold nanoparticles and color filters made thereby: A color photoresist with gold nanoparticles and color filters made therefrom are provided. The color photoresist with gold nanoparticles includes substituted acrylate monomers, gold nanoparticles (or clusters), surfactants and a photo-polymerization initiator. The color filter includes a polyacrylate, gold nanoparticles (or clusters) and surfactants. The gold nanoparticles (or clusters) can... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20080311489 - Inkless reimageable printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into a substrate, where the imaging layer is formed of an imaging composition that includes a solvent or a polymeric binder, and a photochromic material selected from substituted fulgides and substituted dithienylethenes, dissolved or dispersed... Agent: Oliff & Berridge, PLC.

20080311490 - Inkless reimageable printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into said substrate, where the imaging layer includes a photochromic material dispersed in an ionomer, optionally with an additional polymeric binder, and where the photochromic material exhibits a reversible transition between a colorless state and... Agent: Oliff & Berridge, PLC.

20080311491 - Inkless reimageable printing paper and method: An image forming medium includes a substrate, and an imaging layer coated on or impregnated into the substrate, wherein the imaging layer includes a photochromic ploymer, optionally dispersed in a polymeric binder or a phase change binder, the photochromic polymer including a polymer having at least one photochromic unit grafted... Agent: Oliff & Berridge, PLC.

20080311492 - Inkless reimageable printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and a coupling agent. In the image forming medium, irradiation of the imaging layer cause the photobase generator to generate a base that reacts... Agent: Oliff & Berridge, PLC.

20080311493 - Inkless reimageable printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or inpregnated into said substrate, where the imaging layer includes a photochromic material and an optional intermolecular hydrogen bond stabilizer, dispersed in a polymeric binder, where the photochromic material reversibly forms intramolecular hydrogen bonds or reversibly forms... Agent: Oliff & Berridge, PLC.

20080311494 - Inkless reimageable printing paper and method: An image forming medium includes a paper substrate and an imaging layer coated on or impregnated into a paper substrate, where the imaging layer is formed of an imaging composition that includes an alkoxy substituted diarylethene photochromic material dissolved or dispersed in a solvent or polymeric binder, and where the... Agent: Oliff & Berridge, PLC.

20080311495 - Photochromic material, inkless reimageable printing paper, and methods: An image forming medium includes a substrate and an imaging layer coated on or impregnated into said substrate, where the imaging layer includes as a photochromic material a spiropyran compound having a conjugated pathway, dispersed in a polymeric binder, wherein the photochromic material exhibits a reversible transition between a colorless... Agent: Oliff & Berridge, PLC.

20080311496 - Reimageable paper protected against uv light: An image forming medium includes a substrate; an imaging layer including an imaging material coated on said substrate, wherein the imaging material exhibits a reversible transition between a colorless state and a colored state; and a protective layer over the imaging layer, the protection layer including dipolar molecules that can... Agent: Oliff & Berridge, PLC.

20080311497 - Hole blocking layer containing photoconductors: A photoconductor that includes a substrate; an undercoat layer thereover wherein the undercoat layer comprises a metal oxide, an electron donor electron acceptor charge transfer complex; a photogenerating layer; and at least one charge transport layer.... Agent: Patent Documentation Center

20080311498 - Photoreceptor layer having rhodamine additive: The presently disclosed embodiments relate in general to electrophotographic imaging members, such as layered photoreceptor structures, and processes for making and using the same. More particularly, the embodiments pertain to a photoreceptor that incorporates a rhodamine compound that improves image quality.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080311499 - Electrophotographic photoreceptor, and process cartridge and image forming apparatus using the photoreceptor: An electrophotographic photoreceptor, including an electroconductive substrate; a photosensitive layer, located overlying the electroconductive substrate; and a crosslinked resin surface layer, located overlying the photo sensitive layer, wherein the crosslinked resin surface layer includes a crosslinked body of trimethylolpropanetriacrylate, isocyanate including a radical polymerizable functional group and a heat or... Agent: Cooper & Dunham, LLP

20080311500 - Toner for developing electrostatic image, and image forming apparatus and process cartridge using the toner: A toner including toner particles including a binder resin; a colorant, a release agent, and a modified layered inorganic material in which at least part of interlayer ions is modified with an organic ion, wherein the toner includes the release agent in an amount of from 3 to 6% by... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080311501 - Toner particles, method of manufacturing the same, two-component developer, developing device, and image forming apparatus: In a raw material mixing step, toner raw materials containing polymerizable monomers, colorant, and a release agent are mixed. In an emulsifying step, the mixture is emulsified under pressure to obtain a polymerizable composition. In a cooling step, the polymerizable composition is cooled down. In a depressurizing step, the polymerizable... Agent: Nixon & Vanderhye, PC

20080311502 - Toner for development of electrostatic image: A toner for development of electrostatic images, comprising colored particles and an external additive, wherein the colored particles has a volume average particle diameter of 3 to 10 μm and an average circularity of 0.950 to 0.995, and in a molecular weight distribution of THF-soluble matter, which is obtained by... Agent: Kratz, Quintos & Hanson, LLP

20080311503 - Toner, method of manufacturing the same, two-component developer, developing device, and image forming apparatus: A toner composed of small particles excellent in a cleaning property, a transferring property, and charge uniformity is provided as well as a method of manufacturing the toner, and two-component developer, developing device, and image forming apparatus using the toner. The toner contains binder resin and colorant, and includes a... Agent: Nixon & Vanderhye, PC

20080311504 - Method of manufacturing toner and toner: t

20080311505 - Liquid developer and image forming device: A liquid developer includes a toner particle mainly composed of a resin material, and a nonvolatile insulating liquid, the resin material including an ethylene copolymer, and the insulating liquid including fatty acid triglyceride.... Agent: Hogan & Hartson L.L.P.

20080311507 - Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same: wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable... Agent: Crowell & Moring LLP Intellectual Property Group

20080311506 - Graded topcoat materials for immersion lithography: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer... Agent: Schmeiser, Olsen & Watts

20080311508 - Process of making a semiconductor device using multiple antireflective materials: A lithographic structure consisting essentially of: an organic antireflective material disposed on a substrate; a vapor-deposited RCHX material, wherein R is one or more elements selected from the group consisting of Si, Ge, B, Sn, Fe and Ti, and wherein X is not present or is one or more elements... Agent: Connolly Bove Lodge & Hutz LLP

20080311509 - Photopolymer printing plate precursor: A photopolymer printing plate precursor includes a photosensitive coating on a support, wherein the photosensitive coating includes a composition that is photopolymerizable upon absorption of light, and the composition includes at least one binder, a polymerizable compound, a sensitizer, and a photoinitiator. The binder is a copolymer that has a... Agent: Agfa C/o Keating & Bennett, LLP

20080311510 - Lithographic printing plate support and presensitized plate: is the true surface area of a 5 μm square surface region as determined by three-point approximation based on data obtained by extracting 0.02 to 0.2 μm wavelength components from three-dimensional data on the surface region measured with an atomic force microscope at 512×512 points and S0 is the geometrically... Agent: Sughrue Mion, PLLC

20080311512 - Photosensitive resin composition and method for pattern forming: A photosensitive resin composition, which displays superior adhesion with substrates when forming a film and can form fine resin patterns with larger film thicknesses and higher aspect ratios, and a method for forming a pattern using the same are provided. Diphenyl sulfone or derivatives thereof are included into the photosensitive... Agent: Knobbe Martens Olson & Bear LLP

20080311511 - Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming: A photosensitive resin composition, a photosensitive resin laminate, and a method for forming a pattern capable of realizing high hardness while using an epoxy group-containing acrylic resin are provided. In a photosensitive resin composition including (A) an epoxy group-containing acrylic resin, (B) a photopolymerization initiator, and (C) a sensitizer, an... Agent: Knobbe Martens Olson & Bear LLP

20080311513 - Photosensitive metal nanoparticle and method of forming conductive pattern using the same: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive... Agent: Buchanan, Ingersoll & Rooney PC

20080311514 - Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing: In a mixture of silsesquioxane compounds comprising silsesquioxane units having a side chain including a direct bond between a silicon atom and a norbornane skeleton and having a degree of condensation of substantially 100%, a dimethylene chain of the norbornane skeleton remote from the silicon bonded side is substituted with... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080311515 - Positive resist composition and method of forming resist pattern: A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) including a structural unit (a1) derived from hydroxystyrene and a structural unit (a2) having... Agent: Knobbe Martens Olson & Bear LLP

20080311516 - Inkless printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and coupling agent. In the image forming medium, irradiation of the imaging layer causes the photobase generator to generate base that reacts with the... Agent: Oliff & Berridge, PLC.

20080311517 - Inkless printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photoacid generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photoacid generator to generate an acid that reacts... Agent: Oliff & Berridge, PLC.

20080311518 - Inkless printing paper and method: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photobase generator to generate a base that reacts... Agent: Oliff & Berridge, PLC.

20080311519 - Inkless reimageable printing paper and method: An image forming medium includes a substrate, and an imaging layer coated on or impregnated into said substrate, wherein the imaging layer includes an imaging composition including a photochromic or photochromic-thermochromic material dissolved or dispersed in a solvent or polymeric binder, wherein the imaging composition is imageable by light of... Agent: Oliff & Berridge, PLC.

20080311521 - Inkless reimageable printing paper and method: An image forming medium includes a substrate, and an imaging layer coated on or impregnated into said substrate, wherein the imaging layer includes an imaging composition including a photochromic or photochromic-thermochromic material dissolved or dispersed in a solvent or polymeric binder, wherein the imaging composition is imageable by light of... Agent: Oliff & Berridge, PLC.

20080311520 - On-press developable negative-working imageable elements and methods of use: A negative-working imageable element has an imageable layer that includes an initiator composition including an iodonium cation and a borate anion, an infrared radiation absorbing compound, a particulate primary polymeric binder, and a phosphate (meth)acrylate adhesion promoter. The element also includes a polymeric overcoat disposed over the imageable layer and... Agent: Andrew J. Anderson Patent Legal Staff

20080311522 - Resist composition, method of forming resist pattern, compound and acid generator: wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a... Agent: Knobbe Martens Olson & Bear LLP

20080311523 - Material for formation of resist protection film and method of forming resist pattern therewith: In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes,... Agent: Thelen LLP

20080311524 - Method for making negative-working heat-sensitive lithographic printing plate precursor:

20080311525 - Method of making a photopolymer printing plate: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP

20080311526 - Method for a multiple exposure, microlithography projection exposure installation and a projection system: In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system, and a second exposure is carried out in accordance with a second set of exposure... Agent: Fish & Richardson PC

20080311527 - Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same: A method of forming a protection layer on a photoresist pattern and a method of forming a fine pattern using the same are provided. A photoresist layer may be formed on a substrate. Exposure regions and non-exposure regions may be defined in the photoresist layer by an exposure process. A... Agent: Harness, Dickey & Pierce, P.L.C

20080311528 - Methods of patterning photoresist, and methods of forming semiconductor constructions: The invention includes semiconductor constructions containing optically saturable absorption layers. An optically saturable absorption layer can be between photoresist and a topography, with the topography having two or more surfaces of differing reflectivity relative to one another. The invention also includes methods of patterning photoresist in which a saturable absorption... Agent: Wells St. John P.s.

20080311529 - Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns: This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a cleaning step of clearing the surface of the substrate, and a second exposure step of performing immersion exposure of the photoresist... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080311530 - Graded topcoat materials for immersion lithography: A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer... Agent: Schmeiser, Olsen & Watts

20080311531 - Method and apparatus for generating periodic patterns by step-and-align interference lithography: The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving... Agent: Birch Stewart Kolasch & Birch

20080305404 - Hologram recording material: wherein R1 represents a hydrogen atom or methyl group, and R2 represents a saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms, which may contain hetero atoms or halogen atoms in the molecule thereof; and a photopolymerization initiation source (B) which generates an active seed by visible light,... Agent: Sughrue-265550

20080305405 - Optical recording composition, holographic recording medium, and method of recording and reproducing information: The present invention provides an optical recording composition comprising a radical polymerizable monomer having a wavelength λ1 nm within an absorption spectrum ranging from 200 to 1,000 nm, the radical polymerizable monomer exhibiting a molar absorbance coefficient of equal to or greater than 5,000 mole·1·cm−1 at the wavelength λ1 nm,... Agent: Sughrue Mion, PLLC

20080305408 - Aperture mask, manufacturing method thereof, charge beam lithography apparatus, and charge beam lithography method: An aperture mask according to an embodiment of the present invention is an aperture mask for charged beam lithography, and includes: a mask substrate having a first semiconductor layer, an insulating film formed on the first semiconductor layer, and a second semiconductor layer formed on the insulating film, and provided... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305410 - Imprinting device, method of fabricating the same. and method of patterning thin film using the same: An imprinting device includes a first substrate, a light blocking layer formed on the first substrate corresponding to a light blocking area, and a patterned layer formed on the first substrate. The patterned layer includes an etch pattern and a flow control pattern formed on the first substrate corresponding to... Agent: Cantor Colburn, LLP

20080305409 - Lithographic mask and method for printing features using the mask: A lithographic mask enables printing wafer features at very small to large pitch values with an increase in the depth of focus. The mask may include square or rectangular patterns for printing square or rectangular features, such as contacts or vias. The square or rectangular features include wings that aid... Agent: Texas Instruments Incorporated

20080305407 - Mask film to form relief images and method of use: A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index... Agent: Andrew J. Anderson Patent Legal Staff

20080305413 - Methods of forming reticles: The invention includes reticle constructions and methods of forming reticle constructions. In a particular aspect, a method of forming a reticle includes provision of a reticle substrate having a defined main-field region and a defined boundary region. The substrate has a relatively transparent base and a relatively opaque material over... Agent: Baorui Yang

20080305412 - Near-field exposure mask and near-field exposure method: e

20080305406 - Photomask blank, photomask manufacturing method and semiconductor device manufacturing method: By increasing the dry etching rate of a light shielding film, the dry etching time can be shortened so that loss of a resist film is reduced. As a result, a reduction in thickness (to 300 nm or less) of the resist film becomes possible so that pattern resolution and... Agent: Sughrue Mion, PLLC

20080305411 - Photomask blank, resist pattern forming process, and photomask preparation process: A photomask blank has a resist film comprising (A) a base resin, (B) an acid generator, and (C) a basic compound. The resist film further comprises (D) a polymer comprising recurring units having a side chain having a fluorinated hydrocarbon group which contains a carbon atom to which a hydroxyl... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080305414 - Single layered photoconductors containing needle shaped particles: A photoconductor that, for example, includes a supporting substrate, and a single layer thereover comprised of at least one photogenerating pigment, at least one charge transport component, needle shaped particles with, for example, an aspect ratio of from 2 to about 200, and an optional electron transport compound.... Agent: Patent Documentation Center

20080305415 - Photoconductors containing fillers: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, at least one charge transport layer comprised of at least one charge transport component, and an overcoating layer in contact with and contiguous to the top charge transport layer, and which overcoating is comprised of a polymer, an... Agent: Patent Documentation Center

20080305416 - Photoconductors containing fillers in the charge transport: A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, at least one charge transport layer comprised of at least one charge transport component and needle shaped particles with an aspect ratio of, for example, from 2 to about 200.... Agent: Patent Documentation Center

20080305417 - Monolayer type electrophotographic photoreceptor and electrophotographic device provided with the same: a monolayer type photoreceptor obtained by laminating a monolayer type photosensitive layer containing a charge generation material and a charge transport material on a conductive support, wherein the above monolayer type photosensitive layer comprises, as the above charge transport material; a hole transport material represented by the following formula (1)... Agent: Nixon & Vanderhye, PC

20080305418 - Monolayer type photoconductor and image forming device: Provided is a monolayer type photoconductor superior in sensitivity characteristics that allows reliable production by easy confirmation of the sensitivity characteristics, and an image forming device using such a monolayer type photoconductor. A monolayer type photoconductor including a base body and a single photo sensitive layer formed on the base... Agent: Casella & Hespos

20080305419 - Titanylphthalocyanine comprising specific polymorph and method for producing thereof, and electrophotographic photoreceptor comprising charge generating material thereof: The present invention can provide the above novel titanylphthalocyanine having superior photoreceptor characteristics, particularly superior chargeability and photosensitivity to those of the conventional titanylphthalocyanines, and a method for producing the present titanylphthalocyanine, as well as an electrophotographic photoreceptor comprising a charge generating material of the present titanylphthalocyanine, which has excellent... Agent: Birch Stewart Kolasch & Birch

20080305420 - Method and device for coating particles, and carrier for use in developer: A method for coating particles with a coating liquid including supplying airflow to fluidize the particles; mixing the coating liquid with a spray gas in a two-fluid spray nozzle to form a two-phase flow; and atomizing the two-phase flow with the spray gas to spray a mist of the coating... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305421 - Method for producing resinous particles: There is provided a method for producing resinous particles, containing: melting a mixture containing a binder resin and at least one additive having a melting point lower than T1/2 of the binder resin so as to prepare a molten material; atomizing resinous particles from the molten material in an atmosphere... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305422 - Carbon blacks, toners, and composites and methods of making same: A chemical toner is described as well as methods of preparing the same.... Agent: Robert J. Follett, Esq. Cabot Corporation

20080305423 - Toner, and developer, developing apparatus, process cartridge, image forming apparatus and image forming method: A toner that includes toner base particles including a binder resin and a colorant, wherein the toner base particles have a surface roughness (Ra) of 18 nm to 50 nm and a standard deviation (RMS) of the surface roughness of 0.5 nm to 9.9 nm. A developer, a developing apparatus,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305424 - Image forming apparatus, image forming method, and computer program product: A temperature detecting unit detects temperature of a fixing unit, and a control unit monitors temperatures detected by the temperature detecting unit. The control unit determines that the temperature detecting unit is abnormal when a first difference in temperatures in a first time period exceeds a first threshold.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305425 - Method for forming circuit pattern: A method for forming circuit patterns having different resistances. The method includes (1) a first step of forming a first toner image using a first toner and a second toner image using a second toner, each by electrophotography, the first toner containing a resistive material, the second toner having a... Agent: Ostrolenk Faber Gerb & Soffen

20080305426 - Image forming method and image forming apparatus: where, R1 and R2 may be the same or different from each other and each represent hydrogen atom, alkyl group, cycloalkyl group, or aralkyl group; R3 to R14 may be the same or different from each other and each represent hydrogen atom, halogen atom, cyano group, nitro group, amino group,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080305427 - Lithographic printing plate: It relates to a processless lithographic printing plate requiring no post treatments after exposure to laser, wherein a difference between the lightness (L*1) of a laser unexposed area and the lightness (L*2) of a laser exposed area after irradiation with laser is 10□(L*2−L*1)<100. An object of the present invention is... Agent: Birch Stewart Kolasch & Birch

20080305428 - Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer: A method in which a resist layer is applied to a base layer is disclosed. The resist layer includes an adhesive material, and the adhesive force of the adhesive material decreases or increases during an irradiation process. Residues of the resist layer may be stripped using the disclosed method.... Agent: Brinks Hofer Gilson & Lione/infineon Infineon

20080305429 - Resist composition and pattern forming method using the resist composition: A resist composition, includes: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a hydrophobic resin; and (D) a solvent, wherein a difference between a weight... Agent: Sughrue-265550

20080305430 - Photo-sensitive compound and photoresist composition including the same: wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl... Agent: Birch Stewart Kolasch & Birch

20080305431 - Pretreatment compositions: e

20080305433 - Positive resist composition and method of pattern formation with the same: A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group... Agent: Sughrue-265550

20080305432 - Positive resist composition and pattern-forming method: A positive resist composition includes: (A) a resin capable of increasing the solubility in an alkali developing solution by the action of an acid, including: (a1) a repeating unit selected from repeating units represented by specific formulae (a1-1) to (a1-3); (a2) a repeating unit represented by a specific formula (a2);... Agent: Sughrue-265550

20080305434 - Developing apparatus and developing method: A developing apparatus has a substrate holder to hold a substrate, a heater which is provided in a substrate holder, and heats a substrate on a substrate holder for processing a resist film by PEB, a cooler to cool a substrate on a substrate holder, a developing solution nozzle to... Agent: Smith, Gambrell & Russell

20080305435 - Method of making lithographic printing plate substrate and imageable elements: Aluminum-containing substrates having an anodic oxide layer are coated with a interlayer by carefully controlling the concentration of phosphonic acid groups in an interlayer polymer and aluminum (+3) concentration in a post-treatment solution. These substrates have improved hydrophilicity, lithographic printing ink repellency, and overall improved printability when used as part... Agent: Andrew J. Anderson Patent Legal Staff

20080305436 - Plate cutting: A method for cutting flexographic plates (10) while plate imaging process is performed is described. The method includes mounting a flexographic plate (10) on an imaging drum (30); imaging at least one graphical element or piece (11) on the flexographic plate; cutting the graphical piece using the imaging device (31);... Agent: David A. Novais Patent Legal Staff

20080305437 - Multi-layer mask method for patterned structure ethcing: A method for forming a patterned structure within a microelectronic structure uses a non-directly imageable organic material layer located over a substrate and a directly imageable inorganic material layer located upon the non-directly imageable organic material layer. The directly imageable inorganic material layer is directly imaged to form a patterned... Agent: Scully, Scott, Murphy & Presser, P.C.

20080305439 - Manufacturing method of optical waveguide: An optical waveguide production method for producing an optical waveguide comprising the steps of: forming an under-cladding layer and an alignment mark from the same material on a substrate; forming a thin metal film on the alignment mark; forming a first transparent photosensitive resin layer on the resultant substrate to... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080305438 - Method for fabricating polymer ridged waveguides by using tilted immersion lithography: This invention is a method for fabricating polymer ridged waveguides by using tilted immersion lithography. It includes the steps of: 1. preparing step; 2. calculating step; 3. first tilted immersion lithography step; 4. rotating 180-degree step; 5. second tilted immersion lithography step; and 6. finishing step. By these two tilted... Agent: Rosenberg, Klein & Lee

20080305440 - Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field: The present invention is directed to an apparatus for patterning a liquid on a substrate, with the apparatus including, a template having a pair of spaced-apart recessions with a protrusion disposed therebetween, with the protrusion being spaced-apart from the substrate a first distance and each of the pair of spaced-apart... Agent: Fish & Richardson P.C.

20080305441 - Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:... Agent: Lee & Morse, P.C.

20080305442 - Patterned material layer, method of forming the same, microdevice, and method of manufacturing the same: A formation method for a patterned material layer comprising a step of exposing a composite layer to light in a predetermined pattern, the composite layer including a first photosensitive resin layer, a protective film, and an upper resin layer; a step of partly removing the exposed composite layer so as... Agent: Oliff & Berridge, PLC

20080305443 - Pattern forming method using relacs process: A resist pattern is formed on a to-be-processed film. Ions are implanted in the upper surface of the resist pattern. After ion implantation, an organic film is formed to cover the resist pattern and heated. A crosslinked resin film made of the organic film which has crosslinked is formed on... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080305444 - Infrared encoding of security elements using standard xerographic materials with distraction patterns: The teachings as provided herein relate to a watermark embedded in an image that has the property of being relatively indecipherable under normal light, and yet decipherable under infrared illumination when viewed by a suitable infrared sensitive device. This infrared mark entails in combination with at least one distraction pattern,... Agent: Patent Documentation Center

20080299464 - Lengthy volume hologram layer transfer foil, method of producing volume hologram laminate using the same and volume hologram laminate: The present invention provides a lengthy volume hologram layer transfer foil capable of transferring a volume hologram layer continuously to a specified position of a transfer-receiving member. The above problem can be solved by a lengthy volume hologram layer transfer foil according to the present invention, the transfer foil is... Agent: Ladas & Parry LLP

20080299466 - Alternative phase-shifting mask and manufacturing method thereof: A method of manufacturing an alternative phase-shifting mask, includes forming first and second patterns on a transparent substrate to be adjacent to each other, the first and second patterns are transmittable and the second pattern having a recessed portion of the substrate for phase-shifting. A laser light is irradiated to... Agent: Young & Thompson

20080299465 - Frequency tripling using spacer mask having interposed regions: A method for fabricating a semiconductor mask is described. A semiconductor stack having a sacrificial mask comprised of a series of lines is first provided. A spacer mask having spacer lines adjacent to the sidewalls of the series of lines of the sacrificial mask is then formed. The spacer mask... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP

20080299467 - Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold: Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming... Agent: Staas & Halsey LLP

20080299468 - Shadow mask and method of fabricating vertically tapered structure using the shadow mask: A method of fabricating a vertically tapered structure. The method includes placing a spacer layer at a predetermined area on a wafer, placing a mask layer at a predetermined area on the spacer layer, and over-etching the spacer layer, by etching a certain area below the mask layer, fabricating a... Agent: Sughrue Mion, PLLC

20080299469 - Liquid crystal display panel and liquid crystal display apparatus having the same: A liquid crystal display panel includes a first substrate, a second substrate opposite the first substrate and a liquid crystal layer. The first substrate includes a lower substrate, a first buffer layer formed on the lower substrate and a first alignment layer formed on the first buffer layer. The first... Agent: Frank Chau, Esq. F. Chau & Associates, LLC

20080299470 - Adjusting the calibration of an imaging system: The calibration of an imaging system is adjusted for geometric distortion of an image formed by a group of imaging channels on a media supported on a media support. The media support includes a plurality of individually spaced reference features disposed on a surface of the media support and a... Agent: Frank Pincelli Patent Legal Staff

20080299471 - Carrier, developer, development device, image forming apparatus and image forming method: A carrier of the present invention is used in a developer including a toner which includes at least a binder resin and an organic colorant, and the carrier has a core and a coating formed on the surface of the core, the coating including (i) a charge control agent for... Agent: Nixon & Vanderhye, PC

20080299472 - Photoconductors: A coating composition that contains a mixture of an alkyl alcohol, a glycol monoether, a charge transport component, a crosslinking component, and at least one hydroxyl containing polymer, and a photoconductor thereof with a supporting substrate, a photogenerating layer, and at least one charge transport layer, and an overcoating layer... Agent: Patent Documentation Center

20080299473 - Method of manufacturing electrophotographic photoreceptor, electrophotographic photoreceptor, image-forming apparatus, and process cartridge: An aspect of the present invention provides a method of manufacturing an electrophotographic photoreceptor. The method includes forming at least one layer selected from the group consisting of an undercoat layer, a photosensitive layer, and a protective layer, by jetting by an inkjet method a first coating liquid and a... Agent: Oliff & Berridge, PLC

20080299474 - High quality substituted aryl diamine and a photoreceptor: A high quality hole transport material of a substituted biphenyl diamine, such as N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine, where each X is independently selected from —H, alkyl(-CnH2n+1), where n is from 1 to about 10 such as from 1 to about 5 or from 1 to about 6, aralkyl and aryl groups, the aralkyl... Agent: Oliff & Berridge, PLC.

20080299477 - Electrophotographic toner and method of manufacturing electrophotographic toner: An objective is to provide a toner and a method of manufacturing the toner by which a charging amount of toner is kept maintaining to be an appropriate value for a long duration, print images with no fog, together with high density obtained even after heavy-duty printing are obtained, and... Agent: Lucas & Mercanti, LLP

20080299475 - Developer for development of electrostatic image and production process thereof: A developer for development of electrostatic images, comprising colored particles containing a binder resin, a colorant and a parting agent, and an external additive, wherein the developer has properties that a work function is at least 5.70 eV; when excitation energy (eV) in the measurement of the work function is... Agent: Kratz, Quintos & Hanson, LLP

20080299476 - Toner formulation: The present disclosure relates to a method of forming a toner composition, and to a toner composition, that has a controlled particle size distribution, wherein the particle size distribution may be controlled by adjusting the concentration of a charge control additive in a chemical process of toner manufacture. The toner... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080299478 - Toner compositions: The present disclosure provides processes for reducing the particle size of latex resins and toners produced with such resins. In embodiments, a carboxylic acid may be added to materials utilized to produce a latex and reduce the particle size of the resulting latex particles and toner particles. In accordance with... Agent: Xerox Corporation (cdfs)

20080299479 - Toner compositions: Stabilizer compositions are provided having carboxylic acid groups. By esterifying some of the available carboxylic acid groups, the carboxylic acid number of the stabilizer may be adjusted. Such stabilizers may be utilized, in embodiments, for forming toner compositions.... Agent: Xerox Corporation (cdfs)

20080299481 - Liquid developer and image forming apparatus: A liquid developer includes: toner particles containing mainly a resin material, and a nonvolatile insulating liquid, the toner particles containing a liquid having a formulation that is different from the insulating liquid, and the liquid contained in the toner particles having an aniline point that is lower than that of... Agent: Hogan & Hartson L.L.P.

20080299480 - Liquid developer process for producing liquid developer, and image forming apparatus: A liquid developer includes toner particles containing mainly a resin material, and a nonvolatile insulating liquid, the toner particles containing therein a liquid constituting the insulating liquid.... Agent: Hogan & Hartson L.L.P.

20080299482 - Method of manufacturing aqueous dispersion of resin fine particles, aqueous dispersion of resin fine particles, method of manufacturing toner, and toner: A method of manufacturing an aqueous dispersion of resin fine particles, including: a mixing step of mixing an aqueous medium, a resin having an acid group, a basic substance, and a surfactant to obtain a mixture; an emulsification step of applying a shearing force to the mixture while heating at... Agent: Fitzpatrick Cella Harper & Scinto

20080299483 - Method for recycling an image-forming member: The present invention provides a method for recycling a spent image-forming member mounted inside an image-forming apparatus to reuse the image-forming member. In the method, the image-forming member is made of an elastomer before the image-forming member is recycled; and when a recycling work is performed, a surface of the... Agent: Birch Stewart Kolasch & Birch

20080299484 - Photoreceptors: Methods for making dispersions, which are of various rheologies, various pigment/binder ratios, various particle sizes, and possess less impurities or large particles are provided. These dispersions may be utilized to form layers of photoreceptors.... Agent: Xerox Corporation (cdfs)

20080299485 - Fluorochemical sulfonamide surfactants: Described are fluorochemical surfactants derived from nonafluorobutanesulfonyl fluoride that contain polyalkyleneoxy side chains and may be copolymerized with acrylic acid or methacrylic acid to form polyacrylates or polymethacrylates. The surfactants surprisingly lower the surface tension of water and other liquids in the same or similar low values achieved by premier... Agent: 3m Innovative Properties Company

20080299487 - Lithography material and lithography process: An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The additive may have a molecular weight that is less than about 1000 Dalton. The immersion lithography resist material may have a... Agent: Haynes And Boone, LLP

20080299486 - Patterned photoacid etching and articles therefrom: Provided is an article that comprises a substrate comprising an acid-etchable layer, a water-soluble polymer matrix, and a photoacid generator. Also provided is a method for patterning that can provide patterned layers that can be used to form electroactive devices.... Agent: 3m Innovative Properties Company

20080299488 - Negative-working imageable elements and methods of use: Negative-working imageable elements that can be imaged using infrared radiation comprise an imageable layer and a protective overcoat on a hydrophilic substrate. The imageable layer includes an IR-sensitive cyanine dye. The protective overcoat predominantly comprises one or more poly(vinyl alcohol) resins, each of which has a hydrolysis level of 85%... Agent: Patent Legal Staff Eastman Kodak Company

20080299489 - Ultraviolet curable coating fluid for printing systems: An ultraviolet curable coating fluid includes a polymerizable olefin monomer or monomer blend that undergoes self-photoinitiating polymerization when exposed to a predetermined ultraviolet wavelength range, and a predetermined amount of an ultraviolet absorbing image stabilizer that has minimal absorption in the predetermined ultraviolet wavelength range.... Agent: Hewlett Packard Company

20080299490 - Writing method and charged particle beam writing apparatus: A charged particle beam writing apparatus includes a stage on which a first mask substrate and a second mask substrate are arranged side by side, and a writing unit to write a first pattern on the first mask substrate and a second pattern, which complements the first pattern, on the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080299491 - Highly alkaline developer composition and methods of use: A highly alkaline developer composition includes an alkali silicate, an alkyl sulfate, and a water-soluble or water-dispersible polyhydroxy compound such as glycerin. The developer composition is useful for processing imaged elements to produce lithographic printing plates with reduced etching of the aluminum substrates that have been coated with hydrophilic polymers... Agent: Patent Legal Staff Eastman Kodak Company

20080299492 - Exposure method and electronic device manufacturing method: An exposure method for exposing a bright-dark pattern onto each exposure region of a substrate via a projection optical system includes a position detection process for detecting positions of a plurality of microscopic regions in a unit exposure field of the substrate, a deformation calculation step of calculating a state... Agent: Staas & Halsey LLP

20080299493 - Substrate processing apparatus and method of manufacturing device: An apparatus according to the present invention includes a vacuum chamber (5) and processes a substrate (4) in the vacuum chamber (5). The apparatus includes pumps (8A, 8B; 9A, 9B) which exhaust the vacuum chamber (5), a first cryopump (7A) accommodated in the vacuum chamber (5), a second cryopump (7B)... Agent: Morgan & Finnegan, L.L.P.

20080299494 - Double patterning with a double layer cap on carbonaceous hardmask: Methods to etch features in a substrate with a multi-layered double patterning mask. The multi-layered double patterning mask includes a carbonaceous mask layer, a first cap layer on the carbonaceous mask layer and a second cap layer on the first cap layer. After forming the multi-layered mask, a first lithographically... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP

20080299495 - Methods of fabricating metal contact structures for laser diodes using backside uv exposure: Methods of fabricating a metal contact structure for a laser diodes are provided, wherein the method comprises providing a UV transparent semiconductor substrate, a UV transparent semiconductor epilayer defining a ridge disposed between etched epilayer edges, the epilayer being disposed over the UV transparent semiconductor substrate, and a UV opaque... Agent: Corning Incorporated

20080299496 - Manufacturing apparatus and manufacturing method of light-emitting device: Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size... Agent: Cook, Alex, Mcfarron, Manzo, Cummings & Mehler, Ltd.

20080299497 - Method for manufacturing liquid discharge head: A manufacturing method of a liquid discharge head having therein liquid discharge ports and liquid flow passageways communicated with the discharge ports, includes: providing, by depositing, on a substrate, lamination of first and second material layers containing first and second positive type photosensitive resins, respectively, first material layer containing a... Agent: Fitzpatrick Cella Harper & Scinto

20080299498 - Method for manufacturing micro-lenses of image sensors: A method for manufacturing micro-lenses of image sensors includes providing a semiconductor substrate having at least a planarization layer, performing a first photolithography process to form a first set of micro-lens blocks on the planarization layer, performing a first baking process to form a first set of micro-lenses, performing a... Agent: North America Intellectual Property Corporation

20080299500 - Exposure apparatus and device manufacturing method: An exposure apparatus configured to expose resist which is coated on a wafer to light includes a station through which the wafer is transferred between an inside of the exposure apparatus and a coating/developing apparatus configured to coat the wafer with the resist and develop the resist coated on the... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080299499 - Exposure method, method of manufacturing plate for flat panel display, and exposure apparatus: An exposure method facilitating the formation of a fine pattern on a plate. The exposure method illuminates a mask with illumination light and exposes a plate using a mask pattern of the mask. The method includes scanning the plate relative to the mask in a scanning direction, which is an... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080299501 - Low cte photomachinable glass: The present invention describes a composition, method and article for a photomachinable glass having a coefficient of thermal expansion from less than 6×10−6/° C. in the temperature range of 0° C. to 300 ° C. The photomachinable glass composition is a low expansion glass having an amorphous glass phase and... Agent: Corning Incorporated

20080299502 - Coating and developing apparatus, operating method for same, and storage medium for the method: In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080299503 - Material for forming resist protection films and method for resist pattern formation with the same: The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the immersion exposure in a fluid (such as water) and the fluid from deterioration and improving the stability of a resist film in the... Agent: Knobbe Martens Olson & Bear LLP