|Radiation imagery chemistry: process, composition, or product thereof patents - Monitor Patents|
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Radiation imagery chemistry: process, composition, or product thereof November USPTO class listing 11/08Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/27/2008 > patent applications in patent subcategories. USPTO class listing
20080292975 - Device manufacturing method, method of making a mask, and mask: In a lithographic device manufacturing method, sub-resolution assist features are provided to equalize the intensities of the diffraction orders that form the image of the pattern on the substrate. In the case of bright lines against a dark field used with a positive tone resist for forming trenches at or... Agent: Pillsbury Winthrop Shaw Pittman, LLP
20080292974 - Exposure process and photomask set used therein: An exposure process is described, for defining in a photoresist layer a plurality of first patterns having a first pitch and a second pattern between them that is wider than one first pattern. A first exposure step is conducted to the photoresist layer with a first photomask that has a... Agent: J C Patents, Inc.
20080292973 - Method for etching using a multi-layer mask: A method of dry developing a multi-layer mask on a substrate is described. The method comprises forming the multi-layer mask on the substrate, wherein the multi-layer mask comprises a lithographic layer overlying a second mask layer. A feature pattern is then formed in the lithographic layer using a lithographic process,... Agent: Tokyo Electron U.s. Holdings, Inc.
20080292976 - Pattern forming method, pattern formed thereby, mold, processing apparatus, and processing method: A pattern forming method includes a step of forming a pattern of a resist on a surface of a thin film formed on the base material; a step of forming a reverse layer on the pattern of the resist; a step of forming a reverse pattern, of the reverse layer... Agent: Fitzpatrick Cella Harper & Scinto
20080292977 - Manufacturing method of semiconductor integrated circuit device: In the semiconductor integrated circuit device lithography process it is becoming more and more essential to control both exposure dose and focus value independently with a high accuracy. Using a wafer treated precedingly, a section profile of a photoresist is acquired by the technique of scatterometry, then both exposure dose... Agent: Miles & Stockbridge PC
20080292978 - Method for forming an electronic paper display: Methods form a multi-color electrophoretic display. The methods include providing microcapsules, wherein the microcapsules have an electrostatic charge, and wherein the microcapsules comprise, a shell that is transparent and a display medium within the shell, wherein the display medium is comprised of either (a) at least two sets of differently... Agent: Oliff & Berridge, PLC.
20080292979 - Transparent conductive materials and coatings, methods of production and uses thereof: Transparent conductive materials, articles and films are described herein a) that are easily and efficiently produced, b) can be produced prior to application or in situ, c) are easily applied to surfaces and substrates or formed into articles, d) can be produced and used with materials and methods that are... Agent: Honeywell International Inc.
20080292980 - Organic photoreceptor, image forming apparatus and process cartridge: Disclosed is an organic photoreceptor comprising on an electrically conductive support a light-sensitive layer and a surface layer, wherein the surface layer comprises a resin formed by curing a photocurable compound containing at least one polar group and at least one photocurable-functional group and a particulate metal oxide having a... Agent: Lucas & Mercanti, LLP
20080292982 - Photoconductors containing fluorogallium phthalocyanines: A photoconductor comprising an optional supporting substrate, a fluorogallium phthalocyanine containing photogenerating layer, and at least one charge transport layer.... Agent: Patent Documentation Center
20080292981 - Image bearing member and image forming apparatus using the same: This invention relates to image bearing member and an image forming apparatus that employs the image bearing member. The image bearing member contains an electroconductive substrate; a charge generation layer; a charge transport layer; a cross-linking surface protective layer, and a monomer having one radical polymerizable functional group with a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080292983 - Magnetic one-component toner for development of electrostatic latent image and image forming method: Disclosed is a magnetic one-component toner for development of an electrostatic latent image used in a magnetic one-component jumping development system in which a photoconductor is an a-Si photoconductor having a thickness of 30 μm or less and Rz of a developer carrier is from 2.0 to 6.0 μm. A... Agent: Clark & Brody
20080292984 - Process for preparing mixed color toner: a mixed color toner obtainable by the process; a two-component developer containing the toner; and a method of forming fixed images using the toner. The mixed color toner obtainable by the present invention is used for, for example, developing a latent image formed in electrophotography, electrostatic recording method, electrostatic printing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080292985 - Electrophotographic toner and method for producing the electrophotographic toner: The electrophotographic toner is produced by spray-drying a toner ingredient-containing liquid, wherein the toner ingredient-containing liquid dissolves or disperses at least a resin, a low molecular mass organic material, and a colorant in an organic solvent, the resin is soluble in the organic solvent, the low molecular mass organic material... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080292986 - Inkjet printhead and method of manufacturing the same: A method of manufacturing an inkjet printhead having a small thickness variation and having excellent durability, and an inkjet printhead manufactured by the same.... Agent: Stanzione & Kim, LLP
20080292987 - Antireflective coating composition comprising fused aromatic rings: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention... Agent: Sangya Jain Az Electronic Materials Usa Corp.
20080292988 - Resist composition and method of forming resist pattern: (wherein, R40 represents a hydrogen atom or an alkyl group; R41 represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, a carboxyl group or a hydroxyalkyl group; R42 and R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl... Agent: Knobbe Martens Olson & Bear LLP
20080292989 - Positive working photosensitive composition and pattern forming method using the same: A positive working photosensitive composition comprises: (A) a resin having a heterocyclic group containing plural sulfur atoms in a cyclic structure of the heterocyclic group, the resin decomposing by action of an acid to increase its solubility in an alkaline developer; and (B) a compound capable of generating an acid... Agent: Sughrue-265550
20080292990 - Electronic device manufacture: New methods are provided for manufacturing a semiconductor device. Preferred methods of the invention include depositing a photoresist on a semiconductor substrate surface followed by imaging and development of resist coating layer; applying a curable organic or inorganic composition over the resist relief image; etching to provide a relief image... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC
20080292991 - High fidelity multiple resist patterning: An integrated circuit fabrication process as described herein employs a double photoresist exposure technique. After creation of a first pattern of photoresist features on a wafer, a second photoresist layer is formed over the first pattern of photoresist features. The second photoresist layer is subjected to a reflow step that... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)
20080292992 - Photomask correcting method and manufacturing method of semiconductor device: A writing pattern data generating method for, in order to form a first photomask for use in a manufacturing method of a semiconductor device which including forming a first resist pattern on a mask film formed on a first film using the first photomask, forming a first mask pattern by... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
20080292993 - Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof: A liquid discharge head having a substrate provided with energy generating elements for generating energy to discharge a liquid, discharge portions including discharge ports for discharging the liquid, and flow paths supplying the liquid to the discharge portions and a method for its manufacture are provided. The method includes the... Agent: Fitzpatrick Cella Harper & Scinto
20080292994 - Transfer method, transfer apparatus, and method of manufacturing organic light emitting element: The present invention provides a transfer method and a transfer apparatus capable of making the shape and quality of a transferred layer uniform and a method of manufacturing an organic light emitting element. A transfer method includes a step of disposing a transfer substrate and an acceptor substrate so as... Agent: Sonnenschein Nath & Rosenthal LLP
20080292995 - Antireflective coating composition comprising fused aromatic rings: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention... Agent: Sangya Jain Az Electronic Materials Usa Corp.
20080292996 - Method for producing a high resolution resist pattern on a semiconductor wafer: In one disclosed embodiment, a method for producing a high resolution resist pattern on a semiconductor wafer comprises depositing a blanket layer of material on a semiconductor wafer, forming a resist interaction substrate on the blanket layer of material, forming a resist layer of a pre-determined thickness on the resist... Agent: Farjami & Farjami LLP
20080292997 - Method of developing photosensitive material and method of producing conductive layer-attached film: An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates... Agent: Young & Thompson11/20/2008 > patent applications in patent subcategories. USPTO class listing
20080286658 - Holographic recording medium and method of manufacturing holographic recording medium: A holographic recording medium with a plurality of layers including a recording layer, on which are recorded interference patterns generated by interference of information light and reference light. The recording layer is attached to at least one adjacent layer with adhesive.... Agent: Sughrue Mion, PLLC
20080286660 - Damascene reticle and method of manufacture thereof: A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing... Agent: Graham S. Jones, Ii
20080286659 - Extensions of self-assembled structures to increased dimensions via a \"bootstrap\" self-templating method: Methods for fabricating sublithographic, nanoscale arrays of openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Embodiments of the invention use a self-templating or multilayer approach to induce ordering of a self-assembling block copolymer film to an underlying base film to... Agent: Whyte Hirschboeck Dudek S.c. Intellectual Property Department
20080286664 - Full phase shifting mask in damascene process: A full phase shifting mask (FPSM) can be advantageously used in a damascene process for hard-to-etch metal layers. Because the FPSM can be used with a positive photoresist, features on an original layout can be replaced with shifters on a FPSM layout. Adjacent shifters should be of opposite phase, e.g.... Agent: Bever Hoffman & Harms, LLP
20080286663 - Mask and manufacturing method thereof: A blank mask is provided. The blank mask includes a mask layer disposed on a transparent quartz substrate, and a nano inorganic material-polymer complex layer. The nano inorganic material-polymer complex layer has nano-scale components and is formed on a surface of the mask layer to adsorb a residual contamination source... Agent: Marshall, Gerstein & Borun LLP
20080286662 - Photomask producing method and photomask blank: In a photomask blank serving as a base member for producing a halftone-type phase shift mask in which a light-transmissive substrate is formed thereon with a light-semitransmissive phase shift pattern having a desired opening, a light-semitransmissive phase shift film, a chromium film, and an etching mask film are stacked in... Agent: Sughrue Mion, PLLC
20080286661 - Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method: A mask pattern including a light-shielding portion 101 and a semi-light-shielding portion 102 is provided on a transparent substrate 100 having a transparent property against exposing light so as to be surrounded with a transparent portion 104. The semi-light-shielding portion 102 is disposed in an outer region of the mask... Agent: Mcdermott Will & Emery LLP
20080286665 - Color filter and method for producing the same: The present invention provides a method for producing a color filter, the method including: applying an adhesion auxiliary agent onto an inorganic material; forming a curable layer on the inorganic material to which the adhesion auxiliary agent has been applied by applying a curable pigment composition containing an organosilane compound... Agent: Sughrue Mion, PLLC
20080286666 - Color filter and method of producing same: To achiever the object, the invention provides a method of producing a color filter, comprising: a liquid repellent colored layer forming step of forming, on a substrate, a plurality of liquid repellent colored layers having liquid repellency at predetermined intervals; and a light shielding part forming step of coating a... Agent: Ladas & Parry LLP
20080286667 - Overlay management method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, device manufacturing system and device manufacturing method, and program and information recording medium: In repeated processes (steps 201 to 213) of lot processing, an analytical apparatus detects abnormality of overlay, that is, deterioration of overlay accuracy in step 211 and optimizes an apparatus parameter of an exposure apparatus so that the abnormality is solved (so that the overlay accuracy is improved), and then... Agent: Staas & Halsey LLP
20080286668 - Two-component developer, replenishing developer, and image-forming method: An object of the present invention is to provide a two-component developer which can achieve a high-definition image with a smaller toner laid-on level than a conventional one, provides a color gamut comparable to that of printing, can respond to an increase in printing speed, and allows an image with... Agent: Fitzpatrick Cella Harper & Scinto
20080286669 - Photoconductors: A photoconductor that includes a supporting substrate, a first photogenerating layer, a second photogenerating layer and at least one charge transport layer. The first photogenerating layer contains, for example, a phthalocyanine pigment, and the second photogenerating layer contains a different phthalocyanine pigment than the first photogenerating layer phthalocyanine.... Agent: Patent Documentation Center
20080286671 - Electrophotographic photoreceptor containing enamine compound, image formation apparatus provided with the same, enamine compound and method for producing the same: An electrophotographic photoreceptor comprising laminating a monolayer type photosensitive layer containing a charge generation material and a charge transport material or a laminate type photosensitive layer obtained by laminating a charge generation layer containing a charge generation material and a charge transport layer containing a charge transport material in this... Agent: Nixon & Vanderhye, PC
20080286670 - Photoconductors containing charge transport chelating components: A photoconductor that includes an optional supporting substrate, a photogenerating layer, and at least one charge transport layer, and wherein the charge transport layer contains a phenolic chelating additive.... Agent: Patent Documentation Center
20080286672 - Electrophotographic photoreceptor, method for manufacturing the same, and image-forming apparatus using same: The invention relates to an electrophotographic photoreceptor in which protrusions from the surface of the photoreceptor are partly or completely covered by a resin. The effect of such resin covering is to reduce toner deposition, thereby reducing or eliminating spotting defects in images formed using the electrophotographic photoreceptor. The invention... Agent: Birch Stewart Kolasch & Birch
20080286673 - Single layer type electrophotographic photoconductor and image forming device: The present invention provides a single layer type electrophotographic photoconductor which exhibits the small number of generated black spots in a formed image and exhibits the excellent sensitivity characteristic even when the photoconductor is used for a long time or a photoconductor drum is rotated at a high speed and... Agent: Arthur G. Schaier Carmody & Torrance LLP
20080286675 - Method of producing polymerized toner, method of producing binder resin for toner, and toner: The method of producing polymerized toner, the method including: dispersing a polymerizable monomer composition containing at least a polymerizable monomer and a colorant in an aqueous medium; and polymerizing the polymerizable monomer in the aqueous medium with a polymerization initiator to produce toner particles, and is characterized in that a... Agent: Fitzpatrick Cella Harper & Scinto
20080286674 - Toner and method for producing the same: A method for producing a toner is described. The method for producing a toner may include the steps of: preparing a resin solution by mixing a binder resin, a colorant and a wax into an organic solvent; preparing an emulsion by heating the resin solution and an aqueous medium to... Agent: Banner & Witcoff, Ltd. Attorneys For Client Nos. 0166889, 006760
20080286676 - Magnetic toner: A magnetic toner having magnetic toner particles each containing at least a binder resin and a magnetic iron oxide particle, in which: when a solution is prepared by dissolving the magnetic iron oxide particles in an acidic aqueous solution and an Fe element amount in a solution in which all... Agent: Fitzpatrick Cella Harper & Scinto
20080286677 - Toner for developer: Disclosed is a toner for a developer comprising cylindrical toner particles formed of a toner composition containing at least a binder resin and a releasant as toner components, and an external additive, wherein the cylindrical toner particles have an average circularity of 0.880 or more and 0.930 or less.... Agent: Casella & Hespos
20080286678 - Developing agent: A developing agent including a core containing an amorphous polyester resin and a fatty acid ester based wax, a shell provided on the surface of the core and containing a copolymer of an aromatic vinyl monomer and acrylic acid or an acrylic ester, and a coloring agent.... Agent: Amin, Turocy & Calvin, LLP
20080286680 - Method and apparatus for manufacturing toner and toner manufactured by the apparatus and method: A method for manufacturing a toner, including periodically forming liquid droplets of a toner constituent liquid comprising a resin and a colorant by vibrating a thin film having a plurality of holes provided on a retention part thereof to discharge the liquid droplets of the toner constituent liquid from the... Agent: Cooper & Dunham, LLP
20080286679 - Toner preparation method and apparatus, and toner prepared thereby: A method of preparing a toner, including periodically dripping and discharging droplets of a toner constituent liquid comprising a resin and a colorant with a dripper comprising a thin film comprising plural nozzles configured to discharge the droplets, and an electromechanical converter configured to oscillate the thin film; and solidifying... Agent: Cooper & Dunham, LLP
20080286681 - Structured thermal transfer donors: A laser induced thermal imaging (LITI) donor film having a substrate, a light-to-heat conversion layer overlaying the substrate, and a transfer layer overlaying the light-to-heat conversion layer. A surface of the transfer layer includes microstructured or nanostructured features, in a continuous or discontinuous pattern, embossed or otherwise imparted in the... Agent: 3m Innovative Properties Company
20080286683 - Composite structures to prevent pattern collapse: A method and a structure. The structure includes: a solid core comprising a first photoresist material, the core having a bottom surface on a substrate, a top surface and opposite first and second side surfaces between the top surface and the bottom surface; and a shell comprising a second photoresist... Agent: Schmeiser, Olsen & Watts
20080286682 - Material and method for photolithography: A photosensitive material for use in semiconductor manufacture comprises a copolymer that includes a plurality of photoresist chains and a plurality of hydrophobic chains, each hydrophobic chain attached to the end of one of the photoresist chains. The copolymer in response to externally applied energy will self-assemble to a photoresist... Agent: Haynes And Boone, LLP
20080286685 - Planographic printing plate precursor and printing method using the same: In Formula (I), at least one of R1 to R3 represents —(CH2CH2O)n—R4, while the remainder of R1 to R3 respectively independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or R5—COOH; R4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon... Agent: Birch Stewart Kolasch & Birch
20080286686 - Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application: The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and... Agent: Scully, Scott, Murphy & Presser, P.C.
20080286687 - Chemically amplified resist material, topcoat film material and pattern formation method using the same: A resist film made of a chemically amplified resist material including a polymer; a photo-acid generator and carbamoyl oxime is formed on a substrate. Subsequently, pattern exposure is performed by selectively irradiating the resist film with exposing light. After the pattern exposure, the resist film is baked, and the baked... Agent: Mcdermott Will & Emery LLP
20080286689 - Antireflective coating compositions: The present invention relates to antireflective coating compositions.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.
20080286688 - Photosensitive resin composition and cured product thereof: wherein n is an average value of 1 to 20; R1 and R2 may be the same or different, and are each a hydrogen atom, a halogen atom or a C1 to C4 lower alkyl group; R3, R5, R8 and R10 may be the same or different, and are each... Agent: Nields & Lemack
20080286690 - Thiol compound and photosensitive composition using the same: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent... Agent: Sughrue Mion, PLLC
20080286691 - Chemically amplified positive resist composition: e
20080286692 - Photosensitve laminate: A photoresist laminate structure comprising at least one photosensitive resist layer and a polymeric layer bound to the photosensitive resist layer is disclosed, wherein the polymeric layer is substantially impermeable to water.... Agent: Pauly, Devries Smith & Deffner, L.L.C.
20080286693 - Sulfonate derivatives and the use thereof as latent acids: wherein n is 1 or 2; m is 0 or 1; X0 is —[CH2]h—X or —CH═CH2; h is 2, 3, 4, 5 or 6; R1, when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted... Agent: Joann Villamizar Ciba Corporation/patent Department
20080286695 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP
20080286694 - Method to obtain a positive-working thermal lithographic printing master: A positive-working photosensitive composition for use in making an imageable element comprises one or more vinyl copolymers wherein said vinyl copolymer are homopolymer or copolymer containing monomers comprising at least two functional groups such as HOOC—C═C—CONH—R, and may further comprise a converter substance for converting radiation into heat. The converter... Agent: Yisong Yu
20080286696 - Method for manufacturing multilayer printed wiring board: In one embodiment, the invention has a step of forming an inner layer circuit pattern portion and a lead pattern portion, a step of forming a dummy pattern that indicates the range of the lead pattern portion on the outer layer base material, a step of forming an interlayer adhesive... Agent: Birch Stewart Kolasch & Birch
20080286697 - Method and apparatus for processing a wafer:
20080286698 - Semiconductor device manufacturing methods: Methods for manufacturing semiconductor devices are disclosed. One preferred embodiment is a method of processing a semiconductor device. The method includes providing a workpiece having a material layer to be patterned disposed thereon. A masking material is formed over the material layer of the workpiece. The masking material includes a... Agent: Slater & Matsil LLP
20080286700 - High resolution patterning of surface energy utiliizing high resolution monomolecular resist for fabrication of patterned media masters: A method for patterning and forming very small structures on a substrate such as a wafer. The process uses a difference in surface energy between a mask and the substrate to selectively deposit a hard mask material such as a metal onto the surface of the substrate. The mask can... Agent: Zilka-kotab, PC- Hit
20080286699 - Reticles, and methods of treating reticles, configuring reticles and using reticles: Some embodiments include methods of treating reticles to provide backside masking across regions of the reticle to compensate for problems occurring during photolithographic processing. The problems may be, for example, defects in the reticle, problems associated with deposition or development of photoresist, or problems associated with substrate topography. The masking... Agent: Wells St. John P.s.
20080286701 - Method for kinetically controlled etching of copper: An etching composition, particularly for kinetically controlled etching of copper and copper alloy surfaces; a process for etching copper and copper alloys, particularly for etching at high rates to provide uniform and smooth, isotropic surfaces; an etched copper or copper alloy surface obtained by the process; and a process for... Agent: Connolly Bove Lodge & Hutz LLP (for IBM Yorktown)
20080280214 - Method for fabricating photo mask: In a method for fabricating a photo mask, first resist patterns are formed on a transparent substrate where a light blocking layer and a phase shift layer are formed. Line widths of the first resist patterns are measured to define a region requiring a line width correction. Second resist patterns... Agent: Marshall, Gerstein & Borun LLP
20080280212 - Method for photomask fabrication utilizing a carbon hard mask: Methods for forming a photomask using a carbon hard mask are provided. In one embodiment, a method of forming a photomask includes etching a chromium layer through a patterned carbon hard mask layer in the presence of a plasma formed from a process gas containing chlorine and carbon monoxide.... Agent: Patterson & Sheridan, LLP - - Appm/tx
20080280213 - Method of fabricating a mask for a semiconductor device: In a method of fabricating a mask for a semiconductor device, a phase shift layer and a light blocking layer are formed on a transparent substrate. The light blocking layer is patterned to form light blocking patterns which partially expose a surface of the phase shift layer. An extension defect... Agent: Townsend And Townsend And Crew, LLP
20080280216 - Method of forming a hard mask pattern in a semiconductor device: In a method of forming hard mask patterns in a semiconductor device, an etch mask has a pitch less than a resolution limitation of exposure equipment. The method includes forming first hard mask patterns through an exposure process utilizing photoresist patterns, forming a separation layer on a resulting structure including... Agent: Townsend And Townsend And Crew, LLP
20080280215 - Method of forming photomask of semiconductor device: A method of forming a photomask of a semiconductor device includes depositing a first phase shift layer, a light blocking layer, and a second phase shift layer on a transparent substrate, and then a first photoresist pattern is formed to expose a region on an upper surface of the second... Agent: Marshall, Gerstein & Borun LLP
20080280217 - Patterning a single integrated circuit layer using multiple masks and multiple masking layers: A multiple mask and a multiple masking layer technique can be used to pattern a single IC layer. A resolution enhancement technique can be used to define one or more fine-line patterns in a first masking layer, wherein each fine-line feature is sub-wavelength. Moreover, the pitch of each fine-line pattern... Agent: Bever, Hoffman & Harms, LLP
20080280218 - Toner, as well as image forming apparatus and image forming method using the same: To provide a toner produced by emulsifying or dispersing in an aqueous medium particles containing at least polyester resin particles and by aggregating the polyester resin particles, wherein the polyester resin particles contain a polyester resin, the polyester resin is produced by condensation polymerization of an alcohol component containing 65... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080280219 - Toner, image forming apparatus, image forming method, and process cartridge using the toner: The present invention provides a toner containing at least a binder resin, a releasing agent, and a colorant, wherein the binder resin contains at least a polyester resin (A) having a softening point Tm(A) of 120° C. to 160° C., a polyester resin (B) having a softening point Tm(B) of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080280220 - Electrophotographic imaging member and method of making same: Disclosed herein is an electrophotographic imaging member comprising a substrate, and a charge generating layer containing a phthalocyanine pigment, a binder, and a solvent. The charge generating layer has a pigment particle separation distance of 28 nm or less after evaporation of the solvent. A coating system, a method of... Agent: Alix, Yale & Ristas, LLP
20080280221 - Electrophotographic photoreceptor, and image forming apparatus and process cartridge using the same: An electrophotographic photoreceptor including a conductive substrate; and a photosensitive layer located overlying the conductive substrate, including a charge generation material, an electron transport material having a specific formula, and a hole transport material having a specific formula.... Agent: Cooper & Dunham, LLP
20080280222 - Imaging member: The presently disclosed embodiments are directed to charge transport layers useful in electrostatography. More particularly, the embodiments pertain to an improved electrostatographic imaging member having a specific photoreceptor material package comprising an undercoat layer, a charge generation layer comprising a single pigment in binder and having a narrow particle separation... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20080280223 - Process for preparing organic photosensitive pigment: Processes for making photosensitive organic pigments for use in imaging members, specifically processes for making photosensitive phthalocyanine pigments having a specific nanocrystal form. Embodiments include a copper phthalocyanine nanocrystal with good charge generation for use in the formulation of a charge generating layer and narrow particle size distribution.... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation
20080280224 - Carrier and method for producing the same, developer and image forming method: To provide a method for producing a carrier including treating a coating layer on a surface of a core material with a polymer precursor in a supercritical fluid and/or a subcritical fluid so as to add the polymer precursor to the coating layer, and subjecting the coating layer to oxidation... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080280225 - Image developing method, image developing device, and image forming device: An image developing method is disclosed that is able to efficiently remove degraded toner on a developing agent carrier, prevent formation of abnormal images, ensure good image quality over time, and increase the service life of the device. The developing method includes a step of calculating an amount of consumption... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20080280226 - Polyimide film, image-forming apparatus, method for producing the polyimide film, and method for producing the intermediate transfer belt: in a weight-decrease vs. temperature-increase curve when the polyimide film is heated gradually from 30° C., a weight-decrease rate at a first inflection point, where an amount of difference in weight-decrease rates decreases first from 30° C., is in the range of −1.9% or more and −1.4% or less.... Agent: Oliff & Berridge, PLC
20080280227 - Exposing printing plates using light emitting diodes: Particular embodiments include method embodiments and apparatus embodiments. One method embodiment comprises: placing a printing plate on an imaging device; imaging the plate according to imaging data; and applying UV radiation using a plurality of UV emitting LEDs during the process of imaging of the printing plate. In one embodiment,... Agent: Dov Rosenfeld
20080280228 - Photosensitive planographic printing plate: A photosensitive planographic printing plate comprising a substrate and a photosensitive layer including a photopolymerizable compound, wherein the photosensitive layer and the substrate are provided between them with an undercoat layer including a (co)polymer having structural units having ethylenically unsaturated groups bonded with silicon atoms and phosphonic acid groups.... Agent: Eastman Kodak Company Patent Legal Staff
20080280229 - Negative-working imageable elements and methods of use: A radiation-sensitive composition includes a radically polymerizable component, initiator composition, a radiation absorbing compound, and a polymeric binder having recurring units that are derived from various ethylenically unsaturated polymerizable monomers provided that at least 40 mol % of the recurring units have a tertiary carbon atom in the backbone and... Agent: Andrew J. Anderson Patent Legal Staff
20080280231 - Bounce drive actuator and micromotor: Provided is the design and fabrication of the novel bounce drive actuator (BDA) for the development of a new-type micro rotary motor. Although the scratch drive actuator (SDA) micro motor has been developed more than one decade, such device has limited commercial applications due to its shorter lifetime, high power... Agent: Bacon & Thomas, PLLC
20080280230 - Photolithography process including a chemical rinse: The present disclosure provides a plurality of methods of performing a lithography process. In one embodiment, a substrate including a layer of photoresist is provided. The layer of photoresist is exposed. The exposed layer of photoresist is developed. A chemical rinse solution is applied to the developed photoresist. The chemical... Agent: Haynes And Boone, LLP
20080280232 - Method of forming pattern of semiconductor device: The present invention relates to a method of forming a pattern of a semiconductor device. According to the method in accordance with an aspect of the present invention, a photoresist film is formed on a semiconductor substrate. An exposure process is performed on a plurality of light transparent patterns arranged... Agent: Townsend And Townsend And Crew, LLP
20080280233 - Method for deactivating on-press developable lithographic printing plate: A method of deactivating an on-press ink and/or fountain solution developable lithographic printing plate is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser,... Agent: Gary Ganghui Teng
20080280234 - Method of forming visible image for on-press developable lithographic printing plate: A method of forming visible image on an on-press developable lithographic printing plate is described. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is imagewise exposed with a radiation, overall treated with... Agent: Gary Ganghui Teng
20080280235 - Non-aqueous photoresist stripper that inhibits galvanic corrosion: Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous, non-corrosive cleaning compositions that resist galvanic corrosion when used on stacked layer structures of different types of metals at a surface of an electronic device. Such non-aqueous photoresist strippers and cleaning compositions comprise: (a) at least one polar... Agent: Mallinckrodt Inc.11/06/2008 > patent applications in patent subcategories. USPTO class listing
20080274414 - High-transmission attenuating psm: An attenuating PSM includes a quartz substrate, a first dummy pad pattern disposed on the quartz substrate, wherein the first dummy pad pattern is composed of a first phase shifter material layer with a transmission rate of greater than or equal to 15%, and a first opaque pattern disposed at... Agent: North America Intellectual Property Corporation
20080274415 - Layout method for mask: A layout method for a mask can include creating dummy pattern inhibiting regions and a single dummy pattern type for a layer. A cell can be formed in which a first main pattern is formed. A second main pattern can be formed in a main chip layout, and the cell... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association
20080274416 - Layout method for mask: A layout method for a mask can include creating dummy pattern inhibiting regions and a single dummy pattern type for a layer. A cell can be formed in which a first main pattern is formed. A second main pattern can be formed in a main chip layout, and the cell... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association
20080274413 - Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers: Methods for fabricating sublithographic, nanoscale microchannels utilizing an aqueous emulsion of an amphiphilic agent and a water-soluble, hydrogel-forming polymer, and films and devices formed from these methods are provided.... Agent: Whyte Hirschboeck Dudek S.c.
20080274417 - Variable mask field exposure: A method of fabricating integrated circuits according to a first design. One first pattern is common with a second design, and one second pattern is unique to the first design. The first pattern is imaged using a first mask having first patterns formed in a block thereon. No other patterns... Agent: Lng/lsi Joint Customer C/o Luedeka, Neely & Graham, P.C.
20080274418 - Photoconductors: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer of at least one charge transport component, and wherein the charge transport layer contains a charge blocking agent, such as a benzoimidazole.... Agent: Patent Documentation Center
20080274419 - Photoconductors: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the photogenerating layer contains a photogenerating pigment or pigments, and a bis(pyridyl)alkylene.... Agent: Patent Documentation Center
20080274420 - Adhesion promoter: An adhesion promoter for a hot melt adhesive or a pressure sensitive adhesive prepared by admixing a silane composition with an aqueous buffer solution, where the silane composition includes at least two silane compounds. The adhesive is able to bind at very low surface free energy substrates, such as Xerographic... Agent: Oliff & Berridge, PLC.
20080274421 - Photosensitive composition and pattern forming method using the same: A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined... Agent: Sughrue-265550
20080274422 - Preparation process of chemically amplified resist composition: Provided are a preparation method of a resist composition which enables stabilization of a dissolution performance of a resist film obtained from the resist composition thus prepared; and a resist composition obtained by the preparation process and showing small lot-to-lot variations in degradation over time. The process of the present... Agent: Myers Bigel Sibley & Sajovec
20080274423 - Optical information recording medium and method of recording information: The optical information recording medium comprises a recording layer on a support, wherein the recording layer comprises a dye having a film-softening temperature of equal to or higher than 290° C.... Agent: Sughrue Mion, PLLC
20080274424 - Positive photosensitive element comprising vinyl polymers: A positive-working photosensitive composition for use in making an imageable element comprises one or more vinyl copolymers wherein said vinyl copolymer are homopolymer or copolymer containing monomers comprising at least two functional groups such as HOOC—C═C—CONH—R, and may further comprise a converter substance for converting radiation into heat. The converter... Agent: Yisong Yu
20080274425 - Positive working light sensitive planographic printing plate material: Disclosed is a positive working light sensitive planographic printing plate material comprising an aluminum support and provided thereon, a lower layer and an upper layer in that order, at least one of the upper and lower layers containing a fluoroalkyl group-containing acryl resin, wherein the upper layer contains an alkali... Agent: Lucas & Mercanti, LLP
20080274426 - Chemically amplified resist composition: s
20080274427 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor comprising including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support, including a photopolymerizable layer and, optionally, an intermediate... Agent: Agfa C/o Keating & Bennett, LLP
20080274428 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, a top layer and, optionally,... Agent: Agfa C/o Keating & Bennett, LLP
20080274429 - Aqueous treatment of on-press developable lithographic printing plate: A method of treating an on-press developable lithographic printing plate with an aqueous treating solution after imagewise exposure and before on-press development is described. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate... Agent: Gary Ganghui Teng
20080274430 - Uv radiation blocking protective layers compatible with thick film pastes: This invention relates to novel compositions comprising a protective polymer layer and a UV blocking agent. This is used in the fabrication of electronic devices using thick film pastes. The present invention is also an electronic device fabrication process using the compositions. The protective polymer layer is fabricated from materials,... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center
20080274431 - Resist pattern swelling material, and method for patterning using same: To provide a method for easily forming microscopic patterns exceeding the limit of exposure in the patterning technique utilizing the photolithography method in the vacuum deep ultraviolet ray region, a resist pattern swelling material is comprised by mixing a water-soluble or alkali-soluble composition comprising a resin and a cross linking... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20080274432 - Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method: A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst, (A-2) a silicon-containing compound obtained through hydrolytic condensation of a hydrolyzable silicon compound in the presence of a base... Agent: Birch Stewart Kolasch & Birch
20080274433 - Rinse treatment method and development process method: A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.Previous industry: Chemistry: electrical current producing apparatus, product, and process
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