Radiation imagery chemistry: process, composition, or product thereof inventions 10/08

20080261118 - Optical recording composition and holographic recording medium: In General Formula (I), R1 denotes an alkylene group or arylene group, R2 denotes an alkyl group, aryl group, or heterocyclic group, X denotes a divalent linking group selected from the group consisting of —COO—, —CONH—, —OCO—, —NH—, —O—, —S—, —CO—, —SO2—, —SO3—, and —SO2NH—, n and m each independently... Agent: Sughrue Mion, PLLC

20080261119 - Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method: A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from... Agent: Birch Stewart Kolasch & Birch

20080261128 - Methods and structures for protecting one area while processing another area on a chip: Increased protection of areas of a chip are provided by both a mask structure of increased robustness in regard to semiconductor manufacturing processes or which can be removed with increased selectivity and controllability in regard to underlying materials, or both. Mask structures are provided which exhibit an interface of a... Agent: Whitham, Curtis & Christofferson, P.C.

20080261120 - Photolithography mask with integrally formed protective capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261122 - Photolithography mask with protective capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261121 - Photolithography mask with protective silicide capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261124 - Photomask reticle for use in projection exposure, and manufacturing methods therefor and for semiconductor device: A photomask reticle is provided for use in projection exposure which forms a resist pattern on a workable film formed over a semiconductor substrate, comprising area 1 in which a main pattern is formed, area 2 formed around area 1, area 3 formed around area 2, and area 4 formed... Agent: Mcginn Intellectual Property Law Group, PLLC

20080261123 - Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same: A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicating with external equipment for the integrated circuit production, a computational processor... Agent: Amster, Rothstein & Ebenstein LLP

20080261127 - Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same: A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate... Agent: Amster, Rothstein & Ebenstein LLP

20080261125 - Resist pattern and reflow technology: A reflow stabilizing solution for treating photoresist patterns and a reflow technology are disclosed. The reflow stabilizing solution comprises a polymer and is applied after the photoresist material has been developed and patterned. By treating the photoresist with the reflow stabilizing solution after resist patterning and further subjecting the reflow... Agent: Dickstein Shapiro LLP

20080261126 - Secure photomask with blocking aperture: A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask.... Agent: Amster, Rothstein & Ebenstein LLP

20080261129 - Selective surface treatment method using block copolymer, black matrix and method of manufacturing the same, and nozzle plate and method of manufacturing the same: A selective surface treatment method using a block copolymer, a black matrix and a method of manufacturing the same, and a nozzle plate and a method of manufacturing the same are provided. According to the selective surface treatment method, a block copolymer layer including a hydrophilic polymer block and a... Agent: Stanzione & Kim, LLP

20080261130 - Process for a thermal transfer of a liquid crystal film using a transfer element: The invention relates to a laser-induced process that employs a transfer element comprising a liquid crystal material for a thermal transfer onto a receiving surface. The process is suitable for generating markings with various appearance or optical effects on a surface of choice. The transfer element comprises a light-to-heat conversion... Agent: Millen, White, Zelano & Branigan, P.C.

20080261134 - Developing apparatus, developing method and image forming apparatus: A developing apparatus, a developing method and an image forming apparatus are provided in which reduction in the quantity of development is prevented in the case where a micro particle diameter toner is used. The developing apparatus uses a developer containing a toner and supplies the toner to an image... Agent: Amin, Turocy & Calvin, LLP

20080261132 - Resin for electrostatic-image-developing toner, electrostatic-image-developing toner, electrostatic image developer, method for forming image, and image-forming apparatus: A resin for an electrostatic-image-developing toner includes a polyester resin; a vinyl polymer resin obtained by polymerization of a radically polymerizable vinyl monomer; and at least one of a nitroxide compound and a reaction product of a nitroxide compound and an acid.... Agent: Oliff & Berridge, PLC

20080261133 - Resin for electrostatic-image-developing toner, electrostatic-image-developing toner, electrostatic image developer, method for forming image, and image-forming apparatus: A resin for an electrostatic-image-developing toner includes a graft polymer, wherein the graft polymer has a polyester structure in the main chain thereof; the graft polymer includes monomer units derived from vinyl monomers in the side chains thereof; and at least a part of the monomer units have a residue... Agent: Oliff & Berridge, PLC

20080261131 - Toner, image forming apparatus using the same, image forming method using the same, and process cartridge: A toner that is excellent in low-temperature fixing property, offset resistance, storage stability, charge rising property, charge stability with time and pulverizability and allows for forming high-quality images over a long period of time. The toner contains at least a binder resin, a colorant and a charge controlling agent, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080261136 - Electrophotographic photoreceptor, process cartridge and image-forming apparatus: An electrophotographic photoreceptor includes a conductive substrate; and a photosensitive layer that includes a phthalocyanine pigment, a charge-transporting substance and at least one kind of lignophenol derivative.... Agent: Oliff & Berridge, PLC

20080261135 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer provided on or above the conductive support, the photosensitive layer having an outermost layer comprising a cured product of a composition comprising a curable resin, a surfactant containing a fluorine atom, and a charge transporting organic compound having a... Agent: Oliff & Berridge, PLC

20080261141 - Magenta toner for developing electrostatic image: A magenta toner for developing an electrostatic image composed of a binder and a colorant is disclosed. The toner contains a tone controlling agent having a peak of fluorescent spectrum from 380 to 500 nm. An image excellent in light fastness and durability can be obtained and high color reproducibility... Agent: Lucas & Mercanti, LLP

20080261137 - Charge control agent and toner comprising the same: Discussed herein are a charge control agent and toner comprising said charge control agent. Said toner of the invention is comprised of a resin, a colorant, and the charge control agent, wherein, said charge control agent is comprised of a specific type of metal complexes. In the invention, the charge... Agent: Matthias Scholl

20080261138 - Electrostatic latent image developing toner: An objective is to provide an electrostatic latent image developing toner exhibiting ultra-low temperature fixability together with high resolution, excellent fluidity and anti-blocking property, and excellent aging stability in a toner vessel, in which the toner is supplied into an image forming apparatus. Also disclosed is an electrostatic latent image... Agent: Lucas & Mercanti, LLP

20080261139 - Electrophotographic toner: The invention relates to an electrophotographic toner comprising toner particles (10), which contain a matrix material (11), at least part of said toner particles (10) having a first glass flow component (13) with a first melting temperature. The aim of the invention is to create translucent surfaces on glass substrates... Agent: Pauley Petersen & Erickson

20080261140 - Electrophotographic developing agent: An electrophotographic developing agent is provided that includes a binder resin, a releasing agent, a colorant, and a charge control agent. By using a binder resin having a high acid value and a mixture of two waxes having different melting points as a releasing agent, a electrophotographic developing agent is... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20080261142 - Toner powders and process for their preparation: The present invention pertains to a process for the preparation of a toner powder, in which particles of one or more toner base compositions are combined into larger particles. The toner base compositions may be in the form of dry powders, e.g., manufactured by jet milling or by freeze drying... Agent: Kenyon & Kenyon LLP

20080261143 - Image forming apparatus and image forming method: An image forming apparatus and an image forming method are provided that realize both the use of a decolorizing toner and a non-decolorizing toner and miniaturization of the apparatus. An image forming apparatus employing an intermediate transfer system includes: a primary transfer belt that carries a transferred toner image; a... Agent: Amin, Turocy & Calvin, LLP

20080261144 - Method for producing developing agent: A method for producing a developing agent, includes preparing a dispersion of particles containing a binder resin and a coloring agent and forming toner particles by aggregating and fusing the particles, in which the number of coarse particles having a particle size of 0.6 μm or larger after the solid... Agent: Amin, Turocy & Calvin, LLP

20080261145 - Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and... Agent: Hovey Williams LLP

20080261148 - Light transmissive stamper, production method thereof, and production method of multilayer optical recording medium: Provided is a light transmissive stamper having light transmissivity with respect to an ultraviolet ray and durability for repeated use. Specifically, on a light transmissive substrate, a light transmissive auxiliary layer and an inorganic resist layer are formed sequentially, and a light beam is selectively irradiated to the inorganic resist... Agent: Fitzpatrick Cella Harper & Scinto

20080261146 - Lithographic printing plate precursor: To provide a lithographic printing plate precursor which generates no stains in the non-image area and is also excellent in development latitude. Disclosed is a lithographic printing plate precursor comprising a support and a photosensitive layer, said lithographic printing plate precursor further comprising a subbing layer containing a maleamic acid... Agent: Eastman Kodak Company Patent Legal Staff

20080261149 - Method of manufacturing semiconductor device, acid etching resistance material and copolymer:

20080261150 - Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D)... Agent: Sughrue-265550

20080261147 - Photoactive compounds: The present invention relates to novel photoactive compounds that can be used in formulating photoresist compositions.... Agent: Alan P. Kass Clariant Corporation

20080261151 - Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate: The invention provides a near infrared absorption polymer comprising at least two different pendent infra-red chromophoric moieties covalently bonded to the backbone of an alkali-soluble resin, at least one of which is an indole cyanine dye and the other of which is a benz[e]-indole cyanine dye. When used in the... Agent: Moore & Van Allen PLLC

20080261152 - Method of manufacturing mother stamper and method of manufacturing stamper: A method of manufacturing a mother stamper comprises: a first resist layer formation process for forming a first resist layer on a substrate; a first electron beam irradiation process for irradiating electron beam at a first pattern on the first resist layer; a first development process for developing the first... Agent: Sughrue Mion, PLLC

20080261154 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP

20080261153 - Plate making method of lithographic printing plate precursor: A plate-making method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor including a support and an image-recording layer containing a binder polymer to cure an exposed area of the image-recording layer; and developing the exposed lithographic printing plate precursor with a development processing solution... Agent: Sughrue-265550

20080261155 - Metallic air-bridges: A lithographic method of producing an air-bridge (10) comprises the steps of providing a sequence of a bottom resist layer (2), a shield layer (3) and a top resist layer (4), removing the top resist layer (4) and subsequently the shield layer (3) in the area of the bridge span,... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw

20080261156 - Method of forming a pattern in a semiconductor device and method of forming a gate using the same: A method of forming a pattern in a semiconductor device is described. A substrate divided into cell and peripheral regions is provided, and an object layer is formed on a substrate. A buffer pattern is formed on the object layer in the cell region along a first direction. A spacer... Agent: Mills & Onello LLP

20080261158 - Method of manufacturing printed circuit board: A method of manufacturing a printed circuit board is disclosed. The method includes: forming a relievo pattern and an intaglio pattern on a surface of a base plate; forming a metal plate, which has a metal pattern that corresponds with a shape of the relievo pattern and the intaglio pattern,... Agent: Staas & Halsey LLP

20080261157 - Semiconductor laser device and method of manufacturing the same: Disclosed is a method of manufacturing a distributed feedback semiconductor laser device. In order to form a grating in only a channel, an etching mask, which is used when forming a ridge waveguide, is allowed to remain. A portion of sides of an ohmic contact layer is removed. A metal... Agent: Townsend And Townsend And Crew, LLP

20080261159 - Electrophoretic display device: An electrophoretic display device includes a multiplicity of individual reservoirs containing a display medium between conductive substrates, at least one of which is transparent, wherein the display medium includes one or more set of colored particles in a dielectric fluid, and wherein the multiplicity of individual reservoirs are defined by... Agent: Oliff & Berridge, PLC.

20080261160 - Method for manufacturing patterned thin-film layer: A method for manufacturing a patterned thin-film layer according to one preferred embodiment includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each of the banks having a top surface and a... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang

20080261118 - Optical recording composition and holographic recording medium: In General Formula (I), R1 denotes an alkylene group or arylene group, R2 denotes an alkyl group, aryl group, or heterocyclic group, X denotes a divalent linking group selected from the group consisting of —COO—, —CONH—, —OCO—, —NH—, —O—, —S—, —CO—, —SO2—, —SO3—, and —SO2NH—, n and m each independently... Agent: Sughrue Mion, PLLC

20080261119 - Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method: A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from... Agent: Birch Stewart Kolasch & Birch

20080261128 - Methods and structures for protecting one area while processing another area on a chip: Increased protection of areas of a chip are provided by both a mask structure of increased robustness in regard to semiconductor manufacturing processes or which can be removed with increased selectivity and controllability in regard to underlying materials, or both. Mask structures are provided which exhibit an interface of a... Agent: Whitham, Curtis & Christofferson, P.C.

20080261120 - Photolithography mask with integrally formed protective capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261122 - Photolithography mask with protective capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261121 - Photolithography mask with protective silicide capping layer: A photomask and a method of fabricating the photomask. The photomask including: a substrate transparent to a selected wavelength or wavelengths of radiation, the substrate having a top surface and an opposite bottom surface, the substrate having a printable region and a non-printable region; the printable region having first opaque... Agent: Schmeiser, Olsen & Watts

20080261124 - Photomask reticle for use in projection exposure, and manufacturing methods therefor and for semiconductor device: A photomask reticle is provided for use in projection exposure which forms a resist pattern on a workable film formed over a semiconductor substrate, comprising area 1 in which a main pattern is formed, area 2 formed around area 1, area 3 formed around area 2, and area 4 formed... Agent: Mcginn Intellectual Property Law Group, PLLC

20080261123 - Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same: A photomask for integrated circuit production comprising a substrate, one or more layers and a detector for monitoring a process parameter of the integrated circuit production in combination with one or more of the following: communication circuitry for communicating with external equipment for the integrated circuit production, a computational processor... Agent: Amster, Rothstein & Ebenstein LLP

20080261127 - Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same: A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate... Agent: Amster, Rothstein & Ebenstein LLP

20080261125 - Resist pattern and reflow technology: A reflow stabilizing solution for treating photoresist patterns and a reflow technology are disclosed. The reflow stabilizing solution comprises a polymer and is applied after the photoresist material has been developed and patterned. By treating the photoresist with the reflow stabilizing solution after resist patterning and further subjecting the reflow... Agent: Dickstein Shapiro LLP

20080261126 - Secure photomask with blocking aperture: A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask.... Agent: Amster, Rothstein & Ebenstein LLP

20080261129 - Selective surface treatment method using block copolymer, black matrix and method of manufacturing the same, and nozzle plate and method of manufacturing the same: A selective surface treatment method using a block copolymer, a black matrix and a method of manufacturing the same, and a nozzle plate and a method of manufacturing the same are provided. According to the selective surface treatment method, a block copolymer layer including a hydrophilic polymer block and a... Agent: Stanzione & Kim, LLP

20080261130 - Process for a thermal transfer of a liquid crystal film using a transfer element: The invention relates to a laser-induced process that employs a transfer element comprising a liquid crystal material for a thermal transfer onto a receiving surface. The process is suitable for generating markings with various appearance or optical effects on a surface of choice. The transfer element comprises a light-to-heat conversion... Agent: Millen, White, Zelano & Branigan, P.C.

20080261134 - Developing apparatus, developing method and image forming apparatus: A developing apparatus, a developing method and an image forming apparatus are provided in which reduction in the quantity of development is prevented in the case where a micro particle diameter toner is used. The developing apparatus uses a developer containing a toner and supplies the toner to an image... Agent: Amin, Turocy & Calvin, LLP

20080261132 - Resin for electrostatic-image-developing toner, electrostatic-image-developing toner, electrostatic image developer, method for forming image, and image-forming apparatus: A resin for an electrostatic-image-developing toner includes a polyester resin; a vinyl polymer resin obtained by polymerization of a radically polymerizable vinyl monomer; and at least one of a nitroxide compound and a reaction product of a nitroxide compound and an acid.... Agent: Oliff & Berridge, PLC

20080261133 - Resin for electrostatic-image-developing toner, electrostatic-image-developing toner, electrostatic image developer, method for forming image, and image-forming apparatus: A resin for an electrostatic-image-developing toner includes a graft polymer, wherein the graft polymer has a polyester structure in the main chain thereof; the graft polymer includes monomer units derived from vinyl monomers in the side chains thereof; and at least a part of the monomer units have a residue... Agent: Oliff & Berridge, PLC

20080261131 - Toner, image forming apparatus using the same, image forming method using the same, and process cartridge: A toner that is excellent in low-temperature fixing property, offset resistance, storage stability, charge rising property, charge stability with time and pulverizability and allows for forming high-quality images over a long period of time. The toner contains at least a binder resin, a colorant and a charge controlling agent, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080261136 - Electrophotographic photoreceptor, process cartridge and image-forming apparatus: An electrophotographic photoreceptor includes a conductive substrate; and a photosensitive layer that includes a phthalocyanine pigment, a charge-transporting substance and at least one kind of lignophenol derivative.... Agent: Oliff & Berridge, PLC

20080261135 - Electrophotographic photoreceptor, process cartridge and image forming apparatus: An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer provided on or above the conductive support, the photosensitive layer having an outermost layer comprising a cured product of a composition comprising a curable resin, a surfactant containing a fluorine atom, and a charge transporting organic compound having a... Agent: Oliff & Berridge, PLC

20080261141 - Magenta toner for developing electrostatic image: A magenta toner for developing an electrostatic image composed of a binder and a colorant is disclosed. The toner contains a tone controlling agent having a peak of fluorescent spectrum from 380 to 500 nm. An image excellent in light fastness and durability can be obtained and high color reproducibility... Agent: Lucas & Mercanti, LLP

20080261137 - Charge control agent and toner comprising the same: Discussed herein are a charge control agent and toner comprising said charge control agent. Said toner of the invention is comprised of a resin, a colorant, and the charge control agent, wherein, said charge control agent is comprised of a specific type of metal complexes. In the invention, the charge... Agent: Matthias Scholl

20080261138 - Electrostatic latent image developing toner: An objective is to provide an electrostatic latent image developing toner exhibiting ultra-low temperature fixability together with high resolution, excellent fluidity and anti-blocking property, and excellent aging stability in a toner vessel, in which the toner is supplied into an image forming apparatus. Also disclosed is an electrostatic latent image... Agent: Lucas & Mercanti, LLP

20080261139 - Electrophotographic toner: The invention relates to an electrophotographic toner comprising toner particles (10), which contain a matrix material (11), at least part of said toner particles (10) having a first glass flow component (13) with a first melting temperature. The aim of the invention is to create translucent surfaces on glass substrates... Agent: Pauley Petersen & Erickson

20080261140 - Electrophotographic developing agent: An electrophotographic developing agent is provided that includes a binder resin, a releasing agent, a colorant, and a charge control agent. By using a binder resin having a high acid value and a mixture of two waxes having different melting points as a releasing agent, a electrophotographic developing agent is... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P.

20080261142 - Toner powders and process for their preparation: The present invention pertains to a process for the preparation of a toner powder, in which particles of one or more toner base compositions are combined into larger particles. The toner base compositions may be in the form of dry powders, e.g., manufactured by jet milling or by freeze drying... Agent: Kenyon & Kenyon LLP

20080261143 - Image forming apparatus and image forming method: An image forming apparatus and an image forming method are provided that realize both the use of a decolorizing toner and a non-decolorizing toner and miniaturization of the apparatus. An image forming apparatus employing an intermediate transfer system includes: a primary transfer belt that carries a transferred toner image; a... Agent: Amin, Turocy & Calvin, LLP

20080261144 - Method for producing developing agent: A method for producing a developing agent, includes preparing a dispersion of particles containing a binder resin and a coloring agent and forming toner particles by aggregating and fusing the particles, in which the number of coarse particles having a particle size of 0.6 μm or larger after the solid... Agent: Amin, Turocy & Calvin, LLP

20080261145 - Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride: New photoresists for use during the production of semiconductor and MEMS devices are provided. The primer layer preferably comprises a silane dissolved or dispersed in a solvent system. The photoresist layer includes a first polymer prepared from a styrene and an acrylonitrile, and a second polymer comprising epoxy-containing monomers (and... Agent: Hovey Williams LLP

20080261148 - Light transmissive stamper, production method thereof, and production method of multilayer optical recording medium: Provided is a light transmissive stamper having light transmissivity with respect to an ultraviolet ray and durability for repeated use. Specifically, on a light transmissive substrate, a light transmissive auxiliary layer and an inorganic resist layer are formed sequentially, and a light beam is selectively irradiated to the inorganic resist... Agent: Fitzpatrick Cella Harper & Scinto

20080261146 - Lithographic printing plate precursor: To provide a lithographic printing plate precursor which generates no stains in the non-image area and is also excellent in development latitude. Disclosed is a lithographic printing plate precursor comprising a support and a photosensitive layer, said lithographic printing plate precursor further comprising a subbing layer containing a maleamic acid... Agent: Eastman Kodak Company Patent Legal Staff

20080261149 - Method of manufacturing semiconductor device, acid etching resistance material and copolymer:

20080261150 - Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D)... Agent: Sughrue-265550

20080261147 - Photoactive compounds: The present invention relates to novel photoactive compounds that can be used in formulating photoresist compositions.... Agent: Alan P. Kass Clariant Corporation

20080261151 - Thermally reactive infrared absorption polymers and their use in a heat sensitive lithographic printing plate: The invention provides a near infrared absorption polymer comprising at least two different pendent infra-red chromophoric moieties covalently bonded to the backbone of an alkali-soluble resin, at least one of which is an indole cyanine dye and the other of which is a benz[e]-indole cyanine dye. When used in the... Agent: Moore & Van Allen PLLC

20080261152 - Method of manufacturing mother stamper and method of manufacturing stamper: A method of manufacturing a mother stamper comprises: a first resist layer formation process for forming a first resist layer on a substrate; a first electron beam irradiation process for irradiating electron beam at a first pattern on the first resist layer; a first development process for developing the first... Agent: Sughrue Mion, PLLC

20080261154 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer, and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP

20080261153 - Plate making method of lithographic printing plate precursor: A plate-making method of a lithographic printing plate precursor includes: exposing imagewise a lithographic printing plate precursor including a support and an image-recording layer containing a binder polymer to cure an exposed area of the image-recording layer; and developing the exposed lithographic printing plate precursor with a development processing solution... Agent: Sughrue-265550

20080261155 - Metallic air-bridges: A lithographic method of producing an air-bridge (10) comprises the steps of providing a sequence of a bottom resist layer (2), a shield layer (3) and a top resist layer (4), removing the top resist layer (4) and subsequently the shield layer (3) in the area of the bridge span,... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw

20080261156 - Method of forming a pattern in a semiconductor device and method of forming a gate using the same: A method of forming a pattern in a semiconductor device is described. A substrate divided into cell and peripheral regions is provided, and an object layer is formed on a substrate. A buffer pattern is formed on the object layer in the cell region along a first direction. A spacer... Agent: Mills & Onello LLP

20080261158 - Method of manufacturing printed circuit board: A method of manufacturing a printed circuit board is disclosed. The method includes: forming a relievo pattern and an intaglio pattern on a surface of a base plate; forming a metal plate, which has a metal pattern that corresponds with a shape of the relievo pattern and the intaglio pattern,... Agent: Staas & Halsey LLP

20080261157 - Semiconductor laser device and method of manufacturing the same: Disclosed is a method of manufacturing a distributed feedback semiconductor laser device. In order to form a grating in only a channel, an etching mask, which is used when forming a ridge waveguide, is allowed to remain. A portion of sides of an ohmic contact layer is removed. A metal... Agent: Townsend And Townsend And Crew, LLP

20080261159 - Electrophoretic display device: An electrophoretic display device includes a multiplicity of individual reservoirs containing a display medium between conductive substrates, at least one of which is transparent, wherein the display medium includes one or more set of colored particles in a dielectric fluid, and wherein the multiplicity of individual reservoirs are defined by... Agent: Oliff & Berridge, PLC.

20080261160 - Method for manufacturing patterned thin-film layer: A method for manufacturing a patterned thin-film layer according to one preferred embodiment includes the steps of: providing a substrate with a plurality of banks thereon, the plurality of banks defining a plurality of spaces therein for receiving ink therein, each of the banks having a top surface and a... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang

20080254375 - Hologram recording material and hologram recording medium: P

20080254374 - Holographic recording composition and holographic recording medium:

20080254371 - Method for producing an image on a material sensitive to a used radiation, method for obtaining a binary hologram (variants) and methods for producing an image by using said hologram: The aim of said invention is to principally simplify a production process for producing high-resolution images on a material sensitive to a used radiation and to substantially increase a resolution while forming the obtainable image. The inventive method consists in producing images on the sensitive material in the form of... Agent: Kirshstein Ottinger Israel & Shiffmiller

20080254373 - Method of making pdr and pbr glasses for holographic data storage and/or computer generated holograms: Methods of making volume phase holograms and/or making computer-generated holograms using silver ion-exchanged silicate glass articles that include a photo-darkenable-refractive (PDR) glass plate and/or a photo-bleachable-refractive (PBR) glass plate. In one embodiment, a method of forming a volume phase hologram includes the steps of making a PBR glass plate that... Agent: Mitchell P. Brook Luce, Forward, Hamilton & Scripps LLP

20080254372 - Pdr and pbr glasses for holographic data storage and/or computer generated holograms: Silicate glasses for storing holographic data and for producing computer-generated holograms, including photo-darkenable-refractive (PDR) and photo-bleachable-refractive (PBR) glasses. In one embodiment, a PBR glass plate contains a photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, with a base glass composition that has been ion-exchanged in an aqueous... Agent: Mitchell P. Brook Luce, Forward, Hamilton & Scripps LLP

20080254377 - Metal photomask pod and filter device thereof: A metal photomask pod with a filter device and with atmoseal function is provided. The metal photomask pod includes a metal upper cover and a metal lower cover coupled to form an inner space for receiving a photomask. A side portion of the metal upper cover or the metal lower... Agent: Sinorica, LLC

20080254376 - Phase-shifting mask and method of fabricating same: A phase-shifting mask is fabricated using two separate exposure processes. The mask includes a substrate and a device pattern area above the substrate. The mask has a mask pattern defining boundaries of the device pattern area and an administrative pattern area defining boundaries of the mask pattern.... Agent: Haynes And Boone, LLP

20080254378 - Toner, developer, toner container, process cartridge, fixing process, image forming apparatus, and image forming process: In the above equation (1), “TgBi” represents the glass-transition temperature of the amorphous resin, “n” represents the number of amorphous resins, and “b” represents the content of the amorphous resin (part by mass). Examples of the preferred aspect of the present invention includes the one that at least a part... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080254379 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor composed of a conductive substrate having thereon a photosensitive layer and a surface layer formed in this order, wherein the total composition ratio of a group 13 element, oxygen, and hydrogen to the total element content in the surface layer is 0.95 or more, and the abundance... Agent: Oliff & Berridge, PLC

20080254380 - Electrophotographic photoreceptor, process cartridge, and image forming apparatus: An electrophotographic photoreceptor includes a conductive support and a photosensitive layer. The photosensitive layer is disposed on the conductive support, and includes a layer that includes, in the same layer, at least a charge generating material and a compound having a triple bond and a hydroxy group.... Agent: Oliff & Berridge, PLC

20080254381 - Chemical toner with covalently bonded release agent: A chemical toner composition including a polymer polymerized from starting ingredients comprising a resin monomer and a release agent monomer.... Agent: Patent Documentation Center

20080254382 - Heat-sensitive transfer sheet and image-forming method: c

20080254383 - Image-forming method using heat-sensitive transfer system:

20080254384 - Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes: A photosensitive composition includes a cyanine dye that has, on a methine chain thereof, a substituent which is a cation moiety of an onium salt structure.... Agent: Sughrue-265550

20080254385 - Photosensitive resin for flexographic printing plate: Disclosed is a photosensitive resin composition for flexographic printing plates containing a thermoplastic elastomer (A), a polymer (B) mainly composed of butadiene, a photopolymerizable unsaturated monomer (C) and a photopolymerization initiator (D) (which composition substantially contains no hydrophilic polymers). In this photosensitive resin composition for flexographic printing plates, the number... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080254386 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]dodecane... Agent: Birch Stewart Kolasch & Birch

20080254388 - Fluorinated polymer, negative photosensitive resin composition and partition walls: A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20 or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080254387 - Negative-working imageable elements and methods of use: A radiation-sensitive composition includes an initiator composition, a radiation absorbing compound, and a particulate primary polymeric binder that has a backbone comprising multiple urethane moieties and further comprises side chains comprising free radically polymerizable groups attached to the backbone. This primary polymeric binder can be used in place of or... Agent: Andrew J. Anderson, Patent Legal Staff, Eastman Kodak Company

20080254390 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support, including a photopolymerizable layer, a top layer, and optionally,... Agent: Agfa C/o Keating & Bennett, LLP

20080254391 - Method of making a lithographic printing plate: A method of making a lithographic printing plate includes the steps of: a) providing a lithographic printing plate precursor including (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer, (ii) a coating on the support including a photopolymerizable layer and, optionally, an intermediate layer... Agent: Agfa C/o Keating & Bennett, LLP

20080254389 - Method of making lithographic printing plates: A method for preparing a lithographic printing plate includes the steps of—providing a lithographic printing plate precursor including: a support having a hydrophilic surface or which is provided with a hydrophilic layer; and a coating provided on the support and including an image recording layer including hydrophobic thermoplastic polymer particles... Agent: Agfa C/o Keating & Bennett, LLP

20080254392 - Flexible circuit with cover layer: The invention relates to flexible circuits and more particularly to flexible printed circuits having cover layers. The cover layers may be a chemically-etchable adhesive polyimide. The cover layers may be patterned after they are applied to the flexible circuit substrate.... Agent: 3m Innovative Properties Company

20080254393 - Phosphor coating process for light emitting diode: A phosphor coating process for a light-emitting device is described. A light-emitting diode chip is bonded on a substrate. A light-sensitive layer is formed over the light-emitting diode and the substrate. The light-sensitive layer is patterned by a photolithography process to expose an area of the light-emitting diode chip, on... Agent: Joe Mckinney Muncy

20080254394 - Structure for pattern formation, method for pattern formation, and application thereof: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.... Agent: Ladas & Parry LLP

20080254395 - Image recording media and image layers: Imaging layers, image recording media, and methods of preparation of each, are disclosed.... Agent: Hewlett Packard Company

20080254397 - Permanent transparent pattern in a non-transparent microvoided axially stretched self-supporting polymeric film and a process for obtaining same: A permanent transparent pattern in a non-transparent microvoided axially stretched self-supporting polymeric film; a layer configuration comprising the permanent transparent pattern in a non-transparent microvoided axially stretched self-supporting polymeric film exclusive of foam; a non-transparent microvoided thermally transparentizable axially stretched self-supporting polymeric film; and a process for obtaining a permanent... Agent: Leydig Voit & Mayer, Ltd

20080254396 - Process for producing a non-transparent microvoided self-supporting film: A process for producing a non-transparent microvoided self-supporting film comprising the steps of: i) mixing at least one linear polyester having together monomer units consisting essentially of terephthalate, isophthalate and aliphatic dimethylene with the molar ratio of isophthalate monomer units to terephthalate monomer units being at least 0.02 to provide... Agent: Leydig Voit & Mayer, Ltd

20080248402 - Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording: A photosensitive composition and A photosensitive medium for volume hologram recording comprises a photopolymerization reactive compound (a monomer) and any one of the following binder: (a) an organic-inorganic hybrid polymer obtainable by copolymerizing an organometallic compound of the formula 1 “R1mM1(OR2)n” and an ethylenic monomer and/or its hydrolyzed polycondensate; (b)... Agent: Ladas & Parry LLP

20080248401 - Transferring method for transferring hologram or diffraction grating laminated in a thermal transfer sheet and a transfer object: A transferring method for transferring a hologram with stable quality including on-demand information by using a thermal transfer sheet where the hologram is laminated. The transferring method transfers a thermal transfer sheet in which a hologram or a diffraction grating is laminated on a base material film, wherein a direction... Agent: Ladas & Parry LLP

20080248405 - Liquid toner-based pattern mask method and system: A liquid toner-based pattern mask system and methods of masking and patterning a substrate employ a polymer-based liquid toner as a pattern mask. The liquid toner is deposited on the substrate in a masking pattern. The pattern mask is lifted off of the substrate after patterning the substrate using a... Agent: Hewlett Packard Company

20080248403 - Method and system for improving critical dimension uniformity: A method for improving critical dimension uniformity of a wafer includes exposing a plurality of mask patterns on a first plurality of substrates at predetermined locations with common splits conditions of focus and exposure dose for each of the first plurality of substrates to form a plurality of perturbed wafers;... Agent: Haynes And Boone, LLP

20080248404 - Method for controlling phase angle of a mask by post-treatment: A method for controlling phase angle of a mask is provided. A mask comprising a substrate and an absorber is formed. A nitrogen-containing plasma treatment is performed on the mask to reduce the phase angle. Alternatively, a nitrogen-containing plasma treatment is performed on the mask, followed by a vacuum ultraviolet... Agent: Haynes And Boone, LLP

20080248407 - Pellicle: The invention aims at providing a pellicle that does not impair photomask flatness when the pellicle is bonded to the photomask. In the pellicle of the present invention, the surface at which the pellicle frame is mounted on a photomask has a flatness not exceeding 30 μm, while the surface... Agent: Lowe Hauptman Ham & Berner, LLP

20080248406 - Pellicle and method for preparing the same: The present invention aims at reducing the thickness of a pellicle membrane while providing a strong pellicle membrane. The method for manufacturing a pellicle of the present invention comprises the steps of forming, on a base plate, a pellicle membrane comprising a fluorocarbon resin; peeling the membrane off the base... Agent: Lowe Hauptman Ham & Berner, LLP

20080248408 - Photomask and method for forming a non-orthogonal feature on the same: A photomask and method for forming a non-orthogonal feature on the photomask are provided. A method for forming a non-orthogonal feature on a photomask blank includes providing a mask layout file including a primitive shape and fracturing the primitive shape to create a plurality of writeable shapes in a mask... Agent: Baker Botts L.L.P. Patent Department

20080248409 - Reflective mask blank, reflective mask and methods of producing the mask blank and the mask: A reflective mask blank has a substrate (11) on which a reflective layer (12) for reflecting exposure light in a short-wavelength region including an extreme ultraviolet region and an absorber layer (16) for absorbing the exposure light are successively formed. The absorber layer (16) has an at least two-layer structure... Agent: Sughrue Mion, PLLC

20080248410 - Method for forming color filter: A method for forming a color filter is provided. A substrate having a passivasion layer thereon is provided. The passivasion layer has at least one trench therein within a peripheral region of the substrate. A first color filter layer is formed over the passivasion layer to fill the trench by... Agent: Jianq Chyun Intellectual Property Office

20080248411 - Display medium and displaying method: Provided are an indicating material having excellent facility and high security and an indicating method for recording and indicating information on this indicating material. The indicating material has a structure that an ultraviolet light-screening layer having visible light-transmitting ability is laminated on a recording layer having visible light-transmitting ability and... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080248412 - Supervisory etch cd control: Exemplary embodiments provide a controller system and method to control etch critical dimensions (CDs) during semiconductor manufacturing processes when the etch elements cannot be manipulated to control such end. The controller system includes a photo CD controller and an etch CD controller. The photo CD controller includes a first feedback... Agent: Texas Instruments Incorporated

20080248413 - Liquid developing agent, method of producing the same and method of producing display device: On the surface of a core particle of a toner particle, a silane coupling agent treatment layer, a coating layer of thermoplastic resin microparticles applied to the core particle and a charge control agent added to the coating layer through the silane coupling agent treatment layer are provided, wherein the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080248414 - Polyesters for toner for electrophotography: The present invention relates to a polyester having an excellent hydrolysis resistance even when used in a process for producing a toner for electrophotography which includes a step of forming a raw material into particles in an aqueous medium, and a toner for electrophotography which contains the polyester and is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080248415 - Method of manufacturing aggregate particles and toner: A method of manufacturing aggregate particles capable of obtaining aggregate particles having high mechanical strength, small particle size, with narrow particle size distribution width by preventing interfusion of bubbles in the aggregate particles during stirring is provided. Aggregate particles are manufactured by stirring a resin particle slurry including resin particles... Agent: Nixon & Vanderhye, PC

20080248416 - Toner preparation method and apparatus, and toner prepared thereby: A method of preparing a toner, including periodically dripping and discharging a droplet of a toner constituent liquid including a resin and a colorant; and solidifying and granulating the droplet, wherein the dripper includes a thin film including plural nozzles; and an oscillator including an oscillation generator generating an oscillation;... Agent: Cooper & Dunham, LLP

20080248417 - Polyhydric phenol compound and chemically amplified resist composition containing the same: m

20080248418 - Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom: This invention relates to processes for preparing fluoroalcohol-substituted (meth)acrylate esters. This invention also relates to block copolymers incorporating repeat units derived from fluoroalcohol-substituted (meth)acrylate esters, and photoresists derived therefrom.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080248423 - Chemically amplified resist composition: i

20080248421 - Positive resist composition and pattern forming method: wherein in the formula (I), Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two of Ry1 to Ry3 may be coupled to form a ring structure, and... Agent: Sughrue-265550

20080248419 - Positive resist composition and pattern forming method using the same: A positive resist composition, includes: (A) a resin that has a group having absorption at 248 nm at a main chain terminal of the resin (A), and a pattern forming method uses the composition.... Agent: Sughrue-265550

20080248420 - Positive resist composition and pattern-forming method: A positive resist composition includes: (A) a resin capable of increasing the solubility in an alkali developing solution by the action of an acid, including: (a1) a repeating unit selected from repeating units represented by following formulae (a1-1) to (a1-3); (a2) a repeating unit represented by a following formula (a2);... Agent: Sughrue-265550

20080248422 - Resist composition, method of forming resist pattern, compound and acid generator: A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom,... Agent: Knobbe Martens Olson & Bear LLP

20080248424 - Photopolymer composition suitable for lithographic printing plates: Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and... Agent: Eastman Kodak Company Patent Legal Staff

20080248425 - Positive resist composition and pattern-forming method: d

20080248426 - Antihalation compositions: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.... Agent: Rohm And Haas Electronic Materials LLC

20080248427 - Composition for coating over a photoresist pattern comprising a lactam: The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating... Agent: Sangya Jain Az Electronic Materials Usa Corp.

20080248428 - Method for producing flexographic printing forms by thermal development: The invention relates to a method for producing flexographic printing forms by thermal development during which a flexographic printing element exposed in an image-like manner is developed by heating and removing the softened, non-polymerized portions of the relief-forming layer, whereby the flexographic printing element used contains a styrene butadiene block... Agent: Connolly Bove Lodge & Hutz, LLP

20080248429 - Method of forming a contact hole: A method of forming a contact hole is provided. A pattern is formed in a photo resist layer. The pattern is exchanged into a silicon photo resist layer to form a first opening. Another pattern is formed in another photo resist layer. The pattern is exchanged into a silicon photo... Agent: North America Intellectual Property Corporation

20080248430 - Process for preparing a nano-carbon material field emission cathode plate: A nano-carbon material field emission cathode plate is prepared by an oxidation-reduction reaction, which includes immersing a substrate having a first metal layer thereon in a solution of a second metal salt with a nano-carbon material dispersed therein. A difference between the two standard redox potentials of the first metal... Agent: Bacon & Thomas, PLLC

20080248431 - Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device: A pattern forming method includes forming a first anti-reflection coating on a substrate, the substrate having an uneven surface; forming a second anti-reflection coating on the first anti-reflection coating, the first anti-reflection coating having an uneven surface, and the second anti-reflection coating planarizing the uneven surface of the first anti-reflection... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080248432 - Near-field exposure method: p

20080248433 - Photographic element containing a speed-enhancing compound: The invention provides a colour photographic element comprising at least one light-sensitive silver halide emulsion layer or a non silver-containing light-insensitive layer, in which at least one of these layers contains a colourless imidazole compound of formula (I) that undergoes less than 10% chemical or redox reaction directly with oxidized... Agent: Patent Legal Staff

20080241706 - Holographic data storage medium and fabrication method thereof: A holographic data storage medium and a fabrication method thereof are provided. First, a precursor solution including an ultraviolet curable adhesive composition including a monomer having at least one (meth)acryloyl group in the molecule and an oligomer having at least two (meth)acryloyl groups in the molecule, a photopolymerizable organic compound... Agent: Jianq Chyun Intellectual Property Office

20080241707 - Method and system for exposure of a phase shift mask: The present disclosure provides a method of making a mask. The method includes providing a substrate having a first attenuating layer on the substrate and a first imaging layer on the first attenuating layer; performing a first exposure to the first imaging layer using a first radiation energy in writing... Agent: Haynes And Boone, LLP

20080241712 - Method and system for patterning a mask layer: The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each... Agent: Fay Sharpe / Xerox - Parc

20080241710 - Photomask including contrast enhancement layer and method of making same: A photomask and a method of making same. The photomask includes a plate defining transparent regions in a predetermined pattern and opaque regions, the transparent regions adapted to transmit light therethrough; and a contrast enhancement layer disposed over an entire surface of at least one of the transparent regions and... Agent: Intel Corporation C/o Intellevate, LLC

20080241711 - Removal and prevention of photo-induced defects on photomasks used in photolithography: Photoinduced defects that occur on photomasks used in photolithography may be removed or prevented. In one example a photomask is installed into a vacuum chamber, the contaminants on the photomask are broken down with heat, illumination or both and the broken-down contaminants are removed with a vacuum.... Agent: Intel/bstz Blakely Sokoloff Taylor & Zafman LLP

20080241708 - Sub-resolution assist feature of a photomask: The present disclosure provides a mask. The mask includes a transparent substrate, a main feature, and an assistant feature. The main feature includes attenuating material and is disposed on the substrate. The assistant feature includes a sub-resolution feature providing a phase shift. The assistant feature is spaced a distance from... Agent: Haynes And Boone, LLP

20080241709 - System and method for analyzing photomask geometries: In one embodiment, a method for analyzing photomask geometries is provided. An original geometry to be formed in an absorber layer of a photomask blank is received. The original geometry may be modified to generate a modified geometry that is offset from the original geometry. A simulation may be performed... Agent: Baker Botts L.L.P. Patent Department

20080241713 - Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device: A colored photocurable composition for a solid state image pick-up device, the composition including at least (A) a dispersion resin having an unsaturation equivalent of less than 600, (B) a pigment, (C) a photopolymerization initiator, and (D) a polyfunctional photopolymerizable compound having an acidic functional group and/or an alkyleneoxy chain.... Agent: Sughrue Mion, PLLC

20080241714 - Method and apparatus for lens contamination control: The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an alignment offset of the asymmetric pattern associated with the lens system. A contamination of the lens system is determined by comparing the... Agent: Haynes And Boone, LLP

20080241715 - Substrate processing method, substrate processing apparatus, and computer readable storage medium: In the present invention, when trouble occurs and the operation of a substrate processing apparatus is stopped, substrate information containing positions and processing states of the substrates located in the apparatus at that time is stored, and the power supply of the apparatus is then turned off. When the apparatus... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080241719 - Full color image forming process: A process for forming a full-color image, wherein the 4 color toners each have an apparent viscosity at 105° C. of 50,000 to 300,000 Pa·s and an apparent viscosity at 130° C. of 3,000 to 30,000 Pa·s, and as a color toner arranged at the outermost layer on a transfer... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080241716 - Image forming apparatus, image forming method and process cartridge: An image forming apparatus including an image bearing member, a charging device, an irradiating device, a developing device, a transfer device, a fixing device, and a cleaning device, wherein the image bearing member includes a substrate on which a photosensitive layer and a cross-linked surface layer are accumulated and the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080241718 - Method and device for receiving a used web of transfer foil: A method and device for receiving a used web of transfer foil on a wind-up reel overcome the disadvantage of telescoping of the wound-up web of transfer foil on the wind-up reel, which tends to increase as a used web of transfer foil continues to be fed to the wind-up... Agent: Lerner Greenberg Stemer LLP

20080241717 - Toner for electrostatic image development: A toner for electrostatic image development, containing a resin binder and a wax, wherein the resin binder contains an amorphous polyester obtained by polycondensing a carboxylic acid component containing fumaric acid in an amount of from 55 to 100% by mole, with an alcohol component, wherein the wax contains an... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080241720 - Anticurl backside coating (acbc) photoconductors: A photoconductor that contains a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the first layer is in contact with the supporting substrate on the reverse side thereof, and which first layer... Agent: Patent Documentation Center

20080241721 - Photoconductors: A photoconductor containing a first layer, a supporting substrate thereover, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and wherein the first layer is in contact with the supporting substrate on the reverse side thereof, and which layer contains a... Agent: Patent Documentation Center

20080241722 - Mixed crystals comprising c.i. pigment red 170 derivatives: p

20080241723 - Emulsion aggregation toner compositions having ceramic pigments: Emulsion aggregation toner particles comprising at least one binder resin and a colorant, wherein the colorant comprises at least one ceramic pigment.... Agent: Oliff & Berridge, PLC.

20080241724 - Toner compositions including styrene containing external additives: Toner compositions of toner particles including additive particles upon an external surface of the toner particles, wherein the additive particles include crosslinked styrene containing polymer particles, exhibit reduced sensitivity to relative humidity. The crosslinked styrene containing polymer particles have an average particle size of from about 30 nm to about... Agent: Oliff & Berridge, PLC.

20080241725 - Toner for developing agent and method for producing the same: In order to solve the foregoing inconveniences, specified addition amounts of a low-resistance external additive and a high-resistance external additive are used in this invention. Furthermore, the toner having been subjected to external addition is subjected to cyclone classification to separate the external additives by force, thereby producing a toner... Agent: Amin, Turocy & Calvin, LLP

20080241726 - Resin-filled ferrite carrier for electrophotographic developer, production method thereof and electrophotographic developer using the ferrite carrier: Employed are a resin-filled ferrite carrier for an electrophotographic developer filled with a resin in voids of a porous ferrite core material, wherein the resin filled in the voids is a silicone resin which has a softening point of 40° C. or above and is cured at or above such... Agent: Greenblum & Bernstein, P.L.C

20080241727 - Method and apparatus for manufacturing toner, and electrophotographic toner manufactured by the method: A method for manufacturing toner includes steps of supplying, periodically dispensing, and solidifying. The supply step supplies a liquid to be atomized, which includes at least a resin and a colorant. The periodic dispensation step periodically dispenses droplets of the liquid through an atomizing unit. The solidification step solidifies the... Agent: Cooper & Dunham, LLP

20080241728 - Methods for reducing plasticization and blocking in toner compositions: Use of a wax in a toner, such as carnauba wax, to give an increase in charge control agent in a toner, such as a magenta toner, to give an increased glass transition temperature is disclosed. The toner may contain a resin comprising amorphous and crystalline polyesters to provide good... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080241729 - Resin-coated ferrite carrier for electrophotographic developer and electrophotographic developer using the resin-coated ferrite carrier: Employed are a resin-coated ferrite carrier for an electrophotographic developer including a ferrite carrier core material having a BET specific surface area of 900 to 5,000 cm2/g and an apparent density of 2.30 to 2.80 g/cm3, and the electrophotographic developer using this resin-coated ferrite carrier.... Agent: Greenblum & Bernstein, P.L.C

20080241730 - Process for producing toner particles: In a process for producing toner particles through granulation by a wet process, a process for producing toner particles is provided that enables reduction of water content in wet toner particle cakes obtained by separating toner particles from a toner particle dispersion in a good efficiency, followed by washing, and... Agent: Fitzpatrick Cella Harper & Scinto

20080241731 - Heat-sensitive transfer image-receiving sheet: A heat-sensitive transfer image-receiving sheet, in which the heat-sensitive transfer image-receiving sheet is provided in a form that it is wound into a roll and all periphery of the roll is covered with a protective sheet, and in which the heat-sensitive transfer image-receiving sheet contains, on a support, at least... Agent: Sughrue Mion, PLLC

20080241733 - Radiation curable thermal transfer elements: Radiation curable thermal transfer elements including a substrate and a light-to-heat conversion layer overlaying the substrate, and processes to make the thermal transfer elements. The light-to-heat conversion layer is derived from a radiation curable material capable of being cured by exposure to radiation at a curing wavelength and an imaging... Agent: 3m Innovative Properties Company

20080241732 - Thermal transfer image-receiving sheet and method for producing it: A thermal transfer image-receiving sheet comprising, on a support, at least one image-receiving layer containing at least one polymer latex and comprising at least one heat-insulating layer between the receiving layer and the support, wherein at least one layer on the support is formed by water-base coating and at least... Agent: Sughrue Mion, PLLC

20080241734 - Method of pattern transfer: Pattern transfer is achieved by forming a first patterned hard mask layer with a circuit pattern and a plurality of dummy patterns on a substrate, forming a second pattern mask layer on the substrate, exposing the circuit pattern of the first pattern mask layer, and removing a portion of the... Agent: North America Intellectual Property Corporation

20080241735 - lithographic process: The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed... Agent: Berliner & Associates

20080241739 - Lithographic printing plate precursor and method for preparing lithographic printing plate: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.... Agent: Sughrue-265550

20080241740 - Lithographic printing plate precursor and method of preparing lithographic printing plate: A lithographic printing plate precursor includes: a support having a surface, a contact angle of water droplet in air on which is 70° or more; and a photosensitive layer, wherein the support has, on a surface of the support, a compound having a functional group X, the functional group X... Agent: Sughrue-265550

20080241738 - Lithographic printing plate precursor and printing method: A lithographic printing plate precursor includes: a support; and an ink-receptive layer which contains a particle of an organic polymer and a compound comprising a fluorine atom, or contains a particle of an organic polymer containing a fluorine atom.... Agent: Sughrue-265550

20080241737 - Resist composition and pattern-forming method using same: l

20080241736 - Resist composition and patterning process: To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is... Agent: Birch Stewart Kolasch & Birch

20080241741 - Phase change memory devices and methods for manufacturing the same: Phase change memory devices and methods for manufacturing the same are provided. An exemplary embodiment of a phase change memory device comprises a substrate. A dielectric layer is formed over the substrate and a phase change material layer is embedded in the dielectric layer. A first conductive electrode is also... Agent: Quintero Law Office, PC

20080241742 - Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent: A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film... Agent: Sughrue-265550

20080241744 - Curable composition and planographic printing plate precursor: The present invention provides a curable composition containing at least one species selected from polymerizable monomers represented by the following formulas (I) to (III) and a polymerization initiator, and a planographic printing plate precursor including the same. The curable composition can be cured with high sensitivity due to laser light... Agent: Sughrue Mion, PLLC

20080241745 - Negative resist composition and pattern forming method using the same: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic... Agent: Sughrue-265550

20080241743 - Positive resist composition and pattern forming method using the same: A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of... Agent: Sughrue-265550

20080241746 - Positive resist composition and pattern forming method: p

20080241751 - Chemically amplified negative resist composition and patterning process: A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon. In forming a pattern having a fine feature size of less than 0.1 μm, the composition exhibits a high resolution in that a resist coating formed from... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080241748 - Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same: c

20080241747 - Positive resist composition and method of forming resist pattern: A positive resist composition that exhibits a large exposure margin, and excellent levels of resolution and dry etching resistance, as well as a method of forming a resist pattern that uses the positive resist composition. This resist composition includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups... Agent: Knobbe Martens Olson & Bear LLP

20080241749 - Positive resist composition and pattern forming method using the same: A positive resist composition, includes: (B1) a resin capable of decomposing under an action of an acid to increase a solubility of the resin (B1) in an aqueous alkali solution, the resin (B1) containing a specific hydroxystyrene-based repeating unit and/or (meth)acrylic acid-based repeating unit as defined in the specification; (B2)... Agent: Sughrue-265550

20080241752 - Positive resist composition and pattern forming method using the same: A positive resist composition, includes: (A) a resin having a property of becoming soluble in an alkali developer under an action of an acid and having a phenolic hydroxyl group and a weight average molecular weight of 1,500 to 3,500; and (B) a compound capable of generating a sulfonic acid... Agent: Sughrue-265550

20080241750 - Resist composition and pattern formation method using the same: p

20080241753 - Negative resist composition:

20080241754 - Polyonium borates and radiation-sensitive composition and imageable elements containing same: A radiation-sensitive composition includes a free-radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing compound, and a polymeric binder. The initiator composition includes a unique polyonium borate comprising a polyvalent onium cation with multiple onium... Agent: Andrew J. Anderson Patent Legal Staff

20080241755 - Contact metallization of carbon nanotubes: In one embodiment, SWNTs are synthesized from an embedded catalyst in a modified porous anodic alumina (PAA) template. Pd is electrodeposited into the template to form nanowires that grow from an underlying conductive layer beneath the PAA and extend to the initiation sites of the SWNTs within each pore. Individual... Agent: Bingham Mchale LLP

20080241756 - Enhancing lithography for vias and contacts by using double exposure based on line-like features: By performing a double exposure process on the basis of bar-like or line-like features, critical via and contact openings may be defined as an intersection, thereby obtaining the desired design dimension on the basis of less critical lithography process windows. Hence, process flexibility may be enhanced while overall throughput may... Agent: J. Mike Amerson Williams, Morgan & Amerson, P.C.

20080241757 - Reproducible, high yield method for fabricating ultra-short t-gates on hfets: A method for fabricating ultra-short T-gates on heterojunction field effect transistors (HFETs) comprising the steps of (a) providing a coating of three layers of resists, with polymethylmethacrylate (PMMA) with high molecular weight on the bottom, polydimethylglutarimide (PMGI) in the middle, and PMMA with low molecular weight on the top; (b)... Agent: Bae Systems

20080241758 - Photoresist stripping solution and a method of stripping photoresists using the same: A photoresist stripping solution comprising (a) a carboxyl group-containing acidic compound, (b) at least one basic compound (for example, monoethanolamine, tetraalkylammonium) selected from among alkanolamines and specific quaternary ammonium hydroxides, (c) a sulfur-containing corrosion inhibitor and (d) water, and having a pH value of 3.5-5.5; and a method of stripping... Agent: Wenderoth, Lind & Ponack, L.L.P.

20080241759 - Method of manufacturing wiring circuit board: A conductor circuit (2) having a predetermined pattern is formed on a base material (1); a photosensitive resin composition layer is formed on a surface of the base material, on which the conductor circuit (2) having the predetermined pattern is formed, by using a photosensitive resin composition; a surface of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080241760 - Peb embedded exposure apparatus: The present disclosure provides a lithography apparatus. The apparatus includes an exposure module designed for exposure processing; a baking module embedded in the exposure module and designed for post exposure baking (PEB); and a control module designed to control the exposure module and the baking module.... Agent: Haynes And Boone, LLP

20080241762 - Photothermographic material and image forming method: A photothermographic material including at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for thermal development, and further including at least two dyes having maximum absorption wavelengths different from each other, wherein the difference between the maximum absorption wavelengths is from 10 nm to... Agent: Taiyo Corporation

20080241761 - Standard image pattern, developer evaluation method for planographic printing plate using the standard image pattern, and quality control method for planographic printing plate using the standard image pattern: The invention provides a standard image pattern for controlling a process of making printing plates, having at least: a plurality of AM halftone images, each of which is formed of dots according to Amplitude Modulation Screening, and each of which has an area coverage that is different from that of... Agent: Sughrue Mion, PLLC

20080241763 - Method of forming a dual damascene structure utilizing a developable anti-reflective coating: A method of patterning a structure in a thin film on a substrate is described. A film stack on the substrate includes the thin film on the substrate, a developable anti-reflective coating (ARC) layer on the thin film, and a first photo-resist layer on the developable ARC layer. The first... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20080241764 - Lithographic method: The present invention provides a method of lithographic patterning in order to the strength of the patterned photoresist. The method comprises: applying to a surface to be patterned a photoresist (18) comprising a polymer resin, a photocatalyst generator which generates a catalyst on exposure to actinic radiation, and a quencher;... Agent: Nxp, B.v. Nxp Intellectual Property Department

20080241765 - Methods and systems for providing direct manufactured interconnecting assemblies: A system of interconnecting structures fabricated utilizing an additive manufacturing process is described. The system includes a first component comprising a first unit of an interconnection mechanism, and a second component comprising a second unit of an interconnection mechanism. The first component and first unit are integrally formed utilizing the... Agent: John S. Beulick (24691) Armstrong Teasdale LLP

20080241766 - Method for manufacturing a semiconductor device: To overcome the limitations to development of photosensitive layers in a lithography process using a light source such as KrF, ArF, VUV, EUV, E-beam, ion beam, etc., and a patterning process of a large circuit board or a bending substrate, the invention provides a method for manufacturing a semiconductor device... Agent: Marshall, Gerstein & Borun LLP

20080241767 - Deactivating device and method for lithographic printing plate: A device as well as method for deactivating without developing an exposed lithographic printing plate is disclosed. The device comprises a structure for providing a deactivating agent that is capable of deactivating without developing the plate. The plate comprises on a substrate a photosensitive layer capable of hardening upon exposure... Agent: Gary Ganghui Teng

20080241768 - Transfer substrate, and fabrication process of organic electroluminescent devices: A transfer substrate is provided with a photothermal conversion layer and a transfer layer formed in this order on a base substrate. The transfer layer is formed of an organic material selected from the group including a first organic material, which has a weight decrease initiation temperature (Tsub) of lower... Agent: Sonnenschein Nath & Rosenthal LLP

20080241769 - Non-transparent microvoided axially stretched film, production process therefor and process for obtaining a transparent pattern therewith: A film consisting essentially of a continuous phase linear polyester matrix having dispersed therein a non-crosslinked random SAN-polymer and dispersed or dissolved therein at least one ingredient from the group of ingredients consisting of inorganic opacifying pigments, whitening agents, colorants, UV-absorbers, light stabilizers, antioxidants and flame retardants, wherein the film... Agent: Leydig Voit & Mayer, Ltd

20080241770 - Topcoat for initializing thermally rewritable media: A thermally rewritable instrument, such as a card, tag, ticket, or label, includes a substrate and a thermosensitive optical recording medium on a front or back face of the substrate. A topcoat in the form of a high-temperature coating is applied over the thermosensitive optical recording medium to substantial advantage.... Agent: Stephen B. Salai, Esq. Harter, Secrest & Emery LLP