Radiation imagery chemistry: process, composition, or product thereof inventions 08/08

20080206653 - Exposure mask: Disclosed herein is an exposure mask for use in manufacturing a semiconductor device through exposure conducted by use of extreme ultraviolet rays, including, an absorbing film configured to absorb the extreme ultraviolet rays, and a mask blank having the function of reflecting the extreme ultraviolet rays, wherein the thickness of... Agent: Sonnenschein Nath & Rosenthal LLP

20080206657 - Exposure mask substrate manufacturing method, exposure mask manufacturing method, and semiconductor device manufacturing method: A method of manufacturing an exposure mask substrate including a substrate and a light-shielding film formed on the substrate, comprising measuring a flatness of at least one substrate before formation of a light-shielding film, predicting, on the basis of a measurement result, the flatness of the substrate when the substrate... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080206655 - Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template: A mask blank includes a substrate and a thin film formed thereon and used to form a pattern. The mask blank is adapted to be subjected to dry etching corresponding to a method of producing an exposure mask by patterning the thin film by dry etching using an etching gas... Agent: Sughrue Mion, Pllc

20080206654 - Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask: A method for manufacturing a semiconductor device includes calculating a correction amount for correcting a dimension error generated in a pattern, by using an area and a total length of sides of a perimeter of the pattern included in each grid region of a plurality of mesh-like grid regions made... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080206656 - Scattering bar opc application method for sub-half wavelength lithography patterning: A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features... Agent: Mcdermott Will & Emery LLP

20080206659 - Color filter and method of manufacturing the same, and solid-state image pickup element: The present invention provides a method of manufacturing a color filter, including: forming a first color pattern in a repeating pattern on a support; forming, on the support, a second color pattern in a repeating pattern in regions where the first color pattern is not formed; removing at least one... Agent: Sughrue Mion, Pllc

20080206660 - Colored photosensitive composition, color filter, and method for making the color filter: The present invention provides a colored photosensitive composition containing a coloring agent, a resin, and a polymerizable compound, wherein the content of the coloring agent is 50% by mass to 80% by mass with reference to the total solid content, and the resin has an acid value of 1 mg... Agent: Sughrue Mion, Pllc

20080206658 - Compositions containing anthraquinone dyes: A composition composition containing (A) an alkali-soluble binder and (B) an anthraquinone dye of formula (I) wherein R1, R2, R3 and R4 are each independently of the other hydrogen, Q-Cgalkyl which may be unsubstituted or substituted by one or more halogen atoms, hydroxy groups, mercapto groups, amino groups, phenyl groups... Agent: Huntsman International Llc

20080206661 - Image forming apparatus and image forming method: An image forming apparatus having a touchdown-development type developing apparatus, in which a toner collecting roller that collects scattered toner suspended in the vicinity of a toner holding body and a two-component developer holding body is arranged on the downstream side in a rotational direction of the two-component developer holding... Agent: Clark & Brody

20080206662 - Asymmetric arylamine compounds and processes for making the same: Novel asymmetric arylamine compounds useful as hole transport molecules (HTMs) incorporated into imaging members, such as layered photoreceptor devices, and improved chemical processes for making the same. The arylamine compounds increase the charge mobility through the photoreceptor to effectuate an increase in machine speed. The chemical processes utilize a tandem... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080206663 - Chemically prepared toner and process therefor: The present disclosure relates to chemically processed toner that makes use of aqueous dispersions of release agent and/or pigment and solutions of a polymeric resin binder. The polymer solution may be prepared in an organic solvent wherein the organic solvent has some level of solubility in water. The polymer solution... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080206664 - Method for producing core material of electrophotographic ferrite carrier and resin-coated ferrite carrier: The present invention provides a method for producing a core material of an electrophotographic ferrite carrier, by charging a raw powder with an average particle size of 20 to 50 μm obtained by preparing raw materials for ferrite into a combustion flame along with a carrier gas for the raw... Agent: Greenblum & Bernstein, P.L.C

20080206665 - Toner, method for producing toner, two component developer, and image forming apparatus: First toner of the present invention includes colored particles and an external additive. The colored particles are produced by heating and aggregating a mixture that includes a resin particle dispersion in which first resin particles are dispersed and a pigment particle dispersion in which pigment particles are dispersed, so that... Agent: Hamre, Schumann, Mueller & Larson P.c.

20080206667 - High etch resistant underlayer compositions for multilayer lithographic processes: r

20080206670 - Infrared laser-sensitive planographic printing plate precursor: The invention provides an infrared laser-sensitive planographic printing plate precursor, comprising: a support having a hydrophilic surface; and a single layer or a plurality of photosensitive layers disposed on the support having a hydrophilic surface, wherein the outermost layer of the photosensitive layers includes an infrared absorbent and a copolymer... Agent: Sughrue Mion, Pllc

20080206666 - Material for the treatment of lithographic substrates and lithographic printing plates: Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).... Agent: Eastman Kodak Company Patent Legal Staff

20080206668 - Negative resist composition and pattern forming method using the same: A negative resist composition includes: (A) a compound having at least one episulfide structure (a three-membered ring structure comprising two C atoms and one S atom); (B) an alkali-soluble resin; and (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming... Agent: Sughrue-265550

20080206669 - Positive working resist composition and pattern forming method: A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of... Agent: Sughrue-265550

20080206671 - Novel polymers and photoresist compositions: The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193... Agent: Peter F. Corless Rohm And Haas Electronic Materials Llc

20080206672 - Optical information recording medium: The information recording medium is an optical information recording medium having on a substrate a recording layer that permits recording of information by irradiation with laser light of 440 nm or below, and is a heat-mode information recording medium that has a recording layer containing a methine dye and an... Agent: Sughrue-265550

20080206673 - Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same: An embodiment of the present invention is a relief printing plate for forming a high-definition pattern by a printing method, having a convex part comprising a resin layer, a base material supporting the convex part and a light reflection controlling layer, the light wave length being in range of 400... Agent: Squire, Sanders & Dempsey L.l.p.

20080206674 - Dual-layer heat-sensitive imageable elements with a polyvinyl acetal top layer: Thermally imagable elements are described comprising on a substrate with hydrophilic surface (a) a first layer comprising a first polymer soluble or swellable in aqueous alkaline developer and insoluble in organic solvents with low polarity and (b) a second layer comprising a second polymer soluble or swellable in aqueous alkaline... Agent: Eastman Kodak Company Patent Legal Staff

20080206677 - Planographic printing plate material: e

20080206675 - Planographic printing plate precursor: A planographic printing plate precursor including: a support; a hydrophilic layer including a hydrophilic polymer chemically bonded to a surface of the support, where the hydrophilic polymer has a positively-charged substituent and at least one reactive group selected from the group consisting of a reactive group capable of directly chemically... Agent: Sughrue Mion, Pllc

20080206676 - Thermally cured underlayer for lithographic application: p

20080206678 - Radiation-sensitive compositions and elements with basic development enhancers: Radiation-sensitive compositions can be used to prepare positive-working imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble polymeric binder that includes a phenolic resin (such as a novolak) or a poly(vinyl acetal). The compositions also include a developability-enhancing composition comprising one... Agent: Andrew J. Anderson Patent Legal Staff

20080206680 - Composition for forming anti-reflective coating for use in lithography: There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely,... Agent: Oliff & Berridge, Plc

20080206679 - Contrast enhancing exposure system and method for use in semiconductor fabrication: Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate includes a photoresist layer comprising photoacid generators (“PAGs”) and photobase generators (“PBGs”), is described. The method includes dividing the pattern into two... Agent: Haynes And Boone, LLP

20080206681 - Method for producing a structure on the surface of a substrate: The present invention relates to a method for producing a structure serving as an etching mask on the surface of a substrate. In this case, a first method involves forming a first partial structure on the surface of the substrate, which has structure elements that are arranged regularly and are... Agent: Patterson & Sheridan, LLP Gero Mcclellan / Qimonda

20080206682 - Fabrication method of micro-lens and fabrication method of master for micro-lens: A method of fabricating a micro lens, the method including: forming a photo-sensitive film on a substrate; placing a photo mask at a predetermined distance from a top of the photo-sensitive film; exposing the photo-sensitive film by varying an area of exposure of the photo-sensitive film so as to selectively... Agent: Staas & Halsey LLP

20080206685 - Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus: An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high resolution and is inexpensive. The exposure method exposes a pattern onto a substrate with the use of an... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080206683 - Mask and blank storage inner gas: The present disclosure provides a lithography apparatus. The lithography apparatus includes a radiation source providing a radiation energy with a wavelength selected from the group consisting of 193 nm, 248 nm, and 365 nm; a lens system configured approximate to the radiation source; a mask chamber proximate to the lens... Agent: Haynes And Boone, LLP

20080206684 - Method for forming ring pattern: A method for forming a ring pattern is disclosed. The ring pattern has a first wall and a second wall. The method includes the following steps: (a) providing a substrate; (b) forming a dielectric layer on the substrate; (c) forming a first patterned photoresist layer on the dielectric layer, the... Agent: Ingrassia Fisher & Lorenz, P.c.

20080206686 - Method of forming fine patterns of semiconductor device: A method of forming fine patterns on a semiconductor substrate includes forming a first pattern, including first line patterns having a feature size F and an arbitrary pitch P, and forming a second pattern, including second line patterns disposed between adjacent first line patterns, to form a fine pattern having... Agent: Volentine & Whitt Pllc

20080206687 - Method for determining optimal resist thickness: In an example embodiment, there is a method (600) for determining an approximately optimal resist thickness comprising providing a first substrate coated with a resist film having a first thickness using a first coat program, (605, 610). The first thickness of resist is measured (615, 620). A second substrate is... Agent: Nxp, B.v. Nxp Intellectual Property Department

20080206688 - Photothermographic materials incorporating antifoggants: Incorporation of certain compounds into photothermographic materials provides materials with reduced initial image Dmin and improved Raw Stock Keeping film stability without unacceptable loss in sensitometric properties. These compounds include certain e-i) zinc salts of an aryl sulfonic acid or of a fluorinated C2-C6 carboxylic acid, e-ii) non-encapsulated alkali metal... Agent: Carestream Health, Inc. Patent Legal Staff

20080206689 - Method of forming flexible electronic circuits: A multiple layer photosensitive silver halide element having at least one sensitised photosensitive layer on each side of a support, such as a transparent flexible support, is imagewise exposed according to a desired circuit pattern and developed to form a layer of conductive track patterns from each photosensitive layer. The... Agent: Eastman Kodak Company Patent Legal Staff

20080206690 - Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof: Compositions for use in tri-layer applications are described herein, wherein the composition has a matrix and includes: a formulated polymer comprising at least one type of silicon-based moiety forming the matrix of the polymer, a plurality of vinyl groups coupled to the matrix of the polymer, and a plurality of... Agent: Buchalter Nemer

20080206691 - Phosphor screen in rare gas discharge device: The present invention provides a phosphor screen in a Xe gas discharge device such as a plasma display device or a mercury-free flat fluorescent lamp, which phosphor having a clean surface that emit a brighter photoluminescence under the vacuum ultraviolet lights from Xe gas discharge, and which gives a wide... Agent: Birch Stewart Kolasch & Birch

20080199782 - Hologram recording material, hologram recording medium and hologram recording method: in formula (1), L1 representing a bivalent linking group, X representing a group having a substituent constant σ based on Hammett's rule of a value of more than 0, the maximum absorption wavelength of an azobenzene group bonding to X being approximately 360 nm or less, A representing a group... Agent: Oliff & Berridge, PLC

20080199783 - Double-decker pellicle-mask assembly: A pellicle-mask assembly includes a mask substrate having an absorber pattern, and a hard pellicle held against movement with respect to the mask substrate by gas pressure.... Agent: David M. O'dell Attorney For Applicants

20080199788 - Manufacturing method of thin film transistor array panel using an optical mask: A photo mask is provided. The mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo... Agent: Macpherson Kwok Chen & Heid LLP

20080199786 - Method for fabricating photomask in semiconductor device: In a method for fabricating a photomask in a semiconductor device, a phase shift layer, a first light blocking layer, an insulating (or intermediate) layer, and a second light blocking layer are deposited on a transparent substrate. A photoresist pattern selectively exposing a surface of the second light blocking layer... Agent: Townsend And Townsend And Crew, LLP

20080199787 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080199784 - Small feature integrated circuit fabrication: A method for controlling etching during photolithography in the fabrication of an integrated circuit in connection with first and second features that are formed on the integrated circuit having a gap there between comprising depositing a layer of photoresist on the integrated circuit, selectively exposing portions of the photoresist through... Agent: Infineon Technologies North America Corp.

20080199785 - Substrate fluorescence mask utilizing a multiple color overlay for embedding information in printed documents: A method is provided for creation of a substrate fluorescence mask having background color(s), UV mark color(s), and distraction color(s), to be printed as an image on a substrate containing optical brightening agents. The method includes selecting one or more UV mark colors for the mask such that the UV... Agent: Patent Documentation Center

20080199789 - Antireflective coating composition based on silicon polymer: m

20080199791 - Electrophotographic printing toner, electrophotographic printing method and liquid developer for electrophotographic printing: An electrophotographic printing toner including a colorant and a resin, wherein the colorant includes a dye having at least one reactive group selected from the group consisting of SO2CnH2nOSO3H, NHCOCnH2nOSO3H, NHSO2CnH2nOSO3H, COCnH2nOSO3H and SO2CHCH2, wherein n represents an integer of from 1 to 4.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080199792 - Image forming apparatus and image forming method: In a disclosed image forming apparatus, a developing bias applied to a developer carrier or exposure energy with which an image carrier is exposed is adjusted such that an isolated one-dot image on the image carrier has a predetermined image density. When the image carrier is exposed to form dot... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080199790 - Method of metal plating by using frame: The frame plating process of the invention comprises the dry film resist pattern formation step at which a part of the dry film resist is located in such a way as to cap the upper position of the given pattern of opening concavity corresponding to the site needing film thickness... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080199793 - Electrophotographic photoreceptor having excellent electrical properties and image quality and their high stabilities and electrophotographic imaging apparatus employing the same: e

20080199794 - Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member having excellent electrophotographic properties while being prevented from the generation of blade turn-up, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member contains... Agent: Fitzpatrick Cella Harper & Scinto

20080199795 - Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member having excellent electrophotographic properties, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member includes a polymer having a specific repeating structural unit and... Agent: Fitzpatrick Cella Harper & Scinto

20080199796 - Polycarbonate resin, process for producing the same and electrophotographic photoreceptor using the same:

20080199797 - Curable toner compositions and processes: An emulsion aggregation toner composition includes toner particles including: an unsaturated polymeric resin, selected from amorphous resins, crystalline resins, and mixtures thereof; an optional colorant; an optional wax; an optional coagulant; and a photo initiator capable of initiating crosslinking of said unsaturated polymeric resin.... Agent: Oliff & Berridge, PLC.

20080199798 - Electrostatic image developing toner, method for producing same, electrostatic image developer, image forming method and image forming apparatus: An electrostatic image developing toner includes a polyester resin, the electrostatic image developing toner having a sulfur element concentration S at % and a nitrogen element concentration N at % which satisfies 0.5≦N/S≦10, the nitrogen element concentration N being from 0.002 at % to 2.5 at %.... Agent: Oliff & Berridge, PLC

20080199799 - Electrostatic image developer, process cartridge, and image forming apparatus: An electrostatic image developer contains a toner and a carrier having a resin coating layer formed on the surface of a core material containing a ferrite component, wherein a ratio R1/R2 is from 0.88 to 0.92 where R1 is the resistance value (Ω) of the developer having a toner concentration... Agent: Oliff & Berridge, PLC

20080199800 - Resin-filled ferrite carrier for electrophotographic developer and electrophotographic developer using the ferrite carrier: A resin-filled ferrite carrier for an electrophotographic developer filled with a silicone resin in voids of a porous ferrite core material which continuously extend from a surface to a core interior, wherein the resin-filled ferrite carrier has an average particle size of 20 to 50 μm, and (Si/Fe)×100 as determined... Agent: Greenblum & Bernstein, P.L.C

20080199801 - Liquid developer and image forming apparatus: A liquid developer includes: an insulating liquid having dispersed therein toner particles, the insulating liquid containing a fatty acid monoester that is an ester of a fatty acid and a monohydric alcohol, and the insulating liquid having an aniline point of from 5 to 80° C.... Agent: Hogan & Hartson L.L.P.

20080199802 - Toner process: The present disclosure relates to a process for latex preparation comprising a first heating of a latomer mixture comprising at least one free radical polymerizable monomer to low conversion and then adding at least one alkylene anhydride; a second heating of the latomer mixture to low conversion; a third heating... Agent: Mh2 Technology Law Group, LLP (cust. No. W/xerox)

20080199803 - Image forming method and image display body: An image forming method of forming a full-color image in which black can be expressed in addition to a color expressed by diffracted light. Each of plural diffraction gratings R, G, and B is transferred onto a base material from a transfer sheet in which the plural diffraction gratings R,... Agent: Ladas & Parry LLP

20080199806 - Patterning process and resist composition: A pattern is formed by applying a positive resist composition comprising a polymer comprising 7-oxanorbornane ring-bearing recurring units and acid labile group-bearing recurring units and an acid generator onto a substrate to form a resist film, heat treating and exposing the resist film to radiation, heat treating and developing the... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080199805 - Photosensitive compositions employing silicon-containing additives: A photosensitve composition exhibiting high resolution and enhanced, tunable O2 plasma etch resistance comprising a silicon-containing base polymer, a silicon-containing additive, a photoacid generator and solvent is provided. A method of forming a patterned resist film is also provided.... Agent: Paul D. Greeley, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20080199804 - Polymerizable composition, lithographic printing plate precursor and lithographic printing method: A polymerizable composition contains a binder polymer containing a functional group having a dipole moment of 3.8 debye or more and being represented by the formula (1), (2), (3), (4) or (5) as defined herein, a radical polymerizable compound and a radical polymerization initiator.... Agent: Sughrue-265550

20080199807 - Optical information recording medium, method of recording information and method of using compound: The optical information recording medium comprises a recording layer comprising a dye on a support. The recording layer comprises a compound comprising a substituent having a property of producing a gas by thermal decomposition. The method of recording information on the recording layer comprised in the above optical information recording... Agent: Sughrue Mion, PLLC

20080199808 - Optical information recording medium and method of recording information: A denotes a hydrogen atom or a substituent, B1, B2, B3, and B4 each independently denote an atom group forming an aromatic ring with two terminal carbon atoms, M denotes two hydrogen atoms, a divalent to tetravalent metal atom, a metal oxide, a metal atom having a ligand, or a... Agent: Sughrue Mion, PLLC

20080199809 - Optical information recording medium and method of recording information: A denotes a hydrogen atom or a substituent, B1, B2, B3, and B4 each independently denote an atom group forming an aromatic ring with two terminal carbon atoms, M denotes two hydrogen atoms, a divalent to tetravalent metal atom, a metal oxide, a metal atom having a ligand, or a... Agent: Sughrue Mion, PLLC

20080199810 - High performance curable polymers and processes for the preparation thereof: or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substitutents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed is a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned... Agent: Patent Documentation Center

20080199811 - Photosensitive composition and two-photon absorption photorecording medium: wherein D represents a light-absorptive portion composed of a group to give a two-photon absorption compound which is 100 GM or larger of two-photon absorption cross-section in a wavelength longer than 400 nm; A represents an active portion capable of interacting with the light-absorptive portion D that is excited by... Agent: Birch Stewart Kolasch & Birch

20080199812 - Method for making a negative-working lithographic printing plate precusor: e

20080199813 - Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis: According to one exemplary embodiment, a method for forming a photoresist pattern on a semiconductor wafer includes forming a photoresist including an organic polymer matrix on the semiconductor wafer. The method further includes exposing the photoresist to a patterned radiation. The method further includes baking the photoresist after exposing the... Agent: Farjami & Farjami LLP

20080199814 - Device manufacturing process utilizing a double patterning process: the photosensitive compositions have photoacid generator and substantially aqueous base insoluble polymer whose solubility increases upon treatment with acid and further comprises an anchor group, and the fixer is a polyfunctional compound reactive with anchor group, but does not contain silicon and the substrate stays within a lithographic cell from... Agent: Paul D. Greeley, Esq. Ohlandt, Greeley, Ruggiero & Perle, L.L.P.

20080199815 - Plasma display panel and method for fabricating the same: A plasma display panel in which projections are formed in grooves between partitions and phosphor layers are provided on the projections so as to increase the area where phosphor adheres and thereby to increase the luminance. A couple of substrates are opposed to each other to form a discharge space.... Agent: Staas & Halsey LLP

20080199816 - Method of automatic fluid dispensing for imprint lithography processes: Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser... Agent: Board Of Regents, The University Of Texas System

20080199817 - Resist pattern forming method: A resist pattern forming method includes preparing a photomask for generating near-field light having an intensity distribution. The photomask has a light-transmissible base member, and a light-blocking film. The film has a micro-aperture adapted to expose an object to near-field light seeping out from the micro-aperture. The photomask has a... Agent: Fitzpatrick Cella Harper & Scinto

20080193857 - Hologram recording material, process for producing the same and hologram recording medium: The present invention provides a hologram recording material which is suitable for volume hologram record and attains high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low shrinkage and high multiplicity in holographic memory record using not only a green laser but also a blue laser; a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080193858 - Polymerizable compound, optical recording composition, holographic recording medium and method of recording information: In general formula (1), A denotes an oxygen atom, sulfur atom, or NR, R denotes a hydrogen atom, alkyl group, aryl group, or heterocyclic group, X denotes a hydrogen atom, polymerizable group, optionally polymerizable group-substituted alkyl group or the like, B and C each independently denote a hydrogen atom, halogen... Agent: Birch Stewart Kolasch & Birch

20080193859 - Dual metric opc: A technique for creating mask layout data to print a desired pattern of features via a photolithographic process includes defining one or more subresolution assist features (SRAFs) and performing OPC on printing features and the added SRAF features.... Agent: Klarquist Sparkman, LLP

20080193860 - Glossmark image simulation: A method of simulating a differential gloss image includes providing a background and a gloss effect image. The gloss effect image is configured for controlling the selective application of first and second halftones to the background image for creation of a differential gloss image when the background image is printed.... Agent: Fay Sharpe / Xerox - Rochester

20080193863 - Mask set for microarray, method of fabricating mask set, and method of fabricating microarray using mask set: Provided are a mask set for in-situ synthesizing probes of a microarray, a method of fabricating the mask set, and a method of fabricating the microarray using the mask set. A mask set for a microarray includes a plurality of masks for in-situ synthesizing probes onto a substrate which includes... Agent: F. Chau & Associates, Llc

20080193864 - Mask set for microarray, method of fabricating mask set, and method of fabricating microarray using mask set: A mask set with a light-transmitting region of a controlled size includes a plurality of masks for performing in-situ synthesis on probes of a microarray, wherein each mask includes a light-transmitting region and a light-blocking region, and the size of the light-transmitting region is equal to or greater than about... Agent: F. Chau & Associates, Llc

20080193861 - Method for repairing a defect on a photomask: A method for repairing a defect on a photomask includes coating a resist on a photomask substrate. The photomask substrate includes phase shift layer patterns formed on the photomask substrate, light blocking layer patterns formed over the phase shift layer patterns and a defect formed between adjacent phase shift layer... Agent: Townsend And Townsend And Crew, LLP

20080193862 - Reflective mask blank: A reflective mask and a reflective mask blank that can form a fine mask pattern with high accuracy in shape, achieve a sufficient contrast in a pattern inspection, and enable a pattern transfer with high accuracy. On a substrate (11), a multilayer reflective film (12) for reflecting an exposure light,... Agent: Sughrue Mion, Pllc

20080193865 - Toner, developer, toner container and latent electrostatic image carrier, and process cartridge, image forming method, and image forming apparatus using the same: r

20080193866 - Polyhydroxy siloxane photoconductors: An imaging member including an optional supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and an overcoating layer in contact with and contiguous to the charge transport, and which overcoating is comprised of an acrylated polyol, a polyalkylene... Agent: Patent Documentation Center

20080193867 - Electrophotographic photoreceptor and image-forming apparatus: (wherein R1 represents a group having a chiral center, R2 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent, R3 and R4 each independently represents an alkylene group which may have a substituent, or an arylene group which... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080193868 - Dry toner, processes for the production thereof, and the use thereof: The invention relates to a dry toner, containing a platelet-type metal effect pigment or a plurality of platelet-type metal effect pigments and at least one resinous constituent, wherein the metal effect pigment or the metal effect pigments is/are additionally provided with a coating preferably suitable for improving the mechanical stability,... Agent: Ostrolenk Faber Gerb & Soffen

20080193869 - Ultra low melt emulsion aggregation toners having a charge control agent: Toner compositions comprising toner particles including an amorphous resin, a crystalline resin and a charge control agent. The toner compositions having the charge control agent exhibit improved charge performance in the C-zone and the A-zone, and improved RH sensitivity.... Agent: Oliff & Berridge, Plc.

20080193870 - Toner particles and method and system for the production thereof: The invention relates to a toner powder wherein the individual toner particles of the toner powder contain colorants incorporated into at least one polymer, in particular, pigments. The initial product of the polymer consists of a liquid phase based on a monomer and/or oligomer. Subsequently, the colorants, in particular pigments,... Agent: Fay Sharpe LLP

20080193873 - Changing light absorption by disruption of conjugation: Copy-protected optical medium utilizing a composition comprising a transient optical state change security materials constrained to change the optical state light absorption at a wavelength of about 400 nm and an electron transfer agent.... Agent: Kelley Drye & Warren LLP

20080193874 - Chemically amplified resist composition: p

20080193875 - Composite photoresist structure: A composite photoresist structure includes a first organic layer disposed over a substrate to be etched, a sacrificial layer disposed on the first organic layer, and a second organic layer disposed on the sacrificial layer. The thickness of the first organic layer and the thickness of the second organic layer... Agent: North America Intellectual Property Corporation

20080193872 - Compositions and processes for immersion lithography: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials having a water contact angle that can be changed by treatment with base and/or one or more materials that comprise fluorinated photoacid-labile groups and/or one or more materials... Agent: Peter F. Corless Rohm And Haas Electronic Materials Llc

20080193871 - Positive resist composition for immersion exposure and method of forming resist pattern: A positive resist composition for immersion exposure that includes a resin component (A) that exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the resin component (A) includes a resin (A1) that has alkali-soluble groups (i) having a... Agent: Knobbe Martens Olson & Bear LLP

20080193877 - Compositions for use in forming a pattern and methods of forming a pattern: wherein R1, R2, R3, R4 and R5 independently denote a hydrogen atom, a hydroxyl group, an alkyl group, a hydroxyalkyl group, an aminoalkyl group, a mercaptoalkyl group, an amino group, a mercapto group or an ammonium salt, R6 denotes a hydrogen atom or an alkyl group, m denotes an integer... Agent: Volentine & Whitt Pllc

20080193878 - Resist composition and pattern forming method using the same: A resist composition includes: (A) a resin containing a repeating unit having a specific secondary benzyl structure; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method using the composition.... Agent: Sughrue-265550

20080193876 - Rinsing liquid for lithography and method for resist pattern formation: This invention provides a novel rinsing liquid for lithography, which, for a photoresist pattern, can reduce surface defects, the so-called defects, without sacrificing the quality of the product, and, at the same time, can impart resistance to electron beam irradiation to suppress the shrinkage of the resist pattern, and a... Agent: Wenderoth, Lind & Ponack, L.l.p.

20080193879 - Self-topcoating photoresist for photolithography: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive... Agent: Schmeiser, Olsen & Watts

20080193880 - Water soluble resin composition and method for pattern formation using the same: In the present invention, in a water soluble resin composition for use in a method for pattern formation in which a covering layer is provided on a resist pattern formed of a radiation-sensitive resin composition capable of coping with ArF exposure to increase the width of the resist pattern and... Agent: Az Electronic Materials Usa Corp. Attention: Industrial Property Dept.

20080193881 - Method of pattern delineation: A method of delineating a lithographic pattern on a material. A pattern to be delineated is divided according to first and second fields by first and second methods of division. Pattern segments contained in the first fields are divided in the X-direction, and data about the resulting pattern subsegments is... Agent: The Webb Law Firm, P.c.

20080193882 - Pattern formation method: After forming a lower layer film, an intermediate layer film and a first resist film on a substrate, a first resist pattern is formed by performing first exposure. Then, after a first intermediate layer pattern is formed by transferring the first resist pattern onto the intermediate layer film, a second... Agent: Mcdermott Will & Emery LLP

20080193883 - Barrier film material and pattern formation method using the same: A resist film is formed on a substrate, and a barrier film including a compound whose alkali-insoluble property is changed to an alkali-soluble property through molecular structure change caused by an alkaline solution is formed on the resist film. Thereafter, with an immersion liquid provided on the barrier film, pattern... Agent: Mcdermott Will & Emery LLP

20080193884 - Image forming method: An image forming method comprising the steps of: (1) applying a laser beam to a heat developable photosensitive material with a scanning exposure part comprising a semiconductor laser, a polygon mirror, and an imaging lens formed of a resin, the imaging lens comprising at least one of an fθ lens... Agent: Lucas & Mercanti, LLP

20080193885 - Composition and probe for detection of hydrocarbon mixtures: A visual indicating paste for detecting the level of hydrocarbons in a storage container is disclosed. The visual indicating paste is a physical mixture of a non-polar dye, a high molecular weight carrier, a whitening agent and a filler material.... Agent: Arthur M. Peslak, Esq. Mandel & Peslak, Llc

20080187843 - photomask and method for manufacturing a semiconductor device using the photomask: A photomask including a chip area and a shaded area with a first transmitting pattern located in the chip area forming a ring shape with a missing part, and a second transmitting pattern located in the shaded area having a shape corresponding to the missing part of the first transmitting... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080187842 - Method and system for wafer inspection: A method for inspecting semiconductor wafers patterned by a photomask includes loading a first wafer and scanning a first image of the first wafer, loading a second wafer and scanning a second image of the second wafer, comparing the first and second images, and classifying a difference detected between the... Agent: Haynes And Boone, LLP

20080187841 - Phase shift mask with two-phase clear feature: Systems and methods are provided for use in photolithography. In one embodiment, a reticle is provided that comprises a phase shift and transmission control layer, wherein a gap in the phase shift and transmission control layer defines a line. Adjacent to the phase shift and transmission control layer is an... Agent: Knobbe Martens Olson & Bear LLP

20080187844 - Data storage: The invention relates to materials and devices including these materials which have three-dimensional optical data storage capabilities, as well as to related methods and apparatus for storage, reading and erasing optical data. In particular, the invention relates to a three-dimensional optical data storage device comprising a data storage material which... Agent: Mcdermott Will & Emery LLP

20080187845 - Lithographic method: A method of providing a pattern on a substrate is disclosed. The method includes providing a layer of photoresist on the substrate, providing a layer of top coating over the layer of photoresist, lithographically exposing the photoresist layer and developing the photoresist to form a structure, covering the structure with... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080187847 - Electro photographic photoconductor and color image forming apparatus: Provided are an electrophotographic photoconductor which shows a small variation in sensitivity and exhibits a high sensitivity even at a small amount of light exposure and a tandem-system color image forming device provided with the electrophotographic photoconductor. A positive charging type electrophotographic photoconductor for use in a tandem-system color image... Agent: Casella & Hespos

20080187846 - Image carrier, process cartridge and image-forming apparatus: An image carrier includes a conductive base material and a photosensitive layer formed on the base material. The photosensitive layer has an outermost surface layer that contains particles having a number-averaged particle sphericality represented by Formula (1) of approximately 0.7 or less: sphericality=4πA/L2 (1), where π represents the circular constant,... Agent: Oliff & Berridge, PLC

20080187848 - Electrophotographic photoreceptor, and process cartridge and image forming apparatus employing the same: wherein each of X, Y and Z represents a hydrogen atom, a halogen atom, a halogen-substituted alkyl group or a halogen-substituted alkoxy group; at least one of X, Y and Z represents a fluorine atom; each of R4, R5, R6 and R7 represents a hydrogen atom, a halogen atom or... Agent: Lucas & Mercanti, LLP

20080187849 - Electrophotographic apparatus: An electrophotographic apparatus comprising an electrophotographic photoreceptor having the foremost layer containing organic fine particles and inorganic fine particles, which uses a dry-type magnetic toner having a charge amount of 10.0 μc/g or more and 30.0 μc/g or less.... Agent: Nixon & Vanderhye, PC

20080187850 - Tunable electrophotographic imaging member and method of making same: Disclosed herein is an electrophotographic imaging member comprising a supporting substrate and a charge generating layer. The charge generating layer comprises a binder, a first pigment having a first photosensitivity, and a second pigment having a second photosensitivity that is at least 2% greater than the photosensitivity of the first... Agent: Alix, Yale & Ristas, LLP

20080187851 - Method of marking material, marked and verification of genuineness of a product: The invention relates to the marking of a material (18) with identifier marks (16), the material thus marked, and verification of the genuineness of a product on the basis of the marks. In accordance with the invention, an optical brightener is incorporated in the material (18), and marking is performed... Agent: Birch Stewart Kolasch & Birch

20080187852 - Fixing member, manufacturing method thereof, and fixing apparatus and electrophotographic image forming apparatus using the same: An object of the present invention is to provide a fixing member which includes a surface layer including fluorine rubber having an ether bond and a polysiloxane having a polyether structure, and which has excellent adhesion between the surface layer and a substrate. A fixing member is provided including a... Agent: Fitzpatrick Cella Harper & Scinto

20080187853 - Toner: The present invention aims to provide a toner having excellent developability and excellent low-temperature fixability without causing adhesion of ejected sheets even in a high-speed oilless fixing system and capable of preventing a frameless printing from causing a twisted offseting phenomenon. Specifically, provided is a toner having toner particles including... Agent: Fitzpatrick Cella Harper & Scinto

20080187854 - Electrostatic image developing toner, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus: An embodiment of the present invention provides an electrostatic image developing toner including a binder resin containing amorphous polyester resin containing a tin-containing catalyst and crystalline polyester resin containing a titanium-containing catalyst, and a colorant and a releasing agent, an electrostatic image developer using the same, a toner cartridge, a... Agent: Oliff & Berridge, PLC

20080187855 - Hybrid toner processes: A toner process that includes a first heating of a colorant dispersion, a first polyester resin free latex emulsion, a second polyester latex emulsion, and a wax dispersion in the presence of a coagulant containing a metal ion; adding a third polyester free latex; adding an organic sequestering compound or... Agent: Patent Documentation Center

20080187857 - Toner for electrophotography, image forming apparatus, and toner manufacturing method: A toner for electrophotography satisfies Ft/Dt≦3.0 [nN/μm], where Ft is an inter-toner non-electrostatic adhesion force after a compressive stress within 0.7×10−2 [N m2] to 1.5×10−2 [N/m2] is applied, and Dt is a diameter of a toner particle. The inter-toner non-electrostatic adhesion force is obtained by filling a two-dividable cell for... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080187856 - Toner formulation for controlling mass flow: The present invention relates to controlling the mass flow of toner in an image forming device or a toner cartridge. The toner composition includes extra particulate additives including a conductive additive. The extra particulate additives may also include relatively small silica particles or relatively large silica.... Agent: Lexmark International, Inc. Intellectual Property Law Department

20080187858 - Substrate for electrophotographic photoreceptor, process for producing the substrate, and electrophotographic photoreceptor employing the substrate: An electrophotographic photoreceptor substrate which can be easily produced with high productivity and prevents the occurrence of image defects, and which has fine grooves formed in the surface thereof and is characterized in that the grooves are curved and discontinuous when the substrate surface is developed on a plane.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080187860 - Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D)... Agent: Sughrue-265550

20080187859 - Radiation-sensitive resin composition: p

20080187861 - Master substrate and method of manufacturing a high-density relief structure: The present invention relates to a master substrate (10) for optical recording comprising a recording layer (12) and a substrate layer (14), the recording layer comprises a growth dominated phase-change material, the chemical properties with respect to chemical agents of which may be altered due to a phase change induced... Agent: Philips Intellectual Property & Standards

20080187862 - New photosensitive polymeric material for worm optical data storage with two-photon fluorescent readout: Image formation via photoinduced fluorescence changes in a polymeric medium with two-photon fluorescence readout of a multi-layer structure. Fluorophore-containing polymers, possessing one or more basic functional groups, underwent protonation in the presence of a photoinduced acid generator upon exposure to a broad-band UV light source or fast-pulsed red to near-IR... Agent: Brian Steinberger/ucf

20080187866 - Novel dyes and use thereof in imaging members and methods: There are described novel rhodamine dye compounds and imaging members and imaging methods, including thermal imaging members and imaging methods, utilizing the compounds. The dye compounds exhibit a first color when in the crystalline form and a second color, different from the first color, when in the liquid, amorphous form.... Agent: Foley & Lardner LLP

20080187864 - Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process: wherein R1 to R5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene... Agent: Fitzpatrick Cella Harper & Scinto

20080187865 - Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process: wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or... Agent: Fitzpatrick Cella Harper & Scinto

20080187863 - Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition: A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable... Agent: Sughrue-265550

20080187867 - Photosensitive polyimide composition, polyimide film and semiconductor device using the same: A photosensitive polyimide composition, a polyimide film, and a semiconductor device using the same are disclosed. The photosensitive polyimide composition can be cured by heating. A polyhydroxyimide is used as a base resin and can be mixed with a photoacid generator and a cross-linking agent having two or more vinylether... Agent: Cantor Colburn, LLP

20080187868 - Photoactive compounds: The present application relates to a composition comprising a) a polymer containing an acid labile group; b) a compound selected from (i), (ii) and mixtures thereof, where (i) is Ai Xi Bi and (ii) is Ai Xi1; and c) a compound of formula Ai Xi2 where Ai, Bi, Xi, Xi1,... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20080187869 - Exposure control for phase shifting photolithographic masks: Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are... Agent: Numerical C/o Haynes Beffel & Wolfeld LLP

20080187870 - Method for forming photoresist pattern, method for manufacturing display panel, and method for manufacturing display device: A method for forming a photoresist pattern includes forming a photoresist, and forming a photoresist pattern having a step portion by performing a light exposure process a different number of times according to a region. A method for manufacturing a display panel and a method for manufacturing a display device... Agent: Cantor Colburn, LLP

20080187872 - Exposure apparatus: An exposure apparatus exposing a plurality of shot areas on a substrate to light through a liquid includes a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck, a projection optical system configured to project a light through an original onto... Agent: Canon U.s.a. Inc. Intellectual Property Division

20080187874 - Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method: A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080187873 - Method for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper: A nanoimprinting configuration includes a UV light diffuser that randomizes a collimated UV light beam so as to diffuse the shadowing effect from any defect object that resides in the UV optical path. In addition, a combination center circular pad and outer ring-shaped pad form a donut-shaped “non-contact” area between... Agent: Bracewell & Giuliani LLP

20080187871 - Pattern forming apparatus and method: A pattern forming apparatus as exposure apparatus includes first and second movable stages for respectively supporting first and second boards placed thereon, and for transporting each board back and forth on a transport path. A pattern forming unit with DMD and laser forms a pattern on the board according to... Agent: Young & Thompson

20080187875 - Photothermographic material: p