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USPTO Class 430 | Browse by Industry: Previous - Next | All 07/2008 | Recent | 09: Oct | Sept | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 08: Dec | Nov | Oct | Sp | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 07: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 06: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Radiation imagery chemistry: process, composition, or product thereof inventions 07/08Recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.Listing format for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 07/31/2008 > patent applications in patent subcategories. 20080182177 - Method for producing holographic recording medium: A method for producing a holographic recording medium having a holographic recording layer between a first substrate and a second substrate including the steps of: providing a holographic recording layer forming composition onto the first substrate, forming the holographic recording layer between the first and substrate and the second substrate... Agent: Frishauf, Holtz, Goodman & Chick, PC 20080182178 - Bleachable materials for lithography: m 20080182179 - Gray tone mask and method for manufacturing the same: A gray tone mask includes a transparent substrate and a light blocking layer. The light blocking layer is disposed on the transparent substrate and has a transparent region with a minimum thickness, an opaque region with a maximum thickness and a gray tone region with an intermediate thickness, wherein the... Agent: Lowe Hauptman Ham & Berner, LLP 20080182181 - Mask pattern of semiconductor device and manufacturing method thereof: Provided is a mask pattern of a semiconductor device. The mask pattern includes a plurality of main patterns and a plurality of assistance patterns. The main patterns are adjacent to one another. The assistance pattern is disposed on at least one of an end portion and a middle portion of... Agent: The Law Offices Of Andrew D. Fortney, Ph.d., P.C. 20080182182 - Method for manufacturing phase shift mask using electron beam lithography: Disclosed herein is a method for manufacturing a phase shift mask. An embodiment of the disclosed method includes forming a conductive layer on a mask substrate, irradiating a predetermined area of the mask substrate on which the conductive layer is formed with an electron beam, etching the predetermined area, and... Agent: Marshall, Gerstein & Borun LLP 20080182180 - Pellicle film optimized for immersion lithography systems with na>1: An optical pellicle to protect a photomask from particulate contamination during semiconductor lithography is provided which has enhanced transparency and operational characteristics. The pellicle utilizes alternating layers of a transparent polymer and a transparent inorganic layer to form pellicles which have high transmission properties and high strength. In a preferred... Agent: Law Office Of Delio & Peterson, LLC. 20080182183 - Reflective mask blank for euv lithography: A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182184 - Color filter substrate, manufacturing method thereof and liquid crystal display: Provided is a color filter substrate that comprises a substrate. A black matrix, a color filter layer, and a transparent conductive layer are formed on the substrate and the color filter layer is formed in a pixel area defined by the black matrix. A metal conductivity-enhanced layer is formed above... Agent: Sheridan Ross PC 20080182185 - Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect: A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182187 - Color image forming developer, color image forming method, and color image forming device: The present invention provides a color image forming developer comprising yellow, magenta, and cyan toners each containing an infrared absorber, wherein the cyan toner has a maximum infrared absorbance in the infrared region lower than that of the magenta toner and that of the yellow toner, to simultaneously attain sufficient... Agent: Oliff & Berridge, PLC 20080182186 - Toner, method for manufacturing the same, and image forming method: To provide a toner manufacturing method including: dissolving or dispersing a toner material into an organic solvent to prepare a toner solution, the toner material containing at least an active hydrogen group-containing compound, polymer reactive with the active hydrogen group-containing compound, binder resin, releasing agent and coloring agent; emulsifying or... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182188 - Toner receiving composition: In one aspect of the present system and method, an electrophotographic media includes a base media, at least one sub-layer formed on a first side of the base media, and an image receiving layer formed on the at least one sub-layer, wherein the image receiving layer includes a cross-linked resin... Agent: Hewlett Packard Company 20080182189 - Toner for developing electrostatic image and method of producing the same: A toner for developing electrostatic image which has a reduced residual amount of a decomposed product of a polymerization initiator remaining in the toner upon production (mainly an ether component) and an unreacted polymerizable monomer (mainly styrene), less odor produced upon fixing so as to avoid deteriorating surrounding environment, an... Agent: Westerman, Hattori, Daniels & Adrian, LLP 20080182190 - Toner, method for producing toner, and image forming apparatus: An object of the present invention is to provide a toner for electrostatic development containing core-shell type toner particles, which can decrease the amount of a toner fused onto a developing roller and a regulating blade of a developing device in a development process. An aspect of the present invention... Agent: Casella & Hespos 20080182191 - Emulsion aggregation toner composition: An emulsion aggregation toner having toner particles comprising a gel latex, a high Tg latex and at least one wax, wherein the toner fuses at about 170° C. to about 220° C. at process speeds of from about 560 mm/s to about 870 mm/s, wherein the toner exhibits a crease... Agent: Oliff & Berridge, PLC. 20080182192 - Toner compositions: Toners made by the emulsion aggregation process comprising an amorphous resin and a nucleated crystalline resin. Such toners demonstrate improved charging performance in the A-zone and the C-zone, improved heat cohesion and improved resistivity.... Agent: Oliff & Berridge, PLC. 20080182193 - Polyester emulsion containing crosslinked polyester resin, process, and toner: A polyester resin emulsion includes crosslinked polyester resin in an emulsion medium, the crosslinked polyester resin having a degree of crosslinking of from about 0.1 percent to about 100 percent. The emulsion can be formed by solvent flashing a mixture of a polyester resin, an initiator, a solvent, and an... Agent: Oliff & Berridge, PLC. 20080182194 - Polyester for toner: A polyester for a toner having a softening point of from 70° to 110° C. and a glass transition temperature of from 38° to 60° C., obtained by polycondensing an alcohol component containing a propylene oxide adduct of bisphenol A and an ethylene oxide adduct of bisphenol A in a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182195 - Toner for electrophotography: A toner for electrophotography is provided including a binder resin, a colorant, a charge control agent, and a release agent, wherein a glass transition temperature (Tg) is over 55° C., a molecular weight distribution (MWD) is in the range of about 4.5 to 5.5 when a weight average molecular weight... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P. 20080182196 - System and method for controlling particle conductivity in a liquid developer: In one aspect of the present system and method, a method for enhancing a chargeability of a liquid developer includes presenting a liquid developer and combining a Group 3 based charge adjuvant with the liquid developer... Agent: Hewlett Packard Company 20080182197 - Production method of electrophotographic photosensitive member: A production method of an electrophotographic photosensitive member which has high productivity when producing a surface layer in which depressed portions which are independent respectively are formed on an electrophotographic photosensitive member surface, and can produce highly uniform depressed portions in a photosensitive member surface, characterized by producing the surface... Agent: Fitzpatrick Cella Harper & Scinto 20080182198 - Method for producing positively chargeable toner: A method for producing a positively chargeable toner is described. The method for producing a positively chargeable toner may include the steps of: mixing and emulsifying a charge-controlling resin having a positive polar group, an organic solvent and an aqueous medium to form an emulsion, and then removing the organic... Agent: Banner & Witcoff, Ltd. Attorneys For Client Nos. 0166889, 006760 20080182199 - Toner, production process for the same, and image forming method: To provide a toner production process in which at least radically polymerizable monomers are polymerized in at least one of a supercritical fluid and a subcritical fluid to thereby produce toner particles, wherein a polymer of the radically polymerizable monomers is insoluble in at least one of the supercritical fluid... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182200 - Recording medium for electrophotographic image forming apparatus: A recording medium for an electrophotographic image forming apparatus is provided, including: a substrate layer, a toner receiving layer formed on one side or both sides of the substrate layer, and an outermost layer formed on the toner receiving layer, in which the outermost layer includes a thermoplastic resin incorporating... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P. 20080182201 - Light sensitive planographic printing plate material: The present invention provides a light sensitive planographic printing plate material which is suitable for exposure employing a laser emitting light with an emission wavelength of from 350 to 450 nm, and which exhibits high sensitivity and storage stability, as well as excellent safelight property. The light sensitive planographic printing... Agent: Frishauf, Holtz, Goodman & Chick, PC 20080182203 - Photoacid generators, photoresist composition including the same and method of forming pattern using the same: A photoresist composition includes about 4% to about 10% by weight of a photoresist resin, about 0.1% to about 0.5% by weight of a photoacid generator having a sulfonium-salt cationic group and a sulfonium-salt anionic group containing a carboxyl group as a hydrophilic site and a remainder of a solvent.... Agent: Mills & Onello LLP 20080182204 - Photoresists comprising novolak resin blends: Photoresist compositions are provided comprising a radiation sensitive component and at least two distinct novolak resins. In one aspect, photoresists of the invention exhibit notably high dissolution rates, such as in excess of 800 angstroms per second in aqueous developer solution. In another aspect, photoresists of the invention can exhibit... Agent: Peter F. Corless Rohm And Haas Electronic Materials LLC 20080182202 - Planographic printing plate material and resin used therein: Disclosed is a planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a resin comprising a residue of a bicyclic heterocyclic compound with a fused bicyclic ring, wherein the fused bicyclic ring contains two or more of —C(═O)— or two or more of —NH—... Agent: Frishauf, Holtz, Goodman & Chick, PC 20080182205 - Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same: A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a polymerizable compound and a polymerization initiator. Also provided is a planographic printing plate precursor having a polymerizable layer on a hydrophilic support, the... Agent: Birch Stewart Kolasch & Birch 20080182206 - Positive-working imageable elements: Positive-working imageable elements have a substrate and an imageable layer that can be used to prepare lithographic printing plates. The imageable elements also include a radiation absorbing compound, and a mixture of first and second polymers in the same imageable layer. The first polymer has two or more centered H-bonds... Agent: Andrew J. Anderson Patent Legal Staff 20080182207 - Method for manufacturing display device: An object is to provide a display device that can be manufactured with increased use efficiency of a material by a simplified manufacturing process and a manufacturing technique thereof. A light-absorbing layer is formed, an insulating layer is formed over the light-absorbing layer, the light-absorbing layer and the insulating layer... Agent: Cook, Alex, Mcfarron, Manzo, Cummings & Mehler, Ltd. 20080182208 - Method and system for closing plate take-over in immersion lithography: Aspects of the present disclosure provide a method and a system for closing plate take-over in immersion lithography. A plate holder is provided for a closing plate in a wafer holder of an immersion lithography system. An optical detector is provided below the plate holder for determining whether a light... Agent: Haynes And Boone, LLP 20080182209 - Method of fabricating semiconductor device, and developing apparatus using the method: In a resist pattern forming method in which bake processing is performed at a temperature not lower than a glass transition temperature in order to obtain the desired sidewall angle, resist removable is difficult. Accordingly, in the resist pattern forming method of performing bake processing at a temperature not lower... Agent: Fish & Richardson P.C. 20080182210 - Image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus: The disclosure relates to an image-projecting system, such as a projection objective of a microlithographic projection exposure apparatus. In some embodiments, at least one optical element includes a cubic-crystalline material which at a given operating wavelength has a refractive index n that is greater than 1.6. The image-side numerical aperture... Agent: Fish & Richardson PC 20080182211 - Resist pattern forming method: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080182212 - Stabilized dyes for thermal dye transfer materials: The present invention relates to a cyan dye donor element for thermal transfer imaging comprising a support having thereon a dye layer comprising a mixture of at least two cyan dyes dispersed in a polymeric binder, wherein at least one of the at least two cyan dyes is a light... Agent: Andrew J. Anderson Patent Legal Staff 07/24/2008 > patent applications in patent subcategories.20080176145 - Method for manufacturing holographic recording medium and method for manufacturing semiconductor device: To provide a method for manufacturing a holographic recording medium and a method for manufacturing a semiconductor device, by which effects of distortion or irregularities of the surface of an exposure object can be reduced. The method includes the steps of: splitting a laser beam emitted from a laser oscillator... Agent: Nixon Peabody, LLP 20080176146 - Photosensitive composition containing organic fine particles: It is an object of the present invention to provide a photosensitive composition capable of forming permanent holograms with low light scattering loss and high diffraction efficiency, and a method for forming a pattern. A photosensitive composition and a pattern formation method using the photosensitive composition are characterized in that... Agent: Oliff & Berridge, Plc 20080176149 - Endpoint detection for photomask etching: Apparatus and method for endpoint detection are provided for photomask etching. The apparatus provides a plasma etch chamber with a substrate support member. The substrate support member has at least two optical components disposed therein for use in endpoint detection. Enhanced process monitoring for photomask etching are achieved by the... Agent: Patterson & Sheridan, LLP 20080176150 - Exposure mask and method of forming pattern: A method of forming a pattern according to the present invention comprising preparing a reduced projection exposure apparatus having a reduced projection ratio 1/m and a wavelength λ (nm) of exposing light and patterning a light shielding element pattern of a reticle mask on a resist film having a thickness... Agent: Paul J. Esatto, Jr. Scully, Scott, Murphy & Presser, P.c. 20080176148 - Method of making a grayscale reticle using step-over lithography for shaping microlenses: A method of fabricating a grayscale reticle includes preparing a quartz wafer substrate; depositing a layer of SRO on the top surface of the quartz substrate; patterning and etching the SRO to form an initial microlens pattern using step-over lithography; patterning and etching the SRO to form a recessed pattern... Agent: David C. Ripma Sharp Laboratories Of America, Inc. 20080176147 - System and method for eliminating the structure and edge roughness produced during laser ablation of a material: The present technology relates generally to laser ablation, and more particularly pertains to a system and method for eliminating structure and edge roughness, which is produced during the laser ablation of a material. Ablation of materials using a femtosecond laser beam produces a fine scale periodic structure in the ablated... Agent: Scully, Scott, Murphy & Presser, P.c. 20080176151 - Dye-containing curable composition, color filter, and producing process thereof: A dye-containing curable composition including a binder and a dye that is soluble in an organic solvent, in which the binder contains a structural unit represented by the following general formula (I) and has a glass transition temperature in a range of 0 to 250° C. In general formula (I),... Agent: Sughrue Mion, Pllc 20080176152 - Mask patterns for semiconductor device fabrication and related methods and structures: Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the... Agent: Myers Bigel Sibley & Sajovec 20080176153 - Toner for electrophotography: A toner for electrophotography is provided including a binder resin, a coloring agent, a charge controlling agent, and a releasing agent, wherein when the temperature of the toner is in the range from a temperature 40° C. lower than a fixing temperature of the toner to a temperature 10° C.... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p. 20080176154 - Electro-photographic photoreceptor, production method thereof, and electro-photographic apparatus using electro-photographic photoreceptor: In the aim of providing a photoreceptor which is highly sensitive, highly abrasion-resistant, and reduced in cost, a production method for the photoreceptor, and an electrophotographic apparatus using the photoreceptor, the photoreceptor has a structure wherein an organic film (or an amorphous silicon film) used as a charge generation layer... Agent: Greenblum & Bernstein, P.L.C 20080176155 - Alkyltriol titanyl phthalocyanine photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, and at least one charge transport layer, and wherein the photogenerating layer contains an alkyltriol, such as glycerol, and a photogenerating pigment, such as a Type V titanyl phthalocyanine prepared, for example, by dissolving a Type I titanyl phthalocyanine in... Agent: Patent Documentation Center 20080176156 - Composition used in charge transport layer of organic photo conductor: p 20080176157 - Toner porous particles containing hydrocolloids: The present invention is toner particle that includes a continuous phase of binder polymer and a second phase of hydrocolloid. The particle has a porosity of at least 10 percent.... Agent: Andrew J. Anderson Patent Legal Staff. 20080176160 - Rounded radiation curable toner: e 20080176158 - Method of preparing toner, toner prepared using the method, image forming method using the toner, and image forming apparatus containing the toner: A method of preparing a toner, a toner prepared using the method, an image forming method using the toner, and an image forming apparatus containing the toner are provided. The method of preparing toner includes providing a toner composition including a polyester-macromonomer having double bonds at the ends of a... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p. 20080176159 - Toner, process cartridge and image forming apparatus: A toner including a coloring material, a binder resin and an external additive, wherein a tensile strength A of a toner agglomeration body compressed at a compression force of 1.1 kgf/cm2 is from 10 to 25 gf/cm2 and a tensile strength B of a toner agglomeration body compressed at a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c. 20080176161 - Toner for developing a latent image and an image forming method employing the same: A toner for developing an electrostatic charge image comprising a resin, a colorant, and a particle having domain-matrix structure and the particle having two or more kinds of metal elements.... Agent: Cantor Colburn, LLP 20080176162 - Toner and preparation method thereof: Disclosed is a toner comprising toner particles comprising a binding resin and a colorant, wherein the toner particles exhibit an average circularity of 0.950 to 0.980, a volume-base median diameter of 4.5 to 8.0 μm and a volume-based particle size dispersion degree (CVvol) of 15 to 25 and contain a... Agent: Lucas & Mercanti, LLP 20080176163 - Toner, developing device and developing method using the same: The present invention provides a toner having: a toner mother particle; a first external additive including a first inorganic fine particle having a primary particle size distribution of 200 to 750 nm and a work function approximately equivalent to that of the toner mother particle; a second external additive including... Agent: Hogan & Hartson L.l.p. 20080176164 - Toner manufacturing method: The present invention is a method of manufacturing toner particles that includes providing a first emulsion of a first aqueous phase comprising a pore stabilizing hydrocolloid dispersed in an organic solution containing a polymer. The first emulsion is dispersed in a second aqueous phase to form a second emulsion that... Agent: Andrew J. Anderson Patent Legal Staff 20080176166 - Resists for lithography: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning,... Agent: Nixon & Vanderhye, Pc 20080176165 - Solvent mixtures for antireflective coating compositions for photoresists: where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises... Agent: Sangya Jain Az Electronic Materials Usa Corp. 20080176167 - Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part: A photosensitive adhesive composition comprising: (A) a polyimide having a carboxyl group as a side chain, whereof the acid value is 80 to 180 mg/KOH; (B) a photo-polymerizable compound; and (C) a photopolymerization initiator.... Agent: Antonelli, Terry, Stout & Kraus, LLP 20080176168 - Chemically amplified resist composition: p 20080176169 - Binder composition and photosensitive composition including the same: wherein R1, R2, R3 can be selected from the group consisting of hydrogen and alkyl group, R4 is an aromatic group, R5 can be selected from the group consisting of hydrogen, aromatic groups, alkyl groups, substituted alkyl groups and alkyl groups interrupted by an oxygen atom. The copolymer has good... Agent: Pce Industry, Inc. Att. Cheng-ju Chiang 20080176170 - Resist composition for electron beam or euv: A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, as the principal component, one or more compounds selected from... Agent: Knobbe Martens Olson & Bear LLP 20080176171 - Developing method for laser sensitive lithographic printing plate: A method of developing a laser sensitive lithographic printing plate is described. The plate comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser and deactivated under a safe... Agent: Gary Ganghui Teng 20080176172 - Development processing device: A device includes a rotary base; an approach stage; a substrate holding table and a nozzle head. The substrate holding table holds the work by suction, and comes into intimate contact with the approach stage and the rotary base through first and second annular seal members to form a liquid... Agent: Smith, Gambrell & Russell 20080176173 - Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film: A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the... Agent: Sughrue Mion, Pllc 07/17/2008 > patent applications in patent subcategories.20080171269 - Method of patterning an organic planarization layer: A method of patterning a thin film is described. The method comprises forming a thin film to be patterned on a substrate, forming a developable organic planarization layer (OPL) on the thin film, forming a developable anti-reflective coating (ARC) layer on the developable OPL, and forming a mask layer on... Agent: Wood, Herron & Evans, LLP (tokyo Electron) 20080171270 - Polymers useful in photoresist compositions and compositions thereof: m 20080171272 - Curable composition, color filter using the same and manufactuirng method therefor, and solid image pickup element: The present invention provides a curable composition containing a resin, a compound containing an ethylenically unsaturated double bond and a photopolymerization initiator, wherein the resin is manufactured by polymerizing at least a monomer having a dipole moment of 2.0 or more as a copolymerization component, a color filter using the... Agent: Sughrue Mion, PLLC 20080171271 - Photosensitive resin composition for producing color filter and color filter for image sensor produced using the composition: Provided is a photosensitive resin composition that is developable with an aqueous alkaline solution and is suitable for the production of a color filter for an image sensor. The composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, colorants and a solvent. As the colorants, a pigment and... Agent: Summa, Allan & Additon, P.A. 20080171274 - Image forming apparatus, process cartridge, image forming method and developer for electrophotography: An image forming apparatus including at least an image bearer; a charger charging the image bearer; an irradiator irradiating the image bearer to form an electrostatic latent image thereon; an image developer developing the electrostatic latent image with a developer comprising a toner and a carrier to form a toner... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C. 20080171273 - Method of preparing toner and toner prepared using the method: A toner preparation method is provided including: polymerizing a toner composition including a polyester-macromonomer having double bonds at the molecular chain ends and at least one polymerizable monomer to prepare a polymer latex; and mixing the polymer latex with a dispersed pigment solution obtained by dispersing a pigment in a... Agent: Roylance, Abrams, Berdo & Goodman, L.L.P. 20080171275 - Polymers of napthalene tetracarboxylic diimide dimers: t 20080171276 - Developing agent and method for manufacturing the same: A method for manufacturing a developing agent by mixing a resin having a dissociable functional group and an aqueous medium, subjecting the mixture to mechanical shearing, finely pulverizing the pulverized mixture to form resin microparticles, adding a dispersion of colorant particles, causing the resin microparticles and colorant particles to agglomerate,... Agent: Amin, Turocy & Calvin, LLP 20080171277 - Magnetic toner and method of manufacturing magnetic toner: III) 40-95 number % of toner particles satisfy a structure where 70 number % or more of the magnetic iron oxide fine particles in the respective toner particles are present up to a depth of 0.2 time as far as C from the toner particle surface.... Agent: Fitzpatrick Cella Harper & Scinto 20080171278 - Electrostatic image developing toner: An electrostatic image developing toner which is capable of obtaining highly chromatic full-color images of bright color without causing perceived color contamination and exhibits superior lightfastness is disclosed, wherein the toner comprises a binding resin and a colorant, and the colorant is tetraazaporphyrin or phthalocyanine compounds such as a compound... Agent: Lucas & Mercanti, LLP 20080171279 - Predicting relative humididty sensitivity of developer materials: A method of predicting a Lewis acid-base relative humidity (RH) ratio in a two-component developer comprised of at least a toner and a carrier including selecting a candidate toner, selecting a candidate carrier, and determining the Lewis acid and Lewis base constants for the candidate toner and candidate carrier. In... Agent: Oliff & Berridge, PLC. 20080171280 - Toner and production method of the same: A toner comprising toner particles containing a colorant and a binder resin, the binder resin comprising a polyester resin, wherein the polyester resin comprises at least a polyester segment containing an aromatic dial component, the polyester segment being derived from an aromatic diol and a dicarboxylic acid, wherein a content... Agent: Lucas & Mercanti, LLP 20080171281 - Ferrite carrier for electrophotographic developer and electrophotographic developer: Disclosed are a ferrite carrier for electrophotographic developer and an electrophotographic developer using the ferrite carrier, wherein: the ferrite carrier is a composite ferrite composed of Li and Mg; when the composition of the ferrite is calculated as a mixture of a Li ferrite having a stoichiometric composition and a... Agent: Rothwell, Figg, Ernst & Manbeck, P.C. 20080171282 - Developing agent and method for manufacturing the same: A mixture containing a binder resin and a colorant is mixed with an aqueous medium, the resulting mixture liquid is mechanically sheared to finely granulate the mixture, fine particles are formed as cores, and a coating resin layer is formed on core surfaces, to obtain toner particles.... Agent: Amin, Turocy & Calvin, LLP 20080171283 - Wax emulsion for emulsion aggregation toner: A wax emulsion comprised of polyethylene wax and one or more surfactants in an aqueous medium, wherein the polyethylene wax has a degree of crystallinity of from about 50% to about 80% by weight of the polyethylene wax, is provided. The wax emulsion is made by emulsifying the polyethylene wax,... Agent: Oliff & Berridge, PLC. 20080171284 - Method for removing excess uncured build material in solid imaging: Solid imaging apparatus and methods for use are disclosed that reduce the amount of uncured solid imaging build material remaining on a completed build object following the completion of the solid imaging build process. The amount of uncured build material is reduced through the use of either an uncoating web... Agent: Summa, Allan & Additon 20080171285 - Immersion lithography technique and product using a protection layer covering the resist: In an immersion lithography method, the photoresist layer is provided with a shield layer to protect it from degradation caused by contact with the immersion liquid. The shield layer is transparent at the exposure wavelength and is substantially impervious to the immersion liquid. The shield layer can be formed of... Agent: Freescale Semiconductor, Inc. Law Department 20080171287 - Positive resist composition and pattern forming method using the same: A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and... Agent: Sughrue-265550 20080171286 - Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof: There is provided polymeric particles having a particle size between about 60 nm and about 1000 nm and comprising a polymer, the polymer comprising a hydrophobic backbone, a near infrared absorbing segment having attached thereto a near infrared absorbing chromophore having an absorption peak between about 700 nm and about... Agent: Goudreau Gage Dubuc 20080171288 - Negative-acting photolithographic printing plate with improved pre-burn performance: A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an infrared absorbing dye or pigment, a crosslinking agent for the acetal resin and a photosensitive chemical acid progenitor, and the acetal polymer has within its backbone a... Agent: Mark A. Litman & Associates, P.A. 20080171289 - Planographic printing plate material and printing process: The invention provides a planographic printing plate material that excels in on-press development property, printing durability, sensitivity and resistance to fogging by pressure, and a printing process employing the planographic printing plate material. As a means thereof, a planographic printing plate material of on-press development type is used which comprises... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP 20080171290 - Resist material and nanofabrication method: A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal... Agent: Robert J. Depke Lewis T. Steadman 20080171291 - Manufacturing method for semiconductor device: A manufacturing method for a semiconductor device having patterns including two adjacent sides forming a corner portion with an external angle and a periodic pattern with a high density arrangement in the same layer is provided with (a) the step of exposing the first divided pattern including a first side... Agent: Mcdermott Will & Emery LLP 20080171292 - Methods for providing a confined liquid for immersion lithography: A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.... Agent: Martine Penilla & Gencarella, LLP 20080171293 - Method of double patterning a thin film using a developable anti-reflective coating and a developable organic planarization layer: A method of double patterning a thin film is described. The method comprises forming a thin film to be patterned on a substrate, forming an organic planarization layer (OPL) on the thin film, forming an anti-reflective coating (ARC) layer on the OPL, and forming a mask layer on the ARC... Agent: Wood, Herron & Evans, LLP (tokyo Electron) 07/10/2008 > patent applications in patent subcategories.20080166638 - Photoresist composition and method for forming pattern of a semiconductor device: A photoresist composition includes a base resin, a copolymer of acrylic acid or methacrylic acid and 3,3-dimethoxypropene, a photoacid generator, an organic base, and an organic solvent, and is used for forming a fine (micro) pattern in a semiconductor device by double patterning. The invention method can markedly reduce the... Agent: Marshall, Gerstein & Borun LLP 20080166639 - Data preparation for multiple mask printing: A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or... Agent: Christensen, O'connor, Johnson, Kindness, PLLC 20080166640 - Mask used for liga process, method of manufacturing the mask, and method of manufacturing microstructure using liga process: A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplates forming a substrate for the microstructure, a plurality of photosensitive layers,... Agent: Robert E. Bushnell 20080166641 - Method of manufacturing color filter: A method of forming a color filter including forming a light shielding layer formed of an ink-phobic organic material on a transparent substrate, forming a black matrix that defines pixels by patterning the light shielding layer, treating the surface of the substrate on which the black matrix is formed with... Agent: Stanzione & Kim, LLP 20080166642 - Electrophotographic photoconductor and image-forming apparatus: wherein Ar1 and Ar2 each independently represent an optionally-substituted arylene or bivalent heterocyclic group; Ar3 and Ar4 each independently represent a hydrogen atom, or an optionally-substituted aryl or monovalent heterocyclic group, but are not simultaneously hydrogen atoms; or Ar3 and Ar4 may be taken together to form an optionally-substituted bivalent... Agent: Nixon & Vanderhye, PC 20080166643 - Electrophotographic photoreceptors having reduced torque and improved mechanical robustness: Overcoat layers, which may be useful for reducing torque in electrophotographic photoreceptors, are provided. The overcoat layers include a polymer matrix having a particulate inorganic lubricant and a particulate fluoropolymer uniformly dispersed therein. Also provided are electrophotographic photoreceptors that include a substrate and the overcoat layers, electrophotographic imaging apparatuses that... Agent: Oliff & Berridge, PLC. 20080166644 - Electrophotographic photoreceptors having reduced torque and improved mechanical robustness: Backing layers, which may be useful for reducing torque in electrophotographic photoreceptors, are provided. The backing layers, which may be anti-curl backing layers, include a polymer matrix having a particulate inorganic lubricant and a particulate fluoropolymer uniformly dispersed therein. Also provided are electrophotographic photoreceptors that include a substrate and the... Agent: Oliff & Berridge, PLC. 20080166645 - Pyranthrone type compound, organic photoreceptor, image forming method and image forming apparatus: c 20080166646 - Toner for reduced photoreceptor wear rate: An electrophotographic image forming apparatus comprising a photoreceptor, a conductive magnetic brush development system, and a housing in association with the conductive magnetic brush development system for a developer comprising a toner composition having emulsion/aggregation toner particles comprising a gel latex, a high Tg latex, a wax, and a colorant,... Agent: Oliff & Berridge, PLC. 20080166650 - Colorant and toner: A colorant comprising an aggregate of a molecule having a squarylium skeleton and having a maximum absorption wavelength at about 500 nm to about 600 nm in a molecular dispersion state.... Agent: Oliff & Berridge, PLC 20080166647 - Toner including crystalline polyester and wax: A toner disclosed that includes a binder, at least one colorant and at least one wax, wherein the binder includes an amorphous polyester material, a crosslinked polyester material, a crystalline polyester material, and wherein the toner has a glass transition temperature of from about 35° C. to about 60° C.... Agent: Oliff & Berridge, PLC. 20080166648 - Emulsion aggregation high-gloss toner with calcium addition: Toner including toner particles having a calcium-containing material at least in a surface portion of the toner particle, wherein the toner particles contain calcium in an amount of from 20 ppm to about 300 ppm of calcium by dry weight of the toner. Developer including a carrier and a toner,... Agent: Oliff & Berridge, PLC. 20080166649 - Toner compositions: A toner composition having toner particles comprising a gel latex, a high Tg latex, a wax, and a colorant. The gel latex is present in an amount of from about 3 weight percent to about 30 weight percent of the toner composition, the high Tg latex is present in an... Agent: Oliff & Berridge, PLC. 20080166651 - Toner having crosslinked resin for controlling matte performance: A toner composition comprising a crosslinked resin, a substantially non-crosslinked resin, a was, and a colorant. The crosslinked resin has a crosslinked density of from about 0.3 percent to about 30 percent.... Agent: Oliff & Berridge, PLC. 20080166652 - Hot air convective glosser: A system and method to control image gloss in an electrophotographic system or the like using hot air convective heating of the toner image on a recording medium.... Agent: Oliff & Berridge, PLC. 20080166653 - Image forming method: All objective is to provide an image forming method by which sufficient fixing strength can be obtained at a low temperature of 120° C., excellent print images with no belt-like like or streak image defect can be obtained, and no document offsetting is generated even though the superimposed print images... Agent: Lucas & Mercanti, LLP 20080166654 - Two-slot coating of photosensitive members: This method to make an original photoconductor or replacement element uses a two-slot coating process to substantially simultaneously deposit a new SMTL coating layer and a thinner overcoating on an already existing SMTL layer or on a substrate. The total thickness of the existing SMTL layer plus the new SMTL... Agent: James J. Ralabate 20080166655 - Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method: i 20080166656 - Positive photoresist composition: Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an... Agent: Hamilton, Brook, Smith & Reynolds, P.C. 20080166657 - Resist composition for bulkhead formation, bulkhead of el display device and el display device: Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used for production of various organic EL displays, and a separator and an EL display device obtained from... Agent: Wenderoth, Lind & Ponack, L.L.P. 20080166658 - Polyester film for flexographic printing plate: Disclosed herein is a polyester film for flexographic printing plates, which comprises: a polyester base layer (B); a detachable adhesive layer (A) formed on one surface of the polyester base layer using polyester resin and acrylic resin; and an antistatic layer (C) formed on the other surface of the polyester... Agent: D. Peter Hochberg Co. L.p.a. 20080166660 - Chemically amplified resist composition: s 20080166659 - Positive dry film photoresist and composition for preparing the same: A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second... Agent: Birch Stewart Kolasch & Birch 20080166661 - Method for forming a fine pattern in a semiconductor: A method for forming a fine pattern in a semiconductor device includes the steps of: coating a first photoresist composition over a semiconductor substrate including an underlying layer, thereby forming a first photoresist film; exposing and developing the first photoresist film, thereby forming a first photoresist pattern; forming a second... Agent: Marshall, Gerstein & Borun LLP 20080166662 - Plate-making method of planographic printing plate and imagewise exposure device: The present invention is possible to provide a plate-making method of a planographic printing plate to easily obtain the planographic printing plate exhibiting on-press developability, together with printing durability and image reproduction, and an imagewise exposure device used for the planographic printing plate. Disclosed is a plate-making method of a... Agent: Frishauf, Holtz, Goodman & Chick, PC 20080166663 - Processing method of light sensitive planographic printing plate material: Disclosed is a processing method of a light sensitive planographic printing plate material comprising an aluminum support and provided thereon, a light sensitive layer and an oxygen shielding layer in that order, employing an automatic developing machine comprising a pre-washing section with a pre-washing water, a development section and a... Agent: Frishauf, Holtz, Goodman & Chick, PC 20080166664 - Method for forming a resist pattern using a shrinking technology: A method of forming a resist pattern includes the steps of: forming a photoresist pattern on a wafer by exposure and development of a photoresist film; treating the surface of the photoresist pattern by using a resist solvent; and thermally flowing the treated photoresist pattern for shrinkage. An isotropic shrinkage... Agent: Young & Thompson 20080166665 - Method for forming a fine pattern in a semicondutor device: A method for forming a fine pattern a semiconductor device includes the steps of forming a first photoresist pattern over a semiconductor substrate having an underlying layer; coating a pattern hardening coating agent over the first photoresist pattern, thereby forming a pattern hardening film; forming a second photoresist film over... Agent: Marshall, Gerstein & Borun LLP 20080166666 - Positive imageable thick film composition: This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center 20080166668 - Laser mask and method of crystallization using the same: Provided is a method for crystallizing using a laser mask for selectively crystallizing active regions without a laser shot mark, including: providing an array substrate in which N×M active regions are defined; positioning a laser mask having first and second blocks over the substrate, wherein the first and second blocks... Agent: Mckenna Long & Aldridge LLP 20080166667 - Tunable contact angle process for immersionlithography topcoats and photoresists: A process for tuning the water contact angle of an immersion photoresist layer or immersion topcoat layer by modification of the top surface. The surface modification is a layer of fluorinated polymer.... Agent: Nugent & Smith, LLP 20080166669 - Photoresists for visible light imaging: where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from... Agent: Mintz, Levin, Cohn, Ferris, Glovsky & Popeo, P.C. 20080166670 - Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition: A liquid-type composition for forming a photosensitive polymer complex and a method of preparing a photosensitive polymer complex containing silver nanoparticles using the same are provided. The composition for forming a photosensitive polymer complex includes a multifunctional epoxy resin, a photoacid generator, an organic solvent and a silver compound, or... Agent: Harness, Dickey & Pierce, P.L.C 07/03/2008 > patent applications in patent subcategories.20080160421 - Hologram recording medium: The present invention provides a hologram recording medium which is suitable for volume hologram record and can attain high refractive index change, flexibility, high sensitivity, low scattering, environment resistance, durability, low dimensional change (low shrinkage) and high multiplicity in holographic memory record using not only a green laser but also... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c. 20080160431 - Apparatus and method for conformal mask manufacturing: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle... Agent: Knobbe Martens Olson & Bear LLP 20080160424 - Hybrid mask and method of making same: A hybrid topography mask is designed for facilitating the fabrication of a semiconductor wafer. The hybrid mask includes a substrate having a light receiving surface. The light receiving surface defines a plane. Pluralities of pattern elements are etched into and out of the light receiving surface. Each of the plurality... Agent: Reising Ethington Barnes Kisselle, P.c. 20080160423 - Imaging post structures using x and y dipole optics and a single mask: A photolithographic method uses different exposure patterns. In one aspect, a photo-sensitive layer on a substrate is subject to a first exposure using optics having a first exposure pattern, such as an x-dipole pattern, followed by exposure using optics having a second exposure pattern, such as a y-dipole pattern, via... Agent: Vierra Magen/sandisk Corporation 20080160422 - Lithographic mask and methods for fabricating a semiconductor device: Methods for fabricating a semiconductor device and a lithographic mask of use in that method are provided for. The lithographic mask comprises an optically transparent substrate, an attPSM pattern overlying the optically transparent substrate, and a phase shifted optically transparent portion adjacent to and aligned with an edge of the... Agent: Ingrassia Fisher & Lorenz, P.c. (amd) 20080160430 - Manufacturing method for photo mask: A method for manufacturing a photo mask includes forming a mask pattern over a transparent substrate; forming a photoresist over the transparent substrate; subjecting the photoresist to an exposure light from the rear of the transparent substrate to form a photoresist pattern on the mask pattern; and correcting a line... Agent: Marshall, Gerstein & Borun LLP 20080160425 - Mask with focus measurement pattern and method for measuring focus value in exposure process using the same: A mask with a focus measurement pattern and a method for measuring a focus value in an exposure process using the same that are capable of improving the measurement of a focus change, wherein the mask includes an outer reference pattern which provides a position reference for focus measurement, and... Agent: Marshall, Gerstein & Borun LLP 20080160429 - Method for manufacturing a photomask: A method for manufacturing a photomask includes forming a resist pattern on a substrate with a light blocking layer formed thereon, etching the light blocking layer using the resist pattern as a mask, measuring a critical dimension (CD) of the resist pattern, irradiating ultraviolet rays on the resist pattern to... Agent: Marshall, Gerstein & Borun LLP 20080160426 - Method for manufacturing photomask: A method for manufacturing a photomask includes forming a mask pattern to be transferred onto a wafer on a transparent substrate; transferring the mask pattern on a wafer to form a wafer pattern; selecting a critical dimension modification region requiring a line width modification in the pattern transferred onto the... Agent: Marshall, Gerstein & Borun LLP 20080160428 - Method for repairing bridge in photo mask: A method for repairing a bridge in a photo mask includes disposing a phase shift layer pattern and a light shielding layer pattern over a transparent substrate with the phase shift layer pattern disposed between the transparent substrate and the light shielding layer, forming a resist layer over the entire... Agent: Marshall, Gerstein & Borun LLP 20080160427 - Photo mask for depressing haze and method for fabricating the same: A photo mask includes a transparent substrate, a light shielding layer pattern over the transparent substrate, and an ion-reaction preventing layer covering the transparent substrate and the light shielding layer pattern.... Agent: Marshall, Gerstein & Borun LLP 20080160432 - Green photosensitive resin composition and color filter prepared therefrom: The present invention relates to a photosensitive resin composition and a color filter prepared therefrom, and more particularly to a photosensitive resin composition comprising a zinc-containing, phthalocyanine-based green pigment with superior brightness improvement effect and a color filter prepared therefrom. The photosensitive resin composition of the present invention provides improved... Agent: Summa, Allan & Additon, P.a. 20080160433 - Coatable inorganic material and method of forming pattern by utilizing the same: A coatable inorganic material is provided, which is suitable for being coated on a substrate in the form of sol-gel solution and then being directly written with thermochemical mode by using a laser beam. The coatable inorganic material is an oxide, in which the chemical element constitution is more than... Agent: Jianq Chyun Intellectual Property Office 20080160437 - Developing device, image forming apparatus, and image forming method: where Ds (m) is a distance between the photoconductor and the toner carrier, f (Hz) is a frequency of an AC bias applied to the toner carrier, Vpp (V) is an amplitude of the AC bias, θ (−) is a ratio of a peripheral speed of the toner carrier to... Agent: Casella & Hespos 20080160435 - Electrophotographic image forming method using transparent toner: A printing method to form an electrophotographic image includes applying a transparent toner image to a surface of a printing medium, applying color toner images on the transparent toner image according to image information, and applying another transparent toner image onto the color toner images.... Agent: Stanzione & Kim, LLP 20080160436 - Image forming method: Image forming method comprising a step of fixing a toner image in a fixing device of a contact heating system, wherein the toner comprises a resin which comprises a polyester resin and a styrene-aryl resin and is formed by a process comprising allowing a polyvalent carboxylic acid and a polyvalent... Agent: Lucas & Mercanti, LLP 20080160434 - Toner for developing electrostatic latent image and image forming method: A toner for developing an electrostatic latent image is a toner comprising a colored particle containing a colorant and a binder resin, wherein a work function X (eV) of the toner obtained in measuring work function and a gradient A (1/eV) of a normalized photoelectron yield with respect to an... Agent: Kratz, Quintos & Hanson, LLP 20080160438 - Electrophotographic photoreceptor: An electrophotographic photoreceptor includes an electroconductive substrate; and at least a photosensitive layer provided on the electroconductive substrate, wherein the electrophotographic photoreceptor has an outermost layer which contains microcapsules having a lubricating oil encompassed therein. The microcapsules may be composed of an inorganic porous particle or an organic polymer material,... Agent: Rabin & Berdo, Pc 20080160439 - Electrophotographic photoreceptor, method of preparation, and electrophotographic imaging apparatus: An electrophotographic photoreceptor includes a photosensitive layer including a charge generating material, a charge transporting material and a binder resin in a single layer, formed on an electrically conductive substrate. The single photosensitive layer includes an upper photosensitive layer portion and a lower photosensitive layer portion. The upper photosensitive layer... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p. 20080160440 - Carrier and two-component developer: A carrier and a two-component developer are provided. A coating resin layer for coating a core material contains fine particles of titanium oxide which comprise an anatase-type crystal and a rutile-type crystal, and a carrier coating amount of the coating resin layer falls in a range of from 5% by... Agent: Nixon & Vanderhye, Pc 20080160441 - Hybrid toner and method of preparing the same: A hybrid toner and a method of preparing the toner are provided. The hybrid toner is of a core-shell type having improved storage characteristics and a toner blocking phenomenon. The toner prevents image contamination caused by dispersion of waxes or colorants onto the surface of the outer layer of toner... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p. 20080160442 - Hybrid toner and method of preparing the same: A hybrid toner and a method of preparing the toner are provided. The hybrid toner is of a core-shell type, and as such the storage characteristics of the toner are improved and a toner blocking phenomenon and image contamination that are caused by dispersion of waxes or colorants onto the... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p. 20080160443 - Toner, process for producing toner, two-component developer and image forming apparatus: Toner of the present invention is produced by mixing in an aqueous medium at least a resin particle dispersion in which resin particles are dispersed, a colorant particle dispersion in which colorant particles are dispersed, and a wax particle dispersion in which wax particles are dispersed and heating and aggregating... Agent: Hamre, Schumann, Mueller & Larson P.c. 20080160444 - Interlayer for lithographic printing plates: Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) a hydrophilic layer applied onto the aluminum oxide layer comprising at least one phosphono-substituted siloxane of the general formula (I)... Agent: Eastman Kodak Company Patent Legal Staff 20080160445 - Planographic printing plate material, and method of preparing planographic printing plate employing the same: An objective is to provide a positive-working planographic printing plate material exhibiting scratch resistance useful for high productivity in large size printing, and excellent sensitivity and development latitude against a developer having a low pH or a worn-out inactive developer, as well as a method of preparing a planographic printing... Agent: Frishauf, Holtz, Goodman & Chick, Pc 20080160446 - Photoresists including amino acid polymers as photoimageable species: Photoresist compositions including amino acid polymers as photoimageable species are disclosed. Methods of using the compositions in photolithography are also disclosed.... Agent: Intel/blakely 20080160447 - Photopolymer printing plate precursor: A photopolymer printing plate precursor is disclosed comprising in this order a photosensitive coating and a protective coating on a support, wherein said photosensitive coating comprises a composition that is photopolymerizable upon absorption of light, said composition comprising a binder, a polymerizable compound, a sensitizer and a photoinitiator, and wherein... Agent: Leydig Voit & Mayer, Ltd 20080160448 - Photoresist compositions and methods of forming a pattern using the same: In a photoresist composition and a method of forming a pattern using the same, the photoresist composition includes about 0.1 to about 0.5 percent by weight of a photoacid generator including a positively charged sulfonium ion and a negatively charged sulfonate ion having a hydrophilic carboxylic group, about 4 to... Agent: Volentine & Whitt Pllc 20080160449 - Photoresist polymer having nano-smoothness and etching resistance, and resist composition: The present invention provides a hyperbranched polymer that is capable of being used as a polymer material for nanofabrication including lithography, has enhanced dry etching resistance, sensitivity and surface smoothness, has a core shell structure and has an acid degradable repeating unit of tert-butyl vinylbenzoate ester in a shell portion,... Agent: Hoffmann & Baron, LLP 20080160450 - Method and apparatus for treating a re-imageable printing form, machine for processing printing material and method for treating a surface making contact with printing material: A method for treating a re-imageable printing form includes surface modifying a surface of the printing form acting as a printing area in a nanoscopic range by chemically functionalizing the surface through covering with molecules, in particular amphiphilic molecules or polymers. The printing form is subjected to a primary process... Agent: Lerner Greenberg Stemer LLP 20080160451 - Method for preparation of lithographic printing plate: A method for preparation of a lithographic printing plate including: exposing with a laser a lithographic printing plate precursor including a support and a photosensitive layer containing a sensitizing dye, a radical polymerization initiator, a radical polymerizable compound and a binder polymer; and subjecting the exposed lithographic printing plate precursor... Agent: Sughrue-265550 20080160452 - Developer for light sensitive planographic printing plate material and manufacturing process of planographic printing plate employing the same: m 20080160453 - Method for manufacturing a field emission display: The present invention provides a method for manufacturing a cathode panel of a field emission display, comprising: (a) providing a plate comprising a cathode layer and an emitter layer, wherein the cathode layer and the emitter layer are disposed on the upper surface of the plate; (b) forming a photosensitive... Agent: Bacon & Thomas, Pllc 20080160454 - Ink-jet recording head and method for producing same: A method for producing an ink-jet recording head having a discharge port configured to discharge ink, a passage-forming member configured to form an ink passage communicating with the discharge port, and a substrate provided with an energy-generating element configured to generate energy utilized for discharging ink includes the steps of... Agent: Fitzpatrick Cella Harper & Scinto 20080160455 - Exposure method, method for forming projecting and recessed pattern, and method for manufacturing optical element: An exposure pattern having a line width of submicron size is simply formed by using an inexpensive and stable solid state laser or a gas laser as an exposure light source, and by using a photoresist for g-line or i-line. The exposure is performed by locally controlling a reaction time... Agent: Sughrue Mion, Pllc 20080160456 - Image sensor fabricating method: An image sensor fabricating method is provided. A double exposure process is performed on a photoresist, first using a mask with line-shaped patterns in a first direction and then using a mask with line-shaped patterns in a second direction. A development process is performed to form microlenses. The mask can... Agent: Saliwanchik Lloyd & Saliwanchik A Professional Association 20080160457 - Apparatus and method for reducing defects: An embodiment relates generally to an apparatus for reducing defects. The apparatus includes a spindle adapted to hold a wafer; and at least two light sources configured to direct light to a top-side and a back-side of the wafer... Agent: Texas Instruments Incorporated 20080160458 - Lithographic device manufacturing method, lithographic cell, and computer program product: A double patterning process for printing dense lines is provided. In a first step, a first semi dense pattern of lines is printed in a first resist material layer overlaying a substrate provided with a bottom anti-reflection coating. In a second step, a second semi dense pattern of lines is... Agent: Pillsbury Winthrop Shaw Pittman, LLP 20080160459 - Method of forming a pattern: A method of forming a pattern comprising steps as follow. A substrate comprising a layer to be etched is provided. A first resist layer is formed on the substrate. The top of the first resist layer is patterned. A second resist layer is formed on the first resist layer being... Agent: North America Intellectual Property Corporation 20080160461 - Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C:... Agent: Lee & Morse, P.c. 20080160460 - Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer: wherein n and m are independently at least 1 and less than about 190, R1 is a hydrogen, a hydroxyl, a hydrocarbon group of about 10 carbons or less, or a halogen, R2 is methylene or includes an aryl linking group, R3 is a conjugated diene group, and R4 is... Agent: Lee & Morse, P.c. 20080160462 - Method and system for bake plate heat transfer control in track lithography tools: A thermal processing module for a track lithography tool includes a bake plate comprising a process surface and a lower surface opposing the process surface. The thermal processing module also includes a plurality of electrodes coupled to the bake plate Each of the plurality of electrodes is adapted to receive... Agent: Townsend And Townsend And Crew, LLP Previous industry: Chemistry: electrical current producing apparatus, product, and processNext industry: Combustion ###### RSS FEED for 20091112: Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates. For more info, read this article. ###### Thank you for viewing Radiation imagery chemistry: process, composition, or product thereof patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. 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