Radiation imagery chemistry: process, composition, or product thereof inventions 06/08

20080153008 - Optical element, method for production thereof and display device: The present invention is to provide an optical element in which both a good light diffusion performance and a good light transmittance are achieved and which is less subject to environmental influence, a method for production thereof and a display device using the optical element. An optical element including a... Agent: Birch Stewart Kolasch & Birch

20080153009 - Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program: An optical proximity correction is provided that generates a corrected pattern P0 corresponding to a state M0 where the focus is in focus and the exposure dose is optimal, a corrected pattern P1 corresponding to a state M1 where the focus is in focus and the exposure dose is at... Agent: Harness, Dickey & Pierce, P.L.C

20080153010 - Method for depositing reflective multilayer film of reflective mask blank for euv lithography and method for producing reflective mask blank for euv lithography:

20080153012 - Method of measuring the overlay accuracy of a multi-exposure process: A method of measuring the overlay accuracy of a multi-exposure process is provided. The characteristic of this invention is utilizing a scanning electron microscope for monitoring the overlay accuracy real-time during the multi-exposure processes in stead of the conventional optical measurement method.... Agent: Nixon & Vanderhye, Pc

20080153011 - Pattern transfer mask, focus variation measuring method and apparatus, and semiconductor device manufacturing method: A reticle of the present invention has a main pattern (11) and a monitor pattern (12) each having a different thickness of a light-shielding film (4), the light-shielding film (4) of the monitor pattern (12) being formed thicker than that of the main pattern (11). Therefore, in a CD-focus curve,... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080153014 - Additive printed mask process and structures produced thereby: A digital lithographic process first deposits a mask layer comprised of print patterned mask features. The print patterned mask features define gaps into which a target material may be deposited, preferably through a digital lithographic process. The target material is cured or hardened, if necessary, into target features. The mask... Agent: Jas Ip Consulting

20080153013 - Method for fabricating color filter layer: A method of fabricating a color filter layer is provided. First, an active device array substrate having an opaque metal pattern formed thereon is provided. Next, a back-side exposure process is performed on the active device array substrate using the opaque metal layer as a mask to form a black... Agent: Jianq Chyun Intellectual Property Office

20080153017 - Electrophotographic image forming apparatus having transparent toner and white toner: An electrophotographic image forming apparatus including first and second photosensitive bodies, first and second exposing units to form electrostatic latent images on the first and second photosensitive bodies respectively charged to a uniform electric potential, a first developing unit to develop an electrostatic latent image of the first photosensitive body... Agent: Stanzione & Kim, LLP

20080153015 - Method of forming a reconfigurable relief surface using an electrorheological fluid: A structure and method of using a reusable master printing plate is described. In one embodiment, the viscosity of an electrorheological fluid is adjusted using an electric field to control its flow and create the desired relief pattern in a flexible printed surface. After creating the relief pattern, the pattern... Agent: Patent Documentation Center

20080153016 - Method of forming a reconfigurable relief surface using microvalves: A structure and method of using a reusable master printing plate is described. In one embodiment, the method uses an electric field to control a series of microvalves. The microvalves control a fluid flow that raises or lowers selected regions on a flexible printing surface to create a desired relief... Agent: Patent Documentation Center

20080153018 - Toner for non-magnetic one-component developer, method of preparing the toner, developer and image forming method: s

20080153019 - Arylamine compound and electrophotographic photoreceptor: wherein R1 to R4 each independently represents a linear alkyl group or an arylalkenyl group, provided that when all of R1 to R4 represent linear alkyl groups, at least one of R1 to R4 represents a linear alkyl group having a carbon number of 3 or more; and an electrophotographic... Agent: Sughrue-265550

20080153020 - Electrophotographic photoconductive member and image forming apparatus: The present invention provides an electrophotographic photoconductive member comprising a substrate, and a photoconductive layer containing a hole transferring material, a charge generating material and a binder resin, wherein a value (IV/OV value) in which the inorganic value is divided by the organic value of the binder resin is 0.36... Agent: Casella & Hespos

20080153021 - Image bearing member, image forming apparatus and process cartridge: An image bearing member including an electrostatic substrate, a photosensitive layer located overlying the electrostatic substrate, a surface layer located overlying the photosensitive layer, and the surface layer is a cross-linking resin layer in which particulates having a needle form are dispersed and which is formed by curing a monomer... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080153023 - Toner, development unit and image forming apparatus using the same: Disclosed is a toner containing resin mother particles and oil, in which the volume-average particle diameter of the resin mother particles is not less than 2 μm but less than 4 μm, (volume-average particle diameter of the resin mother particles)/(number-average particle diameter of the resin mother particles) is more than... Agent: Hogan & Hartson L.l.p.

20080153022 - Electrophotographic developing agent: A non-magnetic one-component electrophotographic developing agent is provided having improved properties. The electrophotographic developing agent includes parent toner particles comprising a binder resin, a releasing agent, a colorant, and a charge control agent, and an external additive which is added to a surface of the parent toner particles, wherein the... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p.

20080153024 - Electrophotographic toner: An electrophotographic toner includes toner parent particles containing a binder resin, a colorant and a charge control agent; and an external additive added to the surface of the toner parent particles. The toner further includes positively chargeable silica and polymer beads in addition to large particle diameter silica, small particle... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p.

20080153025 - Toner compositions: Processes for producing toner are provided which utilize reactive coalescing agents in forming the toner particles, as well as toners produced by such processes.... Agent: Xerox Corporation (cdfs)

20080153026 - Graphite containing carriers: A carrier containing a core, a polymer coating, mixtures of polymers, or a plurality of polymers thereover, and wherein at least one of, and more specifically, one of the coating polymers, includes graphite.... Agent: Patent Documentation Center

20080153027 - Low melt toner: A toner includes binder of amorphous polymer material, such as an amorphous polyester material, and a crystalline polymer material, such as a crystalline polyester material, wherein the amorphous polymer material has an acid number that is greater than an acid number of the crystalline polymer material. Further, the toner may... Agent: Oliff & Berridge, Plc.

20080153028 - Polyester toner compositions: An emulsion aggregation polyester toner including a polyester resin having modified end groups, wherein the polyester resin includes at least one carboxylic end group. A process of making the toner by oxidation of a polyester resin including reacting the polyester with a hypohalite and a phase transfer catalyst results in... Agent: Oliff & Berridge, Plc.

20080153029 - Thermal printer with two print heads: A thermal printers and printing methods are provided. The thermal printer has a first thermal print head adapted to pressure a first donor web against the receiver medium and to selectively transfer donor material to the receiver medium in an image wise fashion to form a first image in an... Agent: David A. Novais Patent Legal Staff

20080153030 - Positive resist composition and patterning process: There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process... Agent: Oliff & Berridge, Plc

20080153034 - Low activation energy dissolution modification agents for photoresist applications: A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to... Agent: Schmeiser, Olsen & Watts

20080153032 - Photoactive compounds: d

20080153033 - Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing... Agent: Lee & Morse, P.c.

20080153031 - Resist composition: A radiation-sensitive composition containing a resist compound A, an acid generator B, and an acid crosslinking agent C. The resist compound A is (a) a polyphenol compound which is produced by the condensation of a C5-45 aromatic ketone or aromatic aldehyde with a C6-15 compound having from 1 to 3... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080153035 - Antireflective coating compositions: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20080153036 - Chemically amplified positive resist compostion: The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.... Agent: Birch Stewart Kolasch & Birch

20080153037 - Method for recording on optical recording medium: A method for recording on an optical recording medium having a visible information recording layer comprises irradiating the visible information recording layer with a laser light to change a refractive index of the layer, thereby changing the wavelength of an interfering light to generate an interference color. The refractive index... Agent: Sughrue Mion, Pllc

20080153038 - Hybrid optical head for direct engraving of flexographic printing plates: An optical imaging head for direct engraving of flexographic printing plates, comprising: at least two groups of radiation sources, each group comprising at least one radiation source, wherein the radiation sources within each group emit radiation having the same intensity and spot size, different from the intensity and spot size... Agent: David A. Novais Patent Legal Staff

20080153039 - Manufacturing method of semiconductor device: A light absorption layer is formed over a substrate, the light absorption layer is selectively irradiated with a laser beam, and a region of the light absorption layer, which is irradiated with the laser beam, is removed. By adding an impurity element imparting one conductivity type or an inert element... Agent: Cook, Alex, Mcfarron, Manzo, Cummings & Mehler, Ltd.

20080153040 - Method for processing semiconductor wafer: In a rework process for removing an organic film containing silicon formed on a semiconductor wafer substrate, silicon compound residues were generated, and it was difficult to remove them. In the present invention, the semiconductor wafer is processed by the method comprising at least: a first step of cleaning treatment,... Agent: Mcginn Intellectual Property Law Group, Pllc

20080153041 - Exposure method and apparatus: When exposing a pattern on a recording medium, such as a printed wiring board on which a photosensitive layer having sensitivity to light, such as a resist layer or the like, is stacked, the photosensitive layer is prevented from unduly becoming irremovable or liable to be peeled off, while maintaining... Agent: Sughrue Mion, Pllc

20080145764 - Pre-exposure and curing of photo-sensitive material for optical data storage: The apparatus has a first light source for emitting a first light beam, a second light source for emitting a second light beam, and a spatial light modulator, which is switchable between at least two states for spatially modulating at least a part of the first light beam, and which... Agent: Joseph J. Laks Thomson Licensing Llc

20080145766 - Holographic recording medium: e

20080145765 - Metal identification platelet and method of producing thereof: A metal identification platelet equipped with an identification code, while the identification code comprises a hologram. A method of producing the identification platelet with the identification code, including the following steps: A shield from an electro-insulation material is formed on a shim with a holographic motif. Then, the shim is... Agent: Townsend And Townsend And Crew, LLP

20080145768 - Method for forming a film pattern having a reduced pattern size: A method for forming a resist pattern includes: forming a resist mask on a target film by using photolithography, forming a mixing-generation resist film on the resist mask by coating, baking the mixing-generation resist film to form a mixing layer at the interface between the resist mask and the mixing-generation... Agent: Sughrue Mion, Pllc

20080145767 - Method of data encoding, compression, and transmission enabling maskless lithography: A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern... Agent: Weaver Austin Villeneuve Sampson LLP Kla Tencor

20080145771 - Phase-shift mask and method of forming the same: In an attenuated phase-shift mask (PSM) and a method of forming the same, a phase-shift layer and a light-shielding layer are sequentially stacked on a transparent substrate. The phase-shift layer and the light-shielding layer are sequentially removed from the substrate, to form a light-shielding pattern including a first opening and... Agent: Mills & Onello LLP

20080145770 - Recycling of large-size photomask substrate: A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass... Agent: Birch Stewart Kolasch & Birch

20080145769 - Simulation method, simulation system, and method of correcting mask pattern: A simulation system has an entry acceptance unit, a calculation unit, and a decision unit. The entry acceptance unit accepts an entry of measured dimension of the transfer pattern, the calculation unit includes an electric field vector calculation unit, a flare electric field vector calculation unit and a light intensity... Agent: Young & Thompson

20080145772 - Pigment dispersion composition for producing color filter and color filter for color imaging device produced using the same: Disclosed is a pigment dispersion composition for producing a color filter. The pigment dispersion composition comprises a pigment, a binder resin, a dispersant and a solvent. The pigment is a blue anthraquinone pigment and is pretreated with a water-soluble inorganic salt and a wetting agent. The pigment dispersion composition can... Agent: Summa, Allan & Additon, P.a.

20080145774 - Imprint lithography: In an embodiment, an imprint lithography apparatus is disclosed that includes a support structure configured support an imprint template, the imprint template having a neutral plane which substantially bisects the imprint template, and an actuator located in a position such that, when the imprint template is supported by the support... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080145773 - Imprint lithography apparatus and methods: An imprint lithography apparatus including a service station.... Agent: Hewlett Packard Company

20080145775 - Toner: A series of resins were synthesized using a range of bio-based materials to control the molecular architecture, and therefore the properties, of the inventive resins. The resins were formulated into toner formulations such as those useful in printers and copiers.... Agent: Ruden, Mcclosky, Smith, Schuster & Russell, P.a.

20080145776 - Method of preparing toner and toner prepared using the method: A method of preparing toner includes: preparing a primary latex by polymerizing a toner composition including a macromonomer having a hydrophilic group, a hydrophobic group and at least one reactive functional group, and at least one polymerizable monomer; preparing a primary agglomerated toner by mixing the primary latex with a... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p.

20080145777 - Marking material with birefringent nanoparticles: Disclosed is a birefringent marking material comprising a vehicle for the marking material and birefringent nanoparticles having an average particle size of less than about 700 nm. The birefringent marking material, such as an ink or a toner, can be used to provide a security marking on or in an... Agent: Oliff & Berridge, Plc.

20080145778 - Image forming apparatus: An image forming apparatus including an image bearing member to operate at a linear velocity of at least 300 mm/sec, which includes an electroconductive substrate, a charge blocking layer located overlying the electroconductive substrate, a moiré prevention layer located overlying the charge blocking layer, and a photosensitive layer located overlying... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080145779 - Toner particles of controlled morphology: The present invention is a method for the preparation of electrostatographic toner that includes the following steps. A polymer material is dissolved in an organic solvent to form an organic phase that includes a metal complex of zinc dimethyldithiocarbamate; zinc diethyldithiocarbamate; dibenzyldithiocarbamate, zinc di-n-butyldithiocarbamate. The organic phase is dispersed in... Agent: Andrew J. Anderson Eastman Kodak Company

20080145780 - Toner particles of controlled morphology: The present invention is a method for the preparation of electrostatographic toner including the following steps. A polymer material is dissolved in an organic solvent to form an organic phase. The organic phase is dispersed in an aqueous phase that includes a particulate stabilizer and a salt including an anion... Agent: Andrew J. Anderson Patent Legal Staff

20080145781 - Imaging member: An imaging member has a crosslinked overcoat layer which holds fluorinated nanoparticles. The overcoat layer is formed from an overcoat solution comprising a polymer binder; a hole transport molecule; fluorinated nanoparticles; a fluorinated surfactant; a crosslinking agent; and a free radical initiator. The overcoat layer provides excellent wear resistance at... Agent: Fay Sharpe / Xerox - Rochester

20080145782 - Image recording material and novel compound: This invention provides an image recording material, comprising: on a support, a protective layer that contains a crosslinked polymer formed of a polymer (a) having at least one kind of ionically crosslinkable functional group, and a low molecular weight compound (b) having at least one kind of ionically crosslinkable functional... Agent: Sughrue Mion, Pllc

20080145783 - Photosensitive resin composition and organic insulating film produced using the same: A photosensitive resin composition is provided. The composition includes an acrylic copolymer, a photoacid generator and a solvent. The acrylic copolymer includes structural units of Formulae 1, 2, 3 and 4, which are described in the specification. The composition exhibits excellent performance characteristics in terms of mechanical and thermal properties,... Agent: Summa, Allan & Additon, P.a.

20080145785 - Light sensitive planographic printing plate material: Disclosed is a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer containing a photopolymerization initiator, a polymerizable ethylenically unsaturated compound, a sensitizing dye, a polymeric binder and a compound represented in formula 1,... Agent: Frishauf, Holtz, Goodman & Chick, Pc

20080145784 - Positive resist composition, method for resist pattern formation and compound: A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which... Agent: Knobbe Martens Olson & Bear LLP

20080145786 - Photosensitive resin composition for forming organic insulating film and device using the same: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual... Agent: Summa, Allan & Additon, P.a.

20080145787 - Topcoat compositions and methods of use thereof: s

20080145788 - Photothermographic materials containing co-developers with phosphonium cation: Incorporating a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer having a phosphonium cation in photothermographic materials improves image tone in resulting images.... Agent: Carestream Health Inc,

20080145789 - Method of making lithographic printing plates: A negative-working imageable element having an imageable layer on a substrate can be used to form an imaged element by imagewise exposing it to form exposed and non-exposed regions in the imageable layer. The imageable element also has a water-soluble topcoat disposed on the imageable layer. With or without a... Agent: Andrew J. Anderson Patent Legal Staff

20080145790 - Process for production of lithographic printing plates: Process for the production of lithographic printing plates comprising (a) providing a lithographic substrate with a hydrophilic surface; (b) applying a negative working radiation-sensitive composition onto the hydrophilic surface, wherein the composition comprises: (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically... Agent: Eastman Kodak Company Patent Legal Staff

20080145793 - High resolution imaging process using an in-situ image modifying layer: A method of forming a patterned material layer on a substrate. A photoresist layer is formed on the substrate followed by an image modifying material formed on the photoresist. The image modifying material is patterned to form an image modifying pattern. The image modifying pattern and underlying photoresist are then... Agent: International Business Machines Corporation Dept. 18g

20080145794 - Liquid and method for liquid immersionlithography: m

20080145791 - Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method: A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080145792 - Reduction of line edge roughness with a conformal coating of a sealant: A base-loaded polymer is applied to a semiconductor feature formed after exposing and developing a photoresist layer in order to reduce line edge roughness caused by a residual acid collecting on the edges of the feature during the post-exposure bake of the photoresist. Alternatively, a polymer is applied containing grains... Agent: Blakely, Sokoloff, Taylor & Zafman LLP

20080145795 - Semiconductor processing system with ultra low-k dielectric: A semiconductor processing system with ultra low-K dielectric is provided including providing a substrate having an electronic circuit, forming an ultra low-K dielectric layer, having porogens, over the substrate, blocking an incoming radiation from a first region of the ultra low-K dielectric layer, evaporating the porogens from a second region... Agent: Law Offices Of Mikio Ishimaru

20080145797 - Method and apparatus for processing a wafer: s

20080145796 - Method of photolithographic exposure: A method of photolithographic exposure is disclosed. The photolithographic exposure method comprises providing a substrate, forming a first resist layer thereon, forming a second resist layer on the first resist layer, the second resist layer providing a transmission which first increases then decreases as exposure dose increases, and exposing the... Agent: Quintero Law Office, Pc

20080145798 - Method of processing substrate and chemical used in the same: A method of processing a substrate, including a step of processing an organic film pattern formed on a substrate, the step including, in sequence, a removal step of removing one of an alterated layer and a deposited layer formed on the organic film pattern, and a fusion/deformation step of fusing... Agent: Sughrue Mion, Pllc

20080145799 - Substrate developing method, substrate processing method and developing solution supply nozzle: According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-reflective film having solubility in the developing solution is formed... Agent: Rader Fishman & Grauer Pllc

20080145800 - Photothermographic materials containing developer and co-developer: Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials provides a number of improvements including a reduction of sensitivity to high humidity and improved processing latitude.... Agent: Carestream Health Inc,

20080145801 - Photothermographic materials containing developer and co-developer: Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials reduces their sensitivity to high humidity and improves processing latitude.... Agent: Carestream Health Inc,

20080138717 - Color holographic optical element: A process for producing a color holographic optical element in a real-time interactive multi-channel auto-stereoscopic color image display system, including producing light comprising at least three different monochromatic parts of the optical spectrum from one or more lasers and illuminating a holographic plate with the light from different directions and... Agent: Mcdermott Will & Emery LLP 34th Floor

20080138718 - Holographic optical recording medium, manufacturing method thereof and holographic optical recording method: where R1 denotes an atomic group selected from the group consisting of a linear or branched alkylene group having 1 to 10 carbon atoms and an arylene group having 1 to 10 carbon atoms, it being possible for a halogen atom or an alkoxy group to be substituted in R1,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080138722 - Exposure mask, its manufacture method, pattern transfer method, pattern forming method, and sram manufacture method: A mask formed with a mask pattern is prepared, the mask pattern having a shape that a base pattern is divided into at least two partial patterns disposed at a space narrower than a resolution limit. A first relation is acquired between a width of the space separating the partial... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080138719 - Method of arranging mask patterns and apparatus using the method: Provided are a method of fabricating a semiconductor and an apparatus using the method, and more particularly, a method of effectively arranging assist features on the mask and an apparatus using the method. The method of arranging mask patterns includes separately calculating contributions of an assist feature to image intensity... Agent: Marger Johnson & Mccollom, P.c.

20080138720 - Method of arranging mask patterns and apparatus using the method: In positioning assist features on a photomask pattern to improve the image quality of the main features, the method includes deriving an h-function in a first process which represents a contribution of an assist feature with respect to image intensity at a main feature. In a continuation of the method,... Agent: Marger Johnson & Mccollom, P.c.

20080138721 - Substrate and method of fabricating the same: An object of the present invention is to provide a method of fabricating a substrate, and the like which excels in flatness, ten-point average roughness and surface roughness of substrates and flattens and smoothes the substrate surface. The method of fabricating a substrate includes a step of correcting flatness, a... Agent: Squire, Sanders & Dempsey L.l.p.

20080138723 - Method of fabricating color filter using ink-jet technique: A method of fabricating a color filter using an ink-jet technique. The method includes inclining an ink-jet head having a plurality of nozzles at a predetermined angle, moving the ink-jet head in a lengthwise direction of the color filter that is divided into a plurality of working regions, ejecting color... Agent: Stanzione & Kim, LLP

20080138725 - Electrophotographic photoreceptor, and image forming method and apparatus using the same: A photoreceptor including an electroconductive substrate; a photosensitive layer which is located overlying the electroconductive substrate and which is not radically crosslinked; and an outermost layer which is located overlying the photosensitive layer and which includes a radically crosslinked material, wherein the radically crosslinked material includes a unit having a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080138724 - Imaging member: p

20080138727 - Electrophotographic photoreceptor and image forming apparatus including the same:

20080138728 - Latent electrostatic image bearing member, and image forming apparatus, image forming method and process cartridge using the same:

20080138726 - Titanyl phthalocyanine photoconductors: A photoconductor that includes a photogenerating layer, and at least one charge transport layer where the photogenerating layer contains a titanyl phthalocyanine prepared, for example, by dissolving a Type I titanyl phthalocyanine in a solution comprising a trihaloacetic acid and an alkylene halide; adding the resulting mixture of the dissolved... Agent: Patent Documentation Center

20080138729 - Electrophotographic photoreceptor and electrophotographic imaging apparatus having the same: An electrophotographic photoreceptor including an undercoat layer and a photosensitive layer formed on an electrically conductive substrate, the undercoat layer including an inorganic particle and a nylon binder resin having saturation water absorptivity of 3% or less, and the photosensitive layer including a phthalocyanine-based pigment as a charge generating material,... Agent: Stanzione & Kim, LLP

20080138730 - Toner compositions: A toner having its surface functionalized with alkaline resins is provided, and processes for producing the same.... Agent: Xerox Corporation (cdfs)

20080138731 - Dual pigment toner compositions: Dual pigment compositions are provided that include a first pigment based upon a xanthene dye and a second pigment based upon a monoazo dye. The pigment compositions of the present disclosure may be combined with a binder resin to form a toner, in embodiments a magenta toner.... Agent: Xerox Corporation (cdfs)

20080138732 - Toner compositions: A toner having its surface functionalized with alkaline resins is provided, and processes for producing the same.... Agent: Xerox Corporation (cdfs)

20080138733 - Toner for developing electrostatic image: A toner for developing an electrostatic image is disclosed. The toner has softening point Tsp of from 90° C. to 110° C., and the toner satisfies the relation of 0.02≦(Sw/S)×100≦10, Sw being an area of a wax domain having largest diameter among wax domains at a cross section of the... Agent: Lucas & Mercanti, LLP

20080138734 - Carrier, method for producing the same, developer, and image forming method: The present invention provides a method for producing a carrier that includes dissolving at least a coating material in carbon dioxide in a liquid state, and forming a coating layer on a core material surface by reducing the solubility of the liquid with at least the coating material dissolved therein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080138735 - Toner for developing latent electrostatic image, container having the same, developer using the same, process for developing using the same, image-forming process using the same, image-forming apparatus using the same, and image-forming process cartridge: A toner for developing a latent electrostatic image including a base of toner particle which contains a binder resin and a coloring agent, and an external additive. Herein, a plurality of the base of toner particle has a volume average particle diameter (Dv) of 3 μm to 7 μm, a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080138736 - Toner for electrophotography: A toner for electrophotography is provided that includes a binder resin, a colorant, a charge control agent, and a releasing agent, wherein the toner has a complex viscosity (η) of about 4.0×101 Pa·s to about 1.6×103 Pa·s at a temperature ranging from about 40° C. lower than a toner fixing... Agent: Roylance, Abrams, Berdo & Goodman, L.l.p.

20080138737 - Erasable image forming material: An erasable image forming material includes a color former containing crystal violet lactone, a developer, a first binder resin of styrene-butadiene copolymer and a second binder resin of a styrene-based resin containing α-methylstyrene, the first and second binder resins being in a compatible state.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080138739 - Processes for aggregating toner components: Processes for preparing toner compositions used with electrostatographic imaging members. The processes utilize screw extruders to facilitate continuous dispersion and aggregation of toner components, such as color pigments and wax. The continuous dispersion produces the toner components with more control and better product yield. The products produced are also improved... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080138738 - Processes for toner component dispersion: Processes for preparing toner compositions used with electrostatographic imaging members. The processes utilize screw extruders to facilitate continuous dispersion and aggregation of toner components, such as color pigments and wax. The continuous dispersion produces the toner components with more control and better product yield. The products produced are also improved... Agent: Pillsbury Winthrop Shaw Pittman, LLP Xerox Corporation

20080138740 - Cyanine compound, optical recording material using the same and optical recording medium: (In the formula, each of ring A and ring B represents an optionally substituted benzene or naphthalene ring; each of R1 and R2 independently represents a C1-4 alkyl group or an optionally substituted benzyl group; at least one of R1 and R2 is an optionally substituted benzyl group; X represents... Agent: Young & Thompson

20080138741 - Negative-working radiation-sensitive compositions and imageable materials: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder that has a hydrophobic backbone and pendant salt groups that comprise a cation covalently attached to the hydrophobic backbone and a boron-containing anion forming a salt with the cation. The use of these particular polymers provides fast digital speed... Agent: Andrew J. Anderson Patent Legal Staff

20080138742 - Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.... Agent: Sughrue-265550

20080138743 - Laser sensitive lithographic printing plate having specific photopolymer composition: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination... Agent: Gary Ganghui Teng

20080138744 - Anti-reflective coating forming composition containing vinyl ether compound: There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition.... Agent: Oliff & Berridge, Plc

20080138745 - Polymer for hard mask of semiconductor device and composition containing the same: A polymer for hard mask and a composition containing the same, which may be useful in the manufacture of next generation semiconductor devices. When an underlying layer pattern of a semiconductor device, using a polyamic acid having a strong heat resistance, a polyamic acid film is formed by a spin-coating... Agent: Marshall, Gerstein & Borun LLP

20080138747 - Method for forming a photoresist pattern: Disclosed herein are photoresist cleaning solutions useful for cleaning a semiconductor substrate in the last step of a developing step when photoresist patterns are formed. Also disclosed herein are methods for forming photoresist patterns using the solutions. The cleaning solutions of the present invention include H2O as a primary component,... Agent: Marshall, Gerstein & Borun LLP

20080138746 - Pattern formation method using fine pattern formation material for use in semiconductor fabrication step: A resist pattern is formed on the major surface of a semiconductor substrate, and coated with a water-soluble pattern formation material having thermal crosslinking properties in the presence of an acid. A crosslinking film is formed by heating in that portion of the water-soluble pattern formation material which is in... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080138748 - Method to remove bisulfite by-products from enzyme compositions: Provided are methods of removing bisulfite material from a composition that contains a bisulfite material and an enzyme. The method includes contacting the composition with a compound containing at least one aldehyde functional group to form an aldehyde-bisulfite complex, whereby the aldehyde-bisulfite complex may be separated from the composition.... Agent: Colgate-palmolive Company

20080131786 - Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording: A photosensitive composition and A photosensitive medium for volume hologram recording comprises a photopolymerization reactive compound (a monomer) and any one of the following binder: (a) an organic-inorganic hybrid polymer obtainable by copolymerizing an organometallic compound of the formula 1 “R1mM1(OR2)n” and an ethylenic monomer and/or its hydrolyzed polycondensate; (b)... Agent: Seyfarth Shaw LLP

20080131787 - Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.... Agent: Stanzione & Kim, LLP

20080131795 - Method for adjusting lithographic mask flatness using thermally induced pellicle stress: A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature... Agent: Cantor Colburn LLP-ibm Burlington

20080131793 - Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same: A method for forming hard mask patterns includes, sequentially forming first, second, and third hard mask layers formed of materials having different etching selectivities on a substrate, forming first sacrificial patterns having a first pitch therebetween on the third hard mask layer, forming fourth hard mask patterns with a second... Agent: Lee & Morse, P.c.

20080131789 - Method for photomask fabrication utilizing a carbon hard mask: Methods for forming a photomask using a carbon hard mask are provided. In one embodiment, a method of forming a photomask includes etching a chromium layer through a patterned carbon hard mask layer in the presence of a plasma formed from a process gas containing chlorine and carbon monoxide.... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080131792 - Method of correcting photomask defect: In a micromachining apparatus equipped with an AFM having a plurality of independently actuatable probes, which uses an electron beam or a helium ion beam produced by a gas field ion source, an isolating pattern including a defect is grounded by bringing the conducting probe into contact with the pattern,... Agent: Brinks Hofer Gilson & Lione

20080131788 - Method to automatically repair trim photomask design rule violations for alternating phase shift lithography: In accordance an embodiment of the invention, there is provided a method of designing a lithography mask. The method can comprise identifying an area of a layout to be formed on a substrate by exposing a phase photomask that comprises a phase aperture to a beam and trimming a portion... Agent: Texas Instruments Incorporated

20080131794 - Optical member comprising od-doped silica glass: An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be advantageously used for wavelength as short as about 157 nm.... Agent: Corning Incorporated

20080131791 - Soft template with alignment mark: A pattern template includes a flexible substrate, a template mold formed on the flexible substrate to include a pattern, and an alignment mark, the alignment mark has a greater refractive index than that of the template mold. The template is manufactured by providing a master template including a pattern area,... Agent: Sughrue Mion, Pllc

20080131790 - Structure design and fabrication on photomask for contact hole manufacturing process window enhancement: The present disclosure provides a mask. The mask includes a substrate; a first attenuating layer disposed on the substrate, having a first material and a first thickness corresponding to a phase shift; and a second attenuating layer having a second material and disposed on the first attenuating layer. The first... Agent: Haynes And Boone, LLP

20080131796 - Method and test structure for estimating focus settings in a lithography process based on cd measurements: By encoding process-related non-uniformities, such as different height levels, which may be caused by CMP or other processes during the fabrication of complex device levels, such as metallization structures, respective focus parameter settings may be efficiently evaluated on the basis of well-established CD measurement techniques.... Agent: J. Mike Amerson Williams, Morgan & Amerson, P.c.

20080131797 - Toner, developer, toner container, process cartridge, image forming method, and image forming apparatus: To provide a toner that contains at least a binder resin, a colorant, a releasing agent and zeolite, the toner being manufactured through O/W type wet granulation and having an average circularity of 0.970 or greater, and a developer and image forming method using the toner.... Agent: Cooper & Dunham, LLP

20080131798 - Biologically photoconductive organic dispersion:

20080131799 - Imaging members and process for preparing same: An imaging member including a substrate; thereover a charge generating layer; thereover a first charge transport layer comprising a small molecule charge transport material and a polymeric component selected from the group consisting of polyarylamine polyester, polyacylamine, and mixtures and combinations thereof; and a second charge transport layer disposed over... Agent: Marylou J. Lavole, Esq. Llc

20080131800 - Toners and toner methods: A device including a charging component; a developing component; a transport component; a photoconductive component; and a radiant fusing component; wherein the development component contains a toner comprising at least one crystalline polymer, optionally an amorphous polymer, and at least one colorant.... Agent: Marylou J. Lavole, Esq. Llc

20080131801 - Developing agent and method for manufacturing the same: A method including polymerization performed with the use of a binder resin dispersion containing a styrene monomer, a compound having one or more unsaturated bond and sulfonic acid or sulfonate, and an acrylic ester monomer, wherein the contents of the monomers and the compound are 60 to 90 mol %,... Agent: Amin, Turocy & Calvin, LLP

20080131802 - Toner for electrostatic image development, method of producing the same, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus: wherein SP(H) is the solubility parameter of a resin contained in an elution fraction F (0-10) from the beginning of elution of W1 until 10% of elution of W1 when W1 is the whole area of an elution curve on a gel permeation chromatograph measured for an acetone-soluble fraction; SP(L)... Agent: Oliff & Berridge, Plc

20080131803 - Developer material, developer material cartridge, image forming device, and image forming apparatus: A developer material includes base particles that contain at least a binder resin and a colorant, and an external additive that covers the surface of the base particles. The developer material has a mean volume particle diameter in the range of 3.9-6.1 μm, and includes pulverized base particles of an... Agent: Rabin & Berdo, Pc

20080131804 - Process for producing toner for electrophotography: The present invention relates to a process for producing a toner for electrophotography which includes the steps of (A) forming resin-containing core particles having a volume median particle size (D50) of from 1 to 10 μm in an aqueous medium; (B) adding composite fine particles containing a polyester-containing resin and... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080131805 - Two-component developer, developing device using two-component developer, and image forming apparatus: A two-component developer is provided with cylindrical toner particles and magnetic carrier particles having an average sphericity of 0.95 or more. When such a developer is used in development using a two-component developing method, a clear image can be stably obtained for a long period by suppressing a spent phenomenon... Agent: Casella & Hespos

20080131806 - Electrostatic latent image developing toner, method of producing same, and electrostatic latent image developer using same: t

20080131808 - Developing agent: A developing agent including a toner particle obtained by using a dispersion containing a solvent, a granular mixed compound having a binder resin and a coloring agent dispersed in the solvent, and, as an additive to disperse a compound, a combination of a surfactant and a basic compound or a... Agent: Amin, Turocy & Calvin, LLP

20080131807 - Liquid developer and image forming apparatus: A liquid developer includes: an insulating liquid having dispersed therein toner particles, silica fine particles subjected to hydrophobic treatment and a polymer dispersant, the silica fine particles having an average particle diameter of from 5 to 100 nm, and a content of the silica fine particles being from 0.1 to... Agent: Hogan & Hartson L.l.p.

20080131809 - Method for manufacturing developing agent: A dispersion containing a coloring agent particle is mixed in a dispersion of a radical polymerizable monomer, and a reducing agent containing an iron(II) salt is added in the presence of a polymerization initiator to polymerize the dispersed radical polymerizable monomer by the action of a generated radical, thereby not... Agent: Amin, Turocy & Calvin, LLP

20080131810 - Photoactive compounds: The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula −O3S—CF2CF2OCF2CF2—SO3−. The compounds are useful as photoactive materials.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20080131811 - Photoactive compounds: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3−. The compounds are useful as photoactive materials.... Agent: Alan P. Kass Az Electronic Materials Usa Corp.

20080131812 - Resin for printing plate material and lithographic printing plate material by use thereof: Disclosed is a lithographic printing plate material comprising on a support a light-sensitive layer comprising a binder resin, wherein the light sensitive layer comprises a resin containing a group of a cyclic ureido residue derived from a cyclic ureido compound represented by formulas (1), (2), (3), (4) or (5):... Agent: Frishauf, Holtz, Goodman & Chick, Pc

20080131813 - Alkali soluble polymer and positive working photosensitive resin composition using the same: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high... Agent: Hogan & Hartson LLP Ip Group, Columbia Square

20080131814 - Method for forming a fine pattern of a semiconductor device: A method for forming a pattern of a semiconductor device using an immersion lithography process includes pretreating a top portion of the photoresist film with an alkane solvent or alcohol in the immersion lithography process to form a uniform over-coating film.... Agent: Townsend And Townsend And Crew, LLP

20080131815 - Monomer for forming organic anti-reflective coating layer, polymer thereof and composition including the same: m

20080131817 - Gettering members, methods of forming the same, and methods of performing immersion lithography using the same: Provided herein are gettering members that include a monitor substrate and a conditioning layer thereon. Also provided herein are methods of forming gettering layers and methods of performing immersion lithography processes using the same.... Agent: Myers Bigel Sibley & Sajovec

20080131818 - Method for fabrication liquid crystal display device and diffraction mask therefor: An LCD is fabricated using a diffraction mask with transmissive, semi-transmissive, and opaque regions. The semi-transmissive region permits formation of a transmission, reflection, or pixel electrode, depending on the type of LCD being fabricated, using the same masking process as that to produce contact holes in an insulating film and... Agent: Brinks Hofer Gilson & Lione

20080131816 - Patterning method of organic electroluminescent device: In an organic EL device having an organic layer, including an organic luminescent material, formed between a pair of counter electrodes, ultraviolet ray is irradiated to the organic layer, and the amount of irradiation is changed to form an emission pattern having a contrast caused by a luminous brightness corresponding... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080131819 - Process for producing resist pattern and conductor pattern: This process for producing a resist pattern is a process for producing a resist pattern including: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a... Agent: Knobbe Martens Olson & Bear LLP

20080131820 - Lithographic method: A method of achieving frequency doubled lithographic patterning is described. An optical pattern (16) having a first period (p1) is used to expose conventional acid-catalysed photoresist (18) on substrate (20), leaving regions of high exposure (24), regions of low exposure (26) and intermediate regions (22). Processing proceeds leaving regions (24)... Agent: Nxp, B.v. Nxp Intellectual Property Department

20080131821 - Dual layer workpiece masking and manufacturing process: The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small feature dimensions in masks and phase shift masks. The methods described may apply... Agent: Haynes Beffel & Wolfeld LLP

20080131822 - Method of fabricating imprint lithography template: A template, stamp or mold is fabricated by using a low-k material. The structure of the low-k material is transformed when it is baked in a novel heating process. Thus, the template is fabricated to obtain a high hardness and a high aspect-ratio with a low dose of electron beam... Agent: Troxell Law Office Pllc Suite 1404