Radiation imagery chemistry: process, composition, or product thereof inventions 05/08

20080124632 - Method of deriving etching correction values for petterns of photomask and method of fabricating photomask: A method of deriving etching correction values for the patterns of a photomask and a method of fabricating a photomask are described. The former method includes the following steps. The layout data of the photomask are provided, and local etching correction values of respective patterns are determined from the pattern... Agent: J C Patents, Inc.

20080124633 - Photomask unit, exposing method and method for manufacturing semiconductor device: A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle ↓(0°<θ<90°) is higher than transmittance of incident light of an incident angle 0°.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080124634 - Method of manufacturing liquid crystal display: A method of manufacturing a liquid crystal display (LCD). The method includes: forming a plurality of color filters by line-printing a plurality of color inks on a transparent substrate in a longitudinal direction of the color filter array; diving the plurality of color filters so that the color filters can... Agent: Stanzione & Kim, LLP

20080124636 - Toner, and image forming method and process cartridge using the toner: A toner is provided including toner particles A having a circularity of greater than 0.93 and not greater than 1.00 and toner particles B having a circularity of from 0.85 to 0.93, wherein the following relationships are satisfied: 70≦RA≦95, 5≦RB≦30, 0.014≦SD≦0.025, and 0.940≦ED≦0.950, wherein RA (% by number) represents a... Agent: Christopher C. Dunham C/o Cooper & Dunham LLP

20080124635 - Toner, and image forming method, image forming apparatus, and process cartridge using the toner: A toner is provided including a binder resin and a colorant, wherein the toner has a displacement-load curve in which a maximum compression strength is from 0.65 to 1.0 mN and a slope of a line through an origin point and a first shoulder is not less than 1.1 mN/μm;... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080124637 - Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus: An electrophotographic photosensitive member is disclosed which is excellent in cleaning performance, has improved durability, and suppresses image defects in various environments. The electrophotographic photosensitive member has a support and a photosensitive layer provided on the support. Depressed portions independent of one another are formed on the surface of the... Agent: Fitzpatrick Cella Harper & Scinto

20080124638 - Electrophotographic photoreceptor, method of preparing the photoreceptor, and image forming method, image forming apparatus and process cartridge therefor using the photoreceptor: A method of preparing an electrophotographic photoreceptor, including forming a photosensitive layer on an electroconductive substrate; and forming a surface layer on the photosensitive layer, wherein the surface layer is formed by a spray coating comprising a spray droplet having an average diameter (D50) not greater than 10 μm.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080124639 - Thiophosphate containing photoconductors: A photoconductor containing an optional supporting substrate, a thiophosphate containing photogenerating layer, and a charge transport layer which includes a polyhedral oligomeric silsesquioxane (POSS)-containing material and an optional thiophosphate.... Agent: Patent Documentation Center

20080124640 - Polyhedral oligomeric silsesquioxane thiophosphate containing photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, and a charge transport layer which includes a mixture of a polyhedral oligomeric silsesquioxane (POSS)-containing material and a thiophosphate.... Agent: Patent Documentation Center

20080124641 - Electrophotographic photoreceptor: p

20080124642 - Toner for development of electrostatic latent image: An object of the present invention is to provide a toner for development of an electrostatic latent image, which has excellent developability and which is used in an electrophotographic image forming apparatus. One aspect of the present invention pertains to a toner for development of an electrostatic latent image, comprising... Agent: Casella & Hespos

20080124643 - Toner: A toner is provided which can stably provide a favorable density stability, line reproducibility and dot reproducibility even in high-speed copying machines, printers and the like which form high resolution latent images over a long period regardless of environmental conditions, and can provide the image quality adaptable to embedded pattern... Agent: Fitzpatrick Cella Harper & Scinto

20080124644 - Polyester toner resin compositions: Provided herein are polyester toner resins that may reduce or eliminate the use of Bis A, a common polyester toner resin material that may pose environmental and/or toxicity risks. In addition, the polyester toner resins according to some embodiments of the present invention may have desirable toner resin properties, such... Agent: Myers Bigel Sibley & Sajovec

20080124645 - Liquid developer and image forming apparatus: An insulating liquid used for a liquid developer containing toner particles, the insulating liquid includes a fatty acid triglyceride and a fatty acid monoester, the fatty acid triglyceride and the fatty acid monoester each containing an unsaturated fatty acid as a fatty acid component thereof, and an alcohol component constituting... Agent: Hogan & Hartson L.L.P.

20080124646 - Thermal transfer device and method for forming a display device using the same: A thermal transfer device used for forming a display device includes a donor layer capable of modulating light by application of external energy, a print heat for conducting thermal energy to the donor layer, at least one donor element formed by the donor layer absorbing the thermal energy and a... Agent: Birch Stewart Kolasch & Birch

20080124651 - Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers: A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole... Agent: The Webb Law Firm, P.C.

20080124649 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing... Agent: Thomas A. Beck

20080124650 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing... Agent: Thomas A. Beck

20080124652 - Positive resist composition and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]-dodecane structure, hydroxyadamantane units, monocyclic lactone units, and... Agent: Birch Stewart Kolasch & Birch

20080124653 - Positive resist compositions and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms... Agent: Birch Stewart Kolasch & Birch

20080124648 - Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method: A fine and high-accuracy pattern, which is also excellent in either or both of high sensitivity and etching resistance can be provided. Disclosed is a resist pattern forming method in which a single- or multi-layered film 2 is formed on a substrate 1 and a resist pattern is formed on... Agent: Harness, Dickey & Pierce, P.L.C

20080124647 - Transfer substrate, transfer method, and organic electroluminescent device manufacturing method: A transfer substrate includes: a support substrate; a light-to-heat conversion layer; a diffusion prevention layer preventing diffusion of a material constituting the light-to-heat conversion layer; and a transfer layer made of an organic material, wherein the light-to-heat conversion layer, the diffusion prevention layer and the transfer layer are formed on... Agent: David R. Metzger Sonnenschein Nath & Rosenthal LLP

20080124654 - Positive type dry film photoresist and composition for preparing the same: A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The peak height (Rp) of the support film is less than about 300 nm to eliminate fish eye defects. The positive photoresist resin layer may contain alkali soluble resin,... Agent: Birch Stewart Kolasch & Birch

20080124655 - Laser imaging coating and methods for imaging: Briefly described, embodiments of this disclosure include, coating layers image recording media, and methods for forming an image.... Agent: Hewlett Packard Company

20080124656 - Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process: Sulfonate salts have the formula: R1COOCH2CH2CF2CF2SO3−M+ wherein R1 is alkyl, aryl or hetero-aryl, M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080124657 - Method of making a photopolymer plate: This invention describes an exposure apparatus comprising a light measuring device and a light transmitting clamp designed to compress a photocurable (photopolymer) package for use in manufacture of a hand stamp plate, the package typically consisting of a sachet containing a liquid photopolymer. The liquid photopolymer is specifically engineered to... Agent: Kolisch Hartwell, P.C.

20080124658 - Rotary apertured interferometric lithography (rail): A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact... Agent: Seagate Technology C/o Darby & Darby P.C.

20080124659 - Heat transfer film and method of manufacturing partition walls of plasma display panel using the same: A heat transfer film and a method of manufacturing partition walls of a plasma display panel using the same are disclosed. The heat transfer film includes a base film, a light-heat transforming layer formed on the base film, and a partition wall material layer formed on the light-heat transforming layer.... Agent: Birch Stewart Kolasch & Birch

20080124660 - Highly purified liquid perfluoro-n-alkanes and method for preparing: Provided are liquid perfluoro-n-alkanes that are highly transparent to UV wavelengths ranging from about 150 nm to 165 nm, and to the method by which high transparency may be obtained. The liquid, perfluoro-n-alkanes are useful in optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices,... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080124661 - Photochemical and photothermal rearrangements for optical data and image recording: A system for recording and/or transmitting optical data or visual images includes an optical data or visual image recording medium and a light and/or heat source. The medium includes a markable coating established on a substrate. The markable coating includes a leuco dye and a developer precursor including a compound... Agent: Hewlett Packard Company

20080124662 - Wafer stage module of twin scan exposure system and method of controlling the same: In an embodiment, a wafer stage module comprises: a stage divided into an exposure zone and a measurement zone; a plurality of chucks configured to be respectively moved between the exposure zone and the measurement zone; guides parallel to each other at both edge sides of the wafer stage; a... Agent: Marger Johnson & Mccollom, P.C.

20080124663 - Microfluidic systems including three-dimensionally arrayed channel networks: The present invention provides, in certain embodiments, improved microfluidic systems and methods for fabricating improved microfluidic systems, which contain one or more levels of microfluidic channels. The inventive methods can provide a convenient route to topologically complex and improved microfluidic systems. The microfluidic systems provided according to the invention can... Agent: Wolf Greenfield & Sacks, P.C.

20080124664 - Silver halide color light-sensitive material: A silver halide color photographic light-sensitive material, having photographic constituting layers including, on a support, at least one blue-sensitive layer containing a silver halide emulsion, at least one green-sensitive layer containing a silver halide emulsion, at least one red-sensitive layer containing a silver halide emulsion, and at least one hydrophilic... Agent: Sughrue Mion, PLLC

20080118849 - Reflective optical system for a photolithography scanner field projector: A reflective optical system for a photolithography scanner field projector is described. In one example, the optical projection system has at least eight reflecting surfaces for imaging a reflection of a photolithography mask onto a wafer and the system has a numerical aperture of at least 0.5.... Agent: Intel/blakely

20080118852 - Method and system for lithography simulation and measurement of critical dimensions with improved cd marker generation and placement: A method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement is disclosed. The method and system specify a position for measuring a difference between a lithography image and a target pattern, generate one or more CD marker candidates, and select at... Agent: Bingham Mccutchen LLP

20080118850 - Photomask, manufacturing method thereof, and electronic device manufacturing method: A photomask includes a transparent substrate and an opaque film formed on the transparent substrate. The opaque film is configured to form a device pattern with which a wafer is to be exposed; and at least one pair of assist patterns is formed by the opaque film, one assist pattern... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080118851 - Aligning method: When, over a substrate over which a plurality of first patterns each having plural basic regions formed in an exposure region of one shot, second patterns are formed by plural shots of exposure corresponding to the respective basic regions, positions of alignment marks are measured for said plurality of first... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080118853 - Branched polyarylene ethers and processes for the preparation thereof: wherein each Ar is an aryl moiety or an alkylaryl moiety, provided that when Ar is an alkylaryl moiety at least three of the repeating groups are bonded to an aryl portion thereof through the oxygen atoms in the repeating groups, each x, independently of the others, is an integer... Agent: Patent Documentation Center

20080118854 - Charge control resin, and toner: A charge control resin containing a copolymer which has a unit having a sulfonic acid ester group having a specific structure and has the unit in specific proportions. The charge control resin can provide a toner with superior charging performance. Also disclosed is a toner having such a charge control... Agent: Fitzpatrick Cella Harper & Scinto

20080118855 - Toner and developer, and image forming apparatus, image forming method and process cartridge: Provided is a toner that comprises a binder resin, a releasing agent, and a colorant, wherein the mass average particle diameter of the toner is 3 μm to 8 μm, the content of particles having a particle diameter of no more than 5 μm is from 60% by number to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080118856 - Marking liquid: A liquid toner or developer for electrostatic images comprises a carrier liquid, insoluble marking particles and a dispersing agent. The dispersing agent is non-compatible with or insoluble in the carrier liquid. The liquid toner or developer does not need the use of a corona generating wire, roller or the like,... Agent: Klauber & Jackson

20080118857 - Hybrid chemically-produced toners: Provided according to some embodiments of the present invention are hybrid chemically-produced toners produced by a method including forming a resin component including a) at least one of a water reducible acrylic resin and a water dispersible polyester resin; and b) an epoxy; subjecting the resin component to conditions sufficient... Agent: Myers Bigel Sibley & Sajovec

20080118858 - Process for producing photo-conductors: A polycrystalline photo-conductor containing Bi12MO20, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti, is produced by hydrothermal synthesis processing. The photo-conductor is adapted for constituting a radiation imaging panel capable of recording radiation image information.... Agent: Sughrue Mion, Pllc

20080118861 - Film forming method, film forming apparatus and pattern forming method: The film forming method includes the steps of forming surface films including a resist film and a protective film covering the resist film over a surface of a wafer, and forming an edge cap film by supplying an edge cap film material to at least a boundary portion including a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080118859 - Planographic printing plate material and planographic printing process: The invention is to provide a planographic printing plate material providing excellent developability and printing durability and a planographic printing process employing the same, and particularly to provide a planographic printing plate material, which is capable of carrying out on-press development and provides excellent on-press development property and printing durability... Agent: Frishauf, Holtz, Goodman & Chick, Pc

20080118860 - Polymer, resist composition, and patterning process: To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.... Agent: Birch Stewart Kolasch & Birch

20080118863 - Positive resist compositions and patterning process: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms... Agent: Birch Stewart Kolasch & Birch

20080118862 - Sheeting with composite image that floats: Translucent, transparent, or semi-translucent microlens sheetings with composite images are disclosed, in which a composite image floats above or below the sheeting, or both. The composite image may be two-dimensional or three-dimensional. The sheeting may have at least one layer of material having a surface of microlenses that form one... Agent: 3m Innovative Properties Company

20080118864 - Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed: An object of the present invention is to provide a black paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition black matrix pattern efficiently, and superior in storage... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080118865 - Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed: An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition conductive pattern efficiently, and superior in storage stability,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080118866 - Method for forming a tunable deep-ultrviolet dielectric antireflection layer for image transfer processing: A tunable dielectric antireflective layer for use in photolithographic applications, and specifically, for use in an image transfer processing. The tunable dielectric antireflective layer provides a spin-on-glass (SOG) material that can act as both a hardmask and a deep UV antireflective layer (BARC). One such material is titanium oxide generated... Agent: Konrad Raynes & Victor, LLP. Attn: Ibm37

20080118867 - Pattern forming material, pattern forming apparatus, and pattern forming process: The objects of the present invention are to provide pattern forming materials capable of effectively suppressing sensitivity drop of photosensitive layers as well as capable of forming highly fine and precise patterns, pattern forming apparatuses equipped with the pattern forming materials, and pattern forming processes utilizing the pattern forming materials.... Agent: Sughrue Mion, Pllc

20080118868 - Multilayer element with low ph developer solubility: A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The ink receptive outer layer includes a phenolic polymeric binder that is soluble in a developer having a pH of from about 7 to about 11. The use of... Agent: Patent Legal Staff Eastman Kodak Company

20080118869 - Laser sensitive lithographic printing plate having specific photopolymer composition: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination... Agent: Gary Ganghui Teng

20080118870 - Sulfur atom-containing anti-reflective coating forming composition for lithography: There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst and... Agent: Oliff & Berridge, Plc

20080118871 - Resist pattern forming method: A fine and high-accuracy resist pattern, which is excellent in etching resistance, can be formed. Disclosed is a resist pattern forming method, which includes the steps of developing a resist composition having photosensitivity to a predetermined light source through a lithography technique to form a resist pattern 2 on a... Agent: Harness, Dickey & Pierce, P.L.C

20080118872 - Positive tone bi-layer method: The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate.... Agent: Molecular Imprints

20080118873 - Method of processing on-press developable lithographic printing plate: A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is exposed with the radiation, deactivated, and then on-press developed... Agent: Gary Ganghui Teng

20080118875 - Hardmask composition and associated methods: wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group,... Agent: Lee & Morse, P.c.

20080118874 - Use of methanofullerne derivatives as resist materials and method for forming a resist layer: The use as a resist material of a methanofullerene derivative having a plurality of open-ended addends, and to a method for forming a patterned resist layer on a substrate using the methanofullerene derivatives. The methanofullerene derivatives can be represented by the formal C2x(CR1R2)m where x is at least 10, m... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP

20080118876 - Lithographic apparatus and method: In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a deep ultraviolet radiation outlet configured to irradiate an area of the resist, relative movement between the substrate holder and the... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20080113273 - Wafer scale lens module and manufacturing method thereof: There are provided a wafer scale lens module and a manufacturing method thereof. A wafer scale lens module including: at least one lens including a lens substrate and a lens element deposited on at least one surface of the lens substrate, wherein a stop is integrally formed on at least... Agent: Staas & Halsey LLP

20080113279 - Holographic reticle and patterning method: A hologram reticle and method of patterning a target. A layout pattern for an image to be transferred to a target is converted into a holographic representation of the image. A hologram reticle is manufactured that includes the holographic representation. The hologram reticle is then used to pattern the target.... Agent: Steven H. Slater Slater & Matsil, L.l.p.

20080113276 - Method of joining a plurality of reticles for use in producing a semicondcutor layout pattern, a computerized system for implementing such a method and a semiconductor mask arrangement produced by implementing such a method: In particular, the method has bulk sub-reticles and peripheral sub-reticles, and a first matching pattern associates to a peripheral sub-reticle that abuts a bulk sub-reticle and a second matching pattern to the bulk sub-reticle at such distance therefrom that fitting of the peripheral sub-reticle between the second matching pattern and... Agent: Fisher Technology Law

20080113274 - Method of manufacturing photomask and method of repairing optical proximity correction: A method of manufacturing a photomask is described. The graphic data of the photomask are provided, and than an optical proximity correction is performed to the graphic data. A process rule check is then performed to the graphic data with the optical proximity correction. When at least one failed pattern... Agent: J C Patents, Inc.

20080113275 - Method to etch chrome for photomask fabrication: Methods for manufacturing a photomask, such as a chrome on glass photomask and a phase shift photomask are provided. A selective main chrome etch and a selective chrome overetch in the fabrication process provides a photomask having improved image quality and provides nominal image size control and image size uniformity... Agent: Law Office Of Delio & Peterson, Llc.

20080113278 - Photomask layout for a semiconductor device and method of forming a photomask pattern using the photomask layout: In a photomask layout for forming a photomask pattern, the photomask layout includes a first mother pattern corresponding to a principal pattern of the photomask pattern, a second mother pattern corresponding to a supplementary pattern of the photomask pattern and a guide pattern that controls the shot size of illumination... Agent: Myers Bigel Sibley & Sajovec

20080113277 - Tridemensional structures for an ink jet printhead and relevant manufacturing: In a monolithic ink jet printhead, a structural layer is made comprising cavities, obtained fron the polymerization of a solution of a monomer, or an oligomer, and a photointiator; during the polymerization by radiation, acid species are unduly generated in zones protected by a mask, due to reflection of the... Agent: Venable LLP

20080113281 - Filter device for the compensation of an asymmetric pupil illumination: The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle... Agent: Taylor & Aust, P.c.

20080113282 - Method of manufacturing an optical device, a method of manufacturing a color filter and a method of manufacturing an organic electroluminescence device: Discharging stability and resolution power for the pitch between a specified pixel and a pixel of an identical color adjacent with the specified pixel forming a stripe pattern of an optical device constituting by arranging plural elongate pixels on a substrate by using an ink jet printing apparatus are intended... Agent: Squire, Sanders & Dempsey L.l.p.

20080113283 - Siloxane epoxy polymers for redistribution layer applications: Siloxane epoxy materials employed as redistribution layers in electronic packaging and coatings for imprinting lithography, and methods of fabrication are disclosed.... Agent: Heslin Rothenberg Farley & Mesiti Pc

20080113284 - Electrophotographic image forming method and yellow toner used in the method: An electrostatic image forming method is described. The method includes forming latent images corresponding to yellow, magenta and cyan images on a photoreceptor, developing corresponding latent images by developers containing yellow, magenta and cyan toner to form yellow, magenta and cyan images and transferring the yellow, magenta and cyan images... Agent: Lucas & Mercanti, LLP

20080113285 - Image forming apparatus, image forming method, and process cartridge: The present invention provides an image forming apparatus that has high-durability and can prevent image degradation that could be caused by an increase in residual potential on a photoconductor, occurrence of image blur and incidental images and can stably form a high-quality image even when repetitively used for long hours,... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080113286 - Electrophotographic photoreceptor, image forming apparatus and process cartridge: e

20080113280 - Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask: It is an object of the present invention to provide a manufacturing method of a photomask and a manufacturing method of a semiconductor apparatus using the photomask that optimize a sub resolution assist feature on the photomask so as to ensure the depth of focusing for a formed image of... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080113287 - Electrophotographic image-receiving sheet and process for image formation using the same: To provide an image-receiving sheet for electrophotography that suppresses blocking, allows toner images to fix satisfactorily, has excellent glossiness and reduced brittleness and can form high-quality images and to provide a process for image formation using the image-receiving sheet for electrophotography, an image-receiving sheet for electrophotography includes a substrate containing... Agent: Sughrue Mion, Pllc

20080113288 - Manufacturing method of developing agent and coloring agent dispersion for manufacturing of developing agent: In a manufacturing method of a developing agent, by mixing a coloring agent fine particle with at least a surfactant, an aqueous solvent and an organic solvent, thereby dispersing the coloring agent fine particle in a solvent containing the surfactant, the aqueous solvent and the organic solvent, it becomes possible... Agent: Amin, Turocy & Calvin, LLP

20080113290 - Method of preparing toner, toner prepared using the method, method of forming image using the toner, and image forming apparatus employing the toner: A method of preparing toner includes preparing a pigment dispersion solution by dispersing a pigment in a mixed surfactant solution composed of an anionic reactive surfactant and a nonionic reactive surfactant, mixing the pigment dispersion solution with a polymer latex prepared by polymerizing a toner composition comprising an amphiphilic macromonomer... Agent: Stanzione & Kim, LLP

20080113289 - Polyester resin and toner including the same: A polyester resin for toner, which has superior fixing property, storage stability, and image density in an electrophotographic image forming process or an electrostatic printing process, and a toner including the same are disclosed. The polyester resin for toner is produced by carrying out esterification reaction and polycondensation reaction of... Agent: Birch Stewart Kolasch & Birch

20080113291 - Emulsion aggregation toner, developer, and method of making the same: A polyester toner includes particles of a resin, a colorant, an optional wax, and a polyion coagulant, where the toner is prepared by an emulsion aggregation process.... Agent: Oliff & Berridge, Plc.

20080113294 - Compound for resist and radiation-sensitive composition: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080113293 - Continuous generative process for producing a three-dimensional object: It is possible according to the invention to solidify the three-dimensional object in a main direction during a radiation phase exceeding a current prescribed hardening depth, without interrupting supply of electromagnetic energy during the irradiation phase. Further, it is possible to control a current hardening depth of the photopolymerizable material... Agent: Rader, Fishman & Grauer Pllc

20080113295 - Light sensitive printing plate material, printing plate and process of preparing the same: Disclosed is a process of preparing a printing plate comprising imagewise exposing a light sensitive printing plate material comprising a hydrophilic support and provided thereon, an image formation layer and an oxygen shielding layer in that order, and developing the exposed material with an aqueous solution having a pH of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080113292 - Transfer substrate, transfer method, and method of manufacturing display device: A transfer substrate includes a transfer material layer on a support substrate via a light absorbing layer. Antireflection patterns for preventing light reflection on an interface of the support substrate and the light absorbing layer are provided between the support substrate and the light absorbing layer. Thickness of this antireflection... Agent: David R. Metzger Sonnenschein Nath & Rosenthal LLP

20080113296 - Planographic printing plate precursor and stack thereof: The invention provides a planographic printing plate precursor that is writable by laser exposure and is composed of a support, a photosensitive recording layer formed on the support, and a backcoat layer containing an epoxy resin, the backcoat layer being formed on the side of the support opposite to the... Agent: Sughrue Mion, Pllc

20080113297 - Photosensitive composition: There are provided a photosensitive composition used in one-shot exposure of exposing it via a photomask to light from a UV lamp or in direct writing with light from a UV lamp or laser light to form a patterned latent image to be developed with an alkaline aqueous solution, wherein... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080113298 - Method of preparing lithographic printing plates: A defoamer solution is introduced into a pre-rinsing solution, developer, or post-rinsing solution in a lithographic processing apparatus in relation to the surface area of processed imageable element. Surfactants can then be used in the developer if desired, and the recirculation rates of various solutions can be reduced.... Agent: Andrew J. Anderson Patent Legal Staff

20080113299 - Negative lithographic printing plate having darker aluminum substrate: A laser sensitive lithographic printing plate comprises an electrochemically grained, anodized, hydrophilically treated aluminum substrate with a reflection optical density of 0.30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. The photosensitive layer comprises a polymeric binder, a free radical polymerizable monomer, a... Agent: Gary Ganghui Teng

20080113300 - Coating compositions for use in forming patterns and methods of forming patterns: A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially... Agent: Harness, Dickey & Pierce, P.L.C

20080113301 - Method of manufacturing gas sensor: Provided herein is a method of manufacturing a gas sensor. The method includes forming electrodes on a surface of a substrate, manufacturing a paste having a complex of CNTs and a metal-ligand complex comprising a metal that has gas adsorption selectivity for specific gases, coating the paste on the substrate... Agent: Cantor Colburn, LLP

20080113302 - Pattern forming process: The present invention aims to provide a pattern forming process which allows efficiently, highly precisely forming of a permanent pattern such as interconnection patterns and also allows achieving both tent property and resolution at high level. The pattern forming process includes laminating a photosensitive layer on a substrate to be... Agent: Sughrue Mion, Pllc

20080113303 - Multilayer coatings for euv mask substrates: Techniques, methods, and structures disclosed in relation to extreme ultraviolet (EUV) lithography in semiconductor processing. In one exemplary implementation, a method may comprise using ion beam deposition to deposit a first multilayer stack of thin films on a substrate to planarize and smooth surface defects on the substrate. The method... Agent: Fish & Richardson, Pc

20080113304 - Pattern formation method: The photomask of this invention includes, on a transparent substrate, a semi-shielding portion having a transmitting property against exposing light, a transparent portion having a transmitting property against the exposing light and surrounded with the semi-shielding portion, and an auxiliary pattern surrounded with the semi-shielding portion and provided around the... Agent: Mcdermott Will & Emery LLP

20080113305 - Silver halide color photographic light-sensitive material: e

20080107972 - Halftone mask and method for making pattern substrate using the halftone mask: A halftone mask includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107970 - Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect: With respect to an exposure mask having a transparent substrate 1 formed thereon with a mask pattern 2 which becomes a transfer pattern, correction is performed by removing, by the use of a needle-shaped member 4, a peripheral portion of a recessed defect 3 formed on a surface 1a of... Agent: Sughrue Mion, Pllc

20080107971 - Silylphenylene polymer composition for the formation of interlayers and process for the formation of patterns by using the same: t

20080107977 - Pigment compositions, colored compositions making use of the pigment compositions, and color filters: wherein A represents a substituted or unsubstituted phenyl group, B represents a substituted or unsubstituted β-naphthyl group, C represents a substituted or unsubstituted α-anthraquinonyl group, D represents a particular substituted aromatic group, and E represents a substituted or unsubstituted phenyl group, with a proviso that the compounds each have at... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107978 - Imaging member: An imaging member has a crosslinked overcoat layer. The overcoat layer is formed from an overcoat solution comprising a trisilanol polyhedral oligomeric polysilsesquioxane; two crosslinking agents; a hole transport molecule; an acid catalyst; and an alcohol solvent. The overcoat layer provides excellent wear resistance at a low cost.... Agent: Fay Sharpe / Xerox - Rochester

20080107980 - Photoreceptor overcoat layer masking agent:

20080107981 - Positive-charge injection preventing layer for electrophotographic photoreceptors: Positive-charge injection-related ghosting of images in electrophotographic processes is addressed by electrophotographic photoreceptors that include a positive-charge injection preventing layer that includes one or more positive-charge-injection preventing compounds. In addition, processes are provided for preventing positive charge injection, in which the processes include a step of applying a positive-charge injection... Agent: Oliff & Berridge, Plc.

20080107979 - Silanol containing charge transport overcoated photoconductors: A photoconductor containing an optional supporting substrate, a photogenerating layer, at least one silanol containing charge transport layer, and a top overcoating layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107984 - Overcoated photoconductors with thiophosphate containing charge transport layers: A photoconductor containing an optional supporting substrate, a containing photogenerating layer, at least one thiophosphate containing charge transport layer, and a top overcoating crosslinked polymer layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107985 - Silanol containing overcoated photoconductors: A photoconductor containing an optional supporting substrate, a silanol containing photogenerating layer, at least one charge transport layer, and a top overcoating layer in contact with and contiguous to the charge transport layer.... Agent: Patent Documentation Center

20080107983 - Overcoated photoconductors with thiophosphate containing photogenerating layer: A photoconductor containing a thiophosphate photogenerating layer, and at least one charge transport layer, and a top polymeric overcoating layer in contact with and contiguous to a charge transport layer.... Agent: Patent Documentation Center

20080107982 - Photoconductors containing halogenated binders: A photoconductor containing a supporting substrate, a photogenerating layer, and at least one charge transport layer; and wherein the photogenerating layer is comprised of at least one photogenerating pigment and a resin binder that is substantially insoluble in an alkylene halide like methylene chloride.... Agent: Patent Documentation Center

20080107986 - Hydrophobic, salt-like structured silicate: A salt-like hydrophobic structured silicate, wherein the cation of the salt-like structured silicate is a low molecular weight organic cation or a combination thereof with NH4+, H3O+, alkali metal, alkaline earth metal, earth metal and/or a transition metal ion. The anion of the salt-like structured silicate is an island, ring,... Agent: Clariant Corporation Intellectual Property Department

20080107973 - Fine mold and method for regenerating fine mold: A fine mold comprises a regeneration target film forming a convex part of a formation surface, and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film. A manufacturing cost of a product having a three-dimensional structure can... Agent: Dickstein Shapiro LLP

20080107975 - Method of correcting photomask defect: After making an electrical continuity in the isolated pattern by a metal deposition film by a CVD of the electron beam or the helium ion beam generating from the gas field ion source, the defect is corrected and, after the correction, the metal deposition film is physically removed by an... Agent: Brinks Hofer Gilson & Lione

20080107974 - Photomask, multiphase exposure method, and method of manufacturing semiconductor device including insulating gate-type transistors: A photo-mask, a multiphase exposure method and a method of manufacturing a semiconductor device are disclosed. The photo-mask mask includes a first light shielding region which is narrow and elongated, and a second light shielding region which is wider and more elongated than the first light shielding region and is... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080107976 - Real-time configurable masking: Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern having an undefined area, directing a second beam... Agent: Ibm Coporation (rtp) C/o Schubert Osterrieder & Nickelson Pllc

20080107987 - Toner and two-component developer: A toner in which mother toner particles containing at least a resin binder and a colorant are coated with an external additive, wherein the mother toner particles contain fine powders of a fluororesin having an average particle size of 1 μm or less in an amount of from 4 to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080107988 - Emulsion aggregation toner having rheological and flow properties: A toner including toner particles of a styrene acrylate binder and at least one colorant, wherein the styrene acrylate binder has a weight average molecular weight of about 20 to about 30 kpse and a molecular peak of about 23 to about 28 kpse, the toner particles have a weight... Agent: Oliff & Berridge, Plc.

20080107989 - Emulsion aggregation polyester toners: An emulsion aggregation toner including an amorphous resin and a crystalline resin, wherein the toner has an acid value of from about 16 mg/eq. KOH to about 40 mg/eq. KOH and a relative humidity sensitivity ratio of from about 1 to about 2, and wherein the crystalline resin has a... Agent: Oliff & Berridge, Plc.

20080107990 - Toner compositions: Toner compositions comprising low-melt toner particles and methods of preparing such toner compositions are provided. The toner particles include a polyester-containing binder, a colorant and an optional wax. The binder includes at least one crystalline polyester resin and at one amorphous acidic polyester resin.... Agent: Oliff & Berridge, Plc.

20080107991 - Toner for development of electrostatic image, method of producing the same, electrostatic image developer, toner cartridge, process cartridge, and image forming apparatus: n

20080107992 - Image forming method, image forming apparatus, and developer: where ε′ is a specific dielectric constant of the image bearing member, q is an electrification quantity per one toner particle, and r is a volume average radius of the toner particles.... Agent: Amin, Turocy & Calvin, LLP

20080107993 - Donor films with pattern-directing layers: Laser induced thermal imaging (LITI) donor films, and methods of preparing them, having a substrate, a light-to-heat conversion layer, and a pattern-directing layer. The pattern-directing layer can include patterns of self-assembled monolayer regions, hydrophilic and hydrophobic regions, positively or negatively charged regions, or a series of raised or recessed features.... Agent: 3m Innovative Properties Company

20080107994 - Photonic crystal euv photoresists: Embodiments of the present invention provide EUV (extreme ultraviolet) photoresists comprising photonic crystals, as well as other components. Photonic crystals in general provide the ability not only to block light transmission, but also to create resonant pockets in which light can propagate. The photonic crystals are based on bio-related polymers... Agent: Intel/blakely

20080107995 - Optical disc having lenticular surface and method of manufacturing: The optical disc of the present invention includes a first translucent substrate having generally planar opposed top and bottom surfaces. The bottom surface is smooth and adapted to an optical beam for accessing data on the disc. The top surface of the first substrate has formed pits that represent data... Agent: Stetina Brunda Garred & Brucker

20080107996 - Shear resistant printing ink vehicles: The specification describes a process for making gelled ink resins which exhibit improved properties such as lower viscosity under low shear and less viscosity decrease with increasing shear. In a preferred embodiment, a rosin-based or hydrocarbon-based resin is mixed with an organic solvent and reacted with a polyamine reactant, such... Agent: Legal Department Lubrizol Advanced Materials, Inc

20080107997 - Anti-reflective coating containing sulfur atom: There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with... Agent: Oliff & Berridge, Plc

20080107998 - Near-field exposure method and device manufacturing method using the same: A near-field exposure method in which a light blocking film with an opening having an opening width not greater than a wavelength size of exposure light is contacted to an object to be exposed and in which light from an exposure light source is projected on the light blocking film... Agent: Fitzpatrick Cella Harper & Scinto

20080107999 - Exposure method, device manufacturing method, and substrate: An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition RW−RP≦1.0×10−3 when RP is the transmittance of the liquid containing an eluted... Agent: Oliff & Berridge, Plc

20080108000 - Random negative index material structures in a three-dimensional volume: Materials and methods for fabricating and using negative index materials are disclosed. A negative index material comprises a three-dimensional volume including a bulk solution and a plurality of unit cells disposed in the bulk solution in a substantially random pattern. Each unit cell comprises a periodic hole array pattern on... Agent: Hewlett Packard Company

20080102380 - High density lithographic process: A method is provided for patterning monolithically integrated features having a 1:1 ratio. The method comprises forming a first etch barrier layer (18) over a base layer (14) and applying (52) a template (20) to pattern (52) first printed features (26) in the first etch barrier layer (18). The first... Agent: Ingrassia Fisher & Lorenz, P.C.

20080102379 - Method for forming a robust mask with reduced light scattering: A mask and method for forming the same including carrying out a photolithographic patterning process the method including providing a substantially light transparent portion; forming a substantially light shielding layer disposed over the substantially light transparent portion; forming at least one barrier layer disposed over the substantially light shielding layer;... Agent: Tung & Associates

20080102382 - Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate: Methods for producing a photomask or layer or stack patterning include applying two resists to a layer, a layer stack, or a mask substrate (collectively “the layer”). Sensitivity of the first resist with respect to the exposure dose is greater than sensitivity of the second. Both resists are subjected to... Agent: Mayback & Hoffman, P.A.

20080102384 - Method of fabricating color filter: A method of fabricating a color filter is provided, which includes the following steps. First, a loose composite film is formed. Next, the loose composite film is patterned to form a patterned composite film. Then, a treatment process is performed to dense the patterned composite film, thereby a color filter... Agent: Jianq Chyun Intellectual Property Office

20080102386 - Compositions including polymers aligned via interchain interactions: The present invention provides compositions, devices and methods related to the alignment of materials including polymers. In some cases, the present invention comprises the assembly of molecules (e.g., polymers) via intermolecular interactions to produce extended networks, which may have enhanced properties relative to the individual molecules. Such networks may be... Agent: Wolf Greenfield & Sacks, P.C.

20080102387 - Display panel manufacturing method and display panel manufacturing apparatus: A display panel manufacturing method is provided-for manufacturing a display panel including a microlens formed on a surface of a TFT substrate (2) and a light shield (11) corresponding to an inner region of an opening (5B). The method includes a step of arranging photosensitive resin (8) on a surface... Agent: Edwards Angell Palmer & Dodge LLP

20080102388 - Photoreceptor containing substituted biphenyl diamine and method of forming same: A photoreceptor with a substrate, a charge generating layer, a charge transport layer including N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine, having a purity of from about 95 percent to about 100 percent, and a protective overcoating layer, optionally including a hole transport material other than N,N,N′N′-tetra(4-methylphenyl)-(1,1′-biphenyl)-4,4′-diamine, that will discharge form about 85% to about 100%... Agent: Oliff & Berridge, PLC.

20080102389 - Electrophotographic photoreceptor, method of producing the same, process cartridge, and image-forming apparatus: The electrophotographic photoreceptor of the present invention includes a cylindrical support; a charge-generating layer and a charge-transporting layer that are layered onto the cylindrical support in this sequence from the cylindrical support side. The charge-transporting layer includes a charge transport material, and resins including a curable resin and a thermoplastic... Agent: Oliff & Berridge, PLC

20080102390 - Electrophotographic photoreceptor, method of producing the same, process cartridge, and image-forming apparatus: The electrophotographic photoreceptor of the present invention includes a cylindrical support, a photosensitive layer and an outermost surface layer that are layered onto the cylindrical support in this sequence from the cylindrical support side. The outermost surface layer includes a charge transport material and a curable resin. The proportion of... Agent: Oliff & Berridge, PLC

20080102391 - Method for preparing photoreceptor, photoreceptor prepared by the method, and image forming method and apparatus and process cartridge using the photoreceptor: A method for preparing a photoreceptor including forming a photosensitive layer overlying an electroconductive substrate; coating a liquid including a radically polymerizable compound to form a protective layer; irradiating the protective layer with light to crosslink the protective layer; and then contacting the protective layer with a fluid, which is... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102378 - Thermoplastic holographic media: The present invention provides an article comprising: a binder component, a polymerizable component; and a photoinitiator component comprising at least one photoinitiator that causes the polymerizable component to form a polymer or co-polymer when a portion of the polymerizable component is exposed to a light source. The present invention also... Agent: Jagtiani + Guttag

20080102381 - Method for managing light exposure mask and light exposure mask: An object of the present invention is to provide a method for managing a light exposure mask wherein: a mask inspection or a wafer inspection, in order to manage a contamination of a light exposure mask by a growing foreign matter, is not necessary; the method has general versatility regardless... Agent: Ladas & Parry LLP

20080102383 - Phase shift mask and method of fabricating the same: A phase shift mask includes a first non-phase shift region, a first phase shift region adjacent the first non-phase shift region, a second non-phase shift region, a second phase shift region adjacent the second non-phase shift region, and an opaque region interposed between said second phase shift and non-phase shift... Agent: Volentine & Whitt PLLC

20080102385 - Process for color filter array residual pigment removal: A method of fabricating a color filter array including the removal of unwanted residual color pigments. A substrate is coated with a colored photoresist layer. The photoresist layer is patterned. The substrate is then cured. A descumming step is performed after the curing step to remove the residual pigments without... Agent: Dickstein Shapiro LLP

20080102392 - Information recording medium and method of preparing same: An information recording medium includes a transparent recording member and a substantially non-transparent member. The transparent recording member has at least one transparent area and a concavo-convex pattern on a first surface thereof while bearing a reverse toner image on a second surface thereof. The substantially non-transparent member is formed... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102393 - Toner, method of supplying the same and process cartridge: A toner including a colorant, a binder resin, and a releasing agent, wherein the toner has a number average particle diameter measured by a Coulter Counter method of from 3.5 to 6.5 μm and a peak top molecular weight (MPT) of from 2,500 to 4,800, the binder resin contains a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080102394 - Method of preparing resin composition of toner and toner composition having the same: A method of preparing a resin composition of a toner and a toner composition having the same. The method of preparing the resin composition includes preparing a compound in which a double bond is introduced into a polyester by reacting the polyester with a double bond-containing compound, adding a first... Agent: Stanzione & Kim, LLP

20080102395 - Toner and manufacturing method thereof: An objective is to provide toner by which high quality images can be stably formed for a long duration. Disclosed is a toner possessing toner particles each containing a binder resin and a colorant, wherein the toner particle has a low surface energy group chemically bonded to the binder resin... Agent: Lucas & Mercanti, LLP

20080102396 - Toner for developing electrostatic charge image, electrostatic charge image developer, image forming method and image forming apparatus: A toner for developing an electrostatic charge image, includes: a binder resin formed by reacting a polymerizable aromatic monomer having an ethylenically unsaturated double bond conjugated to an aromatic ring thereof, a nitrogen-containing polymerizable aliphatic monomer having an ethylenically unsaturated double bond and a sulfur-containing aliphatic compound to each other;... Agent: Oliff & Berridge, PLC

20080102397 - Toner container and image forming apparatus including same: A toner container of the present invention includes a cylindrical portion containing toner used in an electrophotographic type complex machine. When the cylindrical portion is driven to rotate, the toner gets out via an outlet thereof. The cylindrical portion of the toner container has an inner wall provided with a... Agent: Nixon & Vanderhye, PC

20080102398 - Developing agent and method for producing the same: A method for producing a developing agent including heating a dispersion of a toner particle material containing a binder resin fine particle, a coloring agent particle and a dispersion medium at a temperature of a glass transition point of the binder resin or higher and adding a coagulating agent in... Agent: Amin, Turocy & Calvin, LLP

20080102399 - Image sheet forming method and image sheet forming apparatus: A pair of registration rollers align a leading edge of a recording medium having a transparent section and a non-transparent section. A boundary sensor detects a boundary between the transparent section and the non-transparent section. The boundary sensor is provided on a downstream side of a direction of conveying the... Agent: Harness, Dickey & Pierce, P.L.C

20080102402 - Monomer having sulfonyl group, polymer thereof and photoresist composition including the same: wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a... Agent: Birch Stewart Kolasch & Birch

20080102400 - Negative tone silicon-containing resist for e-beam lithography: The negative resist compositions especially suitable for electron beam-based lithographic processes are obtained by using a polymeric component containing first silsesquioxane moieties functionalized with a first reactive group having a first crosslinking reactivity and a first dissolution rate in aqueous alkaline solutions, and second silsesquioxane moieties functionalized with a second... Agent: International Business Machines Corporation Dept. 18g

20080102403 - Photoresist compositions and methods of forming a pattern using the same: wherein R1, R2, R3 and R4 independently represent a hydrogen atom or a C1-C3 alkyl group, X is a blocking group including an alkyl-substituted adamantane or an alkyl-substituted tricycloalkane, Y is a blocking group including a lactone, Z1 is a blocking group including a hydroxyl-substituted adamantane, and Z2 is a... Agent: Mills & Onello LLP

20080102401 - Si-containing polymers for nano-pattern device fabrication: A resist polymer that has nano-scale patterns located therein that are in the form of sub lithographic hollow pores (or openings) that are oriented in a direction that is substantially perpendicular with that of its major surfaces (top and bottom) is provided. Such a resist polymer having the nano-scale patterns... Agent: Scully, Scott, Murphy & Presser, P.C.

20080102404 - Aluminum alloy plate and support for lithographic printing plate: An aluminum alloy plate for lithographic printing that is capable of obtaining a lithographic printing plate support which is free from appearance defects and has a uniform surface after electrolytic graining treatment and of obtaining a lithographic printing plate having a long press life and an excellent scumming resistance is... Agent: Sughrue Mion, PLLC

20080102405 - Nitrogen-containing organic compound, resist composition and patterning process: A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.... Agent: Birch Stewart Kolasch & Birch

20080102406 - Light sensitive planographic printing plate material and manufacturing process of printing plate employing the same: r

20080102407 - Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process: A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is... Agent: Birch Stewart Kolasch & Birch

20080102409 - Inductor for a system-on-a-chip and a method for manufacturing the same: An inductor for a system-on-a-chip and a method for manufacturing the inductor are disclosed. The inductor comprises a conductive line formed by connecting a plurality of conductive patterns grown from a seed layer formed on a lower wiring. The method comprises using an electrolytic plating process or an electroless plating... Agent: Volentine & Whitt PLLC

20080102408 - Microstructure and method for producing microstructures: Light-diffracting microstructures are produced by the superimposition of at least two relief structures, wherein the first relief structure is produced mechanically while at least one second relief structure is a photomechanically generated diffraction structure. A process for the production of light-diffracting microstructures which are additive superimpositions comprising a relief structure... Agent: Charles R Hoffmann Hoffmann & Baron

20080102410 - Method of manufacturing printed circuit board: A method of manufacturing a printed circuit board is disclosed, in which a cavity is formed for embedding a component, which includes: providing a core board, in which an inner circuit is buried; forming a first via in the core board for interlayer conduction; selectively forming a first photoresist in... Agent: Staas & Halsey LLP